JP5163602B2 - Method for producing high and low pattern layer formed body - Google Patents

Description

  The present invention relates to a method for manufacturing a high / low pattern layer.

  2. Description of the Related Art Conventionally, liquid crystal displays have been used as information display means in various fields regardless of whether they are monochrome or color types.

  For example, a monochrome liquid crystal display is a monochrome liquid crystal having a substrate, a black matrix formed in a pattern on the substrate, and a protective layer provided to protect the black matrix and ensure the flatness of the substrate surface. A display substrate, a counter substrate facing the monochrome liquid crystal display substrate, and a liquid crystal layer sandwiched between the monochrome liquid crystal display substrate and the counter substrate are provided.

  In recent years, columnar spacers have been used as a gap material (spacer) for keeping the gap between the monochrome liquid crystal display substrate and the counter substrate constant, instead of the conventionally used plastic beads. That is, in order to eliminate the decrease in contrast due to light leakage around the plastic beads and the display unevenness due to the unevenness of scattering, a columnar spacer is formed on one of the substrates, and the gap between the two substrates is formed by this spacer. It is kept constant.

  As shown in FIG. 4, an example of a conventional monochrome liquid crystal display substrate using such columnar spacers is a pattern in which a black matrix 42 separating pixels is patterned on a substrate 41 of a monochrome liquid crystal display substrate. Is formed. Such a black matrix 42 has a pixel black matrix 42a formed in the pixel portion A which is a display area of the monochrome liquid crystal display, and an outer peripheral black matrix 42b formed in the outer peripheral part B which is outside the display area. The pixel black matrix 42a has a narrow line width so as not to reduce the aperture ratio of the display area, and the outer peripheral black matrix 42b effectively shields light from a light source such as a backlight. Therefore, the line width is formed wide.

  Further, a protective layer 43 is formed so as to cover the surface of the black matrix 42 in order to protect members such as the black matrix 42 and to impart flatness to the surface of the substrate 41 of the monochrome liquid crystal display substrate. In such a protective layer 43, a difference in film thickness occurs between the pixel portion A and the outer peripheral portion B. This is because the pixel black matrix 42a located in the pixel portion A has a narrow line width, so that the protective layer 43 is difficult to be laminated on the upper surface, and the thickness of the laminated protective layer 43 tends to be thin. On the other hand, since the outer peripheral black matrix 42b provided in the outer peripheral portion B is formed with a sufficient line width, the protective layer 43 is thicker than that of the pixel portion A. Because it becomes. When the columnar spacers 44 are formed on such a protective layer 43, the height from the surface of the substrate 41 of the monochrome liquid crystal display substrate to the upper surface of the columnar spacers 44 is due to the difference in film thickness of the protective layer 43 itself. The outer peripheral portion B is higher than the pixel portion A.

  Such a difference in height appears as a difference in the gap between the substrates. When the counter substrate 45 is arranged on the monochrome liquid crystal display substrate via the columnar spacer 44 in this state, the counter substrate 45 Distortion occurs. The distortion causes inconvenience that light leaks from the peripheral portion of the counter substrate 45, thereby causing a problem that the periphery of the screen becomes bright.

  Therefore, as a method for solving such a problem, for example, Patent Document 1 discloses that the display area of the liquid crystal display device and the height of the columnar spacer itself are prevented from varying outside the display area. A technique using a columnar spacer including a large-diameter spacer and a small-diameter spacer having two or more layers is disclosed. Furthermore, in Patent Document 2, in order to prevent the columnar spacer from changing due to the influence of high temperature and high pressure during the assembly of the liquid crystal display device, the columnar spacer has a low deformation portion with a small deformation amount at high temperature and high pressure. A technique is disclosed in which a two-layer structure including a highly elastic portion capable of following the contraction of liquid crystal at a low temperature is used, and the shape of the columnar spacer is kept constant.

  However, in both methods, in order to form columnar spacers having different heights in the pixel portion A and the outer peripheral portion B, the step of forming the columnar spacer is repeated twice, thereby increasing the height of the columnar spacers in the pixel portion and the outer peripheral portion. Since the difference in thickness is eliminated, a lot of labor is required to create the columnar spacer, which is a factor of reducing manufacturing efficiency.

  In addition, the MVA mode in a multi-alignment-divided vertical alignment (hereinafter, multi-alignment-divided vertical alignment may be abbreviated as MVA) mode is a mode in which all liquid crystal molecules stand vertically on the alignment film when no voltage is applied. The display is controlled by tilting the liquid crystal molecules when a voltage is applied. Furthermore, in order to realize high-quality display, the direction in which the liquid crystal molecules are tilted is defined to be different for each adjacent domain, and a plurality of orientations are divided for each domain. This realizes a high viewing angle, high contrast, high-speed response, faithful color reproduction, high-definition display, and the like.

  In such an MVA mode liquid crystal display, rubbing with a cloth such as nylon or rayon has been performed in order to determine the orientation of liquid crystal molecules. However, when this method is used, the reliability in the production process is sufficient due to the generation of static electricity due to the rubbing process, the decrease in yield due to dust generation, the decrease in productivity due to the complexity of the process, etc. I could not say. In addition, when there is a spacer that regulates the thickness of the liquid crystal layer, there is a drawback that a portion that becomes a shadow of the spacer is not rubbed, and the alignment of liquid crystal molecules in that portion is disturbed.

  In view of such circumstances, as described in Patent Document 3, in recent years, a rubbing technique is used by providing a protrusion for controlling alignment (referred to as an alignment control protrusion in this specification) in a liquid crystal panel. Instead, a method for defining the tilt direction of liquid crystal molecules has been adopted. This is because the alignment control protrusions are provided in zigzag stripes such that the major axes of the liquid crystal molecules at the time of voltage application are all at an angle of 45 °, the alignment direction in one pixel is divided into four, And it is designed so that the division area may become equal. Further, in this method, the protrusions for controlling the orientation are provided on both the color filter side substrate and the opposite substrate opposite thereto, and are formed so as to be alternately arranged when the cells are formed.

  On the other hand, in general, in an MVA mode liquid crystal display provided with protrusions for alignment control, spherical plastic beads are used as a spacer for defining the thickness of the liquid crystal layer. As in the case, columnar spacers have been used to solve the problems associated with the use of plastic beads.

  As described above, in the MVA mode liquid crystal display, it is beneficial to provide alignment control protrusions and columnar spacers. However, although both are formed by the photolithography method using the same material, the height of both is high. Because of the difference in thickness and pattern, they had to be formed separately. Therefore, there has been a demand for the development of a method capable of manufacturing both using the same material at the same time.

  Therefore, in Patent Document 3, (a) a substrate having a negative photoresist applied to the outermost surface is prepared, and (b) a plurality of predetermined notch patterns formed on the surface to which the photoresist is applied. Exposure is performed with a constant exposure amount through a photomask having an opening, and (c) the photomask is exposed in step (b) so that the next opening to be exposed partially overlaps. (D) The steps (b) and (c) are repeated a plurality of times in this order, and (e) the exposed substrate surface is developed with a developer. A method is disclosed in which a film thickness corresponding to the number of exposures is generated to produce the alignment control protrusion and the columnar spacer at the same material and at the same time. However, this method has a drawback that a lot of labor is required in the exposure process because the film thickness of the alignment control protrusion and the columnar spacer is made different depending on the number of exposures in the exposure process.

JP-A-11-109366 JP 2002-148426 A JP 2002-236371 A

  The present invention has been made in view of the above problems, and it is possible to easily and simultaneously manufacture a high and low pattern layer formed by combining patterns having different heights using the same material by a photolithography method. The main object of the present invention is to provide a method for producing a high and low pattern layer formed body.

In order to achieve the above object, the present invention includes a substrate and a high and low pattern layer formed by combining patterns having different heights formed on the substrate, and the high and low pattern layers are the same by a photolithography method. A method for producing a high and low pattern layer formed body that is produced simultaneously with a material, wherein a photocurable resin composition is applied onto the substrate to form a photosensitive layer, and a light shielding layer that blocks light transmission And a mask that has an opening formed along the pattern of the high and low pattern layers, and a filter that absorbs 40% or more of a wavelength in the range of 200 nm to 500 nm is disposed in a part of the opening And exposing the photosensitive layer through the mask, and developing the exposed photosensitive layer, so that the filter is disposed in the opening of the mask. Appropriate photosensitive layer to provide a method for manufacturing a high-low pattern layer formed body characterized by having high and low pattern layer forming step of forming a height pattern layer as a lower portion.

  In the present invention, the filter having the property of absorbing the wavelength within the above-described range at the above ratio is arranged in a part of the opening, so that even the photosensitive layer that becomes the exposure region in the exposure process is a filter. Depending on the presence or absence, a difference in the remaining film ratio after development can be caused. Therefore, a high and low pattern layer composed of a high portion and a low portion having different heights can be simultaneously formed using the same material.

In the said invention, it is preferable that the said photocurable resin composition differs in the reactivity by the intensity of light in the range of 200 nm-500 nm. By using a photocurable resin composition having different reactivity depending on the intensity of light having a wavelength that is the same as the wavelength range absorbed by the above-described filter, even a photosensitive layer that has become an exposure region in the exposure step. Because of the presence or absence of a filter, it is possible to make a difference in the degree of curing, so a high-low pattern layer consisting of high and low parts with different heights can be easily obtained using such a photocurable resin composition, It is because it can form simultaneously.

In the said invention, it is preferable that the said high / low pattern layer formation body is what is used for the board | substrate for liquid crystal displays. In a liquid crystal display substrate, two types of members having different heights may be formed from the same material. In such a case, the method for producing a high and low pattern layer formed body of the present invention can be used efficiently. This is because a liquid crystal display substrate can be manufactured.

The present invention provides a monochrome liquid crystal having a substrate and a high and low pattern layer formed by combining patterns having different heights formed on the substrate, wherein the high and low pattern layers are simultaneously manufactured from the same material by a photolithography method. A method for producing a display substrate, wherein a photocurable resin composition is applied onto the substrate to form a photosensitive layer, a light-shielding layer that blocks light transmission, and a pattern of the high and low pattern layers And a filter that absorbs 40% or more of wavelengths in the range of 200 nm to 500 nm using a mask disposed in a part of the opening, and through the mask. An exposure process for exposing the photosensitive layer, and developing the exposed photosensitive layer, thereby exposing the photosensitive layer corresponding to a region where the filter is disposed in the opening of the mask. Anda height patterned layer forming step of forming a height pattern layer has a low portion, the height pattern layer outside the display area of the pixel spacer and the monochrome liquid crystal display located in the display area of the monochrome liquid crystal display An outer peripheral spacer, wherein the mask includes a light shielding layer that blocks light transmission, a pixel opening formed along the pattern of the pixel spacer, and an outer peripheral opening formed along the pattern of the outer peripheral spacer. And a method for producing a monochrome liquid crystal display substrate, wherein the filter is disposed at least in the outer peripheral opening.

  In the present invention, by using the above-described manufacturing method of the high and low pattern layer, pixel spacers and outer peripheral spacers having different heights can be simultaneously formed using the same material, so that the columnar spacers can be formed efficiently. This is effective in improving the manufacturing efficiency of the substrate for the monochrome liquid crystal display device.

Furthermore, in the present invention, there is provided a manufacturing method of an MVA mode liquid crystal display using the above-described manufacturing method of a high and low pattern layer forming body, wherein the high and low pattern layer is used for the alignment control protrusion and MVA used in the MVA mode liquid crystal display. A columnar spacer, wherein the mask includes a light shielding layer that blocks light transmission, a first opening formed along the pattern of the alignment control protrusion, and a first opening formed along the pattern of the MVA columnar spacer. The present invention provides a method for manufacturing an MVA mode liquid crystal display having two openings, wherein the filter is disposed at least in the first opening.

  In an MVA mode liquid crystal display, it is very beneficial to provide alignment control protrusions and columnar spacers for MVA. However, by forming these by the above-described manufacturing method of the high and low pattern layer formation, the same material is used at the same time. Therefore, an MVA mode liquid crystal display can be manufactured efficiently.

  According to the present invention, since the filter having the property of absorbing 40% or more of the wavelength within the range of 200 nm to 500 nm is disposed in a part of the opening, the photosensitive layer that has become the exposure region in the exposure process. However, it is possible to make a difference in the remaining film ratio after development depending on the presence or absence of a filter. Therefore, there is an effect that the high and low pattern layers including the high part and the low part having different heights can be simultaneously formed using the same material.

It is process drawing which shows an example of the manufacturing method of the high / low pattern layer of this invention. It is process drawing which shows an example of the manufacturing method of the board | substrate for monochrome liquid crystal displays of this invention. It is process drawing which shows an example of the manufacturing method of the MVA mode liquid crystal display of this invention. It is process drawing which shows an example of the board | substrate for monochrome liquid crystal displays in the past. It is the graph which showed the film thickness after the development accompanying the change of the exposure amount of a photosensitive layer in the case where it exposed without passing through a filter, and the case where two types of filters with different light transmittances were used.

  Hereinafter, the manufacturing method of the high and low pattern layer of the present invention, the manufacturing method of the substrate for monochrome liquid crystal display, and the manufacturing method of the MVA mode liquid crystal display will be described.

A. Method for Manufacturing High / Low Pattern Layer Formed Body First, a method for manufacturing the high / low pattern layer formed body will be described. The manufacturing method of the high and low pattern layer formed body of the present invention includes a substrate and a high and low pattern layer formed on the substrate and combined with patterns having different heights, and the high and low pattern layer is formed by a photolithography method. A method for producing a high and low pattern layer formed body that is simultaneously produced with the same material,
A photosensitive layer forming step of applying a photocurable resin composition on the substrate to form a photosensitive layer;
A filter having a light-shielding layer that blocks light transmission and an opening formed along the pattern of the high and low pattern layers, and that absorbs 40% or more of a wavelength within a range of 200 nm to 500 nm is one of the openings. An exposure step of exposing the photosensitive layer through the mask, using a mask disposed in a portion;
A step of forming a high / low pattern layer by developing the exposed photosensitive layer to form a high / low pattern layer in which the photosensitive layer corresponding to the region in which the filter is disposed in the opening of the mask becomes a low portion; It is characterized by this.

  In the present invention, the filter having the property of absorbing the wavelength within the above-described range at the above ratio is arranged in a part of the opening, so that even the photosensitive layer that becomes the exposure region in the exposure process is a filter. Depending on the presence or absence, a difference in the remaining film ratio after development can be caused. Therefore, a high and low pattern layer composed of a high portion and a low portion having different heights can be simultaneously formed using the same material.

  The method for producing the high and low pattern layer of the present invention having such advantages will be specifically described with reference to FIG.

  First, as shown in FIG. 1A, a photocurable resin composition is applied on a substrate 1 to form a photosensitive layer 2.

  Next, as shown in FIG. 1B, it has a light shielding layer 3 that blocks light transmission and an opening 4 that is a light transmitting region, and absorbs a wavelength within a predetermined range at a predetermined ratio. The filter 5 to be exposed exposes the photosensitive layer 2 through a mask 6 provided in a part of the opening 4. At this time, since the reactivity of the photocurable resin composition constituting the photosensitive layer 2 differs depending on the intensity of the short wavelength side of the light to be exposed, the exposed area 7 of the portion exposed through the filter 5 and There is a difference in the degree of curing between the exposed area 8 exposed without a filter. That is, the exposure region 7 exposed to light having a wavelength absorbed within a predetermined range by the filter 5 is more slowly cured than the exposure region 8 exposed to light as it is.

  As a result, as shown in FIG. 1C, three types of patterns, that is, an exposed area 7 exposed through the filter 5, an exposed area 8 exposed without the filter, and an unexposed area are obtained. 9 is formed on the photosensitive layer 2. When such a photosensitive layer 2 is developed and washed, as shown in FIG. 1D, the photosensitive layer 2 in the unexposed area 9 is removed, and the photosensitive layer 2 in the exposed area 7 and the exposed area 8 remains. Furthermore, due to the difference in reactivity of the photocurable resin composition caused by the presence or absence of the filter 5, the exposed region 8 exposed without the filter is more exposed than the exposed region 7 exposed through the filter 5. However, the remaining film ratio after development is increased. As a result, the exposed region 7 exposed through the filter 5 forms a low portion 10, and the exposed region 8 exposed without passing through the filter forms a high portion 11. Therefore, the high / low pattern layer 12 including the high portion 11 and the low portion 10 can be simultaneously formed by the photolithography method using the same material.

  Hereinafter, the manufacturing method of such a high and low pattern layer of the present invention will be described separately for each step.

1. Photosensitive layer forming step First, the photosensitive layer forming step will be described. The photosensitive layer forming step in the present invention is a step of forming a photosensitive layer by applying a photocurable resin composition on a substrate.

  The photo-curable resin composition used in the present invention is not particularly limited as long as it is generally used, but it is particularly in the range of 200 nm to 500 nm, particularly, in the range of 300 nm to 450 nm. It is preferable that a difference occurs in reactivity.

  The difference in reactivity referred to here generally means that a difference occurs in the reaction that can occur when exposed to light in a photocurable resin composition. Since a high / low pattern layer forming body having a low / high pattern layer is manufactured, it means a difference in reactivity that ultimately causes a change in the remaining film ratio of the photosensitive layer in the exposed region.

  Hereinafter, the photosensitive layer formed in this step will be described.

(1) Photosensitive layer The photosensitive layer in this invention is formed by apply | coating a photocurable resin composition on a board | substrate. Thus, the photosensitive layer formed from the photocurable resin composition is cured by exposure, but in the present invention, a filter that absorbs 40% or more of wavelengths in the range of 200 nm to 500 nm is masked. In the exposure process described later, two types of exposure areas are formed, that is, an area exposed through a filter and an area exposed without passing through the filter. Become. In these exposure areas, since the wavelength of light to be exposed differs, the degree of curing varies, so by patterning such a photosensitive layer, high and low pattern layers consisting of high and low parts with different heights Can be formed.

  Hereinafter, the photocurable resin composition for forming such a photosensitive layer will be described.

(Photocurable resin composition)
The photocurable resin composition in the present invention is not particularly limited as long as it has the property of being cured by exposure, but among them, the wavelength is particularly within the range of 200 nm to 500 nm, and particularly within the range of 300 nm to 450 nm. It is preferable that the difference in reactivity is caused by the intensity of light. High and low pattern layers consisting of high and low parts with different heights easily because differences in the degree of curing can be made depending on the presence or absence of a filter that blocks light in the above-mentioned wavelength range used in the exposure process described later. This is because can be formed simultaneously.

  Such a photo-curable resin composition is not particularly limited as long as it is a composition that uses i-line for curing. Specifically, the photo-curable resin composition is represented by JSR Co., Ltd. Optomer NN series and Table 1 below. The photosensitive resin composition of the composition example shown can be mentioned.

  The application method of the photocurable resin composition is not particularly limited as long as it is a method of applying a coating liquid to the entire surface of the substrate, and specifically, spin coating, casting, dipping Coating methods such as a method, a bar coating method, a blade coating method, a roll coating method, a gravure coating method, a flexographic printing method, and a spray coating method are used.

  In the present invention, a photosensitive layer is formed by applying the above-described photocurable resin composition onto a substrate using the above-described coating method.

(2) Substrate In this step, the above-described photocurable resin composition is applied onto a substrate. Such a substrate is not particularly limited as long as it is a material generally used as a substrate for various high and low pattern layer forming bodies, but as a use for the high and low pattern layer forming body in the present invention, a substrate for a liquid crystal display. Therefore, it is preferable that the substrate has transparency. As a material of such a substrate, for example, there is flexibility such as a transparent rigid material having no flexibility such as quartz glass, Pyrex (registered trademark), or a synthetic quartz plate, or a transparent resin film or an optical resin plate. A transparent flexible material or the like can be used.

2. Exposure Step Next, the exposure step will be described. The exposure step in the present invention includes a light-shielding layer that blocks light transmission and an opening formed along the pattern of the high and low pattern layers, and a filter that absorbs a predetermined wavelength at a predetermined ratio, This is a step of exposing the photosensitive layer through the mask using a mask arranged in a part of the opening. For example, as shown in FIG. 1B, a mask 4 having a light shielding layer 3 and an opening 4 and having a filter 5 disposed in a part of the opening 4 is prepared. In this step, the photosensitive layer 2 formed from the photocurable resin composition is exposed.

  The mask used in this process will be described.

(1) Mask The mask in the present invention has a transparent substrate, a light shielding layer that is formed on the transparent substrate and blocks light transmission, and openings that are formed along the pattern of the high and low pattern layers described later. In addition, a filter that absorbs a wavelength within a predetermined range at a predetermined ratio is disposed at a part of the opening. Each member which comprises such a mask in this invention is demonstrated.

(I) Light-shielding layer The light-shielding layer plays a role of hindering the transmission of light in order to prevent light from being irradiated onto a region that becomes an unexposed region of the photosensitive layer during exposure in this step. A material for forming such a light shielding layer is not particularly limited as long as it is a material generally used as a light shielding layer, and a material excellent in light shielding properties is preferably used.

  In the present invention, a metal chromium material can be preferably used. Further, a chromium oxide material may be formed thereon.

  Examples of a method for forming such a light shielding layer include a vacuum evaporation method, a sputtering method, a CVD method, and the like. Among these, it is preferable to form a film by sputtering.

  Moreover, as a method of forming an opening in such a light shielding layer, for example, a resist is stacked on the light shielding layer formed by the above-described coating method on a transparent substrate, and the resist is electron beam or laser or the like. Draw along the pattern of the high and low pattern layer. Thereafter, when the resist is developed, the resist is formed in a pattern. When etching is performed using the resist formed in the pattern, the exposed light shielding layer is etched by removing the resist, and the etched portion becomes an opening.

  In the present invention, since the photosensitive layer described above is a photo-curing type, the opening of the mask formed by the above-described method is formed along the pattern of the high / low pattern layer.

(Ii) Filter The mask according to the present invention is characterized in that a filter is disposed in a part of the opening. Such a filter is not particularly limited as long as it has a property of absorbing a wavelength within a predetermined range at a predetermined ratio. Specifically, the wavelength of light to be absorbed needs to be in the range of 200 nm to 500 nm, and among these, it is preferable to be in the range of 300 nm to 450 nm. Furthermore, the ratio of absorbing wavelengths within the above range is 40% or more. If it is a filter which absorbs the wavelength within the above-mentioned range at the above-mentioned ratio with respect to the light source used when exposing to the photocurable resin composition in the present invention, it is included in the exposed light depending on the presence or absence of the filter. This is because a difference can be made in the wavelength.

  A material for forming such a filter is not particularly limited as long as the material has a property of absorbing the wavelength within the above-described range. Among these, it is preferable that the material has excellent translucency for wavelengths outside the above-described range. Specific examples include films containing color materials such as pigments and dyes, and photosensitive resins containing color materials such as pigments and dyes.

  Furthermore, the method for forming the filter in the present invention is not particularly limited as long as it is a method that can be formed into a thin film using the above-mentioned materials. Specifically, pigments, dyes, and the like are dispersed. Examples thereof include a method of laminating an adhesive film in a necessary region, a method of forming a photosensitive resin containing a coloring material such as a pigment and a dye in a necessary region, and the like.

  Furthermore, in this invention, you may use 2 or more types of filters from which the transmittance | permeability of light differs among the filters which absorb the light of the wavelength within the range mentioned above in the said range. The filters have different light transmittances, which can cause a difference in reactivity in the above-described photo-curable resin composition. As a result, in addition to the presence or absence of filters, the pattern of filters with different light transmittances. Is provided, the low part of the high and low pattern layer formed from the area exposed through the filter can be made into a low part composed of a combination of two or more different heights, and more various heights can be obtained. Therefore, a high and low pattern layer can be formed due to the difference.

  For example, when forming a high and low pattern layer consisting of a high part and one kind of low part depending on the presence or absence of a filter, or by providing two or more filters having different light transmittances in addition to the presence or absence of a filter, When forming a high and low pattern layer having a low portion composed of a combination having different heights, filters having different residual film ratios after development caused by the presence or absence of a filter or different light transmittances were used in advance. In this case, the difference in the remaining film ratio after development can be determined by experiment to adjust the high and low pattern layers.

  FIG. 5 shows the difference in film thickness due to changes in the exposure amount when using two types of yellow filters whose transmittance of light of 200 nm to 500 nm is 10% and 40% and when exposing without passing through the filter. The measured result is shown.

  In addition, a black circle shows the film thickness at the time of exposing without passing through a filter, and the black triangle shows the film thickness at the time of exposing through a yellow filter having a light transmittance of 200% to 500 nm of 40%, The black squares indicate the film thickness when exposed through a yellow filter having a light transmittance of 200% to 500 nm of 10%.

  From the results of FIG. 5, it can be seen that there is a difference in film thickness at each exposure amount due to the presence or absence of the yellow filter and the difference in light transmittance. That is, based on such experimental results, by selecting a filter and an exposure amount that cause a difference in the desired film thickness, a high and low pattern layer composed of a high part and a low part having the desired film thickness and the difference is obtained. Can be formed.

(2) Exposure In this step, pattern exposure is performed on the photosensitive layer through the mask described above. Examples of the light source used at this time include a light source capable of irradiating light capable of curing the photocurable resin composition. Specifically, a light source including ultraviolet light is used. Can be used. Examples of light sources including such ultraviolet light include mercury lamps, metal halide lamps, and xenon lamps. Further, the exposure amount of light at the time of exposure is set to an exposure amount sufficient to cure the portion of the photosensitive layer corresponding to the opening where no filter is disposed.

3. High / Low Pattern Layer Formation Step Next, the high / low pattern layer formation step will be described. The high / low pattern layer forming process in the present invention is a process in which the photosensitive layer exposed by the above-described exposure process is developed, and the photosensitive layer corresponding to the area where the filter is arranged in the opening of the mask becomes a low part. This is a step of forming a pattern layer.

  In the present invention, since the pattern exposure is performed through the mask in which the filter is arranged in a part of the opening during the above-described exposure process, even in the exposure region exposed in the photosensitive layer, the filter There is a difference in reactivity in the photosensitive layer depending on the presence or absence. Accordingly, when such a photosensitive layer is developed in this step, the photosensitive layer in the unexposed area is removed, while the photosensitive layer in the exposed area becomes a high part and a low part having different thicknesses depending on the presence or absence of a filter. A high / low pattern layer comprising a high portion and a low portion is formed. Hereinafter, the high / low pattern layer formed by this process will be described.

(High and low pattern layer)
The high and low pattern layer in the present invention is a layer formed by combining high portions and low portions having different heights in a pattern.

  The high part constituting such a high and low pattern layer is the thickest part of the high and low pattern layer, and in the exposure process described above, the part formed from the photosensitive layer corresponding to the opening without filter is Show. Since the high part is formed from a photosensitive layer that is exposed as it is, the light irradiated from the light source cures more rapidly in the above-described exposure process than the low part described later, and the remaining film ratio after development is higher. It will be the highest.

  On the other hand, the low portion is a portion of the high and low pattern layer excluding the above-described high portion, and means a portion formed from the photosensitive layer corresponding to the opening in which the filter is disposed. Since the light passing through the filter is exposed in the low part, the curing proceeds more slowly in the above-described exposure process than the high part, and the remaining film ratio after development is lower than the high part. is there. Such a low part may be a low part having a uniform height, or may be a low part composed of a combination of a plurality of different heights. That is, in the above-described mask, when a filter having the same light transmittance is arranged in a part of the opening, a low portion having a uniform height is formed, but the light transmittance is low. This is because when two or more different types of filters are used, a difference in height of two or more types occurs in the low part. Such a low part is selected according to the use of the high and low pattern layer formation body.

  Such a difference in film thickness between the high part and the low part, and each film thickness are determined according to the use of the high and low pattern layer forming body.

  The developer used in this step is determined according to the photocurable resin composition used. Specific examples include an aqueous potassium hydroxide solution, an aqueous sodium carbonate solution, an aqueous sodium bicarbonate solution, and an aqueous TMAH solution. In addition, when the photocurable resin composition is formed on a member other than the substrate, it is necessary to use a developer that does not dissolve such a member.

4). Next, the high / low pattern layer formed body obtained by the method for producing a high / low pattern layer formed body of the present invention will be described. The high / low pattern layer formed body in the present invention includes a substrate and a high / low pattern layer formed on the substrate and formed by combining patterns having different heights.

  The use of such a high and low pattern layer formed body is not particularly limited as long as it is made of the same material and has members having different heights. Specifically, a liquid crystal display substrate can be mentioned.

  Note that the liquid crystal display substrate referred to here is a liquid crystal display having a liquid crystal layer sandwiched therein. For example, a color filter side substrate having a color filter, an array side substrate having a thin film transistor, etc. Includes an on-chip type substrate in which a color filter is directly formed on a thin film transistor.

  In the present invention, among liquid crystal display substrates, a monochrome liquid crystal display substrate and an MVA mode liquid crystal display are preferable.

  In a monochrome liquid crystal display substrate, pixel spacers located in the pixel portion that is the display area of the monochrome liquid crystal display and outer peripheral spacers located in the outer periphery that are outside the display area of the monochrome liquid crystal display are formed with different heights. In such a case, by utilizing the high and low pattern layer in the present invention for the pixel spacer and the outer peripheral spacer, the pixel spacer and the outer peripheral spacer can be formed at the same time using the same material. Can be improved.

  On the other hand, in the MVA mode liquid crystal display, alignment control protrusions for controlling the alignment of liquid crystals and MVA columnar spacers for maintaining a constant distance from the counter substrate are formed in the same material with different patterns and different heights. Therefore, it is advantageous in terms of manufacturing efficiency to make such orientation control protrusions and MVA columnar spacers as high and low pattern layers.

  Hereinafter, a method for manufacturing a monochrome liquid crystal display substrate and a method for manufacturing an MVA mode liquid crystal display will be described.

B. Manufacturing method of substrate for monochrome liquid crystal display The manufacturing method of a substrate for monochrome liquid crystal display of the present invention is a manufacturing method of a substrate for monochrome liquid crystal display using the manufacturing method of the above-described high / low pattern layer forming body, Is a pixel spacer located in the display area of the monochrome liquid crystal display and a peripheral spacer located outside the display area of the monochrome liquid crystal display,
A substrate preparing step of preparing a substrate having a black matrix formed in a pattern and a protective layer formed so as to cover the black matrix formed in the pattern;
A photosensitive layer forming step of applying a photocurable resin composition on the substrate to form a photosensitive layer;
A light-shielding layer that blocks light transmission, a pixel opening formed along the pattern of the pixel spacer, and an outer peripheral opening formed along the pattern of the outer spacer, and within a range of 200 nm to 500 nm An exposure step of exposing the photosensitive layer through the mask using a mask that absorbs at least 40% of the wavelength of at least a mask disposed in the outer peripheral opening;
By developing the exposed photosensitive layer, a pixel spacer formed on a protective layer in a region where the black matrix is formed and located in a pixel portion which is a display region of a monochrome liquid crystal display, and a display on the liquid crystal display And a columnar spacer forming step of forming a columnar spacer including an outer peripheral spacer located at an outer peripheral portion that is outside the region.

  In the present invention, since the filter having the property of absorbing the wavelength within the above-described range within the above range is disposed at least in the outer peripheral opening of the mask, the pixel spacer and the outer periphery having different heights using the same material. It is possible to form the spacers simultaneously. As a result, it is possible to avoid the influence due to the difference in film thickness between the outer peripheral part and the pixel part of the protective layer caused by the difference in the line width of the black matrix in the outer peripheral part and the pixel part. In the substrate, the difference between the height from the substrate surface to the outer peripheral spacer upper end surface and the height from the substrate surface to the pixel spacer upper end surface can be adjusted within a suitable range. Therefore, when the counter substrate is disposed on such a monochrome liquid crystal display substrate, the counter substrate is prevented from being distorted so that the gap is widened toward the outer peripheral portion, and light is leaked from the periphery of the counter substrate. It becomes difficult. This can solve the problem that the periphery of the screen becomes unnaturally bright in the monochrome liquid crystal display.

  Hereinafter, a substrate for a monochrome display device of the present invention will be described with reference to the drawings. FIG. 2 is a process diagram showing an example of a method for manufacturing a substrate for a monochrome display device of the present invention.

  First, as shown in FIG. 2A, a black matrix 12 for separating pixels is formed in a pattern on a transparent substrate 30 of a monochrome liquid crystal device substrate. The black matrix 12 includes a pixel black matrix 12a formed in the pixel portion A which is a display area of the monochrome liquid crystal display, and an outer peripheral black matrix 12b formed in the outer periphery B which is outside the display area. Are formed differently. Specifically, the pixel black matrix 12a is formed with a narrow line width in order to prevent a reduction in the aperture ratio of the display area, while the outer peripheral black matrix 12b has a wide line width to shield light from the light source. Form.

  Next, on the transparent substrate 30 of the monochrome liquid crystal display substrate on which such a black matrix 12 is formed, members such as the black matrix 12 are protected as shown in FIG. In order to impart flatness, a protective layer 13 is formed so as to cover the surface of the black matrix 12. In such a protective layer 13, a difference in film thickness on each black matrix 12 occurs due to a difference in line width between the pixel black matrix 12a and the peripheral black matrix 12b. That is, since the pixel black matrix 12a has a narrow line width, the protective layer 13 stacked on the upper surface of the pixel black matrix 12a tends to be thin. On the other hand, since the outer peripheral black matrix 12b is formed with a line width sufficient for the protective layer 13 to be stacked, the film thickness of the protective layer 13 stacked on the upper surface of the outer peripheral black matrix 12b is that of the upper surface of the pixel black matrix 12a. This is because it becomes thicker than the film thickness of the protective layer 13.

  Further, as shown in FIG. 2C, the photosensitive layer 14 is formed on the protective layer 13. Next, a mask 16 used for patterning the photosensitive layer 14 is prepared. The mask 16 includes a light shielding layer 17, a pixel opening 18a corresponding to a position where the pixel spacer is formed, and an outer peripheral opening 18b corresponding to a position where the outer spacer is formed. Furthermore, a filter 19 having a property of absorbing a predetermined range of wavelengths within a predetermined range is disposed in the outer peripheral opening 18b. The photosensitive layer 14 is subjected to pattern exposure through such a mask 16 as shown in FIG. In the present invention, since the filter 19 is disposed in the outer peripheral opening 18b of the mask 16, the portion of the photosensitive layer 14 corresponding to the outer peripheral opening 18b has a predetermined ratio of wavelengths within a predetermined range by the filter 19. Since the absorbed light is exposed, curing proceeds more slowly than the portion of the photosensitive layer 14 corresponding to the pixel opening 18a.

  When the pattern-exposed photosensitive layer 14 is developed and washed, as shown in FIG. 2E, the portion of the photosensitive layer 14 that has become an unexposed area is removed by the light-shielding layer 17 of the mask 16, and the pixel opening portion is removed. The portion of the photosensitive layer 14 that becomes the exposure region by the outer peripheral opening 18b remains. Thereby, the pixel spacer 20a located in the pixel portion A and the outer peripheral spacer 20b located in the outer peripheral portion B are formed on the protective layer 13 in the region where the black matrix 12 is formed. Furthermore, in the present invention, since the pattern exposure is performed by arranging the filter 19 having the property of absorbing a predetermined ratio of wavelengths within a predetermined range only in the outer peripheral opening 18b, the outer peripheral spacer 20b is more preferable. The film thickness is smaller than that of the pixel spacer 20a. As a result, a monochrome liquid crystal display substrate that can eliminate the influence of the difference in film thickness between the pixel portion A and the outer peripheral portion B of the protective layer 13 is obtained.

  Finally, as shown in FIG. 2F, when the counter substrate 21 is bonded to such a monochrome liquid crystal display substrate, in the present invention, the height from the surface of the transparent substrate 30 to the upper end surface of the pixel spacer 20a is In addition, since the substrate from the surface of the transparent substrate 30 to the upper end surface of the outer peripheral spacer 20b can be a uniform monochrome liquid crystal display substrate, no adverse distortion occurs in the counter substrate 21, and the light source Since there is no possibility of light from leaking from the periphery of the counter substrate 21 or the like, the problem that the periphery of the display screen becomes unnaturally bright can be solved.

  Here, the “pixel portion” means a portion that becomes a display area where monochrome display is actually performed when a monochrome liquid crystal display is formed using the monochrome liquid crystal display substrate of the present invention. Further, the “outer peripheral part” means a part located around the pixel part and corresponding to the outside of the display area described above.

  Hereinafter, the manufacturing method of the substrate for a monochrome display device of the present invention having such advantages will be described for each step.

1. Substrate Preparation Step First, the substrate preparation step will be described. The substrate preparation step in the present invention is a step of preparing a substrate having a black matrix formed in a pattern and a protective layer formed so as to cover the black matrix formed in the pattern.

  Hereinafter, the black matrix, the protective layer, and the substrate will be described.

(1) Black matrix The black matrix used in the present invention is provided to classify pixels on which monochrome display is performed according to the orientation of liquid crystal molecules. The method for producing such a black matrix is not particularly limited. For example, a thin metal film such as chromium having a thickness of about 1000 to 2000 mm is formed by sputtering, vacuum deposition, or the like, and this thin film is patterned. And the like.

  In such a black matrix, the pixel portion is formed with a narrow line width in order to increase the aperture ratio of the display region. On the other hand, the outer peripheral portion is provided wider than the black matrix of the pixel portion in order to effectively shield light from a light source such as a backlight. Specifically, the line width of the black matrix provided in the pixel portion is generally in the range of 6 μm to 20 μm, while the line width of the black matrix in the outer peripheral portion is in the range of 2 mm to 10 mm.

  The black matrix may contain light-shielding particles such as carbon fine particles, metal oxides, inorganic pigments, and organic pigments in a resin binder. The resin binder used may be polyimide resin, acrylic resin, epoxy A resin, polyacrylamide, polyvinyl alcohol, gelatin, casein, cellulose, or a mixture of one or more resins, a photosensitive resin, and an O / W emulsion type resin composition such as reactive silicone. An emulsion or the like can be used. As a method for patterning such a resinous black matrix, a generally used method such as a photolithography method or a printing method can be used.

(2) Protective layer The protective layer in the present invention is provided to protect these members and to impart flatness to the substrate surface of the monochrome liquid crystal display substrate in the substrate on which the above-described black matrix or the like is formed. It is what

  As a material for forming such a protective layer, acrylic resin, ethylene-vinyl acetate copolymer, ethylene-vinyl chloride copolymer, ethylene vinyl copolymer, polystyrene, acrylonitrile-styrene copolymer, ABS resin, poly Methacrylic acid resin, ethylene methacrylic acid resin, polyvinyl chloride resin, chlorinated vinyl chloride, polyvinyl alcohol, cellulose acetate propionate, cellulose acetate butyrate, nylon 6, nylon 66, nylon 12, polyethylene terephthalate, polybutylene terephthalate, polycarbonate , Polyvinyl acetal, polyether ether ketone, polyether sulfone, polyphenylene sulfide, polyarylate, polyvinyl butyral, epoxy resin, phenoxy resin, poly Resins, polyamideimide resins, polyamic acid resins, polyetherimide resins, phenol resins, urea resins, and the like, and polymerizable monomers such as methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n- Propyl methacrylate, isopropyl acrylate, isopropyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, tert-butyl acrylate, tert-butyl methacrylate, n-pentyl acrylate, n-pentyl methacrylate, n-hexyl acrylate, n-hexyl methacrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, n-octyl One or more of acrylate, n-octyl methacrylate, n-decyl acrylate, n-decyl methacrylate, styrene, α-methylstyrene, N-vinyl-2-pyrrolidone, glycidyl (meth) acrylate, acrylic acid, methacrylic acid, acrylic acid A polymer or copolymer comprising at least one of dimer (for example, M-5600 manufactured by Toa Synthetic Chemical Co., Ltd.), itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl acetic acid, and acid anhydrides thereof. Examples include photosensitive resin compositions containing two or more species. Among them, a photosensitive resin composition using an acrylic resin is preferable from the viewpoint of flatness required as a protective layer.

  Further, the thickness of the protective layer is not particularly limited as long as it can provide flatness on the substrate. Specifically, the thickness is within a range of 0.3 μm to 10 μm, and among them, It is preferably within a range of 0.7 μm to 2 μm.

  As a method of forming such a protective layer, it can be formed by a known coating method, spin coating method, casting method, dipping method, bar coating method, blade coating method, roll coating method, gravure coating method, Examples of the application method include a flexographic printing method and a spray coating method.

  Note that the difference in film thickness between the pixel portion and the outer peripheral portion of the protective layer laminated on the black matrix varies depending on the difference in line width in both portions of the actually formed black matrix and the material forming the protective layer. However, in general, it is often in the range of 0 μm to 0.5 μm.

(3) Substrate The substrate of the monochrome liquid crystal display substrate in the present invention is for mounting other constituent members. Examples of such a substrate include a glass substrate, a glass film, a synthetic resin substrate, and a synthetic resin film. It is preferable that it is excellent in translucency.

2. Photosensitive layer forming step Next, the photosensitive layer forming step will be described. The photosensitive layer forming step in the present invention is a step of forming a photosensitive layer by applying a photocurable resin composition onto the substrate. Specifically, as shown in FIG. 2C, a transparent substrate having a black matrix 12 formed in a pattern and a protective layer 13 formed on the transparent substrate 30 so as to cover the black matrix 12. 30 is a step of forming a photosensitive layer 14 by applying a photocurable resin composition on the protective layer 13.

  The photosensitive layer formed in this step is formed into a pattern in a columnar spacer forming step, which will be described later, thereby becoming a pixel spacer and an outer peripheral spacer that keep a constant gap between the monochrome liquid crystal display substrate and the counter substrate. Is a layer. Further, in the present invention, since the photosensitive layer is patterned by using the above-described method for producing a high / low pattern layer forming body, pixel spacers and outer peripheral spacers having different heights are simultaneously formed using the same material. be able to.

  In addition, since it is the same as that described in the above-mentioned "A. Manufacturing method of high and low pattern layer formation body, 1. Photosensitive layer formation process" about this process, description here is abbreviate | omitted.

3. Exposure Step Next, the exposure step will be described. The exposure process in the present invention includes a light shielding layer that blocks light transmission, a pixel opening formed along the pixel spacer pattern, and an outer peripheral opening formed along the outer spacer pattern. In addition, a filter that absorbs 40% or more of a wavelength in the range of 200 nm to 500 nm, preferably in the range of 300 nm to 450 nm, is used at least through the mask, and the above- This is a step of exposing the photosensitive layer.

  In addition, the outer periphery opening part here means the part from which the light shielding layer was removed along the pattern of an outer periphery spacer. Since the outer peripheral spacer is a columnar spacer located in the outer peripheral portion, the outer peripheral opening is also formed in a portion corresponding to the outer peripheral portion of the mask. Furthermore, the pixel opening here means a portion where the light shielding layer is removed along the pattern of the pixel spacer. Since the pixel spacer is a columnar spacer located in the pixel portion, the pixel opening is also formed in a portion corresponding to the pixel portion of the mask.

  In the present invention, the difference in film thickness between the outer peripheral portion of the protective layer and the pixel portion caused by the difference in line width between the outer peripheral portion of the black matrix and the pixel portion is provided by providing the outer peripheral spacer and the pixel spacer having different heights. It will be solved. That is, the thickness of the protective layer tends to be thicker at the outer peripheral portion than the pixel portion. Therefore, in order to eliminate such a difference in the thickness of the protective layer, the outer peripheral spacer is made lower than the pixel spacer. Need to form.

  Therefore, in the present invention, in the above-described high and low pattern layer, the above-described filter is disposed in the peripheral opening of the mask formed in the pattern of the peripheral spacer in order to use the low part as the peripheral spacer and the high part as the pixel spacer. ing. As a result, the portion that can be the outer peripheral spacer of the photosensitive layer is exposed to light that has passed through the filter, so that the curing proceeds more slowly than the portion that can be the pixel spacer of the photosensitive layer that is exposed without passing through the filter, In a columnar spacer forming step described later, the remaining film ratio after development is lowered.

  In addition, since the thing regarding this process is the same as having described in "A. Manufacturing method of high and low pattern layer formation body, 2. Exposure process" mentioned above, description here is abbreviate | omitted.

4). Columnar Spacer Forming Step Finally, the columnar spacer forming step will be described. In the present invention, the columnar spacer forming step is performed by developing the exposed photosensitive layer to position a pixel portion which is a display region of a monochrome liquid crystal display on the protective layer in the region where the black matrix is formed. This is a step of forming a columnar spacer composed of pixel spacers to be formed and outer peripheral spacers located on the outer peripheral portion outside the display area of the monochrome liquid crystal display.

(Columnar spacer)
The columnar spacer in the present invention is provided between two substrates sandwiching a liquid crystal layer therein, and is provided in order to keep a constant gap between the two substrates. In such a columnar spacer, in the present invention, the columnar spacer disposed in the pixel portion corresponding to the display area of the monochrome liquid crystal display is defined as the pixel spacer, and the columnar spacer disposed in the outer peripheral portion corresponding to the outside of the display area is defined as the outer peripheral spacer. It is said.

  In the present invention, such pixel spacers and outer peripheral spacers can be simultaneously formed by photolithography using the same material so as to have different heights.

  That is, in the exposure process described above, since a mask having a property of absorbing a wavelength within a predetermined range within a predetermined range is used at least at the outer peripheral opening, photocuring is performed with or without the filter. It is possible to make a difference in the degree of curing of the mold resin composition. Thereby, the pixel spacer can be formed thicker than the outer peripheral spacer.

  In addition, the height relationship between the pixel spacer and the outer peripheral spacer is such that when the opposing substrate is bonded to the monochrome liquid crystal display substrate, the height of the pixel spacer is such that no undesirable distortion occurs between the two substrates. There is no particular limitation as long as it is higher than the height of the outer peripheral spacer. This is because the thickness of the protective layer is smaller in the pixel portion than in the outer peripheral portion because of the difference in width between the pixel portion and the outer peripheral portion of the black matrix. This is because such a difference in film thickness of the protective layer can be corrected by the columnar spacer.

  Specifically, the difference in height between the pixel spacer and the outer peripheral spacer is adjusted according to the difference in film thickness between the pixel portion and the outer peripheral portion of the protective layer formed on the black matrix. For example, when the protective layer is formed, the state of the monochrome liquid crystal display substrate is grasped by measuring the difference in the thickness of the protective layer or performing a simulation, and the pixel spacers and the outer periphery are determined according to the state. Adjust the height difference of the spacer. Furthermore, in order to make the difference in height between the pixel spacer and the outer peripheral spacer a desired difference, a monochromatic liquid crystal can be obtained by measuring the remaining film ratio of the photosensitive layer according to changes in the filter and exposure amount by experiment. This is made possible by determining a filter and an exposure amount suitable for the state of the display substrate.

  Further, the difference in height between the pixel spacer and the outer peripheral spacer is adjusted in accordance with the difference in film thickness between the outer peripheral portion of the protective layer and the pixel portion. When defined based on the difference in the thickness of the protective layer, the height of the pixel spacer itself is preferably higher than the height of the outer peripheral spacer itself within a range of 0 μm to 1.3 μm, and among them, 0.5 μm to 1 It is preferable that the thickness is high within a range of 1 μm. If the pixel spacer and the outer peripheral spacer can be formed with a difference in height within the above range, the height from the substrate surface of the monochrome liquid crystal display substrate to the upper surface of the pixel spacer can be determined from the same substrate surface to the upper surface of the outer peripheral spacer of the substrate. Since the height can be higher in the range of 0 μm to 0.8 μm, the two substrates can be arranged with a highly uniform gap without causing any adverse distortion in the counter substrate. Because you can.

  Further, the height of the pixel spacer itself is not particularly limited as long as it is a height used in a general monochrome liquid crystal display, and specifically, it is in a range of 2.5 μm to 5.5 μm. Is preferred.

  Furthermore, the shape of the columnar spacer in the present invention is not particularly limited as long as it is a shape that can keep a gap between two substrates constant. Specifically, a cylindrical shape, a prismatic shape, a truncated cone shape, or the like can be given.

C. Manufacturing Method of MVA Mode Liquid Crystal Display Next, a manufacturing method of the MVA mode liquid crystal display will be described. The manufacturing method of the MVA mode liquid crystal display of the present invention is a manufacturing method of an MVA mode liquid crystal display using the above-described manufacturing method of the high and low pattern layer forming body,
The high and low pattern layers are alignment control protrusions and MVA columnar spacers used in the MVA mode liquid crystal display,
The mask includes a light shielding layer that blocks light transmission, a first opening formed along the pattern of the alignment control protrusion, and a second opening formed along the pattern of the columnar spacer for MVA. And the filter is disposed at least in the first opening.

  In the present invention, the alignment control protrusions and the MVA columnar spacers used in the MVA mode liquid crystal display can be simultaneously manufactured using the same material by the photolithography method.

  The manufacturing method of the MVA mode liquid crystal display mode liquid crystal display of the present invention having such advantages will be specifically described with reference to the drawings.

  FIG. 3 is a process diagram showing an example of a method for manufacturing an MVA mode liquid crystal display of the present invention. First, as shown in FIG. 3A, a photocurable resin composition is applied on a transparent substrate 31 to form a photosensitive layer 32. Next, as shown in FIG. 3B, along the light shielding layer 33 that blocks light transmission, the first openings 34a formed along the pattern of the alignment control protrusions, and the pattern of the MVA columnar spacers. A mask 36 having a second opening 34b formed and having a filter 35 having a property of absorbing a wavelength within a predetermined range in a predetermined range is prepared in the first opening 34a. The photosensitive layer 32 is exposed through the mask 36. Thereby, a pattern based on the presence or absence of the filter 35 can be formed in the photosensitive layer 32 by the first opening 34 a and the second opening 34 b. Next, by developing and washing the exposed photosensitive layer 32, as shown in FIG. 3C, the unexposed region of the photosensitive layer 32 where light transmission is blocked by the light shielding layer 33 is removed. The portion of the photosensitive layer 32 that has become an exposure region by the first opening 34a and the second opening 34b remains. Further, in the present invention, since the filter 35 is disposed in the first opening 34a, the exposure area corresponding to the first opening 34a is the second opening even in the exposure area. The degree of curing is lower than that of the exposure area corresponding to the portion 34b. Therefore, as shown in FIG. 3C, the exposure area corresponding to the first opening 34a becomes the orientation control protrusion 37, and the second opening. The exposure area corresponding to the portion 34b becomes the MVA columnar spacer 38. In addition, the orientation control protrusion is formed thinner than the MVA columnar spacer.

  Hereinafter, the manufacturing method of the MVA mode liquid crystal display of the present invention will be described separately for each step.

1. Photosensitive layer forming step The photosensitive layer forming step in the present invention is a step of forming a photosensitive layer by applying a photocurable resin composition on a substrate.

  Since this step is the same as the above-described “A. Manufacturing method of high / low pattern layer formed body, 1. Photosensitive layer forming step”, description thereof is omitted here.

2. Exposure Step Next, the exposure step in the present invention is formed along the pattern of the light shielding layer that blocks light transmission, the first opening formed along the pattern of the alignment control protrusion, and the pattern of the MVA columnar spacer. A filter that has a second opening and absorbs 40% or more of a wavelength in the range of 200 nm to 500 nm using at least a mask disposed in the first opening, and the photosensitive layer through the mask. Is a step of exposing the film.

  In addition, the 1st opening part here means the part from which the light shielding layer was removed along the pattern of orientation control protrusion. Furthermore, the 2nd opening part here means the part from which the light shielding layer was removed along the pattern of the columnar spacer for MVA.

  In the present invention, in the above-described high and low pattern layer, the first portion of the mask formed in the pattern of the alignment control protrusion is described above so that the low portion becomes the alignment control protrusion and the high portion becomes the columnar spacer for MVA. A filter is placed. As a result, the light that has passed through the filter is exposed in the portion that can be the alignment control protrusion of the photosensitive layer, and therefore the curing is slower than the portion that can be the columnar spacer for MVA of the photosensitive layer that is exposed without passing through the filter. This progresses, and in the MVA columnar spacer forming step, which will be described later, the remaining film ratio after development is lowered.

  In addition, since the thing regarding this process is the same as having described in "A. Manufacturing method of high and low pattern layer formation body, 2. Exposure process" mentioned above, description here is abbreviate | omitted.

3. Orientation Control Protrusion and MVA Columnar Spacer Forming Process Finally, the alignment control protrusion and MVA columnar spacer formation process will be described. The alignment control protrusion and MVA columnar spacer forming step in the present invention is a step of forming the alignment control protrusion and the MVA columnar spacer by developing the exposed photosensitive layer by the exposure process described above.

  The alignment control protrusions and MVA columnar spacers formed in this step will be described.

(1) Alignment control protrusion The alignment control protrusion in the present invention means a protrusion that controls the alignment of the liquid crystal layer. Since the liquid crystal molecules in contact with the alignment control protrusion are aligned in a direction perpendicular to the contact surface with the alignment control protrusion, when the voltage is applied to the liquid crystal layer, the inclined liquid crystal molecules in the vicinity of the protrusion start from the liquid crystal molecule. As a result, each liquid crystal molecule can be aligned in a predetermined direction. Accordingly, the alignment direction of the liquid crystal can be symmetrically aligned at an angle inclined by 180 degrees when viewed in the horizontal direction and inclined in the vertical direction with the apex of the alignment control protrusion as a boundary. Then, by setting two adjacent areas as one set, and further displaying a single pixel by combining a plurality of these combinations, the observer is always the same even if the viewing angle of the observer is changed in the vertical direction of the orientation control protrusion. It becomes possible to see the image. That is, a wide viewing angle can be secured. The alignment control protrusion is preferably linear (particularly zigzag line), but is not limited to this, and may be dotted.

  In the present invention, such alignment control protrusions are manufactured using the same material as the MVA column spacers described later, and at the same time so that the MVA column spacers are thicker than the alignment control protrusions. It is characterized by this.

  The height of the alignment control protrusion is not particularly limited as long as it is lower than a columnar spacer for MVA described later, but is preferably 0.5 to 2 μm.

  Further, in the present invention, it is preferable that such orientation control protrusions are provided in a zigzag line shape that is refracted by 90 degrees at predetermined intervals, and each zigzag line is formed in a stripe shape parallel to each other. . This is because a completely symmetrical viewing angle characteristic can be obtained not only in the vertical direction of the alignment control protrusion line but also in all directions of up, down, left and right. That is, the orientation of liquid crystal molecules having symmetry of 180 degrees in the horizontal direction differs by 90 degrees between two regions adjacent to each other at the refraction angle of 90 degrees of the alignment control protrusion line. For this reason, it is divided into four regions with the refraction angle and the alignment control projection as a boundary, and the orientation angle of the major axis of the liquid crystal molecules is horizontal between the four regions and the center axis of the zigzag line. It is oriented in four directions with an angle of 45 degrees and an inclined angle in the vertical direction. In this way, one pixel can be displayed by being divided into four at symmetrical angles, so that the observer can always see the same image in all directions, up, down, left, and right.

(2) Columnar spacer for MVA Next, the columnar spacer for MVA will be described. The column spacer for MVA in the present invention is provided in order to regulate the thickness of the liquid crystal layer while keeping the distance between the liquid crystal layers held between two substrates uniform.

  In the present invention, such an MVA columnar spacer is made of the same material as the above-described alignment control protrusion, and the thickness of the MVA columnar spacer is larger than that of the alignment control protrusion. It is manufactured by a photolithography method.

  The MVA columnar spacer is not limited at any position as long as it does not adversely affect the luminance of the liquid crystal display, but is preferably provided at a position overlapping the alignment control protrusion. This is because the selection range of the size of the columnar spacer for MVA can be expanded without reducing the luminance of the liquid crystal display. Note that the MVA columnar spacer may protrude slightly from the alignment control protrusion or may be provided narrower than the alignment control protrusion as long as it overlaps the alignment control protrusion. Further, when the alignment control protrusion is formed in a zigzag shape, it may be provided in a zigzag refracting portion or in a straight line portion other than the refracting portion, and is not particularly limited. Further, the MVA columnar spacer and the alignment control protrusion described above may be colored or transparent, and are not particularly limited.

  When the MVA columnar spacer is provided so as to overlap with the alignment control protrusion, the MVA columnar spacer is provided so as to coincide with the refracting portion (vertex) of the zigzag line among the portions overlapping with the alignment control protrusion. It is preferable. When a voltage is applied, liquid crystal molecules that have fallen from two directions approach each other on the line connecting the refracting portions, so that they have an orientation direction close to vertical and the translucency is significantly reduced. For this reason, the vicinity of the line connecting the refracting portions is always dark, and by disposing the MVA columnar spacer at such a position, the inconvenience caused by both can be integrated into one place. That is, by forming the MVA columnar spacer on the alignment control protrusion, it is possible to prevent any influence on the alignment of the liquid crystal. In addition, when the alignment control protrusion is formed of a transparent material, the MVA columnar spacer may be observed as a black dot during white display if a spacer other than the refractive portion is formed even on the alignment control protrusion. However, there is an advantage that such an inconvenience can be prevented by forming the columnar spacer for MVA on the refracting portion.

  The height of such a column spacer for MVA is preferably in the range of 1 to 10 μm, more preferably in the range of 2 to 10 μm, and further preferably in the range of 1 to 8 μm. .

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. Are included in the technical scope.

  The following examples further illustrate the invention.

[Example]
A 5 μm film was formed on the substrate by spin coating using an Optmer NN series manufactured by JCR Co., Ltd. as a material for forming a high and low pattern layer. This film was exposed at 20 to 100 mJ / cm using a photomask having a filter having a property of transmitting 10% and 40% of a wavelength in the range of 200 nm to 500 nm through a gap of 100 μm. This was developed with 0.05 wt% KOH aqueous solution for 60 seconds. Thereafter, baking was performed at 230 ° C. for 30 seconds, so that a high and low pattern layer composed of high and low portions having different heights as shown in FIG. 5 could be simultaneously formed using the same material.

DESCRIPTION OF SYMBOLS 1 ... Board | substrate 2 ... Photosensitive layer 3 ... Light-shielding layer 4 ... Opening part 5 ... Filter 6 ... Mask 7, 8 ... Exposed area 9 ... Unexposed area 10 ... Low part 11 ... High part

Claims (2)

A substrate, a patterned black matrix formed on the pixel portion and the outer peripheral portion on the substrate, a protective layer formed so as to cover the black matrix, and a pixel formed on the pixel portion on the protective layer A method for manufacturing a monochrome liquid crystal display substrate having a spacer and a columnar spacer formed of an outer peripheral spacer formed on an outer peripheral portion, and a counter substrate, and having no colored layer ,
A substrate preparation step of preparing a substrate having a black matrix formed in a pattern on a pixel portion and an outer peripheral portion on the substrate, and a protective layer formed so as to cover the black matrix;
A photosensitive layer forming step of applying a photocurable resin composition on the substrate to form a photosensitive layer;
An exposure step of exposing the photosensitive layer through a mask ;
A columnar spacer forming step of simultaneously forming columnar spacers composed of the pixel spacers and the outer peripheral spacers on the protective layer in a region where the black matrix is formed by developing the exposed photosensitive layer; Have
The height of the pixel spacer formed in the pixel portion is higher than the height of the outer peripheral spacer formed in the outer peripheral portion,
The mask has a light shielding layer that blocks light transmission, a pixel opening formed along the pattern of the pixel spacer, and an outer peripheral opening formed along the pattern of the outer spacer, A method for manufacturing a substrate for a monochrome liquid crystal display, wherein a filter that absorbs 40% or more of a wavelength within a range of 500 nm is disposed at least in the outer peripheral opening .   The method for producing a substrate for a monochrome liquid crystal display according to claim 1, wherein the photocurable resin composition has different reactivity depending on light intensity within a range of 200 nm to 500 nm.

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