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JP5020132B2 - Manufacturing method of solid electrolytic capacitor - Google Patents
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JP5020132B2 - Manufacturing method of solid electrolytic capacitor - Google Patents

Manufacturing method of solid electrolytic capacitor Download PDF

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JP5020132B2
JP5020132B2 JP2008067602A JP2008067602A JP5020132B2 JP 5020132 B2 JP5020132 B2 JP 5020132B2 JP 2008067602 A JP2008067602 A JP 2008067602A JP 2008067602 A JP2008067602 A JP 2008067602A JP 5020132 B2 JP5020132 B2 JP 5020132B2
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oxide film
dielectric oxide
insulating layer
anode body
electrolytic capacitor
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JP2009224568A (en
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良樹 濱
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ホリストン ポリテック株式会社
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Description

本発明は固体電解コンデンサの製造方法に係わり、特に陽極体の表面に陽極酸化により形成された誘電体酸化膜を備え、かつ、この誘電体酸化膜上に絶縁層を備えている固体電解コンデンサの製造方法に関するものである。   The present invention relates to a method for manufacturing a solid electrolytic capacitor, and more particularly, to a solid electrolytic capacitor comprising a dielectric oxide film formed by anodic oxidation on the surface of an anode body, and an insulating layer on the dielectric oxide film. It relates to a manufacturing method.

従来、陽極体を弁作用金属、例えば、タンタル、ニオブ、アルミニウムで形成し、この陽極体表面に陽極酸化により誘電体酸化膜を形成し、その誘電体酸化膜表面に固体電解質を形成した固体電解コンデンサにおいて、これまで固体電解質に二酸化マンガン(MnO)や7,7’,8,8’−テトラシアノキノジメタン(TCNQ)錯塩が用いられていた。
しかし、二酸化マンガンは電導度が十分でないため、高い周波数における固体電解コンデンサのインピーダンスを十分低下させることができず、また、TCNQ錯塩は熱分解しやすく、固体電解コンデンサの耐熱性が不十分であるといった不具合も有しているため、最近では、二酸化マンガンより高導電度であり、耐熱性に優れた導電性高分子、例えばポリピロールやポリアニリンを固体電解質に用いた固体電解コンデンサが開発されつつある。
Conventionally, an anode body is formed of a valve action metal such as tantalum, niobium, and aluminum, a dielectric oxide film is formed on the surface of the anode body by anodization, and a solid electrolyte is formed on the surface of the dielectric oxide film. In capacitors, manganese dioxide (MnO 2 ) and 7,7 ′, 8,8′-tetracyanoquinodimethane (TCNQ) complex salts have been used as solid electrolytes.
However, since manganese dioxide has insufficient conductivity, the impedance of the solid electrolytic capacitor at a high frequency cannot be sufficiently reduced, and the TCNQ complex salt is easily thermally decomposed, and the heat resistance of the solid electrolytic capacitor is insufficient. Recently, solid electrolytic capacitors using a conductive polymer having higher conductivity than manganese dioxide and excellent heat resistance, such as polypyrrole or polyaniline, are being developed recently.

ところで、陽極体に弁作用金属を用い、加圧成形して焼結して焼結体を形成し、その焼結体を陽極酸化した誘電体酸化膜を誘電体として用いるこの種の固体電解コンデンサにおいては、リーク電流が大きく固体電解コンデンサの特性に悪影響を及ぼしていた。
そこで、特許文献1では、金属タンタルを陽極体として陽極酸化により形成した誘電体酸化膜の表面に直接導電性物質が接触することが、リーク電流の特性劣化の原因であることを明らかにし、誘電体酸化膜と固体電解質との間に、絶縁物を溶剤に溶かして塗布して絶縁層を形成し、固体電解コンデンサを形成したり、誘電体酸化膜の表面に化学酸化重合反応により導電性高分子を形成後、電解重合により絶縁層を形成し、その上に化学酸化重合反応により導電性高分子を形成して固体電解コンデンサを形成したりしていた。
特開2000−133556公報
By the way, this type of solid electrolytic capacitor using a valve metal as an anode body, forming a sintered body by pressure molding and sintering, and using a dielectric oxide film obtained by anodizing the sintered body as a dielectric body However, the leakage current is large and adversely affects the characteristics of the solid electrolytic capacitor.
Therefore, in Patent Document 1, it is clarified that the direct contact of the conductive material with the surface of the dielectric oxide film formed by anodic oxidation using metal tantalum as the anode body is the cause of deterioration of the leakage current characteristics. An insulator is dissolved in a solvent and applied between the body oxide film and the solid electrolyte to form an insulating layer, and a solid electrolytic capacitor is formed, or the surface of the dielectric oxide film is made highly conductive by a chemical oxidative polymerization reaction. After forming the molecule, an insulating layer is formed by electrolytic polymerization, and a conductive polymer is formed thereon by a chemical oxidative polymerization reaction to form a solid electrolytic capacitor.
JP 2000-133556 A

しかしながら、特許文献1のように、誘電体酸化膜と固体電解質との間に、絶縁層にしようとする物質を溶剤に溶かして塗布した場合、塗りむらが起こりやすく、未塗布部分をなくすために、塗り重ねした場合、絶縁層の膜厚が厚くなってしまいコンデンサとしての抵抗が増加してしまう。
また、特許文献1のように、誘電体酸化膜の表面に化学酸化重合反応により導電性高分子を形成後、電解重合により絶縁層を形成し、その上に化学酸化重合反応により導電性高分子を形成した場合、誘電体酸化膜の表面に直接導電性物質が接触することと、導電性高分子層と導電性高分子層との間に絶縁層があるため、固体電解質の導電性が低下してしまう。
また、電気泳動法や電解重合法などの方法は、薄い絶縁層を均一に形成する方法があるが、電圧をかけて成膜するために、一般的に電気的導体表面に形成される必要があり、従来この方法は、電気的導体の表面に設けた誘電体酸化膜の、電気的導体部分である欠損部分に集中的に絶縁体を設けてリーク電流を減少させることに使用してきた。
ところが、金属タンタルを陽極体として陽極酸化により形成した、電気的絶縁表面である誘電体酸化膜の表面に直接導電性物質が接触することが、リーク電流の特性劣化の原因であるために、単に絶縁膜の、電気的導体である欠損部分に絶縁体を設けたとしても、リーク電流の問題を抜本的に解決したとは言えない。
However, as disclosed in Patent Document 1, when a substance intended to be an insulating layer is applied between a dielectric oxide film and a solid electrolyte in a solvent, uneven coating is likely to occur, and in order to eliminate uncoated portions. In the case of repeated coating, the thickness of the insulating layer increases and the resistance as a capacitor increases.
Further, as in Patent Document 1, after forming a conductive polymer by a chemical oxidative polymerization reaction on the surface of a dielectric oxide film, an insulating layer is formed by electrolytic polymerization, and a conductive polymer is formed thereon by a chemical oxidative polymerization reaction. In this case, the conductivity of the solid electrolyte is reduced because the conductive material is in direct contact with the surface of the dielectric oxide film and there is an insulating layer between the conductive polymer layer and the conductive polymer layer. Resulting in.
In addition, methods such as electrophoresis and electrolytic polymerization have a method of forming a thin insulating layer uniformly. However, in order to form a film by applying a voltage, it is generally necessary to form it on the surface of an electrical conductor. In the prior art, this method has been used to reduce the leakage current by intensively providing an insulator in a defective portion of the dielectric oxide film provided on the surface of the electrical conductor.
However, the direct contact of the conductive material with the surface of the dielectric oxide film, which is an electrically insulating surface, formed by anodizing with metal tantalum as the anode body, is the cause of the deterioration of leakage current characteristics. Even if an insulator is provided in the missing portion of the insulating film, which is an electrical conductor, it cannot be said that the problem of leakage current has been drastically solved.

本発明は、上記した問題を解決するためになされたものであり、誘電体酸化膜と固体電解質との間に絶縁層を形成するのに、誘電体酸化膜を形成したタンタル陽極体をマイナス側とし、ハロゲン化モノマ含有の溶液内の対極をプラス側として電解重合法方法により行うことにより、誘電体酸化膜の欠損部分と、誘電体酸化膜表面全体に薄い絶縁層を均一に形成することができ、固体電解コンデンサのリーク電流の問題を抜本的に解決することが可能な固体電解コンデサの製造方法を提供することを目的とする。 The present invention has been made in order to solve the above-described problems. In order to form an insulating layer between a dielectric oxide film and a solid electrolyte, the tantalum anode body on which the dielectric oxide film is formed is provided on the negative side. By performing the electrolytic polymerization method with the counter electrode in the halogenated monomer-containing solution as the positive side, a thin insulating layer can be uniformly formed on the dielectric oxide film defects and the entire surface of the dielectric oxide film. An object of the present invention is to provide a method for manufacturing a solid electrolytic capacitor capable of drastically solving the problem of leakage current of a solid electrolytic capacitor.

本発明は、上記課題を解決するために、弁作用金属からなる陽極体と、該陽極体の表面に陽極酸化により形成された誘電体酸化膜と、該誘電体酸化膜上に設けた絶縁層と、該絶縁層上に設けた導電性高分子の固体電解質と、を有する固体電解コンデンサにおいて、前記誘電体酸化膜を形成した前記陽極体をマイナス側とし、ハロゲン化モノマ含有の溶液内の対極をプラス側として電解重合をおこない、前記誘電体酸化膜表面全体に絶縁性の高分子膜の前記絶縁層を形成する固体電解コンデンサの製造方法を提供するものである。   In order to solve the above problems, the present invention provides an anode body made of a valve metal, a dielectric oxide film formed on the surface of the anode body by anodization, and an insulating layer provided on the dielectric oxide film And a solid electrolyte capacitor of a conductive polymer provided on the insulating layer, wherein the anode body on which the dielectric oxide film is formed is a negative side, and a counter electrode in a solution containing a halogenated monomer Is provided on the positive side, and a method for producing a solid electrolytic capacitor is provided in which the insulating layer of an insulating polymer film is formed on the entire surface of the dielectric oxide film.

本発明によれば、誘電体酸化膜と固体電解質との間に絶縁層を形成するのに、溶剤に溶かして塗布せずに、誘電体酸化膜を形成したタンタル陽極体をマイナス側とし、ハロゲン化モノマ含有の溶液内の対極をプラス側として電解重合法方法により行うことにより、誘電体酸化膜の欠損部分と、誘電体酸化膜表面全体に薄い絶縁層を均一に形成することができ、固体電解コンデンサのリーク電流の問題を抜本的に解決することが可能な固体電解コンデンサの製造方法を提供することができる。
According to the present invention, in order to form the insulating layer between the dielectric oxide film and the solid electrolyte, the tantalum anode body in which the dielectric oxide film is formed without being dissolved and applied in a solvent is set to the negative side, By performing the electropolymerization method with the counter electrode in the solution containing the fluorinated monomer as the positive side, a thin insulating layer can be uniformly formed on the dielectric oxide film defects and the entire surface of the dielectric oxide film. It is possible to provide a method of manufacturing a solid electrolytic capacitor capable of drastically solving the problem of leakage current of the electrolytic capacitor.

本発明に述べる陽極体は、タンタルまたはニオブなどを多孔質焼結体にして表面積を拡大したものや、アルミニウム箔等をエッチングして表面積を拡大したものなどが含まれる。多孔質焼結体の場合は、一端に陽極用リードを埋め込んだものが使用される。   Anode bodies described in the present invention include those in which tantalum or niobium or the like is used as a porous sintered body to increase the surface area, and those in which aluminum foil or the like is etched to increase the surface area. In the case of a porous sintered body, one in which an anode lead is embedded at one end is used.

本発明に述べる固体電解質は、例えばポリピロール、ポリチオフェン、ポリアニリンなどの導電性高分子をさす。
導電性高分子を形成するには、チオフェン、アニリン、ピロール若しくはそれらの誘導体を重合させる。重合は、化学重合、電解重合、またはそれらの組み合わせにより行うことができる。
The solid electrolyte described in the present invention refers to a conductive polymer such as polypyrrole, polythiophene, or polyaniline.
To form a conductive polymer, thiophene, aniline, pyrrole or their derivatives are polymerized. The polymerization can be performed by chemical polymerization, electrolytic polymerization, or a combination thereof.

本発明に述べるハロゲン化モノマは、少なくとも1個のハロゲン原子で置換されている重合可能なモノマをさす。
例えば、テトラブロモ−o−ベンゾキノン、2,4,4,6−テトラブロモ−2,5−シクロヘキサジエノン、ジクロロアセトアルデヒドジエチルアセタール、テトラクロロシクロプロパン、1,3−ジクロロアセトン、1,3−ジブロモプロパン、1,6−ジブロモヘキサン、2−クロロアクリロニトリル、エチル トリクロロアセテート、1,2,3−トリクロロプロパン、1,1,2−トリクロロエタン、ブチル クロロホーメート、トリクロロエチレン、2,3−ジクロロマレイン酸無水物、1,12−ジブロモドデカン、ヘキサクロロ−1,3−ブタジエン、ヘキサクロロシクロペンタジエン、パークロロブタジエン、パークロロシクロペンタジエン、1,4−ジクロロブト−2−エン、1,3−ジクロロブト−2−エン、3,4−ジクロロブト−1−エン、ジクロロ−o−キシレン、ジブロモ−m−キシレン、ジブロモ−p−キシレン、ジブロモ−2−メトキシ−5−シアノ−p−キシレン、ジブロモ−2−メトキシ−p−キシレン、ジブロモ−2−シアノ−p−キシレン、ジブロモ−テトラフルオロ−p−キシレン、2,3,5,6−ヘキサクロロ−p−キシレン、2,5−ジクロルチオフェン、2,5−ジクロルピリジン、ジブロモスチレン、ジクロロベンゼン、ヘキサブロモベンゼン、1,4−ビス(トリクロロメチル)ベンゼン、2,5−ジクロロニトロベンゼン、2,5−ジクロロベンゾニトリル、2,3−ジクロロ−5,6−ジシアノベンゾキノン、1−ブロモ−2−クロロエタン、1−ブロモ−2−クロロプロパン、2−ブロモエチル 、ジブロモ−N−ヒドロキシフタルイミド、1,1−ジブロモ−2,2−ビス(4−ヒドロキシフェニル)エチレン、ジブロモスチレン、1,9−ジクロロ−2,2−パラシクロフェンなどが使用できる。
Halogenated monomers described in this invention refer to polymerizable monomers that are substituted with at least one halogen atom.
For example, tetrabromo-o-benzoquinone, 2,4,4,6-tetrabromo-2,5-cyclohexadienone, dichloroacetaldehyde diethyl acetal, tetrachlorocyclopropane, 1,3-dichloroacetone, 1,3-dibromopropane, 1,6-dibromohexane, 2-chloroacrylonitrile, ethyl trichloroacetate, 1,2,3-trichloropropane, 1,1,2-trichloroethane, butyl chloroformate, trichloroethylene, 2,3-dichloromaleic anhydride, 1,12-dibromododecane, hexachloro-1,3-butadiene, hexachlorocyclopentadiene, perchlorobutadiene, perchlorocyclopentadiene, 1,4-dichlorobut-2-ene, 1,3-dichlorobut-2-ene, 3, 4- Chlorobut-1-ene, dichloro-o-xylene, dibromo-m-xylene, dibromo-p-xylene, dibromo-2-methoxy-5-cyano-p-xylene, dibromo-2-methoxy-p-xylene, dibromo- 2-cyano-p-xylene, dibromo-tetrafluoro-p-xylene, 2,3,5,6-hexachloro-p-xylene, 2,5-dichlorothiophene, 2,5-dichloropyridine, dibromostyrene, Dichlorobenzene, hexabromobenzene, 1,4-bis (trichloromethyl) benzene, 2,5-dichloronitrobenzene, 2,5-dichlorobenzonitrile, 2,3-dichloro-5,6-dicyanobenzoquinone, 1-bromo- 2-chloroethane, 1-bromo-2-chloropropane, 2-bromoethyl, dibromo-N-hy B carboxymethyl phthalimide, 1,1-dibromo-2,2-bis (4-hydroxyphenyl) ethylene, dibromostyrene, etc. 1,9-dichloro-2,2-paracyclophane Fen can be used.

本発明に述べる絶縁層は、誘電体酸化膜の欠損部分と誘電体酸化膜表面全体に設けた高分子重合層で、上記ハロゲン化モノマ含有の溶液中で、誘電体酸化膜を形成した陽極体をマイナス側とし、ハロゲン化モノマ含有の溶液内の対極をプラス側として電解重合をおこなうことにより形成される。
誘電体酸化膜表面の絶縁層の厚さは、0.1nmから100nm程度が好ましい。
この電解重合は、陽極体重量あたりの電流を0.1mA/gから2.0mA/gの間の一定電流の、成膜速度一定で重合電解をおこなう。陽極体重量あたり0.1mA/g未満であると、成膜速度が遅く、2.0mA/gより大きいと陽極体が発熱しやすい。
溶媒には、たとえば、テトラヒドロフラン、アセトニトリル、N、N−ジメチルホルムアミド、プロピレンカーボネイト、1,2−ジメトキシエタン、スルホラン、ニトロメタン、γ−ブチロラクトンなど特に限定なく使用できる。
支持電解質には、たとえば、トリエチルメチルアンモニウムテトラフロロボレート、テトラブチルアンモニウムテトラフロロボレートなどの4級塩アンモニウムのテトラフロロボレート塩、パーフルオロメタンスルホン酸塩、過塩素酸テトラーn―ブチルアンモニウムなどの4級塩アンモニウムの過塩素酸塩など特に限定なく使用できる。
The insulating layer described in the present invention is a polymerized layer provided on the defect portion of the dielectric oxide film and the entire surface of the dielectric oxide film, and an anode body in which the dielectric oxide film is formed in the halogenated monomer-containing solution. Is the negative side, and the counter electrode in the halogenated monomer-containing solution is the positive side.
The thickness of the insulating layer on the surface of the dielectric oxide film is preferably about 0.1 nm to 100 nm.
In this electropolymerization, polymerization electrolysis is performed at a constant film formation rate at a constant current between 0.1 mA / g and 2.0 mA / g. When the anode body weight is less than 0.1 mA / g, the film formation rate is slow, and when it is more than 2.0 mA / g, the anode body tends to generate heat.
As the solvent, for example, tetrahydrofuran, acetonitrile, N, N-dimethylformamide, propylene carbonate, 1,2-dimethoxyethane, sulfolane, nitromethane, γ-butyrolactone and the like can be used without particular limitation.
Examples of the supporting electrolyte include tetrafluoroborate salts of quaternary salts such as triethylmethylammonium tetrafluoroborate and tetrabutylammonium tetrafluoroborate, perfluoromethanesulfonate, tetra-n-butylammonium perchlorate and the like. A perchlorate of a quaternary salt ammonium can be used without any particular limitation.

本発明の誘電体酸化膜を形成した陽極体をマイナス側とし、ハロゲン化モノマ含有の溶液をプラス側として重合電解を行った場合、電子は陽極酸化により形成された誘電体酸化膜を比較的容易に移動し、誘電体酸化膜全面で流れるため、全面に重合電解膜が形成される。この重合電解膜により、電気的絶縁表面である誘電体酸化膜の表面に直接導電性物質が接触することがないため、リーク電流の問題を根本的に解決することができる。また、誘電体酸化膜の欠陥部分は誘電体酸化膜の良好な部分より抵抗が低いので、まず、誘電体酸化膜の欠陥部分から重合が始まる。そのため、酸化被膜の欠陥部分にも十分絶縁体で覆うことになるのでリーク電流を減少させることができる。また、かける電圧が、弁作用金属がイオンになりにくい方向なので、弁作用金属がイオンとなって溶け出して、弁作用金属と重合膜の界面が不安定になることがない。そのため、誘電体酸化膜の欠陥部分に良好に絶縁膜の蓋をすることができる。
逆に、誘電体酸化膜を形成した陽極体をプラス側にし、ハロゲン化モノマ含有の溶液をマイナス側として電圧をかけ重合電解をおこなった場合、電子は陽極酸化により形成された誘電体酸化膜を移動が困難で、誘電体酸化膜の欠損部分に集中して流れるため、その部分にしか重合電解膜が形成されないことになってしまい、誘電体酸化膜の表面に直接導電性物質が接触することになる。そのため、リーク電流の問題を根本的に解決することができない。また、誘電体酸化膜の欠損部分は、この向きに電圧かけても酸化膜ができにくい部分であるために、この向きに重合電解を行うと、誘電体酸化膜の欠損部分で弁作用金属がイオンとなって溶け出しやすいため、弁作用金属と重合膜の界面は安定な部分とは言い難い。
また、陽極体が発熱しない程度の電流で一定に規制して重合電解をおこなうと、大電流が流れて陽極体が発熱し、破壊してしまう恐れもない。
When polymerization electrolysis is performed with the negative electrode formed with the dielectric oxide film of the present invention on the negative side and the halogenated monomer-containing solution on the positive side, electrons are relatively easy to the dielectric oxide film formed by anodic oxidation. And flows over the entire surface of the dielectric oxide film, so that a polymer electrolyte membrane is formed on the entire surface. With this polymerized electrolytic film, the conductive material is not directly in contact with the surface of the dielectric oxide film, which is an electrically insulating surface, so that the problem of leakage current can be fundamentally solved. Further, since the resistance of the defective portion of the dielectric oxide film is lower than that of the good portion of the dielectric oxide film, the polymerization starts from the defective portion of the dielectric oxide film. Therefore, the defective portion of the oxide film is sufficiently covered with the insulator, so that the leakage current can be reduced. Further, since the applied voltage is such that the valve metal is less likely to become ions, the valve metal does not melt as ions and the interface between the valve metal and the polymerized film does not become unstable. Therefore, the insulating film can be satisfactorily covered with the defective portion of the dielectric oxide film.
On the other hand, when the electrolysis is carried out by applying a voltage with the anode body on which the dielectric oxide film is formed on the positive side and the halogenated monomer-containing solution on the negative side, the electrons are transferred to the dielectric oxide film formed by the anodic oxidation. Because it is difficult to move and flows concentrated on the defective portion of the dielectric oxide film, the polymer electrolyte membrane is formed only on that portion, and the conductive material is in direct contact with the surface of the dielectric oxide film. become. Therefore, the problem of leakage current cannot be fundamentally solved. In addition, since the defective portion of the dielectric oxide film is a portion where it is difficult to form an oxide film even when a voltage is applied in this direction, when the polymerization electrolysis is performed in this direction, the valve metal is formed at the defective portion of the dielectric oxide film. Since it is easy to melt as ions, the interface between the valve metal and the polymerized film is hardly a stable part.
In addition, when the polymerization electrolysis is performed with a constant current that does not cause the anode body to generate heat, a large current flows and the anode body does not generate heat and may not be destroyed.

以下、本発明を図面に示す実施の形態に基づいて説明する。
図1は、本発明の固体電解コンデンサの断面図を模式的に示している。
1は、陽極用リードで、タンタル、ニオブまたはアルミニウム等の弁作用金属の、直径が0.1mmから0.5mm程度の線状や、厚さ0.1mmから0.5mm程度の短冊薄板状からなる。
2は、コンデンサ素子で、陽極用リード1の一端を埋め込んで、タンタルやニオブまたはアルミニウム等の弁作用金属の、平均粒径1μm程度の微粉末に、アクリルやカンファー等のバインダーを混合した粉末をプレス加圧成形し、次いで真空中において焼結して形成した海綿状の陽極体3と、この陽極体3に誘電体酸化膜4とを設けたものである。
5は、絶縁層で、誘電体酸化膜4の欠落部分14と誘電体酸化膜4表面全体に設けた絶縁性の高分子膜からなる。
6は、固体電解質層で、絶縁層5の表面に設けた導電性の高分子などからなる。
7は、集電体層で、固体電解質層6の表面に設け、カーボン層と銀層とを順次設けたものなどからなる。
8は、陰極端子板で、導電性接着剤9等により集電体層7に接続される。
10は、陽極端子板で、抵抗溶接やレーザ溶接等の溶接や導電性接着剤により陽極用リード1に接続される。
11は、外装で、エポキシ樹脂等の封止樹脂等でコンデンサ素子等を封止する。陰極端子板8と陽極端子板10の導出部分は、図1ではコンデンサ本体方向に折れ込まれているが、逆に、下側から外側へと広がっていてもかまわない。陰極端子板8や陽極端子板10などの外部導出方法に特に限定はない。
Hereinafter, the present invention will be described based on embodiments shown in the drawings.
FIG. 1 schematically shows a cross-sectional view of the solid electrolytic capacitor of the present invention.
Reference numeral 1 denotes an anode lead, which is made of a valve metal such as tantalum, niobium, or aluminum having a diameter of about 0.1 mm to 0.5 mm, or a strip-shaped plate having a thickness of about 0.1 mm to 0.5 mm. Become.
Reference numeral 2 denotes a capacitor element, in which one end of an anode lead 1 is embedded, and a powder obtained by mixing a valve metal such as tantalum, niobium, or aluminum with a fine powder having an average particle diameter of about 1 μm and a binder such as acrylic or camphor. A sponge-like anode body 3 formed by press-pressing and then sintered in a vacuum, and a dielectric oxide film 4 are provided on the anode body 3.
Reference numeral 5 denotes an insulating layer made of an insulating polymer film provided on the missing portion 14 of the dielectric oxide film 4 and the entire surface of the dielectric oxide film 4.
Reference numeral 6 denotes a solid electrolyte layer made of a conductive polymer provided on the surface of the insulating layer 5.
A current collector layer 7 is provided on the surface of the solid electrolyte layer 6 and includes a carbon layer and a silver layer sequentially provided.
A cathode terminal plate 8 is connected to the current collector layer 7 by a conductive adhesive 9 or the like.
Reference numeral 10 denotes an anode terminal plate, which is connected to the anode lead 1 by welding such as resistance welding or laser welding or a conductive adhesive.
Reference numeral 11 denotes an exterior that seals the capacitor element and the like with a sealing resin such as an epoxy resin. The lead-out portions of the cathode terminal plate 8 and the anode terminal plate 10 are folded in the direction of the capacitor body in FIG. 1, but conversely, they may extend from the lower side to the outside. There is no particular limitation on the external lead-out method of the cathode terminal plate 8 and the anode terminal plate 10.

図2は、本発明の、絶縁性の高分子膜からなる絶縁層の形成方法を模式的に示している。
絶縁層5の形成は、コンデンサ素子2をハロゲン化モノマ含有の溶液12中に浸漬させ、コンデンサ素子2から導出した陽極用リード1をマイナス側とし、ハロゲン化モノマ含有の溶液12内の対極13をプラス側として電解重合をおこなう。
FIG. 2 schematically shows a method for forming an insulating layer made of an insulating polymer film according to the present invention.
The insulating layer 5 is formed by immersing the capacitor element 2 in the halogenated monomer-containing solution 12 so that the anode lead 1 led out from the capacitor element 2 is on the negative side, and the counter electrode 13 in the halogenated monomer-containing solution 12 is formed. Perform electropolymerization as the positive side.

〔実施例1〕
まず、金属タンタルの微粉末の中に、陽極リードの一端部を挿通した状態にして加圧成形し、得られた成形体を真空中において高温度で焼結し、0.5mm×0.5mm×1.0mmの焼結体からなる陽極体を形成する。次に、得られた陽極体を希硝酸水溶液中に浸漬し、その後に化成処理を行って、陽極体表面に25Vの誘電体酸化膜を形成し、10μFのコンデンサとした。
次いで、電解重合のモノマとして0.1Mのジブロモ−p−キシレン、支持電解質として0.1Mの過塩素酸テトラーn―ブチルアンモニウムをアセトニトリル中に溶解した電解液に上記の陽極体を浸漬し、電流を0.5mA/gの一定電流で重合電解を行ない、平均厚さ5nmの絶縁層を形成した。
続いて、0.5Mペルオキソ二硫酸アンモニウム水溶液を調整し、絶縁層を形成した陽極体を0.5Mペルオキソ二硫酸アンモニウム水溶液に10秒浸漬した。次に、等量のアニリンとp−フェノールスルホン酸の水溶液で濃度が0.5Mのアニリン溶液を調整した。そして、0.5Mペルオキソ二硫酸アンモニウム水溶液の浸漬を行ってから30分後に、陽極体をアニリン溶液に10秒浸漬した。次いで、アニリン溶液の浸漬を行った後、陽極体を30分間50℃に保持して、陽極体上で化学酸化重合反応を生じさせた。さらに、陽極体に対して、前記ペルオキソ二硫酸アンモニウム水溶液への浸漬および前記アニリン溶液への浸漬を交互に20回づつおこない、陽極体の表面に化学酸化重合反応によって得られた導電性高分子の固体電解質層を形成した。
続いて、陽極体の所定箇所にカーボンペーストと銀ペーストを塗布し、集電体層を形成した。
次に、陽極リードの他端部に陽極端子を溶接によって導電接続し、集電体層に導電性接着剤を介して陰極端子を接続した。
続いて、陽極端子および陰極端子の導出端部を除いてモールド法により樹脂を全体に塗布し、外装で被覆された固体電解コンデンサ(タンタルコンデンサ)を作製した。
[Example 1]
First, in a fine powder of metal tantalum, one end of the anode lead is inserted and pressure-molded, and the resulting molded body is sintered at a high temperature in a vacuum, 0.5 mm × 0.5 mm An anode body made of a sintered body of × 1.0 mm is formed. Next, the obtained anode body was immersed in a dilute nitric acid aqueous solution, and then a chemical conversion treatment was performed to form a 25 V dielectric oxide film on the surface of the anode body to obtain a 10 μF capacitor.
Next, the anode body was immersed in an electrolytic solution in which 0.1 M dibromo-p-xylene as a monomer for electrolytic polymerization and 0.1 M tetra-n-butylammonium perchlorate as a supporting electrolyte were dissolved in acetonitrile, Was subjected to polymerization electrolysis at a constant current of 0.5 mA / g to form an insulating layer having an average thickness of 5 nm.
Subsequently, a 0.5 M ammonium peroxodisulfate aqueous solution was prepared, and the anode body on which the insulating layer was formed was immersed in a 0.5 M ammonium peroxodisulfate aqueous solution for 10 seconds. Next, an aniline solution having a concentration of 0.5 M was prepared with an equal amount of an aniline and p-phenolsulfonic acid aqueous solution. Then, 30 minutes after the immersion in the 0.5 M aqueous ammonium peroxodisulfate solution, the anode body was immersed in the aniline solution for 10 seconds. Next, after immersing the aniline solution, the anode body was held at 50 ° C. for 30 minutes to cause a chemical oxidative polymerization reaction on the anode body. Further, the anode body is alternately immersed in the ammonium peroxodisulfate aqueous solution and the aniline solution 20 times alternately, and the surface of the anode body is a conductive polymer solid obtained by a chemical oxidative polymerization reaction. An electrolyte layer was formed.
Then, the carbon paste and the silver paste were apply | coated to the predetermined location of the anode body, and the electrical power collector layer was formed.
Next, an anode terminal was conductively connected to the other end of the anode lead by welding, and a cathode terminal was connected to the current collector layer via a conductive adhesive.
Subsequently, the resin was applied to the whole by a molding method except for the lead-out end portions of the anode terminal and the cathode terminal, and a solid electrolytic capacitor (tantalum capacitor) covered with an exterior was produced.

〔実施例2−4〕
ジブロモ−p−キシレンを、ジクロロ−p−キシレン、ジブロモスチレン、またはヘキサクロロ−1、3−ブタジエンに変更する以外、実施例1と同様に固体電解コンデンサを作製した。また、この絶縁層を省いた以外、実施例1と同様に固体電解コンデンサを作製したものを比較例1として、リーク電流を比較し、表1に示す。なお、表1のリーク電流は、7Vを印加し1分後のリーク電流を示す。
[Example 2-4]
A solid electrolytic capacitor was produced in the same manner as in Example 1 except that dibromo-p-xylene was changed to dichloro-p-xylene, dibromostyrene, or hexachloro-1,3-butadiene. Further, except that this insulating layer was omitted, the leakage current was compared as shown in Table 1 as a comparative example 1 in which a solid electrolytic capacitor was produced in the same manner as in Example 1. In addition, the leakage current of Table 1 shows the leakage current 1 minute after applying 7V.

Figure 0005020132
Figure 0005020132

表1において、絶縁層を形成した本実施例の固体電解コンデンサのリーク電流は0.16〜0.23μAの範囲であり、比較例1のリーク電流は2.5μAある。このように本実施例の固体電解コンデンサのリーク電流は大幅に低減している。
以上種々説明してきたように本発明によれば、誘電体酸化膜の欠損部分と導電性高分子層(固体電解質)との間、および誘電体酸化膜と導電性高分子層(固体電解質)との間に、絶縁層が設けられていることから、この絶縁層により、陽極酸化にて形成された誘電体酸化膜の表面に直接導電性物質が接触することはなくなり、したがって、大幅にリーク電流を低減することができる。
In Table 1, the leakage current of the solid electrolytic capacitor of this example in which the insulating layer is formed is in the range of 0.16 to 0.23 μA, and the leakage current of Comparative Example 1 is 2.5 μA. Thus, the leakage current of the solid electrolytic capacitor of this embodiment is greatly reduced.
As described above, according to the present invention, the dielectric oxide film and the conductive polymer layer (solid electrolyte) and the dielectric oxide film and the conductive polymer layer (solid electrolyte) Since an insulating layer is provided between the conductive material and the conductive layer, the insulating layer does not directly contact the surface of the dielectric oxide film formed by anodic oxidation. Can be reduced.

本発明の固体電解コンデンサの断面図を模式的に示している。1 schematically shows a cross-sectional view of a solid electrolytic capacitor of the present invention. 本発明の絶縁性の高分子膜の絶縁層を形成方法を模式的に示している。The formation method of the insulating layer of the insulating polymer film of this invention is typically shown.

符号の説明Explanation of symbols

1…陽極用リード 2…コンデンサ素子 3…陽極体 4…誘電体酸化膜 5…絶縁層 6…固体電解質層 7…集電体層 8…陰極端子板 9…導電性接着剤 10…陽極端子板 11…外装 12…溶液 13…対極 14…欠落部分。   DESCRIPTION OF SYMBOLS 1 ... Lead for anode 2 ... Capacitor element 3 ... Anode body 4 ... Dielectric oxide film 5 ... Insulating layer 6 ... Solid electrolyte layer 7 ... Current collector layer 8 ... Cathode terminal board 9 ... Conductive adhesive 10 ... Anode terminal board 11 ... Exterior 12 ... Solution 13 ... Counter electrode 14 ... Missing part.

Claims (1)

弁作用金属からなる陽極体と、該陽極体の表面に陽極酸化により形成された誘電体酸化膜と、該誘電体酸化膜上に設けた絶縁層と、該絶縁層上に設けた導電性高分子の固体電解質と、を有する固体電解コンデンサにおいて、前記誘電体酸化膜を形成した前記陽極体をマイナス側とし、ハロゲン化モノマ含有の溶液内の対極をプラス側として電解重合をおこない、前記誘電体酸化膜表面全体に絶縁性の高分子膜の前記絶縁層を形成する固体電解コンデンサの製造方法。   An anode body made of a valve metal, a dielectric oxide film formed by anodic oxidation on the surface of the anode body, an insulating layer provided on the dielectric oxide film, and an electrically conductive high electrode provided on the insulating layer In a solid electrolytic capacitor having a molecular solid electrolyte, electrolytic polymerization is carried out with the anode body on which the dielectric oxide film is formed as the negative side and the counter electrode in the halogenated monomer-containing solution as the positive side. A method for manufacturing a solid electrolytic capacitor, wherein the insulating layer of an insulating polymer film is formed on the entire oxide film surface.
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