JP5074352B2 - Gas treatment system - Google Patents

Description

  The present invention relates to a gas processing system.

Conventionally, gas treatment systems have been proposed that remove acidic gas components in exhaust gas discharged from factories and the like by dry treatment. For example, in Patent Document 1, calcium oxide is produced by bringing calcium carbonate particles filled in a reaction chamber into contact with high-temperature exhaust gas discharged from a combustion furnace, and the calcium oxide and an acidic gas component contained in the exhaust gas A gas treatment system that reacts to adsorb and remove is disclosed. In addition, as shown in Patent Documents 2 and 3, the present inventor causes a solid adsorbent mainly composed of calcium components filled in the reaction chamber to flow from top to bottom and intersects the flow direction of the solid adsorbent. The gas processing system which improves the contact efficiency of the solid adsorbent and the exhaust gas and efficiently removes the acidic gas component contained in the exhaust gas by circulating the exhaust gas in the direction or the reverse direction is proposed. By doing so, the solid adsorbent after neutralizing the acid gas component is discharged from the lower part and a new solid adsorbent is supplied from the upper part, so that the acid gas component removing function in the reaction chamber is maintained for a long time. The
JP-A-8-47617 JP 2004-167403 A JP 2008-126134 A

  However, in these gas processing systems, the solid adsorbent may be fused near the gas inlet of the reaction chamber. Such solid adsorbent fusion occurs because the neutralization reaction between the untreated exhaust gas, that is, the exhaust gas having a high concentration of acidic gas components, and the solid adsorbent occurs actively near the gas inlet of the reaction chamber. This is thought to be due to the fact that the amount of heat generation increases with the increase in local temperature. Such fusion of the solid adsorbent is not preferable because the pressure loss when the exhaust gas passes through the reaction chamber increases. Further, when the solid adsorbent is caused to flow in the reaction chamber as in Patent Documents 2 and 3, the fluidity of the solid adsorbent is deteriorated, and the acid gas component removal function in the reaction chamber can be maintained for a long period of time. It becomes difficult.

  This invention is made | formed in view of the subject mentioned above, and it aims at providing the gas processing system which can prevent fusion | melting of a solid adsorbent.

  The present invention adopts the following means in order to achieve the main object described above.

That is, the gas treatment system of the present invention is
A gas passage,
A first reaction chamber filled with a solid adsorbent capable of adsorbing an acidic gas component by a neutralization reaction, the first reaction chamber on the side facing the gas passage and on the side not facing the gas passage; A first chemical adsorption device provided with a gas passage;
A second reaction chamber filled with a solid adsorbent capable of adsorbing an acidic gas component by a neutralization reaction; and a side facing the gas passage and a side not facing the gas passage of the second reaction chamber, respectively A second chemical adsorption device provided with a gas passage;
The process which supplied untreated gas to the gas passage provided in the side which does not face the said gas channel among the said 1st reaction chamber, and passed through the said 1st reaction chamber, the said gas channel, and the said 2nd reaction chamber in this order. The exhaust gas is discharged from a gas passage port provided on the side of the second reaction chamber that does not face the gas passage, or is provided on the side of the second reaction chamber that does not face the gas passage. An untreated gas is supplied to the gas passage, and the treated gas that has passed through the second reaction chamber, the gas passage, and the first reaction chamber in this order is placed on the side of the first reaction chamber that does not face the gas passage. A switch for switching between the reverse direction of discharging from the provided gas passage,
It is equipped with.

  In this gas treatment system, the solid adsorbent in the first reaction chamber causes a neutralization reaction with the untreated gas having a high concentration of the acidic gas component by continuing the operation in the forward direction, and the solid in the vicinity of the untreated gas contact surface. Even if the adsorbent generates heat, it can be switched to the reverse state by the switch before the solid adsorbent is fused. Then, after switching to the reverse state, the solid adsorbent in the first reaction chamber is introduced with the gas (gas containing a small amount of acidic gas components) after neutralization in the second reaction chamber. The temperature rises and the temperature rise is moderated or the temperature falls. Further, by continuing the operation in the reverse direction, the solid adsorbent in the second reaction chamber causes a neutralization reaction with the untreated gas having a high concentration of acid gas components, and the solid adsorbent near the untreated gas contact surface generates heat. Even so, it is possible to switch to the forward state by the switch before the solid adsorbent is fused. After switching to the forward state, the solid adsorbent in the second reaction chamber is introduced with the gas after neutralized in the first reaction chamber (gas containing a small amount of acidic gas components), so that the calorific value is increased. The temperature rises and the temperature rise is moderated or the temperature falls. As described above, the forward state and the reverse direction can be switched as appropriate, so that the solid adsorbent in each reaction chamber can be prevented from being welded.

  Here, the solid adsorbent is not particularly limited as long as it is a material capable of adsorbing acidic gas components (hydrogen halide, sulfurous acid gas, sulfuric acid gas, halogen gas, etc.) by a neutralization reaction. For example, calcium oxide, oxidation Examples include magnesium, sodium oxide, potassium oxide, calcium carbonate, magnesium carbonate, sodium carbonate, and potassium carbonate.

  In the gas processing system of the present invention, the first and second chemical adsorption devices may be formed separately. In this way, as will be described later, it may be possible to share the reaction chambers of the first and second chemisorbers. However, one of the first and second chemisorbers is formed separately, and one of the chambers is heated to a high temperature. Sometimes the heat is not easily transmitted to the other, so that the solid adsorbent in each reaction chamber can be more reliably prevented from welding.

  Thus, in the gas processing system of the present invention in which the first and second chemical adsorption devices are separately formed, the first chemical adsorption device is capable of supplying a solid adsorbent to the first reaction chamber. And a first discharge unit capable of discharging the solid adsorbent from the first reaction chamber, and the solid adsorbent supplied from the first supply unit to the first reaction chamber is in the first reaction chamber. It is configured to move in a direction intersecting with an imaginary line connecting both gas passage ports and discharged from the first discharge unit, and the second chemical adsorption device can supply a solid adsorbent to the second reaction chamber A second supply unit, and a second discharge unit capable of discharging the solid adsorbent from the second reaction chamber, and the solid adsorbent supplied from the second supply unit to the second reaction chamber is the first discharge unit. 2 The second discharge by moving in a direction intersecting with an imaginary line connecting the two gas passage ports of the reaction chamber It may be configured so as to be discharged from. By doing so, since the solid adsorbent after neutralizing the acid gas component is discharged from the first and second discharge sections and a new solid adsorbent is supplied from the first and second supply sections, each reaction The indoor acid gas removal function can be maintained for a long period of time. Moreover, since it can prevent that a solid adsorbent welds as mentioned above, the fluidity | liquidity of a solid adsorbent does not deteriorate.

  At this time, the first chemical adsorption device includes a gas provided on a side not facing the gas passage as compared with a region close to a gas passage provided on the side facing the gas passage in the first reaction chamber. The region closer to the passage port is configured so that the moving speed of the solid adsorbent is faster, and the second chemical adsorption device has a gas passage provided on the side facing the gas passage in the second reaction chamber. It may be configured such that the moving speed of the solid adsorbent is higher in a region near the gas passage port provided on the side not facing the gas passage than in a region near the mouth. In the forward direction state, the region near the gas passage port provided on the side not facing the gas passage in the first reaction chamber is in contact with the untreated gas having a high concentration of acidic gas components and the solid adsorbent, so that the calorific value is increased. However, since the moving speed of the solid adsorbent in this region is high, the time during which the solid adsorbent after the neutralization reaction stays in this region is short, so that it is difficult to reach a high temperature. Further, in the reverse state, the region close to the gas passage provided in the second reaction chamber on the side not facing the gas passage is in contact with the untreated gas having a high concentration of the acidic gas component and the solid adsorbent. Although the amount is large, since the moving speed of the solid adsorbent in this region is fast, the time during which the solid adsorbent after the neutralization reaction stays in this region is short, so that it is difficult to reach a high temperature. Therefore, it can prevent more reliably that the solid adsorbent in each reaction chamber welds.

  In the gas treatment system of the present invention, the first reaction chamber of the first chemical adsorption device and the second reaction chamber of the second chemical adsorption device are made common to form one large reaction chamber, and the first chemical chamber Both gas passage ports of the adsorption device are respectively provided on the side facing the gas passage and the side not facing the gas passage in the large reaction chamber, and both gas passage ports of the second chemical adsorption device are provided on the first reaction chamber. Apart from both gas passage ports of one chemical adsorption device, the large reaction chamber may be provided on the side facing the gas passage and on the side not facing the gas passage. In this way, the system configuration can be made compact as compared with the case where the first and second chemical adsorption devices are separately formed as described above.

  Thus, in the gas processing system of the present invention in which the first reaction chamber and the second reaction chamber are shared to form one large reaction chamber, the large reaction chamber is provided on the side facing the gas passage. The region near the gas passage provided on the side not facing the gas passage may be configured so that the moving speed of the solid adsorbent is faster than the region near the gas passage. In this way, the solid adsorbent after neutralizing the acid gas component is discharged from the discharge section and a new solid adsorbent is supplied from the supply section, so that the acid gas removal function in the large reaction chamber is maintained. Can do. Moreover, since it can prevent that a solid adsorbent welds as mentioned above, the fluidity | liquidity of a solid adsorbent does not deteriorate.

  At this time, the large reaction chamber is solid in the region near the gas passage provided on the side not facing the gas passage as compared with the region near the gas passage provided on the side facing the gas passage. You may be comprised so that the moving speed of adsorption agent may become quick. In the forward state, the region close to the gas passage provided on the side of the large reaction chamber that does not face the gas passage of the first chemical adsorption device is in contact with the untreated gas having a high concentration of acidic gas components and the solid adsorbent. Therefore, although the calorific value is large, since the moving speed of the solid adsorbent in this region is high, the time during which the solid adsorbent after the neutralization reaction stays in this region is short, so that it is difficult to reach a high temperature. In the reverse direction, the region close to the gas passage provided on the side of the large reaction chamber that does not face the gas passage of the second chemical adsorption device has an untreated gas, a solid adsorbent, and a high concentration of acidic gas components. However, since the solid adsorbent in this region has a fast moving speed, the solid adsorbent after the neutralization reaction stays in this region for a short time, so that it is difficult to reach a high temperature. Therefore, the solid adsorbent in the large reaction chamber can be more reliably prevented from welding.

  In the gas treatment system of the present invention, the first and second chemisorption apparatuses oxidize the halogenated hydrocarbons in the untreated gas by oxidative decomposition to generate hydrogen halide and / or halogen gas as acidic gas components. The catalyst may be used as a mixture with a solid adsorbent. In this way, halogenated hydrocarbons (for example, trichlorethylene, etc.) are decomposed into hydrogen halide and halogen gas by the oxidation catalyst in each chemisorber and then adsorbed to the solid adsorbent, so that untreated gas is efficiently purified. can do. Here, examples of the oxidation catalyst include iron oxide, aluminum oxide, and silicon oxide.

  In the gas processing system of the present invention, the gas passage may have a heat source, and the first and second chemical adsorption devices may be warmed up by heat of the heat source. If it carries out like this, the 1st and 2nd chemical adsorption apparatus can be warmed up and the neutralization reaction of the solid adsorption agent and the acidic gas component in untreated gas can be carried out efficiently. Here, the warm-up temperature may be set to an appropriate temperature according to the combination of the acidic gas component and the solid adsorbent. By the way, when it sets so that untreated gas may flow from a 1st reaction chamber to a 2nd reaction chamber, a 2nd reaction chamber is heat-accumulated by heat exchange with waste gas and a solid adsorbent. Therefore, when the switching valve is switched so that the untreated gas flows from the second reaction chamber to the first reaction chamber, the untreated gas is preheated using the heat storage in the second reaction chamber, and the untreated gas is warmed up. It is possible to reduce the heat energy from the heat source necessary for the heat treatment. This is the same when the untreated gas is set to flow from the second reaction chamber to the first reaction chamber and then switched to flow from the first reaction chamber to the second reaction chamber.

  In the gas processing system of the present invention, a dilution gas may be introduced from a dilution gas introduction pipe via a valve into an untreated gas supply path for supplying an untreated gas to the first or second reactor. In this case, immediately before switching the switch, the valve is opened to sufficiently dilute the untreated gas with the dilution gas, and then the valve is closed to switch the switch. In this way, when the gas flow is switched from the forward state to the reverse state, the untreated gas accumulated between the switch and the first reaction chamber is discharged as it is. Since it is discharged in a state that has been released, harmful components are not discharged at a high concentration. In addition, when switching from the reverse direction state to the forward direction state, the untreated gas accumulated between the switch and the second reaction chamber is discharged as it is, but in this case as well, the state diluted with the dilution gas Therefore, harmful components are not discharged at a high concentration.

  In the gas processing system of the present invention, an untreated gas supply path for supplying untreated gas to the first or second reactor, and a treated gas discharge path for discharging treated gas from the first or second reactor. A communication pipe with a valve may be attached between the two, and a valve may be attached to the downstream side of the communication pipe attachment position in the treated gas discharge path. In this case, the communication pipe is normally closed and the processed gas discharge path is opened, and the communication pipe is opened and the processed gas discharge path is closed for a predetermined period immediately after switching the switch. In this way, when the gas flow is switched from the forward direction to the reverse direction, the untreated gas accumulated between the switch and the first reaction chamber flows directly into the treated gas discharge path. It can return to the untreated gas supply path again through the communication pipe. Further, when switching from the reverse state to the forward state, the untreated gas accumulated between the switch and the second reaction chamber flows directly into the treated gas discharge path. To the raw gas supply path again.

  In the gas processing system of the present invention, the switch is opposite to the base surface member, wherein the switch is provided with a base surface member in which first and second passage ports through which gas can pass are arranged in a predetermined direction. The third and fourth passage ports through which the gas can pass are arranged in a direction intersecting the predetermined direction, and both are arranged so as to overlap both the first and second passage ports, When slidably disposed between the base surface member and the facing surface member and positioned in the first posture, the first passage port and the third passage port communicate with each other, and the second passage port and the second passage port. When communication with the four passage ports is permitted, communication between the first passage port and the fourth passage port and communication between the second passage port and the third passage port are blocked, and the second posture is positioned. The communication between the first passage port and the fourth passage port and the first passage A plurality of passages are allowed to communicate with the third passage port, and the communication between the first passage port and the third passage port and the communication between the second passage port and the fourth passage port are blocked. A control member in which a through hole is formed, a gas supply port that surrounds the base surface member and the opposing surface member, is connected to the first passage port and is supplied with untreated gas, and is connected to the second passage port and processed. A gas discharge port for discharging a used gas, a vent pipe connecting the third passage port and a gas passage port provided on the side of the first reaction chamber of the first chemical adsorption device facing the gas passage, and the first And a housing member having a vent pipe connecting the four passage ports and the gas passage ports provided on the side of the second reaction chamber of the second chemical adsorption device that does not face the gas passage. It is good. When the control member of the sliding type switching valve is positioned in the first posture, the gas supply port is connected to the first reaction chamber of the first chemical adsorption device via the first passage port and the third passage port, and the second passage. Since the second reaction chamber of the chemical adsorption device is connected to the gas outlet through the fourth passage and the second passage, it is set in the forward direction. On the other hand, when positioned in the second posture, the gas supply port is connected to the second reaction chamber of the second chemical adsorption device via the first passage port and the fourth passage port, and the first reaction chamber of the first chemical adsorption device. Is connected to the gas discharge port via the third passage port and the second passage port, and thus is set in the reverse direction. That is, the forward direction state and the reverse direction state can be easily switched by operating the control member.

  In addition, although the material of a base surface member or an opposing surface member is not specifically limited, For example, when improving heat resistance, you may use carbon. The material of the housing member is not particularly limited. For example, in order to improve heat dissipation, it is preferable to use a material having high thermal conductivity (for example, aluminum, copper, brass, or an alloy thereof). In order to avoid a sealing failure due to, it is preferable to use a material having a small linear expansion coefficient (for example, stainless steel). The material of the control member is not particularly limited. For example, when improving heat resistance (180 ° C or higher) and corrosion resistance, it is preferable to use austenitic stainless steel, martensitic stainless steel, etc. It is preferable to use an inexpensive material having high thermal conductivity (for example, galvanized steel plate SECC (cold rolled material) or galvanized steel plate SEHC (hot rolled material)).

[First Embodiment]
Next, embodiments of the present invention will be described with reference to the drawings. 1 and 2 are explanatory views of the gas processing system 10 according to the first embodiment. FIG. 1 shows a state in which the slide valve 110 is set in the forward direction, and FIG. When set. 1 and 2 show the slide valve 110 in an exploded manner for convenience of explanation.

  The gas processing system 10 of this embodiment is disposed on the gas passage 12 through which gas can flow in the horizontal direction, the first chemical adsorption device 20 disposed on one side of the gas passage 12, and the other side of the gas passage 12. The second chemical adsorption device 40 and a slide valve 110 as a switch for switching the route for supplying untreated gas and discharging treated gas are provided.

  The gas passage 12 is a cylindrical space, and a heater 14 is attached to the gas passage 12. The heater 14 warms up the first chemical adsorption device 20 and the second chemical adsorption device 40 and maintains the temperature of the untreated gas after passing through the first chemical adsorption device 20 or the second chemical adsorption device 40. Play a role.

  The first chemical adsorption device 20 includes a first reaction chamber 22 filled with a granular solid adsorbent A capable of adsorbing an acidic gas component by a neutralization reaction. Here, the solid adsorbent A is calcium oxide or sodium carbonate. A first inner opening 24 that is a gas passage port is formed in the first reaction chamber 22 on the side facing the gas passage 12. The first inner opening 24 has substantially the same area as the cross-section of the flat and box-shaped first inner space 23 provided inside the first reaction chamber 22, and the gas passage through the first inner space 23. 12 leads to. A plurality of slats 26 made of elongated plates are attached to the first inner opening 24 in parallel with a predetermined gap. On the other hand, a first outer opening 28 that is a gas passage port is formed on the side opposite to the gas passage 12, that is, the side not facing the gas passage 12. The first outer opening 28 has substantially the same area as the cross-section of the flat, box-shaped first outer space 25 provided outside the first reaction chamber 22, and the first outer space 25 and the vent pipe 81 are connected to each other. And is connected to the third connection port 123 of the slide valve 110. Further, similarly to the first inner opening 24, a plurality of blades 30 are attached to the first outer opening 28 in parallel with a predetermined gap. Since each slat 26, 30 is attached so as to incline upward from the inside of the first reaction chamber 22, the solid adsorbent A is removed from the first inner opening 24 and the first outer opening 28. It serves to prevent spillage and to allow gas to enter and exit the first reaction chamber 22 via the first inner opening 24 and the first outer opening 28.

  The first reaction chamber 22 has a first hopper 32 capable of supplying the solid adsorbent A at the upper portion and a screw conveyor 36 capable of discharging the solid adsorbent A via the first adsorbent outlet 34 at the lower portion. is doing. For this reason, the solid adsorbent A moves from top to bottom due to its own weight. This moving direction intersects with an imaginary line connecting the first inner opening 24 and the first outer opening 28. The first hopper 32 and the first adsorbent discharge port 34 correspond to the first supply unit and the first discharge unit of the present invention. The floor 38 of the first reaction chamber 22 is inclined from the inside toward the outside, and the first adsorbent discharge port 34 is provided at the lowest portion. Since the floor 38 of the first reaction chamber 22 is inclined as described above, the moving speed when the solid adsorbent A supplied from the first hopper 32 moves to the first adsorbent discharge port 34 is increased in the gas passage 12. The side not facing the gas passage 12 (region close to the first outer opening 28) is faster than the side facing (region close to the first inner opening 24).

  The second chemical adsorption device 40 includes a second reaction chamber 42 filled with a granular solid adsorbent A capable of adsorbing an acidic gas component by a neutralization reaction. A second inner opening 44 that is a gas passage port is formed in the second reaction chamber 42 on the side facing the gas passage 12. The second inner opening 44 has substantially the same area as the cross section of the flat and box-shaped second inner space 43 provided inside the second reaction chamber 42, and the gas passage through the second inner space 43. 12 leads to. A plurality of blades 46 are attached to the second inner opening 44 in parallel with a predetermined gap. On the other hand, a second outer opening 48 that is a gas passage port is formed on the side opposite to the gas passage 12, that is, the side not facing the gas passage 12. The second outer opening 48 has substantially the same area as the cross section of the flat, box-shaped second outer space 45 provided outside the second reaction chamber 42, and the second outer space 45 and the vent pipe 83 are connected to each other. And the fourth connection port 124 of the slide valve 110 and the vent pipe 83. A plurality of slats 50 are attached to the second outer opening 48 in parallel with a predetermined gap. These blades 46 and 50 have the same shape and the same function as those provided in the first chemical adsorption device 20. The inner spaces 23 and 43 and the outer spaces 25 and 45 have a thickness (the figure in the vertical direction in FIG. 1) and a depth (a length in the direction perpendicular to the paper surface in FIG. 1). 1 is a rectangular parallelepiped shape.

  The second reaction chamber 42 has a second hopper 52 capable of supplying the solid adsorbent A at the upper part and a screw conveyor 56 capable of discharging the solid adsorbent A via the second adsorbent outlet 54 at the lower part. is doing. For this reason, the solid adsorbent A moves from top to bottom due to its own weight. This moving direction intersects with an imaginary line connecting the second inner opening 44 and the second outer opening 48. The second hopper 52 and the second adsorbent discharge port 54 correspond to the second supply unit and the second discharge unit of the present invention. The floor 58 of the first reaction chamber 42 is inclined from the inside toward the outside, and the second adsorbent discharge port 54 is provided at the lowest portion. Since the floor 58 of the second reaction chamber 42 is inclined as described above, the moving speed when the solid adsorbent A supplied from the second hopper 52 moves to the second adsorbent discharge port 54 is increased in the gas passage 12. The side not facing the gas passage 12 (region close to the second outer opening 48) is faster than the side facing (region close to the second inner opening 44).

  The slide valve 110 includes a housing 120 having first and second connection ports 121 and 122 arranged in the vertical direction on one surface and third and fourth connection ports 123 and 124 arranged in the horizontal direction on the other surface. And a slide plate 160 slidable up and down within the housing 120. The first connection port 121 is connected to a gas supply pipe 71 to which an untreated gas containing an acidic gas component such as hydrogen chloride, sulfurous acid gas, or sulfuric acid gas is supplied from the outside, and the second connection port 122 is connected to each chemical. A gas discharge pipe 73 for discharging the processed gas that has passed through the adsorption devices 20 and 40 to the outside is connected. Further, the first outer opening 28 of the first chemical adsorption device 20 is connected to the third connection port 123 via the vent pipe 81, and the second chemical adsorption is connected to the fourth connection port 124 via the vent pipe 83. A second outer opening 48 of the device 40 is connected.

  The housing 120 includes a base surface support 120 a that supports the carbon base surface member 130, and a facing surface support 120 b that supports the carbon facing surface member 140 that faces the base surface member 130. .

  The base surface support 120a is a plate-shaped member made of aluminum having a high thermal conductivity. The base surface support 120a is provided with a recess (not shown) on the surface facing the opposing surface support 120b, and the base surface member 130 is fitted into the recess. The first and second connection ports 121 and 122 penetrate the base surface support 120a in the thickness direction. The base surface member 130 is provided with ellipse-shaped first and second passage ports 131 and 132 that extend long in the left-right direction, and is arranged side by side in the vertical direction. The second connection port 122 is disposed substantially at the center of the second passage port 132. On the surface of the base surface member 130 in contact with the base surface support 120a, a V-ring 135, which is a fluororesin seal ring, is formed in a groove provided along the periphery of the first and second passage ports 131 and 132. , 136 are fitted.

  The facing surface support 120b is a member made of aluminum like the base surface support 120a. The facing surface support 120 b is provided with a recess 125 on the surface facing the base surface support 120 a, and the facing surface member 140 is fitted into the recess 125. The third and fourth connection ports 123 and 124 penetrate the opposing surface support 120b in the thickness direction. The opposing surface member 140 is provided with ellipse-shaped third and fourth passage ports 143 and 144 that extend long in the up-down direction, and the third connection port 123 is provided substantially at the center of the third passage port 143. The fourth connection port 124 is disposed substantially at the center of the fourth passage port 144. Further, the third passage port 143 is provided so as to overlap the right side of the first and second passage ports 131 and 132, and the fourth passage port 144 is overlapped with the left side of the first and second passage ports 131 and 132. Is provided. V-rings 145 and 146 made of fluororesin are fitted into concave grooves provided along the periphery of the third and fourth passage ports 143 and 144 on the surface of the facing surface member 140 that contacts the facing surface support 120b. ing. Moreover, the opposing surface support body 120b is formed with jetties 127 and 128 having a predetermined height on both the left and right sides. The housing 120 includes, in a state in which the base surface support 120a and the facing surface support 120b are overlapped, the left and right sides of the base surface support 120a and the jetties 127 and 128 formed on the left and right sides of the facing surface support 120b. Fastened with multiple screws. Inside the housing 120, a cavity communicating in the vertical direction is formed by the presence of the jetty 127,128.

  The slide plate 160 corresponds to a control member, and is a plate-like member made of martensitic stainless steel (SUS410). The slide plate 160 is sandwiched between the base surface member 130 and the facing surface member 140 in a cavity formed in the housing 120. Specifically, the slide plate 160 is elastically supported by the base surface member 130 and the opposing surface member 140 because the V rings 135, 136, 145, and 146 have elastic force. As a result, the slide plate 160 is supported so as to be slidable in the vertical direction, and the sealing property between the slide plate 160 and the base surface member 130 and the sealing property between the slide plate 160 and the facing surface member 140 are ensured. The slide plate 160 has three first to third through holes 161, 162, and 163 at the positions of the apexes of the triangle.

  Here, when the slide plate 160 is positioned in the first posture, as shown in FIG. 1, the first passage port 131 and the third passage port 143 are allowed to communicate with each other through the first through-hole 161 of the slide plate 160. The second passage port 132 and the fourth passage port 144 are allowed to communicate with each other through the second through-hole 162 of the slide plate 160. Further, communication between the first passage port 131 and the fourth passage port 144, and the second passage port 132 and the third passage port 143 is blocked by the slide plate 160. On the other hand, when the slide plate 160 is positioned in the second posture, as shown in FIG. 2, the first passage port 131 and the fourth passage port 144 are allowed to communicate with each other through the second through hole 162 of the slide plate 160. The second passage port 132 and the third passage port 143 are allowed to communicate with each other through the third through hole 163 of the slide plate 160. Further, the communication between the first passage port 131 and the third passage port 143 and the second passage port 132 and the fourth passage port 144 are blocked by the slide plate 160. Here, the slide plate 160 is moved up and down linearly by a pneumatic cylinder (not shown).

  Next, the usage example of the gas processing system 10 of this embodiment is demonstrated using FIG.1 and FIG.2. Here, the first and second chemical adsorption devices 20 and 40 are warmed up by the heater 14 provided in the gas passage 12 in advance, and the neutralization reaction in the first and second reaction chambers 22 and 42 proceeds. It is assumed that the temperature is set easily. In addition, what is necessary is just to set warming-up temperature to a suitable temperature suitably according to the combination of an acidic gas component and a solid adsorbent. In addition, a blower (not shown) is connected to the downstream side of the gas discharge pipe 73, and the inside of each reaction chamber 22, 42, the gas passage 12, and each vent pipe 81, 83 is rotated by rotating this blower. Assume negative pressure.

  In a state in which the slide plate 160 of the slide valve 110 is slid upward and positioned in the first posture, as shown in FIG. 1, the untreated gas containing the acidic gas component supplied from the gas supply pipe 71 is discharged from the first connection port. The first reaction chamber 22 passes from the first outer opening 28 of the first chemical adsorption device 20 through the first passage 131, the first through hole 161, the third passage 143, the third connection port 123, and the vent pipe 81 from 121. Enter. The untreated gas that has entered the first reaction chamber 22 contacts the solid adsorbent A moving from the top to the bottom in the first reaction chamber 22 while moving from right to left in FIG. . At this time, in the region near the first outer opening 28 in the first reaction chamber 22, the untreated gas contains a high-concentration acidic gas component, so that the amount of heat generated by the neutralization reaction is large and the temperature tends to increase. On the other hand, in the region close to the first inner opening 24 in the first reaction chamber 22, the concentration of the acidic gas component is lowered, so the amount of heat generated by the neutralization reaction is small and it is difficult to reach a high temperature. Thus, the closer to the first outer opening 28 in the first reaction chamber 22, the higher the temperature becomes. However, since the moving speed of the solid adsorbent A is faster as it is closer to the first outer opening 28, the solid adsorbent A that has been heated to a high temperature after neutralization is discharged at an early stage, so that it does not become too high. The gas that has passed through the first reaction chamber 22 passes through the gas passage 12 and enters the second reaction chamber 42 from the second inner opening 44 of the second chemical adsorption device 40. When passing through the gas passage 12, the gas temperature is maintained at a temperature suitable for the neutralization reaction by the heater 14. The untreated gas that has entered the second reaction chamber 42 contacts the solid adsorbent A moving from the top to the bottom in the second reaction chamber 42 while moving from right to left in FIG. However, since most of the acidic gas components have already been removed in the first reaction chamber 22, the amount of heat generated by the neutralization reaction is small and it is difficult to reach a high temperature. The gas that has passed through the second reaction chamber 42 passes through the second outer opening 48, the vent pipe 83, the fourth connection port 124, the fourth passage port 144, the second through hole 162, and the second passage port 132. The second connection port 122 leads to the gas discharge pipe 73. Such a gas flow is called a forward state. When the operation is continued in the forward direction, the region near the first outer opening 28 in the first reaction chamber 22 gradually increases in temperature.

  Then, before the temperature of the region near the first outer opening 28 in the first reaction chamber 22 reaches the fusion temperature of the solid adsorbent A, the slide plate 160 of the slide valve 110 is slid down to the second posture. Position. Then, as shown in FIG. 2, the untreated gas supplied from the gas supply pipe 71 flows from the first connection port 121 to the first passage port 131, the second through hole 162, the fourth passage port 144, and the fourth connection port 124. And enters the second reaction chamber 42 from the second outer opening 48 of the second chemical adsorption device 40 through the vent pipe 83. The untreated gas that has entered the second reaction chamber 42 contacts the solid adsorbent A moving from the top to the bottom in the second reaction chamber 22 while moving from left to right in FIG. . At this time, in the region close to the second outer opening 48 in the second reaction chamber 42, the untreated gas contains a high concentration of acidic gas components, so that the amount of heat generated by the neutralization reaction is large and the temperature tends to increase. On the other hand, in the region close to the second inner opening 44 in the second reaction chamber 42, the concentration of the acidic gas component is reduced, so that the amount of heat generated by the neutralization reaction is small and it is difficult to reach a high temperature. Thus, in the second reaction chamber 42, the closer to the second outer opening 48, the higher the temperature. However, since the moving speed of the solid adsorbent A is faster as it is closer to the second outer opening 48, the high temperature solid adsorbent A after neutralization is discharged at an early stage, so that it does not become too high. The gas after passing through the second reaction chamber 42 passes through the gas passage 12 and enters the first reaction chamber 22 from the first inner opening 24 of the first chemical adsorption device 20. When passing through the gas passage 12, the gas temperature is maintained at a temperature suitable for the neutralization reaction by the heater 14. The untreated gas that has entered the first reaction chamber 22 contacts the solid adsorbent A moving from the top to the bottom in the first reaction chamber 22 while moving from left to right in FIG. However, since most of the acidic gas component has already been removed in the second reaction chamber 42, the amount of heat generated by the neutralization reaction is small and it is difficult to reach a high temperature. The gas after passing through the first reaction chamber 22 passes through the ventilation pipe 81, the third connection port 123, the third passage port 143, the third through hole 163, and the second passage port 132, and then the second connection port 122. To the gas discharge pipe 73. Such a gas flow is called a reverse state. When the operation is continued in the reverse direction, the region near the second outer opening 48 of the second reaction chamber 42 gradually increases in temperature. Even if the region close to the first outer opening 28 in the first reaction chamber 22 is set to the forward state until the previous time, the temperature of that region is set after the reverse state is set. Since it decreases gradually, the solid adsorbent A does not fuse in that region.

  Then, before the temperature of the region near the second outer opening 48 of the second reaction chamber 42 reaches the fusion temperature of the solid adsorbent A, the slide plate 160 of the slide valve 110 is slid upward and positioned in the first posture. To do. Then, the flow of the untreated gas is switched again as shown in FIG. By continuing this state, the temperature of the region near the second outer opening 48 in the second reaction chamber 42 gradually decreases, and instead the temperature of the region near the first outer opening 28 in the first reaction chamber 22. Gradually rises. As described above, by switching the slide plate 160 between the first posture and the second posture at an appropriate timing, the gas flow is switched between the forward direction state and the reverse direction state. The temperature and the temperature of the second reaction chamber 42 can always be kept appropriate. As a result, it is possible to prevent the solid adsorbent A from being fused in any of the reaction chambers 22 and 42.

  According to the gas processing system 10 of the present embodiment described in detail above, since the forward state and the reverse state can be appropriately switched, the solid adsorbent A in each reaction chamber 22, 42 is welded. Can be prevented. Further, the solid adsorbent A after neutralizing the acid gas component is discharged from the first and second adsorbent discharge ports 34 and 54, and a new solid adsorbent A is discharged from the first and second hoppers 32 and 52. Since it is supplied, the acidic gas removal function in each reaction chamber 22, 42 can be maintained for a long period of time, and the solid adsorbent A can be prevented from welding as described above. Sex does not deteriorate. Further, in the forward direction, the region near the first outer opening 28 in the first reaction chamber 22 is likely to be hot, and in the reverse state, the region near the second outer opening 48 in the second reaction chamber 42 is hot. Although it is easy, since the moving speed of the solid adsorbent A is fast in these regions, the time during which the solid adsorbent A after the neutralization reaction stays in these regions is short, so that the temperature can be prevented from becoming too high. Furthermore, when the untreated gas is set to flow from the first reaction chamber 22 to the second reaction chamber 24, the second reaction chamber 24 is stored by heat exchange between the exhaust gas and the solid adsorbent A. For this reason, when the slide valve 110 is switched so that the untreated gas flows from the second reaction chamber 24 to the first reaction chamber 22, the untreated gas is preheated using the heat storage in the second reaction chamber 24, The heat energy from the heater 14 necessary for warming up the gas can be reduced. This is the same when the untreated gas is set to flow from the second reaction chamber 24 to the first reaction chamber 22 and then switched to flow from the first reaction chamber 22 to the second reaction chamber 24.

[Second Embodiment]
3 and 4 are explanatory diagrams of the gas processing system 210 according to the second embodiment. FIG. 3 shows the slide valve 110 in the reverse direction when the slide valve 110 is set in the forward direction. When set.

  The gas processing system 210 includes a gas passage 212 to which a heater 214 is attached and gas can flow in the vertical direction, a first chemical adsorption device 220 disposed on one side of the gas passage 212, and a gas passage 212 on the other side. The second chemical adsorption device 240 is provided with a slide valve 110 as a switch for switching the route of supply of untreated gas and discharge of treated gas. Since the slide valve 110 is the same as that employed in the first embodiment, a specific description thereof will be omitted.

  The first chemical adsorption device 220 includes a first reaction chamber 222 filled with a granular solid adsorbent A. The first reaction chamber 222 corresponds to the upper half of the large reaction chamber 221 that is shared with the second reaction chamber 242 of the second chemical adsorption device 240. A first inner opening 224 which is a gas passage port is formed in the first reaction chamber 222 on the side facing the gas passage 212. The first inner opening 224 communicates with the gas passage 212. A plurality of slats 226 are attached to the first inner opening 224 in parallel with a predetermined gap. On the other hand, a first outer opening 228 that is a gas passage port is also formed on the side opposite to the gas passage 212, that is, the side not facing the gas passage 212. The first outer opening 228 is connected to the third connection port 123 of the slide valve 110 via the vent pipe 81. Further, similar to the first inner opening 224, a plurality of blades 230 are attached to the first outer opening 228 in parallel with a predetermined gap.

   The second chemical adsorption device 240 includes a second reaction chamber 242 filled with a granular solid adsorbent A. The second reaction chamber 242 corresponds to the lower half of the large reaction chamber 221. A second inner opening 244 that is a gas passage port is formed in the second reaction chamber 242 on the side facing the gas passage 212. The second inner opening 244 communicates with the gas passage 212. A plurality of slats 246 are attached to the second inner opening 244 in parallel with a predetermined gap. On the other hand, a second outer opening 248 that is a gas passage port is also formed on the side opposite to the gas passage 212, that is, the side not facing the gas passage 212. The second outer opening 248 is connected to the fourth connection port 124 of the slide valve 110 via the vent pipe 83. Further, like the second inner opening 244, a plurality of wing plates 250 are attached to the second outer opening 248 in parallel with a predetermined gap. The slats 226, 230, 246, 250 have the same shape and the same function as the slats of the first embodiment.

  The large reaction chamber 221 has a hopper 232 capable of supplying the solid adsorbent A at the upper portion and a screw conveyor 236 capable of discharging the solid adsorbent A via the adsorbent discharge port 234 at the lower portion. For this reason, the solid adsorbent A moves from top to bottom due to its own weight. This moving direction intersects with an imaginary line connecting the first inner opening 224 and the first outer opening 228 and an imaginary line connecting the second inner opening 244 and the second outer opening 248. The hopper 232 and the adsorbent discharge port 234 correspond to the supply unit and the discharge unit of the present invention. The floor 238 of the large reaction chamber 221 is inclined from the inside toward the outside, and the adsorbent discharge port 234 is provided at the lowest portion. Since the floor 238 of the large reaction chamber 221 is thus inclined, the moving speed when the solid adsorbent A supplied from the hopper 232 moves up and down to the adsorbent discharge port 234 faces the gas passage 212. The side that does not face the gas passage 212 (region close to the first and second outer openings 228 and 248) is faster than the side (region close to the first and second inner openings 224 and 244).

  Next, a usage example of the gas processing system 210 of the present embodiment will be described with reference to FIGS. 3 and 4. Here, the first and second chemical adsorption devices 220 and 240 are warmed up by the heater 214 provided in the gas passage 212 in advance, and the neutralization reaction in the first and second reaction chambers 222 and 242 proceeds. Easy to set temperature. Further, a blower (not shown) is connected to the downstream side of the gas discharge pipe 73, and the inside of each reaction chamber 220, 240, gas passage 212, and each vent pipe 81, 83 is rotated by rotating this blower. Assume negative pressure.

  In a state where the slide plate 160 of the slide valve 110 is slid upward and positioned in the first posture (see FIG. 1), the untreated gas flows in the forward direction. That is, as shown in FIG. 3, the untreated gas containing the acidic gas component supplied from the gas supply pipe 71 passes through the vent pipe 81 through the slide valve 110 and the first outer opening 228 of the first chemical adsorption device 220. Enters the first reaction chamber 222 and causes a neutralization reaction with the solid adsorbent A in the first reaction chamber 222. The gas after passing through the first reaction chamber 222 passes through the gas passage 212 and enters the second reaction chamber 242 from the second inner opening 244 of the second chemical adsorption device 240. The gas after passing through the second reaction chamber 242 is led out from the second outer opening 248 to the gas exhaust pipe 73 through the vent pipe 83 and the slide valve 110. In such a forward state, since the neutralization reaction occurs actively in a region near the first outer opening 228 in the first reaction chamber 222, the temperature in this region tends to be highest.

  Then, before the temperature of the region close to the first outer opening 228 in the first reaction chamber 222 reaches the fusion temperature of the solid adsorbent A, the slide plate 160 of the slide valve 110 is slid down to the second posture. Position (see FIG. 2). Then, the untreated gas flows in the reverse direction. That is, as shown in FIG. 4, the untreated gas supplied from the gas supply pipe 71 passes through the slide valve 110, the vent pipe 83, and the second reaction chamber 240 from the second outer opening 248. 242 enters and causes a neutralization reaction with the solid adsorbent A in the second reaction chamber 242. The gas after passing through the second reaction chamber 242 passes through the gas passage 212 and enters the first reaction chamber 222 from the first inner opening 224 of the first chemical adsorption device 220. Then, the gas after passing through the first reaction chamber 222 is led out from the first outer opening 228 through the vent pipe 81 to the gas exhaust pipe 73 through the slide valve 110. In such a reverse direction, the neutralization reaction occurs actively in a region near the second outer opening 248 in the second reaction chamber 242, and therefore the temperature in this region is likely to be highest.

  Then, before the temperature of the region close to the second outer opening 248 in the second reaction chamber 242 reaches the fusion temperature of the solid adsorbent A, the slide plate 160 of the slide valve 110 is slid upward to the first posture. Position. Then, the flow of untreated gas is switched in the forward direction. By continuing this state, the temperature of the region near the second outer opening 248 in the second reaction chamber 242 gradually decreases, and instead the temperature of the region near the first outer opening 228 in the first reaction chamber 222. Gradually rises. As described above, by switching the slide plate 160 between the first posture and the second posture at an appropriate timing, the gas flow is switched between the forward direction state and the reverse direction state. The temperature and the temperature of the second reaction chamber 242 can always be kept appropriate. As a result, it is possible to prevent the solid adsorbent A from being fused in any of the reaction chambers 222 and 242.

  According to the gas processing system 210 of this embodiment described in detail above, the same effects as those of the first embodiment can be obtained. Further, since the first reaction chamber 222 and the second reaction chamber 242 are shared, the entire system can be made compact compared to the first embodiment. Incidentally, in 1st Embodiment, since the 1st and 2nd chemical adsorption apparatuses 20 and 40 are provided separately, when one side heats up, it is hard to transmit the heat to the other, and each reaction chamber 22 and 42 inside It is possible to more reliably prevent the solid adsorbent A from welding.

  It should be noted that the present invention is not limited to the above-described embodiment, and it goes without saying that the present invention can be implemented in various modes as long as it belongs to the technical scope of the present invention.

  For example, in the first and second embodiments described above, the slide valve 110 is employed as the switch. However, instead of the slide valve 110, a plurality of pipes 74 to 77 and on-off valves 74a to 74a are used as shown in FIGS. 77a may be adopted. Specifically, the introduction pipe 74 and the outlet pipe 77 are connected to the first outer space 25 of the first chemical adsorption apparatus 20, and the introduction pipe 75 and the outlet pipe 76 are connected to the second outer space 45 of the second chemical adsorption apparatus 40. Connect and attach the open / close valves 74a to 77a to the pipes 74 to 77, respectively. As shown in FIG. 5, when the on-off valves 74a and 76a are opened and the on-off valves 75a and 77a are closed, the untreated gas flows from the introduction pipe 74 to the first chemical adsorption device 20, the gas passage 12 and the second chemical adsorption. After passing through the device 40 in this order, it is led out to the lead-out pipe 76 (forward direction state). On the other hand, as shown in FIG. 6, when the on-off valves 74a, 76a are closed and the on-off valves 75a, 77a are switched to open, the untreated gas flows from the introduction pipe 75 to the second chemical adsorption device 40, the gas passage 12 and the first chemical. After passing through the adsorption device 20 in this order, it is led out to the lead-out pipe 77. Even in this case, the same effects as those of the first and second embodiments described above can be obtained. However, in FIGS. 5 and 6, it is necessary to operate the four open / close valves 74 a to 77 a, whereas when the slide valve 110 is employed, only one slide valve 110 needs to be operated. The configuration necessary for switching the gas flow can be made compact.

  In the first embodiment described above, the solid adsorbent A moves from the top to the bottom in the first and second reaction chambers 22 and 42. However, the first and second hoppers 32 and 52 and the first and second hoppers 2 The adsorbent outlets 34 and 54 may be closed so that the solid adsorbent A does not move. Similarly, in the second embodiment, the solid adsorbent A may not be moved. In this case, since the solid adsorbent A has a reduced ability to neutralize the acidic gas component as the operation is continued, it is preferable to replace the solid adsorbent A with a new one at an appropriate timing. At this time, the solid adsorbent A may be packed in an air permeable cartridge container, and the entire cartridge container may be replaced. By doing so, the replacement work of the solid adsorbent A is facilitated.

  In the first embodiment described above, the heater 14 is attached to the gas passage 12, but heaters are attached to the first and second reaction chambers 22 and 42, and the heaters in the reaction chambers 22 and 42 are warmed up by these heaters. Etc. may be performed. Also in the second embodiment, similarly, heaters may be attached to the large reaction chamber 221 to warm up the reaction chambers 222 and 242 with these heaters. In this case, the heaters 14 and 214 may be omitted.

  In the first and second embodiments described above, the solid adsorbent A is used alone, but a mixture of the solid adsorbent A and the oxidation catalyst may be used. In this way, when the untreated gas contains a halogenated hydrocarbon (for example, trichloroethylene), the halogenated hydrocarbon is decomposed into hydrogen halide, halogen gas, etc. by the oxidation catalyst and then adsorbed on the solid adsorbent A. Therefore, the untreated gas can be purified efficiently. Here, the oxidation catalyst may be appropriately selected depending on the type of halogenated hydrocarbon contained in the untreated gas, and examples thereof include iron oxide, aluminum oxide, and silicon oxide.

  In the first and second embodiments described above, when the gas flow is switched from the forward direction state to the reverse direction state by the slide valve 110, the untreated gas accumulated in the vent pipe 81 is directly discharged from the gas discharge pipe 73. Thus, when switching from the reverse direction state to the forward direction state, the untreated gas accumulated in the vent pipe 83 is directly discharged to the gas discharge pipe 73. For this reason, for example, as shown in FIG. 7, the gas supply pipe 71 is configured to be able to supply harmless gas (for example, air) via the valve 78, and the valve 78 is opened immediately before switching the slide valve 110. It is preferable to dilute the untreated gas sufficiently with a harmless gas, and then close the valve 78 to switch the slide valve 110. In this way, it is possible to prevent the untreated gas containing the acidic gas component at a high concentration from being released as it is. Alternatively, a communication pipe with a valve is attached between the gas supply pipe 71 and the gas exhaust pipe 73, and a valve is attached downstream from the attachment position of the communication pipe in the gas exhaust pipe 73. The pipe may be closed and the gas discharge pipe 73 may be opened, and the communication pipe may be opened and the gas discharge pipe 73 may be closed for a predetermined period immediately after the slide valve 110 is switched. In this way, even if the untreated gas returns to the gas discharge pipe 73 as it is, the untreated gas can be returned to the gas supply pipe 71 again through the communication pipe.

It is explanatory drawing of the gas processing system 10 of 1st Embodiment, and represents the time when the slide valve 110 is set to the forward direction state. It is explanatory drawing of the gas processing system 10 of 1st Embodiment, and represents the time when the slide valve 110 is set to the reverse direction state. It is explanatory drawing of the gas processing system 210 of 2nd Embodiment, and represents the time when the slide valve 110 is set to the forward direction state. It is explanatory drawing of the gas processing system 210 of 2nd Embodiment, and represents the time when the slide valve 110 is set to the reverse direction state. It is explanatory drawing when a piping structure is employ | adopted instead of the slide valve 110, and it sets to the forward direction state. It is explanatory drawing when employ | adopting a piping structure instead of the slide valve 110, and setting to a reverse direction state. It is explanatory drawing showing the structure which dilutes untreated gas.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 10 Gas processing system, 12 Gas passage, 14 Heater, 20 1st chemical adsorption apparatus, 22 1st reaction chamber, 23 1st inner space, 24 1st inner opening, 25 1st outer space, 26, 30, 46, 50 Wings, 28 First outer opening, 32 First hopper, 34 First adsorbent outlet, 36,56 Screw conveyor, 38,58 Floor, 40 Second chemical adsorption device, 42 Second reaction chamber, 43 Second inner Space, 44 Second inner opening, 45 Second outer space, 48 Second outer opening, 52 Second hopper, 54 Second adsorbent outlet, 71 Gas supply pipe, 73 Gas discharge pipe, 74,75 Inlet pipe, 74a ˜77a Open / close valve, 76,77 Lead pipe, 78 valve, 81,83 Vent pipe, 110 Slide valve, 120 housing, 120a Base surface support, 12 0b Opposite surface support, 121 1st connection port, 122 2nd connection port, 123 3rd connection port, 124 4th connection port, 125 depression, 127,128 jetty, 130 Base surface member, 131 1st passage port, 132 2nd passage port, 135, 136, 145, 146 V ring, 140 Opposing surface member, 143 3rd passage port, 144 4th passage port, 160 Slide plate, 161-163 First to third through hole, 210 Gas treatment System, 212 gas passage, 214 heater, 220 first chemical adsorption device, 221 large reaction chamber, 222 first reaction chamber, 224 first inner opening, 226, 230, 246, 250 vane, 228 first outer opening, 232 Hopper, 234 Adsorbent outlet, 236 Screw conveyor, 238 floor, 240 Second chemical adsorption device, 242 Second reaction chamber, 2 4 second inner opening, 248 second outer opening path, A solid adsorbent.

Claims (10)

A gas passage,
A first reaction chamber filled with a solid adsorbent capable of adsorbing an acidic gas component by a neutralization reaction, the first reaction chamber on the side facing the gas passage and on the side not facing the gas passage; A first chemical adsorption device provided with a gas passage;
A second reaction chamber filled with a solid adsorbent capable of adsorbing an acidic gas component by a neutralization reaction, and a side facing the gas passage and a side not facing the gas passage of the second reaction chamber, respectively; A second chemical adsorption device provided with a gas passage;
The process which supplied untreated gas to the gas passage provided in the side which does not face the said gas channel among the said 1st reaction chamber, and passed through the said 1st reaction chamber, the said gas channel, and the said 2nd reaction chamber in this order. The exhaust gas is discharged from a gas passage port provided on the side of the second reaction chamber that does not face the gas passage, or is provided on the side of the second reaction chamber that does not face the gas passage. An untreated gas is supplied to the gas passage, and the treated gas that has passed through the second reaction chamber, the gas passage, and the first reaction chamber in this order is placed on the side of the first reaction chamber that does not face the gas passage. A switch for switching between the reverse direction of discharging from the provided gas passage,
Equipped with a,
The first chemical adsorption device includes a first supply unit capable of supplying a solid adsorbent to the first reaction chamber, and a first discharge unit capable of discharging the solid adsorbent from the first reaction chamber, The solid adsorbent supplied from the first supply unit to the first reaction chamber moves in a direction crossing an imaginary line connecting the two gas passage ports of the first reaction chamber and is discharged from the first discharge unit. Configured as
The second chemical adsorption device includes a second supply unit capable of supplying a solid adsorbent to the second reaction chamber, and a second discharge unit capable of discharging the solid adsorbent from the second reaction chamber, The solid adsorbent supplied from the second supply unit to the second reaction chamber moves in a direction crossing an imaginary line connecting the two gas passage ports of the second reaction chamber and is discharged from the second discharge unit. Configured as
Gas processing system.   When the switch is in the forward state, before the temperature of the region close to the gas passage on the side not facing the gas passage in the first reaction chamber reaches the fusion temperature of the solid adsorbent, Switching to the reverse state, and in the reverse state, the temperature of the region close to the gas passage on the side of the second reaction chamber that does not face the gas passage is the fusion temperature of the solid adsorbent. Before reaching the forward state,
  The gas processing system according to claim 1. The first chemical adsorption device has a gas passage port provided on a side not facing the gas passage as compared to a region near the gas passage port provided on the side facing the gas passage in the first reaction chamber. It is configured so that the moving speed of the solid adsorbent is faster in the closer area,
The second chemical adsorption device has a gas passage opening provided on a side not facing the gas passage as compared with a region near the gas passage opening provided on the side facing the gas passage in the second reaction chamber. It is configured so that the moving speed of the solid adsorbent is faster in the near area,
The gas processing system according to claim 1 or 2 . The first and second chemical adsorption devices are formed separately.
The gas processing system according to any one of claims 1 to 3 . The first reaction chamber of the first chemical adsorption device and the second reaction chamber of the second chemical adsorption device are shared to form one large reaction chamber,
Both gas passage ports of the first chemical adsorption device are respectively provided on the side facing the gas passage and the side not facing the gas passage in the large reaction chamber,
The gas passage ports of the second chemical adsorption device are separated from the gas passage ports of the first chemical adsorption device on the side facing the gas passage and the side not facing the gas passage in the large reaction chamber. Each provided,
The gas processing system according to any one of claims 1 to 3 . In the first and second chemical adsorption apparatuses, an oxidation catalyst that oxidizes and decomposes a halogenated hydrocarbon in an untreated gas to generate an acid gas component hydrogen halide and / or halogen gas is mixed with a solid adsorbent. Used,
The gas processing system of any one of Claims 1-5 . The gas passage has a heat source, and the heat of the heat source can warm up the first and second chemical adsorption devices.
The gas processing system of any one of Claims 1-6 . A gas treatment system according to any one of claims 1 to 7 ,
A dilution gas can be introduced from a dilution gas introduction pipe through a valve into an untreated gas supply path for supplying an untreated gas to the first or second reactor.
Gas processing system. A gas treatment system according to any one of claims 1 to 7 ,
A communication pipe with a valve between an untreated gas supply path for supplying untreated gas to the first or second reactor and a treated gas discharge path for discharging treated gas from the first or second reactor And a valve is attached downstream of the treated gas discharge path from the attachment position of the communication pipe.
Gas processing system. The switch is
A base surface member provided with first and second passage ports through which gas can pass in a predetermined direction;
Opposing to the base surface member, the third and fourth passage ports through which gas can pass are arranged in a direction intersecting the predetermined direction, and both are provided so as to overlap both the first and second passage ports. An opposing surface member;
When the base surface member and the facing surface member are slidably disposed and positioned in the first posture, the first passage port and the third passage port communicate with each other, and the second passage port and the The communication with the fourth passage is allowed, the communication between the first passage and the fourth passage and the communication between the second passage and the third passage are blocked, and the second posture is positioned. Sometimes communication between the first passage port and the fourth passage port and communication between the second passage port and the third passage port are allowed, and communication between the first passage port and the third passage port and the first passage port are allowed. A control member in which a plurality of through holes are formed so as to block communication between the two passage ports and the fourth passage port;
A gas supply port that surrounds the base surface member and the opposing surface member, is connected to the first passage port and is supplied with untreated gas, a gas discharge port that is connected to the second passage port and discharges the treated gas, A vent pipe connecting the third passage port and the gas passage port provided on the side not facing the gas passage in the first reaction chamber of the first chemical adsorption device, the fourth passage port, and the second chemical adsorption device A housing member having a vent pipe connecting a gas passage port provided on the side of the second reaction chamber not facing the gas passage;
A sliding switching valve with
The gas processing system according to any one of claims 1 to 9 .