JP5129665B2 - Plasma processing equipment - Google Patents

Description

  The present invention includes cleaning of foreign substances such as organic substances existing on the surface of the object to be processed, resist peeling and etching, improvement of organic film adhesion, metal oxide reduction, film formation, plating pretreatment, coating pretreatment, The present invention relates to a plasma processing apparatus used for plasma processing such as surface modification of various materials and parts, and is particularly suitably applied to surface modification of a wide workpiece (workpiece).

  Conventionally, a streamer discharge is formed in the same direction as the gas flow of the plasma generating gas by introducing the plasma generating gas into the cylindrical container and applying a voltage with an electrode disposed outside the cylindrical container. At the same time, it has been proposed that plasma is generated in the cylindrical container by this streamer discharge, and the plasma is blown out of the cylindrical container and supplied to the object to be processed (for example, plasma processing is performed on the object to be processed) (for example, , See Patent Document 1).

Further, a plurality of fixed electrodes are arranged in parallel to face the peripheral surface of the roll electrode, and a voltage is applied between the roll electrode and the fixed electrode to form a non-uniform plasma state. It has also been proposed to perform a plasma treatment on a workpiece by conveying the workpiece through the inside (see, for example, Patent Document 2).
JP 2002-93768 A JP 2006-299000 A

  However, in the plasma processing apparatus described in Patent Document 1, there is no streamer discharge forming means for generating streamer discharge, and streamer discharge generated by simply applying a voltage between the electrodes is used. Sometimes it was difficult to sustain. Moreover, in order to plasma-process a wide workpiece, a wide cylindrical container is required, but it is difficult to ensure the strength of the cylindrical container formed of glass or the like. Due to the deformation, it is difficult to blow out the plasma uniformly, which may cause variations in the plasma treatment of the workpiece.

  On the other hand, in the plasma processing apparatus described in Patent Document 2, a nonuniform electric field strength distribution is forcibly formed. However, since the plasma processing is nonuniform with a pair of electrodes, it is uniform on the object to be processed. In order to achieve a satisfactory plasma treatment effect, it is necessary to dispose a large number of fixed electrodes around the roll electrode and superimpose non-uniform plasma, which increases the size and cost of the apparatus. was there.

  The present invention has been made in view of the above points, and can stably generate streamer discharge to generate uniform plasma, and can suppress the increase in size and cost of the apparatus. The object is to provide a processing apparatus.

The plasma processing apparatus according to the present invention supplies a plasma generating gas to an opposing region formed between a pair of opposing electrodes, and applies the voltage between the electrodes under atmospheric pressure or a pressure in the vicinity thereof. In the plasma processing apparatus for forming a streamer discharge in the region and generating plasma in the opposed region by the streamer discharge and supplying the plasma to the object to be processed, by generating a non-uniform electric field strength distribution in the opposed region A streamer discharge forming means for forming a streamer discharge; a streamer discharge dispersing means for dispersing the streamer discharge in the facing area; and a transport means for transporting the object to be processed in the facing area. A gas supply means for supplying the plasma generating gas to the counter area as the streamer discharge dispersion means. The provided, the gas supply means is formed by a gas nozzle of the tapered shape, that turbulence of the plasma generation gas ejected from the gas nozzle comprising forming the streamer discharge freely dispersed in the counter area It is a feature.

In the present invention , the streamer discharge forming means preferably generates a non-uniform electric field strength distribution in a direction substantially parallel to the transport direction of the workpiece.

In the present invention , it is preferable that the streamer discharge forming means is formed with non-uniform intervals between the opposing electrodes.

In the present invention , the streamer discharge forming means is formed by covering at least one opposing surface of the opposing electrode with a dielectric and partially varying the dielectric constant of the dielectric. Is preferred.

In the present invention , the streamer discharge forming means is formed by covering at least one opposing surface of the opposing electrode with a dielectric and partially varying the thickness of the dielectric. preferable.

In the present invention , it is preferable that the streamer discharge dispersing means is formed such that at least one of the opposed electrodes is displaceable with respect to the other.

In the present invention , the gas supply means is preferably provided adjacent to the facing region.

In the present invention , it is preferable to include a chamber for accommodating at least the opposing electrodes, the streamer discharge forming means, and the streamer discharge dispersing means.

The present invention is uniformly dispersed in the opposing area of the local discharge forms and tends streamer discharge collector with a good streamer discharge collector of the plasma generation efficiency can be stably formed by streamer discharge forming means in the streamer discharge dispersing means is to be able, which can generate stable and uniform plasma to generate a streamer discharge electricity, moreover, the streamer discharge electricity to disperse in streamer discharge dispersing means, to generate a streamer discharge electric Therefore, it is not necessary to provide a large number of electrodes, and the increase in size and cost of the apparatus can be suppressed. Further, the present invention can disperse the streamer discharge by using the gas flow of the plasma generating gas supplied from the gas supply means, and the device can be miniaturized, simplified, and reduced in cost by using the members together. It can be planned.

Further, according to the present invention, when the streamer discharge forming means generates a non-uniform electric field intensity distribution in a direction substantially parallel to the conveyance direction of the workpiece, an electric field is generated in a direction substantially parallel to the conveyance direction. By providing an intensity distribution, streamer discharge can be distributed in the same direction. By forming the distribution direction of the streamer discharge in the same direction as the width direction of the workpiece, the streamer discharge is superimposed while the workpiece passes through the treatment space. Variation in plasma processing intensity can be suppressed.

In the present invention, when the streamer discharge forming means is formed with non-uniform spacing between the opposing electrodes, the opposing surfaces of the electrodes are inclined surfaces, flat plates, curved surfaces, etc. By doing so, it is possible to easily form streamer discharge forming means for generating a non-uniform electric field strength distribution.

In the present invention, the streamer discharge forming means is formed by covering at least one opposing surface of the opposing electrode with a dielectric and partially changing the dielectric constant of the dielectric. , by changing the material of the dielectric, the electric field strength distribution remains smooth state facing surfaces can be non-uniform, easily be the interval adjusting a conductive electrode having a streamer discharge forming means It can be performed and can stably form a streamer discharge.

Further, in the present invention, when the streamer discharge forming means is formed by covering at least one facing surface of the facing electrode with a dielectric and partially varying the thickness of the dielectric. By changing the thickness of the dielectric, the electric field strength distribution can be made non-uniform even without uneven processing or slant processing on the opposing surface, and streamer discharge forming means can be easily formed It is.

Further, the present invention, the streamer discharge dispersion means, when said at least one of opposing electrodes formed by displaced freely formed relative to the other displaces against one of the electrodes to the other electrodes it allows the gas for plasma generation in the opposing area can impart turbulent component, it is capable of dispersing the streamer discharge electricity efficiently.

Further, the present invention, when the gas supply means comprising provided adjacent to the opposing region can be efficiently supplied to the plasma generation gas in the opposite area, the use efficiency of the plasma generation gas It can be raised.

Further, the present invention is, in the case made comprises a chamber containing the at least the opposing electrode and the streamer discharge forming means the streamer discharge dispersion means, to reduce the diffusion of the more plasma generation gas into the chamber over it can be one in which it is possible to reduce a load on the environment along with the control of the gas atmosphere in the opposing area can be easily performed.

  Hereinafter, the best mode for carrying out the present invention will be described.

(Embodiment 1)
The plasma processing apparatus shown in FIG. 1 is provided with a pair of electrodes 1, 1 arranged vertically opposite to each other, and a space between the opposed electrodes 1, 1 is formed as a facing region 2. The electrode 1 can be formed of a conductive metal material such as copper, aluminum, titanium alloy, brass, stainless steel having high corrosion resistance (such as SUS304). The upper electrode 1 is formed as a cylindrical roll electrode 1a, and the lower electrode is formed as a flat plate electrode 1b having a flat upper surface. In FIG. 1, the roll electrode 1a and the flat plate electrode 1b are formed long in a direction orthogonal to the paper surface. Moreover, the shaft part 40 is protrudingly provided in the both end surfaces of the roll electrode 1a, and the roll electrode 1a is formed so that rotation around the shaft part 40 is possible.

  Since the peripheral surface of the roll electrode 1a is a curved surface, the distance between the lower surface of the roll electrode 1a and the upper surface of the plate electrode 1b is narrowest immediately below the shaft portion 40 and gradually increases toward both long sides of the plate electrode 1b. It is formed to spread. That is, in the direction parallel to the tangential direction of the peripheral surface on the lower surface of the roll electrode 1a (the direction parallel to the short direction of the flat plate electrode 1b), the distance between the opposing regions 2 gradually increases from the center toward both sides. Is formed. Thus, the streamer discharge forming means can be formed by making the interval between the electrodes 1 and 1 non-uniform in the vertical direction. In other words, the distance between the roll electrode 1a and the flat plate electrode 1b becomes wider toward the both ends of the opposed region 2 in the short direction of the flat plate electrode 1b (horizontal direction parallel to the drawing sheet), and therefore, compared with the central portion of the opposed region 2. Electric field strength is reduced. Therefore, a non-uniform electric field strength distribution is generated so that the electric field strength gradually decreases from the central portion of the opposing region 2 toward both ends. Here, the electric field strength at the center of the opposing region 2 can be 20 kV / mm, and the electric field strength at both ends of the opposing region 2 can be 18 kV / mm, but is not limited thereto. The facing region 2 is formed as a processing space 5 for supplying plasma P to the workpiece H and performing plasma processing.

  A power source 21 is connected to the lower flat plate electrode 1b to form a high voltage electrode, and the upper roll electrode 1a is grounded at the shaft portion 40 to be formed as a ground electrode. The flat plate electrode 1b is formed with a circulation hole 30 for circulating the cooling water over substantially the entire length in the longitudinal direction. Further, the entire surface including the facing surface 20 of the peripheral surface of the roll electrode 1a and the upper surface of the plate electrode 1b is covered with a dielectric 3 to prevent arc discharge. The dielectric 3 can be formed of a high-melting-point insulating material such as a vitreous material such as quartz glass, alumina, barium titanate, yttria, or zirconium, or a ceramic material, and has a relative dielectric constant of 5 or more. It is preferable. The thickness of the dielectric 3 coating is constant throughout, for example, 0.5 to 5 mm.

  The plasma processing apparatus includes a gas nozzle 22 as the gas supply means 4. The gas nozzle 22 is disposed on the side of the plate electrode 1b and is adjacent to the facing region 2. Moreover, the gas nozzle 22 is arrange | positioned over the substantially full length of the elongate direction of the flat plate electrode 1b. The gas nozzle 22 is formed with a point-shaped gas ejection path 23, and the plasma generating gas G is ejected from the gas ejection path 23 to the facing region 2 from the side. In the first embodiment, the gas nozzle 22 serves as both the gas supply means 4 and the streamer discharge dispersion means.

  The electrode 1, the gas nozzle 22 and the processing space 5 are accommodated in a box-shaped chamber 6. A carry-in port 26 and a carry-out port 27 are provided on the upper surface of the chamber 6. In this plasma processing apparatus, the transport means for transporting the workpiece H is the roll electrode 1a, and the roll electrode 1a is rotationally driven to transport the workpiece H such as a film along its peripheral surface. Can do.

  And when plasma-treating the flexible long to-be-processed object H, such as a synthetic resin film, using said plasma processing apparatus, it carries out as follows. First, by applying a voltage between the roll electrode 1a and the plate electrode 1b while introducing the plasma generating gas G into the facing region 2 from the side opening under atmospheric pressure or a pressure in the vicinity thereof (90 to 107 kPa). A large number of streamer discharges S are generated in the facing region 2. Here, since the plasma generating gas G is introduced into the opposing region 2 through the gas ejection path 23 of the gas nozzle 22, the plasma generating gas G is injected into the opposing region 2 at a high speed, and this injection causes turbulent flow of the plasma generating gas G. Occurs and the streamer discharge S is diffused and dispersed in the facing region 2. Therefore, even if the streamer discharge S is locally formed by the non-uniform electric field strength distribution, it can be dispersed over the entire opposing region 2. Thereafter, the plasma P is generated substantially uniformly over the entire facing region 2 by the distributed streamer discharge S. The waveform of the voltage applied between the roll electrode 1a and the plate electrode 1b can be a continuous waveform such as a sine wave, and the frequency is preferably set to 1 kHz to 200 MHz. When a voltage having a continuous waveform is used, the power supply between the roll electrode 1a and the plate electrode 1b can be increased, and high-density plasma can be generated. The waveform of the voltage applied between the roll electrode 1a and the flat plate electrode 1b can be a pulse waveform. In this case, the frequency is preferably set to 0.5 kHz to 200 MHz. By using the voltage of the pulse waveform, the temperature rise in the facing region 2 can be suppressed, and the plasma processing can be performed even for the workpiece H having low heat resistance. The voltage applied between the electrodes 1 and 1 varies depending on the distance between the electrodes 1 and 1 and the composition of the plasma generating gas G, but is preferably set so that the electric field strength is in the range of 1 kV to 30 kV / mm. .

  On the other hand, the workpiece H is carried into the chamber 6 from the carry-in entrance 26, passes through the facing region 2 that is the treatment space 5, and is carried out of the chamber 6 through the carry-out port 27. Here, in this plasma processing apparatus, the workpiece H is transported substantially horizontally when passing through the facing region 2, and therefore is not uniform in the horizontal direction substantially parallel to the transport direction of the workpiece H in the facing region 2. An electric field intensity distribution is generated by the streamer discharge forming means.

  Then, the surface of the workpiece H is exposed by supplying the plasma P exposed to the lower surface of the workpiece H (the surface that does not contact the dielectric 3 of the roll electrode 1a) when passing through the facing region 2. Plasma treatment such as reforming treatment can be performed. Here, by supplying the plasma P while transporting the workpiece H, the plasma treatment can be performed over the entire length of the workpiece H in the transport direction. In addition, the plasma treatment can be performed over the entire length in the longitudinal direction of the electrode 1 also in the width direction of the workpiece H (the direction orthogonal to the transport direction in the horizontal plane). In addition, although the conveyance speed of the to-be-processed object H can be 0.05-30 m / min, it is not limited to this.

(Embodiment 2)
The plasma processing apparatus shown in FIG. 2 is the same as that shown in FIG. 1 except that the opposing surface 20 on the upper surface of the plate electrode 1b is an uneven surface. The uneven surface can be formed by providing a plurality of protrusions 29 and protrusions on the opposing surface 20. The roughness of the facing surface 20 can be 10 to 2000 μm at the maximum height Rmax, but is not limited thereto. In this manner, the distance between the peripheral surface of the roll electrode 1a and the opposing surface 20 of the upper surface of the flat plate electrode 1b is partially non-uniform in the long direction and short direction of the flat plate electrode 1b. Can be formed. That is, the electric field strength is lower in the portion where the distance between the electrodes 1 and 1 is wide than in the narrow portion. Accordingly, a non-uniform electric field strength distribution is generated in the entire facing region 2. The peripheral surface of the roll electrode 1a and the entire surface of the flat plate electrode 1b are covered with the dielectric 3 similar to the above. Since the thickness of the coating of the dielectric 3 is constant over the entire surface in the same manner as described above, the unevenness of the facing surface 20 appears on the upper surface of the coating of the dielectric 3 in the portion covering the facing surface 20. And in this plasma processing apparatus, the unevenness | corrugation of the upper surface of this dielectric material 3 is formed as a streamer discharge dispersion | distribution means. Therefore, this plasma processing apparatus is provided with a cover 32 having a gas introduction hole 33 as the gas supply means 4, but a gas nozzle 22 similar to the above that jets the plasma generating gas G to the facing region 2 is provided. Not provided. Other configurations are the same as those of the plasma processing apparatus.

  And when plasma-treating the flexible and long to-be-processed object H, such as a synthetic resin film, using this plasma processing apparatus, it can carry out similarly to the above. In other words, a voltage is applied between the roll electrode 1a and the plate electrode 1b while introducing the plasma generating gas G into the opposing region 2 from the side opening through the gas introduction hole 33 of the cover 32 under atmospheric pressure or a pressure in the vicinity thereof. As a result, a large number of streamer discharges S are generated in the facing region 2. At this time, since the upper surface of the coating film of the dielectric 3 facing the facing region 2 is formed as an uneven surface, a turbulent flow of the plasma generating gas G occurs in the facing region 2, and this turbulent flow causes a streamer discharge. S is diffused and dispersed in the facing region 2. Therefore, even if the streamer discharge S is locally formed by the non-uniform electric field strength distribution, it can be dispersed over the entire opposing region 2. Thereafter, in the same manner as described above, the plasma P is generated substantially uniformly over the entire opposing region 2 by the distributed streamer discharge S. In the same manner as described above, after the workpiece H is carried into the chamber 6, the plasma P is exposed and supplied to the lower surface of the workpiece H when passing through the facing region 2 (processing space 5). Thus, plasma treatment such as surface modification treatment of the workpiece H can be performed.

(Embodiment 3)
In the plasma processing apparatus shown in FIG. 3, the opposing surface 20 of the electrodes 1 and 1 is formed as an uneven surface as in the case of FIG. 2, but the thickness of the dielectric 3 covering this is made uneven. The upper surface of the coating film of the dielectric 3 facing the opposing region 2 is formed as a flat surface. Therefore, the unevenness on the upper surface of the coating of the dielectric 3 is not used as the streamer discharge dispersion means as in the plasma processing apparatus in FIG. 2, but instead, the gas supply means is provided by the gas nozzle 25 as in the plasma processing apparatus in FIG. 4 and streamer discharge dispersing means are also used. Other configurations are the same as those of the plasma processing apparatus.

  And when plasma-treating the above-mentioned flexible long to-be-processed object H using this plasma processing apparatus, it can carry out similarly to the above. That is, by applying a voltage between the electrodes 1 and 1 while introducing the plasma generating gas G through the gas ejection path 23 of the gas nozzle 22 into the opposing region 2 from its side opening under atmospheric pressure or a pressure in the vicinity thereof. A large number of streamer discharges S are generated in the facing region 2. At this time, the streamer discharge forming means is a film of the dielectric 3 having unevenness and a partially different thickness on the opposing surface 20 on the upper surface of the flat plate electrode 1b. Thereafter, similarly to the above, the streamer discharge S is diffused and dispersed in the opposing region 2 by the streamer discharge dispersing means, and the plasma P is generated substantially uniformly over the entire opposing region 2 by the dispersed streamer discharge S. . In the same manner as described above, after the workpiece H is carried into the chamber 6, the plasma P is exposed and supplied to the lower surface of the workpiece H when passing through the facing region 2 (processing space 5). Thus, plasma treatment such as surface modification treatment of the workpiece H can be performed.

(Embodiment 4)
In the plasma processing apparatus shown in FIG. 4, the streamer discharge forming means is formed by partially varying the dielectric constant of the dielectric 3 covering the facing surface 20 of the facing electrodes 1 and 1. That is, as shown in FIG. 4B, the dielectric 3 covering the facing surface 20 is formed of a plurality of types of dielectrics 3a and 3b having different dielectric constants, and the tile-shaped dielectrics 3a and 3b are, for example, a checkered pattern. Are arranged on the opposite surface 20. Thereby, the electric field strength is different between the dielectric 3a portion and the dielectric 3b portion, and a non-uniform electric field strength distribution in the vertical direction can be formed in the facing region 2. The relative dielectric constant difference between the dielectric 3a and the dielectric 3b is preferably 1 to 1600, but is not limited thereto. Further, as in the plasma processing apparatus of FIG. 1, the gas nozzle 22 serves as both the gas supply means 4 and the streamer discharge dispersion means. Other configurations are the same as those of the plasma processing apparatus.

  And when plasma-treating the long to-be-processed object H which has the above flexibility using this plasma processing apparatus, it can carry out similarly to the above. That is, a voltage is applied between the roll electrode 1a and the plate electrode 1b while introducing the plasma generating gas G into the opposing region 2 from the side opening through the gas injection path 23 of the gas nozzle 22 under atmospheric pressure or a pressure in the vicinity thereof. As a result, a large number of streamer discharges S are generated in the facing region 2. Thereafter, similarly to the above, the streamer discharge S is diffused and dispersed in the opposing region 2 by the streamer discharge dispersing means, and the plasma P is generated substantially uniformly over the entire opposing region 2 by the dispersed streamer discharge S. . In the same manner as described above, after the workpiece H is carried into the chamber 6, the plasma P is exposed and supplied to the lower surface of the workpiece H when passing through the facing region 2 (processing space 5). Thus, plasma treatment such as surface modification treatment of the workpiece H can be performed.

(Embodiment 5)
In the plasma processing apparatus shown in FIG. 5, the streamer discharge dispersing means is formed by driving and displacing the plate electrode 1b substantially horizontally in the longitudinal direction of the plate electrode 1b with respect to the roll electrode 1a. Therefore, the gas nozzle 22 as shown in FIG. 1 is not provided, and the gas supply means 4 is formed by the cover 32 having the gas introduction holes 33. In displacing the plate electrode 1, a rolling member 35 such as a wheel that rolls on the base 39 is provided on the lower surface of the plate electrode 1, and a link member 36 is projected from one end of the plate electrode 1. 36 is connected to a rocking device 37 containing a motor or the like. Then, by transmitting the drive of the swing device 37 to the plate electrode 1b via the link member 36, the plate electrode 1b can be vibrated by reciprocating substantially horizontally in the longitudinal direction. By displacing the plate electrode 1b with respect to the roll electrode 1a in this way, a turbulent component can be imparted to the plasma generating gas G in the facing region 2, and the locally generated streamer discharge S is dispersed. Can do. Here, in order to impart a turbulent flow component to the plasma generation gas G in the facing region 2, the plate electrode 1b can be vibrated at, for example, 0.1 to 200 mm per second. Other configurations are the same as those of the plasma processing apparatus.

  And when plasma-treating the long to-be-processed object H which has the above flexibility using this plasma processing apparatus, it can carry out similarly to the above. That is, the voltage between the roll electrode 1a and the plate electrode 1b is introduced while introducing the plasma generating gas G into the opposing region 2 from the side opening through the gas introduction holes 33 of the pair of covers 32 under atmospheric pressure or a pressure in the vicinity thereof. As a result, a number of streamer discharges S are generated in the facing region 2. Thereafter, the streamer discharge S is diffused and dispersed in the opposing region 2 by the streamer discharge dispersing means by the reciprocating movement of the flat plate electrode 1b, and the plasma P is generated almost uniformly over the entire opposing region 2 by the dispersed streamer discharge S. Is done. In the same manner as described above, after the workpiece H is carried into the chamber 6, the plasma P is exposed and supplied to the lower surface of the workpiece H when passing through the facing region 2 (processing space 5). Thus, plasma treatment such as surface modification treatment of the workpiece H can be performed.

  Hereinafter, the present invention will be described specifically by way of examples.

Example 1
The plasma processing apparatus shown in FIG. 1 was formed. The roll electrode 1a is made of stainless steel and has a cylindrical shape with a diameter of 300 mm. The plate electrode 1b is made of a titanium alloy and has a lengthwise dimension of 200 mm, a lengthwise dimension of 30 mm, and a height of 25 mm. Further, the cross section of the plate electrode 1b is formed in a rectangular shape. Therefore, the non-uniform electric field strength distribution is generated by the streamer discharge forming means in the horizontal direction substantially parallel to the conveying direction of the workpiece H in the facing region 2. A 1 mm-thick dielectric (alumina) 3 film was formed on the peripheral surface of the roll electrode 1a and the entire surface of the flat plate electrode 1b by thermal spraying. Further, cooling water was circulated through the circulation hole 30 of the flat plate electrode 1b. The roll electrode 1a and the flat plate electrode 1b were disposed so as to face each other so that the interval at the shortest portion when not discharged was 0.8 mm. As the gas supply means 4, a gas nozzle 22 having a pre-shaped gas ejection passage 23 is used, and the gas supply means 4 is also used as a streamer discharge dispersion means.

(Example 2)
The plasma processing apparatus shown in FIG. 2 was formed. A large number of protrusions 29 are provided on the opposing surface 20 on the upper surface of the plate electrode 1b to form an uneven surface (maximum height Rmax 500 μm). A 1 mm thick dielectric (alumina) 3 coating is formed on the peripheral surface of the roll electrode 1 a and the entire surface of the flat plate electrode 1 b by a thermal spraying method, and the surface of the dielectric 3 coating covering the opposing surface 20 is also uneven. Is formed. A plasma processing apparatus was formed in the same manner as Example 1 except for these.

(Example 3)
The plasma processing apparatus shown in FIG. 3 was formed. The plate electrode 1b is the same as that of Example 2, and the dielectric (alumina) 3 having a thickness of 1 mm at the thinnest portion on the peripheral surface of the roll electrode 1a and the entire surface of the plate electrode 1b by thermal spraying is used. A film was formed. The surface of the coating of the dielectric 3 that covers the facing surface 20 was formed to be a flat surface. A plasma processing apparatus was formed in the same manner as Example 1 except for these.

Example 4
The plasma processing apparatus shown in FIG. 4 was formed. The cross section of the plate electrode 1b was rectangular, and the opposing surface 20 was a flat surface. A coating of dielectric (alumina) 3 having a thickness of 1 mm was formed on the surface other than the facing surface 20 of the flat plate electrode 1b by a thermal spraying method. Dielectric 3a made of alumina and dielectric 3b made of barium titanate were used for the film of dielectric 3 covering the facing surface 20. The coatings of the two kinds of dielectrics 3a and 3b are tiles having a size of 5 mm × 10 mm, and these are arranged in a checkered pattern. The upper surface of the dielectric 3 film was formed to be a flat surface. A plasma processing apparatus was formed in the same manner as Example 1 except for these.

(Example 5)
The plasma processing apparatus shown in FIG. 5 was formed. The plate electrode 1b was displaced with respect to the roll electrode 1a by vibrating once per second with an amplitude of 2 mm in a direction parallel to the longitudinal direction. Further, a cover 32 having a gas introduction hole 33 is used instead of the gas nozzle 22. A plasma processing apparatus was formed in the same manner as Example 1 except for these.

(Comparative Example 1)
A cover 32 having a gas introduction hole 33 was used while the opposing surface 20 of the plate electrode 1b was a curved surface parallel to the peripheral surface of the roll electrode 1a. A plasma processing apparatus was formed in the same manner as Example 1 except for these. Therefore, this does not include the streamer discharge forming means and the streamer discharge dispersing means.

<Evaluation of plasma processing capability>
A plasma generating gas G of 10 liters / minute of nitrogen and 0.01 liters / minute of oxygen is introduced into the facing region 2 at atmospheric pressure, and 30 Hz and 12 kV having a sine wave waveform between the electrodes 1 and 1 by the power source 21. A voltage was applied. As a result, streamer discharge S is generated in the facing region 2 in Examples 1 to 5 and Comparative Example 1, and glow discharge is generated in Comparative Example 2 and plasma P is generated, and this plasma P is blown into the processing space 5. It was.

  As the workpiece H, a polyimide film was used and conveyed so as to pass through the facing region 2 at 20 m / min. And the plasma treatment was performed to the to-be-processed object H in Examples 1-5 and the comparative example 1 on this condition, and the contact angle of the water before and behind plasma treatment was measured. The contact angle of water after the plasma treatment was measured by setting 20 measurement points on the upper surface of the workpiece H at 10 mm intervals. The contact angle of water before the plasma treatment was 72 °. The results are shown in Table 1.

  As can be seen from Table 1, in Examples 1 to 5, the contact angle of water after plasma treatment was lower than that in Comparative Example 1. In Comparative Example 1, the change in the contact angle of water was small. Therefore, it can be said that the plasma processing capability of Examples 1 to 5 including the streamer discharge forming means for generating the non-uniform electric field strength distribution and the streamer discharge dispersing means for dispersing the streamer discharge S is high.

It is a schematic sectional drawing which shows Embodiment 1 of this invention. It is general | schematic sectional drawing which shows Embodiment 2 same as the above. It is a schematic sectional drawing which shows Embodiment 3 same as the above. (A) is the schematic side view which shows Embodiment 4 same as the above, (b) is the schematic which shows an electrode, (c) is a schematic sectional drawing. (A) is a schematic side view which shows Embodiment 4 same as the above, (b) is a schematic sectional drawing. 6 is a schematic cross-sectional view showing a comparative example 1. FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Electrode 2 Opposite area | region 3 Dielectric material 4 Gas supply means 5 Processing space 6 Chamber S Streamer discharge G Gas for plasma generation H To-be-processed object P Plasma

Claims (8)

Supplying a plasma generation gas to the opposed region formed between a pair of opposing electrodes, the to form a streamer discharge to the opposing region by applying a voltage between the electrodes under a pressure at or near atmospheric pressure the streamer discharge to generate a plasma in said opposing region, the plasma processing apparatus for supplying the plasma to the object to be processed, streamer discharge for forming the streamer discharge by generating a non-uniform electric field intensity distribution in the opposite region a forming unit, a streamer discharge dispersing means for dispersing the streamer discharge by the facing region, the object to be processed and a conveyance means for conveying at the facing region, as the streamer discharge dispersion means, said plasma A gas supply means for supplying the generation gas to the facing region is provided, and the gas supply means Is formed in the gas nozzle shape, the plasma processing apparatus characterized by comprising forming freely disperse the streamer discharge in the opposite region by turbulence of the plasma generation gas ejected from the gas nozzle. The streamer discharge forming means, a plasma processing apparatus according to claim 1, wherein said is to generate a non-uniform electric field strength distribution in the conveyance direction substantially parallel to the direction of the object. The streamer discharge forming means, a plasma processing apparatus according to claim 1 or 2, characterized by comprising a distance between the opposing electrodes is formed in the non-uniform. The streamer discharge forming means, according to claim 1, characterized by comprising the dielectric constant of the dielectric with at least one of the opposing surfaces of the opposing electrode is coated with a dielectric formed by changing the partial The plasma processing apparatus as described in any one of thru | or 3. The streamer discharge forming means 1 through claim, characterized by comprising formed by varying the thickness of the dielectric in part with at least one of the opposing surfaces of the opposing electrode is coated with a dielectric 5. The plasma processing apparatus according to claim 4. The streamer discharge dispersion means, plasma treatment apparatus according to any of claims 1 to 5, characterized by comprising displaced freely form relative to the other at least one of the opposing electrode. The plasma processing apparatus according to any one of claims 1 to 6, characterized by comprising provided adjacent the gas supply means to said opposed region. The plasma processing apparatus according to any one of claims 1 to 7, characterized by comprising comprises a chamber containing at least said the opposing electrode and the streamer discharge forming means the streamer discharge dispersion means.

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