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JP5010344B2 - Surface treatment apparatus for cast steel pieces and surface treatment method for cast steel pieces - Google Patents
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JP5010344B2 - Surface treatment apparatus for cast steel pieces and surface treatment method for cast steel pieces - Google Patents

Surface treatment apparatus for cast steel pieces and surface treatment method for cast steel pieces Download PDF

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JP5010344B2
JP5010344B2 JP2007131258A JP2007131258A JP5010344B2 JP 5010344 B2 JP5010344 B2 JP 5010344B2 JP 2007131258 A JP2007131258 A JP 2007131258A JP 2007131258 A JP2007131258 A JP 2007131258A JP 5010344 B2 JP5010344 B2 JP 5010344B2
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magnetic field
cast steel
plasma arc
plasma
alternating magnetic
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JP2008284582A (en
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健彦 藤
純 田中
研一 山本
紘一 武田
武男 山本
郁視 久野
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Nippon Steel Corp
Akita Prefectural University
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Akita Prefectural University
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Abstract

<P>PROBLEM TO BE SOLVED: To perform uniform melting treatment at an optional position in the width direction of a cast slab by adjusting distribution of alternating current magnetic fields thereby making an incident angle of a plasma arc on the surface of the cast slab always constant. <P>SOLUTION: A surface layer treatment apparatus 1 is provided with a plasma torch T generating the plasma arc P in a space between the cast slab H and the plasma torch T. Between the plasma torch T and the cast slab H, an alternating current magnetic field Mt reciprocating the plasma arc P in the width direction A of the cast slab H and an alternating current magnetic field Mh in a direction reverse to the magnetic field Mt below it are generated by alternating current generators (electromagnetic coils 21, 22). The plasma arc P reciprocated in the width direction A is rebent with electromagnetic force by the magnetic field Mh in the reverse direction immediately before it reaches the cast slab H, and the incident angle of the plasma arc P on the cast slab H can be controlled. <P>COPYRIGHT: (C)2009,JPO&amp;INPIT

Description

本発明は、例えば鋼の連続鋳造鋳片や、圧延途中の鋼片などの鋳鋼片の表層を、プラズマによって加熱したり、溶融処理するための表層処理装置および表層処理方法に関する。   The present invention relates to a surface layer processing apparatus and a surface layer processing method for heating or melting a surface layer of a cast steel slab such as a continuous cast slab of steel or a steel slab in the middle of rolling.

例えば連続鋳造後の鋳片や圧延途中の鋼片の表層を改質する処理には、プラズマ加熱装置が用いられている(特許文献1参照)。   For example, a plasma heating apparatus is used for the process of modifying the slab after continuous casting or the surface layer of a steel slab during rolling (see Patent Document 1).

プラズマ加熱装置は、例えば搬送される鋳片に対向配置された、トーチを陰極、鋳片を陽極とする直流プラズマのプラズマトーチを備え、当該プラズマトーチと鋳片との間にプラズマアークを発生させ、そのプラズマアークの熱によって鋳片を加熱して溶融し、その表層を例えば改質処理するようになっている。   The plasma heating apparatus includes, for example, a direct current plasma plasma torch that is disposed opposite to a slab to be conveyed and has a torch as a cathode and a slab as an anode, and generates a plasma arc between the plasma torch and the slab. The slab is heated and melted by the heat of the plasma arc, and the surface layer is subjected to a modification treatment, for example.

鋳鋼片の表層を溶融処理する場合には、鋳鋼片に対し、プラズマアークによって均一に加熱、溶融させ、可能な限り鋳鋼片の表層を均一に溶融処理する必要がある。すなわち、特許文献1等に示す技術を用いて幅の広い鋳鋼片を加熱する場合、鋳鋼片の幅方向全体にプラズマアークを当てて、鋳鋼片を加熱する必要がある。このため、交流磁場の電磁力を用いてプラズマアークを鋳鋼片の幅方向に往復移動させて鋳片を加熱することが提案されている(特許文献2参照)。このように交流磁場の電磁力を用いてプラズマアークを往復移動させる方法は、プラズマトーチをスキャンさせる方法に比べて、機械的な部品点数を少なくできる点で優れている。なお本願において「鋳鋼片」とは、「鋳片」と「鋼片」を総称したものであり、「鋳片」とは鋳造後の鋼材を、「鋼片」とは鋳片を圧延した後の鋼材を意味している。   When the surface layer of the cast steel slab is melted, it is necessary to uniformly heat and melt the cast steel slab by a plasma arc, and to melt the surface layer of the cast steel slab as uniformly as possible. That is, when heating a wide cast steel piece using the technique shown in Patent Document 1 or the like, it is necessary to heat the cast steel piece by applying a plasma arc to the entire width direction of the cast steel piece. For this reason, it has been proposed to reciprocate the plasma arc in the width direction of the cast steel piece using the electromagnetic force of the alternating magnetic field to heat the cast piece (see Patent Document 2). Thus, the method of reciprocating the plasma arc using the electromagnetic force of the alternating magnetic field is superior in that the number of mechanical parts can be reduced as compared with the method of scanning the plasma torch. In the present application, “cast steel slab” is a general term for “slab slab” and “steel slab”, “slab slab” is a steel material after casting, and “steel slab” is after rolling the slab. Means steel.

特開2004−195512号公報JP 2004-195512 A 特開昭54−142154号公報JP 54-142154 A

前記の従来技術では、例えば図13に示すように、鋳鋼片Hの搬送方向Bに対してプラズマトーチTの前後に、それぞれ2本ずつの互いに平行な、例えば金属線からなる電流通路51、52、53、54を設けて、図中の太矢印に示すような交流磁場Mを発生させ、当該交流磁場Mによる電磁力で、プラズマアークを図13の紙面に直交する方向に往復移動させる。なお、図に示す電流方向は、ある一瞬の状態を示すものであり、交流電流であるために、時間の経過に伴い方向が入れ替わるが、常に電流通路51と52に流れる電流が同じ方向であり、電流通路53と54に流れる電流はその逆向きである。   In the prior art described above, for example, as shown in FIG. 13, two current paths 51, 52 made of metal wires, for example, are arranged in parallel with each other before and after the plasma torch T with respect to the conveying direction B of the cast steel slab H. , 53, 54 are provided to generate an alternating magnetic field M as indicated by a thick arrow in the figure, and the plasma arc is reciprocated in a direction perpendicular to the paper surface of FIG. It should be noted that the current direction shown in the figure indicates a state of a certain moment and is an alternating current, so the direction is changed over time. However, the current flowing in the current paths 51 and 52 is always in the same direction. The current flowing in the current paths 53 and 54 is in the opposite direction.

このようにしてプラズマアークを鋳片Hの幅方向に往復移動させる際、移動の両端部では、図14に示すように、プラズマアークPが鋳片Hの表面に対して斜め方向に入射する。かかる場合、プラズマトーチT直下での入射幅aと比較すると、端部での入射幅bの方がより大きくなるため、端部での入射熱の密度はプラズマトーチT直下よりも低くなる。また斜めに入射することによりプラズマガスが拡散するので、入射熱量は単純に入射部の面積の比率だけでは導き出せなくなる。したがって、一定のプラズマ出力で且つプラズマアークPを等速に往復移動させると、鋳片Hの幅方向Aの位置によってプラズマアークPの入熱量が異なり、部分的に処理不良が発生したり、均一な処理ができないおそれが生ずる。   When the plasma arc is reciprocated in the width direction of the slab H in this way, the plasma arc P is incident on the surface of the slab H in an oblique direction as shown in FIG. In such a case, the incident width b at the end is larger than the incident width a just below the plasma torch T, so the density of the incident heat at the end is lower than directly below the plasma torch T. Further, since the plasma gas diffuses by being incident obliquely, the amount of incident heat cannot be derived simply by the ratio of the area of the incident portion. Accordingly, if the plasma arc P is reciprocated at a constant plasma output and at a constant speed, the amount of heat input to the plasma arc P differs depending on the position in the width direction A of the slab H. May not be able to be processed properly.

このように、プラズマアークPが鋳片Hの幅方向A位置によって異なる角度で入射される場合、溶融する鋳片表層の溶融深さを均一にするには、位置により印加する交流磁場の波形や振動数を変化させなければならない。しかも、鋳片の種類や処理速度、プラズマ出力等の処理条件に応じて、それぞれ異なる交流磁場の調整を行う必要がある。そのため、複数の処理条件について予め処理試験を行い、適正な交流磁場の波形や振動数を設定しなければならず、多大な手間がかかる。   Thus, when the plasma arc P is incident at different angles depending on the position in the width direction A of the slab H, in order to make the melting depth of the molten slab surface layer uniform, The frequency must be changed. In addition, it is necessary to adjust different AC magnetic fields according to processing conditions such as the type of slab, processing speed, and plasma output. Therefore, it is necessary to perform a processing test for a plurality of processing conditions in advance and set an appropriate waveform and frequency of the alternating magnetic field, which takes a lot of time and effort.

本発明は、かかる点に鑑みてなされたものであり、交流磁場の分布を調整することによってプラズマアークの鋳鋼片表面への入射角を常に一定にし、鋳鋼片の幅方向の任意の位置において均一な溶融処理を行うことを目的としている。   The present invention has been made in view of such points, and by adjusting the distribution of the alternating magnetic field, the angle of incidence of the plasma arc on the surface of the cast steel slab is always constant, and is uniform at any position in the width direction of the cast steel slab. The purpose is to perform a proper melting process.

上記問題を解決するため、本発明は、鋳鋼片との間にプラズマアークを発生させるプラズマトーチを備えた表層処理装置において、前記プラズマトーチと前記鋳鋼片の間に、前記プラズマアークを前記鋳鋼片の幅方向に往復移動させる交流磁場と、その下方に前記交流磁場とは逆向きの交流磁場とを発生させる交流磁場発生装置を有し、前記交流磁場発生装置は、前記プラズマトーチによって発生するプラズマアークの、鋳鋼片の搬送方向の前後に配置された一対の電磁コイルと、前記一対の電磁コイルに同方向の交流電流を供給する交流電源とを有することを特徴としている。 In order to solve the above-described problem, the present invention provides a surface treatment apparatus including a plasma torch that generates a plasma arc between a cast steel piece and the plasma arc between the plasma torch and the cast steel piece. plasma and alternating magnetic field for reciprocating in the width direction of the said alternating magnetic field thereunder have a alternating magnetic field generator for generating an AC magnetic field in the opposite direction, the alternating magnetic field generator is generated by the plasma torch A pair of electromagnetic coils arranged before and after the arc in the conveying direction of the cast steel piece, and an AC power supply for supplying an alternating current in the same direction to the pair of electromagnetic coils .

このように本発明においては、プラズマアークを往復移動させる交流磁場、及び被処理部材である鋳鋼片の手前でそれとは逆向きの交流磁場、の両方を発生させる交流磁場発生装置を有しているので、例えばプラズマアークを鋳鋼片の幅方向に沿って左側に移動させたときに、鋳鋼片に入射する直前でプラズマアークを右方向に曲げ戻すことができる。つまり、プラズマアークが傾いた状態で鋳鋼片に入熱しないように、鋳鋼片への入射角を調整することができる。したがって、プラズマアークを幅方向に移動させても、プラズマトーチの直下に入熱するときと同様に常にほぼ直角の入射角を保って入熱し、表層処理を行うことができる。なおここで「ほぼ直角」の入射角を保って入熱するとしたのは、必ずしも厳密に直角である必要はなく、直角、若しくはその不可避的な誤差範囲は本発明のかかる作用によって得られるものだからである。したがって、以下、本発明の作用に関してプラズマアークが直角の入射角を保って鋳鋼片へ入熱する旨の記載があっても、それは必ずしも厳密に直角であることだけに限定されるものではない。   As described above, the present invention has an AC magnetic field generator that generates both an AC magnetic field for reciprocating the plasma arc and an AC magnetic field in the opposite direction before the cast steel slab, which is a member to be processed. Therefore, for example, when the plasma arc is moved to the left along the width direction of the cast steel piece, the plasma arc can be bent back rightward just before entering the cast steel piece. That is, the incident angle to the cast steel piece can be adjusted so as not to heat the cast steel piece with the plasma arc tilted. Therefore, even if the plasma arc is moved in the width direction, the surface layer treatment can be performed by always inputting heat while maintaining a substantially right angle of incidence as in the case of heat input immediately below the plasma torch. Note that the heat input with the "substantially right angle" incident angle maintained here does not necessarily have to be exactly a right angle, because a right angle or an unavoidable error range thereof is obtained by such an operation of the present invention. It is. Therefore, hereinafter, even if there is a description that the plasma arc heats into the cast steel piece while maintaining a right angle of incidence with respect to the action of the present invention, it is not necessarily limited to being strictly right angle.

前記交流磁場発生装置は、前記プラズマトーチによって発生するプラズマアークの、鋳鋼片の搬送方向の前後に配置された一対の電磁コイルと、前記一対の電磁コイルに同方向の交流電流を供給する交流電源とで構成しているので、これによって、簡単な構造で、プラズマアークを往復移動させる交流磁場及び曲げ戻す磁場の両方を発生させることができる。かかる場合、前記一対の電磁コイルを、上下方向に移動可能としてもよい。 The AC magnetic field generator includes a pair of electromagnetic coils disposed before and after a cast steel slab of a plasma arc generated by the plasma torch, and an AC power source that supplies an alternating current in the same direction to the pair of electromagnetic coils. Thus, it is possible to generate both an alternating magnetic field for reciprocating the plasma arc and a magnetic field for bending back with a simple structure. In such a case, the pair of electromagnetic coils may be movable in the vertical direction.

さらに前記交流磁場発生装置は、前記プラズマトーチによって発生するプラズマアークの、鋳鋼片の搬送方向の前後にそれぞれ上下に並列配置された片側4つずつの電磁コイルと、前記電磁コイルに交流電流を供給する交流電源からなり、前記プラズマトーチ側の2対の電磁コイルと前記鋳鋼片側の2対の電磁コイルとが互いに逆向きの交流磁場を形成するものとしてもよい。このような構造とすれば、プラズマアークを往復移動させる交流磁場と、鋳鋼片付近でプラズマアークを曲げ戻す磁場とを、異なる電磁コイルによって形成するので、より容易に、また精密にプラズマアークの入射角を調整することができる。 Further, the AC magnetic field generator supplies four AC coils arranged in parallel vertically on the front and rear sides of the transport direction of the cast steel pieces of the plasma arc generated by the plasma torch, and supplies AC current to the electromagnetic coils. The two pairs of electromagnetic coils on the plasma torch side and the two pairs of electromagnetic coils on the cast steel piece side may form alternating magnetic fields opposite to each other. With such a structure, the AC magnetic field for reciprocating the plasma arc and the magnetic field for bending the plasma arc near the cast steel slab are formed by different electromagnetic coils, making it easier and more precise to enter the plasma arc. The corner can be adjusted.

また前記の場合、前記プラズマトーチ側の2対の電磁コイルと前記鋳鋼片側の2対の電磁コイルとに対して、異なった交流電源から交流電流が供給されるようにしてもよい。これによって、プラズマアークの振れ幅及び入射角の各々に関して微調整ができるので、さらに精密な表層処理が可能である。   In the above case, AC currents may be supplied from different AC power sources to the two pairs of electromagnetic coils on the plasma torch side and the two pairs of electromagnetic coils on the cast steel piece side. As a result, fine adjustment can be made with respect to each of the deflection width and the incident angle of the plasma arc, so that more precise surface layer processing is possible.

また別な観点によれば、本発明は、鋳鋼片との間にプラズマアークを発生させるプラズマトーチを備え、プラズマアークによって鋳鋼片の表層を処理する表層処理方法であって、前記プラズマトーチと前記鋳鋼片の間に、前記プラズマアークを前記鋳鋼片の幅方向に往復移動させる交流磁場と、その下方に前記交流磁場とは逆向きの交流磁場との双方を発生させることにより、前記プラズマアークの前記鋳鋼片への入射角を制御し、前記交流磁場と、前記交流磁場とは逆向きの交流磁場は、前記プラズマアークの、鋳鋼片の搬送方向の前後に配置された一対の電磁コイルに対して、同方向の交流電流を供給することによって発生させることを特徴としている。 According to another aspect, the present invention includes a plasma torch for generating a plasma arc between a cast steel piece and a surface layer treatment method for treating a surface layer of the cast steel piece with the plasma arc, the plasma torch and the By generating both an alternating magnetic field for reciprocating the plasma arc in the width direction of the cast steel piece and an alternating magnetic field opposite to the alternating magnetic field below the cast steel piece, The incident angle to the cast steel slab is controlled, and the alternating magnetic field and the alternating magnetic field opposite to the alternating magnetic field are applied to a pair of electromagnetic coils arranged before and after the plasma arc in the transport direction of the cast steel slab. It is characterized by being generated by supplying alternating current in the same direction .

かかる場合、前記一対の電磁コイルを上下方向に移動させて前記プラズマアークの前記鋳鋼片への入射角をさらに制御するようにしてもよい。
また前記プラズマトーチによって発生するプラズマアークの、鋳鋼片の搬送方向の前後にそれぞれ片側4本ずつの電磁コイル上下に並列配置し、前記交流磁場と、前記交流磁場とは逆向きの交流磁場は、これらコイルのうち前記プラズマトーチ側の2対の電磁コイルと前記鋳鋼片側の2対の電磁コイルに対して、互いに逆向きの交流電流を供給することによって発生させるようにしてもよい。
In such a case, the angle of incidence of the plasma arc on the cast steel piece may be further controlled by moving the pair of electromagnetic coils in the vertical direction.
The plasma arc generated by the plasma torch is arranged in parallel above and below four electromagnetic coils on each side before and after the transport direction of the cast steel piece, and the alternating magnetic field and the alternating magnetic field opposite to the alternating magnetic field are: You may make it generate | occur | produce by supplying the alternating current of mutually opposite direction with respect to two pairs of electromagnetic coils by the side of the said plasma torch and two pairs of electromagnetic coils by the side of the said cast steel among these coils.

本発明によれば、表層処理を施す鋳鋼片に対するプラズマアークの入射角度を調整し、常に鋳鋼片の表面にほぼ直角に入射させることができるので、鋳鋼片全体に対して均一な入熱状態で表層処理することができ、高品質の製品を製造することができる。   According to the present invention, it is possible to adjust the incident angle of the plasma arc to the cast steel piece subjected to the surface layer treatment, and to always make the incident angle substantially perpendicular to the surface of the cast steel piece. Surface treatment can be performed, and high-quality products can be manufactured.

以下、本発明の好ましい実施の形態について図を参照して説明する。図1は、本実施の形態にかかる表層処理装置1の構成の概略を正面からみた模式図であり、図2は同じく平面からみた模式図である。   Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a schematic diagram of a schematic configuration of a surface processing apparatus 1 according to the present embodiment as viewed from the front, and FIG. 2 is a schematic diagram of the same from a plane.

表層処理装置1は、水平方向に搬送される鋳片Hの搬送ライン上に設けられている。表層処理装置1は、例えば搬送される鋳片Hの上方に配置された1本または複数本のプラズマトーチTを有している。プラズマトーチTは、複数本の場合には鋳片Hの幅方向Aに沿って並列に配置されるが、プラズマトーチT自体の本数は任意である。プラズマトーチTは、直流電源2からの電圧の印加によって、鋳片Hとの間に直流プラズマによるプラズマアークPを形成させる。プラズマアークPには、鋳片H側からプラズマトーチ側に電流が流れている。プラズマトーチTの出力制御は、制御装置3によって制御される。なおプラズマアークPを生成するためのプラズマガスとしては、非酸化性ガス、例えば窒素ガスやアルゴンガスが好ましい。   The surface layer processing apparatus 1 is provided on the conveyance line of the slab H conveyed in the horizontal direction. The surface layer processing apparatus 1 has, for example, one or a plurality of plasma torches T disposed above the slab H to be conveyed. In the case of a plurality of plasma torches T, the plasma torches T are arranged in parallel along the width direction A of the slab H, but the number of the plasma torches T itself is arbitrary. The plasma torch T forms a plasma arc P by DC plasma with the slab H by applying a voltage from the DC power source 2. In the plasma arc P, a current flows from the slab H side to the plasma torch side. The output control of the plasma torch T is controlled by the control device 3. The plasma gas for generating the plasma arc P is preferably a non-oxidizing gas such as nitrogen gas or argon gas.

プラズマトーチTの下方であって、かつ鋳片Hの搬送方向Bの前後、すなわちプラズマトーチTによって形成されるプラズマアークPの搬送方向Bの前後には、交流磁場発生装置としての線状の電磁コイル21、22が、対向して平行に設けられている。これらの電磁コイル21、22は、交流電源5からの交流電流の供給によって、プラズマアークPに周期的にローレンツ力を作用させて、プラズマアークPを、供給される交流の周波数に応じて鋳片Hの幅方向Aに往復移動させる。   Below the plasma torch T and before and after the slab H transfer direction B, that is, before and after the transfer direction B of the plasma arc P formed by the plasma torch T, linear electromagnetic waves as an AC magnetic field generator Coils 21 and 22 are provided in parallel to face each other. These electromagnetic coils 21, 22 cause the Lorentz force to act periodically on the plasma arc P by supplying an alternating current from the AC power source 5, and the plasma arc P is cast according to the supplied AC frequency. Reciprocate in the width direction A of H.

図3(A)は、図2のC−C方向から見た拡大断面を示しており、電磁コイル21、22は、プラズマトーチTの中心軸線に対して対称位置に配置され、図1に示す交流電源5から交流電流が供給されると、電磁コイル21、22には、各々同一方向に電流が流れる。これにより、電磁コイル21、22の上側と下側に、図3(A)の矢印に示すように、左右逆方向の磁場Mt、Mhが発生する。図3(B)はこのときの磁束密度の分布を示す。なお図は瞬間の電流の方向を示しており、時間の経過に伴って方向が入れ替わる。交流電源5の出力は、主制御装置4によって制御される。   FIG. 3A shows an enlarged cross section viewed from the CC direction of FIG. 2, and the electromagnetic coils 21 and 22 are arranged at symmetrical positions with respect to the central axis of the plasma torch T and are shown in FIG. When an alternating current is supplied from the alternating current power source 5, the current flows through the electromagnetic coils 21 and 22 in the same direction. As a result, magnetic fields Mt and Mh in opposite directions are generated on the upper and lower sides of the electromagnetic coils 21 and 22 as indicated by arrows in FIG. FIG. 3B shows the distribution of magnetic flux density at this time. The figure shows the direction of the instantaneous current, and the direction is changed over time. The output of the AC power supply 5 is controlled by the main controller 4.

本実施の形態にかかる表層処理装置1は、以上のような構成を有しており、直流電源2からの電圧を印加すると、プラズマトーチTと鋳片Hとの間に直流プラズマによるプラズマアークPが形成され、また電磁コイル21、22に交流電源5から交流電流が供給されると、プラズマアークPは電磁力を受けて鋳片Hの幅方向Aに往復移動する。   The surface layer processing apparatus 1 according to the present embodiment has the above-described configuration, and when a voltage from the DC power source 2 is applied, a plasma arc P generated by DC plasma between the plasma torch T and the slab H is applied. When an alternating current is supplied to the electromagnetic coils 21 and 22 from the alternating current power source 5, the plasma arc P reciprocates in the width direction A of the slab H in response to the electromagnetic force.

図4は、本実施の形態によるプラズマアークPの移動状態を示す。交流電流が電磁コイル21、22に流れると、図3に示したように、電磁コイル21、22の上側と下側では逆向きの磁場Mt、Mhが形成される。したがって、図4に示すように、プラズマトーチT付近で例えば図の左方向へ移動する力を受けたプラズマアークPは、鋳片Hに近づくと反対の右側へ戻される力を受ける。したがって、プラズマトーチTから鋳片H表面までの距離に応じて、電磁コイル21、22の交流磁場によるプラズマアークPの戻り量を調整することにより、鋳片Hの表面に対してプラズマアークPをほぼ直角に入射させることができる。この入射角の調整は、電磁コイル21、22の設置位置により行うことができる。すなわち、プラズマの出力量やプラズマトーチTと鋳片Hとの距離等に応じて、電磁コイル21、22の設置高さを上下方向に移動させることにより、磁力分布を制御し、鋳片Hへの入射角を調整する。   FIG. 4 shows a moving state of the plasma arc P according to the present embodiment. When an alternating current flows through the electromagnetic coils 21 and 22, as shown in FIG. 3, opposite magnetic fields Mt and Mh are formed on the upper and lower sides of the electromagnetic coils 21 and 22, respectively. Therefore, as shown in FIG. 4, the plasma arc P that has received a force moving in the left direction in the drawing near the plasma torch T, for example, receives a force that returns to the opposite right side when approaching the slab H. Therefore, the plasma arc P is applied to the surface of the slab H by adjusting the return amount of the plasma arc P by the alternating magnetic field of the electromagnetic coils 21 and 22 according to the distance from the plasma torch T to the slab H surface. The light can be incident at a substantially right angle. The adjustment of the incident angle can be performed according to the installation positions of the electromagnetic coils 21 and 22. That is, the magnetic force distribution is controlled by moving the installation height of the electromagnetic coils 21 and 22 in the vertical direction according to the plasma output amount, the distance between the plasma torch T and the slab H, etc. Adjust the incident angle.

このように、常にプラズマアークPを鋳片Hに対して垂直方向に入射させることにより、プラズマアークPの入射幅aが、幅方向Aの位置に関係なく常に一定となる。この状態で鋳片Hへの入熱を均一にするには、プラズマアークPの移動による鋳片H表面の幅方向Aにおける各位置の滞在時間を等しくすればよいので、常にプラズマアークPの移動速度が一定になるように、電磁コイル21、22に対して交流電源5が供給する交流は、例えば三角波等の単純な波形の磁場を形成するものでもよい。したがって、様々な溶融処理条件に対して、プラズマアークPの出力と磁場の強さのみを調整することにより対処できる。そのため、制御が容易であるうえ、事前にサンプルの処理試験を行って各種設定を決める必要がなく、大幅に手間が軽減できる。しかも、極めて単純な構成であり、狭いスペースでも実施可能である。   Thus, by always causing the plasma arc P to enter the slab H in the vertical direction, the incident width a of the plasma arc P is always constant regardless of the position in the width direction A. In order to make the heat input to the slab H uniform in this state, the residence time at each position in the width direction A of the surface of the slab H by the movement of the plasma arc P may be equalized. The AC supplied from the AC power supply 5 to the electromagnetic coils 21 and 22 may form a simple waveform magnetic field such as a triangular wave so that the speed is constant. Therefore, it is possible to cope with various melting processing conditions by adjusting only the output of the plasma arc P and the strength of the magnetic field. Therefore, it is easy to control, and it is not necessary to determine various settings by conducting a sample processing test in advance, and the labor can be greatly reduced. Moreover, it has a very simple configuration and can be implemented even in a narrow space.

上記実施の形態は、プラズマトーチTが複数本ある場合でも同様に実施可能である。なおこの種の装置に使用されるプラズマトーチTによって発生するプラズマアークPの水平方向の移動幅は通常100mm程度であるから、鋳片Hの幅が100mmを超える場合には、プラズマトーチTを複数本配置し、それぞれのプラズマトーチTを同様に往復移動させて表層処理を行う。   The above embodiment can be similarly implemented even when there are a plurality of plasma torches T. Since the horizontal movement width of the plasma arc P generated by the plasma torch T used in this type of apparatus is normally about 100 mm, a plurality of plasma torches T are provided when the width of the slab H exceeds 100 mm. This is arranged, and each plasma torch T is similarly reciprocated to perform surface layer processing.

なお、処理対象である鋳片Hへの入射角を制御するにあたっては、目視の他、例えばCCDカメラで表面部分を撮像してその画像処理データを用いる等の方法により好適に制御することができる。   In addition, when controlling the incident angle to the slab H to be processed, it can be suitably controlled by a method such as imaging the surface portion with a CCD camera and using the image processing data in addition to visual observation. .

図5及び図6は、本発明の異なる実施の形態を示す。図5は、表層処理装置11の構成の概略を正面からみた模式図であり、図6は同じく平面からみた模式図である。   5 and 6 show different embodiments of the present invention. FIG. 5 is a schematic view of an outline of the configuration of the surface processing apparatus 11 as seen from the front, and FIG. 6 is a schematic view of the same as seen from the plane.

表層処理装置11は、搬送される鋳片Hの上方に配置された複数(図では7本)のプラズマトーチT1〜T7を、鋳片Hの幅方向Aに沿って並列に有している。これらのプラズマトーチT1〜T7は、直流電源2からの電圧の印加によって、各々鋳片Hとの間に直流プラズマによるプラズマアークPを形成させる。各プラズマアークPには、鋳片H側からプラズマトーチT1〜T7側に電流が流れている。プラズマトーチT1〜T7の着火本数、並びに出力の制御は制御装置3によって制御される。   The surface layer processing apparatus 11 has a plurality (seven in the figure) of plasma torches T1 to T7 arranged in parallel along the width direction A of the slab H arranged above the slab H to be conveyed. These plasma torches T <b> 1 to T <b> 7 form a plasma arc P by DC plasma between each of the slabs H by application of a voltage from the DC power source 2. In each plasma arc P, a current flows from the slab H side to the plasma torch T1 to T7 side. The number of ignitions and the output of the plasma torches T1 to T7 are controlled by the control device 3.

プラズマトーチT1〜T7の下方であって、かつ鋳片Hの搬送方向Bの前後、すなわちプラズマトーチT1〜T7によって形成されるプラズマアークPの搬送方向Bの前後には、交流磁場発生装置としての電磁コイル23、24、25、26が相互に平行となるように設けられている。これらの電磁コイル23、24、25、26は、交流電源15、16からの交流電流の供給によって、各プラズマアークPに周期的にローレンツ力を作用させて、各プラズマアークPを、供給される交流の周波数に応じて鋳片Hの幅方向Aに往復移動させる。   Below the plasma torches T1 to T7 and before and after the slab H transfer direction B, that is, before and after the transfer direction B of the plasma arc P formed by the plasma torches T1 to T7, The electromagnetic coils 23, 24, 25, and 26 are provided so as to be parallel to each other. These electromagnetic coils 23, 24, 25, 26 are supplied with each plasma arc P by periodically applying a Lorentz force to each plasma arc P by supplying alternating current from AC power sources 15, 16. The slab H is reciprocated in the width direction A according to the AC frequency.

電磁コイル23、24、25、26(図7参照)は、プラズマトーチT1〜T7の両側に対称に配置され、電磁コイル23と24、電磁コイル25と26は、それぞれ同型同大のループ状の形状を有している。電磁コイル23、24と電磁コイル25、26とは、それぞれ交流電源15、16から交流電流が供給されると、逆向きの磁場を同期して発生させる。電磁コイル23の磁場強度及び方向は電磁コイル24と同一であり、電磁コイル25の磁場強度及び方向は電磁コイル26と同一である。電磁コイル23、24の交流電源15と、電磁コイル25、26の交流電源16の出力及び位相制御は、主制御装置4が行なう。   The electromagnetic coils 23, 24, 25, and 26 (see FIG. 7) are symmetrically arranged on both sides of the plasma torches T1 to T7. The electromagnetic coils 23 and 24 and the electromagnetic coils 25 and 26 are loop-shaped of the same type and the same size, respectively. It has a shape. The electromagnetic coils 23 and 24 and the electromagnetic coils 25 and 26 generate reverse magnetic fields in synchronism when supplied with AC current from the AC power sources 15 and 16, respectively. The magnetic field strength and direction of the electromagnetic coil 23 are the same as those of the electromagnetic coil 24, and the magnetic field strength and direction of the electromagnetic coil 25 are the same as those of the electromagnetic coil 26. The main controller 4 performs output and phase control of the AC power supply 15 of the electromagnetic coils 23 and 24 and the AC power supply 16 of the electromagnetic coils 25 and 26.

図7(A)は、図6のD−D方向から見た拡大断面を示しており、電磁コイル23と24、電磁コイル25と26は、プラズマトーチT1の中心軸線に対してそれぞれ対称位置に配置されている。そして図5に示したように、交流電源15、16から電磁コイル23、24、25、26交流電流が供給されると、電磁コイル23、24と電磁コイル25、26には、各々逆向きの電流が流れる。これにより、電磁コイル23、24の間と電磁コイル25、26の間に、図7(A)の矢印に示すように、左右逆方向の磁場Mt、Mhを発生させる。図7(B)はこのときの磁束密度の分布を示す。なお図は瞬間の電流の方向を示しており、時間の経過に伴い方向が入れ替わる。   FIG. 7A shows an enlarged cross section viewed from the DD direction in FIG. 6. The electromagnetic coils 23 and 24 and the electromagnetic coils 25 and 26 are respectively symmetrical with respect to the central axis of the plasma torch T1. Has been placed. Then, as shown in FIG. 5, when the alternating current is supplied from the electromagnetic power sources 15 and 16 to the electromagnetic coils 23, 24, 25, and 26, the electromagnetic coils 23 and 24 and the electromagnetic coils 25 and 26 are reversed in direction. Current flows. As a result, magnetic fields Mt and Mh in opposite directions are generated between the electromagnetic coils 23 and 24 and between the electromagnetic coils 25 and 26 as shown by arrows in FIG. FIG. 7B shows the distribution of magnetic flux density at this time. The figure shows the direction of the instantaneous current, and the direction changes with the passage of time.

図8は、本実施の形態によるプラズマアークPの移動状態を示す。交流電流が流れると、電磁コイル23、24、25、26による影響で、図7に示したように、プラズマトーチT1付近と鋳片H付近では逆向きの磁場Mt、Mhが形成される。したがって、前述の図4の実施形態と同様、図8に示すように、プラズマトーチT1付近で例えば図の左方向に移動する力を受けたプラズマアークPは、鋳片Hに近づくと反対の右側へ戻される力を受ける。   FIG. 8 shows a moving state of the plasma arc P according to the present embodiment. When an alternating current flows, magnetic fields Mt and Mh in opposite directions are formed near the plasma torch T1 and the slab H as shown in FIG. 7 due to the influence of the electromagnetic coils 23, 24, 25, and 26. Therefore, as in the embodiment of FIG. 4 described above, as shown in FIG. 8, the plasma arc P that has received a force moving in the left direction of the figure in the vicinity of the plasma torch T1, for example, on the right side opposite to the slab H Receive the power to return to.

本実施形態においては、プラズマアークPを左右に移動させるための磁場Mtを発生する電磁コイル23、24と、鋳片Hの表面付近でプラズマアークPを逆方向に戻すための磁場Mhを発生する電磁コイル25、26とを別体として設けているので、プラズマアークPの入射角をより正確に微調整することができる。プラズマアークPのプラズマ流の速度は、プラズマトーチTを出た直後が最も速く、次第に減速していく。そのため、プラズマトーチT1に近い部分ではプラズマアークPを移動させるために磁場Mtを強くして十分な湾曲を与え、鋳片H付近では磁場Mhを若干弱くした逆方向の力を与えて曲げ戻すことにように調整することが好ましい。本実施の形態においては、電磁コイル23〜26の設置位置を変更することなく、電磁コイル23、24及び電磁コイル25、26へ供給される電流をそれぞれ独立して制御することによって、自由に磁場の調整を行うことができる。したがって、本実施形態は、プラズマ電流や、プラズマトーチTと鋳片Hとの距離、雰囲気中の酸素や窒素濃度の変化等に応じて、簡単な調整により自在に適応できる。   In the present embodiment, electromagnetic coils 23 and 24 that generate a magnetic field Mt for moving the plasma arc P to the left and right, and a magnetic field Mh for returning the plasma arc P in the reverse direction near the surface of the slab H are generated. Since the electromagnetic coils 25 and 26 are provided separately, the incident angle of the plasma arc P can be finely adjusted more accurately. The speed of the plasma flow of the plasma arc P is the fastest immediately after exiting the plasma torch T and gradually decelerates. Therefore, in order to move the plasma arc P in the portion close to the plasma torch T1, the magnetic field Mt is strengthened to give a sufficient curvature, and in the vicinity of the slab H, the magnetic field Mh is slightly weakened to give a reverse force to bend back. It is preferable to adjust as follows. In the present embodiment, the magnetic field is freely controlled by independently controlling the current supplied to the electromagnetic coils 23 and 24 and the electromagnetic coils 25 and 26 without changing the installation positions of the electromagnetic coils 23 to 26. Adjustments can be made. Therefore, the present embodiment can be freely adapted by simple adjustment according to the plasma current, the distance between the plasma torch T and the slab H, the change in oxygen or nitrogen concentration in the atmosphere, and the like.

このように、プラズマアークPを曲げ戻して常に鋳片Hに対して直角に入射するように容易に調整できるので、プラズマアークPの入射幅aが、幅方向Aの位置に関係なく常に一定となる。そのため、この状態で鋳片Hへの入熱を均一にするには、プラズマアークPの移動速度が一定になるように、三角波等の単純な波形の磁場を形成することでもよいため、制御が容易である。   In this way, the plasma arc P can be easily adjusted so that the plasma arc P bends back and is always incident at right angles to the slab H. Therefore, the incident width a of the plasma arc P is always constant regardless of the position in the width direction A. Become. Therefore, in order to make the heat input to the slab H uniform in this state, it is possible to form a simple waveform magnetic field such as a triangular wave so that the moving speed of the plasma arc P is constant. Easy.

さらに、本実施の形態においては、プラズマアークPを移動させるための磁場Mtと曲げ戻すための磁場Mhとを独立して制御できるので、プラズマアークPの左右の振れ幅を自在に調整することができる。したがって、鋳片Hの幅が変動しても、容易に対応できる。   Furthermore, in the present embodiment, since the magnetic field Mt for moving the plasma arc P and the magnetic field Mh for bending back can be controlled independently, it is possible to freely adjust the left and right swing width of the plasma arc P. it can. Therefore, even if the width of the slab H varies, it can be easily handled.

前記した各実施の形態の表層処理装置は,例えば鋳片Hを加熱したり、鋳片Hに炭素などの添加物を供給して,表層溶融改質処理を行う際に使用される。また本発明は,鋳片Hに炭素以外の添加元素やその合金を添加して行われる表層改質処理にも適用できる。さらに本発明の処理対象は、鋳片に限られず,鋼片であってもよい。   The surface layer processing apparatus of each embodiment described above is used when, for example, the slab H is heated or an additive such as carbon is supplied to the slab H to perform the surface layer melt reforming process. The present invention can also be applied to a surface layer reforming process performed by adding an additive element other than carbon or an alloy thereof to the slab H. Furthermore, the object to be treated of the present invention is not limited to a cast slab, and may be a steel slab.

上記の表層処理装置により、鋳片に対してプラズマ加熱溶融による表層改質処理を行った。サンプルとした鋳片は、厚さ100mm、幅100mm、長さ500mmの0.2%質量C鋼であり、その表層を3mm/s及び5mm/sの搬送速度で溶融処理した。プラズマトーチの数は1本とし、プラズマ電流を300A及び500Aで実施した。   With the above surface layer processing apparatus, the surface layer reforming process by plasma heating and melting was performed on the slab. The cast slab used as a sample was 0.2% mass C steel having a thickness of 100 mm, a width of 100 mm, and a length of 500 mm, and the surface layer was melt-treated at a conveying speed of 3 mm / s and 5 mm / s. The number of plasma torches was one, and the plasma current was 300A and 500A.

図9は、本実施例における表層処理装置の部分断面図である。プラズマトーチTの先端と鋳片Hとの距離hを100mmとし、鋳片HからプラズマトーチTまでの距離hの1/4の高さh1、3/4の高さh2の位置において、磁束密度の正負の最大値をそれぞれ6mT及び10mTと設定した。プラズマトーチTの中心軸から搬送方向Bに対して前後方向対称位置に、同じ向きに710Aの電流が流れる電磁コイルを1本ずつ、計2本配置した。前記中心軸から各電磁コイルまでの水平距離dは、40mmである。電磁コイルの鋳片Hの表面からの垂直方向の高さh3が38.3mmのときに、前記所定の磁束密度を有する磁場が得られた。なお、図9は瞬間の電流の方向を示しており、時間の経過に伴い方向が入れ替わる。磁場を発生する交流電流の波形は、図10に示すような三角波とし、周波数を100Hzとした。   FIG. 9 is a partial cross-sectional view of the surface layer processing apparatus in the present embodiment. The distance h between the tip of the plasma torch T and the slab H is 100 mm, and the magnetic flux density is at a height h1 that is 1/4 of the distance h from the slab H to the plasma torch T and at a height h2 that is 3/4. The maximum positive and negative values were set to 6 mT and 10 mT, respectively. A total of two electromagnetic coils, each carrying a current of 710 A in the same direction, were arranged at positions symmetrical with respect to the conveyance direction B from the central axis of the plasma torch T, one by one. A horizontal distance d from the central axis to each electromagnetic coil is 40 mm. When the height h3 in the vertical direction from the surface of the slab H of the electromagnetic coil was 38.3 mm, a magnetic field having the predetermined magnetic flux density was obtained. FIG. 9 shows the direction of the instantaneous current, and the direction is changed over time. The waveform of the alternating current that generates the magnetic field was a triangular wave as shown in FIG. 10, and the frequency was 100 Hz.

また、同じ材料で従来の方法により表面改質処理を行った。従来例は、交流磁場を100Hzの正弦波とし、プラズマトーチと鋳片の間の中間高さ(1/2h)において磁束密度の最大値を3mTとして実施した。さらに、同じ材料で、交流磁場の波形を台形波とした場合についても実施した。台形波については、磁場が一定値となる部分の比率、すなわち図11の波形の幅Fに対する幅Eの値を、10%から90%まで10%ピッチで変化させた波形についてそれぞれ実施した。   Moreover, the surface modification process was performed by the conventional method with the same material. In the conventional example, the AC magnetic field was a sine wave of 100 Hz, and the maximum value of the magnetic flux density was 3 mT at the intermediate height (1/2 h) between the plasma torch and the slab. Furthermore, the same material was used when the alternating magnetic field waveform was trapezoidal. For the trapezoidal wave, the ratio of the portion where the magnetic field becomes a constant value, that is, the value of the width E with respect to the width F of the waveform in FIG.

上記の各条件でそれぞれ表面改質処理を行った後、各材料の溶融処理部の側面を調査した。   After performing the surface modification treatment under each of the above conditions, the side surface of the melt-treated portion of each material was investigated.

本発明の実施例によれば、処理部の中央部の溶融深さが5mm、全処理幅100mmの1/4、3/4の位置の溶融深さも5mmであり、幅方向全体にわたって溶融深さが均一であった。   According to the embodiment of the present invention, the melt depth at the central portion of the processing portion is 5 mm, the melt depth at the 1/4 and 3/4 positions of the total treatment width of 100 mm is also 5 mm, and the melt depth over the entire width direction. Was uniform.

これに対し、従来例のうち交流磁場を正弦波とした場合、処理部の状態は、幅方向中央の溶融深さが6mmで最も深く、端部に向かうに従って次第に浅くなり、全処理幅100mmの1/4、3/4の位置では、溶融深さが4mmであった。   On the other hand, in the conventional example, when the alternating magnetic field is a sine wave, the state of the processing part is deepest when the melting depth at the center in the width direction is 6 mm, and gradually becomes shallower toward the end, and the total processing width is 100 mm. At the 1/4 and 3/4 positions, the melt depth was 4 mm.

また、従来例のうち交流磁場が台形波の場合には、幅方向全体の溶融深さが均一になるときの台形波の条件が、プラズマ電流の大きさによって異なった。すなわち、プラズマ電流が300Aの場合には台形波の磁場一定部の比率が50%、500Aの場合には磁場一定部の比率が70%のときに、最も均一に処理され、その溶融深さは5mmであった。しかし、この場合、プラズマ出力が異なると最適な磁場の波形が異なるため、プラズマ出力毎に予め実験により最適な波形を調べておかなければならない。従って、余分な時間やコストを要した上、台形波の制御には、複雑な制御機構を要した。従って、制御が容易な三角波でも均一な溶融深さが得られた本発明の実施例が好適である。   In the conventional example, when the alternating magnetic field is a trapezoidal wave, the conditions of the trapezoidal wave when the entire melting depth in the width direction is uniform differ depending on the magnitude of the plasma current. That is, when the plasma current is 300 A, the ratio of the trapezoidal wave constant magnetic field part is 50%, and when the plasma current is 500 A, the ratio of the constant magnetic field part is 70%. It was 5 mm. However, in this case, since the optimum magnetic field waveform differs depending on the plasma output, the optimum waveform must be examined beforehand by experiment for each plasma output. Therefore, in addition to requiring extra time and cost, the trapezoidal wave control requires a complicated control mechanism. Therefore, the embodiment of the present invention in which a uniform melting depth is obtained even with a triangular wave that is easy to control is suitable.

実施例1と同様の材料を用いて同様の条件で、電磁コイルの配置が異なる実施例について、プラズマ加熱溶融による表層改質処理を行った。   A surface layer reforming process by plasma heating and melting was performed on examples having different electromagnetic coil arrangements under the same conditions using the same materials as in Example 1.

図12は、本実施例における表層処理装置の部分断面図である。実施例1と同様に、プラズマトーチTの先端と鋳片Hとの距離hを100mmとし、鋳片HからプラズマトーチTまでの距離hの1/4の高さh1、3/4の高さh2において、磁束密度の正負の最大値をそれぞれ6mT及び10mTと設定した。プラズマトーチTの中心軸から搬送方向Bに対して前後方向対称位置に、各4本ずつの電磁コイルを配置した。前記中心軸から各電磁コイルまでの水平距離dは、40mmである。各電磁コイルの垂直方向の高さh4、h5、h6、h7は、それぞれ5mm、45mm、55mm、95mmとした。左右対称位置の電磁コイルには同じ向きの電流を供給した。最もプラズマトーチT寄りの電磁コイルと最も鋳片H寄りの電磁コイルには同じ方向の電流を供給し、その間に配置された電磁コイルには、それらと逆向きの電流を供給した。プラズマトーチT寄りの4本の電磁コイルに430A、鋳片H寄りの4本の電磁コイルに260Aの電流を流したときに、前記所定の磁場が得られた。なお、図12は瞬間の電流の方向を示しており、時間の経過に伴い方向が入れ替わる。磁場を発生する交流電流の波形は、実施例1と同様に三角波とした。   FIG. 12 is a partial cross-sectional view of the surface layer processing apparatus in the present embodiment. As in the first embodiment, the distance h between the tip of the plasma torch T and the slab H is 100 mm, and the height h1, 3/4 of the distance h from the slab H to the plasma torch T is 1/4. At h2, the maximum positive and negative values of the magnetic flux density were set to 6 mT and 10 mT, respectively. Four electromagnetic coils were arranged at positions symmetrical with respect to the conveyance direction B from the central axis of the plasma torch T. A horizontal distance d from the central axis to each electromagnetic coil is 40 mm. The heights h4, h5, h6, and h7 in the vertical direction of each electromagnetic coil were 5 mm, 45 mm, 55 mm, and 95 mm, respectively. Currents in the same direction were supplied to the electromagnetic coils at the symmetrical positions. The current in the same direction was supplied to the electromagnetic coil closest to the plasma torch T and the electromagnetic coil closest to the slab H, and the current in the opposite direction was supplied to the electromagnetic coil arranged therebetween. When a current of 430 A was passed through the four electromagnetic coils near the plasma torch T and 260 A was passed through the four electromagnetic coils near the slab H, the predetermined magnetic field was obtained. FIG. 12 shows the direction of the instantaneous current, and the direction is changed over time. The waveform of the alternating current that generates the magnetic field was a triangular wave as in Example 1.

この条件で表面改質処理を行った後、各材料の溶融処理部の側面を調査したところ、実施例1と同様に、処理部の中央部の溶融深さが5mm、全処理幅100mmの1/4、3/4の位置の溶融深さも5mmであり、幅方向全体にわたって溶融深さが均一であった。なお、本実施例の場合には、磁場の調整が、電磁コイルに供給する電流によって制御できるため、一旦設置した電磁コイルの高さを変更する必要がない。   After performing the surface modification treatment under these conditions, the side surface of the melt-treated portion of each material was examined. As in Example 1, the melt depth at the center of the treated portion was 5 mm and the total treatment width was 100 mm. The melt depth at the positions of / 4 and 3/4 was also 5 mm, and the melt depth was uniform over the entire width direction. In the case of the present embodiment, since the adjustment of the magnetic field can be controlled by the current supplied to the electromagnetic coil, it is not necessary to change the height of the electromagnetic coil once installed.

本発明は、鋳鋼片を幅方向に対して均一に表層処理する際に有用である。   The present invention is useful when a cast steel slab is uniformly surface-treated in the width direction.

第1の実施の形態にかかる表層処理装置の構成の正面からみた概略を示す模式図である。It is a schematic diagram which shows the outline seen from the front of the structure of the surface layer processing apparatus concerning 1st Embodiment. 第1の実施の形態にかかる表層処理装置の構成の平面からみた概略を示す模式図である。It is a schematic diagram which shows the outline seen from the plane of the structure of the surface layer processing apparatus concerning 1st Embodiment. 第1の実施の形態における磁場の状態を示す説明図であり、(A)は図2のC−C方向から見た拡大断面による磁場の説明図、(B)は磁束密度の分布図である。It is explanatory drawing which shows the state of the magnetic field in 1st Embodiment, (A) is explanatory drawing of the magnetic field by the expanded cross section seen from CC direction of FIG. 2, (B) is a distribution map of magnetic flux density. . 図3の交流磁場によるプラズマアークの移動状態を正面から見た説明図である。It is explanatory drawing which looked at the movement state of the plasma arc by the alternating current magnetic field of FIG. 3 from the front. 第2の実施の形態にかかる表層処理装置の構成の正面からみた概略を示す模式図である。It is a schematic diagram which shows the outline seen from the front of the structure of the surface layer processing apparatus concerning 2nd Embodiment. 第2の実施の形態にかかる表層処理装置の構成の平面からみた概略を示す模式図である。It is a schematic diagram which shows the outline seen from the plane of the structure of the surface layer processing apparatus concerning 2nd Embodiment. 第2の実施の形態における磁場の状態を示す説明図であり、(A)は図6のD−D方向から見た拡大断面による磁場の説明図、(B)は磁束密度の分布図である。It is explanatory drawing which shows the state of the magnetic field in 2nd Embodiment, (A) is explanatory drawing of the magnetic field by the expanded cross section seen from the DD direction of FIG. 6, (B) is a distribution map of magnetic flux density. . 図7の交流磁場によるプラズマアークの移動状態を正面から見た説明図である。It is explanatory drawing which looked at the movement state of the plasma arc by the alternating current magnetic field of FIG. 7 from the front. 実施例1を示す断面図である。1 is a cross-sectional view showing Example 1. FIG. 実施例で用いた三角波の波形図である。It is a wave form diagram of the triangular wave used in the Example. 従来例で用いた台形波の波形図である。It is a waveform diagram of the trapezoidal wave used in the conventional example. 実施例2を示す断面図である。6 is a cross-sectional view showing Example 2. FIG. 従来例の磁場の状態を示す説明図であり、(A)は断面による磁場の説明図、(B)は磁束密度の分布図である。It is explanatory drawing which shows the state of the magnetic field of a prior art example, (A) is explanatory drawing of the magnetic field by a cross section, (B) is a distribution map of magnetic flux density. 図13の交流磁場によるプラズマアークの移動状態を正面から見た説明図である。It is explanatory drawing which looked at the movement state of the plasma arc by the alternating current magnetic field of FIG. 13 from the front.

符号の説明Explanation of symbols

1、11 表層処理装置
2 直流電源
3 制御装置
4 主制御装置
5、15、16 交流電源
21、22、23、24、25、26 電磁コイル
A 幅方向
B 搬送方向
H 鋳片
Mt、Mh 磁場
P プラズマアーク
T、T1、T2、T3、T4、T5、T6、T7 プラズマトーチ
DESCRIPTION OF SYMBOLS 1, 11 Surface processing apparatus 2 DC power supply 3 Control apparatus 4 Main control apparatus 5, 15, 16 AC power supply 21, 22, 23, 24, 25, 26 Electromagnetic coil A Width direction B Conveyance direction H Slab Mt, Mh Magnetic field P Plasma arc T, T1, T2, T3, T4, T5, T6, T7 Plasma torch

Claims (7)

鋳鋼片との間にプラズマアークを発生させるプラズマトーチを備えた表層処理装置において、
前記プラズマトーチと前記鋳鋼片の間に、前記プラズマアークを前記鋳鋼片の幅方向に往復移動させる交流磁場と、当該交流磁場の下方に前記交流磁場とは逆向きの交流磁場とを発生させる交流磁場発生装置を有し、
前記交流磁場発生装置は、前記プラズマトーチによって発生するプラズマアークの、鋳鋼片の搬送方向の前後に配置された一対の電磁コイルと、前記一対の電磁コイルに同方向の交流電流を供給する交流電源とを有することを特徴とする、鋳鋼片の表層処理装置。
In the surface treatment apparatus equipped with a plasma torch that generates a plasma arc between cast steel pieces,
Between the plasma torch and the cast steel slab, an alternating magnetic field that reciprocates the plasma arc in the width direction of the cast steel slab, and an alternating current that generates an alternating magnetic field opposite to the alternating magnetic field below the alternating magnetic field. have a magnetic field generating device,
The AC magnetic field generator includes a pair of electromagnetic coils disposed before and after a cast steel slab of a plasma arc generated by the plasma torch, and an AC power source that supplies an alternating current in the same direction to the pair of electromagnetic coils. A surface layer processing apparatus for cast steel pieces, comprising:
前記一対の電磁コイルは、上下方向に移動可能であることを特徴とする、請求項に記載の鋳鋼片の表層処理装置。 The surface treatment apparatus for cast steel pieces according to claim 1 , wherein the pair of electromagnetic coils is movable in the vertical direction. 鋳鋼片との間にプラズマアークを発生させるプラズマトーチを備えた表層処理装置において、
前記プラズマトーチと前記鋳鋼片の間に、前記プラズマアークを前記鋳鋼片の幅方向に往復移動させる交流磁場と、当該交流磁場の下方に前記交流磁場とは逆向きの交流磁場とを発生させる交流磁場発生装置を有し、
前記交流磁場発生装置は、前記プラズマトーチによって発生するプラズマアークの、鋳鋼片の搬送方向の前後にそれぞれ上下に並列配置された片側4本ずつの電磁コイルと、前記電磁コイルに交流電流を供給する交流電源とを有し、
前記プラズマトーチ側の2対の電磁コイルと前記鋳鋼片側の2対の電磁コイルとは互いに逆向きの交流磁場を形成するものであることを特徴とする、鋳鋼片の表層処理装置。
In the surface treatment apparatus equipped with a plasma torch that generates a plasma arc between cast steel pieces,
Between the plasma torch and the cast steel slab, an alternating magnetic field that reciprocates the plasma arc in the width direction of the cast steel slab, and an alternating current that generates an alternating magnetic field opposite to the alternating magnetic field below the alternating magnetic field. have a magnetic field generating device,
The AC magnetic field generation device supplies AC current to each of the four electromagnetic coils arranged in parallel one above the other in front and rear of the transport direction of the cast steel piece of the plasma arc generated by the plasma torch, and the electromagnetic coil. AC power supply,
The surface treatment apparatus for cast steel pieces, wherein the two pairs of electromagnetic coils on the plasma torch side and the two pairs of electromagnetic coils on the cast steel piece side form alternating magnetic fields opposite to each other.
前記プラズマトーチ側の2対の電磁コイルと前記鋳鋼片側の2対の電磁コイルには、異なった交流電源から交流電流が供給されることを特徴とする、請求項に記載の鋳鋼片の表層処理装置。 The surface layer of a cast steel slab according to claim 3 , wherein an alternating current is supplied from different AC power sources to the two pairs of electromagnetic coils on the plasma torch side and the two pairs of electromagnetic coils on the cast steel piece side. Processing equipment. 鋳鋼片との間にプラズマアークを発生させるプラズマトーチを備え、プラズマアークによって鋳鋼片の表層を処理する表層処理方法において、
前記プラズマトーチと前記鋳鋼片の間に、前記プラズマアークを前記鋳鋼片の幅方向に往復移動させる交流磁場と、その下方に前記交流磁場とは逆向きの交流磁場とを発生させることにより、前記プラズマアークの前記鋳鋼片への入射角を制御し、
前記交流磁場と、前記交流磁場とは逆向きの交流磁場は、前記プラズマアークの、鋳鋼片の搬送方向の前後に配置された一対の電磁コイルに対して、同方向の交流電流を供給することによって発生させることを特徴とする、鋳鋼片の表層処理方法。
In the surface layer processing method comprising a plasma torch for generating a plasma arc between the cast steel pieces and processing the surface layer of the cast steel pieces by the plasma arc,
By generating an alternating magnetic field for reciprocating the plasma arc in the width direction of the cast steel piece between the plasma torch and the cast steel piece, and generating an alternating magnetic field opposite to the alternating magnetic field below the alternating magnetic field. Controlling the angle of incidence of the plasma arc on the cast steel slab ,
The alternating magnetic field opposite to the alternating magnetic field supplies an alternating current in the same direction to a pair of electromagnetic coils arranged before and after the plasma arc in the conveying direction of the cast steel slab. The surface layer processing method of the cast steel piece characterized by the above-mentioned.
前記一対の電磁コイルを上下方向に移動させて前記プラズマアークの前記鋳鋼片への入射角をさらに制御することを特徴とする、請求項に記載の鋳鋼片の表層処理方法。 6. The surface treatment method for a cast steel piece according to claim 5 , wherein the pair of electromagnetic coils are moved in the vertical direction to further control an incident angle of the plasma arc to the cast steel piece. 鋳鋼片との間にプラズマアークを発生させるプラズマトーチを備え、プラズマアークによって鋳鋼片の表層を処理する表層処理方法において、
前記プラズマトーチと前記鋳鋼片の間に、前記プラズマアークを前記鋳鋼片の幅方向に往復移動させる交流磁場と、その下方に前記交流磁場とは逆向きの交流磁場とを発生させることにより、前記プラズマアークの前記鋳鋼片への入射角を制御し、
前記プラズマトーチによって発生するプラズマアークの、鋳鋼片の搬送方向の前後にそれぞれ片側4本ずつの電磁コイル上下に並列配置し、前記交流磁場と、前記交流磁場と逆向きの交流磁場は、これらコイルのうち前記プラズマトーチ側の2対の電磁コイルと前記鋳鋼片側の2対の電磁コイルに対して、互いに逆向きの交流電流を供給することによって発生させることを特徴とする、請求項6に記載の鋳鋼片の表層処理方法。
In the surface layer processing method comprising a plasma torch for generating a plasma arc between the cast steel pieces and processing the surface layer of the cast steel pieces by the plasma arc,
By generating an alternating magnetic field for reciprocating the plasma arc in the width direction of the cast steel piece between the plasma torch and the cast steel piece, and generating an alternating magnetic field opposite to the alternating magnetic field below the alternating magnetic field. Controlling the angle of incidence of the plasma arc on the cast steel slab ,
The plasma arc generated by the plasma torch is arranged in parallel above and below four electromagnetic coils on each side before and after the cast steel piece conveying direction, and the alternating magnetic field and the alternating magnetic field opposite to the alternating magnetic field are arranged in these coils. 7, wherein the plasma torch side two pairs of electromagnetic coils and the cast steel piece side two pairs of electromagnetic coils are generated by supplying alternating currents in opposite directions to each other. Surface treatment method for cast steel pieces.
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