Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP5115043B2 - Silicone copolymer having sulfur functional group and method for producing the same - Google Patents
[go: Go Back, main page]

JP5115043B2 - Silicone copolymer having sulfur functional group and method for producing the same - Google Patents

Silicone copolymer having sulfur functional group and method for producing the same Download PDF

Info

Publication number
JP5115043B2
JP5115043B2 JP2007156166A JP2007156166A JP5115043B2 JP 5115043 B2 JP5115043 B2 JP 5115043B2 JP 2007156166 A JP2007156166 A JP 2007156166A JP 2007156166 A JP2007156166 A JP 2007156166A JP 5115043 B2 JP5115043 B2 JP 5115043B2
Authority
JP
Japan
Prior art keywords
group
silicone copolymer
mol
copolymer
hydrocarbon group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007156166A
Other languages
Japanese (ja)
Other versions
JP2008308541A (en
Inventor
健 西川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Fine Chemicals Co Ltd
Original Assignee
Toray Fine Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Fine Chemicals Co Ltd filed Critical Toray Fine Chemicals Co Ltd
Priority to JP2007156166A priority Critical patent/JP5115043B2/en
Publication of JP2008308541A publication Critical patent/JP2008308541A/en
Application granted granted Critical
Publication of JP5115043B2 publication Critical patent/JP5115043B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Silicon Polymers (AREA)

Description

本発明は、電子材料や微細加工の材料として有用な硫黄官能基を有する新規シリコーン共重合体に関するものである。   The present invention relates to a novel silicone copolymer having a sulfur functional group useful as an electronic material or a material for fine processing.

近年、半導体素子の微細化が進むとともに、その製造に用いられるリソグラフィ工程についていっそうの微細化が求められるようになってきている。微細化が急速に発展してきた背景には、投影レンズの高NA化、レジストの性能向上、短波長化が挙げられる。   In recent years, with the progress of miniaturization of semiconductor elements, further miniaturization of a lithography process used for manufacturing the semiconductor element has been demanded. The background of rapid progress in miniaturization includes higher NA of projection lenses, improved resist performance, and shorter wavelengths.

特に露光波長の短波長化は大きな変革をもたらしてきたが、さらに微細化の要求は大きく、KrF(248nm)露光からArF(193nm)露光への短波長化が進んできている。   In particular, the shortening of the exposure wavelength has brought about a great change, but the demand for further miniaturization is great, and the shortening of the wavelength from KrF (248 nm) exposure to ArF (193 nm) exposure is progressing.

半導体微細加工で開発されているArF液浸プロセスでは、光源のレンズとレジストとの間に水の層を設けるプロセスであり、水の屈折率(n=1.44)を利用してArF露光(193nm)の波長を見かけ上134nmの波長にすることにより、より微細パターンを作成しようとするプロセスである。   The ArF immersion process developed in semiconductor microfabrication is a process in which a layer of water is provided between the lens of the light source and the resist, and ArF exposure (n = 1.44) is used to make ArF exposure ( This is a process for creating a finer pattern by apparently setting the wavelength of 193 nm to a wavelength of 134 nm.

このように現在、露光波長を短くして微細パターンを作成しようとする試みと、使用するレンズの開口数を大きくして微細パターンを作成しようとする研究がなされている。しかし樹脂の屈折率が低い場合、使用するレンズの開口数が大きくなると、露光される光を樹脂界面で全反射して樹脂内に光が透過しなくなるという問題があり、レンズの開口数を大きくして微細パターンを作成するプロセスに適用できないという問題があった(特許文献1参照)。よって、電子材料用途、特に微細加工プロセスで使用するためには、樹脂の屈折率を大きくして樹脂界面での光の全反射を防ぐ必要があった。   Thus, at present, there are attempts to create a fine pattern by shortening the exposure wavelength and research to create a fine pattern by increasing the numerical aperture of the lens used. However, when the refractive index of the resin is low, if the numerical aperture of the lens used increases, there is a problem that the light to be exposed is totally reflected at the resin interface and the light is not transmitted into the resin. Thus, there is a problem that it cannot be applied to a process for creating a fine pattern (see Patent Document 1). Therefore, for use in electronic materials, particularly in microfabrication processes, it is necessary to increase the refractive index of the resin to prevent total reflection of light at the resin interface.

一方、微細化作成に対応するため中間層を設ける三層レジストプロセスが考案されており、その中間層としてフェノール性水酸基をもつシリコーン重合体の例は報告されている(特許文献2参照)。しかしながら、それら重合体では、フェノール骨格を有するため、微細加工で使用されるArF(193nm)のような遠紫外線露光波長には樹脂自体の吸収が大きく、光が透過しないという問題があった。   On the other hand, a three-layer resist process in which an intermediate layer is provided has been devised in order to cope with miniaturization, and an example of a silicone polymer having a phenolic hydroxyl group as the intermediate layer has been reported (see Patent Document 2). However, since these polymers have a phenol skeleton, there is a problem that the resin itself absorbs a large amount at a far ultraviolet exposure wavelength such as ArF (193 nm) used in microfabrication and does not transmit light.

このことから、電子材料用途、特に微細加工で用いることができるシリコーン重合体で、屈折率が高い新規シリコーン重合体が求められていた。
特開2006−227632号公報 特開2003−149822号公報
For this reason, there has been a demand for a novel silicone polymer having a high refractive index, which is a silicone polymer that can be used in electronic materials, particularly in fine processing.
JP 2006-227632 A JP 2003-149822 A

本発明者は、遠紫外線露光波長で屈折率を向上させる材料について、種々検討を重ねた結果、硫黄官能基を有するシリコーン共重合体が220nm以下の波長で屈折率を向上させることを見出し、この知見に基づいて本発明をなすに至った。   The present inventor has found that the silicone copolymer having a sulfur functional group improves the refractive index at a wavelength of 220 nm or less as a result of various studies on the material that improves the refractive index at the far ultraviolet exposure wavelength. The present invention has been made based on the findings.

すなわち、本発明は、下記一般式 That is, the present invention has the following general formula:

Figure 0005115043
Figure 0005115043

(式中、Rは環状スルフィド基、Aは芳香族環を有する炭化水素基、Bは芳香族を含まない炭化水素基を示す。a、b、cはモル%を示し、aは1〜50モル%、bは1〜50モル%、cは20〜98%、但しb+cは21以上でa+b+c=100を示す)
で示され、重量平均分子量(ポリスチレン換算)が、500から10,000であるシリコーン共重合体を提供することである。
(In the formula, R represents a cyclic sulfide group, A represents a hydrocarbon group having an aromatic ring, B represents a hydrocarbon group not containing an aromatic group, a, b and c represent mol%, and a represents 1 to 50) Mol%, b is 1 to 50 mol%, c is 20 to 98 %, provided that b + c is 21 or more and a + b + c = 100)
And having a weight average molecular weight (polystyrene conversion) of 500 to 10,000.

本発明の硫黄官能基を有するシリコーン共重合体は、遠紫外線領域での短波長の露光波長で透過性が良く、高屈折率であり、遠紫外線領域で使用するのに適した材料である。本発明のシリコーン共重合体は、200℃以上の熱をかけることにより、容易に硬化させることができることから、反射防止膜的な役割を果たすため、微細加工プロセスに導入することができる。   The silicone copolymer having a sulfur functional group of the present invention is a material suitable for use in the far ultraviolet region because of its good transparency at a short exposure wavelength in the far ultraviolet region and a high refractive index. Since the silicone copolymer of the present invention can be easily cured by applying heat of 200 ° C. or higher, it can be introduced into a microfabrication process because it functions as an antireflection film.

また、本発明のシリコーン共重合体は、電子材料分野に限らず、塗料や接着剤等、幅広い分野で応用できる。   Further, the silicone copolymer of the present invention can be applied not only in the field of electronic materials but also in a wide range of fields such as paints and adhesives.

本発明のシリコーン共重合体は、下記一般式
下記一般式
The silicone copolymer of the present invention has the following general formula:

Figure 0005115043
Figure 0005115043

(式中、Rは硫黄官能基を含む炭化水素基を示す)
で示される繰り返し単位と下記一般式
(In the formula, R represents a hydrocarbon group containing a sulfur functional group)
And the following general formula

Figure 0005115043
Figure 0005115043

(式中、Xは炭化水素基を示す)
で示される繰り返し単位を含むシリコーン共重合体である。
(Wherein X represents a hydrocarbon group)
It is a silicone copolymer containing the repeating unit shown by these.

本発明のシリコーン共重合体の下記骨格   The following skeleton of the silicone copolymer of the present invention

Figure 0005115043
Figure 0005115043

は、シルセスキオキサン骨格を示し、各ケイ素原子が3個の酸素原子に結合し、各酸素原子が2個のケイ素原子に結合していることを示す。シルセスキオキサン骨格は、例えば、下記一般式 Represents a silsesquioxane skeleton, wherein each silicon atom is bonded to three oxygen atoms, and each oxygen atom is bonded to two silicon atoms. The silsesquioxane skeleton has, for example, the following general formula

Figure 0005115043
Figure 0005115043

に示す構造式で示すことができる。 It can be shown by the structural formula shown in

また、本発明のシリコーン共重合体は、例えば、下記一般式   Moreover, the silicone copolymer of the present invention has, for example, the following general formula:

Figure 0005115043
Figure 0005115043

で示されるラダー型シリコーン共重合体でも良い。 The ladder type silicone copolymer shown by these may be sufficient.

本発明のシリコーン共重合体のRで示される環状スルフィド基は、環状骨格中に硫黄原子を有する炭化水素基を示す The cyclic sulfide group represented by R in the silicone copolymer of the present invention represents a hydrocarbon group having a sulfur atom in the cyclic skeleton .

Rで示される環状スルフィド、下記一般式 The cyclic sulfide group represented by R has the following general formula

Figure 0005115043
Figure 0005115043

で記載される環状スルフィドが好ましい Are preferred .

本発明のシリコーン共重合体は、下記一般式   The silicone copolymer of the present invention has the following general formula:

Figure 0005115043
Figure 0005115043

(式中、Rは環状スルフィド基、Aは芳香族環を有する炭化水素基、Bは芳香族を含まない炭化水素基を示す。a、b、cはモル%を示し、aは1〜50モル%、bは1〜50モル%、cは20〜98%、但しb+cは21以上でa+b+c=100を示す)
で示されるシリコーン共重合体である。
(In the formula, R represents a cyclic sulfide group, A represents a hydrocarbon group having an aromatic ring, B represents a hydrocarbon group not containing an aromatic group, a, b and c represent mol%, and a represents 1 to 50) Mol%, b is 1 to 50 mol%, c is 20 to 98 %, provided that b + c is 21 or more and a + b + c = 100)
It is a silicone copolymer shown by these.

Aは、芳香族環を有する炭化水素基を示し、193nmで示される代表的な遠紫外線露光波長で光学特性を調整する部位である。すなわち200nm以下の遠紫外線露光波長では芳香族環を含まない場合、光がすべて透過する。使いやすい樹脂にするために、芳香族環を有する炭化水素基を導入することにより、樹脂自体に吸収を持たせて光学特性と調整することが可能となる場合がある。   A represents a hydrocarbon group having an aromatic ring, and is a site for adjusting optical characteristics at a typical far ultraviolet exposure wavelength indicated at 193 nm. That is, all light is transmitted when the aromatic ring is not included at a far ultraviolet exposure wavelength of 200 nm or less. In order to make the resin easy to use, by introducing a hydrocarbon group having an aromatic ring, it may be possible to adjust the optical characteristics by giving absorption to the resin itself.

芳香族環を有する炭化水素基は、フェニル基、フェニルメチル基、フェニルエチル基等のベンゼン環を有する炭化水素基が好ましく、原料入手の観点からフェニル基がより好ましい。また、1−ナフチル基、2−ナフチル基、9−アントラセニル基、9−フェナントレニル基等の縮合多環式炭化水素も好ましく、原料入手の観点から1−ナフチル基、2−ナフチル基がより好ましい。芳香族環に置換基が結合した4−メチルフェニル基、3−メチルフェニル基、2−メチルフェニル基、4−エチルフェニル基等のベンゼン環を有する炭化水素基、2−メチル−1−ナフチル基、5−メチル−1−ナフチル基等、縮合多環式炭化水素基に置換基が結合した形でも良い。   The hydrocarbon group having an aromatic ring is preferably a hydrocarbon group having a benzene ring such as a phenyl group, a phenylmethyl group, or a phenylethyl group, and more preferably a phenyl group from the viewpoint of obtaining raw materials. Moreover, condensed polycyclic hydrocarbons, such as 1-naphthyl group, 2-naphthyl group, 9-anthracenyl group, and 9-phenanthrenyl group, are also preferable, and 1-naphthyl group and 2-naphthyl group are more preferable from the viewpoint of obtaining raw materials. A hydrocarbon group having a benzene ring such as a 4-methylphenyl group, a 3-methylphenyl group, a 2-methylphenyl group, and a 4-ethylphenyl group having a substituent bonded to an aromatic ring, a 2-methyl-1-naphthyl group , A substituted polycyclic hydrocarbon group such as a 5-methyl-1-naphthyl group or the like may be used.

Bは、芳香族環を有しない炭化水素基を示し、200nm以下の遠紫外線露光波長で透明性が高い、炭化水素基が好ましい。炭化水素基として、炭素数1から20の直鎖状、分枝状、環状の1価の炭化水素基が好ましく、架橋炭化水素基でも良い。芳香族環を有しない炭化水素基の好ましい例として、炭素数1から20の直鎖状炭化水素基は、メチル基、エチル基、n−プロピル基、n−ブチル基、n−ペンチル基、n−ヘキシル基等の炭化水素が挙げられる。好ましい分枝状炭化水素基として、イソプロピル基、イソブチル基等の炭化水素基が挙げられる。好ましい環状炭化水素基として、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロオクチル基等の環状炭化水素基が挙げられる。その環状炭化水素基に炭化水素基が結合していても良い。また、架橋炭化水素基の好ましい例として、下記構造式の架橋炭化水素基が挙げられる。   B represents a hydrocarbon group having no aromatic ring, and is preferably a hydrocarbon group having high transparency at a far ultraviolet exposure wavelength of 200 nm or less. The hydrocarbon group is preferably a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and may be a crosslinked hydrocarbon group. As a preferable example of the hydrocarbon group having no aromatic ring, the linear hydrocarbon group having 1 to 20 carbon atoms is a methyl group, an ethyl group, an n-propyl group, an n-butyl group, an n-pentyl group, n -Hydrocarbons such as hexyl groups. Preferable branched hydrocarbon groups include hydrocarbon groups such as isopropyl group and isobutyl group. Preferred cyclic hydrocarbon groups include cyclic hydrocarbon groups such as a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. A hydrocarbon group may be bonded to the cyclic hydrocarbon group. In addition, preferred examples of the crosslinked hydrocarbon group include a crosslinked hydrocarbon group having the following structural formula.

Figure 0005115043
Figure 0005115043

この架橋炭化水素基に炭化水素基が結合していても良い。原料入手の容易さから、メチル基、エチル基、n−プロピル基、シクロヘキシル基、ノルボルナニル基がより好ましく、立体的に小さい炭化水素基を使用すれば樹脂に占めるSi-Oの存在比が高くなることからさらに好ましく、メチル基が一番好ましい。 A hydrocarbon group may be bonded to the crosslinked hydrocarbon group. Methyl group, ethyl group, n-propyl group, cyclohexyl group and norbornanyl group are more preferable because of easy availability of raw materials, and the use of sterically small hydrocarbon groups increases the abundance ratio of Si-O in the resin. Therefore, a methyl group is most preferable.

本発明のシリコーン共重合体は、下記一般式 The silicone copolymer of the present invention has the following general formula:

Figure 0005115043
Figure 0005115043

(式中、Rは環状スルフィド基、Aは芳香族炭化水素基、Bは芳香族を含まない炭化水素基を示す。a、b、cはモル%を示し、aは1〜50モル%、bは1〜50モル%、cは20〜98%、但しb+cは21以上でa+b+c=100を示す)
で示されるシリコーン共重合体である。
(In the formula, R represents a cyclic sulfide group, A represents an aromatic hydrocarbon group, B represents a hydrocarbon group not containing an aromatic group, a, b, and c represent mol%, a represents 1 to 50 mol%, b is 1 to 50 mol%, c is 20 to 98 %, provided that b + c is 21 or more and a + b + c = 100)
It is a silicone copolymer shown by these.

ここで、a成分は、環状スルフィドを有するシリコーン共重合体部位を示す Here, a component shows the silicone copolymer site | part which has cyclic sulfide .

a成分は1〜50モル%である。 The component a is 1 to 50 mol% .

b成分は、芳香族炭化水素基を有するシリコーン共重合体部位を示す。b成分は、1モル%以上、50モル%以下である。b成分が、1モル%以上、50モル%以下であると、半導体分野で使用されている200nm以下の遠紫外線領域の露光波長で光を透過しないという問題が生じない。 b component shows the silicone copolymer site | part which has an aromatic hydrocarbon group. b component is 1 mol% or more and 50 mol% or less. When the b component is 1 mol% or more and 50 mol% or less, there is no problem that light is not transmitted at an exposure wavelength in the far ultraviolet region of 200 nm or less used in the semiconductor field.

c成分は、芳香族を含まない炭化水素基を有するシリコーン共重合体部位を示す。メチル基やエチル基のような炭素数が小さい置換基を導入した場合、シリコーン共重合体に占めるSi-Oの割合が高くなる。Si-Oが占める割合が高くなれば、例えば半導体分野で使用されているエッチングに対する耐性が向上することから、非常に良い材料になる場合がある。c成分は、20モル%以上であるc component shows the silicone copolymer site | part which has the hydrocarbon group which does not contain an aromatic. When a substituent having a small carbon number such as a methyl group or an ethyl group is introduced, the proportion of Si—O in the silicone copolymer increases. If the proportion of Si-O is increased, for example, resistance to etching used in the semiconductor field is improved, which may be a very good material . c component is 2 0 mol% or more.

本発明のシリコーン共重合体は、重量平均分子量(ポリスチレン換算)が、500から10,000の範囲にある。 Silicone copolymers of the present invention, the weight average molecular weight (polystyrene equivalent), area by near-5 00 10,000.

本発明のシリコーン共重合体の分散度は、1.0から10.0の範囲にあるものが好ましく、1.0から2.0の分散度が小さいものが最も好ましい。
本発明のシリコーン共重合体
The dispersity of the silicone copolymer of the present invention is preferably in the range of 1.0 to 10.0, and most preferably in the range of 1.0 to 2.0.
Silicone copolymer of the present invention

Figure 0005115043
Figure 0005115043

を製造する場合、好ましくは、下記一般式 Preferably, the following general formula

Figure 0005115043
Figure 0005115043

(式中、Rは環状スルフィド基を示し、Xは、塩素またはアルコキシ基を示す)
と下記一般式
(Wherein R represents a cyclic sulfide group, and X represents a chlorine or alkoxy group)
And the following general formula

Figure 0005115043
Figure 0005115043

(式中、Aは芳香族炭化水素基を示し、Xは、塩素またはアルコキシ基を示す)
と下記一般式
(In the formula, A represents an aromatic hydrocarbon group, and X represents a chlorine or alkoxy group)
And the following general formula

Figure 0005115043
Figure 0005115043

(式中、Bは、芳香族を含まない炭化水素基を示し、Xは、塩素またはアルコキシ基を示す)
の混合液を反応溶媒中、水と触媒の存在下、加水分解反応及び縮重合反応をすることにより製造することができる。
(In the formula, B represents a hydrocarbon group not containing an aromatic group, and X represents a chlorine or alkoxy group)
In the presence of water and a catalyst in the reaction solvent.

ここで、Xは、塩素またはアルコキシ基を示すが、アルコキシ基は、メトキシ基、エトキシ基、n−プロピルオキシ基、n−ブチルオキシ基、イソプロピルオキシ基等が挙げられ、原料入手の容易さからメトキシ基、エトキシ基が好ましい。   Here, X represents chlorine or an alkoxy group. Examples of the alkoxy group include a methoxy group, an ethoxy group, an n-propyloxy group, an n-butyloxy group, and an isopropyloxy group. Group and ethoxy group are preferred.

反応溶媒としては、メタノール、エタノール、イソプロパノール、n−ブタノール、t−ブタノール等のアルコール溶媒、トルエン、キシレン等に非水溶性炭化水素溶媒、アセトニトリル、テトラヒドロフラン等の水溶性炭化水素溶媒が使用可能であるが、加水分解反応では水を使用することから、メタノール、エタノール、イソプロパノール等のアルコール溶媒が好ましい。   As the reaction solvent, alcohol solvents such as methanol, ethanol, isopropanol, n-butanol and t-butanol, water-insoluble hydrocarbon solvents such as toluene and xylene, and water-soluble hydrocarbon solvents such as acetonitrile and tetrahydrofuran can be used. However, since water is used in the hydrolysis reaction, alcohol solvents such as methanol, ethanol and isopropanol are preferred.

加水分解で使用する水の量は、原料モノマーの合計モル数に対して、3.0から50.0当量が好ましく、3.0から10.0当量がより好ましい。   The amount of water used in the hydrolysis is preferably 3.0 to 50.0 equivalents, more preferably 3.0 to 10.0 equivalents, based on the total number of moles of raw material monomers.

加水分解、縮重合で使用する触媒は、酸性触媒、塩基性触媒どちらも使用することができるが、塩基性触媒では、縮重合が進行し高分子量化が進むため、酸性触媒が好ましい。酸性触媒としては、塩酸、硝酸、硫酸などの無機酸、シュウ酸、トリフルオロ酢酸、マロン酸、こはく酸、クエン酸等のカルボン酸、p−トルエンスルホン酸、メタンスルホン酸等のスルホニル化合物のような強酸が好ましい。   As the catalyst used in the hydrolysis and condensation polymerization, either an acidic catalyst or a basic catalyst can be used. However, the basic catalyst is preferably an acidic catalyst because the condensation polymerization proceeds and the molecular weight increases. Examples of acidic catalysts include inorganic acids such as hydrochloric acid, nitric acid and sulfuric acid, carboxylic acids such as oxalic acid, trifluoroacetic acid, malonic acid, succinic acid and citric acid, and sulfonyl compounds such as p-toluenesulfonic acid and methanesulfonic acid. Strong acids are preferred.

塩基性触媒を使用する場合は、テトラメチルアンモニウムハイドライドやテトラエチルアンモニウムハイドライド等のアンモニウム塩を使用することが好ましい。   When a basic catalyst is used, it is preferable to use an ammonium salt such as tetramethylammonium hydride or tetraethylammonium hydride.

本発明のシリコーン共重合体は、重量平均分子量(ポリスチレン換算)が500から10,000の範囲にある低分子量のものである。また、分散度は、1.0から10.0の範囲にあるものが好ましく、1.0から2.0の分散度が小さいものが最も好ましい。特に強酸性条件では得られたシリコーン共重合体が低分子量で、低分散になるため、特に好ましい。 Silicone copolymer of the present invention is the weight average molecular weight (polystyrene equivalent) of low molecular weight which is from 5 00 to the range of 10,000. Further, the dispersity is preferably in the range of 1.0 to 10.0, and most preferably in the range of 1.0 to 2.0. The silicone copolymer obtained is particularly preferable under strongly acidic conditions because it has a low molecular weight and low dispersion.

加水分解反応、縮重合反応で得られた反応液をトルエン、酢酸エチル等の非プロトン性溶媒で抽出して水で洗浄後、油層中の溶媒を留去すれば目的のシリコーン共重合体を合成することができる。   Extract the reaction solution obtained by hydrolysis and condensation polymerization with an aprotic solvent such as toluene or ethyl acetate, wash with water, and then evaporate the solvent in the oil layer to synthesize the desired silicone copolymer. can do.

本発明では、下記一般式 In the present invention , the following general formula

Figure 0005115043
Figure 0005115043

(式中、Rは環状スルフィド基、Aは芳香族炭化水素基、Bは芳香族を含まない炭化水素基を示す。a、b、cはモル%を示し、aは1〜50モル%、bは1〜50モル%、cは20〜98%、但しb+cは21以上でa+b+c=100を示す)
で示されるシリコーン共重合体を製造する場合、例えば、下記で示される合成法で合成することができる。
(In the formula, R represents a cyclic sulfide group, A represents an aromatic hydrocarbon group, B represents a hydrocarbon group not containing an aromatic group, a, b, and c represent mol%, a represents 1 to 50 mol%, b is 1 to 50 mol%, c is 20 to 98 %, provided that b + c is 21 or more and a + b + c = 100)
In the case of producing the silicone copolymer represented by, for example, it can be synthesized by the synthesis method shown below.

Figure 0005115043
Figure 0005115043

(式中、Rは環状スルフィド基、Aは芳香族炭化水素基、Bは芳香族を含まない炭化水素基を示す。a、b、cはモル%を示し、aは1〜50モル%、bは1〜50モル%、cは20〜98%、但しb+cは21以上でa+b+c=100を示す。Xは塩素またはアルコキシ基を示し、メトキシ基、エトキシ基、n−プロピル基、イソプロピル基を示す)
ここで、Xは、塩素またはアルコキシ基を示すが、アルコキシ基は、メトキシ基、エトキシ基、n−プロピルオキシ基、n−ブチルオキシ基、イソプロピルオキシ基等が挙げられ、原料入手の容易さから、メトキシ基、エトキシ基が好ましい。
(In the formula, R represents a cyclic sulfide group, A represents an aromatic hydrocarbon group, B represents a hydrocarbon group not containing an aromatic group, a, b, and c represent mol%, a represents 1 to 50 mol%, b is 1 to 50 mol%, c is 20 to 98 %, but b + c is 21 or more and a + b + c = 100, X is chlorine or an alkoxy group, methoxy group, ethoxy group, n-propyl group, isopropyl group is selected. Show)
Here, X represents chlorine or an alkoxy group, and examples of the alkoxy group include a methoxy group, an ethoxy group, an n-propyloxy group, an n-butyloxy group, and an isopropyloxy group. A methoxy group and an ethoxy group are preferable.

このようにして硫黄官能基を有するシリコーン共重合体を合成することができ、200nm以下の露光波長で屈折率を向上させた新規な硫黄官能基を有するシリコーン共重合体が提供される。また、本発明のシリコーン共重合体には、硫黄官能基を有しており、硬化剤と反応させることによりシロキサン膜を形成することができることから、塗料、接着剤用途に展開することができる。   Thus, a silicone copolymer having a sulfur functional group can be synthesized, and a novel silicone copolymer having a sulfur functional group having an improved refractive index at an exposure wavelength of 200 nm or less is provided. Moreover, since the silicone copolymer of this invention has a sulfur functional group and can form a siloxane film by making it react with a hardening | curing agent, it can expand | deploy to a coating material and an adhesive agent use.

以下、実施例を示して本発明を具体的に説明する。   Hereinafter, the present invention will be specifically described with reference to examples.

以下の実施例において、測定には下記装置を使用し、原料は試薬メーカーから購入した一般的な試薬を用いた。   In the following examples, the following apparatus was used for the measurement, and a general reagent purchased from a reagent manufacturer was used as a raw material.

測定装置
NMR測定・・・日本電子製400MHz NMR測定器
IR測定・・・島津製IR Prestige-21
GPC測定・・・東ソー製HLC-8220
屈折率測定・・・J.A.WOOLLAM社製 屈折率測定装置Wvase 32
参考例1
3−メルカプトプロピルシルセスキオキサン・フェニルシルセスキオキサン・メチルシルセスキオキサン共重合体(モル組成比20:10:70)の合成
撹拌機、環流冷却器、滴下ろう斗及び温度計を備えた1L4つ口フラスコに、水47.8gと35%塩酸4.4gを仕込み、3−メルカプトプロピルトリメトキシシラン16.3g(0.083モル)とフェニルトリメトキシシラン5.7g(0.042モル)とメチルトリメトキシシラン39.7g(0.291モル)のトルエン252.2g溶液を反応温度10〜20℃で2時間かけて滴下した。滴下終了後、同温度で2時間熟成後に、反応溶液をGC分析することにより原料がすべて無くなっていることを確認した。次に静置後分液を行い、油層を回収した。次いで5%炭酸水素ナトリウム水溶液で洗浄し、さらに水で洗浄し、最後にトルエン油層を回収した。
measuring device
NMR measurement: JEOL 400MHz NMR measuring instrument
IR measurement ・ ・ ・ IR Prestige-21 made by Shimadzu
GPC measurement: Tosoh HLC-8220
Refractive index measurement ・ ・ ・ JAWOOLLAM Refractive index measuring device Wvase 32
Reference example 1
Synthesis of 3-mercaptopropylsilsesquioxane / phenylsilsesquioxane / methylsilsesquioxane copolymer (molar composition ratio 20:10:70) with stirrer, reflux condenser, dropping funnel and thermometer A 1 L four-necked flask was charged with 47.8 g of water and 4.4 g of 35% hydrochloric acid, and 16.3 g (0.083 mol) of 3-mercaptopropyltrimethoxysilane and 5.7 g of phenyltrimethoxysilane (0.042 mol). ) And 39.7 g (0.291 mol) of methyltrimethoxysilane in 252.2 g of toluene were added dropwise at a reaction temperature of 10 to 20 ° C. over 2 hours. After completion of the dropwise addition, after aging for 2 hours at the same temperature, it was confirmed by GC analysis of the reaction solution that all the raw materials were gone. Next, liquid separation was performed after standing, and an oil layer was recovered. Subsequently, it was washed with a 5% aqueous sodium hydrogen carbonate solution, further washed with water, and finally a toluene oil layer was recovered.

その得られた油層をエバポレーターで溶媒を除去し、白色粉末である3−メルカプトプロピルシルセスキオキサン・フェニルシルセスキオキサン・メチルシルセスキオキサン共重合体(モル組成比20:10:70)を33.8g得た。得られた共重合体のGPC分析の結果、重量平均分子量(Mw:ポリスチレン換算)1,230、分散度(Mw/Mn:ポリスチレン換算)1.4であった。   The solvent was removed from the obtained oil layer with an evaporator, and 3-mercaptopropylsilsesquioxane / phenylsilsesquioxane / methylsilsesquioxane copolymer (molar composition ratio 20:10:70) was a white powder. Of 33.8 g was obtained. As a result of GPC analysis of the obtained copolymer, it was weight average molecular weight (Mw: polystyrene conversion) 1,230 and dispersity (Mw / Mn: polystyrene conversion) 1.4.

得られた共重合体のスペクトルデータを下記に示す。   The spectrum data of the obtained copolymer is shown below.

赤外線吸収スペクトル(IR)データ
2840 cm-1 (-SH)、1030-1120 cm-1(Si-O)
核磁気共鳴スペクトル(NMR)データ(1H-NMR溶媒:DMSO-d6)
0.565-1.021ppm(bs)、1.183-2.505ppm(bs)、7.550-8.615ppm(bs) 。
Infrared absorption spectrum (IR) data
2840 cm -1 (-SH), 1030-1120 cm -1 (Si-O)
Nuclear magnetic resonance spectrum (NMR) data ( 1 H-NMR solvent: DMSO-d6)
0.565-1.021 ppm (bs), 1.183-2.505 ppm (bs), 7.550-8.615 ppm (bs).

参考例2
3−メルカプトプロピルシルセスキオキサン・フェニルシルセスキオキサン・メチルシルセスキオキサン共重合体(モル組成比40:10:50)の合成
撹拌機、環流冷却器、滴下ろう斗及び温度計を備えた1L4つ口フラスコに、水47.8gと35%塩酸4.4gを仕込み、3−メルカプトプロピルトリメトキシシラン32.7g(0.166モル)とフェニルトリメトキシシラン5.7g(0.042モル)とメチルトリメトキシシラン28.3g(0.208モル)のトルエン252.2g溶液を反応温度10〜20℃で2時間かけて滴下し参考例1記載の方法で抽出しトルエン油層を回収した。
Reference example 2
Synthesis of 3-mercaptopropylsilsesquioxane / phenylsilsesquioxane / methylsilsesquioxane copolymer (molar composition ratio 40:10:50) Equipped with stirrer, reflux condenser, dropping funnel and thermometer In addition, 47.8 g of water and 4.4 g of 35% hydrochloric acid were charged into a 1 L four-necked flask, and 32.7 g (0.166 mol) of 3-mercaptopropyltrimethoxysilane and 5.7 g of phenyltrimethoxysilane (0.042 mol) were added. And a solution of 28.3 g (0.208 mol) of methyltrimethoxysilane in 252.2 g of toluene at a reaction temperature of 10 to 20 ° C. were added dropwise over 2 hours and extracted by the method described in Reference Example 1 to recover a toluene oil layer.

その得られた油層をエバポレーターで溶媒を除去し、白色粉末である3−メルカプトプロピルシルセスキオキサン・フェニルシルセスキオキサン・メチルシルセスキオキサン共重合体(モル組成比40:10:50)を42.7g得た。得られた共重合体のGPC分析の結果、重量平均分子量(Mw:ポリスチレン換算)1,210、分散度(Mw/Mn:ポリスチレン換算)1.4であった。   The solvent was removed from the obtained oil layer with an evaporator, and 3-mercaptopropylsilsesquioxane / phenylsilsesquioxane / methylsilsesquioxane copolymer (molar composition ratio 40:10:50) was a white powder. 42.7g of was obtained. As a result of GPC analysis of the obtained copolymer, the weight average molecular weight (Mw: polystyrene conversion) was 1,210, and the dispersity (Mw / Mn: polystyrene conversion) was 1.4.

得られた共重合体のスペクトルデータを下記に示す。   The spectrum data of the obtained copolymer is shown below.

赤外線吸収スペクトル(IR)データ
2840 cm-1 (-SH)、1026-1111 cm-1(Si-O)
核磁気共鳴スペクトル(NMR)データ(1H-NMR溶媒:DMSO-d6)
0.560-1.035ppm(bs)、1.181-2.550ppm(bs)、7.021-8.252ppm(b) 。
Infrared absorption spectrum (IR) data
2840 cm -1 (-SH), 1026-1111 cm -1 (Si-O)
Nuclear magnetic resonance spectrum (NMR) data ( 1 H-NMR solvent: DMSO-d6)
0.560-1.035ppm (bs), 1.181-2.550ppm (bs), 7.021-8.252ppm (b).

参考例3
メルカプトメチルシルセスキオキサン・フェニルシルセスキオキサン・メチルシルセスキオキサン共重合体(モル組成比40:10:50)の合成
撹拌機、環流冷却器、滴下ろう斗及び温度計を備えた200mL4つ口フラスコに、水15.7gと35%塩酸1.47gを仕込み、メルカプトメチルトリメトキシシラン9.50g(0.056モル)とフェニルトリメトキシシラン2.80g(0.014モル)とメチルトリメトキシシラン9.61g(0.071モル)のトルエン32.9g溶液を反応温度10〜20℃で2時間かけて滴下し参考例1記載の方法で抽出しトルエン油層を回収した。
Reference example 3
Synthesis of mercaptomethylsilsesquioxane / phenylsilsesquioxane / methylsilsesquioxane copolymer (molar composition ratio 40:10:50) 200 mL 4 equipped with stirrer, reflux condenser, dropping funnel and thermometer A 1-neck flask was charged with 15.7 g of water and 1.47 g of 35% hydrochloric acid, 9.50 g (0.056 mol) of mercaptomethyltrimethoxysilane, 2.80 g (0.014 mol) of phenyltrimethoxysilane and methyltrimethylsilane. A solution of 9.61 g (0.071 mol) of methoxysilane in 32.9 g of toluene was added dropwise at a reaction temperature of 10 to 20 ° C. over 2 hours, followed by extraction by the method described in Reference Example 1 to recover a toluene oil layer.

その得られた油層をエバポレーターで溶媒を除去し、無色粘性液体である3−メルカプトメチルシルセスキオキサン・フェニルシルセスキオキサン・メチルシルセスキオキサン共重合体(モル組成比40:10:50)を11.7g得た。得られた共重合体のGPC分析の結果、重量平均分子量(Mw:ポリスチレン換算)1,190、分散度(Mw/Mn:ポリスチレン換算)1.4であった。   The solvent was removed from the obtained oil layer with an evaporator, and a 3-mercaptomethylsilsesquioxane / phenylsilsesquioxane / methylsilsesquioxane copolymer (molar composition ratio 40:10:50) was a colorless viscous liquid. 11.7 g) was obtained. As a result of GPC analysis of the obtained copolymer, it was 1,190 in weight average molecular weight (Mw: polystyrene conversion) and dispersity (Mw / Mn: polystyrene conversion) 1.4.

得られた共重合体のスペクトルデータを下記に示す。   The spectrum data of the obtained copolymer is shown below.

赤外線吸収スペクトル(IR)データ
2565 cm-1 (-SH)、1042-1271 cm-1(Si-O)
核磁気共鳴スペクトル(NMR)データ(1H-NMR溶媒:DMSO-d6)
0.561ppm(bs)、7.545-8.610ppm(bs) 。
Infrared absorption spectrum (IR) data
2565 cm -1 (-SH), 1042-1271 cm -1 (Si-O)
Nuclear magnetic resonance spectrum (NMR) data ( 1 H-NMR solvent: DMSO-d6)
0.561 ppm (bs), 7.545-8.610 ppm (bs).

実施例
2−チエニルシルセスキオキサン・フェニルシルセスキオキサン・メチルシルセスキオキサン共重合体(モル組成比40:10:50)の合成
撹拌機、環流冷却器、滴下ろう斗及び温度計を備えた200mL4つ口フラスコに、水10.8gと35%塩酸1.01gを仕込み、2−チエニルトリエトキシシラン9.76g(0.039モル)とフェニルトリメトキシシラン1.92g(0.010モル)とメチルトリメトキシシラン6.57g(0.048モル)のトルエン27.0g溶液を反応温度10〜20℃で2時間かけて滴下し参考例1記載の方法で抽出しトルエン油層を回収した。
Example 1
Synthesis of 2-thienylsilsesquioxane / phenylsilsesquioxane / methylsilsesquioxane copolymer (molar composition ratio 40:10:50) equipped with stirrer, reflux condenser, dropping funnel and thermometer A 200 mL four-necked flask was charged with 10.8 g of water and 1.01 g of 35% hydrochloric acid, and 9.76 g (0.039 mol) of 2-thienyltriethoxysilane and 1.92 g (0.010 mol) of phenyltrimethoxysilane, A solution of methyltrimethoxysilane (6.57 g, 0.048 mol) in toluene (27.0 g) was added dropwise at a reaction temperature of 10 to 20 ° C. over 2 hours, followed by extraction by the method described in Reference Example 1 to recover a toluene oil layer.

その得られた油層をエバポレーターで溶媒を除去し、無色粘性液体である3−メルカプトメチルシルセスキオキサン・フェニルシルセスキオキサン・メチルシルセスキオキサン共重合体(モル組成比40:10:50)を9.54g得た。得られた共重合体のGPC分析の結果、重量平均分子量(Mw:ポリスチレン換算)1,100、分散度(Mw/Mn:ポリスチレン換算)1.2であった。   The solvent was removed from the obtained oil layer with an evaporator, and a 3-mercaptomethylsilsesquioxane / phenylsilsesquioxane / methylsilsesquioxane copolymer (molar composition ratio 40:10:50) was a colorless viscous liquid. ) Was obtained. As a result of GPC analysis of the obtained copolymer, the weight average molecular weight (Mw: converted to polystyrene) was 1,100, and the dispersity (Mw / Mn: converted to polystyrene) was 1.2.

得られた共重合体のスペクトルデータを下記に示す。   The spectrum data of the obtained copolymer is shown below.

赤外線吸収スペクトル(IR)データ
1026-1269 cm-1 (Si-O)
核磁気共鳴スペクトル(NMR)データ(1H-NMR溶媒:DMSO-d6)
0.175ppm(bs)、6.995-7.1282ppm(bs)、7.551-8.612ppm(bs) 。
Infrared absorption spectrum (IR) data
1026-1269 cm -1 (Si-O)
Nuclear magnetic resonance spectrum (NMR) data ( 1 H-NMR solvent: DMSO-d6)
0.175 ppm (bs), 6.975-7.1282 ppm (bs), 7.551-8.612 ppm (bs).

比較例1
フェニルシルセスキオキサン・メチルシルセスキオキサン共重合体(モル組成比10:90)の合成
撹拌機、環流冷却器、滴下ろう斗及び温度計を備えた1L4つ口フラスコに、水57.8gと35%塩酸水溶液5.2gを仕込み、フェニルトリメトキシシラン10.0g(0.050モル)とメチルトリメトキシシラン61.8g(0.454モル)のトルエン107.8g溶液を反応温度10〜20℃で滴下し実施例1記載の方法で抽出しトルエン油層を回収した。
Comparative Example 1
Synthesis of phenylsilsesquioxane / methylsilsesquioxane copolymer (molar composition ratio 10:90) Into a 1 L four-necked flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer, 57.8 g of water And 5.2 g of 35% hydrochloric acid aqueous solution were charged, and 107.8 g of toluene of 10.0 g (0.050 mol) of phenyltrimethoxysilane and 61.8 g (0.454 mol) of methyltrimethoxysilane was added at a reaction temperature of 10-20. It was dropped at 0 ° C. and extracted by the method described in Example 1, and a toluene oil layer was recovered.

その得られた油層をエバポレーターで溶媒を除去し、白色粉末である1−ナフチルシルセスキオキサン・メチルシルセスキオキサン共重合体を35.7g得た。GPC分析の結果、重量平均分子量(Mw:ポリスチレン換算)1,900、分散度(Mw/Mn:ポリスチレン換算)2.0であった。   The solvent was removed from the obtained oil layer with an evaporator to obtain 35.7 g of 1-naphthylsilsesquioxane / methylsilsesquioxane copolymer as white powder. As a result of GPC analysis, the weight average molecular weight (Mw: converted to polystyrene) was 1,900, and the dispersity (Mw / Mn: converted to polystyrene) was 2.0.

得られた共重合体のスペクトルデータを下記に示す。   The spectrum data of the obtained copolymer is shown below.

赤外線吸収スペクトル(IR)データ
1018-1196cm-1(Si-O)
核磁気共鳴スペクトル(NMR)データ(1H-NMR溶媒:CDCl3
0.135ppm(bs)、7.210-8.194ppm(b) 。
Infrared absorption spectrum (IR) data
1018-1196cm -1 (Si-O)
Nuclear magnetic resonance spectrum (NMR) data ( 1 H-NMR solvent: CDCl 3 )
0.135 ppm (bs), 7.210-8.194 ppm (b).

実施例1、参考例1〜3と比較例1で合成したシリコーン共重合体をPGMEA(プロピレングリコールモノエチルエーテルアセテート)に溶解させて20%溶液にした。次にシリコンウェハーにスピンコーターで塗布しオーブンで250℃まで昇温させて0.5ミクロンの硬化膜を形成した。その膜の193nm波長での屈折率を測定した結果を表1に示す。193nm遠紫外線の代表的な波長である。シリコーン共重合体に硫黄原子を導入することにより、屈折率を向上させることができる。 Example 1 The silicone copolymer synthesized in Reference Examples 1 to 3 and Comparative Example 1 was dissolved in PGMEA (propylene glycol monoethyl ether acetate) to form a 20% solution. Next, it was applied to a silicon wafer with a spin coater and heated to 250 ° C. in an oven to form a 0.5 micron cured film. The results of measuring the refractive index of the film at a wavelength of 193 nm are shown in Table 1. This is a typical wavelength of 193 nm deep ultraviolet light. The refractive index can be improved by introducing sulfur atoms into the silicone copolymer.

Figure 0005115043
Figure 0005115043

表1から、比較例1の硫黄原子が入っていないシリコーン共重合体では屈折率が1.69であったのに対し、硫黄原子を導入した実施例1、参考例1〜3では屈折率が1.75以上に向上した。 From Table 1, the refractive index of the silicone copolymer containing no sulfur atom in Comparative Example 1 was 1.69, whereas in Example 1 and Reference Examples 1 to 3 in which a sulfur atom was introduced, the refractive index was 1. It improved to 1.75 or more.

参考例4
3−メルカプトプロピルシルセスキオキサン・1−ナフチルシルセスキオキサン・メチルシルセスキオキサン共重合体(モル組成比20:50:30)
撹拌機、環流冷却器、滴下ろう斗及び温度計を備えた1L4つ口フラスコに、水22.8gと35%塩酸2.1gを仕込み、3−メルカプトプロピルトリメトキシシラン7.8g(0.040モル)と1−ナフチルトリメトキシシラン24.6g(0.099モル)とメチルトリメトキシシラン8.1g(0.059モル)のトルエン61.3g溶液を反応温度10〜20℃で2時間かけて滴下し参考例1記載の方法で抽出しトルエン油層を回収した。
Reference example 4
3-mercaptopropylsilsesquioxane / 1-naphthylsilsesquioxane / methylsilsesquioxane copolymer (molar composition ratio 20:50:30)
A 1 L four-necked flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer was charged with 22.8 g of water and 2.1 g of 35% hydrochloric acid, and 7.8 g of 3-mercaptopropyltrimethoxysilane (0.040 g). Mol), 24.6 g (0.099 mol) of 1-naphthyltrimethoxysilane and 8.1 g (0.059 mol) of methyltrimethoxysilane in a solution of 61.3 g of toluene at a reaction temperature of 10 to 20 ° C. over 2 hours. The toluene oil layer was recovered by dropping and extracting by the method described in Reference Example 1.

その得られた油層をエバポレーターで溶媒を除去し、白色粉末である3−メルカプトプロピルシルセスキオキサン・1−ナフチルシルセスキオキサン・メチルシルセスキオキサン共重合体(モル組成比20:50:30)を30.3g得た。得られた共重合体のGPC分析の結果、重量平均分子量(Mw:ポリスチレン換算)750、分散度(Mw/Mn:ポリスチレン換算)1.2であった。   The solvent was removed from the obtained oil layer with an evaporator, and 3-mercaptopropylsilsesquioxane / 1-naphthylsilsesquioxane / methylsilsesquioxane copolymer (molar composition ratio 20:50: white powder) was obtained. 30) 30.3g was obtained. As a result of GPC analysis of the obtained copolymer, the weight average molecular weight (Mw: polystyrene conversion) was 750, and the dispersity (Mw / Mn: polystyrene conversion) was 1.2.

得られた共重合体のスペクトルデータを下記に示す。   The spectrum data of the obtained copolymer is shown below.

赤外線吸収スペクトル(IR)データ
2845 cm-1 (-SH)、3055、1504 cm-1 (ナフタレン)、1028-1115 cm-1 (Si-O)
核磁気共鳴スペクトル(NMR)データ(1H-NMR溶媒:DMSO-d6)
0.561-1.025ppm(bs)、1.183-2.500ppm(bs)、6.697-8.315ppm(bs) 。
Infrared absorption spectrum (IR) data
2845 cm -1 (-SH), 3055, 1504 cm -1 (naphthalene), 1028-1115 cm -1 (Si-O)
Nuclear magnetic resonance spectrum (NMR) data ( 1 H-NMR solvent: DMSO-d6)
0.561-1.025ppm (bs), 1.183-2.500ppm (bs), 6.697-8.315ppm (bs).

比較例2
1−ナフチルシルセスキオキサン・メチルシルセスキオキサン共重合体(モル組成比50:50)の合成
撹拌機、環流冷却器、滴下ろう斗及び温度計を備えた3L4つ口フラスコに、水265.8gと35%塩酸水溶液24.9gを仕込み、1−ナフチルトリメトキシシラン297.0g(1.196モル)とメチルトリメトキシシラン162.9g(1.196モル)のトルエン689.9g溶液を反応温度10〜20℃で滴下し実施例1記載の方法で抽出しトルエン油層を回収した。
Comparative Example 2
Synthesis of 1-naphthylsilsesquioxane / methylsilsesquioxane copolymer (molar composition ratio: 50:50) 8 g and 24.9 g of 35% hydrochloric acid aqueous solution were charged, and a solution of 299.9 g (1.196 mol) of 1-naphthyltrimethoxysilane and 682.9 g of toluene of 162.9 g (1.196 mol) of methyltrimethoxysilane was reacted. It dripped at the temperature of 10-20 degreeC, and extracted by the method of Example 1, and collect | recovered toluene oil layers.

その得られた油層をエバポレーターで溶媒を除去し、白色粉末である1−ナフチルシルセスキオキサン・メチルシルセスキオキサン共重合体を320.0g得た。GPC分析の結果、重量平均分子量(Mw:ポリスチレン換算)820、分散度(Mw/Mn:ポリスチレン換算)1.2であった。   The solvent was removed from the obtained oil layer with an evaporator to obtain 320.0 g of 1-naphthylsilsesquioxane / methylsilsesquioxane copolymer as white powder. As a result of GPC analysis, it was a weight average molecular weight (Mw: converted to polystyrene) 820 and a dispersity (Mw / Mn: converted to polystyrene) 1.2.

得られた共重合体のスペクトルデータを下記に示す。   The spectrum data of the obtained copolymer is shown below.

赤外線吸収スペクトル(IR)データ
3055、1504 cm-1 (ナフタレン)、1026-1111 cm-1 (Si-O)
核磁気共鳴スペクトル(NMR)データ(1H-NMR溶媒:CDCl3
0.182ppm(bs)、7.021-8.252ppm(b)
実施例5と比較例2で合成したナフタレン骨格を有するシリコーン共重合体をPGMEA(プロピレングリコールモノエチルエーテルアセテート)に溶解させて20%溶液にした。次にシリコンウェハーにスピンコーターで塗布しオーブンで250℃まで昇温させて0.5ミクロンの硬化膜を形成した。その膜の193nm波長での屈折率を測定した結果を表2に示す。193nm遠紫外線の代表的な波長である。
Infrared absorption spectrum (IR) data
3055, 1504 cm -1 (naphthalene), 1026-1111 cm -1 (Si-O)
Nuclear magnetic resonance spectrum (NMR) data ( 1 H-NMR solvent: CDCl 3 )
0.182ppm (bs), 7.021-8.252ppm (b)
The silicone copolymer having a naphthalene skeleton synthesized in Example 5 and Comparative Example 2 was dissolved in PGMEA (propylene glycol monoethyl ether acetate) to form a 20% solution. Next, it was applied to a silicon wafer with a spin coater and heated to 250 ° C. in an oven to form a 0.5 micron cured film. The results of measuring the refractive index of the film at a wavelength of 193 nm are shown in Table 2. This is a typical wavelength of 193 nm deep ultraviolet light.

Figure 0005115043
Figure 0005115043

比較例2のナフタレン骨格を有するシリコーン共重合体では、屈折率が1.50であったのに対し、硫黄原子を導入した参考例4のシリコーン共重合体では屈折率が1.57に向上した。シリコーン共重合体に硫黄原子を導入することにより、屈折率を向上させることができる。 The silicone copolymer having a naphthalene skeleton of Comparative Example 2 had a refractive index of 1.50, whereas the silicone copolymer of Reference Example 4 into which sulfur atoms were introduced improved the refractive index to 1.57. . The refractive index can be improved by introducing sulfur atoms into the silicone copolymer.

Claims (6)

下記一般式
Figure 0005115043
(式中、Rは環状スルフィド基、Aは芳香族環を有する炭化水素基、Bは芳香族を含まない炭化水素基を示す。a、b、cはモル%を示し、aは1〜50モル%、bは1〜50モル%、cは20〜98%、但しb+cは21以上でa+b+c=100を示す)
で示され、重量平均分子量(ポリスチレン換算)が、500から10,000であるシリコーン共重合体。
The following general formula
Figure 0005115043
(In the formula, R represents a cyclic sulfide group, A represents a hydrocarbon group having an aromatic ring, B represents a hydrocarbon group not containing an aromatic group, a, b and c represent mol%, and a represents 1 to 50) Mol%, b is 1 to 50 mol%, c is 20 to 98 %, provided that b + c is 21 or more and a + b + c = 100)
A silicone copolymer having a weight average molecular weight (in terms of polystyrene) of 500 to 10,000.
Rが
Figure 0005115043
のいずれかである請求項1に記載のシリコーン共重合体。
R is
Figure 0005115043
The silicone copolymer according to claim 1, which is any one of the following.
Aがフェニル基である請求項1または2に記載のシリコーン共重合体。 The silicone copolymer according to claim 1 or 2, wherein A is a phenyl group. Bがメチル基である請求項1〜3のいずれかに記載のシリコーン共重合体。 B is a methyl group, The silicone copolymer in any one of Claims 1-3. 置換基R(Rは環状スルフィド基)、A(Aは芳香族炭化水素基)、B(Bは芳香族を含まない炭化水素基)を有するシリコンモノマーを、酸性条件下、加水分解して製造する請求項1に記載のシリコーン共重合体の製造方法。 Manufactured by hydrolyzing a silicon monomer having a substituent R (R is a cyclic sulfide group), A (A is an aromatic hydrocarbon group), B (B is a hydrocarbon group not containing an aromatic group) under acidic conditions The method for producing a silicone copolymer according to claim 1. 環状スルフィド基が
Figure 0005115043
のいずれかである請求項5に記載のシリコーン共重合体の製造方法。
Cyclic sulfide group
Figure 0005115043
The method for producing a silicone copolymer according to claim 5, wherein:
JP2007156166A 2007-06-13 2007-06-13 Silicone copolymer having sulfur functional group and method for producing the same Expired - Fee Related JP5115043B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007156166A JP5115043B2 (en) 2007-06-13 2007-06-13 Silicone copolymer having sulfur functional group and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007156166A JP5115043B2 (en) 2007-06-13 2007-06-13 Silicone copolymer having sulfur functional group and method for producing the same

Publications (2)

Publication Number Publication Date
JP2008308541A JP2008308541A (en) 2008-12-25
JP5115043B2 true JP5115043B2 (en) 2013-01-09

Family

ID=40236437

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007156166A Expired - Fee Related JP5115043B2 (en) 2007-06-13 2007-06-13 Silicone copolymer having sulfur functional group and method for producing the same

Country Status (1)

Country Link
JP (1) JP5115043B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011062142A1 (en) * 2009-11-18 2011-05-26 日産化学工業株式会社 Sulfur-containing silsesquioxane fine particles and process for preparation thereof
WO2015041343A1 (en) * 2013-09-20 2015-03-26 リンテック株式会社 Curable composition, cured product, and method for using curable composition
WO2015041340A1 (en) * 2013-09-20 2015-03-26 リンテック株式会社 Silane compound polymer, curable composition, cured product, and method for using cured composition
CN113227214A (en) * 2018-12-27 2021-08-06 日产化学株式会社 Film-forming composition
WO2025182955A1 (en) * 2024-02-29 2025-09-04 信越化学工業株式会社 Organopolysiloxane, rubber composition, and tire

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06306173A (en) * 1993-04-26 1994-11-01 Showa Denko Kk Reactive polyoganosiloxane
EP0700951B1 (en) * 1994-09-08 2000-12-27 Showa Denko Kabushiki Kaisha Polyorganosiloxane and process for producing the same
JPH08134219A (en) * 1994-11-02 1996-05-28 Shin Etsu Chem Co Ltd Organopolysiloxane containing mercapto group and hydrolyzable group and method for producing the same
DE10132941A1 (en) * 2001-07-06 2003-01-23 Degussa Oligomeric organosilanes, process for their preparation and their use

Also Published As

Publication number Publication date
JP2008308541A (en) 2008-12-25

Similar Documents

Publication Publication Date Title
US7833696B2 (en) Method for forming anti-reflective coating
JP7510060B2 (en) Resin composition, photosensitive resin composition, cured film, method for producing cured film, patterned cured film, and method for producing patterned cured film
JP5296297B2 (en) Silicone copolymer having condensed polycyclic hydrocarbon group and process for producing the same
AU2016232011A1 (en) Novel siloxane polymer compositions and their use
JP2011510133A (en) Silsesquioxane resin
JP5115043B2 (en) Silicone copolymer having sulfur functional group and method for producing the same
US9068086B2 (en) Compositions for antireflective coatings
TW201527890A (en) Positive photosensitive resin composition, method for producing film using the same, and electronic component
TWI460232B (en) Silsesquioxane resins
KR101589165B1 (en) Silane composition and cured film thereof, and method for forming negative resist pattern using same
JPH05125187A (en) Polyorganosilsesquioxane and its production
US20160311975A1 (en) Polymer for Preparing Resist Underlayer Film, Resist Underlayer Film Composition Containing the Polymer and Method for Forming Resist Underlayer Film Using the Composition
JP5158594B2 (en) Silicone polymer having naphthalene ring and composition thereof
JP5035770B2 (en) Silicone copolymer having condensed polycyclic hydrocarbon group and method for producing the same
TWI498381B (en) Polyxanthoxy resin for optical material formation and optical material
JP2014101425A (en) Cage silsesquioxane, crosslinked cage silsesquioxane, and optical element having the same
JP4466855B2 (en) Positive resist composition
JP5115099B2 (en) Silicone copolymer having acyloxy group and method for producing the same
WO2021187324A1 (en) Negative photosensitive resin composition, pattern structure and method for producing patterned cured film
JP5854385B2 (en) Silicone polymer
JP5167609B2 (en) Silicone copolymer having oxetanyl group
JP7620218B2 (en) Silicon compound, reactive material, resin composition, photosensitive resin composition, cured film, method for producing cured film, patterned cured film, and method for producing patterned cured film
KR20140122247A (en) Silicon-rich antireflective coating materials and method of making same
TW201630981A (en) Silicone copolymer and method for producing same
JP7773826B1 (en) Organopolysiloxane, optical component, electronic component, and method for producing organopolysiloxane

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100209

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20100303

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20100303

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120410

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120417

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20120522

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20120522

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120606

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120626

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120817

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120911

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20121001

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 5115043

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20151026

Year of fee payment: 3

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees