JP5318486B2 - Liquid crystal display panel and manufacturing method thereof - Google Patents
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Description
本発明は、液晶表示パネル及びその製造方法に関する。 The present invention relates to a liquid crystal display panel and a method for manufacturing the same.
図10は従来の液晶表示パネルの額縁近傍の構造を示した断面図である。この液晶表示パネル1には、薄膜トランジスタ(TFT:Thin Film Transistor)等のスイッチング素子がマトリクス状に形成されたTFT基板2と、カラーフィルタ(CF)やブラックマトリクス(BM)等が形成されたCF基板3とを有し、これらの基板の対向面には配向処理が施された配向膜9が形成されている。そして、両基板間に所定のギャップ(間隙)を形成させる為に柱スペーサ10とシール材5とが形成され、そのギャップに液晶材4が封入されている。
FIG. 10 is a cross-sectional view showing a structure in the vicinity of a frame of a conventional liquid crystal display panel. The liquid
ここで、図11に従来の液晶表示パネルの貼り合せ工程フローを示す。シール塗布工程において、シール材をTFT基板の所定の位置に塗布して外周(補助)シール及び本シールを形成し、続いてAg塗布工程において、AgトランスファーをTFT基板の所定の位置に打点状に塗布していた(TN(Twisted Nematic)モードの液晶表示パネルを作製する場合)。次に、液晶滴下工程において、液晶材を所定の滴下量で、前記本シール内側の所定の位置にマトリックス状、線状或いは放射状に滴下していた。 Here, FIG. 11 shows a flow of a bonding process of a conventional liquid crystal display panel. In the seal application process, a sealing material is applied to a predetermined position of the TFT substrate to form an outer peripheral (auxiliary) seal and a main seal. Subsequently, in the Ag application process, the Ag transfer is formed in a dot pattern at a predetermined position of the TFT substrate. The liquid crystal display panel of TN (Twisted Nematic) mode was applied. Next, in the liquid crystal dropping step, the liquid crystal material was dropped at a predetermined drop amount in a matrix shape, a linear shape, or a radial shape at a predetermined position inside the main seal.
次に、CF基板の画素領域に、基板間に所定のギャップを形成させる為の柱スペーサ或いは球状スペーサを予め配置し、貼り合せ工程において、前記両基板を接触・加圧することによって、基板間の画素領域全域に液晶材を均一に拡散させながら基板間のギャップを均一に形成していた。 Next, column spacers or spherical spacers for forming a predetermined gap between the substrates are arranged in advance in the pixel region of the CF substrate, and the substrates are brought into contact with each other and pressed in the bonding step. The gap between the substrates was formed uniformly while the liquid crystal material was uniformly diffused throughout the pixel region.
そして、次工程への搬送の際、貼り合せ基板の嵌合ずれを防止する為に、シール材の仮止めとして部分的に数箇所のUV仮硬化を行っていた。このとき、液晶材は時間経過と共に拡散し、画素領域からその外側の額縁BM形成領域を通過してシール材にまで達していた。次のUV硬化工程において、UV照射によりシール材を硬化させていたが、未硬化状態のシール材と液晶材とは既に接触していた。更に、次の熱硬化工程において、シール材を完全硬化させていたが、このときも初期の半硬化状態のシール材と液晶材とは接触し続けていた。 And in order to prevent the fitting shift | offset | difference of a bonding board | substrate at the time of conveyance to the next process, UV temporary hardening of several places was performed partially as temporary fixing of a sealing material. At this time, the liquid crystal material diffused over time, and passed from the pixel region to the outer frame BM formation region to reach the sealing material. In the next UV curing step, the sealing material was cured by UV irradiation, but the uncured sealing material and the liquid crystal material were already in contact. Furthermore, in the next thermosetting step, the sealing material was completely cured, but at this time, the initial semi-cured sealing material and the liquid crystal material were kept in contact with each other.
このように、従来の構造では、貼り合せ工程、UV硬化工程或いは熱硬化工程において、未硬化或いは半硬化状態のシール材と液晶材とが接触することにより、図10に示すように不純物がシール材5から液晶材4へ溶出し、液晶材4を汚染させる問題が発生していた。この液晶材4を汚染する物質として、未硬化或いは半硬化状態のシール材5から溶け出すオリゴマー成分、フタル酸エステルなどの有機物、Na、K、Clなどのイオン性不純物などが挙げられる。また、更に液晶材4が未硬化或いは半硬化状態のシール材5と接触し、液晶材4がシール材5とその下地との界面部を浸食することで、シール材5が塗布された基板界面部においてシール接着強度が低下する問題が発生していた。その結果、信頼性試験後の液晶表示パネルのシール周辺部において、シミ、ムラ及びシール剥離が発生するなど、液晶表示装置の表示品位、信頼性に問題が生じていた。 As described above, in the conventional structure, the uncured or semi-cured sealing material and the liquid crystal material come into contact with each other in the bonding process, the UV curing process, or the thermal curing process, so that impurities are sealed as shown in FIG. The problem that the liquid material 4 was eluted from the material 5 and contaminated the liquid crystal material 4 occurred. Examples of substances that contaminate the liquid crystal material 4 include oligomer components that dissolve from the uncured or semi-cured seal material 5, organic substances such as phthalate esters, and ionic impurities such as Na, K, and Cl. Further, the liquid crystal material 4 comes into contact with the uncured or semi-cured sealing material 5, and the liquid crystal material 4 erodes the interface between the sealing material 5 and its base, so that the substrate interface to which the sealing material 5 is applied is applied. There has been a problem that the seal adhesive strength is lowered at the portion. As a result, there have been problems in the display quality and reliability of the liquid crystal display device such as spots, unevenness, and peeling of the seal in the periphery of the seal of the liquid crystal display panel after the reliability test.
このような未硬化或いは半硬化状態のシール材と液晶材とが接触することに起因した液晶材の汚染及びシール材の接着強度の低下の問題を解決する技術として、(1)障壁を用いた技術と、(2)表面エネルギーを高くする技術とがある。 As a technique for solving the problem of contamination of the liquid crystal material caused by contact between the uncured or semi-cured sealing material and the liquid crystal material, and the problem of decrease in the adhesive strength of the sealing material, (1) a barrier was used. There are technologies and (2) technologies for increasing the surface energy.
(1)の障壁を用いた技術を用いた技術は、図12に示すように、TFT基板2の画素領域とシール材5を塗布する領域に凸部12を形成し、前記凸部12と前記凸部12に対向する基板との距離を調整することで液晶材4の拡散を一時抑制するものである。この方法に関する従来例として、特開平11-38424号公報と特開2003-315810号公報とがあり、特開平11-38424号公報では、TFT基板の画素領域とシール材5を塗布する領域に凸部12を形成し、凸部12の頂部には配向膜として垂直配向膜を形成することについて開示している。特開2003-315810号公報では、図13に示すように、画素領域内或いは、画素領域内及び画素領域外に液晶材4の流動制御壁13を多数形成することについて開示している。
As shown in FIG. 12, the technique using the barrier (1) technique forms a convex portion 12 in the pixel region of the
(2)の表面エネルギーを高くする技術に関する従来例として、特開平10−260406号公報があり、この公報では、表示領域から離れた位置の配向膜を表面改質することにより、表示領域の配向膜よりも表面エネルギーを高くすることについて開示している。 As a conventional example relating to the technique for increasing the surface energy of (2), there is JP-A-10-260406. In this publication, the orientation of the display region is modified by surface modification of the alignment film at a position away from the display region. It discloses that the surface energy is higher than that of the film.
しかしながら、特開平11-38424号公報による抑制方法は、垂直配向膜と凸部とで液晶拡散制御を行うもので、液晶材に対する濡れ性がある程度低い垂直配向膜を使用した液晶表示パネル品種にしか効果が得られず、通常の配向膜を使用した場合には液晶拡散速度を減少させることが出来ないという問題がある。また、液晶拡散速度を減少させるためには、シール周辺部に、凸部高さを大きく且つ広範囲に凸部を形成させる必要がある為、凸部高さのばらつき具合によっては凸部と対向する基板とが局所的に接触する問題が起き、この接触により局所的な応力が発生し、シール周辺部のギャップばらつきを招くことになる。その結果、額縁BMと画素領域との境界部で表示品位の低下が発生する。この問題は凸部と基板との間の距離が短くなるほど顕著に現れる。 However, the suppression method disclosed in Japanese Patent Application Laid-Open No. 11-38424 performs liquid crystal diffusion control with the vertical alignment film and the projections, and is only applicable to liquid crystal display panel varieties using a vertical alignment film that has low wettability to a liquid crystal material. There is a problem that the effect cannot be obtained and the liquid crystal diffusion rate cannot be reduced when a normal alignment film is used. Further, in order to reduce the liquid crystal diffusion speed, it is necessary to form a convex portion in a wide area in the periphery of the seal, so that the convex portion is opposed depending on how the convex portion height varies. A problem of local contact with the substrate occurs, and local stress is generated by this contact, resulting in gap variation in the periphery of the seal. As a result, display quality deteriorates at the boundary between the frame BM and the pixel region. This problem becomes more noticeable as the distance between the convex portion and the substrate becomes shorter.
また、特開2003-315810号公報による抑制方法では、流動制御壁を多数配置することで液晶の拡散を一時抑制することは可能となるが、画素領域内或いは、画素領域内及び画素領域外に、流動制御壁を対向する基板に接触するように多数配置させている為、画素領域、シール周辺部での接触応力によるギャップばらつきを招くことになる。その結果、画素領域の表示品位の低下、額縁BMと画素領域との境界部での表示品位の低下が発生する。 In addition, in the suppression method according to Japanese Patent Laid-Open No. 2003-315810, it is possible to temporarily suppress the diffusion of liquid crystal by arranging a large number of flow control walls, but in the pixel region or in the pixel region and outside the pixel region. Since a large number of flow control walls are arranged so as to be in contact with the opposing substrate, gap variation due to contact stress in the pixel region and the seal peripheral portion is caused. As a result, the display quality of the pixel area is degraded, and the display quality is degraded at the boundary between the frame BM and the pixel area.
また、特開平10−260406号公報による抑制方法は、表示領域から離れた位置の配向膜を、表示領域の配向膜よりも表面エネルギーを高くすることで、液晶表示パネル作製後にシール材から液晶材へと溶け出す或いは既に溶け出していたイオン性不純物を吸着させ、液晶材へと拡散するのを抑制するに過ぎず、未硬化或いは半硬化状態のシール材と液晶材が接触することで製造中から多量に溶け出すイオン性不純物を事前に抑制することが出来ない。 In addition, the suppression method according to Japanese Patent Laid-Open No. 10-260406 discloses that the alignment film at a position away from the display region has a surface energy higher than that of the alignment film in the display region, so that the liquid crystal material is changed from the sealing material after the liquid crystal display panel is manufactured. It is only manufactured by adsorbing the ionic impurities that have been dissolved out or adsorbed and suppressing diffusion into the liquid crystal material, and the liquid crystal material is in contact with the uncured or semi-cured sealing material. It is impossible to suppress in advance the ionic impurities that are dissolved in large quantities.
本発明は、上記問題点に鑑みてなされたものであって、その主たる目的は、シール材から溶け出す不純物による液晶材の汚染及びシール材の接着強度の低下を抑制し、液晶表示装置の表示品位、信頼性を向上させることが出来る液晶表示パネル及びその製造方法を提供することにある。 The present invention has been made in view of the above problems, and its main purpose is to suppress the contamination of the liquid crystal material and the decrease in the adhesive strength of the seal material due to impurities dissolved from the seal material, and the display of the liquid crystal display device An object of the present invention is to provide a liquid crystal display panel capable of improving the quality and reliability and a method for manufacturing the same.
上記目的を達成するため、本発明は、額縁の遮光領域にブラックマトリクスが形成された第1の基板と、前記遮光領域に有機膜或いは無機膜が形成された第2の基板との間に液晶材を備え、少なくとも一方の基板の前記遮光領域の外側に設けたシール材により前記液晶材が封止される液晶表示パネルにおいて、前記遮光領域における前記第1の基板及び/又は前記第2の基板の前記液晶材に対する接触角が、前記遮光領域の内側の画素領域における接触角よりも大きいものである。 In order to achieve the above object, the present invention provides a liquid crystal between a first substrate in which a black matrix is formed in a light shielding region of a frame and a second substrate in which an organic film or an inorganic film is formed in the light shielding region. In the liquid crystal display panel, wherein the liquid crystal material is sealed by a sealing material provided on the outside of the light shielding region of at least one substrate, the first substrate and / or the second substrate in the light shielding region The contact angle with respect to the liquid crystal material is larger than the contact angle in the pixel region inside the light shielding region.
本発明においては、前記第1の基板の前記ブラックマトリクス上、及び/又は、前記第2の基板の前記有機膜或いは前記無機膜上の少なくとも一部に、前記液晶材を弾く撥液晶処理層を有することが好ましく、前記撥液晶処理層は、フッ素膜又はシリコーン膜を含む構成とすることができる。 In the present invention, a liquid repellent treatment layer that repels the liquid crystal material is formed on the black matrix of the first substrate and / or on at least a part of the organic film or the inorganic film of the second substrate. Preferably, the liquid-repellent treatment layer includes a fluorine film or a silicone film.
また、本発明は、額縁の遮光領域にブラックマトリクスを形成した基板と、前記遮光領域に有機膜或いは無機膜を形成した基板と、を形成し、一方の基板の前記遮光領域の外側にシール材を塗布し、前記シール材で囲まれた領域に液晶材を滴下し、前記一方の基板と他方の基板とを貼り合わせた後、前記シール材を硬化して前記液晶材を封止する液晶表示パネルの製造方法において、前記液晶材を滴下する前の前記一方の基板、及び/又は、前記一方の基板に貼り合わせる前の前記他方の基板の、前記遮光領域の少なくとも一部に、前記液晶材を弾く撥液晶処理を施し、前記遮光領域における前記一方の基板及び/又は前記他方の基板の前記液晶材に対する接触角を増加させるものである。 According to the present invention, a substrate having a black matrix formed in a light shielding region of a frame and a substrate having an organic film or an inorganic film formed in the light shielding region are formed, and a sealing material is formed outside the light shielding region of one substrate. A liquid crystal display in which a liquid crystal material is dropped onto a region surrounded by the sealing material, the one substrate and the other substrate are bonded together, and then the sealing material is cured to seal the liquid crystal material. In the panel manufacturing method, the liquid crystal material is provided on at least a part of the light shielding region of the one substrate before the liquid crystal material is dropped and / or the other substrate before being bonded to the one substrate. The liquid crystal repellent treatment is performed to increase the contact angle of the one substrate and / or the other substrate with respect to the liquid crystal material in the light shielding region.
また、本発明は、額縁の遮光領域にブラックマトリクスを形成した第1の基板と、前記遮光領域に有機膜或いは無機膜を形成した第2の基板と、を形成し、前記第2の基板の前記遮光領域の外側にシール材を塗布し、前記シール材で囲まれた領域に液晶材を滴下し、前記第2の基板と前記第1の基板とを貼り合わせた後、前記シール材を硬化して、前記第1の基板と前記第2の基板との間に前記液晶材を封止する液晶表示パネルの製造方法において、前記液晶材を滴下する前の前記第2の基板の前記有機膜或いは前記無機膜上、及び/又は、前記第2の基板と貼り合わせる前の前記第1の基板の前記ブラックマトリクス上の少なくとも一部に、前記液晶材を弾く撥液晶処理を施し、前記遮光領域における前記第1の基板及び/又は前記第2の基板の前記液晶材に対する接触角を増加させるものである。 According to the present invention, a first substrate in which a black matrix is formed in a light shielding region of a frame and a second substrate in which an organic film or an inorganic film is formed in the light shielding region are formed, and the second substrate A sealing material is applied to the outside of the light shielding region, a liquid crystal material is dropped on a region surrounded by the sealing material, and the second substrate and the first substrate are bonded together, and then the sealing material is cured. Then, in the method of manufacturing a liquid crystal display panel in which the liquid crystal material is sealed between the first substrate and the second substrate, the organic film of the second substrate before dropping the liquid crystal material Alternatively, at least a part of the first substrate on the inorganic film and / or the first substrate before being bonded to the second substrate is subjected to a liquid repellent treatment that repels the liquid crystal material, and the light shielding region The first substrate and / or the second substrate in It is intended to increase the contact angle with respect to the liquid crystal material of the plate.
本発明においては、前記撥液晶処理は、フッ素化処理又はシリコーン化処理を含む構成とすることができ、前記撥液晶処理を施す領域を、両基板を貼り合わせてから前記シール材が硬化するまでの時間と、前記接触角と基板間のギャップとに基づいて定められる前記液晶材の拡散速度と、を参照して設定する構成とすることができる。 In the present invention, the liquid repellent treatment may include a fluorination treatment or a siliconization treatment, and the region to be subjected to the liquid repellent treatment is bonded between the two substrates and the sealing material is cured. And a diffusion rate of the liquid crystal material determined based on the contact angle and the gap between the substrates.
このように、本発明では、画素領域とシール材との間の領域に液晶拡散を制御する為の撥液晶処理層を薄膜で形成することによって、表面エネルギーを低下、即ち液晶材に対する濡れ性を低下させ、液晶拡散速度を減少させる。これにより、シール材から溶け出す不純物による液晶材の汚染及びシール材の接着強度の低下を抑制して、液晶表示装置の表示品位、信頼性を向上させることが出来る。 As described above, in the present invention, the surface energy is reduced, that is, the wettability with respect to the liquid crystal material is reduced by forming the liquid repellent treatment layer for controlling the liquid crystal diffusion in the region between the pixel region and the sealing material as a thin film. Reduce the liquid crystal diffusion rate. Thereby, it is possible to improve the display quality and reliability of the liquid crystal display device by suppressing the contamination of the liquid crystal material and the decrease in the adhesive strength of the seal material due to impurities dissolved from the seal material.
本発明の液晶表示パネル及びその製造方法によれば、シール材から溶け出す不純物による液晶材の汚染及びシール材の接着強度の低下を抑制し、液晶表示装置の表示品位、信頼性を向上させることが出来る。 According to the liquid crystal display panel and the method of manufacturing the same of the present invention, it is possible to suppress the contamination of the liquid crystal material and the decrease in the adhesive strength of the seal material due to impurities dissolved from the seal material, thereby improving the display quality and reliability of the liquid crystal display device. I can do it.
その理由は、CF基板の額縁BM及びそれに対向するTFT基板の膜面すなわち遮光部に、液晶材の拡散を制御する為の撥液晶処理層を形成することによって、液晶材に対する濡れ性を低下させ、液晶拡散速度を減少させることが可能となり、未硬化或いは半硬化状態のシール材と液晶材との接触を抑制することができるからである。 The reason is that by forming a liquid repellent treatment layer for controlling the diffusion of the liquid crystal material on the frame BM of the CF substrate and the film surface of the TFT substrate opposite to the CF substrate, that is, the light shielding portion, the wettability to the liquid crystal material is lowered. This is because the liquid crystal diffusion rate can be reduced, and the contact between the uncured or semi-cured sealing material and the liquid crystal material can be suppressed.
また、CF基板の額縁BMとTFT基板と間の距離を短くする必要がないため、額縁BM近傍のギャップ均一性を悪化させることなく、必要とする液晶拡散速度を得ることが出来る。これは、狭額縁化構造或いは高速応答性など、シール材と液晶材が接触し易い製品設計である液晶表示装置に対しても有効な手段となる。その結果、信頼性が各段に向上した高品質の液晶表示装置を提供することが可能となる。 Further, since it is not necessary to shorten the distance between the frame BM of the CF substrate and the TFT substrate, the required liquid crystal diffusion rate can be obtained without deteriorating the gap uniformity in the vicinity of the frame BM. This is an effective means even for a liquid crystal display device having a product design in which the sealing material and the liquid crystal material are easy to contact, such as a narrow frame structure or high-speed response. As a result, it is possible to provide a high-quality liquid crystal display device with improved reliability at each stage.
背景技術で示したように、貼り合せ工程、UV硬化工程或いは熱硬化工程において、液晶材の拡散が制御できない為に、未硬化或いは半硬化状態のシール材と液晶材とが接触することによる液晶材の汚染及びシール接着強度の低下という問題があり、この問題を解決するための各種方法が提案されている。 As shown in the background art, since the diffusion of the liquid crystal material cannot be controlled in the bonding process, the UV curing process or the thermosetting process, the liquid crystal is produced by the contact between the uncured or semi-cured sealing material and the liquid crystal material. There are problems of contamination of the material and a decrease in the sealing adhesive strength, and various methods for solving this problem have been proposed.
しかしながら、特開平11-38424号公報では、凸部を形成し、凸部の頂部には配向膜として垂直配向膜を形成している為、液晶材の汚染という課題はある程度解消されるが、凸部を形成することによるシール周辺部のギャップ均一性悪化を招くことについては配慮されていない。また、特開2003-315810号公報では、流動制御壁を多数配置している為、液晶材の汚染という課題はある程度解消されるが、流動制御壁を多数配置させることによる画素領域及びシール周辺部でのギャップ均一性悪化を招くことについては配慮されていない。また、特開平10−260406号公報では、表示領域から離れた位置の配向膜を、表示領域の配向膜よりも表面エネルギーを高くすることで、液晶表示パネル作製後にシール材中の不純物が液晶材へ拡散することによる液晶材の汚染という課題はある程度解消されるかも知れないが、未硬化或いは半硬化状態のシール材と液晶材が接触することに何ら違いはない。故に、シール材から不純物が溶け出す以上、上記問題の根本対策とはならない。 However, in Japanese Patent Application Laid-Open No. 11-38424, a convex portion is formed, and a vertical alignment film is formed as an alignment film on the top of the convex portion. No consideration is given to the deterioration of the uniformity of the gap around the seal due to the formation of the portion. In Japanese Patent Laid-Open No. 2003-315810, since a large number of flow control walls are arranged, the problem of contamination of the liquid crystal material is solved to some extent, but the pixel region and the seal peripheral portion by arranging a large number of flow control walls. No consideration is given to the deterioration of gap uniformity. Japanese Patent Laid-Open No. 10-260406 discloses that an impurity in a sealing material is produced after the liquid crystal display panel is manufactured by increasing the surface energy of the alignment film at a position away from the display region than the alignment film in the display region. Although the problem of contamination of the liquid crystal material due to diffusion to the surface may be solved to some extent, there is no difference in the contact between the uncured or semi-cured sealing material and the liquid crystal material. Therefore, as long as impurities are dissolved from the sealing material, it is not a fundamental countermeasure for the above problem.
そこで、本発明では、互いに対向した、額縁に有機膜或いは無機膜からなるBMを形成したCF基板と、額縁に有機膜或いは無機膜を形成したTFT基板間のいずれか一方或いは双方にシール材を塗布し、液晶材を封入する液晶表示パネルにおいて、液晶滴下後の貼り合せの際に、未硬化或いは半硬化状態のシール材と液晶材とが接触することに起因した液晶材の汚染及びシール材の接着強度の低下を抑制することを目的に、CF基板の額縁BM及び/又はそれに対向するTFT基板の膜面に、液晶拡散(液晶材が移動し、広がる現象を指す。)を制御する為の撥液晶処理(ここでは液晶材を弾かせる処理を指す。)を施した構成とする。その結果、シール材が未硬化或いは半硬化状態で液晶材と接触することを抑制することができ、信頼性が各段に向上した高品質の液晶表示装置を提供することが可能となる。以下、図面を参照して説明する。 Therefore, in the present invention, a sealing material is provided on one or both of a CF substrate having a BM formed of an organic film or an inorganic film on the frame and a TFT substrate having an organic film or an inorganic film formed on the frame. In a liquid crystal display panel in which liquid crystal material is applied and sealed, liquid crystal material contamination due to contact between the liquid crystal material and the non-cured or semi-cured seal material at the time of bonding after the liquid crystal is dropped and the seal material In order to suppress a decrease in the adhesive strength, liquid crystal diffusion (refers to a phenomenon in which the liquid crystal material moves and spreads) on the frame BM of the CF substrate and / or the film surface of the TFT substrate opposite to the frame BM. The liquid crystal repellent treatment (here, the treatment for flipping the liquid crystal material) is applied. As a result, the sealing material can be prevented from coming into contact with the liquid crystal material in an uncured or semi-cured state, and a high-quality liquid crystal display device with improved reliability can be provided. Hereinafter, description will be given with reference to the drawings.
[実施形態1]
図1は、本発明の第1実施形態の液晶表示パネルの額縁近傍の構造を示した断面図である。この液晶表示パネル1には、TFT等のスイッチング素子がマトリクス状に形成された一方の基板(以下、TFT基板2と呼ぶ。)と、CFやBM等が形成された他方の基板(以下、CF基板3と呼ぶ。)と、を有し、前記TFT基板2の額縁部(周縁部)には有機膜或いは無機膜(図示せず)が形成されており、前記CF基板3の額縁部には額縁BM6が形成されている。また、これらの基板の対向面には少なくとも配向処理が施された配向膜9が形成されている。そして、前記対向した両基板間に所定のギャップ(間隙)を形成させる為に柱スペーサ10とシール材5が形成され、そのギャップに液晶材4が封入されている。
[Embodiment 1]
FIG. 1 is a cross-sectional view showing the structure in the vicinity of the frame of the liquid crystal display panel according to the first embodiment of the present invention. The liquid
ここで、未硬化或いは半硬化状態のシール材5と液晶材4とが接触することによる液晶材4の汚染及びシール材5の接着強度の低下を抑制する為に、CF基板3の額縁BM6及びそれに対向するTFT基板2の膜面(以下、額縁BM6で遮光されるパネル部位を、遮光領域と称す。)に対し、液晶拡散を制御する為の撥液晶処理層11を設けた構成となっている。この撥液晶処理層11を付与することで、この部分での液晶材4に対する表面エネルギー(平均化された一様な表面エネルギーを前提とする。)が低下する。その結果、液晶材4と基板との接触角が増大し、濡れ性を低下させることが可能となる。 Here, in order to suppress contamination of the liquid crystal material 4 due to contact between the uncured or semi-cured seal material 5 and the liquid crystal material 4 and a decrease in the adhesive strength of the seal material 5, the frame BM6 of the CF substrate 3 and The liquid crystal repellent treatment layer 11 for controlling liquid crystal diffusion is provided on the film surface of the TFT substrate 2 (hereinafter referred to as a light shielding region, which is shielded by the frame BM6). Yes. By applying the liquid repellent treatment layer 11, the surface energy of the liquid crystal material 4 at this portion (assuming an averaged uniform surface energy) is lowered. As a result, the contact angle between the liquid crystal material 4 and the substrate is increased, and wettability can be reduced.
図2に撥液晶処理層の形成領域を示す。撥液晶処理層11は、液晶表示パネル1のTFT基板2及びCF基板3のそれぞれの画素領域とシール塗布位置との間に閉曲線状に形成されている。また、液晶材の拡散をより制御する為の撥液晶処理層の形成領域を図3に示す。撥液晶処理層11は、液晶表示パネル1のTFT基板2及びCF基板3のそれぞれの画素領域とシール塗布位置との間に、パネルコーナー部を除く領域に形成されている。これは画素領域内に液晶材を滴下する位置がシール塗布位置に対し、パネルコーナー部の方がパネル辺部に比べ遠くなる場合、パネルコーナー部においてはパネル辺部より液晶材のシール塗布位置への到達時間が比較的に長くなることを考慮したものである。
FIG. 2 shows the formation region of the liquid repellent treatment layer. The liquid repellent treatment layer 11 is formed in a closed curve shape between each pixel region of the
図4に本発明の液晶表示パネル工程フローの一例を示す。CF基板の撥液晶処理工程において、画素領域からシール塗布位置の間の額縁BMの最表面上に対し、接触角が増大するような撥液晶処理を行う。このようにして額縁BM部に、貼り合せ工程アウト〜熱硬化工程インまでのリードタイムを考慮して設定した所定範囲の撥液晶処理層を形成させる。また、CF基板の画素領域には、基板間に所定のギャップを形成させる為の柱スペーサが予め形成されているが、形成されていないCF基板の場合には撥液晶処理完了後にポリマービーズ、シリカビーズ等の絶縁性の球状スペーサを配置させても良い。 FIG. 4 shows an example of the liquid crystal display panel process flow of the present invention. In the liquid crystal repellent treatment process of the CF substrate, the liquid repellent treatment is performed so that the contact angle increases on the outermost surface of the frame BM between the pixel region and the seal application position. In this way, a liquid repellent treatment layer having a predetermined range set in consideration of the lead time from the bonding process out to the thermosetting process in is formed in the frame BM part. In addition, in the pixel region of the CF substrate, column spacers for forming a predetermined gap between the substrates are formed in advance. However, in the case of a CF substrate that is not formed, polymer beads, silica after completion of the liquid-repellent treatment Insulating spherical spacers such as beads may be arranged.
一方、TFT基板の撥液晶処理工程においては、CF基板の前記撥液晶処理層に対向する画素領域からシール塗布位置の間のTFT基板の膜面上、例えばSiNx、ITOなどの無機膜或いはノボラックなどの有機膜の最表面上に対し、同様な撥液晶処理を行う。このようにしてTFT基板側にもCF基板と同様に所定範囲の撥液晶処理層を形成させる。 On the other hand, in the liquid crystal repellent treatment process of the TFT substrate, on the film surface of the TFT substrate between the pixel region facing the liquid repellent treatment layer of the CF substrate and the seal application position, for example, an inorganic film such as SiNx or ITO, or a novolac The same liquid repellent treatment is performed on the outermost surface of the organic film. In this way, a liquid repellent treatment layer having a predetermined range is formed on the TFT substrate side in the same manner as the CF substrate.
なお、前述した撥液晶処理工程については、ラビング洗浄・乾燥工程の次工程として設けた場合を例にとって挙げているが、例えば、パネル製造工程の先頭である基板(TFT/CF)洗浄工程の前に撥液晶処理工程を設けても良く、TFT基板、CF基板のどちらの基板であっても、液晶滴下工程よりも前に撥液晶処理が実施されればよい。 The above-described liquid-repellent treatment process is exemplified as a case where it is provided as the next process of the rubbing cleaning / drying process. For example, before the substrate (TFT / CF) cleaning process, which is the head of the panel manufacturing process. May be provided with a liquid repellent treatment step, and it is sufficient that the liquid crystal repellent treatment is performed before the liquid crystal dropping step regardless of whether the substrate is a TFT substrate or a CF substrate.
次に、シール塗布工程において、シール材を前記TFT基板の所定の位置に閉曲線状に塗布して外周(補助)シール及び本シールを形成し、続いてAg塗布工程において、Agトランスファーを基板の所定の位置に必要に応じて打点状に塗布する(このAg塗布工程は、TNモードの液晶表示パネルを作製する場合に実施し、IPS(In Plane Switching)モードではこの工程は省かれる。)。次に、液晶滴下工程において、液晶材を所定の滴下量で前記本シール内側の所定の位置にマトリックス状(マトリックス状に多数打点)、線状或いは放射状等任意の形状で滴下する。 Next, in the seal coating process, a sealing material is applied to a predetermined position of the TFT substrate in a closed curve shape to form an outer peripheral (auxiliary) seal and a main seal. Subsequently, in the Ag coating process, the Ag transfer is transferred to a predetermined position on the substrate. (Ag application step is performed when a TN mode liquid crystal display panel is manufactured, and this step is omitted in the IPS (In Plane Switching) mode). Next, in the liquid crystal dropping step, the liquid crystal material is dropped at a predetermined drop amount in a predetermined shape inside the main seal in a matrix shape (a large number of dots in the matrix shape), a linear shape or a radial shape.
その後、貼り合せ工程において、前記TFT基板と前記CF基板を接触・加圧することで、基板間の画素領域及び周辺部に液晶材を均一に拡散させながら、基板間のギャップを均一に形成させる。このとき、画素領域にギャップ均一性を持たせる為には、画素領域における液晶材の拡散は速い方が良い。これはTFT基板とCF基板を接触・加圧させる間に、液晶材の拡散を速くすることで画素領域内の液晶層を均一にする方が画素領域のギャップ均一性が保たれるからである。それに対し、液晶材の拡散が遅い場合、画素領域の中心部が画素領域の周辺部に比べ液晶層が厚く(太鼓腹状態)なり、ギャップ均一性が損なわれることとなる。 Thereafter, in the bonding step, the TFT substrate and the CF substrate are contacted and pressed to uniformly diffuse the liquid crystal material in the pixel region and the peripheral portion between the substrates, thereby forming a uniform gap between the substrates. At this time, in order to provide gap uniformity in the pixel region, it is better that the liquid crystal material diffuses quickly in the pixel region. This is because, when the TFT substrate and the CF substrate are brought into contact with each other and pressed, the diffusion of the liquid crystal material is accelerated to make the liquid crystal layer in the pixel region uniform so that the gap uniformity in the pixel region is maintained. . On the other hand, when the diffusion of the liquid crystal material is slow, the liquid crystal layer is thicker in the center of the pixel region than in the periphery of the pixel region (drum state), and gap uniformity is impaired.
次に、UV硬化工程への搬送の際、貼り合せ基板の嵌合ずれを防止する為に、シール材の仮止めとして、外周シールに対して部分的に数箇所のUV仮硬化を行う。このとき、液晶材は時間経過と共に画素領域を拡散して行き、その外側の遮光領域にまで達しているが、本発明では、撥液晶処理層により遮光領域における液晶材の拡散速度は低下し、シール材には接しない。この状態で次のUV硬化工程において、所定量のUV照射によりシール材を硬化させる。この液晶拡散制御により、未硬化状態のシール材と液晶材とが接触するのを防ぐことが出来る。 Next, in order to prevent misalignment of the bonded substrate during transport to the UV curing process, UV temporary curing is performed at several locations on the outer peripheral seal as a temporary fixing of the sealing material. At this time, the liquid crystal material diffuses in the pixel region over time and reaches the outer light shielding region, but in the present invention, the diffusion rate of the liquid crystal material in the light shielding region is reduced by the liquid repellent treatment layer, Do not touch the sealing material. In this state, in the next UV curing step, the sealing material is cured by a predetermined amount of UV irradiation. This liquid crystal diffusion control can prevent the uncured sealing material and the liquid crystal material from coming into contact with each other.
そして、次の熱硬化工程において、所定の温度で加熱することによりシール材を完全硬化させ、必要とする接着強度を持たせる。このときも本発明の撥液晶処理層により液晶材の拡散を制御し続けている為、液晶材はシール材とは接触しない。このようにして、半硬化状態のシール材と液晶材が接触することを抑制することが出来る。そして液晶材は加熱とともに次第に粘性が下がり、熱硬化が完了するときには本シール内側全領域に拡散・充填され、シール材と液晶材とが接し合い、額縁BM近傍においてもギャップの均一性が確保される。この後、作製した液晶表示パネルは、ACF(Anisotropic ConductiveFilm)貼付/TCP(Tape Carrier Package)圧接工程、基板圧接工程を経て、組立工程でバックライト光源を取り付けて、液晶表示装置が完成する。 Then, in the next thermosetting step, the sealing material is completely cured by heating at a predetermined temperature, and the required adhesive strength is obtained. Also at this time, since the diffusion of the liquid crystal material is continuously controlled by the liquid repellent treatment layer of the present invention, the liquid crystal material is not in contact with the sealing material. In this way, contact between the semi-cured sealing material and the liquid crystal material can be suppressed. The viscosity of the liquid crystal material gradually decreases with heating, and when the thermosetting is completed, the entire area inside the seal is diffused and filled, the seal material and the liquid crystal material come into contact with each other, and uniformity of the gap is ensured even in the vicinity of the frame BM. The Thereafter, the manufactured liquid crystal display panel is subjected to an ACF (Anisotropic Conductive Film) pasting / TCP (Tape Carrier Package) pressure welding process and a substrate pressure welding process, and a backlight light source is attached in an assembly process, thereby completing a liquid crystal display device.
このように、本発明では、撥液晶処理層を配置することによって、画素領域外側の遮光領域を通過する液晶材の拡散速度を減少させ、未硬化或いは半硬化状態のシール材と液晶材とが接触することを抑制することが出来る。尚、撥液晶処理層は画素領域から外側に形成すれば良く、さらにシール材と基板との密着性が確保できる場合は、シール塗布位置まで形成しても良い。また、撥液晶処理層の設定によっては、これを配置した部位の配向が乱れ、液晶表示パネルの光漏れが問題となる場合もある。そのため、撥液晶処理層は遮光領域にのみ配置するのが良い。また、図1では額縁BMとシール材との間に間隔を有する例を示したが、額縁BMは必要に応じてシール塗布位置まで延在させることも出来る。 Thus, in the present invention, by disposing the liquid repellent treatment layer, the diffusion rate of the liquid crystal material passing through the light shielding region outside the pixel region is reduced, and the uncured or semi-cured sealing material and the liquid crystal material are reduced. Contact can be suppressed. Note that the liquid repellent layer may be formed outside the pixel region, and may be formed up to the seal application position when the adhesion between the sealant and the substrate can be secured. In addition, depending on the setting of the liquid repellent treatment layer, the orientation of the portion where the layer is disposed may be disturbed, and light leakage of the liquid crystal display panel may be a problem. Therefore, the liquid repellent treatment layer is preferably disposed only in the light shielding region. Moreover, although the example which has a space | interval between frame BM and a sealing material was shown in FIG. 1, frame BM can also be extended to a seal | sticker application position as needed.
[実施形態2]
図5は本発明の第2実施形態の液晶表示パネルの額縁近傍の構造を示した断面図である。この液晶表示パネルは、図1に示す第1実施形態の液晶表示パネルにおいて、額縁BMの表面上及びそれに対向するTFT基板の膜面上の所望の位置に、4フッ化エチレンなどのフッ素樹脂を塗布する、或いはフッ素化処理を施すことでフッ素皮膜11aを薄膜で形成させた構成となっている。
[Embodiment 2]
FIG. 5 is a sectional view showing the structure in the vicinity of the frame of the liquid crystal display panel according to the second embodiment of the present invention. This liquid crystal display panel is the same as the liquid crystal display panel according to the first embodiment shown in FIG. 1, except that a fluororesin such as ethylene tetrafluoride is applied to desired positions on the surface of the frame BM and on the film surface of the TFT substrate facing it. The fluorine film 11a is formed as a thin film by coating or fluorination treatment.
このようにしてCF基板3の額縁BM6の表面上及びそれに対向するTFT基板2の膜面上には、フッ素皮膜11aである撥液晶処理層が付与され、撥液晶性を持たせることが出来る。その結果、遮光領域を通過する液晶材4の拡散速度を減少させることが出来る。ここで、10nm以上の厚さで前記フッ素皮膜11aを形成すれば、フッ素皮膜11aと液晶材4とがなす接触角はほぼ変化がないことから、フッ素皮膜11aとしては10〜100nmの膜厚で形成すればよいことを確認している。図6は、画素領域からシール塗布位置間に前記フッ素皮膜11aなどの撥液晶膜を形成させたTFT基板2に対し、液晶材4をマトリックス状に滴下させたときの状態(ここでは1滴分)を示す模式図である。
In this manner, the liquid repellent treatment layer as the fluorine film 11a is provided on the surface of the frame BM6 of the CF substrate 3 and on the film surface of the
[実施形態3]
図7は本発明の第3実施形態の液晶表示パネルの額縁近傍の構造を示した断面図である。この液晶表示パネルは、図1に示す第1実施形態の液晶表示パネルにおいて、額縁BMの表面上及びそれに対向するTFT基板の膜面上に対し、局所的にシリコーン化処理を施すことでシリコーン皮膜11bを薄膜で形成させた構成となっている。
[Embodiment 3]
FIG. 7 is a cross-sectional view showing the structure in the vicinity of the frame of the liquid crystal display panel according to the third embodiment of the present invention. This liquid crystal display panel is the same as the liquid crystal display panel of the first embodiment shown in FIG. 1, except that the silicone film is locally applied to the surface of the frame BM and the film surface of the TFT substrate facing the frame BM. 11b is formed as a thin film.
このようにしてCF基板3の額縁BM6の表面上及びそれに対向するTFT基板2の膜面上には、シリコーン皮膜11bである撥液晶処理層が付与され、撥液晶性を持たせることが出来る。その結果、遮光領域を通過する液晶材4の拡散速度を減少させる効果が得られる。このシリコーン皮膜11bは10〜100nmの膜厚で形成すればよい。
In this way, the liquid-repellent treatment layer, which is the silicone film 11b, is provided on the surface of the frame BM6 of the CF substrate 3 and the film surface of the
図8に撥液晶処理層による液晶拡散制御効果を概念的に示す。図8(b)は従来の基板貼り合せ時の液晶材の拡散状態を示しており、CF基板3とTFT基板2が接触・加圧されると、液晶材4は画素領域から額縁BMの遮光領域へと急速に拡散していく。その結果、拡散した液晶材4がUV硬化する前の未硬化状態のシール材5と接触することとなる。一方、図8(a)は本発明の基板貼り合せ時の液晶材の拡散状態を示しており、CF基板3とTFT基板2が接触・加圧されても、遮光領域に、液晶材4に対する接触角が増大するような撥液晶処理を施している為に、液晶材4は遮光領域にて拡散速度が著しく減少することとなる。その結果、液晶材4がUV硬化する前の未硬化状態のシール材5と接触するタイミングを遅らせ、未硬化状態のシール材5と液晶材4とが接触することを抑制することが出来る。
FIG. 8 conceptually shows the liquid crystal diffusion control effect by the liquid repellent treatment layer. FIG. 8B shows the diffusion state of the liquid crystal material when the substrates are bonded together. When the CF substrate 3 and the
前記接触角を、液晶表示パネルに封入する液晶材を使用して、JIS R 3257(1999)「基板ガラス表面の濡れ性試験方法」に基づき測定すれば(例えば、協和界面科学製の接触角測定機DM300を使用)、撥液晶性の度合いを容易に確認出来る。この撥液晶性は撥液晶処理層が形成されている限り、液晶表示パネルを解体し、アセトン、IPAにて付着している液晶材を除去後、再度測定しても再現することができる。尚、撥液晶処理層を形成することで、CF基板の前記額縁BM及びそれに対向するTFT基板の前記膜面に付与した撥液晶処理層の表面エネルギーは、画素領域の配向膜表面上の表面エネルギーよりも低くなる。これは撥液晶処理層の接触角と画素領域の配向膜表面上の接触角を測定することで判断することが可能であり、撥液晶処理層の液晶材に対する接触角は、画素領域の配向膜表面上の接触角よりも大きくなる。 If the contact angle is measured based on JIS R 3257 (1999) “Test method for wettability of glass substrate surface” using a liquid crystal material sealed in a liquid crystal display panel (for example, contact angle measurement manufactured by Kyowa Interface Science) Machine DM300), the degree of liquid repellency can be easily confirmed. This liquid repellency can be reproduced by disassembling the liquid crystal display panel and removing the liquid crystal material adhering with acetone or IPA and then measuring again as long as the liquid crystal repellent layer is formed. By forming the liquid repellent treatment layer, the surface energy of the liquid repellent treatment layer applied to the frame BM of the CF substrate and the film surface of the TFT substrate opposite to the frame BM is the surface energy on the alignment film surface in the pixel region. Lower than. This can be determined by measuring the contact angle of the liquid repellent layer and the contact angle on the alignment film surface of the pixel region. The contact angle of the liquid repellent layer to the liquid crystal material is determined by the alignment film of the pixel region. It becomes larger than the contact angle on the surface.
ここで、図9に本発明の液晶表示パネルの額縁BM形成領域における液晶拡散速度とギャップとの関係を示す。一般に液晶表示パネルにおいて、額縁BM形成領域のギャップ、即ち額縁BMとTFT基板との間隙距離は、額縁BM形成領域ではCFとなる色層が形成されていない分もあり、画素領域の間隙(ギャップ)より大きい。図9より額縁BMとTFT基板との間隙距離が短くなる、つまり画素領域のギャップが小さくなるほど、液晶拡散速度が次第に減少していくのが判る。 FIG. 9 shows the relationship between the liquid crystal diffusion speed and the gap in the frame BM formation region of the liquid crystal display panel of the present invention. In general, in the liquid crystal display panel, the gap between the frame BM formation region, that is, the gap distance between the frame BM and the TFT substrate, is that the CF layer is not formed in the frame BM formation region. Larger) From FIG. 9, it can be seen that the liquid crystal diffusion rate gradually decreases as the gap distance between the frame BM and the TFT substrate decreases, that is, the gap in the pixel region decreases.
しかしながら、遮光領域に撥液晶処理を施していない場合(図の×印)、額縁BMとTFT基板との間隙距離をかなり短くしても速度減少に限界が有る。そこで、更に速度を減少させる為に額縁BMとTFT基板とが接触するくらいまで距離を縮めると、部分的に額縁BMとTFT基板が接触するという問題が起きる。その結果、額縁BM近傍の接触した箇所でギャップ均一性が悪化し、周辺ムラという新たな不具合が発生することになる。それに対し、フッ素皮膜やシリコーン皮膜などの撥液晶処理層を薄膜で形成することで(図の△印及び□印)、額縁BMとTFT基板間との間隙距離を極端に短くする必要がなく、液晶表示パネルの狙いの画素領域のギャップ或いは額縁BM幅に応じた撥液晶処理層の種類選定が可能となる。その結果、額縁BM近傍のギャップ均一性を悪化させることなしに、必要とする液晶拡散速度を得ることが出来る。 However, if the liquid-repellent treatment is not performed on the light-shielding region (marked with x in the figure), there is a limit to speed reduction even if the gap distance between the frame BM and the TFT substrate is considerably shortened. Therefore, if the distance is shortened so that the frame BM and the TFT substrate come into contact with each other in order to further reduce the speed, there arises a problem that the frame BM and the TFT substrate partially come into contact. As a result, the gap uniformity deteriorates at the contact point in the vicinity of the frame BM, and a new problem of peripheral unevenness occurs. On the other hand, by forming a liquid repellent treatment layer such as a fluorine film or a silicone film as a thin film (Δ mark and □ mark in the figure), there is no need to extremely shorten the gap distance between the frame BM and the TFT substrate. It is possible to select the type of the liquid repellent treatment layer according to the gap of the target pixel region or the frame BM width of the liquid crystal display panel. As a result, the required liquid crystal diffusion speed can be obtained without deteriorating the gap uniformity in the vicinity of the frame BM.
尚、フッ素皮膜やシリコーン皮膜と液晶材とがなす接触角は前述のように約10nmでほぼ一定の値となるが、ここでは塗り残しによって発生するピンホール発生率も考慮し100nmとした。また、撥液晶処理層の幅は、画素領域からシール塗布位置の間の額縁BM幅の許容範囲内で設定することができ、貼り合せ工程アウト〜熱硬化工程インのリードタイムを考慮して設定すると良い。例えば、貼り合せ工程アウト〜熱硬化工程インまでのリードタイムを2.5分以内とするプロセス条件にて、額縁BMとTFT基板との距離が2.0μmである液晶表示パネルを作製する時は、図9より額縁BMの表面上及びそれに対向するTFT基板の膜面上にフッ素皮膜の撥液晶処理層を具備する場合では、ばらつきを加味して撥液晶処理層幅を4.5mm以上とすると良い。このようにすれば未硬化のシール材と液晶材とが接触することはない。 Note that the contact angle between the fluorine film or silicone film and the liquid crystal material is about 10 nm as described above, which is a substantially constant value, but here it is set to 100 nm in consideration of the occurrence rate of pinholes generated due to unpainted areas. Further, the width of the liquid repellent layer can be set within the allowable range of the frame BM width between the pixel region and the seal application position, and is set in consideration of the lead time from the bonding process out to the thermosetting process in. Good. For example, when manufacturing a liquid crystal display panel in which the distance between the frame BM and the TFT substrate is 2.0 μm under process conditions in which the lead time from the bonding process out to the thermosetting process in is within 2.5 minutes. 9, in the case where a liquid crystal repellent layer having a fluorine film is provided on the surface of the frame BM and on the film surface of the TFT substrate opposite thereto, the width of the liquid repellent layer is 4.5 mm or more in consideration of variation. good. If it does in this way, an uncured sealing material and a liquid crystal material will not contact.
また、上記実施形態ではCF基板及びTFT基板の両膜面に、液晶拡散を制御する為の撥液晶処理を施した構成を例に挙げて説明したが、CF基板或いはTFT基板の少なくともどちらか一方に撥液晶処理を施した構成とすれば、液晶材の拡散速度を減少させることが可能な為、未硬化或いは半硬化のシール材と液晶材が接する時間を遅らせることができ、液晶材の汚染を抑制することが出来る。 In the above embodiment, the description has been given by taking as an example a configuration in which both film surfaces of the CF substrate and the TFT substrate are subjected to liquid repellent treatment for controlling liquid crystal diffusion. However, at least one of the CF substrate and the TFT substrate is described. If the liquid crystal repellent treatment is applied to the liquid crystal, the diffusion rate of the liquid crystal material can be reduced, so that the time of contact between the uncured or semi-cured seal material and the liquid crystal material can be delayed, resulting in contamination of the liquid crystal material. Can be suppressed.
以下の実施例において、本発明の液晶表示パネルの製造方法の具体例を説明するが、本発明の要旨を変更しない限り、本発明は以下の実施例に限定されるものではない。 In the following examples, specific examples of the method for producing a liquid crystal display panel of the present invention will be described. However, the present invention is not limited to the following examples unless the gist of the present invention is changed.
まず、第1の実施例として、撥液晶処理層としてフッ素皮膜を用いる場合のIPSモードでの液晶表示装置の製造方法を示す。 First, as a first embodiment, a method for manufacturing a liquid crystal display device in the IPS mode when a fluorine film is used as the liquid repellent treatment layer will be described.
CF基板の撥液晶処理工程において、画素領域からシール塗布位置の間の額縁BMの表面上に対し、フッ素化処理を施した。このフッ素化処理として、フッ素系分子を成膜装置にて局所的に堆積させた後、重合処理を行うことにより、膜厚が約100nmのフッ素皮膜を閉曲線状に形成させた。また、額縁BMとTFT基板との間隙距離が2.1μmである液晶表示パネルで、貼り合せ工程アウト〜熱硬化工程インまでのリードタイムを2分以内とするプロセス条件で作製する為に、フッ素皮膜幅を4mmとした(画素領域の間隙(ギャップ)の狙い値は2.0μm)。一方、TFT基板の撥液晶処理工程においても、CF基板の前記フッ素皮膜に対向する画素領域からシール塗布位置の間のTFT基板のSiNx膜面上に対し、同様なフッ素化処理を行った。このようにしてTFT基板側にもCF基板と同様に、膜厚が約100nmのフッ素皮膜を4mm幅で閉曲線状に形成させた。 In the liquid crystal repellent treatment process of the CF substrate, the surface of the frame BM between the pixel region and the seal application position was subjected to fluorination treatment. As this fluorination treatment, a fluorine film having a film thickness of about 100 nm was formed in a closed curve by locally depositing fluorine-based molecules with a film forming apparatus and then performing a polymerization treatment. In addition, in a liquid crystal display panel having a gap distance of 2.1 μm between the frame BM and the TFT substrate, it is necessary to produce fluorine under the process conditions in which the lead time from the bonding process out to the thermosetting process in is within 2 minutes. The film width was set to 4 mm (the target value of the gap (gap) in the pixel region was 2.0 μm). On the other hand, in the liquid crystal repellent treatment process of the TFT substrate, the same fluorination treatment was performed on the SiNx film surface of the TFT substrate between the pixel region facing the fluorine film of the CF substrate and the seal application position. In this way, a fluorine film having a film thickness of about 100 nm was formed in a closed curve shape with a width of 4 mm on the TFT substrate side as well as the CF substrate.
次に、シール塗布工程において、ハイブリッド型(UV+熱硬化)シール材を、画素領域を囲うように所定の位置に、外周(補助)シール及び本シールとしてそれぞれ閉曲線状に塗布した。次に、液晶滴下工程において、液晶材を前記本シール内側の所定の位置に、所定の滴下量でマトリックス状に滴下した。その後、貼り合せ工程において、前記両基板を接触・加圧することで、基板間の画素領域全域に液晶材を均一に拡散させながら、基板間のギャップを均一に形成させた。そして、次工程への搬送の際、シール材の仮止めとして部分的に数箇所のUV仮硬化を行った。次のUV硬化工程において、UV照射量3000mJにてシール材を硬化させた。このとき前記フッ素皮膜により、未硬化状態のシール材と液晶材とが接触していないことを確認した。そして、次に熱硬化工程において、120℃、1時間加熱することによりシール材を完全硬化させた。このとき加熱開始時点では、前記フッ素皮膜により、半硬化状態のシール材と液晶材が接触していないことを確認した。その後、シール材の熱硬化が完了するときには、液晶材は本シール内側全領域に拡散・充填され、シール材と液晶材とが接し合い、額縁BM近傍においてもギャップが形成された。熱硬化完了後、液晶表示パネルの画素領域及び額縁BM近傍のギャップ測定を実施した。その結果、画素領域全域で均一なギャップが得られていることを確認出来た。 Next, in the seal application process, a hybrid type (UV + thermosetting) sealant was applied in a closed curve shape as a peripheral (auxiliary) seal and a main seal at predetermined positions so as to surround the pixel region. Next, in the liquid crystal dropping step, the liquid crystal material was dropped in a matrix form at a predetermined drop amount at a predetermined position inside the main seal. Thereafter, in the bonding step, the two substrates were brought into contact with each other and pressed to uniformly diffuse the liquid crystal material throughout the pixel region between the substrates, thereby forming a uniform gap between the substrates. And in the case of conveyance to the next process, UV temporary hardening of some places was performed partially as temporary stop of a sealing material. In the next UV curing step, the sealing material was cured at a UV irradiation amount of 3000 mJ. At this time, it was confirmed that the uncured sealing material and the liquid crystal material were not in contact with each other by the fluorine film. Then, in the thermosetting step, the sealing material was completely cured by heating at 120 ° C. for 1 hour. At this time, it was confirmed that the semi-cured sealing material and the liquid crystal material were not in contact with each other at the start of heating. Thereafter, when the thermosetting of the sealing material was completed, the liquid crystal material was diffused and filled in the entire area inside the seal, the sealing material and the liquid crystal material were in contact with each other, and a gap was also formed in the vicinity of the frame BM. After the thermosetting was completed, a gap measurement in the vicinity of the pixel region and the frame BM of the liquid crystal display panel was performed. As a result, it was confirmed that a uniform gap was obtained over the entire pixel region.
このようにして作製した本発明の実施例である液晶表示装置の高温高湿試験を実施した。温度60℃、湿度60%環境化での1500h駆動試験を実施した結果、液晶表示パネルのシール周辺部におけるシミ、ムラ及びシール剥離の発生は確認されず、良好な表示状態であった。比較として、撥液晶処理層を形成させていない液晶表示パネルを作製したが、駆動試験1000hに達する頃に、シール周辺部においてシミが発生しているのが確認された。 A high-temperature and high-humidity test of the liquid crystal display device according to the embodiment of the present invention thus manufactured was performed. As a result of carrying out a 1500 h drive test at a temperature of 60 ° C. and a humidity of 60%, the occurrence of spots, unevenness, and peeling of the seal in the periphery of the seal of the liquid crystal display panel was not confirmed, and a good display state was obtained. As a comparison, a liquid crystal display panel in which no liquid repellent treatment layer was formed was produced, but it was confirmed that spots were generated in the periphery of the seal when the driving test reached 1000 h.
次に、第2の実施例として、撥液晶処理層としてフッ素皮膜を用いる場合のTNモードでの液晶表示装置の製造方法を示す。 Next, as a second embodiment, a method of manufacturing a liquid crystal display device in the TN mode when a fluorine film is used as the liquid repellent treatment layer will be described.
CF基板の撥液晶処理工程において、画素領域からシール塗布位置の間の額縁BMの表面上に対し、フッ素化処理を施した。このフッ素化処理として、フッ素系分子を成膜装置にて局所的に堆積させた後、重合処理を行うことにより、膜厚が約100nmのフッ素皮膜を閉曲線状に形成させた。また、額縁BMとTFT基板との間隙距離が2.3μmである液晶表示パネルで、貼り合せ工程アウト〜熱硬化工程インまでのリードタイムを2分以内とするプロセス条件で作製する為に、フッ素皮膜幅を4.5mmとした(画素領域の間隙(ギャップ)の狙い値は2.2μm)。一方、TFT基板の撥液晶処理工程においても、CF基板の前記フッ素皮膜に対向する画素領域からシール塗布位置の間のTFT基板のSiNx膜面上に対し、同様なフッ素化処理を行った。このようにしてTFT基板側にもCF基板と同様に、膜厚が約100nmのフッ素皮膜を4.5mm幅で閉曲線状に形成させた。 In the liquid crystal repellent treatment process of the CF substrate, the surface of the frame BM between the pixel region and the seal application position was subjected to fluorination treatment. As this fluorination treatment, a fluorine film having a film thickness of about 100 nm was formed in a closed curve by locally depositing fluorine-based molecules with a film forming apparatus and then performing a polymerization treatment. In addition, in a liquid crystal display panel with a gap distance between the frame BM and the TFT substrate of 2.3 μm, fluorine can be produced under the process conditions in which the lead time from the bonding process out to the thermosetting process in is within 2 minutes. The film width was set to 4.5 mm (the target value of the gap (gap) in the pixel region was 2.2 μm). On the other hand, in the liquid crystal repellent treatment process of the TFT substrate, the same fluorination treatment was performed on the SiNx film surface of the TFT substrate between the pixel region facing the fluorine film of the CF substrate and the seal application position. In this manner, a fluorine film having a film thickness of about 100 nm was formed in a closed curve with a width of 4.5 mm on the TFT substrate side in the same manner as the CF substrate.
次に、シール塗布工程において、ハイブリッド型(UV+熱硬化)シール材を、画素領域を囲うように所定の位置に、外周(補助)シール及び本シールとしてそれぞれ閉曲線状に塗布した。次に、Ag塗布工程において、Agトランスファーを前記本シール外側の所定の位置にマトリックス状に滴下した。次に、液晶滴下工程において、液晶材を前記本シール内側の所定の位置に、所定の滴下量で打点状に塗布した。その後、貼り合せ工程において、前記両基板を接触・加圧することで、基板間の画素領域全域に液晶材を均一に拡散させながら、基板間のギャップを均一に形成させた。そして次工程への搬送の際、シール材の仮止めとして部分的に数箇所のUV仮硬化を行った。次のUV硬化工程において、UV照射量3000mJにてシール材を硬化させた。このとき前記フッ素皮膜により、未硬化状態のシール材と液晶材とが接触していないことを確認出来た。そして、次に熱硬化工程において、120℃、1時間加熱することによりシール材を完全硬化させた。このとき加熱開始時点では、前記フッ素皮膜により、半硬化状態のシール材と液晶材とが接触していないことを確認した。その後、シール材の熱硬化が完了するときには、液晶材は本シール内側全領域に拡散・充填され、シール材と液晶材とが接し合い、額縁BM近傍においてもギャップが形成された。熱硬化完了後、液晶表示パネルの画素領域及び額縁BM近傍のギャップ測定を実施した。その結果、画素領域全域で均一なギャップが得られていることを確認出来た。 Next, in the seal application process, a hybrid type (UV + thermosetting) sealant was applied in a closed curve shape as a peripheral (auxiliary) seal and a main seal at predetermined positions so as to surround the pixel region. Next, in the Ag application step, Ag transfer was dropped in a matrix at predetermined positions outside the main seal. Next, in the liquid crystal dropping step, the liquid crystal material was applied to the predetermined position inside the main seal in the form of dots at a predetermined dropping amount. Thereafter, in the bonding step, the two substrates were brought into contact with each other and pressed to uniformly diffuse the liquid crystal material throughout the pixel region between the substrates, thereby forming a uniform gap between the substrates. And in the case of conveyance to the next process, UV temporary hardening of some places was performed partially as temporary stop of a sealing material. In the next UV curing step, the sealing material was cured at a UV irradiation amount of 3000 mJ. At this time, it was confirmed by the fluorine film that the uncured sealing material and the liquid crystal material were not in contact. Then, in the thermosetting step, the sealing material was completely cured by heating at 120 ° C. for 1 hour. At this time, it was confirmed that the semi-cured sealing material and the liquid crystal material were not in contact with each other by the fluorine film at the start of heating. Thereafter, when the thermosetting of the sealing material was completed, the liquid crystal material was diffused and filled in the entire area inside the seal, the sealing material and the liquid crystal material were in contact with each other, and a gap was also formed in the vicinity of the frame BM. After the thermosetting was completed, a gap measurement in the vicinity of the pixel region and the frame BM of the liquid crystal display panel was performed. As a result, it was confirmed that a uniform gap was obtained over the entire pixel region.
このようにして作製した本発明の実施例である液晶表示装置の高温高湿試験を実施した。温度60℃、湿度60%環境化での1500h駆動試験を実施した結果、液晶表示パネルのシール周辺部におけるシミ、ムラ及びシール剥離の発生は確認されず、良好な表示状態であった。比較として、撥液晶処理層を形成させていない液晶表示パネルを作製したが、駆動試験1000hに達する頃に、シール周辺部においてシミ及び一部のシール剥離が発生しているのが確認された。 A high-temperature and high-humidity test of the liquid crystal display device according to the embodiment of the present invention thus manufactured was performed. As a result of carrying out a 1500 h drive test at a temperature of 60 ° C. and a humidity of 60%, the occurrence of spots, unevenness, and peeling of the seal in the periphery of the seal of the liquid crystal display panel was not confirmed, and a good display state was obtained. As a comparison, a liquid crystal display panel in which the liquid repellent treatment layer was not formed was produced, but it was confirmed that spots and partial seal peeling occurred in the periphery of the seal when the driving test reached 1000 h.
次に、第3の実施例として、撥液晶処理層としてシリコーン皮膜を用いる場合のIPSモードでの液晶表示装置の製造方法を示す。 Next, as a third embodiment, a method for manufacturing a liquid crystal display device in the IPS mode when a silicone film is used as the liquid repellent treatment layer will be described.
CF基板の撥液晶処理工程において、画素領域からシール塗布位置の間の額縁BMの表面上に対し、シリコーン化処理を施し、膜厚が約100nmのシリコーン皮膜を閉曲線状に形成させた。また、額縁BMとTFT基板との間隙距離が2.1μmである液晶表示パネルで、貼り合せ工程アウト〜熱硬化工程インまでのリードタイムを2分以内とするプロセス条件で作製する為に、シリコーン皮膜幅を4mmとした(画素領域の間隙(ギャップ)の狙い値は2.0μm)。一方、TFT基板の撥液晶処理工程においても、CF基板の前記シリコーン皮膜に対向する画素領域からシール塗布位置の間のTFT基板のSiNx膜面上に対し、同様なシリコーン化処理を行った。このようにして、TFT基板側にもCF基板と同様に、膜厚が約100nmのシリコーン皮膜を4mm幅で閉曲線状に形成させた。 In the liquid crystal repellent treatment process of the CF substrate, the surface of the frame BM between the pixel region and the seal application position was subjected to silicone treatment to form a silicone film having a film thickness of about 100 nm in a closed curve shape. In addition, a liquid crystal display panel with a gap distance of 2.1 μm between the frame BM and the TFT substrate is manufactured in a process condition in which the lead time from the bonding process out to the thermosetting process in is within 2 minutes. The film width was set to 4 mm (the target value of the gap (gap) in the pixel region was 2.0 μm). On the other hand, in the liquid crystal repellent treatment process of the TFT substrate, the same silicone treatment was performed on the SiNx film surface of the TFT substrate between the pixel region facing the silicone film of the CF substrate and the seal application position. In this way, a silicone film having a film thickness of about 100 nm was formed on the TFT substrate side in a closed curve shape with a width of 4 mm, similarly to the CF substrate.
次に、シール塗布工程において、ハイブリッド型(UV+熱硬化)シール材を、画素領域を囲うように所定の位置に、外周(補助)シール及び本シールとしてそれぞれ閉曲線状に塗布した。次に、液晶滴下工程において、液晶材を前記本シール内側の所定の位置に、所定の滴下量でマトリックス状に滴下した。その後、貼り合せ工程において、前記両基板を接触・加圧することで、基板間の画素領域全域に液晶材を均一に拡散させながら、基板間のギャップを均一に形成させた。そして次工程への搬送の際、シール材の仮止めとして部分的に数箇所のUV仮硬化を行った。次のUV硬化工程において、UV照射量3000mJにてシール材を硬化させた。このとき前記シリコーン皮膜により、未硬化状態のシール材と液晶材とが接触していないことを確認出来た。そして、次に熱硬化工程において、120℃、1時間加熱することによりシール材を完全硬化させた。このとき加熱開始時点では、前記シリコーン皮膜により、半硬化状態のシール材と液晶材とが接触していないことを確認した。その後、シール材の熱硬化が完了するときには、液晶材は本シール内側全領域に拡散・充填され、シール材と液晶材とが接し合い、額縁BM近傍においてもギャップが形成された。熱硬化完了後、液晶表示パネルの画素領域及び額縁BM近傍のギャップ測定を実施した。その結果、画素領域全域で均一なギャップが得られていることを確認出来た。 Next, in the seal application process, a hybrid type (UV + thermosetting) sealant was applied in a closed curve shape as a peripheral (auxiliary) seal and a main seal at predetermined positions so as to surround the pixel region. Next, in the liquid crystal dropping step, the liquid crystal material was dropped in a matrix form at a predetermined drop amount at a predetermined position inside the main seal. Thereafter, in the bonding step, the two substrates were brought into contact with each other and pressed to uniformly diffuse the liquid crystal material throughout the pixel region between the substrates, thereby forming a uniform gap between the substrates. And in the case of conveyance to the next process, UV temporary hardening of some places was performed partially as temporary stop of a sealing material. In the next UV curing step, the sealing material was cured at a UV irradiation amount of 3000 mJ. At this time, it was confirmed by the silicone film that the uncured sealing material and the liquid crystal material were not in contact. Then, in the thermosetting step, the sealing material was completely cured by heating at 120 ° C. for 1 hour. At this time, it was confirmed that the semi-cured sealing material and the liquid crystal material were not in contact with each other by the silicone film at the start of heating. Thereafter, when the thermosetting of the sealing material was completed, the liquid crystal material was diffused and filled in the entire area inside the seal, the sealing material and the liquid crystal material were in contact with each other, and a gap was also formed in the vicinity of the frame BM. After the thermosetting was completed, a gap measurement in the vicinity of the pixel region and the frame BM of the liquid crystal display panel was performed. As a result, it was confirmed that a uniform gap was obtained over the entire pixel region.
このようにして作製した本発明の実施例である液晶表示装置の高温高湿試験を実施した。温度60℃、湿度60%環境化での1500h駆動試験を実施した結果、液晶表示パネルのシール周辺部におけるシミ、ムラ及びシール剥離の発生は確認されず、良好な表示状態であった。比較として、撥液晶処理層を形成させていない液晶表示パネルを作製したが、駆動試験1000hに達する頃に、シール周辺部においてシミが発生しているのが確認された。 A high-temperature and high-humidity test of the liquid crystal display device according to the embodiment of the present invention thus manufactured was performed. As a result of carrying out a 1500 h drive test at a temperature of 60 ° C. and a humidity of 60%, the occurrence of spots, unevenness, and peeling of the seal in the periphery of the seal of the liquid crystal display panel was not confirmed, and a good display state was obtained. As a comparison, a liquid crystal display panel in which no liquid repellent treatment layer was formed was produced, but it was confirmed that spots were generated in the periphery of the seal when the driving test reached 1000 h.
本発明は、対向する一対の基板間に液晶を挟持する液晶表示パネル及び該液晶表示パネルを用いる液晶表示装置並びにその製造方法に利用可能である。 INDUSTRIAL APPLICABILITY The present invention can be used for a liquid crystal display panel that sandwiches liquid crystal between a pair of opposing substrates, a liquid crystal display device that uses the liquid crystal display panel, and a method for manufacturing the same.
1 液晶表示パネル
2 TFT基板
3 CF基板
4 液晶材
5 シール材
6 額縁BM
7 色層
8 駆動回路層
9 配向膜
10 柱スペーサ
10a 球状スペーサ
11 撥液晶処理層
11a フッ素被膜
11b シリコーン被膜
12 凸部
13 流動制御壁
DESCRIPTION OF
7 Color layer 8 Drive circuit layer 9 Alignment film 10 Column spacer 10a Spherical spacer 11 Liquid repellent treatment layer 11a Fluorine coating 11b Silicone coating 12 Protrusion 13 Flow control wall
Claims (5)
前記液晶表示パネルは、前記シール材で囲まれた領域に前記液晶材を滴下し、前記第1の基板と前記第2の基板とを貼り合わせた後、前記シール材を硬化して前記液晶材を封止して製造されるものであり、
前記額縁の前記第1の基板の前記ブラックマトリクスと前記第2の基板間のギャップが2.0μmであり、
前記第1の基板の前記ブラックマトリクス上、及び/又は、前記第2の基板の前記有機膜或いは前記無機膜上の少なくとも一部に、前記液晶材を弾く撥液晶処理層を有し、前記撥液晶処理層はフッ素膜又はシリコーン膜であり、その厚さが10〜100nmかつ幅が4.5mm以上であり、
前記遮光領域における前記第1の基板及び/又は前記第2の基板の前記液晶材に対する接触角が、前記遮光領域の内側の画素領域における接触角よりも大きいことを特徴とする液晶表示パネル。 A liquid crystal material is provided between a first substrate in which a black matrix is formed in a light shielding region of a frame and a second substrate in which an organic film or an inorganic film is formed in the light shielding region, and the light shielding of at least one substrate In the liquid crystal display panel in which the liquid crystal material is sealed by a sealing material provided outside the region,
The liquid crystal display panel drops the liquid crystal material in a region surrounded by the sealing material, bonds the first substrate and the second substrate, and then cures the sealing material to form the liquid crystal material. Is manufactured by sealing,
A gap between the black matrix of the first substrate of the frame and the second substrate is 2.0 μm;
A liquid repellent treatment layer for repelling the liquid crystal material on at least a part of the black matrix of the first substrate and / or the organic film or the inorganic film of the second substrate; The liquid crystal treatment layer is a fluorine film or a silicone film, and has a thickness of 10 to 100 nm and a width of 4.5 mm or more.
A liquid crystal display panel, wherein a contact angle of the first substrate and / or the second substrate with respect to the liquid crystal material in the light shielding region is larger than a contact angle with a pixel region inside the light shielding region.
前記液晶材を滴下する前の前記一方の基板、及び/又は、前記一方の基板に貼り合わせる前の前記他方の基板の、前記遮光領域の少なくとも一部に、前記液晶材を弾く撥液晶処理を施し、前記遮光領域における前記一方の基板及び/又は前記他方の基板の前記液晶材に対する接触角を増加させるものであり、A liquid repellent treatment for repelling the liquid crystal material on at least a part of the light shielding region of the one substrate before dropping the liquid crystal material and / or the other substrate before being bonded to the one substrate. And increasing the contact angle of the one substrate and / or the other substrate with respect to the liquid crystal material in the light shielding region,
前記額縁の前記第1の基板の前記ブラックマトリクスと前記第2の基板間のギャップが2.0μmであり、A gap between the black matrix of the first substrate of the frame and the second substrate is 2.0 μm;
前記撥液晶処理により形成される撥液晶処理層がフッ素膜またはシリコーン膜であり、その厚さが10〜100nmかつ幅が4.5mm以上であることを特徴とする液晶表示パネルの製造方法。A method for producing a liquid crystal display panel, wherein the liquid repellent treatment layer formed by the liquid repellent treatment is a fluorine film or a silicone film, and has a thickness of 10 to 100 nm and a width of 4.5 mm or more.
前記液晶材を滴下する前の前記第2の基板の前記有機膜或いは前記無機膜上、及び/又は、前記第2の基板と貼り合わせる前の前記第1の基板の前記ブラックマトリクス上の少なくとも一部に、前記液晶材を弾く撥液晶処理を施し、前記遮光領域における前記第1の基板及び/又は前記第2の基板の前記液晶材に対する接触角を増加させるものであり、At least one on the organic film or the inorganic film of the second substrate before dropping the liquid crystal material and / or on the black matrix of the first substrate before being bonded to the second substrate. Part is subjected to a liquid repellent treatment to repel the liquid crystal material to increase a contact angle of the first substrate and / or the second substrate with respect to the liquid crystal material in the light shielding region,
前記額縁の前記第1の基板の前記ブラックマトリクスと前記第2の基板間のギャップが2.0μmであり、A gap between the black matrix of the first substrate of the frame and the second substrate is 2.0 μm;
前記撥液晶処理により形成される撥液晶処理層がフッ素膜またはシリコーン膜であり、その厚さが10〜100nmかつ幅が4.5mm以上であることを特徴とする液晶表示パネルの製造方法。A method for producing a liquid crystal display panel, wherein the liquid repellent treatment layer formed by the liquid repellent treatment is a fluorine film or a silicone film, and has a thickness of 10 to 100 nm and a width of 4.5 mm or more.
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| US12/266,184 US8629969B2 (en) | 2007-11-08 | 2008-11-06 | Liquid crystal display panel and method of manufacturing the liquid crystal display panel |
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| CN102967966B (en) * | 2012-11-20 | 2015-05-20 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and manufacturing method thereof |
| US9030631B2 (en) | 2012-11-20 | 2015-05-12 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Liquid crystal displaying panel and manufacturing method thereof |
| KR102418432B1 (en) * | 2015-01-23 | 2022-07-08 | 삼성디스플레이 주식회사 | Liquid crystal display and method for manufacturing the same |
| CN106353931A (en) * | 2016-11-04 | 2017-01-25 | 张家港康得新光电材料有限公司 | 3d display screen |
| CN106654060B (en) * | 2016-12-19 | 2018-12-28 | 纳晶科技股份有限公司 | Production method, black film and the luminescent device of black film |
| CN111045270A (en) * | 2019-12-31 | 2020-04-21 | Oppo广东移动通信有限公司 | Photonic crystal color changing device, color changing method, shell and electronic equipment |
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| JP3298607B2 (en) * | 1995-09-29 | 2002-07-02 | ソニー株式会社 | Liquid crystal element and manufacturing method thereof |
| JP2000122078A (en) * | 1998-10-21 | 2000-04-28 | Canon Inc | Liquid crystal cell and liquid crystal display |
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