JP5265157B2 - Image forming apparatus and exposure amount adjusting method thereof - Google Patents
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本発明は、電子写真方式の画像形成装置およびその露光量の調整方法に関する。 The present invention relates to an electrophotographic image forming apparatus and an exposure amount adjusting method thereof.
前記電子写真方式の画像形成装置において、感光体膜の絶縁破壊は大きな課題である。このため従来では、感光体膜厚を厚くすることで耐圧効果を得ていたが、膜厚アップは画質劣化を引起こし、耐圧と画質とのトレードオフが生じる。そこで、画質を維持しながら耐圧効果を得るために、感光体膜の材料であるアモルファスシリコン(a−Si)よりも電気的絶縁性の高いSi−C層またはSi−N層を、該感光体膜とアルミなどの基材層との間に介在した感光体が、特許文献1で開発されている。 In the electrophotographic image forming apparatus, dielectric breakdown of the photoreceptor film is a big problem. For this reason, conventionally, the pressure resistance effect has been obtained by increasing the thickness of the photosensitive member. However, increasing the film thickness causes deterioration in image quality, resulting in a trade-off between breakdown voltage and image quality. Therefore, in order to obtain a pressure-resistant effect while maintaining the image quality, a Si—C layer or a Si—N layer having higher electrical insulation than amorphous silicon (a-Si), which is a material of the photoconductor film, is provided on the photoconductor. A photoconductor interposed between a film and a base material layer such as aluminum has been developed in Patent Document 1.
しかしながら、その結果、感光体明電位VLや残留電位が従来よりも高くなってしまうという問題がある。詳しくは、前記感光体明電位VLは、図6で示すように、感光体が帯電手段で帯電された状態での電位を感光体暗電位Voとするとき、充分な露光量で書込みが行われた際の前記感光体膜の電位である。図6は、露光量に対する感光体表面電位の減少量の関係を示すグラフである。 However, as a result, there is a problem that the photoreceptor light potential VL and the residual potential become higher than the conventional one. Specifically, as shown in FIG. 6, the photosensitive member bright potential VL is written with a sufficient exposure amount when the potential of the photosensitive member charged by the charging means is the photosensitive member dark potential Vo. It is the potential of the photoreceptor film at the time of exposure. FIG. 6 is a graph showing the relationship of the amount of decrease in the photoreceptor surface potential with respect to the exposure amount.
前記感光体明電位VLや残留電位は、前記感光体膜の膜質(表面電荷密度に対する光キャリア発生量、キャリア移動速度、光導電層膜厚等、のパラメータを持つ)および電荷注入阻止の程度によって決定される。電荷注入阻止の程度が高ければ、キャリアが前記アルミなどの導電性基材へ注入することを防ぐ機能が高まり、感光体膜の耐圧性が高まるが、一方で前記感光体明電位VLや残留電位に影響が現れることになる。 The photoconductor light potential VL and the residual potential depend on the film quality of the photoconductor film (having parameters such as the amount of photocarrier generation with respect to the surface charge density, carrier moving speed, photoconductive layer thickness, etc.) and the degree of charge injection prevention. It is determined. If the degree of charge injection prevention is high, the function of preventing carriers from being injected into the conductive substrate such as aluminum is enhanced, and the pressure resistance of the photoreceptor film is enhanced. On the other hand, the photoreceptor light potential VL and residual potential are increased. Will have an effect.
前記感光体明電位VLは、前記a−Siの場合で、0〜20V程度である。そして、前記耐圧層によって、図6の例では、前記感光体明電位VLは、感光体Aでは80Vであり、感光体Bでは30Vであり、それらの差は50Vになっている。そして、従来では、前記露光手段から感光体への書き込み露光量は、前記感光体暗電位Voが半減するのに必要な半減露光量を基本光量Ebとして、その基本光量Ebの少なくとも2倍以上の光量で露光を行うことによって、感光体明電位VLを得ている。図6の例では、Vo=350Vであり、半減露光量(=基本光量Eb)はVo/2の175Vとなる露光量0.32μJ/cm2となっている。 The photoreceptor light potential VL is about 0 to 20 V in the case of the a-Si. Due to the breakdown voltage layer, in the example of FIG. 6, the photosensitive member bright potential VL is 80 V for the photosensitive member A, 30 V for the photosensitive member B, and the difference between them is 50 V. Conventionally, the writing exposure amount from the exposure means to the photosensitive member is at least twice the basic light amount Eb, with the half light exposure amount required for the photosensitive member dark potential Vo being halved as the basic light amount Eb. The photosensitive member bright potential VL is obtained by performing exposure with the amount of light. In the example of FIG. 6, Vo = 350V, and the half-exposure amount (= basic light amount Eb) is an exposure amount of 0.32 μJ / cm 2 that becomes 175V of Vo / 2.
一方、特許文献2には、露光量を前記半減露光量の3倍以上10倍以下とすることで、感光体膜(光導電層)の膜削れによる前記感光体明電位VLの上昇を抑え、前記感光体明電位VLの膜厚依存性を小さくして、長期に亘って良好な画像形成を可能にした画像形成装置が提案されている。
しかしながら、耐圧と高画質との両者を得るために、前述のような耐圧層を備えた感光体を用いる場合、従来のように、感光体暗電位Voの半減露光量に基づいて露光量を設定すると、耐圧層を備えることで感光体明電位VLが高くなった感光体においては、露光不足となってしまい、低階調再現性が失われることになってしまう。 However, in order to obtain both the withstand voltage and the high image quality, when using the photoreceptor having the withstand voltage layer as described above, the exposure amount is set based on the half exposure amount of the photoreceptor dark potential Vo as in the past. As a result, the photoconductor having the photoconductor bright potential VL having a high withstand voltage layer is underexposed and the low gradation reproducibility is lost.
詳しくは、評価方法としては、露光量はドット再現性に大きく寄与するので、ドット再現性を評価指標とする。そして、図7で示すように、一定面積内のドット占有面積率を6.25%(1/16)としたパターンを露光して、これを入力面積率として、感光体上で現像して得られたトナー像のドット占有面積率を測定して、これを出力面積率とし、入力面積率に対して出力面積率がどれだけ変化したかを評価する。画像形成の条件としては、感光体膜の材料は前記a−Siで、感光体の径は40mm、線速度は400mm/sec、前記感光体暗電位Voは前記350V、LSUビーム径は60μmとしている。 Specifically, as an evaluation method, since the exposure amount greatly contributes to dot reproducibility, dot reproducibility is used as an evaluation index. Then, as shown in FIG. 7, a pattern having a dot occupation area ratio within a fixed area of 6.25% (1/16) is exposed, and this is used as an input area ratio and developed on the photoconductor. The dot occupation area ratio of the obtained toner image is measured, and this is used as the output area ratio, and how much the output area ratio changes with respect to the input area ratio is evaluated. As the conditions for image formation, the material of the photoreceptor film is the a-Si, the diameter of the photoreceptor is 40 mm, the linear velocity is 400 mm / sec, the photoreceptor dark potential Vo is 350 V, and the LSU beam diameter is 60 μm. .
このような条件で、前記図6で示すように、感光体A,B共に、感光体暗電位Vo=350Vの半減露光量(Vo/2=175Vとなる)の0.32μJ/cm2を基本光量Ebとして、その倍数の同じ露光量で露光した場合、図8で示すように、前記出力面積率は大きく異なる。たとえば、同じ3倍の露光量である0.96μJ/cm2で露光した場合、出力面積率は、感光体明電位VLが高かった感光体Aが3.3%で入力よりも小さくなり、感光体明電位VLが低かった感光体Bでは7.5%で入力よりも大きく出力される。また、正しい前記6.25%のドット占有面積率を再現するのに必要な露光量は、感光体Aでは4倍になるのに対して、感光体Bでは2.7倍程度で済むことになる。したがって、たとえば感光体Bに適した露光量で感光体Aを露光すると、黒ベタ画像がグレー画像になってしまう。このように感光体暗電位Voの半減露光量のみから露光量を決定すると、ドット再現性がばらつくことになる。 Under these conditions, as shown in FIG. 6, the photosensitive bodies A and B both have a basic exposure potential of 0.32 μJ / cm 2, which is a half-exposure amount of the photosensitive body dark potential Vo = 350V (Vo / 2 = 175V). When the exposure is performed with the same amount of exposure as the light quantity Eb, the output area ratio is greatly different as shown in FIG. For example, when exposure is performed at 0.96 μJ / cm 2 , which is the same three times the exposure amount, the output area ratio is 3.3% for the photoconductor A having a high photoconductor light potential VL, and is smaller than the input. Photosensitive body B having a low body potential VL outputs 7.5% more than the input. In addition, the exposure amount necessary to reproduce the correct 6.25% dot occupation area ratio is four times that of the photoconductor A, but about 2.7 times that of the photoconductor B. Become. Therefore, for example, when the photoconductor A is exposed with an exposure amount suitable for the photoconductor B, the black solid image becomes a gray image. As described above, when the exposure amount is determined only from the half-exposure amount of the photoreceptor dark potential Vo, the dot reproducibility varies.
本発明の目的は、感光体明電位のばらつきに対して、低階調域の再現性を高めることができる画像形成装置およびその露光量調整方法を提供することである。 SUMMARY OF THE INVENTION An object of the present invention is to provide an image forming apparatus capable of improving the reproducibility of a low gradation region with respect to variations in the photoreceptor bright potential, and an exposure amount adjusting method thereof.
本発明の画像形成装置およびその露光量調整方法は、露光手段から感光体への書き込み露光量が、感光体暗電位Voからの半減露光量(感光体電位がVo/2となる露光量)を基本光量Ebとして、その基本光量Ebの予め定める倍数に設定される画像形成装置およびその露光量調整方法において、前記感光体の光導電層がアモルファスシリコンから成り、前記感光体の光導電層と導電性基材層との間に、前記アモルファスシリコンよりも電気的絶縁性が高く、感光体明電位VLを上昇させるSi−C層またはSi−N層が介在され、感光体電位が、(Vo−VL)/2+VLとなるときの露光量が前記基本光量Ebに設定されることを特徴とする。 In the image forming apparatus and the exposure amount adjusting method of the present invention, the writing exposure amount from the exposure means to the photosensitive member is reduced by half the exposure amount from the photosensitive member dark potential Vo (the exposure amount at which the photosensitive member potential becomes Vo / 2). In the image forming apparatus and the exposure amount adjusting method in which the basic light amount Eb is set to a predetermined multiple of the basic light amount Eb, the photoconductive layer of the photoconductor is made of amorphous silicon, and the photoconductive layer of the photoconductor is electrically conductive. An Si—C layer or Si—N layer, which is higher in electrical insulation than the amorphous silicon and increases the photoconductor light potential VL, is interposed between the photoconductive substrate layer and the photoconductor potential is (Vo−). (VL) / 2 + VL, the exposure amount is set to the basic light amount Eb.
また、本発明の画像形成装置およびその露光量調整方法は、露光手段から感光体への書き込み露光量が、感光体暗電位Voからの半減露光量を基本光量Ebとして、その基本光量Ebの予め定める倍数に設定される画像形成装置およびその露光量調整方法において、前記感光体の光導電層と導電性基材層との間に、前記光導電層よりも電気的絶縁性が高く、感光体明電位VLを上昇させる絶縁層と電荷注入阻止層との少なくとも一方が介在され、感光体電位が、(Vo−VL)/2+VLとなるときの露光量が前記基本光量Ebに設定されることを特徴とする。In the image forming apparatus and the exposure amount adjusting method according to the present invention, the exposure amount written from the exposure unit to the photosensitive member is set to the basic light amount Eb in advance with the half light exposure amount from the photosensitive member dark potential Vo as the basic light amount Eb. In the image forming apparatus and the exposure amount adjusting method set to a predetermined multiple, between the photoconductive layer and the conductive base material layer of the photoconductor, electrical insulation is higher than the photoconductive layer, and the photoconductor That at least one of the insulating layer for increasing the bright potential VL and the charge injection blocking layer is interposed, and the exposure amount when the photosensitive member potential becomes (Vo−VL) / 2 + VL is set to the basic light amount Eb. Features.
上記の構成によれば、電子写真方式の画像形成装置において、露光手段から感光体への書き込み露光量が、従来では、感光体暗電位Voからの半減露光量(感光体電位がVo/2となる露光量)を基本光量Ebとして、その基本光量Ebの予め定める倍数、たとえば2〜3倍に設定されていたのに対して、本発明では、前記半減露光量となる感光体電位を、感光体明電位をVLとするとき、(Vo−VL)/2+VLから求める。 According to the above configuration, in the electrophotographic image forming apparatus, the writing exposure amount from the exposure unit to the photoconductor is conventionally half the exposure amount from the photoconductor dark potential Vo (the photoconductor potential is Vo / 2). Is set to a predetermined multiple of the basic light amount Eb, for example, 2 to 3 times, whereas in the present invention, the photosensitive member potential to be the half exposure amount is set to be a photosensitive amount. When the body light potential is VL, it is obtained from (Vo−VL) / 2 + VL.
したがって、感光体によってばらつきのある前記感光体明電位VLを考慮して、特に該感光体明電位VLが高い感光体において、低階調域の再現性を高めることができる。 Therefore, in consideration of the photoconductor light potential VL, which varies depending on the photoconductor, the reproducibility of the low gradation region can be improved particularly on the photoconductor having a high photoconductor light potential VL.
また、前記感光体の光導電層が、アモルファスシリコン(a−Si)から成る場合、セレン系感光体や有機感光体等と比較して、表面硬度が高く、耐久性や取扱い性に優れるといった利点を有する。そのアモルファスシリコン(a−Si)よりも電気的絶縁性の高いSi−C層またはSi−N層を、前記感光体の光導電層とアルミなどの導電性基材層との間に介在した場合、感光体の絶縁破壊に対する耐圧を高めつつ、光導電層で発生した光励起キャリアのアルミ基材層への流出が妨げられるので、高画質化を図ることができる。Further, when the photoconductive layer of the photoconductor is made of amorphous silicon (a-Si), the surface hardness is high compared to a selenium photoconductor, an organic photoconductor, etc., and the durability and handling properties are excellent. Have When a Si—C layer or Si—N layer having higher electrical insulation than the amorphous silicon (a-Si) is interposed between the photoconductive layer of the photoconductor and a conductive substrate layer such as aluminum. In addition, it is possible to improve the image quality because it prevents the photoexcited carriers generated in the photoconductive layer from flowing into the aluminum base layer while increasing the breakdown voltage against the dielectric breakdown of the photoconductor.
また、本発明の画像形成装置は、前記感光体明電位VLには標準値Vrefが設定されており、VL−Vrefの差分ΔVだけ、前記感光体暗電位Voおよび現像手段における現像バイアスVBが偏倚されていることを特徴とする。 In the image forming apparatus of the present invention, a standard value Vref is set for the photoconductor light potential VL, and the photoconductor dark potential Vo and the developing bias VB in the developing unit are biased by a difference ΔV of VL−Vref. It is characterized by being.
上記の構成によれば、前記感光体明電位VLには標準値Vrefが設定されており、実際の感光体明電位VLが標準値Vrefからずれが生じると、現像手段における現像バイアスVBとの差が小さくなって、ベタ画像の再現性が悪くなる。そこで、VL−Vrefの差分ΔVだけ、該現像バイアスVBを高くする。一方、前記現像バイアスVBと感光体暗電位Voとの電位差が一定の値より小さくなると、カブリが生じるので、対応して該感光体暗電位Voも高くしておくことで、そのような不具合の発生を防止することができる。 According to the above configuration, the standard value Vref is set for the photosensitive member light potential VL, and when the actual photosensitive member light potential VL deviates from the standard value Vref, the difference from the developing bias VB in the developing unit. Becomes smaller and the reproducibility of a solid image becomes worse. Therefore, the developing bias VB is increased by the difference ΔV of VL−Vref. On the other hand, if the potential difference between the developing bias VB and the photoconductor dark potential Vo becomes smaller than a certain value, fogging occurs. Therefore, if the photoconductor dark potential Vo is correspondingly increased, such a problem can be prevented. Occurrence can be prevented.
さらにまた、本発明の画像形成装置は、前記予め定める倍数が、2.25〜8倍、好ましくは2.8〜3.4倍、より好ましくは3.15倍であることを特徴とする。 Furthermore, the image forming apparatus of the present invention is characterized in that the predetermined multiple is 2.25 to 8 times, preferably 2.8 to 3.4 times, more preferably 3.15 times.
上記の構成によれば、露光量を、前記半減露光量に略対応する基本光量Ebの2倍とすると、経年などで感光体膜の膜厚が薄くなると露光不足となる可能性があり、また前記露光手段の光量ばらつきや感光体膜の感度ばらつきによっても露光不足となる可能性があるのに対して、2.25倍以上で、感光体明電位VLの膜厚依存性を抑えて、そのような露光不足の可能性の少ない露光量を得ることができ、一方、倍率が大きすぎても感光体膜の光疲労を招くので、前記8倍以下、好ましくは4倍以下とすることが必要となる。さらに、2.8〜3.4倍であれば、低階調性のドット再現性を得られ、そして、前記3.15倍が、充分な露光量を得ることができるとともに、光疲労を確実に抑え、最も好ましい。 According to the above configuration, if the exposure amount is twice the basic light amount Eb substantially corresponding to the half-exposure amount, there is a possibility that underexposure will occur when the film thickness of the photosensitive film becomes thin due to aging, etc. While exposure may also be underexposure due to variations in the amount of light of the exposure means and sensitivity of the photoconductor film, the film thickness dependence of the photoconductor light potential VL is suppressed by 2.25 times or more. Such an exposure amount with a low possibility of underexposure can be obtained, and on the other hand, even if the magnification is too large, the photoconductor film will be light-fatigue, so it is necessary to make it 8 times or less, preferably 4 times or less. It becomes. Further, if it is 2.8 to 3.4 times, low gradation dot reproducibility can be obtained, and 3.15 times can obtain a sufficient exposure amount and ensure light fatigue. Most preferably.
本発明の画像形成装置およびその露光量調整方法は、以上のように、電子写真方式の画像形成装置において、露光手段から感光体への書き込み露光量が、従来では、感光体暗電位Voからの半減露光量(感光体電位がVo/2となる露光量)を基本光量Ebとして、その基本光量Ebの予め定める倍数、たとえば2〜3倍に設定されていたのに対して、本発明では、前記半減露光量となる感光体電位を、感光体明電位をVLとするとき、(Vo−VL)/2+VLから求める。 As described above, according to the image forming apparatus and the exposure amount adjusting method of the present invention, in the electrophotographic image forming apparatus, the writing exposure amount from the exposure unit to the photosensitive member is conventionally from the photosensitive member dark potential Vo. The half exposure amount (exposure amount at which the photoreceptor potential is Vo / 2) is set as a basic light amount Eb, and is set to a predetermined multiple of the basic light amount Eb, for example, 2 to 3 times. The photosensitive member potential that is the half-exposure amount is obtained from (Vo−VL) / 2 + VL, where the photosensitive member bright potential is VL.
それゆえ、感光体によってばらつきのある前記感光体明電位VLを考慮して、特に該感光体明電位VLが高い感光体において、低階調域の再現性を高めることができる。 Therefore, in consideration of the photoconductor light potential VL, which varies depending on the photoconductor, the reproducibility of the low gradation region can be improved particularly on the photoconductor having a high photoconductor light potential VL.
図1は、本発明の実施の一形態に係る画像形成装置である複写機31の機械的構成を示す縦断面図である。この複写機31は、大略的に、画像形成を行う本体部32と、前記本体部32の上方側に配設され、原稿読取り装置であるスキャナ部33と、そのスキャナ部33の上方側に配設されるADF34とを備えて構成される。 FIG. 1 is a longitudinal sectional view showing a mechanical configuration of a copying machine 31 which is an image forming apparatus according to an embodiment of the present invention. The copying machine 31 is generally disposed on the upper side of the main body 32 for image formation, the scanner unit 33 serving as a document reading device, and disposed on the upper side of the scanner unit 33. And ADF 34 provided.
前記本体部32では、1または複数(図1では3個)の給紙トレイ41,42,43や手差しトレイ44に装填された記録紙41a,42a,43a,44aの何れかが取込みローラ41b,42b,43b,44bで1枚ずつ取出され、レジストローラ45,46にてタイミング調整が行われた後、画像形成部47に搬送される。前記画像形成部47は、感光体47aの周囲に、帯電器47b、レーザ書込みユニット47c、現像器47d、クリーニングユニット47eおよび転写ユニット47f等が配置され、前記記録紙41a,42a,43a,44aに電子写真方式で画像形成を行う。こうして記録紙41a,42a,43a,44aに形成されたトナー像は、定着部48にて定着され、排出ローラ49,50から排紙トレイ51上に排出される。 In the main body 32, one or a plurality of (three in FIG. 1) paper feed trays 41, 42, 43 or one of the recording papers 41a, 42a, 43a, 44a loaded in the manual feed tray 44 is a take-in roller 41b, 42b, 43b, and 44b are taken out one by one, adjusted in timing by registration rollers 45 and 46, and then conveyed to the image forming unit 47. In the image forming unit 47, a charger 47b, a laser writing unit 47c, a developing unit 47d, a cleaning unit 47e, a transfer unit 47f, and the like are arranged around the photosensitive member 47a, and the recording paper 41a, 42a, 43a, 44a is disposed on the recording paper 41a. Image formation is performed by electrophotography. The toner images thus formed on the recording papers 41 a, 42 a, 43 a, 44 a are fixed by the fixing unit 48 and discharged from the discharge rollers 49, 50 onto the paper discharge tray 51.
前記レーザ書込みユニット47cに与えられる原稿画像データは、スキャナ部33および/またはADF34にて読取られる。スキャナ部33は、原稿載置台52に載置されたブック物や1枚物の原稿に照明光を照射し、その反射光を読取るベッド式の原稿読取り装置である。一方、ADF34は、原稿トレイ53に積層されたシート原稿54を順次取込んで原稿画像を読取る原稿給送式の原稿読取り装置であり、読取られた原稿は排出トレイ55上へと排出される。こうして読取られた原稿画像データは、図示しない画像処理ユニットにて濃度調整や輪郭強調などの画像処理が行われ、前記レーザ書込みユニット47cに与えられる。 Document image data given to the laser writing unit 47 c is read by the scanner unit 33 and / or the ADF 34. The scanner unit 33 is a bed-type document reading device that irradiates illumination light onto a book or a single document placed on the document placement table 52 and reads the reflected light. On the other hand, the ADF 34 is a document feeding type document reading device that sequentially reads the sheet document 54 stacked on the document tray 53 and reads the document image, and the read document is discharged onto the discharge tray 55. The document image data read in this way is subjected to image processing such as density adjustment and contour enhancement in an image processing unit (not shown), and is given to the laser writing unit 47c.
注目すべきは、本実施の形態では、露光手段である前記レーザ書込みユニット47cにおける書込み露光量が、前記感光体暗電位Voだけでなく、感光体明電位VLも含めて決定され、感光体47aの電位が、(Vo−VL)/2+VLとなるときの露光量が基本光量Ebに設定されることである。そして、実際の露光量は、後述するように、その基本光量Ebの2.25〜8倍、好ましくは2.8〜3.4倍、より好ましくは3.15倍に設定される。 It should be noted that in this embodiment, the writing exposure amount in the laser writing unit 47c, which is the exposure means, is determined including not only the photosensitive member dark potential Vo but also the photosensitive member light potential VL, and the photosensitive member 47a. That is, the exposure amount when the potential becomes (Vo−VL) / 2 + VL is set to the basic light amount Eb. The actual exposure amount is set to 2.25 to 8 times, preferably 2.8 to 3.4 times, more preferably 3.15 times the basic light amount Eb, as will be described later.
また注目すべきは、前記感光体明電位VLには標準値Vrefが設定されており、VL−Vrefの差分ΔVだけ、前記感光体暗電位Voおよび現像手段である現像器47dにおける現像バイアスVBが偏倚されていることである。 It should also be noted that the standard value Vref is set for the photoconductor light potential VL, and the photoconductor dark potential Vo and the developing bias VB in the developing device 47d as developing means are set by the difference ΔV of VL−Vref. That is biased.
具体的には、前記図6で示すVL=80Vの感光体Aと、VL=30Vの感光体Bとを用いる場合、感光体Aは、感光体Bに比べて感光体明電位VLが高い分、ベタ画像の再現性が悪くなるので、Vref=30Vとして、その差分ΔV=50Vだけ、前記現像バイアスVBを上昇させる。 Specifically, when the photoreceptor A with VL = 80 V and the photoreceptor B with VL = 30 V shown in FIG. 6 are used, the photoreceptor A has a higher photoconductor light potential VL than the photoreceptor B. Since the reproducibility of the solid image is deteriorated, Vref = 30V, and the development bias VB is increased by the difference ΔV = 50V.
しかしながら、そのように現像バイアスVBを上昇させ、感光体暗電位Voと現像バイアスVBの電位差が小さくなると、カブリが発生するので、感光体Aに対しては、Vo=400Vとする。こうして前記図6と同様に露光量に対する感光体表面電位の減少量の関係を求めると、感光体Aに対しては図2のように、感光体Bに対しては図3のようになる。そして、上式から、感光体Aに対しては240V、感光体Bに対しては190Vとなるときの露光量0.26μJ/cm2および0.29μJ/cm2が、それぞれの基本光量Ebに設定される。 However, when the developing bias VB is increased and the potential difference between the photosensitive member dark potential Vo and the developing bias VB becomes small, fogging occurs. Therefore, for the photosensitive member A, Vo = 400V. Thus, when the relationship between the exposure amount and the amount of decrease in the photoreceptor surface potential is obtained in the same manner as in FIG. 6, the photoreceptor A is as shown in FIG. 2, and the photoreceptor B is as shown in FIG. Then, from the above equation, 240V for photoconductor A, the exposure amount 0.26μJ / cm 2 and 0.29μJ / cm 2 when a 190V for photoconductor B, and each of the basic amount Eb Is set.
これらの値を用いて、前記図7で示すパターンを評価パターンとして、前記図8と同様に露光量を変化させたときの出力面積率の変化を図4で示す。前記基本光量Ebの倍数変化に対して、感光体AとBとの出力面積率の特性が、ほぼ一致していることが理解される。したがって、感光体暗電位Voだけでなく、感光体によってばらつきのある感光体明電位VLを考慮して基本光量Ebを決定することで、特に該感光体明電位VLが高い感光体Aにおいて、低階調域の再現性を高めることができる(ドット再現性がばらつくことがない)。 FIG. 4 shows the change in the output area ratio when the exposure amount is changed in the same manner as in FIG. 8 using these values as the evaluation pattern for the pattern shown in FIG. It is understood that the characteristics of the output area ratios of the photoconductors A and B substantially match with the multiple change of the basic light amount Eb. Therefore, the basic light amount Eb is determined in consideration of not only the photoconductor dark potential Vo but also the photoconductor light potential VL which varies depending on the photoconductor, so that the photoconductor A having a high photoconductor light potential VL is low. The reproducibility of the gradation range can be improved (dot reproducibility does not vary).
また、前記図4から、露光量を、前記半減露光量に略対応する基本光量Ebの2倍とすると、経年などで感光体膜の膜厚が薄くなると露光不足となる可能性があり、また前記レーザ書込みユニット47cの光量ばらつきや感光体膜の感度ばらつきによっても露光不足となる可能性があるのに対して、2.25倍以上にすることで、感光体明電位VLの膜厚依存性を抑えて、そのような露光不足の可能性のない露光量を得ることができ、一方、倍率が大きすぎても感光体膜の光疲労を招くので、8倍以下、好ましくは4倍以下とすることがよい。特に好ましくは、2.8〜3.4倍であれば、低階調性のドット再現性を得られ、その中でも、前記図4から、3.15倍、すなわち感光体A,Bへの明点での露光量を0.82μJ/cm2および0.91μJ/cm2とすることで、感光体A,Bの光疲労を確実に抑え、ドット占有面積率が入力面積率に対して±1%以内となって、良好なドット再現性を得ることができる。 From FIG. 4, if the exposure amount is twice the basic light amount Eb substantially corresponding to the half exposure amount, there is a possibility that underexposure will occur when the film thickness of the photosensitive film becomes thin due to aging, etc. Although there is a possibility of underexposure due to variations in the amount of light of the laser writing unit 47c and variations in the sensitivity of the photoreceptor film, the film thickness dependence of the photoreceptor light potential VL can be increased by 2.25 times or more. The amount of exposure with no possibility of underexposure can be suppressed, and on the other hand, even if the magnification is too high, the photoconductor film is light fatigued, so that it is 8 times or less, preferably 4 times or less. It is good to do. Particularly preferably, the dot reproducibility of low gradation can be obtained when the magnification is 2.8 to 3.4 times. Among them, from FIG. 4 to 3.15 times, that is, the brightness to the photoconductors A and B. By setting the exposure amount at the point to 0.82 μJ / cm 2 and 0.91 μJ / cm 2 , the light fatigue of the photoconductors A and B is surely suppressed, and the dot occupation area ratio is ± 1 with respect to the input area ratio. %, It is possible to obtain good dot reproducibility.
ここで、図9に、感光体A,Bの断面構造を示す。これらの感光体A,Bは、アモルファスシリコン感光体であり、感光層の基本構成は、アルミなどから成る導電性基体1上に、SiN:H等から成る絶縁層2、Si(P):H等から成る電荷注入阻止層3、その上にSi:H等から成るキャリア励起・輸送層(光導電層)4、SiC:H等から成る表面保護層5が順次積層されて構成される。このようにキャリア励起・輸送層(光導電層)4と導電性基体1との間に、アモルファスシリコン(a−Si)よりも電気的絶縁性の高い絶縁層2と電荷注入阻止層3とを積層することで、感光体A,Bの絶縁破壊に対する耐圧を高めつつ、キャリア励起・輸送層(光導電層)4で発生した光励起キャリアの導電性基体1への流出が妨げられるので、高画質化を図ることができる。 FIG. 9 shows a cross-sectional structure of the photoconductors A and B. These photoconductors A and B are amorphous silicon photoconductors, and the basic structure of the photoconductive layer is an insulating layer 2 made of SiN: H or the like on a conductive substrate 1 made of aluminum or the like, Si (P): H. A charge injection blocking layer 3 made of, for example, a carrier excitation / transport layer (photoconductive layer) 4 made of Si: H or the like, and a surface protective layer 5 made of SiC: H or the like are sequentially laminated thereon. Thus, between the carrier excitation / transport layer (photoconductive layer) 4 and the conductive substrate 1, the insulating layer 2 and the charge injection blocking layer 3 having higher electrical insulation than amorphous silicon (a-Si) are provided. By laminating, the breakdown voltage of the photoconductors A and B against breakdown is increased, and the outflow of photoexcited carriers generated in the carrier excitation / transport layer (photoconductive layer) 4 to the conductive substrate 1 is hindered. Can be achieved.
また、アモルファスシリコン感光体は、セレン系感光体や有機感光体等と比較して、表面硬度が高く、耐久性や取扱い性に優れるといった利点を有する。詳しくは、アモルファスシリコン感光体であれば、表面硬度が高いことから、繰返し画像形成を行なった場合であっても、感光層の摩耗劣化が生じにくいばかりか、感光層表面に傷や圧接痕が生じにくく、画像形成装置への組付け等をする際の取扱い性にも優れているためである。 In addition, the amorphous silicon photoconductor has advantages such as higher surface hardness and superior durability and handleability compared to a selenium photoconductor and an organic photoconductor. In detail, since the surface hardness of an amorphous silicon photoconductor is high, it is difficult to cause wear deterioration of the photosensitive layer even when repeated image formation is performed, and scratches or pressure marks are not formed on the surface of the photosensitive layer. This is because they are less likely to occur and are easy to handle when assembled to an image forming apparatus.
さらにまた、注目すべきは、この複写機31では、感光体47aにはICメモリ47gが実装されており、そのICメモリ47gに、感光体個々で異なる前記基本光量Ebや、帯電能力などの情報が記憶されており、それを読取った制御手段が前記レーザ書込みユニット47cにおける書込み露光量を変化させることである。 Furthermore, it should be noted that in this copying machine 31, an IC memory 47g is mounted on the photoconductor 47a, and information such as the basic light amount Eb and the charging ability that are different for each photoconductor is stored in the IC memory 47g. Is stored, and the control means that reads it changes the writing exposure amount in the laser writing unit 47c.
図5は、本実施の形態の複写機31における前記制御手段の機能的構成を示すブロック図である。感光体47aの交換時、または電源投入時などで、読取り部21が前記ICメモリ47gから前記基本光量Ebの情報を読取る。その基本光量Ebの情報は、乗算器22において、倍数記憶部23に記憶されている倍数、前記3.15が乗算されて、実際の露光量データが求められ、露光量セット部24に記憶される。前記レーザ書込みユニット47cは、露光量セット部24によって制御され、半導体レーザの発光輝度、すなわち電流が制御されて、所望とする露光量で前記感光体47aへ原稿画像に対応した光照射を行う。 FIG. 5 is a block diagram showing a functional configuration of the control means in the copying machine 31 of the present embodiment. When the photoconductor 47a is replaced or when the power is turned on, the reading unit 21 reads information on the basic light amount Eb from the IC memory 47g. The information on the basic light amount Eb is multiplied by the multiple stored in the multiple storage unit 23, 3.15, in the multiplier 22, and the actual exposure amount data is obtained and stored in the exposure amount setting unit 24. The The laser writing unit 47c is controlled by the exposure amount setting unit 24, and the light emission luminance, that is, current, of the semiconductor laser is controlled to irradiate the photoconductor 47a with light corresponding to the original image with a desired exposure amount.
また、前記ICメモリ47gには、前記感光体明電位VLも記憶されており、前記制御手段において、前記読取り部21で読取られたその感光体明電位VLの情報は、減算器25において、Vref記憶部26に記憶されている標準値Vrefが減算されて前記差分ΔVが求められ、さらに加算器27において、VB記憶部28に記憶されているバイアス電圧VBに加算されて実際のバイアス電圧が求められ、現像バイアスセット部29に記憶される。前記現像器47dは、前記現像バイアスセット部29によってセットされたバイアス電圧VBで感光体47aの静電潜像の現像を行う。 The IC memory 47g also stores the photosensitive member bright potential VL. Information on the photosensitive member bright potential VL read by the reading unit 21 in the control means is stored in the subtractor 25 by Vref. The difference ΔV is obtained by subtracting the standard value Vref stored in the storage unit 26 and further added to the bias voltage VB stored in the VB storage unit 28 in the adder 27 to obtain the actual bias voltage. And stored in the development bias setting unit 29. The developing unit 47d develops the electrostatic latent image on the photoreceptor 47a with the bias voltage VB set by the developing bias setting unit 29.
このように構成することで、寿命や不具合等で感光体47aのユニット交換を行った場合にも、制御手段はICメモリ47gから必要な情報を読取って、適正な制御を行うことができる。すなわち感光体A(Eb=0.26)と感光体B(Eb=0.29)との間でユニット交換が行われた場合でも、適性な露光量が設定され、同じドットを再現することができる。なお、ICメモリ47gには前記感光体明電位VLの情報だけが格納されており、前記基本光量Ebの演算が制御手段で行われてもよい。 With this configuration, even when the unit of the photoconductor 47a is replaced due to a life or trouble, the control unit can read out necessary information from the IC memory 47g and perform appropriate control. That is, even when the unit is exchanged between the photosensitive member A (Eb = 0.26) and the photosensitive member B (Eb = 0.29), an appropriate exposure amount is set and the same dot can be reproduced. it can. Note that the IC memory 47g may store only the information on the photoreceptor light potential VL, and the basic light quantity Eb may be calculated by the control means.
21 読取り部
22 乗算器
23 倍数記憶部
24 露光量セット部
25 減算器
26 Vref記憶部
27 加算器
28 VB記憶部
29 現像バイアスセット部
31 複写機
32 本体部
33 スキャナ部
34 ADF
47 画像形成部
47a 感光体
47b 帯電器
47c レーザ書込みユニット
47d 現像器
47e クリーニングユニット
47f 転写ユニット
47g ICメモリ
DESCRIPTION OF SYMBOLS 21 Reading part 22 Multiplier 23 Multiple number memory | storage part 24 Exposure amount setting part 25 Subtractor 26 Vref memory | storage part 27 Adder 28 VB memory | storage part 29 Development bias setting part 31 Copier 32 Main body part 33 Scanner part 34 ADF
47 Image forming unit 47a Photoconductor 47b Charger 47c Laser writing unit 47d Developer 47e Cleaning unit 47f Transfer unit 47g IC memory
Claims (6)
前記感光体の光導電層がアモルファスシリコンから成り、前記感光体の光導電層と導電性基材層との間に、前記アモルファスシリコンよりも電気的絶縁性が高く、感光体明電位VLを上昇させるSi−C層またはSi−N層が介在され、
感光体電位が、
(Vo−VL)/2+VL
となるときの露光量が前記基本光量Ebに設定されることを特徴とする画像形成装置。 In the image forming apparatus in which the exposure amount written from the exposure unit to the photosensitive member is set to a predetermined multiple of the basic light amount Eb, with the half light exposure amount from the photosensitive member dark potential Vo as the basic light amount Eb.
The photoconductive layer of the photoconductor is made of amorphous silicon. Between the photoconductive layer of the photoconductor and the conductive base material layer, the photoconductive layer is higher in electrical insulation than the amorphous silicon and raises the photoconductor light potential VL. An Si-C layer or Si-N layer to be interposed,
The photoreceptor potential is
(Vo-VL) / 2 + VL
The image forming apparatus is characterized in that the exposure amount at the time is set to the basic light amount Eb.
前記感光体の光導電層と導電性基材層との間に、前記光導電層よりも電気的絶縁性が高く、感光体明電位VLを上昇させる絶縁層と電荷注入阻止層との少なくとも一方が介在され、At least one of an insulating layer and a charge injection blocking layer between the photoconductive layer of the photoconductor and the conductive base material layer, which is higher in electrical insulation than the photoconductive layer and raises the photoconductor light potential VL. Intervened,
感光体電位が、The photoreceptor potential is
(Vo−VL)/2+VL(Vo-VL) / 2 + VL
となるときの露光量が前記基本光量Ebに設定されることを特徴とする画像形成装置。The image forming apparatus is characterized in that the exposure amount at the time is set to the basic light amount Eb.
前記感光体の光導電層がアモルファスシリコンから成り、前記感光体の光導電層と導電性基材層との間に、前記アモルファスシリコンよりも電気的絶縁性が高く、感光体明電位VLを上昇させるSi−C層またはSi−N層が介在され、
感光体電位が、
(Vo−VL)/2+VL
となるときの露光量を前記基本光量Ebに設定することを特徴とする画像形成装置の露光量調整方法。 In the exposure amount adjustment method of the image forming apparatus, the exposure amount written from the exposure unit to the photosensitive member is set to a predetermined multiple of the basic light amount Eb, with the half light exposure amount from the photosensitive member dark potential Vo as the basic light amount Eb.
The photoconductive layer of the photoconductor is made of amorphous silicon. Between the photoconductive layer of the photoconductor and the conductive base material layer, the photoconductive layer is higher in electrical insulation than the amorphous silicon and raises the photoconductor light potential VL. An Si-C layer or Si-N layer to be interposed,
The photoreceptor potential is
(Vo-VL) / 2 + VL
The exposure amount adjustment method for the image forming apparatus is characterized in that the exposure amount at the time is set to the basic light amount Eb.
前記感光体の光導電層と導電性基材層との間に、前記光導電層よりも電気的絶縁性が高く、感光体明電位VLを上昇させる絶縁層と電荷注入阻止層との少なくとも一方が介在され、At least one of an insulating layer and a charge injection blocking layer between the photoconductive layer of the photoconductor and the conductive base material layer, which is higher in electrical insulation than the photoconductive layer and raises the photoconductor light potential VL. Intervened,
感光体電位が、The photoreceptor potential is
(Vo−VL)/2+VL(Vo-VL) / 2 + VL
となるときの露光量を前記基本光量Ebに設定することを特徴とする画像形成装置の露光量調整方法。The exposure amount adjustment method for the image forming apparatus is characterized in that the exposure amount at the time is set to the basic light amount Eb.
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