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JP5255359B2 - Precursor solution for film formation - Google Patents
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JP5255359B2 - Precursor solution for film formation - Google Patents

Precursor solution for film formation Download PDF

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JP5255359B2
JP5255359B2 JP2008193871A JP2008193871A JP5255359B2 JP 5255359 B2 JP5255359 B2 JP 5255359B2 JP 2008193871 A JP2008193871 A JP 2008193871A JP 2008193871 A JP2008193871 A JP 2008193871A JP 5255359 B2 JP5255359 B2 JP 5255359B2
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hydrogen peroxide
precursor solution
solution
film
niobium
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JP2010031125A (en
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邦彦 中田
健一朗 菅原
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Sumitomo Chemical Co Ltd
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Description

本発明は、例えば、ニオブまたはタンタルをドーパントとした酸化チタン系透明導電膜や、酸化ニオブまたは酸化タンタルを含む反射防止膜などを塗布法で形成する際に好適に用いられる、優れた保存安定性を備えた膜形成用前駆体溶液に関する。   The present invention, for example, has excellent storage stability that is suitably used when forming a titanium oxide transparent conductive film using niobium or tantalum as a dopant or an antireflection film containing niobium oxide or tantalum oxide by a coating method. It is related with the precursor solution for film formation provided with.

周期律表のVA族に属する5価のニオブやタンタルは、例えば、酸化チタン系透明導電膜の導電性を高めるためのドーパントとして有用であることが知られている。また、それらの金属酸化物は、反射防止膜の構成材料として利用されている。
このようなニオブまたはタンタルドープ酸化チタン系透明導電膜や酸化ニオブまたは酸化タンタルからなる反射防止膜などの金属酸化物の薄膜を形成する方法としては、大別して、スパッタ法やPLD(パルスレーザーデポジション)法のように真空系で成膜する方法と、金属酸化物粒子を含むスラリーあるいは溶液を基材に塗布した後に加熱する方法とがあるが、前者の真空系での成膜法は、大掛かりな装置が必要で設備的なコストが嵩み、ひいては製品コストの高騰が避けられない。そのため、近年では、既存の設備を用いて簡便な操作で安価に実施することができる点で工業的な大量生産に適している後者の塗布法が有望視されている。
It is known that pentavalent niobium or tantalum belonging to group VA of the periodic table is useful as a dopant for increasing the conductivity of a titanium oxide-based transparent conductive film, for example. Moreover, those metal oxides are utilized as a constituent material of an antireflection film.
Methods of forming such metal oxide thin films such as a niobium or tantalum-doped titanium oxide transparent conductive film or an antireflection film made of niobium oxide or tantalum oxide can be broadly divided into sputtering and PLD (pulse laser deposition). ) Method of forming a film in a vacuum system, and a method of heating after applying a slurry or solution containing metal oxide particles to a substrate, but the former film forming method in a vacuum system is large-scale. Equipment is necessary and the cost of equipment is increased, and as a result, the product cost is inevitably increased. Therefore, in recent years, the latter coating method suitable for industrial mass production is promising in that it can be implemented at low cost by a simple operation using existing equipment.

ニオブまたはタンタルドープ酸化チタン系薄膜や、酸化ニオブまたは酸化タンタルの薄膜といったニオブまたはタンタルを含む金属酸化物膜を塗布法で形成するに際しては、前駆体として、ニオブ化合物またはタンタル化合物に過酸化水素を反応させてペルオキソ化した反応生成物(すなわちペルオキシ錯体)が用いられる。
例えば、本発明者は、先般、ニオブまたはタンタルがドープされた酸化チタンからなる透明導電性膜を備えた新たな透明導電性基板の製造方法として、チタン化合物に過酸化水素を反応させてペルオキソ化した反応生成物と、ニオブ化合物またはタンタル化合物に過酸化水素を反応させてペルオキソ化した反応生成物とを含む前駆体液を、透明基板上に塗布し、還元雰囲気下にてアニール処理を施す方法を提案した(特願2007−280071号)が、そのなかでも、ニオブ化合物またはタンタル化合物に過酸化水素を反応させてペルオキソ化した反応生成物(ニオブまたはタンタルのペルオキシ錯体)をドープ原料として用いている。
When forming a niobium or tantalum-doped titanium oxide thin film or a metal oxide film containing niobium or tantalum such as a niobium oxide or tantalum oxide thin film by a coating method, hydrogen peroxide is added to the niobium compound or tantalum compound as a precursor. A reaction product peroxylated by reaction (ie peroxy complex) is used.
For example, the present inventor has recently proposed a method for producing a transparent conductive substrate comprising a transparent conductive film made of titanium oxide doped with niobium or tantalum by peroxidation by reacting a titanium compound with hydrogen peroxide. A precursor solution containing a reaction product obtained by reacting a niobium compound or a tantalum compound with hydrogen peroxide and peroxidation is applied on a transparent substrate and subjected to an annealing treatment in a reducing atmosphere. Among them, a proposed product (Japanese Patent Application No. 2007-280071) uses a reaction product (peroxy complex of niobium or tantalum) obtained by reacting a niobium compound or a tantalum compound with hydrogen peroxide and peroxidizing it as a doping material. .

しかしながら、一般に、金属化合物に過酸化水素を反応させて生じるペルオキシ錯体は、不安定であるため、室温以上で放置しておくと、分解が進行してペルオキシ基由来の酸素が放出される傾向があり、結果として、ゲル化もしくは白濁化が生じやすく、場合によっては膜形成時の塗布性、膜の密着性および透明性などに重大な欠点を招くおそれがあった。そのため、これまで、金属化合物に過酸化水素を反応させた反応生成物(ペルオキシ錯体)を膜形成用前駆体溶液として用いる場合には、調製後直ちに使用するか、あるいは保存する場合には室温未満(例えば0℃以下)に冷却しておくなど、様々な制約がある中で取り扱われてきたが、そのような制約を取り払うべく、室温で長期間安定に保持させうるペルオキシ錯体が要望されている。これは、金属種がニオブやタンタルである場合に限らず、チタンペルオキシ錯体などにおいても同様である。   However, in general, a peroxy complex produced by reacting hydrogen peroxide with a metal compound is unstable. Therefore, when left at room temperature or higher, decomposition tends to proceed and oxygen derived from the peroxy group tends to be released. As a result, gelation or white turbidity is likely to occur, and in some cases, there is a possibility of causing serious drawbacks in coating properties, film adhesion, and transparency. Therefore, until now, when using a reaction product (peroxy complex) obtained by reacting hydrogen peroxide with a metal compound as a precursor solution for film formation, it should be used immediately after preparation or at room temperature when stored. Although it has been handled under various restrictions such as cooling to (for example, 0 ° C. or lower), a peroxy complex that can be stably maintained at room temperature for a long period of time has been demanded in order to remove such restrictions. . This is not limited to the case where the metal species is niobium or tantalum, but the same applies to titanium peroxy complexes.

ニオブまたはタンタルのペルオキシ錯体の安定性については、これまで殆ど報告された例はないが、従来から光触媒分野における膜形成材料や粘着性塗料などとして汎用され、比較的研究が進んでいるチタンペルオキシ錯体に関しては、その溶液の安定性についても種々報告されている(例えば、特許文献1参照)。それによれば、安定なチタンペルオキシ錯体を得る際のチタン化合物と過酸化水素との最適な反応比率は1:1であることが知られている。つまり、チタン1原子につき過酸化イオン1原子が結合した構造であるチタンペルオキシ錯体が、最も良好な保存安定性を示すのである。   There have been few reports on the stability of niobium or tantalum peroxy complexes, but titanium peroxy complexes that have been widely used as film-forming materials and adhesive coatings in the photocatalyst field and have been studied relatively well. With regard to, various reports have been made on the stability of the solution (see, for example, Patent Document 1). According to this, it is known that the optimum reaction ratio between the titanium compound and hydrogen peroxide for obtaining a stable titanium peroxy complex is 1: 1. That is, a titanium peroxy complex having a structure in which one atom of peroxide ion is bonded to one atom of titanium exhibits the best storage stability.

しかしながら、上述した最適な反応比率で安定化したチタンペルオキシ錯体であっても、固形分濃度を高くすると、未だ充分な安定性は得られないのが現状であり、例えば、固形分濃度が2重量%以上になると室温で1日以内にゲル化してしまうのが通常であった。膜形成用材料として用いる場合、一回の塗布で充分な膜厚を得るため、通常、固形分濃度はある程度高く設定することが望まれるので、上記チタンペルオキシ錯体は、高濃度でも室温で数日間保存できる程度のさらなる安定性向上が要望されている。   However, even if the titanium peroxy complex is stabilized at the optimum reaction ratio described above, if the solid content concentration is increased, sufficient stability cannot be obtained yet. For example, the solid content concentration is 2% by weight. In general, it would gel within one day at room temperature. When used as a film-forming material, in order to obtain a sufficient film thickness by a single application, it is usually desirable to set the solid content concentration to a certain level. Therefore, the titanium peroxy complex is used at room temperature for several days even at high concentrations. There is a need for further stability improvements that can be preserved.

チタンペルオキシ錯体の安定性が上述したような現状にあるなか、ニオブまたはタンタルのペルオキシ錯体についても、同様に充分な安定性を確保するのは困難であり、例えば、上述したチタン化合物と過酸化水素との最適な比率(1:1)を、ニオブ化合物またはタンタル化合物と過酸化水素との最適比率に適用してみても、固形分濃度が高くなると室温で数日間安定して保存することはできなかった。   While the stability of the titanium peroxy complex is as described above, it is difficult to ensure sufficient stability for the niobium or tantalum peroxy complex as well, such as the titanium compound and hydrogen peroxide described above. Even if the optimal ratio (1: 1) is applied to the optimal ratio of niobium compound or tantalum compound and hydrogen peroxide, it can be stably stored at room temperature for several days when the solid content concentration increases. There wasn't.

特表2007−532469号公報Special table 2007-532469

本発明は、上記のような事情に鑑みなされたものであって、ニオブまたはタンタルを含む膜の塗布法による形成を可能にする、優れた保存安定性を備えた膜形成用前駆体溶液を提供することを目的とする。   The present invention has been made in view of the above circumstances, and provides a film forming precursor solution having excellent storage stability that enables formation of a film containing niobium or tantalum by a coating method. The purpose is to do.

本発明者は、前記課題を解決するべく鋭意検討を行った。その結果、ニオブ化合物またはタンタル化合物に過酸化水素を反応させるにあたり、ニオブ化合物またはタンタル化合物と過酸化水素との比率を、従来の知見(すなわち、安定なチタンペルオキシ錯体の最適比率が1:1であること)から好ましいであろうと推測される比率(すなわち、チタンペルオキシ錯体と同じ1:1)から外れた特定範囲に設定してみたところ、予想に反して、極めて優れた保存安定性を有するペルオキシ錯体が得られることを見出した。そして、この予想を超えた高い安定性を備えたペルオキシ錯体であれば、固形分濃度を8.5重量%まで高めることができることを見出し、本発明を完成した。   The present inventor has intensively studied to solve the above problems. As a result, when the hydrogen peroxide is reacted with the niobium compound or the tantalum compound, the ratio of the niobium compound or tantalum compound to hydrogen peroxide is determined based on the conventional knowledge (that is, the optimum ratio of the stable titanium peroxy complex is 1: 1). When the specific range deviating from the ratio that is presumed to be preferable (that is, the same 1: 1 as the titanium peroxy complex) was set, a peroxy having extremely excellent storage stability, contrary to expectations. It was found that a complex was obtained. And if it was the peroxy complex provided with the high stability which exceeded this expectation, it discovered that solid content concentration could be raised to 8.5 weight%, and completed this invention.

すなわち、本発明は、以下の構成からなる。
(i)ニオブ化合物またはタンタル化合物1モルに対して2.5〜3.5モルの過酸化水素を反応させてなる反応生成物を含み、固形分濃度が8.5重量%以下である、ことを特徴とする膜形成用前駆体溶液。
(ii)下記一般式(1)〜(5)のいずれかで表される溶剤をも含有する、前記(i)記載の膜形成用前駆体溶液。

Figure 0005255359
(式(1)中、R1〜R6は、Hまたはアルキル基を表し、各々同じであってもよいし異なっていてもよい。Xは、−OHまたは−OR(ただし、Rはアルキル基を表す)を表す。)
Figure 0005255359
(式(2)中、R1〜R5は、Hまたはアルキル基を表し、各々同じであってもよいし異なっていてもよい。Xは、−OHまたは−OR(ただし、Rはアルキル基を表す)を表す。)
Figure 0005255359
(式(3)中、R1〜R7は、Hまたはアルキル基を表し、各々同じであってもよいし異なっていてもよい。Xは、−OHまたは−OR(ただし、Rはアルキル基を表す)を表す。)
Figure 0005255359
(式(4)中、Yは、置換基を有していてもよい炭素数3〜6のアルキレン基を表す。)
Figure 0005255359
(式(5)中、Yは、置換基を有していてもよい炭素数3〜6のアルキレン基を表す。)
(iii)前記溶剤は、3−メトキシ−1−ブタノール、3−メトキシ−3−メチル−1−ブタノール、ジアセトンアルコール、4−ヒドロキシ−2−ブタノン、5−ヒドロキシ−2−ペンタノン、テトラヒドロフラン−2−カルボン酸、2−メチル−1,3−プロパンジオール、γ−ブチロラクトン、δ−バレロラクトン、ε−カプロラクトンからなる群より選ばれる少なくとも1種である、前記(ii)記載の膜形成用前駆体溶液。 That is, this invention consists of the following structures.
(I) a reaction product obtained by reacting 2.5 to 3.5 moles of hydrogen peroxide with 1 mole of niobium compound or tantalum compound, and having a solid content concentration of 8.5% by weight or less. A precursor solution for film formation characterized by the following.
(ii) The film forming precursor solution according to the above (i), which also contains a solvent represented by any one of the following general formulas (1) to (5).
Figure 0005255359
(In Formula (1), R < 1 > -R < 6 > represents H or an alkyl group, and may respectively be the same or different. X is -OH or -OR (However, R is an alkyl group. Represents).)
Figure 0005255359
(In Formula (2), R < 1 > -R < 5 > represents H or an alkyl group, and may respectively be the same or different. X is -OH or -OR (However, R is an alkyl group. Represents).)
Figure 0005255359
(In Formula (3), R < 1 > -R < 7 > represents H or an alkyl group, and may respectively be the same or different. X is -OH or -OR (However, R is an alkyl group. Represents).)
Figure 0005255359
(In formula (4), Y represents an alkylene group having 3 to 6 carbon atoms which may have a substituent.)
Figure 0005255359
(In formula (5), Y represents a C3-C6 alkylene group which may have a substituent.)
(Iii) The solvent is 3-methoxy-1-butanol, 3-methoxy-3-methyl-1-butanol, diacetone alcohol, 4-hydroxy-2-butanone, 5-hydroxy-2-pentanone, tetrahydrofuran-2 -Film forming precursor according to (ii) above, which is at least one selected from the group consisting of carboxylic acid, 2-methyl-1,3-propanediol, γ-butyrolactone, δ-valerolactone, and ε-caprolactone solution.

本発明によれば、優れた保存安定性を有するニオブまたはタンタルのペルオキシ錯体を含む膜形成用前駆体溶液を提供することができ、これにより、ニオブまたはタンタルドープ酸化チタン系薄膜や、酸化ニオブまたは酸化タンタルの薄膜といったニオブまたはタンタルを含む金属酸化物膜を塗布法にて形成することができる。詳しくは、前記膜形成用前駆体溶液は、ゲル化もしくは白濁化を生じることなく室温で数日間安定に保持させることができるものであり、調製後直ちに使用するか、室温未満(例えば0℃以下)に冷却して保存しなければならないなど特段の制約もなく、膜形成に用いることができる。さらに、前記膜形成用前駆体溶液が有する優れた安定性の下では、従来よりも固形分濃度を高めることが可能であるので、膜形成時に一回の塗布で形成する膜厚を大きく設定できる点でも有利である。   According to the present invention, it is possible to provide a film-forming precursor solution containing a niobium or tantalum peroxy complex having excellent storage stability, whereby a niobium or tantalum-doped titanium oxide thin film, niobium oxide or A metal oxide film containing niobium or tantalum such as a tantalum oxide thin film can be formed by a coating method. Specifically, the film-forming precursor solution can be stably maintained for several days at room temperature without causing gelation or clouding, and can be used immediately after preparation, or less than room temperature (for example, 0 ° C. or less). The film can be used for film formation without any particular restriction such as being cooled and stored. Furthermore, under the excellent stability of the film-forming precursor solution, the solid content concentration can be increased as compared with the prior art, so that the film thickness formed by a single coating can be set larger during film formation. This is also advantageous.

本発明の膜形成用前駆体溶液は、ニオブ化合物またはタンタル化合物に対して過酸化水素を反応させてなる反応生成物、すなわち、ニオブ化合物またはタンタル化合物がペルオキシ化されてなる錯体(ペルオキシ錯体)を含む。このペルオキシ錯体は、単独で加熱することにより酸化ニオブまたは酸化タンタルとなり、他方、例えばチタンペルオキシ錯体とともに加熱することによりニオブまたはタンタルがドープされた酸化チタンとなる金属酸化物前駆体となる。   The film forming precursor solution of the present invention comprises a reaction product obtained by reacting hydrogen peroxide with a niobium compound or a tantalum compound, that is, a complex (peroxy complex) formed by peroxylating the niobium compound or the tantalum compound. Including. This peroxy complex becomes niobium oxide or tantalum oxide by heating alone, and becomes a metal oxide precursor which becomes titanium oxide doped with niobium or tantalum by heating with, for example, a titanium peroxy complex.

本発明において、前記反応生成物はニオブ化合物またはタンタル化合物1モルに対して2.5〜3.5モルの過酸化水素を反応させてなる。好ましくは、ニオブ化合物またはタンタル化合物1モルに対して2.8〜3.2モルの過酸化水素を反応させてなるのがよい。これにより、優れた安定性を有する反応生成物(ペルオキシ錯体)が得られ、本発明の前駆体溶液は、例えば室温(20±5℃)で10日以上、好ましくは15日以上、より好ましくは20日以上、さらに好ましくは30日以上の長期間安定に保存することができる。ニオブ化合物またはタンタル化合物に反応させる過酸化水素の量が前記範囲よりも少ない場合、多い場合とも、ペルオキシ錯体の保存安定性は低下し、前駆体溶液を室温で数時間〜数日間(例えば1時間〜4日間程度)保持すると、ゲル化もしくは白濁化を生じることとなる。特に、過酸化水素の量が前記範囲よりも多い場合には、過剰分のフリーの過酸化水素が分解することにより発熱してしまい、液の安定性は大幅に低下する。   In the present invention, the reaction product is obtained by reacting 2.5 to 3.5 moles of hydrogen peroxide with 1 mole of niobium compound or tantalum compound. Preferably, 2.8 to 3.2 mol of hydrogen peroxide is reacted with 1 mol of niobium compound or tantalum compound. Thereby, a reaction product (peroxy complex) having excellent stability is obtained, and the precursor solution of the present invention is, for example, at room temperature (20 ± 5 ° C.) for 10 days or more, preferably 15 days or more, more preferably It can be stored stably for a long period of 20 days or longer, more preferably 30 days or longer. When the amount of hydrogen peroxide reacted with the niobium compound or the tantalum compound is less than the above range, the storage stability of the peroxy complex is lowered, and the precursor solution is allowed to stand at room temperature for several hours to several days (for example, 1 hour). When held for about 4 days, gelation or white turbidity occurs. In particular, when the amount of hydrogen peroxide is larger than the above range, excessive free hydrogen peroxide decomposes to generate heat, and the stability of the liquid is greatly reduced.

本発明の膜形成用前駆体溶液は、固形分濃度が8.5重量%以下であり、より好ましくは、8.0重量%以下、さらに好ましくは7.5重量%以下、さらに好ましくは7.0重量%以下である。本発明の前駆体溶液に含まれるペルオキシ錯体は優れた保存安定性を有するものであるので、このように比較的高い固形分濃度に設定しても、常温で数日間、ゲル化もしくは白濁化を生じることなく安定に保持させることができる。固形分濃度の下限については、特に制限されないが、例えば、膜形成時の塗布性を考慮すると、2重量%以上であるのが好ましく、4重量%以上であるのがより好ましい。なお、ここでいう固形分濃度は、前駆体溶液を得る際に用いたニオブ化合物またはタンタル化合物の重量が、前駆体溶液の全重量中に占める割合(重量%)を意味するものである。   The film-forming precursor solution of the present invention has a solid content concentration of 8.5% by weight or less, more preferably 8.0% by weight or less, still more preferably 7.5% by weight or less, and even more preferably 7.% by weight. 0% by weight or less. Since the peroxy complex contained in the precursor solution of the present invention has excellent storage stability, even if it is set to such a relatively high solid content concentration, gelation or turbidity will occur for several days at room temperature. It can be stably held without being generated. The lower limit of the solid content concentration is not particularly limited, but is preferably 2% by weight or more, and more preferably 4% by weight or more in consideration of, for example, applicability during film formation. In addition, solid content concentration here means the ratio (weight%) which the weight of the niobium compound or tantalum compound used when obtaining the precursor solution occupies in the total weight of the precursor solution.

ニオブ化合物またはタンタル化合物に過酸化水素を反応させて前記反応生成物を得る際には、過酸化水素による反応(すなわち、ペルオキシ化反応)は、例えば、ニオブ化合物またはタンタル化合物を適当な溶媒により溶解させ、必要に応じて攪拌しつつ、濃度1〜60重量%程度の過酸化水素水を添加することにより行うことができる。ペルオキシ化反応の反応時間は、通常1秒〜60分、好ましくは5分〜20分程度である。なお、過酸化水素によるペルオキシ化反応は、通常、激しい発熱を伴うので、反応は冷却しながら(具体的には、内温を−10℃以下に保つようにして)行うことが望ましい。反応後、さらに−10℃以下に冷却しつつ熟成保持してもよい。   When the reaction product is obtained by reacting niobium compound or tantalum compound with hydrogen peroxide, the reaction with hydrogen peroxide (that is, peroxylation reaction) is performed by, for example, dissolving the niobium compound or tantalum compound in an appropriate solvent. It can be carried out by adding a hydrogen peroxide solution having a concentration of about 1 to 60% by weight while stirring as necessary. The reaction time of the peroxylation reaction is usually about 1 second to 60 minutes, preferably about 5 minutes to 20 minutes. Since the peroxylation reaction with hydrogen peroxide usually involves intense heat generation, it is desirable to carry out the reaction while cooling (specifically, keeping the internal temperature at −10 ° C. or lower). After the reaction, aging may be maintained while further cooling to −10 ° C. or lower.

前記ニオブ化合物は、ニオブ源としてNb原子を含むものであれば特に制限はなく、例えば、塩化ニオブ、ニオブアルコキシド(メトキシド、エトキシド等)、金属ニオブ、水酸化ニオブ等を用いることができる。他方、前記タンタル化合物は、タンタル源としてTa原子を含むものであれば特に制限はなく、例えば、塩化タンタル、タンタルアルコキシド(メトキシド、エトキシド等)、金属タンタル、水酸化タンタル等を用いることができる。なお、上記のうち、チタンアルコキシド、ニオブアルコキシド、タンタルアルコキシドは、水分と接触すると直ちに反応する不安定な物質なので、乾燥(低湿度)雰囲気で扱うことが好ましい。   The niobium compound is not particularly limited as long as it contains an Nb atom as a niobium source. For example, niobium chloride, niobium alkoxide (methoxide, ethoxide, etc.), niobium metal, niobium hydroxide, and the like can be used. On the other hand, the tantalum compound is not particularly limited as long as it contains Ta atoms as a tantalum source. For example, tantalum chloride, tantalum alkoxide (methoxide, ethoxide, etc.), metal tantalum, tantalum hydroxide, or the like can be used. Of the above, titanium alkoxide, niobium alkoxide, and tantalum alkoxide are unstable substances that react immediately upon contact with moisture, and thus are preferably handled in a dry (low humidity) atmosphere.

前記ニオブ化合物またはタンタル化合物としては、水酸化物を用いることが好ましい。すなわち、原料として水酸化ニオブまたは水酸化タンタルを用いるか、もしくは、これら水酸化物以外のニオブ化合物またはタンタル化合物を用い、過酸化水素と反応させる前に予めアルカリあるいは水を加えるなどして水酸化し、生じた水酸化物の沈殿を分取、洗浄すればよい。このように、水酸化物を過酸化水素と反応させて得られたペルオキシ錯体であれば、形成された膜内に炭素原子を含む有機部位が全く存在しないことになるので、例えば該膜を透明導電性として利用する場合などに、導電性等を考慮し高温に加熱して有機部位を分解・揮散させる必要がなく、膜形成時の加熱温度を比較的低温に設定することができるので好ましい。例えば、水酸化物以外のニオブ化合物またはタンタル化合物をそのまま用いて過酸化水素と反応させた場合には、得られたペルオキシ錯体の一部に有機部位が存在することになり、この有機部位を分解・揮散させるためには、少なくとも400℃以上、好ましくは500〜600℃程度の温度に加熱することが必要になる。   As the niobium compound or tantalum compound, a hydroxide is preferably used. That is, niobium hydroxide or tantalum hydroxide is used as a raw material, or niobium compounds or tantalum compounds other than these hydroxides are used, and alkali or water is added in advance before reacting with hydrogen peroxide. Then, the generated hydroxide precipitate may be collected and washed. Thus, in the case of a peroxy complex obtained by reacting a hydroxide with hydrogen peroxide, there is no organic site containing carbon atoms in the formed film. In the case of use as conductivity, it is not necessary to decompose and volatilize the organic part by heating to a high temperature in consideration of conductivity and the like, and the heating temperature at the time of film formation can be set to a relatively low temperature, which is preferable. For example, when a niobium compound or tantalum compound other than a hydroxide is used as it is and reacted with hydrogen peroxide, an organic site exists in a part of the obtained peroxy complex, and this organic site is decomposed. In order to volatilize, it is necessary to heat to a temperature of at least 400 ° C. or more, preferably about 500 to 600 ° C.

前記過酸化水素によるペルオキシ化反応に用いることのできる溶媒としては、特に制限はなく、例えば、水、メタノール、エタノール、プロパノール、ブタノール、エチレングリコール等の水系やアルコール系等の水溶性溶剤を用いることができるが、ペルオキシ化反応で使用する溶媒として、後述する一般式(1)〜(5)のいずれかで表される特定構造の溶剤を用いるようにしても勿論よい。   The solvent that can be used for the peroxylation reaction with hydrogen peroxide is not particularly limited, and for example, water-based or alcohol-based water-soluble solvents such as water, methanol, ethanol, propanol, butanol, and ethylene glycol are used. Of course, a solvent having a specific structure represented by any one of the general formulas (1) to (5) described below may be used as the solvent used in the peroxylation reaction.

本発明の膜形成用前駆体溶液は、さらに、前記一般式(1)〜(5)のいずれかで表される溶剤(以下「特定溶剤」と称することもある)を含有することが好ましい。前記特定溶剤は、前駆体溶液中ではペルオキシ錯体を安定化させる作用をなして該溶液の保存安定性をより向上させる。また、前記特定溶剤は、膜形成時、前駆体溶液を基板に塗布し加熱することにより速やかに揮発するものであり、形成された膜中には該特定溶剤に由来する有機成分が残存することはないので、残存した有機成分が加熱により炭化して膜の透明性を低下させたり、導電性等の膜機能に影響を及ぼすこともない。   The film-forming precursor solution of the present invention preferably further contains a solvent represented by any one of the general formulas (1) to (5) (hereinafter also referred to as “specific solvent”). The specific solvent functions to stabilize the peroxy complex in the precursor solution, thereby further improving the storage stability of the solution. In addition, the specific solvent volatilizes quickly by applying the precursor solution to the substrate and heating at the time of film formation, and organic components derived from the specific solvent remain in the formed film. Therefore, the remaining organic components are not carbonized by heating to lower the transparency of the film or affect the film function such as conductivity.

前記式(1)〜(3)において、R1〜R6、R1〜R5、またはR1〜R7の例であるアルキル基としては、例えば、メチル基、エチル基、プロピル基、ブチル基等が挙げられる。また、前記式(1)〜(3)中、Xの例である−ORにおいてRで示されるアルキル基についても同様である。
前記式(4)および(5)において、Yで示される置換基を有していてもよい炭素数3〜6のアルキレン基としては、例えば、プロピレン基、ブチレン基、ペンチレン基、ヘキシレン基等が挙げられる。
In the formulas (1) to (3), examples of the alkyl group as an example of R 1 to R 6 , R 1 to R 5 , or R 1 to R 7 include, for example, a methyl group, an ethyl group, a propyl group, and butyl Groups and the like. In the formulas (1) to (3), the same applies to the alkyl group represented by R in —OR, which is an example of X.
In the formulas (4) and (5), examples of the alkylene group having 3 to 6 carbon atoms which may have a substituent represented by Y include a propylene group, a butylene group, a pentylene group and a hexylene group. Can be mentioned.

前記式(1)〜(3)で表される化合物は、前記反応生成物と共存させると、当該化合物が必須に有する2つの酸素原子とペルオキシ錯体の金属原子との間の二座で、結合力の異なる共有結合と配位結合とが生じて安定な6員環または7員環構造を形成し、その架橋構造によりペルオキシ基を包囲的に保護することができる。しかも、ここで形成される架橋構造内には結合力の強い共有結合が一つしかないので、加熱によって金属原子から速やかに有機分子が外れやすく、得られる膜中に有機成分が残存することもない。
前記式(4)および(5)で表される化合物は、前記反応生成物と共存させると、当該化合物が必須に有する2つの酸素原子とペルオキシ錯体の金属原子との間の二座で配位し、該化合物が持つ5員環乃至8員環の嵩高い構造によってペルオキシ基を立体的に保護することができる。しかも、ここで形成される金属原子と酸素原子との結合は非常に弱いので、加熱によって金属原子から速やかに有機分子が外れやすく、得られる膜中に有機成分が残存することもない。
When the compounds represented by the formulas (1) to (3) coexist with the reaction product, they are bonded at a bidentate between two oxygen atoms that the compound has and a metal atom of a peroxy complex. A covalent bond and a coordination bond having different forces are generated to form a stable 6-membered ring or 7-membered ring structure, and the peroxy group can be surrounded and protected by the bridge structure. Moreover, since there is only one strong covalent bond in the cross-linked structure formed here, organic molecules can be easily detached from metal atoms by heating, and organic components may remain in the resulting film. Absent.
When the compounds represented by the formulas (4) and (5) coexist with the reaction product, they are coordinated in a bidentate between the two oxygen atoms that the compound has and the metal atom of the peroxy complex. In addition, the peroxy group can be sterically protected by the bulky structure of the 5-membered to 8-membered ring of the compound. In addition, since the bond between the metal atom and the oxygen atom formed here is very weak, the organic molecule is easily detached from the metal atom by heating, and the organic component does not remain in the obtained film.

前記特定溶剤は、前記一般式(1)〜(5)で表される特定構造を有するものであれば、アルコール、アルコキシアルコール、カルボン酸、エステルなど、どのような有機化合物であってもよいが、具体的には、3−メトキシ−1−ブタノール、3−メトキシ−3−メチル−1−ブタノール、ジアセトンアルコール(4−ヒドロキシ−4−メチルペンタン−2−オン)、4−ヒドロキシ−2−ブタノン、5-ヒドロキシ−2−ペンタノン、テトラヒドロフラン−2−カルボン酸、2−メチル−1,3−プロパンジオール、γ−ブチロラクトン、δ−バレロラクトン、ε−カプロラクトンからなる群より選ばれる少なくとも1種であることが好ましい。これらの中でも、3−メトキシ−1−ブタノールは、前駆体溶液の保存安定性向上効果が著しく高いことから、特に好ましい。   The specific solvent may be any organic compound such as alcohol, alkoxy alcohol, carboxylic acid, ester, etc., as long as it has the specific structure represented by the general formulas (1) to (5). Specifically, 3-methoxy-1-butanol, 3-methoxy-3-methyl-1-butanol, diacetone alcohol (4-hydroxy-4-methylpentan-2-one), 4-hydroxy-2- At least one selected from the group consisting of butanone, 5-hydroxy-2-pentanone, tetrahydrofuran-2-carboxylic acid, 2-methyl-1,3-propanediol, γ-butyrolactone, δ-valerolactone, and ε-caprolactone Preferably there is. Among these, 3-methoxy-1-butanol is particularly preferable because the effect of improving the storage stability of the precursor solution is remarkably high.

前記特定溶剤は、最終的に前記反応生成物(ペルオキシ錯体)と共存していればよく、例えば、上述した過酸化水素によるペルオキシ化反応における溶剤として用いることで前駆体溶液に含有させてもよいし、前記反応生成物が後述する固形分濃度になるように希釈目的で添加する溶媒として用いることで前駆体溶液に含有させてもよい。
前記特定溶剤をも含有させる場合、その含有量は、特に制限されないが、前駆体溶液中の全溶媒量に対して15〜80重量%とすることが好ましい。
The said specific solvent should just coexist with the said reaction product (peroxy complex) finally, for example, may be contained in a precursor solution by using as a solvent in the peroxylation reaction by the hydrogen peroxide mentioned above. Then, the reaction product may be contained in the precursor solution by using it as a solvent added for the purpose of dilution so as to have a solid content concentration described later.
When the specific solvent is also contained, the content is not particularly limited, but is preferably 15 to 80% by weight with respect to the total amount of the solvent in the precursor solution.

本発明の膜形成用前駆体溶液を用いた膜形成方法としては、特に制限されないが、例えば、本発明の膜形成用前駆体溶液を単独で、もしくは例えば公知のチタンペルオキシ錯体(チタン化合物に過酸化水素を反応させた反応生成物)に混合して、基材に塗布し、加熱すればよい。本発明の膜形成用前駆体溶液を単独で塗布した場合には、反射防止膜等に好適な酸化ニオブまたは酸化タンタルの薄膜を形成することができ、他方、チタンのペルオキシ錯体と混合して塗布した場合には、透明導電性膜等に好適なニオブまたはタンタルドープ酸化チタン系薄膜を形成することができる。   The film forming method using the film forming precursor solution of the present invention is not particularly limited. For example, the film forming precursor solution of the present invention is used alone or, for example, a known titanium peroxy complex (containing a titanium compound). The reaction product obtained by reacting hydrogen oxide) may be mixed, applied to a substrate, and heated. When the film forming precursor solution of the present invention is applied alone, a thin film of niobium oxide or tantalum oxide suitable for an antireflection film or the like can be formed. On the other hand, it is mixed with a peroxy complex of titanium and applied. In this case, a niobium or tantalum-doped titanium oxide thin film suitable for a transparent conductive film or the like can be formed.

前記前駆体溶液を基材上に塗布する際の塗布方法は、均一にウェットコーティングできる方法であれば特に制限はなく、従来公知の方法を採用することができる。例えば、キャピラリコート法、スピンコート法、スリットダイコート法、スプレーコート法、ディップコート法、ロールコート法、スクリーン印刷法、フレキソ印刷法、バーコーター法等を採用することができる。   The application method for applying the precursor solution on the substrate is not particularly limited as long as it is a method that enables uniform wet coating, and a conventionally known method can be employed. For example, a capillary coating method, a spin coating method, a slit die coating method, a spray coating method, a dip coating method, a roll coating method, a screen printing method, a flexographic printing method, a bar coater method, and the like can be employed.

前記前駆体溶液を塗布した後の加熱方法やその条件については、液の組成や用いる基材の耐熱性等に応じて適宜設定すればよく、特に制限されないが、例えば、常温〜500℃、好ましくは400℃以下の温度で、通常1分〜1時間程度の時間加熱すればよい。また、加熱を行なう際の雰囲気も、特に制限されないが、例えば、得られる膜に導電性を付与する場合には還元雰囲気下で行なうのがよい。なお、例えば、塗布した本発明の前駆体溶液の固形分濃度が低い場合には、加熱に際し、予め、真空乾燥や減圧乾燥等の手段によって溶媒(特定溶剤)を均一に揮散させてもよい。   The heating method after applying the precursor solution and the conditions thereof may be appropriately set according to the composition of the solution and the heat resistance of the substrate to be used, and are not particularly limited. For example, normal temperature to 500 ° C., preferably May be heated at a temperature of 400 ° C. or lower, usually for about 1 minute to 1 hour. Also, the atmosphere for heating is not particularly limited. For example, when conductivity is imparted to the obtained film, it is preferably performed in a reducing atmosphere. For example, when the solid content concentration of the applied precursor solution of the present invention is low, the solvent (specific solvent) may be volatilized in advance by means of vacuum drying, reduced pressure drying or the like before heating.

以下、実施例により本発明をより詳細に説明するが、本発明は、かかる実施例により限定されるものではない。   EXAMPLES Hereinafter, although an Example demonstrates this invention in detail, this invention is not limited by this Example.

(実施例1)
アルゴンガス雰囲気中でニオブペンタエトキシド0.75gを脱水エタノール9.56g中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.8g(ニオブペンタエトキシド1モルに対して過酸化水素3.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(1)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で15日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
Example 1
In an argon gas atmosphere, 0.75 g of niobium pentaethoxide was dissolved in 9.56 g of dehydrated ethanol, and 0.8 g of hydrogen peroxide solution having a concentration of 30% by weight (based on 1 mol of niobium pentaethoxide) was obtained. Hydrogen peroxide (corresponding to 3.0 mol of hydrogen peroxide) was gradually added under stirring, and after completion of the addition, the mixture was stirred for 5 minutes to cause peroxo-reaction. The reaction was conducted while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution was controlled so as not to exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (1).
When the obtained precursor solution was housed in a glass narrow mouth bottle and the mouth of the bottle was opened, the state when left at room temperature (20 ± 5 ° C.) for 15 days was visually observed, A transparent solution state was maintained without causing turbidity or cloudiness.

(実施例2)
実施例1と同じ固形分濃度でニオブ化合物に対する過酸化水素の量を変更した以外は、実施例1と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でニオブペンタエトキシド0.75gを脱水エタノール9.69g中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.67g(ニオブペンタエトキシド1モルに対して過酸化水素2.5モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、実施例1と同様に、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(2)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で15日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
(Example 2)
A film-forming precursor solution similar to that in Example 1 was produced except that the amount of hydrogen peroxide relative to the niobium compound was changed at the same solid content concentration as in Example 1.
That is, 0.75 g of niobium pentaethoxide was dissolved in 9.69 g of dehydrated ethanol in an argon gas atmosphere, and 0.67 g of hydrogen peroxide solution having a concentration of 30% by weight (to 1 mol of niobium pentaethoxide was added). (Corresponding to 2.5 mol of hydrogen peroxide) was gradually added with stirring, and after the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. As in Example 1, the reaction was performed while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution did not exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. Was controlled as follows. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (2).
When the obtained precursor solution was housed in a glass narrow mouth bottle and the mouth of the bottle was opened, the state when left at room temperature (20 ± 5 ° C.) for 15 days was visually observed, A transparent solution state was maintained without causing turbidity or cloudiness.

(実施例3)
実施例1と同じ固形分濃度でニオブ化合物に対する過酸化水素の量を変更した以外は、実施例1と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でニオブペンタエトキシド0.75gを脱水エタノール9.43g中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.93g(ニオブペンタエトキシド1モルに対して過酸化水素3.5モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、実施例1と同様に、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(3)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で15日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
(Example 3)
A film-forming precursor solution similar to that in Example 1 was produced except that the amount of hydrogen peroxide relative to the niobium compound was changed at the same solid content concentration as in Example 1.
That is, 0.75 g of niobium pentaethoxide was dissolved in 9.43 g of dehydrated ethanol in an argon gas atmosphere, and 0.93 g of hydrogen peroxide solution having a concentration of 30% by weight (to 1 mol of niobium pentaethoxide was added). (Corresponding to 3.5 mol of hydrogen peroxide) was gradually added with stirring, and after the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. As in Example 1, the reaction was performed while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution did not exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. Was controlled as follows. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (3).
When the obtained precursor solution was housed in a glass narrow mouth bottle and the mouth of the bottle was opened, the state when left at room temperature (20 ± 5 ° C.) for 15 days was visually observed, A transparent solution state was maintained without causing turbidity or cloudiness.

(比較例1)
実施例1と同じ固形分濃度でニオブ化合物に対する過酸化水素の量を本発明の範囲外に変更した以外は、実施例1と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でニオブペンタエトキシド0.75gを脱水エタノール9.82g中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.54g(ニオブペンタエトキシド1モルに対して過酸化水素2.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、実施例1と同様に、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(C1)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で放置したところ、4日後には目視にてゲル化が観察された。つまり、得られた前駆体溶液の常温における使用可能な時間(可使時間)は4日未満であった。
(Comparative Example 1)
A film-forming precursor solution similar to Example 1 was produced, except that the amount of hydrogen peroxide relative to the niobium compound was changed outside the scope of the present invention at the same solid content concentration as in Example 1.
That is, 0.75 g of niobium pentaethoxide was dissolved in 9.82 g of dehydrated ethanol in an argon gas atmosphere. (Corresponding to 2.0 mol of hydrogen peroxide) was gradually added under stirring, and after completion of the addition, the mixture was stirred for 5 minutes to cause peroxo-reaction. As in Example 1, the reaction was performed while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution did not exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. Was controlled as follows. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (C1).
When the obtained precursor solution was accommodated in a glass narrow mouth bottle and left at room temperature (20 ± 5 ° C.) with the mouth of the bottle opened, gelation was visually observed after 4 days. It was. That is, the usable time (pot life) of the obtained precursor solution at room temperature was less than 4 days.

(比較例2)
実施例1と同じ固形分濃度でニオブ化合物に対する過酸化水素の量を本発明の範囲外に変更した以外は、実施例1と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でニオブペンタエトキシド0.75gを脱水エタノール1.35g中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水9.01g(ニオブペンタエトキシド1モルに対して過酸化水素5.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、実施例1と同様に、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(C2)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で放置したところ、6時間後には目視にてゲル化が観察された。つまり、得られた前駆体溶液の常温における使用可能な時間(可使時間)は6時間未満であった。
(Comparative Example 2)
A film-forming precursor solution similar to Example 1 was produced, except that the amount of hydrogen peroxide relative to the niobium compound was changed outside the scope of the present invention at the same solid content concentration as in Example 1.
That is, 0.75 g of niobium pentaethoxide was dissolved in 1.35 g of dehydrated ethanol in an argon gas atmosphere, and 9.01 g of hydrogen peroxide solution having a concentration of 30% by weight (to 1 mol of niobium pentaethoxide was added). (Corresponding to 5.0 mol of hydrogen peroxide) was gradually added with stirring. After the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. As in Example 1, the reaction was performed while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution did not exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. Was controlled as follows. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (C2).
The obtained precursor solution was housed in a glass narrow mouth bottle and left at room temperature (20 ± 5 ° C.) with the bottle mouth open. After 6 hours, gelation was visually observed. It was. That is, the usable time (pot life) of the obtained precursor solution at room temperature was less than 6 hours.

(実施例4)
実施例1と同じ固形分濃度およびニオブ化合物に対する過酸化水素量で、溶剤の組成を変更した以外は、実施例1と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でニオブペンタエトキシド0.75gを脱水エタノール7.56gと3−メトキシ−1−ブタノール2gとの混合溶剤中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.8g(ニオブペンタエトキシド1モルに対して過酸化水素3.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、実施例1と同様に、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(4)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で20日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
Example 4
A film-forming precursor solution was produced in the same manner as in Example 1 except that the composition of the solvent was changed at the same solid content concentration and hydrogen peroxide amount as in Example 1.
That is, 0.75 g of niobium pentaethoxide was dissolved in a mixed solvent of 7.56 g of dehydrated ethanol and 2 g of 3-methoxy-1-butanol in an argon gas atmosphere, and the resulting solution was peroxidized at a concentration of 30% by weight. Hydrogen water 0.8g (equivalent to 3.0 moles of hydrogen peroxide with respect to 1 mole of niobium pentaethoxide) was gradually added with stirring. After the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. As in Example 1, the reaction was performed while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution did not exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. Was controlled as follows. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (4).
When the obtained precursor solution was accommodated in a glass narrow mouth bottle and the mouth of the bottle was opened and left standing at room temperature (20 ± 5 ° C.) for 20 days, the gel was visually observed. A transparent solution state was maintained without causing turbidity or cloudiness.

(実施例5)
実施例1と同じ固形分濃度およびニオブ化合物に対する過酸化水素量で、溶剤の組成を変更した以外は、実施例1と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でニオブペンタエトキシド0.75gを脱水エタノール5.56gと3−メトキシ−1−ブタノール4gとの混合溶剤中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.8g(ニオブペンタエトキシド1モルに対して過酸化水素3.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、実施例1と同様に、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(5)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で30日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
(Example 5)
A film-forming precursor solution was produced in the same manner as in Example 1 except that the composition of the solvent was changed at the same solid content concentration and hydrogen peroxide amount as in Example 1.
That is, 0.75 g of niobium pentaethoxide was dissolved in a mixed solvent of 5.56 g of dehydrated ethanol and 4 g of 3-methoxy-1-butanol in an argon gas atmosphere, and the resulting solution was peroxidized at a concentration of 30% by weight. Hydrogen water 0.8g (equivalent to 3.0 moles of hydrogen peroxide with respect to 1 mole of niobium pentaethoxide) was gradually added with stirring. After the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. As in Example 1, the reaction was performed while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution did not exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. Was controlled as follows. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (5).
When the obtained precursor solution was housed in a glass narrow mouth bottle and the mouth of the bottle was opened, the state when left at room temperature (20 ± 5 ° C.) for 30 days was visually observed. A transparent solution state was maintained without causing turbidity or cloudiness.

(実施例6)
実施例1と同じ固形分濃度およびニオブ化合物に対する過酸化水素量で、溶剤の組成を変更した以外は、実施例1と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でニオブペンタエトキシド0.75gを脱水エタノール3.56gと3−メトキシ−1−ブタノール6gとの混合溶剤中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.8g(ニオブペンタエトキシド1モルに対して過酸化水素3.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、実施例1と同様に、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(6)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で30日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
(Example 6)
A film-forming precursor solution was produced in the same manner as in Example 1 except that the composition of the solvent was changed at the same solid content concentration and hydrogen peroxide amount as in Example 1.
That is, 0.75 g of niobium pentaethoxide was dissolved in a mixed solvent of 3.56 g of dehydrated ethanol and 6 g of 3-methoxy-1-butanol in an argon gas atmosphere, and the resulting solution was peroxidized at a concentration of 30% by weight. Hydrogen water 0.8g (equivalent to 3.0 moles of hydrogen peroxide with respect to 1 mole of niobium pentaethoxide) was gradually added with stirring. After the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. As in Example 1, the reaction was performed while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution did not exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. Was controlled as follows. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (6).
When the obtained precursor solution was housed in a glass narrow mouth bottle and the mouth of the bottle was opened, the state when left at room temperature (20 ± 5 ° C.) for 30 days was visually observed. A transparent solution state was maintained without causing turbidity or cloudiness.

(実施例7)
実施例1と同じ固形分濃度およびニオブ化合物に対する過酸化水素量で、溶剤の組成を変更した以外は、実施例1と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でニオブペンタエトキシド0.75gを脱水エタノール2.56gと3−メトキシ−1−ブタノール7gとの混合溶剤中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.8g(ニオブペンタエトキシド1モルに対して過酸化水素3.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、実施例1と同様に、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(7)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で30日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
(Example 7)
A film-forming precursor solution was produced in the same manner as in Example 1 except that the composition of the solvent was changed at the same solid content concentration and hydrogen peroxide amount as in Example 1.
That is, 0.75 g of niobium pentaethoxide was dissolved in a mixed solvent of 2.56 g of dehydrated ethanol and 7 g of 3-methoxy-1-butanol in an argon gas atmosphere, and the resulting solution was peroxidized at a concentration of 30% by weight. Hydrogen water 0.8g (equivalent to 3.0 moles of hydrogen peroxide with respect to 1 mole of niobium pentaethoxide) was gradually added with stirring. After the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. As in Example 1, the reaction was performed while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution did not exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. Was controlled as follows. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (7).
When the obtained precursor solution was housed in a glass narrow mouth bottle and the mouth of the bottle was opened, the state when left at room temperature (20 ± 5 ° C.) for 30 days was visually observed. A transparent solution state was maintained without causing turbidity or cloudiness.

(実施例8)
実施例1と同じ固形分濃度およびニオブ化合物に対する過酸化水素量で、溶剤の組成を変更した以外は、実施例1と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でニオブペンタエトキシド0.75gを3−メトキシ−1−ブタノール9.56g中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.8g(ニオブペンタエトキシド1モルに対して過酸化水素3.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、実施例1と同様に、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(8)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で30日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
(Example 8)
A film-forming precursor solution was produced in the same manner as in Example 1 except that the composition of the solvent was changed at the same solid content concentration and hydrogen peroxide amount as in Example 1.
That is, 0.75 g of niobium pentaethoxide was dissolved in 9.56 g of 3-methoxy-1-butanol in an argon gas atmosphere, and 0.8 g of niobium hydrogen peroxide having a concentration of 30% by weight was added to the resulting solution. (Equivalent to 3.0 moles of hydrogen peroxide per mole of ethoxide) was gradually added under stirring. After the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. As in Example 1, the reaction was performed while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution did not exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. Was controlled as follows. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (8).
When the obtained precursor solution was housed in a glass narrow mouth bottle and the mouth of the bottle was opened, the state when left at room temperature (20 ± 5 ° C.) for 30 days was visually observed. A transparent solution state was maintained without causing turbidity or cloudiness.

(実施例9)
実施例1と同じニオブ化合物に対する過酸化水素量で、溶剤の組成と量を変更して固形分濃度を上げた以外は、実施例1と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でニオブペンタエトキシド0.75gを脱水エタノール2.56gと3−メトキシ−1−ブタノール6gとの混合溶剤中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.8g(ニオブペンタエトキシド1モルに対して過酸化水素3.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、実施例1と同様に、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度7.41重量%の反応生成物を膜形成用前駆体溶液(9)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で30日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
Example 9
A film-forming precursor solution similar to that of Example 1 was produced, except that the amount of hydrogen peroxide relative to the same niobium compound as in Example 1 was changed to increase the solid content concentration by changing the composition and amount of the solvent.
That is, 0.75 g of niobium pentaethoxide was dissolved in a mixed solvent of 2.56 g of dehydrated ethanol and 6 g of 3-methoxy-1-butanol in an argon gas atmosphere, and the resulting solution was peroxidized at a concentration of 30% by weight. Hydrogen water 0.8g (equivalent to 3.0 moles of hydrogen peroxide with respect to 1 mole of niobium pentaethoxide) was gradually added with stirring. After the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. As in Example 1, the reaction was performed while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution did not exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. Was controlled as follows. The reaction product having a solid concentration of 7.41% by weight thus obtained was used as a film-forming precursor solution (9).
When the obtained precursor solution was housed in a glass narrow mouth bottle and the mouth of the bottle was opened, the state when left at room temperature (20 ± 5 ° C.) for 30 days was visually observed. A transparent solution state was maintained without causing turbidity or cloudiness.

(実施例10)
実施例1と同じニオブ化合物に対する過酸化水素量で、溶剤の組成と量を変更して固形分濃度を上げた以外は、実施例1と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でニオブペンタエトキシド0.75gを3−メトキシ−1−ブタノール8g中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.8g(ニオブペンタエトキシド1モルに対して過酸化水素3.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、実施例1と同様に、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度7.85重量%の反応生成物を膜形成用前駆体溶液(10)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で15日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
(Example 10)
A film-forming precursor solution similar to that of Example 1 was produced, except that the amount of hydrogen peroxide relative to the same niobium compound as in Example 1 was changed to increase the solid content concentration by changing the composition and amount of the solvent.
That is, 0.75 g of niobium pentaethoxide was dissolved in 8 g of 3-methoxy-1-butanol in an argon gas atmosphere, and 0.8 g of niobium pentaethoxide having a concentration of 30 wt% was added to the resulting solution. (Equivalent to 3.0 mol of hydrogen peroxide per 1 mol) was gradually added with stirring, and after the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. As in Example 1, the reaction was performed while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution did not exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. Was controlled as follows. The reaction product having a solid content concentration of 7.85% by weight thus obtained was used as a film-forming precursor solution (10).
When the obtained precursor solution was housed in a glass narrow mouth bottle and the mouth of the bottle was opened, the state when left at room temperature (20 ± 5 ° C.) for 15 days was visually observed, A transparent solution state was maintained without causing turbidity or cloudiness.

(比較例3)
実施例1と同じニオブ化合物に対する過酸化水素量で、溶剤の組成と量を変更して固形分濃度を本発明の範囲外にまで上げた以外は、実施例1と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でニオブペンタエトキシド0.75gを3−メトキシ−1−ブタノール7g中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.8g(ニオブペンタエトキシド1モルに対して過酸化水素3.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、実施例1と同様に、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度8.77重量%の反応生成物を膜形成用前駆体溶液(C3)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で放置したところ、1日(24時間)後には目視にてゲル化が観察された。つまり、得られた前駆体溶液の常温における使用可能な時間(可使時間)は1日未満であった。
(Comparative Example 3)
The same precursor for film formation as in Example 1 except that the amount of hydrogen peroxide with respect to the same niobium compound as in Example 1 was changed and the solid content concentration was increased outside the scope of the present invention by changing the composition and amount of the solvent. A solution was prepared.
That is, 0.75 g of niobium pentaethoxide was dissolved in 7 g of 3-methoxy-1-butanol in an argon gas atmosphere, and 0.8 g of niobium pentaethoxide having a concentration of 30% by weight was added to the resulting solution. (Equivalent to 3.0 mol of hydrogen peroxide per 1 mol) was gradually added with stirring, and after the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. As in Example 1, the reaction was performed while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution did not exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. Was controlled as follows. The reaction product having a solid content concentration of 8.77% by weight thus obtained was used as a film-forming precursor solution (C3).
The obtained precursor solution was housed in a glass narrow mouth bottle and left at room temperature (20 ± 5 ° C.) with the bottle mouth open. After one day (24 hours), the gel was visually observed. Observed. That is, the usable time (pot life) of the obtained precursor solution at room temperature was less than one day.

(実施例11)
アルゴンガス雰囲気中でタンタルペンタエトキシド0.4gを脱水エタノール3.1gと3−メトキシ−1−ブタノール2gとの混合溶剤中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.34g(タンタルペンタエトキシド1モルに対して過酸化水素3.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(11)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で20日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
(Example 11)
In an argon gas atmosphere, 0.4 g of tantalum pentaethoxide is dissolved in a mixed solvent of 3.1 g of dehydrated ethanol and 2 g of 3-methoxy-1-butanol, and a hydrogen peroxide solution having a concentration of 30% by weight is obtained in the resulting solution. 0.34 g (corresponding to 3.0 mol of hydrogen peroxide with respect to 1 mol of tantalum pentaethoxide) was gradually added with stirring, and after the addition was completed, the mixture was stirred for 5 minutes to cause a peroxo reaction. The reaction was conducted while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution was controlled so as not to exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. The reaction product having a solid concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (11).
When the obtained precursor solution was accommodated in a glass narrow mouth bottle and the mouth of the bottle was opened and left standing at room temperature (20 ± 5 ° C.) for 20 days, the gel was visually observed. A transparent solution state was maintained without causing turbidity or cloudiness.

(実施例12)
実施例11と同じ固形分濃度でタンタル化合物に対する過酸化水素の量を変更した以外は、実施例11と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でタンタルペンタエトキシド0.4gを脱水エタノール3.17gと3−メトキシ−1−ブタノール2.0gとの混合溶剤中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.27g(タンタルペンタエトキシド1モルに対して過酸化水素2.5モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(12)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で10日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
(Example 12)
A film-forming precursor solution similar to that in Example 11 was produced, except that the amount of hydrogen peroxide relative to the tantalum compound was changed at the same solid content concentration as in Example 11.
That is, 0.4 g of tantalum pentaethoxide was dissolved in a mixed solvent of 3.17 g of dehydrated ethanol and 2.0 g of 3-methoxy-1-butanol in an argon gas atmosphere, and the resulting solution had a concentration of 30% by weight. Hydrogen peroxide solution 0.27g (corresponding to 2.5 moles of hydrogen peroxide per mole of tantalum pentaethoxide) was gradually added with stirring, and after the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. It was. The reaction was conducted while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution was controlled so as not to exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (12).
When the obtained precursor solution was accommodated in a glass narrow mouth bottle and the mouth of the bottle was opened, the state when left at room temperature (20 ± 5 ° C.) for 10 days was visually observed. A transparent solution state was maintained without causing turbidity or cloudiness.

(実施例13)
実施例11と同じ固形分濃度でタンタル化合物に対する過酸化水素の量を変更した以外は、実施例11と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でタンタルペンタエトキシド0.4gを脱水エタノール2.94gと3−メトキシ−1−ブタノール2.0gとの混合溶剤中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.5g(タンタルペンタエトキシド1モルに対して過酸化水素3.5モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(13)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で10日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
(Example 13)
A film-forming precursor solution similar to that in Example 11 was produced, except that the amount of hydrogen peroxide relative to the tantalum compound was changed at the same solid content concentration as in Example 11.
That is, 0.4 g of tantalum pentaethoxide was dissolved in a mixed solvent of 2.94 g of dehydrated ethanol and 2.0 g of 3-methoxy-1-butanol in an argon gas atmosphere, and the resulting solution had a concentration of 30% by weight. Hydrogen peroxide solution 0.5g (corresponding to 3.5 moles of hydrogen peroxide per mole of tantalum pentaethoxide) was gradually added with stirring. After the addition was completed, the mixture was stirred for 5 minutes to allow peroxo-reaction. It was. The reaction was conducted while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution was controlled so as not to exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (13).
When the obtained precursor solution was accommodated in a glass narrow mouth bottle and the mouth of the bottle was opened, the state when left at room temperature (20 ± 5 ° C.) for 10 days was visually observed. A transparent solution state was maintained without causing turbidity or cloudiness.

(比較例4)
実施例11と同じ固形分濃度でタンタル化合物に対する過酸化水素の量を本発明の範囲外に変更した以外は、実施例11と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でタンタルペンタエトキシド0.4gを脱水エタノール2.2gと3−メトキシ−1−ブタノール3.1gとの混合溶剤中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.14g(タンタルペンタエトキシド1モルに対して過酸化水素1.25モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(C4)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で放置したところ、2日後には目視にてゲル化が観察された。つまり、得られた前駆体溶液の常温における使用可能な時間(可使時間)は2日未満であった。
(Comparative Example 4)
A film-forming precursor solution similar to Example 11 was produced, except that the amount of hydrogen peroxide relative to the tantalum compound was changed outside the scope of the present invention at the same solid content concentration as Example 11.
That is, 0.4 g of tantalum pentaethoxide was dissolved in a mixed solvent of 2.2 g of dehydrated ethanol and 3.1 g of 3-methoxy-1-butanol in an argon gas atmosphere, and the resulting solution had a concentration of 30% by weight. 0.14 g of hydrogen peroxide solution (corresponding to 1.25 mol of hydrogen peroxide per 1 mol of tantalum pentaethoxide) was gradually added with stirring. After the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. It was. The reaction was conducted while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution was controlled so as not to exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (C4).
When the obtained precursor solution was placed in a glass narrow mouth bottle and left at room temperature (20 ± 5 ° C.) with the bottle mouth open, gelation was visually observed after 2 days. It was. That is, the usable time (pot life) of the obtained precursor solution at room temperature was less than 2 days.

(比較例5)
実施例11と同じ固形分濃度でタンタル化合物に対する過酸化水素の量を本発明の範囲外に変更した以外は、実施例11と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でタンタルペンタエトキシド0.4gを脱水エタノール1.8gと3−メトキシ−1−ブタノール2.52gとの混合溶剤中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.14g(タンタルペンタエトキシド1モルに対して過酸化水素10モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(C5)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で放置したところ、3時間後には目視にてゲル化が観察された。つまり、得られた前駆体溶液の常温における使用可能な時間(可使時間)は3時間未満であった。
(Comparative Example 5)
A film-forming precursor solution similar to Example 11 was produced, except that the amount of hydrogen peroxide relative to the tantalum compound was changed outside the scope of the present invention at the same solid content concentration as Example 11.
That is, 0.4 g of tantalum pentaethoxide was dissolved in a mixed solvent of 1.8 g of dehydrated ethanol and 2.52 g of 3-methoxy-1-butanol in an argon gas atmosphere, and the resulting solution had a concentration of 30% by weight. Hydrogen peroxide solution 0.14 g (corresponding to 10 mol of hydrogen peroxide with respect to 1 mol of tantalum pentaethoxide) was gradually added with stirring, and after completion of the addition, the mixture was stirred for 5 minutes to cause peroxo reaction. The reaction was conducted while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution was controlled so as not to exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (C5).
The obtained precursor solution was housed in a glass narrow mouth bottle and left at room temperature (20 ± 5 ° C.) with the bottle mouth open, and gelation was observed visually after 3 hours. It was. That is, the usable time (pot life) of the obtained precursor solution at room temperature was less than 3 hours.

(実施例14)
実施例11と同じ固形分濃度およびタンタル化合物に対する過酸化水素の量で、溶剤の組成を変更した以外は、実施例11と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でタンタルペンタエトキシド0.4gを脱水エタノール5.1g中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.34g(タンタルペンタエトキシド1モルに対して過酸化水素3.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度6.75重量%の反応生成物を膜形成用前駆体溶液(14)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で10日間放置したときの状態を目視にて観察したところ、ゲル化や白濁等を生じることなく透明な溶液状態が維持されていた。
(Example 14)
A film-forming precursor solution similar to that of Example 11 was produced, except that the composition of the solvent was changed with the same solid content concentration and the amount of hydrogen peroxide relative to the tantalum compound as in Example 11.
That is, 0.4 g of tantalum pentaethoxide was dissolved in 5.1 g of dehydrated ethanol in an argon gas atmosphere, and 0.34 g of hydrogen peroxide solution having a concentration of 30% by weight (1 mol of tantalum pentaethoxide was added to the obtained solution). (Corresponding to 3.0 mol of hydrogen peroxide) was gradually added under stirring, and after completion of the addition, the mixture was stirred for 5 minutes to cause peroxo-reaction. The reaction was conducted while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution was controlled so as not to exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. The reaction product having a solid content concentration of 6.75% by weight thus obtained was used as a film-forming precursor solution (14).
When the obtained precursor solution was accommodated in a glass narrow mouth bottle and the mouth of the bottle was opened, the state when left at room temperature (20 ± 5 ° C.) for 10 days was visually observed. A transparent solution state was maintained without causing turbidity or cloudiness.

(比較例6)
実施例11と同じタンタル化合物に対する過酸化水素量で、溶剤の組成と量を変更して固形分濃度を本発明の範囲外にまで上げた以外は、実施例11と同様の膜形成用前駆体溶液を製造した。
すなわち、アルゴンガス雰囲気中でタンタルペンタエトキシド0.4gを脱水エタノール1.53gと3−メトキシ−1−ブタノール2.29gとの混合溶剤中に溶解させ、得られた溶液に濃度30重量%の過酸化水素水0.34g(タンタルペンタエトキシド1モルに対して過酸化水素3.0モルに相当)を攪拌下で徐々に添加し、添加終了後、5分間攪拌して、ペルオキソ化反応させた。なお、反応は、溶液を入れたフラスコの周囲をドライアイスで冷却しながら行い、過酸化水素水の添加によって発熱した際に溶液の内温が−10℃を超えないように制御した。このようにして得られた固形分濃度8.77重量%の反応生成物を膜形成用前駆体溶液(C6)とした。
得られた前駆体溶液を、ガラス製細口瓶に収容して、瓶の口を開放した状態で、常温(20±5℃)で放置したところ、1日(24時間)後には目視にてゲル化が観察された。つまり、得られた前駆体溶液の常温における使用可能な時間(可使時間)は1日未満であった。
(Comparative Example 6)
The same precursor for film formation as in Example 11 except that the amount of hydrogen peroxide with respect to the same tantalum compound as in Example 11 was changed to increase the solid content concentration outside the scope of the present invention by changing the composition and amount of the solvent. A solution was prepared.
That is, 0.4 g of tantalum pentaethoxide was dissolved in a mixed solvent of 1.53 g of dehydrated ethanol and 2.29 g of 3-methoxy-1-butanol in an argon gas atmosphere, and the resulting solution had a concentration of 30% by weight. Hydrogen peroxide water 0.34g (corresponding to 3.0 moles of hydrogen peroxide per 1 mole of tantalum pentaethoxide) was gradually added with stirring. After the addition was completed, the mixture was stirred for 5 minutes to cause peroxo-reaction. It was. The reaction was conducted while cooling the periphery of the flask containing the solution with dry ice, and the internal temperature of the solution was controlled so as not to exceed −10 ° C. when heat was generated by the addition of hydrogen peroxide. The reaction product having a solid content concentration of 8.77% by weight thus obtained was used as a film-forming precursor solution (C6).
The obtained precursor solution was housed in a glass narrow mouth bottle and left at room temperature (20 ± 5 ° C.) with the bottle mouth open. After one day (24 hours), the gel was visually observed. Observed. That is, the usable time (pot life) of the obtained precursor solution at room temperature was less than one day.

Claims (3)

ニオブ化合物またはタンタル化合物1モルに対して2.5〜3.5モルの過酸化水素を反応させてなる反応生成物を含み、固形分濃度が8.5重量%以下である、ことを特徴とする膜形成用前駆体溶液。   It contains a reaction product obtained by reacting 2.5 to 3.5 moles of hydrogen peroxide with 1 mole of niobium compound or tantalum compound, and has a solid content concentration of 8.5% by weight or less. A precursor solution for film formation. 下記一般式(1)〜(5)のいずれかで表される溶剤をも含有する、請求項1記載の膜形成用前駆体溶液。
Figure 0005255359
(式(1)中、R1〜R6は、Hまたはアルキル基を表し、各々同じであってもよいし異なっていてもよい。Xは、−OHまたは−OR(ただし、Rはアルキル基を表す)を表す。)
Figure 0005255359
(式(2)中、R1〜R5は、Hまたはアルキル基を表し、各々同じであってもよいし異なっていてもよい。Xは、−OHまたは−OR(ただし、Rはアルキル基を表す)を表す。)
Figure 0005255359
(式(3)中、R1〜R7は、Hまたはアルキル基を表し、各々同じであってもよいし異なっていてもよい。Xは、−OHまたは−OR(ただし、Rはアルキル基を表す)を表す。)
Figure 0005255359
(式(4)中、Yは、置換基を有していてもよい炭素数3〜6のアルキレン基を表す。)
Figure 0005255359
(式(5)中、Yは、置換基を有していてもよい炭素数3〜6のアルキレン基を表す。)
The film forming precursor solution according to claim 1, which also contains a solvent represented by any one of the following general formulas (1) to (5).
Figure 0005255359
(In Formula (1), R < 1 > -R < 6 > represents H or an alkyl group, and may respectively be the same or different. X is -OH or -OR (However, R is an alkyl group. Represents).)
Figure 0005255359
(In Formula (2), R < 1 > -R < 5 > represents H or an alkyl group, and may respectively be the same or different. X is -OH or -OR (However, R is an alkyl group. Represents).)
Figure 0005255359
(In Formula (3), R < 1 > -R < 7 > represents H or an alkyl group, and may respectively be the same or different. X is -OH or -OR (However, R is an alkyl group. Represents).)
Figure 0005255359
(In formula (4), Y represents an alkylene group having 3 to 6 carbon atoms which may have a substituent.)
Figure 0005255359
(In formula (5), Y represents a C3-C6 alkylene group which may have a substituent.)
前記溶剤は、3−メトキシ−1−ブタノール、3−メトキシ−3−メチル−1−ブタノール、ジアセトンアルコール、4−ヒドロキシ−2−ブタノン、5−ヒドロキシ−2−ペンタノン、テトラヒドロフラン−2−カルボン酸、2−メチル−1,3−プロパンジオール、γ−ブチロラクトン、δ−バレロラクトン、ε−カプロラクトンからなる群より選ばれる少なくとも1種である、請求項2記載の膜形成用前駆体溶液。   The solvent is 3-methoxy-1-butanol, 3-methoxy-3-methyl-1-butanol, diacetone alcohol, 4-hydroxy-2-butanone, 5-hydroxy-2-pentanone, tetrahydrofuran-2-carboxylic acid The film forming precursor solution according to claim 2, which is at least one selected from the group consisting of 2-methyl-1,3-propanediol, γ-butyrolactone, δ-valerolactone, and ε-caprolactone.
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