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JP5084182B2 - Coated plastic products and coatings - Google Patents
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JP5084182B2 - Coated plastic products and coatings - Google Patents

Coated plastic products and coatings Download PDF

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JP5084182B2
JP5084182B2 JP2006158260A JP2006158260A JP5084182B2 JP 5084182 B2 JP5084182 B2 JP 5084182B2 JP 2006158260 A JP2006158260 A JP 2006158260A JP 2006158260 A JP2006158260 A JP 2006158260A JP 5084182 B2 JP5084182 B2 JP 5084182B2
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JP2007327089A (en
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正樹 中谷
昌 白倉
哲也 鈴木
英之 児玉
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Kirin Brewery Co Ltd
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Description

本発明は、プラスチック製品を、炭素及び水素を主成分とし、DLC(ダイヤモンドライクカーボン)とは異なる構造を有する被膜で被覆した被覆プラスチック製品に関し、ガスバリア性(酸素透過性が小さい性質)、耐衝撃性、耐摩耗性、耐傷性、親和性、耐熱性又は環境性等の基本特性を向上させるものである。これにより、被覆プラスチック製品が、包装容器、摺動部材、記録媒体、繊維又はカード等の用途において優れた性能を発揮する。また、本発明は、プラスチックのみならず、金属、セラミックス又はガラスの基体の表面上に形成された前記被膜にも関する。   The present invention relates to a coated plastic product obtained by coating a plastic product with a coating mainly composed of carbon and hydrogen and having a structure different from that of DLC (diamond-like carbon), and has a gas barrier property (a property of low oxygen permeability) and impact resistance. It improves basic properties such as heat resistance, abrasion resistance, scratch resistance, affinity, heat resistance, and environmental properties. Thereby, a covering plastic product exhibits the outstanding performance in uses, such as a packaging container, a sliding member, a recording medium, a fiber, or a card | curd. The present invention also relates to the coating film formed on the surface of a substrate of metal, ceramics or glass as well as plastic.

プラスチックは、極めて広い範囲の産業で、例えば、包装材、容器、部品等の用途に広く使用されている。特にガラスやアルミニウムの代替材料としても広く採用されているため、飲料容器ではプラスチック容器が主流の一つである。ただし、ガスバリア性、耐摩耗性、耐衝撃性又は耐傷性等の基本特性が不足しているとの指摘がなされている用途もある。このため近年は、これらの基本特性のさらなる向上が求められてきた。そこで、無機物やガラスをポリエチレンテレフタレート(PET)樹脂からなる成形体の表面に被覆する発明が開示されており、ガスバリア性、耐摩耗性、耐衝撃性又は耐傷性等が改善されてきた。例えば、ポリエチレンテレフタレート製ボトルに炭素膜又は無機物薄膜を被覆した技術が開示されている(例えば、特許文献1、2又は3を参照。)。   Plastics are widely used in a very wide range of industries, for example, in applications such as packaging materials, containers, and parts. In particular, plastic containers are one of the mainstream beverage containers because they are widely adopted as alternative materials for glass and aluminum. However, there are applications for which it has been pointed out that basic properties such as gas barrier properties, abrasion resistance, impact resistance or scratch resistance are insufficient. Therefore, in recent years, further improvement of these basic characteristics has been demanded. Accordingly, an invention has been disclosed in which an inorganic substance or glass is coated on the surface of a molded body made of polyethylene terephthalate (PET) resin, and gas barrier properties, wear resistance, impact resistance, scratch resistance, and the like have been improved. For example, a technique in which a polyethylene terephthalate bottle is coated with a carbon film or an inorganic thin film is disclosed (for example, see Patent Documents 1, 2, or 3).

特開平8−53116号公報JP-A-8-53116 特開2002−68308号公報JP 2002-68308 A 特開2001−158415号公報JP 2001-158415 A

しかし、被膜は、脆性材料であるため、被膜の下地母材である樹脂が大きく変形する場合、被膜がその変形に追随できずに、破壊や剥離を招くことがある。或いは、被膜と樹脂との熱膨張率の違いにより、昇温時に被膜が下地母材である樹脂の寸法変化に追随できず、破壊や剥離を招くことがある。   However, since the coating is a brittle material, when the resin that is the base material of the coating is greatly deformed, the coating may not follow the deformation and may be broken or peeled off. Alternatively, due to the difference in coefficient of thermal expansion between the coating and the resin, the coating may not follow the dimensional change of the resin that is the base material at the time of temperature rise, which may cause destruction or peeling.

近年は、プラスチック製品について、より幅広い分野で使われるようになったため、優れたガスバリア性、耐摩耗性、耐衝撃性及び耐傷性を有しつつ、優れた耐変形性を有することが望まれる。   In recent years, since plastic products have been used in a wider range of fields, it is desirable to have excellent deformation resistance while having excellent gas barrier properties, wear resistance, impact resistance, and scratch resistance.

また、プラスチック製品のみならず、金属、セラミックス又はガラスの各材料からなる製品についても、耐衝撃性、耐摩耗性、耐傷性又は親和性等の基本特性の向上が求められる。   Further, not only plastic products but also products made of metals, ceramics, or glass materials are required to improve basic characteristics such as impact resistance, wear resistance, scratch resistance, and affinity.

そこで、本発明は、プラスチック製品について、被膜で表面を被覆することで、優れたガスバリア性、耐摩耗性、耐衝撃性及び耐傷性に加えて、優れた耐変形性を付与することを目的とする。   Therefore, the present invention aims to impart excellent deformation resistance in addition to excellent gas barrier properties, wear resistance, impact resistance and scratch resistance by coating the surface of a plastic product with a coating. To do.

また、プラスチック製品のみならず、金属、セラミックス又はガラスの各材料からなる製品についても、同様に、耐衝撃性、耐摩耗性、耐傷性又は親和性等の基本特性の向上を図るために、これらの製品の表面を被覆するための被膜を提供することを目的とする。   In addition to plastic products, products made of metals, ceramics, or glass materials are also used to improve basic characteristics such as impact resistance, wear resistance, scratch resistance, and affinity. An object of the present invention is to provide a coating for coating the surface of a product.

本発明者らは、上記の課題を解決すべく鋭意研究開発したところ、DLC(ダイヤモンドライクカーボン)とは構成元素を同一とするが、原子の結合構造が異なる被膜でプラスチック製品の表面を被覆することで上記目的が達成できることを見出し、本発明を完成させた。すなわち、本発明に係る被覆プラスチック製品は、常圧低温プラズマCVD法によって、プラスチック成形体の表面上に炭素原子と水素原子とを主構成原子として含む被膜が形成された被覆プラスチック製品において、前記被膜は、隙間をあけて対向し合う高周波印加用電極と接地電極の少なくともいずれか一方の対向側の電極表面を比誘電率3以上100以下の誘電体で覆い、前記高周波印加用電極、前記接地電極又は前記誘電体のいずれかの上に前記隙間に面してプラスチック成形体を配置し、前記隙間に、炭素原子源及び水素原子源となる原料ガスと不活性ガスとを(原料ガス体積%/不活性ガス体積%)が50/50〜100/0となる割合でそれぞれ含有する供給ガスを流速2.5〜50m/分で流し、前記高周波印加用電極に単位電極面積あたり0.02〜0.2W/mmの高周波電力を供給して、前記供給ガスを常圧下でプラズマ化することによって形成されてなり、かつ、飛行時間型二次イオン質量分析(TOF−SIMS)法の陰イオン解析において、(1)一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する3原子炭素のピークの強度比率(C3/C1)が0.07以上、(2)一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する4原子炭素のピークの強度比率(C4/C1)が0.05以上、(3)一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する5原子炭素のピークの強度比率(C5/C1)が0.02以上、の(1)〜(3)の少なくともいずれか一つを満たし、かつ、示差走査熱量分析(DSC)法の解析において、昇温速度10℃/min、窒素雰囲気の測定条件で140〜150℃の間に発熱ピークの頂点が出現し、70〜80℃の間に吸熱ピークの頂点が出現することを特徴とする。なお、(原料ガス体積%/不活性ガス体積%)が50/50〜100/0となる割合には、(原料ガス体積%/不活性ガス体積%)=50/50と(原料ガス体積%/不活性ガス体積%)=100/0のいずれの端値も含まれる(以下、同じ表記において同じ)。 As a result of intensive research and development to solve the above-mentioned problems, the inventors of the present invention have the same constituent elements as DLC (diamond-like carbon), but coat the surface of a plastic product with a coating having a different atomic bonding structure. As a result, the inventors have found that the above object can be achieved, and completed the present invention. That is, the coated plastic product according to the present invention is a coated plastic product in which a coating containing carbon atoms and hydrogen atoms as main constituent atoms is formed on the surface of a plastic molded body by an atmospheric pressure low temperature plasma CVD method. Covers the electrode surface of at least one of the high-frequency application electrode and the ground electrode facing each other with a gap therebetween with a dielectric having a relative dielectric constant of 3 to 100, and the high-frequency application electrode and the ground electrode Alternatively, a plastic molded body is disposed on either of the dielectrics so as to face the gap, and in the gap, a source gas and an inert gas serving as a carbon atom source and a hydrogen atom source (source gas volume% / A supply gas containing an inert gas volume%) of 50/50 to 100/0 is flowed at a flow rate of 2.5 to 50 m / min. And supplying high-frequency power electrode area per 0.02~0.2W / mm 2, the result of the feed gas is formed by plasma at atmospheric pressure, and time-of-flight secondary ion mass spectrometry (TOF -SIMS) In the anion analysis of the method, (1) the intensity ratio of the peak of triatomic carbon to the peak of monoatomic carbon (C3 / C1) in the measurement after cleaning the surface with pure water using the primary ion source Au 0.02 or more, and (2) the ratio of the intensity of the peak of 4-atomic carbon to the peak of monoatomic carbon (C4 / C1) in the measurement after cleaning the surface with pure water using the primary ion source Au is 0.05 As described above, (3) the intensity ratio (C5 / C1) of the pentaatomic carbon peak to the monoatomic carbon peak in the measurement after cleaning the surface with pure water using the primary ion source Au is 0.02 or more ( Less of 1) to (3) In the analysis of the differential scanning calorimetry (DSC) method, the peak of the exothermic peak appears at 140 ° C to 150 ° C under the measurement conditions of a heating rate of 10 ° C / min and nitrogen atmosphere. The end point of the endothermic peak appears between 70 and 80 ° C. Note that the ratio of (source gas volume% / inert gas volume%) to 50/50 to 100/0 is (source gas volume% / inert gas volume%) = 50/50 (source gas volume%). / Inert gas volume%) = 100/0 is included (hereinafter the same in the same notation).

ここで、本発明に係る被覆プラスチック製品では、前記原料ガスがアセチレンであることが好ましい。炭素原子/水素原子の比率が高く、成膜効率が高い。   Here, in the coated plastic product according to the present invention, the raw material gas is preferably acetylene. High carbon / hydrogen atom ratio and high deposition efficiency.

或いは、本発明に係る被覆プラスチック製品は、プラスチック成形体の表面上に炭素原子と水素原子とを主構成原子として含む被膜が形成された被覆プラスチック製品において、前記被膜は、飛行時間型二次イオン質量分析(TOF−SIMS)法の陰イオン解析において、前記(1)(2)(3)の全てを満たすことが好ましい。 Alternatively, the coated plastic product according to the present invention is a coated plastic product in which a coating containing carbon atoms and hydrogen atoms as main constituent atoms is formed on the surface of a plastic molding, wherein the coating is a time-of-flight secondary ion In the anion analysis of the mass spectrometry (TOF-SIMS) method, it is preferable to satisfy all of the above (1), (2), and (3).

ここで、本発明に係る被覆プラスチック製品では、前記被膜は、同一組成からなる単一層、異組成からなる複数層又は連続的に組成が傾斜している傾斜組成層のいずれかであることが含まれる。   Here, in the coated plastic product according to the present invention, the coating includes any one of a single layer having the same composition, a plurality of layers having different compositions, or a gradient composition layer having a continuously gradient composition. It is.

本発明に係る被覆プラスチック製品では、前記プラスチック成形体がポリエチレンテレフタレート樹脂からなることが好ましい。酸素透過度が低く、プラスチック製品が飲料用容器である場合に最適である。   In the coated plastic product according to the present invention, the plastic molded body is preferably made of a polyethylene terephthalate resin. It is optimal when the oxygen permeability is low and the plastic product is a beverage container.

本発明に係る被覆プラスチック製品では、包装容器、摺動部品、記録媒体、シート、繊維又はカードであることが含まれる。   The coated plastic product according to the present invention includes a packaging container, a sliding part, a recording medium, a sheet, a fiber, or a card.

本発明に係る被膜は、常圧低温プラズマCVD法によって、基体の表面上に形成された炭素原子と水素原子とを主構成原子として含む被膜において、前記被膜は、隙間をあけて対向し合う高周波印加用電極と接地電極の少なくともいずれか一方の対向側の電極表面を比誘電率3以上100以下の誘電体で覆い、前記高周波印加用電極、前記接地電極又は前記誘電体のいずれかの上に前記隙間に面して基体を配置し、前記隙間に、炭素原子源及び水素原子源となる原料ガスと不活性ガスとを(原料ガス体積%/不活性ガス体積%)が50/50〜100/0となる割合でそれぞれ含有する供給ガスを流速2.5〜50m/分で流し、前記高周波印加用電極に単位電極面積あたり0.02〜0.2W/mm の高周波電力を供給して、前記供給ガスを常圧下でプラズマ化することによって形成されてなり、かつ、飛行時間型二次イオン質量分析(TOF−SIMS)法の陰イオン解析において、(1)一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する3原子炭素のピークの強度比率(C3/C1)が0.07以上、(2)一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する4原子炭素のピークの強度比率(C4/C1)が0.05以上、(3)一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する5原子炭素のピークの強度比率(C5/C1)が0.02以上、の(1)〜(3)の少なくともいずれか一つを満たし、かつ、示差走査熱量分析(DSC)法の解析において、昇温速度10℃/min、窒素雰囲気の測定条件で140〜150℃の間に発熱ピークの頂点が出現し、70〜80℃の間に吸熱ピークの頂点が出現することを特徴とする。 The film according to the present invention is a film containing carbon atoms and hydrogen atoms formed as main constituent atoms on the surface of a substrate by atmospheric pressure low temperature plasma CVD, wherein the films are opposed to each other with a gap therebetween. The electrode surface on the opposite side of at least one of the application electrode and the ground electrode is covered with a dielectric having a relative dielectric constant of 3 or more and 100 or less, and is placed on any of the high-frequency application electrode, the ground electrode, or the dielectric. A substrate is arranged facing the gap, and a raw material gas and an inert gas (raw material gas volume% / inert gas volume%) of 50/50 to 100 are provided in the gap as a carbon atom source and a hydrogen atom source. The supply gas respectively contained at a rate of 0/0 is flowed at a flow rate of 2.5 to 50 m / min, and high frequency power of 0.02 to 0.2 W / mm 2 per unit electrode area is supplied to the high frequency application electrode. The supply gas In the negative ion analysis of the time-of-flight secondary ion mass spectrometry (TOF-SIMS) method, (1) the surface is purified using the primary ion source Au. After the water cleaning, the intensity ratio (C3 / C1) of the triatomic carbon peak to the monoatomic carbon peak is 0.07 or more, and (2) the surface is cleaned with pure water using the primary ion source Au. The intensity ratio (C4 / C1) of the peak of the 4-atomic carbon to the peak of the monoatomic carbon in the measurement of 0.05 is 0.05 or more, and (3) the measurement after the surface is cleaned with pure water using the primary ion source Au. The intensity ratio (C5 / C1) of the peak of 5 atomic carbons to the peak of monoatomic carbons satisfies at least one of (1) to (3) of 0.02 or more, and differential scanning calorimetry (DSC ) In the analysis of the method, Raising rate 10 ° C. / min, the apex of the exothermic peak between 140 to 150 ° C. under measurement conditions of a nitrogen atmosphere appeared, characterized in that the apex of the endothermic peak appearing between 70 to 80 ° C..

本発明は、プラスチック製品について、被膜で表面を被覆することで、優れたガスバリア性、耐摩耗性、耐衝撃性及び耐傷性に加えて、優れた耐変形性を付与することができる。また、被成膜体である基体は、プラスチック製品のみならず、金属、セラミックス又はガラスの各材料からなる製品であっても良く、前記被膜によって、耐衝撃性、耐摩耗性、耐傷性又は親和性等の基本特性の向上を図ることができる。さらにこの被膜には残留応力が少ないため、例えば膜厚が10μm或いは10μm以上の厚さであってもクラックが発生しにくく、かつ、耐変形性を有しているため、基体の変形或いは熱膨張による伸び縮みに対して追随性が高い。   The present invention can impart excellent deformation resistance in addition to excellent gas barrier properties, wear resistance, impact resistance, and scratch resistance by covering the surface of a plastic product with a coating. Further, the substrate that is the film formation body may be not only a plastic product but also a product made of each material of metal, ceramics, or glass, and depending on the coating, impact resistance, wear resistance, scratch resistance, or affinity It is possible to improve basic characteristics such as property. Further, since this film has little residual stress, for example, even if the film thickness is 10 μm or 10 μm or more, cracks are hardly generated and it has deformation resistance, so that deformation or thermal expansion of the substrate is possible. High compliance with expansion and contraction due to.

以下本発明について実施形態を示して詳細に説明するが本発明はこれらの記載に限定して解釈されない。   Hereinafter, the present invention will be described in detail with reference to embodiments, but the present invention is not construed as being limited to these descriptions.

(作用)
常圧低温プラズマCVD法によって、プラスチック成形体の表面上に炭素原子と水素原子とを主構成原子として含む被膜が形成された被覆プラスチック製品については、例えば、特許文献3に開示がある。特許文献3に開示された技術では、プラズマ化させる供給ガスは、ヘリウムガス等の不活性ガスをメインガスとしている(例えば特許文献3の請求項6又は7を参照。)。常圧低温プラズマCVD法では、不活性ガスをメインガスとしなければ供給ガスのプラズマ化が難しいためである。しかし、不活性ガスをメインガスとすれば、(1)同じ膜厚でガスバリア性が低くなる、(2)原料ガスの含有量が小さいので、成膜速度が小さい(例えば特許文献3の実施例を参照すると成膜時間が1分間と非常に長い)、という問題がある。
(Function)
For example, Patent Document 3 discloses a coated plastic product in which a coating containing carbon atoms and hydrogen atoms as main constituent atoms is formed on the surface of a plastic molded body by atmospheric pressure low temperature plasma CVD. In the technique disclosed in Patent Document 3, the supply gas to be converted into plasma uses an inert gas such as helium gas as the main gas (see, for example, claim 6 or 7 of Patent Document 3). This is because in the atmospheric pressure low temperature plasma CVD method, it is difficult to convert the supply gas into plasma unless the inert gas is used as the main gas. However, if the inert gas is used as the main gas, (1) the gas barrier property is reduced with the same film thickness, and (2) the content of the source gas is small, so that the film formation rate is low (for example, the embodiment of Patent Document 3). , The film formation time is as long as 1 minute).

一方、本実施形態に係る被覆プラスチック製品では、その表面を被覆している被膜が、炭素原子源及び水素原子源となる原料ガスをメインガスとして含有する供給ガスを用いて、常圧低温プラズマCVD法によって成膜されている。つまり、従来困難であった、原料ガスをメインガスとする供給ガスをプラズマ化させる。そのため、推測ではあるが、その被膜は、炭素と水素を主成分とし、炭素骨格の3次元構造と炭化水素の直鎖構造との混合組成物と、不可避不純物とからなる。つまり、その被膜は、炭素骨格の3次元構造を有することで、耐摩耗性、耐衝撃性及び耐傷性に優れた性能を発揮し、その構造を柔軟な炭化水素の直鎖構造が保持することによって耐変形性に優れた性質を併せ持つものである。これにより、被膜に内部応力が残留し難く、クラックが生じない最大厚さを大きくすることができる(例えば最大厚さ100μm)。この被膜で被覆されたプラスチック製品は、ガスバリア性、耐摩耗性、耐衝撃性、耐傷性を持ちつつ、かつ、耐変形性に優れた性質を併せ持つ。また、原料ガスをメインガスとして含有する供給ガスを用いることから、成膜速度が非常に大きく、最大3μm/秒も可能であり、生産性に優れた被覆プラスチック製品となる。   On the other hand, in the coated plastic product according to the present embodiment, the coating covering the surface uses atmospheric pressure low temperature plasma CVD using a supply gas containing a source gas as a carbon atom source and a hydrogen atom source as a main gas. The film is formed by the method. That is, the supply gas having the source gas as the main gas, which has been difficult in the past, is turned into plasma. Therefore, although it is speculated, the coating film is composed of carbon and hydrogen as main components, a mixed composition of a three-dimensional structure of a carbon skeleton and a linear structure of hydrocarbon, and unavoidable impurities. In other words, the coating has a three-dimensional structure of a carbon skeleton, so that it exhibits excellent performance in wear resistance, impact resistance and scratch resistance, and the structure is retained by a flexible hydrocarbon linear structure. Therefore, it has a property with excellent deformation resistance. Thereby, internal stress hardly remains in the coating, and the maximum thickness at which cracks do not occur can be increased (for example, the maximum thickness is 100 μm). The plastic product coated with this film has gas barrier properties, abrasion resistance, impact resistance, and scratch resistance, and also has excellent deformation resistance. In addition, since the supply gas containing the source gas as the main gas is used, the film forming rate is very high and the maximum 3 μm / second is possible, resulting in a coated plastic product with excellent productivity.

(本実施形態に係る被覆プラスチック製品)
本実施形態に係る被覆プラスチック製品は、具体的には、常圧低温プラズマCVD法によって、プラスチック成形体の表面上に炭素原子と水素原子とを主構成原子として含む被膜が形成された被覆プラスチック製品であり、前記被膜は、炭素原子源及び水素原子源となる原料ガスと不活性ガスとを(原料ガス体積%/不活性ガス体積%)が50/50〜100/0となる割合でそれぞれ含有する供給ガスを常圧下でプラズマ化することによって形成される。
(Coated plastic product according to this embodiment)
Specifically, the coated plastic product according to the present embodiment is a coated plastic product in which a coating containing carbon atoms and hydrogen atoms as main constituent atoms is formed on the surface of a plastic molded body by an atmospheric pressure low temperature plasma CVD method. And the coating film contains a source gas and an inert gas which are a carbon atom source and a hydrogen atom source in a ratio of 50/50 to 100/0 (source gas volume% / inert gas volume%). It is formed by converting the supplied gas into plasma under normal pressure.

本実施形態に係る被覆プラスチック製品において、被膜は、周知のプラズマCVD法、スパッタリング法、真空蒸着法等の各種成膜法によって成膜可能であるが、成膜効率及び被膜の平滑性、被膜体の形状選択の自由度の高さからプラズマCVD法が好ましい。特に常圧で行なう常圧低温プラズマCVD法が成膜速度及び被膜構造の制御の容易性、真空装置の不要化に伴う単純化・省スペース化の点からより好ましい。常圧低温プラズマCVD法において、常圧とは、本実施形態では、0.1気圧(10000Pa)以上の大気圧下または準大気圧下のことを指す。また、低温プラズマCVD法であるから、被成膜体は加熱をしないか、或いは、加熱をしてもプラスチック基板が熱ダメージを受けない程度に留めるようにする。例えば基板がPET製の場合、基板温度が80℃以下となるようにする。   In the coated plastic product according to the present embodiment, the film can be formed by various film forming methods such as a well-known plasma CVD method, sputtering method, vacuum deposition method, etc., but the film forming efficiency, the smoothness of the film, and the film body The plasma CVD method is preferable because of its high degree of freedom in shape selection. In particular, the normal pressure low temperature plasma CVD method performed at normal pressure is more preferable from the viewpoints of film formation speed and ease of control of the film structure, and simplification and space saving associated with the need for a vacuum apparatus. In the normal-pressure low-temperature plasma CVD method, the normal pressure refers to an atmospheric pressure or a sub-atmospheric pressure of 0.1 atm (10000 Pa) or more in the present embodiment. In addition, since the low temperature plasma CVD method is used, the film formation target is not heated, or the plastic substrate is not damaged even if heated. For example, when the substrate is made of PET, the substrate temperature is set to 80 ° C. or lower.

被成膜体となるプラスチック成形体は、用途に応じた形態を有するため特に制限はないが、例えば、包装容器であればボトル形状、摺動部品であれば軸部品、記録媒体であれば円盤形状、カードであれば薄板形状、シートであれば反物状、繊維であれば糸状又は中空糸状とする。包装容器は、例えば炭酸飲料や発泡飲料等を充填するワンウェイ若しくはリターナブルで使用可能な飲料用容器、食品容器として使用される。プラスチック成形体の表面に被膜を形成することで、本実施形態に係る被覆プラスチック製品となる。   The plastic molded body to be the film-forming body is not particularly limited because it has a form corresponding to the application. For example, it is a bottle shape for a packaging container, a shaft part for a sliding part, and a disk for a recording medium. If it is a shape or a card, it is a thin plate shape, if it is a sheet, it is a fabric shape, if it is a fiber, it is a thread or hollow fiber. The packaging container is used as a one-way or returnable and usable beverage container or food container filled with, for example, a carbonated beverage or a sparkling beverage. By forming a film on the surface of the plastic molded body, the coated plastic product according to the present embodiment is obtained.

プラスチック成形体の材料としては、例えば、ポリエチレンテレフタレート樹脂(PET)、ポリブチレンテレフタレート樹脂、ポリエチレンナフタレート樹脂、ポリエチレン樹脂、ポリプロピレン樹脂(PP)、シクロオレフィンコポリマ樹脂(COC、環状オレフィン共重合)、アイオノマ樹脂、ポリ−4−メチルペンテン−1樹脂、ポリメタクリル酸メチル樹脂、ポリスチレン樹脂、エチレン−ビニルアルコール共重合樹脂、アクリロニトリル樹脂、ポリ塩化ビニル樹脂、ポリ塩化ビニリデン樹脂、ポリアミド樹脂、ポリアミドイミド樹脂、ポリアセタール樹脂、ポリカーボネート樹脂、ポリスルホン樹脂、又は、4弗化エチレン樹脂、アクリロニトリル−スチレン樹脂、アクリロニトリル‐ブタジエン‐スチレン樹脂を例示することができる。この中で、PETが特に好ましい。酸素透過度が低く、プラスチック製品が飲料用容器である場合に最適である。   Examples of plastic molding materials include polyethylene terephthalate resin (PET), polybutylene terephthalate resin, polyethylene naphthalate resin, polyethylene resin, polypropylene resin (PP), cycloolefin copolymer resin (COC, cyclic olefin copolymer), and ionomer. Resin, poly-4-methylpentene-1 resin, polymethyl methacrylate resin, polystyrene resin, ethylene-vinyl alcohol copolymer resin, acrylonitrile resin, polyvinyl chloride resin, polyvinylidene chloride resin, polyamide resin, polyamideimide resin, polyacetal Exemplifying resin, polycarbonate resin, polysulfone resin, or tetrafluoroethylene resin, acrylonitrile-styrene resin, acrylonitrile-butadiene-styrene resin It can be. Among these, PET is particularly preferable. It is optimal when the oxygen permeability is low and the plastic product is a beverage container.

本実施形態においては、被成膜体はプラスチック成形体である場合で説明をしているが、例えば、金属、セラミックス又はガラスの各材料からなる基体の表面に被膜を被覆しても良い。同様に、耐衝撃性、耐摩耗性、耐傷性又は親和性等の基本特性の向上を図ることができる。   In the present embodiment, the case where the film formation target is a plastic molded body has been described. However, for example, a film may be coated on the surface of a base made of metal, ceramics, or glass. Similarly, basic characteristics such as impact resistance, wear resistance, scratch resistance, or affinity can be improved.

炭素原子源及び水素原子源となる原料ガスとしては、例えば、メタン、エタン、プロパン、ブタン、ペンタン、ヘキサンなどのアルカン系ガス類、エチレン、プロピレン、ブチンなどのアルケン系ガス類、ブタジエン、ペンタジエンなどのアルカジエン系ガス類、アセチレン、メチルアセチレンなどのアルキン系ガス類、ベンゼン、トルエン、キシレン、インデン、ナフタレン、フェナントレンなどの芳香族炭化水素ガス類、シクロプロパン、シクロヘキサンなどのシクロアルカン系ガス類、シクロベンテン、シクロヘキセンなどのシクロアルケン系ガス類、メタノール、エタノールなどのアルコール系ガス類、アセトン、メチルエチルケトンなどのケトン系ガス類、フォルムアルデヒド、アセトアルデヒドなどのアルデヒド系ガス類がある。この中でアセチレンが好ましい。炭素原子/水素原子の比率が高く、成膜効率が高い。   Examples of the source gas used as the carbon atom source and the hydrogen atom source include alkane gases such as methane, ethane, propane, butane, pentane, and hexane, alkene gases such as ethylene, propylene, and butyne, butadiene, pentadiene, and the like. Alkadiene gases, alkyne gases such as acetylene and methylacetylene, aromatic hydrocarbon gases such as benzene, toluene, xylene, indene, naphthalene and phenanthrene, cycloalkane gases such as cyclopropane and cyclohexane, cyclohexane There are cycloalkene gases such as bentene and cyclohexene, alcohol gases such as methanol and ethanol, ketone gases such as acetone and methyl ethyl ketone, and aldehyde gases such as formaldehyde and acetaldehyde.Of these, acetylene is preferred. High carbon / hydrogen atom ratio and high deposition efficiency.

不活性ガスとしては、例えば、ヘリウム、アルゴンのような希ガス或いは窒素ガスである。   The inert gas is, for example, a rare gas such as helium or argon or a nitrogen gas.

供給ガスは、前記原料ガスを70体積%以上100体積%以下、前記不活性ガスを0体積%以上30体積%以下含有していることが好ましく、前記原料ガスを85体積%以上100体積%以下、前記不活性ガスを0体積%以上15体積%以下含有していることがより好ましい。前記原料ガスを50体積%未満、不活性ガスを50体積%超の割合でそれぞれ含有する供給ガスをプラズマ化して被膜を形成すれば、前述の通り、(1)同じ膜厚でガスバリア性が低くなる、(2)原料ガスの含有量が小さいので、成膜速度が小さい、という問題がある。なお、供給ガスには、本発明の作用効果に影響を与えない範囲で、他の添加ガス、例えば酸素ガス、水蒸気などが含まれていても良い。また、希ガスと窒素ガスとを混合して不活性ガスとしても良い。   The supply gas preferably contains 70 to 100% by volume of the source gas, 0 to 30% by volume of the inert gas, and 85 to 100% by volume of the source gas. More preferably, the inert gas is contained in an amount of 0% by volume to 15% by volume. If the coating gas is formed by converting the supply gas containing less than 50% by volume of the source gas and more than 50% by volume of the inert gas into plasma, as described above, (1) the gas barrier property is low with the same film thickness. (2) Since the content of the source gas is small, there is a problem that the film forming speed is low. The supply gas may contain other additive gases such as oxygen gas and water vapor as long as the effects of the present invention are not affected. Moreover, it is good also as inert gas by mixing rare gas and nitrogen gas.

被膜は、炭素原子と水素原子とを主構成原子として含み、前述の通り、推測ではあるが、炭素骨格の3次元構造と炭化水素の直鎖構造との混合組成物と、不可避不純物とからなる。つまり、その被膜は、炭素骨格の3次元構造を有することで、耐摩耗性、耐衝撃性及び耐傷性に優れた性能を発揮し、その構造を柔軟な炭化水素の直鎖構造が保持することによって耐変形性に優れた性質を併せ持つものである。被膜には、原子数比15%以下であれば、酸素、窒素の少なくとも一種を含んでも良い。それを超えると、所望の被膜特性が低下する。   The coating includes carbon atoms and hydrogen atoms as main constituent atoms. As described above, the coating consists of a mixed composition of a three-dimensional structure of a carbon skeleton and a straight chain structure of hydrocarbons, and unavoidable impurities. . In other words, the coating has a three-dimensional structure of a carbon skeleton, so that it exhibits excellent performance in wear resistance, impact resistance and scratch resistance, and the structure is retained by a flexible hydrocarbon linear structure. Therefore, it has a property with excellent deformation resistance. The coating may contain at least one of oxygen and nitrogen as long as the atomic ratio is 15% or less. Beyond that, the desired film properties are reduced.

被覆プラスチック製品の被膜は、飛行時間型二次イオン質量分析(TOF−SIMS)法の陰イオン解析において、一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する3原子炭素のピークの強度比率(C3/C1)が0.07以上であり、かつ、示差走査熱量分析(DSC)法の解析において、昇温速度10℃/min、窒素雰囲気の測定条件で140〜150℃の間に発熱ピークの頂点が出現し、70〜80℃の間に吸熱ピークの頂点が出現する被膜を含む。   The coating of the coated plastic product has a peak of monoatomic carbon in the measurement after cleaning the surface with pure water using the primary ion source Au in the anion analysis of time-of-flight secondary ion mass spectrometry (TOF-SIMS) method. In the analysis of the differential scanning calorimetry (DSC) method, the intensity ratio (C3 / C1) of the peak of the triatomic carbon with respect to is 0.07 or more, and the temperature rise rate is 10 ° C./min under the measurement conditions of the nitrogen atmosphere. It includes a film in which the peak of the exothermic peak appears between 140 and 150 ° C and the peak of the endothermic peak appears between 70 and 80 ° C.

また、被覆プラスチック製品の被膜は、飛行時間型二次イオン質量分析法の陰イオン解析において、一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する4原子炭素のピークの強度比率(C4/C1)が0.05以上であり、かつ、示差走査熱量分析法の解析において、昇温速度10℃/min、窒素雰囲気の測定条件で140〜150℃の間に発熱ピークの頂点が出現し、70〜80℃の間に吸熱ピークの頂点が出現する被膜を含む。   Further, the coating of the coated plastic product has four atoms relative to the peak of the monoatomic carbon in the measurement after the surface is cleaned with pure water using the primary ion source Au in the anion analysis of the time-of-flight secondary ion mass spectrometry. The carbon peak intensity ratio (C4 / C1) is 0.05 or more, and in the analysis of the differential scanning calorimetry method, the temperature rise rate is 10 ° C./min, and the measurement condition in the nitrogen atmosphere is 140 to 150 ° C. The film includes a film in which the peak of the exothermic peak appears and the peak of the endothermic peak appears between 70 to 80 ° C.

また、被覆プラスチック製品の被膜は、飛行時間型二次イオン質量分析法の陰イオン解析において、一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する5原子炭素のピークの強度比率(C5/C1)が0.02以上であり、かつ、示差走査熱量分析法の解析において、昇温速度10℃/min、窒素雰囲気の測定条件で140〜150℃の間に発熱ピークの頂点が出現し、70〜80℃の間に吸熱ピークの頂点が出現する被膜を含む。   Moreover, the coating of the coated plastic product is 5 atoms relative to the peak of the monoatomic carbon in the measurement after the surface is cleaned with pure water using the primary ion source Au in the anion analysis of the time-of-flight secondary ion mass spectrometry. The intensity ratio of carbon peak (C5 / C1) is 0.02 or more, and in the analysis of the differential scanning calorimetry method, the heating rate is 10 ° C./min, and the measurement condition in the nitrogen atmosphere is 140 to 150 ° C. The film includes a film in which the peak of the exothermic peak appears and the peak of the endothermic peak appears between 70 to 80 ° C.

或いは、被覆プラスチック製品の被膜は、プラスチック成形体の表面上に炭素原子と水素原子とを主構成原子として含む被膜が形成された被覆プラスチック製品において、前記被膜は、飛行時間型二次イオン質量分析法の陰イオン解析において、一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する3原子炭素のピークの強度比率(C3/C1)が0.07以上であり、単原子炭素のピークに対する4原子炭素のピークの強度比率(C4/C1)が0.05以上であり、単原子炭素のピークに対する5原子炭素のピークの強度比率(C5/C1)が0.02以上であり、かつ、示差走査熱量分析法の解析において、昇温速度10℃/min、窒素雰囲気の測定条件で140〜150℃の間に発熱ピークの頂点が出現し、70〜80℃の間に吸熱ピークの頂点が出現する被膜を含む。   Alternatively, the coating of the coated plastic product is a coated plastic product in which a coating containing carbon atoms and hydrogen atoms as main constituent atoms is formed on the surface of a plastic molded body, and the coating is a time-of-flight secondary ion mass spectrometry In the anion analysis of the method, the intensity ratio (C3 / C1) of the peak of triatomic carbon to the peak of monoatomic carbon in the measurement after cleaning the surface with pure ion source Au is 0.07 or more. Yes, the intensity ratio (C4 / C1) of the peak of the 4-atomic carbon to the peak of the monoatomic carbon is 0.05 or more, and the intensity ratio (C5 / C1) of the peak of the 5-atomic carbon to the peak of the monoatomic carbon is 0. 0.02 or more, and in the differential scanning calorimetry analysis, the peak of the exothermic peak was observed at 140 ° C. to 150 ° C. under the measurement conditions of a heating rate of 10 ° C./min and a nitrogen atmosphere. There appeared, including coatings top of an endothermic peak appearing between 70 to 80 ° C..

Auイオンを用いた飛行時間型二次イオン質量分析法において、炭素原子のみからなる被膜の断片は、陰イオン解析において検出される。この解析において、被膜に3次元構造の炭素骨格が豊富であるほど、炭素原子のみからなる断片のうち、炭素原子数の多い断片が相対的に多くなる。直鎖の炭素骨格の場合に結合している水素などの異元素の原子のみがスパッタリング過程で除去され、直鎖の炭素のみが連なった断片が生じることは、3次元構造の炭素骨格から水素や炭素などの原子が除去され直鎖の状態で、或いは、3次元骨格のままの状態で断片化することよりも、確率的に起こりにくいためである。したがって、3次元構造の炭素骨格を有する典型的な炭化水素化合物であるDLC(ダイヤモンドライクカーボン)は、一般の直鎖状炭化水素化合物よりも炭素原子のみからなる断片のうち、炭素原子数の多い断片が相対的に多くなる。この相対的な多さは、具体的には、単炭素原子の検出量と複数炭素原子の検出量との比であるピーク高さを観察することで明らかになる。ただし、一般の解析の精度において、単炭素原子と二炭素原子に由来するピークは、DLCと一般の直鎖状炭化水素化合物の間で顕著な差はなく、また、炭素数が増加するにつれて、具体的には炭素数が5を超える領域から、断片の生成確率に対して解析のバックグラウンドが相対的に高くなり、ピーク高さに対する信頼性が乏しくなる。結果、これらの炭素数の間にあたる領域である炭素数3、4及び5については被膜を構成する3次元構造の炭素骨格の相対量を信頼性高く読み取ることができる。   In time-of-flight secondary ion mass spectrometry using Au ions, fragments of the coating consisting only of carbon atoms are detected in anion analysis. In this analysis, the more the carbon skeleton having a three-dimensional structure is rich in the film, the more the fragments having a large number of carbon atoms among the fragments composed of only carbon atoms. In the case of a straight-chain carbon skeleton, only atoms of foreign elements such as hydrogen bonded to each other are removed in the sputtering process, and a fragment in which only straight-chain carbon is connected is generated. This is because it is less probable than the fragmentation in a straight chain state in which atoms such as carbon are removed or in a three-dimensional skeleton state. Therefore, DLC (diamond-like carbon), which is a typical hydrocarbon compound having a three-dimensional structure carbon skeleton, has a larger number of carbon atoms than fragments of general linear hydrocarbon compounds. There are relatively many fragments. Specifically, the relative amount becomes clear by observing the peak height, which is the ratio between the detected amount of single carbon atoms and the detected amount of multiple carbon atoms. However, in the accuracy of general analysis, peaks derived from single carbon atoms and two carbon atoms are not significantly different between DLC and general linear hydrocarbon compounds, and as the number of carbons increases, Specifically, from the region where the number of carbon atoms exceeds 5, the analysis background is relatively high with respect to the fragment generation probability, and the reliability with respect to the peak height is poor. As a result, for the carbon numbers 3, 4 and 5 which are regions between these carbon numbers, the relative amount of the three-dimensional carbon skeleton constituting the coating can be read with high reliability.

飛行時間型二次イオン質量分析法の陰イオン解析の分析条件は、次の通りである。
分析装置:TOF−SIMS300(ION−TOF社製)
一次イオン源:Au
最表面超純水洗浄後、測定面積200μm角の領域を対象に測定。
The analysis conditions for anion analysis of time-of-flight secondary ion mass spectrometry are as follows.
Analyzer: TOF-SIMS300 (manufactured by ION-TOF)
Primary ion source: Au
Measured over a 200 μm square area after cleaning with the outermost ultrapure water.

耐変形性に優れた性質を備えたプラスチック製品の被膜は、示差走査熱量分析法の解析において、昇温速度10℃/min、窒素雰囲気の測定条件で140〜150℃の間に発熱ピークの頂点が出現し、70〜80℃の間に吸熱ピークの頂点が出現する。これは、被膜の構造に、直鎖構造が含まれているためと推測される。なお、DLC膜では吸熱ピーク及び発熱ピークのいずれも検出されない。耐変形性については、当該被膜はDLC膜よりも柔軟な構造とすることが好ましく、このような柔軟な構造は炭素骨格の3次元構造と炭化水素の直鎖構造との混合組成物を形成することで得られたと推測される。このうち耐変形性は直鎖構造に由来すると考えられるが、このような構造とすると、被膜を示差走査熱量分析した際にDLC膜とは異なり、明瞭な吸熱ピークと発熱ピークが検出される。   The film of plastic products having properties with excellent deformation resistance is the peak of the exothermic peak between 140 ° C and 150 ° C under a measurement condition in a nitrogen atmosphere in the analysis by differential scanning calorimetry. And the end of the endothermic peak appears between 70 and 80 ° C. This is presumed to be because the structure of the coating contains a linear structure. In the DLC film, neither an endothermic peak nor an exothermic peak is detected. In terms of deformation resistance, the coating preferably has a softer structure than the DLC film, and such a flexible structure forms a mixed composition of a three-dimensional structure of a carbon skeleton and a linear structure of a hydrocarbon. It is presumed that it was obtained. Among these, the deformation resistance is considered to be derived from a linear structure, but with such a structure, when the film is subjected to differential scanning calorimetry, distinct endothermic peaks and exothermic peaks are detected, unlike the DLC film.

被膜の組成は、厚さ方向において均質であるが、供給ガス中の原料ガス含有量を成膜中に変更するなどの手法により、2種以上の組成が積層された構造としてもよい。残留応力が適宜緩和される。また、プラスチック成形体と被膜との界面から被膜表面に向かって連続的に組成を傾斜させて、被膜を傾斜組成層としても良い。   The composition of the coating is uniform in the thickness direction, but a structure in which two or more kinds of compositions are laminated by a method such as changing the raw material gas content in the supply gas during film formation may be employed. Residual stress is moderated as appropriate. Alternatively, the composition may be continuously inclined from the interface between the plastic molded body and the coating toward the surface of the coating, and the coating may be a gradient composition layer.

被膜の膜厚は、0.01〜100μmであることによって、ガスバリア性、耐摩耗性、耐衝撃性及び耐傷性が得られつつ、優れた耐変形性も得られる。0.01〜10μmとすることが好ましく、0.05〜5μmとすることがより好ましい。なお、この被膜は、炭素骨格の3次元構造と炭化水素の直鎖構造との混合組成物であるため、10μm以上としてもクラックが入り難い。   When the film thickness is 0.01 to 100 μm, excellent deformation resistance is obtained while gas barrier properties, abrasion resistance, impact resistance and scratch resistance are obtained. It is preferable to set it as 0.01-10 micrometers, and it is more preferable to set it as 0.05-5 micrometers. In addition, since this film is a mixed composition of a three-dimensional structure of a carbon skeleton and a linear structure of a hydrocarbon, cracks are hardly generated even when the thickness is 10 μm or more.

本実施形態に係る被覆プラスチック製品において、被膜の成膜方法の一形態は次の通りである。図1は、被覆プラスチック製品の被膜の成膜装置の一形態を示す概略図である。ここで図1ではプラスチック成形体がPETシート5である場合を示している。図1に示すように、本実施形態において、被膜は、隙間1をあけて対向し合う高周波印加用電極2と接地電極3の両方の対向側の電極表面2a,3aを比誘電率3以上100以下の誘電体4a,4bで覆い、誘電体4bの上に隙間1に面してプラスチック成形体であるPETシート5を配置し、隙間1に、炭素原子源及び水素原子源となる原料ガスと不活性ガスとを(原料ガス体積%/不活性ガス体積%)が50/50〜100/0となる割合でそれぞれ含有する供給ガス12を流速2.5〜50m/分で流し、高周波印加用電極2に単位電極面積あたり0.02〜0.2W/mmの高周波電力を供給して、供給ガス12を常圧下でプラズマ化することによって形成される。なお、高周波印加用電極2の電極面積は、隙間1側を向く端面の面積である。 In the coated plastic product according to the present embodiment, one form of the film forming method is as follows. FIG. 1 is a schematic diagram showing an embodiment of a film forming apparatus for a coated plastic product. Here, FIG. 1 shows a case where the plastic molded body is a PET sheet 5. As shown in FIG. 1, in the present embodiment, the coating film has a relative dielectric constant of 3 or more on electrode surfaces 2 a and 3 a on both sides of the high-frequency applying electrode 2 and the ground electrode 3 facing each other with a gap 1 therebetween. Covered with the following dielectrics 4a and 4b, a PET sheet 5 which is a plastic molded body is disposed on the dielectric 4b so as to face the gap 1, and in the gap 1, a source gas serving as a carbon atom source and a hydrogen atom source Supply gas 12 containing inert gas at a ratio of 50/50 to 100/0 (raw gas volume% / inert gas volume%) is flowed at a flow rate of 2.5 to 50 m / min for high frequency application. It is formed by supplying 0.02 to 0.2 W / mm 2 of high frequency power per unit electrode area to the electrode 2 and converting the supply gas 12 into plasma under normal pressure. The electrode area of the high-frequency application electrode 2 is the area of the end face facing the gap 1 side.

図1の成膜装置100において、高周波印加用電極2に高周波電源6の出力が接続されている。高周波電源6は、1kHz〜1MHzの高周波電力を出力するタイプのものであり、9kHz〜40kHzの高周波電力を出力するタイプがより好ましい。周波数が1kHz未満であると被膜の炭素の3次元ネットワーク化が不十分となり、また成膜時間が長くなる。一方、周波数が1MHzを超えるとアーク放電を起こしやすくなる。高周波電力の電圧は、放電面積や誘電率によって原料ガスの放電開始電圧が変化するため、装置によって最適電圧を適宜変更するが、単位電極面積あたり0.02〜0.2W/mm、好ましくは0.04〜0.1W/mmとする。 In the film forming apparatus 100 of FIG. 1, the output of the high frequency power source 6 is connected to the high frequency application electrode 2. The high-frequency power source 6 is a type that outputs high-frequency power of 1 kHz to 1 MHz, and a type that outputs high-frequency power of 9 kHz to 40 kHz is more preferable. If the frequency is less than 1 kHz, the coating of carbon in the three-dimensional network becomes insufficient and the film formation time becomes long. On the other hand, when the frequency exceeds 1 MHz, arc discharge is likely to occur. The voltage of the high frequency power is appropriately changed depending on the apparatus because the discharge start voltage of the raw material gas varies depending on the discharge area and dielectric constant, but is 0.02 to 0.2 W / mm 2 per unit electrode area, preferably It is set to 0.04 to 0.1 W / mm 2 .

高周波印加用電極2と接地電極3は、導電体であればいずれの材料により形成されていても良いが、例えば、銅、アルミニウム、ステンレスである。高周波印加用電極2と接地電極3との電極間距離、すなわち、隙間1の距離は、誘電体4の厚さによって適宜変更するが、例えば、0.1〜15mm程度が好ましい。隙間1のうち、供給ガスの流路となる空間的隙間1aの距離は0.1〜3mm程度が好ましい。空間的隙間1aの距離が小さすぎるとスパークしたり、アーク放電が生じやすく、一方広すぎると高周波電力の高パワーが必要となる。なお、高周波印加用電極2は、絶縁体11に埋め込まれており、絶縁体11には、供給ガスの流路7と排気流路9が形成されている。絶縁体11の材料としては、例えば4弗化エチレン樹脂等の樹脂がある。   The high-frequency applying electrode 2 and the ground electrode 3 may be formed of any material as long as they are conductors, and are, for example, copper, aluminum, and stainless steel. The inter-electrode distance between the high-frequency applying electrode 2 and the ground electrode 3, that is, the distance of the gap 1 is appropriately changed depending on the thickness of the dielectric 4, but is preferably about 0.1 to 15 mm, for example. Of the gap 1, the distance of the spatial gap 1 a serving as a flow path for the supply gas is preferably about 0.1 to 3 mm. If the distance between the spatial gaps 1a is too small, sparking or arc discharge is likely to occur. On the other hand, if the distance is too wide, high frequency power is required. The high-frequency applying electrode 2 is embedded in an insulator 11, and a supply gas flow path 7 and an exhaust flow path 9 are formed in the insulator 11. Examples of the material of the insulator 11 include resins such as tetrafluoroethylene resin.

誘電体4a,4bの比誘電率は3以上100以下とし、7以上40以下とすることが好ましい。誘電体4a,4bは、例えばソーダガラス、鉛ガラス等のガラス、アルミナである。比誘電率が3未満であると放電がしにくくなる。一方、比誘電率が100を超えるとアーク放電しやすなり、また発熱しやすくなる。   The relative dielectric constants of the dielectrics 4a and 4b are 3 or more and 100 or less, and preferably 7 or more and 40 or less. The dielectrics 4a and 4b are glass, such as soda glass and lead glass, and alumina, for example. When the relative dielectric constant is less than 3, it becomes difficult to discharge. On the other hand, when the relative dielectric constant exceeds 100, arc discharge is likely to occur and heat is easily generated.

なお、特許文献3の技術のようにヘリウムガスなどの不活性ガスの供給濃度を高くすることで放電を維持しているが、本実施形態においては、誘電体4a,4bを挟み込むことで放電促進用の不活性ガスが不要とすることができる。このため、炭素原子源及び水素原子源となる原料ガスと不活性ガスとを(原料ガス体積%/不活性ガス体積%)が50/50〜100/0となる割合でそれぞれ含有する供給ガス12をプラズマ化させることができる。不活性ガスを減らすことによって、成膜速度が向上し、また、炭素骨格の3次元構造と炭化水素の直鎖構造との混合組成物からなる被膜が得られる。   Although the discharge is maintained by increasing the supply concentration of an inert gas such as helium gas as in the technique of Patent Document 3, in this embodiment, the discharge is accelerated by sandwiching the dielectrics 4a and 4b. The use of an inert gas can be eliminated. For this reason, the supply gas 12 which contains the source gas and inert gas which become a carbon atom source and a hydrogen atom source in the ratio (source gas volume% / inert gas volume%) will be 50 / 50-100 / 0, respectively. Can be turned into plasma. By reducing the inert gas, the film formation rate is improved, and a film composed of a mixed composition of a three-dimensional structure of a carbon skeleton and a linear structure of a hydrocarbon is obtained.

供給ガス12は、供給ガス発生手段8から供給され、供給ガスの流路7を通して、空間的隙間1aに流れ込む。次いで、PETシート5の表面とほぼ平行に流れた後、排気流路9を通って排気用ブロア10によって系外に排気される。供給ガス12がPETシート5の表面に対して平行に流れるときの流速は2.5〜50m/分とすることが好ましい。流速2.5m/分未満ではプラズマが生じにくく、また成膜速度が小さくなる。一方、流速50m/分を超えると付着効率が小さくなる。   The supply gas 12 is supplied from the supply gas generation means 8 and flows into the spatial gap 1 a through the supply gas flow path 7. Next, after flowing almost in parallel with the surface of the PET sheet 5, it is exhausted out of the system by the exhaust blower 10 through the exhaust passage 9. The flow rate when the supply gas 12 flows parallel to the surface of the PET sheet 5 is preferably 2.5 to 50 m / min. When the flow rate is less than 2.5 m / min, plasma is hardly generated and the film formation rate is reduced. On the other hand, if the flow rate exceeds 50 m / min, the adhesion efficiency decreases.

図1に示した成膜装置100において、誘電体4a,4bは、高周波印加用電極2と接地電極3の両方の対向側の電極表面に配置されているが、この形態に限定されず、いずれか一方のみ配置されることとしても良い。ただし、誘電体を配置しなければ、アーク放電が生じやすく、また、放電促進用の不活性ガスが必要となる。プラスチック成形体であるPETシート5は、高周波印加用電極2、接地電極3又は誘電体4a,4bのいずれかの上に隙間1に面して配置される。図2に高周波印加用電極2、接地電極3及び誘電体並びにプラスチック成形体の配置パターンの態様を示し、(a)は図1のAの拡大図、(b)〜(f)は(a)の他態様例である。図2において、他態様として、(b)は供給ガス12をPETシート5と誘電体4bとの間に流す配置例、(c)は高周波印加用電極2の電極面にのみ誘電体4aを配置し、誘電体4aとPETシート5との間に供給ガス12を流す配置例、(d)は接地電極3の電極面にのみ誘電体4bを配置し、誘電体4bとPETシート5との間に供給ガス12を流す配置例、(e)は接地電極3の電極面にのみ誘電体4bを配置し、PETシート5と高周波印加用電極2との間に供給ガス12を流す配置例、(f)は高周波印加用電極2の電極面にのみ誘電体4aを配置し、PETシート5と接地電極3との間に供給ガス12を流す配置例、をそれぞれ示している。図2に示すように供給ガス12は、プラスチック成形体と誘電体4a又は4bとの隙間、PETシート5と高周波印加用電極2との隙間或いはPETシート5と接地電極3との隙間に流される。   In the film forming apparatus 100 shown in FIG. 1, the dielectrics 4 a and 4 b are arranged on the electrode surfaces on the opposite sides of both the high-frequency applying electrode 2 and the ground electrode 3. Only one of them may be arranged. However, if a dielectric is not disposed, arc discharge is likely to occur, and an inert gas for promoting discharge is required. A PET sheet 5 that is a plastic molded body is disposed on one of the high-frequency applying electrode 2, the ground electrode 3, and the dielectrics 4 a and 4 b so as to face the gap 1. FIG. 2 shows an arrangement pattern of the high-frequency applying electrode 2, the ground electrode 3, the dielectric, and the plastic molded body, (a) is an enlarged view of A in FIG. 1, and (b) to (f) are (a). It is another example of an aspect. In FIG. 2, (b) shows an arrangement example in which the supply gas 12 is caused to flow between the PET sheet 5 and the dielectric 4b, and (c) shows that the dielectric 4a is arranged only on the electrode surface of the high-frequency applying electrode 2. In the arrangement example in which the supply gas 12 is allowed to flow between the dielectric 4 a and the PET sheet 5, (d) shows that the dielectric 4 b is arranged only on the electrode surface of the ground electrode 3, and between the dielectric 4 b and the PET sheet 5. (E) is an arrangement example in which the dielectric 4b is arranged only on the electrode surface of the ground electrode 3, and the supply gas 12 is caused to flow between the PET sheet 5 and the high-frequency applying electrode 2. f) shows an arrangement example in which the dielectric 4a is disposed only on the electrode surface of the high-frequency applying electrode 2, and the supply gas 12 is allowed to flow between the PET sheet 5 and the ground electrode 3. As shown in FIG. 2, the supply gas 12 flows in the gap between the plastic molded body and the dielectric 4 a or 4 b, the gap between the PET sheet 5 and the high frequency application electrode 2, or the gap between the PET sheet 5 and the ground electrode 3. .

(実施例1)
図1に示した成膜装置を使用して、PETシートの表面に被膜を形成した。PETシートは、40mm×40mmで厚さは0.3mmである。プラズマ放電の条件は、周波数9kHz、電圧20kV、供給ガスとしてアセチレンガス流量1.0リットル/分、PETシートと電極との隙間距離1.0mm、成膜時間5秒間、放電面積40cm、基板温度50℃とした。なお、この場合に、印加された電力密度は、0.05W/mmであった。
Example 1
A film was formed on the surface of the PET sheet using the film forming apparatus shown in FIG. The PET sheet has a size of 40 mm × 40 mm and a thickness of 0.3 mm. The plasma discharge conditions were a frequency of 9 kHz, a voltage of 20 kV, an acetylene gas flow rate of 1.0 liter / min as the supply gas, a gap distance of 1.0 mm between the PET sheet and the electrode, a film formation time of 5 seconds, a discharge area of 40 cm 2 , and a substrate temperature. The temperature was 50 ° C. In this case, the applied power density was 0.05 W / mm 2 .

(実施例2)
プラズマ放電の条件において、周波数を35kHz、電圧24kV、供給ガスとしてアセチレンガス流量を1.0リットル/分及び窒素ガス流量を1.0リットル/分とした以外は実施例1と同様とした。なお、この場合に、印加された電力密度は、0.08W/mmであった。
(Example 2)
The conditions of plasma discharge were the same as in Example 1 except that the frequency was 35 kHz, the voltage was 24 kV, the supply gas was an acetylene gas flow rate of 1.0 liter / minute, and the nitrogen gas flow rate was 1.0 liter / minute. In this case, the applied power density was 0.08 W / mm 2 .

(比較例1)
厚さ0.3mmの高密度ポリエチレンシートを準備した。
(Comparative Example 1)
A high-density polyethylene sheet having a thickness of 0.3 mm was prepared.

(比較例2)
厚さ0.3mmのポリスチレンシートを準備した。
(Comparative Example 2)
A polystyrene sheet having a thickness of 0.3 mm was prepared.

(比較例3)
実施例1と同じPETシート(非成膜)を準備した。
(Comparative Example 3)
The same PET sheet (non-film-formed) as in Example 1 was prepared.

(比較例4)
プラズマ放電の条件において、周波数を3kHz、電圧15kV、供給ガスとしてアセチレンガス流量を3.0リットル/分、成膜時間10秒間とした以外は実施例1と同様とした。なお、この場合に、印加された電力密度は、0.01W/mmであった。
(Comparative Example 4)
The conditions of plasma discharge were the same as in Example 1 except that the frequency was 3 kHz, the voltage was 15 kV, the flow rate of acetylene gas as the supply gas was 3.0 liters / minute, and the film formation time was 10 seconds. In this case, the applied power density was 0.01 W / mm 2 .

(比較例5)
プラズマ放電の条件において、周波数を9kHz、電圧20kV、供給ガスとしてアセチレンガス流量を0.75リットル/分及び窒素ガス流量を2.25リットル/分とした以外は比較例1と同様とした。なお、この場合に、印加された電力密度は、0.05W/mmであった。
(Comparative Example 5)
The conditions of plasma discharge were the same as in Comparative Example 1 except that the frequency was 9 kHz, the voltage was 20 kV, the acetylene gas flow rate was 0.75 liter / min as the supply gas, and the nitrogen gas flow rate was 2.25 liter / min. In this case, the applied power density was 0.05 W / mm 2 .

(比較例6)
特許文献1の装置を用いて、肉厚0.3mmのPETボトルの内表面にDLC膜を高周波電源の周波数13.56MHz、その出力1200W、原料ガスをアセチレン、成膜時間2秒間の条件で、膜厚30nmのDLC膜の成膜を行なった。
(Comparative Example 6)
Using the apparatus of Patent Document 1, a DLC film is formed on the inner surface of a PET bottle having a thickness of 0.3 mm at a frequency of 13.56 MHz of a high frequency power source, its output is 1200 W, a source gas is acetylene, and a film formation time is 2 seconds. A DLC film having a thickness of 30 nm was formed.

(比較例7)
比較例6において、原料ガスをアセチレンからヘキサメチルジシロキサン(HMDSO)と酸素とした以外は同様にして、酸化珪素被膜を形成した。比較例7について同様に表面の摩擦係数を計測した。
(Comparative Example 7)
In Comparative Example 6, a silicon oxide film was formed in the same manner except that the source gas was changed from acetylene to hexamethyldisiloxane (HMDSO) and oxygen. For Comparative Example 7, the surface friction coefficient was measured in the same manner.

被膜の膜厚は、Veeco社DEKTAK3を用いて測定した。   The film thickness of the coating was measured using Veeco DEKTAK3.

実施例1〜2及び比較例1〜6について、TOF‐SIMSの陰イオン解析((TOF‐SIMS300(ION−TOF社製)、一次イオン源Auを用いて表面を純水洗浄後測定))によって、単炭素原子ピーク(原子量12.00)及び3〜5炭素原子ピーク(それぞれ原子量36.00、48.00、60.00)のピーク強度を求め、その強度比率を算出した。   For Examples 1-2 and Comparative Examples 1-6, by anion analysis of TOF-SIMS ((TOF-SIMS300 (manufactured by ION-TOF), measured after pure water cleaning using primary ion source Au)) The peak intensities of the single carbon atom peak (atomic weight 12.00) and the 3-5 carbon atom peak (atomic weights 36.00, 48.00, 60.00 respectively) were determined, and the intensity ratio was calculated.

実施例1〜2及び比較例1〜6について、DSC解析(示差走査熱量計DSC−60島津製作所製、昇温速度10°/min、窒素雰囲気)によって被膜片の40〜300℃の吸発熱プロファイルを測定し、吸熱ピーク及び発熱ピークの位置を計測した。比較例1〜3のプラスチックシート片についても同様に吸発熱プロファイルを測定し、吸熱ピーク及び発熱ピークの位置を計測した。   About Examples 1-2 and Comparative Examples 1-6, 40-300 degreeC endothermic of the film piece by DSC analysis (Differential scanning calorimeter DSC-60 Shimadzu Corporation make, temperature increase rate 10 degrees / min, nitrogen atmosphere) The profile was measured, and the positions of the endothermic peak and the exothermic peak were measured. For the plastic sheet pieces of Comparative Examples 1 to 3, the endothermic profile was similarly measured, and the positions of the endothermic peak and the exothermic peak were measured.

実施例1〜2及び比較例4〜7について、酸素透過度測定装置(Oxtran2/20(Modern Control社製、23℃、RH90%))にて酸素透過度を測定した。   About Examples 1-2 and Comparative Examples 4-7, oxygen permeability was measured with an oxygen permeability measuring device (Oxtran 2/20 (manufactured by Modern Control, 23 ° C., RH 90%)).

実施例1〜2及び比較例4〜7について、回転盤式摩擦計(FPR−2000、レスカ社製、SUS304 3/16インチ球使用、負荷100g、間隔0.1秒、半径5mm、回転速度100r.p.m.、線速度5.2cm/秒、23℃、20分)を用いて表面の摩擦係数を計測した。   About Examples 1-2 and Comparative Examples 4-7, a rotating disk type friction meter (FPR-2000, manufactured by Reska, SUS304 3/16 inch sphere use, load 100 g, interval 0.1 second, radius 5 mm, rotation speed 100 r The coefficient of friction of the surface was measured using a linear velocity of 5.2 cm / second, 23 ° C., 20 minutes).

実施例1〜2及び比較例4〜7について、成膜時間のみを調整して被膜を全て50nmの膜厚としたサンプルを準備し、85℃の湯に浸漬し、室温に冷却されるまで放置し、PET熱変形後の被膜の密着性を目視観察した。   About Examples 1-2 and Comparative Examples 4-7, the sample which adjusted only film-forming time and made all the films into a film thickness of 50 nm was prepared, it was immersed in 85 degreeC hot water, and it was left until it cooled to room temperature. Then, the adhesion of the coating after PET thermal deformation was visually observed.

表1と表2に分析結果を示した。

Figure 0005084182
Tables 1 and 2 show the analysis results.

Figure 0005084182


Figure 0005084182
Figure 0005084182

実施例1の元素組成をHFS(hydrogen foward scattering analysis)/RBS(Rutherford backscattering spectrometry)法で解析したところ、炭素:水素:酸素:窒素の元素比は、41:48:11:0であった。   When the elemental composition of Example 1 was analyzed by the HFS (Hydrogen Scattering Analysis) / RBS (Rutherford Backscattering Spectrometry) method, the elemental ratio of carbon: hydrogen: oxygen: nitrogen was 41: 48: 11: 0.

実施例1について、SIMS(二次イオン質量分析法)解析(Physical Electronic6650、一次イオン種:Cs、一次加速電圧5kv)で被膜厚さ方向の組成プロファイルを測定したところ、厚さ方向の炭素:水素:酸素:窒素の組成はほぼ一定で、水素、酸素、窒素の濃度はそれぞれ約3×1021原子/cm、9×1020原子/cm、2×1020原子/cm、であった。 About Example 1, when the composition profile in the film thickness direction was measured by SIMS (secondary ion mass spectrometry) analysis (Physical Electronic 6650, primary ion species: Cs + , primary acceleration voltage 5 kv), carbon in the thickness direction: The composition of hydrogen: oxygen: nitrogen is almost constant, and the concentrations of hydrogen, oxygen, and nitrogen are about 3 × 10 21 atoms / cm 3 , 9 × 10 20 atoms / cm 3 , and 2 × 10 20 atoms / cm 3 , respectively. there were.

実施例1について、固体13C−NMR解析(CMX300 7.5mmプローブ(Chemagnetics社製)、CPMAS法(90° pulse 4.5μsec、帯域幅:30kHz、繰り返し時間:5sec、積算回数:3000、回転数:9kHz))にて得られた13C−NMRスペクトルからは、炭素原子に関する結合状態について分離されたsp:sp:−CO:−COOのピーク強度比は、32.5:57.8:4.6:5.1であった。 About Example 1, solid state 13C-NMR analysis (CMX300 7.5 mm probe (manufactured by Chemicals)), CPMAS method (90 ° pulse 4.5 μsec, bandwidth: 30 kHz, repetition time: 5 sec, integration number: 3000, rotation speed: From the 13 C-NMR spectrum obtained in 9 kHz)), the peak intensity ratio of sp 2 : sp 3 : —CO: —COO separated for the bonding state with respect to the carbon atom is 32.5: 57.8: 4. .6: 5.1.

被覆プラスチック製品の被膜の成膜装置の一形態を示す概略図である。It is the schematic which shows one form of the film-forming apparatus of the film of a covering plastic product. 高周波印加用電極2、接地電極3及び誘電体並びにプラスチック成形体の配置パターンの態様を示し、(a)は図1のAの拡大図、(b)〜(f)は(a)の他態様例である。The mode of the arrangement pattern of the high frequency applying electrode 2, the ground electrode 3, the dielectric and the plastic molded body is shown, (a) is an enlarged view of A in FIG. 1, and (b) to (f) are other modes of (a). It is an example.

符号の説明Explanation of symbols

1,電極間の隙間
1a,空間的隙間
2,高周波印加用電極
2a,高周波印加用電極の対向側の電極表面
3,接地電極
3a,接地電極の対向側の電極表面
4,4a,4b,誘電体
5,PETシート
6,高周波電源
7,供給ガスの流路
8,供給ガス発生手段
9,排気流路
10,排気用ブロア
11,絶縁体
12,供給ガス
100,成膜装置
1, gap 1a between electrodes, spatial gap 2, electrode 2a for high frequency application, electrode surface 3 on the opposite side of the electrode for high frequency application 3, ground electrode 3a, electrode surfaces 4, 4a, 4b on the opposite side of the ground electrode, dielectric Body 5, PET sheet 6, high frequency power source 7, supply gas flow path 8, supply gas generating means 9, exhaust flow path 10, exhaust blower 11, insulator 12, supply gas 100, film forming apparatus

Claims (7)

常圧低温プラズマCVD法によって、プラスチック成形体の表面上に炭素原子と水素原子とを主構成原子として含む被膜が形成された被覆プラスチック製品において、
前記被膜は、
隙間をあけて対向し合う高周波印加用電極と接地電極の少なくともいずれか一方の対向側の電極表面を比誘電率3以上100以下の誘電体で覆い、前記高周波印加用電極、前記接地電極又は前記誘電体のいずれかの上に前記隙間に面してプラスチック成形体を配置し、前記隙間に、炭素原子源及び水素原子源となる原料ガスと不活性ガスとを(原料ガス体積%/不活性ガス体積%)が50/50〜100/0となる割合でそれぞれ含有する供給ガスを流速2.5〜50m/分で流し、前記高周波印加用電極に単位電極面積あたり0.02〜0.2W/mmの高周波電力を供給して、前記供給ガスを常圧下でプラズマ化することによって形成されてなり、かつ、
飛行時間型二次イオン質量分析(TOF−SIMS)法の陰イオン解析において、
(1)一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する3原子炭素のピークの強度比率(C3/C1)が0.07以上、
(2)一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する4原子炭素のピークの強度比率(C4/C1)が0.05以上、
(3)一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する5原子炭素のピークの強度比率(C5/C1)が0.02以上、の(1)〜(3)の少なくともいずれか一つを満たし、かつ、
示差走査熱量分析(DSC)法の解析において、昇温速度10℃/min、窒素雰囲気の測定条件で140〜150℃の間に発熱ピークの頂点が出現し、70〜80℃の間に吸熱ピークの頂点が出現することを特徴とする被覆プラスチック製品。
In a coated plastic product in which a coating containing carbon atoms and hydrogen atoms as main constituent atoms is formed on the surface of a plastic molded body by a normal pressure low temperature plasma CVD method,
The coating is
The electrode surface of at least one of the high-frequency applying electrode and the ground electrode facing each other with a gap is covered with a dielectric having a relative dielectric constant of 3 to 100, and the high-frequency applying electrode, the ground electrode, or the ground electrode A plastic molded body is disposed on one of the dielectrics so as to face the gap, and a raw material gas and an inert gas serving as a carbon atom source and a hydrogen atom source (raw material gas volume% / inert gas) are placed in the gap. Gas supplied in a ratio of 50/50 to 100/0 at a flow rate of 2.5 to 50 m / min, and 0.02 to 0.2 W per unit electrode area through the high-frequency application electrode. / Mm 2 of high frequency power is supplied, and the supply gas is formed into plasma under normal pressure , and
In anion analysis of time-of-flight secondary ion mass spectrometry (TOF-SIMS) method,
(1) The intensity ratio (C3 / C1) of the peak of triatomic carbon to the peak of monoatomic carbon in the measurement after cleaning the surface with pure water using the primary ion source Au is 0.07 or more,
(2) The intensity ratio (C4 / C1) of the peak of the 4-atomic carbon to the peak of the monoatomic carbon in the measurement after cleaning the surface with pure water using the primary ion source Au is 0.05 or more,
(3) (1) The intensity ratio (C5 / C1) of the peak of the five atomic carbon to the peak of the monoatomic carbon in the measurement after the surface is cleaned with pure water using the primary ion source Au is 0.02 or more. Satisfy at least one of (3), and
In the differential scanning calorimetry (DSC) method, the peak of the exothermic peak appears between 140 and 150 ° C. under the measurement conditions of a temperature rising rate of 10 ° C./min and nitrogen atmosphere, and the endothermic peak between 70 and 80 ° C. Coated plastic products characterized by the appearance of
前記原料ガスがアセチレンであることを特徴とする請求項に記載の被覆プラスチック製品。 The coated plastic product according to claim 1 , wherein the source gas is acetylene. 前記被膜は、飛行時間型二次イオン質量分析(TOF−SIMS)法の陰イオン解析において、前記(1)(2)(3)の全てを満たすことを特徴とする請求項1又は2に記載の被覆プラスチック製品。 The said film satisfy | fills all said (1) (2) (3) in the anion analysis of a time-of-flight type secondary ion mass spectrometry (TOF-SIMS) method, The said 1 or 2 is characterized by the above-mentioned. coated plastic products. 前記被膜は、同一組成からなる単一層、異組成からなる複数層又は連続的に組成が傾斜している傾斜組成層のいずれかであることを特徴とする請求項1、2又は3に記載の被覆プラスチック製品。 Said coating is a single layer composed of the same composition, according to claim 1, 2 or 3 more layers or continuously composition a heterogeneous composition is characterized in that either a graded composition layer which is inclined Coated plastic products. 前記プラスチック成形体がポリエチレンテレフタレート樹脂からなることを特徴とする請求項1、2、3又は4に記載の被覆プラスチック製品。 The coated plastic product according to claim 1, 2, 3, or 4 , wherein the plastic molded body is made of polyethylene terephthalate resin. 包装容器、摺動部品、記録媒体、シート、繊維又はカードであることを特徴とする請求項1、2、3、4又は5に記載の被覆プラスチック製品。 The coated plastic product according to claim 1, 2, 3, 4, or 5 , wherein the coated plastic product is a packaging container, a sliding part, a recording medium, a sheet, a fiber, or a card. 常圧低温プラズマCVD法によって、基体の表面上に形成された炭素原子と水素原子とを主構成原子として含む被膜において、
前記被膜は、隙間をあけて対向し合う高周波印加用電極と接地電極の少なくともいずれか一方の対向側の電極表面を比誘電率3以上100以下の誘電体で覆い、前記高周波印加用電極、前記接地電極又は前記誘電体のいずれかの上に前記隙間に面して基体を配置し、前記隙間に、炭素原子源及び水素原子源となる原料ガスと不活性ガスとを(原料ガス体積%/不活性ガス体積%)が50/50〜100/0となる割合でそれぞれ含有する供給ガスを流速2.5〜50m/分で流し、前記高周波印加用電極に単位電極面積あたり0.02〜0.2W/mm の高周波電力を供給して、前記供給ガスを常圧下でプラズマ化することによって形成されてなり、かつ、
飛行時間型二次イオン質量分析(TOF−SIMS)法の陰イオン解析において、
(1)一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する3原子炭素のピークの強度比率(C3/C1)が0.07以上、
(2)一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する4原子炭素のピークの強度比率(C4/C1)が0.05以上、
(3)一次イオン源Auを用いて表面を純水洗浄した後の測定での単原子炭素のピークに対する5原子炭素のピークの強度比率(C5/C1)が0.02以上、の(1)〜(3)の少なくともいずれか一つを満たし、かつ、
示差走査熱量分析(DSC)法の解析において、昇温速度10℃/min、窒素雰囲気の測定条件で140〜150℃の間に発熱ピークの頂点が出現し、70〜80℃の間に吸熱ピークの頂点が出現することを特徴とする被膜。
In a film containing carbon atoms and hydrogen atoms as main constituent atoms formed on the surface of the substrate by atmospheric pressure low temperature plasma CVD method,
The coating covers the electrode surface on at least one of the high-frequency applying electrode and the ground electrode facing each other with a gap therebetween with a dielectric having a relative dielectric constant of 3 to 100, and the high-frequency applying electrode, A substrate is disposed on either the ground electrode or the dielectric so as to face the gap, and a raw material gas and an inert gas serving as a carbon atom source and a hydrogen atom source are contained in the gap (raw material gas volume% / The inert gas volume%) is supplied at a flow rate of 2.5 to 50 m / min, respectively, at a rate of 50/50 to 100/0, and 0.02 to 0 per unit electrode area is supplied to the high-frequency application electrode. Formed by supplying high frequency power of 2 W / mm 2 and converting the supply gas into plasma under normal pressure, and
In anion analysis of time-of-flight secondary ion mass spectrometry (TOF-SIMS) method,
(1) The intensity ratio (C3 / C1) of the peak of triatomic carbon to the peak of monoatomic carbon in the measurement after cleaning the surface with pure water using the primary ion source Au is 0.07 or more,
(2) The intensity ratio (C4 / C1) of the peak of the 4-atomic carbon to the peak of the monoatomic carbon in the measurement after cleaning the surface with pure water using the primary ion source Au is 0.05 or more,
(3) (1) The intensity ratio (C5 / C1) of the peak of the five atomic carbon to the peak of the monoatomic carbon in the measurement after the surface is cleaned with pure water using the primary ion source Au is 0.02 or more. Satisfy at least one of (3), and
In the differential scanning calorimetry (DSC) method, the peak of the exothermic peak appears between 140 and 150 ° C. under the measurement conditions of a temperature rising rate of 10 ° C./min and nitrogen atmosphere, and the endothermic peak between 70 and 80 ° C. A film characterized by the appearance of vertices .
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