JP5216634B2 - Automatic analyzer - Google Patents

Description

  The present invention relates to an automatic analyzer for analyzing components contained in a liquid, and more particularly to an automatic analyzer having a cleaning function.

  The automatic analyzer is intended for biochemical test items, immunological test items, etc., and changes in color and turbidity caused by the reaction of the mixture of the test sample collected from the sample and the reagent of each test item are measured with a spectrophotometer. Optical data is measured by a photometric unit such as a turbidimeter or an nephelometer, thereby generating analysis data represented by concentrations of various test item components in the test sample, enzyme activities, and the like.

  In this automatic analyzer, an inspection target item selected from a large number of inspection items is analyzed for each test sample. In order to perform the analysis, the test sample is dispensed from the sample container to the reaction container with the sample dispensing probe, and the reagent for each test item is dispensed from the reagent container to the reaction container with the reagent dispensing probe. Next, the test sample and reagent mixture dispensed in the reaction vessel are stirred with a stirrer and then measured with a photometric unit. Further, after washing the sample and reagent dispensing probe in contact with the test sample and reagent, the stirrer and the reaction container in contact with the mixed solution, the sample is repeatedly used for measurement.

  However, in an automatic analyzer that measures a large number of test samples over a wide range of items, it can be used for substances and reagents such as proteins, lipids, etc. contained in the test sample that cannot be removed by washing at the end of the measurement of the mixed solution during measurement. Substances such as latex contained in the reaction container and reaction product substances of the test sample and reagent may remain in the reaction container, adversely affecting the measurement of the mixed solution, and the analysis data generated by the measurement may be deteriorated.

  In order to remove this residual substance from the reaction vessel, an automatic analyzer that can perform cleaning by supplying an alkaline cleaning solution, an acidic cleaning solution, or the like into the reaction vessel every time the measurement of the mixed solution is known (for example, patents) Reference 1).

  However, since it is necessary to clean the inside of the reaction vessel in a short time, if the test item is analysis of trace components such as protein in urine, a trace amount of residual material that can be ignored by normal test items adversely affects the analysis data. There is a problem that gives.

  An automatic analyzer that cleans the reaction container by irradiating ultrasonic waves from the outside of the reaction container with a great effect on the cleaning is known (see, for example, Patent Document 2).

JP-A-6-160398 JP 2004-279289 A

  However, in the cleaning method of Patent Document 2, a large cleaning effect can be obtained in a short time, but if the reaction container is irradiated with ultrasonic waves from the outside to clean the reaction container, strong ultrasonic waves are applied to the reaction container. Irradiation is necessary. For this reason, there is a problem that the outer surface of the reaction vessel deteriorates due to excessive ultrasonic waves.

  The present invention has been made to solve the above-described problems, and an object of the present invention is to provide an automatic analyzer that can prevent the reaction vessel from being deteriorated and can strongly wash the inside of the reaction vessel.

  In order to achieve the above object, the automatic analyzer of the present invention is arranged so as to be able to enter the reaction vessel in an automatic analyzer that dispenses a sample and a reagent into a reaction vessel and measures a mixed solution thereof. A washing nozzle having a low-pressure channel and a high-pressure channel joining the low-pressure channel, and a washing liquid for washing the reaction vessel into the low-pressure channel of the washing nozzle that has entered the reaction vessel at a low pressure A reaction vessel cleaning means having a low pressure pump to be supplied and a high pressure pump for supplying the cleaning liquid to the high pressure channel at a pressure higher than the low pressure, the reaction vessel cleaning means having the low pressure pump and the high pressure pump. The reaction vessel is cleaned using the cleaning liquid from the high-pressure channel joined to the cleaning liquid flowing through the low-pressure channel by supply from a pump.

  According to the present invention, a low-pressure pump that supplies cleaning liquid at a low pressure and a high-pressure pump that supplies high pressure higher than the low pressure, and a cleaning nozzle that generates bubbles by cavitation from the cleaning liquid supplied from each pump are provided, The reaction vessel can be cleaned using a cleaning liquid containing bubbles generated by cavitation supplied from the cleaning nozzle. Thereby, since excessive cleaning power is not required, deterioration of the reaction vessel can be prevented. In addition, it is possible to powerfully clean the inside of the reaction vessel, and it is possible to prevent the analysis data from deteriorating.

The block diagram which shows the structure of the automatic analyzer which concerns on the Example of this invention. The perspective view which shows the structure of the analysis part which concerns on the Example of this invention. The figure which shows the structure of the reaction container washing | cleaning part which concerns on the Example of this invention. The figure which shows the structure of the 1st washing | cleaning nozzle unit which concerns on the Example of this invention. The figure which shows the structure of the 2nd washing | cleaning nozzle unit which concerns on the Example of this invention. The figure which shows the structure of the 3rd washing nozzle unit which concerns on the Example of this invention.

  Examples of the present invention will be described below.

  Hereinafter, an embodiment of an automatic analyzer according to the present invention will be described with reference to FIGS.

  FIG. 1 is a block diagram showing a configuration of an automatic analyzer according to an embodiment of the present invention. This automatic analyzer 100 measures a standard sample of each test item or a test sample collected from a sample and a reagent corresponding to each test item and generates standard data and test data. 24, and an analysis control unit 25 that drives and controls each analysis unit related to the measurement of the analysis unit 24.

  Also, the standard data and test data generated by the analysis unit 24 are processed to generate calibration data and analysis data, and the calibration data and analysis data generated by the data processing unit 30 are printed out. And an output unit 40 for displaying and outputting, an operation unit 80 for inputting various command signals, and the like, an analysis control unit 25, a data processing unit 30, and a system control unit 90 for controlling the output unit 40 in an integrated manner. Yes.

  FIG. 2 is a perspective view showing the configuration of the analysis unit 24. The analysis unit 24 includes a sample container 17 that accommodates each sample such as a standard sample and a test sample, a sample disk 5 that holds the sample container 17, and one reagent that reacts with a component of an inspection item included in each sample. A reagent container 6 for storing a first reagent of a system and a two reagent system, a reagent container 1 having a reagent rack 1a for rotatably holding the reagent container 6, and a first reagent that forms a pair with a first reagent of a two reagent system A reagent container 7 containing two reagents, a reagent container 2 having a reagent rack 2a for rotatably holding the reagent container 7, and a reaction for rotatably holding a plurality of reaction containers 3 arranged on the circumference And a disk 4.

  In addition, a sample dispensing probe 16 for dispensing each sample in the sample container 17 held on the sample disk 5 and sucking it into the reaction container 3, and rotating and moving the sample dispensing probe 16 up and down. A sample dispensing arm 10 that can be held and a washing tank 16a that cleans the sample dispensing probe 16 each time dispensing of each sample is provided.

  Also, a first reagent dispensing probe 14 for aspirating the first reagent in the reagent container 6 housed in the reagent store 1 and dispensing it into the reaction container 3 from which each sample has been discharged, and the first reagent A first reagent dispensing arm 8 that holds the dispensing probe 14 so that the dispensing probe 14 can be rotated and moved up and down, and a washing tank 14a that cleans the first reagent dispensing probe 14 every time the dispensing of the first reagent is completed. .

  Also, a first stirrer 18 that stirs the mixed solution of each sample and the first reagent discharged into the reaction vessel 3, and a first stirrer arm 20 that holds the first stirrer 18 so as to be rotatable and vertically movable. And a washing tank 18a for washing the first stirring bar 18 every time the stirring of the mixed solution is completed.

  Also, a second reagent dispensing probe 15 for aspirating the second reagent in the reagent container 7 stored in the reagent storage 2 and dispensing it into the reaction container 3 from which each sample and first reagent are discharged; A second reagent dispensing arm 9 for holding the second reagent dispensing probe 15 so as to be rotatable and vertically movable, and a washing tank 15a for washing the second reagent dispensing probe 15 every time the second reagent dispensing is completed. It has.

  Also, a second stirrer 19 that stirs the mixed solution of each sample, first reagent, and second reagent in the reaction vessel 3, and a second stirrer arm that holds the second stirrer 19 so as to be rotatable and vertically movable. 21 and a washing tank 19a for washing the second stirrer 19 every time the mixed solution is stirred.

  Moreover, the photometric part 13 which irradiates light to the liquid mixture in the reaction container 3 and measures optically, and the reaction container washing | cleaning part 12 which wash | cleans the inside of the reaction container 3 which completed the measurement in the photometric part 13 are provided. .

  Then, the photometry unit 13 irradiates the reaction container 3 passing through the optical path with light, and detects the wavelength light of each inspection item that has passed through the liquid mixture containing the standard sample and the test sample in the reaction container 3. For example, standard data or test data represented by absorbance data is generated. Then, the generated standard data and test data are output to the data processing unit 30.

  The analysis control unit 25 includes a mechanism unit 26 having a mechanism for driving each analysis unit of the analysis unit 24, and a control unit 28 for controlling each mechanism of the mechanism unit 26 and the reaction container cleaning unit 12 of the analysis unit 24. Yes. Then, the mechanism unit 26 stops after rotating the sample disk 5, the reagent rack 1a of the reagent storage 1 and the reagent rack 2a of the reagent storage 2, and the reaction disk 45 for each analysis cycle. It has a mechanism to do. The sample dispensing arm 10, the first reagent dispensing arm 8, the second reagent dispensing arm 9, the first stirring arm 20, and the second stirring arm 21 are each provided with a mechanism for rotating and moving up and down. .

  The data processing unit 30 shown in FIG. 1 includes a calculation unit 31 that processes standard data and test data output from the photometry unit 13 of the analysis unit 24 to generate calibration data and analysis data for each inspection item, A data storage unit 32 for storing the standard data and analysis data generated by the unit 31.

  The calculation unit 31 generates calibration data representing the relationship between the concentration and activity of each test item component and the standard data from the standard data output from the photometry unit 13 and the standard values preset in the standard sample of the standard data. The generated calibration data is output to the output unit 40 and stored in the data storage unit 32.

  The data storage unit 32 includes a memory device such as a hard disk, and stores the calibration data output from the calculation unit 31 for each inspection item. Moreover, the analysis data of each inspection item output from the calculation unit 31 is stored for each test sample. Furthermore, the management analysis data of each inspection item output from the calculation unit 31 is stored for each management sample.

  The output unit 40 includes a printing unit 41 that prints out calibration data and analysis data output from the calculation unit 31 of the data processing unit 30 and a display unit 42 that displays and outputs the calibration data. The printing unit 41 includes a printer or the like, and prints the calibration data and analysis data output from the calculation unit 31 on printer paper or the like according to a preset format.

  The display unit 42 includes a monitor such as a CRT or a liquid crystal panel, and displays calibration data and analysis data output from the calculation unit 31. In addition, an analysis parameter setting screen for setting analysis parameters of each inspection item that can be inspected by the automatic analyzer 100, a reagent information setting screen for setting reagent information of a reagent corresponding to each inspection item, and each test sample A test sample information setting screen or the like for setting identification information such as a name and ID for identifying the test sample and an inspection item is displayed.

  The operation unit 80 includes input devices such as a keyboard, a mouse, a button, and a touch key panel, and performs operations such as setting of analysis parameters for each test item, setting of reagent information, identification information of a test sample, and setting of test items. Do.

  The system control unit 90 includes a CPU and a storage circuit, a command signal input by an operation from the operation unit 80, analysis parameter information of each inspection item, reagent information, test sample identification information, and inspection item information, etc. Are stored in the storage circuit, and based on these input information, the analysis control unit 25, the data processing unit 30, and the output unit 40 are integrated to control the entire system.

  Hereinafter, with reference to FIG. 1 thru | or FIG. 6, the structure and operation | movement of the reaction container washing | cleaning part 12 in the analysis part 24 are demonstrated in detail.

  FIG. 3 is a diagram showing the configuration of the reaction container cleaning unit 12. The reaction container cleaning unit 12 discharges and sucks a cleaning liquid such as pure water for cleaning the inside of the reaction container 3, and supplies the cleaning liquid to the cleaning nozzle unit 50 and discharges the supplied cleaning liquid. A cleaning pump unit 60 is provided. When the reaction disk 4 is rotating, it is held at the upper stop position of the cleaning position W, and when the reaction disk 4 stops, it moves to the lower stop position, and the reaction container 3 stopped at the cleaning position W is cleaned. I do.

  The cleaning nozzle unit 50 is arranged to move up and down and enter the reaction vessel 3, and corresponds to the drain nozzle 51 corresponding to the first cleaning position W1 of the cleaning position W and the second to fourth cleaning positions W2 to W4. The first to third cleaning nozzle units 52 to 54 and the drying nozzle 55 corresponding to the fifth cleaning position W5.

  The drain nozzle 51 is configured by a suction nozzle that sucks the mixed liquid in the reaction vessel 3. Then, the liquid mixture in the reaction vessel 3 that has been measured at the photometric unit 13 and stopped at the first cleaning position W1 is discharged by the mixed liquid discharging operation performed by the cleaning pump unit 60. Thereafter, the reaction vessel 3 at the first cleaning position W1 is rotationally moved to the second cleaning position W2.

  The first cleaning nozzle unit 52 supplies the cleaning liquid supplied from the cleaning pump unit 60 to the inside of the reaction vessel 3 stopped at the second cleaning position W2 after the mixed liquid is discharged at the first cleaning position W1, and the supplied cleaning liquid. Cleaning is performed by a series of cleaning operations consisting of discharge of water. Thereafter, the reaction vessel 3 at the second cleaning position W2 is rotationally moved to the third cleaning position W3.

  The second cleaning nozzle unit 53 supplies the cleaning liquid performed by the cleaning pump unit 60 and discharges the supplied cleaning liquid in the reaction vessel 3 stopped at the third cleaning position W3 after being cleaned at the second cleaning position W2. Cleaning is performed by a series of cleaning operations. Thereafter, the reaction vessel 3 at the third cleaning position W3 is rotationally moved to the fourth cleaning position W4.

  The third cleaning nozzle unit 54 supplies the cleaning liquid performed by the cleaning pump unit 60 and discharges the supplied cleaning liquid in the reaction vessel 3 stopped at the fourth cleaning position W4 after being cleaned at the third cleaning position W3. Cleaning is performed by a series of cleaning operations. Thereafter, the reaction vessel 3 at the fourth cleaning position W4 is rotationally moved to the fifth cleaning position W5.

  The drying nozzle 55 is constituted by a suction nozzle that sucks the inside of the reaction vessel 3. Then, after washing at the fourth washing position W4, the inside of the reaction vessel 3 stopped at the fifth washing position W5 is dried by a drying operation consisting of discharge performed by the washing pump unit 60. Thereafter, the reaction container 3 at the fifth cleaning position W5 dispenses the sample by the sample dispensing probe 16 based on the information on the inspection item for each test sample set on the test sample information setting screen of the display unit 42. Is rotated to a position where possible.

  The cleaning pump unit 60 includes a low-pressure pump 61 and a high-pressure pump 62 that supply the cleaning liquid to the first to third cleaning nozzle units 52 to 54 in the cleaning nozzle unit 50, a drain nozzle 51 of the cleaning nozzle unit 50, To a third cleaning nozzle unit 52 to 54 and a drainage pump unit 63 for discharging the mixed liquid and the cleaning liquid from the drying nozzle 55.

  Further, the cleaning liquid tank 64 storing the cleaning liquid, the first drain tank 65 storing the mixed liquid discharged from the drain nozzle 51, the first to third cleaning nozzle units 52 to 54, and the drying nozzle 55. A second drainage tank 66 for storing the discharged cleaning liquid.

  The low pressure pump 61 sucks the cleaning liquid from the cleaning liquid tank 64 and supplies the sucked cleaning liquid to the first to third cleaning nozzle units 52 to 54 at a low pressure of 0.1 MPa, for example. The high-pressure pump 62 sucks the cleaning liquid from the cleaning liquid tank 64, and supplies the sucked cleaning liquid to the first to third cleaning nozzle units 52 to 54 at a timing almost the same as that of the low-pressure pump 61. Supply is performed at a high pressure, for example, 3 MPa.

  The drainage pump unit 63 includes a first drainage pump 631 that discharges the liquid mixture in the reaction vessel 3 stopped at the first cleaning position W1 into the first drainage tank 65, and second to fourth cleaning positions W2 to A second drain pump 632 for discharging the cleaning liquid discharged into the reaction container 3 stopped at W4 and the cleaning liquid slightly remaining in the reaction container 3 stopped at the fifth cleaning position W5 into the second drain tank 66; It has.

Next, details of the configuration of the first to third cleaning nozzle units 52 to 54 will be described.
FIG. 4 is a diagram showing the configuration of the first cleaning nozzle unit 52. The first cleaning nozzle unit 52 includes a cleaning nozzle 521 that discharges the cleaning liquid into the reaction container 3 stopped at the second cleaning position W2, a suction nozzle 522 that sucks the cleaning liquid discharged into the reaction container 3, and a cleaning A holding body 523 that holds the nozzle 521 and the suction nozzle 522 and a splash prevention cover 524 that prevents the cleaning liquid discharged from the cleaning nozzle 521 from scattering outside the reaction vessel 3 are configured.

  The cleaning nozzle 521 is positioned approximately in the center of the reaction vessel 3 at the lower stop position of the cleaning nozzle unit 50. And the washing | cleaning liquid supplied from the outer tube | pipe 525 which forms the low voltage | pressure flow path 5251 in which the washing | cleaning liquid supplied from the low pressure pump 61 of the washing pump unit 60 flows from the top, and the high pressure pump 62 of the washing pump unit 60 The inner pipe 526 forms a high-pressure channel 5261 that flows from the top to the bottom and joins the low-pressure channel 5251.

  The outer tube 525 has an opening provided in the vicinity of the upper end thereof closed by the inner tube 526 and encloses between the closed portion other than the upper end of the inner tube 526 and the lower end. A low-pressure channel 5251 is formed by the inner surface and the outer surface of the inner tube 526 included therein. In addition, a plurality of holes 5252 are provided in the lower end portion and in the vicinity thereof so that the cleaning liquid can be discharged radially toward all surfaces in contact with the mixed liquid in the reaction vessel 3.

  The inner tube 526 has an upper end portion disposed at the same height as the upper end portion of the outer tube 525, and a lower end portion disposed at a position higher than the lower end portion of the outer tube 525.

  Then, the cleaning liquid supplied by the low pressure pump 61 and the high pressure pump 62 flows in from the openings at the upper ends of the outer pipe 525 and the inner pipe 526, and the flowing cleaning liquid flows downward in the low pressure channel 5251 and the high pressure channel 5261. Next, the cleaning liquid that has flowed through the high-pressure channel 5261 is jetted from the opening at the lower end of the inner tube 526 and merges with the cleaning liquid that flows through the low-pressure channel 5251. A cleaning liquid containing bubbles generated by cavitation in the joined flow area is discharged from the hole 5252 of the outer tube 525 toward the inner surface of the reaction vessel 3. The discharged cleaning solution is used to wash away the mixed solution remaining on the inner surface of the reaction vessel 3. Further, the remaining substance of the mixed liquid adhering to the inner surface of the reaction vessel 3 is washed away by using an impact force that collapses when bubbles contained in the cleaning liquid collide with the inner surface of the reaction vessel 3.

  The low pressure pump 61 and the high pressure pump 62 are set to a low pressure and a high pressure at which bubbles are generated by cavitation in a flow area where the cleaning liquid from the high pressure flow path 5261 merges with the cleaning liquid flowing in the low pressure flow path 5251.

  As described above, the cleaning nozzle 521 enters the reaction vessel 3, and the inside of the reaction vessel 3 can be cleaned by discharging the cleaning liquid containing bubbles generated by cavitation from a position close to the inner surface of the reaction vessel 3. Thereby, it is possible to prevent deterioration of the reaction vessel 3 without requiring an excessive cleaning force as in the case of ultrasonic cleaning. Further, the inside of the reaction vessel 3 can be strongly cleaned.

  In addition, the pump which can change a pressure is used for the low pressure pump 61 and the high pressure pump 62, and the cleaning nozzle 521 is supplied based on the information of the inspection item for each test sample set on the test sample information setting screen of the display unit 42. You may implement so that the pressure of a washing | cleaning liquid may be varied. And when the information of the test item corresponding to the reagent containing, for example, latex that easily contaminates the reaction vessel 3 is set in advance and the reaction vessel 3 containing the mixed solution of the test item is washed, Increase pressure to clean strongly. Further, when analysis of protein in urine, which is easily affected by dirt, is performed, the reaction vessel 3 used for the test item is more strongly washed than usual.

  The suction nozzle 522 is disposed, for example, on the third cleaning position W3 side, which is the direction in which the reaction container 3 rotates with respect to the cleaning nozzle 521. The lower end of the suction nozzle 522 is located in the reaction container 3 at the lower stop position of the cleaning nozzle unit 50. Close to the bottom of the. Then, the cleaning liquid discharged from the outer tube 525 of the cleaning nozzle 521 is sucked by the suction operation of the second drain pump 632 of the drain pump unit 63 in the cleaning pump unit 60.

  The splash prevention cover 524 is provided to prevent the cleaning liquid discharged from the outer tube 525 of the cleaning nozzle 521 from splashing out of the reaction vessel 3 and entering the other reaction vessel 3, and at a lower stop position of the cleaning nozzle unit 50. The cleaning nozzle 521 and the suction nozzle 522 are held at a height close to the upper end of the reaction vessel 3.

  FIG. 5 is a diagram showing the configuration of the second cleaning nozzle unit 53. The second cleaning nozzle unit 53 is different from the first cleaning nozzle unit 52 in that the arrangement of suction nozzles is different. Of the units constituting the second cleaning nozzle unit 53, the same components as those of the first cleaning nozzle unit 52 are denoted by the same reference numerals, and description thereof is omitted or simplified.

  The second cleaning nozzle unit 53 includes a cleaning nozzle 521 that discharges the cleaning liquid into the reaction container 3 stopped at the third cleaning position W3, a suction nozzle 522a that sucks the cleaning liquid discharged into the reaction container 3, and a cleaning nozzle. 521 and the suction nozzle 522a, and a splash prevention cover 524a for preventing the cleaning liquid discharged from the cleaning nozzle 521 from scattering outside the reaction vessel 3.

  As described above, the cleaning nozzle 521 enters the reaction vessel 3, and the inside of the reaction vessel 3 can be cleaned by discharging the cleaning liquid containing bubbles generated by cavitation from a position close to the inner surface of the reaction vessel 3. Thereby, it is possible to prevent deterioration of the reaction vessel 3 without requiring an excessive cleaning force as in the case of ultrasonic cleaning. Further, the inside of the reaction vessel can be strongly cleaned.

  The suction nozzle 522a is arranged on the second cleaning position W2 side opposite to the direction in which the reaction container 3 rotates with respect to the cleaning nozzle 521, and the lower end of the suction nozzle 522a reacts at the lower stop position of the cleaning nozzle unit 50. It is close to the bottom surface in the container 3. Then, the cleaning liquid discharged from the outer tube 525 of the cleaning nozzle 521 is sucked by the suction operation of the second drainage pump 632.

  As described above, by arranging the suction nozzle 522a at a position different from the suction nozzle 522 of the first cleaning nozzle unit 52, the suction nozzle 522 becomes an obstacle at the second cleaning position W2, and the cleaning liquid cannot be applied. Cleaning can be performed by applying a cleaning liquid to the inner surface of the reaction vessel 3.

  FIG. 6 is a diagram showing the configuration of the third cleaning nozzle unit 54. The third cleaning nozzle unit 54 is different from the first and second cleaning nozzle units 52 and 53 in that the arrangement of the suction nozzles is different. Of the units constituting the third cleaning nozzle unit 54, the same components as those of the first and second cleaning nozzle units 52 and 53 are denoted by the same reference numerals, and description thereof is omitted or simplified.

  The third cleaning nozzle unit 54 includes a cleaning nozzle 521 that discharges the cleaning liquid into the reaction container 3 stopped at the fourth cleaning position W4, a suction nozzle 522b that sucks the cleaning liquid discharged into the reaction container 3, and a cleaning nozzle. 521 and a suction nozzle 522b, and a splash prevention cover 524b that prevents the cleaning liquid discharged from the cleaning nozzle 521 from scattering outside the reaction vessel 3.

  As described above, the cleaning nozzle 521 enters the reaction vessel 3, and the inside of the reaction vessel 3 can be cleaned by discharging the cleaning liquid containing bubbles generated by cavitation from a position close to the inner surface of the reaction vessel 3. Thereby, it is possible to prevent deterioration of the reaction vessel 3 without requiring an excessive cleaning force as in the case of ultrasonic cleaning. Further, the inside of the reaction vessel 3 can be strongly cleaned.

  The suction nozzle 522b is disposed on the inner or outer peripheral side in the direction in which the reaction container 3 rotates with respect to the cleaning nozzle 521, and the lower end portion is close to the bottom surface in the reaction container 3 at the lower stop position of the cleaning nozzle unit 50. doing. Then, the cleaning liquid discharged from the outer tube 525 of the cleaning nozzle 521 is sucked by the suction operation of the second drainage pump 632.

  Thus, by arranging the suction nozzle 522b at a position different from the suction nozzles 522 and 522a of the first and second cleaning nozzle units 52 and 53, the suction nozzle 522 at the second and third cleaning positions W2 and W3. The cleaning liquid can be applied to the inner surface of the reaction vessel 3 where the cleaning liquid cannot be applied due to the obstacle 522a.

  The cleaning tank 64 is replaced with, for example, a first cleaning liquid tank storing an alkaline cleaning liquid, a second cleaning liquid tank storing an acidic cleaning liquid, and a third cleaning liquid tank storing pure water. Further, the first low-pressure pump 61 and the high-pressure pump 62 suck the cleaning liquid from the first cleaning liquid tank having the same function as this pump and supply it to the first cleaning nozzle unit 52. The third cleaning liquid is sucked from the second low-pressure pump and the second high-pressure pump that sucks the cleaning liquid from the second cleaning liquid tank and supplies it to the second cleaning nozzle unit 53, and the third cleaning liquid tank. The third low-pressure pump and the third high-pressure pump supplied to the nozzle unit 54 may be used instead. Thereby, a greater cleaning effect can be obtained.

  Moreover, you may implement so that surfactant may be added to a washing | cleaning liquid. Thereby, a greater cleaning effect can be obtained.

  According to the embodiment of the present invention described above, the washing nozzle 521 disposed so as to be able to enter the reaction vessel 3 having the low-pressure channel 5251 and the high-pressure channel 5261 joined to the low-pressure channel 5251, and the washing liquid at a low pressure. A low pressure pump 61 that supplies the flow path 5251 with a low pressure and a high pressure pump 62 that supplies the high pressure flow path 5261 with a high pressure are provided. Then, the cleaning nozzle 521 is allowed to enter the reaction container 3 and the cleaning liquid containing bubbles generated by cavitation is discharged from a position close to the inner surface of the reaction container 3 to clean the reaction container 3. Thereby, since the excessive washing | cleaning force is not required like the ultrasonic cleaning wash | cleaned from the outer side of the reaction container, degradation of the reaction container 3 can be prevented. Moreover, it becomes possible to wash | clean the inside of the reaction container 3 strongly, and it can prevent the deterioration of analysis data.

3 Reaction vessel 52 First cleaning nozzle 61 Low pressure pump 62 High pressure pump 632 Second drainage pump 521 Cleaning nozzle 522 Suction nozzle 523 Holding body 524 Jump prevention cover 525 Outer tube 526 Inner tube 5251 Low pressure channel 5252 Hole 5261 High pressure channel

Claims (7)

In an automatic analyzer that dispenses a sample and a reagent into a reaction vessel and measures the mixture,
A washing nozzle disposed so as to be able to enter the reaction vessel, and having a low-pressure channel and a high-pressure channel joining the low-pressure channel;
A low-pressure pump that supplies a low-pressure cleaning solution for cleaning the inside of the reaction vessel to the low-pressure channel of the cleaning nozzle that has entered the reaction vessel, and a high pressure higher than the low pressure to the high-pressure channel. A reaction vessel cleaning means having a high-pressure pump for supplying the cleaning liquid;
The reaction container cleaning means performs cleaning of the reaction container using the cleaning liquid from the high pressure flow path joined to the cleaning liquid flowing in the low pressure flow path by supply from the low pressure pump and the high pressure pump. An automatic analyzer characterized by   The low pressure and the high pressure are pressures in which bubbles are generated by cavitation in a flow area where the cleaning liquid from the high-pressure channel joins the cleaning liquid flowing in the low-pressure channel. The automatic analyzer described.   The cleaning nozzle that has entered the reaction container can discharge the cleaning liquid from the high-pressure channel that has joined the cleaning liquid flowing in the low-pressure channel toward the inner surface of the reaction container that is in contact with the mixed solution. The automatic analyzer according to claim 1, comprising a plurality of holes.   4. The automatic analyzer according to claim 3, wherein the reaction container cleaning means has a suction nozzle for sucking the cleaning liquid discharged into the reaction container.   The said reaction container washing | cleaning means has a scattering prevention cover hold | maintained at the said washing nozzle for preventing the washing | cleaning liquid discharged from the said washing nozzle from scattering outside the said reaction container. Automatic analyzer.   The cleaning nozzle includes the inner tube forming the high-pressure channel and a portion other than one end of the inner tube into which the cleaning liquid from the high-pressure pump flows to form the low-pressure channel. The automatic analyzer according to claim 1, further comprising an outer tube.   The automatic analyzer according to claim 1, wherein the cleaning liquid is an alkaline cleaning liquid, an acidic cleaning liquid, or a cleaning liquid containing a surfactant.

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