JP4978097B2 - Proximity exposure photomask and color filter manufacturing method - Google Patents

Description

  The present invention relates to a proximity exposure photomask that is used, for example, when forming a color filter for a liquid crystal display device, and a method for manufacturing a color filter using the proximity exposure photomask.

Conventionally, for forming a colored layer of a color filter of a liquid crystal display device, pattern exposure is performed on a photosensitive resin layer formed on a substrate, and the photosensitive resin layer is developed after the exposure, whereby a target pattern is obtained. A photolithography method is used. In photolithography, light is generally irradiated through a photomask. At this time, in order to prevent scratches caused by the photomask adhering to the object to be exposed, or in order to prevent defects from occurring when dust is attached to the photomask, the gap between the photomask and the object to be exposed is determined. In many cases, a gap is provided in the exposure, that is, proximity (proximity) exposure is performed. However, when such a gap is provided, there has been a problem that a fine pattern cannot be formed into a desired shape due to the Fresnel diffraction phenomenon or the like. For example, when exposure is performed using a proximity exposure photomask having a fine light-shielding portion 2 as shown in FIG. 10, the photosensitive resin in the region corresponding to the light-shielding portion 2 is exposed by diffracted light. Because it ends up. Therefore, when a negative resist is exposed using the photomask for proximity exposure, a hole having a shape corresponding to the light shielding portion cannot be formed, and when a positive resist is exposed. However, there is a problem that the convex member is formed in a pattern corresponding to the light shielding portion, and the height of the formed convex member cannot be made constant in the substrate.
In addition, the prior literature regarding this invention has not been discovered.

  Therefore, it is desired to provide a proximity exposure photomask capable of forming a fine pattern by proximity exposure and a method of manufacturing a color filter using the proximity exposure photomask.

  The present invention provides a transparent substrate, a substantially regular polygonal or substantially circular light-shielding portion formed on the transparent substrate, and the light-shielding portion formed on the transparent substrate with a gap from the light-shielding portion. Provided is a photomask for proximity exposure, characterized by having an auxiliary light shielding part concentric with the light shielding part.

  According to the present invention, since the auxiliary light-shielding part is formed, even when the light-shielding part pattern is fine, the diffracted light into the light-shielding part region can be reduced. Further, interference of diffracted light can be prevented. Therefore, the photosensitive resin can be exposed and patterned with high definition in the same pattern as the light shielding portion.

  In the said invention, it is preferable that the diameter of the said light-shielding part is 16 micrometers or less. This is because the light shielding portion having such a size is generally susceptible to diffracted light.

  In addition, the present invention provides a method for producing a color filter, characterized by having a colored layer forming step of forming a colored layer having a hole corresponding to the light shielding portion, using the proximity exposure photomask. According to the present invention, since the photomask for proximity exposure is used, a colored layer having holes in a high-definition pattern can be easily formed.

  Furthermore, the present invention provides a method for producing a color filter, characterized by having a liquid crystal alignment control protrusion forming step of forming a liquid crystal alignment control protrusion corresponding to the light shielding portion using the proximity exposure photomask. provide. According to the present invention, since the photomask for proximity exposure is used, the liquid crystal alignment control protrusion can be easily formed in a high-definition pattern shape and a target height.

  According to the present invention, even when the light-shielding portion has a fine pattern, it is possible to sensitize a photosensitive resin to a target pattern and to form a photomask for proximity exposure that can be patterned. it can.

  The present invention relates to a proximity exposure photomask that is used, for example, when forming a color filter for a liquid crystal display device, and a method for manufacturing a color filter using the proximity exposure photomask. Each will be described below.

A. Proximity Exposure Photomask First, the proximity exposure photomask of the present invention will be described. The proximity exposure photomask of the present invention includes a transparent substrate, a substantially regular polygonal or substantially circular light shielding part formed on the transparent substrate, and the light shielding part and a gap outside the light shielding part on the transparent substrate. It has an auxiliary light-shielding part concentric with the light-shielding part formed with a gap.

  The photomask for proximity exposure of the present invention includes, for example, as shown in FIG. 1, a transparent substrate 1, a light shielding portion 2 formed on the transparent substrate 1, and the light shielding portion on the outside of the light shielding portion 2. 2 and an auxiliary light-shielding portion 3 formed with a gap. The light shielding part 2 and the auxiliary light shielding part 3 are concentric. Here, the center of the auxiliary light shielding part being concentric with the center of the light shielding part means that the center of the auxiliary light shielding part is within a circle having a radius of 3 μm from the center of the light shielding part. In addition, the substantially circular shape referred to in the present invention is a circular shape, an oval shape having a maximum diameter in the range of 0.8 to 1.2 when the minimum diameter is 1, or a part of a circle is a straight line or a curve. A cut shape, or a shape obtained by cutting a part of the ellipse with a straight line or a curve. In addition, a substantially regular polygon means that the length of the longest straight line is 0.8 to 1.2 when the length of the shortest straight line among the straight lines drawn from each corner so as to pass through the center is 1. Let's say a polygon that falls within the range.

When the photosensitive resin layer is patterned using the proximity exposure photomask of the present invention, the pattern corresponding to the auxiliary light shielding portion is not resolved, and only the pattern corresponding to the shape of the light shielding portion is formed. The

According to the present invention, since the auxiliary light-shielding part is provided, the diffracted light to the light-shielding part region can be reduced when proximity exposure is performed, and the diffracted light near the center part of the light-shielding part. Can be prevented from interfering with each other. The reason for this will be described with reference to a simulation of light intensity distribution in exposure using a photomask for proximity exposure. In the simulation of the light intensity distribution, the amplitude E _P of the light at the point P on the substrate is expressed by the following formula (1) based on general Fresnel diffraction, and the opening (exposure) of the corresponding proximity exposure photomask. It is obtained by calculation as an integral value of spherical waves from each point of the light transmission region), and further, the light intensity I at the point P can be obtained by calculation according to the following formula (2).

  FIG. 2 is a diagram for explaining the calculation of the light intensity distribution at the point P on the substrate 52 by the following formula (1), and an arbitrary point Q at the opening of the proximity exposure photomask 11; 5 is a schematic diagram showing a positional relationship with an arbitrary point P on a substrate 52. FIG. In FIG. 2, a point S is a position on the substrate 52 when the exposure light 53 that has passed the point Q travels straight.

Here, in Equation (1), k = 2π / λ, E _P is the amplitude of light at point P on the substrate, A is a constant determined by the intensity of incident light, λ is the wavelength of incident light, and δ is a line The angle formed by the minute QS and the line QP, r is the distance from the point Q to the point P, and i is an imaginary unit.

I = E _P × E _P ^* (2)
Here, in Equation (2), E _P ^* is a conjugate complex number of E _P.

  The above calculation is performed by a computer by dividing the opening of the proximity exposure photomask into finite minute sections.

  For example, as shown in FIG. 10, when a general proximity exposure photomask having an auxiliary light shielding part having a circular light shielding part 2 with a radius of 5 μm is used, and a circle with a radius of 4 μm as shown in FIG. And a case where the photomask for proximity exposure of the present invention having the auxiliary light-shielding part 3 formed in a ring shape with a width of 1 μm with a gap of 1 μm outside the light-shielding part 2 is provided. FIG. 3 shows the results obtained by simulation of the relationship between the distance from the center of the light shielding portion and the relative light intensity (the light incident intensity is 1).

  In the graph showing the relative light intensity shown in FIG. 3, the proximity exposure gap is 100 μm, the light source is a mercury lamp, and λ is 365 nm.

  As shown in FIG. 3, in a general proximity exposure photomask in which no auxiliary light-shielding part is formed, the relative light intensity is high due to diffracted light even within the light-shielding part region, and the relative light intensity is higher due to interference. There is also a part. Therefore, when the patterning of the photosensitive resin is performed, the photosensitive resin is exposed even in the region corresponding to the light shielding portion, and it becomes difficult to form the hole and the convex member in the target pattern shape. On the other hand, when the proximity exposure photomask of the present invention in which the auxiliary light shielding portion is formed is used, the amount of diffracted light into the light shielding portion region is small, and the resist material can be easily designed.

  Furthermore, for example, as shown in FIG. 10, when a general proximity exposure photomask without an auxiliary light shielding part having a circular light shielding part 2 having a radius of 8.5 μm is used, for example, as shown in FIG. 1. The proximity exposure photomask of the present invention having a circular light shielding part 2 having a radius of 4 μm and an auxiliary light shielding part 3 formed in a ring shape with a width of 1 μm outside the light shielding part 2 with a 1 μm gap is used. FIG. 4 shows the results obtained by simulation of the relationship between the distance from the center of the light-shielding portion and the relative light intensity (light incident intensity is 1).

  In the case of using a general proximity exposure photomask, the radius of the light shielding portion is required to be 8.5 μm or more in order to make the relative light intensity from the center of the light shielding portion to 4 μm or less a predetermined value. According to the invention, as shown in FIG. 4, even if the radius of the light-shielding part is 4 μm, the relative light intensity from the center of the light-shielding part to 4 μm can be set to a predetermined value or less, and the finer Pattern formation is possible.

Therefore, by using the proximity exposure photomask of the present invention, it is possible to create a fine pattern. For example, by patterning a negative resist, the target pattern shape, that is, the shape of the light-shielding portion is high-definition. It is possible to form a hole in. Further, by patterning the positive resist, it is possible to form a convex member in a target pattern shape, that is, in the shape of the light shielding portion, at a target height with high definition.
Hereinafter, the proximity exposure photomask of the present invention will be described in detail for each configuration.

1. Auxiliary light shielding part The auxiliary light shielding part used in the photomask for proximity exposure of the present invention is concentric with a light shielding part described later, and is formed on a transparent substrate with a gap from the light shielding part. As such an auxiliary light-shielding part, any light-shielding part that reduces diffracted light generated in the light-shielding part region and prevents interference of diffracted light during proximity exposure can be used. For example, it may be formed of a halftone light-blocking member that transmits part of the exposure light.

  Further, such an auxiliary light shielding portion may be formed continuously around the light shielding portion, for example, as shown in FIG. 1, for example, non-continuously, as shown in FIG. It may be. In the case of being formed discontinuously, for example, as shown in FIG. 5A, the auxiliary light-shielding portion 3 has a circular light-shielding member, a halftone light-shielding member, and the like arranged around the light-shielding portion 2. For example, as shown in FIG. 5B, a polygonal light-shielding member such as a rectangle or a halftone light-shielding member is disposed around the light-shielding portion 2. There may be.

  In addition, the auxiliary light shielding part may have a shape obtained by hollowing out the light shielding part 2 and a gap portion from a similar substantially circular or substantially polygonal shape of the light shielding part 2, as shown in FIG. Further, for example, as shown in FIGS. 6A and 6B, a shape obtained by hollowing out the light shielding portion 2 and the gap portion from a substantially circular or substantially polygonal shape different from the light shielding portion 2 may be used. .

  Note that the size and width of the auxiliary light-shielding part and the gap between the light-shielding part and the auxiliary light-shielding part can be determined by simulation of the light intensity distribution based on the Fresnel diffraction described above.

  In the present invention, the gap, that is, the distance from the end of the light shielding part to the end of the auxiliary light shielding part on the light shielding part side is usually about 0.5 μm to 5 μm, preferably about 1 μm to 3 μm. This is because, by setting the gap to the above range, the exposure light diffraction and the like can be reduced when exposure is performed using the proximity exposure photomask of the present invention.

Further, the width and size of the auxiliary light shielding portion are not particularly limited as long as the width and size are not resolved when exposure and development are performed using the proximity exposure photomask of the present invention. However, when the auxiliary light shielding portion is continuously formed, the width of the auxiliary light shielding portion is usually about 0.5 μm to 5 μm, and preferably about 1 μm to 3 μm. Also, when the light shielding portion is formed discontinuously, the size of each of the light-shielding member or a half-tone light-shielding member constituting the auxiliary light-shielding portion, 1μm ² ~25μm ² about, inter alia 4 [mu] m ² 10 .mu.m ² about It is preferable that Also in this case, it is preferable that the total area of the light-shielding member or a half-tone light-shielding member formed per 10 [mu] m ² that is usually 3μm ² ~7μm ² about.

  The method for forming the auxiliary light shielding part is appropriately selected according to the type of the auxiliary light shielding part. For example, the light shielding portion and the halftone light shielding portion in a general photomask can be formed in the same manner. For example, the light shielding film or the halftone light shielding film can be formed and then patterned. Examples of the method for forming the light shielding film and the halftone light shielding film include physical vapor deposition (PVD) such as sputtering, ion plating, and vacuum vapor deposition. It can be formed by etching or the like depending on the method.

  Further, the material for forming the auxiliary light shielding portion may be the same as that used for a light shielding portion of a general photomask or a halftone light shielding portion. When the auxiliary light-shielding part is made of a light-shielding film that does not substantially transmit exposure light, for example, chromium, chromium oxide, chromium nitride, chromium oxynitride, molybdenum silicide, tantalum, aluminum, silicon, silicon oxide, silicon oxynitride, etc. Can be used. Among the above, chromium-based materials such as chromium, chromium oxide, chromium nitride, and chromium oxynitride are preferably used in the present invention. This is because such a chromium-based material has the most actual use record and is preferable in terms of cost and quality. The auxiliary light-shielding portion using the chromium-based material may be a single layer or may be a laminate of two or more layers.

  Further, when the auxiliary light shielding portion is formed of a halftone light shielding film that transmits a part of the exposure light, for example, a metal film such as chromium, molybdenum silicide, tantalum, aluminum, silicon, nickel, or chromium, molybdenum silicide, A nitride, carbide, or the like of a metal such as tantalum, aluminum, silicon, or nickel can be used.

  In the present invention, it is preferable to use the same material as that for forming a light shielding part described later when forming the auxiliary light shielding part. This is because if the auxiliary light-shielding part and the light-shielding part are formed of the same material, the auxiliary light-shielding part and the light-shielding part can be collectively formed.

  Note that the auxiliary light shielding portion may have a low reflection function. Since the low reflection function can prevent irregular reflection of exposure light, a clearer pattern can be formed. In order to add a low reflection function to the auxiliary light-shielding part, for example, the surface of the auxiliary light-shielding part may contain a chromium compound such as chromium oxide that prevents exposure light from being reflected. In this case, the auxiliary light shielding portion may be formed by an inclined interface in which the content component gradually changes toward the surface.

  The thickness of the auxiliary light shielding part is not particularly limited. For example, when chromium is used, the thickness can be about 50 nm to 150 nm. In the present invention, it is preferable that the thickness of the auxiliary light shielding portion is approximately the same as the thickness of the light shielding portion. As described above, in the manufacturing process of the proximity exposure photomask of the present invention, the auxiliary light-shielding portion and the light-shielding portion can be formed in a lump.

2. Light-shielding part Next, the light-shielding part used for the photomask for proximity exposure of this invention is demonstrated. The light-shielding portion used in the present invention is formed in a substantially regular polygon or a substantially circular shape on a transparent substrate described later, and the shape thereof is appropriately selected according to the type and application of the proximity exposure photomask. The

  In the present invention, the diameter of the light-shielding portion is preferably 16 μm or less, more preferably about 6 μm to 14 μm, and particularly preferably about 8 μm to 12 μm. This is because, in general, a light shielding part having a diameter within the above range is easily affected by diffracted light. Note that the diameter of the light shielding portion when the light shielding portion is substantially polygonal means the length of a straight line drawn from each corner so as to pass through the center.

  The light shielding part forming material and the forming method can be the same as the light shielding part forming material and the forming method used for a general photomask, and are the same as those described in the section of the auxiliary light shielding part. It can be. Further, the light shielding part may have a low reflection function, and the method for imparting the low reflection function may be the same as that described in the section of the auxiliary light shielding part.

  The thickness of the light-shielding part used in the present invention is appropriately selected depending on the material for forming the light-shielding part. For example, when chromium is used, the thickness can usually be about 50 nm to 150 nm.

  Moreover, it is preferable that the average transmittance | permeability in the exposure wavelength of a light-shielding part is 0.1% or less. This is because high-definition patterning can be performed in a target pattern. In addition, the said average transmittance | permeability can be measured by using the transmittance | permeability of the transparent substrate mentioned later as a reference (100%). For the measurement of the average transmittance, an ultraviolet / visible spectrophotometer (for example, Hitachi U-4000) or a device using a photodiode array as a detector (for example, Otsuka Electronics MCPD) can be used.

3. Transparent substrate The transparent substrate used in the present invention is not particularly limited as long as the light shielding part and the auxiliary light shielding part can be formed, and a transparent substrate used for a general photomask can be used. . As the transparent substrate, for example, optically polished low expansion glass such as borosilicate glass and aluminoborosilicate glass, quartz glass, synthetic quartz glass, Pyrex (registered trademark) glass, soda lime glass, white sapphire and the like are not flexible. A transparent rigid material, or a transparent flexible material having flexibility such as a transparent resin film or an optical resin film can be used. Among them, quartz glass is a material having a small coefficient of thermal expansion, and is excellent in dimensional stability and characteristics in high-temperature heat treatment.

4). Proximity Exposure Photomask Next, the proximity exposure photomask of the present invention will be described. The photomask for proximity exposure of the present invention is not particularly limited as long as it has the light shielding part and the auxiliary light shielding part on the transparent substrate. For example, a halftone light shielding part is formed as necessary. It may be what has been done.

  The proximity exposure photomask of the present invention can exert its effect by using a high-pressure mercury lamp that has been conventionally used in the production of color filters, but does not particularly limit the exposure light source.

  Further, the photomask for proximity exposure of the present invention uses a negative resist to form a pattern having a fine hole corresponding to the light shielding part, or uses a positive resist to form the light shielding part. It is suitably used when forming a fine convex member corresponding to the above. Specifically, it is particularly useful when forming a colored layer of a color filter for a transflective liquid crystal display device as described later, or when forming a liquid crystal alignment control member of a color filter.

B. Next, a method for producing a color filter of the present invention will be described.
The color filter manufacturing method of the present invention is a method of forming various members of a color filter using the above-described photomask for proximity exposure, and forming a colored layer of a color filter for a transflective liquid crystal display device. There is an embodiment (first embodiment) and an embodiment (second embodiment) for forming a liquid crystal alignment control member of a color filter. Hereinafter, each embodiment will be described.

1. First Embodiment First, a first embodiment of the method for producing a color filter of the present invention will be described. The manufacturing method of the color filter of this embodiment is a method characterized by including a colored layer forming step of forming a colored layer having a hole corresponding to the light shielding portion using the proximity exposure photomask. .

  The color filter manufacturing method of this embodiment uses a proximity exposure photomask having a light shielding part 2 and an auxiliary light shielding part 3 as shown in FIG. 7, for example, and forms a colored layer containing a negative photosensitive resin. It is a method which has the colored layer formation process which forms the colored layer by which the hole was formed in the pattern shape similar to the light-shielding part 2 by exposing the composition for water.

  When a negative photosensitive resin is exposed using a general proximity exposure photomask to form a colored layer having a hole, the exposure light is diffracted into the light shielding area of the proximity exposure photomask. In addition, due to interference of the diffracted light, it is difficult to form a hole having a small diameter in the target pattern. However, according to this embodiment, since the proximity exposure photomask having the auxiliary light shielding portion is used, it is possible to reduce the diffracted light into the light shielding portion region and prevent interference of the diffracted light. Therefore, it is possible to form a colored layer in which holes are formed with high definition in a target pattern.

  The color filter having the hole in the colored layer is usually used for a transflective liquid crystal display device, and the region where the hole is formed is used as a region for reflected light. By forming the hole in the colored layer in the reflected light region, it is possible to make the chromaticity and luminance of the transflective liquid crystal display device uniform in the reflection mode and the transmission mode. . Hereinafter, the colored layer forming step and other steps in this embodiment will be described.

(1) Colored layer forming step The colored layer forming step in this embodiment is a step of forming a colored layer having a hole corresponding to the light shielding portion using the proximity exposure photomask. It can be set as the process of exposing and developing the composition for colored layer formation containing a conductive resin, and forming the colored layer in which the hole part was formed in the pattern shape similar to the said light-shielding part.

  The shape of the hole formed by this step is appropriately selected according to the type of the transflective liquid crystal display device, and can be, for example, rectangular or circular. The diameter of the hole is preferably 16 μm or less, more preferably 2 μm to 14 μm, particularly 6 μm to 10 μm. This is because the colored layer can be formed in a high-definition pattern.

  The colored layer forming composition used in this step is not particularly limited as long as it contains a negative photosensitive resin, and when forming a colored layer of a general color filter. The thing similar to what is used can be used. The method for exposing and developing the colored layer forming composition may be the same as the method for forming a colored layer of a general color filter.

(2) Other process The manufacturing method of the color filter of this embodiment will not be specifically limited if it has the said colored layer formation process, For example, the light shielding part formation process which forms a light shielding part, or the said coloring You may have required processes, such as a transparent electrode layer formation process which forms a transparent electrode layer on a layer. Each of these steps can be the same as each step in a general color filter manufacturing method.

2. Second Embodiment Next, a second embodiment of the color filter manufacturing method of the present invention will be described. The method for producing a color filter according to this embodiment includes a liquid crystal alignment control protrusion forming step of forming a liquid crystal alignment control protrusion corresponding to the light shielding portion using the proximity exposure photomask. It is.

  The color filter manufacturing method according to the present embodiment uses a proximity exposure photomask having a light shielding part 2 and an auxiliary light shielding part 3 as shown in FIG. 1, for example, and controls liquid crystal alignment containing a positive photosensitive resin. This is a method including a liquid crystal alignment control protrusion forming step of forming a liquid crystal alignment control protrusion in a pattern similar to that of the light-shielding portion 2 by exposing the composition for forming protrusions for exposure.

  When a positive photosensitive resin is exposed using a general photomask to form the liquid crystal alignment control protrusions in a fine pattern, the exposure light is diffracted into the light shielding area of the photomask and the diffracted light Due to the interference, it is difficult to form the liquid crystal alignment control protrusions in a desired pattern and uniform height. However, according to this embodiment, since the proximity exposure photomask having the auxiliary light shielding portion is used, it is possible to reduce the diffracted light into the light shielding portion region and prevent interference of the diffracted light. Accordingly, it is possible to form the liquid crystal alignment control protrusions with high definition in the target pattern, and to make the height of the formed liquid crystal alignment control protrusions uniform.

  The liquid crystal alignment control protrusion is usually formed on the transparent electrode layer, and is a member that controls the alignment direction of the liquid crystal when a voltage is applied to the liquid crystal display device. The liquid crystal alignment control protrusion forming process and other processes of this embodiment will be described below.

(1) Liquid crystal alignment control protrusion forming step The liquid crystal alignment control protrusion forming step in the present embodiment is a step of forming a liquid crystal alignment control protrusion corresponding to the light shielding portion, and contains a positive photosensitive resin. In this step, the liquid crystal alignment control protrusions are formed in the same pattern as the light-shielding portion by exposing and developing the liquid crystal alignment control protrusion forming composition.

  The shape of the liquid crystal alignment control protrusion formed in this step is appropriately selected according to the type of color filter and the like, and can be, for example, rectangular or circular. Further, the diameter of the liquid crystal alignment control protrusion is preferably 16 μm or less, more preferably in the range of 2 μm to 14 μm, and particularly preferably in the range of 6 μm to 10 μm.

  In addition, the height of the liquid crystal alignment control protrusion formed in this step is usually about 0.5 μm to 3 μm, and preferably about 0.5 μm to 2 μm. This is because the alignment direction of the liquid crystal can be controlled with high accuracy.

  Here, the projection forming composition for controlling liquid crystal alignment used in this step is not particularly limited as long as it contains a positive photosensitive resin, and liquid crystal alignment control of a general color filter. The thing similar to what is used when forming process protrusion can be used. The method for exposing and developing the liquid crystal alignment control protrusion forming composition may be the same as the method for forming the liquid crystal alignment control protrusion of a general color filter.

(2) Other steps The method for producing a color filter of the present embodiment is not particularly limited as long as it has the liquid crystal alignment control protrusion forming step. For example, a light shielding portion forming step for forming a light shielding portion, A necessary step such as a colored layer forming step for forming a colored layer and a transparent electrode layer forming step for forming a transparent electrode layer on the colored layer may be included. Each of these steps can be the same as each step in a general color filter manufacturing method.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  Hereinafter, the present invention will be specifically described using examples and comparative examples.

[Example 1]
On the transparent substrate, a negative photosensitive resin solution having the following composition was applied and dried.
(Negative photosensitive resin solution)
・ Red pigment (Chromophthal red A2B, manufactured by Ciba Specialty Chemicals) ・ ・ ・ 4.8 parts by weight ・ Yellow pigment (PASFOL Yellow D1819, manufactured by BASF) ・ ・ ・ 1.2 parts by weight ・ Dispersant (Bic Chemie) Dispersic 161) ... 3.0 parts by weight / monomer (SR399 manufactured by Sartomer) ... 4.0 parts by weight / Polymer I ... 5.0 parts by weight / Irgacure 907 (Ciba Specialty Chemicals) Made) ... 1.4 parts by weight- (2,2'bis (o-chlorophenyl) -4,5,4 ', 5'-tetraphenyl-1,2'-biimidazole) ... 0.6 Parts by weight / propylene glycol monomethyl ether acetate 80.0 parts by weight * Polymer I is benzyl methacrylate: styrene: acrylic acid: 2-hydroxyethyl methacrylate = 15. 6: 37.0: 30.5: 16.9 (molar ratio) of 1 mol% of 2-methacryloyloxyethyl isocyanate added to 100 mol% of the copolymer, and the weight average molecular weight is 42500. It is.
Thereafter, using a proximity exposure photomask having a light-shielding part and an auxiliary light-shielding part as shown in FIG. 1, exposure and development were performed under conditions of an exposure dose of 100 mJ / cm ² and an exposure gap of 100 μm. ) Was formed. The diameter of the light shielding part of the proximity exposure photomask was 7 μm, the diameter of the circle at the inner end of the auxiliary light shielding part was 10 μm, and the diameter of the circle outside the auxiliary light shielding part was 12 μm. It was 7 micrometers when the hole diameter of the said hole part was measured.

[Comparative Example 1]
A negative photosensitive resin-containing composition similar to that in Example 1 was exposed and developed using a proximity exposure photomask having a light-shielding portion as shown in FIG. The diameter of the light shielding part of the proximity exposure photomask was 12 μm. In this case, the photosensitive resin could not be patterned, and no hole was formed.

[Comparative Example 2]
Using a photomask for proximity exposure having a light-shielding portion as shown in FIG. 10, the same negative photosensitive resin-containing composition as in Example 1 was exposed and developed, as shown in FIG. 8B. A hole was formed. The diameter of the light shielding part of the proximity exposure photomask was 15 μm. In this case, a hole having a hole diameter of 15 μm was formed, but it was distorted as shown in FIG. 8B due to the influence of interference in the light shielding part of the proximity exposure photomask.

[Example 2]
On the transparent substrate, a positive photosensitive resin solution having the following composition was applied and dried.
(Positive photosensitive resin solution)
・ Alkali-soluble novolak resin (MP402FPY manufactured by Japan Epoxy Resin Co., Ltd.) ... 90 parts by weight-Benzophenone compound containing quinonediazide group (NTester manufactured by Toyo Gosei Co., Ltd.) ... 9 parts by weightAdditive (Shin-Etsu Chemical Co., Ltd.) KBM-403 manufactured by Co., Ltd.) 1 part by weight / solvent (propylene glycol monomethyl ether acetate) ... 250 parts by weight / solvent (cyclohexanone) 50 parts by weight For proximity exposure as in Example 1. Using a photomask, exposure and development were performed under the conditions of an exposure dose of 80 mJ / cm ² and an exposure gap of 100 μm to form a convex member as shown in FIG. It was 8.5 micrometers when the bottom-bottom diameter of the said convex-shaped member was measured. The height was 1.4 μm.

[Comparative Example 3]
Using the same proximity exposure photomask as in Comparative Example 1, the same positive photosensitive resin-containing composition as in Example 2 was exposed and developed, and a convex member as shown in FIG. Formed. It was 13.4 micrometers when the bottom diameter of the said convex member was measured. The height was 1.2 μm.

It is a top view which shows an example of the photomask for proximity exposure of this invention. It is a figure for demonstrating Fresnel diffraction. It is a graph for demonstrating the advantage of the photomask for proximity exposure of this invention. It is a graph for demonstrating the advantage of the photomask for proximity exposure of this invention. It is a top view which shows the other example of the photomask for proximity exposure of this invention. It is a top view which shows the other example of the photomask for proximity exposure of this invention. It is a top view which shows the other example of the photomask for proximity exposure of this invention. It is a microscope picture of the hole part formed using the photomask for proximity exposure of this invention. It is a cross-sectional photograph of the convex-shaped member formed using the photomask for proximity exposure of this invention. It is a top view of the conventional photomask for proximity exposure.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Transparent substrate 2 ... Light-shielding part 3 ... Auxiliary light-shielding part

Claims (4)

A transparent substrate, a substantially regular polygonal or substantially circular light shielding part formed on the transparent substrate, and a concentricity with the light shielding part formed on the transparent substrate with a gap from the light shielding part outside the light shielding part A photomask for proximity exposure having an auxiliary light shielding portion of
The proximity between the auxiliary light shielding part formed outside the light shielding part and the auxiliary light shielding part formed outside the adjacent light shielding part is longer than the diameter of the light shielding part. Photomask for exposure.   The proximity exposure photomask according to claim 1, wherein a diameter of the light shielding portion is 16 μm or less.   A method for producing a color filter, comprising: a colored layer forming step of forming a colored layer having a hole corresponding to the light shielding portion, using the proximity exposure photomask according to claim 1. .   A liquid crystal alignment control protrusion forming step of forming a liquid crystal alignment control protrusion corresponding to the light shielding portion using the proximity exposure photomask according to claim 1. Production method.

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