JP5125994B2 - Germanium curved spectroscopic element - Google Patents
Germanium curved spectroscopic element Download PDFInfo
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Description
本発明は、X線反射やX線分光に用いるゲルマニウム湾曲分光素子に関する。 The present invention relates to a germanium curved spectroscopic element used for X-ray reflection and X-ray spectroscopy.
従来、X線の集光や分光のためにゲルマニウム単結晶を素材とする湾曲分光素子が用いられている。湾曲分光素子を用いることで、所定の広がりを持って入射してきたX線を湾曲した結晶表面でブラッグ反射させて所定の位置に集光させ、または所定の波長のX線のみを取り出すことができる。 Conventionally, curved spectroscopic elements made of germanium single crystals are used for X-ray focusing and spectroscopy. By using a curved spectroscopic element, X-rays incident with a predetermined spread can be Bragg-reflected by a curved crystal surface and condensed at a predetermined position, or only X-rays with a predetermined wavelength can be extracted. .
一般的なヨハンタイプのゲルマニウム湾曲分光素子は以下のようにして加工される。まず、単結晶ゲルマニウムの平板を、X線反射面として作用する結晶格子面と結晶表面とが平行である薄い平板に加工する。次に、所望の曲率半径に湾曲した湾曲面を有するアルミニウム製基板を作成する。前記の単結晶ゲルマニウムの薄板に上方から圧力をかけ、アルミニウム製基板の湾曲面に沿わせるように接着剤で貼り付ける。基板及び基板に貼りつけられて湾曲したゲルマニウム板をフッ酸で化学エッチングする。以上により、滑らかな湾曲結晶面を有する湾曲結晶分光素子が得られる A general Johann-type germanium curved spectroscopic element is processed as follows. First, a single crystal germanium flat plate is processed into a thin flat plate in which the crystal lattice plane acting as an X-ray reflecting surface and the crystal surface are parallel. Next, an aluminum substrate having a curved surface curved to a desired radius of curvature is created. A pressure is applied from above to the single crystal germanium thin plate, and it is attached with an adhesive so as to follow the curved surface of the aluminum substrate. The substrate and the curved germanium plate attached to the substrate are chemically etched with hydrofluoric acid. Thus, a curved crystal spectroscopic element having a smooth curved crystal plane can be obtained.
化学エッチングの方法の一つに液体によるウエットエッチング法がある。中でもエッチング液を満たした容器内に目的物を浸けるディップ式は、生産コスト及び生産効率の点から湾曲分光素子の製造方法として広く用いられている。 One of the chemical etching methods is a wet etching method using a liquid. Among them, the dip method in which the object is immersed in a container filled with an etching solution is widely used as a method for manufacturing a curved spectroscopic element from the viewpoint of production cost and production efficiency.
ディップ式ではゲルマニウム湾曲分光素子のみならず、その基板も共にエッチング液に浸けられる。これにより、湾曲結晶表面に割れが多く発生する結果となる。これは、エッチングの際、化学反応により少なくとも20℃以上の急激な温度上昇が生じることによると考えられる。基板の素材であるアルミニウムとゲルマニウム単結晶の線膨張係数は大きく異なるため、急激な温度変化に伴ってゲルマニウム湾曲結晶に応力が生じるからである。 In the dip type, not only the germanium curved spectroscopic element but also its substrate are both immersed in the etching solution. This results in many cracks occurring on the curved crystal surface. This is considered to be due to a rapid temperature increase of at least 20 ° C. or more due to a chemical reaction during etching. This is because, since the linear expansion coefficients of aluminum and germanium single crystal, which are the materials of the substrate, are greatly different, stress is generated in the germanium curved crystal with a rapid temperature change.
結晶表面に生じた割れの部分はX線の反射に寄与しない。また、アルミニウム製基板との間に存する接着層の剥離が発生すれば、X線反射面が所定の曲率半径の湾曲面を構成しなくなるため、結晶の非接着領域全体がその機能を果たさなくなる。 The cracked portion generated on the crystal surface does not contribute to the reflection of X-rays. In addition, if the adhesive layer existing between the aluminum substrate is peeled off, the X-ray reflecting surface does not form a curved surface having a predetermined radius of curvature, so that the entire non-bonded region of the crystal does not perform its function.
本発明は上記のような課題に鑑みてなされたものであり、その目的とするところは、湾曲面に割れの生じないゲルマニウム湾曲分光素子を得ることにある。 The present invention has been made in view of the above problems, and an object of the present invention is to obtain a germanium curved spectroscopic element in which a curved surface is not cracked.
上記課題を解決するために成された本発明に係る湾曲分光素子は、
a)円筒状湾曲面を有する基板と、
b)前記基板の湾曲面に貼り付けられた単結晶ゲルマニウムからなる湾曲結晶と、
から構成される湾曲分光素子であって、
前記基板はゲルマニウムからなることを特徴とする。
In order to solve the above problems, the curved spectroscopic element according to the present invention is:
a) a substrate having a cylindrical curved surface;
b) a curved crystal made of single crystal germanium attached to the curved surface of the substrate;
A curved spectroscopic element comprising:
The substrate is made of germanium.
本発明に係る湾曲分光素子では、湾曲結晶部分と基板部分の線膨張係数が同一又は殆ど差がないため、化学エッチング処理を行っても湾曲表面に割れの生じないゲルマニウム湾曲分光素子を得ることができる。 In the curved spectroscopic element according to the present invention, since the linear expansion coefficients of the curved crystal part and the substrate part are the same or almost different, it is possible to obtain a germanium curved spectroscopic element that does not cause a crack on the curved surface even when chemical etching is performed. it can.
以下、本発明の実施例について図１〜３を用いて説明する。 Examples of the present invention will be described below with reference to FIGS.
図１〜３は、本発明の実施例によるヨハンタイプ湾曲結晶分光素子及びその構成部を示す模式図である。本実施例の湾曲分光素子１５は単結晶ゲルマニウムの薄板１２を単結晶ゲルマニウムの基板１３の湾曲面１４に貼り付けた構成をとる（図３）。以下、本実施例のヨハンタイプ湾曲分光素子の製造過程について説明する。 1 to 3 are schematic views showing a Johann type curved crystal spectroscopic element and its components according to an embodiment of the present invention. The curved spectroscopic element 15 of the present embodiment has a configuration in which a single crystal germanium thin plate 12 is attached to a curved surface 14 of a single crystal germanium substrate 13 (FIG. 3). Hereinafter, the manufacturing process of the Johann type curved spectroscopic element of this embodiment will be described.
まず、図１(a)に示す単結晶ゲルマニウムの平板１１を、X線反射面として作用する結晶格子面１５と結晶表面とが平行である薄い平板に加工する（工程１）。図１(b)は加工された薄板１２を示す。ここでは長さ25mm、幅16mm、厚さ0.2mmの薄板として加工された例で説明を行う。次に、曲率半径200mmの湾曲面１４を有する多結晶ゲルマニウムの基板１３を作成する（工程２、図２）。この加工は通常研磨によって行われる。工程１を経て得られた単結晶ゲルマニウムの薄板１２に圧力をかけて、多結晶ゲルマニウムの基板１３の湾曲面１４に接着剤で貼り付ける（工程３、図３）。
First, the single crystal germanium flat plate 11 shown in FIG. 1A is processed into a thin flat plate in which the crystal lattice plane 15 acting as an X-ray reflecting surface and the crystal surface are parallel (step 1). FIG. 1B shows the processed thin plate 12. Here, an example in which a thin plate having a length of 25 mm, a width of 16 mm, and a thickness of 0.2 mm is processed will be described. Next, a polycrystalline germanium substrate 13 having a curved surface 14 with a curvature radius of 200 mm is formed (
このようにして製造された湾曲分光素子１５をフッ酸溶液中に浸けてエッチングを行い、表面を滑らかに加工する（工程４）。 The curved spectroscopic element 15 thus manufactured is immersed in a hydrofluoric acid solution and etched to process the surface smoothly (step 4).
工程３で、単結晶ゲルマニウムの薄板に圧力をかけて湾曲させるのは、ゲルマニウム結晶の結晶格子面を保持するためである。X線は結晶格子面で反射されるので、研磨などの方法で湾曲面を作成すると、結晶格子面が保持できずX線の反射性能が低下する。従って、ヨハンタイプの湾曲結晶では研磨せずに湾曲面を作成している。一方、工程２で研磨によって湾曲面１４を作成するのは、該湾曲面は薄板２の貼り付け面として機能するに過ぎず、結晶格子面を保つ必要がないからである。
In
本実施例では基板の素材として多結晶ゲルマニウムを用いた。多結晶ゲルマニウムの線膨張係数は5.7×10-6/℃であり、単結晶ゲルマニウムの線膨張係数6.1×10-6/℃との差は4×10-7/℃である。一方、従来の基板に用いられているアルミニウムの線膨張係数は2.3×10-5/℃であり、単結晶ゲルマニウムの線膨張係数との差は1.7×10-5/℃である。 In this embodiment, polycrystalline germanium is used as the material for the substrate. The linear expansion coefficient of polycrystalline germanium is 5.7 × 10 −6 / ° C., and the difference from the linear expansion coefficient of single crystal germanium 6.1 × 10 −6 / ° C. is 4 × 10 −7 / ° C. On the other hand, the linear expansion coefficient of aluminum used in the conventional substrate is 2.3 × 10 −5 / ° C., and the difference from the linear expansion coefficient of single crystal germanium is 1.7 × 10 −5 / ° C.
このため、本実施例の分光素子１５をエッチングすることによって20℃の急激な温度上昇が起こったとしても、基板１３と薄板１２の伸長の差は、長さ方向で0.2μmにしかならない。一方、多結晶ゲルマニウムに代えて、従来通りアルミニウムを用いた場合の伸長差は8.5μmである。 For this reason, even if a rapid temperature rise of 20 ° C. occurs by etching the spectroscopic element 15 of this embodiment, the difference in elongation between the substrate 13 and the thin plate 12 is only 0.2 μm in the length direction. On the other hand, in place of polycrystalline germanium, the elongation difference when aluminum is used as usual is 8.5 μm.
このように、基板の素材として多結晶ゲルマニウムを用いた場合のエッチング時の伸長差は、アルミニウムを用いたときの伸長差よりも著しく小さい。このため、割れが生じる可能性は著しく低いといえる。 As described above, the difference in elongation at the time of etching when polycrystalline germanium is used as the material for the substrate is significantly smaller than the difference in elongation at the time of using aluminum. For this reason, it can be said that the possibility of cracking is extremely low.
また、本実施例の基板の素材である多結晶ゲルマニウムは劈開性がないので加工が容易であり、工程２の研磨過程を容易になし得る。
In addition, since polycrystalline germanium, which is the material of the substrate of this embodiment, has no cleavage property, it can be easily processed, and the polishing process in
上記実施例では、基板の素材として多結晶ゲルマニウムを用いて説明を行ったが、多結晶ゲルマニウムの代わりに単結晶ゲルマニウムを用いることも可能である。単結晶ゲルマニウムは劈開性を有するため、多結晶ゲルマニウムと比較すると加工が容易ではない。しかし、湾曲結晶と同一素材であることから、エッチング加工により温度上昇が生じたとしても同一の伸張が発生するに過ぎず、湾曲分光素子１５に割れが生じることはない。 In the above embodiment, description has been made using polycrystalline germanium as the material of the substrate, but it is also possible to use single crystal germanium instead of polycrystalline germanium. Since single crystal germanium has a cleavage property, it is not easy to process as compared with polycrystalline germanium. However, since it is the same material as the curved crystal, even if the temperature rises due to the etching process, only the same elongation occurs and the curved spectroscopic element 15 is not cracked.
以上の実施例ではヨハンタイプの湾曲分光素子として説明を行ったが、本発明はヨハンソンタイプの湾曲分光素子にも当然適用可能である。 In the above embodiment, the Johann-type curved spectroscopic element has been described. However, the present invention is naturally applicable to Johanson-type curved spectroscopic elements.
１１…単結晶ゲルマニウム
１２…薄板
１３…基板
１４…湾曲面
１５…湾曲分光素子
１６…結晶格子面
DESCRIPTION OF SYMBOLS 11 ... Single crystal germanium 12 ... Thin plate 13 ... Substrate 14 ... Curved surface 15 ... Curved spectroscopic element 16 ... Crystal lattice surface
Claims (3)
b)前記基板の湾曲面に貼り付けられた単結晶ゲルマニウムからなる湾曲結晶と、
から構成される湾曲分光素子であって、
前記基板はゲルマニウムからなることを特徴とする湾曲分光素子。 a) a substrate having a cylindrical curved surface;
b) a curved crystal made of single crystal germanium attached to the curved surface of the substrate;
A curved spectroscopic element comprising:
The curved spectroscopic element, wherein the substrate is made of germanium.
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| EP3498889A1 (en) * | 2017-12-12 | 2019-06-19 | Koninklijke Philips N.V. | Device and method for anodic oxidation of an anode element for a curved x-ray grating, system for producing a curved x-ray grating and curved x-ray grating |
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| JPH0833497B2 (en) * | 1987-03-25 | 1996-03-29 | 株式会社島津製作所 | X-ray curved crystal |
| JPH08201589A (en) * | 1995-01-26 | 1996-08-09 | Nikon Corp | X-ray spectroscopic element |
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