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JP5219906B2 - Temperature measuring apparatus, temperature measuring method, exposure apparatus, and device manufacturing method - Google Patents
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JP5219906B2 - Temperature measuring apparatus, temperature measuring method, exposure apparatus, and device manufacturing method - Google Patents

Temperature measuring apparatus, temperature measuring method, exposure apparatus, and device manufacturing method Download PDF

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JP5219906B2
JP5219906B2 JP2009093077A JP2009093077A JP5219906B2 JP 5219906 B2 JP5219906 B2 JP 5219906B2 JP 2009093077 A JP2009093077 A JP 2009093077A JP 2009093077 A JP2009093077 A JP 2009093077A JP 5219906 B2 JP5219906 B2 JP 5219906B2
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temperature
potential difference
reference resistor
temperature sensor
constant current
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知之 森田
芳幸 岡田
広志 磯山
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Canon Inc
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Description

本発明は、高精度な温度計測が可能な温度計測装置に関する。   The present invention relates to a temperature measuring apparatus capable of measuring temperature with high accuracy.

半導体露光装置においては超微細加工のため、0.001℃レベルでの高精度な温度計測が要求される。このような高精度な温度計測には白金抵抗体を使用した温度センサが用いられることが多く、センサの配線抵抗の影響を抑制するために3線式もしくは4線式の信号検出回路にて温度センサにおける抵抗値の変化を電圧信号に変換することが多い。ところが従来の温度測定方法では、温度センサや信号検出回路の誤差、又は、これらの経時変化等により高精度な測定ができないという問題があった。 In a semiconductor exposure apparatus, high-precision temperature measurement at a 0.001 ° C. level is required for ultra-fine processing. For such high-precision temperature measurement, a temperature sensor using a platinum resistor is often used. In order to suppress the influence of the wiring resistance of the sensor, the temperature is detected by a 3-wire or 4-wire signal detection circuit. In many cases, a change in resistance value in a sensor is converted into a voltage signal. However, the conventional temperature measurement method has a problem that high-precision measurement cannot be performed due to an error of the temperature sensor or the signal detection circuit or a change with time of these.

測定精度をより向上させるため、特許文献1には、3線式の測温抵抗体センサを用いた温度測定装置において、複数の基準抵抗体のそれぞれに定電流を流した場合に生じる電圧を比較して温度を求める温度測定装置が開示されている。   In order to further improve the measurement accuracy, Patent Document 1 compares the voltage generated when a constant current is passed through each of a plurality of reference resistors in a temperature measuring device using a three-wire resistance thermometer sensor. Thus, a temperature measuring device for obtaining the temperature is disclosed.

特開2000−241258号公報JP 2000-241258 A

しかしながら、特許文献1に開示されているような基準抵抗体を複数用いて温度補正を行う場合、基準抵抗体の絶対抵抗値の誤差と装置サイズが問題となる。より高精度の基準抵抗体を複数用いるとコストが高くなり、装置サイズも大型化する。例えば、多数の温度計測装置を必要とする半導体露光装置では、露光装置全体のコストとサイズを大きく押し上げることになる。
また、温度センサ固有の誤差を補正するため、温度校正手段等を用いて、予め温度センサ固有の誤差量を取得し、実際の温度計測時に補正演算を行う必要がある。同様に温度検出回路固有の誤差についても、より高精度に値を管理された基準抵抗体を用いて温度校正手段等により予め取得し、実際の計測時に補正演算を行う必要がある。このように、温度センサ固有の誤差と温度検出回路の誤差を分離して取り扱う場合、それぞれの誤差量を取得する際に発生する計測誤差や校正残差が重畳する。このため、最終的な温度計測誤差が増加する要因となる。
そこで本発明は、低コストで高精度な小型の温度計測装置を提供する。
However, when temperature correction is performed using a plurality of reference resistors as disclosed in Patent Document 1, an error in the absolute resistance value of the reference resistor and the device size become problems. The use of a plurality of higher precision reference resistors increases the cost and increases the size of the apparatus. For example, in a semiconductor exposure apparatus that requires a large number of temperature measurement apparatuses, the cost and size of the entire exposure apparatus are greatly increased.
In addition, in order to correct an error specific to the temperature sensor, it is necessary to acquire an error amount specific to the temperature sensor in advance using a temperature calibration unit or the like and perform a correction calculation at the time of actual temperature measurement. Similarly, an error inherent to the temperature detection circuit needs to be acquired in advance by a temperature calibration means or the like using a reference resistor whose value is managed with higher accuracy, and correction calculation must be performed during actual measurement. As described above, when the error inherent to the temperature sensor and the error of the temperature detection circuit are handled separately, measurement errors and calibration residuals that occur when acquiring the respective error amounts are superimposed. For this reason, the final temperature measurement error increases.
Therefore, the present invention provides a small temperature measuring apparatus with high accuracy and low cost.

本発明の一側面としての温度計測装置は、温度に応じて抵抗値が変化する温度センサと、該温度センサの該抵抗値から該温度を検出する温度検出手段とを備えた温度計測装置であって、前記温度検出手段は、基準抵抗体と、前記温度センサ又は前記基準抵抗体のいずれか一方に定電流を流す定電流手段と、前記定電流を前記温度センサ又は前記基準抵抗体のいずれに流すかを決定する切り替え手段と、前記定電流を前記温度センサに流した場合に該温度センサに生じる第1の電位差を検出し、該定電流を前記基準抵抗体に流した場合に該基準抵抗体に生じる第2の電位差を検出する電圧検出手段と、予め計測された前記基準抵抗体の基準電位差、及び、予め計測された前記温度センサと前記温度検出手段との合成オフセット誤差を保持する保持手段と、前記第2の電位差と前記基準電位差との差に相当するドリフト誤差、及び、前記合成オフセット誤差を前記第1の電位差に加算することにより該第1の電位差を補正する温度補正手段とを有する。   A temperature measurement device according to one aspect of the present invention is a temperature measurement device including a temperature sensor whose resistance value changes according to temperature, and temperature detection means for detecting the temperature from the resistance value of the temperature sensor. The temperature detecting means includes a reference resistor, constant current means for supplying a constant current to either the temperature sensor or the reference resistor, and the constant current to either the temperature sensor or the reference resistor. Switching means for determining whether to flow, a first potential difference generated in the temperature sensor when the constant current is passed through the temperature sensor, and the reference resistance when the constant current is passed through the reference resistor A voltage detection unit for detecting a second potential difference generated in the body, a reference potential difference of the reference resistor measured in advance, and a pre-measured synthetic offset error between the temperature sensor and the temperature detection unit. And a temperature correction means for correcting the first potential difference by adding the drift error corresponding to the difference between the second potential difference and the reference potential difference, and the combined offset error to the first potential difference. Have

本発明の他の側面としての温度計測方法は、温度に応じて抵抗値が変化する温度センサと、該温度センサの該抵抗値から該温度を検出する温度検出手段とを用いて温度を計測する温度計測方法であって、前記温度センサに定電流を流して該温度センサに生じる第1の電位差を検出する工程と、前記温度検出手段の基準抵抗体に前記定電流を流して該基準抵抗体に生じる第2の電位差を検出する工程と、前記第2の電位差と予め計測された前記基準抵抗体の基準電位差との差に相当するドリフト誤差、及び、予め計測された前記温度センサと前記温度検出手段との合成オフセット誤差を前記第1の電位差に加算することにより該第1の電位差を補正する工程とを有する。   A temperature measurement method according to another aspect of the present invention measures a temperature using a temperature sensor whose resistance value changes according to temperature, and a temperature detection unit that detects the temperature from the resistance value of the temperature sensor. A method for measuring temperature, comprising a step of flowing a constant current through the temperature sensor to detect a first potential difference generated in the temperature sensor, and a flow of the constant current through a reference resistor of the temperature detecting means. Detecting a second potential difference generated in the first step, a drift error corresponding to a difference between the second potential difference and a reference potential difference of the reference resistor measured in advance, and the temperature sensor and the temperature measured in advance. And correcting the first potential difference by adding a combined offset error with the detection means to the first potential difference.

本発明の他の側面としての露光装置は、原版のパターンを基板上に露光する露光装置であって、光源からの光を用いて前記原版を照明する照明光学系と、前記原版の前記パターンを前記基板上に投影する投影光学系と、前記露光装置の内部の温度を計測する温度計測装置とを有する。   An exposure apparatus according to another aspect of the present invention is an exposure apparatus that exposes a pattern of an original on a substrate, an illumination optical system that illuminates the original using light from a light source, and the pattern of the original A projection optical system that projects onto the substrate; and a temperature measurement device that measures a temperature inside the exposure apparatus.

本発明の他の側面としてのデバイス製造方法は、前記露光装置を用いて基板を露光する工程と、露光された前記基板を現像する工程とを有する。   A device manufacturing method according to another aspect of the present invention includes a step of exposing a substrate using the exposure apparatus and a step of developing the exposed substrate.

本発明の他の目的及び特徴は、以下の実施例において説明される。   Other objects and features of the present invention are illustrated in the following examples.

本発明によれば、低コストで高精度な小型の温度計測装置を提供することができる。   According to the present invention, it is possible to provide a small temperature measuring apparatus with high accuracy and low cost.

実施例1における温度計測装置の概略構成図である。It is a schematic block diagram of the temperature measuring device in Example 1. 実施例1の温度計測装置における計測誤差の説明図である。It is explanatory drawing of the measurement error in the temperature measuring device of Example 1. 実施例2における温度計測装置の概略構成図である。It is a schematic block diagram of the temperature measuring device in Example 2. 実施例2の温度計測装置における計測誤差の説明図である。It is explanatory drawing of the measurement error in the temperature measuring device of Example 2. 本実施例における露光装置の概略構成図である。It is a schematic block diagram of the exposure apparatus in a present Example.

以下、本発明の実施例について、図面を参照しながら詳細に説明する。各図において、同一の部材については同一の参照番号を付し、重複する説明は省略する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In each figure, the same members are denoted by the same reference numerals, and redundant description is omitted.

まず、本発明の実施例1の温度計測装置について説明する。図1は、本実施例における温度計測装置100の概略構成図である。図1(a)は定電流Iを測温抵抗体センサ1に流している状態を示し、図1(b)は定電流Iを基準抵抗体20aに流している状態を示す。温度計測装置100は、温度に応じて抵抗値Rtが変化する測温抵抗体センサ1(温度センサ)と、測温抵抗体センサ1の抵抗値Rtから温度を検出する温度検出回路8(温度検出手段)とを備えて構成されている。   First, the temperature measuring apparatus according to the first embodiment of the present invention will be described. FIG. 1 is a schematic configuration diagram of a temperature measuring apparatus 100 in the present embodiment. FIG. 1A shows a state in which the constant current I is passed through the resistance temperature sensor 1, and FIG. 1B shows a state in which the constant current I is passed through the reference resistor 20a. The temperature measuring device 100 includes a resistance temperature sensor 1 (temperature sensor) whose resistance value Rt changes according to temperature, and a temperature detection circuit 8 (temperature detection) that detects the temperature from the resistance value Rt of the resistance temperature sensor 1. Means).

測温抵抗体センサ1は4線式の温度センサであり、4本のケーブル2(第1〜第4の配線2a〜2d)を用いて、温度検出回路8に接続されている。第1の配線2a及び第4の配線2dは、温度検出回路8における定電流源3(定電流手段)からの電流を測温抵抗体センサ1に流すため、測温抵抗体センサ1の両端にそれぞれ接続されている。第1の配線2a及び第4の配線2dは、同相ノイズを抑制するため、互いに並列に配線されている。また、第2の配線2b及び第3の配線2cは、定電流源3からの電流を測温抵抗体センサ1に流した場合に測温抵抗体センサ1の両端に生じる電位差Va(第1の電位差)を計測するため、測温抵抗体センサ1の両端にそれぞれ接続されている。第2の配線2b及び第3の配線2cも、同相ノイズを抑制するため、互いに並列に配線されている。   The resistance thermometer sensor 1 is a four-wire temperature sensor, and is connected to the temperature detection circuit 8 using four cables 2 (first to fourth wirings 2a to 2d). The first wiring 2a and the fourth wiring 2d flow the current from the constant current source 3 (constant current means) in the temperature detection circuit 8 to the resistance thermometer sensor 1, so that both ends of the resistance thermometer sensor 1 are connected. Each is connected. The first wiring 2a and the fourth wiring 2d are wired in parallel with each other in order to suppress common-mode noise. In addition, the second wiring 2b and the third wiring 2c have a potential difference Va (first voltage) generated at both ends of the resistance thermometer sensor 1 when the current from the constant current source 3 is passed through the resistance thermometer sensor 1. In order to measure (potential difference), both ends of the resistance temperature sensor 1 are connected. The second wiring 2b and the third wiring 2c are also wired in parallel with each other in order to suppress common-mode noise.

図1(a)に示されるように、定電流Iを定電流源3から測温抵抗体センサ1に流した場合に測温抵抗体センサ1の両端に生じる電位差Vaは、切り替え手段10を介して、差動アンプ部4(電位差増幅手段)により増幅される。差動アンプ部4で増幅された電位差Vaは、A/D変換部5によりアナログ信号からデジタル信号へ変換される。本実施例において、差動アンプ部4及びA/D変換部5は、定電流Iを測温抵抗体センサ1に流した場合に測温抵抗体センサ1に生じる電位差Vaを検出する電圧検出手段を構成する。   As shown in FIG. 1A, the potential difference Va generated at both ends of the resistance temperature sensor 1 when the constant current I flows from the constant current source 3 to the resistance temperature sensor 1 is switched via the switching means 10. Then, it is amplified by the differential amplifier section 4 (potential difference amplification means). The potential difference Va amplified by the differential amplifier unit 4 is converted from an analog signal to a digital signal by the A / D conversion unit 5. In this embodiment, the differential amplifier section 4 and the A / D converter section 5 are voltage detection means for detecting a potential difference Va generated in the resistance temperature sensor 1 when the constant current I is passed through the resistance temperature sensor 1. Configure.

本実施例の温度検出回路8には、所定の基準抵抗値を有する基準抵抗体20aが設けられている。定電流源3は、測温抵抗体センサ1と基準抵抗体20aのいずれか一方に所定の定電流Iを流す。切り替え手段10は、定電流Iを測温抵抗体センサ1又は基準抵抗体20aのいずれかに流すかを決定する。切り替え手段10の切り替え動作は、不図示の制御部により制御される。   The temperature detection circuit 8 of the present embodiment is provided with a reference resistor 20a having a predetermined reference resistance value. The constant current source 3 supplies a predetermined constant current I to one of the resistance temperature sensor 1 and the reference resistor 20a. The switching means 10 determines whether the constant current I flows through either the resistance temperature sensor 1 or the reference resistor 20a. The switching operation of the switching means 10 is controlled by a control unit (not shown).

図1(b)に示されるように、切り替え手段10の切り替え動作により、定電流Iは基準抵抗体20aに流れる。定電流Iを基準抵抗体20aに流した場合に基準抵抗体20aの両端に生じる電位差Vb(第2の電位差)は、測温抵抗体センサ1の電位差Vaと同様に、切り替え手段10を介して差動アンプ部4により増幅され、A/D変換部5によりデジタル信号へ変換される。   As shown in FIG. 1B, the constant current I flows through the reference resistor 20a by the switching operation of the switching means 10. The potential difference Vb (second potential difference) generated at both ends of the reference resistor 20a when the constant current I flows through the reference resistor 20a is similar to the potential difference Va of the resistance thermometer sensor 1 through the switching means 10. Amplified by the differential amplifier 4 and converted into a digital signal by the A / D converter 5.

このように、定電流源3から定電流Iを流すことにより測温抵抗体センサ1又は基準抵抗体20aの両端に発生した電位差Va、Vbは、高入力インピーダンスの差動アンプ部4で検出される。差動アンプ部4の入力インピーダンスが充分高い場合、切り替え手段10を含めた被計測物までの配線抵抗は無視できる。測温抵抗体センサ1の抵抗値Rtは、定電流Iと検出された電位差Vaとから求められる。   Thus, the potential differences Va and Vb generated at both ends of the resistance temperature sensor 1 or the reference resistor 20a by flowing the constant current I from the constant current source 3 are detected by the differential amplifier section 4 having a high input impedance. The When the input impedance of the differential amplifier section 4 is sufficiently high, the wiring resistance to the object to be measured including the switching means 10 can be ignored. The resistance value Rt of the resistance temperature sensor 1 is obtained from the constant current I and the detected potential difference Va.

演算部6は、温度変換部と温度補正部とを備えて構成される。演算部6は、電位差Va、Vbのそれぞれを補正して温度値に変換する。後述のように、本実施例の温度計測装置100は、狭い温度範囲で生じる誤差を効果的に補正することができる。以下、図2を参照して、温度計測装置100において、狭い温度範囲で生じる計測誤差について説明する。図2(a)は、計測誤差Δtとして、オフセット誤差(計測誤差21a)と検出ゲイン誤差(計測誤差21b)の両方を含む場合の温度と検出信号(検出電位差)との関係を示している。また図2(b)は、オフセット誤差が除去された後の検出ゲイン誤差(計測誤差21b)のみが生じている場合の温度と検出信号との関係を示している。   The calculation unit 6 includes a temperature conversion unit and a temperature correction unit. The calculation unit 6 corrects each of the potential differences Va and Vb and converts them into temperature values. As will be described later, the temperature measuring apparatus 100 of the present embodiment can effectively correct errors that occur in a narrow temperature range. Hereinafter, with reference to FIG. 2, a measurement error that occurs in a narrow temperature range in the temperature measurement apparatus 100 will be described. FIG. 2A shows the relationship between the temperature and the detection signal (detection potential difference) when the measurement error Δt includes both an offset error (measurement error 21a) and a detection gain error (measurement error 21b). FIG. 2B shows the relationship between the temperature and the detection signal when only the detection gain error (measurement error 21b) after the offset error is removed occurs.

半導体露光装置においては超微細加工を行うため、常温付近の比較的狭い温度範囲において、露光装置内の環境の温度管理を0.01℃レベルで行う必要があり、結果として、0.001℃レベルでの高精度な温度計測が要求される。露光装置内の環境の制御目標温度は、温度制御されたクリーンルームの設定温度付近の温度であり、0.01℃レベルでの精度が要求されるのは、露光装置内の環境の制御目標温度付近の限られた±1℃未満の温度範囲においてである。仮に、このような精度が要求される第1の温度範囲22a(基準抵抗体20aが対象とする温度範囲)をT1±1℃とすると、±1℃の狭い温度範囲の計測において、測温抵抗体センサ1の抵抗値Rtは、温度の線形関数とみなすことができる。   In order to perform ultra-fine processing in a semiconductor exposure apparatus, it is necessary to manage the temperature of the environment in the exposure apparatus at a 0.01 ° C. level in a relatively narrow temperature range near room temperature. High-accuracy temperature measurement is required. The control target temperature of the environment in the exposure apparatus is a temperature near the set temperature of the temperature controlled clean room, and the accuracy at the 0.01 ° C level is required near the control target temperature of the environment in the exposure apparatus. In a limited temperature range of less than ± 1 ° C. Assuming that the first temperature range 22a (temperature range targeted by the reference resistor 20a) requiring such accuracy is T1 ± 1 ° C., in the measurement of a narrow temperature range of ± 1 ° C., the resistance temperature detector The resistance value Rt of the body sensor 1 can be regarded as a linear function of temperature.

ここで、計測対象の真の温度(真値)をt、温度の計測誤差をΔt、測温抵抗体センサ1の抵抗値をR(t)、測温抵抗体センサ1の抵抗値R(t)の誤差を△R、定電流源3からの定電流値をIo、及び、定電流源3の電流誤差をΔIoとする。また、検出ゲインをG、検出ゲイン誤差をΔG、検出オフセットをO、及び、検出オフセット誤差をΔOとする。このとき、図1(a)に示される温度計測装置100の計測温度は、次の式(1)で表される。なお、検出ゲインG、検出ゲイン誤差ΔG、検出オフセットO、及び、検出オフセット誤差ΔOは、測温抵抗体センサ1と温度検出回路8との合成量である。   Here, the true temperature (true value) to be measured is t, the temperature measurement error is Δt, the resistance value of the resistance temperature sensor 1 is R (t), and the resistance value R (t of the resistance temperature sensor 1 is ) Is ΔR, the constant current value from the constant current source 3 is Io, and the current error of the constant current source 3 is ΔIo. The detection gain is G, the detection gain error is ΔG, the detection offset is O, and the detection offset error is ΔO. At this time, the measured temperature of the temperature measuring device 100 shown in FIG. 1A is expressed by the following equation (1). The detection gain G, the detection gain error ΔG, the detection offset O, and the detection offset error ΔO are the combined amounts of the resistance temperature sensor 1 and the temperature detection circuit 8.

式(1)を展開して整理すると、以下の式(2)で表される近似式が得られる。 When the expression (1) is expanded and arranged, an approximate expression represented by the following expression (2) is obtained.

式(2)より計測対象の真の温度t及び温度の計測誤差Δtは、以下の式(3)、式(4)にそれぞれ分離できる。 From the equation (2), the true temperature t to be measured and the temperature measurement error Δt can be separated into the following equations (3) and (4), respectively.

また、R(t)とΔtの微分は、以下の式(5)、式(6)でそれぞれ表される。 Further, the differentiation between R (t) and Δt is expressed by the following equations (5) and (6), respectively.

式(5)、(6)より、以下の式(7)が得られる。 From the equations (5) and (6), the following equation (7) is obtained.

ここで、検出ゲイン誤差ΔG、定電流源の電流誤差ΔIoは、主にそれぞれの回路を構成する抵抗誤差(検出ゲイン抵抗誤差E、定電流源の抵抗誤差E)に依存する。このため、検出ゲイン誤差ΔG、定電流源の電流誤差ΔIは、それぞれ、ΔG=G・E、ΔIo=Io・E
と表され、上記の式(7)は以下の式(8)のように表される。
Here, the detection gain error ΔG and the constant current source current error ΔIo mainly depend on resistance errors (detection gain resistance error E G , constant current source resistance error E I ) constituting the respective circuits. Therefore, the detection gain error ΔG and the constant current source current error ΔI O are respectively ΔG = G · E G and ΔIo = Io · E I.
The above formula (7) is expressed as the following formula (8).

すなわち、計測誤差21b(ゲイン成分)である単位温度あたりの計測誤差Δt/dtは、検出ゲイン抵抗誤差E(検出ゲイン抵抗精度)と定電流源の抵抗精度E(定電流源の抵抗精度)の和に依存する。 That is, the measurement error Δt / dt per unit temperature, which is the measurement error 21b (gain component), is the detection gain resistance error E G (detection gain resistance accuracy) and the constant current source resistance accuracy E I (constant current source resistance accuracy). ).

計測誤差21b(ゲイン成分)は、検出ゲイン抵抗及び定電流源の抵抗として、一般に入手可能な高精度抵抗を用いることにより、±0.001℃/℃に抑えることができる。高精度抵抗の経時安定性は、数ppm/年、その温度係数も数ppm/℃のものが一般入手可能であり(4ppmで温度換算約0.001℃)、経時的、環境温度的に充分安定した温度検出回路が実現できる。また、検出ゲイン抵抗値は、第1の温度検出範囲の中心値T1での測温抵抗体センサ1の理論温度係数に則した値に設定するのが好ましい。   The measurement error 21b (gain component) can be suppressed to ± 0.001 ° C./° C. by using a generally available high-precision resistor as the detection gain resistor and the resistance of the constant current source. High-precision resistors with a time stability of several ppm / year and a temperature coefficient of several ppm / ° C. are generally available (4 ppm and converted to a temperature of about 0.001 ° C.). A stable temperature detection circuit can be realized. The detection gain resistance value is preferably set to a value according to the theoretical temperature coefficient of the resistance temperature sensor 1 at the center value T1 of the first temperature detection range.

一方、計測誤差21a(オフセット成分)は、例えば不図示の温度校正手段を用いて、実際の計測前に予め除去しておくことができる。温度校正は、測温抵抗体センサ1及び温度検出回路8を組み合わせて実行される。次に、図2(b)を参照して、計測誤差21a(オフセット成分)の補正後の計測誤差について説明する。   On the other hand, the measurement error 21a (offset component) can be removed in advance before actual measurement using, for example, a temperature calibration unit (not shown). The temperature calibration is executed by combining the resistance temperature sensor 1 and the temperature detection circuit 8. Next, the measurement error after correction of the measurement error 21a (offset component) will be described with reference to FIG.

温度校正手段は、第1の温度範囲の中心値T1付近の温度を第1の温度範囲校正点温度Tαとして選択し、第1の温度範囲校正点温度Tαで温度校正を行う。計測誤差Δtの第1の温度範囲校正点温度Tαにおける計測誤差21a(オフセット成分)は、測温抵抗体センサ1と温度検出回路8との合成オフセット誤差に相当する。温度校正手段は、第1の温度範囲校正点温度Tαでの測温抵抗体センサ1に生じる電位差Vαを計測して温度校正を行うことにより、合成オフセット誤差を取得することができる。温度校正手段により予め取得された合成オフセット誤差は、温度検出回路8の補正値保持部7(保持手段)に保持される。   The temperature calibration means selects a temperature near the center value T1 of the first temperature range as the first temperature range calibration point temperature Tα, and performs temperature calibration at the first temperature range calibration point temperature Tα. The measurement error 21 a (offset component) at the first temperature range calibration point temperature Tα of the measurement error Δt corresponds to a combined offset error between the resistance temperature sensor 1 and the temperature detection circuit 8. The temperature calibration means can acquire the composite offset error by measuring the potential difference Vα generated in the resistance temperature sensor 1 at the first temperature range calibration point temperature Tα and performing temperature calibration. The combined offset error acquired in advance by the temperature calibration unit is held in the correction value holding unit 7 (holding unit) of the temperature detection circuit 8.

温度検出回路8の演算部6は、補正値保持部7に保持された合成オフセット誤差を用いて計測対象の温度t(真値)で検出された電位差Vtを補正することにより、Tα±1℃程度の狭い温度範囲において高精度な温度検出が可能となる。なお、計測誤差21a(オフセット成分)は、測温抵抗体センサ1と温度検出回路8のそれぞれの固有成分に起因する合成量であるため、温度校正の際には、これらを一組として管理するのが好ましい。また本実施例では、計測誤差21a(オフセット成分)が充分小さい超高精度な基準抵抗を用いて温度校正を行うことにより、測温抵抗体センサ1と温度検出回路8のそれぞれの固有成分を分離して管理してもよい。   The calculation unit 6 of the temperature detection circuit 8 corrects the potential difference Vt detected at the temperature t (true value) to be measured using the combined offset error held in the correction value holding unit 7, thereby obtaining Tα ± 1 ° C. Highly accurate temperature detection is possible in a narrow temperature range. Note that the measurement error 21a (offset component) is a combined amount caused by the respective intrinsic components of the resistance temperature sensor 1 and the temperature detection circuit 8, and is therefore managed as a set during temperature calibration. Is preferred. Further, in this embodiment, the temperature calibration is performed using an ultra-high accuracy reference resistor having a sufficiently small measurement error 21a (offset component), thereby separating the intrinsic components of the resistance temperature sensor 1 and the temperature detection circuit 8. You may manage it.

また、基準抵抗体20aとして用いられる高精度抵抗は、前述のとおり、経時的及び環境温度的に安定しているものが一般入手可能であり、温度検出回路8のドリフト誤差を検出して補正するには有効である。基準抵抗体20aは、温度検出回路8が検出可能な任意の抵抗値を有する。ただし、温度検出回路8における非線形誤差の影響を低減させるため、第1の温度範囲校正点温度Tαに相当する抵抗値の近傍に設定されていることがより好ましい。第1の温度範囲校正点温度Tαでの温度校正時において、基準抵抗体20aの計測値(基準電位差)を取得することができる。温度計測装置100は、予め計測された基準抵抗体20aの基準電位差を初期値として補正値保持部7に保持する。温度検出回路8の演算部6は、最新の基準抵抗体20aの計測値(電位差Vb)と初期値である基準電位差のとの差に相当するドリフト誤差を計算して、このドリフト誤差を抑制するように計測誤差を補正する。   As described above, the high-precision resistor used as the reference resistor 20a is generally available as described above, which is stable over time and at ambient temperature, and detects and corrects drift errors in the temperature detection circuit 8. Is effective. The reference resistor 20a has an arbitrary resistance value that can be detected by the temperature detection circuit 8. However, in order to reduce the influence of non-linear errors in the temperature detection circuit 8, it is more preferable that the temperature is set in the vicinity of the resistance value corresponding to the first temperature range calibration point temperature Tα. At the time of temperature calibration at the first temperature range calibration point temperature Tα, the measurement value (reference potential difference) of the reference resistor 20a can be acquired. The temperature measuring device 100 holds the reference potential difference of the reference resistor 20a measured in advance in the correction value holding unit 7 as an initial value. The calculation unit 6 of the temperature detection circuit 8 calculates a drift error corresponding to the difference between the latest measured value (potential difference Vb) of the reference resistor 20a and the reference potential difference that is the initial value, and suppresses this drift error. The measurement error is corrected as follows.

具体的には、演算部6の温度補正部(温度補正手段)は、ドリフト誤差及び合成オフセット誤差を測温抵抗体センサ1の電位差Va(第1の電位差)に加算することにより電位差Vaを補正する。   Specifically, the temperature correction unit (temperature correction unit) of the calculation unit 6 corrects the potential difference Va by adding the drift error and the combined offset error to the potential difference Va (first potential difference) of the resistance temperature sensor 1. To do.

計測誤差におけるドリフト誤差は、経時的に緩やかに変化する。このため、温度計測時においては、測温抵抗体センサ1の第1の電位差の検出に対して、間欠的に基準抵抗体20aの第2の電位差を検出して補正値を更新するのがより好ましい。基準抵抗体20aの電位差Vb(第2の電位差)を検出する際には、温度検出回路8から現在の温度検出値を出力することができない。そこで、温度検出回路8は不図示の記憶部を有し、この記憶部は前回の温度検出値を保持する。このため、基準抵抗体20aの電位差Vbを検出する際には、記憶部に保持された前回の(最後の)温度検出値を現在の温度検出値として出力することにより、連続的な温度検出値の出力が可能となる。なお、温度検出回路8は、温度や湿度等の環境変動による影響を低減するため、一定温度及び一定湿度に調整された空間に設置するのが好ましい。   The drift error in the measurement error changes gradually with time. For this reason, at the time of temperature measurement, it is more preferable to detect the second potential difference of the reference resistor 20a and update the correction value intermittently with respect to the detection of the first potential difference of the resistance temperature sensor 1. preferable. When detecting the potential difference Vb (second potential difference) of the reference resistor 20a, the temperature detection circuit 8 cannot output the current temperature detection value. Therefore, the temperature detection circuit 8 has a storage unit (not shown), and this storage unit holds the previous temperature detection value. For this reason, when detecting the potential difference Vb of the reference resistor 20a, by outputting the previous (last) temperature detection value held in the storage unit as the current temperature detection value, the continuous temperature detection value Can be output. The temperature detection circuit 8 is preferably installed in a space adjusted to a constant temperature and a constant humidity in order to reduce the influence of environmental fluctuations such as temperature and humidity.

また、精度が要求される比較的狭い温度範囲内の2点の温度で温度校正を行い、測温抵抗体センサ1と温度検出回路8との合成オフセット誤差及び合成検出ゲイン誤差の両方を求めて補正値保持部7に保持し、計測値を補正してもよい。この場合、計測誤差21b(ゲイン成分)も補正することができ、上述の温度範囲においてさらに高精度な温度検出が可能となる。検出ゲイン抵抗の精度を落とし、温度検出精度を維持したまま部品コストを低減することも可能である。   Also, temperature calibration is performed at two temperatures within a relatively narrow temperature range where accuracy is required, and both a combined offset error and a combined detection gain error between the resistance temperature sensor 1 and the temperature detection circuit 8 are obtained. The measurement value may be corrected by holding it in the correction value holding unit 7. In this case, the measurement error 21b (gain component) can also be corrected, and the temperature can be detected with higher accuracy in the above temperature range. It is also possible to reduce the accuracy of the detection gain resistor and reduce the component cost while maintaining the temperature detection accuracy.

本実施例の温度計測装置100は、温度検出回路8から出力される温度検出値を用いて温度制御を行う温度制御演算部、及び、温度を調節する温度調節部を更に有していてもよい。   The temperature measurement apparatus 100 of the present embodiment may further include a temperature control calculation unit that performs temperature control using the temperature detection value output from the temperature detection circuit 8, and a temperature adjustment unit that adjusts the temperature. .

次に、本発明の実施例2における温度計測装置について説明する。図3は、本実施例における温度計測装置100aの概略構成図である。図4は、オフセット成分を補正した後の計測誤差の説明図である。温度計測装置100aは、基準抵抗体20aの他に、基準抵抗体20aが対象とする温度範囲とは異なる温度範囲を対象とする基準抵抗体20b(第2の基準抵抗体)を有する点で、実施例1の温度計測装置100とは異なる。また、切り替え手段10aは、不図示の制御部からの指令に基づいて、定電流Iを測温抵抗体センサ1及び基準抵抗体20a、20bのいずれかに流すかを決定する。   Next, a temperature measuring apparatus according to the second embodiment of the present invention will be described. FIG. 3 is a schematic configuration diagram of the temperature measuring device 100a in the present embodiment. FIG. 4 is an explanatory diagram of the measurement error after correcting the offset component. In addition to the reference resistor 20a, the temperature measuring device 100a includes a reference resistor 20b (second reference resistor) that targets a temperature range different from the temperature range that the reference resistor 20a targets. This is different from the temperature measuring apparatus 100 of the first embodiment. Further, the switching means 10a determines whether the constant current I is caused to flow through either the resistance temperature sensor 1 or the reference resistors 20a and 20b based on a command from a control unit (not shown).

温度計測装置100aは、計測対象の温度が中心値T1を中心とした第1の温度範囲22aを外れて中心値T2を中心とした第2の温度範囲22bに至る場合、第2の温度範囲22bについても第1の温度範囲22aと同様の方法で補正を行う。すなわち、電圧検出手段は、定電流を基準抵抗体20bに流した場合に基準抵抗体20bに生じる電位差(第3の電位差)を検出する。また、温度補正手段としての演算部6は、第3の電位差と基準抵抗体20bの基準電位差との差に相当する第2のドリフト誤差を電位差Va(第1の電位差)に加算して電位差Vaを補正する。したがって、本実施例によれば、より高精度な温度検出が可能となる。   When the temperature to be measured deviates from the first temperature range 22a centered on the center value T1 and reaches the second temperature range 22b centered on the center value T2, the temperature measuring device 100a is configured to be in the second temperature range 22b. Is corrected in the same manner as in the first temperature range 22a. That is, the voltage detection unit detects a potential difference (third potential difference) generated in the reference resistor 20b when a constant current is passed through the reference resistor 20b. In addition, the calculation unit 6 serving as a temperature correction unit adds a second drift error corresponding to the difference between the third potential difference and the reference potential difference of the reference resistor 20b to the potential difference Va (first potential difference), thereby adding the potential difference Va. Correct. Therefore, according to the present embodiment, temperature detection with higher accuracy is possible.

第1の温度範囲22aの第1の温度範囲校正点温度Tαの場合と同様の方法で、第2の温度範囲中心値T2付近の温度を第2の温度範囲校正点温度Tβとして選択する。第2の温度範囲校正点温度Tβで測温抵抗体センサ1の検出値Vβに対して温度校正を行い、計測誤差Δtの第2の温度範囲校正点温度Tβにおける測温抵抗体センサ1と温度検出回路8aの合成オフセット誤差を取得する。温度校正手段を用いて予め取得した合成オフセット誤差は、補正値保持部7に保持される。演算部6は、合成オフセット誤差を用いて計測対象の温度t(真値)の検出値Vtを補正することにより、第2の温度範囲22bにおいても高精度な温度検出が可能となる。   In the same manner as in the case of the first temperature range calibration point temperature Tα of the first temperature range 22a, a temperature near the second temperature range center value T2 is selected as the second temperature range calibration point temperature Tβ. Temperature calibration is performed on the detection value Vβ of the resistance temperature sensor 1 at the second temperature range calibration point temperature Tβ, and the resistance temperature sensor 1 and the temperature at the second temperature range calibration point temperature Tβ of the measurement error Δt. The composite offset error of the detection circuit 8a is acquired. The combined offset error acquired in advance using the temperature calibration means is held in the correction value holding unit 7. The calculation unit 6 can detect the temperature t (true value) to be measured using the combined offset error to detect the temperature with high accuracy even in the second temperature range 22b.

また、温度計測装置100aが第2の温度範囲22bにおいて温度計測を行う場合、ドリフト補正の際に利用する基準抵抗体として、第2の温度範囲22bに則した基準抵抗体20b(第2の基準抵抗体)が用いられる。このような基準抵抗体20bを用いることにより、温度検出回路8aの非線形誤差の影響を低減させることができる。第2の温度範囲校正点温度Tβでの温度校正時に基準抵抗体20bの計測値(基準電位差)を取得し、この基準電位差を初期値として補正値保持部7に保持する。温度計測装置100aは、第2の温度範囲22bの温度計側を行う場合、最新の基準抵抗体20bの計測値(電位差)と初期値(基準電位差)との差を計算して得られる値を補正値として用いる。このため、計測誤差中のドリフト誤差を効果的に抑制することができる。   When the temperature measuring device 100a performs temperature measurement in the second temperature range 22b, a reference resistor 20b (second reference) conforming to the second temperature range 22b is used as a reference resistor used for drift correction. Resistor) is used. By using such a reference resistor 20b, it is possible to reduce the influence of the nonlinear error of the temperature detection circuit 8a. A measured value (reference potential difference) of the reference resistor 20b is acquired at the time of temperature calibration at the second temperature range calibration point temperature Tβ, and this reference potential difference is held in the correction value holding unit 7 as an initial value. When the temperature measuring device 100a performs the thermometer side of the second temperature range 22b, a value obtained by calculating the difference between the latest measured value (potential difference) of the reference resistor 20b and the initial value (reference potential difference) is obtained. Used as a correction value. For this reason, the drift error in the measurement error can be effectively suppressed.

上記各実施例において、測温抵抗体センサ1及び温度検出回路8、8aの組み合わせで補正値を管理している場合、機器故障の際には、これらの両方を交換する必要がある。しかし、高精度の基準抵抗体20a、20bを用いて温度検出回路8、8aの誤差を比較補正することにより、誤差を抑制しながら温度検出回路8、8a単体での交換が可能となる。具体的には、まず交換元の温度検出基板において事前に測温抵抗体センサ1に替えて温度検出回路の外部の基準抵抗体を接続する。この基準抵抗体による検出値をRef1として不図示の記憶部に記憶させる。同様に、交換用の温度検出回路についても前述の交換元基板で事前に検出値を取得したものと同一の基準抵抗体を接続する。そして、この基準抵抗体による検出値をRef2として記憶部に記憶させる。ここで、検出値Ref1、Ref2の差は、各温度検出回路が有する誤差の個体差である。温度検出回路を交換した後、この個体差を演算部6で補正することにより、温度検出回路単体での交換が可能となる。   In each of the above embodiments, when the correction value is managed by the combination of the resistance temperature sensor 1 and the temperature detection circuits 8 and 8a, it is necessary to replace both of them when a device failure occurs. However, by comparing and correcting the errors of the temperature detection circuits 8 and 8a using the high-precision reference resistors 20a and 20b, it is possible to replace the temperature detection circuits 8 and 8a alone while suppressing the errors. Specifically, first, a reference resistor external to the temperature detection circuit is connected instead of the resistance temperature sensor 1 in advance on the temperature detection board of the replacement source. A value detected by the reference resistor is stored in a storage unit (not shown) as Ref1. Similarly, for the temperature detection circuit for replacement, the same reference resistor as that obtained in advance with the aforementioned replacement source board is connected. Then, the value detected by this reference resistor is stored in the storage unit as Ref2. Here, the difference between the detection values Ref1 and Ref2 is an individual difference in error of each temperature detection circuit. After the temperature detection circuit is replaced, the individual difference is corrected by the calculation unit 6 so that the temperature detection circuit alone can be replaced.

各温度検出回路誤差の個体差を算出する場合、前述のドリフト誤差成分も取得して補正することが好ましい。また、計測誤差21a(オフセット成分)が充分小さい超高精度基準抵抗体であれば、前述の温度検出回路個体差の補正値取得に同一個体の基準抵抗体を用いなくてもよい。   When calculating the individual difference of each temperature detection circuit error, it is preferable to acquire and correct the aforementioned drift error component. Further, as long as the measurement error 21a (offset component) is a sufficiently high precision reference resistor, the same individual reference resistor may not be used to obtain the correction value for the temperature detection circuit individual difference.

以上の温度計測装置を用いることで、0.001℃レベルでの高精度かつ低コストの温度計測が可能となる。また、このような温度計測装置を備えた半導体露光装置において、低コストで高精度な温調制御、温度管理を行い、装置精度を向上させることができる。   By using the above temperature measuring device, it is possible to measure the temperature at the 0.001 ° C. level with high accuracy and low cost. Further, in a semiconductor exposure apparatus equipped with such a temperature measuring device, high-precision temperature control and temperature management can be performed at low cost, and the accuracy of the device can be improved.

図5は、前記各実施例の温度計測装置を適用した半導体露光装置の概略構成図である。露光装置200は、原版(レチクル)のパターンを基板上(ウエハ上)に露光する露光装置である。温度計測装置100、100aは、露光装置200の内部の温度を計測する。図5に示されるように、露光装置200は、露光光を照射する照明装置30、レチクル(原版)を保持し相対的に移動させるレチクルステージ31、投影光学系32、及び、ウエハ(基板)を保持し相対的に移動させるウエハステージ33を備える。露光装置200は、レチクルに形成された回路パターン像をウエハに投影露光する。また、露光装置200の投影露光方式としては、ステップアンドリピート式やステップアンドスキャン式を適用することができる。   FIG. 5 is a schematic block diagram of a semiconductor exposure apparatus to which the temperature measuring apparatus of each of the embodiments is applied. The exposure apparatus 200 is an exposure apparatus that exposes a pattern of an original (reticle) on a substrate (on a wafer). The temperature measuring apparatuses 100 and 100a measure the temperature inside the exposure apparatus 200. As shown in FIG. 5, an exposure apparatus 200 includes an illumination apparatus 30 that irradiates exposure light, a reticle stage 31 that holds and relatively moves a reticle (original), a projection optical system 32, and a wafer (substrate). A wafer stage 33 that holds and relatively moves is provided. The exposure apparatus 200 projects and exposes a circuit pattern image formed on a reticle onto a wafer. Further, as the projection exposure method of the exposure apparatus 200, a step-and-repeat method or a step-and-scan method can be applied.

照明装置30は、回路パターンが形成されたレチクルを照明し、光源部と照明光学系とを有する。光源部は、例えば、光源としてレーザを使用する。レーザは、波長約193nmのArFエキシマレーザ、波長約248nmのKrFエキシマレーザ、又は、波長約153nmのF2エキシマレーザ等を用いることができる。レーザの種類はエキシマレーザに限定されるものではなく、例えば、YAGレーザを用いてもよい。また、そのレーザの個数も限定されるものではない。   The illumination device 30 illuminates a reticle on which a circuit pattern is formed, and includes a light source unit and an illumination optical system. The light source unit uses, for example, a laser as a light source. As the laser, an ArF excimer laser with a wavelength of about 193 nm, a KrF excimer laser with a wavelength of about 248 nm, an F2 excimer laser with a wavelength of about 153 nm, or the like can be used. The type of laser is not limited to the excimer laser, and for example, a YAG laser may be used. Further, the number of lasers is not limited.

光源としてレーザが用いられる場合、レーザ光源からの平行光束を所望のビーム形状に整形する光束整形光学系、コヒーレントなレーザ光束をインコヒーレント化するインコヒーレント化光学系を用いることが好ましい。また、光源部に使用可能な光源はレーザに限定されるものではなく、一又は複数の水銀ランプやキセノンランプ等のランプも使用可能である。照明光学系は、光源からの光を用いてレチクルを照明する光学系であり、レンズ、ミラー、ライトインテグレーター、及び、絞り等を備えて構成される。   When a laser is used as the light source, it is preferable to use a light beam shaping optical system that shapes the parallel light beam from the laser light source into a desired beam shape and an incoherent optical system that makes the coherent laser light beam incoherent. The light source that can be used for the light source unit is not limited to a laser, and one or a plurality of lamps such as a mercury lamp and a xenon lamp can be used. The illumination optical system is an optical system that illuminates a reticle using light from a light source, and includes a lens, a mirror, a light integrator, a diaphragm, and the like.

投影光学系32は、レチクルのパターンをウエハ上に投影する光学系である。投影光学系32は、複数のレンズ素子のみからなる光学系、又は、複数のレンズ素子と少なくとも1枚の凹面鏡とを有する光学系(カタディオプトリック光学系)から構成される。また、複数のレンズ素子と少なくとも1枚のキノフォーム等の回折光学素子とを有する光学系、又は、全ミラー型の光学系等を用いることもできる。露光装置200は、半導体集積回路等の半導体デバイスや、マイクロマシン、薄膜磁気ヘッド等の微細なパターンが形成されたデバイスの製造に利用され得る。   The projection optical system 32 is an optical system that projects a reticle pattern onto a wafer. The projection optical system 32 is configured by an optical system including only a plurality of lens elements, or an optical system (catadioptric optical system) having a plurality of lens elements and at least one concave mirror. An optical system having a plurality of lens elements and at least one diffractive optical element such as a kinoform, or an all-mirror optical system can also be used. The exposure apparatus 200 can be used for manufacturing a semiconductor device such as a semiconductor integrated circuit or a device on which a fine pattern such as a micromachine or a thin film magnetic head is formed.

デバイス(半導体集積回路素子、液晶表示素子等)は、前述のいずれかの実施例の露光装置を使用して感光剤を塗布した基板(ウエハ、ガラスプレート等)を露光する工程と、その基板を現像する工程と、他の周知の工程と、を経ることにより製造される。   A device (semiconductor integrated circuit element, liquid crystal display element, etc.) includes a step of exposing a substrate (wafer, glass plate, etc.) coated with a photosensitive agent using the exposure apparatus of any one of the embodiments described above, and the substrate It is manufactured by undergoing a development step and other known steps.

前記各実施例によれば、低コストで高精度な温度計測装置及び温度計測方法を提供することができる。また、高品質なデバイスの製造が可能な露光装置及びデバイス製造方法を提供することができる。   According to each of the embodiments, it is possible to provide a low-cost and high-accuracy temperature measurement device and temperature measurement method. Further, it is possible to provide an exposure apparatus and a device manufacturing method capable of manufacturing a high-quality device.

以上、本発明の実施例について具体的に説明した。ただし、本発明は上記実施例として記載された事項に限定されるものではなく、本発明の技術思想を逸脱しない範囲内で適宜変更が可能である。   The embodiment of the present invention has been specifically described above. However, the present invention is not limited to the matters described as the above-described embodiments, and can be appropriately changed without departing from the technical idea of the present invention.

1:測温抵抗体センサ
3:定電流源
4:差動アンプ部
5:A/D変換部
6:演算部
7:補正値保持部
8:温度検出回路
I:定電流
Va、Vb:電位差
Rt:抵抗値
10:切り替え手段
20a、20b:基準抵抗体
1: RTD sensor 3: Constant current source 4: Differential amplifier unit 5: A / D conversion unit 6: Calculation unit 7: Correction value holding unit 8: Temperature detection circuit I: Constant current Va, Vb: Potential difference Rt : Resistance value 10: Switching means 20a, 20b: Reference resistor

Claims (6)

温度に応じて抵抗値が変化する温度センサと、該温度センサの該抵抗値から該温度を検出する温度検出手段とを備えた温度計測装置であって、
前記温度検出手段は、
基準抵抗体と、
前記温度センサ又は前記基準抵抗体のいずれか一方に定電流を流す定電流手段と、
前記定電流を前記温度センサ又は前記基準抵抗体のいずれに流すかを決定する切り替え手段と、
前記定電流を前記温度センサに流した場合に該温度センサに生じる第1の電位差を検出し、該定電流を前記基準抵抗体に流した場合に該基準抵抗体に生じる第2の電位差を検出する電圧検出手段と、
予め計測された前記基準抵抗体の基準電位差、及び、予め計測された前記温度センサと前記温度検出手段との合成オフセット誤差を保持する保持手段と、
前記第2の電位差と前記基準電位差との差に相当するドリフト誤差、及び、前記合成オフセット誤差を前記第1の電位差に加算することにより該第1の電位差を補正する温度補正手段と、を有することを特徴とする温度計測装置。
A temperature measurement device comprising a temperature sensor whose resistance value changes according to temperature, and a temperature detection means for detecting the temperature from the resistance value of the temperature sensor,
The temperature detecting means includes
A reference resistor;
Constant current means for supplying a constant current to either the temperature sensor or the reference resistor;
Switching means for determining whether to pass the constant current to the temperature sensor or the reference resistor;
A first potential difference generated in the temperature sensor is detected when the constant current is passed through the temperature sensor, and a second potential difference generated in the reference resistor is detected when the constant current is passed through the reference resistor. Voltage detecting means for
Holding means for holding a reference potential difference of the reference resistor measured in advance, and a combined offset error between the temperature sensor and the temperature detecting means measured in advance;
Temperature correction means for correcting the first potential difference by adding the drift error corresponding to the difference between the second potential difference and the reference potential difference and the combined offset error to the first potential difference. A temperature measuring device characterized by that.
前記温度検出手段は、前記基準抵抗体が対象とする温度範囲とは異なる温度範囲を対象とする第2の基準抵抗体を更に有し、
前記電圧検出手段は、前記定電流を前記第2の基準抵抗体に流した場合に該第2の基準抵抗体に生じる第3の電位差を検出し、
前記温度補正手段は、前記第3の電位差と前記第2の基準抵抗体の基準電位差との差に相当する第2のドリフト誤差を前記第1の電位差に加算して該第1の電位差を補正することを特徴とする請求項1記載の温度計測装置。
The temperature detecting means further includes a second reference resistor that targets a temperature range different from a temperature range that the reference resistor targets.
The voltage detecting means detects a third potential difference generated in the second reference resistor when the constant current is passed through the second reference resistor;
The temperature correction means corrects the first potential difference by adding a second drift error corresponding to a difference between the third potential difference and a reference potential difference of the second reference resistor to the first potential difference. The temperature measuring device according to claim 1, wherein:
前記電圧検出手段は、前記第1の電位差の検出に対して前記第2の電位差の検出を間欠的に行い、
前記温度補正手段は、前記基準抵抗体の前記第2の電位差が検出されている際に、最後に取得した前記第1の電位差を補正して得られた温度検出値を出力することを特徴とする請求項1記載の温度計測装置。
The voltage detecting means intermittently detects the second potential difference with respect to the detection of the first potential difference;
The temperature correction means outputs a temperature detection value obtained by correcting the first potential difference acquired last when the second potential difference of the reference resistor is detected. The temperature measuring device according to claim 1.
温度に応じて抵抗値が変化する温度センサと、該温度センサの該抵抗値から該温度を検出する温度検出手段とを用いて温度を計測する温度計測方法であって、
前記温度センサに定電流を流して該温度センサに生じる第1の電位差を検出する工程と、
前記温度検出手段の基準抵抗体に前記定電流を流して該基準抵抗体に生じる第2の電位差を検出する工程と、
前記第2の電位差と予め計測された前記基準抵抗体の基準電位差との差に相当するドリフト誤差、及び、予め計測された前記温度センサと前記温度検出手段との合成オフセット誤差を前記第1の電位差に加算することにより該第1の電位差を補正する工程と、を有することを特徴とする温度計測方法。
A temperature measurement method for measuring temperature using a temperature sensor whose resistance value changes according to temperature and a temperature detection means for detecting the temperature from the resistance value of the temperature sensor,
Detecting a first potential difference generated in the temperature sensor by passing a constant current through the temperature sensor;
Passing a constant current through a reference resistor of the temperature detecting means to detect a second potential difference generated in the reference resistor;
A drift error corresponding to a difference between the second potential difference and a reference potential difference of the reference resistor measured in advance, and a combined offset error between the temperature sensor and the temperature detection unit measured in advance are calculated as the first offset. And correcting the first potential difference by adding to the potential difference.
原版のパターンを基板上に露光する露光装置であって、
光源からの光を用いて前記原版を照明する照明光学系と、
前記原版の前記パターンを前記基板上に投影する投影光学系と、
前記露光装置の内部の温度を計測する請求項1乃至3のいずれか一に記載の温度計測装置と、を有することを特徴とする露光装置。
An exposure apparatus that exposes a pattern of an original on a substrate,
An illumination optical system that illuminates the original using light from a light source;
A projection optical system that projects the pattern of the original onto the substrate;
An exposure apparatus comprising: the temperature measurement apparatus according to claim 1, which measures a temperature inside the exposure apparatus.
請求項5記載の露光装置を用いて基板を露光する工程と、
露光された前記基板を現像する工程と、を有することを特徴とするデバイス製造方法。
Exposing the substrate using the exposure apparatus according to claim 5;
And developing the exposed substrate. A device manufacturing method comprising:
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