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JP4952415B2 - Transmitted light amount variable element and projection display device - Google Patents
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JP4952415B2 - Transmitted light amount variable element and projection display device - Google Patents

Transmitted light amount variable element and projection display device Download PDF

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JP4952415B2
JP4952415B2 JP2007182040A JP2007182040A JP4952415B2 JP 4952415 B2 JP4952415 B2 JP 4952415B2 JP 2007182040 A JP2007182040 A JP 2007182040A JP 2007182040 A JP2007182040 A JP 2007182040A JP 4952415 B2 JP4952415 B2 JP 4952415B2
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refractive index
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transmitted light
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浩司 宮坂
弘昌 佐藤
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AGC Inc
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Asahi Glass Co Ltd
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Description

本発明は、入射した光の光量を切り替えて透過させる透過光量可変素子および投射型表示装置に関する。   The present invention relates to a transmitted light amount variable element and a projection display device that switch the amount of incident light and transmit the light.

投射画像を表示する投射型表示装置として、例えば、入射光を映像信号に応じて変調し透過光を投射して画像を表示する液晶投射型表示装置(例えば、特開2001−264728号公報参照)、および、画素毎に有する微小ミラーの反射角を映像信号に応じて変化させて反射光量を変調し、変調して得られた光を投射して画像を表示するDMD(Digital Micromirror Device 登録商標)型の投射型表示装置(例えば、特開2004−361856号公報参照)がある。   As a projection display device that displays a projected image, for example, a liquid crystal projection display device that modulates incident light according to a video signal and projects transmitted light to display an image (see, for example, Japanese Patent Laid-Open No. 2001-264728) And DMD (Digital Micromirror Device (registered trademark)) that modulates the amount of reflected light by changing the reflection angle of a micromirror for each pixel according to a video signal and projects the light obtained by the modulation to display an image Type projection display devices (see, for example, Japanese Patent Application Laid-Open No. 2004-361856).

例として、図7に液晶投射型表示装置50の構成図を示す。光源1を出射した光は、反射鏡2を反射してほぼ光軸に平行な光となり、照明光学系3を介して透過光量可変素子8によって光量を調整された光が偏光子4に進み、偏光子4によって所定の直線偏光方向の光にされる。偏光子4を出射した光は、画像表示用空間光変調素子としての液晶パネル5によって偏光状態の変調を受け検光子6に入射し、検光子6を通過することによって所定の偏光成分のみが投射レンズ系7に出射し、投射レンズ系7を通過して不図示のスクリーン等に投射表示される。   As an example, FIG. 7 shows a configuration diagram of a liquid crystal projection display device 50. The light emitted from the light source 1 is reflected by the reflecting mirror 2 to become light substantially parallel to the optical axis, and the light whose light amount is adjusted by the transmitted light amount variable element 8 through the illumination optical system 3 proceeds to the polarizer 4. The light is converted into light having a predetermined linear polarization direction by the polarizer 4. The light emitted from the polarizer 4 is modulated in the polarization state by a liquid crystal panel 5 as a spatial light modulation element for image display, enters the analyzer 6, and passes through the analyzer 6 so that only a predetermined polarization component is projected. The light is emitted to the lens system 7, passes through the projection lens system 7, and is projected and displayed on a screen or the like (not shown).

ここで、液晶投射型表示装置に使用される透過光量可変素子8は、スクリーン等に投射表示させる場所の明るさによって光量を調整する素子であり、液晶に電圧を印加し、その印加電圧の大きさによって透過させる光量の調整を実現しているものである。また、電圧を印加するための電極を分割して透過光量可変素子を透過する光の光量を各電極部ごとに調整することで、場所の明るさに対応して投射画像のコントラストが最大になるように調整できる機能を実現している(特許文献1)。   Here, the transmitted light amount variable element 8 used in the liquid crystal projection display device is an element that adjusts the light amount according to the brightness of the place to be projected and displayed on a screen or the like, and applies a voltage to the liquid crystal, and the magnitude of the applied voltage. Thus, the adjustment of the amount of light to be transmitted is realized. In addition, the contrast of the projected image is maximized according to the brightness of the place by adjusting the amount of light transmitted through the transmitted light amount variable element for each electrode unit by dividing the electrode for applying the voltage. The function which can be adjusted is realized (Patent Document 1).

従来の透過光量可変素子は、2枚の基板の一方に断面が凹凸状となる多層格子部材を設け液晶を充填した構造であり、この液晶に電圧を印加することで透過と回折機能を発現させ透過光量を調整していた。このような設計においては、光利用効率を高めるために、広帯域で入射する光の波長に対応する液晶の常光屈折率(n)に合わせて多層格子部材(n)の屈折率を調整していた。多層格子部材は、高屈折率部材と低屈折率部材との層からなり、特許文献1では多層膜の平均屈折率を低くして液晶の屈折率と整合させるため、低屈折率の部材の屈折率が約1.41と低い材料を使用して実現している。低屈折率の部材となる屈折率約1.41の透光性材料として、実際には、MgFやプラズマアシストなしで成膜した多孔質SiOが考えられる。 The conventional transmitted light amount variable element has a structure in which a multi-layer grating member having a concavo-convex cross section is provided on one of two substrates and liquid crystal is filled. By applying a voltage to this liquid crystal, transmission and diffraction functions are exhibited. The amount of transmitted light was adjusted. In such a design, in order to increase the light utilization efficiency, the refractive index of the multilayer grating member (n m ) is adjusted in accordance with the ordinary refractive index (n o ) of the liquid crystal corresponding to the wavelength of light incident in a wide band. It was. The multilayer grating member is composed of a layer of a high refractive index member and a low refractive index member. In Patent Document 1, the average refractive index of the multilayer film is lowered to match the refractive index of the liquid crystal. This is realized by using a material having a low rate of about 1.41. As a translucent material having a refractive index of about 1.41 that becomes a low refractive index member, actually, MgF 2 or porous SiO 2 formed without plasma assist can be considered.

国際公開第2006/082901号パンフレットInternational Publication No. 2006/082901 Pamphlet

しかしながら、MgFで作製した膜は膜自体の強度に問題がある上、回折格子構造を作製する過程でのエッチング加工に難点があり、また、多孔質のSiOは機械的強度が弱く、長期使用時の信頼性に問題があった。さらに、低屈折率の部材として機械的強度および信頼性に優れるSiO結晶膜を用いて多層格子部材を形成すると、これらの材料で作製する多層格子部材よりも平均屈折率が高くなる。この差が生じるため、多層格子部材の平均屈折率と格子凹部に含まれる液晶の常光屈折率とが一致しなくなる。すると、それらの屈折率差から回折が生じ、電圧を制御して液晶の常光屈折率を用いる場合でも、透過光量可変素子を透過する光の透過率が下がってしまうという問題があった。 However, the film made of MgF 2 has a problem in the strength of the film itself, and has a difficulty in etching in the process of manufacturing the diffraction grating structure, and porous SiO 2 has a low mechanical strength, and has a long-term There was a problem in reliability during use. Furthermore, when a multilayer grating member is formed using a SiO 2 crystal film having excellent mechanical strength and reliability as a low refractive index member, the average refractive index becomes higher than that of a multilayer grating member made of these materials. Since this difference occurs, the average refractive index of the multilayer grating member does not match the ordinary refractive index of the liquid crystal contained in the grating recesses. Then, diffraction occurs due to the difference in refractive index, and there is a problem that the transmittance of light transmitted through the transmitted light amount variable element is lowered even when the ordinary refractive index of the liquid crystal is used by controlling the voltage.

本発明はこのような問題を解決するためになされたものであり、加工性が容易で信頼性が高くかつ、光利用効率が高く広帯域にわたって略一定となる透過光量を制御性よく調整できる透過光量可変素子および投射型表示装置を提供するものである。   The present invention has been made to solve such problems. The transmitted light amount that allows easy adjustment of the transmitted light amount that is easy to process, has high reliability, has high light utilization efficiency, and is substantially constant over a wide band with good controllability. A variable element and a projection display device are provided.

本発明は、平行に配置された少なくとも2枚の透明基板と、前記透明基板の対向する一対の前記透明基板のいずれか一方の面に設けられ断面形状が周期的な凹凸状の回折格子の凸部を形成する第1の多層膜部材と、前記回折格子の凹部の一部に設けられる光学媒質と、一対の前記透明基板間に前記回折格子および前記光学媒質を埋めるように挟持された液晶と、前記液晶に電圧を印加するための透明電極と、を備え、前記第1の多層膜部材は、屈折率が異なる複数種の光学薄膜が基板と垂直方向に積層された多層構造を有し、前記光学媒質の屈折率は、前記液晶の常光屈折率より高い透過光量可変素子を提供する。 The present invention includes at least two transparent substrates arranged in parallel, wherein arranged on one side one of the pair of the transparent substrate opposite the transparent substrate, the cross-sectional shape is periodic uneven diffraction grating A first multilayer film member that forms a convex part, an optical medium provided in a part of the concave part of the diffraction grating, and a liquid crystal sandwiched between the pair of transparent substrates so as to fill the diffraction grating and the optical medium And a transparent electrode for applying a voltage to the liquid crystal, wherein the first multilayer film member has a multilayer structure in which a plurality of types of optical thin films having different refractive indexes are laminated in a direction perpendicular to the substrate. The optical medium has a refractive index that is higher than the ordinary refractive index of the liquid crystal.

この構成により、回折格子の凸部を形成する多層膜部材の平均屈折率に対して回折格子の凹部を埋める液晶の常光屈折率が低い材料を使用した場合でも、凹部に含まれる光学媒質により凹部の平均屈折率が大きくなり、凸部の平均屈折率との差を小さくすることができる。これにより、透過光量可変素子に光を入射させて凹部と凸部との屈折率の差によって生じる透過光量の減少を抑制することができ、液晶材料選択の自由度が大きく好適である。ここで、凸部とは回折格子構造の多層膜部材の部分であり、凹部とは凸部の間にあり多層膜部材の底辺から頂点までの高さの部分である。したがって、凸部の頂点より高い部分にある液晶は凸部および凹部いずれにも含まれない。   With this configuration, even when a material having a low ordinary refractive index of liquid crystal filling the concave portion of the diffraction grating with respect to the average refractive index of the multilayer film member forming the convex portion of the diffraction grating is used, the concave portion is formed by the optical medium contained in the concave portion This increases the average refractive index, and can reduce the difference from the average refractive index of the protrusions. Thereby, it is possible to suppress the decrease in the transmitted light amount caused by the difference in the refractive index between the concave portion and the convex portion by making the light incident on the transmitted light amount variable element, which is preferable because the degree of freedom in selecting the liquid crystal material is large. Here, the convex part is a part of the multilayer film member having a diffraction grating structure, and the concave part is a part between the convex part and having a height from the bottom to the apex of the multilayer film member. Therefore, the liquid crystal in a portion higher than the top of the convex portion is not included in either the convex portion or the concave portion.

また、前記第1の多層膜部材は、第1の高屈折率材料と第1の低屈折率材料との2種類の光学材料から形成される上記に記載の透過光量可変素子を提供する。   The first multilayer film member provides the transmitted light amount variable element described above, which is formed of two types of optical materials, a first high refractive index material and a first low refractive index material.

この構成により、必要最小限の部材で多層膜を形成することができるため生産効率が向上し好適である。   With this configuration, a multilayer film can be formed with a minimum number of members, which is preferable because production efficiency is improved.

また、前記第1の高屈折率材料がTaであり、前記第1の低屈折率材料がSiOである上記に記載の透過光量可変素子を提供する。 In addition, there is provided the transmitted light amount variable element according to the above, wherein the first high refractive index material is Ta 2 O 5 and the first low refractive index material is SiO 2 .

この構成により、安定した材料を使用することできるので、信頼性の高い多層膜が得られるので、好適である。   This structure is preferable because a stable material can be used, and a highly reliable multilayer film can be obtained.

また、前記光学媒質は、前記基板に垂直方向に積層された第2の多層膜部材から形成され、前記第2の多層膜部材の平均屈折率は前記液晶の常光屈折率より高い屈折率を有する上記に記載の透過光量可変素子を提供する。   The optical medium is formed of a second multilayer member laminated in a direction perpendicular to the substrate, and the average refractive index of the second multilayer member is higher than the ordinary refractive index of the liquid crystal. The transmitted light amount variable element described above is provided.

この構成により、回折格子の凸部を形成する多層膜部材の屈折率の平均値に対して、入射する光の波長分散を考慮した凹部の平均屈折率との差をさらに小さく調整することができ、透過光量可変素子の光利用効率をさらに大きくすることができる。さらに、透明基板に対して凹部に透明基板より屈折率の大きい材料を含むとき、多層膜構造にすることによって内部干渉による透過率の低減を抑制することができるので好適である。   With this configuration, the difference between the average refractive index of the multilayer film member forming the convex portion of the diffraction grating and the average refractive index of the concave portion considering the wavelength dispersion of incident light can be adjusted to be smaller. The light use efficiency of the transmitted light amount variable element can be further increased. Furthermore, when the concave portion contains a material having a higher refractive index than the transparent substrate, a multilayer film structure is preferable because a reduction in transmittance due to internal interference can be suppressed.

また、前記第2の多層膜部材は、第2の高屈折率材料と第2の低屈折率材料との2種類の光学材料から形成される上記に記載の透過光量可変素子を提供する。   Further, the second multilayer film member provides the transmitted light amount variable element described above, which is formed of two types of optical materials, that is, a second high refractive index material and a second low refractive index material.

この構成により、必要最小限の部材で多層膜を形成することができるため生産効率が向上し好適である。   With this configuration, a multilayer film can be formed with a minimum number of members, which is preferable because production efficiency is improved.

また、前記第2の高屈折率材料がTaであり、前記第2の低屈折率材料がSiOである上記に記載の透過光量可変素子を提供する。 In addition, the transmitted light amount variable element according to the above, wherein the second high refractive index material is Ta 2 O 5 and the second low refractive index material is SiO 2 .

この構成により、安定した材料を使用することできるので、信頼性の高い多層膜が得られるので、好適である。   This structure is preferable because a stable material can be used, and a highly reliable multilayer film can be obtained.

また、平行に配置された前記透明基板を3枚とし、一対の前記透明基板に挟持された前記液晶の配向方向と、他の一対の前記透明基板に挟持された前記液晶の配向方向とが略直交となる上記に記載の透過光量可変素子を提供する。   The number of the transparent substrates arranged in parallel is three, and the alignment direction of the liquid crystal sandwiched between the pair of transparent substrates and the alignment direction of the liquid crystal sandwiched between the other pair of transparent substrates are approximately. The transmitted light amount variable element described above that is orthogonal to each other is provided.

この構成により、入射する光の偏光状態がランダムであっても光量の制御が可能となり、入射偏光依存性がない透過光量可変素子を実現することができる。   With this configuration, the amount of light can be controlled even when the polarization state of incident light is random, and a transmitted light amount variable element having no dependency on incident polarization can be realized.

また、前記透明電極が複数の領域に分割され、前記複数の領域ごと電圧を印加することができる上記に記載の透過光量可変素子を提供する。 In addition, there is provided the transmitted light amount variable element according to the above, wherein the transparent electrode is divided into a plurality of regions, and a voltage can be applied to each of the plurality of regions.

この構成により、透過光量可変素子に入射する光に対して領域ごとに光量を変えて透過させることができるので、光量制御方式の自由度が向上する。   With this configuration, the light incident on the transmitted light amount variable element can be transmitted by changing the light amount for each region, so that the degree of freedom of the light amount control method is improved.

また、前記回折格子の格子ピッチが10μm以下である上記に記載の透過光量可変素子を提供する。   In addition, the transmission light amount variable element according to the above, wherein the diffraction grating has a grating pitch of 10 μm or less.

この構成により、回折格子に入射する光の回折角が大きくなり、直進する光の光路と大きく異ならせることができるため迷光となる回折光が透過せず、精度の良い制御ができるので好ましい。   This configuration is preferable because the diffraction angle of light incident on the diffraction grating is increased and can be greatly different from the light path of light traveling straight, so that diffracted light that becomes stray light does not pass through and can be controlled with high accuracy.

さらに、所定の光源と、入射光の映像信号に応じて変調して出射させる画像表示用空間変調素子と、複数のレンズからなり、前記光源が出射した光を前記画像表示用空間光変調素子に集光照明する照明光学系と、前記画像表示用空間変調素子から出射した光を投射する投射レンズ系と、前記光源を出射した光が前記投射レンズ系を通過するまでの光路中に1つ以上配置された、上記に記載の透過光量可変素子と、を備えた投射型表示装置を提供する。 Further, the image display spatial light modulation element includes a predetermined light source, an image display light spatial modulation element that modulates and emits light according to a video signal of incident light, and a plurality of lenses. 1 in the optical path until the light emitted from the light source passes through the projection lens system, the illumination optical system that collects and illuminates the light, the projection lens system that projects the light emitted from the light spatial modulation element for image display Provided is a projection display device including at least one of the transmitted light amount variable elements described above.

この構成により、光のコントラストが大きく信頼性が高くかつ、光量の制御が容易な投射型表示装置を実現できる。   With this configuration, it is possible to realize a projection display device that has high light contrast, high reliability, and easy light quantity control.

本発明は、少なくとも2枚の平行配置された透明基板の対向面のいずれかの面に断面が凹凸となる回折格子が形成されて一対の透明基板で液晶を充填して挟持され、凸部が多層膜で形成され、凹部には液晶の常光屈折率より大きい屈折率の光学媒質が含まれ、挟持される液晶に電圧が印加できる構造にすることによって、光利用効率が高く信頼性に優れ、光量制御が容易な透過光量制御素子および投射型表示装置を提供できるものである。   In the present invention, a diffraction grating having a concave-convex cross section is formed on one of the opposing surfaces of at least two transparent substrates arranged in parallel, the liquid crystal is filled between a pair of transparent substrates, and the convex portions are sandwiched. Formed with a multilayer film, the concave portion contains an optical medium with a refractive index larger than the ordinary refractive index of the liquid crystal, and by adopting a structure that can apply a voltage to the sandwiched liquid crystal, the light utilization efficiency is high and the reliability is excellent. It is possible to provide a transmitted light amount control element and a projection display device that can easily control the light amount.

(第1の実施の態様)
図1は、本発明の第1の実施の形態に係る透過光量可変素子の模式的な構成を示す断面図である。図1において透過光量可変素子10は、平行に配置された一対の透明基板11a、11bと、透明基板11aの一対の基板の対向面側に設けられ、多層構造を有する透明部材により周期的な凹凸をなすように配置された第1の多層膜部材13と、周期的な凹凸の溝を浅くするように凹部に設けられた光学媒質として単層光学部材14と、凹凸を埋めるように挟持された液晶15と、液晶15に電圧を印加するための透明電極12a、12bと、シール材16と、透明電極12a、12b間に所定の波形の電圧を印加するための配線17とを含むように構成される。凹部は、この単層光学部材14と液晶15とから構成され、凹部に含まれる液晶の屈折率変化により光路長を変化させる。
(First Embodiment)
FIG. 1 is a cross-sectional view showing a schematic configuration of a transmitted light amount variable element according to the first embodiment of the present invention. In FIG. 1, the transmitted light amount variable element 10 is provided with a pair of transparent substrates 11 a and 11 b arranged in parallel and the opposing surface side of the pair of transparent substrates 11 a, and is periodically uneven by a transparent member having a multilayer structure. Sandwiched between the first multilayer film member 13 arranged so as to form a groove and the single-layer optical member 14 as an optical medium provided in the concave portion so as to make the periodic concave and convex grooves shallow. The liquid crystal 15 includes transparent electrodes 12a and 12b for applying a voltage to the liquid crystal 15, a sealing material 16, and a wiring 17 for applying a voltage having a predetermined waveform between the transparent electrodes 12a and 12b. Is done. The recess is composed of the single-layer optical member 14 and the liquid crystal 15, and the optical path length is changed by changing the refractive index of the liquid crystal contained in the recess.

図1において、透明基板11a、11bとして、例えば、アクリル系樹脂、エポキシ系樹脂、塩化ビニル系樹脂、ポリカーボネート等を用いるのでもよいが、耐久性等の点からガラス基板が好適である。また、この第1の多層膜部材13および単層光学部材14と液晶15との界面、透明電極12bと液晶15との界面に図示しない配向膜を設ける。配向膜はポリイミド、PVA等の配向膜材料を成膜しラビング処理を施す方法により実現でき、液晶の配向制御性を向上でき、好適である。そのほか、無機材料からなる配向膜として、例えば、SiONを斜め蒸着して得られた薄膜、イオンビーム照射して配向処理した膜を用いることができる。これら、斜め蒸着やイオンビーム照射による配向処理は、ラビングでは配向処理が難しい凹凸状の格子部材の凹部の配向規制力に優れているので、好ましい。   In FIG. 1, for example, an acrylic resin, an epoxy resin, a vinyl chloride resin, a polycarbonate, or the like may be used as the transparent substrates 11a and 11b, but a glass substrate is preferable from the viewpoint of durability and the like. Further, an alignment film (not shown) is provided at the interface between the first multilayer film member 13 and the single-layer optical member 14 and the liquid crystal 15 and at the interface between the transparent electrode 12 b and the liquid crystal 15. The alignment film can be realized by a method of forming an alignment film material such as polyimide or PVA and performing a rubbing process, and can improve the alignment controllability of the liquid crystal, which is preferable. In addition, as the alignment film made of an inorganic material, for example, a thin film obtained by obliquely depositing SiON or a film subjected to alignment treatment by ion beam irradiation can be used. These alignment treatments by oblique vapor deposition and ion beam irradiation are preferable because they are excellent in the alignment regulating force of the concave portions of the concavo-convex lattice member, which is difficult to carry out by rubbing.

第1の多層膜部材13を構成する各透明部材は、屈折率の異なる複数の光学部材が積層された多層構造(以下、このような層構造の膜を単に多層膜という)を有する。上記の多層構造となる多層格子部材13を用いることによって、多層膜内の光の干渉状態を波長毎に変えることができる。これは、実効的に第1の多層膜部材13の屈折率の波長分散を制御して所望のものとでき、回折効率や透過率の波長依存性も制御するためのものである。   Each transparent member constituting the first multilayer film member 13 has a multilayer structure in which a plurality of optical members having different refractive indexes are laminated (hereinafter, a film having such a layer structure is simply referred to as a multilayer film). By using the multilayer grating member 13 having the multilayer structure, the interference state of light in the multilayer film can be changed for each wavelength. This is for effectively controlling the wavelength dispersion of the refractive index of the first multilayer film member 13 and controlling the wavelength dependency of diffraction efficiency and transmittance.

第1の多層膜部材13は、例えば真空蒸着法やスパッタ法を用いて屈折率の異なる複数の誘電性薄膜を厚さ方向に周期的に堆積する。その後、フォトリソグラフィ技術およびエッチング技術を用いて凸部を多層膜の構造に加工して得られる。光学薄膜の材料としては、Si、Ta、Nb、Ti、Al、Mg、Ca等の酸化物が信頼性の点で好ましい。2種類の光学薄膜の材料を組み合わせる場合、SiOやTaの組み合わせが、互いの屈折率差が大きくて設計が容易であり、また信頼性、短波長域における透過率、耐光性、作製の制御性等の点から好ましい。この場合、例えばイオンプレーティング法によって酸素、窒素、アルゴンガスなどを導入させた真空チャンバーにRF電圧を印加させてプラズマを発生させた雰囲気内で成膜することで強度、信頼性が向上した膜を形成できる。 The first multilayer film member 13 periodically deposits a plurality of dielectric thin films having different refractive indexes in the thickness direction using, for example, a vacuum evaporation method or a sputtering method. Thereafter, the convex portion is processed into a multilayer film structure using a photolithography technique and an etching technique. As a material for the optical thin film, oxides such as Si, Ta, Nb, Ti, Al, Mg, and Ca are preferable from the viewpoint of reliability. When combining two types of optical thin film materials, the combination of SiO 2 and Ta 2 O 5 has a large difference in refractive index between each other and is easy to design. In addition, reliability, transmittance in a short wavelength region, light resistance, This is preferable from the viewpoint of controllability of production. In this case, for example, a film whose strength and reliability are improved by forming a film in an atmosphere in which an RF voltage is applied to a vacuum chamber into which oxygen, nitrogen, argon gas, or the like is introduced by an ion plating method, and plasma is generated. Can be formed.

表1は、第1の多層格子部材13の光学薄膜の材料、層構造を説明するための一例の表である。   Table 1 is an example of a table for explaining the material and layer structure of the optical thin film of the first multilayer lattice member 13.

Figure 0004952415
Figure 0004952415

表1には、2種類の光学薄膜(例えばL1、L2)が交互に合計19層積層される第1の多層膜部材13の層構造の例である。層L1で代表される光学薄膜は、屈折率が1.46、膜厚が0.202μmであり、層L2で代表される光学薄膜は、屈折率2.20、膜厚が0.038μmである。また、透明基板11a、11bの屈折率は1.52である。   Table 1 shows an example of the layer structure of the first multilayer film member 13 in which a total of 19 layers of two types of optical thin films (for example, L1 and L2) are alternately stacked. The optical thin film represented by the layer L1 has a refractive index of 1.46 and a film thickness of 0.202 μm, and the optical thin film represented by the layer L2 has a refractive index of 2.20 and a film thickness of 0.038 μm. . The refractive indexes of the transparent substrates 11a and 11b are 1.52.

一般に回折格子の回折効率は、凹凸格子の凹部と凸部とを透過する屈折率と距離の積で表される光路長の差と、入射する光の波長との比に依存して変化する。以下では、回折効率の波長依存性を小さくする方法について詳細に説明する。回折効率の波長依存性を小さくするために、利用波長帯域内で光路長差/波長を一定に近づける必要がある。つまり、光路長差の短波長側で小さくし、長波長側で大きくする必要がある。この光路長差の波長依存性を適切な値に近づけるために、凹凸格子を第1の多層膜部材13により構成することが好ましい。   In general, the diffraction efficiency of a diffraction grating varies depending on the ratio between the difference in optical path length represented by the product of the refractive index and distance transmitted through the concave and convex portions of the concave-convex grating and the wavelength of incident light. Hereinafter, a method for reducing the wavelength dependency of the diffraction efficiency will be described in detail. In order to reduce the wavelength dependence of the diffraction efficiency, it is necessary to make the optical path length difference / wavelength close to a constant within the wavelength band used. That is, it is necessary to reduce the difference in optical path length on the short wavelength side and increase it on the long wavelength side. In order to bring the wavelength dependency of the optical path length difference close to an appropriate value, it is preferable that the concavo-convex grating is constituted by the first multilayer film member 13.

具体的には、表1に示す多層膜の例では、光量を可変したい波長帯域を利用波長帯域とし、この場合は460〜660nmの範囲の可視光領域とした。多層膜面に垂直の方向から入射する光の波長がこの利用波長帯域であれば高い透過率を示し、利用波長範囲と異なる波長の光に対しては低い透過率を示し、このように多層膜が光を反射する波長帯域である反射帯域を有する場合、460nmより短い波長側である短波長側では、多層膜での光の干渉により実効的な屈折率が大きくなり、逆に660nmより長い長波長側では、実効的な屈折率が小さくなる。   Specifically, in the example of the multilayer film shown in Table 1, the wavelength band in which the amount of light is desired to be changed is the use wavelength band, and in this case, the visible light region is in the range of 460 to 660 nm. If the wavelength of light incident from the direction perpendicular to the multilayer film surface is in this utilization wavelength band, the transmittance is high, and the transmittance is low for light having a wavelength different from the utilization wavelength range. Has a reflection band which is a wavelength band for reflecting light, an effective refractive index increases on the short wavelength side, which is a wavelength side shorter than 460 nm, due to light interference in the multilayer film, and conversely, a longer wavelength than 660 nm. On the wavelength side, the effective refractive index is small.

この多層膜を凹凸格子状に加工して第1の多層膜部材13とする。また、図1において凹部は単層光学部材14と液晶15とからなるが、上記のように凹部に含まれる液晶は単層光学部材14の高さから第1の多層膜部材13と同じ高さまでを埋める部分に相当する。単層光学部材14には、液晶15の常光屈折率(n)より大きい屈折率の材料を用いることで、単層光学部材14のような光学媒質を形成しないときに比べて凹部の平均常光屈折率を上げることができる。また、凹凸状の回折格子のピッチは、狭いほど光の直進方向に対する回折角度が大きくなる。投射型表示装置では、回折光は不要な迷光となるのでできるだけ回折角度が大きい方が好ましい。したがって、回折させる光の十分な回折角を得るために格子ピッチは10μm以下が好ましく、4μm以下であればより好ましい。図1では、回折格子の長手方向はY軸に平行であり、周期ピッチはX軸に対して例えば一つの凸部を形成する第1の多層膜部材の左端から隣り合う第1の多層膜部材の左端までの長さに相当する。 The multilayer film is processed into a concavo-convex lattice shape to form a first multilayer film member 13. In FIG. 1, the concave portion includes the single-layer optical member 14 and the liquid crystal 15, but the liquid crystal contained in the concave portion from the height of the single-layer optical member 14 to the same height as the first multilayer film member 13 as described above. Corresponds to the part to fill. The single layer optical member 14 is made of a material having a refractive index larger than the ordinary light refractive index (n o ) of the liquid crystal 15, so that the average ordinary light in the recesses can be obtained as compared with the case where an optical medium such as the single layer optical member 14 is not formed. The refractive index can be increased. Further, the narrower the pitch of the concavo-convex diffraction grating, the larger the diffraction angle with respect to the straight traveling direction of light. In the projection display device, the diffracted light becomes unnecessary stray light, so that the diffraction angle is preferably as large as possible. Therefore, in order to obtain a sufficient diffraction angle of the light to be diffracted, the grating pitch is preferably 10 μm or less, more preferably 4 μm or less. In FIG. 1, the longitudinal direction of the diffraction grating is parallel to the Y axis, and the periodic pitch is, for example, a first multilayer film member adjacent to the X axis from the left end of the first multilayer film member forming one convex portion. It corresponds to the length to the left end of.

表1のような光学薄膜により第1の多層膜部材13を形成すると、第1の多層膜部材13の平均屈折率n(各層の光学薄膜の屈折率と厚さとの積の総和/各層の厚さの総和)は約1.57となる。使用する液晶15の常光屈折率nは、この第1の多層膜部材13の平均屈折率と一致するような材料を用いると回折格子を透過する光の光路長差を「0」に近づけることができるので、透過率を向上させることができる。しかし、使用する液晶材料の常光屈折率nは1.5程度であるので、凹部をこの液晶材料のみで構成すると透過率を向上させることはできない。したがって、凹部にnより高い屈折率となる光学媒質を含ませることで、このような特性の液晶材料を用いて第1の多層格子部材13の平均屈折率nと一致させることができるので、液晶材料の選択自由度が向上し、好ましい。 The optical thin film as shown in Table 1 to form a first multilayer film member 13, the average refractive index n m (product of sum / each layer of the refractive index and thickness of the optical thin film layers of the first multilayer film member 13 The total thickness) is about 1.57. When the material having the ordinary refractive index n o of the liquid crystal 15 used matches the average refractive index of the first multilayer film member 13, the optical path length difference of the light transmitted through the diffraction grating is brought close to “0”. Therefore, the transmittance can be improved. However, since the ordinary refractive index n o of the liquid crystal material used is about 1.5, it is impossible to improve the transmittance and constituting a recess only in the liquid crystal material. Therefore, by containing the optical medium as a higher refractive index than n o in the recess, it is possible to match the average refractive index n m of the first multilayer grating member 13 by using a liquid crystal material of such properties This is preferable because the degree of freedom in selecting a liquid crystal material is improved.

具体的に、第1の多層膜部材13の平均屈折率nと、液晶15が常光となる時の凹部の平均屈折率とを一致させるため、凹部に液晶15の常光屈折率nよりも高い屈折率である単層光学部材14を適切な膜厚で設けることで実現することができる。凸部と凹部との屈折率を一致させることで入射する光の透過率を最大とすることができるが、所定の波長帯域において機能を実現するために第1の多層膜部材13、単層光学部材14および液晶15の波長分散特性も考慮して最大の透過率となるように設計する必要がある。また、屈折率が高い単層光学部材14を用いることで、単層光学部材の厚さを薄くすることができるので好ましい。 Specifically, the average refractive index n m of the first multilayer film member 13, the liquid crystal 15 to match the average refractive index of the recess when the ordinary light, than the ordinary refractive index n o of the liquid crystal 15 in the recess This can be realized by providing the single-layer optical member 14 having a high refractive index with an appropriate film thickness. The transmittance of incident light can be maximized by matching the refractive indexes of the convex portion and the concave portion, but the first multilayer film member 13 and the single-layer optical device are used to realize the function in a predetermined wavelength band. In consideration of the wavelength dispersion characteristics of the member 14 and the liquid crystal 15, it is necessary to design the maximum transmittance. In addition, it is preferable to use the single-layer optical member 14 having a high refractive index because the thickness of the single-layer optical member can be reduced.

光量可変素子10は、液晶15に印加する電圧の大きさによって液晶の実効屈折率が変化し、入射する光の透過率を調整させるものである。光量可変素子10の機能として、所望の波長帯域の光がこの回折格子に入射するとき、光の回折効率の低い透過時と、回折効率の高い遮光時における透過率の差が大きいことがコントラストを大きくできる点で好ましい。回折格子としては、凹部となる単層光学部材14と液晶15とを通過する光と、凸部となる第1の多層膜部材13を通過する光との光路長差が、光量可変素子10に入射する光の波長をλとすると、遮光時には実質的に上記光路差が(2n+1)・λ/2、透過時にはnλとなるように設計する(nは整数)ことで機能を実現することができる。さらに、それぞれnの値が「0」とすると、膜厚を薄くすることができ透過率が向上するのでとくに好ましい。   The light quantity variable element 10 changes the effective refractive index of the liquid crystal depending on the magnitude of the voltage applied to the liquid crystal 15 and adjusts the transmittance of incident light. As a function of the light quantity variable element 10, when light in a desired wavelength band is incident on the diffraction grating, the contrast is large because of a large difference in transmittance between light having low diffraction efficiency and light shielding having high diffraction efficiency. This is preferable in that it can be increased. As the diffraction grating, the optical path length difference between the light passing through the single-layer optical member 14 serving as the recess and the liquid crystal 15 and the light passing through the first multilayer film member 13 serving as the protrusion is the light quantity variable element 10. When the wavelength of the incident light is λ, the function can be realized by designing so that the optical path difference is substantially (2n + 1) · λ / 2 when blocked and nλ when transmitting (n is an integer). . Further, it is particularly preferable that the value of n is “0” because the film thickness can be reduced and the transmittance is improved.

また、本発明の適用は、表1に示す多層膜の例には限られず、凹部となる単層光学部材14と液晶15とを通過する光と第1の多層膜部材13を通過する光との光路長差が、遮光時と透過時に、それぞれ実質的に上記の設計に準ずる材料および膜厚の構成であればよい。   The application of the present invention is not limited to the example of the multilayer film shown in Table 1. Light passing through the single-layer optical member 14 and the liquid crystal 15 serving as a recess and light passing through the first multilayer film member 13 The optical path length difference may be a material and a film thickness that substantially conform to the above-described design at the time of light shielding and transmission.

液晶15は屈折率異方性を有し、特性としては誘電異方性が正のものでも負のものでもよい。以下、説明の便宜上液晶15は、誘電異方性が正(電圧を印加すると電界方向に液晶分子の長軸方向が揃う)のものを用いるものとする。また、以下、液晶15の常光屈折率をnとし、異常光屈折率をnとする。 The liquid crystal 15 has a refractive index anisotropy and may have a positive or negative dielectric anisotropy as a characteristic. Hereinafter, for convenience of explanation, it is assumed that the liquid crystal 15 has a positive dielectric anisotropy (when the voltage is applied, the major axis direction of the liquid crystal molecules is aligned with the electric field direction). Further, hereinafter, the ordinary refractive index of the liquid crystal 15 and n o, the extraordinary refractive index and n e.

ここで、凹部に含まれる単層光学部材14の屈折率と常光屈折率nとの平均屈折率を平均常光屈折率no_avr、凹部に含まれる単層光学部材14の屈折率と異常光屈折率nとの平均屈折率を平均異常光屈折率ne_avrとして説明する。このとき、no_avrまたはne_avrうちのいずれか一方の屈折率を、第1の多層膜部材13の屈折率nと実質的に一致させる。例えば、no_avr=nとしたとき、凸部と凹部との光路差が半波長の奇数倍となる|ne_avr−n|・d=(2n+1)・λ/2となるように設計する(nは整数)。このようにすると、光量可変素子10は液晶15に対して電圧非印加時、電圧印加時に上記いずれかの状態となるので、電圧の大きさによって透過率の制御が容易となり好ましい。以下、回折格子の透過時で凸部と凹部との屈折率が一致、遮光時で屈折率差がλ/2として説明する。 Here, the refractive index and the ordinary refractive index n o and an average refractive index of the average ordinary refractive index n O_avr of a single layer optical member 14 contained in the recess, the refractive index and an extraordinary refractive monolayer optical member 14 contained in the recess illustrating the average refractive index of the rate n e average extraordinary refractive index n e_avr. In this case, either the refractive index of n O_avr or n E_avr, substantially match the refractive index n m of the first multilayer film member 13. For example, when the n o_avr = n m, the optical path difference between the convex portion and the concave portion is an odd multiple of a half wavelength | design · d = (2n + 1) · λ / 2 and so as to | n e_avr -n m (N is an integer). In this way, the light quantity variable element 10 is in any one of the above states when no voltage is applied to the liquid crystal 15 or when a voltage is applied. Therefore, the transmittance can be easily controlled depending on the magnitude of the voltage. In the following description, it is assumed that the refractive index of the convex portion and the concave portion is the same when transmitted through the diffraction grating and the refractive index difference is λ / 2 when the light is shielded.

透明電極12a、12bは、ITOやSnO等の金属酸化物薄膜、金属薄膜等を用いることができるが、ITOやSnO等が透過率が高く好ましい。透明電極は液晶15の配向方向を電圧によって変えることができればよく、透明基板11a面上または回折格子の凹凸部表面上に設けることができるが、透明基板11a面上は信頼性が向上するので好ましい。また、透明基板12a、12bの対向しない面には図示しない反射防止膜を設けることにより透過率を向上させることができる。 Transparent electrodes 12a, 12b, the metal oxide thin film such as ITO or SnO 2, may be a metal thin film or the like, ITO, SnO 2 or the like is preferable because of high transmittance. The transparent electrode only needs to be able to change the orientation direction of the liquid crystal 15 depending on the voltage, and can be provided on the transparent substrate 11a surface or the surface of the concavo-convex portion of the diffraction grating, but the transparent substrate 11a surface is preferable because reliability is improved. . Moreover, the transmittance | permeability can be improved by providing the antireflection film which is not shown in the surface which does not oppose the transparent substrates 12a and 12b.

図5に、透明電極102a、102bを、複数の分割電極111、112、113の領域に分割した場合の構成例を説明するため、X−Y平面からの図を示す。以下では、説明の便宜上、図面上の白く表された分割電極は光が透過し、メッシュの施された分割電極は印加された電圧に応じて光の一部が回折して透過率が低くなっているものとする。   FIG. 5 shows a view from the XY plane in order to explain a configuration example when the transparent electrodes 102 a and 102 b are divided into a plurality of divided electrodes 111, 112 and 113. In the following, for convenience of explanation, light is transmitted through the divided electrodes shown in white on the drawing, and part of the light is diffracted according to the applied voltage, and the transmittance is lowered. It shall be.

図5(a)には、全分割電極111、112、113が同一の電位にされ、全領域を光が透過する様子が示されている。同様に、図2(b)には、分割電極113の電位が切り替えられ、分割電極113の領域で透過率が低下している。図2(c)には、分割電極112の電位も切り替えられ、分割電極112、113の領域も透過率が低下している。このように構成することによって、分割電極111、112、113が設けられた領域ごとに光の透過率を変えることができる。   FIG. 5A shows a state in which all the divided electrodes 111, 112, and 113 are set to the same potential and light is transmitted through the entire region. Similarly, in FIG. 2B, the potential of the divided electrode 113 is switched, and the transmittance is reduced in the region of the divided electrode 113. In FIG. 2C, the potential of the divided electrode 112 is also switched, and the transmittance of the regions of the divided electrodes 112 and 113 is also reduced. With this configuration, the light transmittance can be changed for each region where the divided electrodes 111, 112, and 113 are provided.

図6は、図5に示す透明電極12a、12bと同様に複数の分割電極の領域に分割した場合の構成例を説明するためのX−Y平面の図である。図6に示す分割電極121、122、123の形状は、投射型表示装置を構成する照明光学系にマイクロレンズ(フライアレイレンズ)が含まれる場合に用いることが好適なものである。すなわち、分割電極121、122、123の形状は、端の部分が上記のマイクロレンズのセルの形状に相似し、各セルごとに光の透過率を変えることができるものである。   FIG. 6 is an XY plane view for explaining a configuration example in the case of dividing into a plurality of divided electrode regions in the same manner as the transparent electrodes 12a and 12b shown in FIG. The shape of the divided electrodes 121, 122, and 123 shown in FIG. 6 is suitable for use when a microlens (fly array lens) is included in the illumination optical system that constitutes the projection display device. That is, the shape of the divided electrodes 121, 122, 123 is similar to the shape of the microlens cell at the end, and the light transmittance can be changed for each cell.

シール材16は、液晶15を一対の透明基板11a、11b間に密封するために設けられるものである。シール材16としては、エポキシ樹脂等の熱硬化型高分子からなる樹脂、紫外線硬化型樹脂等を用いることができる。また、シール材16として、所望のセル間隔を得るためにガラスファイバ等のスペーサを数%混入させたものを用いてもよい。配線17としては、透明電極12a、12b間に所定の波形の電圧を印加するためのものであり、フレキシブル配線等を用いることができる。   The sealing material 16 is provided to seal the liquid crystal 15 between the pair of transparent substrates 11a and 11b. As the sealing material 16, a resin made of a thermosetting polymer such as an epoxy resin, an ultraviolet curable resin, or the like can be used. Further, as the sealing material 16, a material in which a spacer such as glass fiber is mixed in order to obtain a desired cell interval may be used. The wiring 17 is for applying a voltage having a predetermined waveform between the transparent electrodes 12a and 12b, and a flexible wiring or the like can be used.

以下、透過光量可変素子10の作用について図1を用いて説明する。液晶15に電圧を印加することでZ軸方向に進行する光の屈折率を実効的に変化させることができる。第1の多層膜部材13の屈折率nと凹部に含まれる単層光学部材14と液晶15との実効的な平均屈折率とを実質的に等しくすると、回折格子に入射する光は回折することなく透過し、高い透過率を得ることができる。これに対して、印加する電圧の大きさを変化させて第1の多層膜部材13の屈折率nと凹部に含まれる単層光学部材14と液晶15との実効的な屈折率とを異ならせると、回折格子に入射する光は光路長差を生じるため、回折が生じ透過率が小さくなる。印加する電圧を調整してこの光路長差がλ/2になると回折効率が最大となり、透過率がほぼ「0」となる遮光状態を実現できる。以下、印加する電圧の値をV(変数)として説明する。 Hereinafter, the operation of the transmitted light amount variable element 10 will be described with reference to FIG. By applying a voltage to the liquid crystal 15, the refractive index of light traveling in the Z-axis direction can be effectively changed. When substantially equal to the effective average refractive index of the single layer optical member 14 and the liquid crystal 15 included in the refractive index n m and the recess of the first multilayer film member 13, light incident on the diffraction grating diffracts Can be transmitted without any problem and high transmittance can be obtained. In contrast, different from the single-layer optical member 14 included in the refractive index n m and the recess of the first multilayer film member 13 by changing the magnitude of the voltage applied and the effective refractive index of the liquid crystal 15 In this case, the light incident on the diffraction grating causes an optical path length difference, so that diffraction occurs and the transmittance is reduced. When the applied voltage is adjusted and the optical path length difference becomes λ / 2, the diffraction efficiency becomes maximum, and a light-shielding state in which the transmittance is almost “0” can be realized. Hereinafter, the value of the voltage to be applied will be described as V (variable).

以下、説明を簡単にするため、透過光量可変素子10に入射する光は、液晶分子の長軸方向に一致する第1の多層膜部材13の長手方向となるY軸方向に直線偏光し、かつ、電圧非印加時に液晶分子は、基板11a、11bにほぼ平行であるとする。また、印加電圧が充分に大きな値Vのとき、液晶分子の長軸方向は、基板11a、11bにほぼ垂直(Z軸にほぼ平行)になるとする。このようにすると、Z軸方向で入射する光に対して液晶15の実効的な屈折率は、電圧印加時(V=V)にはnとなり、電圧非印加時(V=0)にはnとなる。したがって、凹部に含まれる単層光学部材14と液晶15からなる平均屈折率も電圧印加時(V=V)にはno_avrとなり、電圧非印加時(V=0)にはne_avrとなる。 Hereinafter, for the sake of simplicity, the light incident on the transmitted light amount variable element 10 is linearly polarized in the Y-axis direction that is the longitudinal direction of the first multilayer film member 13 that coincides with the long-axis direction of the liquid crystal molecules, and The liquid crystal molecules are assumed to be substantially parallel to the substrates 11a and 11b when no voltage is applied. Further, when the applied voltage is sufficiently large value V o, the long axis direction of liquid crystal molecules, and become (substantially parallel to the Z-axis) substantially perpendicular substrate 11a, to 11b. In this way, the effective refractive index of the liquid crystal 15 with respect to light incident at the Z-axis direction, n o becomes the applied voltage (V = V o), when voltage is applied (V = 0) Becomes ne . Thus, the n E_avr the average refractive index of a single layer optical member 14 and the liquid crystal 15 contained in the recess when the voltage is applied (V = V o) to the n O_avr next, when no voltage is applied (V = 0) .

第1の多層膜部材13の実効的な屈折率nと凹部の平均常光屈折率no_avrとを実質的に等しくして電圧印加時(V=V)の透過率を高く設計する。一方、印加電圧を徐々に低下させるとそれに合わせて液晶分子の長軸方向が透明基板に対して水平方向に近づくので、凹部の平均屈折率が大きくなって平均異常光屈折率ne_avrに近づく。このとき、nとne_avrとの屈折率差によって回折格子に入射する光の光路差が発生し、回折が生じるため透過率は小さくなる。さらに印加電圧を低下させて電圧を非印加(V=0)にすると、この光路長差が入射する光の波長λに対して|ne_avr−n|・d=λ/2となる設計において回折効率が最大かつ、透過率がほぼ「0」となる遮光状態となる。 A first multilayer film member 13 effective average ordinary refractive index n O_avr refractive index n m and the recess of substantially equally high design the transmittance when a voltage is applied (V = V o). On the other hand, when the applied voltage is gradually lowered, the major axis direction of the liquid crystal molecules approaches the horizontal direction with respect to the transparent substrate accordingly, so that the average refractive index of the concave portion increases and approaches the average extraordinary light refractive index ne_avr . In this case, the optical path difference of the light occurs incident to the diffraction grating by the refractive index difference between n m and n E_avr, transmittance since diffraction occurs is reduced. When the applied voltage is further decreased to make the voltage non-applied (V = 0), the optical path length difference becomes | ne_avr− n m | · d = λ / 2 with respect to the wavelength λ of the incident light. A light shielding state is achieved in which the diffraction efficiency is maximum and the transmittance is substantially “0”.

上記では、電圧非印加時(V=0)に液晶分子の長軸方向が基板に対して平行となる構成を例にしたが、電圧非印加時(V=0)に液晶分子の長軸方向が基板に対してほぼ垂直となり、充分に高い印加電圧(V=V)で液晶分子が基板に対して平行になるような誘電異方性(Δε)が負の液晶を用いることもできる。この場合、電圧非印加時に高い透過率を得ることができるので、何らかの原因で電圧を印加できない故障時にも高い透過率を保持し、故障時に光が遮光されるのを防止することができる。 In the above example, the major axis direction of the liquid crystal molecules is parallel to the substrate when no voltage is applied (V = 0), but the major axis direction of the liquid crystal molecules is not applied when the voltage is not applied (V = 0). It is also possible to use a liquid crystal having a negative dielectric anisotropy (Δε) so that the liquid crystal molecules are parallel to the substrate with a sufficiently high applied voltage (V = V o ) at a substantially perpendicular voltage to the substrate. In this case, since a high transmittance can be obtained when no voltage is applied, a high transmittance can be maintained even in the event of failure where voltage cannot be applied for some reason, and light can be prevented from being blocked during the failure.

(第2の実施の態様)
図2は、本発明の第2の実施の形態に係る透過光量可変素子の模式的な構成を示す断面図であり、第1の実施の形態に係る構成と同様の部材は図1と同じ符号を付している。第1の実施の形態には、凹部に光学媒質として単層光学部材14を設けたが、第2の実施の形態では、光学媒質として凹部に第2の多層膜部材24を設けたものである。他の構成、機能は同じものであり、第2の多層膜部材24は少なくとも2種類以上の光学部材を積層した構造である。多層膜部材24は液晶15の常光屈折率nに比べて高い屈折率となるように光学部材および膜厚を設計することで第1の多層膜部材13の屈折率に対して実質的に一致するように設計することができる。また、多層膜構造により内部干渉を抑制して最大となる透過率を高く、コントラストの向上を実現できるものである。
(Second Embodiment)
FIG. 2 is a cross-sectional view showing a schematic configuration of the transmitted light amount variable element according to the second embodiment of the present invention, and the same members as those in the configuration according to the first embodiment are denoted by the same reference numerals as in FIG. Is attached. In the first embodiment, the single-layer optical member 14 is provided as an optical medium in the recess, but in the second embodiment, the second multilayer film member 24 is provided in the recess as the optical medium. . Other configurations and functions are the same, and the second multilayer film member 24 has a structure in which at least two kinds of optical members are laminated. Multilayer film member 24 is substantially coincident with respect to the refractive index of the first multilayer film member 13 by designing the optical member and the film thickness so that the high refractive index as compared with the ordinary refractive index n o of the liquid crystal 15 Can be designed to In addition, the multilayer film structure can suppress internal interference, increase the maximum transmittance, and improve the contrast.

第2の多層膜部材24は、複数の光学薄膜から構成されるので、光学薄膜の組み合わせおよび膜厚を調整することで屈折率を調整できる。したがって、凹部の平均常光屈折率と第1の多層膜部材13の屈折率とを波長分散特性も含めて微調整することができるので、透過率の制御性が向上し好ましい。第2の多層膜24は2種類以上の屈折率の異なる材料によって構成することができるが、2種類の材料で構成されていると生産性の点からも好ましい。光学部材としては、Ta、SiO、CeO、HfO、SnOなどがあるが、膜の安定性の点からTaおよびSiOで構成することが好ましい。 Since the second multilayer film member 24 is composed of a plurality of optical thin films, the refractive index can be adjusted by adjusting the combination and film thickness of the optical thin films. Therefore, the average ordinary light refractive index of the concave portion and the refractive index of the first multilayer film member 13 can be finely adjusted including the wavelength dispersion characteristics, which is preferable because the controllability of the transmittance is improved. The second multilayer film 24 can be composed of two or more types of materials having different refractive indexes. However, it is preferable that the second multilayer film 24 is composed of two types of materials from the viewpoint of productivity. Examples of the optical member include Ta 2 O 5 , SiO 2 , CeO 2 , HfO 2 , SnO 2, etc., but it is preferable to use Ta 2 O 5 and SiO 2 from the viewpoint of film stability.

表2は、第2の多層膜部材24の光学薄膜の材料、層構造を説明するための一例の表である。   Table 2 is an example of a table for explaining the material and layer structure of the optical thin film of the second multilayer film member 24.

Figure 0004952415
Figure 0004952415

第2の多層膜部材24を設けた透過光量可変素子20の作用について図2を用いて説明する。作用としては第1の実施の形態と同様であり、凹部の光学媒質である第2の多層膜部材24の屈折率と液晶15の常光屈折率nとの平均常光屈折率no_avrが、第1の多層膜部材13の屈折率nと実質的に等しくなるように設計する。さらに第2の多層膜部材24の屈折率と液晶15の異常光屈折率nとの平均異常光屈折率ne_avrと、多層格子部材13の屈折率mとの差が、入射する光の波長λ、第1の多層膜部材13の高さをdとしたときに、|ne_avr−n|・d=λ/2となるようにする。このような設計の下では、液晶15に印加する電圧によって制御よく入射光の透過率を調整できる。 The operation of the transmitted light amount variable element 20 provided with the second multilayer film member 24 will be described with reference to FIG. The effect is similar to the first embodiment, the average ordinary refractive index n O_avr the ordinary refractive index n o of the refractive index of the liquid crystal 15 of the second multilayer film member 24 is an optical medium of the recess is, the designing 1 of the multilayer film member 13 refractive index n m and such that substantially equal to. Furthermore refractive index and the average extraordinary refractive index n E_avr the extraordinary refractive index n e of the liquid crystal 15 of the second multilayer film member 24, the difference between the refractive index m n of multilayered grid members 13, the incident light When the wavelength λ and the height of the first multilayer film member 13 are d, | ne_avr− n m | · d = λ / 2. Under such a design, the transmittance of incident light can be adjusted with good control by the voltage applied to the liquid crystal 15.

(第3の実施の態様)
図3は、本発明の第3の実施の形態に係る透過光量可変素子の模式的な構成を示す断面図である。これは、第1の実施の形態に係る構成の透過光量可変素子を透明基板11aの裏面側にも同構成を施したものであるが、第1の多層膜部材13と同じ光学薄膜構成となる第1の多層膜部材23の格子の長手方向が互いに直交して配置されている点が異なる。図示しない液晶15、25の配向方向はそれぞれ第1の多層膜部材13、23の長手方向に平行となるよう処理をする。
(Third embodiment)
FIG. 3 is a cross-sectional view showing a schematic configuration of a transmitted light amount variable element according to the third embodiment of the present invention. In this configuration, the transmitted light amount variable element having the configuration according to the first embodiment is also provided on the back side of the transparent substrate 11a, but has the same optical thin film configuration as the first multilayer film member 13. The difference is that the longitudinal directions of the lattices of the first multilayer film member 23 are arranged orthogonal to each other. Processing is performed so that the alignment directions of liquid crystals 15 and 25 (not shown) are parallel to the longitudinal directions of the first multilayer members 13 and 23, respectively.

第1および第2の実施の形態に係る透過光量可変素子10、20は、入射する直線偏光の光の方向は回折格子の長手方向、つまりY軸方向に平行な偏光状態において機能するものである。第3の実施の形態に係る透過光量可変素子30は、ランダムな偏光方向の光が入射してもX軸成分の光、Y軸成分の光のいずれにおいても透過光量を制御することができるものである。図3は第3の実施の形態に係る構成の一例であり、偏光方向に限らずランダム偏光に対して透過光量を制御する他の構成として、第1の多層膜部材23の長手方向が第1の多層膜部材13と同様にY軸に平行であるが、液晶25の配向方向がX方向である場合である。このように第3の実施の形態に係る透過光量可変素子30は、例えば、DMD投射型表示装置等のランダムに偏光している光を変調して投射する装置において配置すると有用である。   The transmitted light amount variable elements 10 and 20 according to the first and second embodiments function in a polarization state in which the direction of incident linearly polarized light is parallel to the longitudinal direction of the diffraction grating, that is, the Y-axis direction. . The transmitted light amount variable element 30 according to the third embodiment can control the transmitted light amount in both X-axis component light and Y-axis component light even when light having a random polarization direction is incident. It is. FIG. 3 shows an example of a configuration according to the third embodiment. As another configuration for controlling the amount of transmitted light with respect to random polarization as well as the polarization direction, the longitudinal direction of the first multilayer film member 23 is the first. This is a case where the alignment direction of the liquid crystal 25 is the X direction although it is parallel to the Y axis as in the multilayer film member 13. Thus, it is useful to arrange the transmitted light amount variable element 30 according to the third embodiment in a device that modulates and projects randomly polarized light, such as a DMD projection display device.

以下に、実施例を挙げて本発明をより具体的に説明する。   Hereinafter, the present invention will be described more specifically with reference to examples.

(実施例1)
以下、本発明の実施例1に係る透過光量可変素子10について図1を用いて説明する。透明基板11a、11bとして、厚さ0.6mmの石英ガラス基板を用いる。透明基板11a、11bの表面にスパッタ法を用いて、300Ω/□程度のシート抵抗となるITO膜を成膜し、フォトリソグラフィ技術およびエッチング技術により透明電極12a、12bを形成する。
Example 1
Hereinafter, the transmitted light amount variable element 10 according to the first embodiment of the present invention will be described with reference to FIG. A quartz glass substrate having a thickness of 0.6 mm is used as the transparent substrates 11a and 11b. An ITO film having a sheet resistance of about 300Ω / □ is formed on the surfaces of the transparent substrates 11a and 11b by sputtering, and the transparent electrodes 12a and 12b are formed by a photolithography technique and an etching technique.

透明電極を形成した基板を洗浄、乾燥後、スパッタ法を用いて、透明基板11aの透明電極12aが形成された面上に、表1に示す層構造および膜厚となるようにSiO膜とTa膜を交互に成膜して多層膜を形成する。各膜の形成にはイオンプレーティング法によりプラズマを発生させた雰囲気中で実施する。表1で、奇数層(例えばL19層)の屈折率1.46に相当する光学薄膜がSiOであり、偶数層(例えばL18層)の屈折率2.20に相当する光学薄膜がTaである。この多層膜に対して、フォトリソグラフィ技術と、多層膜構造を離隔させるようにエッチング加工を実施して周期ピッチが6μmの回折格子となる第1の多層膜部材13を形成する。 After cleaning and drying the substrate on which the transparent electrode is formed, a sputtering method is used to form a SiO 2 film on the surface of the transparent substrate 11a on which the transparent electrode 12a is formed so as to have the layer structure and film thickness shown in Table 1. A Ta 2 O 5 film is alternately formed to form a multilayer film. Each film is formed in an atmosphere in which plasma is generated by an ion plating method. In Table 1, the optical thin film corresponding to the refractive index of 1.46 of the odd layer (for example, L19 layer) is SiO 2 , and the optical thin film corresponding to the refractive index of 2.20 of the even layer (for example, L18 layer) is Ta 2 O. 5 . Etching is performed on the multilayer film so that the multilayer film structure is separated from the photolithography technique, thereby forming a first multilayer film member 13 that becomes a diffraction grating having a periodic pitch of 6 μm.

エッチング加工後、真空蒸着によってTa膜を190nm形成し、リフトオフ工程によって凸部上のTa膜を除去する。これにより、凹部に単層光学部材14に相当する膜厚190nmのTa膜が形成される。透明基板11a、11bの対向させる面上に図示しない配向膜材料としてポリイミドをフレキソ印刷法により厚さ50nm形成する。その後、ポリイミドの膜に回折格子の長手方向であるY方向に平行にラビングするにより配向処理を施す。 After etching, the the Ta 2 O 5 film was 190nm formed by vacuum evaporation, to remove the Ta 2 O 5 film on the convex portions by a lift-off process. Thereby, a Ta 2 O 5 film having a film thickness of 190 nm corresponding to the single-layer optical member 14 is formed in the recess. Polyimide is formed to a thickness of 50 nm as an alignment film material (not shown) on the opposing surfaces of the transparent substrates 11a and 11b by flexographic printing. Thereafter, the polyimide film is rubbed in parallel with the Y direction, which is the longitudinal direction of the diffraction grating, to perform an alignment treatment.

次に、エポキシ樹脂からなるシール材16を透明基板11bの対向させる面上に印刷し、熱圧着により液晶セルを作製する。ここで、シール材16中に図示しないガラスファイバを混ぜて、セルギャップを均一化する。続いて、真空注入法を用いて、低分子液晶を2枚の透明基板間の空隙となる液晶セルに注入し、図示しない封止材を用いて液晶セルの注入口を封止する。ここでは、589nmの光に対する常光屈折率nが1.52、異常光屈折率nが1.65の屈折率異方性を有する液晶を使用する。次に、配線17であるフレキシブル回路基板を透明電極12a、12bと電気的に導通するように設ける。配線17としてフレキシブル回路基板を介して、遮光量を制御するための電気信号が透明電極12a、12bに入力される。 Next, the sealing material 16 made of an epoxy resin is printed on the surface facing the transparent substrate 11b, and a liquid crystal cell is manufactured by thermocompression bonding. Here, a glass fiber (not shown) is mixed in the sealing material 16 to make the cell gap uniform. Subsequently, a low-molecular liquid crystal is injected into a liquid crystal cell serving as a gap between two transparent substrates using a vacuum injection method, and an injection port of the liquid crystal cell is sealed using a sealing material (not shown). Here, the ordinary refractive index n o for 589nm light of 1.52, the extraordinary refractive index n e uses a liquid crystal having a refractive index anisotropy of 1.65. Next, the flexible circuit board which is the wiring 17 is provided so as to be electrically connected to the transparent electrodes 12a and 12b. An electrical signal for controlling the amount of light shielding is input to the transparent electrodes 12a and 12b via the flexible circuit board as the wiring 17.

上記のように作製された透過光量可変素子10にY方向に平行な直線偏光の光をZ軸に平行に入射すると、液晶15に対し電圧非印加時には、第1の多層膜部材13の屈折率と、単層光学部材であるTaの屈折率と液晶の異常光屈折率との平均屈折率である平均異常光屈折率との差により回折作用が生じる。一方、液晶15に電界がZ軸方向に平行になるように電圧を印加すると、電圧の大きさに応じて液晶分子の長軸方向のチルト角が変化する。すると、Y方向に平行な偏光方向の光に対する実効的な屈折率が変化し、入射する光の回折効率も同様に変化する。これより、光の進行方向であるZ軸方向に透過する光の透過率が変化し、印加電圧によって制御可能な透過光量可変素子10を実現することができる。 When linearly polarized light parallel to the Y direction is incident on the transmitted light amount variable element 10 manufactured as described above in parallel to the Z axis, the refractive index of the first multilayer film member 13 is applied when no voltage is applied to the liquid crystal 15. And a difference in the average extraordinary refractive index, which is the average refractive index between the refractive index of Ta 2 O 5 that is a single-layer optical member and the extraordinary refractive index of the liquid crystal, causes a diffraction effect. On the other hand, when a voltage is applied to the liquid crystal 15 so that the electric field is parallel to the Z-axis direction, the tilt angle in the major axis direction of the liquid crystal molecules changes according to the magnitude of the voltage. Then, the effective refractive index for the light in the polarization direction parallel to the Y direction changes, and the diffraction efficiency of the incident light also changes. As a result, the transmittance of light transmitted in the Z-axis direction, which is the light traveling direction, changes, and the transmitted light amount variable element 10 that can be controlled by the applied voltage can be realized.

図8は、上記で作製された透過光量可変素子10に、回折格子のY軸に平行な直線偏光の光を入射した場合の透過率の波長依存性を示すものである。6つの曲線は、透明電極12a、12b間に印加する電圧の大きさを変え、液晶の実効的な屈折率を変えたときの透過率の波長依存性を示す。図8に示す曲線は、波長650nmの光に対して透過率が低い方から順に、液晶の実効的な屈折率nが1.64、1.62、1.60、1.58、1.56および1.52となるように電圧が印加されている。   FIG. 8 shows the wavelength dependency of the transmittance when linearly polarized light parallel to the Y axis of the diffraction grating is incident on the transmitted light quantity variable element 10 manufactured as described above. The six curves show the wavelength dependence of the transmittance when the magnitude of the voltage applied between the transparent electrodes 12a and 12b is changed and the effective refractive index of the liquid crystal is changed. The curves shown in FIG. 8 indicate that the effective refractive index n of the liquid crystal is 1.64, 1.62, 1.60, 1.58, 1.56 in order from the lowest transmittance with respect to light having a wavelength of 650 nm. And a voltage of 1.52 is applied.

このように、透過率が液晶の実効的な屈折率(印加電圧)に応じて変化し、可視光領域である460〜660nmの波長帯域において透過率の変動が20%以内となる略一定の特性を示す透過光量可変素子10が得られる。   Thus, the transmittance changes according to the effective refractive index (applied voltage) of the liquid crystal, and the transmittance variation is within 20% in the wavelength range of 460 to 660 nm that is the visible light region. The transmitted light amount variable element 10 is obtained.

(実施例2)
以下、本発明の実施例2に係る透過光量可変素子20について図2を用いて説明する。実施例1において凹部の光学媒質としての単層光学部材14の代わりに第2の多層膜部材24とし、格子ピッチを4μmとする点が異なるが、それ以外の構成は同じであり、使用する他の部材も実施例1に示すものと同一である。透明電極12aを成膜した基板を洗浄、乾燥後、スパッタ法を用いて、透明基板11aの透明電極12aが形成された面上に、表1に示す層構造および膜厚となるようにSiO膜とTa膜とを交互に成膜して多層膜を形成する。この多層膜に対して、フォトリソグラフィ技術と、多層膜構造を離隔させるようにエッチング加工を実施して周期ピッチが4μmの回折格子を形成する。エッチング加工後、真空蒸着によって表2に示す層構造および膜厚となるようにSiO膜とTa膜とを交互に成膜して第2の多層膜部材24を形成する。その後、リフトオフ工程によって凸部上のSiO膜とTa膜とを除去する。これにより、凹部に第2の多層膜部材24に相当する膜厚257nmの膜が形成される。
(Example 2)
Hereinafter, the transmitted light amount variable element 20 according to the second embodiment of the present invention will be described with reference to FIG. In Example 1, the second multilayer film member 24 is used in place of the single-layer optical member 14 as the optical medium of the concave portion, and the lattice pitch is 4 μm. These members are also the same as those shown in the first embodiment. The substrate on which the transparent electrode 12a is formed is washed, dried, and then sputtered to form SiO 2 so as to have the layer structure and film thickness shown in Table 1 on the surface of the transparent substrate 11a on which the transparent electrode 12a is formed. Films and Ta 2 O 5 films are alternately formed to form a multilayer film. Etching is performed on the multilayer film so as to separate the multilayer film structure from the photolithography technique, thereby forming a diffraction grating having a periodic pitch of 4 μm. After the etching process, the second multilayer film member 24 is formed by alternately depositing SiO 2 films and Ta 2 O 5 films so as to have the layer structure and film thickness shown in Table 2 by vacuum deposition. Thereafter, the SiO 2 film and the Ta 2 O 5 film on the convex portion are removed by a lift-off process. As a result, a film having a film thickness of 257 nm corresponding to the second multilayer film member 24 is formed in the recess.

図示しないポリイミドによる配向膜を形成し、エポキシ樹脂からなるシール材16を透明基板11bの対向させる面上に印刷し、熱圧着により液晶セルを作製する。ここで、シール材16中に図示しないガラスファイバを混ぜて、セルギャップを均一化する。続いて、真空注入法を用いて、低分子液晶を2枚の透明基板間の空隙となる液晶セルに注入し、図示しない封止材を用いて液晶セルの注入口を封止する。透明電極12a、12bには配線17に相当するフレキシブル回路基板を経由して遮光量を制御するための電気信号を入力する。   An alignment film made of polyimide (not shown) is formed, and a sealing material 16 made of an epoxy resin is printed on the facing surface of the transparent substrate 11b, and a liquid crystal cell is manufactured by thermocompression bonding. Here, a glass fiber (not shown) is mixed in the sealing material 16 to make the cell gap uniform. Subsequently, a low-molecular liquid crystal is injected into a liquid crystal cell serving as a gap between two transparent substrates using a vacuum injection method, and an injection port of the liquid crystal cell is sealed using a sealing material (not shown). An electric signal for controlling the light shielding amount is input to the transparent electrodes 12a and 12b via a flexible circuit board corresponding to the wiring 17.

図9は、上記で作製された透過光量可変素子20に、回折格子のY軸に平行な直線偏光の光を入射したときの透過率の波長依存性を示すものである。6つの曲線は、透明電極12a、12b間に印加する電圧の大きさを変え、液晶の実効的な屈折率を変えたときの透過率の波長依存性を示。図9に示す曲線は、波長650nmの光に対して透過率が低い方から順に、液晶の実効的な屈折率が1.64、1.62、1.60、1.58、1.56および1.52となるように電圧が印加されている。   FIG. 9 shows the wavelength dependency of the transmittance when linearly polarized light parallel to the Y-axis of the diffraction grating is incident on the transmission light amount variable element 20 manufactured as described above. The six curves show the wavelength dependence of the transmittance when the magnitude of the voltage applied between the transparent electrodes 12a and 12b is changed and the effective refractive index of the liquid crystal is changed. The curves shown in FIG. 9 indicate that the effective refractive index of the liquid crystal is 1.64, 1.62, 1.60, 1.58, 1.56, and the like in order from the lowest transmittance with respect to light having a wavelength of 650 nm. A voltage is applied so as to be 1.52.

このように、透過率が液晶の実効的な屈折率(印加電圧)に応じて変化し、可視光領域である460〜660nmの波長帯域において透過率の変動が20%以内となる略一定の特性を示す透過光量可変素子20が得られる。   Thus, the transmittance changes according to the effective refractive index (applied voltage) of the liquid crystal, and the transmittance variation is within 20% in the wavelength range of 460 to 660 nm that is the visible light region. Is obtained.

(比較例)
図4に比較例として、回折格子の凹部には膜を形成せずに液晶15のみが充填されている構成である透過光量可変素子30を示す。第1の多層膜部材13には表1の光学薄膜の材料および膜厚に設定し、液晶15も実施例1および実施例2と同じ物性の材料を用いるものである。
(Comparative example)
As a comparative example, FIG. 4 shows a transmitted light amount variable element 30 having a configuration in which only the liquid crystal 15 is filled without forming a film in the concave portion of the diffraction grating. The first multilayer film member 13 is set to the material and film thickness of the optical thin film shown in Table 1, and the liquid crystal 15 is also made of a material having the same physical properties as those in the first and second embodiments.

図10は、上記で作製された透過光量可変素子30に、回折格子のY軸に平行な直線偏光の光を入射したときの透過率の波長依存性を示すものである。6つの曲線は、透明電極12a、12b間に印加する電圧の大きさを変え、液晶の実効的な屈折率を変えたときの透過率の波長依存性を示。図10に示す曲線は、波長650nmの光に対して透過率が低い方から順に、液晶の実効的な屈折率が1.64、1.62、1.60、1.52、1.58および1.56となるように電圧が印加されている。   FIG. 10 shows the wavelength dependence of the transmittance when linearly polarized light parallel to the Y axis of the diffraction grating is incident on the transmission light amount variable element 30 manufactured as described above. The six curves show the wavelength dependence of the transmittance when the magnitude of the voltage applied between the transparent electrodes 12a and 12b is changed and the effective refractive index of the liquid crystal is changed. The curves shown in FIG. 10 indicate that the effective refractive index of the liquid crystal is 1.64, 1.62, 1.60, 1.52, 1.58 in order from the lowest transmittance to light having a wavelength of 650 nm. A voltage is applied so as to be 1.56.

このように、透過率が液晶の実効的な屈折率(印加電圧)に応じて変化するが、可視光領域である460〜660nmの波長帯域において屈折率が1.52における透過光が波長によって一定になっておらず、電圧を印加して液晶15がほぼ常光屈折率nとなったときに透過率の制御が困難な特性となる。実施例1および実施例2では常光屈折率nとなるときの電圧(V=V)以上では最大透過率となるように安定しているのに対し、比較例ではV=V以上では透過率が一定とならないので、最大透過率となるようにするために、電圧の微調整が必要となる。 As described above, the transmittance varies depending on the effective refractive index (applied voltage) of the liquid crystal, but the transmitted light having a refractive index of 1.52 is constant depending on the wavelength in the wavelength range of 460 to 660 nm that is the visible light region. not turned in, the control of the transmittance is difficult characteristics when the liquid crystal 15 by applying a voltage became almost ordinary refractive index n o. In Example 1 and Example 2, it is stable so that the maximum transmittance is obtained at a voltage (V = V o ) or higher when the ordinary refractive index is n o , whereas in the comparative example, at V = V o or more. Since the transmittance is not constant, fine adjustment of the voltage is necessary to obtain the maximum transmittance.

本発明に係る透過光量可変素子および投射型表示装置は、可視光の波長帯域において液晶に印加する電圧によって光の透過率を効率よく制御することができる。また、透過光量可変素子を構成する光学材料として加工性および信頼性に優れる材料を選択できるので、生産性が向上できかつ、信頼性の高い透過光量可変素子および投射型表示装置を実現できる。   The transmitted light amount variable element and the projection display device according to the present invention can efficiently control the light transmittance by the voltage applied to the liquid crystal in the visible light wavelength band. Moreover, since a material excellent in processability and reliability can be selected as the optical material constituting the transmitted light amount variable element, productivity can be improved and a highly reliable transmitted light amount variable element and a projection display device can be realized.

本発明の第1の実施態様における透過光量可変素子の構成を示す模式図。The schematic diagram which shows the structure of the transmitted light amount variable element in the 1st embodiment of this invention. 本発明の第2の実施態様における透過光量可変素子の構成を示す模式図。The schematic diagram which shows the structure of the transmitted light amount variable element in the 2nd embodiment of this invention. 本発明の第3の実施態様における透過光量可変素子の構成を示す模式図。The schematic diagram which shows the structure of the transmitted light amount variable element in the 3rd embodiment of this invention. 比較例における透過光量可変素子の構成を示す模式図。The schematic diagram which shows the structure of the transmitted light amount variable element in a comparative example. 本発明の実施の形態に係る透明電極を構成する分割電極の一例(略円形)を示す模式図。The schematic diagram which shows an example (substantially circular) of the division | segmentation electrode which comprises the transparent electrode which concerns on embodiment of this invention. 本発明の実施の形態に係る透明電極を構成する分割電極の他の一例(マイクロレンズ用)を示す模式図。The schematic diagram which shows another example (for microlenses) of the division | segmentation electrode which comprises the transparent electrode which concerns on embodiment of this invention. 本発明の実施の形態に係る液晶投射型表示装置の構成の一例を示す模式図。The schematic diagram which shows an example of a structure of the liquid crystal projection type display apparatus which concerns on embodiment of this invention. 本発明の実施例1における入射光の波長に対する透過率の特性図。The characteristic figure of the transmittance | permeability with respect to the wavelength of the incident light in Example 1 of this invention. 本発明の実施例2における入射光の波長に対する透過率の特性図。The characteristic figure of the transmittance | permeability with respect to the wavelength of the incident light in Example 2 of this invention. 比較例における入射光の波長に対する透過率の特性図。The characteristic figure of the transmittance | permeability with respect to the wavelength of the incident light in a comparative example.

符号の説明Explanation of symbols

1 光源
2 反射鏡
3 照明光学系
4 偏光子
5 液晶パネル
6 検光子
7 投射レンズ系
8、20、30、40 透過光量可変素子
11a、11b、21b 透明基板
12a、12b、22a、22b 透明電極
13、23 第1の多層膜部材
14 単層光学部材
15、25 液晶
16、26 シール材
17、27 配線
24 第2の多層膜部材
50 液晶投射型表示装置
111、112、113、121、122、123 透明電極
DESCRIPTION OF SYMBOLS 1 Light source 2 Reflecting mirror 3 Illumination optical system 4 Polarizer 5 Liquid crystal panel 6 Analyzer 7 Projection lens system 8, 20, 30, 40 Transmitted light quantity variable element 11a, 11b, 21b Transparent substrate 12a, 12b, 22a, 22b Transparent electrode 13 , 23 First multilayer film member 14 Single layer optical member 15, 25 Liquid crystal 16, 26 Sealing material 17, 27 Wiring 24 Second multilayer film member 50 Liquid crystal projection display device 111, 112, 113, 121, 122, 123 Transparent electrode

Claims (10)

平行に配置された少なくとも2枚の透明基板と、
前記透明基板の対向する一対の前記透明基板のいずれか一方の面に設けられ断面形状が周期的な凹凸状の回折格子の凸部を形成する第1の多層膜部材と、
前記回折格子の凹部の一部に設けられる光学媒質と、
一対の前記透明基板間に前記回折格子および前記光学媒質を埋めるように挟持された液晶と、
前記液晶に電圧を印加するための透明電極と、を備え、
前記第1の多層膜部材は、屈折率が異なる複数種の光学薄膜が基板と垂直方向に積層された多層構造を有し、
前記光学媒質の屈折率は、前記液晶の常光屈折率より高い透過光量可変素子。
At least two transparent substrates arranged in parallel;
Provided on one side one of the pair of the transparent substrate facing the transparent substrate, a first multilayer element cross-sectional shape to form a protrusion periodic uneven diffraction grating,
An optical medium provided in a part of the concave portion of the diffraction grating;
A liquid crystal sandwiched between the pair of transparent substrates so as to fill the diffraction grating and the optical medium;
A transparent electrode for applying a voltage to the liquid crystal,
The first multilayer film member has a multilayer structure in which a plurality of types of optical thin films having different refractive indexes are stacked in a direction perpendicular to the substrate,
The transmitted light amount variable element in which the refractive index of the optical medium is higher than the ordinary refractive index of the liquid crystal.
前記第1の多層膜部材は、第1の高屈折率材料と第1の低屈折率材料との2種類の光学材料から形成される請求項1に記載の透過光量可変素子。   2. The transmitted light amount variable element according to claim 1, wherein the first multilayer film member is formed of two types of optical materials, a first high refractive index material and a first low refractive index material. 前記第1の高屈折率材料がTaであり、前記第1の低屈折率材料がSiOである請求項2に記載の透過光量可変素子。 3. The transmitted light amount variable element according to claim 2 , wherein the first high refractive index material is Ta 2 O 5 and the first low refractive index material is SiO 2 . 前記光学媒質は、前記基板に垂直方向に積層された第2の多層膜部材から形成され、
前記第2の多層膜部材の平均屈折率は前記液晶の常光屈折率より高い屈折率を有する請求項1〜3いずれか1項に記載の透過光量可変素子。
The optical medium is formed from a second multilayer member laminated in a direction perpendicular to the substrate,
The transmitted light amount variable element according to any one of claims 1 to 3, wherein an average refractive index of the second multilayer film member has a refractive index higher than an ordinary refractive index of the liquid crystal.
前記第2の多層膜部材は、第2の高屈折率材料と第2の低屈折率材料との2種類の光学材料から形成される請求項4に記載の透過光量可変素子。   5. The transmitted light amount variable element according to claim 4, wherein the second multilayer film member is formed of two types of optical materials, a second high refractive index material and a second low refractive index material. 前記第2の高屈折率材料がTaであり、前記第2の低屈折率材料がSiOである請求項5に記載の透過光量可変素子。 6. The transmitted light amount variable element according to claim 5, wherein the second high refractive index material is Ta 2 O 5 and the second low refractive index material is SiO 2 . 平行に配置された前記透明基板を3枚とし、一対の前記透明基板に挟持された前記液晶の配向方向と、他の一対の前記透明基板に挟持された液晶の配向方向とが略直交となる請求項1〜6いずれか1項に記載の透過光量可変素子。   The number of the transparent substrates arranged in parallel is three, and the alignment direction of the liquid crystal sandwiched between the pair of transparent substrates and the alignment direction of the liquid crystal sandwiched between the other pair of transparent substrates are substantially orthogonal. The transmitted light amount variable element according to any one of claims 1 to 6. 前記透明電極が複数の領域に分割され、前記複数の領域ごと電圧を印加することができる請求項1〜7いずれか1項に記載の透過光量可変素子。 The transmitted light amount variable element according to claim 1, wherein the transparent electrode is divided into a plurality of regions, and a voltage can be applied to each of the plurality of regions. 前記回折格子の格子ピッチが10μm以下である請求項1〜8いずれか1項に記載の透過光量可変素子。   The transmitted light amount variable element according to claim 1, wherein a grating pitch of the diffraction grating is 10 μm or less. 所定の光源と、
入射光の映像信号に応じて変調して出射させる画像表示用空間変調素子と、
複数のレンズからなり、前記光源が出射した光を前記画像表示用空間光変調素子に集光照明する照明光学系と、
前記画像表示用空間変調素子から出射した光を投射する投射レンズ系と、
前記光源を出射した光が前記投射レンズ系を通過するまでの光路中に1つ以上配置された、請求項1〜いずれか1項に記載の透過光量可変素子と、を備えた投射型表示装置。
A predetermined light source;
A spatial light modulating element for image display that modulates and emits light according to a video signal of incident light;
An illumination optical system comprising a plurality of lenses and condensing and illuminating the light emitted from the light source on the spatial light modulation element for image display;
A projection lens system for projecting light emitted from the image display light spatial modulation element;
Light emitted from the light source is arranged at least one in the optical path to pass through the projection lens system, a projection display provided with a transmitted light quantity variable element according to any one of claims 1-9 apparatus.
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