JP5317564B2 - Organosiloxane copolymer resin - Google Patents
Organosiloxane copolymer resin Download PDFInfo
- Publication number
- JP5317564B2 JP5317564B2 JP2008187120A JP2008187120A JP5317564B2 JP 5317564 B2 JP5317564 B2 JP 5317564B2 JP 2008187120 A JP2008187120 A JP 2008187120A JP 2008187120 A JP2008187120 A JP 2008187120A JP 5317564 B2 JP5317564 B2 JP 5317564B2
- Authority
- JP
- Japan
- Prior art keywords
- bis
- hydroxyphenyl
- dicarboxylic acid
- organosiloxane
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 125000005375 organosiloxane group Chemical group 0.000 title claims abstract description 76
- 229920006026 co-polymeric resin Polymers 0.000 title claims description 51
- 229920005989 resin Polymers 0.000 claims abstract description 45
- 239000011347 resin Substances 0.000 claims abstract description 45
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims abstract description 32
- 125000003118 aryl group Chemical group 0.000 claims abstract description 21
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 15
- 125000001931 aliphatic group Chemical group 0.000 claims description 13
- 238000012695 Interfacial polymerization Methods 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 125000001142 dicarboxylic acid group Chemical group 0.000 claims description 5
- 238000000465 moulding Methods 0.000 claims description 3
- 150000001991 dicarboxylic acids Chemical class 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 19
- 239000011342 resin composition Substances 0.000 abstract description 18
- 229920000728 polyester Polymers 0.000 abstract description 2
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 47
- 239000000243 solution Substances 0.000 description 32
- -1 siloxane structure Chemical group 0.000 description 28
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 27
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 18
- 238000004519 manufacturing process Methods 0.000 description 18
- 239000002904 solvent Substances 0.000 description 18
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 15
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- 235000010290 biphenyl Nutrition 0.000 description 12
- 239000004305 biphenyl Substances 0.000 description 12
- 125000006267 biphenyl group Chemical group 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 12
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 12
- 238000000576 coating method Methods 0.000 description 11
- 239000012074 organic phase Substances 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 10
- 229920001230 polyarylate Polymers 0.000 description 10
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 8
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 238000006116 polymerization reaction Methods 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 6
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 239000008346 aqueous phase Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- VOWWYDCFAISREI-UHFFFAOYSA-N Bisphenol AP Chemical compound C=1C=C(O)C=CC=1C(C=1C=CC(O)=CC=1)(C)C1=CC=CC=C1 VOWWYDCFAISREI-UHFFFAOYSA-N 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N Bisphenol F Natural products C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- SDDLEVPIDBLVHC-UHFFFAOYSA-N Bisphenol Z Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCCCC1 SDDLEVPIDBLVHC-UHFFFAOYSA-N 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 4
- 239000002685 polymerization catalyst Substances 0.000 description 4
- 239000001294 propane Substances 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- OWEYKIWAZBBXJK-UHFFFAOYSA-N 1,1-Dichloro-2,2-bis(4-hydroxyphenyl)ethylene Chemical compound C1=CC(O)=CC=C1C(=C(Cl)Cl)C1=CC=C(O)C=C1 OWEYKIWAZBBXJK-UHFFFAOYSA-N 0.000 description 3
- YMTYZTXUZLQUSF-UHFFFAOYSA-N 3,3'-Dimethylbisphenol A Chemical compound C1=C(O)C(C)=CC(C(C)(C)C=2C=C(C)C(O)=CC=2)=C1 YMTYZTXUZLQUSF-UHFFFAOYSA-N 0.000 description 3
- WVDRSXGPQWNUBN-UHFFFAOYSA-N 4-(4-carboxyphenoxy)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C=C1 WVDRSXGPQWNUBN-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- IOEJYZSZYUROLN-UHFFFAOYSA-M Sodium diethyldithiocarbamate Chemical compound [Na+].CCN(CC)C([S-])=S IOEJYZSZYUROLN-UHFFFAOYSA-M 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 235000019445 benzyl alcohol Nutrition 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- MQCPOLNSJCWPGT-UHFFFAOYSA-N 2,2'-Bisphenol F Chemical compound OC1=CC=CC=C1CC1=CC=CC=C1O MQCPOLNSJCWPGT-UHFFFAOYSA-N 0.000 description 2
- QQOMQLYQAXGHSU-UHFFFAOYSA-N 2,3,6-Trimethylphenol Chemical compound CC1=CC=C(C)C(O)=C1C QQOMQLYQAXGHSU-UHFFFAOYSA-N 0.000 description 2
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 2
- DXCHWXWXYPEZKM-UHFFFAOYSA-N 2,4-ditert-butyl-6-[1-(3,5-ditert-butyl-2-hydroxyphenyl)ethyl]phenol Chemical compound C=1C(C(C)(C)C)=CC(C(C)(C)C)=C(O)C=1C(C)C1=CC(C(C)(C)C)=CC(C(C)(C)C)=C1O DXCHWXWXYPEZKM-UHFFFAOYSA-N 0.000 description 2
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 2
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- LVLNPXCISNPHLE-UHFFFAOYSA-N 2-[(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1CC1=CC=CC=C1O LVLNPXCISNPHLE-UHFFFAOYSA-N 0.000 description 2
- XBQRPFBBTWXIFI-UHFFFAOYSA-N 2-chloro-4-[2-(3-chloro-4-hydroxyphenyl)propan-2-yl]phenol Chemical compound C=1C=C(O)C(Cl)=CC=1C(C)(C)C1=CC=C(O)C(Cl)=C1 XBQRPFBBTWXIFI-UHFFFAOYSA-N 0.000 description 2
- WRMNZCZEMHIOCP-UHFFFAOYSA-N 2-phenylethanol Chemical compound OCCC1=CC=CC=C1 WRMNZCZEMHIOCP-UHFFFAOYSA-N 0.000 description 2
- CSOQDRZGMGKOGN-UHFFFAOYSA-N 2-tert-butyl-4-[1-(5-tert-butyl-4-hydroxy-2-methylphenyl)-2-methylpropyl]-5-methylphenol Chemical compound C=1C(C(C)(C)C)=C(O)C=C(C)C=1C(C(C)C)C1=CC(C(C)(C)C)=C(O)C=C1C CSOQDRZGMGKOGN-UHFFFAOYSA-N 0.000 description 2
- YCOXTKKNXUZSKD-UHFFFAOYSA-N 3,4-xylenol Chemical compound CC1=CC=C(O)C=C1C YCOXTKKNXUZSKD-UHFFFAOYSA-N 0.000 description 2
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 2
- ASHGTJPOSUFTGB-UHFFFAOYSA-N 3-methoxyphenol Chemical compound COC1=CC=CC(O)=C1 ASHGTJPOSUFTGB-UHFFFAOYSA-N 0.000 description 2
- URFNSYWAGGETFK-UHFFFAOYSA-N 4,4'-Dihydroxybibenzyl Chemical compound C1=CC(O)=CC=C1CCC1=CC=C(O)C=C1 URFNSYWAGGETFK-UHFFFAOYSA-N 0.000 description 2
- MIFGCULLADMRTF-UHFFFAOYSA-N 4-[(4-hydroxy-3-methylphenyl)methyl]-2-methylphenol Chemical compound C1=C(O)C(C)=CC(CC=2C=C(C)C(O)=CC=2)=C1 MIFGCULLADMRTF-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 101001059734 Thermococcus litoralis (strain ATCC 51850 / DSM 5473 / JCM 8560 / NS-C) Trehalose/maltose-binding protein MalE Proteins 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 description 2
- VJGNLOIQCWLBJR-UHFFFAOYSA-M benzyl(tributyl)azanium;chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CC1=CC=CC=C1 VJGNLOIQCWLBJR-UHFFFAOYSA-M 0.000 description 2
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- MIHINWMALJZIBX-UHFFFAOYSA-N cyclohexa-2,4-dien-1-ol Chemical compound OC1CC=CC=C1 MIHINWMALJZIBX-UHFFFAOYSA-N 0.000 description 2
- 238000000113 differential scanning calorimetry Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- YCOZIPAWZNQLMR-UHFFFAOYSA-N pentadecane Chemical compound CCCCCCCCCCCCCCC YCOZIPAWZNQLMR-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- ZPQOPVIELGIULI-UHFFFAOYSA-N 1,3-dichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1 ZPQOPVIELGIULI-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- KUFFULVDNCHOFZ-UHFFFAOYSA-N 2,4-xylenol Chemical compound CC1=CC=C(O)C(C)=C1 KUFFULVDNCHOFZ-UHFFFAOYSA-N 0.000 description 1
- VBCBBRBVCPTOKP-UHFFFAOYSA-N 2,6-di(butan-2-yl)-4-[[3,5-di(butan-2-yl)-4-hydroxyphenyl]methyl]phenol Chemical compound CCC(C)C1=C(O)C(C(C)CC)=CC(CC=2C=C(C(O)=C(C(C)CC)C=2)C(C)CC)=C1 VBCBBRBVCPTOKP-UHFFFAOYSA-N 0.000 description 1
- WPZJSWWEEJJSIZ-UHFFFAOYSA-N 2,6-dibromo-4-[(3,5-dibromo-4-hydroxyphenyl)methyl]phenol Chemical compound C1=C(Br)C(O)=C(Br)C=C1CC1=CC(Br)=C(O)C(Br)=C1 WPZJSWWEEJJSIZ-UHFFFAOYSA-N 0.000 description 1
- JRWCWHILGVMUTD-UHFFFAOYSA-N 2,6-dibromo-4-[1-(3,5-dibromo-4-hydroxyphenyl)-3,3,5-trimethylcyclohexyl]phenol Chemical compound C1C(C)CC(C)(C)CC1(C=1C=C(Br)C(O)=C(Br)C=1)C1=CC(Br)=C(O)C(Br)=C1 JRWCWHILGVMUTD-UHFFFAOYSA-N 0.000 description 1
- HHWOEAFLIJITGC-UHFFFAOYSA-N 2,6-dichloro-4-[1-(3,5-dichloro-4-hydroxyphenyl)-3,3,5-trimethylcyclohexyl]phenol Chemical compound C1C(C)CC(C)(C)CC1(C=1C=C(Cl)C(O)=C(Cl)C=1)C1=CC(Cl)=C(O)C(Cl)=C1 HHWOEAFLIJITGC-UHFFFAOYSA-N 0.000 description 1
- ALLIENKNQNBVMR-UHFFFAOYSA-N 2,6-dimethyl-4-(3,3,5-trimethylcyclohexyl)phenol Chemical compound C1C(C)(C)CC(C)CC1C1=CC(C)=C(O)C(C)=C1 ALLIENKNQNBVMR-UHFFFAOYSA-N 0.000 description 1
- GSOYMOAPJZYXTB-UHFFFAOYSA-N 2,6-ditert-butyl-4-(3,5-ditert-butyl-4-hydroxyphenyl)phenol Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(C=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 GSOYMOAPJZYXTB-UHFFFAOYSA-N 0.000 description 1
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- BKTRENAPTCBBFA-UHFFFAOYSA-N 4-[2-(4-hydroxy-3-phenylphenyl)propan-2-yl]-2-phenylphenol Chemical compound C=1C=C(O)C(C=2C=CC=CC=2)=CC=1C(C)(C)C(C=1)=CC=C(O)C=1C1=CC=CC=C1 BKTRENAPTCBBFA-UHFFFAOYSA-N 0.000 description 1
- WOCGGVRGNIEDSZ-UHFFFAOYSA-N 4-[2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical compound C=1C=C(O)C(CC=C)=CC=1C(C)(C)C1=CC=C(O)C(CC=C)=C1 WOCGGVRGNIEDSZ-UHFFFAOYSA-N 0.000 description 1
- VHLLJTHDWPAQEM-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)-4-methylpentan-2-yl]phenol Chemical compound C=1C=C(O)C=CC=1C(C)(CC(C)C)C1=CC=C(O)C=C1 VHLLJTHDWPAQEM-UHFFFAOYSA-N 0.000 description 1
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- YGWDVTRZWSYDJJ-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)dodecan-2-yl]phenol Chemical compound C=1C=C(O)C=CC=1C(C)(CCCCCCCCCC)C1=CC=C(O)C=C1 YGWDVTRZWSYDJJ-UHFFFAOYSA-N 0.000 description 1
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- WCYKOMDAWXBZBN-UHFFFAOYSA-N CC=1C=C(C=C(C1C1=C(C=C(C=C1C)O)C)C)O.CC=1C=C(C=CC1C1=C(C=C(C=C1)O)C)O Chemical compound CC=1C=C(C=C(C1C1=C(C=C(C=C1C)O)C)C)O.CC=1C=C(C=CC1C1=C(C=C(C=C1)O)C)O WCYKOMDAWXBZBN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
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- 239000012359 Methanesulfonyl chloride Substances 0.000 description 1
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- BELBBZDIHDAJOR-UHFFFAOYSA-N Phenolsulfonephthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2S(=O)(=O)O1 BELBBZDIHDAJOR-UHFFFAOYSA-N 0.000 description 1
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- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
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- KYPYTERUKNKOLP-UHFFFAOYSA-N Tetrachlorobisphenol A Chemical compound C=1C(Cl)=C(O)C(Cl)=CC=1C(C)(C)C1=CC(Cl)=C(O)C(Cl)=C1 KYPYTERUKNKOLP-UHFFFAOYSA-N 0.000 description 1
- AMNPXXIGUOKIPP-UHFFFAOYSA-N [4-(carbamothioylamino)phenyl]thiourea Chemical compound NC(=S)NC1=CC=C(NC(N)=S)C=C1 AMNPXXIGUOKIPP-UHFFFAOYSA-N 0.000 description 1
- GAUWPACNJVYEFR-UHFFFAOYSA-N [N+](=O)([O-])C=1C=C(C=CC1O)C(C)(C)C1=CC(=C(C=C1)O)[N+](=O)[O-].BrC=1C=C(C=C(C1O)Br)C(C)(C)C1=CC(=C(C(=C1)Br)O)Br Chemical compound [N+](=O)([O-])C=1C=C(C=CC1O)C(C)(C)C1=CC(=C(C=C1)O)[N+](=O)[O-].BrC=1C=C(C=C(C1O)Br)C(C)(C)C1=CC(=C(C(=C1)Br)O)Br GAUWPACNJVYEFR-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- UBXYXCRCOKCZIT-UHFFFAOYSA-N biphenyl-3-ol Chemical compound OC1=CC=CC(C=2C=CC=CC=2)=C1 UBXYXCRCOKCZIT-UHFFFAOYSA-N 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- YXVFYQXJAXKLAK-UHFFFAOYSA-N biphenyl-4-ol Chemical compound C1=CC(O)=CC=C1C1=CC=CC=C1 YXVFYQXJAXKLAK-UHFFFAOYSA-N 0.000 description 1
- ZFVMWEVVKGLCIJ-UHFFFAOYSA-N bisphenol AF Chemical compound C1=CC(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C=C1 ZFVMWEVVKGLCIJ-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
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- CGZZMOTZOONQIA-UHFFFAOYSA-N cycloheptanone Chemical compound O=C1CCCCCC1 CGZZMOTZOONQIA-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- FPIQZBQZKBKLEI-UHFFFAOYSA-N ethyl 1-[[2-chloroethyl(nitroso)carbamoyl]amino]cyclohexane-1-carboxylate Chemical compound ClCCN(N=O)C(=O)NC1(C(=O)OCC)CCCCC1 FPIQZBQZKBKLEI-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 239000002783 friction material Substances 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- LHGVFZTZFXWLCP-UHFFFAOYSA-N guaiacol Chemical compound COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- QARBMVPHQWIHKH-UHFFFAOYSA-N methanesulfonyl chloride Chemical compound CS(Cl)(=O)=O QARBMVPHQWIHKH-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- GOQYKNQRPGWPLP-UHFFFAOYSA-N n-heptadecyl alcohol Natural products CCCCCCCCCCCCCCCCCO GOQYKNQRPGWPLP-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- 235000010292 orthophenyl phenol Nutrition 0.000 description 1
- SJDACOMXKWHBOW-UHFFFAOYSA-N oxyphenisatine Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2NC1=O SJDACOMXKWHBOW-UHFFFAOYSA-N 0.000 description 1
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- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 125000000636 p-nitrophenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)[N+]([O-])=O 0.000 description 1
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- 150000004714 phosphonium salts Chemical group 0.000 description 1
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- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
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Landscapes
- Polyesters Or Polycarbonates (AREA)
Abstract
Description
本発明は、耐熱性を維持しつつ、透明性や柔軟性があり、撥水性に優れ、摩擦係数が小さく、さらには、溶解性に優れ、溶液粘度が低くハンドリング性に優れた樹脂組成物に関する。 The present invention relates to a resin composition having transparency and flexibility, excellent water repellency, a small coefficient of friction, excellent solubility, low solution viscosity and excellent handling properties while maintaining heat resistance. .
2,2−ビス(4−ヒドロキシフェニル)プロパン〔ビスフェノールAと略記することがある〕とテレフタル酸及びイソフタル酸とから得られるポリアリレートは、エンジニアリングプラスチックとして既によく知られている。かかるポリアリレートは、耐熱性が高く、衝撃強度に代表される機械的強度や寸法安定性に優れ、その成形品は電気・電子、自動車、機械等の分野に幅広く応用されている。 Polyarylates obtained from 2,2-bis (4-hydroxyphenyl) propane (sometimes abbreviated as bisphenol A), terephthalic acid and isophthalic acid are already well known as engineering plastics. Such polyarylate has high heat resistance and is excellent in mechanical strength and dimensional stability represented by impact strength, and its molded products are widely applied in fields such as electric / electronics, automobiles and machines.
また、優れた電気的特性(絶縁性、誘電特性等)、耐熱性を有しているため、コンデンサ等の電子部品用フィルム、液晶表示装置用等の光学フィルム、微細加工用のベースフィルムなどに応用されている。 In addition, it has excellent electrical characteristics (insulating properties, dielectric properties, etc.) and heat resistance, so it can be used as a film for electronic parts such as capacitors, an optical film for liquid crystal displays, a base film for microfabrication, etc. Applied.
近年、これらの用途では、耐熱性を有し、可視光線のみならず紫外線領域の透明性が求められることが多くなっている。例えばCD−RやDVD−Rなどのような光記録メディアや平面ディスプレー、電子写真方式のプリンターなどでは、半導体レーザーや発光ダイオードなどが光源として使用されており、これらの光源の波長は短くするほど記録密度や解像度が向上することが知られていることから、短波長光源の開発が盛んになっており、これらのシステムで使用される被膜および光学レンズには、短波長光線に対する高い透過性が必要であった。 In recent years, these applications are often required to have heat resistance and transparency in the ultraviolet region as well as visible light. For example, in optical recording media such as CD-R and DVD-R, flat displays, electrophotographic printers, etc., semiconductor lasers, light emitting diodes, etc. are used as light sources. Since it is known that recording density and resolution are improved, development of short-wavelength light sources has become active, and coatings and optical lenses used in these systems have high transparency to short-wavelength light. It was necessary.
また、樹脂表面の防汚性・撥水性や、摩擦や摩耗に対する要求は、ますます厳しいものになってきている。例えば、摺動部品材料では金属や他のプラスチック材料との摩擦摺動により傷が生じたりする問題があり、低摩擦の材料が求められている。 In addition, the demands for antifouling and water repellency, friction and wear on the resin surface are becoming increasingly severe. For example, there is a problem that a sliding component material is scratched by frictional sliding with a metal or other plastic material, and a low friction material is required.
さらに、ポリアリレートを溶媒に溶解させて使用することが多いが、近年では環境への影響からジクロロメタンやクロロホルムなどの塩素系溶剤の使用が制限されており、より環境負荷の少ないシクロヘキサノンなどの非塩素系汎用溶剤に対する溶解性が求められている。 In addition, polyarylate is often used by dissolving it in a solvent, but in recent years, the use of chlorinated solvents such as dichloromethane and chloroform has been restricted due to environmental impact, and non-chlorine such as cyclohexanone with less environmental impact. There is a need for solubility in general-purpose solvents.
そのような中、さらに高いガラス転移温度を達成するために、ポリアリレートにおける酸成分に特定構造を含有したポリアリレートが知られている(例えば、特許文献1)。 Under such circumstances, in order to achieve a higher glass transition temperature, polyarylate containing a specific structure in the acid component in polyarylate is known (for example, Patent Document 1).
しかし、この樹脂は、耐熱性があるものの柔軟性に乏しいものであった。また、防汚性・撥水性が不十分であり、摩擦係数も高いものであった。さらに、溶解させる溶媒の種類に欠け、溶融粘度や溶液粘度は高くハンドリング性にも、欠けるものであった。
本発明は、耐熱性を維持しつつ、透明性や柔軟性があり、撥水性に優れ、摩擦係数が小さく、さらには、溶解性に優れ、溶液粘度が低くハンドリング性に優れた樹脂組成物を提供することを目的とする。 The present invention provides a resin composition having transparency and flexibility, excellent water repellency, a low coefficient of friction, excellent solubility, low solution viscosity and excellent handling properties while maintaining heat resistance. The purpose is to provide.
本発明者らは、このような課題を解決するために鋭意研究を重ねた結果、特定構造の酸成分から構成され、かつシロキサン構造を有するオルガノシロキサン共重合樹脂が、上記目的を達成できることを見出し、本発明に到達した。 As a result of intensive studies to solve such problems, the present inventors have found that an organosiloxane copolymer resin composed of an acid component having a specific structure and having a siloxane structure can achieve the above object. The present invention has been reached.
すなわち本発明の要旨は次のとおりである。 That is, the gist of the present invention is as follows.
(1)ジカルボン酸残基、(B)二価フェノール残基、および(C)オルガノシロキサン残基より構成され、界面重合によって得られるものであるオルガノシロキサン共重合樹脂であって、全ジカルボン酸に対し、60モル%以上の芳香族ジカルボン酸を含み、前記芳香族ジカルボン酸が、下記一般式(I)で示される芳香族ジカルボン酸であり、オルガノシロキサンが、下記一般式(II)で示されるオルガノシロキサンであり、樹脂中におけるオルガノシロキサン残基の割合が0.05質量%以上80質量%未満であることを特徴とするオルガノシロキサン共重合樹脂。
(1) An organosiloxane copolymer resin composed of a dicarboxylic acid residue, (B) a dihydric phenol residue, and (C) an organosiloxane residue, which is obtained by interfacial polymerization , comprising all dicarboxylic acids On the other hand, it contains 60 mol% or more of aromatic dicarboxylic acid, the aromatic dicarboxylic acid is an aromatic dicarboxylic acid represented by the following general formula (I), and the organosiloxane is represented by the following general formula (II). An organosiloxane copolymer resin which is an organosiloxane and has a ratio of organosiloxane residues in the resin of 0.05% by mass or more and less than 80% by mass.
(2)ジカルボン酸が、芳香族ジカルボン酸/脂肪族ジカルボン酸=60/40〜100/0(モル比)であることを特徴とする(1)に記載のオルガノシロキサン共重合樹脂。
(3)(1)または(2)に記載のオルガノシロキサン共重合樹脂を成形して得られる成型体、フィルム、コート被膜。
(2) The organosiloxane copolymer resin according to (1) , wherein the dicarboxylic acid is aromatic dicarboxylic acid / aliphatic dicarboxylic acid = 60/40 to 100/0 (molar ratio).
(3) A molded article, film, or coat film obtained by molding the organosiloxane copolymer resin according to (1) or (2) .
本発明によれば、特定構造を有する(A)ジカルボン酸残基、(B)二価フェノール残基、および(C)オルガノシロキサン残基よりなるオルガノシロキサン共重合樹脂は、耐熱性を維持しつつ、透明性や柔軟性があり、撥水性に優れ、摩擦係数が小さく、さらには、溶解性に優れ、溶液粘度が低くハンドリング性に優れたオルガノシロキサン共重合樹脂とすることができる。また、短波長領域での透明性にも優れるため、光学部品用途に好適なオルガノシロキサン共重合樹脂を提供することができる。 According to the present invention, an organosiloxane copolymer resin comprising (A) a dicarboxylic acid residue, (B) a dihydric phenol residue, and (C) an organosiloxane residue having a specific structure maintains heat resistance. The organosiloxane copolymer resin has transparency and flexibility, excellent water repellency, a small coefficient of friction, excellent solubility, low solution viscosity, and excellent handling properties. Moreover, since it is excellent also in transparency in a short wavelength region, an organosiloxane copolymer resin suitable for use in optical parts can be provided.
本発明のオルガノシロキサン共重合樹脂は、特定構造を有する(A)ジカルボン酸残基、(B)二価フェノール残基、および(C)オルガノシロキサン残基より構成される。 The organosiloxane copolymer resin of the present invention is composed of (A) a dicarboxylic acid residue, (B) a dihydric phenol residue, and (C) an organosiloxane residue having a specific structure.
本発明のオルガノシロキサン共重合樹脂を構成するジカルボン酸残基を与えるジカルボン酸としては、下記に示す一般式(I)で示すジフェニルエーテルジカルボン酸である必要があり、その具体例としては、ジフェニルエーテル−2,2’−ジカルボン酸、ジフェニルエーテル−2,3’−ジカルボン酸、ジフェニルエーテル−2,4’−ジカルボン酸、ジフェニルエーテル−3,3’−ジカルボン酸、ジフェニルエーテル−3,4’−ジカルボン酸、ジフェニルエーテル−4,4’−ジカルボン酸などのジフェニルエーテルジカルボン酸が挙げられる。中でも、耐熱性の優れている点から、ジフェニルエーテル−4,4’−ジカルボン酸が特に好ましく用いられる。 The dicarboxylic acid which gives the dicarboxylic acid residue constituting the organosiloxane copolymer resin of the present invention needs to be diphenyl ether dicarboxylic acid represented by the following general formula (I). Specific examples thereof include diphenyl ether-2. , 2'-dicarboxylic acid, diphenyl ether-2,3'-dicarboxylic acid, diphenyl ether-2,4'-dicarboxylic acid, diphenyl ether-3,3'-dicarboxylic acid, diphenyl ether-3,4'-dicarboxylic acid, diphenyl ether-4 And diphenyl ether dicarboxylic acid such as 4,4'-dicarboxylic acid. Of these, diphenyl ether-4,4'-dicarboxylic acid is particularly preferably used because of its excellent heat resistance.
本発明のオルガノシロキサン共重合樹脂に用いるジフェニルエーテルジカルボン酸は、オルガノシロキサン共重合樹脂を構成する全ジカルボン酸成分に対し60モル%以上配合する必要があり、耐熱性の向上、フィルムとした場合の350nmにおける透過性を向上させるためには90モル%以上であることがさらに好ましい。 The diphenyl ether dicarboxylic acid used in the organosiloxane copolymer resin of the present invention must be blended in an amount of 60 mol% or more based on the total dicarboxylic acid component constituting the organosiloxane copolymer resin, improving heat resistance, and 350 nm when used as a film. In order to improve the permeability at 90, it is more preferably 90 mol% or more.
本発明のオルガノシロキサン共重合樹脂に用いるジカルボン酸としては、芳香族ジカルボン酸としてジフェニルエーテルジカルボン酸を用いるほかに、他の芳香族ジカルボン酸、脂肪族ジカルボン酸を含んでもよい。具体的には、テレフタル酸、イソフタル酸、オルトフタル酸、2,6−ナフタレンジカルボン酸、ジフェン酸ビス(p−カルボキシフェニル)アルカン、ジフェニルエーテル−2,2’−ジカルボン酸、ジフェニルエーテル−2,3’−ジカルボン酸、ジフェニルエーテル−2,4’−ジカルボン酸、ジフェニルエーテル−3,3’−ジカルボン酸、ジフェニルエーテル−3,4’−ジカルボン酸、ジフェニルエーテル−4,4’−ジカルボン酸などの芳香族ジカルボン酸、シュウ酸、マロン酸、コハク酸、アジピン酸、セバシン酸などの脂肪族ジカルボン酸が挙げられる。 The dicarboxylic acid used in the organosiloxane copolymer resin of the present invention may include other aromatic dicarboxylic acids and aliphatic dicarboxylic acids in addition to using diphenyl ether dicarboxylic acid as the aromatic dicarboxylic acid. Specifically, terephthalic acid, isophthalic acid, orthophthalic acid, 2,6-naphthalenedicarboxylic acid, bis (p-carboxyphenyl) alkane diphenate, diphenyl ether-2,2′-dicarboxylic acid, diphenyl ether-2,3′- Aromatic dicarboxylic acids such as dicarboxylic acid, diphenyl ether-2,4′-dicarboxylic acid, diphenyl ether-3,3′-dicarboxylic acid, diphenyl ether-3,4′-dicarboxylic acid, diphenyl ether-4,4′-dicarboxylic acid, Examples thereof include aliphatic dicarboxylic acids such as acid, malonic acid, succinic acid, adipic acid, and sebacic acid.
他の脂肪族ジカルボン酸を配合する場合は、芳香族ジカルボン酸/脂肪族ジカルボン酸=60/40〜100/0(モル比)の範囲で混合することが必要であり、耐熱性のためには90/10〜100/0(モル比)が望ましい。脂肪族ジカルボン酸の配合が、40モル%を超える場合は、本願発明の耐熱性、引張伸度に優れるオルガノシロキサン共重合樹脂とすることができず好ましくない。 When blending other aliphatic dicarboxylic acids, it is necessary to mix in the range of aromatic dicarboxylic acid / aliphatic dicarboxylic acid = 60/40 to 100/0 (molar ratio). 90/10 to 100/0 (molar ratio) is desirable. When the amount of the aliphatic dicarboxylic acid exceeds 40 mol%, the organosiloxane copolymer resin excellent in heat resistance and tensile elongation of the present invention cannot be obtained, which is not preferable.
本発明では、上記一般式(I)で示される芳香族カルボン酸以外に、テレフタル酸、イソフタル酸、オルトフタル酸、2,6−ナフタレンジカルボン酸などの芳香族カルボン酸と共重合しても構わないが、これらのカルボン酸量は本発明の効果を損なわないために、全カルボン酸中の割合として40モル%未満とすることが必要である。 In the present invention, in addition to the aromatic carboxylic acid represented by the general formula (I), it may be copolymerized with an aromatic carboxylic acid such as terephthalic acid, isophthalic acid, orthophthalic acid, or 2,6-naphthalenedicarboxylic acid. However, in order not to impair the effects of the present invention, the amount of these carboxylic acids needs to be less than 40 mol% as a proportion in the total carboxylic acid.
本発明のオルガノシロキサン共重合樹脂を構成する二価フェノール残基を与えるニ価フェノールの具体例としては、1,1−ビス(4−ヒドロキシフェニル)メタン、1,1−ビス(4−ヒドロキシフェニル)エタン〔ビスフェノールAP〕、1,1−ビス(4−メチル−2−ヒドロキシフェニル)メタン、1,1−ビス(3,5−ジメチル−4−ヒドロキシフェニル)メタン、1,1−ビス(4−ヒドロキシフェニル)シクロヘキサン〔ビスフェノールZ〕、2,2−ビス(4−ヒドロキシフェニル)−4−メチルペンタン、2,2−ビス(4−ヒドロキシフェニル)プロパン〔ビスフェノールA〕、2,2−ビス(3−メチル−4−ヒドロキシフェニル)プロパン〔ビスフェノールC〕、2,2−ビス(3,5−ジメチル−4−ヒドロキシフェニル)プロパン〔TMBPA〕、1,1−ビス(4−ヒドロキシフェニル)−1−フェニルエタン〔AP〕、1,1−ビス(4−ヒドロキシフェニル)−2−エチルヘキサン、2,2−ビス(3−フェニル−4−ヒドロキシフェニル)プロパン、1,1−ビス(3−メチル−4−ヒドロキシフェニル)メタン、4,4’−ビフェノール、2,2−ビス(4−ヒドロキシフェニル)ブタン、1,1−ビス(4−ヒドロキシフェニル)−2−メチルプロパン、1,1−ビス(4−ヒドロキシフェニル)−1−フェニルメタン、2,2−ビス(4−ヒドロキシフェニル)オクタン、1,1−ビス(3−メチル−4−ヒドロキシフェニル)シクロヘキサン、2,2−ビス(3−アリル−4−ヒドロキシフェニル)プロパン、2,2−ビス(3−イソプロピル−4−ヒドロキシフェニル)プロパン、2,2−ビス(3−tert−ブチル−4−ヒドロキシフェニル)プロパン、2,2−ビス(3−sec−ブチル−4−ヒドロキシフェニル)プロパン、ビスフェノールフルオレン、1,1−ビス(2−メチル−4−ヒドロキシ−5−tert−ブチルフェニル)−2−メチルプロパン、4,4’−[1,4−フェニレン−ビス(2−プロピリデン)−ビス(3−メチル−4−ヒドロキシフェニル)]、1,1−ビス(3−フェニル−4−ヒドロキシフェニル)シクロヘキサン、4,4’−ジヒドロキシフェニルエーテル、ビス(2−ヒドロキシフェニル)メタン、2,4’−メチレンビスフェノール、ビス(3−メチル−4−ヒドロキシフェニル)メタン、ビス(4−ヒドロキシフェニル)プロパン、1,1−ビス(2−ヒドロキシ−5−メチルフェニル)エタン、1,1−ビス(4−ヒドロキシフェニル)−3−メチルブタン、ビス(2−ヒドロキシ−3,5−ジメチルフェニル)メタン、1,1−ビス(4−ヒドロキシフェニル)シクロペンタン、1,1−ビス(3−メチル−4−ヒドロキシフェニル)シクロペンタン、3,3−ビス(4−ヒドロキシフェニル)ペンタン、3,3−ビス(3−メチル−4−ヒドロキシフェニル)ペンタン、3,3−ビス(3,5−ジメチル−4−ヒドロキシフェニル)ペンタン、2,2−ビス(2−ヒドロキシ−3,5−ジメチルフェニル)プロパン、2,2−ビス(4−ヒドロキシフェニル)ノナン、1,1−ビス(3−メチル−4−ヒドロキシフェニル)−1−フェニルエタン、1,1−ビス(3,5−ジメチル−4−ヒドロキシフェニル)シクロヘキサン、2,2−ビス(4−ヒドロキシフェニル)デカン、1,1−ビス(4−ヒドロキシフェニル)デカン、ビス(2−ヒドロキシ−3−tert−ブチル−5−メチルフェニル)メタン、ビス(4−ヒドロキシフェニル)ジフェニルメタン、テルペンジフェノール、1,1−ビス(3−tert−ブチル−4−ヒドロキシフェニル)シクロヘキサン、1,1−ビス(2−メチル−4−ヒドロキシ−5−tert−ブチルフェニル)−2−メチルプロパン、2,2−ビス(3−シクロヘキシル−4−ヒドロキシフェニル)プロパン、1,1−ビス(3,5−ジtert−ブチル−4−ヒドロキシフェニル)メタン、1,1−ビス(3,5−ジsec−ブチル−4−ヒドロキシフェニル)メタン、1,1−ビス(3−シクロヘキシル−4−ヒドロキシフェニル)シクロヘキサン、1,1−ビス(2−ヒドロキシ−3,5−ジtert−ブチルフェニル)エタン、ビス(3−ノニル−4−ヒドロキシフェニル)メタン、2,2−ビス(3,5−ジtert−ブチル−4−ヒドロキシフェニル)プロパン、ビス(2−ヒドロキシ−3,5−ジtert−ブチル−6−メチルフェニル)メタン、1,1−ビス(3−フェニル−4−ヒドロキシフェニル)−1−フェニルエタン、ビス(3−フルオロ−4−ヒドロキシフェニル)メタン、ビス(2−ヒドロキシ−5−フルオロフェニル)メタン、2,2−ビス(4−ヒドロキシフェニル)−1,1,1,3,3,3−ヘキサフルオロプロパン、2,2−ビス(3−フルオロ−4−ヒドロキシフェニル)プロパン、ビス(3−フルオロ−4−ヒドロキシフェニル)−フェニルメタン、ビス(3ーフルオロ−4−ヒドロキシフェニル)−(p−フルオロフェニル)メタン、ビス(4−ヒドロキシフェニル)−(p−フルオロフェニル)メタン、2,2−ビス(3−クロロ−4−ヒドロキシ−5−メチルフェニル)プロパン、2,2−ビス(3,5−ジクロロ−4−ヒドロキシフェニル)プロパン、2,2−ビス(3−クロロ−4−ヒドロキシフェニル)プロパン、1,1−ビス(3,5−ジブロモ−4−ヒドロキシフェニル)メタン、2,2−ビス(3,5−ジブロモ−4−ヒドロキシフェニル)プロパン、2,2−ビス(3−ニトロ−4−ヒドロキシフェニル)プロパン、3,3’−ジメチル−4,4’−ビフェノール、3,3’,5,5’−テトラメチル−4,4’−ビフェノール〔TMBP〕、3,3’,5,5’−テトラtert−ブチル−4,4’−ビフェノール、ビス(4−ヒドロキシフェニル)ケトン、3,3’−ジフルオロ−4,4’−ビフェノール、3,3’,5,5’−テトラフルオロ−4,4’−ビフェノール、ビス(4−ヒドロキシフェニル)ジメチルシラン、ビス(3−メチル−4−ヒドロキシフェニル)エーテル、ビス(3,5−ジメチル−4−ヒドロキシフェニル)エーテル、ビス(2,3,5−トリメチル−4−ヒドロキシフェニル)−フェニルメタン、2,2−ビス(4−ヒドロキシフェニル)ドデカン、2,2−ビス(3−メチル−4−ヒドロキシフェニル)ドデカン、2,2−ビス(3,5−ジメチル−4−ヒドロキシフェニル)ドデカン、1,1−ビス(3−tert−ブチル−4−ヒドロキシフェニル)−1−フェニルエタン、1,1−ビス(3,5−ジtert−ブチル−4−ヒドロキシフェニル)−1−フェニルエタン、1,1−ビス(2−メチル−4−ヒドロキシ−5−シクロヘキシルフェニル)−2−メチルプロパン、1,1−ビス(2−ヒドロキシ−3,5−ジtert−ブチルフェニル)エタン、イサチンビスフェノール、イサチンビスクレゾール、2,2’,3,3’,5,5’−ヘキサメチル−4,4’−ビフェノール、ビス(2ーヒドロキシフェニル)メタン、2,4’−メチレンビスフェノール、1,2−ビス(4−ヒドロキシフェニル)エタン、2−(4−ヒドロキシフェニル)−2−(2−ヒドロキシフェニル)プロパン、ビス(2−ヒドロキシ−3−アリルフェニル)メタン、1,1−ビス(2−ヒドロキシ−3,5−ジメチルフェニル)−2−メチルプロパン、1,1−ビス(2ーヒドロキシ−5−tert−ブチルフェニル)エタン、ビス(2−ヒドロキシ−5−フェニルフェニル)メタン、1,1−ビス(2−メチル−4−ヒドロキシ−5−tert−ブチルフェニル)ブタン、ビス(2−メチル−4−ヒドロキシ−5−シクロヘキシルフェニル)メタン、2,2−ビス(4−ヒドロキシフェニル)ペンタデカン、2,2−ビス(3−メチル−4−ヒドロキシフェニル)ペンタデカン、2,2−ビス(3,5−ジメチル−4−ヒドロキシフェニル)ペンタデカン、1,2−ビス(3,5−ジtert−ブチル−4−ヒドロキシフェニル)エタン、ビス(2−ヒドロキシ−3,5−ジtert−ブチルフェニル)メタン、2,2−ビス(3−スチリル−4−ヒドロキシフェニル)プロパン、1,1−ビス(4−ヒドロキシフェニル)−1−(p−ニトロフェニル)エタン、ビス(3,5−ジフルオロ−4−ヒドロキシフェニル)メタン、ビス(3,5−ジフルオロ−4−ヒドロキシフェニル)フェニルメタン、ビス(3,5−ジフルオロ−4−ヒドロキシフェニル)ジフェニルメタン、ビス(3−フルオロ−4−ヒドロキシフェニル)ジフェニルメタン、2,2−ビス(3−クロロ−4−ヒドロキシフェニル)プロパン、3,3’,5,5’−テトラtert−ブチル−2,2’−ビフェノール、2,2’−ジアリル−4,4’−ビフェノール、1,1−ビス(4−ヒドロキシフェニル)−3,3,5−トリメチル−シクロヘキサン、1,1−ビス(4−ヒドロキシフェニル)−3,3,5,5−テトラメチル−シクロヘキサン、1,1−ビス(4−ヒドロキシフェニル)−3,3,4−トリメチル−シクロヘキサン、1,1−ビス(4−ヒドロキシフェニル)−3,3−ジメチル−5−エチル−シクロヘキサン、1,1−ビス(4−ヒドロキシフェニル)−3,3,5−トリメチル−シクロペンタン、1,1−ビス(3,5−ジメチル−4−ヒドロキシフェニル)−3,3,5−トリメチル−シクロヘキサン、1,1−ビス(3,5−ジフェニル−4−ヒドロキシフェニル)−3,3,5−トリメチル−シクロヘキサン、1,1−ビス(3−メチル−4−ヒドロキシフェニル)−3,3,5−トリメチル−シクロヘキサン、1,1−ビス(3−フェニル−4−ヒドロキシフェニル)−3,3,5−トリメチル−シクロヘキサン、1,1−ビス(3,5−ジクロロ−4−ヒドロキシフェニル)−3,3,5−トリメチル−シクロヘキサン、9,9−ビス(4−ヒドロキシフェニル)フルオレン、9、9−ビス(3−メチル−4−ヒドロキシフェニル)フルオレン、1,1−ビス(3,5−ジブロモ−4−ヒドロキシフェニル)−3,3,5−トリメチル−シクロヘキサン、ビス(4−ヒドロキシフェニル)スルホン、ビス(2−ヒドロキシフェニル)スルホン、ビス(3,5−ジメチル−4−ヒドロキシフェニル)スルホン、ビス(3,5−ジエチル−4−ヒドロキシフェニル)スルホン、ビス(3−メチル−4−ヒドロキシフェニル)スルホン、ビス(3−エチル−4−ヒドロキシフェニル)スルホン、ビス(4−ヒドロキシフェニル)スルフィド、ビス(3,5−ジメチル−4−ヒドロキシフェニル)スルフィド、ビス(3,5−ジエチル−4−ヒドロキシフェニル)スルフィド、ビス(3−メチル−4−ヒドロキシフェニル)スルフィド、ビス(3−エチル−4−ヒドロキシフェニル)スルフィド、2,4−ジヒドロキシジフェニルスルホンなどが挙げられる。 Specific examples of the dihydric phenol that gives the dihydric phenol residue constituting the organosiloxane copolymer resin of the present invention include 1,1-bis (4-hydroxyphenyl) methane and 1,1-bis (4-hydroxyphenyl). ) Ethane [bisphenol AP], 1,1-bis (4-methyl-2-hydroxyphenyl) methane, 1,1-bis (3,5-dimethyl-4-hydroxyphenyl) methane, 1,1-bis (4 -Hydroxyphenyl) cyclohexane [bisphenol Z], 2,2-bis (4-hydroxyphenyl) -4-methylpentane, 2,2-bis (4-hydroxyphenyl) propane [bisphenol A], 2,2-bis ( 3-methyl-4-hydroxyphenyl) propane [bisphenol C], 2,2-bis (3,5-dimethyl-4-hydroxy) Phenyl) propane [TMBPA], 1,1-bis (4-hydroxyphenyl) -1-phenylethane [AP], 1,1-bis (4-hydroxyphenyl) -2-ethylhexane, 2,2-bis ( 3-phenyl-4-hydroxyphenyl) propane, 1,1-bis (3-methyl-4-hydroxyphenyl) methane, 4,4′-biphenol, 2,2-bis (4-hydroxyphenyl) butane, 1, 1-bis (4-hydroxyphenyl) -2-methylpropane, 1,1-bis (4-hydroxyphenyl) -1-phenylmethane, 2,2-bis (4-hydroxyphenyl) octane, 1,1-bis (3-methyl-4-hydroxyphenyl) cyclohexane, 2,2-bis (3-allyl-4-hydroxyphenyl) propane, 2,2-bis (3- Sopropyl-4-hydroxyphenyl) propane, 2,2-bis (3-tert-butyl-4-hydroxyphenyl) propane, 2,2-bis (3-sec-butyl-4-hydroxyphenyl) propane, bisphenolfluorene, 1,1-bis (2-methyl-4-hydroxy-5-tert-butylphenyl) -2-methylpropane, 4,4 ′-[1,4-phenylene-bis (2-propylidene) -bis (3- Methyl-4-hydroxyphenyl)], 1,1-bis (3-phenyl-4-hydroxyphenyl) cyclohexane, 4,4′-dihydroxyphenyl ether, bis (2-hydroxyphenyl) methane, 2,4′-methylene Bisphenol, bis (3-methyl-4-hydroxyphenyl) methane, bis (4-hydroxyphenyl) ) Propane, 1,1-bis (2-hydroxy-5-methylphenyl) ethane, 1,1-bis (4-hydroxyphenyl) -3-methylbutane, bis (2-hydroxy-3,5-dimethylphenyl) methane 1,1-bis (4-hydroxyphenyl) cyclopentane, 1,1-bis (3-methyl-4-hydroxyphenyl) cyclopentane, 3,3-bis (4-hydroxyphenyl) pentane, 3,3- Bis (3-methyl-4-hydroxyphenyl) pentane, 3,3-bis (3,5-dimethyl-4-hydroxyphenyl) pentane, 2,2-bis (2-hydroxy-3,5-dimethylphenyl) propane 2,2-bis (4-hydroxyphenyl) nonane, 1,1-bis (3-methyl-4-hydroxyphenyl) -1-phenylethane, 1, -Bis (3,5-dimethyl-4-hydroxyphenyl) cyclohexane, 2,2-bis (4-hydroxyphenyl) decane, 1,1-bis (4-hydroxyphenyl) decane, bis (2-hydroxy-3- tert-butyl-5-methylphenyl) methane, bis (4-hydroxyphenyl) diphenylmethane, terpene diphenol, 1,1-bis (3-tert-butyl-4-hydroxyphenyl) cyclohexane, 1,1-bis (2 -Methyl-4-hydroxy-5-tert-butylphenyl) -2-methylpropane, 2,2-bis (3-cyclohexyl-4-hydroxyphenyl) propane, 1,1-bis (3,5-ditert- Butyl-4-hydroxyphenyl) methane, 1,1-bis (3,5-disec-butyl-4-hydroxy Phenyl) methane, 1,1-bis (3-cyclohexyl-4-hydroxyphenyl) cyclohexane, 1,1-bis (2-hydroxy-3,5-ditert-butylphenyl) ethane, bis (3-nonyl-4) -Hydroxyphenyl) methane, 2,2-bis (3,5-ditert-butyl-4-hydroxyphenyl) propane, bis (2-hydroxy-3,5-ditert-butyl-6-methylphenyl) methane, 1,1-bis (3-phenyl-4-hydroxyphenyl) -1-phenylethane, bis (3-fluoro-4-hydroxyphenyl) methane, bis (2-hydroxy-5-fluorophenyl) methane, 2,2 -Bis (4-hydroxyphenyl) -1,1,1,3,3,3-hexafluoropropane, 2,2-bis (3-fluoro-4 -Hydroxyphenyl) propane, bis (3-fluoro-4-hydroxyphenyl) -phenylmethane, bis (3-fluoro-4-hydroxyphenyl)-(p-fluorophenyl) methane, bis (4-hydroxyphenyl)-(p -Fluorophenyl) methane, 2,2-bis (3-chloro-4-hydroxy-5-methylphenyl) propane, 2,2-bis (3,5-dichloro-4-hydroxyphenyl) propane, 2,2- Bis (3-chloro-4-hydroxyphenyl) propane, 1,1-bis (3,5-dibromo-4-hydroxyphenyl) methane, 2,2-bis (3,5-dibromo-4-hydroxyphenyl) propane 2,2-bis (3-nitro-4-hydroxyphenyl) propane, 3,3′-dimethyl-4,4′-biphenol 3,3 ′, 5,5′-tetramethyl-4,4′-biphenol [TMBP], 3,3 ′, 5,5′-tetratert-butyl-4,4′-biphenol, bis (4-hydroxy Phenyl) ketone, 3,3′-difluoro-4,4′-biphenol, 3,3 ′, 5,5′-tetrafluoro-4,4′-biphenol, bis (4-hydroxyphenyl) dimethylsilane, bis ( 3-methyl-4-hydroxyphenyl) ether, bis (3,5-dimethyl-4-hydroxyphenyl) ether, bis (2,3,5-trimethyl-4-hydroxyphenyl) -phenylmethane, 2,2-bis (4-hydroxyphenyl) dodecane, 2,2-bis (3-methyl-4-hydroxyphenyl) dodecane, 2,2-bis (3,5-dimethyl-4-hydroxy) Enyl) dodecane, 1,1-bis (3-tert-butyl-4-hydroxyphenyl) -1-phenylethane, 1,1-bis (3,5-ditert-butyl-4-hydroxyphenyl) -1- Phenylethane, 1,1-bis (2-methyl-4-hydroxy-5-cyclohexylphenyl) -2-methylpropane, 1,1-bis (2-hydroxy-3,5-ditert-butylphenyl) ethane, Isatin bisphenol, isatin biscresol, 2,2 ′, 3,3 ′, 5,5′-hexamethyl-4,4′-biphenol, bis (2-hydroxyphenyl) methane, 2,4′-methylenebisphenol, 1,2-bis (4-hydroxyphenyl) ethane, 2- (4-hydroxyphenyl) -2- (2-hydroxyphenyl) propane, bis ( 2-hydroxy-3-allylphenyl) methane, 1,1-bis (2-hydroxy-3,5-dimethylphenyl) -2-methylpropane, 1,1-bis (2-hydroxy-5-tert-butylphenyl) Ethane, bis (2-hydroxy-5-phenylphenyl) methane, 1,1-bis (2-methyl-4-hydroxy-5-tert-butylphenyl) butane, bis (2-methyl-4-hydroxy-5- Cyclohexylphenyl) methane, 2,2-bis (4-hydroxyphenyl) pentadecane, 2,2-bis (3-methyl-4-hydroxyphenyl) pentadecane, 2,2-bis (3,5-dimethyl-4-hydroxy) Phenyl) pentadecane, 1,2-bis (3,5-ditert-butyl-4-hydroxyphenyl) ethane, bis (2-hydride) Xy-3,5-ditert-butylphenyl) methane, 2,2-bis (3-styryl-4-hydroxyphenyl) propane, 1,1-bis (4-hydroxyphenyl) -1- (p-nitrophenyl) ) Ethane, bis (3,5-difluoro-4-hydroxyphenyl) methane, bis (3,5-difluoro-4-hydroxyphenyl) phenylmethane, bis (3,5-difluoro-4-hydroxyphenyl) diphenylmethane, bis (3-Fluoro-4-hydroxyphenyl) diphenylmethane, 2,2-bis (3-chloro-4-hydroxyphenyl) propane, 3,3 ′, 5,5′-tetra-tert-butyl-2,2′-biphenol 2,2′-diallyl-4,4′-biphenol, 1,1-bis (4-hydroxyphenyl) -3,3,5- Limethyl-cyclohexane, 1,1-bis (4-hydroxyphenyl) -3,3,5,5-tetramethyl-cyclohexane, 1,1-bis (4-hydroxyphenyl) -3,3,4-trimethyl-cyclohexane 1,1-bis (4-hydroxyphenyl) -3,3-dimethyl-5-ethyl-cyclohexane, 1,1-bis (4-hydroxyphenyl) -3,3,5-trimethyl-cyclopentane, 1-bis (3,5-dimethyl-4-hydroxyphenyl) -3,3,5-trimethyl-cyclohexane, 1,1-bis (3,5-diphenyl-4-hydroxyphenyl) -3,3,5- Trimethyl-cyclohexane, 1,1-bis (3-methyl-4-hydroxyphenyl) -3,3,5-trimethyl-cyclohexane, 1,1-bis (3- Phenyl-4-hydroxyphenyl) -3,3,5-trimethyl-cyclohexane, 1,1-bis (3,5-dichloro-4-hydroxyphenyl) -3,3,5-trimethyl-cyclohexane, 9,9- Bis (4-hydroxyphenyl) fluorene, 9,9-bis (3-methyl-4-hydroxyphenyl) fluorene, 1,1-bis (3,5-dibromo-4-hydroxyphenyl) -3,3,5- Trimethyl-cyclohexane, bis (4-hydroxyphenyl) sulfone, bis (2-hydroxyphenyl) sulfone, bis (3,5-dimethyl-4-hydroxyphenyl) sulfone, bis (3,5-diethyl-4-hydroxyphenyl) Sulfone, bis (3-methyl-4-hydroxyphenyl) sulfone, bis (3-ethyl-4-hydroxyphenyl) Nyl) sulfone, bis (4-hydroxyphenyl) sulfide, bis (3,5-dimethyl-4-hydroxyphenyl) sulfide, bis (3,5-diethyl-4-hydroxyphenyl) sulfide, bis (3-methyl-4) -Hydroxyphenyl) sulfide, bis (3-ethyl-4-hydroxyphenyl) sulfide, 2,4-dihydroxydiphenylsulfone and the like.
上記の二価フェノールの中でも、工業的に入手しやすく、耐熱性や溶剤溶解性に優れている点から、2,2−ビス(4−ヒドロキシフェニル)プロパン〔ビスフェノールA〕、2,2−ビス(3−メチル−4−ヒドロキシフェニル)プロパン〔ビスフェノールC〕、2,2−ビス(3,5−ジメチル−4−ヒドロキシフェニル)プロパン〔TMビスフェノールA〕、2,2−ビス(3,5−ジメチル−4−ヒドロキシフェニル)メタン〔TMビスフェノールF〕、1,1−ビス(4−ヒドロキシフェニル)−1−フェニルエタン〔ビスフェノールAP〕、1,1−ビス(4−ヒドロキシフェニル)シクロヘキサン〔ビスフェノールZ〕が好ましい。これらは1種だけ用いても、2種以上を併用してもよい。 Among the above-mentioned dihydric phenols, 2,2-bis (4-hydroxyphenyl) propane [bisphenol A] and 2,2-bis are industrially available and excellent in heat resistance and solvent solubility. (3-methyl-4-hydroxyphenyl) propane [bisphenol C], 2,2-bis (3,5-dimethyl-4-hydroxyphenyl) propane [TM bisphenol A], 2,2-bis (3,5- Dimethyl-4-hydroxyphenyl) methane [TM bisphenol F], 1,1-bis (4-hydroxyphenyl) -1-phenylethane [bisphenol AP], 1,1-bis (4-hydroxyphenyl) cyclohexane [bisphenol Z ] Is preferable. These may be used alone or in combination of two or more.
中でも、側鎖にメチル基を有する二価フェノールとして、2,2−ビス(3−メチル−4−ヒドロキシフェニル)プロパン〔ビスフェノールC〕、2,2−ビス(3,5−ジメチル−4−ヒドロキシフェニル)プロパン〔TMビスフェノールA〕は、溶媒に溶解し、塗工液とした場合に、溶液濃度を下げずに溶液粘度を下げられるために、溶液粘度を低く抑えることができ、塗工時のハンドリングが向上し、特に好ましい。 Among them, 2,2-bis (3-methyl-4-hydroxyphenyl) propane [bisphenol C], 2,2-bis (3,5-dimethyl-4-hydroxy) are used as dihydric phenols having a methyl group in the side chain. When phenyl) propane [TM bisphenol A] is dissolved in a solvent and used as a coating solution, the solution viscosity can be lowered without lowering the solution concentration, so that the solution viscosity can be kept low. Handling is improved, which is particularly preferable.
本発明のオルガノシロキサン共重合樹脂を構成するオルガノシロキサンは、下記一般式(II)、(III)で示される。 The organosiloxane constituting the organosiloxane copolymer resin of the present invention is represented by the following general formulas (II) and (III).
上記一般式(II)中R1及びR2は、同一でも異なっていても良く、炭素原子数が1〜12個の脂肪族基または芳香族基である。R3、R4、R5およびR6は、すべて同一でも異なっていても良い脂肪族基または芳香族の基である。mは5以上の整数であり、X1およびX2は一般式(III)のいずれかの基である。一般式(III)中、R10は炭素原子数が1〜5個の脂肪族基または芳香族基であり、sは0〜4の整数である。 In the general formula (II), R 1 and R 2 may be the same or different and are an aliphatic group or an aromatic group having 1 to 12 carbon atoms. R 3 , R 4 , R 5 and R 6 are all aliphatic groups or aromatic groups which may be the same or different. m is an integer of 5 or more, and X 1 and X 2 are any group of the general formula (III). In the general formula (III), R 10 is 1-5 aliphatic group or an aromatic group carbon atoms, s is an integer of 0-4.
オルガノシロキサン構造のシロキサン長を示す上記一般式(II)におけるmは20以上である。mが4以下のときは耐熱性が低下し、250を超えるときは、オルガノシロキサンの粘度増加や溶解性低下のため重合時のハンドリング性が低下したり、得られるオルガノシロキサン共重合樹脂の透明性が低下したりすることがある。
In the above general formula (II) indicating the siloxane length of the organosiloxane structure, m is 20 or more . When m is 4 or less, the heat resistance is lowered, and when it exceeds 250, the handling property at the time of polymerization is lowered due to the increase in viscosity or solubility of the organosiloxane, or the transparency of the resulting organosiloxane copolymer resin. May decrease.
オルガノシロキサン共重合樹脂中における、上記一般式(II)で示されるオルガノシロキサン残基の含有量は、0.05質量%以上80質量%以下であり、好ましくは0.05質量%以上50質量%以下であり、特に好ましくは1質量%以上30質量%以下である。0.05質量%未満の場合は、樹脂の弾性率を低下させ柔軟性を付与したり、摩擦係数の低下、撥水性などシロキサン導入による効果が不十分となることがあり、80質量%を超えるときは耐熱性が不足する場合がある。 In the organosiloxane copolymer resin, the content of the organosiloxane residue represented by the general formula (II) is from 0.05% by mass to 80% by mass, preferably from 0.05% by mass to 50% by mass. Or less, and particularly preferably 1% by mass or more and 30% by mass or less. If it is less than 0.05% by mass, the elasticity of the resin may be lowered to give flexibility, or the effect of introducing siloxanes such as a reduction in friction coefficient and water repellency may be insufficient, exceeding 80% by mass. Sometimes heat resistance may be insufficient.
なお、オルガノシロキサン共重合樹脂中における一般式(II)で示されるオルガノシロキサン残基の含有するモル比は、好ましくは0.001モル%以上、25モル%以下であり、特に好ましくは、0.01モル%以上、10モル%未満である。0.001モル%未満の場合は、撥水性などシロキサン導入による効果が不十分となることがあり、25モル%を超えるときは耐熱性が不足することがある。 The molar ratio of the organosiloxane residue represented by the general formula (II) in the organosiloxane copolymer resin is preferably 0.001 mol% or more and 25 mol% or less, and particularly preferably 0.001 mol% or less. It is 01 mol% or more and less than 10 mol%. When the amount is less than 0.001 mol%, the effect of introducing siloxane such as water repellency may be insufficient, and when it exceeds 25 mol%, the heat resistance may be insufficient.
本発明のオルガノシロキサン共重合樹脂のカルボキシル価およびアミン価は、それぞれ100mol/t以下とすることが必要であり、好ましくは50mol/t以下であり、最適には30mol/t以下である。カルボキシル価およびアミン価がそれぞれ100mol/tを超えると、加水分解しやすくなったり、溶融成型後に着色が見られたり、樹脂の絶縁破壊電圧、耐アーク性や誘電率等の電気的特性が悪化したりする傾向がある。また、樹脂を溶媒に溶解して塗工液とした場合、溶液の保存安定性が低下する傾向にある。塗工液の保存安定性が低下すると、時間の経過とともに、白濁したり沈澱、不溶物が生じたり、増粘してゲル化したりして、その結果として均一な被膜が形成できなくなり、被膜の機械特性や電気的特性が低下する場合がある。 The carboxyl value and amine value of the organosiloxane copolymer resin of the present invention must be 100 mol / t or less, preferably 50 mol / t or less, and optimally 30 mol / t or less. When the carboxyl value and amine value each exceed 100 mol / t, hydrolysis easily occurs, coloring is observed after melt molding, and electrical characteristics such as dielectric breakdown voltage, arc resistance and dielectric constant of the resin deteriorate. There is a tendency to. In addition, when a resin is dissolved in a solvent to form a coating solution, the storage stability of the solution tends to decrease. If the storage stability of the coating solution decreases, it will become cloudy, precipitate, insoluble, or thicken and gel with time, resulting in the formation of a uniform film. Mechanical and electrical characteristics may be degraded.
本発明のオルガノシロキサン共重合樹脂の分子量は、重量平均分子量Mwを指標として表すことができ、重量平均分子量Mwは30,000〜300,000が好ましく、より好ましくは50,000〜200,00である。重量平均分子量Mwが30,000未満では、樹脂の強度が不足する場合がある。一方、重量平均分子量Mwが300,000を超えると、高粘度のため取扱いが困難になる傾向がある。樹脂の分子量は、製造に際して、後述する末端封止剤の添加量によって制御することができる。 The molecular weight of the organosiloxane copolymer resin of the present invention can be expressed by using the weight average molecular weight Mw as an index, and the weight average molecular weight Mw is preferably 30,000 to 300,000, more preferably 50,000 to 200,00. is there. If the weight average molecular weight Mw is less than 30,000, the strength of the resin may be insufficient. On the other hand, when the weight average molecular weight Mw exceeds 300,000, it tends to be difficult to handle due to high viscosity. The molecular weight of the resin can be controlled by the addition amount of the end-capping agent described later during the production.
本発明のオルガノシロキサン共重合樹脂を製造する方法としては、重合性や、得られた樹脂の外観の点から、有機溶媒中での反応、特には低温で反応をおこなうことができる界面重合法によって製造することが必要である。 As a method for producing the organosiloxane copolymer resin of the present invention, the polymerizable and, from the appearance of the obtained resin point, the reaction in organic solvents, especially by interfacial polymerization method capable of performing a reaction at a low temperature It is necessary to manufacture.
界面重合法とは、水と相溶しない有機溶剤に溶解させた二価カルボン酸ハライドと、アルカリ水溶液に溶解させた二価フェノールとを混合することによってポリエステルを得る重合方法である。界面重合法に関する文献として、W.M.EARECKSON J.Poly.Sci.XL399 1959年や、特公昭40−1959号公報などが挙げられる。界面重合法は溶液重合法と比較すると、反応が速いため、酸ハライドの加水分解を抑えることができ、結果として高分子量の樹脂を得ることができる。 The interfacial polymerization method is a polymerization method for obtaining a polyester by mixing a divalent carboxylic acid halide dissolved in an organic solvent incompatible with water and a dihydric phenol dissolved in an alkaline aqueous solution. As literature on the interfacial polymerization method, W.W. M.M. EARECKSON J. Poly. Sci. XL399 1959, Japanese Examined Patent Publication No. 40-1959, and the like. Since the interfacial polymerization method is faster than the solution polymerization method, hydrolysis of the acid halide can be suppressed, and as a result, a high molecular weight resin can be obtained.
界面重合法についてさらに詳細に例示する。まず、水相として、二価フェノールのアルカリ水溶液を調製し、続いて、重合触媒を添加する。次に、有機相として、水と相溶せず樹脂を溶解する有機溶媒にオルガノシロキサンを溶解させ、この溶液を先のアルカリ溶液に混合する。一方で、この混合液とは別に、有機溶媒に二価カルボン酸ハライドを溶解させ、この溶液を先のアルカリ・有機溶媒混合溶液にさらに添加することにより、オルガノシロキサン共重合樹脂を重合する。 The interfacial polymerization method will be illustrated in more detail. First, an aqueous alkali solution of a dihydric phenol is prepared as an aqueous phase, and then a polymerization catalyst is added. Next, as an organic phase, an organosiloxane is dissolved in an organic solvent that is incompatible with water and dissolves a resin, and this solution is mixed with the previous alkaline solution. On the other hand, an organosiloxane copolymer resin is polymerized by dissolving a divalent carboxylic acid halide in an organic solvent separately from this mixed solution and further adding this solution to the previous alkali / organic solvent mixed solution.
重合条件としては、好ましくは50℃以下の温度で1時間〜8時間撹拌しながら重合反応をおこなうことによって所望の樹脂溶液を得ることができる。 As the polymerization conditions, a desired resin solution can be obtained by conducting a polymerization reaction while stirring preferably at a temperature of 50 ° C. or lower for 1 to 8 hours.
界面重合において二価フェノール水溶液を調製する際に用いられるアルカリとしては、水酸化ナトリウムや水酸化カリウムなどが挙げられる。 Examples of the alkali used when preparing the dihydric phenol aqueous solution in the interfacial polymerization include sodium hydroxide and potassium hydroxide.
本発明の樹脂の末端は、一価フェノール、一価酸クロライド、一価アルコール、一価カルボン酸などで封止されていてもよい。そのような末端封止剤として用いられる一価フェノールとしては、フェノール、o−クレゾール、m−クレゾール、p−クレゾール、p−tert−ブチルフェノール、o−フェニルフェノール、m−フェニルフェノール、p−フェニルフェノール、o−メトキシフェノール、m−メトキシフェノール、p−メトキシフェノール、2,3,6−トリメチルフェノール、2,3−キシレノール、2,4−キシレノール、2,5−キシレノール、2,6−キシレノール、3,4−キシレノール、3,5−キシレノール、2−フェニル−2−(4−ヒドロキシフェニル)プロパン(「p−(α−クミル)フェノール)」と記すことがある。)2−フェニル−2−(2−ヒドロキシフェニル)プロパン、2−フェニル−2−(3−ヒドロキシフェニル)プロパンなどが挙げられ、一価酸クロライドとしては、ベンゾイルクロライド、安息香酸クロライド、メタンスルホニルクロライド、フェニルクロロホルメートなどが挙げられ、一価アルコールとしては、メタノール、エタノール、n−プロパノール、イソプロパノール、n−ブタノール、2−ブタノール、ペンタノール、ヘキサノール、ドデシルアルコール、ステアリルアルコール、ベンジルアルコール、フェネチルアルコールなどが挙げられ、一価カルボン酸としては、酢酸、プロピオン酸、オクタン酸、シクロヘキサンカルボン酸、安息香酸、トルイル酸、フェニル酢酸、p−tert−ブチル安息香酸、p−メトキシフェニル酢酸などが挙げられる。これらの中でも、好ましい末端封止剤としては、p−tert−ブチルフェノールが挙げられる。 The terminal of the resin of the present invention may be sealed with monohydric phenol, monohydric acid chloride, monohydric alcohol, monohydric carboxylic acid or the like. Examples of monohydric phenols used as such end capping agents include phenol, o-cresol, m-cresol, p-cresol, p-tert-butylphenol, o-phenylphenol, m-phenylphenol, and p-phenylphenol. O-methoxyphenol, m-methoxyphenol, p-methoxyphenol, 2,3,6-trimethylphenol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3 , 4-xylenol, 3,5-xylenol, 2-phenyl-2- (4-hydroxyphenyl) propane (“p- (α-cumyl) phenol)”. ) 2-phenyl-2- (2-hydroxyphenyl) propane, 2-phenyl-2- (3-hydroxyphenyl) propane and the like, and monovalent acid chlorides include benzoyl chloride, benzoic acid chloride, and methanesulfonyl chloride. , Phenyl chloroformate, etc., and monohydric alcohols include methanol, ethanol, n-propanol, isopropanol, n-butanol, 2-butanol, pentanol, hexanol, dodecyl alcohol, stearyl alcohol, benzyl alcohol, phenethyl alcohol. Monovalent carboxylic acids include acetic acid, propionic acid, octanoic acid, cyclohexanecarboxylic acid, benzoic acid, toluic acid, phenylacetic acid, p-tert-butylbenzoic acid, p-methoxyphene Etc. Le acetic acid. Among these, a preferable end-capping agent includes p-tert-butylphenol.
界面重合の重合触媒としては、トリブチルベンジルアンモニウムハライド、テトラブチルアンモニウムハライド、トリメチルベンジルアンモニウムハライド、トリエチルベンジルアンモニウムハライドなどの第四級アンモニウム塩や、トリブチルベンジルホスホニウムハライド、テトラブチルホスホニウムハライド、トリメチルベンジルホスホニウムハライド、トリエチルベンジルホスホニウムハライドなどの第四級ホスホニウム塩が挙げられるが、中でも、重合を促進しやすく、樹脂中に含有する二価カルボン酸量を300ppm以下にしやすい点で、トリブチルベンジルアンモニウムハライド、テトラブチルアンモニウムハライド、トリブチルベンジルホスホニウムハライド、テトラブチルホスホニウムハライドが好ましい。 Interfacial polymerization catalysts include quaternary ammonium salts such as tributylbenzylammonium halide, tetrabutylammonium halide, trimethylbenzylammonium halide, triethylbenzylammonium halide, tributylbenzylphosphonium halide, tetrabutylphosphonium halide, trimethylbenzylphosphonium halide. And quaternary phosphonium salts such as triethylbenzylphosphonium halide. Among them, tributylbenzylammonium halide, tetrabutyl are preferable in that the polymerization is easily promoted and the amount of divalent carboxylic acid contained in the resin is easily reduced to 300 ppm or less. Ammonium halide, tributylbenzylphosphonium halide, and tetrabutylphosphonium halide are preferred.
界面重合における有機相の溶媒としては、ジクロロメタン、1,2−ジクロロエタン、クロロホルム、四塩化炭素、クロロベンゼン、1,1,2,2−テトラクロロエタン、1,1,1−トリクロロエタン、o−ジクロロベンゼン、m−ジクロロベンゼン、p−ジクロロベンゼンなどのハロゲン化炭化水素系溶媒、トルエン、ベンゼン、キシレンなどの芳香族系炭化水素、シクロヘキサノン、シクロヘプタノンなどのケトン系溶媒を用いることができるが、重合性の観点から、ジクロロメタン、クロロホルム、トルエン、シクロヘキサノンなどが好適に使用される。 As the organic phase solvent in the interfacial polymerization, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, chlorobenzene, 1,1,2,2-tetrachloroethane, 1,1,1-trichloroethane, o-dichlorobenzene, Halogenated hydrocarbon solvents such as m-dichlorobenzene and p-dichlorobenzene, aromatic hydrocarbons such as toluene, benzene and xylene, and ketone solvents such as cyclohexanone and cycloheptanone can be used. From this viewpoint, dichloromethane, chloroform, toluene, cyclohexanone and the like are preferably used.
重合後に得られた樹脂溶液に酢酸を添加し、重合を終了したあと、樹脂溶液を水で繰返し洗浄し、樹脂溶液に含まれるナトリウムやカリウム、および重合触媒などのイオン性成分を除去する。洗浄に使用する水は、酸性であっても、塩基性であっても構わないが、洗浄廃液水が、中性になるまで繰返し洗浄することが望ましい。 Acetic acid is added to the resin solution obtained after the polymerization, and after the polymerization is completed, the resin solution is repeatedly washed with water to remove ionic components such as sodium and potassium and a polymerization catalyst contained in the resin solution. The water used for washing may be acidic or basic, but it is desirable to wash repeatedly until the washing waste water becomes neutral.
ここで得られたオルガノシロキサン共重合樹脂溶液を、貧溶媒に添加することによりポリマーを析出させる(再沈殿)。ここで用いられる貧溶媒としては、特に限定はされないがメタノール、エタノール、イソプロピルアルコールなどのアルコール類やヘキサンなどの炭化水素などが好適に用いられる。析出で得られたポリマー固形分はろ過などで単離し、その後に乾燥させることにより固形分を得ることができる。 The organosiloxane copolymer resin solution obtained here is added to a poor solvent to precipitate a polymer (reprecipitation). Although it does not specifically limit as a poor solvent used here, Hydrocarbons, such as alcohols, such as methanol, ethanol, and isopropyl alcohol, hexane, etc. are used suitably. The polymer solid content obtained by the precipitation can be isolated by filtration or the like, and then dried to obtain the solid content.
本願発明のオルガノシロキサン共重合樹脂は、得られた樹脂単独で用いても良いし、または、2種類以上を混合して用いても良い。 The organosiloxane copolymer resin of the present invention may be used alone or in combination of two or more.
本願発明のオルガノシロキサン共重合樹脂は、耐熱性を維持しつつ、透明性や柔軟性があり、紫外線による色変化が抑制され、撥水性に優れ、摩擦係数が小さく、電気的特性(絶縁性、誘電特性等)に優れるため、コンデンサ等の電子部品用フィルム、液晶表示装置、プラズマディスプレイ、有機EL用の位相差フィルム、偏光フィルム、反射防止フィルム、視野角拡大フィルム、高輝度フィルム、拡散フィルム、導光フィルム等の光学フィルム、およびそのコート層や積層体、ITO膜等を付与したタッチパネル、微細加工用のベースフィルム、スピーカーなどの音響機器用振動板などに用いることができる。 The organosiloxane copolymer resin of the present invention has transparency and flexibility while maintaining heat resistance, color change due to ultraviolet rays is suppressed, water repellency is excellent, the friction coefficient is small, and electrical characteristics (insulating properties, Excellent dielectric properties, etc.) Films for electronic parts such as capacitors, liquid crystal display devices, plasma displays, retardation films for organic EL, polarizing films, antireflection films, wide viewing angle films, high brightness films, diffusion films, It can be used for optical films such as light guide films, coating layers and laminates thereof, touch panels provided with ITO films, etc., base films for fine processing, diaphragms for acoustic devices such as speakers, and the like.
また、溶解性に優れ、溶液粘度が低くハンドリング性に優れるため、溶媒に溶かし塗膜として形成させることができ、電子回路基板、液晶ドライバ、ワイヤーハーネス等の絶縁保護被膜として用いることができる。 Moreover, since it is excellent in solubility and has low solution viscosity and excellent handling properties, it can be dissolved in a solvent and formed as a coating film, and can be used as an insulating protective coating for electronic circuit boards, liquid crystal drivers, wire harnesses and the like.
また、短波長領域での透明性にも優れるため、CD−RやDVD−Rなどのような光記録メディアや平面ディスプレー、電子写真方式の感光体バインダー、光学レンズなどに用いられるほかに、半導体レーザーや発光ダイオードなどの光源材料として使用することができ、特に350nm近傍の短波長の紫外線の透過性に優れるため、次世代の高密度な光記録メディア等に使用することが可能である。 In addition, because it has excellent transparency in the short wavelength region, it is used for optical recording media such as CD-R and DVD-R, flat displays, electrophotographic photoreceptor binders, optical lenses, and other semiconductors. It can be used as a light source material such as a laser or a light-emitting diode, and is particularly excellent in the transmittance of ultraviolet rays having a short wavelength of around 350 nm, so that it can be used for next-generation high-density optical recording media.
次に、本発明を実施例、比較例によって具体的に説明する。 Next, the present invention will be specifically described with reference to examples and comparative examples.
なお、実施例においては、下記一般式(IV)〜(VII)の構造を有するオルガノシロキサンを用いた。使用したオルガノシロキサンの分子量、mの関係を表1に示す。 In the examples, organosiloxanes having the structures of the following general formulas (IV) to (VII) were used. Table 1 shows the relationship between the molecular weight and m of the organosiloxane used.
得られたオルガノシロキサン共重合樹脂に対して、各種評価を以下の方法に従って行なった。 Various evaluations were performed on the obtained organosiloxane copolymer resin according to the following methods.
1.樹脂特性
(樹脂組成)
日本電子製Lambda300WB NMRを用い1Hを測定核とし、測定周波数300MHzで測定を行った。
(分子量)
ウォーターズ社製GPCシステム(1515HPLCポンプおよび2414示差屈折計)、検出器として2410 RI、カラムとしてMixed-D(充填シリカゲル粒径5μm、チューブ長さ300x内径7.5mm)を用い、溶媒クロロホルムを流速1ml/分として、ポリスチレン換算で、重量平均分子量を測定した。
(Tg)
樹脂15mgをサンプルとし、DSC(示差走査熱量測定)装置(パーキンエルマー社製DSC7)を用いて、−80℃から300℃までを、昇温速度10℃/分の条件で測定を行い、得られた昇温曲線中のガラス転移に由来する2つの折曲点の温度の中間値を求め、これをガラス転移温度とした。
(溶解性)
樹脂10質量部に対してシクロヘキサノンまたはクロロホルム90質量部を加え、25℃において24時間攪拌し、ゲル物などの不溶物が発生せずに樹脂が溶解したかを判断した。両溶媒に溶解したものを○、クロロホルムのみに溶解したものを△、両溶媒ともに溶解なかったものを×とした。ここでは、環境負荷の低い塗工液の汎用溶媒であるシクロヘキサノンを用いた。
(溶液粘度)
N−メチルピロリドンを溶媒とし、樹脂固形分12%のポリマー溶液を作製し、25℃での溶液粘度を測定した。ここでは、測定時のポリマー溶液の濃度変化を抑制するため、揮発性の低いN−メチルピロリドンを用いた。
(カルボキシル価)
試験管に樹脂0.15gを精秤し、ベンジルアルコール5mlに加熱溶解した。クロロホルム10mlと前記の樹脂のベンジルアルコール溶液とを混合した後、フェノールレッドを指示薬として加え、撹拌しながら0.1N−KOHベンジルアルコール溶液で中和滴定を行なってカルボキシル価を求めた。
(アミン価)
樹脂0.5gをm−クレゾール20mlに60℃で溶解した後、室温まで冷却し、0.1N p−トルエンスルホン酸水溶液で滴定を行うことにより求めた。
1. Resin properties (resin composition)
Measurement was performed at a measurement frequency of 300 MHz using 1 H as a measurement nucleus using Lambda 300WB NMR manufactured by JEOL.
(Molecular weight)
Waters GPC system (1515 HPLC pump and 2414 differential refractometer), 2410 RI as detector, Mixed-D (packed silica gel particle size 5 μm, tube length 300 x inner diameter 7.5 mm) as column, solvent chloroform flow rate 1 ml / As a minute, the weight average molecular weight was measured in terms of polystyrene.
(Tg)
Using 15 mg of resin as a sample, using a DSC (Differential Scanning Calorimetry) apparatus (DSC7 manufactured by PerkinElmer Co., Ltd.), measurement is performed from −80 ° C. to 300 ° C. under a temperature rising rate of 10 ° C./min An intermediate value of the temperatures of two bending points derived from the glass transition in the temperature rising curve was determined, and this was taken as the glass transition temperature.
(Solubility)
90 parts by mass of cyclohexanone or chloroform was added to 10 parts by mass of the resin, and the mixture was stirred at 25 ° C. for 24 hours. A sample dissolved in both solvents was marked with ◯, a sample dissolved only in chloroform was marked with Δ, and a sample dissolved in both solvents was marked with ×. Here, cyclohexanone, which is a general-purpose solvent for a coating solution having a low environmental load, was used.
(Solution viscosity)
A polymer solution having a resin solid content of 12% was prepared using N-methylpyrrolidone as a solvent, and the solution viscosity at 25 ° C. was measured. Here, N-methylpyrrolidone having low volatility was used in order to suppress a change in the concentration of the polymer solution during measurement.
(Carboxyl value)
In a test tube, 0.15 g of resin was precisely weighed and dissolved in 5 ml of benzyl alcohol by heating. After mixing 10 ml of chloroform and a benzyl alcohol solution of the above resin, phenol red was added as an indicator, and neutralization titration was performed with a 0.1 N KOH benzyl alcohol solution while stirring to obtain a carboxyl value.
(Amine number)
The resin 0.5 g was dissolved in 20 ml of m-cresol at 60 ° C., cooled to room temperature, and titrated with a 0.1 N p-toluenesulfonic acid aqueous solution.
2.フィルム特性
上記で得られたオルガノシロキサン共重合樹脂に対して、樹脂15質量部にジクロロメタン85質量部を加えて作製した溶液を用い、PETフィルム上に溶液流延塗布を行い100μmの塗膜を作製した。得られた塗膜について、減圧にて120℃24時間乾燥して、樹脂フィルムを作製した。そして、以下の評価を行なった。ここでは、樹脂の溶解性に優れ、塗膜形成後に溶媒除去を行いやすい塩化メチレンを用いた。
(透過率)
日立製作所製U−4000形自記分光光度計を用い、得られた100μmの樹脂フィルムを、波長350nmおよび450nmにおける光線透過率を測定し 、透過率50%以上を合格とした。
(引張弾性率・引張伸度)
得られた100μmの樹脂フィルムで、インテスコ社 引張圧縮試験機を用い、JIS K-2318に準拠し、引張弾性率と、破断点での引張伸度を測定した。
(接触角)
得られた100μmの樹脂フィルムで、JIS R 3257に準拠し、協和界面科学社製接触角計CA−DT・A型を用いて、20℃×50%RHの環境下で、50μmの樹脂フィルムに対し、純水を滴下することで接触角の測定を行った。接触角が大きいほど、撥水性が高いことを示す。
(摩擦係数)
得られた100μmの樹脂フィルムで、協和界面科学製TS501を用い、SUS製の線状接触子を用いて、荷重50g、速度100m/秒で測定した。
2. Film characteristics Using the solution prepared by adding 85 parts by mass of dichloromethane to 15 parts by mass of the resin to the organosiloxane copolymer resin obtained above, solution casting was performed on a PET film to produce a 100 μm coating film. did. About the obtained coating film, it dried at 120 degreeC under reduced pressure for 24 hours, and produced the resin film. And the following evaluation was performed. Here, methylene chloride, which is excellent in resin solubility and easily removes the solvent after forming the coating film, was used.
(Transmittance)
Using a U-4000 self-recording spectrophotometer manufactured by Hitachi, Ltd., the light transmittance at wavelengths of 350 nm and 450 nm was measured for the obtained 100 μm resin film, and the transmittance was determined to be 50% or more.
(Tensile modulus / tensile elongation)
With the obtained 100 μm resin film, the tensile elastic modulus and the tensile elongation at the breaking point were measured according to JIS K-2318 using an Intesco tensile / compression tester.
(Contact angle)
With the obtained 100 μm resin film, in accordance with JIS R 3257, using a contact angle meter CA-DT • A type manufactured by Kyowa Interface Science Co., Ltd., in an environment of 20 ° C. × 50% RH, to a 50 μm resin film On the other hand, the contact angle was measured by dropping pure water. A larger contact angle indicates higher water repellency.
(Coefficient of friction)
The obtained 100 μm resin film was measured at a load of 50 g and a speed of 100 m / sec using a TS501 made by Kyowa Interface Science and using a linear contact made of SUS.
製造例1
攪拌装置を備えた反応容器中に、二価フェノール成分として2,2−ビス(4−ヒドロキシフェニル)プロパン19.57質量部(96.5モル部)、末端封止剤としてp−tert−ブチルフェノール(PTBP)0.40質量部(3.0モル部)、アルカリとして水酸化ナトリウム10.82質量部(300モル部)、重合触媒としてベンジル−トリ−n−ブチルアンモニウムクロライド(BTBAC)0.38質量部、ハイドロサルファイトナトリウム(SHS)0.16質量部を仕込み、水1000質量部に溶解した(水相)。また、これとは別に、塩化メチレン200質量部に、下記式(IV)で示すオルガノシロキサン9.94質量部(3.5モル部)を溶解した(有機相1)。この有機相1を、先に調製した水相中に強攪拌下で添加し、そのまま15℃で30分間攪拌した。
Production Example 1
In a reaction vessel equipped with a stirrer, 19.57 parts by mass (96.5 mol parts) of 2,2-bis (4-hydroxyphenyl) propane as a dihydric phenol component and p-tert-butylphenol as an end-capping agent (PTBP) 0.40 parts by mass (3.0 mol parts), sodium hydroxide 10.82 parts by mass (300 mol parts), and polymerization catalyst benzyl-tri-n-butylammonium chloride (BTBAC) 0.38 A mass part and 0.16 mass part of hydrosulfite sodium (SHS) were prepared, and it melt | dissolved in 1000 mass parts of water (water phase). Separately from this, 9.94 parts by mass (3.5 mol parts) of an organosiloxane represented by the following formula (IV) was dissolved in 200 parts by mass of methylene chloride (organic phase 1). This organic phase 1 was added to the previously prepared aqueous phase under strong stirring, and the mixture was stirred at 15 ° C. for 30 minutes.
さらに、この有機相1とは別に、塩化メチレン400質量部に、ジフェニルエーテル−4,4’−ジカルボン酸クロライド26.62質量部(101.5モル部)を溶解した(有機相2)。この有機相2を、すでに攪拌している水相と有機相1の混合溶液中に強攪拌下で添加し、15℃で2時間重合反応を行った。この後攪拌を停止し、水相と有機相をデカンテーションして分離した。水相を除去した後、新たに塩化メチレン200質量部、純水1000重量部と酢酸を添加して反応を停止し、15℃で30分間攪拌した。この有機相を純水で5回洗浄した後に、有機相をヘキサン中に添加してポリマーを沈殿させ、分離・乾燥後、オルガノシロキサン共重合樹脂(P−1)を得た。その結果を表2に示す。得られたオルガノシロキサン共重合樹脂(P−1)の樹脂組成は、NMRで確認したところ、仕込みの配合通りの樹脂組成であった。 Further, apart from the organic phase 1, 26.62 parts by mass (101.5 mols) of diphenyl ether-4,4'-dicarboxylic acid chloride was dissolved in 400 parts by mass of methylene chloride (organic phase 2). This organic phase 2 was added to a mixed solution of an aqueous phase and an organic phase 1 that had already been stirred under strong stirring, and a polymerization reaction was performed at 15 ° C. for 2 hours. Thereafter, stirring was stopped, and the aqueous phase and the organic phase were decanted and separated. After removing the aqueous phase, 200 parts by mass of methylene chloride, 1000 parts by weight of pure water and acetic acid were newly added to stop the reaction, followed by stirring at 15 ° C. for 30 minutes. After this organic phase was washed 5 times with pure water, the organic phase was added into hexane to precipitate a polymer, and after separation and drying, an organosiloxane copolymer resin (P-1) was obtained. The results are shown in Table 2. When the resin composition of the obtained organosiloxane copolymer resin (P-1) was confirmed by NMR, it was a resin composition as prepared.
製造例2
二価フェノール成分として2,2−ビス(3−メチル−4−ヒドロキシフェニル)プロパン(BisC)20.71質量部(96.3モル部)、末端封止剤としてp−tert−ブチルフェノール(PTBP)0.38質量部(3.0モル部)、アルカリとして水酸化ナトリウム10.21質量部(300モル部)、オルガノシロキサン9.92質量部(3.7モル部)、ジフェニルエーテル−4,4’−ジカルボン酸クロライド25.13質量部(101.5モル部)とした以外は、製造例1と同様に製造し、オルガノシロキサン共重合樹脂(P−2)を得た。その結果を表2に示す。得られたオルガノシロキサン共重合樹脂(P−2)の樹脂組成は、NMRで確認したところ、仕込みの配合通りの樹脂組成であった。
Production Example 2
2,2-bis (3-methyl-4-hydroxyphenyl) propane (BisC) 20.71 parts by mass (96.3 mols) as the dihydric phenol component, and p-tert-butylphenol (PTBP) as the end-capping agent 0.38 parts by mass (3.0 parts by mol), sodium hydroxide as 10.21 parts by mass (300 parts by mol), organosiloxane 9.92 parts by mass (3.7 parts by mol), diphenyl ether-4,4 ′ -It manufactured similarly to manufacture example 1 except having set it as 25.13 mass parts (101.5 mol part) of dicarboxylic acid chloride, and obtained organosiloxane copolymer resin (P-2). The results are shown in Table 2. When the resin composition of the obtained organosiloxane copolymer resin (P-2) was confirmed by NMR, it was a resin composition as prepared.
製造例3〜製造例6
製造例1と同様にして、オルガノシロキサン共重合樹脂(P−3)〜(P−6)の製造を行った。その結果を表2に示す。得られたオルガノシロキサン共重合樹脂(P−3)〜(P−6)の樹脂組成は、NMRで確認したところ、すべて仕込みの配合通りの樹脂組成であった。
Production Example 3 to Production Example 6
In the same manner as in Production Example 1, organosiloxane copolymer resins (P-3) to (P-6) were produced. The results are shown in Table 2. When the resin composition of the obtained organosiloxane copolymer resin (P-3)-(P-6) was confirmed by NMR, all were resin compositions as prepared.
製造例7〜製造例9
製造例1と同様にして、ポリアリレート樹脂(P−7)〜(P−9)の製造を行った。その結果を表2に示す。得られたポリアリレート樹脂(P−7)〜(P−9)の樹脂組成は、NMRで確認したところ、すべて仕込みの配合通りの樹脂組成であった。
Production Example 7 to Production Example 9
In the same manner as in Production Example 1, polyarylate resins (P-7) to (P-9) were produced. The results are shown in Table 2. When the resin composition of the obtained polyarylate resins (P-7) to (P-9) was confirmed by NMR, it was a resin composition as prepared.
製造例10
製造例1と同様にして、オルガノシロキサン共重合樹脂(P−10)の製造を行った。その結果を表2に示す。得られたオルガノシロキサン共重合樹脂(P−10)の樹脂組成は、NMRで確認したところ、すべて仕込みの配合通りの樹脂組成であった。
Production Example 10
In the same manner as in Production Example 1, an organosiloxane copolymer resin (P-10) was produced. The results are shown in Table 2. When the resin composition of the obtained organosiloxane copolymer resin (P-10) was confirmed by NMR, all were resin compositions as prepared.
製造例11〜製造例20
製造例1と同様にして、オルガノシロキサン共重合樹脂(P−11)〜(P−20)の製造を行った。その結果を表3に示す。得られたオルガノシロキサン共重合樹脂(P−11)〜(P−20)の樹脂組成は、NMRで確認したところ、すべて仕込みの配合通りの樹脂組成であった。
Production Example 11 to Production Example 20
In the same manner as in Production Example 1, organosiloxane copolymer resins (P-11) to (P-20) were produced. The results are shown in Table 3. The resin compositions of the resulting organosiloxane copolymer resins (P-11) to (P-20) were confirmed by NMR and all were resin compositions as prepared.
実施例1
製造例1で作成されたオルガノシロキサン共重合樹脂(P−1)15質量部にジクロロメタン85質量部を加えて作製した溶液を用い、PETフィルム上に溶液流延塗布を行い100μmの塗膜を作製した。得られた塗膜について、減圧にて120℃24時間乾燥して、樹脂フィルム(F−1)を作製し、各種評価を行なった。その結果を、表4に示す。
Example 1
Using a solution prepared by adding 85 parts by mass of dichloromethane to 15 parts by mass of the organosiloxane copolymer resin (P-1) prepared in Production Example 1, solution casting was performed on a PET film to prepare a 100 μm coating film. did. About the obtained coating film, it dried at 120 degreeC under reduced pressure for 24 hours, produced the resin film (F-1), and performed various evaluation. The results are shown in Table 4.
実施例2
オルガノシロキサン共重合樹脂P−1の代わりにオルガノシロキサン共重合樹脂(P−2)を用いた以外は実施例1と同様にして、樹脂フィルム(F−2)を作製し、各種評価を行なった。評価結果を表4に示す。
Example 2
A resin film (F-2) was produced in the same manner as in Example 1 except that the organosiloxane copolymer resin (P-2) was used instead of the organosiloxane copolymer resin P-1, and various evaluations were performed. . The evaluation results are shown in Table 4.
実施例3〜実施例6
実施例1と同様の操作を行って、樹脂フィルム(F−3)〜(F−6)の評価を行なった。評価結果を表4に示す。
Example 3 to Example 6
The same operations as in Example 1 were performed to evaluate the resin films (F-3) to (F-6). The evaluation results are shown in Table 4.
比較例1〜比較例4
実施例1と同様の操作を行って、樹脂フィルム(F−7)〜(F−10)の評価を行なった。評価結果を表4に示す。
Comparative Examples 1 to 4
The same operations as in Example 1 were performed to evaluate the resin films (F-7) to (F-10). The evaluation results are shown in Table 4.
比較例5〜比較例8
実施例1と同様の操作を行って、樹脂フィルム(F−11)〜(F−14)の評価を行なった。評価結果を表5に示す。
Comparative Example 5 to Comparative Example 8
The same operations as in Example 1 were performed to evaluate the resin films (F-11) to (F-14). The evaluation results are shown in Table 5.
実施例7〜実施例12
実施例1と同様の操作を行って、樹脂フィルム(F−15)〜(F−20)の評価を行なった。評価結果を表5に示す。
Example 7 to Example 12
The same operations as in Example 1 were performed to evaluate the resin films (F-15) to (F-20). The evaluation results are shown in Table 5.
実施例で得られたフィルムは、引張弾性率が低く柔軟性に優れていた。また、接触角は大きく、摩擦係数が低かった。そのため、樹脂組成物の表面が汚れにくく摩擦や摩耗に強く、表面特性が優れていた。また、溶解性があり、溶液粘度も低いために、ハンドリング性にも優れていた。 The films obtained in the examples had a low tensile elastic modulus and excellent flexibility. Moreover, the contact angle was large and the friction coefficient was low. Therefore, the surface of the resin composition is hard to get dirty and is strong against friction and wear, and has excellent surface characteristics. Moreover, since it was soluble and the solution viscosity was low, it was excellent in handling property.
比較例1で得られたフィルムは、用いたポリアリレート樹脂(P−7)にはオルガノシロキサンが共重合されていないため、引張弾性率が高く柔軟性に乏しかった。また、接触角は少なく、摩擦係数が高い。そのため、樹脂組成物の表面が汚れやすく摩擦や摩耗に弱く、表面特性が不十分であった。 The film obtained in Comparative Example 1 had high tensile elastic modulus and poor flexibility because the polyarylate resin (P-7) used was not copolymerized with organosiloxane. In addition, the contact angle is small and the friction coefficient is high. Therefore, the surface of the resin composition is easily soiled and weak against friction and wear, and the surface characteristics are insufficient.
比較例2で得られたフィルムは、用いたポリアリレート樹脂(P−8)のジカルボン酸成分としてMPCを用いたため、耐熱性が低く、得られたフィルムの350nmにおける透過性が低かった。また、オルガノシロキサンを共重合しなかったため、引張弾性率が高く柔軟性に乏しかった。 Since the film obtained in Comparative Example 2 used MPC as the dicarboxylic acid component of the used polyarylate resin (P-8), the heat resistance was low, and the transparency of the obtained film at 350 nm was low. Moreover, since the organosiloxane was not copolymerized, the tensile modulus was high and the flexibility was poor.
比較例3で得られたフィルムは、ポリアリレート樹脂(P−9)の二価フェノール成分としてTMBPを用いたため、得られたフィルムの350nmにおける透過性が低く、摩擦係数が高かった。また、オルガノシロキサンを共重合しなかったため、引張弾性率が高く柔軟性に乏しかった。 Since the film obtained in Comparative Example 3 used TMBP as the dihydric phenol component of the polyarylate resin (P-9), the obtained film had low permeability at 350 nm and high friction coefficient. Moreover, since the organosiloxane was not copolymerized, the tensile modulus was high and the flexibility was poor.
比較例4で得られたフィルムは、用いたオルガノシロキサン共重合樹脂(P−10)に共重合したオルガノシロキサンが所定のものでなかったため、耐熱性が不足した。 The film obtained in Comparative Example 4 was insufficient in heat resistance because the organosiloxane copolymerized with the organosiloxane copolymer resin (P-10) used was not a predetermined one.
比較例5で得られたフィルムは、用いたオルガノシロキサン共重合樹脂(P−11)のジカルボン酸であるDEDCの配合が所定よりも少なかったため、耐熱性が不足した。 The film obtained in Comparative Example 5 was insufficient in heat resistance because the amount of DEDC, which was the dicarboxylic acid of the organosiloxane copolymer resin (P-11) used, was less than the predetermined amount.
比較例6で得られたフィルムは、用いたオルガノシロキサン共重合樹脂(P−12)のカルボン酸としてSBCを用いたため、耐熱性は極めて低かった。 Since the film obtained in Comparative Example 6 used SBC as the carboxylic acid of the organosiloxane copolymer resin (P-12) used, the heat resistance was extremely low.
比較例7で得られたフィルムは、用いたオルガノシロキサン共重合樹脂(P−13)のカルボン酸としてDEDCとSBCを併用し、またDEDCが所定よりも少ない配合で用いたため、耐熱性は低かった。 The film obtained in Comparative Example 7 was low in heat resistance because DEDC and SBC were used in combination as the carboxylic acid of the organosiloxane copolymer resin (P-13) used, and DEDC was used in an amount less than a predetermined amount. .
比較例8で得られたフィルムは、用いたオルガノシロキサン共重合樹脂(P−14)のカルボン酸成分としてMPCを用いたために、耐熱性は低く、また、得られたフィルムの350nmにおける透過性が低かった。
The film obtained in Comparative Example 8 had low heat resistance because MPC was used as the carboxylic acid component of the organosiloxane copolymer resin (P-14) used, and the film obtained had a permeability at 350 nm. It was low.
Claims (3)
A molded article, film, and coat film obtained by molding the organosiloxane copolymer resin according to claim 1 .
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