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JP5040451B2 - Manufacturing method of laminate of release material and single-sided metal foil laminated resin film, single-sided metal foil laminated film - Google Patents
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JP5040451B2 - Manufacturing method of laminate of release material and single-sided metal foil laminated resin film, single-sided metal foil laminated film - Google Patents

Manufacturing method of laminate of release material and single-sided metal foil laminated resin film, single-sided metal foil laminated film Download PDF

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JP5040451B2
JP5040451B2 JP2007151178A JP2007151178A JP5040451B2 JP 5040451 B2 JP5040451 B2 JP 5040451B2 JP 2007151178 A JP2007151178 A JP 2007151178A JP 2007151178 A JP2007151178 A JP 2007151178A JP 5040451 B2 JP5040451 B2 JP 5040451B2
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metal foil
resin film
thermocompression bonding
expansion coefficient
linear expansion
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JP2008302569A (en
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拓郎 河内山
敦志 山下
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Ube Corp
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Ube Industries Ltd
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本発明は、離型材と片面金属箔積層樹脂フィルムとの積層体の製造方法、及びこれらの製法により得られるロール状の積層体、片面金属箔積層フィルムに関する。

The present invention relates to a method for producing a laminate of a release material and a single-sided metal foil laminated resin film, and a roll-like laminate obtained by these production methods and a single-sided metal foil laminated film .

カメラ、パソコン、液晶ディスプレイなどの電子機器類への用途として芳香族ポリイミドフィルムは広く使用されている。芳香族ポリイミドフィルムをフレキシブルプリント板(FPC)やテ−プ・オ−トメイティッド・ボンディング(TAB)などの基板材料として使用するためには、エポキシ樹脂などの接着剤を用いて銅箔を張り合わせる方法が採用されている。   Aromatic polyimide films are widely used as applications for electronic devices such as cameras, personal computers, and liquid crystal displays. In order to use an aromatic polyimide film as a substrate material such as a flexible printed board (FPC) or tape-automated bonding (TAB), a copper foil is bonded using an adhesive such as an epoxy resin. The method is adopted.

従来、片面積層基板をラミネート成形すると、加熱加圧する前後で各構成基材の膨張、収縮の差より、シワが発生し外観不良となる場合がある。シワの発生を抑制させる方法としては、離型材を他面に張り合わせる方法が提案されており、例えば、特許文献1では、Rzが3μm未満の耐熱性フィルムや金属箔が提案されている。
特許文献2には、耐熱性樹脂を含む耐熱性コア層の両表面に接着層が積層されてなる接着フィルム、金属層および耐熱性樹脂を含む耐熱樹脂裏打層、を備え、前記接着フィルムのいずれか一方の表面にのみ前記金属層が積層されており、かつ他方の表面に耐熱樹脂裏打層が積層されていることを特徴とする片面金属張積層板が提案されている。
特許文献3には、非熱可塑性ポリイミド層の両面に熱可塑性ポリイミドを含む接着層を有する耐熱性接着シートの片面に導電層、他方の面に耐熱樹脂裏打層を形成してなる片面金属張積層板であって、下記条件を満足する片面金属張積層板が提案されている。
80≦(導電層の線膨張係数/裏打層の線膨張係数)×100≦120
80≦(耐熱性接着シートの線膨張係数/裏打層の線膨張係数)×100≦120
特開2001−162719号公報 特開2007−055039号公報 特開2007−098672号公報
Conventionally, when a single-area layer substrate is laminated, wrinkles may occur due to the difference between expansion and contraction of each constituent base material before and after heating and pressurization, resulting in poor appearance. As a method for suppressing the generation of wrinkles, a method of sticking a release material to the other surface has been proposed. For example, Patent Document 1 proposes a heat-resistant film or metal foil having an Rz of less than 3 μm.
Patent Document 2 includes an adhesive film in which an adhesive layer is laminated on both surfaces of a heat-resistant core layer containing a heat-resistant resin, and a heat-resistant resin backing layer containing a metal layer and a heat-resistant resin. There has been proposed a single-sided metal-clad laminate in which the metal layer is laminated only on one surface and a heat-resistant resin backing layer is laminated on the other surface.
Patent Document 3 discloses a single-sided metal-clad laminate in which a conductive layer is formed on one side of a heat-resistant adhesive sheet having an adhesive layer containing thermoplastic polyimide on both sides of a non-thermoplastic polyimide layer, and a heat-resistant resin backing layer is formed on the other side. A single-sided metal-clad laminate that satisfies the following conditions has been proposed.
80 ≦ (Linear expansion coefficient of conductive layer / Linear expansion coefficient of backing layer) × 100 ≦ 120
80 ≦ (Linear expansion coefficient of heat-resistant adhesive sheet / Linear expansion coefficient of backing layer) × 100 ≦ 120
JP 2001-162719 A JP 2007-055039 A JP 2007-098672 A

金属箔と、両面が熱圧着性を有する樹脂フィルムと、離型材とを用いてラミネート成形により、補強材と片面金属箔積層樹脂フィルムとを重ね合わせた積層体のロールを製造する場合に、時折ラミネート後の積層体にTD方向にカールが発生し、その結果ロールにシワが入る場合がある。特に両面が熱圧着性を有する樹脂フィルムの総厚みが薄い物を用いると、ラミネート後の積層体にTD方向のカールの発生頻度が高くなる。そのため両面に薄い熱圧着性層を有する樹脂フィルムを用いても、ラミネート後の積層体にカールの発生頻度を少なく又は全く発生させない方法が求められている。
本発明では、金属箔と、両面が熱圧着性を有する樹脂フィルムと、離型材とを用いてラミネート成形により、補強材と片面金属箔積層樹脂フィルムとを重ね合わせた積層体のロールを製造する場合に、ラミネート後に得られる積層体がTD方向にカールの発生しない或いは極めて発生頻度の少ないロールを得ることが出来る製造方法、特に両面が熱圧着性を有する樹脂フィルムとして厚みの薄いフィルムを用いる場合でも、TD方向にカールが発生しない或いは極めて発生頻度の少ない積層体を製造し、皺のないロールの製造方法を提供することを目的とする。
When manufacturing a roll of a laminate in which a reinforcing material and a single-sided metal foil laminated resin film are laminated by laminating using a metal foil, a resin film having thermocompression bonding on both sides, and a release material, occasionally Curling may occur in the TD direction in the laminated body after lamination, and as a result, wrinkles may enter the roll. In particular, when a resin film having both sides having thermocompression bonding and a thin total thickness is used, the frequency of occurrence of curling in the TD direction increases in the laminated body after lamination. For this reason, there is a demand for a method in which even if a resin film having thin thermocompression bonding layers on both sides is used, the frequency of occurrence of curling is low or not generated at all in the laminated body after lamination.
In this invention, the roll of the laminated body which laminated | stacked the reinforcing material and the single-sided metal foil laminated resin film is manufactured by laminate molding using a metal foil, a resin film having both sides thermocompression bonding, and a release material. In the case where the laminate obtained after lamination does not curl in the TD direction, or a production method capable of obtaining a roll having a very low frequency of occurrence, particularly when a thin film is used as a resin film having thermocompression bonding on both sides However, it is an object of the present invention to provide a method for producing a roll having no wrinkles by producing a laminate in which curling does not occur in the TD direction or the occurrence frequency is extremely low.

本発明では、ラミネート後に得られる積層体のTD方向のカールを防止する目的のため、ラミネート温度よりも温度の低い温度域でのTD方向の線膨張係数に着目した。
本発明の第一は、金属箔と、両面が熱圧着性を有する樹脂フィルムと、離型材との順に重ねながら加熱加圧式の熱圧着装置に供給して、熱圧着により金属箔と樹脂フィルムとがはり合わされた片面金属箔積層樹脂フィルムと離型材との重なった積層体を製造する方法であり、
離型材のTD方向の線膨張係数(TD−P)(50〜200℃)が、金属箔のTD方向の線膨張係数(TD−M)の0.7倍〜0.9倍の範囲を用いることを特徴とする積層体の製造方法に関する。
本発明の第一の積層体の製造方法により、TD方向にカールの小さな積層体を得ることが出来、その結果離型材剥離後にTD方向にカールの小さな積層体を得ることができる。さらに、皺のないロール状の積層体を製造することが出来、生産性に優れ、加工性に優れ、外観が良好な片面金属箔積層フィルムを得ることが出来る。
In the present invention, for the purpose of preventing curling in the TD direction of the laminate obtained after lamination, attention was paid to the linear expansion coefficient in the TD direction in a temperature range lower than the lamination temperature.
The first of the present invention is to supply a metal foil, a resin film having thermocompression bonding on both surfaces, and a heat pressurizing thermocompression bonding apparatus while sequentially stacking a release material, and the metal foil and the resin film by thermocompression bonding. Is a method of manufacturing a laminated body of a laminated single-sided metal foil laminated resin film and a release material,
The linear expansion coefficient (TD-P) (50 to 200 ° C.) in the TD direction of the release material is in the range of 0.7 to 0.9 times the linear expansion coefficient (TD-M) in the TD direction of the metal foil. It is related with the manufacturing method of the laminated body characterized by the above-mentioned.
By the first method for producing a laminate of the present invention, a laminate having a small curl in the TD direction can be obtained, and as a result, a laminate having a small curl in the TD direction can be obtained after the release material is peeled off. Furthermore, a roll-shaped laminated body without wrinkles can be produced, and a single-sided metal foil laminated film having excellent productivity, excellent workability, and good appearance can be obtained.

本発明の第一の製造方法では、両面が熱圧着性を有する樹脂フィルムのTD方向の線膨張係数(TD−B)(50〜200℃)が、金属箔のTD方向の線膨張係数(TD−M)の0.8倍〜1.2倍の範囲[(TD−B)/(TD−M)]であることにより、特に効果が優れる。
本発明の第一の製造方法では、離型材のMD方向の線膨張係数(MD−P)(50〜200℃)が、金属箔のMD方向の線膨張係数(MD−M)の0.7倍〜0.9倍の範囲[(MD−P)/(MD−M)]であり、
両面が熱圧着性を有する樹脂フィルムのMD方向の線膨張係数(MD−B)(50〜200℃)が、金属箔のMD方向の線膨張係数(MD−M)の0.8倍〜1.3倍の範囲[(MD−B)/(MD−M)]であることにより、
さらに離型材のMD方向の線膨張係数(MD−P)(50〜200℃)が、金属箔のMD方向の線膨張係数(MD−M)の0.7倍〜0.9倍の範囲[(MD−P)/(MD−M)]であり、
両面が熱圧着性を有する樹脂フィルムのMD方向の線膨張係数(MD−B)(50〜200℃)が、金属箔のMD方向の線膨張係数(MD−M)の0.8倍〜1.3倍の範囲[(MD−B)/(MD−M)]であり、離型材のMD方向の線膨張係数(MD−P)(50〜200℃)が、離型材のTD方向の線膨張係数(TD−P)(50〜200℃)の0.9〜1.1の範囲[(MD−P)/(TD−P)]であることにより、
特に効果が優れる。
In the first production method of the present invention, the linear expansion coefficient (TD-B) (50 to 200 ° C.) in the TD direction of the resin film having thermocompression bonding on both surfaces is the linear expansion coefficient (TD) in the TD direction of the metal foil. The effect is particularly excellent by being in the range [(TD-B) / (TD-M)] of 0.8 times to 1.2 times of -M).
In the first manufacturing method of the present invention, the linear expansion coefficient (MD-P) (50 to 200 ° C.) in the MD direction of the release material is 0.7 of the linear expansion coefficient (MD-M) in the MD direction of the metal foil. Times to 0.9 times [(MD-P) / (MD-M)],
The linear expansion coefficient (MD-B) (50 to 200 ° C.) in the MD direction of the resin film having thermocompression bonding on both sides is 0.8 to 1 times the linear expansion coefficient (MD-M) in the MD direction of the metal foil. .3 times the range [(MD-B) / (MD-M)]
Furthermore, the linear expansion coefficient (MD-P) (50 to 200 ° C.) in the MD direction of the release material is in the range of 0.7 to 0.9 times the linear expansion coefficient (MD-M) in the MD direction of the metal foil [ (MD-P) / (MD-M)],
The linear expansion coefficient (MD-B) (50 to 200 ° C.) in the MD direction of the resin film having thermocompression bonding on both sides is 0.8 to 1 times the linear expansion coefficient (MD-M) in the MD direction of the metal foil. .3 times the range [(MD-B) / (MD-M)], and the linear expansion coefficient (MD-P) (50 to 200 ° C.) in the MD direction of the release material is a line in the TD direction of the release material. By the expansion coefficient (TD-P) (50 to 200 ° C.) in the range of 0.9 to 1.1 [(MD-P) / (TD-P)],
The effect is particularly excellent.

本発明の第二は、金属箔と、両面が熱圧着性を有する樹脂フィルムと、離型材との順に重ねながら加熱加圧式の熱圧着装置に供給して、熱圧着により金属箔と樹脂フィルムとがはり合わされた片面銅箔積層樹脂フィルムと離型材との重なった積層体を製造する方法であり、
離型材のTD方向の線膨張係数(50〜200℃)は、金属箔のTD方向の線膨張係数(50〜200℃)に対して(−6〜−2ppm/℃)のものを用いることを特徴とする積層体の製造方法に関する。
本発明の第二の積層体の製造方法により、TD方向にカールの小さな積層体を得ることが出来、その結果離型材剥離後にTD方向にカールの小さな積層体を得ることができる。さらに、皺のないロール状の積層体を製造することが出来、生産性に優れ、加工性に優れ、外観が良好な片面金属箔積層フィルムを得ることが出来る。
本発明の第二では、離型材のMD方向の線膨張係数(50〜200℃)が、金属箔のMD方向の線膨張係数(50〜200℃)に対して(−9〜−2ppm/℃)のものを用いることにより、特に効果が優れる。
本発明の第二では、剥離材のMD方向とTD方向の線膨張係数比(MD/TD比)(50〜200℃)が0.8〜1.1の範囲のものを用いることにより、特に効果が優れる。
本発明の第二では、両面が熱圧着性を有する樹脂フィルムのTD方向の線膨張係数(50〜200℃)は、金属箔のTD方向の線膨張係数(50〜200℃)に対して(−5〜5ppm/℃)のものを用いることにより、特に効果が優れる。
本発明の第二では、両面が熱圧着性を有する樹脂フィルムのMD方向の線膨張係数(50〜200℃)は、金属箔のMD方向の線膨張係数(50〜200℃)に対して(−3〜6ppm/℃)のものを用いることにより、特に効果が優れる。
In the second aspect of the present invention, the metal foil, the resin film having thermocompression bonding on both sides, and the release material are supplied to the heat and pressure thermocompression bonding apparatus while being stacked in order, and the metal foil and the resin film are bonded by thermocompression bonding. Is a method of manufacturing a laminated body of a laminated single-sided copper foil laminated resin film and a release material,
The linear expansion coefficient (50 to 200 ° C.) in the TD direction of the release material should be (−6 to −2 ppm / ° C.) relative to the linear expansion coefficient (50 to 200 ° C.) of the metal foil in the TD direction. It is related with the manufacturing method of the laminated body characterized.
By the method for producing a second laminate of the present invention, a laminate having a small curl in the TD direction can be obtained, and as a result, a laminate having a small curl in the TD direction can be obtained after the release material is peeled off. Furthermore, a roll-shaped laminated body without wrinkles can be produced, and a single-sided metal foil laminated film having excellent productivity, excellent workability, and good appearance can be obtained.
In the second of the present invention, the linear expansion coefficient (50 to 200 ° C.) in the MD direction of the release material is (−9 to −2 ppm / ° C.) with respect to the linear expansion coefficient (50 to 200 ° C.) in the MD direction of the metal foil. ) Is particularly effective.
In the second aspect of the present invention, particularly by using a release material having a linear expansion coefficient ratio (MD / TD ratio) (50 to 200 ° C.) of 0.8 to 1.1 in the MD direction and the TD direction, Excellent effect.
In the second aspect of the present invention, the linear expansion coefficient (50 to 200 ° C.) in the TD direction of the resin film having both sides thermocompression bonding is (with respect to the linear expansion coefficient (50 to 200 ° C.) in the TD direction of the metal foil ( The effect is particularly excellent by using a material of −5 to 5 ppm / ° C.).
In the second aspect of the present invention, the linear expansion coefficient (50 to 200 ° C.) in the MD direction of the resin film having both sides thermocompression bonding is (with respect to the linear expansion coefficient (50 to 200 ° C.) in the MD direction of the metal foil ( The effect is particularly excellent by using a material of −3 to 6 ppm / ° C.).

本発明の第一及び本発明の第ニの好ましい態様を以下に示す。好ましい態様は複数組み合わせることができる。
1)離型材が片面金属箔積層樹脂フィルムに対して内側に巻かれているロールを製造する場合に、適用することができる。
2)金属箔が銅箔であり、両面が熱圧着性を有する樹脂フィルム及び離型材がポリイミドフィルムを用いることが出来る。
3)金属箔の厚みが5〜30μmの範囲、
両面が熱圧着性を有する樹脂フィルムの厚みが8〜40μmの範囲、
離型フィルムの厚みが15〜50μmの範囲の場合に、特に適用することができる。
4)両面が熱圧着性を有する樹脂フィルムは、ポリイミド層の両面に熱圧着性ポリイミド層を積層している多層ポリイミドフィルムを用いること。
5)加熱加圧式の熱圧着装置は、ダブルベルトプレスを用いること。
The first and second preferred embodiments of the present invention will be described below. A plurality of preferred embodiments can be combined.
1) It can be applied when manufacturing a roll in which a release material is wound inside with respect to a single-sided metal foil laminated resin film.
2) The metal foil is a copper foil, and a resin film having a thermocompression bonding property on both sides and a release material can use a polyimide film.
3) The thickness of the metal foil is in the range of 5 to 30 μm,
The thickness of the resin film having both sides thermocompression bonding is in the range of 8 to 40 μm,
This is particularly applicable when the thickness of the release film is in the range of 15 to 50 μm.
4) Use a multilayer polyimide film in which the thermocompression bonding polyimide layer is laminated on both surfaces of the polyimide layer as the resin film having both surfaces thermocompression bonding.
5) Use a double belt press for the heat and pressure thermocompression bonding equipment.

本発明の第一及び第二より、片面金属箔積層樹脂フィルム、若しくはロール状の積層体を製造することができる。
本発明の片面金属箔積層樹脂フィルムは、外観に優れ、TD方向のカールの小さな積層体である。
From the first and second aspects of the present invention, a single-sided metal foil laminated resin film or a roll-shaped laminate can be produced.
The single-sided metal foil laminated resin film of the present invention is a laminate having excellent appearance and small curl in the TD direction.

本発明により、TD方向にカールの発生しない片面金属箔積層樹脂フィルムと離型材との重なった積層体を製造することが出来、その結果皺のないロール状の長尺の積層体を容易に製造することが出来、生産性に優れる。
本発明の製造方法により製造される積層体若しくはロール状積層体は、剥離材を除去することにより、TD方向にカールしていない、外観良好な、加工性に優れる片面金属箔積層を得ることが出来る。
According to the present invention, it is possible to produce a laminate in which a single-sided metal foil laminated resin film and a release material that do not curl in the TD direction overlap with each other, and as a result, easily produce a roll-like long laminate without wrinkles. It can be done and has excellent productivity.
The laminate or roll-like laminate produced by the production method of the present invention can obtain a single-sided metal foil laminate that is not curled in the TD direction, has a good appearance, and has excellent workability by removing the release material. I can do it.

両面が熱圧着性を有する樹脂フィルムとしては、両面が熱圧着性を有する樹脂フィルムなだどのようなものでも用いることが出来、例えば、
1)電子・電気などの配線基板などの基板材料に用いる樹脂フィルムの両面に接着剤層、熱融着性樹脂層(熱圧着性樹脂層)、又は熱硬化性樹脂層などの熱圧着性を有する層を有する多層の樹脂フィルム、
2)樹脂フィルム自体が熱圧着性を有する熱圧着性樹脂フィルム、
3)樹脂フィルム自体が熱圧着性を有する熱圧着性樹脂フィルムの片面に接着剤層、熱融着性樹脂層(熱圧着性樹脂層)、又は熱硬化性樹脂層などの熱圧着性を有する層を有する多層の樹脂フィルム、
などを挙げることが出来る。
As the resin film having both sides thermocompression bonding, any resin film having both sides thermocompression bonding can be used, for example,
1) Thermocompression bonding such as an adhesive layer, a heat-fusible resin layer (thermocompression resin layer), or a thermosetting resin layer on both sides of a resin film used for a substrate material such as an electronic / electric wiring board. A multilayer resin film having a layer having,
2) The thermocompression bonding resin film in which the resin film itself has thermocompression bonding,
3) The resin film itself has thermocompression bonding such as an adhesive layer, a heat-fusible resin layer (thermocompression bonding resin layer), or a thermosetting resin layer on one surface of the thermocompression bonding resin film having thermocompression bonding. A multilayer resin film having a layer,
And so on.

両面が熱圧着性を有する樹脂フィルムの電子・電気などの配線基板などの基板材料に用いる中心基材の樹脂フィルムの両面に接着剤層、熱融着性樹脂層(熱圧着性樹脂層)、又は熱硬化性樹脂層などの熱圧着性を有する層を有する多層の樹脂フィルムにおいて、
中心基材の樹脂フィルムとしては、全芳香族のポリイミドなどのポリイミド、ポリアミドイミド、アラミドなどのポリアミド、液晶ポリマー、ポリエステル、ポリフエリレンサルファイド、ポリカーボネート、ポリ塩化ビニル、ポリ塩化ビニリデンなど公知の熱可塑性又は非熱可塑性の樹脂フィルムを用いることが出来、特に全芳香族のポリイミドなどのポリイミド、ポリアミドイミド、アラミドなどのポリアミドなどの高融点や非溶融性高分子からのフィルムが好ましく、さらにこれらのフィルムを二層以上を組合せて使用してもよく、これらフィルムの両面に公知のポリイミドなどの熱圧着性樹脂層又は接着剤層を有する多層又は一層構造のフィルムを用いることが出来る。
両面が熱圧着性を有する樹脂フィルムの樹脂フィルム自体が熱圧着性を有する熱圧着性樹脂フィルムとしては、公知の加熱加圧下で金属箔と直接熱圧着できる樹脂を用いることができ、例えば全芳香族のポリイミドなどのポリイミド、ポリアミドイミド、ポリアミド、液晶ポリマー、ポリエステル、ポリカーボネートなどを挙げることが出来、さらにこれらのフィルムを二層以上を組合せて使用してもよい。
Adhesive layer, heat-fusible resin layer (thermo-compressible resin layer) on both sides of the central base resin film used for circuit board materials such as electronic / electric wiring boards for resin films with both sides thermo-compression bonding, Or in a multilayer resin film having a layer having a thermocompression bonding property such as a thermosetting resin layer,
As the resin film for the central substrate, known thermoplastics such as polyimides such as wholly aromatic polyimides, polyamides such as polyamideimide and aramid, liquid crystal polymers, polyesters, polyphenylene sulfide, polycarbonate, polyvinyl chloride, and polyvinylidene chloride Alternatively, a non-thermoplastic resin film can be used, and a film made of a high melting point or non-melting polymer such as polyimide such as wholly aromatic polyimide, polyamide such as polyamide imide, and aramid is preferable. Two or more layers may be used in combination, and a multilayer or single-layer film having a thermocompression-bonding resin layer such as polyimide or an adhesive layer on both surfaces of these films can be used.
As the thermocompression-bonding resin film having a thermocompression bonding property, the resin film itself having thermocompression bonding can be a resin that can be directly thermocompression bonded to a metal foil under a known heat and pressure. Examples include polyimides such as group polyimide, polyamideimide, polyamide, liquid crystal polymer, polyester, polycarbonate and the like, and these films may be used in combination of two or more layers.

本発明の第一の製造方法において、両面が熱圧着性を有する樹脂フィルム及び剥離材は、以下の特徴を少なくとも1つ有することが好ましい。(これらの特徴は任意の特徴を複数組み合わせることが出来る。)
1)離型材のTD方向の線膨張係数(TD−P)(50〜200℃)が、金属箔のTD方向の線膨張係数(TD−M)の0.7倍〜0.9倍の範囲、好ましくは0.7倍〜0.8倍の範囲であるもの、
2)両面が熱圧着性を有する樹脂フィルムのTD方向の線膨張係数(TD−B)(50〜200℃)が、金属箔のTD方向の線膨張係数(TD−M)の0.8倍〜1.2倍の範囲であるもの、好ましくは0.9倍〜1.1倍の範囲であるもの、さらに好ましくは0.9倍〜1.0倍の範囲であるもの、
3)離型材のMD方向の線膨張係数(MD−P)(50〜200℃)が、離型材のTD方向の線膨張係数(TD−P)(50〜200℃)の0.8倍〜1.2倍の範囲であるもの、好ましくは0.9倍〜1.1倍の範囲であるもの、さらに好ましくは0.9倍〜1.0倍の範囲であるもの、
4)両面が熱圧着性を有する樹脂フィルムのMD方向の線膨張係数(MD−B)(50〜200℃)が、金属箔のMD方向の線膨張係数(MD−M)の0.8倍〜1.3倍の範囲であるもの、好ましくは0.9倍〜1.2倍の範囲であるもの、さらに好ましくは0.9倍〜1.1倍の範囲であるもの、
5)離型材のMD方向の線膨張係数(MD−P)(50〜200℃)が、金属箔のMD方向の線膨張係数(MD−M)の0.7倍〜1.0倍の範囲、さらに好ましくは0.7倍〜0.9倍の範囲、特に好ましくは0.7倍〜0.8倍の範囲であるもの、
6)引張弾性率(MD、ASTM−D882)は3000MPa以上であるもの、さらに4000MPa以上であるもの、特に5000MPa以上であるもの、などをあげることができる。
本発明のロール状積層体の製造方法において、上記の1)、好ましくは上記の1)及び2)を選択することにより、TD方向にカールの抑制されたものを得ることが出来、さらに少なくとも上記の3)、4)又は5)を選択することによりMD方向にもカールの抑制されたものを得ることが出来る。
In the first manufacturing method of the present invention, it is preferable that the resin film and the release material having both surfaces having thermocompression bonding have at least one of the following characteristics. (These features can be combined with any number of features.)
1) The linear expansion coefficient (TD-P) (50 to 200 ° C.) of the release material in the TD direction is 0.7 to 0.9 times the linear expansion coefficient (TD-M) of the metal foil in the TD direction. , Preferably in the range of 0.7 times to 0.8 times,
2) The linear expansion coefficient (TD-B) (50-200 ° C.) in the TD direction of the resin film having thermocompression bonding on both surfaces is 0.8 times the linear expansion coefficient (TD-M) in the TD direction of the metal foil. Is in the range of -1.2 times, preferably in the range of 0.9-1.1 times, more preferably in the range of 0.9-1.0 times,
3) The linear expansion coefficient (MD-P) (50 to 200 ° C) in the MD direction of the release material is 0.8 times the linear expansion coefficient (TD-P) (50 to 200 ° C) in the TD direction of the release material. Those in the range of 1.2 times, preferably in the range of 0.9 times to 1.1 times, more preferably in the range of 0.9 times to 1.0 times,
4) The linear expansion coefficient (MD-B) (50 to 200 ° C.) in the MD direction of the resin film having thermocompression bonding on both surfaces is 0.8 times the linear expansion coefficient (MD-M) in the MD direction of the metal foil. Those in the range of -1.3 times, preferably in the range of 0.9-1.2 times, more preferably in the range of 0.9-1.1 times,
5) The linear expansion coefficient (MD-P) (50 to 200 ° C.) in the MD direction of the release material is in the range of 0.7 to 1.0 times the linear expansion coefficient (MD-M) in the MD direction of the metal foil. More preferably in the range of 0.7 times to 0.9 times, particularly preferably in the range of 0.7 times to 0.8 times,
6) Tensile elastic modulus (MD, ASTM-D882) is 3000 MPa or more, further 4000 MPa or more, particularly 5000 MPa or more.
In the method for producing a roll-shaped laminate of the present invention, by selecting the above 1), preferably 1) and 2) above, it is possible to obtain a curled product in the TD direction, and at least the above-mentioned By selecting 3), 4) or 5), it is possible to obtain one in which curling is suppressed in the MD direction.

本発明の第二の製造方法において、両面が熱圧着性を有する樹脂フィルム及び剥離材は、以下の特徴を少なくとも1つ有することが好ましい。(これらの特徴は任意の特徴を複数組み合わせることが出来る。)
本発明の第二において、離型材及び両面が熱圧着性を有する樹脂フィルムの最適な線膨張係数(50〜200℃)は、以下の範囲であり、これの範囲を選択して組み合わせることができる。
a)離型材の最適な線膨張係数(50〜200℃)
・TD方向:金属箔のTD方向の線膨張係数に対して、(−6〜−2ppm/℃)、好ましくは(−5〜−2ppm/℃)、より好ましくは(−4〜−2ppm/℃)、特に好ましくは(−4〜−3ppm/℃)の範囲。
・MD方向:金属箔のMD方向の線膨張係数に対して、(−9〜−1ppm/℃)、好ましくは(−7〜−2ppm/℃)、より好ましくは(−6〜−2ppm/℃)、さらに好ましくは(−5〜−2ppm/℃)、特に好ましくは(−4〜−3ppm/℃)の範囲。
・離型材のMD方向の線膨張係数とTD方向の線膨張係数との比(MD/TD比):0.8〜1.1、好ましくは0.9〜1.1、さらに好ましくは0.9〜1.0の範囲。
b)両面が熱圧着性を有する樹脂フィルムの最適な線膨張係数(50〜200℃)
・TD方向:金属箔のTD方向の線膨張係数に対して、(−5〜5ppm/℃)、好ましくは(−4〜4ppm/℃)、より好ましくは(−3〜3ppm/℃)、さらに好ましくは(−2〜2ppm/℃)、特に好ましくは(−1〜1ppm/℃)の範囲。
・MD方向:金属箔のMD方向の線膨張係数に対して、(−4〜6ppm/℃)、好ましくは(−3〜5ppm/℃)、より好ましくは(−2〜4ppm/℃)、さらに好ましくは(−1〜3ppm/℃)、特に好ましくは(0〜2ppm/℃)の範囲。
・両面が熱圧着性を有する樹脂フィルムのMD方向の線膨張係数とTD方向の線膨張係数との比(MD/TD比):0.8〜1.1、好ましくは0.9〜1.1の範囲。
本発明のロール状積層体の製造方法において、上記のa)、好ましくは上記のa)及びb)のTD方向の線膨張係数を選択することにより、TD方向にカールの抑制されたものを得ることが出来、さらに少なくとも上記のa)、a)及びb)のMD方向の線膨張係数を選択することによりMD方向にもカールの抑制されたものを得ることが出来る。
In the second manufacturing method of the present invention, it is preferable that the resin film and the release material having both surfaces having thermocompression bonding have at least one of the following characteristics. (These features can be combined with any number of features.)
In the second aspect of the present invention, the optimum linear expansion coefficient (50 to 200 ° C.) of the release film and the resin film having both surfaces thermocompression bonding is in the following range, and these ranges can be selected and combined. .
a) Optimum linear expansion coefficient of the release material (50 to 200 ° C.)
-TD direction: (-6 to -2 ppm / ° C), preferably (-5 to -2 ppm / ° C), more preferably (-4 to -2 ppm / ° C) with respect to the linear expansion coefficient of the metal foil in the TD direction. ), Particularly preferably in the range of (−4 to −3 ppm / ° C.).
MD direction: (−9 to −1 ppm / ° C.), preferably (−7 to −2 ppm / ° C.), more preferably (−6 to −2 ppm / ° C.) with respect to the linear expansion coefficient in the MD direction of the metal foil. ), More preferably (−5 to −2 ppm / ° C.), and particularly preferably (−4 to −3 ppm / ° C.).
-Ratio of the linear expansion coefficient in the MD direction and the linear expansion coefficient in the TD direction of the release material (MD / TD ratio): 0.8 to 1.1, preferably 0.9 to 1.1, more preferably 0.8. A range of 9 to 1.0.
b) Optimum linear expansion coefficient (50 to 200 ° C.) of a resin film having thermocompression bonding on both sides
-TD direction: (-5-5 ppm / ° C), preferably (-4-4 ppm / ° C), more preferably (-3-3 ppm / ° C), relative to the linear expansion coefficient in the TD direction of the metal foil, The range is preferably (-2 to 2 ppm / ° C), particularly preferably (-1 to 1 ppm / ° C).
MD direction: (−4 to 6 ppm / ° C.), preferably (−3 to 5 ppm / ° C.), more preferably (−2 to 4 ppm / ° C.) with respect to the linear expansion coefficient in the MD direction of the metal foil The range is preferably (−1 to 3 ppm / ° C.), particularly preferably (0 to 2 ppm / ° C.).
-Ratio of the linear expansion coefficient in the MD direction and the linear expansion coefficient in the TD direction (MD / TD ratio) of the resin film having thermocompression bonding on both surfaces: 0.8 to 1.1, preferably 0.9 to 1. A range of 1.
In the method for producing a roll-shaped laminate of the present invention, by selecting the linear expansion coefficient in the TD direction of the above-mentioned a), preferably a) and b) above, a product in which curling is suppressed in the TD direction is obtained. Further, by selecting at least the linear expansion coefficient in the MD direction of the above-mentioned a), a) and b), it is possible to obtain a curl suppressed in the MD direction.

本発明の第二において、金属箔が圧延銅箔又は電解銅箔などの銅箔の場合、離型材及び両面が熱圧着性を有する樹脂フィルムの最適な線膨張係数(50〜200℃)は、以下の範囲であり、これの範囲を選択して組み合せることができる。(但し銅箔のTD及びMD方向の線膨張係数を18ppm/℃とした場合)
a)離型材の最適な線膨張係数(50〜200℃)
・TD方向:12〜16ppm/℃、好ましくは13〜16ppm/℃、より好ましくは14〜16ppm/℃、特に好ましくは14〜15ppm/℃の範囲。
・MD方向:9〜16ppm/℃、好ましくは11〜16ppm/℃、より好ましくは12〜16ppm/℃、さらに好ましくは13〜16ppm/℃、特に好ましくは14〜15ppm/℃の範囲。
・MD/TD比:0.8〜1.1、好ましくは0.9〜1.1、さらに好ましくは0.9〜1.0の範囲。
b)両面が熱圧着性を有する樹脂フィルムの最適な線膨張係数(50〜200℃)
・TD方向:13〜23ppm/℃、好ましくは14〜22ppm/℃、より好ましくは15〜21ppm/℃、さらに好ましくは16〜20ppm/℃、特に好ましくは17〜19ppm/℃の範囲。
・MD方向:15〜24ppm/℃、好ましくは16〜23ppm/℃、より好ましくは17〜22ppm/℃、さらに好ましくは18〜21ppm/℃、特に好ましくは18〜20ppm/℃の範囲。
・MD/TD比:0.8〜1.1、好ましくは0.9〜1.1の範囲。
In the second aspect of the present invention, when the metal foil is a copper foil such as a rolled copper foil or an electrolytic copper foil, the optimal linear expansion coefficient (50 to 200 ° C.) of the release film and the resin film having both sides thermocompression bonding is It is the following ranges, and these ranges can be selected and combined. (However, when the coefficient of linear expansion in the TD and MD directions of the copper foil is 18 ppm / ° C)
a) Optimum linear expansion coefficient of the release material (50 to 200 ° C.)
TD direction: 12 to 16 ppm / ° C., preferably 13 to 16 ppm / ° C., more preferably 14 to 16 ppm / ° C., particularly preferably 14 to 15 ppm / ° C.
MD direction: 9 to 16 ppm / ° C, preferably 11 to 16 ppm / ° C, more preferably 12 to 16 ppm / ° C, still more preferably 13 to 16 ppm / ° C, and particularly preferably 14 to 15 ppm / ° C.
MD / TD ratio: 0.8 to 1.1, preferably 0.9 to 1.1, more preferably 0.9 to 1.0.
b) Optimum linear expansion coefficient (50 to 200 ° C.) of a resin film having thermocompression bonding on both sides
TD direction: 13 to 23 ppm / ° C., preferably 14 to 22 ppm / ° C., more preferably 15 to 21 ppm / ° C., further preferably 16 to 20 ppm / ° C., particularly preferably 17 to 19 ppm / ° C.
MD direction: 15 to 24 ppm / ° C., preferably 16 to 23 ppm / ° C., more preferably 17 to 22 ppm / ° C., further preferably 18 to 21 ppm / ° C., particularly preferably 18 to 20 ppm / ° C.
MD / TD ratio: 0.8 to 1.1, preferably 0.9 to 1.1.

以下本発明の第一及び第二の積層体の製造方法について、詳細に説明する。   Hereinafter, the manufacturing method of the 1st and 2nd laminated body of this invention is demonstrated in detail.

ロール状積層体の製造方法において、
金属箔、両面が熱圧着性を有する樹脂フィルム、剥離材の厚みは、用いる加圧装置などにより適宜選択しておこなうことができ、どのようなものでも用いることが出来るが、
1)金属箔の厚みは好ましくは5〜35μmの範囲、より好ましくは7〜30μmの範囲、さらに好ましくは9〜25μmの範囲、特に好ましくは10〜20μmの範囲、
2)両面が熱圧着性を有する樹脂フィルムの厚みは、好ましくは8〜125μmの範囲、より好ましくは9〜75μm、さらに好ましくは10〜40μm、特に好ましくは12〜28μmの範囲、
3)離型材のフィルムの厚みは、好ましくは5〜75μm、より好ましくは8〜60μm、さらに好ましくは15〜50μm、特に好ましくは22〜40μmの範囲、
を挙げることが出来、これらの厚みは適宜選択して行うことが出来る。
特にロール状積層体の製造方法において、
金属箔の厚みが5〜30μmの範囲、
両面が熱圧着性を有する樹脂フィルムの厚みが8〜40μmの範囲、
離型フィルムの厚みが15〜50μmの範囲、
を組み合わせる場合に適用できる。
In the method for producing a roll laminate,
Metal foil, resin film having thermocompression bonding on both sides, and the thickness of the release material can be appropriately selected depending on the pressure device used, and any one can be used.
1) The thickness of the metal foil is preferably in the range of 5 to 35 μm, more preferably in the range of 7 to 30 μm, still more preferably in the range of 9 to 25 μm, particularly preferably in the range of 10 to 20 μm.
2) The thickness of the resin film having thermocompression bonding on both sides is preferably in the range of 8 to 125 μm, more preferably 9 to 75 μm, still more preferably 10 to 40 μm, and particularly preferably in the range of 12 to 28 μm.
3) The thickness of the release agent film is preferably in the range of 5 to 75 μm, more preferably 8 to 60 μm, still more preferably 15 to 50 μm, and particularly preferably 22 to 40 μm.
These thicknesses can be selected as appropriate.
Especially in the manufacturing method of the roll-shaped laminate,
The thickness of the metal foil is in the range of 5 to 30 μm,
The thickness of the resin film having both sides thermocompression bonding is in the range of 8 to 40 μm,
The thickness of the release film is in the range of 15-50 μm,
Applicable when combining

接着剤としては、電気・電子分野で使用されている耐熱性を有する接着剤であれば特に制限はなく、例えばポリイミド系接着剤、エポキシ変性ポリイミド系接着剤、フェノール樹脂変性エポキシ樹脂接着剤、エポキシ変性アクリル樹脂系接着剤、エポキシ変性ポリアミド系接着剤、ポリアミドフェノール系接着剤、NBRエポキシ系接着剤などが挙げられる。この接着剤はそれ自体電子分野で実施されている任意の方法で設けることができ、例えばポリイミドフィルムなどの樹脂フィルムに、接着剤溶液を塗布・乾燥してもよく、別途に形成したフィルム状接着剤と貼り合わせてもよい。   The adhesive is not particularly limited as long as it is a heat-resistant adhesive used in the electric and electronic fields. For example, polyimide adhesive, epoxy-modified polyimide adhesive, phenol resin-modified epoxy resin adhesive, epoxy Examples thereof include a modified acrylic resin adhesive, an epoxy-modified polyamide adhesive, a polyamidephenol adhesive, and an NBR epoxy adhesive. This adhesive can itself be provided by any method implemented in the electronic field. For example, an adhesive solution may be applied to a resin film such as a polyimide film and dried. You may paste together with an agent.

両面が熱圧着性を有する樹脂フィルムは、無機微粒子を含む樹脂を用いることができる。
無機微粒子としては、微粒子状の二酸化チタン粉末、二酸化ケイ素(シリカ)粉末、酸化マグネシウム粉末、酸化アルミニウム(アルミナ)粉末、酸化亜鉛粉末などの無機酸化物粉末、微粒子状の窒化ケイ素粉末、窒化チタン粉末などの無機窒化物粉末、炭化ケイ素粉末などの無機炭化物粉末、および微粒子状の炭酸カルシウム粉末、硫酸カルシウム粉末、硫酸バリウム粉末などの無機塩粉末を挙げることができる。これらの無機微粒子は二種以上を組合せて使用してもよい。これらの無機微粒子を均一に分散させるために、それ自体公知の手段を適用することができる。
A resin film containing inorganic fine particles can be used for the resin film having both surfaces having thermocompression bonding.
Inorganic fine particles include fine particle titanium dioxide powder, silicon dioxide (silica) powder, magnesium oxide powder, aluminum oxide (alumina) powder, inorganic oxide powder such as zinc oxide powder, fine particle silicon nitride powder, and titanium nitride powder. Inorganic nitride powder such as silicon carbide powder, inorganic carbide powder such as silicon carbide powder, and inorganic salt powder such as particulate calcium carbonate powder, calcium sulfate powder, and barium sulfate powder. These inorganic fine particles may be used in combination of two or more. In order to uniformly disperse these inorganic fine particles, a means known per se can be applied.

両面が熱圧着性を有する樹脂フィルムの一例としては、公知の耐熱性及び強度を有する中心基材となるポリイミドと、中心基材のポリイミドの両面に、熱圧着性を有するポリイミドが積層されたフィルム、又は公知の熱圧着性を有するポリイミドのフィルムなどを用いることができる。
中心基材となるポリイミドは、プリント配線板、フレキシブルプリント基板、TABテープ等の電子部品の素材として用いることができるベースフィルムを構成する耐熱性ポリイミドなどの樹脂フィルムを用いることが好ましい。
中心基材となるポリイミドは、以下の特徴を少なくとも1つ有するポリイミドを用いることが好ましい。(これらの特徴は任意の特徴を複数組み合わせることが出来る。)
1)単独のポリイミドフィルムの場合にガラス転移温度が200℃以上、さらに好ましくは300℃以上か確認不可能であるもの、
2)非熱可塑性ポリイミド、などをあげることができる。
As an example of a resin film having thermocompression bonding on both sides, a film in which a polyimide serving as a central substrate having known heat resistance and strength and a polyimide having thermocompression bonding are laminated on both sides of the polyimide of the central substrate Alternatively, a polyimide film having a known thermocompression bonding property can be used.
The polyimide used as the central substrate is preferably a resin film such as a heat-resistant polyimide that constitutes a base film that can be used as a material for electronic components such as a printed wiring board, a flexible printed circuit board, and a TAB tape.
It is preferable to use a polyimide having at least one of the following characteristics as the polyimide serving as the central substrate. (These features can be combined with any number of features.)
1) In the case of a single polyimide film, the glass transition temperature is 200 ° C. or higher, more preferably 300 ° C. or higher.
2) Non-thermoplastic polyimide can be used.

中心基材となるポリイミドとしては、
(1)3,3’,4,4’−ビフェニルテトラカルボン酸二無水物、ピロメリット酸二無水物及び1,4−ヒドロキノンジベンゾエート−3,3’,4,4’−テトラカルボン酸二無水物より選ばれる成分を少なくとも1種含む酸成分、好ましくはこれらの酸成分を少なくとも70モル%以上、さらに好ましくは80モル%以上、より好ましくは90モル%以上含む酸成分と、
(2)ジアミン成分としてp−フェニレンジアミン、4,4−ジアミノジフェニルエーテル、m−トリジン及び4,4’−ジアミノベンズアニリドより選ばれる成分を少なくとも1種含むジアミン、好ましくはこれらのジアミン成分を少なくとも70モル%以上、さらに好ましくは80モル%以上、より好ましくは90モル%以上含むジアミン成分とから得られるポリイミドなどを用いることができる。
特に、中心基材となるポリイミドを構成する酸成分とジアミン成分との組合せの一例としては、
1)3,3’,4,4’−ビフェニルテトラカルボン酸二無水物と、p−フェニレンジアミン或いはp−フェニレンジアミン及び4,4−ジアミノジフェニルエ−テル、
2)3,3’,4,4’−ビフェニルテトラカルボン酸二無水物及びピロメリット酸二無水物と、p−フェニレンジアミン或いはp−フェニレンジアミン及び4,4−ジアミノジフェニルエ−テル、
3)ピロメリット酸二無水物と、p−フェニレンジアミン及び4,4−ジアミノジフェニルエ−テル、
4)3,3’,4,4’−ビフェニルテトラカルボン酸二無水物とp−フェニレンジアミンとを主成分(合計100モル%中の50モル%以上)として得られるものが、プリント配線板、フレキシブルプリント基板、TABテープ等の電子部品の素材として用いられ、広い温度範囲にわたって優れた機械的特性を有し、長期耐熱性を有し、耐加水分解性に優れ、熱分解開始温度が高く、加熱収縮率と線膨張係数が小さい、難燃性に優れるために好ましい。
As polyimide as the central substrate,
(1) 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, pyromellitic dianhydride and 1,4-hydroquinone dibenzoate-3,3 ′, 4,4′-tetracarboxylic acid bis An acid component containing at least one component selected from anhydrides, preferably an acid component containing at least 70 mol% or more, more preferably 80 mol% or more, more preferably 90 mol% or more of these acid components;
(2) A diamine containing at least one component selected from p-phenylenediamine, 4,4-diaminodiphenyl ether, m-tolidine, and 4,4′-diaminobenzanilide as the diamine component, preferably at least 70 of these diamine components. A polyimide obtained from a diamine component containing at least mol%, more preferably at least 80 mol%, more preferably at least 90 mol% can be used.
In particular, as an example of a combination of an acid component and a diamine component that constitutes the polyimide serving as the central substrate,
1) 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, p-phenylenediamine or p-phenylenediamine and 4,4-diaminodiphenyl ether,
2) 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride and pyromellitic dianhydride, p-phenylenediamine or p-phenylenediamine and 4,4-diaminodiphenyl ether,
3) pyromellitic dianhydride, p-phenylenediamine and 4,4-diaminodiphenyl ether,
4) What is obtained by using 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride and p-phenylenediamine as main components (50 mol% or more in a total of 100 mol%) is a printed wiring board, Used as a material for electronic components such as flexible printed circuit boards and TAB tapes, has excellent mechanical properties over a wide temperature range, has long-term heat resistance, excellent hydrolysis resistance, and high thermal decomposition starting temperature, It is preferable because the heat shrinkage rate and the linear expansion coefficient are small and the flame retardancy is excellent.

中心基材となるポリイミドを得ることができる酸成分として、上記に示す酸成分の他に本発明の特性を損なわない範囲で、
2,3,3’,4’−ビフェニルテトラカルボン酸二無水物、3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物、ビス(3,4−ジカルボキシフェニル)エーテル二無水物、ビス(3,4−ジカルボキシフェニル)スルフィド二無水物、ビス(3,4−ジカルボキシフェニル)スルホン二無水物、ビス(3,4−ジカルボキシフェニル)メタン二無水物、2,2−ビス(3,4−ジカルボキシフェニル)プロパン二無水物、2,2−ビス(3,4−ジカルボキシフェニル)−1,1,1,3,3,3−ヘキサフルオロプロパン二無水物、2,2−ビス[(3,4−ジカルボキシフェノキシ)フェニル]プロパン二無水物、などの酸ニ無水物成分を用いることができる。
As an acid component that can obtain a polyimide as a central substrate, in addition to the acid component shown above, the characteristics of the present invention are not impaired.
2,3,3 ′, 4′-biphenyltetracarboxylic dianhydride, 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride, bis (3,4-dicarboxyphenyl) ether dianhydride Bis (3,4-dicarboxyphenyl) sulfide dianhydride, bis (3,4-dicarboxyphenyl) sulfone dianhydride, bis (3,4-dicarboxyphenyl) methane dianhydride, 2,2- Bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (3,4-dicarboxyphenyl) -1,1,1,3,3,3-hexafluoropropane dianhydride, 2 Acid dianhydride components such as 2-bis [(3,4-dicarboxyphenoxy) phenyl] propane dianhydride can be used.

中心基材となるポリイミドを得ることができるジアミン成分として、上記に示すジアミン成分の他に本発明の特性を損なわない範囲で、
m−フェニレンジアミン、3,4’−ジアミノジフェニルエーテル、3,3’−ジアミノジフェニルスルフィド、3,4’−ジアミノジフェニルスルフィド、4,4’−ジアミノジフェニルスルフィド、3,3’−ジアミノジフェニルスルホン、3,4’−ジアミノジフェニルスルホン、4,4’−ジアミノジフェニルスルホン、3,3’−ジアミノベンゾフェノン、4,4’−ジアミノベンゾフェノン、3,4’−ジアミノベンゾフェノン、3,3’−ジアミノジフェニルメタン、4,4’−ジアミノジフェニルメタン、3,4’−ジアミノジフェニルメタン、2,2−ジ(3−アミノフェニル)プロパン、2,2−ジ(4−アミノフェニル)プロパン、などのジアミン成分を用いることができる。
As a diamine component that can obtain a polyimide as a central substrate, in addition to the diamine component shown above, the characteristics of the present invention are not impaired.
m-phenylenediamine, 3,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl sulfide, 3,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfide, 3,3'-diaminodiphenyl sulfone, 3 4,4′-diaminodiphenylsulfone, 4,4′-diaminodiphenylsulfone, 3,3′-diaminobenzophenone, 4,4′-diaminobenzophenone, 3,4′-diaminobenzophenone, 3,3′-diaminodiphenylmethane, 4, , 4'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 2,2-di (3-aminophenyl) propane, 2,2-di (4-aminophenyl) propane, and the like can be used. .

熱圧着性ポリイミド基材となるポリイミドは、プリント配線板、フレキシブルプリント基板、TABテープ等の電子部品の素材として用いることができる公知の熱融着性或いは熱圧着性を有するポリイミドを用いることができる。
熱圧着性(熱融着性)ポリイミド基材となるポリイミドとしては、金属箔と熱融着(熱圧着)することができるポリイミドを用いることができ、好ましくは150℃〜400℃、さらに好ましくは200〜400℃、より好ましくは250〜400℃の温度で熱融着(熱圧着)できる熱可塑性ポリイミドなどのポリイミドを用いることができる。
熱圧着性ポリイミド基材となるポリイミドは、ガラス転移温度が好ましくは170〜320℃、より好ましくは180〜300℃、さらに好ましくは190〜280℃、特に好ましくは200〜275℃のものを用いることができる。
The polyimide used as the thermocompression-bonding polyimide substrate can be a known heat-bondable or thermocompression-bondable polyimide that can be used as a material for electronic components such as printed wiring boards, flexible printed boards, and TAB tapes. .
As a polyimide used as a thermocompression bonding (heat-bonding) polyimide substrate, a polyimide that can be heat-bonded (thermocompression bonding) with a metal foil can be used, preferably 150 to 400 ° C, more preferably. A polyimide such as a thermoplastic polyimide that can be heat-sealed (thermocompression bonded) at a temperature of 200 to 400 ° C., more preferably 250 to 400 ° C., can be used.
The polyimide used as the thermocompression bonding substrate is preferably one having a glass transition temperature of 170 to 320 ° C, more preferably 180 to 300 ° C, still more preferably 190 to 280 ° C, and particularly preferably 200 to 275 ° C. Can do.

熱圧着性ポリイミド基材となるポリイミドは、
(1)3,3’,4,4’−ビフェニルテトラカルボン酸二無水物、2,3,3’,4’−ビフェニルテトラカルボン酸二無水物、ピロメリット酸二無水物、3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物、ビス(3,4−ジカルボキシフェニル)エーテル二無水物、ビス(3,4−ジカルボキシフェニル)スルフィド二無水物、ビス(3,4−ジカルボキシフェニル)スルホン二無水物、ビス(3,4−ジカルボキシフェニル)メタン二無水物、2,2−ビス(3,4−ジカルボキシフェニル)プロパン二無水物及び1,4−ヒドロキノンジベンゾエート−3,3’,4,4’−テトラカルボン酸二無水物などの酸ニ無水物より選ばれる成分を少なくとも1種含む酸成分、好ましくはこれらの酸成分を少なくとも70モル%以上、さらに好ましくは80モル%以上、より好ましくは90モル%以上含む酸成分と、
(2)ジアミン成分としては、1,3−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(3−アミノフェノキシ)ベンゼン、1,4−ビス(4−アミノフェノキシ)ベンゼン、3,3’−ジアミノベンゾフェノン、4,4’−ビス(3−アミノフェノキシ)ビフェニル、4,4’−ビス(4−アミノフェノキシ)ビフェニル、ビス[4−(3−アミノフェノキシ)フェニル]ケトン、ビス[4−(4−アミノフェノキシ)フェニル]ケトン、ビス[4−(3−アミノフェノキシ)フェニル]スルフィド、ビス[4−(4−アミノフェノキシ)フェニル]スルフィド、ビス[4−(3−アミノフェノキシ)フェニル]スルホン、ビス[4−(4−アミノフェノキシ)フェニル]スルホン、ビス[4−(3−アミノフェノキシ)フェニル]エーテル、ビス[4−(4−アミノフェノキシ)フェニル]エーテル、2,2−ビス[4−(3−アミノフェノキシ)フェニル]プロパン、2,2−ビス[4−(4−アミノフェノキシ)フェニル]プロパンなどのジアミンより選ばれる成分を少なくとも1種含むジアミン、好ましくはこれらのジアミン成分を少なくとも70モル%以上、さらに好ましくは80モル%以上、より好ましくは90モル%以上含むジアミン成分とから得られるポリイミドなどを用いることができる。
The polyimide used as the thermocompression bonding polyimide substrate is
(1) 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 2,3,3 ′, 4′-biphenyltetracarboxylic dianhydride, pyromellitic dianhydride, 3,3 ′ , 4,4′-benzophenonetetracarboxylic dianhydride, bis (3,4-dicarboxyphenyl) ether dianhydride, bis (3,4-dicarboxyphenyl) sulfide dianhydride, bis (3,4- Dicarboxyphenyl) sulfone dianhydride, bis (3,4-dicarboxyphenyl) methane dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride and 1,4-hydroquinone dibenzoate An acid component containing at least one component selected from acid dianhydrides such as −3,3 ′, 4,4′-tetracarboxylic dianhydride, preferably at least 70 mol% of these acid components; Preferably 80 mol% or more, more preferably an acid component comprising 90 mol% or more,
(2) As the diamine component, 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (3-aminophenoxy) benzene, 1,4-bis (4-aminophenoxy) benzene, 3,3 '-Diaminobenzophenone, 4,4'-bis (3-aminophenoxy) biphenyl, 4,4'-bis (4-aminophenoxy) biphenyl, bis [4- (3-aminophenoxy) phenyl] ketone, bis [4 -(4-aminophenoxy) phenyl] ketone, bis [4- (3-aminophenoxy) phenyl] sulfide, bis [4- (4-aminophenoxy) phenyl] sulfide, bis [4- (3-aminophenoxy) phenyl Sulfone, bis [4- (4-aminophenoxy) phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] Ter, bis [4- (4-aminophenoxy) phenyl] ether, 2,2-bis [4- (3-aminophenoxy) phenyl] propane, 2,2-bis [4- (4-aminophenoxy) phenyl] It is obtained from a diamine containing at least one component selected from diamines such as propane, preferably a diamine component containing these diamine components at least 70 mol% or more, more preferably 80 mol% or more, more preferably 90 mol% or more. Polyimide or the like can be used.

熱圧着性ポリイミド基材となるポリイミドを得ることができる酸成分とジアミン成分との組合せの一例としては、
(1)3,3’,4,4’−ビフェニルテトラカルボン酸二無水物及び2,3,3’,4’−ビフェニルテトラカルボン酸二無水物の酸ニ無水物より選ばれる成分を少なくとも1種含む酸成分、好ましくはこれらの酸成分を少なくとも70モル%以上、さらに好ましくは80モル%以上、より好ましくは90モル%以上含む酸成分と、
(2)ジアミン成分としては、1,3−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(3−アミノフェノキシ)ベンゼン4,4’−ビス(3−アミノフェノキシ)ビフェニル、ビス[4−(3−アミノフェノキシ)フェニル]スルホン、ビス[4−(3−アミノフェノキシ)フェニル]エーテル、2,2−ビス[4−(3−アミノフェノキシ)フェニル]プロパン、2,2−ビス[4−(4−アミノフェノキシ)フェニル]プロパンなどのジアミンより選ばれる成分を少なくとも1種含むジアミン、好ましくはこれらのジアミン成分を少なくとも70モル%以上、さらに好ましくは80モル%以上、より好ましくは90モル%以上含むジアミン成分とから得られるポリイミドなどを用いることができる。
As an example of a combination of an acid component and a diamine component that can obtain a polyimide to be a thermocompression bonding polyimide substrate,
(1) At least one component selected from acid dianhydrides of 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride and 2,3,3 ′, 4′-biphenyltetracarboxylic dianhydride An acid component containing seeds, preferably an acid component containing at least 70 mol% or more, more preferably 80 mol% or more, more preferably 90 mol% or more of these acid components;
(2) As the diamine component, 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (3-aminophenoxy) benzene 4,4′-bis (3-aminophenoxy) biphenyl, bis [4 -(3-aminophenoxy) phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] ether, 2,2-bis [4- (3-aminophenoxy) phenyl] propane, 2,2-bis [4 A diamine containing at least one component selected from diamines such as-(4-aminophenoxy) phenyl] propane, preferably at least 70 mol%, more preferably 80 mol% or more, more preferably 90 mol, of these diamine components. The polyimide etc. which are obtained from the diamine component which contains% or more can be used.

熱圧着性ポリイミド基材となるポリイミドを得ることができるジアミン成分として、上記に示すジアミン成分の他に本発明の特性を損なわない範囲で、
m−フェニレンジアミン、3,4’−ジアミノジフェニルエーテル、3,3’−ジアミノジフェニルスルフィド、3,4’−ジアミノジフェニルスルフィド、4,4’−ジアミノジフェニルスルフィド、3,3’−ジアミノジフェニルスルホン、3,4’−ジアミノジフェニルスルホン、4,4’−ジアミノジフェニルスルホン、3,3’−ジアミノベンゾフェノン、4,4’−ジアミノベンゾフェノン、3,4’−ジアミノベンゾフェノン、3,3’−ジアミノジフェニルメタン、4,4’−ジアミノジフェニルメタン、3,4’−ジアミノジフェニルメタン、2,2−ジ(3−アミノフェニル)プロパン、2,2−ジ(4−アミノフェニル)プロパン、などのジアミン成分を用いることができる。
As a diamine component that can obtain a polyimide that becomes a thermocompression bonding polyimide substrate, in addition to the diamine component shown above, the characteristics of the present invention are not impaired.
m-phenylenediamine, 3,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl sulfide, 3,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfide, 3,3'-diaminodiphenyl sulfone, 3 4,4′-diaminodiphenylsulfone, 4,4′-diaminodiphenylsulfone, 3,3′-diaminobenzophenone, 4,4′-diaminobenzophenone, 3,4′-diaminobenzophenone, 3,3′-diaminodiphenylmethane, 4, , 4'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 2,2-di (3-aminophenyl) propane, 2,2-di (4-aminophenyl) propane, and the like can be used. .

熱圧着性基材となるポリイミドの物性を損なわない範囲で他のテトラカルボン酸二無水物、例えば3,3’,4,4’−ビフェニルテトラカルボン酸二無水物、2,2−ビス(3、4−ジカルボキシフェニル)プロパン二無水物あるいは2,3,6,7−ナフタレンテトラカルボン酸二無水物など、好適には3,3’,4,4’−ビフェニルテトラカルボン酸二無水物で置き換えられてもよい。また、熱圧着性ポリイミドの物性を損なわない範囲で他のジアミン、例えば4,4’−ジアミノジフェニルエ−テル、4,4’−ジアミノベンゾフェノン、4,4’−ジアミノジフェニルメタン、2,2−ビス(4−アミノフェニル)プロパン、1,4−ビス(4−アミノフェノキシ)ベンゼン、4,4’−ビス(4−アミノフェニル)ジフェニルエ−テル、4,4’−ビス(4−アミノフェニル)ジフェニルメタン、4,4’−ビス(4−アミノフェノキシ)ジフェニルエ−テル、4,4’−ビス(4−アミノフェノキシ)ジフェニルメタン、2,2−ビス〔4−(アミノフェノキシ)フェニル〕プロパン、2,2−ビス〔4−(4−アミノフェノキシ)フェニル〕ヘキサフルオロプロパンなどの複数のベンゼン環を有する柔軟な芳香族ジアミン、1,4−ジアミノブタン、1,6−ジアミノヘキサン、1,8−ジアミノオクタン、1,10−ジアミノデカン、1,12−ジアミノドデカンなどの脂肪族ジアミン、ビス(3−アミノプロピル)テトラメチルジシロキサンなどのジアミノジシロキサンによって置き換えられてもよい。他の芳香族ジアミンの使用割合は全ジアミンに対して20モル%以下、特に10モル%以下であることが好ましい。また、脂肪族ジアミンおよびジアミノジシロキサンの使用割合は全ジアミンに対して20モル%以下であることが好ましい。この割合を越すと熱圧着性ポリイミドの耐熱性が低下する。前記の熱圧着性ポリイミドのアミン末端を封止するためにジカルボン酸無水物、例えば、無水フタル酸およびその置換体、ヘキサヒドロ無水フタル酸およびその置換体、無水コハク酸およびその置換体など、特に、無水フタル酸を使用してもよい。   Other tetracarboxylic dianhydrides, such as 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 2,2-bis (3, as long as the physical properties of the polyimide used as the thermocompression bonding substrate are not impaired. , 4-dicarboxyphenyl) propane dianhydride or 2,3,6,7-naphthalenetetracarboxylic dianhydride, preferably 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride It may be replaced. Further, other diamines such as 4,4′-diaminodiphenyl ether, 4,4′-diaminobenzophenone, 4,4′-diaminodiphenylmethane, 2,2-bis, as long as the physical properties of the thermocompression bonding polyimide are not impaired. (4-aminophenyl) propane, 1,4-bis (4-aminophenoxy) benzene, 4,4′-bis (4-aminophenyl) diphenyl ether, 4,4′-bis (4-aminophenyl) Diphenylmethane, 4,4′-bis (4-aminophenoxy) diphenyl ether, 4,4′-bis (4-aminophenoxy) diphenylmethane, 2,2-bis [4- (aminophenoxy) phenyl] propane, 2, Flexible aromatic di- having a plurality of benzene rings, such as 2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane Mine, 1,4-diaminobutane, 1,6-diaminohexane, 1,8-diaminooctane, 1,10-diaminodecane, 1,12-diaminododecane and other aliphatic diamines, bis (3-aminopropyl) tetra It may be replaced by a diaminodisiloxane such as methyldisiloxane. The proportion of other aromatic diamine used is preferably 20 mol% or less, particularly preferably 10 mol% or less, based on the total diamine. Moreover, it is preferable that the usage-amount of aliphatic diamine and diaminodisiloxane is 20 mol% or less with respect to all the diamine. If this ratio is exceeded, the heat resistance of the thermocompression bonding polyimide decreases. Dicarboxylic anhydrides, such as phthalic anhydride and its substitutes, hexahydrophthalic anhydride and its substitutes, succinic anhydride and its substitutes, etc., for sealing the amine ends of the thermocompression bonding polyimides, Phthalic anhydride may be used.

中心基材となるポリイミド及び/又は熱圧着性基材となるポリイミドの合成は、最終的に各成分の割合が前記範囲内であればランダム重合、ブロック重合、あるいはあらかじめ2種類のポリアミック酸を合成しておき両ポリアミック酸溶液を混合後反応条件下で混合して均一溶液とする、いずれの方法によっても達成される。   The synthesis of the polyimide that will be the central substrate and / or the polyimide that will be the thermocompression bonding substrate will ultimately be random polymerization, block polymerization, or two types of polyamic acid if the proportion of each component is within the above range. In addition, it can be achieved by any method in which both polyamic acid solutions are mixed and then mixed under reaction conditions to obtain a uniform solution.

前記各成分を使用し、ジアミン成分とテトラカルボン酸二無水物の略等モル量を、有機溶媒中で反応させてポリアミック酸の溶液(均一な溶液状態が保たれていれば一部がイミド化されていてもよい)とする。   Using each of the above-mentioned components, a substantially equimolar amount of a diamine component and a tetracarboxylic dianhydride are reacted in an organic solvent to give a polyamic acid solution (partly imidized if a uniform solution state is maintained) May be used).

中心基材となるポリイミド及び/又は熱圧着性基材となるポリイミドの合成は、ジアミン成分とテトラカルボン酸二無水物成分とを、略等モル量(場合により、酸性分が過剰、或いはジアミン成分が過剰でも良い)を有機溶媒中、約100℃以下、特に20〜60℃の温度で反応させてポリアミック酸の溶液とし、このポリアミック酸の溶液をドープ液として使用し、そのドープ液の薄膜を形成し、その薄膜から溶媒を蒸発させ除去すると共にポリアミック酸をイミド環化することにより製造することができる。また、前述のようにして製造したポリアミック酸の溶液を150〜250℃に加熱するか、またはイミド化剤を添加して150℃以下、特に15〜50℃の温度で反応させて、イミド環化した後溶媒を蒸発させる、もしくは貧溶媒中に析出させて粉末とした後、該粉末を有機溶液に溶解して熱圧着性ポリイミドの有機溶媒溶液を得ることができる。
ポリアミック酸の溶液の溶液粘度は、製造方法に応じて適宜選択すればよく、ポリアミック(ポリイミド前駆体)酸溶液は、30℃で測定した回転粘度が、約0.1〜5000ポイズ、特に0.5〜2000ポイズ、さらに好ましくは1〜2000ポイズ程度のものであることが、このポリアミック酸溶液を取り扱う作業性の面から好ましい。したがって、前記の重合反応は、生成するポリアミック酸が上記のような粘度を示す程度にまで実施することが望ましい。
The synthesis of the polyimide as the central base material and / or the polyimide as the thermocompression bonding base material is carried out by using an approximately equimolar amount of the diamine component and the tetracarboxylic dianhydride component (in some cases, the acid content is excessive or the diamine component). Is allowed to react in an organic solvent at a temperature of about 100 ° C. or less, particularly 20 to 60 ° C., to form a polyamic acid solution, and this polyamic acid solution is used as a dope solution. It can be produced by evaporating and removing the solvent from the thin film and cyclizing the polyamic acid with an imide. In addition, the polyamic acid solution produced as described above is heated to 150 to 250 ° C., or an imidizing agent is added and reacted at a temperature of 150 ° C. or less, particularly 15 to 50 ° C. to imide cyclization. Thereafter, the solvent is evaporated or precipitated in a poor solvent to form a powder, and then the powder is dissolved in an organic solution to obtain an organic solvent solution of a thermocompression bonding polyimide.
The solution viscosity of the polyamic acid solution may be appropriately selected according to the production method, and the polyamic (polyimide precursor) acid solution has a rotational viscosity measured at 30 ° C. of about 0.1 to 5000 poises, particularly 0.8. From the viewpoint of workability in handling this polyamic acid solution, it is preferably about 5 to 2000 poise, more preferably about 1 to 2000 poise. Therefore, it is desirable to carry out the polymerization reaction to such an extent that the produced polyamic acid exhibits the above viscosity.

中心基材となるポリイミド及び/又は熱圧着性基材となるポリイミドを得るためには、有機溶媒中、ジアミン(アミノ基のモル数として)の使用量が酸無水物の全モル数(テトラ酸二無水物とジカルボン酸無水物の酸無水物基としての総モルとして)に対する比として、好ましくは0.92〜1.1、特に0.98〜1.1、そのなかでも特に0.99〜1.1であり、ジカルボン酸無水物の使用量がテトラカルボン酸二無水物の酸無水物基モル量に対する比として、好ましくは0.05以下であるような割合の各成分を反応させることができる。   In order to obtain a polyimide as a central substrate and / or a polyimide as a thermocompression bonding substrate, the amount of diamine (as the number of moles of amino group) used in the organic solvent is the total number of moles of acid anhydride (tetraacid (As the total moles of dianhydride and dicarboxylic anhydride as acid anhydride groups), preferably 0.92 to 1.1, in particular 0.98 to 1.1, in particular 0.99 to 1.1, and the ratio of the amount of the dicarboxylic acid anhydride used to react the tetracarboxylic dianhydride with respect to the molar amount of the acid anhydride group is preferably 0.05 or less. it can.

前記のジアミンおよびジカルボン酸無水物の使用割合が前記の範囲外であると、得られるポリアミック酸、従って熱圧着性ポリイミドの分子量が小さく、金属箔との積層体の接着強度の低下をもたらす場合がある。また、ポリアミック酸のゲル化を制限する目的でリン系安定剤、例えば亜リン酸トリフェニル、リン酸トリフェニル等をポリアミック酸重合時に固形分(ポリマ−)濃度に対して0.01〜1%の範囲で添加することができる。また、イミド化促進の目的で、ド−プ液中に塩基性有機化合物を添加することができる。例えば、イミダゾ−ル、2−イミダゾ−ル、1,2−ジメチルイミダゾ−ル、2−フェニルイミダゾ−ル、ベンズイミダゾ−ル、イソキノリン、置換ピリジンなどをポリアミック酸に対して0.05〜10質量%、特に0.1〜2質量%の割合で使用することができる。これらは比較的低温でポリイミドフィルムを形成するため、イミド化が不十分となることを避けるために使用することができる。また、接着強度の安定化の目的で、熱圧着性ポリイミド原料ド−プに有機アルミニウム化合物、無機アルミニウム化合物または有機錫化合物を添加してもよい。例えば水酸化アルミニウム、アルミニウムトリアセチルアセトナ−トなどをポリアミック酸に対してアルミニウム金属として1ppm以上、特に1〜1000ppmの割合で添加することができる。   When the ratio of the diamine and dicarboxylic acid anhydride is out of the above range, the resulting polyamic acid, and thus the molecular weight of the thermocompression bonding polyimide, is small, which may result in a decrease in the adhesive strength of the laminate with the metal foil. is there. Further, for the purpose of limiting the gelation of polyamic acid, phosphorus stabilizers such as triphenyl phosphite and triphenyl phosphate are 0.01 to 1% based on the solid content (polymer) concentration during polyamic acid polymerization. It can be added in the range of. For the purpose of promoting imidization, a basic organic compound can be added to the dope solution. For example, 0.05-10 mass of imidazole, 2-imidazole, 1,2-dimethylimidazole, 2-phenylimidazole, benzimidazole, isoquinoline, substituted pyridine, etc. with respect to the polyamic acid. %, In particular 0.1 to 2% by weight. Since these form a polyimide film at a relatively low temperature, they can be used to avoid insufficient imidization. For the purpose of stabilizing the adhesive strength, an organoaluminum compound, an inorganic aluminum compound, or an organotin compound may be added to the thermocompression bonding polyimide raw material dope. For example, aluminum hydroxide, aluminum triacetylacetonate or the like can be added in an amount of 1 ppm or more, particularly 1 to 1000 ppm as an aluminum metal with respect to the polyamic acid.

ポリアミック酸製造に使用する有機溶媒は、中心基材となるポリイミド及び/又は熱圧着性基材となるポリイミドのいずれに対しても、N−メチル−2−ピロリドン、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N,N−ジエチルアセトアミド、ジメチルスルホキシド、ヘキサメチルホスホルアミド、N−メチルカプロラクタム、クレゾ−ル類などが挙げられる。これらの有機溶媒は単独で用いてもよく、2種以上を併用してもよい。   The organic solvent used for the production of polyamic acid is N-methyl-2-pyrrolidone, N, N-dimethylformamide, N for any of polyimide as a central substrate and / or polyimide as a thermocompression bonding substrate. , N-dimethylacetamide, N, N-diethylacetamide, dimethylsulfoxide, hexamethylphosphoramide, N-methylcaprolactam, cresols and the like. These organic solvents may be used alone or in combination of two or more.

多層のポリイミドフィルムの製造においては、例えば中心基材のポリイミドのポリアミック酸の溶液と、熱圧着層用のポリアミック酸の溶液を支持体上に共押出して流延塗布し、自己支持性となる程度(通常のキュア工程前の段階を意味する)、例えば支持体上より剥離することができる程度であり、温度100〜180℃で2〜60分間程度加熱して自己支持性フィルムを製造される。自己支持性フィルムは、溶媒および生成水分が好ましくは約25〜60重量%、特に好ましくは30〜50重量%残存している固化フィルムを挙げることが出来る。
自己支持性フィルムを加熱処理してポリイミドフィルムを得る。自己支持性フィルムの加熱処理としては、公知の方法を用いることが出来、例えば、連続的または断続的に自己支持性フィルムの少なくとも一対の両端縁を連続的または断続的に前記フィルムと共に移動可能な固定装置などで固定した状態で、前記の乾燥温度より高く、しかも好ましくは200〜550℃の範囲内、さらに好ましくは300〜500℃の範囲内、特に好ましくは320〜500℃の範囲内の高温度で、好ましくは1〜100分間、特に1〜10分間、前記自己支持性フィルムを乾燥および熱処理して、好ましくは最終的に得られるポリイミドフィルム中の有機溶媒および生成水等からなる揮発物の含有量が1重量%以下になるように、自己支持性フィルムから溶媒などを充分に除去するとともに前記フィルムを構成しているポリマーのイミド化を充分に行って、熱融着性を有する多層ポリイミドフィルムを形成する。
また、200℃以上の連続加熱処理においては、ピンテンタ、クリップ、枠などで、少なくとも長尺の自己支持性フィルムの長手方向に直角の方向の両端縁を固定して加熱処理を行うことが好ましい。特に薄い厚みのフィルムを製造する場合には、加熱処理時間は短くてもよい。
支持体としては、例えばステンレス基板、ステンレスベルトなどが使用される。
ポリイミドのポリアミック酸の溶液は、さらにイミド化触媒、有機リン含有化合物、無機微粒子などを加えたものを用いることが出来る。
なお、上記の自己支持性フィルムの加熱減量とは、測定対象のフィルムを420℃で20分間乾燥し、乾燥前の重量W1と乾燥後の重量W2とから数式1に従って算出した値である。

Figure 0005040451
また、上記の自己支持性フィルムのイミド化率は、IR(ATR)で測定し、フィルムとフルキュア品との振動帯ピーク面積の比を利用して、イミド化率を算出することができる。振動帯ピークとしては、イミドカルボニル基の対称伸縮振動帯やベンゼン環骨格伸縮振動帯などを利用する。またイミド化率測定に関し、特開平9−316199号公報に記載のカールフィッシャー水分計を用いる手法もある。 In the production of a multilayer polyimide film, for example, a polyamic acid solution of polyimide as a central base material and a polyamic acid solution for a thermocompression bonding layer are coextruded on a support and cast to the extent that it becomes self-supporting. (It means the stage before the normal curing process), for example, it can be peeled from the support, and is heated at a temperature of 100 to 180 ° C. for about 2 to 60 minutes to produce a self-supporting film. Examples of the self-supporting film include a solidified film in which the solvent and generated water are preferably about 25 to 60% by weight, particularly preferably 30 to 50% by weight.
A self-supporting film is heat-treated to obtain a polyimide film. As the heat treatment of the self-supporting film, a known method can be used. For example, at least a pair of both edges of the self-supporting film can be moved with the film continuously or intermittently. In a state of being fixed by a fixing device or the like, the temperature is higher than the drying temperature, preferably in the range of 200 to 550 ° C, more preferably in the range of 300 to 500 ° C, and particularly preferably in the range of 320 to 500 ° C. The self-supporting film is dried and heat-treated at a temperature, preferably for 1 to 100 minutes, particularly for 1 to 10 minutes, and preferably a volatile substance composed of an organic solvent and product water in the finally obtained polyimide film. The solvent is sufficiently removed from the self-supporting film and the film is constituted so that the content is 1% by weight or less. The imidization of Rimmer performed sufficiently to form a multi-layer polyimide film having thermal adhesiveness.
Further, in the continuous heat treatment at 200 ° C. or higher, it is preferable to carry out the heat treatment with pin tenters, clips, frames, etc., at least fixing both end edges in the direction perpendicular to the longitudinal direction of the long self-supporting film. In particular, when a thin film is manufactured, the heat treatment time may be short.
As the support, for example, a stainless steel substrate or a stainless steel belt is used.
As the polyimide polyamic acid solution, a solution obtained by further adding an imidization catalyst, an organic phosphorus-containing compound, inorganic fine particles and the like can be used.
The loss on heating of the self-supporting film is a value calculated according to Equation 1 from the weight W1 before drying and the weight W2 after drying after drying the film to be measured at 420 ° C. for 20 minutes.
Figure 0005040451
Moreover, the imidation rate of said self-supporting film can be measured by IR (ATR), and an imidation rate can be calculated using the ratio of the vibration band peak area of a film and a full cure product. As the vibration band peak, a symmetric stretching vibration band of an imidecarbonyl group, a benzene ring skeleton stretching vibration band, or the like is used. Further, regarding the imidization rate measurement, there is also a method using a Karl Fischer moisture meter described in JP-A-9-316199.

両面が熱圧着性を有する樹脂フィルムの厚みは、好ましくは8〜125μmの範囲、より好ましくは9〜75μm、さらに好ましくは10〜40μm、さらに好ましくは12〜28μmの範囲、特に好ましくは12〜18μmの範囲である。
両面が熱圧着性を有する樹脂フィルムは、樹脂フィルムの両面に熱圧着性を有する層が形成され、好ましくは樹脂フィルムの両面に厚みが略等しい熱圧着性を有する層が形成されている。
両面が熱圧着性を有する樹脂フィルムは、樹脂フィルムの両面に熱圧着性を有する層が一体となるように形成されているものを用いることができる。
両面が熱圧着性を有する樹脂フィルムは、両面に厚みが略等しい熱圧着性層を有し、片面の熱圧着性層の厚みと他面の熱圧着性層の厚みとの合計が3〜10μm、好ましくは3〜9μm、さらに好ましくは3〜8μmであることが、金属箔との圧着性に優れ、カールしない又はしにくい積層体を得ることが出来る。
The thickness of the resin film having thermocompression bonding on both sides is preferably in the range of 8 to 125 μm, more preferably 9 to 75 μm, still more preferably 10 to 40 μm, still more preferably 12 to 28 μm, and particularly preferably 12 to 18 μm. Range.
In the resin film having both surfaces having thermocompression bonding, layers having thermocompression bonding are formed on both surfaces of the resin film, and preferably, layers having thermocompression bonding having substantially the same thickness are formed on both surfaces of the resin film.
As the resin film having both surfaces having thermocompression bonding, a resin film formed so that the layers having thermocompression bonding are integrated on both surfaces of the resin film can be used.
A resin film having thermocompression bonding on both sides has a thermocompression bonding layer having substantially the same thickness on both surfaces, and the total of the thickness of the thermocompression bonding layer on one side and the thickness of the thermocompression bonding layer on the other surface is 3 to 10 μm. The laminate preferably has a thickness of 3 to 9 μm, more preferably 3 to 8 μm, and can provide a laminate that is excellent in pressure-bonding property to the metal foil and does not curl or hardly curl.

金属箔としては、銅、アルミニウム、金、合金の箔など各種金属箔が挙げられるが、好適には圧延銅箔、電解銅箔、アルミニウム箔などがあげられる。金属箔として、表面粗さRzが0.5μm以上であるものを用いることが出来る。また、金属箔の表面粗さRzが10μm以下、特に7μm以下であるものが好ましい。   Examples of the metal foil include various metal foils such as copper, aluminum, gold, and alloy foils, and preferred examples include rolled copper foil, electrolytic copper foil, and aluminum foil. A metal foil having a surface roughness Rz of 0.5 μm or more can be used. Further, it is preferable that the surface roughness Rz of the metal foil is 10 μm or less, particularly 7 μm or less.

剥離材は、金属箔と両面が熱圧着性を有する樹脂フィルムとを、加熱加圧式の熱圧着装置によりはりあわせた積層体より、容易にはがせるものであればよく、金属箔と両面が熱圧着性を有する樹脂フィルムとを加熱加圧式の熱圧着装置ではりあわせる場合には、そのはり合わせ温度や圧力で大きな変形しないものが好ましい。
剥離材としては、Rzが3μm未満の樹脂フィルムや金属箔を挙げることができる。
剥離材としては、PTFEなどのフッ素樹脂フィルム、ユ−ピレックスS(宇部興産製)などのポリイミドフィルム、アラミドフィルムなどの樹脂フィルム、圧延銅箔、圧延アルミニウム箔、電解銅箔などの金属箔などを挙げることができる。
The release material may be any material that can be easily peeled off from a laminate in which a metal foil and a resin film having thermocompression bonding on both sides are bonded together by a heat and pressure type thermocompression bonding apparatus. In the case where the resin film having the properties is bonded with a heat-pressure type thermocompression bonding apparatus, it is preferable that the resin film does not deform greatly due to the bonding temperature and pressure.
Examples of the release material include resin films and metal foils having an Rz of less than 3 μm.
Examples of release materials include fluororesin films such as PTFE, polyimide films such as Upilex S (manufactured by Ube Industries), resin films such as aramid films, metal foils such as rolled copper foil, rolled aluminum foil, and electrolytic copper foil. Can be mentioned.

ロール状積層体の製造方法の一例を示す。
両面が熱圧着性を有する樹脂フィルムと、その片面に金属箔を、他面に補強材を重ねて、少なくとも一対の加熱加圧式の熱圧着装置に連続的に供給して、加圧部の温度が熱圧着性層の熱圧着可能な温度範囲で加熱下に熱圧着して、樹脂フィルムの金属箔の反対側に離型材が重ねられている長尺のロール状積層体、好ましくは剥離材を内側にしている長尺のロール状積層体を製造することができる。
加熱加圧式の熱圧着装置としては、加圧部材を有する装置であり、一対の圧着金属ロ−ル(圧着部は金属製、セラミック溶射金属製のいずれでもよい)、ダブルベルトプレスが挙げられ、特に加圧下に熱圧着および冷却できるものであって、そのなかでも特にダブルベルトプレスを好適に挙げることができる。
An example of the manufacturing method of a roll-shaped laminated body is shown.
Resin film with thermocompression bonding on both sides, metal foil on one side, and reinforcing material on the other side, and continuously supplied to at least a pair of heat and pressure thermocompression bonding equipment Is a long roll-shaped laminate, preferably a release material, which is thermocompressed under heating in a temperature range where the thermocompression bonding layer can be thermocompressed, and a release material is stacked on the opposite side of the metal foil of the resin film. A long roll-shaped laminated body on the inside can be manufactured.
The heat and pressure type thermocompression bonding device is a device having a pressure member, and includes a pair of pressure bonding metal rolls (the pressure bonding portion may be made of metal or ceramic sprayed metal), a double belt press, In particular, it can be thermocompression-bonded and cooled under pressure, and among them, a double belt press can be particularly preferred.

本発明において、両面が熱圧着性を有する樹脂フィルムと金属箔とを、ダブルベルトプレスに導く入口ドラムに沿わせることによって、好適には100℃より高く250℃以下の温度で2〜120秒間程度予熱して、加圧下で熱圧着−冷却してはり合わせることによって、片面金属箔積層樹脂フィルムを得ることができる。   In the present invention, the resin film and the metal foil having thermocompression bonding on both sides are placed along an inlet drum that leads to a double belt press, preferably at a temperature higher than 100 ° C. and lower than 250 ° C. for about 2 to 120 seconds. A single-sided metal foil laminated resin film can be obtained by preheating, thermocompression-bonding under pressure, cooling and bonding.

本発明において、樹脂フィルムを予め予熱することにより、ポリイミドなどのように樹脂フィルムに含有されている水分によりラミネート後の積層体に発泡による外観不良が発生したり、電子回路形成時の半田浴浸漬時に発泡が生じ、製品収率が悪化することを防ぐことが出来る。樹脂フィルムを予め予熱する方法としては、加熱加圧装置に供給する前に予熱できるものであればよく、例えばラミネート装置全体を炉の中に設置する方法などを挙げることが出来る。   In the present invention, by preheating the resin film in advance, appearance defects due to foaming may occur in the laminated body after lamination due to moisture contained in the resin film such as polyimide, or immersion in a solder bath when forming an electronic circuit Occasional foaming can be prevented and the product yield can be prevented from deteriorating. As a method for preheating the resin film in advance, any method can be used as long as it can be preheated before being supplied to the heating and pressurizing apparatus.

本発明の片面金属箔積層樹脂フィルムの製造法において、好適にはダブルベルトプレスの加熱圧着ゾ−ンの温度が熱圧着性ポリイミドのガラス転移温度より20℃以上高く400℃以下の温度、特にガラス転移温度より30℃以上高く400℃以下の温度で加圧下に熱圧着し、引き続いて冷却ゾ−ンで加圧下に冷却して、好適には熱圧着性ポリイミドのガラス転移温度より20℃以上低い温度、特に30℃以上低い温度まで冷却して、積層することによって製造することができる。   In the method for producing a single-sided metal foil laminated resin film of the present invention, the temperature of the thermocompression bonding zone of the double belt press is preferably 20 ° C. or more higher than the glass transition temperature of the thermocompression bonding polyimide and 400 ° C. or less, particularly glass. Thermocompression bonding under pressure at a temperature of 30 ° C. or higher and 400 ° C. or lower than the transition temperature, followed by cooling under pressure with a cooling zone, preferably 20 ° C. or more lower than the glass transition temperature of the thermocompression bonding polyimide It can be manufactured by cooling and laminating to a temperature, especially a temperature lower by 30 ° C. or more.

本発明の片面金属箔積層樹脂フィルムの製造法において、剥離容易な高耐熱性フィルム、例えば前記のRzが2μm未満の高耐熱性フィルムまたは金属箔、好適にはポリイミドフィルム(宇部興産社製、ユ−ピレックスS)、フッ素樹脂フィルム、銅箔などの高耐熱性フィルムなどの保護材を、金属箔とダブルベルトプレスのベルトの間に介在させてもよい。この保護材は積層後、積層体から除いて巻き取ることが好ましい。   In the method for producing a single-sided metal foil laminated resin film of the present invention, a highly heat-resistant film that can be easily peeled, such as a high heat-resistant film or metal foil having a Rz of less than 2 μm, preferably a polyimide film (manufactured by Ube Industries, Ltd. -A protective material such as a heat-resistant film such as Pyrex S), a fluororesin film, or a copper foil may be interposed between the metal foil and the belt of the double belt press. This protective material is preferably removed from the laminate after being laminated and wound up.

本発明においては、ダブルベルトプレスを用いて加圧下に熱圧着−冷却して積層することによって、好適には引き取り速度1m/分以上とすることができ、得られるフレキシブル金属箔積層体は、長尺で幅が約400mm以上、特に約500mm以上の幅広の、接着強度が大きく(90°ピ−ル強度:0.7kN/m以上、さらに0.8kN/m以上、さらに0.9kN/m以上、特に1kN/m以上)、金属箔表面に皺が実質的に認められない程外観が良好なフレキシブル金属箔積層体を得ることができる。   In the present invention, it is possible to preferably achieve a take-up speed of 1 m / min or more by laminating by thermocompression-cooling under pressure using a double belt press, and the resulting flexible metal foil laminate is long. Adhesive strength with a width of about 400 mm or more, especially about 500 mm or more, and high adhesion strength (90 ° peel strength: 0.7 kN / m or more, further 0.8 kN / m or more, further 0.9 kN / m or more In particular, it is possible to obtain a flexible metal foil laminate having a good appearance so that wrinkles are not substantially observed on the surface of the metal foil.

本発明において、片面金属箔積層樹脂フィルムは、両面が熱圧着性を有する樹脂フィルム、金属箔、及び離型材がロ−ル巻きの状態でダブルベルトプレスにそれぞれ供給され、片面金属箔積層樹脂フィルムと離型材とを重ねてロール巻きの状態で得ることができる。   In the present invention, the single-sided metal foil laminated resin film is a single-sided metal foil laminated resin film that is supplied to a double belt press in a state in which the resin film having both sides thermocompression bonding, the metal foil, and the release material are rolled. And a mold release material can be obtained in a rolled state.

片面金属箔積層樹脂フィルムは、カメラ、パソコン、液晶ディスプレイなどの電子機器類への用途のフレキシブルプリント板(FPC)やテ−プ・オ−トメイティッド・ボンディング(TAB)、COFなどの基板材料として使用することができる。
片面金属箔積層樹脂フィルムは、カールが小さく、ファインピッチ回路を形成する基板材料として好適に用いることが出来る。
Single-sided metal foil laminated resin film is used as a substrate material for flexible printed boards (FPC), tape-automated bonding (TAB), COF, etc. for electronic devices such as cameras, personal computers and liquid crystal displays. Can be used.
The single-sided metal foil laminated resin film has a small curl and can be suitably used as a substrate material for forming a fine pitch circuit.

本発明のロール状積層体の製造方法より得られる片面金属箔積層樹脂フィルムと離型材との積層体の長さ540mm×幅700mm(又は長さ540mm×幅400mm)に裁断した試料は、
1)カール量はTD側両端部が離型フィルム側に好ましくは25mm以下、より好ましくは20mm以下、さらに好ましくは15mm以下、特に好ましくは10mm以下であること、
及び/又は、
2)カール量はTD側両端部が金属箔側に好ましくは25mm以下、より好ましくは20mm以下、さらに好ましくは15mm以下、特に好ましくは10mm以下であること、
の特徴を有する。
さらに、本発明のロール状積層体の製造方法より得られる片面金属箔積層樹脂フィルムと離型材との積層体の長さ540mm×幅700mm(又は長さ540mm×幅400mm)に裁断した試料は、
カール量はMD側両端部が離型フィルム側又は金属箔側に好ましくは25mm以下、より好ましくは15mm以下、さらに好ましくは8mm以下、特に好ましくは5mm以下であることが好ましい。
A sample cut into a length of 540 mm × width of 700 mm (or length of 540 mm × width of 400 mm) of a laminate of a single-sided metal foil laminated resin film and a release material obtained from the method for producing a roll-shaped laminate of the present invention,
1) The curl amount is preferably 25 mm or less, more preferably 20 mm or less, further preferably 15 mm or less, particularly preferably 10 mm or less at both ends on the TD side on the release film side.
And / or
2) The curl amount is preferably 25 mm or less, more preferably 20 mm or less, still more preferably 15 mm or less, particularly preferably 10 mm or less at both ends on the TD side on the metal foil side.
It has the characteristics of.
Furthermore, the sample cut into a length of 540 mm × width of 700 mm (or length of 540 mm × width of 400 mm) of the laminate of the single-sided metal foil laminated resin film and the release material obtained from the method for producing a roll-shaped laminate of the present invention,
The curl amount is preferably 25 mm or less, more preferably 15 mm or less, still more preferably 8 mm or less, and particularly preferably 5 mm or less at both ends on the MD side on the release film side or metal foil side.

以下、本発明を実施例に基づき、さらに詳細に説明する。但し、本発明は下記実施例により制限されるものでない。   Hereinafter, the present invention will be described in more detail based on examples. However, the present invention is not limited by the following examples.

(評価方法)
以下の各例において、部は質量部を意味する。以下の各例において、物性評価は以下の方法に従って測定した。
1)線膨張係数の測定法:TMAにて、20〜200℃、5℃/分の昇温速度で測定(MD、又はTD)した。
2)ガラス転移温度の測定法:粘弾性より測定。
3)引張弾性率の測定法:長さ200mm、幅10mmの試料を用いて、ASTM・D882に準拠して、10mm/分の速度で行った。
4)カール量の測定法:所定の大きさ(長さ540mm×幅700mm、又は長さ540mm×幅400mm)に裁断した試料を図1のように、平らな面に置き、TD両端部のカール量を測定する。
図1において、離型材フィルムを記号1で示し、片面金属箔積層樹脂フィルムを記号2で示し、片面金属箔積層樹脂フィルムと離型材フィルムとが重なった積層体を記号3で示している。
図1(a)は、片面金属箔積層樹脂フィルムと離型材フィルムとが重なった積層体3のTD側両端部が、離型材フィルム側1にカールしている模式図です。X1はTD側両端部の離型材フィルム側のカール量を示します。
図1(b)は、片面金属箔積層樹脂フィルムと離型材フィルムとが重なった積層体3のTD側両端部が、片面金属箔積層樹脂フィルム側(金属箔側)2にカールしている模式図です。X2はTD側両端部の片面金属箔積層樹脂フィルム側(金属箔側)のカール量を示します。
5)製品外観:積層後の製品外観について、皺の有無を目視観察で評価。
( ○:皺無し、△:少し皺有り、×:多数の皺有り)
6)接着強度(90°ピ−ル強度):片面金属箔積層樹脂フィルムの樹脂フィルムと金属箔との90°剥離強度を10mm幅の試料について、50mm/分の速度で測定した。
(Evaluation method)
In each of the following examples, “part” means “part by mass”. In each of the following examples, the physical property evaluation was measured according to the following method.
1) Measuring method of linear expansion coefficient: TMA was measured (MD or TD) at a heating rate of 20 to 200 ° C. and 5 ° C./min.
2) Measuring method of glass transition temperature: Measured from viscoelasticity.
3) Measuring method of tensile modulus: Using a sample having a length of 200 mm and a width of 10 mm, it was performed at a speed of 10 mm / min in accordance with ASTM D882.
4) Measuring method of curl amount: A sample cut into a predetermined size (length 540 mm × width 700 mm or length 540 mm × width 400 mm) is placed on a flat surface as shown in FIG. Measure the amount.
In FIG. 1, the release material film is indicated by symbol 1, the single-sided metal foil laminated resin film is indicated by symbol 2, and the laminate in which the single-sided metal foil laminated resin film and the release material film are overlapped is indicated by symbol 3.
FIG. 1A is a schematic diagram in which both end portions on the TD side of a laminate 3 in which a single-sided metal foil laminated resin film and a release material film overlap are curled on the release material film side 1. X1 indicates the curl amount on the release material film side at both ends of the TD side.
FIG. 1B is a schematic diagram in which both end portions on the TD side of the laminate 3 in which the single-sided metal foil laminated resin film and the release material film overlap are curled to the single-sided metal foil laminated resin film side (metal foil side) 2. It is a figure. X2 indicates the amount of curl on the single-sided metal foil laminated resin film side (metal foil side) at both ends of the TD side.
5) Product appearance: The appearance of the product after lamination was evaluated by visual observation for the presence of wrinkles.
(○: No wrinkles, △: Some wrinkles, ×: Many wrinkles)
6) Adhesive strength (90 ° peel strength): The 90 ° peel strength between the resin film of the single-sided metal foil laminated resin film and the metal foil was measured at a rate of 50 mm / min for a 10 mm wide sample.

(参考例1:中心基体層ポリイミド製造用ド−プの合成例1)
撹拌機、窒素導入管を備えた反応容器に、N−メチル−2−ピロリドンを加え、さらに、パラフェニレンジアミン(PPD)と3,3’,4,4’−ビフェニルテトラカルボン酸二無水物(s−BPDA)とを1000:998のモル比でモノマ−濃度が18%(質量%、以下同じ)になるように加えた。添加終了後50℃を保ったまま3時間反応を続けた。得られたポリアミック酸溶液は褐色粘調液体であり、25℃における溶液粘度は約1500ポイズであった。この溶液をド−プとして使用した。
(Reference Example 1: Synthesis Example 1 of Dope for Manufacturing Central Substrate Layer Polyimide)
N-methyl-2-pyrrolidone is added to a reaction vessel equipped with a stirrer and a nitrogen introducing tube, and further, paraphenylenediamine (PPD) and 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride ( s-BPDA) at a molar ratio of 1000: 998 so that the monomer concentration was 18% (mass%, the same applies hereinafter). After completion of the addition, the reaction was continued for 3 hours while maintaining 50 ° C. The obtained polyamic acid solution was a brown viscous liquid, and the solution viscosity at 25 ° C. was about 1500 poise. This solution was used as a dope.

(参考例2:熱圧着性ポリイミド製造用ド−プの合成−1)
撹拌機、窒素導入管を備えた反応容器に、N−メチル−2−ピロリドンを加え、さらに、1,3−ビス(4−アミノフェノキシ)ベンゼン(TPE−R)と2,3,3’,4’−ビフェニルテトラカルボン酸二無水物(a−BPDA)とを1000:1000のモル比でモノマ−濃度が22%になるように、またトリフェニルホスフェ−トをモノマ−質量に対して0.1%加えた。添加終了後25℃を保ったまま1時間反応を続けた。25℃における溶液粘度は約2000ポイズであった。この溶液をド−プとして使用した。
(Reference Example 2: Synthesis of dope for producing thermocompression bonding polyimide-1)
N-methyl-2-pyrrolidone is added to a reaction vessel equipped with a stirrer and a nitrogen introducing tube, and 1,3-bis (4-aminophenoxy) benzene (TPE-R) and 2,3,3 ′, 4'-biphenyltetracarboxylic dianhydride (a-BPDA) was added at a molar ratio of 1000: 1000 to a monomer concentration of 22%, and triphenyl phosphate was reduced to 0% of the monomer mass. Added 1%. After completion of the addition, the reaction was continued for 1 hour while maintaining 25 ° C. The solution viscosity at 25 ° C. was about 2000 poise. This solution was used as a dope.

(参考例3:多層ポリイミドフィルムAの製造)
前記の中心基体層ポリイミド製造用ド−プと熱圧着性ポリイミド製造用ド−プとを三層押出し成形用ダイス(マルチマニホ−ルド型ダイス)を設けた製膜装置を使用し、三層押出ダイスから金属製支持体上に流延し、140℃の熱風で連続的に乾燥し、固化フィルムを形成した。この固化フィルムを支持体から剥離した後加熱炉で200℃から320℃まで徐々に昇温して溶媒の除去、イミド化を行い長尺状の三層押出しポリイミドフィルムを巻き取りロ−ルに巻き取った。
(Reference Example 3: Production of multilayer polyimide film A)
A three-layer extrusion die using a film forming apparatus provided with a three-layer extrusion die (multi-manifold die) for the central substrate layer polyimide manufacturing dope and the thermocompression bonding polyimide manufacturing dope. Then, it was cast on a metal support and continuously dried with hot air at 140 ° C. to form a solidified film. After the solidified film is peeled off from the support, the temperature is gradually raised from 200 ° C. to 320 ° C. in a heating furnace to remove the solvent and imidize, and wind a long three-layer extruded polyimide film on a winding roll. I took it.

得られた三層押出しポリイミドフィルム(A1)は、
各層の厚みが4μm/17μm/4μm(総厚み25μm)であり、線膨張係数(50−200℃)が、MD:20ppm/℃、TD:19ppm/℃でありで、基体層ポリイミドのガラス転移温度は340℃以下の温度で明確に確認されず、熱圧着層ポリイミドはガラス転移温度が250℃である。
The resulting three-layer extruded polyimide film (A1)
The thickness of each layer is 4 μm / 17 μm / 4 μm (total thickness 25 μm), the linear expansion coefficient (50-200 ° C.) is MD: 20 ppm / ° C., TD: 19 ppm / ° C., and the glass transition temperature of the base layer polyimide Is not clearly confirmed at a temperature of 340 ° C. or lower, and the thermocompression-bonding layer polyimide has a glass transition temperature of 250 ° C.

得られた三層押出しポリイミドフィルム(A2)は、
各層の厚みが3μm/9μm/3μm(総厚み15μm)であり、線膨張係数(50−200℃)が、MD:19ppm/℃、TD:18ppm/℃でありで、基体層ポリイミドのガラス転移温度は340℃以下の温度で明確に確認されず、熱圧着層ポリイミドはガラス転移温度が250℃である。
The resulting three-layer extruded polyimide film (A2)
The thickness of each layer is 3 μm / 9 μm / 3 μm (total thickness 15 μm), the linear expansion coefficient (50-200 ° C.) is MD: 19 ppm / ° C., TD: 18 ppm / ° C., and the glass transition temperature of the base layer polyimide Is not clearly confirmed at a temperature of 340 ° C. or lower, and the thermocompression-bonding layer polyimide has a glass transition temperature of 250 ° C.

(参考例4:離型材のポリイミドフィルムの製造)
前記の中心基体層ポリイミド製造用ド−プを単層押出し成形用ダイスを設けた製膜装置を使用し、単層押出ダイスから金属製支持体上に流延し、熱風で連続的に乾燥し、固化フィルムを形成した。この固化フィルムを支持体から剥離した後加熱炉で徐々に昇温して溶媒の除去、イミド化を行い、表1に示す厚みと線膨張係数を有する数種類の長尺状のポリイミドフィルムをロール状に巻き取った。
(Reference Example 4: Production of polyimide film as release material)
The above-mentioned center substrate layer polyimide production dope is cast on a metal support from a single layer extrusion die using a single layer extrusion die and is continuously dried with hot air. A solidified film was formed. After peeling this solidified film from the support, the temperature is gradually raised in a heating furnace to remove the solvent and imidize, and roll several kinds of long polyimide films having the thickness and linear expansion coefficient shown in Table 1 into rolls. Rolled up.

(実施例1、比較例1〜3)
ロール巻きした圧延銅箔(マイクロハード社製、VSBK、厚さ18μm)と、三層押出しポリイミドフィルム(A1)と、表1に示すロール巻きした離型材のポリイミドフィルムとを用い、各々のロールよりフィルムを引き出して3枚のフィルムを重ねて、ダブルベルトプレスに連続的に供給し、加熱ゾーンの温度(最高加熱温度)380℃、冷却ゾーンの温度(最低冷却温度)117℃で、連続的に加圧下に熱圧着−冷却を連続して行い、片面に銅箔を積層した片面銅箔積層ポリイミドフィルムと離型材のポリイミドフィルムとを、離型材のポリイミドフィルムを内側にしてロール状に巻き取った。三層押出しポリイミドフィルム(A1)は150℃に予熱してダブルベルトプレスに供給した。
巻き取ったロールより、離型材のポリイミドフィルムと片面銅箔積層ポリイミドフィルムとを重ねた状態で幅540mm、長さ700mmの試料を切り取り、裁断した試料のカール量を評価し、結果を表1に示す。
(Example 1, Comparative Examples 1-3)
Rolled rolled copper foil (manufactured by Microhardware, VSBK, thickness 18 μm), three-layer extruded polyimide film (A1), and a rolled release polyimide film shown in Table 1 from each roll The film is pulled out and the three films are stacked and continuously supplied to the double belt press. The heating zone temperature (maximum heating temperature) is 380 ° C., the cooling zone temperature (minimum cooling temperature) is 117 ° C., and continuously. Thermocompression-bonding-cooling was continuously performed under pressure, and a single-sided copper foil laminated polyimide film having a copper foil laminated on one side and a releaser polyimide film were wound into a roll with the releaser polyimide film inside. . The three-layer extruded polyimide film (A1) was preheated to 150 ° C. and supplied to a double belt press.
From the wound roll, a sample having a width of 540 mm and a length of 700 mm was cut out in a state where the polyimide film of the release material and the single-sided copper foil laminated polyimide film were stacked, and the curl amount of the cut sample was evaluated. Show.

(実施例2、比較例4)
ロール巻きした圧延銅箔(日立電線製、HPF−ST12−X、厚さ12μm)と、三層押出しポリイミドフィルム(A2)と、表1に示すロール巻きした離型材のポリイミドフィルムとを用い、各々のロールよりフィルムを引き出して3枚のフィルムを重ねて、ダブルベルトプレスに連続的に供給し、加熱ゾーンの温度(最高加熱温度)380℃、冷却ゾーンの温度(最低冷却温度)117℃で、連続的に加圧下に熱圧着−冷却を連続して行い、片面に銅箔を積層した片面銅箔積層ポリイミドフィルムと離型材のポリイミドフィルムとを、離型材のポリイミドフィルムを内側にしてロール状に巻き取った。三層押出しポリイミドフィルム(A2)は150℃に予熱してダブルベルトプレスに供給した。
巻き取ったロールより、離型材のポリイミドフィルムと片面銅箔積層ポリイミドフィルムとを重ねた状態で幅540mm、長さ400mmの試料を切り取り、裁断した試料のカール量を評価し、結果を表1に示す。
(Example 2, Comparative Example 4)
Rolled rolled copper foil (manufactured by Hitachi Cable, HPF-ST12-X, thickness 12 μm), a three-layer extruded polyimide film (A2), and a rolled release polyimide film shown in Table 1, respectively, Pull out the film from the roll of the three layers, superimpose three films, continuously supply to the double belt press, heating zone temperature (maximum heating temperature) 380 ℃, cooling zone temperature (minimum cooling temperature) 117 ℃, Continuously pressurizing and cooling under pressure, and continuously performing cooling. Rolled with a single-sided copper foil laminated polyimide film with a copper foil laminated on one side and a polyimide film as a release material, with the polyimide film as a release material inside. Winded up. The three-layer extruded polyimide film (A2) was preheated to 150 ° C. and supplied to a double belt press.
From the wound roll, a sample having a width of 540 mm and a length of 400 mm was cut out in a state where the polyimide film of the release material and the single-sided copper foil laminated polyimide film were overlapped, and the curl amount of the cut sample was evaluated. Show.

(実施例3)
ロール巻きした電解銅箔(日本電解社製、HLB、厚さ9μm)と、三層押出しポリイミドフィルム(A2)と、表1に示すロール巻きした離型材のポリイミドフィルムとを用い、各々のロールよりフィルムを引き出して3枚のフィルムを重ねて、ダブルベルトプレスに連続的に供給し、加熱ゾーンの温度(最高加熱温度)380℃、冷却ゾーンの温度(最低冷却温度)117℃で、連続的に加圧下に熱圧着−冷却を連続して行い、片面に銅箔を積層した片面銅箔積層ポリイミドフィルムと離型材のポリイミドフィルムとを、離型材のポリイミドフィルムを内側にしてロール状に巻き取った。三層押出しポリイミドフィルム(A1)は150℃に予熱してダブルベルトプレスに供給した。
巻き取ったロールより、離型材のポリイミドフィルムと片面銅箔積層ポリイミドフィルムとを重ねた状態で幅540mm、長さ700mmの試料を切り取り、裁断した試料のカール量を評価し、結果を表1に示す。
(Example 3)
From each roll using a rolled electrolytic copper foil (manufactured by Nippon Electrolytic Co., Ltd., HLB, thickness 9 μm), a three-layer extruded polyimide film (A2), and a rolled release polyimide film shown in Table 1 The film is pulled out and the three films are stacked and continuously supplied to the double belt press. The heating zone temperature (maximum heating temperature) is 380 ° C., the cooling zone temperature (minimum cooling temperature) is 117 ° C., and continuously. Thermocompression-bonding-cooling was continuously performed under pressure, and a single-sided copper foil laminated polyimide film having a copper foil laminated on one side and a releaser polyimide film were wound into a roll with the releaser polyimide film inside. . The three-layer extruded polyimide film (A1) was preheated to 150 ° C. and supplied to a double belt press.
From the wound roll, a sample having a width of 540 mm and a length of 700 mm was cut out in a state where the polyimide film of the release material and the single-sided copper foil laminated polyimide film were stacked, and the curl amount of the cut sample was evaluated. Show.

(実施例4)
ロール巻きした圧延銅箔(日鉱金属社製、BHY22BHA、厚さ18μm)と、三層押出しポリイミドフィルム(A2)と、表1に示すロール巻きした離型材のポリイミドフィルムとを用い、各々のロールよりフィルムを引き出して3枚のフィルムを重ねて、ダブルベルトプレスに連続的に供給し、加熱ゾーンの温度(最高加熱温度)380℃、冷却ゾーンの温度(最低冷却温度)117℃で、連続的に加圧下に熱圧着−冷却を連続して行い、片面に銅箔を積層した片面銅箔積層ポリイミドフィルムと離型材のポリイミドフィルムとを、離型材のポリイミドフィルムを内側にしてロール状に巻き取った。三層押出しポリイミドフィルム(A1)は150℃に予熱してダブルベルトプレスに供給した。
巻き取ったロールより、離型材のポリイミドフィルムと片面銅箔積層ポリイミドフィルムとを重ねた状態で幅540mm、長さ700mmの試料を切り取り、裁断した試料のカール量を評価し、結果を表1に示す。
Example 4
Rolled rolled copper foil (manufactured by Nikko Metals, BHY22BHA, thickness 18 μm), a three-layer extruded polyimide film (A2), and a roll-released polyimide film shown in Table 1 were used. The film is pulled out and the three films are stacked and continuously supplied to the double belt press. The heating zone temperature (maximum heating temperature) is 380 ° C., the cooling zone temperature (minimum cooling temperature) is 117 ° C., and continuously. Thermocompression-bonding-cooling was continuously performed under pressure, and a single-sided copper foil laminated polyimide film having a copper foil laminated on one side and a releaser polyimide film were wound into a roll with the releaser polyimide film inside. . The three-layer extruded polyimide film (A1) was preheated to 150 ° C. and supplied to a double belt press.
From the wound roll, a sample having a width of 540 mm and a length of 700 mm was cut out in a state where the polyimide film of the release material and the single-sided copper foil laminated polyimide film were stacked, and the curl amount of the cut sample was evaluated. Show.

(実施例5,6)
ロール巻きした圧延銅箔(日鉱金属社製、BHY13HHA、厚さ12μm)と、三層押出しポリイミドフィルム(A2)と、表1に示すロール巻きした離型材のポリイミドフィルムとを用い、各々のロールよりフィルムを引き出して3枚のフィルムを重ねて、ダブルベルトプレスに連続的に供給し、加熱ゾーンの温度(最高加熱温度)380℃、冷却ゾーンの温度(最低冷却温度)117℃で、連続的に加圧下に熱圧着−冷却を連続して行い、片面に銅箔を積層した片面銅箔積層ポリイミドフィルムと離型材のポリイミドフィルムとを、離型材のポリイミドフィルムを内側にしてロール状に巻き取った。三層押出しポリイミドフィルム(A1)は150℃に予熱してダブルベルトプレスに供給した。
巻き取ったロールより、離型材のポリイミドフィルムと片面銅箔積層ポリイミドフィルムとを重ねた状態で幅540mm、長さ700mmの試料を切り取り、裁断した試料のカール量を評価し、結果を表1に示す。
(Examples 5 and 6)
Rolled rolled copper foil (manufactured by Nikko Metals, BHY13HHA, thickness 12 μm), a three-layer extruded polyimide film (A2), and a roll-released polyimide film shown in Table 1 were used. The film is pulled out and the three films are stacked and continuously supplied to the double belt press. The heating zone temperature (maximum heating temperature) is 380 ° C., the cooling zone temperature (minimum cooling temperature) is 117 ° C., and continuously. Thermocompression-bonding-cooling was continuously performed under pressure, and a single-sided copper foil laminated polyimide film having a copper foil laminated on one side and a releaser polyimide film were wound into a roll with the releaser polyimide film inside. . The three-layer extruded polyimide film (A1) was preheated to 150 ° C. and supplied to a double belt press.
From the wound roll, a sample having a width of 540 mm and a length of 700 mm was cut out in a state where the polyimide film of the release material and the single-sided copper foil laminated polyimide film were stacked, and the curl amount of the cut sample was evaluated. Show.

表1において、銅箔と離型フィルムとの線膨張係数比とは、
(離型フィルムの線膨張係数)/(銅箔の線膨張係数)を意味し、銅箔の線膨張係数はMD方向及びMD方向共に、18ppmとした。
実施例6において、MD方向の銅箔と離型フィルムとの線膨張係数比の小さなものを用いた場合、MD方向にカールした物が得られた。
実施例1〜6及び比較例1〜4のロール状の積層体より巻きだした片面銅箔積層ポリイミドフィルムの外観は、皺がなく良好であった。
実施例1〜6及び比較例1〜4のロール状の積層体より巻きだした片面銅箔積層ポリイミドフィルムの90°ピール強度は、すべて1kN/m以上であった。
In Table 1, the linear expansion coefficient ratio between the copper foil and the release film is
It means (linear expansion coefficient of release film) / (linear expansion coefficient of copper foil), and the linear expansion coefficient of copper foil was 18 ppm in both the MD direction and the MD direction.
In Example 6, when the one having a small linear expansion coefficient ratio between the copper foil in the MD direction and the release film was used, a product curled in the MD direction was obtained.
The appearances of the single-sided copper foil laminated polyimide films wound out from the roll-shaped laminates of Examples 1 to 6 and Comparative Examples 1 to 4 were good without any wrinkles.
The 90 ° peel strengths of the single-sided copper foil laminated polyimide films wound out from the roll-like laminates of Examples 1 to 6 and Comparative Examples 1 to 4 were all 1 kN / m or more.

Figure 0005040451
Figure 0005040451

図1は、カール量の測定法において、片面金属箔積層樹脂フィルムと離型材フィルムとが重なった試料のカール量を説明する模式図である。FIG. 1 is a schematic diagram for explaining the curl amount of a sample in which a single-sided metal foil laminated resin film and a release material film are overlapped in the curl amount measurement method.

符号の説明Explanation of symbols

1:離型材フィルム、
2:片面金属箔積層樹脂フィルム、
3:片面金属箔積層樹脂フィルムと離型材フィルムとが重なった積層体。
1: release material film,
2: Single-sided metal foil laminated resin film,
3: A laminate in which a single-sided metal foil laminated resin film and a release material film overlap.

Claims (10)

金属箔と、両面が熱圧着性を有する樹脂フィルムと、離型材との順に重ねながら加熱加圧式の熱圧着装置に供給して、熱圧着により金属箔と樹脂フィルムとがはり合わされた片面金属箔積層樹脂フィルムと離型材との重なった積層体を製造する方法であり、
離型材のTD方向の線膨張係数(TD−P)(50〜200℃)が、金属箔のTD方向の線膨張係数(TD−M)(50〜200℃)の0.7倍〜0.9倍の範囲を用いることを特徴とする積層体の製造方法。
A single-sided metal foil in which the metal foil and the resin film are bonded together by thermocompression bonding while supplying the metal foil, a resin film having thermocompression bonding on both sides, and a release material in order. It is a method for producing a laminated body in which a laminated resin film and a release material are overlapped,
The linear expansion coefficient (TD-P) (50 to 200 ° C.) of the release material in the TD direction is 0.7 times to the linear expansion coefficient (TD-M) (50 to 200 ° C.) of the metal foil in the TD direction. A method for producing a laminate, wherein a range of 9 times is used.
両面が熱圧着性を有する樹脂フィルムのTD方向の線膨張係数(TD−B)(50〜200℃)が、金属箔のTD方向の線膨張係数(TD−M)(50〜200℃)の0.8倍〜1.2倍の範囲であることを特徴とする請求項1に記載の積層体の製造方法。   The linear expansion coefficient (TD-B) (50 to 200 ° C.) in the TD direction of the resin film having thermocompression bonding on both surfaces is the linear expansion coefficient (TD-M) (50 to 200 ° C.) in the TD direction of the metal foil. The method for producing a laminate according to claim 1, wherein the range is 0.8 to 1.2 times. 離型材のMD方向の線膨張係数(MD−P)(50〜200℃)が、金属箔のMD方向の線膨張係数(MD−M)の0.7倍〜0.9倍の範囲であり、
両面が熱圧着性を有する樹脂フィルムのMD方向の線膨張係数(MD−B)(50〜200℃)が、金属箔のMD方向の線膨張係数(MD−M)(50〜200℃)の0.8倍〜1.3倍の範囲であることを特徴とする請求項1又は請求項2に記載の積層体の製造方法。
The linear expansion coefficient (MD-P) (50 to 200 ° C.) in the MD direction of the release material is in the range of 0.7 to 0.9 times the linear expansion coefficient (MD-M) in the MD direction of the metal foil. ,
The linear expansion coefficient in the MD direction (MD-B) (50 to 200 ° C.) of the resin film having thermocompression bonding on both surfaces is the linear expansion coefficient (MD-M) (50 to 200 ° C.) in the MD direction of the metal foil. It is the range of 0.8 times-1.3 times, The manufacturing method of the laminated body of Claim 1 or Claim 2 characterized by the above-mentioned.
金属箔と、両面が熱圧着性を有する樹脂フィルムと、離型材との順に重ねながら加熱加圧式の熱圧着装置に供給して、熱圧着により金属箔と樹脂フィルムとがはり合わされた片面銅箔積層樹脂フィルムと離型材との重なった積層体を製造する方法であり、
離型材のTD方向の線膨張係数(50〜200℃)は、金属箔のTD方向の線膨張係数(50〜200℃)に対して(−6〜−2ppm/℃)のものを用いることを特徴とする積層体の製造方法。
A single-sided copper foil in which the metal foil and the resin film are bonded to each other by thermocompression bonding while supplying the metal foil, the resin film having thermocompression bonding on both sides, and the release material in order. It is a method for producing a laminated body in which a laminated resin film and a release material are overlapped,
The linear expansion coefficient (50 to 200 ° C.) in the TD direction of the release material should be (−6 to −2 ppm / ° C.) relative to the linear expansion coefficient (50 to 200 ° C.) of the metal foil in the TD direction. The manufacturing method of the laminated body characterized.
離型材のMD方向の線膨張係数(50〜200℃)が、金属箔のMD方向の線膨張係数(50〜200℃)に対して(−9〜−1ppm/℃)のものを用い、
剥離材のMD方向とTD方向の線膨張係数比(MD/TD比)(50〜200℃)が0.8〜1.1の範囲であり、
両面が熱圧着性を有する樹脂フィルムのTD方向の線膨張係数(50〜200℃)は、金属箔のTD方向の線膨張係数(50〜200℃)に対して(−5〜5ppm/℃)のものを用い、
両面が熱圧着性を有する樹脂フィルムのMD方向の線膨張係数(50〜200℃)は、金属箔のMD方向の線膨張係数(50〜200℃)に対して(−3〜6ppm/℃)のものを用いることを特徴とする請求項4に記載の積層体の製造方法。
The linear expansion coefficient (50 to 200 ° C.) in the MD direction of the release material is (−9 to −1 ppm / ° C.) relative to the linear expansion coefficient (50 to 200 ° C.) in the MD direction of the metal foil.
The linear expansion coefficient ratio (MD / TD ratio) (50 to 200 ° C.) in the MD direction and TD direction of the release material is in the range of 0.8 to 1.1,
The linear expansion coefficient (50 to 200 ° C.) in the TD direction of the resin film having thermocompression bonding on both sides is (−5 to 5 ppm / ° C.) with respect to the linear expansion coefficient (50 to 200 ° C.) in the TD direction of the metal foil. Use
The linear expansion coefficient (50 to 200 ° C.) in the MD direction of the resin film having thermocompression bonding on both sides is (−3 to 6 ppm / ° C.) with respect to the linear expansion coefficient (50 to 200 ° C.) in the MD direction of the metal foil. The manufacturing method of the laminated body of Claim 4 characterized by the above-mentioned.
金属箔の厚みが5〜30μmの範囲、
両面が熱圧着性を有する樹脂フィルムの厚みが8〜40μmの範囲、
離型フィルムの厚みが15〜50μmの範囲であることを特徴とする請求項1〜5のいずれか1項に記載の積層体の製造方法。
The thickness of the metal foil is in the range of 5 to 30 μm,
The thickness of the resin film having both sides thermocompression bonding is in the range of 8 to 40 μm,
The thickness of a release film is the range of 15-50 micrometers, The manufacturing method of the laminated body of any one of Claims 1-5 characterized by the above-mentioned.
積層体は、離型材が片面金属箔積層樹脂フィルムに対して内側に巻かれているロール状の積層体であることを特徴とする請求項1〜6のいずれか1項に記載の積層体の製造方法。   The laminate is a roll-like laminate in which the release material is wound inward with respect to the single-sided metal foil laminated resin film. The laminate according to any one of claims 1 to 6, Production method. 金属箔が銅箔であり、両面が熱圧着性を有する樹脂フィルム及び離型材がポリイミドフィルムであることを特徴とする請求項1〜7のいずれか1項に記載の積層体の製造方法。   The method for producing a laminate according to any one of claims 1 to 7, wherein the metal foil is a copper foil, and the resin film having a thermocompression bonding property on both sides and the release material are polyimide films. 金属箔が圧延銅箔であり、両面が熱圧着性を有する樹脂フィルム及び離型材がポリイミドフィルムであることを特徴とする請求項1〜7のいずれか1項に記載の積層体の製造方法。   The method for producing a laminate according to any one of claims 1 to 7, wherein the metal foil is a rolled copper foil, and both the resin film having thermocompression bonding and the release material are polyimide films. 前記両面が熱圧着性を有する樹脂フィルムは、中心基材のポリイミドの両面に熱圧着性を有するポリイミドが積層されたフィルムであり、前記熱圧着性を有するポリイミドは、150℃〜400℃の温度で熱融着できる熱可塑性ポリイミドであることを特徴とする請求項1〜9のいずれか1項に記載の積層体の製造方法。  The resin film having thermocompression bonding on both sides is a film in which polyimide having thermocompression bonding is laminated on both surfaces of polyimide as a central base material, and the polyimide having thermocompression bonding is a temperature of 150 ° C. to 400 ° C. The method for producing a laminate according to any one of claims 1 to 9, wherein the polyimide is a thermoplastic polyimide that can be heat-sealed with a glass.
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