JP4953784B2 - 半導体ウェーハ用のクランプ治具 - Google Patents
半導体ウェーハ用のクランプ治具 Download PDFInfo
- Publication number
- JP4953784B2 JP4953784B2 JP2006325097A JP2006325097A JP4953784B2 JP 4953784 B2 JP4953784 B2 JP 4953784B2 JP 2006325097 A JP2006325097 A JP 2006325097A JP 2006325097 A JP2006325097 A JP 2006325097A JP 4953784 B2 JP4953784 B2 JP 4953784B2
- Authority
- JP
- Japan
- Prior art keywords
- clamp
- semiconductor wafer
- plate
- robot
- thermoplastic resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004065 semiconductor Substances 0.000 title claims description 51
- 235000012431 wafers Nutrition 0.000 claims description 54
- 150000001875 compounds Chemical class 0.000 claims description 14
- 229920005992 thermoplastic resin Polymers 0.000 claims description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
- 230000002093 peripheral effect Effects 0.000 claims description 12
- 239000000835 fiber Substances 0.000 claims description 11
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 239000002216 antistatic agent Substances 0.000 claims description 5
- 239000002041 carbon nanotube Substances 0.000 claims description 5
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 5
- 229920000049 Carbon (fiber) Polymers 0.000 description 17
- 239000004917 carbon fiber Substances 0.000 description 17
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 16
- 239000002245 particle Substances 0.000 description 12
- 230000006870 function Effects 0.000 description 7
- 239000000945 filler Substances 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 239000004696 Poly ether ether ketone Substances 0.000 description 3
- VNWKTOKETHGBQD-YPZZEJLDSA-N carbane Chemical compound [10CH4] VNWKTOKETHGBQD-YPZZEJLDSA-N 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 229920002530 polyetherether ketone Polymers 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- -1 carbow whiskers Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000009993 protective function Effects 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- WSQZNZLOZXSBHA-UHFFFAOYSA-N 3,8-dioxabicyclo[8.2.2]tetradeca-1(12),10,13-triene-2,9-dione Chemical class O=C1OCCCCOC(=O)C2=CC=C1C=C2 WSQZNZLOZXSBHA-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000011553 magnetic fluid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manipulator (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
各クランプ部を、体積抵抗率が1.0×10 0 〜1.0×10 13 (Ω・cm)の熱可塑性樹脂コンパウンドにより射出成形し、熱可塑性樹脂コンパウンドに帯電防止付与材を含有するとともに、この帯電防止付与材には、繊維径0.5〜150nm、繊維長0.01〜2000μmのカーボンナノチューブを含有し、各クランプ部をダイヤモンドライクカーボンにより被覆したことを特徴としている。
2 先端部
3 末端部
4 最先端
5 クランプチップ(接触領域、クランプ部)
6 支持アーム(支持部材)
7 嵌合保持溝
10 ダイヤモンドライクカーボン
20 ロボット
21 胴体
22 アーム
W 半導体ウェーハ
Claims (1)
- ロボットのアームに、半導体ウェーハの径以上の長さを有する板を装着し、この板の先端部側を二股に形成してその一対の最先端には半導体ウェーハの周縁部をクランプするクランプ部をそれぞれ設け、板の両側部から前後方向に回転可能な支持部材をそれぞれ側方に伸ばして各支持部材の先端部には半導体ウェーハの周縁部をクランプするクランプ部を設けた半導体ウェーハ用のクランプ治具であって、
各クランプ部を、体積抵抗率が1.0×10 0 〜1.0×10 13 (Ω・cm)の熱可塑性樹脂コンパウンドにより射出成形し、熱可塑性樹脂コンパウンドに帯電防止付与材を含有するとともに、この帯電防止付与材には、繊維径0.5〜150nm、繊維長0.01〜2000μmのカーボンナノチューブを含有し、各クランプ部をダイヤモンドライクカーボンにより被覆したことを特徴とする半導体ウェーハ用のクランプ治具。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006325097A JP4953784B2 (ja) | 2006-12-01 | 2006-12-01 | 半導体ウェーハ用のクランプ治具 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006325097A JP4953784B2 (ja) | 2006-12-01 | 2006-12-01 | 半導体ウェーハ用のクランプ治具 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008140949A JP2008140949A (ja) | 2008-06-19 |
| JP4953784B2 true JP4953784B2 (ja) | 2012-06-13 |
Family
ID=39602119
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006325097A Expired - Fee Related JP4953784B2 (ja) | 2006-12-01 | 2006-12-01 | 半導体ウェーハ用のクランプ治具 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4953784B2 (ja) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010129674A (ja) * | 2008-11-26 | 2010-06-10 | Shin Etsu Polymer Co Ltd | 基板収納容器、クランプハンド、及び基板の取り出し方法 |
| KR101534357B1 (ko) | 2009-03-31 | 2015-07-06 | 도쿄엘렉트론가부시키가이샤 | 기판 지지 장치 및 기판 지지 방법 |
| JP2010239087A (ja) * | 2009-03-31 | 2010-10-21 | Tokyo Electron Ltd | 基板支持装置及び基板支持方法 |
| JP5083268B2 (ja) * | 2009-03-31 | 2012-11-28 | 東京エレクトロン株式会社 | 基板支持装置 |
| EP3312871B1 (de) | 2014-02-03 | 2024-09-25 | EV Group E. Thallner GmbH | Aufnahmeeinrichtung zur aufnahme eines substratstapels |
| JP6616194B2 (ja) | 2016-01-15 | 2019-12-04 | 日東電工株式会社 | 載置部材 |
| KR102197693B1 (ko) * | 2019-03-22 | 2020-12-31 | 주식회사 로보스타 | 디스플레이용 필름의 클램핑 장치 |
| CN113049854B (zh) * | 2021-03-04 | 2024-07-02 | 内蒙古电力(集团)有限责任公司内蒙古电力科学研究院分公司 | 一种多用高压试验线夹连接件 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0817895A (ja) * | 1994-06-30 | 1996-01-19 | Kokusai Electric Co Ltd | ウェーハ搬送プレート |
| JP2003285382A (ja) * | 2002-03-28 | 2003-10-07 | Dainippon Screen Mfg Co Ltd | 複合構造部材および該部材の製造方法 |
| JP2003341783A (ja) * | 2002-05-28 | 2003-12-03 | Fujitsu Ltd | 基板収納装置 |
| US20050256248A1 (en) * | 2002-09-26 | 2005-11-17 | Mitsushi Tada | Alicyclic structure containing polymer resin composition and formed article |
-
2006
- 2006-12-01 JP JP2006325097A patent/JP4953784B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008140949A (ja) | 2008-06-19 |
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