JP5332843B2 - X-ray holography measurement method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To perform both kinds of measurement, the diffracted X-ray holographic measurement and the transmission X-ray holographic measurement, regarding the method of X-ray holographic measurement. <P>SOLUTION: A specimen for measurement includes an X-ray absorbing-film absorbing X-rays on the other surface of a base material, as opposed to one surface thereof, the base material including a measuring part; a first opening bored through the absorbing film, in the other surface corresponding to the measuring part; a second opening bored through the absorbing film, the base material, and a domain adjoining the measuring part; and a crystal piece placed above the second opening. X-rays are applied to the other surface of each specimen, facing the one surface thereof, to overlap diffracted light from the measuring part with diffracted light from the crystal piece on a detection surface positioned on the one surface side. Interference fringes formed by the overlapping are analyzed as a hologram. <P>COPYRIGHT: (C)2011,JPO&amp;INPIT

Description

  The present invention relates to an X-ray holography measurement method, for example, a configuration for obtaining diffraction information and X-ray absorption information from the same measurement unit in a measurement sample.

  Conventionally, a sample analysis method by diffraction using X-rays has been performed in order to analyze various physical properties of a sample. Normally used X-rays have a beam size larger than the coherent length of X-rays (coherence length), so that incoherent X is not coherent between two spatially separated waves. Is a line.

  When diffraction measurement is performed with incoherent X-rays, phase information is lost in the X-ray diffraction intensity obtained in the experiment, and thus a real space structure cannot be obtained. Therefore, a diffraction measurement using a coherent X-ray obtained by cutting out a beam smaller than the coherent length of the X-ray by placing a pinhole upstream of the measurement sample has been attempted. A typical example is diffraction measurement of gold nanocrystals by Robinson et al. (See, for example, Non-Patent Document 1).

  The phase of the obtained diffraction measurement can be determined using a phase recovery algorithm such as the Hybrid Input Output method to obtain a real space structure (see, for example, Non-Patent Document 2).

  However, when such a phase recovery algorithm is used, there is a possibility that the phase converged by repeated calculation is not a correct real space structure but a local solution. Therefore, transmission X-ray holography measurement is performed as a method capable of experimentally determining the phase.

  Transmission X-ray holography measurement divides the wavefront of coherent X-rays into two, and superimposes the X-ray (object light) that has passed through the sample and the X-ray (reference light) that does not pass through the sample on the far-off detection surface In this method, the interference fringes are recorded as a hologram. Since phase information is also recorded in this hologram, the structure of the real space can be uniquely determined.

  In this transmission X-ray holography method, since the interference between the X-ray transmitted through the sample and the reference light X-ray is measured, the sample shape can be evaluated from the difference in the amount of X-ray absorption by the sample. (For example, see Non-Patent Document 3).

  In addition, an example in which the magnetic domain distribution of a magnetic film is evaluated by utilizing the difference in the amount of X-ray absorption between clockwise circularly polarized light and counterclockwise circularly polarized light has been reported (see, for example, Non-Patent Document 4). In this method, since the difference in the amount of X-ray absorption by the sample is measured, the density distribution and element distribution in the film surface can also be evaluated.

I. K. Robinson, I.D. A. Vartanyants, G.M. J. et al. Williams, M.M. A. Pfeifer, J. et al. A. Pitney, Phys. Rev. Lett. , Vol. 87, p. 195505, 2001 J. et al. R. Fienup, Appl. Opt. Vol. 20, p. 2758-2369, 1982 W. F. Schlotter, R.A. Rick, K.M. Chen, A.M. Scherz, J .; Stohr, J .; Luning, S.M. Eisebitt, Ch. Gunther, W.M. Eberhardt, O .; Hellwig, I .; McNulty, Appl. Phys. Lett. , Vol. 89, p. 163112, 2006 S. Eisebitt, J.M. Lunng, W.L. F. Schlotter, M.M. Lorgen, O .; Hellwig, W.M. Eberhardt, J. et al. Stohr, Nature, Vol. 432, p. 885,2004

  However, since this conventional technique does not utilize X-ray diffraction, crystallinity in the film surface of the sample, crystal orientation, crystal stacking fault, which can be known only by diffracting X-rays, There is a problem that it is not possible to acquire information on a distribution such as distortion.

  Therefore, an object of the present invention is to enable measurement by both methods of diffraction X-ray holography measurement and transmission X-ray holography measurement.

  From one aspect of the present invention, the measurement unit provided on the front side of the substrate and at least one transmission hole that transmits reference X-rays adjacent to the measurement unit are provided, and the measurement unit is provided on the back side of the substrate. And a coherent X-ray is irradiated from the back surface of the measurement sample having an X-ray absorption film covering the region other than the transmission hole, and the emission X-ray from the measurement unit and the emission X-ray from the transmission hole are irradiated on the surface side. An X-ray holography measurement method in which the interference fringes formed by the superposition are analyzed as a hologram, and the irradiated X-rays are diffracted between the transmission hole and the detection surface. Providing a crystal piece, obtaining an interference fringe by superimposing the diffracted X-ray from the transmission hole in the state in which the crystal piece is provided and the diffracted X-ray from the measurement unit; and a state in which the crystal piece is not provided. Transmitted X-rays from the transmission hole and the measurement X-ray holography measurement method characterized and a step of acquiring the interference fringes due to superposition of the transmitted X-rays from is provided.

  From another viewpoint of the present invention, the measurement unit provided on the surface side of the substrate and at least one transmission hole that transmits the reference X-ray adjacent to the measurement unit are provided on the back side of the substrate. The coherent X-ray is irradiated from the back surface of the measurement sample having an X-ray absorption film covering the region other than the measurement unit and the transmission hole, and the emission X-ray from the measurement unit and the emission X-ray from the transmission hole are irradiated. An X-ray holography measurement method that superimposes on a detection surface located on the front surface side and analyzes the interference fringes formed by the superposition as a hologram, wherein the method includes between at least one of the transmission holes and the detection surface. A crystal piece for diffracting irradiated X-rays is provided, and the other transmission hole among the transmission holes is not provided with the crystal piece, and the diffraction X-ray from the transmission hole provided with the crystal piece and the measurement unit Drying by overlapping with diffraction X-rays An X-ray holography measurement method characterized by simultaneously obtaining a fringe and an interference fringe by superimposing a transmission X-ray from another transmission hole not provided with the crystal piece and a transmission X-ray from the measurement unit Provided.

  According to the disclosed X-ray holography measurement method, both the diffraction X-ray holography measurement and the transmission X-ray holography measurement can be measured. As a result, it is possible to uniquely determine the shape of the sample within the film surface, the distribution of crystallinity within the film surface of the sample, and the like.

It is explanatory drawing of the X-ray holography measuring method of embodiment of this invention. It is explanatory drawing to the middle of the preparation process of the sample for a measurement used for the X-ray holography measuring method of Example 1 of this invention. It is explanatory drawing to the middle after FIG. 2 of the preparation process of the sample for a measurement used for the X-ray holography measuring method of Example 1 of this invention. It is explanatory drawing to the middle after FIG. 3 of the preparation process of the sample for a measurement used for the X-ray holography measuring method of Example 1 of this invention. It is explanatory drawing after FIG. 4 of the manufacturing process of the sample for a measurement used for the X-ray holography measuring method of Example 1 of this invention. It is explanatory drawing of the X-ray holography measuring method of Example 2 of this invention. It is explanatory drawing of the X-ray holography measuring method of Example 3 of this invention. It is explanatory drawing of the X-ray holography measuring method of Example 4 of this invention.

  Here, an X-ray holography measurement method according to an embodiment of the present invention will be described with reference to FIG. FIG. 1 is a conceptual configuration explanatory diagram of an X-ray holography measurement method according to an embodiment of the present invention. As shown in FIG. 1, a measurement sample 10 for diffraction X-ray holography measurement, which is a problem, is provided on the back side of a substrate 11 provided with a thin film 12 including a microfabricated measurement unit 13 used in a device. An X-ray absorption film 14 is provided.

  The X-ray absorption film 14 is provided with an opening 17 so that X-rays can pass through the measurement unit 13 as a measurement location, and the substrate 11 and the thin film 12 are within the X-ray coherence distance from the opening 17. And at least one through-hole penetrating the X-ray absorbing film 14 is provided. Here, a case where two through holes 15 and 16 are provided is illustrated.

  A crystal piece 18 for generating reference light for diffraction X-ray holography measurement is placed on the X-ray path on the thin film 12 side of at least one of the through holes 15. In this case, the crystal piece 18 may be arranged so as to be in direct contact with the thin film 12, or the crystal piece 18 may be installed so as to protrude from a reinforcing / supporting washer (not shown). There is no need to be in direct contact with 12.

  In this case, the crystal piece 18 is preferably a simple substance having a simple crystal structure, and particularly preferably a single crystal. For example, a Si single crystal piece or a single crystal metal piece may be used. If it is a simple substance, a polycrystalline metal piece may be used.

  As the crystal piece 18, it is desirable to use a crystal piece having a lattice constant approximate to the lattice constant of the measurement unit 13, for example, a lattice constant in a range of ± 5% of the lattice constant of the measurement unit 13. In that case, interference fringes can be generated on the detection surface 24 by placing the measurement sample 10 and the crystal piece 18 in a parallel state where the angle θ is θ = 0 °. In particular, it is desirable to use a crystal piece 18 made of the same material as the measurement unit 13.

  When a crystal piece 18 having a lattice constant different from the lattice constant of the measurement unit 13 is selected, the Bragg angle of the diffracted material X-ray 22 from the measurement unit 13 and the diffraction reference X-ray 23 from the crystal piece 18 are selected. What is necessary is just to determine angle (theta) which the sample 10 for a measurement and the crystal piece 18 make so that a Bragg angle may correspond.

  When the measurement sample 10 is irradiated with coherent X-rays 19 from the X-ray absorption film 14 side, the coherent X-rays 19 that have passed through the opening 17 are absorbed by the measurement unit 13 and are diffracted and transmitted X-rays. 20 and diffracted material X-rays 22 are generated. On the other hand, the coherent X-ray 19 that has passed through the through-hole 16 becomes the transmission reference X-ray 21 as it is, and the coherent X-ray 19 that has passed through the through-hole 15 is diffracted by the crystal piece 18 to become the diffraction reference X-ray 23.

  The coherent X-ray 19 is preferably an X-ray having a large coherence length. For example, when a free electron laser is used, the coherence length is about several hundreds of μm.

  The transmission material X-ray 20 and the transmission reference X-ray 21 interfere with each other on the detection surface 24 separated by about 50 cm to 5 m to form an interference fringe, and the interference fringe is detected by the detector 25 disposed on the detection surface 24. A transmission X-ray holography measurement is performed.

  On the other hand, the diffracted material X-ray 22 and the diffraction reference X-ray 23 also interfere with each other on the detection surface 24 to form interference fringes, which could not be measured conventionally by detecting the interference fringes with the detector 26 disposed on the detection surface 24. Diffraction X-ray holography measurement will be performed simultaneously.

  As described above, the diffraction X-ray holography measurement makes it possible to uniquely determine the crystallinity distribution in the film surface of the sample, which has been impossible in the past. In addition, by using this sample, it is possible to perform transmission X-ray holography measurement, which is a conventional technique, at the same time. Therefore, it is possible to evaluate the crystal state and magnetic domain of the thin film sample on the micro-processed substrate using the same sample and investigate the relationship between the two.

  When only one reference X-ray through-hole is provided, first, after performing transmission X-ray holography measurement with the through-hole open, a crystal piece is placed so as to cover the through-hole and diffracted. X-ray holography may be performed. The order may be reversed.

  Based on the above, a measurement sample manufacturing process used in the X-ray holography measurement method according to the first embodiment of the present invention will be described with reference to FIGS. First, as shown in FIG. 2A, a thin film 32 including a measurement object 33 is formed on a Si wafer 31. Here, the measurement object is, for example, a ferroelectric capacitor including a Pt lower electrode / PZT film / Pt upper electrode, and the ferroelectric capacitor is covered with an interlayer insulating film.

  Reference numeral 34 denotes a cutting line for cutting out a region including the measurement object 33 into a sample size for measurement. The sample size is arbitrary, but is set to, for example, about 3 mm × 3 mm to 10 mm × 10 mm from the viewpoint of ease of handling.

  Next, as shown in FIG. 2B, for example, the Si wafer 31 is cut out along the cutting line 34 using a dicer (not shown) to form the Si substrate 35. Or you may punch using a disk punch instead of a dicer.

  Next, as shown in FIG. 3C, a supporting washer 36 is attached to the thin film 32 side with an adhesive in order to reinforce and support the Si substrate 35 in the next thinning step.

Next, as shown in FIG. 3D, the back surface of the Si substrate 35 is thinned by polishing or the like. For example, after polishing to a thickness of about several hundreds μm with a paper file or the like, it is polished to a thickness of about 10 to 50 μm with a grinder or the like, and finally processed to an optimum sample thickness by ion milling or the like.
The optimum sample thickness depends on the energy of the X-ray to be measured.

  This sample thickness is a film thickness that provides satisfactory measurement accuracy based on experience. Here, for example, the substrate thickness is such that the X-ray transmission intensity at the measurement energy is 10% or more of the incident X-ray intensity. The Si substrate 35 is thinned up to. If more accurate measurement is required, the substrate thickness may be further reduced.

  Next, as shown in FIG. 4E, an X-ray absorption film 37 is formed on the back surface of the thinned Si substrate 35 by using a sputtering method, a vacuum evaporation method, or a plating method. In this case, the film thickness of the X-ray absorption film 37 is also set to a film thickness that can provide satisfactory measurement accuracy based on experience. The film is formed to a thickness that is 1% or less of the strength. In addition, when more highly accurate measurement is required, the film thickness may be further increased.

  Here, the reason for forming the X-ray absorption film 37 again after thinning the Si substrate 35 will be described. In general, it is difficult to make a small and deep hole. For example, in the FIB (focused ion beam) method, it is not perpendicular to the film thickness direction but can be cut at an angle of about 1 °. Eventually, a hole cannot be drilled at a certain depth.

  On the other hand, it is known that the absorption of X-rays by a film depends on the energy of X-rays, the type of elements in the film, the density of the film, the film thickness, and the like. When measurement is performed using high-energy X-rays, the thickness of the X-ray absorption film 37 may be increased, but on the other hand, it is difficult to make a small hole.

Therefore, in order to efficiently absorb X-rays with a small film thickness, it is preferable to select a high-density film having a large atomic number as shown in the table below, and iridium, platinum, gold, etc. are optimal.

The Si substrate 35 having an atomic number of 14 and a density of 2.3 [g / cm ³ ] has poor X-ray absorption efficiency (the X-ray transmittance of 1 μm thickness is 3 for 700 eV X-rays). .78 × 10 ⁻¹ ). Therefore, after thinning the Si substrate 35, a film of iridium, platinum, gold or the like is formed, so that the film thickness of the entire measurement sample is reduced, and a small hole for reference X-ray described later is opened. Becomes easier.

  Next, as shown in FIG. 4F, through-holes 38 and 39 that penetrate the sample for reference light of X-ray holography are formed using the FIB method. In this case, the desired measurement object 33 is confirmed, and a hole is opened from the thin film surface side so that it is possible to determine a location where the reference light through holes 38 and 39 are opened.

  In this case, the size of the reference light through holes 38 and 39 and the distance from the measurement object 33 to the through holes 38 and 39 are determined in consideration of the coherence length of the incident X-rays. Here, the size of the through holes 38 and 39 is about 0.05 μm × 0.05 μm to 0.5 μm × 0.5 μm, and the distance from the measurement object 33 to the through holes 38 and 39 is about 0.5 μm to 50 μm. In any case, it is within the range of the coherence length of incident X-rays.

  Next, as shown in FIG. 5G, the X-ray absorption film 37 is selectively removed using the FIB method so that the region corresponding to the measurement object 33 of the Si substrate 35 is exposed, and the opening 40 is formed. Form. At this time, the through holes 38 and 39 are used for specifying the measurement object 33 from the X-ray absorption film 37 side.

  In this case, the size of the opening 40 is, for example, 1 μm × 1 μm to 2 μm × 2 μm, and the depth is sufficient if the X-ray absorption film 37 is completely removed. In principle, it is desirable to completely remove the Si substrate 35. However, in reality, it is not desirable to make the measurement object 33 too deep because the measurement object 33 is damaged by the FIB in the removal process.

  Finally, as shown in FIG. 5 (h), a crystal piece 41 for generating reference light for diffraction X-ray holography measurement is formed between the measurement sample and the crystal piece 41 so as to cover one through-hole 38. The angle θ is set so that θ = 0 °. Here, a dual beam apparatus having both functions of FIB and SEM (scanning electron microscope) is used to install the crystal piece 41.

  First, a crystal piece 41 is cut out from a prepared crystal using FIB. The size of the crystal piece 41 is set to a size having a surface larger than the through-hole 38 and does not projectably block the object light opening 40 even if the crystal piece 41 is installed, for example, a cube having one side of about 1 μm. . Here, since the ferroelectric capacitor is a measurement object, for example, a single Pt piece is used as the crystal piece 41. The Pt piece is preferably a single crystal, but is usually polycrystalline.

  The cut crystal piece 41 is bonded to a microsampling needle in the dual beam apparatus. While checking the SEM image, the cut crystal piece 41 is brought on the through hole 38. In this case, the angle θ formed between the measurement sample and the crystal piece 41 can be set to a desired angle with an accuracy of about 0.1 ° by checking the SEM image.

  In addition, for adhesion between the measurement sample and the crystal piece, the deposition function of the FIB apparatus is used, for example, both are fixed by the deposition of the carbon film 42 that hardly absorbs X-rays. After fixing the measurement sample and the crystal piece 41, the microsampling needle and the crystal piece 41 are separated by FIB. If the crystal piece 41 is too thick, it can be thinned by processing with FIB after this.

  As described above, by performing the sample processing sequentially, the diffraction X-ray holography measurement and the transmission X-ray holography measurement are simultaneously performed on the desired measurement object 33 of the actual device as shown in FIG. A measurement sample that can be obtained is obtained.

  Next, an X-ray holography measurement method according to Embodiment 2 of the present invention will be described with reference to FIG. FIG. 6 is a conceptual cross-sectional view of a measurement sample used in the X-ray holography measurement method of Example 2 of the present invention. As described in the first embodiment, when the crystal piece 41 of the same material as the object to be measured or the crystal piece of the same lattice constant is selected, the Bragg angles of the diffracted X-rays are the same, so θ = 0 ° good.

  However, when a crystal piece 41 having a lattice constant different from that of the measurement object 33, for example, a Si single crystal piece is selected, the crystal piece 41 needs to be inclined with respect to the measurement sample. Considering that the distance between the measurement sample and the detector is about 50 cm to 5 m and is sufficiently far compared with the distance between the through hole 38 and the opening 40, the Bragg angle of the diffracted material X-ray from the measurement sample is Then, the angle θ formed so that the Bragg angles of the diffraction reference light X-rays from the crystal piece 41 coincide with each other is determined.

  Here, the crystal piece 41 is adhered to a microsampling needle in the dual beam apparatus, and the crystal piece 41 is brought on the through hole 38 while confirming the SEM image. Next, the sample is placed while confirming the SEM image so that the angle θ between the measurement sample and the crystal piece 41 becomes a predetermined angle.

  Next, using the deposition function of the FIB apparatus, for example, a carbon film 42 that hardly absorbs X-rays may be deposited to fix the both. After the measurement sample and the crystal piece 41 are fixed, the measurement sample shown in FIG. 6 is obtained by separating the microsampling needle and the crystal piece 41 by FIB.

  Next, an X-ray holography measurement method according to Example 3 of the present invention will be described with reference to FIG. FIG. 7 is a conceptual cross-sectional view of a measurement sample used in the X-ray holography measurement method of Example 3 of the present invention. In Example 3, the desired measurement object 33 is in the vicinity of the surface of the thin film 32 and may be damaged in the subsequent sample preparation process.

  Therefore, before cutting out from the Si wafer 31, a transparent protective film 43 is provided on the thin film 32 in the visible light region. Here, for example, a plasma polymerization film using methylene ethane / Ar gas is provided as the protective film 43. Since such a carbon-based plasma polymerized film hardly absorbs X-rays, it does not affect the measurement.

  Thereafter, the measurement sample shown in FIG. 7 is obtained by sequentially performing each step in the same manner as in Example 1 described above. The protective film 43 may be marked with a laser so that the position of the desired measurement object 33 can be specified.

  Next, an X-ray holography measurement method according to Example 4 of the present invention will be described with reference to FIG. In the fourth embodiment of the present invention, only one through hole for reference light is provided, and the basic manufacturing process is the same as in the first embodiment.

  First, as shown in FIG. 8A, a transmission X-ray hologram is obtained by irradiating coherent X-rays 44 without covering the through-holes 38 with crystal pieces. When the coherent X-ray 44 is irradiated, the transmission material X-ray 45 that has passed through the measurement object 33 through the opening 40 interferes with the transmission reference X-ray 46 that has passed through the through hole 38, and a detection surface separated by 50 cm to 5 m. In 47, an interference fringe is detected by a detector (not shown).

  Next, as shown in FIG. 8B, a diffracted X-ray hologram is obtained by irradiating the coherent X-ray 44 with the through-hole 38 covered with the crystal piece 41. When the coherent X-ray 44 is irradiated, the diffracted material X-ray 48 diffracted from the measurement object 33 through the opening 40 and the diffraction reference X-ray 49 diffracted by the crystal piece 41 through the through hole 38 interfere with each other. Then, the detection surface 47 detects the interference fringes with a detector (not shown).

  From the transmission X-ray hologram, information on the shape of the measurement object 33 is obtained from the difference in the amount of X-ray absorption. On the other hand, from the diffraction X-ray hologram, the crystallinity, crystal orientation, and stacking fault of the measurement object 33 are obtained. Alternatively, information on crystallinity such as strain distribution can be obtained.

  Since each of these pieces of information is guaranteed to be information about the measurement object 33 at the same position, high-precision analysis can be performed without performing transmission X-ray holography measurement and diffraction X-ray holography measurement at the same time. Is possible. The order of transmission X-ray holography measurement and diffraction X-ray holography measurement may be reversed.

DESCRIPTION OF SYMBOLS 10 Sample for measurement 11 Substrate 12 Thin film 13 Measuring part 14, 37 X-ray absorption film 15, 16, 38, 39 Through-hole 17, 40 Opening part 18, 41 Crystal piece 19, 44 Coherent X-ray 20, 45 Transmitted substance X-ray 21 and 46 Transmission reference X-rays 22 and 48 Diffraction material X-rays 23 and 49 Diffraction reference X-rays 24 and 47 Detection surface 25 Detector 26 Detector 31 Si wafer 32 Thin film 33 Measurement object 34 Cutting line 35 Si substrate 36 Washer 42 Carbon film 43 Protective film

Claims (5)

A measurement unit provided on the front side of the substrate and at least one transmission hole that transmits reference X-rays adjacent to the measurement unit, and a region other than the measurement unit and the transmission hole is provided on the back side of the substrate. Irradiate coherent X-rays from the back side of the measurement sample having an X-ray absorption film to cover,
The emission X-ray from the measurement unit and the emission X-ray from the transmission hole are superimposed on the detection surface located on the surface side,
An X-ray holography measurement method for analyzing interference fringes formed by the superposition as a hologram,
A crystal piece for diffracting the irradiated X-ray is provided between the transmission hole and the detection surface, and the diffracted X-ray from the transmission hole in a state where the crystal piece is provided and the diffraction X-ray from the measurement unit are overlapped. Obtaining interference fringes by matching; and
An X-ray holography measurement method comprising: obtaining interference fringes by superimposing transmission X-rays from a transmission hole in a state where no crystal piece is provided and transmission X-rays from the measurement unit. A measurement unit provided on the front side of the substrate and at least one transmission hole that transmits reference X-rays adjacent to the measurement unit, and a region other than the measurement unit and the transmission hole is provided on the back side of the substrate. Irradiate coherent X-rays from the back side of the measurement sample having an X-ray absorption film to cover,
The emission X-ray from the measurement unit and the emission X-ray from the transmission hole are superimposed on the detection surface located on the surface side,
An X-ray holography measurement method for analyzing interference fringes formed by the superposition as a hologram,
A crystal piece for diffracting the irradiated X-ray is provided between at least one of the transmission holes and the detection surface, and the crystal piece is not provided in the other transmission holes of the transmission hole. Interference fringes due to superposition of the diffracted X-rays from the provided transmission holes and the diffracted X-rays from the measurement unit, the transmission X-rays from other transmission holes not provided with the crystal pieces, and the transmission X from the measurement unit An X-ray holography measurement method characterized by simultaneously obtaining interference fringes by superimposing with a line.   The X-ray holography measurement method according to claim 1, wherein a distance between the measurement unit and the transmission hole is within a coherent distance of the irradiated coherent X-ray.   The X-ray holography measurement method according to any one of claims 1 to 3, wherein the crystal piece is bonded to a surface of the measurement sample via a carbon film.   5. The X according to claim 1, wherein a diffraction plane of the crystal piece is adjusted so that a Bragg angle in the measurement unit and a Bragg angle in the crystal piece coincide with each other. X-ray holography measurement method.

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