JP5032040B2 - Method for producing hydrogen selenide - Google Patents
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この発明は、高純度のセレン化水素、特に不純物としての硫化水素、水分の残存量が極めて少ないセレン化水素を製造する方法に関する。 The present invention relates to a method for producing high-purity hydrogen selenide, particularly hydrogen sulfide as an impurity, and hydrogen selenide with a very small residual amount of moisture.
セレン化水素は、シリコン半導体のドーパントガスとして、ZnSeなどの化合物半導体の原料ガスとして、さらにはCIS型太陽電池の原料としても重要な材料として最近特に注目を浴びており、この種の半導体関係の用途では、特に不純物濃度が低い高純度のものが望まれている。 Hydrogen selenide has recently attracted particular attention as an important material as a dopant gas for silicon semiconductors, as a raw material gas for compound semiconductors such as ZnSe, and also as a raw material for CIS solar cells. In applications, high purity products with particularly low impurity concentration are desired.
セレン化水素の製造方法として、いくつかの製造方法が知られているが、金属セレン、酸化セレンなどの原料に温度500〜700℃で水素を接触させて直接水素化して、ガス状セレン化水素とする方法がある。
この直接法にあっては、一旦生成したガス状のセレン化水素を冷却して液化または固化し、得られた液化物または固化物の周囲の雰囲気ガスを排気除去して、水素などのセレン化水素ガスに同伴されるガス成分を除去し、セレン化水素の純度を高めて精製することが行われている。
As a method for producing hydrogen selenide, several production methods are known. Gaseous hydrogen selenide is obtained by directly hydrogenating a raw material such as metal selenium or selenium oxide by contacting hydrogen at a temperature of 500 to 700 ° C. There is a method.
In this direct method, once generated gaseous hydrogen selenide is cooled and liquefied or solidified, and the resulting liquefied product or ambient gas around the solidified product is removed by exhaust to remove hydrogen and other selenides. Gas components accompanying hydrogen gas are removed, and purification is performed by increasing the purity of hydrogen selenide.
しかし、このような製造方法では、精製後においても、水分や硫化水素などに代表される不純物を十分に除去することはできなかった。
不純物である硫化水素は、原料となる金属セレン、酸化セレンなどに微量に同伴されるイオウに由来するもので、セレンとイオウは同族元素であることから、金属セレンの精製工程でイオウを十分に除去しきれずに、数十ppm程度残存するためである。
However, in such a manufacturing method, impurities such as moisture and hydrogen sulfide cannot be sufficiently removed even after purification.
Impurity hydrogen sulfide is derived from sulfur entrained in metal selenium, selenium oxide, etc. as raw materials, and since selenium and sulfur are homologous elements, sulfur is adequately purified in the metal selenium purification process. This is because about several tens of ppm remain without being completely removed.
また、水分は、原料を反応装置に充填する際に空気に同伴して持ち込まれ、これら反応装置の内壁面に吸着したものが、ガス状セレン化水素に随伴されるものである。 In addition, the moisture is brought along with the air when the raw material is charged into the reactor, and the water adsorbed on the inner wall surface of the reactor is accompanied by gaseous hydrogen selenide.
半導体の製造に用いられるセレン化水素では、このような水分、硫化水素は、極力避けなければならない不純物であるが、これら不純物を除去する方法は知られていない。
セレン化水素の製造方法および精製方法に関しては、以下のような公知文献がある。
Regarding the production method and purification method of hydrogen selenide, there are the following known documents.
よって、本発明における課題は、高純度で特に水分、硫化水素の残留量が少ないセレン化水素の製造方法を得ることにある。 Accordingly, an object of the present invention is to obtain a method for producing hydrogen selenide having a high purity and particularly a small amount of moisture and hydrogen sulfide.
かかる課題を解決するため、
請求項1にかかる発明は、金属セレンまたはセレン化合物を100〜400℃の温度で純度99.99体積%以上の高純度水素と接触させつつ、反応系内を加熱下に排気した(以下、予備工程と言うことがある。)のち、
温度500〜700℃で高純度水素と接触させて得られたガス状のセレン化水素を、さらに液化または固化し、この液化物または固化物の周囲の雰囲気ガスを排気したのち、前記液化物または固化物を気化させることで、
硫化水素が1ppm未満の高純度のガス状のセレン化水素を得る(以下、本工程と言うことがある。)ことを特徴とするセレン化水素の製造方法である。
To solve this problem,
The invention according to claim 1 evacuates the reaction system under heating while contacting the metal selenium or the selenium compound with high-purity hydrogen having a purity of 99.99% by volume or more at a temperature of 100 to 400 ° C. Sometimes called a process.)
The gaseous hydrogen selenide obtained by contacting with high-purity hydrogen at a temperature of 500 to 700 ° C. is further liquefied or solidified, and the liquefied product or the ambient gas around the solidified product is evacuated. By vaporizing the solidified material,
This is a method for producing hydrogen selenide, characterized in that high-purity gaseous hydrogen selenide having a hydrogen sulfide content of less than 1 ppm is obtained (hereinafter sometimes referred to as this step).
本発明では、予備工程においては、原料中に含まれるイオウ分などの低沸点成分がそのまま、または水素化物として系外に排出される。この予備工程の加熱温度では原料中のセレンは水素と反応せず、セレン化水素となることはない。また、反応系内に吸着している水分も脱着して系外に排出される。これにより、原料は高純度に精製されることになる。 In the present invention, in the preliminary process, low-boiling components such as sulfur contained in the raw material are discharged out of the system as they are or as hydrides. At the heating temperature of this preliminary step, selenium in the raw material does not react with hydrogen and does not become hydrogen selenide. Further, moisture adsorbed in the reaction system is also desorbed and discharged out of the system. Thereby, a raw material will be refine | purified with high purity.
そして、本工程では、精製された原料が水素と反応してセレン化水素となり、このセレン化水素はしたがって水分や硫化水素などの不純物の少ない高純度のものとなる。
また、本工程で得られたガス状セレン化水素をさらに液化または固化し、この液化物または固化物の周囲の雰囲気ガスを排気したのち、前記液化物または固化物を気化させて高純度のガス状セレン化水素を得るようにすれば、液化物または固化物の周囲の雰囲気ガス中に含まれる水素ガスなどのガス成分も除去されることになってさらに純度が高められる。
In this step, the refined raw material reacts with hydrogen to form hydrogen selenide, and this hydrogen selenide thus has a high purity with little impurities such as moisture and hydrogen sulfide.
Further, the gaseous hydrogen selenide obtained in this step is further liquefied or solidified, and after evacuating the ambient gas around the liquefied product or solidified product, the liquefied product or solidified product is vaporized to obtain a high-purity gas. If the hydrogen selenide is obtained, gas components such as hydrogen gas contained in the ambient gas around the liquefied or solidified product are also removed, thereby further improving the purity.
図1は、本発明のセレン化水素の製造方法に用いられる製造装置の一例を示すもので、図中符号1は、反応炉を示す。
この反応炉1は、その内部に原料となる金属セレン、セレン化合物を収め、これを700℃まで加熱できるようになっている。
FIG. 1 shows an example of a production apparatus used in the method for producing hydrogen selenide according to the present invention. Reference numeral 1 in the drawing denotes a reaction furnace.
The reactor 1 contains metal selenium and a selenium compound as raw materials therein and can be heated to 700 ° C.
反応炉1には、管2が接続され、弁3を介して図示しない高純度水素供給源からの高純度水素が反応炉1内に送り込まれるようになっている。
また、反応炉1には管4が接続され、この管4から反応生成ガスが反応炉1から排出されるようになっている。管4には、その途中で分岐されて管5が接続され、この管5は弁6を介して図示しない排気装置に接続され、反応生成ガスが系外に排出できるようになっている。
A pipe 2 is connected to the reaction furnace 1, and high purity hydrogen from a high purity hydrogen supply source (not shown) is sent into the reaction furnace 1 through a valve 3.
In addition, a tube 4 is connected to the reaction furnace 1, and a reaction product gas is discharged from the reaction furnace 1 from the tube 4. The pipe 4 is branched in the middle of the pipe 4 and connected to a pipe 5. The pipe 5 is connected to an exhaust device (not shown) via a valve 6 so that the reaction product gas can be discharged out of the system.
また、管4は、弁7を介してトラップ部8に接続されており、反応炉1からの反応生成ガスがトラップ部8に送られるようなっている。
トラップ部8は、トラップ本体とこのトラップ本体の外周に設けられトラップ本体を冷却または加熱する熱媒体槽とからなり、管4からトラップ本体内に導入された反応生成ガスを冷却して液化または固化し、あるいはこの液化物または固化物を気化するものである。
Further, the pipe 4 is connected to the trap part 8 via the valve 7, and the reaction product gas from the reaction furnace 1 is sent to the trap part 8.
The trap unit 8 includes a trap body and a heat medium tank that is provided on the outer periphery of the trap body and cools or heats the trap body, and cools and liquefies or solidifies the reaction product gas introduced into the trap body from the pipe 4. Alternatively, this liquefied product or solidified product is vaporized.
また、トラップ部8のトラップ本体には、管9が接続され、この管9はその途中で分岐されて管10が接続され、この管10は弁11を介して図示しない排気装置に接続され、トラップ本体の気相のガスが系外に排出できるようになっている。さらに、管9からは弁12を介してトラップ本体からのガスが製品ガスとして導出されるようになっている。
In addition, a pipe 9 is connected to the trap body of the trap portion 8, the pipe 9 is branched in the middle of the trap section 8, and a pipe 10 is connected. The pipe 10 is connected to an exhaust device (not shown) via a valve 11, The gas in the gas phase of the trap body can be discharged out of the system. Further, gas from the trap body is led out from the pipe 9 through the
次に、この製造装置を用いたセレン化水素の製造方法を説明する。
(予備工程)
反応炉1に原料となる金属セレン、セレン化合物を充填する。金属セレンには、粉末状または塊状のものが用いられ、セレン化合物では、粉末状固体、液体であっても良い。セレン化合物には、酸化セレン、セレン酸塩、亜セレン酸塩などが用いられる。原料には、できる限り高純度のものが用いられ、全不純物残留量が0.1wt%未満のものが好ましい。
Next, a method for producing hydrogen selenide using this production apparatus will be described.
(Preliminary process)
The reactor 1 is filled with metal selenium and selenium compounds as raw materials. The metal selenium is in powder form or in bulk form, and the selenium compound may be in powder form solid or liquid. As the selenium compound, selenium oxide, selenate, selenite and the like are used. As the raw material, one having as high purity as possible is used, and one having a total impurity residual amount of less than 0.1 wt% is preferable.
ついで、管2から高純度水素を反応炉1内に供給する。高純度水素としては、純度99.99体積%以上で、露点が−70℃以下のものが用いられる。その後、反応炉1内の温度を400℃以下、好ましくは100〜400℃とし、圧力を常圧として高純度水素を流し続け、管4、5、弁6を経て系外に生成ガスを排出する。
この温度範囲では、原料中のセレンと水素とは反応せず、原料中に含まれる水分、イオウ分、炭素分、酸素分、ハロゲン分などの低沸点の不純物がガス状となって気相に移行する。
Next, high purity hydrogen is supplied from the tube 2 into the reaction furnace 1. As the high-purity hydrogen, those having a purity of 99.99% by volume or more and a dew point of −70 ° C. or less are used. Thereafter, the temperature in the reactor 1 is set to 400 ° C. or less, preferably 100 to 400 ° C., the high pressure hydrogen is kept flowing under normal pressure, and the product gas is discharged out of the system through the pipes 4 and 5 and the valve 6. .
In this temperature range, selenium and hydrogen in the raw material do not react, and low-boiling impurities such as moisture, sulfur, carbon, oxygen, and halogen contained in the raw material become gaseous and enter the gas phase. Transition.
気相に移行したガス状の不純物は、そのまま系外に排出されるか、あるいは水素と反応して水素化物として系外に排出される。例えば、原料中の硫黄分は水素と反応して硫化水素として排出される。また、反応炉1内壁面に吸着している水分は、加熱され脱着されて系外に排出される。 The gaseous impurities transferred to the gas phase are discharged out of the system as they are, or react with hydrogen and discharged out of the system as hydrides. For example, sulfur in the raw material reacts with hydrogen and is discharged as hydrogen sulfide. Further, the moisture adsorbed on the inner wall surface of the reactor 1 is heated, desorbed and discharged out of the system.
反応炉1の加熱時間は、原料の充填量にも左右されるが、1〜10時間とされ、高純度水素の流量は大気圧、0℃において1〜10L/minとされる。
この予備工程によって、原料中の低沸点の不純物が除去され、原料が精製された状態となる。
Although the heating time of the reaction furnace 1 depends on the filling amount of the raw material, it is 1 to 10 hours, and the flow rate of the high purity hydrogen is 1 to 10 L / min at 0 ° C. at atmospheric pressure .
By this preliminary process, impurities having a low boiling point in the raw material are removed, and the raw material is in a purified state.
(本工程)
予備工程が終了したのち、反応炉1内の温度を500〜700℃とし、圧力を常圧として、高純度水素を導入する。この温度では、原料中のセレンが水素と反応してセレン化水素となる。この時、弁6を閉とし、弁7を開として反応炉1内で生成した生成ガス(セレン化水素ガス)をトラップ部8に送るようにする。
(This process)
After the preliminary process is completed, high-purity hydrogen is introduced at a temperature in the reaction furnace 1 of 500 to 700 ° C. and a pressure of normal pressure. At this temperature, selenium in the raw material reacts with hydrogen to form hydrogen selenide. At this time, the valve 6 is closed, the valve 7 is opened, and the generated gas (hydrogen selenide gas) generated in the reaction furnace 1 is sent to the trap unit 8.
トラップ部8では、熱媒体槽に液化窒素などの冷却媒体を満たし、トラップ本体をセレン化水素の液化温度または固化温度以下に冷却しておき、反応炉1からの生成ガスをトラップ本体内で冷却し、これに含まれるセレン化水素を液体状または固体状として、一旦トラップ本体内に捕集する。 In the trap unit 8, the heat medium tank is filled with a cooling medium such as liquefied nitrogen, the trap body is cooled below the liquefaction temperature or solidification temperature of hydrogen selenide, and the generated gas from the reactor 1 is cooled in the trap body. The hydrogen selenide contained therein is once collected in the trap body as a liquid or solid.
トラップ本体内の気相には、生成ガスに含まれている水素などの極めて低沸点のガス成分が存在することになるが、このガス成分は、管9、10、弁11と通って系外に排出される。
この本工程での反応炉1の加熱時間は、やはり原料の充填量にも左右されるが、1〜10時間とされる。
In the gas phase in the trap body, a gas component having a very low boiling point such as hydrogen contained in the generated gas is present. This gas component passes through the pipes 9 and 10 and the valve 11 to the outside of the system. To be discharged.
The heating time of the reaction furnace 1 in this step is 1 to 10 hours although it depends on the amount of raw material charged.
反応炉1からの生成ガスの供給が終わったら、弁7、11を閉とし、弁12を開として、トラップ部8のトラップ本体の温度をセレン化水素の気化温度以上とし、トラップ本体に捕集されている液体状または固体状のセレン化水素を気化する。トラップ部8のトラップ本体の温度をセレン化水素の気化温度以上にするには、熱媒体槽に常温の水を満たす方法や常温の空気を流す方法などがある。
When the supply of the product gas from the reaction furnace 1 is finished, the valves 7 and 11 are closed, the
これにより、トラップ部8のトラップ本体から気化したセレン化水素は、管9、弁12を経て、製品ガスとして導出される。
Thereby, hydrogen selenide vaporized from the trap body of the trap unit 8 is led out as a product gas through the pipe 9 and the
このような製造方法にあっては、予備工程において原料中に含まれる低沸点の不純物が原料中から除去され、かつ反応炉1内壁面等に吸着された水分も脱着して系外に排出される。このため、予備工程が終了した時点では、原料は極めて高純度に精製されたものとなる。 In such a production method, low-boiling impurities contained in the raw material are removed from the raw material in the preliminary process, and moisture adsorbed on the inner wall surface of the reactor 1 is also desorbed and discharged out of the system. The For this reason, at the time when the preliminary process is completed, the raw material is purified to an extremely high purity.
したがって、本工程において、原料中のセレンと水素との反応で生成したセレン化水素には、不純物がほとんど含まれないものとなる。また、トラップ部8のトラップ本体において、生成したセレン化水素を一旦液化または固化し、トラップ本体内の気相の水素などの雰囲気ガスを排気しているので、セレン化水素を気化させて製品ガスとしたときに、製品セレン化水素ガス中にこの雰囲気ガスが混入することもない。 Therefore, in this step, the hydrogen selenide produced by the reaction of selenium and hydrogen in the raw material contains almost no impurities. Further, since the generated hydrogen selenide is once liquefied or solidified in the trap body of the trap unit 8 and the atmospheric gas such as gaseous hydrogen in the trap body is exhausted, the hydrogen selenide is vaporized to produce the product gas. In this case, the atmospheric gas is not mixed into the product hydrogen selenide gas.
このため、本発明の製造方法によれば、後述の具体例からも明らかなように、製品セレン化水素ガスに含まれる硫化水素、水分を1ppm未満とすることができる。 For this reason, according to the production method of the present invention, as is clear from the specific examples described later, the hydrogen sulfide and moisture contained in the product hydrogen selenide gas can be reduced to less than 1 ppm.
以下、具体例を示す。
(比較例)
図1に示す装置を用いた。高純度金属セレン(純度:99.999wt%)を反応炉1に充填した後、トラップ部8のトラップ本体を−196℃に冷却し、反応炉1を常圧で600℃に加熱しながら高純度水素を4時間流通させ、後段のトラップ部8に生成ガスを固化させた。生成ガスを固化させたままトラップ部の気相のみを真空排気した。その後再び気化させた生成ガス中の不純物分析をガスクロマトグラフィーにより実施した。
不純物分析結果を表1に示す。
Specific examples are shown below.
(Comparative example)
The apparatus shown in FIG. 1 was used. After filling the reactor 1 with high purity metal selenium (purity: 99.999 wt%), the trap body of the trap unit 8 is cooled to −196 ° C., and the reactor 1 is heated to 600 ° C. at normal pressure. Hydrogen was allowed to flow for 4 hours, and the generated gas was solidified in the subsequent trap section 8. Only the vapor phase of the trap part was evacuated while the generated gas was solidified. Thereafter, analysis of impurities in the product gas which had been vaporized again was performed by gas chromatography.
Table 1 shows the results of impurity analysis.
(実施例1)
図1に示す装置を用いた。
予備工程:高純度金属セレン(純度:99.999wt%)を反応炉1に充填し、反応炉1を常圧で350℃、配管等を250℃に加熱しながら水素ガスを4時間流通させた。
本工程:反応炉1を600℃に加熱した状態で4時間水素を流通させて、後段の−196℃に冷却したトラップ部8に生成ガスを固化させた。生成ガスを固化させたままトラップ部8の気相のみを真空排気した。その後再び気化させた生成ガス中の不純物分析をガスクロマトグラフィーにより実施した。
不純物分析結果を表2に示す。
Example 1
The apparatus shown in FIG. 1 was used.
Preliminary process: High purity metal selenium (purity: 99.999 wt%) was charged into the reactor 1, and hydrogen gas was allowed to flow for 4 hours while heating the reactor 1 at 350 ° C. at normal pressure and 250 ° C., etc. .
This step: Hydrogen was circulated for 4 hours in a state where the reactor 1 was heated to 600 ° C., and the generated gas was solidified in the trap portion 8 cooled to −196 ° C. in the subsequent stage. Only the vapor phase of the trap portion 8 was evacuated while the generated gas was solidified. Thereafter, analysis of impurities in the product gas which had been vaporized again was performed by gas chromatography.
The impurity analysis results are shown in Table 2.
予備工程を行っていない比較例に比較し、不純物濃度の低い高純度なセレン化水素が得られることが確認された。 It was confirmed that high-purity hydrogen selenide having a low impurity concentration can be obtained as compared with a comparative example in which no preliminary process was performed.
(実施例2)
図1に示す装置を用いた。
予備工程:高純度金属セレン(純度:99.999wt%)を反応炉1に充填し、反応炉を常圧で350℃、配管等を250℃に加熱しながら高純度水素ガスを4時間流通させた。その後加熱を停止し、高純度水素ガスを封入したまま一晩放置した。
本工程:次の日、後段のトラップ部を−196℃に冷却し、反応炉を600℃に加熱した状態で4時間高純度水素を流通させ、トラップ部に生成ガスを固化させた。生成ガスを固化させたままトラップ部のガス相のみを真空排気した。その後再び気化させた生成ガス中の不純物分析を実施した。
不純物分析結果を表3に示す。
(Example 2)
The apparatus shown in FIG. 1 was used.
Preliminary process: High purity metal selenium (purity: 99.999 wt%) is charged into the reactor 1, and high purity hydrogen gas is allowed to flow for 4 hours while heating the reactor to 350 ° C at normal pressure and piping to 250 ° C. It was. Thereafter, the heating was stopped, and the mixture was left overnight with high purity hydrogen gas sealed.
This step: The next day, the subsequent trap portion was cooled to -196 ° C, and high purity hydrogen was circulated for 4 hours in a state where the reactor was heated to 600 ° C, and the generated gas was solidified in the trap portion. Only the gas phase of the trap part was evacuated while the generated gas was solidified. After that, impurities in the vaporized product gas were analyzed again.
Table 3 shows the results of impurity analysis.
予備工程を行っていない比較例に比較し、不純物濃度の低い高純度なセレン化水素が得られることが確認された。 It was confirmed that high-purity hydrogen selenide having a low impurity concentration can be obtained as compared with a comparative example in which no preliminary process was performed.
1・・反応炉、8・・トラップ部
1 ... Reactor, 8 ... Trap part
Claims (1)
温度500〜700℃で高純度水素と接触させて得られたガス状のセレン化水素を、さらに液化または固化し、この液化物または固化物の周囲の雰囲気ガスを排気したのち、前記液化物または固化物を気化させることで、
硫化水素が1ppm未満の高純度のガス状のセレン化水素を得ることを特徴とするセレン化水素の製造方法。 After contacting the metal selenium or selenium compound with high-purity hydrogen having a purity of 99.99% by volume or more at a temperature of 100 to 400 ° C. , the reaction system was evacuated under heating,
The gaseous hydrogen selenide obtained by contacting with high-purity hydrogen at a temperature of 500 to 700 ° C. is further liquefied or solidified, and the liquefied product or the ambient gas around the solidified product is evacuated. By vaporizing the solidified material,
A process for producing hydrogen selenide, characterized by obtaining high-purity gaseous hydrogen selenide having a hydrogen sulfide content of less than 1 ppm .
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| JP2006072887A JP5032040B2 (en) | 2006-03-16 | 2006-03-16 | Method for producing hydrogen selenide |
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| JP2006072887A JP5032040B2 (en) | 2006-03-16 | 2006-03-16 | Method for producing hydrogen selenide |
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| JP5032040B2 true JP5032040B2 (en) | 2012-09-26 |
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| JP5086451B2 (en) | 2011-01-27 | 2012-11-28 | 大陽日酸株式会社 | Hydrogen selenide production equipment |
| US8361199B2 (en) | 2011-05-27 | 2013-01-29 | Air Liquide Electronics U.S. Lp | Purification of H2Se |
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| JPS55130804A (en) * | 1979-03-30 | 1980-10-11 | Sumitomo Electric Ind Ltd | Manufacture of zinc selenide |
| US4957513A (en) * | 1989-05-10 | 1990-09-18 | Raytheon Company | Method of purifying a mixed H2 /H2 Se vapor stream |
| JP2700413B2 (en) * | 1989-06-08 | 1998-01-21 | 日本パイオニクス株式会社 | Hydride gas purification method |
| JP4734852B2 (en) * | 2004-06-02 | 2011-07-27 | シンフォニアテクノロジー株式会社 | Refining method and refining apparatus |
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