JP5253677B2 - ヘキサクロロジシラン含有蒸気の廃棄処理方法 - Google Patents
ヘキサクロロジシラン含有蒸気の廃棄処理方法 Download PDFInfo
- Publication number
- JP5253677B2 JP5253677B2 JP2012556501A JP2012556501A JP5253677B2 JP 5253677 B2 JP5253677 B2 JP 5253677B2 JP 2012556501 A JP2012556501 A JP 2012556501A JP 2012556501 A JP2012556501 A JP 2012556501A JP 5253677 B2 JP5253677 B2 JP 5253677B2
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- Japan
- Prior art keywords
- hexachlorodisilane
- steam
- disposal method
- alcohol
- hydrocarbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- LXEXBJXDGVGRAR-UHFFFAOYSA-N trichloro(trichlorosilyl)silane Chemical compound Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl LXEXBJXDGVGRAR-UHFFFAOYSA-N 0.000 title claims description 21
- 238000000034 method Methods 0.000 claims description 12
- 229930195733 hydrocarbon Natural products 0.000 claims description 10
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 claims description 9
- 150000002430 hydrocarbons Chemical class 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000004215 Carbon black (E152) Substances 0.000 claims description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 6
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 6
- 239000004202 carbamide Substances 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 6
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 claims description 5
- 150000001298 alcohols Chemical class 0.000 claims description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 4
- 238000009835 boiling Methods 0.000 claims description 4
- JYVLIDXNZAXMDK-UHFFFAOYSA-N pentan-2-ol Chemical compound CCCC(C)O JYVLIDXNZAXMDK-UHFFFAOYSA-N 0.000 claims description 4
- AQIXEPGDORPWBJ-UHFFFAOYSA-N pentan-3-ol Chemical compound CCC(O)CC AQIXEPGDORPWBJ-UHFFFAOYSA-N 0.000 claims description 4
- 239000008096 xylene Substances 0.000 claims description 4
- 239000002699 waste material Substances 0.000 claims 1
- 239000002912 waste gas Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- -1 carbon atom Hydrocarbons Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2251/00—Reactants
- B01D2251/20—Reductants
- B01D2251/206—Ammonium compounds
- B01D2251/2067—Urea
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2251/00—Reactants
- B01D2251/20—Reductants
- B01D2251/208—Hydrocarbons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
- B01D2257/204—Inorganic halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Biomedical Technology (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treating Waste Gases (AREA)
- Silicon Compounds (AREA)
- Gas Separation By Absorption (AREA)
- Processing Of Solid Wastes (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
好ましくは無極性炭化水素、例えば脂肪族又は芳香族の炭化水素、より好ましくは常圧(900〜1100hPa)で好ましくは100℃未満の沸点を有する炭化水素をベースとする溶剤、好ましくは炭素原子1〜20個を有する、より好ましくは炭素原子6〜12個を有する炭化水素、特に好ましくはオクタン、ノナン、デカン、ベンゼン、トルエン、キシレン、その際にキシレンが特に好ましい。
好ましくは900〜1100hPa及び25℃で液体であるアルコール、好ましくは全て900〜1100hPaの圧力で50℃〜150℃、より好ましくは90℃〜110℃、特に好ましくは100℃〜120℃の沸点を有し、好ましくは炭素原子1〜6個、好ましくは炭素原子3〜5個を有する、単官能性のアルコール、二官能性又は多官能性のアルコール、特に好ましくはペンタノール類、例えば1−ペンタノール、2−ペンタノール、3−ペンタノール並びに1−ブタノール、2−ブタノール、3−ブタノール、1−プロパノール、2−プロパノール、その際に3−ブタノールが特に好ましい。
・尿素0.1〜0.5モル、特に好ましくは0.2〜0.4モル
・溶剤10〜200ml、特に好ましくは溶剤50〜100mlが使用される。
ヘキサクロロジシランが窒素下に蒸留される装置からの廃ガスを、キシレン50ml、t−ブタノール50ml及び尿素10gの混合物に通す。混合物を、マグネチックスターラーを用いて撹拌する。ガス出口で、廃ガスをシリコーン油のみに通す装置とは異なり、金属と接触する際に発火する白色付着物は形成されない。
Claims (7)
- ヘキサクロロジシラン含有蒸気の廃棄処理方法であって、
ヘキサクロロジシラン含有蒸気を、900〜1100hPa及び25℃で液体の無極性炭化水素と、尿素と、900〜1100hPa及び25℃で液体のアルコールとを含有する混合物へ通す
ことを特徴とする、ヘキサクロロジシラン含有蒸気の廃棄処理方法。 - 炭化水素が常圧(900〜1100hPa)で100℃未満の沸点を有する、請求項1記載のヘキサクロロジシラン含有蒸気の廃棄処理方法。
- 炭化水素が炭素原子1〜20個を有する、請求項1又は2記載のヘキサクロロジシラン含有蒸気の廃棄処理方法。
- 炭化水素が炭素原子6〜12個を有する、請求項3記載のヘキサクロロジシラン含有蒸気の廃棄処理方法。
- 炭化水素がキシレンである、請求項1から4までのいずれか1項記載のヘキサクロロジシラン含有蒸気の廃棄処理方法。
- アルコールが、炭素原子1〜6個を有するアルコールである、請求項1から5までのいずれか1項記載のヘキサクロロジシラン含有蒸気の廃棄処理方法。
- アルコールが、1−ペンタノール、2−ペンタノール、3−ペンタノール、1−ブタノール、2−ブタノール、3−ブタノール、1−プロパノール、2−プロパノールから選択される、請求項1から6までのいずれか1項記載のヘキサクロロジシラン含有蒸気の廃棄処理方法。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102010002812.6 | 2010-03-12 | ||
| DE102010002812A DE102010002812A1 (de) | 2010-03-12 | 2010-03-12 | Verfahren zur Entsorgung Hexachlordisilan-haltiger Dämpfe |
| PCT/EP2011/053523 WO2011110586A1 (de) | 2010-03-12 | 2011-03-09 | Verfahren zur entsorgung hexachlordisilan-haltiger dämpfe |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013522001A JP2013522001A (ja) | 2013-06-13 |
| JP5253677B2 true JP5253677B2 (ja) | 2013-07-31 |
Family
ID=44168188
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012556501A Expired - Fee Related JP5253677B2 (ja) | 2010-03-12 | 2011-03-09 | ヘキサクロロジシラン含有蒸気の廃棄処理方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9504959B2 (ja) |
| EP (1) | EP2544795B1 (ja) |
| JP (1) | JP5253677B2 (ja) |
| KR (1) | KR101469336B1 (ja) |
| CN (1) | CN102791360B (ja) |
| DE (1) | DE102010002812A1 (ja) |
| WO (1) | WO2011110586A1 (ja) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6225812B2 (ja) | 2014-04-18 | 2017-11-08 | 日亜化学工業株式会社 | 発光装置 |
| DE102014018435A1 (de) | 2014-12-10 | 2016-06-16 | Silicon Products Bitterfeld GmbH&CO.KG | Verfahren zur Gewinnung von Hexachlordisilan aus in Prozessabgasströmen enthaltenen Gemischen von Chlorsilanen |
| KR101750451B1 (ko) | 2015-06-05 | 2017-06-27 | 오션브릿지 주식회사 | 고순도 헥사클로로디실란 파티클 제거 장치 |
| US10550002B2 (en) | 2018-05-23 | 2020-02-04 | National Kaohsiung University Of Science And Technology | Method for treatment of hexachlorodisilane and hydrolyzed product |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB993249A (en) * | 1961-03-02 | 1965-05-26 | Unilever Ltd | Organic silicates |
| DE3503262A1 (de) * | 1985-01-31 | 1986-08-07 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verfahren zum aufarbeiten von bei der siliciumherstellung anfallenden halogensilangemischen |
| JPH0749093B2 (ja) * | 1987-02-28 | 1995-05-31 | 高純度シリコン株式会社 | 珪素化合物を含むガスの処理方法 |
| DE19654556A1 (de) * | 1996-12-27 | 1998-07-02 | Wacker Chemie Gmbh | Harnstoffgruppen aufweisende Organosiliciumverbindungen, deren Herstellung sowie deren Verwendung |
| JPH11253741A (ja) * | 1998-03-13 | 1999-09-21 | Tokuyama Corp | シラン類の処理方法 |
| JP4465961B2 (ja) | 2000-08-02 | 2010-05-26 | 三菱マテリアル株式会社 | 六塩化二珪素の製造方法 |
| EP2000195B1 (en) * | 2006-03-07 | 2013-10-23 | Kanken Techno Co. Ltd. | Method of making hcd gas harmless and apparatus therefor |
| CN101143297B (zh) * | 2006-09-15 | 2010-08-18 | 中国石油化工股份有限公司 | 污水储罐排放气的净化处理方法 |
| JP4793407B2 (ja) * | 2008-05-26 | 2011-10-12 | 東亞合成株式会社 | クロロポリシランを含む廃ガスの処理方法及びその処理装置 |
-
2010
- 2010-03-12 DE DE102010002812A patent/DE102010002812A1/de not_active Withdrawn
-
2011
- 2011-03-09 KR KR1020127025250A patent/KR101469336B1/ko not_active Expired - Fee Related
- 2011-03-09 CN CN201180011979.7A patent/CN102791360B/zh not_active Expired - Fee Related
- 2011-03-09 US US13/634,508 patent/US9504959B2/en not_active Expired - Fee Related
- 2011-03-09 WO PCT/EP2011/053523 patent/WO2011110586A1/de not_active Ceased
- 2011-03-09 JP JP2012556501A patent/JP5253677B2/ja not_active Expired - Fee Related
- 2011-03-09 EP EP11707413.8A patent/EP2544795B1/de not_active Not-in-force
Also Published As
| Publication number | Publication date |
|---|---|
| US20130004399A1 (en) | 2013-01-03 |
| KR101469336B1 (ko) | 2014-12-10 |
| US9504959B2 (en) | 2016-11-29 |
| CN102791360A (zh) | 2012-11-21 |
| WO2011110586A1 (de) | 2011-09-15 |
| EP2544795A1 (de) | 2013-01-16 |
| DE102010002812A1 (de) | 2011-09-15 |
| CN102791360B (zh) | 2015-06-24 |
| KR20130004319A (ko) | 2013-01-09 |
| EP2544795B1 (de) | 2014-04-30 |
| JP2013522001A (ja) | 2013-06-13 |
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