JP5263607B2 - Inorganic oxide particle dispersion, curing agent and curing agent for epoxy resin - Google Patents
Inorganic oxide particle dispersion, curing agent and curing agent for epoxy resin Download PDFInfo
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- JP5263607B2 JP5263607B2 JP2009046907A JP2009046907A JP5263607B2 JP 5263607 B2 JP5263607 B2 JP 5263607B2 JP 2009046907 A JP2009046907 A JP 2009046907A JP 2009046907 A JP2009046907 A JP 2009046907A JP 5263607 B2 JP5263607 B2 JP 5263607B2
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- inorganic oxide
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- dispersion
- particle dispersion
- oxide particle
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- 239000002245 particle Substances 0.000 title claims abstract description 72
- 239000006185 dispersion Substances 0.000 title claims abstract description 55
- 229910052809 inorganic oxide Inorganic materials 0.000 title claims abstract description 49
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 26
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 20
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 20
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 18
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 claims abstract description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 64
- 238000006243 chemical reaction Methods 0.000 claims description 33
- 125000003700 epoxy group Chemical group 0.000 claims description 16
- 150000008065 acid anhydrides Chemical class 0.000 claims description 14
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 3
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 claims 1
- 125000000524 functional group Chemical group 0.000 abstract description 4
- 230000016615 flocculation Effects 0.000 abstract 1
- 238000005189 flocculation Methods 0.000 abstract 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 41
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 39
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- 239000000203 mixture Substances 0.000 description 16
- 239000000377 silicon dioxide Substances 0.000 description 16
- 238000003756 stirring Methods 0.000 description 16
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 14
- 238000000034 method Methods 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 235000019441 ethanol Nutrition 0.000 description 10
- -1 aromatic carboxylic anhydrides Chemical class 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 239000003960 organic solvent Substances 0.000 description 8
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 229910000077 silane Inorganic materials 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 239000002612 dispersion medium Substances 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- CMIAIUZBKPLIOP-YZLZLFLDSA-N methyl (1r,4ar,4br,10ar)-7-(2-hydroperoxypropan-2-yl)-4a-methyl-2,3,4,4b,5,6,10,10a-octahydro-1h-phenanthrene-1-carboxylate Chemical compound C1=C(C(C)(C)OO)CC[C@@H]2[C@]3(C)CCC[C@@H](C(=O)OC)[C@H]3CC=C21 CMIAIUZBKPLIOP-YZLZLFLDSA-N 0.000 description 5
- 230000003472 neutralizing effect Effects 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000003377 acid catalyst Substances 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- PYRZPBDTPRQYKG-UHFFFAOYSA-N cyclopentene-1-carboxylic acid Chemical compound OC(=O)C1=CCCC1 PYRZPBDTPRQYKG-UHFFFAOYSA-N 0.000 description 4
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 3
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 3
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 150000008064 anhydrides Chemical group 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000001139 pH measurement Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000006228 supernatant Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 1
- KNDQHSIWLOJIGP-UMRXKNAASA-N (3ar,4s,7r,7as)-rel-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione Chemical compound O=C1OC(=O)[C@@H]2[C@H]1[C@]1([H])C=C[C@@]2([H])C1 KNDQHSIWLOJIGP-UMRXKNAASA-N 0.000 description 1
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- YQJPWWLJDNCSCN-UHFFFAOYSA-N 1,3-diphenyltetramethyldisiloxane Chemical compound C=1C=CC=CC=1[Si](C)(C)O[Si](C)(C)C1=CC=CC=C1 YQJPWWLJDNCSCN-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- NOGFHTGYPKWWRX-UHFFFAOYSA-N 2,2,6,6-tetramethyloxan-4-one Chemical compound CC1(C)CC(=O)CC(C)(C)O1 NOGFHTGYPKWWRX-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- JTWDWVCNOLORBR-UHFFFAOYSA-N 3-chloropropyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CCCCl JTWDWVCNOLORBR-UHFFFAOYSA-N 0.000 description 1
- FKBMTBAXDISZGN-UHFFFAOYSA-N 5-methyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)CCC2C(=O)OC(=O)C12 FKBMTBAXDISZGN-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 229910002014 Aerosil® 130 Inorganic materials 0.000 description 1
- 229910002018 Aerosil® 300 Inorganic materials 0.000 description 1
- 229910002019 Aerosil® 380 Inorganic materials 0.000 description 1
- 229910002020 Aerosil® OX 50 Inorganic materials 0.000 description 1
- 229910002021 Aerosil® TT 600 Inorganic materials 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 229910002049 SYLYSIA SY470 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- RYBVCZSZPZFJOK-UHFFFAOYSA-N butyl-[butyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound CCCC[Si](C)(C)O[Si](C)(C)CCCC RYBVCZSZPZFJOK-UHFFFAOYSA-N 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexyloxide Natural products O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- UJTGYJODGVUOGO-UHFFFAOYSA-N diethoxy-methyl-propylsilane Chemical compound CCC[Si](C)(OCC)OCC UJTGYJODGVUOGO-UHFFFAOYSA-N 0.000 description 1
- OYWALDPIZVWXIM-UHFFFAOYSA-N dimethyl-[3-(oxiran-2-ylmethoxy)propyl]-trimethylsilyloxysilane Chemical compound C[Si](C)(C)O[Si](C)(C)CCCOCC1CO1 OYWALDPIZVWXIM-UHFFFAOYSA-N 0.000 description 1
- ZHQXGMHMKLHOHN-UHFFFAOYSA-N dimethyl-propyl-trimethylsilyloxysilane Chemical compound CCC[Si](C)(C)O[Si](C)(C)C ZHQXGMHMKLHOHN-UHFFFAOYSA-N 0.000 description 1
- 238000002296 dynamic light scattering Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- VANNPISTIUFMLH-UHFFFAOYSA-N glutaric anhydride Chemical compound O=C1CCCC(=O)O1 VANNPISTIUFMLH-UHFFFAOYSA-N 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical class O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- REQXNMOSXYEQLM-UHFFFAOYSA-N methoxy-dimethyl-phenylsilane Chemical compound CO[Si](C)(C)C1=CC=CC=C1 REQXNMOSXYEQLM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000004291 sulphur dioxide Substances 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- WILBTFWIBAOWLN-UHFFFAOYSA-N triethyl(triethylsilyloxy)silane Chemical compound CC[Si](CC)(CC)O[Si](CC)(CC)CC WILBTFWIBAOWLN-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- PHPGKIATZDCVHL-UHFFFAOYSA-N trimethyl(propoxy)silane Chemical compound CCCO[Si](C)(C)C PHPGKIATZDCVHL-UHFFFAOYSA-N 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 150000003738 xylenes Chemical class 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
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- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Silicon Compounds (AREA)
Abstract
Description
本発明は、無機酸化物粒子分散体、硬化剤及びエポキシ樹脂用硬化剤に関する。 The present invention relates to an inorganic oxide particle dispersion, a curing agent, and a curing agent for epoxy resin.
従来、エポキシ樹脂組成物にシリカ等の無機酸化物を分散させることで、線膨張係数を低下、内部応力を低減させ、硬化物の耐熱衝撃性、強度、弾性率の向上を図る方法が知られている。無機酸化物を用いる場合には、通常、エポキシ樹脂に無機酸化物を分散し、カルボン酸無水物等の硬化剤と混合した後、熱硬化させることが一般的に行われている。しかし、無機酸化物を分散させたエポキシ樹脂の保存安定性は悪く、経時的な樹脂の粘度増加(増粘)が問題となっている(非特許文献1、2及び3参照)。 Conventionally, a method has been known in which an inorganic oxide such as silica is dispersed in an epoxy resin composition to lower the coefficient of linear expansion, reduce internal stress, and improve the thermal shock resistance, strength, and elastic modulus of the cured product. ing. In the case of using an inorganic oxide, generally, the inorganic oxide is generally dispersed in an epoxy resin, mixed with a curing agent such as a carboxylic acid anhydride, and then thermally cured. However, the storage stability of the epoxy resin in which the inorganic oxide is dispersed is poor, and the increase in viscosity (thickening) of the resin over time is a problem (see Non-Patent Documents 1, 2, and 3).
なお、エポキシ樹脂硬化物の線膨張係数を低減する方法として、粒子径3〜60μmのシリカ粉末を添加することが提案されている(特許文献1参照)。このように無機酸化物の粒子径が大きい(0.1〜100μm程度)場合には、線膨張係数を下げるために大量の無機酸化物粒子を添加する必要があるが、樹脂に対して多量の無機酸化物を添加すると、エポキシ化合物の粘度が急激に上昇してしまい、添加量を所望の量まで増やせないため、内部応力を低減できない等の問題があった。また、粒子径5〜40nmのガラス粉末を添加し高い透過率を維持しながら、その線膨張係数を低下させ、内部応力を低減させる方法も提案されている(特許文献2参照)。しかし、線膨張係数を低下させるために、多量のガラス粉末を添加することでエポキシ樹脂の粘度上昇を抑制しているものの未だ十分とは言えなかった。また、無機酸化物を分散させたエポキシ樹脂組成物は、熱安定性も悪く、高温で保存すると粒子の表面に存在する水酸基のためエポキシ基が開環し粘度上昇が著しくなるといった問題もあった。特に、光学用途では透明性が必要であり微小な無機酸化物を使用しなければならず、凝集による粒子径増加に伴う硬化物の透過率低下は致命的な問題ともいえる。 As a method for reducing the linear expansion coefficient of the cured epoxy resin, it has been proposed to add silica powder having a particle size of 3 to 60 μm (see Patent Document 1). Thus, when the particle diameter of the inorganic oxide is large (about 0.1 to 100 μm), it is necessary to add a large amount of inorganic oxide particles in order to reduce the linear expansion coefficient. When an inorganic oxide is added, the viscosity of the epoxy compound is rapidly increased, and the amount added cannot be increased to a desired amount, so that there is a problem that internal stress cannot be reduced. In addition, a method has been proposed in which glass powder having a particle diameter of 5 to 40 nm is added to maintain the high transmittance while reducing the linear expansion coefficient and reducing internal stress (see Patent Document 2). However, although the increase in the viscosity of the epoxy resin is suppressed by adding a large amount of glass powder in order to reduce the linear expansion coefficient, it is still not sufficient. In addition, the epoxy resin composition in which the inorganic oxide is dispersed has poor heat stability, and there is a problem in that when it is stored at a high temperature, the epoxy group is ring-opened due to the hydroxyl group present on the surface of the particle, resulting in a significant increase in viscosity. . In particular, transparency is required for optical applications, and a minute inorganic oxide must be used. It can be said that a decrease in the transmittance of a cured product accompanying an increase in particle diameter due to aggregation is a fatal problem.
本発明は、平均粒子径が100nm以下の微小な無機酸化物を用いた場合でも凝集することなく、かつ、透明性に優れたエポキシ樹脂硬化物等を容易に調製でき、また、無機酸化物粒子の含有量が増加した場合でも粘度が上昇しにくい、無機酸化物粒子分散体を提供することを主な課題とする。 The present invention can easily prepare an epoxy resin cured product having excellent transparency without aggregation even when a fine inorganic oxide having an average particle size of 100 nm or less is used. The main object is to provide an inorganic oxide particle dispersion in which the viscosity does not easily increase even when the content of is increased.
本発明者は前記課題を解決すべく、鋭意検討したところ、通常、硬化剤として用いられている酸無水物に、特定の化合物を反応させた無機酸化物粒子を分散させることにより、前記課題を解決することができることを見出した。 As a result of diligent studies to solve the above-mentioned problems, the present inventor normally disperses inorganic oxide particles obtained by reacting a specific compound in an acid anhydride used as a curing agent. I found out that it can be solved.
すなわち、本発明は、シリカ粒子(b1)に対するエポキシ基を有するシランカップリング剤及び/又はシリル化剤(b2)の反応量が、シリカ粒子(b1)1gに対して、エポキシ基を有するシランカップリング剤及び/又はシリル化剤(b2)が0.2〜3mmolである請求項1に記載の無機酸化物粒子分散体;前記無機酸化物粒子分散体を含有する硬化剤;前記無機酸化物粒子分散体を含有するエポキシ樹脂用硬化剤に関する。 That is, the present invention is a silane coupling agent having an epoxy group to silica particles (b1) and / or silylating agent reaction of (b2) is, the silica particles (b1) 1 g, silane having an epoxy group cup The inorganic oxide particle dispersion according to claim 1, wherein the ring agent and / or silylating agent (b2) is 0.2 to 3 mmol; the curing agent containing the inorganic oxide particle dispersion; the inorganic oxide particles The present invention relates to a curing agent for epoxy resin containing a dispersion.
本発明によれば、平均粒子径が100nm以下の微小な無機酸化物を用いた場合でも凝集することなく、かつ、透明性に優れたエポキシ樹脂硬化物等を容易に調製できる無機酸化物粒子分散体を得ることができる。当該無機酸化物粒子分散体は、酸無水物中に無機酸化物が均一に分散されたものであり、例えば、酸無水物組成物はエポキシ樹脂、ポリエステル樹脂、ポリウレタン樹脂等の原材料(硬化剤、架橋剤等)として使用できる。特にエポキシ樹脂用硬化剤として用いた場合、従来のエポキシ樹脂と酸無水物による硬化物の透明性を維持しつつ、強度・靭性を向上させることができる。 According to the present invention, inorganic oxide particle dispersion that can easily prepare an epoxy resin cured product having excellent transparency without agglomeration even when a fine inorganic oxide having an average particle size of 100 nm or less is used. You can get a body. The inorganic oxide particle dispersion is obtained by uniformly dispersing an inorganic oxide in an acid anhydride. For example, an acid anhydride composition is made of raw materials (curing agent, epoxy resin, polyester resin, polyurethane resin, etc.). It can be used as a crosslinking agent. In particular, when used as a curing agent for epoxy resins, the strength and toughness can be improved while maintaining the transparency of the cured product of conventional epoxy resins and acid anhydrides.
本発明の無機酸化物粒子分散体は、カルボン酸無水物(A)(以下、成分(A)という)中に、シリカ粒子(b1)(以下、成分(b1)という)及びエポキシ基を有するシランカップリング剤(b2)(以下、成分(b2)という)を反応させて得られた変性無機酸化物粒子(b)(以下、成分(b)という)にカルボン酸無水物(b3)を反応させて得られる平均粒子径が5〜100nmの無機酸化物粒子(B)(以下、成分(B)という)が分散されたものである。 The inorganic oxide particle dispersion of the present invention includes a silica particle (b1) (hereinafter referred to as component (b1)) and a silane having an epoxy group in carboxylic acid anhydride (A) (hereinafter referred to as component (A)). A modified inorganic oxide particle (b) (hereinafter referred to as component (b)) obtained by reacting a coupling agent (b2) (hereinafter referred to as component (b2)) is allowed to react with a carboxylic acid anhydride (b3). Inorganic oxide particles (B) having an average particle diameter of 5 to 100 nm (hereinafter referred to as component (B)) are dispersed.
本発明で使用される成分(A)としては、1分子中に少なくとも2つのカルボキシル基を有するカルボン酸の無水物であれば、特に限定されず、公知のものを用いることができる。具体的には、例えば、無水フタル酸、無水トリメリット酸、無水ピロメリット酸等の芳香族系カルボン酸無水物、無水マレイン酸、無水グルタル酸等の脂肪族系カルボン酸無水物、ヘキサヒドロ無水フタル酸、テトラヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸無水メチルナジック酸、無水ナジック酸等の脂環族系カルボン酸無水物等があげられる。これらは単独でもしくは2種以上併せて用いることができる。これら酸無水物の中でも、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、無水フタル酸、テトラヒドロ無水フタル酸を用いることが好ましい。特に、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸を用いることが、エポキシ樹脂硬化物としての耐黄変性を向上させるために好適であり、光学用途に適しているため好ましい。なお、成分(A)が液状でない場合には、必要に応じて、後述する成分(B)を分散させる際に用いる有機溶媒を用いることが好ましい。 The component (A) used in the present invention is not particularly limited as long as it is an anhydride of carboxylic acid having at least two carboxyl groups in one molecule, and a known one can be used. Specifically, for example, aromatic carboxylic anhydrides such as phthalic anhydride, trimellitic anhydride and pyromellitic anhydride, aliphatic carboxylic anhydrides such as maleic anhydride and glutaric anhydride, hexahydrophthalic anhydride Examples thereof include alicyclic carboxylic acid anhydrides such as acid, tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methyl nadic anhydride, and nadic anhydride. These may be used alone or in combination of two or more. Among these acid anhydrides, it is preferable to use hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, phthalic anhydride, and tetrahydrophthalic anhydride. In particular, it is preferable to use hexahydrophthalic anhydride or methylhexahydrophthalic anhydride because it is suitable for improving yellowing resistance as a cured epoxy resin and suitable for optical applications. In addition, when a component (A) is not liquid, it is preferable to use the organic solvent used when disperse | distributing the component (B) mentioned later as needed.
本発明で用いられる成分(B)は、成分(b1)に成分(b2)を反応させて得られた成分(b)に、成分(b3)を反応させることにより得られる。 The component (B) used in the present invention is obtained by reacting the component (b3) with the component (b) obtained by reacting the component (b1) with the component (b2).
本発明で使用される成分(b1)の平均粒子径は、通常、5nm〜100nm程度とすることが好ましく、特に5nm〜80nmとすることが好ましい。平均粒子径が5nm未満の粒子は、調製することが困難であり、得られたとしても粒子径が小さすぎるため、無機酸化物粒子を含む被膜の強度が弱く、被膜の基材に対する密着性が悪くなるため好ましくない。また、平均粒子径が100nmを超えると、無機酸化物粒子を含む被膜の強度が低下し、被膜の基材に対する密着性が悪くなり、さらには安定な分散状態を維持できず沈降することがあるため好ましくない。 The average particle diameter of the component (b1) used in the present invention is usually preferably set to about 5 nm to 100 nm, particularly preferably to 5 to 80 nm. Particles having an average particle size of less than 5 nm are difficult to prepare, and even if obtained, the particle size is too small, so the strength of the coating containing inorganic oxide particles is weak, and the coating has good adhesion to the substrate. Since it gets worse, it is not preferable. Further, if the average particle diameter exceeds 100 nm, the strength of the coating containing inorganic oxide particles is lowered, the adhesion of the coating to the base material is deteriorated, and further, a stable dispersion state cannot be maintained and sedimentation may occur. Therefore, it is not preferable.
なお、成分(b1)は、市販の分散液をそのまま用いてもよい。市販品(商品名)としては、例えば、シリカ粒子の分散液として、メタノールシリカゾル、IPA−ST、MEK−ST、MIBK−ST、XBA−ST、DMAC−ST、ST−20、ST−40、ST−C、ST−N、ST−O、ST−50、ST−OL(以上、日産化学工業(株)製)、オルガノゾルPL−2L−MA、PL−2L−IPA、PL−2PGME(以上、扶桑化学工業(株)製)等を、シリカ粒子として、アエロジル130、アエロジル300、アエロジル380、アエロジルTT600、アエロジルOX50(以上、日本アエロジル(株)製)、シルデックスH31、シルデックスH32、シルデックスH51、シルデックスH52、シルデックスH121、シルデックスH122(以上、旭硝子(株)製)、E220A、E220(以上、日本シリカ工業(株)製)、SYLYSIA470(富士シリシア化学(株)製)、SGフレーク(日本板硝子(株)製)等を、挙げることができる。さらに、水と相溶性を有する有機溶媒に分散したシリカ粒子分散液と水に分散したシリカ粒子を混合してもよい。水に分散したシリカ粒子としては、スノーテックスシリーズ(日産化学工業(株)製)、シリカドールシリーズ(日本化学工業(株)製)、カタロイドシリーズ(触媒化成工業(株)製)等を挙げることができる。これらのなかでは、特に分散液が酸性であるシリカ粒子分散液が好ましい。また、水に分散したシリカ粒子に水と相溶性を有する有機溶媒を加えたものも使用できる。 In addition, you may use a commercially available dispersion as it is for a component (b1). As a commercial item (trade name), for example, as silica particle dispersion, methanol silica sol, IPA-ST, MEK-ST, MIBK-ST, XBA-ST, DMAC-ST, ST-20, ST-40, ST -C, ST-N, ST-O, ST-50, ST-OL (above, manufactured by Nissan Chemical Industries, Ltd.), Organosol PL-2L-MA, PL-2L-IPA, PL-2PGME (above, Fuso Chemical Industry Co., Ltd.) as silica particles, Aerosil 130, Aerosil 300, Aerosil 380, Aerosil TT600, Aerosil OX50 (above, Nippon Aerosil Co., Ltd.), Sildex H31, Sildex H32, Sildex H51 Sildex H52, Sildex H121, Sildex H122 (above, manufactured by Asahi Glass Co., Ltd.), E22 A, E220 (manufactured by Nippon Silica Industrial Co., Ltd.), (manufactured by Fuji Silysia Chemical (Co., Ltd.)) SYLYSIA470, the SG Flake (manufactured by Nippon Sheet Glass Co., Ltd.), and the like, can be cited. Furthermore, a silica particle dispersion liquid dispersed in an organic solvent compatible with water and silica particles dispersed in water may be mixed. Examples of silica particles dispersed in water include Snowtex series (manufactured by Nissan Chemical Industries, Ltd.), silica doll series (manufactured by Nippon Chemical Industry Co., Ltd.), and cataloid series (manufactured by Catalytic Chemical Industries, Ltd.). be able to. Among these, a silica particle dispersion in which the dispersion is acidic is particularly preferable. Moreover, what added the organic solvent compatible with water to the silica particle disperse | distributed in water can also be used.
成分(b2)としては、一分子中にエポキシ基を有するシランカップリング剤及び/又はシリル化剤であれば限定されず公知のものを用いることができる。本発明において、シランカップリング剤とは、エポキシ基とアルコキシ基等の加水分解基を有する化合物である。また、シリル化剤とは、エポキシ基を有するアルコキシ基等の加水分解基を有しないシラン化合物である。シランカップリング剤としては、具体的には、例えば、一般式(1):Z4−nSiXn(式中、エポキシ基、Xはアルコキシ基、ハロゲン基又はアミノ基を表す。nは1〜3の整数である。)で表される化合物を用いることができる。シリル化剤としては、具体的には、一般式(2): As a component (b2), if it is a silane coupling agent and / or silylating agent which have an epoxy group in 1 molecule, it will not be limited but a well-known thing can be used. In the present invention, the silane coupling agent is a compound having a hydrolysis group such as an epoxy group and an alkoxy group. The silylating agent is a silane compound that does not have a hydrolyzing group such as an alkoxy group having an epoxy group . Specific examples of the silane coupling agent include, for example, general formula (1): Z 4-n SiX n (wherein the epoxy group , X represents an alkoxy group, a halogen group, or an amino group. It is an integer of 3.) The compound represented by this can be used. Specifically, as the silylating agent, the general formula (2):
(式中、R1、R2、R3、R4、R5及びR6は、有機官能基であり、少なくとも1つ以上がエポキシ基である)で表わされる化合物を用いることができる。なお、有機官能基としては、アルコキシ基等の加水分解基以外であれば特に限定されず公知のものが挙げられる。有機官能基としては、具体的には、例えば、炭素数が1〜20のアルキル基、フェニル基などが挙げられる。なお、エポキシ基としては、3,4−エポキシシクロヘキシル基、3−グリシドキシプロピル基等が挙げられる。 (Wherein R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are organic functional groups, at least one of which is an epoxy group ) can be used. The organic functional group is not particularly limited as long as it is other than a hydrolyzable group such as an alkoxy group, and examples thereof include known ones. Specifically as an organic functional group, a C1-C20 alkyl group, a phenyl group, etc. are mentioned, for example . As the epoxy group, 3,4-epoxycyclohexyl group, and a 3-glycidoxypropyl group.
シランカップリング剤としては、具体的には3−グリシドキシプロピルトリメトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、3−グリシドキシプロピルメチルジメトキシシラン、3―グリシドキシプロピルメチルジエトキシシラン、3−グリシドキシプロピルトリエトキシシラン等のエポキシ基を有するシランカップリング剤等が挙げられる。また、シリル化剤としては、3−グリシドキシプロピルペンタメチルジシロキサンなどが挙げられる。これらは単独でもしくは2種以上併せて用いられる。これらの中では、エポキシ基を有するシランカップリング剤が好ましく、特にエポキシ基及びジアルコキシシリル基を有するシランカップリング剤を用いることが、成分(b3)のカルボン酸無水物基との反応が容易に進行し、得られた成分(B)の成分(A)中への分散性を高め、粘度を低下させることができ、エポキシ化合物との硬化反応を行った際にマトリックス中に結合により固定できる点から好ましい。成分(B)の成分(A)中への分散後、分散体の粘度が高粘度化する場合は、ヘキサメチルジシロキサン、1,3−ジブチルテトラメチルジシロキサン、1,3−ジフェニルテトラメチルジシロキサン、1,3−ジビニルテトラメチルジシロキサン、ヘキサエチルジシロキサン、ヘキサメチルジシラザン、トリメチルメトキシシラン、トリメチルエトキシシラン、トリメチルプロポキシシラン、フェニルジメチルメトキシシラン、クロロプロピルジメチルメトキシシラン、3−グリシドキシプロピルペンタメチルジシロキサン等のシラン化合物を、成分(b1)と成分(b2)を反応させて得られる成分(b)と再度反応させることで低粘度化を図ることができる。なおこれらシラン化合物は1種を単独で用いても2種以上を混合して用いてもよい。当該シラン化合物の添加量は、成分(b2)の物質量に対し10〜100mol%程度とすることが好ましい。 Specific examples of the silane coupling agent include 3-glycidoxypropyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, and 3-glycid. propyl methyl diethoxy silane, such as a silane coupling agent having an epoxy group such as 3-glycidoxypropyl triethoxy silane. Examples of the silylating agent include 3-glycidoxypropylpentamethyldisiloxane. These may be used alone or in combination of two or more. Among these, a silane coupling agent having an epoxy group is preferable. In particular, the use of a silane coupling agent having an epoxy group and a dialkoxysilyl group facilitates the reaction with the carboxylic acid anhydride group of the component (b3). The dispersibility of the obtained component (B) in the component (A) can be increased, the viscosity can be lowered, and when the curing reaction with the epoxy compound is carried out, it can be fixed by bonding in the matrix. It is preferable from the point. When the viscosity of the dispersion increases after dispersion of component (B) in component (A), hexamethyldisiloxane, 1,3-dibutyltetramethyldisiloxane, 1,3-diphenyltetramethyldi Siloxane, 1,3-divinyltetramethyldisiloxane, hexaethyldisiloxane, hexamethyldisilazane, trimethylmethoxysilane, trimethylethoxysilane, trimethylpropoxysilane, phenyldimethylmethoxysilane, chloropropyldimethylmethoxysilane, 3-glycidoxy Viscosity can be lowered by reacting a silane compound such as propylpentamethyldisiloxane again with the component (b) obtained by reacting the component (b1) with the component (b2). In addition, these silane compounds may be used individually by 1 type, or 2 or more types may be mixed and used for them. The amount of the silane compound added is preferably about 10 to 100 mol% with respect to the amount of the component (b2).
成分(B)の製造に用いる成分(b3)としては、前述の成分(A)と同様のものに加え、無水酢酸、無水プロピオン酸、無水安息香酸などのモノカルボン酸の脱水縮合物などを用いることができる。なお、成分(B)を成分(A)中に安定に分散させるためには、成分(b3)は成分(A)と同じものとすることが好ましい。 As the component (b3) used for the production of the component (B), in addition to the same component (A) described above, a dehydration condensate of a monocarboxylic acid such as acetic anhydride, propionic anhydride, benzoic anhydride or the like is used. be able to. In order to stably disperse the component (B) in the component (A), the component (b3) is preferably the same as the component (A).
成分(b1)に対する成分(b2)の反応量は、特に限定されないが、通常、成分(b1)1gに対して、成分(b2)を0.2〜3mmol程度反応させればよく、好ましくは0.4〜2.5mmolである。3mmolを超えてカップリング剤を反応させることは困難であり、0.2mmol未満では、アルコール系溶媒から、他のケトン等の有機溶媒へ置換する際、粒子が不安定化し、凝集物・塊が析出する場合がある。 Although the reaction amount of the component (b2) with respect to the component (b1) is not particularly limited, it is generally sufficient to react about 0.2 to 3 mmol of the component (b2) with respect to 1 g of the component (b1), preferably 0. .4 to 2.5 mmol. It is difficult to react the coupling agent in excess of 3 mmol, and in the case of less than 0.2 mmol, when the alcohol solvent is replaced with an organic solvent such as other ketones, the particles become unstable, and aggregates / lumps are formed. It may precipitate.
また、成分(b)に対する成分(b3)の反応量は、特に限定されないが、通常、成分(b)1gに対して、成分(b3)を0.2〜3mmol程度であり、好ましくは0.4〜2.5mmolである。 Moreover, the reaction amount of the component (b3) with respect to the component (b) is not particularly limited, but usually the component (b3) is about 0.2 to 3 mmol, preferably 0. 4-2.5 mmol.
成分(b1)と成分(b2)の反応方法としては、特に限定されず公知の方法を採用すれば良い。具体的には、例えば、成分(b1)の存在下、成分(b2)を酸触媒、水、必要に応じて有機溶媒を使用して、30℃〜150℃程度で加熱反応させる方法などを採用することができる。なお、成分(b1)自体が酸性であれば必ずしも酸触媒を加える必要はない。有機溶媒としては、例えば、メチルアルコール、エチルアルコール、2−プロピルアルコール、n−ブチルアルコール、n−オクチルアルコール、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、ジエチレングリコールモノ−n−ブチルエーテル、プロピルグリコールモノメチルエーテル、プロピルグリコールモノエチルエーテル等のアルコール類が好ましい。なお、当該反応は、pH7未満、好ましくはpH2〜pH6の酸性条件下で、必要に応じては酸触媒を加えても良く、反応温度30℃〜150℃程度で、1時間〜15時間程度、好ましくは2時間〜12時間反応させ、得られた反応液が酸性の場合には、イオン交換樹脂、アルカリ、酸吸着剤等で中和処理することが好ましい。 The reaction method of component (b1) and component (b2) is not particularly limited, and a known method may be employed. Specifically, for example, a method in which the component (b2) is heated and reacted at about 30 ° C. to 150 ° C. using an acid catalyst, water, and, if necessary, an organic solvent in the presence of the component (b1) is employed. can do. In addition, if the component (b1) itself is acidic, it is not always necessary to add an acid catalyst. Examples of the organic solvent include methyl alcohol, ethyl alcohol, 2-propyl alcohol, n-butyl alcohol, n-octyl alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, propyl glycol monomethyl ether. Alcohols such as propyl glycol monoethyl ether are preferred. The reaction is carried out under acidic conditions of pH less than 7, preferably pH 2 to pH 6, and an acid catalyst may be added as necessary. The reaction temperature is about 30 ° C. to 150 ° C. for about 1 hour to 15 hours, Preferably, the reaction is performed for 2 to 12 hours, and when the obtained reaction solution is acidic, it is preferable to neutralize with an ion exchange resin, an alkali, an acid adsorbent, or the like.
成分(b)と成分(b3)との反応方法としては、特に限定されず公知の方法を採用すれば良い。具体的には、例えば、各成分を、必要に応じて有機溶媒の存在下、10℃〜150℃程度で加熱反応させる方法などを採用することができる。なお、反応が進行しにくい場合は酸触媒を加えても良い。なお、使用する溶媒は成分(b3)に対して不活性なものであれば特に限定されず、公知のものを用いることができる。このようにして得られた成分(B)は、平均粒子径が、5〜100nm程度である。 The reaction method between the component (b) and the component (b3) is not particularly limited, and a known method may be employed. Specifically, for example, a method in which each component is heated and reacted at about 10 ° C. to 150 ° C. in the presence of an organic solvent as necessary can be employed. If the reaction does not proceed easily, an acid catalyst may be added. In addition, the solvent to be used will not be specifically limited if it is inactive with respect to a component (b3), A well-known thing can be used. The component (B) thus obtained has an average particle size of about 5 to 100 nm.
なお、成分(B)は、必要に応じて、適当な溶媒に分散した分散液として、無機酸化物粒子分散体の調製に供することもできる。溶媒としては、酸無水物に対して不活性で、適度の揮発性を有する限り特に限定されるものではないが、例えば、ジエチルエーテル、テトラヒドロフラン等のエーテル類;アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類;酢酸エチル、酢酸n−ブチル、乳酸エチル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、γ−ブチロラクトン等のエステル又はラクトン類;ベンゼン、トルエン、キシレン類等の芳香族炭化水素類;ジメチルホルムアミド、ジメチルアセトアミド、N−メチルピロリドン等のアミド又はラクタム類等を挙げることができる。これらの溶媒は、単独で又は2種以上を混合して使用することができる。無機酸化物粒子の分散液の固形分濃度は、通常、1〜60重量%程度、好ましくは5〜50重量%である。 In addition, a component (B) can also be used for preparation of an inorganic oxide particle dispersion as a dispersion liquid disperse | distributed to the suitable solvent as needed. The solvent is not particularly limited as long as it is inert to acid anhydrides and has an appropriate volatility. For example, ethers such as diethyl ether and tetrahydrofuran; acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone Ketones such as ethyl acetate, n-butyl acetate, ethyl lactate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, γ-butyrolactone and other esters or lactones; aromatic carbonization such as benzene, toluene, xylenes, etc. Hydrogens; Amides or lactams such as dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like can be mentioned. These solvents can be used alone or in admixture of two or more. The solid content concentration of the dispersion of inorganic oxide particles is usually about 1 to 60% by weight, preferably 5 to 50% by weight.
本発明の無機酸化物粒子分散体は、成分(A)100重量部に対して、成分(B)を通常3〜70重量部(固形分)程度、好ましくは5〜50重量部分散させたものである。なお、成分(B)の使用量が70重量部を超えると、組成物が増粘して、取り扱いが困難になるおそれがある。 The inorganic oxide particle dispersion of the present invention is obtained by dispersing about 3 to 70 parts by weight (solid content), preferably 5 to 50 parts by weight of component (B) with respect to 100 parts by weight of component (A). It is. In addition, when the usage-amount of a component (B) exceeds 70 weight part, there exists a possibility that a composition may thicken and handling may become difficult.
以下に実施例をあげて本発明を具体的に説明するが、本発明はこれら実施例に限定されるものではない。なお、pH測定、平均粒子径の測定、表面被覆量は下記の方法で決定した。また、実施例中「%」は、重量基準である。 EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. The pH measurement, average particle diameter measurement, and surface coating amount were determined by the following methods. In the examples, “%” is based on weight.
pH測定方法
中和処理した表面被覆シリカゾル分散液をシリカゾルに対し溶液濃度が1%になるようにイオン交換水で希釈し、pH計(装置名:「D−52」、(株)堀場製作所製)を用い、25℃にて測定した。
pH measurement method Neutralized surface-coated silica sol dispersion was diluted with ion-exchanged water so that the solution concentration was 1% with respect to silica sol, and a pH meter (device name: “D-52”, manufactured by Horiba, Ltd.) ) And measured at 25 ° C.
平均粒子径の測定方法
平均粒子径は、動的光散乱法装置(装置名:「FPAR−3」、濃厚系プロ―ブ使用、大塚電子(株)製)を用い、25℃にて測定し、キュムラント解析法によって決定した値を採用した。
Measuring method of average particle diameter The average particle diameter is measured at 25 ° C. using a dynamic light scattering apparatus (device name: “FPAR-3”, using a concentrated probe, manufactured by Otsuka Electronics Co., Ltd.). The value determined by cumulant analysis was adopted.
表面反応量の測定方法
得られた有機溶媒に分散されたシリカゾルをn−ヘキサンと混合し、凝集したシリカゾルを遠心分離器で処理し(3000rpm、30分間)、分散溶媒とシリカゾルを分離した。上澄みを取り除いた後、残渣にテトラヒドロフランを加えてシリカゾル粒子を再分散させ、さらにn−ヘキサンを加えシリカゾルを凝集させた。この操作を繰り返し、上澄み液にシリカゾル表面と反応しなかったシランカップリング剤が無いことを、ガスクロマトグラフィで確認した。このシリカゾルを、105℃で3時間乾燥させ、得られた固形物の熱分析(装置名:「TG−DTA 2000S」、ブルカー・エイエックスエス(株)製。昇温速度;10℃/分、800℃まで加熱)を行い、その際の重量減少量から、シリカゾル単位重量当たりに反応したカップリング剤量を算出した。
Method for measuring surface reaction amount The silica sol dispersed in the obtained organic solvent was mixed with n-hexane, and the agglomerated silica sol was treated with a centrifuge (3000 rpm, 30 minutes) to separate the dispersion solvent and the silica sol. After removing the supernatant, tetrahydrofuran was added to the residue to redisperse the silica sol particles, and n-hexane was further added to aggregate the silica sol. This operation was repeated, and it was confirmed by gas chromatography that there was no silane coupling agent that did not react with the silica sol surface in the supernatant. The silica sol was dried at 105 ° C. for 3 hours, and thermal analysis of the obtained solid (device name: “TG-DTA 2000S”, manufactured by Bruker AXS Co., Ltd., heating rate: 10 ° C./min, The amount of coupling agent reacted per unit weight of silica sol was calculated from the weight loss at that time.
粘度の測定方法
粘度は、E型粘度計装置(製品名:「RE−80E」、コーン:1°30´×24、東京計器(株)製)を用いて測定した値である。測定温度は25℃である。
Viscosity Measuring Method Viscosity is a value measured using an E-type viscometer device (product name: “RE-80E”, cone: 1 ° 30 ′ × 24, manufactured by Tokyo Keiki Co., Ltd.). The measurement temperature is 25 ° C.
実施例1
攪拌機、攪拌羽根、コンデンサー、滴下漏斗、温度計及び窒素ラインを具備した四つ口丸底フラスコに、シリカ/2−プロピルアルコール分散液(日産化学工業(株)製、商品名「IPA−ST」)300g(シリカ固形分32%、平均粒子径20nm)、イオン交換水15.7g、及び2−プロピルアルコール4.3gを仕込み、窒素気流下で攪拌しながら、80℃まで加熱した。次いで、3−グリシドキシプロピルメチルジメトキシシラン(東レ・ダウコーニング(株)製、商品名「Z−6044」)96gを2−プロピルアルコール224gで溶解したものを1時間かけて滴下し、滴下終了後、還流下で6時間保温することにより、シリカゾルの表面被覆処理を行った。この表面被覆シリカゾル分散液を、0.1mol/l水酸化カリウム/エチルアルコール溶液(和光純薬工業(株)製)で中和することにより、表面被覆シリカゾルの平均粒子径が21nm、反応量1.0mmol/g((b1)に対する(b2)の反応量)で、pHが6.5の中和処理表面被覆シリカゾル分散液を得た。
次に、攪拌機、攪拌羽根、水分定量受器、コンデンサー、及び温度計を具備した丸底フラスコに、上記で得られた中和処理表面被覆シリカゾル分散液600gを仕込み、さらに濃度10%になるようにエチルメチルケトンを1200g添加した。攪拌しながら80℃まで加熱を行い、エチルメチルケトン、エチルアルコール、2−プロピルアルコールを共沸蒸留し、濃度を20%まで上げた。この濃度間で、エチルメチルケトンの添加、及びエチルメチルケトン、エチルアルコール、2−プロピルアルコールの留去を行い、最終的にゾル濃度20%において分散媒をエチルメチルケトンに置換した。
得られた表面被覆シリカゾルエチルメチルケトン分散液400gに、4−メチルヘキサヒドロ無水フタル酸とヘキサヒドロ無水フタル酸混合物(新日本理化(株)製、商品名「リカシッドMH−700」)gを80g添加し、攪拌しながら80℃で1時間還流させた。反応終了後、減圧(15hPa)下、ロータリーエバポレーターでエチルメチルケトンを留去することで、シリカ粒子の表面をシランカップリング剤、及び酸無水物で反応させたシリカが分散した酸無水物を158g(収率99%)得た。このとき、反応量は0.8mmol/g((b)に対する(b3)の反応量)であった。
Example 1
To a four-necked round bottom flask equipped with a stirrer, stirring blade, condenser, dropping funnel, thermometer and nitrogen line, silica / 2-propyl alcohol dispersion (manufactured by Nissan Chemical Industries, Ltd., trade name “IPA-ST”) ) 300 g (silica solid content 32%, average particle diameter 20 nm), ion-exchanged water 15.7 g, and 2-propyl alcohol 4.3 g were charged and heated to 80 ° C. while stirring under a nitrogen stream. Subsequently, 96 g of 3-glycidoxypropylmethyldimethoxysilane (manufactured by Toray Dow Corning Co., Ltd., trade name “Z-6044”) dissolved in 224 g of 2-propyl alcohol was added dropwise over 1 hour, and the addition was completed. Thereafter, the surface of the silica sol was coated by maintaining the temperature for 6 hours under reflux. By neutralizing this surface-coated silica sol dispersion with a 0.1 mol / l potassium hydroxide / ethyl alcohol solution (manufactured by Wako Pure Chemical Industries, Ltd.), the average particle size of the surface-coated silica sol is 21 nm and the reaction amount is 1. A neutralized surface-coated silica sol dispersion having a pH of 6.5 at 0.0 mmol / g (reaction amount of (b2) with respect to (b1)) was obtained.
Next, 600 g of the neutralized surface-coated silica sol dispersion obtained above is charged into a round bottom flask equipped with a stirrer, stirring blade, moisture meter, condenser, and thermometer so that the concentration becomes 10%. 1,200 g of ethyl methyl ketone was added. While stirring, the mixture was heated to 80 ° C., and ethyl methyl ketone, ethyl alcohol, and 2-propyl alcohol were azeotropically distilled to increase the concentration to 20%. Between these concentrations, ethyl methyl ketone was added and ethyl methyl ketone, ethyl alcohol, and 2-propyl alcohol were distilled off, and finally the dispersion medium was replaced with ethyl methyl ketone at a sol concentration of 20%.
80 g of a mixture of 4-methylhexahydrophthalic anhydride and hexahydrophthalic anhydride (manufactured by Shin Nippon Rika Co., Ltd., trade name “Licacid MH-700”) was added to 400 g of the obtained surface-coated silica sol ethyl methyl ketone dispersion. The mixture was refluxed at 80 ° C. for 1 hour with stirring. After completion of the reaction, 158 g of acid anhydride in which silica reacted with the silane coupling agent and acid anhydride was dispersed on the surface of the silica particles by distilling off ethyl methyl ketone with a rotary evaporator under reduced pressure (15 hPa). (Yield 99%). At this time, the reaction amount was 0.8 mmol / g (reaction amount of (b3) with respect to (b)).
実施例2
攪拌機、攪拌羽根、コンデンサー、滴下漏斗、温度計及び窒素ラインを具備した四つ口丸底フラスコに、「IPA−ST」300g、イオン交換水21.9g、及び2−プロピルアルコール318gを仕込み、窒素気流下で攪拌しながら、80℃まで加熱した。次いで、3−グリシドキシプロピルトリメトキシシラン(東レ・ダウコーニング(株)製、商品名「Z−6040」)96gを2−プロピルアルコール544gで溶解したものを1時間かけて滴下し、滴下終了後、還流下で6時間保温した。続けて、ヘキサメチルジシロキサン(東京化成工業(株)製)を64g添加し、さらに還流下で4時間保温することにより、シリカゾルの表面被覆処理を行った。この表面被覆シリカゾル分散液を、0.1mol/l水酸化カリウム/エチルアルコール溶液で中和することにより、表面被覆シリカゾルの平均粒子径が20nm、反応量1.4mmol/g((b1)に対する(b2)の反応量)で、pHが6.5の中和処理表面被覆シリカゾル分散液を得た。
次に、実施例1に従って、上記中和処理表面被覆シリカゾル分散液の分散媒をエチルメチルケトンに置換した。得られた表面被覆シリカゾルエチルメチルケトン分散液400gに、「リカシッドMH−700」を80g添加し、攪拌しながら80℃で1時間還流させた。反応終了後、減圧(15hPa)下、ロータリーエバポレーターでエチルメチルケトンを留去することで、シリカ粒子の表面をシランカップリング剤、シリル化剤、及び酸無水物で反応させたシリカが分散した酸無水物を158g(収率99%)得た。このとき、反応量は1.0mmol/g((b)に対する(b3)の反応量)であった。
Example 2
A four-necked round bottom flask equipped with a stirrer, stirring blade, condenser, dropping funnel, thermometer and nitrogen line was charged with 300 g of “IPA-ST”, 21.9 g of ion-exchanged water, and 318 g of 2-propyl alcohol. The mixture was heated to 80 ° C. with stirring under an air stream. Next, 96 g of 3-glycidoxypropyltrimethoxysilane (manufactured by Toray Dow Corning Co., Ltd., trade name “Z-6040”) dissolved in 544 g of 2-propyl alcohol was added dropwise over 1 hour, and the addition was completed. Thereafter, the mixture was kept under reflux for 6 hours. Subsequently, 64 g of hexamethyldisiloxane (manufactured by Tokyo Kasei Kogyo Co., Ltd.) was added, and the mixture was further heated for 4 hours under reflux, whereby a silica sol surface coating treatment was performed. By neutralizing this surface-coated silica sol dispersion with a 0.1 mol / l potassium hydroxide / ethyl alcohol solution, the average particle size of the surface-coated silica sol is 20 nm and the reaction amount is 1.4 mmol / g ((b1) In the reaction amount b2), a neutralized surface-coated silica sol dispersion having a pH of 6.5 was obtained.
Next, according to Example 1, the dispersion medium of the neutralized surface-coated silica sol dispersion was replaced with ethyl methyl ketone. 80 g of “Licacid MH-700” was added to 400 g of the obtained surface-coated silica sol ethyl methyl ketone dispersion, and the mixture was refluxed at 80 ° C. for 1 hour with stirring. After completion of the reaction, the ethyl methyl ketone is distilled off with a rotary evaporator under reduced pressure (15 hPa), whereby the silica particles are reacted with a silane coupling agent, a silylating agent, and an acid anhydride. 158 g (99% yield) of anhydride was obtained. At this time, the reaction amount was 1.0 mmol / g (reaction amount of (b3) with respect to (b)).
比較例1
攪拌機、攪拌羽根、コンデンサー、滴下漏斗、温度計及び窒素ラインを具備した四つ口丸底フラスコに、「IPA−ST」500g、イオン交換水2.0g、及び2−プロピルアルコール564gを仕込み、窒素気流下で攪拌しながら、80℃まで加熱した。次いで、ヘキサメチルジシロキサン18.2gを2−プロピルアルコール103.0gで溶解したものを1時間かけて滴下し、滴下終了後、還流下で6時間保温することにより、シリカゾルの表面被覆処理を行った。この表面被覆シリカゾル分散液を、0.1mol/l水酸化カリウム/エタノール溶液で中和することにより、表面被覆シリカゾルの平均粒子径が18nm、反応量0.3mmol/g((b1)に対する(b2)の反応量)で、pHが6.5の中和処理表面被覆シリカゾル分散液を得た。
次に、実施例1に従って、上記中和処理表面被覆シリカゾル分散液の分散媒をエチルメチルケトンに置換した。得られた表面被覆シリカゾルエチルメチルケトン分散液400gに、「リカシッドMH−700」を186.7g添加し、25℃で1時間攪拌し、次いで減圧(15hPa)下、ロータリーエバポレーターでエチルメチルケトンを留去することで、シリカ粒子の表面をシラン剤で反応させたシリカが分散した酸無水物を264g(収率99%)得た。
Comparative Example 1
A four-necked round bottom flask equipped with a stirrer, stirring blade, condenser, dropping funnel, thermometer and nitrogen line was charged with 500 g of “IPA-ST”, 2.0 g of ion-exchanged water, and 564 g of 2-propyl alcohol. The mixture was heated to 80 ° C. with stirring under an air stream. Next, a solution obtained by dissolving 18.2 g of hexamethyldisiloxane in 103.0 g of 2-propyl alcohol was dropped over 1 hour, and after completion of the dropwise addition, the silica sol was subjected to a surface coating treatment by incubating for 6 hours under reflux. It was. By neutralizing this surface-coated silica sol dispersion with a 0.1 mol / l potassium hydroxide / ethanol solution, the average particle size of the surface-coated silica sol was 18 nm, and the reaction amount was 0.3 mmol / g ((b2) relative to (b1) ), A neutralized surface-coated silica sol dispersion having a pH of 6.5 was obtained.
Next, according to Example 1, the dispersion medium of the neutralized surface-coated silica sol dispersion was replaced with ethyl methyl ketone. To 400 g of the obtained surface-coated silica sol ethyl methyl ketone dispersion, 186.7 g of “Ricacid MH-700” was added, stirred at 25 ° C. for 1 hour, and then the ethyl methyl ketone was distilled with a rotary evaporator under reduced pressure (15 hPa). By leaving, 264 g (yield 99%) of an acid anhydride in which silica whose surface was reacted with a silane agent was dispersed was obtained.
比較例2
攪拌機、攪拌羽根、コンデンサー、滴下漏斗、温度計及び窒素ラインを具備した四つ口丸底フラスコに、「IPA−ST」300g、イオン交換水7.8g、及び2−プロピルアルコール12.2gを仕込み、窒素気流下で攪拌しながら、80℃まで加熱した。次いで、n−プロピルトリメトキシシラン(東レ・ダウコーニング(株)製、商品名「Z−6265」)48gを2−プロピルアルコール112gで溶解したものを1時間かけて滴下し、滴下終了後、還流下で6時間保温し表面被覆処理を行った。この表面被覆シリカゾル分散液480gを、0.1mol/l水酸化カリウム/エチルアルコール溶液で中和することにより、表面被覆シリカゾルの平均粒子径が23nm、反応量0.8mmol/g((b1)に対する(b2)の反応量)で、pHが6.5の中和処理表面被覆シリカゾル分散液を得た。
次に、実施例1に従って、上記中和処理表面被覆シリカゾル分散液の分散媒をエチルメチルケトンに置換した。得られた表面被覆シリカゾルエチルメチルケトン分散液400gに、「リカシッドMH−700」を187g添加し、攪拌しながら80℃で1時間還流させた。反応終了後、減圧(15hPa)下、ロータリーエバポレーターでエチルメチルケトンを留去することで、シリカ粒子の表面をシランカップリング剤で反応させたシリカが分散した酸無水物を284g(収率99%)得た。
Comparative Example 2
A four-necked round bottom flask equipped with a stirrer, stirring blade, condenser, dropping funnel, thermometer and nitrogen line was charged with 300 g of “IPA-ST”, 7.8 g of ion-exchanged water, and 12.2 g of 2-propyl alcohol. The mixture was heated to 80 ° C. with stirring under a nitrogen stream. Subsequently, 48 g of n-propyltrimethoxysilane (trade name “Z-6265”, manufactured by Toray Dow Corning Co., Ltd.) dissolved in 112 g of 2-propyl alcohol was added dropwise over 1 hour. A surface coating treatment was performed by keeping the temperature for 6 hours below. By neutralizing 480 g of this surface-coated silica sol dispersion with a 0.1 mol / l potassium hydroxide / ethyl alcohol solution, the average particle diameter of the surface-coated silica sol is 23 nm and the reaction amount is 0.8 mmol / g ((b1)). In (reaction amount of (b2)), a neutralized surface-coated silica sol dispersion having a pH of 6.5 was obtained.
Next, according to Example 1, the dispersion medium of the neutralized surface-coated silica sol dispersion was replaced with ethyl methyl ketone. 187 g of “Licacid MH-700” was added to 400 g of the obtained surface-coated silica sol ethyl methyl ketone dispersion, and the mixture was refluxed at 80 ° C. for 1 hour with stirring. After completion of the reaction, ethyl methyl ketone was distilled off with a rotary evaporator under reduced pressure (15 hPa), whereby 284 g (99% yield) of an acid anhydride in which silica obtained by reacting the surface of the silica particles with a silane coupling agent was dispersed. )Obtained.
比較例3
攪拌機、攪拌羽根、コンデンサー、滴下漏斗、温度計及び窒素ラインを具備した四つ口丸底フラスコに、シリカ粉末(富士シリシア化学(株)製、平均粒子径3μm)50g、イオン交換水4.1g、及び2−プロピルアルコール195.9gを仕込み、窒素気流下で攪拌しながら、80℃まで昇温した。次いで、「Z−6044」25gを2−プロピルアルコール100gで溶解したものを1時間かけて滴下し、滴下終了後、還流下で6時間保温し表面被覆処理を行った。この表面被覆シリカゾル分散液を、0.1mol/l水酸化カリウム/エチルアルコール溶液(で中和することにより、表面被覆シリカゾルの平均粒子径が385nm、反応量0.7mmol/g((b1)に対する(b2)の反応量)で、pHが6.5の中和処理表面被覆シリカゾル分散液を得た。
次に、実施例1に従って、上記中和処理表面被覆シリカゾル分散液の分散媒をエチルメチルケトンに置換した。得られた表面被覆シリカゾルエチルメチルケトン分散液300gに、「リカシッドMH−700」を140g添加し、攪拌しながら80℃で1時間還流させた。反応終了後、減圧(15hPa)下、ロータリーエバポレーターでエチルメチルケトンを留去することで、シリカ粒子の表面をシランカップリング剤、及び酸無水物で反応させたシリカが分散した酸無水物を198g(収率99%)得た。このとき、反応量は0.6mmol/g((b)に対する(b3)の反応量)であった。
Comparative Example 3
In a four-necked round bottom flask equipped with a stirrer, stirring blade, condenser, dropping funnel, thermometer and nitrogen line, 50 g of silica powder (manufactured by Fuji Silysia Chemical Ltd., average particle size 3 μm), 4.1 g of ion-exchanged water. , And 195.9 g of 2-propyl alcohol, and the temperature was raised to 80 ° C. while stirring under a nitrogen stream. Next, 25 g of “Z-6044” dissolved in 100 g of 2-propyl alcohol was added dropwise over 1 hour, and after completion of the addition, the mixture was kept warm for 6 hours under reflux to perform surface coating treatment. By neutralizing this surface-coated silica sol dispersion with a 0.1 mol / l potassium hydroxide / ethyl alcohol solution (average particle diameter of the surface-coated silica sol is 385 nm, the reaction amount is 0.7 mmol / g ((b1)) In (reaction amount of (b2)), a neutralized surface-coated silica sol dispersion having a pH of 6.5 was obtained.
Next, according to Example 1, the dispersion medium of the neutralized surface-coated silica sol dispersion was replaced with ethyl methyl ketone. 140 g of “Licacid MH-700” was added to 300 g of the obtained surface-coated silica sol ethyl methyl ketone dispersion, and the mixture was refluxed at 80 ° C. for 1 hour with stirring. After completion of the reaction, 198 g of acid anhydride in which silica reacted with the silane coupling agent and acid anhydride was dispersed on the surface of the silica particles by distilling off ethyl methyl ketone with a rotary evaporator under reduced pressure (15 hPa). (Yield 99%). At this time, the reaction amount was 0.6 mmol / g (reaction amount of (b3) with respect to (b)).
上記の通り合成した実施例1〜2、及び比較例1〜4の無機酸化物粒子分散体の測定値を表1に記載する。 Table 1 shows the measured values of the inorganic oxide particle dispersions of Examples 1-2 and Comparative Examples 1-4 synthesized as described above.
表1に示すとおり、実施例における無機酸化物粒子分散体中のSiO2濃度は比較例に比して高いにも関わらず、低粘度で安定である。比較例における分散体の粘度は21,000mPa・sを超え、製造時や成型時の樹脂との混和操作において取扱いが困難となる。
As shown in Table 1, although the SiO 2 concentration in the inorganic oxide particle dispersions in the examples is higher than that in the comparative examples, the viscosity is low and stable. The viscosity of the dispersion in the comparative example exceeds 21,000 mPa · s, and it becomes difficult to handle in the mixing operation with the resin during production or molding.
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