JP5071122B2 - 廃液処理装置及び液体噴射装置 - Google Patents
廃液処理装置及び液体噴射装置 Download PDFInfo
- Publication number
- JP5071122B2 JP5071122B2 JP2008013437A JP2008013437A JP5071122B2 JP 5071122 B2 JP5071122 B2 JP 5071122B2 JP 2008013437 A JP2008013437 A JP 2008013437A JP 2008013437 A JP2008013437 A JP 2008013437A JP 5071122 B2 JP5071122 B2 JP 5071122B2
- Authority
- JP
- Japan
- Prior art keywords
- waste liquid
- liquid tank
- tank
- liquid
- waste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000007788 liquid Substances 0.000 title claims description 358
- 239000002699 waste material Substances 0.000 title claims description 249
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 239000010808 liquid waste Substances 0.000 claims description 2
- 239000011347 resin Substances 0.000 description 25
- 229920005989 resin Polymers 0.000 description 25
- 238000003756 stirring Methods 0.000 description 11
- 230000001737 promoting effect Effects 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 7
- 239000006096 absorbing agent Substances 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000002745 absorbent Effects 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000000018 DNA microarray Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/17—Ink jet characterised by ink handling
- B41J2/18—Ink recirculation systems
- B41J2/185—Ink-collectors; Ink-catchers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/17—Ink jet characterised by ink handling
- B41J2/1721—Collecting waste ink; Collectors therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/17—Ink jet characterised by ink handling
- B41J2/175—Ink supply systems ; Circuit parts therefor
- B41J2/17596—Ink pumps, ink valves
Landscapes
- Ink Jet (AREA)
Description
Claims (5)
- エネルギー線の照射により硬化する液体を廃液として回収するための廃液タンクと、上記廃液タンクに貯留された廃液の液面に対して硬化用のエネルギー線を照射する照射手段と、廃液タンクと貯留させた廃液との少なくともいずれかに対して外力を付与する外力付与手段とを備え、
前記廃液タンクは、前記液面に対して傾斜しており、
前記照射手段は、前記廃液タンクの開口に向かって進退可能に構成されていることを特徴とする廃液処理装置。 - 前記外力付与手段は、前記廃液タンクに接続された回転軸を有し、
前記回転軸は、前記液面に対して傾斜している請求項1記載の廃液処理装置。 - 上記外力付与手段は、廃液タンクを揺動させるものである請求項1又は2に記載の廃液処理装置。
- 前記液体を前記廃液タンクに導入する排出路を有し、
前記排出路は、前記液面に平行な面に対して垂直方向に延びる導入口を含むことを特徴とする請求項1〜3のいずれか一項に記載の廃液処理装置。 - 請求項1〜4のいずれか一項に記載の廃液処理装置と、
前記エネルギー線の照射により硬化する液体を噴射する噴射ヘッドと、を備えたことを特徴とする液体噴射装置。
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008013437A JP5071122B2 (ja) | 2008-01-24 | 2008-01-24 | 廃液処理装置及び液体噴射装置 |
| CNA2009100027802A CN101491974A (zh) | 2008-01-24 | 2009-01-22 | 废液处理装置 |
| US12/357,968 US20090189947A1 (en) | 2008-01-24 | 2009-01-22 | Waste liquid processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008013437A JP5071122B2 (ja) | 2008-01-24 | 2008-01-24 | 廃液処理装置及び液体噴射装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009172850A JP2009172850A (ja) | 2009-08-06 |
| JP5071122B2 true JP5071122B2 (ja) | 2012-11-14 |
Family
ID=40898782
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008013437A Expired - Fee Related JP5071122B2 (ja) | 2008-01-24 | 2008-01-24 | 廃液処理装置及び液体噴射装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20090189947A1 (ja) |
| JP (1) | JP5071122B2 (ja) |
| CN (1) | CN101491974A (ja) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009184133A (ja) * | 2008-02-04 | 2009-08-20 | Seiko Epson Corp | 廃液処理装置 |
| JP2009202389A (ja) * | 2008-02-27 | 2009-09-10 | Seiko Epson Corp | 廃液処理装置 |
| JP2009248379A (ja) * | 2008-04-02 | 2009-10-29 | Seiko Epson Corp | 廃液処理装置、及び、液体噴射装置 |
| JP5782961B2 (ja) * | 2011-09-27 | 2015-09-24 | ブラザー工業株式会社 | 液滴噴射装置 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51116056A (en) * | 1975-04-04 | 1976-10-13 | Oak Seisakusho:Kk | Method of treating waste water from resin photoengraving |
| JPS5394261A (en) * | 1977-01-30 | 1978-08-18 | Matsuba Kougiyou Kk | Method and equipment for treating waste effluent of photosensitive resin |
| US5173269A (en) * | 1989-06-15 | 1992-12-22 | At&T Bell Laboratories | Apparatus for reducing the reactivity of articles destined for disposal |
| ATE181840T1 (de) * | 1995-03-31 | 1999-07-15 | Hermann Eser | Verfahren und vorrichtung zur desinfektion oder sterilisation von infektionsmüll |
| JPH09234888A (ja) * | 1996-02-29 | 1997-09-09 | Copyer Co Ltd | インクジェット方式画像形成装置 |
| JPH10793A (ja) * | 1996-06-12 | 1998-01-06 | Copyer Co Ltd | インクジェット方式画像形成装置 |
| US6011247A (en) * | 1997-03-03 | 2000-01-04 | Questron Canada Inc. | System for open and closed vessel microwave chemistry |
| US6153107A (en) * | 1997-08-14 | 2000-11-28 | Asahi Kasei Kogyo Kabushiki Kaisha | Process for treating development waste liquor |
| JP4314331B2 (ja) * | 1997-08-14 | 2009-08-12 | 旭化成イーマテリアルズ株式会社 | 現像廃液の処理方法及び装置 |
| KR100311007B1 (ko) * | 1998-02-27 | 2002-02-19 | 윤종용 | 습식전자사진방식칼라인쇄기용잉크전달시스템 |
| JP2000194243A (ja) * | 1998-12-28 | 2000-07-14 | Copyer Co Ltd | 画像形成装置 |
| US6607689B1 (en) * | 2000-08-29 | 2003-08-19 | Micron Technology, Inc. | Layer thickness control for stereolithography utilizing variable liquid elevation and laser focal length |
| US6720567B2 (en) * | 2001-01-30 | 2004-04-13 | Gsi Lumonics Corporation | Apparatus and method for focal point control for laser machining |
| US6902246B2 (en) * | 2001-10-03 | 2005-06-07 | 3D Systems, Inc. | Quantized feed system for solid freeform fabrication |
| JP2003211705A (ja) * | 2002-01-24 | 2003-07-29 | Hitachi Printing Solutions Ltd | 紫外線硬化型インクを用いたインクジェットプリンタ |
| JP4238561B2 (ja) * | 2002-11-06 | 2009-03-18 | コニカミノルタホールディングス株式会社 | インクジェットプリンタ |
| US7118206B1 (en) * | 2004-03-19 | 2006-10-10 | 3D Systems, Inc. | Gas bubble removal from ink-jet dispensing devices |
| JP4364712B2 (ja) * | 2004-04-16 | 2009-11-18 | 株式会社リコー | 画像形成装置 |
| JP2006119336A (ja) * | 2004-10-21 | 2006-05-11 | Kyocera Mita Corp | 画像形成装置 |
| JP4788295B2 (ja) * | 2005-11-01 | 2011-10-05 | コニカミノルタホールディングス株式会社 | インクジェット記録装置 |
| JP2007144656A (ja) * | 2005-11-24 | 2007-06-14 | Seiko Epson Corp | 液体回収装置及び液体噴射装置 |
| JP4867393B2 (ja) * | 2006-02-28 | 2012-02-01 | セイコーエプソン株式会社 | 液体噴射装置 |
| JP2009184133A (ja) * | 2008-02-04 | 2009-08-20 | Seiko Epson Corp | 廃液処理装置 |
| US8232444B2 (en) * | 2009-03-26 | 2012-07-31 | Objet Ltd. | Method for handling photocurable fluid waste |
-
2008
- 2008-01-24 JP JP2008013437A patent/JP5071122B2/ja not_active Expired - Fee Related
-
2009
- 2009-01-22 US US12/357,968 patent/US20090189947A1/en not_active Abandoned
- 2009-01-22 CN CNA2009100027802A patent/CN101491974A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009172850A (ja) | 2009-08-06 |
| CN101491974A (zh) | 2009-07-29 |
| US20090189947A1 (en) | 2009-07-30 |
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