JP4979265B2 - Liquid supply mechanism - Google Patents

Description

  The present invention relates to a mechanism for supplying hypohalous acid and other liquids to a pool, a twenty-four hour bath, and the like.

Conventionally, hypochlorous acid has been used to sterilize pool water and circulating baths.
For example, the pool water is drawn from a water supply port, purified through a balancing tank, a hair catcher, a circulation pump, a filter, a heat exchanger, and the like, and returned to the pool again (see, for example, Non-Patent Document 1). Then, hypochlorous acid was sucked up from the storage tank by a diaphragm pump and injected into the piping of the circulation channel.
However, there has been a problem that gas may be generated from the hypochlorous acid solution and supply failure may occur.
Takumina, Inc., “Takumina Useful Information / Technical Materials Pool / Circulation System for Bathtub”, <URL: http://www.tacmina.co.jp/oyakudati/tech_info/sakkin/4-7.html>

  Therefore, the present invention is intended to provide a liquid supply mechanism in which supply failure is less likely to occur than in the prior art.

In order to solve the above problems, the present invention takes the following technical means.
(1) The liquid supply mechanism according to the present invention has a liquid storage tank, is in a pressurized state when supplying the liquid, and is set to a pressure condition corresponding to the supply amount. To do.
According to this liquid supply mechanism, since a pressurized state is applied when the liquid is supplied, a pressing force is applied to the liquid instead of a suction pressure (negative pressure) as in a conventional diaphragm pump. It is in a state where generation is suppressed. In addition, since the pressurization condition corresponding to the supply amount is set (pressurization pressure, pressurization time, flow path diameter, etc.), the supply amount can be controlled by this. Specifically, the liquid injection amount can be adjusted using an electromagnetic valve, an orifice, or the like.
Here, as the liquid, a chemical solution such as a solution containing hypohalous acid (hypochlorous acid or hypobromous acid) can be exemplified. The hypohalous acid-containing solution has a property that a halogen gas is likely to be generated due to an increase in pH value, water temperature, and ultraviolet irradiation environment. Further, a compressor or a blower is used as a means for pressurizing the liquid.

(2) The liquid in the storage tank may be in a predetermined pressurized state other than when the liquid is supplied. If comprised in this way, generation | occurrence | production of the gas from a liquid can be suppressed other than the time of supply, and it will be excellent in the standup at the time of supply.

The present invention is configured as described above and has the following effects.
Since the liquid is in a state where generation of gas is suppressed, it is possible to provide a liquid supply mechanism in which supply failure is less likely to occur than in the past.

Embodiments of the present invention will be described below (see FIGS. 1 and 2).
In this embodiment, a sterilizing agent (tap water in which hypochlorous acid is dissolved) is supplied to the piping 12 of the circulation channel for sterilizing the pool water and the bathtub (see [Background Art]). A mechanism was formed.

  This liquid supply mechanism has a storage tank 6 (pressure chemical chamber) for liquid (tap water in which hypochlorous acid is dissolved), and is in a pressurized state when supplying the liquid. For this reason, a pressurizing means 10 is connected to the storage tank 6 via a check valve 8. As the pressurizing means 10, a compressor or a blower is used. 9 is a pressure gauge. Further, the chemical solution storage tank 6 is connected to the piping 12 of the circulation channel via an electromagnetic valve 11. Here, the liquid in the storage tank 6 is kept in a predetermined pressurization state even during a standby time other than the supply of the liquid.

The liquid storage tank 6 is replenished with the chemical solution 2 from the original chemical solution storage tank 1 through the orifice valve 3 and the electromagnetic valve 4. 13 is a control panel. The chemical liquid storage tank 6 detects the liquid level of the chemical liquid 7 by the level sensor 5 and replenishes from the chemical liquid storage tank 1 when the liquid level decreases.
Specifically, when the storage tank 6 is pressurized, the electromagnetic valve 4 between the chemical solution storage tank 1 is closed, and when the chemical solution is replenished to the storage tank 6, the pressurized state is released. As shown in FIG. 2, two storage tanks 6 are formed, and when one storage tank 6 is in a pressurized state, the other storage tank 6 can be replenished with a chemical solution.

  Then, when supplying the liquid, the pressurizing condition is set (pressurizing pressure, pressurizing time, channel diameter, etc.) according to the supply amount of the circulation channel to the pipe 12. For example, the supply flow path can be opened only for the time corresponding to the supply amount corresponding to the pressure value that has been in the pressurized state from the standby state described above. Conversely, the pressure value at the time of supply can be set to correspond to the supply amount. The liquid injection amount can be adjusted using an electromagnetic valve, an orifice, or the like.

Next, the usage state of the liquid supply mechanism of this embodiment will be described.
According to this liquid supply mechanism, since a pressurized state is applied when the liquid is supplied, a pressing force is applied to the liquid instead of a suction pressure (negative pressure) as in a conventional diaphragm pump. There is an advantage that supply failure is less likely to occur than in the prior art. In addition, since the pressurization condition according to the supply amount is set, there is an advantage that the supply amount can be controlled. Furthermore, the liquid in the storage tank is in a predetermined pressurized state other than at the time of supplying the liquid, and it is possible to suppress the generation of gas from the liquid other than at the time of supply and to be excellent in rising at the time of supply. There is an advantage of becoming.

  In addition, since the pressurized state is used for supplying the liquid, the liquid supply can be more quantitatively controlled by controlling the pressurizing pressure at a high pressure. Furthermore, even when the liquid has a high viscosity, it can be dealt with by increasing the pressure. In addition, compared with the diaphragm method, the liquid contact part is simple, it has excellent heat resistance and chemical resistance, and it is difficult to break down. Space can be reduced.

  Since the liquid is in a state where generation of gas and the like is suppressed, and supply failure is less likely than in the past, it can be applied to various liquid supply mechanisms. In addition, there is a possibility that the concept can be developed for the supply of powder.

The figure explaining embodiment of the supply mechanism of the liquid of this invention. The figure explaining other embodiment of the liquid supply mechanism of this invention.

Explanation of symbols

6 Reservoir 7 Liquid

Claims (1)

It has a pressure chemical solution chamber (6) for a chemical solution (7) that easily generates gas, and is pressurized by the pressurizing means (10) when the chemical solution (7) is supplied, and a pressurizing condition corresponding to the supply amount by so setting, to a predetermined pressurized state at a chemical (7) said pressurizing means (10) also pressure chemical chamber (6) except when the supply of the chemical liquid (7) to the time of supply In the chemical solution supply mechanism that is excellent in the rise of the pressure, the chemical solution supply mechanism is characterized in that a compressor or a blower is used as the pressurizing means (10).