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JP5282801B2 - Single crystal manufacturing apparatus and manufacturing method - Google Patents
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JP5282801B2 - Single crystal manufacturing apparatus and manufacturing method - Google Patents

Single crystal manufacturing apparatus and manufacturing method Download PDF

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JP5282801B2
JP5282801B2 JP2011144239A JP2011144239A JP5282801B2 JP 5282801 B2 JP5282801 B2 JP 5282801B2 JP 2011144239 A JP2011144239 A JP 2011144239A JP 2011144239 A JP2011144239 A JP 2011144239A JP 5282801 B2 JP5282801 B2 JP 5282801B2
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raw material
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crucible
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single crystal
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晃 小野寺
一重 遠藤
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TDK Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus and a method for producing a single crystal, by means of which a single crystal with uniform composition distribution is stably obtained even when a highly volatile material such as MoO<SB POS="POST">3</SB>is used. <P>SOLUTION: The method for producing a single crystal includes a step in which: a raw material 7 of a raw material melt 8 is filled in the inside of a crucible 11, and at the same time, an opening 11b of the crucible 11 is closed by a lid 17 having a protrusion of which the tip can be immersed in the raw material melt 8; the raw material melt 8 is obtained by heating and melting the raw material 7 and at the same time, the liquid level of the raw material melt 8 in the crucible 11 is detected; the lid 17 is heated, and at the same time the distance between the lid 17 and the liquid level is set to be a predetermined value by a lid moving means 21; and a seed is brought into contact with the raw material melt 8 leaked out from a through-hole 11a and the seed is pulled down along a predetermined pull down axis, wherein the distance is kept at the predetermined value in the pulling down step. <P>COPYRIGHT: (C)2013,JPO&amp;INPIT

Description

本発明は、坩堝底部に設けられた孔より原材料融液を引き出しつつ所望の結晶材料を得る引下げ法により単結晶を製造する単結晶製造装置、及び単結晶製造方法に関する。より詳細には、IGBT(Insulated Gate Bipolar Transistor)インバータ、FET、高速スイッチング素子、等の所謂次世代半導体パワーデバイスに用いられる酸化物単結晶に例示されるファイバー状単結晶を得るために好適な単結晶製造装置、及び単結晶製造方法に関する。   The present invention relates to a single crystal manufacturing apparatus and a single crystal manufacturing method for manufacturing a single crystal by a pulling method for obtaining a desired crystal material while drawing a raw material melt from a hole provided in a crucible bottom. More specifically, a single crystal suitable for obtaining a fiber-like single crystal exemplified by an oxide single crystal used in so-called next-generation semiconductor power devices such as an IGBT (Insulated Gate Bipolar Transistor) inverter, FET, and high-speed switching element. The present invention relates to a crystal manufacturing apparatus and a single crystal manufacturing method.

加熱溶融された原材料を保持する坩堝の底部に引き出し孔を形成し、当該孔から漏出する原材料融液に対して結晶核(以降シードと称する。)を接触させ、孔からの原材料の漏出に伴って該シードを引下げることにより、該シードを核として成長する単結晶を得る、所謂引下げ法が知られている。当該方法により得られる単結晶は、従来から知られるCZ法に代表される所謂引き上げ法等により得られる単結晶の結晶径と比較して得られる結晶の径はより小さくなる。しかし、結晶成長に要する時間が短く、且つCZ法と比較して安価に結晶性に優れた単結晶が得られる方法であるとして、現在実際の製造装置としてのハード面での改変、及び各種単結晶への適用の検討が為されている。例えば特許文献1には、坩堝に適宜原材料を供給することを可能とすることによって、内容量の小さな坩堝を用いた単結晶製造装置であっても、連続的により長い単結晶を得る構成が開示されている。   A lead hole is formed in the bottom of the crucible holding the heated and melted raw material, and a crystal nucleus (hereinafter referred to as a seed) is brought into contact with the raw material melt that leaks from the hole, with the leakage of the raw material from the hole. A so-called pulling-down method is known in which a single crystal that grows using the seed as a nucleus is obtained by pulling down the seed. A single crystal obtained by this method has a smaller crystal diameter than that of a single crystal obtained by a so-called pulling method represented by a conventionally known CZ method. However, as a method for obtaining a single crystal having a short time required for crystal growth and excellent in crystallinity at a low cost as compared with the CZ method, it is necessary to modify the actual manufacturing equipment in terms of hardware and various single units. Application to crystals has been studied. For example, Patent Document 1 discloses a configuration for continuously obtaining longer single crystals even in a single crystal manufacturing apparatus using a crucible with a small internal capacity by enabling raw materials to be appropriately supplied to the crucible. Has been.

ここで、例えばSiを用いた従来のIGBT等は、その耐熱温度が175℃前後であることから、例えば車載製品これを用いようとした場合には要求される耐熱温度が200℃に至ることもあるために態様できないという問題がある。このため、高温対応可能なSiC、AlN、或いは安価なMoO3といった高温対応可能な材料を用いた次世代半導体の開発が活発に行われている。この様な次世代半導体の開発においては、高品質なMoO3の所謂バルク単結晶を得ることが重要な要素となる。 Here, for example, conventional IGBTs using Si have a heat-resistant temperature of around 175 ° C., for example, when a vehicle-mounted product is intended to be used, the required heat-resistant temperature can reach 200 ° C. Therefore, there is a problem that it cannot be implemented. For this reason, development of next-generation semiconductors using materials capable of supporting high temperatures such as SiC, AlN, or inexpensive MoO 3 capable of supporting high temperatures has been actively conducted. In the development of such next-generation semiconductors, obtaining a so-called bulk single crystal of high-quality MoO 3 is an important factor.

特開2008−150223号公報JP 2008-150223 A

例えば高温向け用途で期待される材料としてMoO3があるが、現状では気相成長法でしか得ることができず高品質なバルク結晶が得られていない。これは、MoO3の持つ沸点が低いという特性にも起因している。即ち、当該組成からなる融液を坩堝内に保持して該融液から結晶材料を得ようとした場合、融液の一部が揮発して融液の濃度分布に不均一が生じ、安定的な結晶成長が困難なことによる。従って、当該組成を有する単結晶材料を引下げ法によって得ようとしても、坩堝内部の原材料融液の揮発-蒸発によって結晶成長に供せられる材料の組成、温度分布等の諸特性が安定せず、事実上安定的な結晶引下げの操作は困難であった。また、仮にバルク結晶材料が得られたとしても、その品質は安定しておらず、その結果高品質化を図ることも困難であって。 For example, there is MoO 3 as a material expected for high-temperature applications, but at present, high-quality bulk crystals cannot be obtained because it can only be obtained by vapor phase growth. This is also attributed to the low boiling point of MoO3. That is, when an attempt is made to obtain a crystalline material from the melt by holding the melt composed of the composition in the crucible, a part of the melt volatilizes, resulting in non-uniformity in the melt concentration distribution, which is stable. This is because the crystal growth is difficult. Therefore, even if an attempt is made to obtain a single crystal material having the above composition by the pulling-down method, the characteristics of the material used for crystal growth by the volatilization-evaporation of the raw material melt inside the crucible, temperature distribution and other characteristics are not stable, In practice, stable crystal pulling operation was difficult. Even if a bulk crystal material is obtained, its quality is not stable, and as a result, it is difficult to improve the quality.

本発明は以上の状況に鑑みて為されたものであって、上述したような揮発性の高い材料を用いた場合であっても、均一な組成の分布を有する単結晶を安定的に得ることを可能とする単結晶の製造装置及びその製造方法の提供を目的とする。   The present invention has been made in view of the above situation, and can stably obtain a single crystal having a uniform composition distribution even when a highly volatile material as described above is used. An object of the present invention is to provide a single crystal manufacturing apparatus and a manufacturing method thereof.

上記課題を解決するために、本発明に係る単結晶の製造装置は、底部が閉塞された閉塞部となる筒形状を有し、閉塞部を筒形状の内部から外部に貫通する貫通孔を有する坩堝、の内部に保持された原材料融液を貫通孔から漏出させ、漏出した原材料融液に、原材料融液が結晶化する際の結晶方位を定めるシードを接触させ、シードを所定の引下げ軸に沿って引き下げることによってシードを基点として成長する単結晶を得る単結晶製造装置であって、坩堝の開口を塞ぎ、原材料融液に先端部が浸漬可能な突起を有する蓋と、原材料融液の坩堝内における液面の位置を検出する液面検出部と、蓋を液面に対して相対的に移動させる蓋移動手段と、蓋を加熱する加熱手段と、を有し、蓋移動手段は突起の先端が原材料融液に浸漬した状態を維持するように相対的な移動を行うことを特徴としている。   In order to solve the above problems, a single crystal manufacturing apparatus according to the present invention has a cylindrical shape that becomes a closed portion with a closed bottom, and has a through hole that penetrates the closed portion from the inside of the cylindrical shape to the outside. The raw material melt held in the crucible is leaked from the through hole, and the seed that determines the crystal orientation when the raw material melt is crystallized is brought into contact with the leaked raw material melt, and the seed is used as a predetermined pulling shaft. A single crystal manufacturing apparatus for obtaining a single crystal that grows with a seed as a starting point by pulling down along the lid, closing the opening of the crucible and having a protrusion having a tip that can be immersed in the raw material melt, and a crucible for the raw material melt A liquid level detector for detecting the position of the liquid level in the inside, a lid moving means for moving the lid relative to the liquid level, and a heating means for heating the lid. Keep the tip immersed in the raw material melt It is characterized by performing the relative movement to.

なお、前述した単結晶製造装置にあっては、原材料融液と蓋の表面との濡れ性を示す接触角θoと、原材料融液と坩堝の内周面との濡れ性を示す接触角θiとは、θi≧θoを満たすことが好ましい。或いは、突起の先端が原材料融液に浸漬する際の先端の表面と原材料融液の液面とのなす角θcontと、原材料融液と突起の表面との濡れ性を示す接触角θoとが、θcont<θoを満たすことが好ましい。また、上記単結晶製造装置は、蓋と坩堝の内周面との間に配置されて隙間を塞ぐ液体封止材を更に有することがより好ましい。また、加熱手段は、原材料融液を保持する坩堝の温度よりも蓋の温度を高く維持することがより好ましい。 In the single crystal manufacturing apparatus described above, the contact angle θo indicating wettability between the raw material melt and the surface of the lid, and the contact angle θi indicating wettability between the raw material melt and the inner peripheral surface of the crucible Preferably satisfies θi ≧ θo. Alternatively, there is an angle θcont formed between the surface of the tip when the tip of the protrusion is immersed in the raw material melt and the liquid surface of the raw material melt, and a contact angle θo 1 indicating wettability between the raw material melt and the surface of the protrusion. , Θcont <θo 1 is preferably satisfied. Moreover, it is more preferable that the single crystal manufacturing apparatus further includes a liquid sealing material disposed between the lid and the inner peripheral surface of the crucible to close the gap. Moreover, it is more preferable that the heating means maintain the temperature of the lid higher than the temperature of the crucible holding the raw material melt.

また、上記課題を解決するために、本発明に係る単結晶製造方法は、底部が閉塞された閉塞部となる筒形状を有し、閉塞部を筒形状の内部から外部に貫通する貫通孔を有する坩堝、の内部に保持された原材料融液を貫通孔から漏出させ、漏出した原材料融液に、原材料融液が結晶化する際の結晶方位を定めるシードを接触させ、シードを所定の引下げ軸に沿って引き下げることによってシードを基点として成長する単結晶を得る単結晶製造方法であって、坩堝の内部に原材料融液の原材料を充填すると共に、原材料融液に先端部が浸漬可能な突起を有する蓋により坩堝の開口を閉鎖し、原材料を加熱溶融して原材料融液得ると共に原材料融液の坩堝内における液面の位置を検出し、蓋を加熱すると共に、蓋移動手段によって蓋と液面との間隔を所定値とし、貫通孔から漏出した原材料融液にシードを接触させてシードを所定の引下げ軸に沿って引下げる工程を有し、間隔は引下げる工程において所定値を維持されることを特徴としている。   In order to solve the above problems, the method for producing a single crystal according to the present invention has a cylindrical shape that becomes a closed portion with a closed bottom, and has a through hole that penetrates the closed portion from the inside of the cylindrical shape to the outside. The raw material melt held inside the crucible is leaked from the through-hole, the seed that determines the crystal orientation when the raw material melt is crystallized is brought into contact with the leaked raw material melt, and the seed is pulled down to a predetermined pulling axis. A single crystal manufacturing method for obtaining a single crystal that grows with a seed as a base point by pulling down along the surface of the crucible, wherein the crucible is filled with the raw material of the raw material melt, and a protrusion whose tip can be immersed in the raw material melt The lid of the crucible is closed, the raw material is heated and melted to obtain the raw material melt, the position of the liquid level in the crucible of the raw material melt is detected, the lid is heated, and the lid moving means Interval It has a step of bringing the seed into contact with the raw material melt leaked from the through hole and lowering the seed along a predetermined pulling axis, and the interval is maintained at the predetermined value in the step of lowering Yes.

なお、前述した単結晶製造方法においては、所定値は引下げる工程に応じて変更されることが好ましい。或いは、蓋は、引下げる工程に応じて温度の変更が為されることがより好ましい。   In the single crystal manufacturing method described above, the predetermined value is preferably changed according to the step of reducing. Alternatively, it is more preferable that the temperature of the lid is changed according to the step of pulling down.

本発明によれば、例えばMoO3等の揮発性が高い、或いは低融点及び沸点を有した材料を用いた場合であっても、均一な組成分布を有した単結晶を安定的に得ることが可能となる。 According to the present invention, it is possible to stably obtain a single crystal having a uniform composition distribution even when a highly volatile material such as MoO 3 or a material having a low melting point and a boiling point is used. It becomes possible.

本発明の一実施形態に係る単結晶引下げ装置の主要構成を側方から見た状態の概略構成についてこれらの部分断面を含めて示す図である。It is a figure which shows these schematic structures including the partial cross section about the main structure of the single crystal pulling-down apparatus which concerns on one Embodiment of this invention seen from the side. 本発明の更なる実施形態について図1と同様の様式にてこれを示す図である。FIG. 2 shows a further embodiment of the invention in a manner similar to FIG. 図2における領域Aを拡大して更なる実施形態を示す図である。It is a figure which expands the area | region A in FIG. 2, and shows further embodiment. 図2における領域Aを拡大して図3Aとは異なる形態を示す図である。It is a figure which expands the area | region A in FIG. 2, and shows a different form from FIG. 3A. 図1に示す構成を含む単結晶製造装置の概略構成を示す図である。It is a figure which shows schematic structure of the single crystal manufacturing apparatus containing the structure shown in FIG.

以下に図面を参照して本発明の一実施形態について説明する。図1は、本発明の一実施形態に係る単結晶製造装置である引下げ装置の主たる構成要素に関して、これらを側方から見た場合の概略を示す図である。当該実施形態に係る引下げ装置1は、坩堝11、アフターヒータ13、加熱コイル15、加熱蓋17、蓋昇降部21、及び液面検出部23、を有する。坩堝11は、底面(下端部)が閉塞された円筒形状を有しており、カーボン或いは高融点金属(例えば、Re、Ir、W、Ta、Mo、Pt、或いはこれらの合金)から構成される。坩堝11の底面中央には、該坩堝の中心軸に沿って、円筒の閉塞部である当該底面を坩堝11の内側から外側に貫通する貫通孔11aが設けられる。加熱コイル15は坩堝11と同軸の螺旋状構造を有する。該加熱コイル15は坩堝11等に向けて高周波を発し、所謂高周波誘導現象を利用して坩堝11或いは坩堝11の内部に保持される原材料7或いは原材料融液8の加熱(発熱)、及び原材料の溶融を行っている。   An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a diagram showing an outline of the main components of a pulling apparatus, which is a single crystal manufacturing apparatus according to an embodiment of the present invention, as viewed from the side. The pulling device 1 according to this embodiment includes a crucible 11, an after heater 13, a heating coil 15, a heating lid 17, a lid lifting / lowering unit 21, and a liquid level detection unit 23. The crucible 11 has a cylindrical shape with a closed bottom surface (lower end) and is made of carbon or a high melting point metal (for example, Re, Ir, W, Ta, Mo, Pt, or an alloy thereof). . At the center of the bottom surface of the crucible 11, a through hole 11 a is provided along the central axis of the crucible so as to penetrate the bottom surface, which is a closed portion of the cylinder, from the inside of the crucible 11 to the outside. The heating coil 15 has a spiral structure coaxial with the crucible 11. The heating coil 15 emits a high frequency toward the crucible 11 or the like, and utilizes the so-called high frequency induction phenomenon to heat (heat generation) the raw material 7 or the raw material melt 8 held inside the crucible 11 or the crucible 11, and the raw material Melting is taking place.

坩堝貫通孔11aの開口形成面に端面が対向するように、シード5(図4参照)が配置される。シード5とは、原材料融液8と接触した状態にて該原材料融液8の結晶化が進展した場合、当該結晶の生成核となって結晶方位を定める働きを有する。即ち、該シード5は、単結晶成長の際の成長基点となる。当該シード5は、当該坩堝11の中心軸に沿って延在し且つ該中心軸に沿った上下動が可能なシード保持具(不図示)によって支持され、当該貫通孔の鉛直下方に配置される。シード保持具は引下げ機構31により昇降する。坩堝11から漏出した原材料融液8は、当該シード5における原材料融液8との接触面(上部に設けられる平坦面)と接触して結晶化を始め、該シード5を前述した中心軸に沿って引下げることによって結晶の成長、育成を促す。本形態では、原材料融液8は坩堝11の材料に対して接触角が小さく所謂濡れ性が良いことから、坩堝貫通孔11aから坩堝11の下部に漏出した際に貫通孔の開口孔形成端面に濡れ広がり、該開口孔形成端面と同じ大きさ断面積を有した固液境界(育成部8a)を形成している。該育成部8aの下方に連続して単結晶9が育成される。   The seed 5 (see FIG. 4) is arranged so that the end surface faces the opening forming surface of the crucible through hole 11a. When the crystallization of the raw material melt 8 progresses in contact with the raw material melt 8, the seed 5 serves to form crystal nuclei and determine the crystal orientation. That is, the seed 5 serves as a growth base point during single crystal growth. The seed 5 is supported by a seed holder (not shown) that extends along the central axis of the crucible 11 and can move up and down along the central axis, and is arranged vertically below the through hole. . The seed holder is moved up and down by the pulling mechanism 31. The raw material melt 8 leaked from the crucible 11 comes into contact with a contact surface (a flat surface provided at the upper part) with the raw material melt 8 in the seed 5 to start crystallization, and the seed 5 is aligned along the above-described central axis. By pulling it down, it promotes crystal growth and growth. In this embodiment, the raw material melt 8 has a small contact angle with respect to the material of the crucible 11 and good so-called wettability. Therefore, when the raw material melt 8 leaks from the crucible through-hole 11a to the lower part of the crucible 11, A solid-liquid boundary (growing part 8a) having the same cross-sectional area as the opening hole forming end face is formed. A single crystal 9 is grown continuously below the growing portion 8a.

坩堝11の下方には、坩堝11の下端外周近傍と当接して該坩堝11を支持する、円筒形状のアフターヒータ13が配置される。アフターヒータ13は、坩堝と同様の材料より構成されており、坩堝11と同軸となるように配置されている。原材料加熱時において、該アフターヒータ13も高周波誘導によって発熱し、坩堝11の下端より漏洩する原材料融液を加熱可能としている。また、アフターヒータ13の長さは、加熱コイル15の長手方向において中央部に配置される坩堝11と該アフターヒータ13とを当接させて配置した際に、該加熱コイル15における有効加熱領域に該アフターヒータ13が収容されるように設定されている。該アフターヒータ13の設置により引下げ方向における均熱領域が拡大可能となり、結晶育成の条件をより広範なものとすることが可能となる。   Below the crucible 11, a cylindrical after-heater 13 that contacts the vicinity of the outer periphery of the lower end of the crucible 11 and supports the crucible 11 is disposed. The after heater 13 is made of the same material as that of the crucible and is arranged so as to be coaxial with the crucible 11. When the raw material is heated, the after-heater 13 also generates heat by high-frequency induction, and the raw material melt that leaks from the lower end of the crucible 11 can be heated. Further, the length of the after heater 13 is such that when the crucible 11 arranged at the center in the longitudinal direction of the heating coil 15 and the after heater 13 are arranged in contact with each other, the effective heating area in the heating coil 15 is set. The after heater 13 is set to be accommodated. By installing the after heater 13, the soaking area in the pulling-down direction can be expanded, and the conditions for crystal growth can be made wider.

本発明では、坩堝11の上部の開口11bに対して該坩堝11の軸方向に挿入可能となるように外形状を有する蓋を有する。該蓋は、坩堝11とは独立して加熱等の温度管理が可能となるようにヒータを内包しており、以降加熱蓋17と称する。加熱蓋17は外部に設けられた加熱用の制御装置等の加熱部20と接続される。また、当該加熱蓋17は、該加熱蓋17を引下げ軸に沿った方向に昇降する昇降部21によって支持される。また、加熱蓋17は引下げ軸方向と並行に坩堝11の内部方向に突出するコーン部18を有する。コーン部18は突出方向の先端部分で原材料融液8に接触している。なお、図示した構成では、複数のコーン部18が引下げ軸を中心として円周方向に環状に配置されている場合が示されているが、例えば図2に示すように単一のコーン部18を有した構成としても良い。   In this invention, it has the lid | cover which has an external shape so that it can insert in the axial direction of this crucible 11 with respect to the opening 11b of the upper part of the crucible 11. FIG. The lid includes a heater so that temperature management such as heating can be performed independently of the crucible 11, and is hereinafter referred to as a heating lid 17. The heating lid 17 is connected to a heating unit 20 such as a heating control device provided outside. The heating lid 17 is supported by an elevating unit 21 that elevates and lowers the heating lid 17 in a direction along the pulling axis. The heating lid 17 has a cone portion 18 that protrudes in the crucible 11 in parallel with the pulling-down axis direction. The cone portion 18 is in contact with the raw material melt 8 at the tip portion in the protruding direction. In the illustrated configuration, a case where a plurality of cone portions 18 are annularly arranged in the circumferential direction around the pulling shaft is shown. For example, as shown in FIG. It may be configured to have.

例えば本発明により得ようとするMoO3等の酸化物材料としては揮発性の高い材料からなる原材料融液8は、坩堝11の材料に対して濡れ性が非常に良い場合が多い。揮発した原材料は蓋に付着しその表面で通常は固化する。本発明の如く蓋を加熱する態様とすることによって固化した原材料の再融液化を促すことが可能となる。しかし、例えば坩堝或いは蓋に用いられる材料の全般に対して濡れ性の良い原材料融液の場合、蓋の表面に液体として付着したまま坩堝11内に滴下することが容易ではないことが考えられる。本発明の如く原材料融液8と蓋17の下面とを繋ぐコーン部18を加熱蓋17の下面に配置することにより、原材料融液8の表面からコーン部18の表面を伝って濡れ上がった原材料融液8と加熱蓋17に下面で再溶融された原材料融液とが接触し、交じり合うことが可能となる。 For example, the raw material melt 8 made of a highly volatile material such as MoO 3 to be obtained by the present invention often has very good wettability with respect to the material of the crucible 11. Volatile raw materials adhere to the lid and usually solidify on the surface. By adopting a mode in which the lid is heated as in the present invention, it is possible to promote remelting of the solidified raw material. However, for example, in the case of a raw material melt having good wettability with respect to all materials used for the crucible or the lid, it may not be easy to drop it into the crucible 11 while adhering as a liquid to the surface of the lid. By disposing the cone portion 18 connecting the raw material melt 8 and the lower surface of the lid 17 on the lower surface of the heating lid 17 as in the present invention, the raw material wets from the surface of the raw material melt 8 along the surface of the cone portion 18. The melt 8 and the raw material melt remelted on the lower surface of the heating lid 17 come into contact with each other and can be mixed with each other.

また、本発明では、坩堝11内に溜められた原材料融液8の液面を計測する液面検出部23を配している。液面検出部23は、例えば坩堝11に充填した原材料7の充填量と引下げられた原材料融液の量から求めることとしても良く、坩堝11の情報から液面を観察可能として超音波或いは光によってその高さを測定する等、公知の種々の液面計測の手法を適用可能である。該液面検出部23によって求められた原材料融液8の液面の位置は、液面制御ユニット25に伝えられる。液面制御ユニット25は昇降部21と接続されており、昇降部21は得られた液面に基づいて該液面と加熱蓋17の下面と液面との間隔が一定となるように加熱蓋17の昇降を制御する。当該構成を配することにより、坩堝11の内壁、原材料融液8の液面、加熱蓋17下面、及びコーン部18表面によって略閉鎖された空間の容積は常に一定に保持され、これにより加熱蓋17下面及びコーン部18表面に付着した原材料融液8の量は常に一定となり、結果として結晶成長に供せられる原材料融液8の量によらず、坩堝11より結晶成長のために供給される原材料融液8の組成等は一定に保持される。   In the present invention, the liquid level detection unit 23 for measuring the liquid level of the raw material melt 8 stored in the crucible 11 is provided. The liquid level detection unit 23 may be obtained from, for example, the amount of the raw material 7 filled in the crucible 11 and the amount of the raw material melt lowered, and the liquid level can be observed from the information of the crucible 11 by ultrasonic waves or light. Various known liquid level measurement techniques, such as measuring the height, can be applied. The position of the liquid level of the raw material melt 8 obtained by the liquid level detection unit 23 is transmitted to the liquid level control unit 25. The liquid level control unit 25 is connected to the elevating unit 21, and the elevating unit 21 is heated based on the obtained liquid level so that the distance between the liquid level, the lower surface of the heating lid 17 and the liquid level is constant. 17 is controlled. By arranging the configuration, the volume of the space substantially closed by the inner wall of the crucible 11, the liquid surface of the raw material melt 8, the lower surface of the heating lid 17, and the surface of the cone portion 18 is always kept constant, thereby the heating lid. The amount of the raw material melt 8 adhering to the lower surface 17 and the surface of the cone portion 18 is always constant. As a result, the amount of the raw material melt 8 supplied to the crystal growth is supplied from the crucible 11 for crystal growth. The composition of the raw material melt 8 is kept constant.

なお、原材料融液8と加熱蓋17の表面(コーン部18の表面を含むが以下該コーン部18の表面を含めて加熱蓋17表面と称する。)との濡れ性の良さを示す接触角θoは、坩堝17との内周面との濡れ性に関する接触角θiに対してθi≧θoを満たす、即ち濡れ性が良いことが好ましい。当該条件を満たすことにより、蓋表面と原材料融液8の液面との間での原材料融液の拡散が優先的に進行することとなり、揮発による原材料融液8の組成変化をより迅速且つ確実に抑制することとなる。また、コーン部18の先端部が原材料融液8の液面に接触する際の先端部表面と液面とのなす角θcontは、コーン部18表面に対して原材料融液8を滴下させた際の所謂接触角θoに対して、θcont<θoを満たすことが好ましい。即ち、コーン部18の突起表面が原材料融液8表面に対して垂直に近い角度で浸漬される状態がより好ましい。   The contact angle θo indicating the wettability between the raw material melt 8 and the surface of the heating lid 17 (including the surface of the cone portion 18 but hereinafter referred to as the surface of the heating lid 17). Preferably satisfies θi ≧ θo with respect to the contact angle θi related to the wettability with the inner peripheral surface of the crucible 17, that is, the wettability is good. By satisfying the condition, the diffusion of the raw material melt between the lid surface and the liquid surface of the raw material melt 8 will preferentially proceed, and the composition change of the raw material melt 8 due to volatilization can be made more quickly and reliably. Will be suppressed. In addition, the angle θcont formed by the tip surface and the liquid surface when the tip of the cone portion 18 contacts the liquid surface of the raw material melt 8 is determined when the raw material melt 8 is dropped on the surface of the cone portion 18. The so-called contact angle θo preferably satisfies θcont <θo. That is, it is more preferable that the projection surface of the cone portion 18 is immersed at an angle close to perpendicular to the surface of the raw material melt 8.

更に、前術した実施形態の変形例を図2、図3A或いは図3Bに示す。図2は図1に示した坩堝11、加熱蓋17及び原材料融液8のみを図1と同様の様式にて示したものであって、同図における先の実施形態に対する変形部分に関連する領域を丸Aにて示す。図3A及び3Bは当該領域Aを拡大して模式的に示している。先の実施形態では加熱蓋17は坩堝11の上部開口11bに対して挿入可能と述べたが、坩堝材料に対して濡れ性が良い原材料融液8を用いていることから、加熱蓋17の外周部と坩堝11の内周壁との隙間の間隔を狭めても原材料融液8が内周壁を伝って濡れ上がってしまう。また、これを防止するために加熱蓋17と坩堝11内壁との隙間の間隔をあまり狭めると、これらが接触して坩堝11の材料からなる不純物の発生といった問題も懸念される。   Further, a modification of the previously operated embodiment is shown in FIG. 2, FIG. 3A or FIG. 3B. FIG. 2 shows only the crucible 11, the heating lid 17 and the raw material melt 8 shown in FIG. 1 in the same manner as in FIG. 1, and the region related to the modified portion of the previous embodiment in FIG. Is indicated by a circle A. 3A and 3B schematically show the area A in an enlarged manner. In the previous embodiment, it has been described that the heating lid 17 can be inserted into the upper opening 11b of the crucible 11. However, since the raw material melt 8 having good wettability with respect to the crucible material is used, the outer periphery of the heating lid 17 is used. Even if the gap between the portion and the inner peripheral wall of the crucible 11 is narrowed, the raw material melt 8 gets wet along the inner peripheral wall. Further, if the gap between the heating lid 17 and the inner wall of the crucible 11 is made too narrow in order to prevent this, there is a concern that these may come into contact with each other to generate impurities made of the material of the crucible 11.

本変形例では、この隙間に液体封止材24(24a、24b)を配することとしている(図3A、3B参照)。該液体封止材24の存在により、該隙間を通じての原材料融液8の不要な濡れ上がり、更にはこれによる坩堝11外部への漏出も防止される。なお、液体封止材24は、図3Aに示すように、粘性の高い材料24aを断面略円形の所謂Oリングの様な形状となるように配置しても良い。又は、図3Bに示すように、坩堝11内周面及び加熱蓋17の外周面の隙間を、粘性の低い材料24bによって埋めるように該材料を配置しても良い。更に、同部材は、坩堝11に対して加熱蓋17が移動する関係上、これらの間で摩擦、摺動によって異物を発生する恐れが無いように、坩堝11内周面、加熱蓋17下面、及び原材料融液8に対して濡れ性の低い液体材料から構成することが好ましい。   In this modification, the liquid sealing material 24 (24a, 24b) is disposed in the gap (see FIGS. 3A and 3B). The presence of the liquid sealing material 24 prevents unnecessary raw material melt 8 from rising through the gap, and further prevents leakage to the outside of the crucible 11. As shown in FIG. 3A, the liquid sealing material 24 may be arranged such that a highly viscous material 24a has a shape like a so-called O-ring having a substantially circular cross section. Alternatively, as shown in FIG. 3B, the material may be arranged so that the gap between the inner peripheral surface of the crucible 11 and the outer peripheral surface of the heating lid 17 is filled with a low-viscosity material 24b. Further, since the heating lid 17 moves with respect to the crucible 11, the same member has an inner peripheral surface of the crucible 11, a lower surface of the heating lid 17, so that there is no possibility of generating foreign matter due to friction and sliding between them. And it is preferable to comprise from the liquid material with low wettability with respect to the raw material melt 8.

また、加熱部20によって加熱蓋17が加熱される際の温度は、坩堝11内部の原材料有機8の保持温度に対して高く設定されることが好ましい。原材料融液8の表面から気化される材料に関しては、表面から離れるに従ってその温度が上昇し、付着状態において最高温度となる。従って、これを再溶融し、且つ液面に対して循環させるエネルギーを付与する必要がある。本発明では、上述するように加熱蓋17の温度を原材料融液8の保持温度より高く維持することによって、この循環現象を容易且つ好適に連続させることを可能としている。上述した実施形態にこれら構成を付加することにより、単結晶の育成に寄与する原材料融液8の濃度等をより安定化させることが可能となり、高品質なバルク単結晶を得ることが可能となる。   The temperature at which the heating lid 17 is heated by the heating unit 20 is preferably set higher than the holding temperature of the raw material organic 8 inside the crucible 11. The temperature of the material vaporized from the surface of the raw material melt 8 increases as the distance from the surface increases, and reaches the maximum temperature in the attached state. Therefore, it is necessary to remelt and apply energy to circulate the liquid surface. In the present invention, as described above, by maintaining the temperature of the heating lid 17 higher than the holding temperature of the raw material melt 8, this circulation phenomenon can be easily and suitably continued. By adding these configurations to the above-described embodiment, the concentration of the raw material melt 8 that contributes to the growth of the single crystal can be further stabilized, and a high-quality bulk single crystal can be obtained. .

なお、以上のべた実施形態において述べた蓋は円筒形状としているが、ただの筒形状であっても良い。また、加熱蓋は、蓋本体と蓋を加熱する加熱手段とを別体としても良いことから、本発明ではこれらを先端が原材料融液に浸漬する突起を有した蓋と加熱手段として定義する。さらに、本発明では蓋を昇降させる構成を例示しているが、坩堝側を移動させても良く、従って蓋の移動は相対的な移動として把握されることが好ましい。更に、蓋の温度については、原材料融液の残量に応じてこれを変化させる温度管理様式とすることも可能である。   In addition, although the lid described in the above-described embodiments has a cylindrical shape, it may have a simple cylindrical shape. In addition, since the heating lid may have a lid body and a heating means for heating the lid separately, in the present invention, these are defined as a lid having a protrusion whose tip is immersed in the raw material melt and a heating means. Furthermore, although the structure which raises / lowers a lid | cover is illustrated in this invention, you may move the crucible side, Therefore, it is preferable that the movement of a lid | cover is grasped | ascertained as a relative movement. Furthermore, the temperature of the lid may be a temperature management mode in which it is changed according to the remaining amount of the raw material melt.

次に、図1に示した構成からなる引下げ装置を用いて、実際に単結晶を育成する方法について説明する。坩堝11の内部に原材料7を充填し、加熱蓋17を坩堝11上部の開口11bを覆うように配置する。この状態で加熱コイル15に対して高周波電力を印加して原材料7の融解を行う。同時に加熱蓋17の加熱も開始する。原材料7の融解後、液面検出部23によって原材料融液8の液面を検出し、液面制御ユニット25及び蓋昇降部21によって液面と加熱蓋17下面との間隔を所定値となるように制御する。その後所定時間の経過を待って原材料融液8の状態の安定化を図り、坩堝11の貫通孔11aから漏出する原材料融液8に対してシード5を接触させる。原材料融液8とシード5との接触部より結晶成長が開始されたことを確認後、上述した育成部8aの状態を見ながらシード5を所定の引下げ軸に沿って引下げて単結晶の育成を図る。   Next, a method for actually growing a single crystal using the pulling apparatus having the configuration shown in FIG. 1 will be described. The inside of the crucible 11 is filled with the raw material 7, and the heating lid 17 is disposed so as to cover the opening 11b above the crucible 11. In this state, high frequency power is applied to the heating coil 15 to melt the raw material 7. At the same time, heating of the heating lid 17 is also started. After the raw material 7 is melted, the liquid level detection unit 23 detects the liquid level of the raw material melt 8, and the liquid level control unit 25 and the lid lifting / lowering unit 21 set the distance between the liquid level and the lower surface of the heating lid 17 to a predetermined value. To control. Then, after a predetermined time has elapsed, the state of the raw material melt 8 is stabilized, and the seed 5 is brought into contact with the raw material melt 8 leaking from the through hole 11a of the crucible 11. After confirming that the crystal growth has started from the contact portion between the raw material melt 8 and the seed 5, the seed 5 is pulled down along a predetermined pulling axis while observing the state of the growing portion 8a described above to grow a single crystal. Plan.

引下げ時においては、液面検出部23によって融液面の位置を確認し、液面制御ユニット25及び蓋昇降部21によって加熱蓋17の昇降を行い、液面と加熱蓋17下面との間隔を所定値に維持し続ける。これにより、坩堝貫通孔11aを介して漏出する原材料融液8の濃度等をより安定化させることが可能となり、高品質なバルク単結晶を得ることが可能となる。なお、坩堝11内の原材料融液8の残量によっては、加熱蓋17下面より融液中に還流する揮発分融液の還流様式に変化が生じ、濃度或いは温度の状態変化が生じることも考えられる。この場合、予め坩堝11内部の原材料融液8の残量に応じて得られた単結晶の特性を得ておき、その特性変化に応じて該変化を抑制するように先の所定値を徐々に変化させる様式とすることも可能である。この場合、所定値の変化様式等は液面制御ユニット25に記憶された変化パターン、或いは操作者による指定に応じて決定されることが好ましい。   At the time of lowering, the position of the melt surface is confirmed by the liquid level detection unit 23, the heating lid 17 is moved up and down by the liquid level control unit 25 and the lid lifting unit 21, and the interval between the liquid level and the lower surface of the heating lid 17 is increased. Continue to maintain a predetermined value. As a result, the concentration of the raw material melt 8 leaking through the crucible through hole 11a can be further stabilized, and a high-quality bulk single crystal can be obtained. Note that depending on the remaining amount of the raw material melt 8 in the crucible 11, a change may occur in the reflux mode of the volatile melt that flows back into the melt from the lower surface of the heating lid 17, and a change in the concentration or temperature state may also occur. It is done. In this case, the characteristics of the single crystal obtained according to the remaining amount of the raw material melt 8 in the crucible 11 are obtained in advance, and the predetermined value is gradually increased so as to suppress the change according to the characteristic change. It is also possible to change the style. In this case, it is preferable that the change mode or the like of the predetermined value is determined according to the change pattern stored in the liquid level control unit 25 or the designation by the operator.

次に、図1に示した構成を含む単結晶引下げ装置の概略構成について説明する。図4は、本発明の一実施形態に係る単結晶引下げ装置を側方から見た状態での概略構成を示している。単結晶引下げ装置1は、前述したように、主たる構成として、シード5、坩堝11、アフターヒータ13、加熱コイル15、コーン部18を含む加熱蓋17、加熱部20、蓋昇降部21、液面検出部23、及び引下げ機構31、更には、保温管27、アウターチューブ28、坩堝ステージ29、CCDカメラ35、及び同図中で不図示の液面制御ユニット25を含む制御装置を有している。アフターヒータ13は、その下端において円環状の坩堝ステージ29の上面によって支持されている。坩堝ステージ29(及び保温管27)は、セラミックス、石英等、加熱に用いる高周波誘導に対して絶縁性を有する材料から構成されている。保温管27は加熱コイル15の内側に配置されて、坩堝11を囲む円筒形状を有し、坩堝11から発せられた熱の外部への発散を抑制する。坩堝ステージ29は、下面において、該坩堝ステージ29と同様の材料からなる円筒状のアウターチューブ28の上端部によって支持されている。これら坩堝11、アフターヒータ13、加熱コイル15、保温管25、坩堝ステージ29及びアウターチューブ28は、同軸となるように配置されており、結晶の引下げ操作は該軸と一致する引下げ軸に沿って行われる。   Next, a schematic configuration of the single crystal pulling apparatus including the configuration shown in FIG. 1 will be described. FIG. 4 shows a schematic configuration of a single crystal pulling apparatus according to an embodiment of the present invention as viewed from the side. As described above, the single crystal pulling device 1 is mainly composed of the seed 5, the crucible 11, the after heater 13, the heating coil 15, the heating lid 17 including the cone portion 18, the heating portion 20, the lid lifting and lowering portion 21, the liquid level. The detector 23 and the pull-down mechanism 31 are further provided with a control device including a heat retaining tube 27, an outer tube 28, a crucible stage 29, a CCD camera 35, and a liquid level control unit 25 (not shown in the figure). . The after heater 13 is supported by the upper surface of the annular crucible stage 29 at the lower end thereof. The crucible stage 29 (and the heat insulating tube 27) is made of a material having insulation properties against high frequency induction used for heating, such as ceramics and quartz. The heat insulating tube 27 is disposed inside the heating coil 15 and has a cylindrical shape surrounding the crucible 11, and suppresses the heat radiated from the crucible 11 to the outside. The crucible stage 29 is supported on the lower surface by an upper end portion of a cylindrical outer tube 28 made of the same material as the crucible stage 29. The crucible 11, the after heater 13, the heating coil 15, the heat insulating tube 25, the crucible stage 29, and the outer tube 28 are arranged so as to be coaxial, and the crystal pulling operation is performed along a pulling axis that coincides with the axis. Done.

また、シード5は引下げ機構31の上部端部に配置される不図示のシード保持具よって保持されている。シード5は、この引下げ機構31の軸方向の上下動に応じて上下動可能とされている。また、CCDカメラ35は、固液境界である育成部8aの形成状態を観察するために用いられる。アフターヒータ13には育成部8a観察用の不図示の貫通窓が設けられており、CCDカメラ35は当該貫通窓を介して育成部8aの映像を撮像することが可能となっている。CCDカメラ35から得られた映像は前述した制御装置に送信され、得られた映像に基づいて育成部8aの状態の判別が行われ、当該判別結果に応じてシード5の引下げ速度の制御が行われる。即ち、育成部8aの映像に応じて引下げ機構31の制御が為され、シード5の上昇動作の減速、停止、或いは降下への変更、降下速度の調整等の動作が実施される。また、同様に、育成部8aの状態に応じて加熱蓋17の昇降位置に関しても、液面制御ユニット25により制御される。   The seed 5 is held by a seed holder (not shown) disposed at the upper end of the pulling mechanism 31. The seed 5 can be moved up and down in accordance with the vertical movement of the pulling mechanism 31 in the axial direction. The CCD camera 35 is used for observing the formation state of the growing part 8a which is a solid-liquid boundary. The after heater 13 is provided with a through window (not shown) for observing the growing part 8a, and the CCD camera 35 can take an image of the growing part 8a through the through window. The image obtained from the CCD camera 35 is transmitted to the control device described above, the state of the growing unit 8a is determined based on the obtained image, and the pulling-down speed of the seed 5 is controlled according to the determination result. Is called. That is, the pull-down mechanism 31 is controlled in accordance with the image of the growing unit 8a, and operations such as deceleration, stop, or change to the lowering operation of the seed 5 and adjustment of the lowering speed are performed. Similarly, the raising / lowering position of the heating lid 17 is also controlled by the liquid level control unit 25 in accordance with the state of the growing section 8a.

なお、上述した単結晶引下げ装置1で述べた構成は一例であり、例えば原材料に応じて種々改変が可能である。具体的には、坩堝11と加熱コイル15との間に更なる発熱体となる導電性材料からなる円筒状の部材を配しても良い。また、坩堝11自体が発熱する構成ではなく、この円筒状の部材が発熱する構成としても良い。或いは、アフターヒータ13をなくする構成とする、アフターヒータ13を二重構造とする、アフターヒータと加熱コイル15との位置関係を改変可能とする、等の構造とすることも可能である。また、引下げ操作を、例えば不活性ガス雰囲気、或いは酸化性、フッ化性等ガス雰囲気等、特定の気体雰囲気中において行うことも考えられる。この様な場合を想定し、該引下げ装置1は密閉可能なチャンバの内部に設置され、排気系及びガス導入系を該チャンバに付随させて、内部空間を所謂真空状態まで排気する、或いは特定のガスで所定の圧力を維持すること等を可能としておくことが好ましい。   Note that the configuration described in the above-described single crystal pulling apparatus 1 is an example, and various modifications can be made depending on the raw materials, for example. Specifically, a cylindrical member made of a conductive material serving as a further heating element may be disposed between the crucible 11 and the heating coil 15. The crucible 11 itself may not be configured to generate heat, and the cylindrical member may be configured to generate heat. Alternatively, the structure may be such that the after heater 13 is eliminated, the after heater 13 has a double structure, or the positional relationship between the after heater and the heating coil 15 can be modified. It is also conceivable that the lowering operation is performed in a specific gas atmosphere such as an inert gas atmosphere or a gas atmosphere such as an oxidizing or fluorinated gas. Assuming such a case, the lowering device 1 is installed inside a sealable chamber, and an exhaust system and a gas introduction system are attached to the chamber to exhaust the internal space to a so-called vacuum state, It is preferable to make it possible to maintain a predetermined pressure with gas.

本発明においては、揮発性の高い原材料融液を用いたバルク単結晶の育成に際して、温度管理可能であると共に原材料融液液面に先端部が浸漬可能な突起を有する蓋によって坩堝11の上部の開口11bを閉鎖し、且つこの蓋の下面と融液液面との間隔を所定値に維持しつつ単結晶の育成を行う様式としている。以上述べたように、本発明によれば、当該加熱蓋の作用により、高品質なバルク単結晶の育成が困難と考えられていた育成温度において揮発性を有した原材料融液を用いた場合であっても、好適にシードタッチを実施し、各部分における組成等の均一性に優れた高品位な単結晶を育成することが可能となる。   In the present invention, when a bulk single crystal is grown using a highly volatile raw material melt, the temperature can be controlled and the top of the crucible 11 is covered with a lid having a protrusion whose tip can be immersed in the raw material melt surface. The opening 11b is closed, and the single crystal is grown while maintaining the distance between the lower surface of the lid and the melt surface at a predetermined value. As described above, according to the present invention, due to the action of the heating lid, in the case of using a raw material melt having volatility at a growth temperature at which it was considered difficult to grow a high-quality bulk single crystal. Even if it exists, it becomes possible to implement seed touch suitably and to grow a high-quality single crystal excellent in uniformity of composition and the like in each part.

なお、本明細書においては、棒状の単結晶を得る構成に関して記述している。しかし、本発明は当該結晶形状のみならず、例えば坩堝から原材料を漏出させる際の坩堝貫通孔の態様、原材料融液が濡れ広がる坩堝下端の面形状等を改変することにより、種々の形態からなる単結晶の育成に適用することも可能である。また、突起を付加し且つ上下動可能な当該加熱蓋は、CZ法等に例示される所謂引上げ法における坩堝の蓋としても適用可能である。   Note that in this specification, a structure for obtaining a rod-like single crystal is described. However, the present invention has various forms by modifying not only the crystal shape but also, for example, the shape of the crucible through hole when the raw material is leaked from the crucible, the surface shape of the lower end of the crucible where the raw material melt spreads, etc. It can also be applied to single crystal growth. In addition, the heating lid to which a protrusion is added and which can be moved up and down is also applicable as a crucible lid in a so-called pulling method exemplified by the CZ method.

1:引下げ装置、 5:シード、 7:原材料、 8:原材料融液、 8a:育成部、 9:単結晶、11:坩堝、 11a:坩堝貫通孔、 11b:坩堝開口 13:アフターヒータ、 15:加熱コイル、 17:加熱蓋、 18:コーン部、 20:加熱部、 21:蓋昇降部、 23:液面検出部、 24(24a、24b):液体封止材、 25:液面制御ユニット、 27:保温管、 28:アウターチューブ、 29:坩堝ステージ、 31:引下げ機構、 35:CCDカメラ DESCRIPTION OF SYMBOLS 1: Pulling-down apparatus, 5: Seed, 7: Raw material, 8: Raw material melt, 8a: Growing part, 9: Single crystal, 11: Crucible, 11a: Crucible through-hole, 11b: Crucible opening 13: After heater, 15: Heating coil, 17: heating lid, 18: cone portion, 20: heating portion, 21: lid lifting / lowering portion, 23: liquid level detecting portion, 24 (24a, 24b): liquid sealing material, 25: liquid level control unit, 27: heat insulation tube, 28: outer tube, 29: crucible stage, 31: pulling mechanism, 35: CCD camera

Claims (8)

底部が閉塞された閉塞部となる筒形状を有し、前記閉塞部を前記筒形状の内部から外部に貫通する貫通孔を有する坩堝、の内部に保持された原材料融液を前記貫通孔から漏出させ、漏出した前記原材料融液に、前記原材料融液が結晶化する際の結晶方位を定めるシードを接触させ、前記シードを所定の引下げ軸に沿って引き下げることによって前記シードを基点として成長する単結晶を得る単結晶製造装置であって、
前記坩堝の開口を塞ぎ、前記原材料融液に先端部が浸漬可能な突起を有する蓋と、
前記原材料融液の前記坩堝内における液面の位置を検出する液面検出部と、
前記蓋を前記液面に対して相対的に移動させる蓋移動手段と、
前記蓋を加熱する加熱手段と、を有し、
前記蓋移動手段は前記突起の先端が前記原材料融液に浸漬した状態を維持するように前記相対的な移動を行うことを特徴とする単結晶製造装置。
Leakage of raw material melt held inside the crucible having a cylindrical shape that becomes a closed portion with a closed bottom portion and having a through hole that penetrates the closed portion from the inside of the cylindrical shape to the outside from the through hole A seed that determines a crystal orientation when the raw material melt is crystallized is brought into contact with the leaked raw material melt, and the seed is grown along a predetermined pulling axis to grow from the seed as a base point. A single crystal manufacturing apparatus for obtaining a crystal,
A lid having a protrusion that closes the opening of the crucible and whose tip can be immersed in the raw material melt;
A liquid level detector for detecting the position of the liquid level in the crucible of the raw material melt;
Lid moving means for moving the lid relative to the liquid surface;
Heating means for heating the lid,
The single crystal manufacturing apparatus according to claim 1, wherein the lid moving means performs the relative movement so as to maintain a state in which a tip of the protrusion is immersed in the raw material melt.
前記原材料融液と前記蓋の表面との濡れ性を示す接触角θoと、前記原材料融液と前記坩堝の内周面との濡れ性を示す接触角θiとは、θi≧θoを満たすことを特徴とする請求項1に記載の単結晶製造装置。   The contact angle θo indicating wettability between the raw material melt and the surface of the lid and the contact angle θi indicating wettability between the raw material melt and the inner peripheral surface of the crucible satisfy θi ≧ θo. The single crystal manufacturing apparatus according to claim 1, wherein 前記突起の前記先端が前記原材料融液に浸漬する際の前記先端の表面と前記原材料融液の液面とのなす角θcontと、前記原材料融液と前記突起の表面との濡れ性を示す接触角θoとが、θcont<θoを満たすことを特徴とする請求項1又は2に記載の単結晶製造装置。 The angle θcont formed by the surface of the tip and the surface of the raw material melt when the tip of the protrusion is immersed in the raw material melt, and contact indicating wettability between the raw material melt and the surface of the protrusion The single crystal manufacturing apparatus according to claim 1 , wherein the angle θo 1 satisfies θcont <θo 1 . 前記蓋と前記坩堝の内周面との間に配置されて前記隙間を塞ぐ液体封止材を更に有することを特徴とする請求項1乃至3の何れか一項に記載の単結晶製造装置。   4. The single crystal manufacturing apparatus according to claim 1, further comprising a liquid sealing material disposed between the lid and the inner peripheral surface of the crucible to close the gap. 前記加熱手段は、前記原材料融液を保持する前記坩堝の温度よりも前記蓋の温度を高く維持することを特徴とする請求項1乃至4の何れか一項に記載の単結晶製造装置。   5. The single crystal manufacturing apparatus according to claim 1, wherein the heating unit maintains a temperature of the lid higher than a temperature of the crucible holding the raw material melt. 6. 底部が閉塞された閉塞部となる筒形状を有し、前記閉塞部を前記筒形状の内部から外部に貫通する貫通孔を有する坩堝、の内部に保持された原材料融液を前記貫通孔から漏出させ、漏出した前記原材料融液に、前記原材料融液が結晶化する際の結晶方位を定めるシードを接触させ、前記シードを所定の引下げ軸に沿って引き下げることによって前記シードを基点として成長する単結晶を得る単結晶製造方法であって、
前記坩堝の内部に前記原材料融液の原材料を充填すると共に、前記原材料融液に先端部が浸漬可能な突起を有する蓋により前記坩堝の開口を閉鎖し、
前記原材料を加熱溶融して前記原材料融液得ると共に前記原材料融液の前記坩堝内における液面の位置を検出し、
前記蓋を加熱すると共に、蓋移動手段によって前記蓋と前記液面との間隔を所定値とし、
前記貫通孔から漏出した前記原材料融液に前記シードを接触させて前記シードを前記所定の引下げ軸に沿って引下げる工程を有し、
前記間隔は前記引き下げる工程に置いて前記所定値を維持されることを特徴とする単結晶製造方法。
Leakage of raw material melt held inside the crucible having a cylindrical shape that becomes a closed portion with a closed bottom portion and having a through hole that penetrates the closed portion from the inside of the cylindrical shape to the outside from the through hole A seed that determines a crystal orientation when the raw material melt is crystallized is brought into contact with the leaked raw material melt, and the seed is grown along a predetermined pulling axis to grow from the seed as a base point. A single crystal manufacturing method for obtaining a crystal,
The crucible is filled with the raw material of the raw material melt, and the crucible opening is closed with a lid having a protrusion whose tip can be immersed in the raw material melt,
The raw material is heated and melted to obtain the raw material melt, and the position of the liquid level in the crucible of the raw material melt is detected,
While heating the lid, a gap between the lid and the liquid level is set to a predetermined value by a lid moving means,
The step of bringing the seed into contact with the raw material melt leaked from the through hole and lowering the seed along the predetermined pulling axis;
The single crystal manufacturing method, wherein the predetermined value is maintained in the step of lowering the interval.
前記所定値は前記引下げる工程に応じて変更されることを特徴とする請求項6に記載の単結晶製造方法。   The method for producing a single crystal according to claim 6, wherein the predetermined value is changed according to the lowering step. 前記蓋は、前記引下げる工程に応じて温度の変更が為されることを特徴とする請求項6又は7に記載の単結晶製造方法。   The method for producing a single crystal according to claim 6 or 7, wherein the temperature of the lid is changed according to the step of pulling down.
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