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JP5337968B2 - Optical element manufacturing method and optical element - Google Patents
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JP5337968B2 - Optical element manufacturing method and optical element - Google Patents

Optical element manufacturing method and optical element Download PDF

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JP5337968B2
JP5337968B2 JP2008048084A JP2008048084A JP5337968B2 JP 5337968 B2 JP5337968 B2 JP 5337968B2 JP 2008048084 A JP2008048084 A JP 2008048084A JP 2008048084 A JP2008048084 A JP 2008048084A JP 5337968 B2 JP5337968 B2 JP 5337968B2
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temperature
refractive index
optical element
diffraction efficiency
heating
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JP2009222734A (en
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聡 廣野
誠 糟谷
克 松田
博孝 望月
歴 渡邉
一良 伊東
泰之 小関
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Omron Corp
National Institute of Advanced Industrial Science and Technology AIST
University of Osaka NUC
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National Institute of Advanced Industrial Science and Technology AIST
Osaka University NUC
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical element that irradiates the inside of an optical polymer structure with femtosecond laser light and heating the structure to make the refractive index difference between a laser irradiation portion and a non-irradiation portion large, and to provide an optical element having high diffraction efficiency and an optical element having an optical waveguide with small propagation loss. <P>SOLUTION: The method of manufacturing the optical element includes a laser irradiation stage of irradiating the inside of the optical polymer structure with the femtosecond laser light of 10<SP>-15</SP>to 10<SP>-11</SP>second in pulse width to vary the refractive index of the irradiation portion; and a heating process of heating the optical polymer structure. In the heating stage, the heating is carried out under a condition of 0.8&le;T/T<SB>g</SB>&le;1.13, where T is the absolute temperature of heating temperature and T<SB>g</SB>is the absolute temperature of the glass transition point of a material constituting the optical polymer structure. <P>COPYRIGHT: (C)2010,JPO&amp;INPIT

Description

本発明は、パルス幅が10-15秒〜10-11秒の超短パルスレーザ(以下、「フェムト秒レーザ」ともいう。)を光学高分子構造体内部に照射し、レーザ照射部の屈折率を変化させる光学素子の製造方法および光学素子に関する。 The present invention irradiates an optical polymer structure with an ultrashort pulse laser (hereinafter also referred to as “femtosecond laser”) having a pulse width of 10 −15 seconds to 10 −11 seconds, and the refractive index of the laser irradiation portion. The present invention relates to a method for manufacturing an optical element and an optical element.

近年、リソグラフィなどのプロセスにより光学素子を製造する方法とは別に、フェムト秒レーザをガラスまたは光学高分子構造体の内部に照射し、照射部の屈折率を変化させて、たとえば回折光学素子または光導波路を有する光学素子を製造する方法が知られている。この方法は、照射するレーザをレンズなどにより集光し、焦点位置を、光学高分子構造体の内部で移動させることにより、屈折率などが変化した構造変化部を光学高分子構造体の内部の任意の部分に形成することができる。(特許文献1参照)。屈折率などが異なるレーザ照射部の大きさ、形状、構造変化の程度などは、レーザの照射時間、レーザの焦点位置の移動方向とその速度、光学高分子構造体の材質、レーザのパルス幅と照射エネルギまたはレンズの開口数などにより調整することができる。フェムト秒レーザは、チタン・サファイア結晶をレーザ媒質として得られ、同じ出力であっても、単位時間および単位空間当たりの電場強度が極めて高いため、無機ガラスなどに照射することにより、新たな構造を誘起することができる。   In recent years, apart from a method of manufacturing an optical element by a process such as lithography, a femtosecond laser is irradiated on the inside of a glass or optical polymer structure, and the refractive index of the irradiated part is changed, for example, a diffractive optical element or optical A method for manufacturing an optical element having a waveguide is known. In this method, the laser to be irradiated is condensed by a lens or the like, and the focal position is moved inside the optical polymer structure, so that the structural change portion in which the refractive index has changed is changed inside the optical polymer structure. It can be formed in any part. (See Patent Document 1). The size, shape, and degree of structural change of the laser irradiation part with different refractive index, etc. are the laser irradiation time, the moving direction and speed of the focal position of the laser, the material of the optical polymer structure, the pulse width of the laser It can be adjusted by the irradiation energy or the numerical aperture of the lens. A femtosecond laser is obtained using a titanium / sapphire crystal as the laser medium, and even with the same output, the electric field strength per unit time and unit space is extremely high. Can be induced.

フェムト秒レーザによる屈折率などの変化は、熱溶融と冷却による構造の変化、架橋反応による構造の変化、相分離による構造の変化などにより誘起される。たとえば、レーザの照射により、光学高分子材料が溶融し、冷却することにより、照射前の配向状態から照射後の無配向状態に構造が変化する。また、架橋反応により、照射前の未架橋状態が照射後、架橋状態に構造が変化する。あるいは、相分離により、混合もしくは溶解状態から相分離した状態に構造が変化する。屈折率などが変化したレーザ照射部を直接、内部に形成するため、製造工程を短縮化することができ、素子を集積化できる。また、光学高分子材料を用いると、屈折率などが変化した構造変化部を、500mW以下の低いエネルギのレーザにより形成することができるため、高速加工が可能である。   Changes in the refractive index due to the femtosecond laser are induced by structural changes due to thermal melting and cooling, structural changes due to cross-linking reactions, structural changes due to phase separation, and the like. For example, when the optical polymer material is melted by laser irradiation and cooled, the structure changes from the alignment state before irradiation to the non-alignment state after irradiation. In addition, the structure changes to a crosslinked state after irradiation from an uncrosslinked state before irradiation due to a crosslinking reaction. Alternatively, the structure changes from a mixed or dissolved state to a phase separated state by phase separation. Since the laser irradiation portion having a changed refractive index or the like is directly formed inside, the manufacturing process can be shortened and the elements can be integrated. In addition, when an optical polymer material is used, a structure change portion having a changed refractive index or the like can be formed by a low energy laser of 500 mW or less, and high speed processing is possible.

また、近赤外領域の波長のフェムト秒レーザを石英ガラスからなる基板に集光照射し、基板の内部に高屈折領域を連続的に誘起し、光導波路を形成した後、基板を600℃〜1000℃の温度雰囲気下で2時間以上加熱処理する光導波路の製造方法が知られている(特許文献2参照)。この方法により製造した光学素子は、光導波路の伝播損失が小さく、伝播損失の偏波依存性を抑制することができるとある。ここに、伝播損失の偏波依存性とは、あらゆる偏波を伝播させたときの伝播損失の最大値と最小値の差である。   Further, a femtosecond laser having a wavelength in the near-infrared region is condensed and irradiated onto a substrate made of quartz glass, and a high refractive region is continuously induced inside the substrate to form an optical waveguide. An optical waveguide manufacturing method is known in which heat treatment is performed for 2 hours or more in a temperature atmosphere of 1000 ° C. (see Patent Document 2). An optical element manufactured by this method has a small propagation loss of the optical waveguide and can suppress the polarization dependence of the propagation loss. Here, the polarization dependence of the propagation loss is the difference between the maximum value and the minimum value of the propagation loss when any polarization is propagated.

ところで、フェムト秒レーザにより光学素子を製造する場合、誘起する屈折率の変化が大きいことが望まれる。屈折率差が大きいと、たとえば回折光学素子において回折効率が高くなるというメリットがあるためである。ここで、屈折率の変化とは、レーザ照射部に誘起された屈折率と、未照射部の屈折率の差をいう。また、誘起する屈折率の変化は、その後の温度変化に対して安定することが望まれる。様々な温度環境下で、光学素子としての特性を安定化するためである。しかし、特許文献1には、光学高分子構造体として、プラスチック構造体は開示されているが、大きな屈折率差をもたらす方法は具体的に開示されておらず、また、誘起する屈折率の変化のその後の温度変化に対する安定性については述べられていない。また、特許文献2では、フェムト秒レーザの照射により、石英ガラスからなる基板内に形成された光導波路特性が加熱により向上することは述べられているが、特性が向上する理由および加熱処理時の温度依存性については述べられておらず、また
、誘起する屈折率の変化のその後の温度変化に対する安定性については述べられていない。
特開2002−249607号公報 特開2003−240994号公報
By the way, when an optical element is manufactured by a femtosecond laser, it is desired that the induced refractive index change is large. This is because if the difference in refractive index is large, for example, there is a merit that diffraction efficiency is increased in a diffractive optical element. Here, the change in the refractive index refers to the difference between the refractive index induced in the laser irradiated portion and the refractive index of the unirradiated portion. In addition, it is desirable that the induced refractive index change is stable against subsequent temperature changes. This is because the characteristics as an optical element are stabilized under various temperature environments. However, Patent Document 1 discloses a plastic structure as an optical polymer structure, but does not specifically disclose a method for providing a large refractive index difference, and induces a change in refractive index. The stability to subsequent temperature changes is not described. Further, in Patent Document 2, it is stated that the characteristics of an optical waveguide formed in a substrate made of quartz glass are improved by heating by irradiation with a femtosecond laser. The temperature dependence is not described, and the stability of the induced refractive index change against the subsequent temperature change is not described.
JP 2002-249607 A JP 2003-240994 A

本発明の課題は、光学高分子構造体の内部にフェムト秒レーザを照射し、加熱により、レーザ照射部と非照射部との屈折率差を大きくする光学素子の製造方法を提供することにある。また、回折効率の高い光学素子および伝播損失の少ない光導波路を有する光学素子を提供することにある。   An object of the present invention is to provide a method of manufacturing an optical element that irradiates a femtosecond laser inside an optical polymer structure and increases a refractive index difference between a laser irradiation part and a non-irradiation part by heating. . Another object of the present invention is to provide an optical element having a high diffraction efficiency and an optical waveguide having a small propagation loss.

本発明の光学素子の製造方法は、パルス幅が10-15秒〜10-11秒のフェムト秒レーザを光学高分子構造体の内部に照射することにより、照射部の屈折率を変化させるレーザ照射工程と、加熱を行なう加熱工程とを含み、加熱工程は、加熱温度を絶対温度でTとし、光学高分子構造体を構成する材料のガラス転移点の絶対温度をTgとするとき、0.8≦
T/Tg≦1.13の条件で加熱することを特徴とする。
The method of manufacturing an optical element according to the present invention includes laser irradiation that changes the refractive index of an irradiation part by irradiating the inside of an optical polymer structure with a femtosecond laser having a pulse width of 10 -15 seconds to 10 -11 seconds. And a heating step for heating, wherein the heating step is 0. When the heating temperature is T in absolute temperature and the absolute temperature of the glass transition point of the material constituting the optical polymer structure is T g . 8 ≦
It heats on the conditions of T / Tg <= 1.13.

加熱工程における加熱は、30秒間以上であることが好ましい。
上記加熱温度Tは、所定時間の加熱において、照射部と非照射部との屈折率の差が最大となる温度の絶対温度の±10K以内、前記屈折率の差が飽和する時間が最短である温度の絶対温度の±10K以内、および前記屈折率の差が極大となる時間が最短である温度の絶対温度の±10K以内のいずれかの温度であることが好ましい。
Heating in the heating step is preferably for 30 seconds or more.
The heating temperature T is within ± 10K of the absolute temperature of the temperature at which the difference in refractive index between the irradiated part and the non-irradiated part becomes the maximum in heating for a predetermined time, and the time when the difference in refractive index is saturated is the shortest. Preferably, the temperature is within ± 10K of the absolute temperature and within ± 10K of the absolute temperature of the temperature at which the difference in refractive index is maximum.

上記加熱温度Tは、光学素子が使用時に曝される最高温度を絶対温度でT1とし、0.
8≦T1/Tg≦1.13の範囲にある場合に、T1≦Tとすることが好ましい。
The heating temperature T is an absolute temperature T 1 that is the maximum temperature to which the optical element is exposed during use.
In the range of 8 ≦ T 1 / T g ≦ 1.13, it is preferable to satisfy T 1 ≦ T.

上記光学高分子構造体を構成する材料は、ポリメチルメタクリレート、ポリカーボネート、およびシクロオレフィンポリマーからなる群より選択される少なくとも1種であることが好ましい。   The material constituting the optical polymer structure is preferably at least one selected from the group consisting of polymethyl methacrylate, polycarbonate, and cycloolefin polymer.

上記光学高分子構造体は、母材と添加材とを含む混合物からなり、母材がポリメチルメタクリレートであり、添加材が、つぎの式(1)に示す構造を有するジアリールエテンであり、母材に対する添加材の混合比率が3質量%以上であることが好ましい。   The optical polymer structure is made of a mixture containing a base material and an additive, the base material is polymethyl methacrylate, the additive is a diarylethene having a structure represented by the following formula (1), and the base material The mixing ratio of the additive with respect to is preferably 3% by mass or more.

(式(1)において、R1とR4とは、脂肪族炭化水素基、ヒドロキシ基、ニトロ基、アミノ基またはメルカプト基である。R2、R3、R5およびR6は、水素、アミノ基、脂肪族炭化水素基、芳香族炭化水素基、および芳香族複素環基からなる群より選択される置換基、またはR2とR3、およびR5とR6とは、芳香族炭化水素または芳香族複素環を構成して
もよい。XとYとは、硫黄、窒素または酸素であり、環Zは脂環式炭化水素、芳香族炭化水素または芳香族複素環からなる構造を有する。)
また、本発明は、上記光学素子の製造方法により製造した光学素子であって、照射部と非照射部との屈折率の差が0.0002以上である光学素子に関する。
(In the formula (1), R 1 and R 4 are an aliphatic hydrocarbon group, a hydroxy group, a nitro group, an amino group or a mercapto group. R 2 , R 3 , R 5 and R 6 are hydrogen, A substituent selected from the group consisting of an amino group, an aliphatic hydrocarbon group, an aromatic hydrocarbon group, and an aromatic heterocyclic group, or R 2 and R 3 , and R 5 and R 6 are aromatic carbonized It may constitute hydrogen or an aromatic heterocyclic ring, X and Y are sulfur, nitrogen or oxygen, and ring Z has a structure consisting of alicyclic hydrocarbon, aromatic hydrocarbon or aromatic heterocyclic ring .)
The present invention also relates to an optical element manufactured by the above-described optical element manufacturing method, wherein the difference in refractive index between the irradiated part and the non-irradiated part is 0.0002 or more.

レーザ照射部と非照射部との屈折率の差の加熱温度T以下での温度変化に対する安定性が、±30%以下であることが好ましい。   The stability of the difference in refractive index between the laser irradiated portion and the non-irradiated portion with respect to a temperature change below the heating temperature T is preferably ± 30% or less.

前記照射部は、照射部の厚さ0.3mmにおける使用波長の光線の透過率が80%以上であることが好ましい。   The irradiating part preferably has a light transmittance of a working wavelength at a thickness of 0.3 mm of the irradiating part of 80% or more.

本発明の製造方法によれば、フェムト秒レーザの照射部と非照射部の屈折率差が大きい光学素子を提供できる。したがって、回折光学素子の回折効率を高めることができる。   According to the manufacturing method of the present invention, it is possible to provide an optical element having a large difference in refractive index between the irradiated part and the non-irradiated part of the femtosecond laser. Therefore, the diffraction efficiency of the diffractive optical element can be increased.

本発明の光学素子の製造方法は、フェムト秒レーザを光学高分子構造体の内部に照射する工程と、加熱する工程とを備え、加熱工程においては、加熱温度を絶対温度でTとし、光学高分子構造体を構成する材料のガラス転移点の絶対温度をTgとするとき、0.8≦
T/Tg≦1.13の条件で加熱する。レーザ照射により、光学高分子構造体の内部にお
けるレーザ照射部の屈折率を変化させ、その後、加熱処理を行なうことにより、レーザ照射部と非照射部との屈折率差を拡大することができる。その結果、レーザ照射部と非照射部との屈折率差が0.0002以上であり、屈折率差が好ましくは0.0005以上、より好ましくは0.0008以上の光学素子を提供することができる。
The method for producing an optical element of the present invention includes a step of irradiating an optical polymer structure with a femtosecond laser and a step of heating. In the heating step, the heating temperature is T as an absolute temperature, When the absolute temperature of the glass transition point of the material constituting the molecular structure is T g , 0.8 ≦
Heating is performed under the condition of T / T g ≦ 1.13. The refractive index difference between the laser irradiated portion and the non-irradiated portion can be increased by changing the refractive index of the laser irradiated portion inside the optical polymer structure by laser irradiation and then performing heat treatment. As a result, it is possible to provide an optical element in which the difference in refractive index between the laser irradiation part and the non-irradiation part is 0.0002 or more, and the difference in refractive index is preferably 0.0005 or more, more preferably 0.0008 or more. .

本発明において、光学高分子構造体とは、該光学高分子構造体から製造される光学素子の使用波長帯域で透明なものをいい、好ましくは使用波長帯域における透過率が80%以上である。また、その形状は、板状、膜状、特定形状(例えばレンズ形状など)、複雑な立体形状などいずれの形状のものでもよい。   In the present invention, the optical polymer structure means a transparent material in the used wavelength band of an optical element produced from the optical polymer structure, and preferably has a transmittance of 80% or more in the used wavelength band. Further, the shape may be any shape such as a plate shape, a film shape, a specific shape (for example, a lens shape), or a complicated three-dimensional shape.

また、レーザ照射により、光学高分子構造体の内部におけるレーザ照射部の屈折率を変化させ、その後、加熱処理を行なうことにより、レーザ照射部と非照射部との屈折率差を、その後の温度変化に対して安定化することができる。その結果、レーザ照射部と非照射部との屈折率差の温度や時間変化に対する安定性が±30%以下であり、安定性が好ましくは±20%以下、より好ましくは±15%以下の光学素子を提供することができる。なお、安定性とは、所定時間加熱処理後のブラッグ一次回折効率から求められる屈折率と、加熱処理後に曝される温度変化を施した後のブラッグ一次回折効率から求められる屈折率との差を、前者の屈折率(所定時間加熱処理後のブラッグ一次回折効率から求められる屈折率)で除した値いう。この値が小さい場合に、経時変化において安定性がよい光学素子を提供することができる。   In addition, by changing the refractive index of the laser irradiated portion inside the optical polymer structure by laser irradiation, and then performing heat treatment, the difference in refractive index between the laser irradiated portion and the non-irradiated portion is changed to the subsequent temperature. Stabilize against changes. As a result, the stability of the refractive index difference between the laser irradiated portion and the non-irradiated portion with respect to temperature and time change is ± 30% or less, and the stability is preferably ± 20% or less, more preferably ± 15% or less. An element can be provided. Stability refers to the difference between the refractive index obtained from the Bragg primary diffraction efficiency after heat treatment for a predetermined time and the refractive index obtained from the Bragg primary diffraction efficiency after temperature change exposed after the heat treatment. , A value divided by the former refractive index (refractive index obtained from Bragg first-order diffraction efficiency after heat treatment for a predetermined time). When this value is small, it is possible to provide an optical element having good stability over time.

また、レーザ照射部の厚さ0.3mmにおける使用波長の光線の透過率が、好ましくは80%以上、より好ましくは90%以上である光学素子を提供することができる。なお、レーザ照射部の厚さは、実用的な最小厚みを考慮して、厚さ0.01mmでの使用波長の光線の透過率が80%以上であっても、光利用効率の高い光学素子として利用できる。使用波長の光線は、可視光線や近赤外光線などである。したがって、たとえば、高回折効率を有する回折光学素子、また、たとえば曲率半径が小さいときの伝播損失が小さい光導波路、また、回折効率や伝播特性を温度変化に対して安定化することのできる優れた光学素子を製造することができる。   In addition, it is possible to provide an optical element in which the transmittance of the light having the wavelength used at the laser irradiation portion thickness of 0.3 mm is preferably 80% or more, more preferably 90% or more. Note that the thickness of the laser irradiation part is an optical element with high light utilization efficiency even when the transmittance of the light having the wavelength used at 0.01 mm is 80% or more in consideration of the practical minimum thickness. Available as The light having the wavelength used is visible light, near infrared light, or the like. Therefore, for example, a diffractive optical element having a high diffraction efficiency, an optical waveguide having a small propagation loss, for example, when the radius of curvature is small, and an excellent ability to stabilize the diffraction efficiency and propagation characteristics against temperature changes An optical element can be manufactured.

加熱工程においては、レーザ照射部と非照射部との屈折率差を高め、光学素子の1次回折効率を高めるたり、レーザの照射部と非照射部との屈折率差のその後の温度変化に対する安定性を高める点で、T/Tgの値を0.8以上とし、0.86以上が好ましい。加熱
温度が、Tgを大きく越えると、高分子材料の他の物性が変化するため、T/Tg≦1.13の条件とする。加熱時間は、T/Tgの値などにより変動するが、一般には30秒間以
上とし、0.5時間以上が好ましく、24時間以上がより好ましい。また、レーザ照射部と非照射部との屈折率差を拡大する効率を高め、加熱時間を短縮化する点で、加熱温度Tは、所定時間の加熱において、照射部と非照射部との屈折率の差が最大となる温度の絶対温度の±10K以内、前記屈折率の差が飽和する時間が最短である温度の絶対温度の±10K以内、および前記屈折率の差が極大となる時間が最短である温度の絶対温度の±10K以内のいずれかの温度であることが好ましい。これらの温度条件は、用いる光学高分子構造体を上記加熱温度条件下で加熱し、そのプロットにより決定される。上記所定期間は特に限定されないが、およそ168時間(7日間)の加熱のプロットにより、決定することができる。
In the heating step, the refractive index difference between the laser irradiation part and the non-irradiation part is increased, the first-order diffraction efficiency of the optical element is increased, or the refractive index difference between the laser irradiation part and the non-irradiation part against the subsequent temperature change. In terms of improving stability, the value of T / Tg is set to 0.8 or more, and preferably 0.86 or more. When the heating temperature greatly exceeds T g , other physical properties of the polymer material change, and therefore T / T g ≦ 1.13. The heating time varies depending on the value of T / T g and the like, but is generally 30 seconds or longer, preferably 0.5 hours or longer, and more preferably 24 hours or longer. In addition, the heating temperature T is the refraction between the irradiated part and the non-irradiated part in heating for a predetermined time in that the efficiency of expanding the refractive index difference between the laser irradiated part and the non-irradiated part is increased and the heating time is shortened. Within ± 10K of the absolute temperature of the temperature at which the difference in refractive index is maximum, within ± 10K of the absolute temperature of the temperature at which the time for saturation of the difference in refractive index is the shortest, and the time when the difference in refractive index is maximized It is preferably any temperature within ± 10 K of the absolute temperature of the shortest temperature. These temperature conditions are determined by plotting the optical polymer structure to be used under the above heating temperature condition. The predetermined period is not particularly limited, but can be determined by a heating plot of about 168 hours (7 days).

また、レーザ照射部と非照射部との屈折率差の温度変化に対する安定性を高める点で、加熱温度Tは、光学素子の使用時に曝される最高温度をT1とするとき、T1≦Tが好ましく、(T1+10)≦Tの温度がより好ましい。また特に、光学素子の使用時に、長期継
続的に0.8≦T/Tg≦1.13の範囲の高温T2に曝される場合には、安定性を高めるために、T2≦Tの温度で24時間以上加熱することが好ましく、120時間(5日間)
以上がより好ましい。
In terms of enhancing the stability against temperature change of the refractive index difference between the laser irradiation portion and the non-irradiated portion, the heating temperature T, when the maximum temperature exposure during use of the optical element and the T 1, T 1 ≦ T is preferable, and a temperature of (T 1 +10) ≦ T is more preferable. In particular, when the optical element is used, when exposed to a high temperature T 2 in a range of 0.8 ≦ T / T g ≦ 1.13 continuously for a long period of time, T 2 ≦ T It is preferable to heat for 24 hours or more at a temperature of 120 hours (5 days)
The above is more preferable.

加熱工程は、加熱時の雰囲気として一般的な大気雰囲気でよいが、たとえば、シクロオレフィンポリマーのようにグレードによっては加熱時に酸化劣化され易い材料の場合、加熱時の雰囲気として酸素を除去するために、真空や減圧雰囲気、窒素雰囲気などとしても本発明の効果を得ることができる。   The heating step may be a general air atmosphere as the atmosphere during heating. For example, in the case of a material that is easily oxidized and deteriorated during heating, such as a cycloolefin polymer, in order to remove oxygen as the atmosphere during heating. The effects of the present invention can also be obtained in a vacuum, a reduced pressure atmosphere, a nitrogen atmosphere, or the like.

光学高分子構造体を構成する材料は、ホモポリマー、コポリマー、ポリマーアロイ、ポリマーブレンドなどの高分子材料を単独または2種以上組み合わせた材料であり、ポリマーは、熱可塑性ポリマー、熱硬化性ポリマー、紫外線硬化性ポリマーなどが好ましい。   The material constituting the optical polymer structure is a material that is a single polymer or a combination of two or more polymer materials such as a homopolymer, a copolymer, a polymer alloy, and a polymer blend. The polymer is a thermoplastic polymer, a thermosetting polymer, An ultraviolet curable polymer or the like is preferable.

熱可塑性ポリマーは、たとえば、ポリメチルメタクリレート、ポリエチルメタクリレートなどのポリメタクリル酸エステル、ポリエチルアクリレート、ポリブチルアクリレートなどのポリアクリル酸エステル、ブチルアクリレートとエチルアクリレートからなる共重合体、ポリメタクリルイミド、ポリスチレン、ABS樹脂、AS樹脂などのスチレン系ポリマー、6−ナイロン、66−ナイロン、12−ナイロンなどのポリアミド、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート、ポリブチレンナフタレートなどのポリエステル、ポリエチレン、ポリプロピレンなどのポリオレフィン、ビスフェノールA系ポリカーボネートなどのポリカーボネート、ポリエーテルスルホン、ポリノルボルネン、シクロオレフィンポリマー、シクロオレフィンコポリマー、ポリ塩化ビニル、ポリ塩化ビニリデン、ポリ酢酸ビニル、ポリビニルアルコール、ポリアセタール、ポリフェニレンエーテル、ポリフェニレンサルフィドなどを好ましく使用することができる。また、たとえば、アクリル系熱可塑性エラストマー、スチレン系熱可塑性エラストマー、ポリエステル系熱可塑性エラストマー、ポリオレフィン系熱可塑性エラストマー、ポリウレタン系熱可塑性エラストマーなどの各種熱可塑性エラストマーなども使用することができる。   Thermoplastic polymers include, for example, polymethacrylic acid esters such as polymethyl methacrylate and polyethyl methacrylate, polyacrylic acid esters such as polyethyl acrylate and polybutyl acrylate, copolymers of butyl acrylate and ethyl acrylate, polymethacrylimide, Polystyrene such as polystyrene, ABS resin, AS resin, polyamide such as 6-nylon, 66-nylon, 12-nylon, polyester such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polybutylene naphthalate, polyethylene, polypropylene Polyolefin such as bisphenol A polycarbonate, polyethersulfone, polynorbornene, siku Olefin polymers, cycloolefin copolymers, polyvinyl chloride, polyvinylidene chloride, polyvinyl acetate, polyvinyl alcohol, polyacetal, polyphenylene ether, polyphenylene sulfide can be preferably used. Further, for example, various thermoplastic elastomers such as acrylic thermoplastic elastomer, styrene thermoplastic elastomer, polyester thermoplastic elastomer, polyolefin thermoplastic elastomer, polyurethane thermoplastic elastomer, and the like can be used.

熱硬化性ポリマーには、熱硬化性ポリウレタン、熱硬化性ポリエステル、フェノール系樹脂、メラミン系樹脂、エポキシ系樹脂などが含まれる。フッ化ビニリデン、ヘキサフルオロプロピレン、ヘキサフルオロアセトンなどのフッ素系樹脂を用いることができる。ま
た、作業性が高まる点で、ポリシラン系ポリマーが好ましい。ポリシラン系ポリマーとしては、ポリ(ジメチルシラン)、ポリ(メチルエチルシラン)、ポリ(メチルプロピルシラン)、ポリ(メチルブチルシラン)、ポリ(メチルヘキシルシラン)、ポリ(ジヘキシルシラン)、ポリ(ジドデシルシラン)などのポリ(アルキルアルキルシラン)、ポリ(メチルシクロヘキシルシラン)などのポリ(アルキルシクロアルキルシラン)、ポリ(メチルフェニルシラン)などのポリ(アルキルアリールシラン)、ポリ(ジフェニルシラン)などのポリ(アリールアリールシラン)、ポリフェニルシリン、ポリメチルシリンなどのケイ素原子の3次元構造を有するホモポリマー、ポリ(ジメチルシラン−メチルシクロヘキシルシラン)、ポリ(ジメチルシラン−メチルフェニルシラン)などのコポリマーを使用することができる。
Thermosetting polymers include thermosetting polyurethane, thermosetting polyester, phenolic resin, melamine resin, epoxy resin, and the like. Fluorine-based resins such as vinylidene fluoride, hexafluoropropylene, and hexafluoroacetone can be used. Moreover, a polysilane polymer is preferable in terms of improving workability. Polysilane polymers include poly (dimethylsilane), poly (methylethylsilane), poly (methylpropylsilane), poly (methylbutylsilane), poly (methylhexylsilane), poly (dihexylsilane), poly (didodecyl) Poly (alkylalkylsilane) such as poly (alkyl silane), poly (alkylcycloalkylsilane) such as poly (methylcyclohexylsilane), poly (alkylarylsilane) such as poly (methylphenylsilane), and poly (diphenylsilane) (Arylarylsilane), polyphenylsilin, polymethylsilin, and other homopolymers having a three-dimensional structure of silicon atoms, poly (dimethylsilane-methylcyclohexylsilane), and poly (dimethylsilane-methylphenylsilane) are used. It can be.

光学高分子構造体を構成する材料として、母材と添加材とを含む混合物を用いることができる。母材と添加材とを含む混合物を用いるときは、母材がポリメチルメタクリレートであり、添加材が、つぎの式(1)に示す構造を有するジアリールエテンである態様が、レーザ照射部と非照射部との屈折率差の大きい光学素子を得ることができる点で好ましい。   As a material constituting the optical polymer structure, a mixture containing a base material and an additive can be used. When a mixture containing a base material and an additive is used, the mode in which the base material is polymethyl methacrylate and the additive is a diarylethene having a structure represented by the following formula (1) is not irradiated with the laser irradiation unit. This is preferable in that an optical element having a large difference in refractive index from the portion can be obtained.

(式(1)において、R1とR4とは、脂肪族炭化水素基、ヒドロキシ基、ニトロ基、アミノ基またはメルカプト基である。R2、R3、R5およびR6は、水素、アミノ基、脂肪族炭化水素基、芳香族炭化水素基、および芳香族複素環基からなる群より選択される置換基、またはR2とR3、およびR5とR6とは、芳香族炭化水素または芳香族複素環を構成してもよい。XとYとは、硫黄、窒素または酸素であり、環Zは脂環式炭化水素、芳香族炭化水素または芳香族複素環からなる構造を有する。)
上記式(1)において、R1とR4とは、同一でも異なっていてもよく、脂肪族炭化水素基であることが好ましく、なかでもメチル基が好ましい。R2、R3、R5およびR6は、同一でも互いに異なっていてもよく、R2、R3、R5とR6が芳香族炭化水素の構成原子または芳香族複素環の構成原子であるときは、とくに、t−ブチル基またはトリフェニルアミノ基を有する態様が好ましい。XとYが硫黄原子である態様が好ましい。環Zとしては、とくにフッ素で置換された態様が好ましい。
(In the formula (1), R 1 and R 4 are an aliphatic hydrocarbon group, a hydroxy group, a nitro group, an amino group or a mercapto group. R 2 , R 3 , R 5 and R 6 are hydrogen, A substituent selected from the group consisting of an amino group, an aliphatic hydrocarbon group, an aromatic hydrocarbon group, and an aromatic heterocyclic group, or R 2 and R 3 , and R 5 and R 6 are aromatic carbonized It may constitute hydrogen or an aromatic heterocyclic ring, X and Y are sulfur, nitrogen or oxygen, and ring Z has a structure consisting of alicyclic hydrocarbon, aromatic hydrocarbon or aromatic heterocyclic ring .)
In the above formula (1), R 1 and R 4 may be the same or different, and are preferably an aliphatic hydrocarbon group, and particularly preferably a methyl group. R 2, R 3, R 5 and R 6, which may be identical or different from each other, with R 2, R 3, R 5 and R 6 constituent atoms of the constituent atoms or aromatic heterocyclic aromatic hydrocarbon In some cases, an embodiment having a t-butyl group or a triphenylamino group is particularly preferable. An embodiment in which X and Y are sulfur atoms is preferred. The ring Z is particularly preferably an embodiment substituted with fluorine.

式(1)に示す添加剤のうち、つぎの式(2)に示す構造のジアリールエテンが、レーザ照射部と非照射部との屈折率差をより大きく拡大することができる点で好ましい。また、同様の観点から、式(1)に示す構造のジアリールエテンの母材に対する混合比率は、3質量%以上が好ましく、5質量%以上がより好ましい。一方、使用波長の光線の透過率を高め、レーザ加工を容易にし、かつレーザ加工により製造された光学素子の光利用効率を高める点で、添加材の母材に対する混合率は、40質量%以下が好ましく、35質量%以下がより好ましい。また、光学高分子構造体における母材と添加材の含有率は、レーザ照射部と非照射部との屈折率差を大きくする点で、80質量%以上が好ましく、90質量%以上がより好ましい。光学高分子構造体の可視光線透過率が高いと、構造体内部を視認することができ、フェムト秒レーザの照射位置および焦点位置を容易に調整することがで
き、レーザ加工を容易にすることができる。また、レーザ加工により製造された光学素子の光利用効率を高めることができる。したがって、添加材を10質量%混合したときの厚さ3mmでの使用波長の光線の透過率が80%以上の態様が好ましく、より好ましくは90%以上である。光学高分子構造体の厚さと透過率は、実用的な厚さを考慮して、厚さ0.1mmでの使用波長の光線の透過率が80%以上であっても、光利用効率の高い光学素子として利用することができる。なお、照射部の厚さは、レーザが照射された際に、光学高分子構造体において屈折率の変化が誘起されるレーザ進入方向の長さ(改質厚)をいう。
Of the additives represented by the formula (1), diarylethene having the structure represented by the following formula (2) is preferable in that the difference in refractive index between the laser irradiated portion and the non-irradiated portion can be further enlarged. From the same viewpoint, the mixing ratio of the diarylethene having the structure represented by the formula (1) to the base material is preferably 3% by mass or more, and more preferably 5% by mass or more. On the other hand, the mixing ratio of the additive to the base material is 40% by mass or less in terms of increasing the transmittance of the light of the wavelength used, facilitating laser processing, and increasing the light utilization efficiency of the optical element manufactured by laser processing. Is preferable, and 35 mass% or less is more preferable. Further, the content of the base material and the additive in the optical polymer structure is preferably 80% by mass or more, and more preferably 90% by mass or more, from the viewpoint of increasing the refractive index difference between the laser irradiated part and the non-irradiated part. . When the visible light transmittance of the optical polymer structure is high, the inside of the structure can be visually recognized, the irradiation position and the focal position of the femtosecond laser can be easily adjusted, and laser processing can be facilitated. it can. Moreover, the light utilization efficiency of the optical element manufactured by laser processing can be improved. Therefore, an aspect in which the transmittance of the light having the wavelength used at a thickness of 3 mm when the additive is mixed by 10% by mass is preferably 80% or more, and more preferably 90% or more. The thickness and transmittance of the optical polymer structure are high in light use efficiency even when the transmittance of the light having the wavelength used at 0.1 mm is 80% or more in consideration of the practical thickness. It can be used as an optical element. Note that the thickness of the irradiated portion refers to the length (modified thickness) in the laser entrance direction in which a change in refractive index is induced in the optical polymer structure when the laser is irradiated.

本発明では、光学高分子構造体の内部にフェムト秒レーザを照射して、照射部に屈折率変化を誘起する方法において、レーザ照射後に加熱処理を行なうことにより、照射部に誘起された屈折率と非照射部の屈折率差を拡大でき、また、その後の温度変化による屈折率差の変化を安定化できることを新たに見出したものである。このようにレーザ照射後の加熱処理により屈折率差が拡大および安定化するメカニズムは未だ明確には解明されていないが、構造的な変化としての照射部の収縮、例えば体積緩和の促進により照射部の密度が増加することが推測される。   In the present invention, in the method of irradiating the inside of the optical polymer structure with a femtosecond laser and inducing a refractive index change in the irradiated part, the refractive index induced in the irradiated part is obtained by performing a heat treatment after the laser irradiation. It was newly found that the difference in refractive index between the non-irradiated portion and the non-irradiated portion can be enlarged, and the change in the refractive index difference due to the temperature change thereafter can be stabilized. Although the mechanism by which the difference in refractive index is enlarged and stabilized by heat treatment after laser irradiation is not yet clearly elucidated, the irradiation part is contracted as a structural change, for example, by promoting volume relaxation. It is estimated that the density of increases.

以下、実施例を挙げて本発明をより詳細に説明するが、本発明はこれらに限定されるものではない。   EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated in detail, this invention is not limited to these.

(実施例1)
まず、1.レーザ照射方法、2.回折特性の測定方法と屈折率差の計算方法、3.レーザ照射による屈折率変化部位の透過率の測定方法について述べる。
Example 1
First, 1. 1. Laser irradiation method 2. a method for measuring diffraction characteristics and a method for calculating a difference in refractive index; A method for measuring the transmittance of the refractive index changing portion by laser irradiation will be described.

1.レーザ照射方法
フェムト秒レーザは、中心波長800nm、パルス幅118×10-15秒、繰返し周波
数1kHzとした。また、N.A.(開口数)0.13の対物レンズ(倍率5倍)を使用し、対物レンズの前に5.5mm径のアパーチャを設定した。また、各材料の屈折率をnとしたときに、構造体の表面から内部への移動が500μm/nとなるように、光学高分子構造体の内部に集光照射し、周期Λが10μmで、一辺が1mmの回折格子を作製した。また、ステージ速度は1mm/sで走査した。
1. Laser irradiation method The femtosecond laser had a center wavelength of 800 nm, a pulse width of 118 × 10 −15 seconds, and a repetition frequency of 1 kHz. N. A. An objective lens having a numerical aperture of 0.13 (5 times magnification) was used, and an aperture having a diameter of 5.5 mm was set in front of the objective lens. Further, when the refractive index of each material is n, the inside of the optical polymer structure is condensed and irradiated so that the movement from the surface of the structure to the inside becomes 500 μm / n, and the period Λ is 10 μm. A diffraction grating having a side of 1 mm was prepared. The stage speed was scanned at 1 mm / s.

2.回折特性の測定方法と、フェムト秒レーザの照射により誘起される屈折率差Δnの計算方法
回折特性として、回折効率と回折角を測定した。すなわち、フェムト秒レーザにより形成した周期Λが10μmで、一辺が1mmの回折格子を、回折格子に垂直な方向からブラッグ角θBだけ傾けて測定した。測定に使用するレーザは、He−Neレーザ(波長λ=
632.8nm)とし、ビーム径φ0.5mmで入射した。その後、回折格子から500
mmの位置にスクリーンを置き、0次光と1次光の間隔から回折角を算出した。
2. Method for Measuring Diffraction Characteristics and Calculation Method for Refractive Index Difference Δn Induced by Femtosecond Laser Irradiation As diffraction characteristics, diffraction efficiency and diffraction angle were measured. That is, the measurement was performed by tilting a diffraction grating formed by a femtosecond laser with a period Λ of 10 μm and a side of 1 mm from a direction perpendicular to the diffraction grating by a Bragg angle θ B. The laser used for measurement is a He—Ne laser (wavelength λ =
632.8 nm) and incident with a beam diameter of φ0.5 mm. Then from the diffraction grating 500
A screen was placed at a position of mm, and the diffraction angle was calculated from the interval between the 0th order light and the 1st order light.

本実施例の場合、2ΛsinθB=λの関係よりθB=1.8°となるため、回折格子を傾ける角度は1.8°とし、また500mm離れた位置での0次光と1次光の距離が31.7mm程度であることから、周期Λ=10μmでの回折光を確認するようにした。一方、フェムト秒レーザによる照射部と非照射部との屈折率の差Δnは、回折効率から導出した。すなわち、測定した1次回折効率をη1、屈折率差をΔn、屈折率変化部の長さをL
、測定時の波長をλ、ブラッグ回折角をθBとして、つぎの式(3)から屈折率差Δnを
求めた。
In the case of the present embodiment, θ B = 1.8 ° because of the relationship 2Λsin θ B = λ, so the angle at which the diffraction grating is tilted is 1.8 °, and the 0th order light and the 1st order light at positions 500 mm apart. Since the distance is about 31.7 mm, diffracted light with a period Λ = 10 μm was confirmed. On the other hand, the refractive index difference Δn between the irradiated part and the non-irradiated part by the femtosecond laser was derived from the diffraction efficiency. That is, the measured first-order diffraction efficiency is η 1 , the refractive index difference is Δn, and the length of the refractive index changing portion is L
The refractive index difference Δn was determined from the following equation (3), where λ is the wavelength at the time of measurement and θ B is the Bragg diffraction angle.

改質厚Lは透過型顕微鏡で観察することにより測定した。ここで、回折効率からのΔnの導出に本式を用いているのは、本実施例では、厚みを表すパラメータQ値が10に近い値であり、いわゆる「厚い」回折格子であり、回折格子の透過率が90%以上と吸収がほとんどないためである。なお、Q値は、つぎの式(4)のように表される。   The modified thickness L was measured by observing with a transmission microscope. Here, the reason why Δn is derived from the diffraction efficiency is that in this embodiment, the parameter Q value representing the thickness is a value close to 10, which is a so-called “thick” diffraction grating. This is because there is almost no absorption at 90% or more. The Q value is expressed as the following equation (4).

3.レーザ照射による屈折率変化部位の透過率の測定方法
透過率は、波長632.8nmの可視光線による光学高分子構造体への透過後光量に対し、厚さ160μm〜400μmの回折格子を透過した後、回折分岐した次数光をすべて足し合わせた光量の比率で表した。
3. Method for Measuring Transmittance of Refractive Index Change Part by Laser Irradiation After transmitting through a diffraction grating having a thickness of 160 μm to 400 μm with respect to the amount of light after passing through the optical polymer structure by visible light having a wavelength of 632.8 nm The ratio of the amount of light obtained by adding all the orders of light that were diffracted and branched.

本実施例においては、光学高分子構造体を構成する材料として、屈折率1.490、ガラス転移点120℃のポリメチルメタクリレート(以下、「PMMA」という。)を用いた。また、PMMAには、三菱レーヨン社製のPMMA(商品名アクリライト、型式#000)を用いた。つぎに、光学高分子構造体の内部に、加工面でのレーザパルスエネルギが1000nJとなるようにフェムト秒レーザを照射した。その結果、改質厚Lは370μmであり、式(4)によりQ値は9.9となり、ブラッグ角での1次回折効率は1.9
%であった。また、レーザ照射部と非照射部との屈折率差Δnは1.5×10-4であり、レーザ照射部の波長632.8nmでの光線透過率は90.5%であった。その後、25℃(室温)、40℃、50℃、60℃、70℃、80℃、90℃と100℃の各温度雰囲気中で経日処理を行なった後に、25℃(室温)下にて回折効率を測定した。表1と図1に、各温度雰囲気での経日処理後のブラッグ角での1次回折効率の経日変化を示す。また、レーザ照射部の7日間経過後の波長632.8nmでの光線透過率を表1に示す。各温度条件のうち、40℃〜100℃の雰囲気は恒温加熱槽により調整した。
In this example, polymethyl methacrylate (hereinafter referred to as “PMMA”) having a refractive index of 1.490 and a glass transition point of 120 ° C. was used as a material constituting the optical polymer structure. Moreover, PMMA (trade name acrylite, model # 000) manufactured by Mitsubishi Rayon Co., Ltd. was used as PMMA. Next, the inside of the optical polymer structure was irradiated with a femtosecond laser so that the laser pulse energy on the processed surface was 1000 nJ. As a result, the modified thickness L is 370 μm, the Q value is 9.9 according to the equation (4), and the first-order diffraction efficiency at the Bragg angle is 1.9.
%Met. The refractive index difference Δn between the laser irradiated portion and the non-irradiated portion was 1.5 × 10 −4 , and the light transmittance at a wavelength of 632.8 nm of the laser irradiated portion was 90.5%. Then, after carrying out the daily treatment in each temperature atmosphere of 25 ° C. (room temperature), 40 ° C., 50 ° C., 60 ° C., 70 ° C., 80 ° C., 90 ° C. and 100 ° C., at 25 ° C. (room temperature) The diffraction efficiency was measured. Table 1 and FIG. 1 show changes over time in the first-order diffraction efficiency at the Bragg angle after the daily treatment in each temperature atmosphere. In addition, Table 1 shows the light transmittance at a wavelength of 632.8 nm after the elapse of 7 days from the laser irradiation part. Among the temperature conditions, the atmosphere of 40 ° C. to 100 ° C. was adjusted by a constant temperature heating tank.

表1と図1の結果から明らかなとおり、25℃では、レーザ照射後7日間経過でブラッグ角での1次回折効率は1.1%に対し、40℃以上で2.7%以上と2.5倍以上に向上する。特に、60℃以上の温度雰囲気では、加熱処理前に比べて1次回折効率が大幅に増加した。PMMAのガラス転移点の絶対温度Tgは、120+273=393Kであり
、40℃で加熱したときの絶対温度Tは、40+273=313Kであるから、T/Tg
は0.8となる。また、60℃で加熱したときの絶対温度Tは、60+273=333Kであるから、T/Tgは0.85となる。したがって、T/Tgが0.8以上の雰囲気で加熱することにより、回折効率が増加し、特に、T/Tgが0.85以上の雰囲気で加熱す
ることにより、回折効率が飛躍的に増加することがわかった。
As is apparent from the results of Table 1 and FIG. 1, at 25 ° C., the first-order diffraction efficiency at the Bragg angle is 1.1% after 7 days from laser irradiation, while it is 2.7% or more at 40 ° C. or higher and 2%. Improve by more than 5 times. In particular, in the temperature atmosphere of 60 ° C. or higher, the first-order diffraction efficiency was significantly increased as compared with that before the heat treatment. Since the absolute temperature T g of the glass transition point of PMMA is 120 + 273 = 393K, and the absolute temperature T when heated at 40 ° C. is 40 + 273 = 313K, T / T g
Becomes 0.8. Moreover, since the absolute temperature T when heated at 60 ° C. is 60 + 273 = 333 K, T / T g is 0.85. Accordingly, the diffraction efficiency is increased by heating in an atmosphere having a T / T g of 0.8 or more, and in particular, the diffraction efficiency is dramatically improved by heating in an atmosphere having a T / T g of 0.85 or more. It turned out to increase.

さらに、80℃で加熱した場合には、図1に示すように、5日間経過後、ブラッグ角での1次回折効率が70%に達した。したがって、80℃で5日間処理した場合の回折効率70%は、25℃の場合の回折効率1.1%に比べて約64倍であり、回折効率の飽和値(70%)が、経過日数が7日以下では、他の温度条件の飽和値に比べて高いことがわかった。また、70℃の場合、20日間以上経過後に飽和値(70%)に達したことから、飽和に達するまでの日数は、80℃の条件が、他の条件に比べて最も短く、最も効率よく処理できることがわかった。すなわち、本実施例の条件では、70℃〜80℃の温度条件の場合に、回折効率が最も高い値で飽和し、さらに、そのための処理時間が短い点で、80℃がピーク温度であった。   Furthermore, when heated at 80 ° C., the first-order diffraction efficiency at the Bragg angle reached 70% after 5 days, as shown in FIG. Therefore, the diffraction efficiency of 70% when treated at 80 ° C. for 5 days is about 64 times the diffraction efficiency of 1.1% at 25 ° C., and the saturation value (70%) of the diffraction efficiency is the number of days elapsed. However, in 7 days or less, it was found to be higher than the saturation value of other temperature conditions. In addition, in the case of 70 ° C., the saturation value (70%) was reached after 20 days or more, so the number of days until saturation is reached is the shortest in the 80 ° C. condition and the most efficient. I understood that it can be processed. That is, under the conditions of this example, the diffraction efficiency was saturated at the highest value under the temperature condition of 70 ° C. to 80 ° C., and 80 ° C. was the peak temperature in that the processing time for that was short. .

所定の雰囲気下で7日間経過後のレーザ照射部の波長632.8nmでの光線透過率を表1に示す。表1の結果より、加熱前後を問わず、いずれの試料も波長632.8nmでの光線透過率は90%以上あった。また、いずれの試料も、加熱処理前後で改質厚Lは370μmで変化しなかった。すなわち、加熱前後での改質部の透明性と改質長さLは不変であり、測定条件も不変であった。しかし、レーザ照射部と非照射部との屈折率差Δnは、たとえば、回折効率が1.1%である25℃の雰囲気では、Δnが1.1×10-4であるのに対して、回折効率が70%である80℃の雰囲気では、Δnが10.8×10-4であり、約10倍大きくなった。したがって、式(3)により回折効率の増加は、屈折率差Δnの増加によるものと考察された。 Table 1 shows the light transmittance at a wavelength of 632.8 nm of the laser-irradiated part after a lapse of 7 days in a predetermined atmosphere. From the results shown in Table 1, the light transmittance at a wavelength of 632.8 nm was 90% or more for all the samples regardless of before and after heating. In all the samples, the modified thickness L was 370 μm and remained unchanged before and after the heat treatment. That is, the transparency and the modification length L of the modified part before and after heating were unchanged, and the measurement conditions were also unchanged. However, the refractive index difference Δn between the laser irradiation part and the non-irradiation part is, for example, Δn is 1.1 × 10 −4 in an atmosphere at 25 ° C. where the diffraction efficiency is 1.1%. In an atmosphere at 80 ° C. where the diffraction efficiency is 70%, Δn is 10.8 × 10 −4, which is about 10 times larger. Therefore, it was considered from equation (3) that the increase in diffraction efficiency was due to an increase in the refractive index difference Δn.

また、本実施例1と同様のフェムト秒レーザの条件において、加工面でのレーザパルスエネルギを500nJとなるようにフェムト秒レーザを照射した後、150℃で30秒間の加熱処理を行なった光学高分子構造体と、170℃で30秒間の加熱処理を行なった光学高分子構造体を作製し、上記と同様に回折効率等の評価を行なった。その結果、150℃で30秒間加熱処理した場合は、上記加熱処理を行なわない場合に比し、ブラッグ1次回折効率で2.5倍の値となった。また、170℃で30秒間加熱処理した場合は、上記加熱処理を行なわない場合に比し、ブラッグ1次回折効率で1.8倍の値となった。この時、改質厚Lは285μmで変化せず、波長632.8nmでの光線透過率はいずれも90%以上で変化せず、また、測定条件も不変であった。したがって、式(3)により回折効率の増加は、屈折率差Δnの増加によるものと考察された。   Further, under the same femtosecond laser conditions as in Example 1, the optical height was obtained by performing a heat treatment at 150 ° C. for 30 seconds after irradiating the femtosecond laser so that the laser pulse energy on the processed surface was 500 nJ. A molecular structure and an optical polymer structure subjected to a heat treatment at 170 ° C. for 30 seconds were prepared, and diffraction efficiency and the like were evaluated in the same manner as described above. As a result, when the heat treatment was performed at 150 ° C. for 30 seconds, the Bragg first-order diffraction efficiency was 2.5 times that of the case where the heat treatment was not performed. When the heat treatment was performed at 170 ° C. for 30 seconds, the Bragg first-order diffraction efficiency was 1.8 times that of the case where the heat treatment was not performed. At this time, the modified thickness L did not change at 285 μm, the light transmittance at a wavelength of 632.8 nm did not change at 90% or more, and the measurement conditions were unchanged. Therefore, it was considered from equation (3) that the increase in diffraction efficiency was due to an increase in the refractive index difference Δn.

これにより、レーザ照射後の加熱温度がガラス転移点以上となるT/Tg=(170+273)/(120+273)=1.13の条件においても、屈折率差Δnを高めるという本発明の同じ効果が奏されることがわかった。 Accordingly, the same effect of the present invention that the refractive index difference Δn is increased even under the condition of T / T g = (170 + 273) / (120 + 273) = 1.13 where the heating temperature after laser irradiation is equal to or higher than the glass transition point. I understood that it was played.

(実施例2)
本実施例においては、光学高分子構造体を構成する材料として、屈折率1.585、ガラス転移点142℃のポリカーボネート(以下、「PC」という。)を用いた。また、PCには、帝人社製のPC(商品名パンライト、型式AD−5503)を用い、光学高分子
構造体の内部に、加工面でのレーザパルスエネルギが500nJとなるようにフェムト秒レーザを照射した。その結果、改質厚Lは330μmであり、式(4)によりQ値は8.3となり、ブラッグ角での1次回折効率は0.3%であった。また、レーザ照射部と非照
射部との屈折率差Δnは0.7×10-4であり、レーザ照射部の波長632.8nmでの光線透過率は95.8%であった。その後、25℃(室温)、70℃、90℃、110℃、120℃、130℃と150℃の各温度雰囲気中で経日処理を行なった後に、25℃(室温)下にて、1次回折効率の経日変化を測定した。表2と図2に、各温度雰囲気での経日処理後のブラッグ角での1次回折効率の経日変化を示す。また、7日間経過後のレーザ照射部における波長632.8nmでの光線透過率を表2に示す。各温度条件のうち、70℃〜150℃の雰囲気は恒温加熱槽により調整した。
(Example 2)
In this example, a polycarbonate (hereinafter referred to as “PC”) having a refractive index of 1.585 and a glass transition point of 142 ° C. was used as a material constituting the optical polymer structure. In addition, a PC manufactured by Teijin Ltd. (trade name Panlite, model AD-5503) is used as the PC, and a femtosecond laser is formed inside the optical polymer structure so that the laser pulse energy on the processed surface is 500 nJ. Was irradiated. As a result, the modified thickness L was 330 μm, the Q value was 8.3 according to Equation (4), and the first-order diffraction efficiency at the Bragg angle was 0.3%. The refractive index difference Δn between the laser irradiated portion and the non-irradiated portion was 0.7 × 10 −4 , and the light transmittance at a wavelength of 632.8 nm of the laser irradiated portion was 95.8%. Then, after performing daily treatment in each temperature atmosphere of 25 ° C. (room temperature), 70 ° C., 90 ° C., 110 ° C., 120 ° C., 130 ° C. and 150 ° C., the next time at 25 ° C. (room temperature) Changes in folding efficiency over time were measured. Table 2 and FIG. 2 show changes over time in the first-order diffraction efficiency at the Bragg angle after the daily treatment in each temperature atmosphere. Table 2 shows the light transmittance at a wavelength of 632.8 nm in the laser irradiation part after 7 days. Among each temperature condition, the atmosphere of 70 ° C. to 150 ° C. was adjusted by a constant temperature heating tank.

表2と図2の結果から明らかなとおり、25℃の雰囲気に対して、70℃以上の雰囲気では、日数経過とともに、ブラッグ角での1次回折効率が増加していくことがわかった。PCのガラス転移点の絶対温度Tgは、142+273=415Kであり、70℃で加熱
したときの絶対温度Tは、70+273=343Kであるから、T/Tgは0.83とな
る。したがって、T/Tgが0.83以上の雰囲気で加熱することにより、回折効率が増
加することがわかった。
As is apparent from the results of Table 2 and FIG. 2, it was found that the first-order diffraction efficiency at the Bragg angle increases with the passage of days in an atmosphere of 70 ° C. or higher with respect to an atmosphere of 25 ° C. The absolute temperature T g of the glass transition point of PC is 142 + 273 = 415K, and the absolute temperature T when heated at 70 ° C. is 70 + 273 = 343K, so T / T g is 0.83. Therefore, it was found that the diffraction efficiency is increased by heating in an atmosphere having a T / T g of 0.83 or more.

特に、120℃で加熱した場合には、図2に示すとおり、5日間経過後、ブラッグ角での1次回折効率が18%に達した。したがって、120℃で5日間経過後の回折効率18%は、25℃で7日間経過後の回折効率4%に比べて約4.5倍であり、回折効率の飽和値(18%)が他の温度条件の飽和値に比べて高いことを考慮すると、最も効率を高めるように処理できる条件であることがわかった。すなわち、本実施例の条件では、120℃がピーク温度であった。   In particular, when heated at 120 ° C., the first-order diffraction efficiency at the Bragg angle reached 18% after 5 days, as shown in FIG. Therefore, the diffraction efficiency of 18% after 5 days at 120 ° C is about 4.5 times the diffraction efficiency of 4% after 7 days at 25 ° C, and the saturation value (18%) of the diffraction efficiency is others. In view of the fact that it is higher than the saturation value of the temperature conditions, it was found that the conditions were such that the treatment could be performed with the highest efficiency. That is, under the conditions of this example, 120 ° C. was the peak temperature.

所定の雰囲気下で7日間経過後のレーザ照射部の波長632.8nmでの光線透過率を表2に示す。表2の結果より、加熱前後を問わず、いずれの試料も波長632.8nmでの光線透過率は90%以上あった。また、いずれの試料も、実施例1と同様に、加熱前後での改質部の透明性と改質長さLは不変であり、測定条件も不変であった。しかし、レーザ照射部と非照射部との屈折率差Δnは、たとえば、回折効率が4%である25℃の雰囲気では、Δnが2.4×10-4であるのに対して、回折効率が18%である120℃の雰囲気では、Δnが5.4×10-4であり、約2.3倍大きくなった。したがって、回折効率の増加は、屈折率差Δnの増加によるものと考察された。 Table 2 shows the light transmittance at a wavelength of 632.8 nm of the laser-irradiated part after a lapse of 7 days under a predetermined atmosphere. From the results in Table 2, the light transmittance at a wavelength of 632.8 nm was 90% or more for any sample, regardless of whether it was heated or not. Further, in any sample, as in Example 1, the transparency of the modified portion and the modified length L before and after heating were unchanged, and the measurement conditions were also unchanged. However, the refractive index difference Δn between the laser irradiation part and the non-irradiation part is, for example, Δn is 2.4 × 10 −4 in an atmosphere at 25 ° C. where the diffraction efficiency is 4%, whereas the diffraction efficiency is low. In an atmosphere at 120 ° C. where 18% is 18%, Δn is 5.4 × 10 −4, which is about 2.3 times larger. Therefore, it was considered that the increase in diffraction efficiency was due to an increase in the refractive index difference Δn.

また、本実施例から、ガラス転移点142℃より高い温度の150℃でも、回折効率お
よびΔnが高まることがわかった。すなわち、光学高分子構造体に誘起される屈折率差はガラス転移点を越えても消失することなく、また、屈折率差を拡大することができる。なお、ガラス転移点を越えても、たわみなどの変形が問題とならないガラス転移点以上の近傍温度の場合は、ガラス転移点以上としても差し支えない。
In addition, it was found from this example that the diffraction efficiency and Δn are increased even at 150 ° C., which is higher than the glass transition point 142 ° C. That is, the refractive index difference induced in the optical polymer structure does not disappear even when the glass transition point is exceeded, and the refractive index difference can be enlarged. In addition, even if it exceeds the glass transition point, in the case of a temperature near the glass transition point at which deformation such as deflection does not cause a problem, the glass transition point may be exceeded.

(実施例3)
本実施例においては、光学高分子構造体を構成する材料として、屈折率1.509、ガラス転移点123℃のシクロオレフィンポリマー(以下、「COP」という。)を用いた。また、COPには、日本ゼオン社製のCOP(商品名ZEONEX、型式330R)を用い、光学高分子構造体の内部に、加工面でのレーザパルスエネルギが400nJとなるようにフェムト秒レーザを照射した。また、N.A.(開口数)0.25の対物レンズ(倍率10倍)を使用し、対物レンズの前に5.5mm径のアパーチャを設定し、また、構造体の表面から内部への移動が1000μm/nとなるように、光学高分子構造体の内部に集光照射した。それ以外は実施例1と同様の条件とした。
(Example 3)
In this example, a cycloolefin polymer (hereinafter referred to as “COP”) having a refractive index of 1.509 and a glass transition point of 123 ° C. was used as a material constituting the optical polymer structure. Also, COP (trade name ZEONEX, model 330R) manufactured by Nippon Zeon Co., Ltd. is used as the COP, and the inside of the optical polymer structure is irradiated with a femtosecond laser so that the laser pulse energy on the processed surface becomes 400 nJ. did. N. A. (Numerical aperture) 0.25 objective lens (magnification 10 times) is used, an aperture with a diameter of 5.5 mm is set in front of the objective lens, and the movement from the surface of the structure to the inside is 1000 μm / n Thus, the inside of the optical polymer structure was condensed and irradiated. The other conditions were the same as in Example 1.

その結果、改質厚Lは160μmであり、式(4)によりQ値は4.2となり、ブラッグ角での1次回折効率は0.1%であった。また、レーザ照射部と非照射部との屈折率差
Δnは0.7×10-4であり、レーザ照射部の波長632.8nmでの光線透過率は99%であった。その後、25℃(室温)、50℃、70℃、90℃、100℃の各温度雰囲気中で経時処理を行なった後に、25℃(室温)下にて、回折効率を測定した。表3と図3に、各温度雰囲気での経時処理後のブラッグ角での1次回折効率を示す。また、7日間経過後のレーザ照射部における波長632.8nmでの光線透過率を表3に示す。各温度条件のうち、50℃〜100℃の雰囲気は恒温加熱槽により調整した。
As a result, the modified thickness L was 160 μm, the Q value was 4.2 according to Equation (4), and the first-order diffraction efficiency at the Bragg angle was 0.1%. The refractive index difference Δn between the laser irradiated part and the non-irradiated part was 0.7 × 10 −4 , and the light transmittance at a wavelength of 632.8 nm of the laser irradiated part was 99%. Then, after performing a time-dependent process in each temperature atmosphere of 25 degreeC (room temperature), 50 degreeC, 70 degreeC, 90 degreeC, and 100 degreeC, diffraction efficiency was measured under 25 degreeC (room temperature). Table 3 and FIG. 3 show the first-order diffraction efficiency at the Bragg angle after the aging treatment in each temperature atmosphere. Table 3 shows the light transmittance at a wavelength of 632.8 nm in the laser irradiation part after 7 days. Among the temperature conditions, the atmosphere of 50 ° C. to 100 ° C. was adjusted by a constant temperature heating tank.

表3と図3の結果から明らかなとおり、25℃の雰囲気に対して、50℃以上の雰囲気では、ブラッグ角での1次回折効率が増加することがわかった。COPのガラス転移点の絶対温度Tgは、123+273=396Kであり、50℃で加熱したときの絶対温度T
は、50+273=323Kであるから、T/Tgは0.82となる。したがって、T/
gが0.82以上の雰囲気で加熱することにより、回折効率が増加することがわかった
As is apparent from the results of Table 3 and FIG. 3, it was found that the first-order diffraction efficiency at the Bragg angle increases in an atmosphere of 50 ° C. or higher with respect to an atmosphere of 25 ° C. The absolute temperature T g of the glass transition point of COP is 123 + 273 = 396 K, and the absolute temperature T when heated at 50 ° C.
Since 50 + 273 = 323K, T / T g is 0.82. Therefore, T /
By T g is heated at 0.82 above atmosphere, it was found that the diffraction efficiency is increased.

特に、100℃で加熱した場合には、表3と図3に示すとおり、0.5〜2時間後にブラッグ角での1次回折効率が14%程度と極大化する傾向を示した。したがって、100℃で0.5時間経過後の回折効率14%は、25℃で7日間経過後の回折効率6.6%の約2倍であり、他の温度条件での0.5時間経過時の回折効率に比べて高いことから、短時間に回折効率を高めるように処理できる条件であることがわかった。すなわち、本実施例の条件では、100℃がピーク温度であった。   In particular, when heated at 100 ° C., as shown in Table 3 and FIG. 3, the first-order diffraction efficiency at the Bragg angle tended to maximize to about 14% after 0.5 to 2 hours. Therefore, the diffraction efficiency of 14% after 0.5 hours at 100 ° C. is about twice the diffraction efficiency of 6.6% after 7 days at 25 ° C., and 0.5 hours after other temperature conditions. Since it was higher than the diffraction efficiency at the time, it was found that the conditions were such that the diffraction efficiency could be increased in a short time. That is, under the conditions of this example, 100 ° C. was the peak temperature.

所定の雰囲気下で7日間経過後のレーザ照射部の波長632.8nmでの光線透過率を表3に示す。表3の結果より、加熱前後を問わず、いずれの試料も波長632.8nmでの光線透過率は90%以上あった。また、いずれの試料も、実施例1と同様に、加熱前後での改質部の透明性と改質長さLは不変であり、測定条件も不変であった。しかし、レーザ照射部と非照射部との屈折率差Δnは、たとえば、回折効率が6.6%である25℃の雰囲気では、Δnが6.5×10-4であるのに対して、回折効率が13.5%である70℃の雰囲気では、Δnが9.5×10-4であり、約1.5倍大きくなった。したがって、回折効率の増加は、屈折率差Δnの増加によるものと考察された。 Table 3 shows the light transmittance at a wavelength of 632.8 nm of the laser-irradiated part after a lapse of 7 days in a predetermined atmosphere. From the results shown in Table 3, the light transmittance at a wavelength of 632.8 nm was 90% or more for any sample regardless of before and after heating. Further, in any sample, as in Example 1, the transparency of the modified portion and the modified length L before and after heating were unchanged, and the measurement conditions were also unchanged. However, the refractive index difference Δn between the laser irradiated portion and the non-irradiated portion is, for example, Δn is 6.5 × 10 −4 in an atmosphere at 25 ° C. where the diffraction efficiency is 6.6%. In an atmosphere at 70 ° C. with a diffraction efficiency of 13.5%, Δn was 9.5 × 10 −4 , which was about 1.5 times larger. Therefore, it was considered that the increase in diffraction efficiency was due to an increase in the refractive index difference Δn.

また、本実施例では、加熱時の雰囲気として一般的な大気雰囲気としているが、シクロオレフィンポリマーのようにグレードによっては加熱時に酸化劣化され易い材料の場合、加熱時の雰囲気として酸素を除去するために、真空や減圧雰囲気、および窒素雰囲気などとしても同様の効果を得ることができる。   In this example, a general air atmosphere is used as the atmosphere during heating. However, in the case of a material that is easily oxidized and deteriorated during heating depending on the grade such as a cycloolefin polymer, oxygen is removed as the atmosphere during heating. In addition, the same effects can be obtained as a vacuum, a reduced pressure atmosphere, a nitrogen atmosphere, or the like.

(実施例4)
本実施例においては、光学高分子構造体を構成する材料に、母材と添加材との混合物を用いた。母材は、屈折率1.49、ガラス転移点95℃のPMMAを用いた。PMMAの作成方法として、メチルメタクリレート(以下、「MMA」という。)30gと、MMAに対して0.1mol%の開始剤を加えた。窒素雰囲気下、55℃で72時間加熱し、バルク状のPMMAを得た。この場合のガラス転移点は95℃である。また、添加材は、つぎの式(2)に示す構造を有する屈折率1.56のジアリールエテンを用い、ジアリールエテンを母材に対して10質量%混合した。作成方法として、MMA30gに10質量%のジアリールエテンを溶解させ、MMAに対して0.1mol%の開始剤を加えた。これを、窒素雰囲気下、55℃で72時間加熱し、バルク状のジアリールエテンを含有するPMMAを得た。この混合物のガラス転移点は85℃であった。つぎに、光学高分子構造体の内部に、加工面でのレーザパルスエネルギが1100nJとなるようにフェムト秒レーザを照射した。その結果、改質厚Lは430μmであり、式(4)によりQ値は11.5となり、ブラッグ角での1次回折効率は9.3%であった。また、レーザ照射部と非照射
部との屈折率差Δnは2.8×10-4であり、レーザ照射部の波長632.8nmでの光線透過率は60%であった。
Example 4
In this example, a mixture of a base material and an additive was used as the material constituting the optical polymer structure. As the base material, PMMA having a refractive index of 1.49 and a glass transition point of 95 ° C. was used. As a method for producing PMMA, 30 g of methyl methacrylate (hereinafter referred to as “MMA”) and an initiator of 0.1 mol% with respect to MMA were added. Heating was performed at 55 ° C. for 72 hours in a nitrogen atmosphere to obtain bulk PMMA. In this case, the glass transition point is 95 ° C. Further, as the additive, diarylethene having a refractive index of 1.56 having a structure represented by the following formula (2) was used, and 10% by mass of diarylethene was mixed with the base material. As a preparation method, 10% by mass of diarylethene was dissolved in 30 g of MMA, and 0.1 mol% of an initiator was added to MMA. This was heated at 55 ° C. for 72 hours under a nitrogen atmosphere to obtain PMMA containing bulk diarylethene. The glass transition point of this mixture was 85 ° C. Next, a femtosecond laser was irradiated into the optical polymer structure so that the laser pulse energy on the processed surface was 1100 nJ. As a result, the modified thickness L was 430 μm, the Q value was 11.5 according to the equation (4), and the first-order diffraction efficiency at the Bragg angle was 9.3%. The refractive index difference Δn between the laser irradiated part and the non-irradiated part was 2.8 × 10 −4 , and the light transmittance at a wavelength of 632.8 nm of the laser irradiated part was 60%.

その後、25℃(室温)と70℃の各温度雰囲気中で7日間処理を行なった後に、25℃(室温)下にて、一次回折効率を測定した。図4に、各温度雰囲気における7日間経過後のブラッグ角における1次回折効率とレーザ照射部の波長632.8nmでの光線透過率を示す。なお、70℃の雰囲気は恒温加熱槽により調整した。   Then, after processing for 7 days in each atmosphere at 25 ° C. (room temperature) and 70 ° C., the first-order diffraction efficiency was measured at 25 ° C. (room temperature). FIG. 4 shows the first-order diffraction efficiency at the Bragg angle after 7 days in each temperature atmosphere and the light transmittance at a wavelength of 632.8 nm of the laser irradiation part. The atmosphere at 70 ° C. was adjusted with a constant temperature heating tank.

図4の結果から明らかなとおり、1次回折効率は、25℃の雰囲気下における12.1%に対して、70℃以上の雰囲気下では、89.6%と7倍以上向上した。また、格子部
の波長632.8nmでの光線透過率も加熱処理により80%から92%に向上した。光学高分子材料のガラス転移点の絶対温度Tgは、80+273=353Kであり、70℃
で加熱したときの絶対温度Tは、70+273=343Kであるから、T/Tgは0.9
7となる。したがって、T/Tgが0.97の雰囲気で加熱することにより、光学高分子
構造体が混合物からなる態様においても、回折効率が増加することが確認できた。
As is apparent from the results of FIG. 4, the first-order diffraction efficiency was improved 7 times or more to 89.6% in an atmosphere at 70 ° C. or higher, compared to 12.1% in an atmosphere at 25 ° C. Further, the light transmittance at a wavelength of 632.8 nm of the grating portion was improved from 80% to 92% by the heat treatment. The absolute temperature T g of the glass transition point of the optical polymer material is 80 + 273 = 353 K, and 70 ° C.
Since the absolute temperature T when heated at 70 is 70 + 273 = 343K, T / T g is 0.9.
7 Therefore, it was confirmed that heating in an atmosphere having a T / T g of 0.97 increases the diffraction efficiency even in an embodiment in which the optical polymer structure is composed of a mixture.

なお、いずれの試料も、加熱処理前後で改質厚Lは430μmで変化しなかった。また、加熱前後で改質部の透明性は変化するが、この変化が透明性が向上する方向であるためジアリールエテンの異性化による屈折率増加とは逆方向であるといえる。そして、測定条件も同一であったが、レーザ照射部と非照射部との屈折率差Δnは、回折効率が12.1%である25℃の雰囲気では、Δnが3.4×10-4であるのに対して、回折効率が89.6%である70℃の雰囲気では、Δnが11.6×10-4であり、3.4倍大きくなった。したがって、回折効率の増加は、実施例1〜3と同様に、屈折率差Δnの増加によるものと考察された。 In all samples, the modified thickness L was 430 μm and did not change before and after the heat treatment. Moreover, although the transparency of the modified portion changes before and after heating, it can be said that this change is in the direction opposite to the increase in refractive index due to isomerization of diarylethene because this change is in the direction of improving the transparency. The measurement conditions were also the same, but the refractive index difference Δn between the laser irradiation part and the non-irradiation part was Δn of 3.4 × 10 −4 in an atmosphere at 25 ° C. where the diffraction efficiency was 12.1%. On the other hand, in an atmosphere at 70 ° C. where the diffraction efficiency is 89.6%, Δn was 11.6 × 10 −4 , which was 3.4 times larger. Therefore, the increase in diffraction efficiency was considered to be due to the increase in the refractive index difference Δn, as in Examples 1-3.

(実施例5)
本実施例においては、フェムト秒レーザの中心波長を400nm、光学高分子構造体の内部に、加工面でのレーザパルスエネルギが164nJとなるようにした以外は、実施例1と同様の条件にてフェムト秒レーザを照射した。その結果、改質厚Lは240μmであり、式(4)により求められるQ値は6.4となり、ブラッグ角での1次回折効率は1.
0%であった。また、レーザ照射部と非照射部との屈折率差Δnは1.7×10-4であり、レーザ照射部の波長632.8nmでの光線透過率は98%であった。その後、25℃(室温)、50℃、70℃、と100℃の各温度雰囲気中で経日加熱処理を行なった後に、25℃(室温)下にて、回折効率を測定した。表4と図5に、各温度雰囲気での経日加熱処理後のブラッグ角での1次回折効率を示す。また、レーザ照射部の8日間経過後の波長632.8nmでの光線透過率を表4に示す。
(Example 5)
In this example, the same conditions as in Example 1 were used except that the center wavelength of the femtosecond laser was 400 nm, and the laser pulse energy on the processed surface was 164 nJ inside the optical polymer structure. Femtosecond laser was irradiated. As a result, the modified thickness L is 240 μm, the Q value obtained by the equation (4) is 6.4, and the first-order diffraction efficiency at the Bragg angle is 1.
0%. The refractive index difference Δn between the laser irradiated part and the non-irradiated part was 1.7 × 10 −4 , and the light transmittance at a wavelength of 632.8 nm of the laser irradiated part was 98%. Then, after carrying out heat treatment in each temperature atmosphere at 25 ° C. (room temperature), 50 ° C., 70 ° C., and 100 ° C., the diffraction efficiency was measured at 25 ° C. (room temperature). Table 4 and FIG. 5 show the first-order diffraction efficiency at the Bragg angle after the daily heat treatment in each temperature atmosphere. In addition, Table 4 shows the light transmittance at a wavelength of 632.8 nm after 8 days from the laser irradiation portion.

各温度条件のうち、50℃〜100℃の雰囲気は恒温加熱槽により調整した。   Among the temperature conditions, the atmosphere of 50 ° C. to 100 ° C. was adjusted by a constant temperature heating tank.

表4と図5の結果から明らかなとおり、50℃以上ではブラッグ角での1次回折効率は向上し、特に、50℃と70℃の温度雰囲気では、加熱処理前に比べて1次回折効率が大幅に増加した。PMMAのガラス転移点の絶対温度Tgは、120+273=393Kで
あり、50℃で加熱したときの絶対温度Tは、50+273=323Kであるから、T/Tgは0.85となる。したがって、T/Tgが0.85以上の雰囲気で加熱することにより、回折効率が増加することがわかった。
As is apparent from the results of Table 4 and FIG. 5, the first-order diffraction efficiency at the Bragg angle is improved at 50 ° C. or higher, and particularly in the temperature atmosphere at 50 ° C. and 70 ° C., the first-order diffraction efficiency is higher than before heat treatment. Increased significantly. The absolute temperature T g of the glass transition point of PMMA is 120 + 273 = 393K, and the absolute temperature T when heated at 50 ° C. is 50 + 273 = 323 K, so T / T g is 0.85. Therefore, it was found that the diffraction efficiency is increased by heating in an atmosphere having a T / T g of 0.85 or more.

さらに、70℃で加熱した場合には、図5に示すように、ブラッグ角での1次回折効率が、5日間経過後に27%、18日間経過後に30%に達した。したがって、70℃で18日間処理した場合の回折効率30.1%は、25℃で8日間処理した場合の回折効率0
.7%の約43倍であり、また、他の温度条件での飽和となる回折効率値および極大となる回折効率値に比べて高いことがわかった。すなわち、本実施例の条件では、70℃の温度条件の場合に回折効率が最も高い値で飽和し、さらに、そのための処理時間が短い点で、70℃がピーク温度であった。
Furthermore, when heated at 70 ° C., as shown in FIG. 5, the first-order diffraction efficiency at the Bragg angle reached 27% after 5 days and 30% after 18 days. Therefore, the diffraction efficiency of 30.1% when treated at 70 ° C. for 18 days is zero when the diffraction efficiency is treated for 8 days at 25 ° C.
. It was about 43 times that of 7%, and was found to be higher than the diffraction efficiency value at which saturation was achieved and the maximum diffraction efficiency value at other temperature conditions. That is, under the conditions of this example, the diffraction efficiency was saturated at the highest value in the case of the temperature condition of 70 ° C., and 70 ° C. was the peak temperature in that the processing time for that was short.

所定の雰囲気下で8日間経過後のレーザ照射部の可視光線透過率を表4に示す。表4の結果より、加熱前後を問わず、いずれの試料も可視光線透過率は90%以上あった。また、いずれの試料も、加熱処理前後で改質厚Lは240μmで変化しなかった。すなわち、加熱前後での改質部の透明性と改質長さLは不変であり、測定条件も不変であった。しかし、レーザ照射部と非照射部との屈折率差Δnは、たとえば、回折効率が1.2%である25℃の雰囲気では、Δnが1.9×10-4であるのに対して、回折効率が31.6%である70℃の雰囲気では、Δnが10.0×10-4であり、約5.3倍大きくなった。したがって、式(3)により回折効率の増加は、屈折率差Δnの増加によるものと考察された。 Table 4 shows the visible light transmittance of the laser-irradiated part after 8 days in a predetermined atmosphere. From the results shown in Table 4, the visible light transmittance of each sample was 90% or more regardless of before and after heating. In all the samples, the modified thickness L was 240 μm and remained unchanged before and after the heat treatment. That is, the transparency and the modification length L of the modified part before and after heating were unchanged, and the measurement conditions were also unchanged. However, the refractive index difference Δn between the laser irradiated portion and the non-irradiated portion is, for example, Δn is 1.9 × 10 −4 in an atmosphere at 25 ° C. where the diffraction efficiency is 1.2%. In an atmosphere at 70 ° C. with a diffraction efficiency of 31.6%, Δn was 10.0 × 10 −4 , which was about 5.3 times larger. Therefore, it was considered from equation (3) that the increase in diffraction efficiency was due to an increase in the refractive index difference Δn.

下記実施例6〜9においては、フェムト秒レーザ照射後に、加熱処理を行ない、更にその後に温度雰囲気条件を変えて、回折効率を評価した。   In the following Examples 6 to 9, after the femtosecond laser irradiation, the heat treatment was performed, and then the temperature atmosphere conditions were changed to evaluate the diffraction efficiency.

(実施例6)
本実施例においては、先ず、光学高分子構造体の内部に、加工面でのレーザパルスエネルギが500nJとなるようにフェムト秒レーザを照射した。また、構造体の表面から内部への移動が1000μm/nとなるように、光学高分子構造体の内部に集光照射した。それ以外は実施例1と同様の条件とした。その結果、改質厚Lは315μmであり、式(4)によりQ値は8.4となり、ブラッグ角での1次回折効率は1.3%であった。また
、レーザ照射部と非照射部との屈折率差Δnは1.5×10-4であり、レーザ照射部の波長632.8nmでの光線透過率は97%であった。
(Example 6)
In this example, first, a femtosecond laser was irradiated into the optical polymer structure so that the laser pulse energy on the processed surface was 500 nJ. Further, the inside of the optical polymer structure was condensed and irradiated so that the movement from the surface of the structure to the inside was 1000 μm / n. The other conditions were the same as in Example 1. As a result, the modified thickness L was 315 μm, the Q value was 8.4 according to Equation (4), and the first-order diffraction efficiency at the Bragg angle was 1.3%. The refractive index difference Δn between the laser irradiated part and the non-irradiated part was 1.5 × 10 −4 , and the light transmittance at a wavelength of 632.8 nm of the laser irradiated part was 97%.

その後、25℃(室温)、70℃、100℃の各温度雰囲気中で7日間経過処理を行なった。70℃と100℃の雰囲気は恒温加熱槽により調整した。処理後に25℃(室温)下にて測定を実施すると、25℃(室温)での7日間経過処理後のブラッグ角での1次回折効率は0.9%、レーザ照射部と非照射部との屈折率差Δnは1.2×10-4、レーザ照射部の波長632.8nmでの光線透過率は97%であり、また、70℃での7日間経過処理後のブラッグ角での1次回折効率は60.5%、レーザ照射部と非照射部との屈折率差Δnは11.4×10-4、レーザ照射部の波長632.8nmでの光線透過率は99%であり、また、100℃での7日間経過処理後のブラッグ角での1次回折効率は7.1%、レーザ照射部と非照射部との屈折率差Δnは3.4×10-4、レーザ照射部の波長632.8nmでの光線透過率は97%であった。 Thereafter, a lapse process was performed for 7 days in each temperature atmosphere of 25 ° C. (room temperature), 70 ° C., and 100 ° C. The atmosphere at 70 ° C. and 100 ° C. was adjusted by a constant temperature heating tank. When the measurement was performed at 25 ° C. (room temperature) after the treatment, the first-order diffraction efficiency at the Bragg angle after 7 days of treatment at 25 ° C. (room temperature) was 0.9%. The refractive index difference Δn is 1.2 × 10 −4 , the light transmittance at a wavelength of 632.8 nm of the laser irradiation part is 97%, and 1 at the Bragg angle after 7 days of processing at 70 ° C. The next diffraction efficiency is 60.5%, the refractive index difference Δn between the laser irradiated part and the non-irradiated part is 11.4 × 10 −4 , and the light transmittance at the wavelength of 632.8 nm of the laser irradiated part is 99%. The first-order diffraction efficiency at the Bragg angle after 7 days of processing at 100 ° C. is 7.1%, the refractive index difference Δn between the laser irradiated part and the non-irradiated part is 3.4 × 10 −4 , and laser irradiation. The light transmittance at a wavelength of 632.8 nm was 97%.

さらにその後、上記処理を行なった光学高分子構造体の各々を、−25℃、25℃(室温)、70℃、100℃の各温度雰囲気中で113時間、H/C1の温度サイクル雰囲気中で110サイクル、H/C2の温度サイクル雰囲気中で102サイクル、の各条件で経過処理を行なった後、25℃(室温)下にて測定を実施した。ここで、H/C1は、−25℃の温度雰囲気下で30分間経過後、70度の温度雰囲気下で30分間経過することを1サイクルとする温度サイクルのことであり、また、H/C2は、−40℃の温度雰囲気下で30分間経過後、100℃の温度雰囲気下で30分経過することを1サイクルとする温度サイクルのことを示す。   After that, each of the optical polymer structures subjected to the above-described treatment was subjected to 113 hours in a temperature atmosphere of −25 ° C., 25 ° C. (room temperature), 70 ° C., and 100 ° C. in a temperature cycle atmosphere of H / C1. The treatment was performed under conditions of 110 cycles and 102 cycles in an H / C2 temperature cycle atmosphere, and then the measurement was performed at 25 ° C. (room temperature). Here, H / C1 is a temperature cycle in which a cycle of 30 minutes in a temperature atmosphere of −25 ° C. and 30 minutes in a temperature atmosphere of −70 ° C. is defined as one cycle. Indicates a temperature cycle in which 30 minutes pass under a temperature atmosphere of −40 ° C. and 30 minutes pass under a temperature atmosphere of 100 ° C. as one cycle.

表5と表6に、レーザ照射後に、25℃(室温)、70℃、100℃の各温度で7日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率およびレーザ照射部の波長632.8nmでの光線透過率を示す。また、図6に、レーザ照射後に25℃(室温)で7
日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率のグラフを示す。また、図7に、レーザ照射後に70℃で7日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率のグラフを示す。また、図8に、レーザ照射後に100℃で7日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率のグラフを示す。各温度雰囲気条件のうち、−25℃は恒温冷却槽、70℃、100℃は恒温加熱槽、H/C1とH/C2はヒートサイクル試験槽により調整した。
Tables 5 and 6 show that after the laser irradiation, the first-order diffraction efficiency and the laser irradiation part after being exposed to the atmospheric conditions after each lapse of 7 days at temperatures of 25 ° C. (room temperature), 70 ° C., and 100 ° C. The light transmittance at a wavelength of 632.8 nm is shown. Further, FIG. 6 shows that after laser irradiation, 7 ° C. at 25 ° C. (room temperature).
The graph of the 1st-order diffraction efficiency after exposing to each temperature atmospheric condition after progressing a day is shown. Further, FIG. 7 shows a graph of first-order diffraction efficiency after exposure to each temperature and atmosphere condition after 7 days at 70 ° C. after laser irradiation. Further, FIG. 8 shows a graph of the first-order diffraction efficiency after exposure to each temperature and atmosphere condition after 7 days at 100 ° C. after laser irradiation. Among each temperature atmosphere condition, −25 ° C. was adjusted by a constant temperature cooling bath, 70 ° C. and 100 ° C. by a constant temperature heating bath, and H / C1 and H / C2 were adjusted by a heat cycle test bath.

表5と図6から明らかなとおり、25℃(室温)で7日間処理を行なったものは、その後の各温度雰囲気113時間経過後、およびH/C1の110サイクル後、H/C2の102サイクル後において、−25℃、25℃(室温)では、最大の安定性で、ブラッグ角での1次回折効率として−54%(屈折率差Δnの安定性としては−32%)程度であるものの、70℃、100℃、H/C1、H/C2では大きく回折効率が変化し、最大の安定性で、ブラッグ角での1次回折効率として+5300%(屈折率差Δnの安定性として+700%)程度となる。ここで安定性は、各温度雰囲気経過処理後の回折効率の値をα、各温度雰囲気経過処理前の回折効率の値をβとして、
(α−β)/β×100% 式(5)
の式(5)で表され、各温度雰囲気経過処理前の回折効率およびΔnに対する変化率を示し、±の符号は増減を示す。
As is apparent from Table 5 and FIG. 6, those treated for 7 days at 25 ° C. (room temperature) are those after 113 hours of each temperature atmosphere, 110 cycles of H / C1, and 102 cycles of H / C2. Later, at −25 ° C. and 25 ° C. (room temperature), the maximum stability is obtained, and the first-order diffraction efficiency at the Bragg angle is about −54% (the stability of the refractive index difference Δn is about −32%). , 70 ° C., 100 ° C., H / C1, and H / C2, the diffraction efficiency changes greatly, and the maximum stability is + 5300% as the first-order diffraction efficiency at the Bragg angle (+ 700% as the stability of the refractive index difference Δn) ) Here, the stability is defined as a value of the diffraction efficiency after each temperature atmosphere passage treatment is α, a value of the diffraction efficiency before each temperature atmosphere passage treatment is β,
(Α−β) / β × 100% Formula (5)
The diffraction efficiency before each temperature atmosphere progress treatment and the rate of change with respect to Δn are shown, and the sign of ± indicates increase or decrease.

また、表5と図7から明らかなとおり、70℃で7日間処理を行なったものは、その後の各温度雰囲気113時間後、およびH/C1の110サイクル後、H/C2の102サイクル後において、−25℃、25℃(室温)、70℃、H/C1では、回折効率の変化は小さく、最大の安定性でも、ブラッグ角での1次回折効率として+13%(屈折率差Δnの安定性として+9%)程度であるものの、100℃、H/C2では大きく回折効率が変化し、最大の安定性で、ブラッグ角での1次回折効率として−95%(屈折率差Δnの安定性として−80%)程度となる。   Further, as is apparent from Table 5 and FIG. 7, those treated at 70 ° C. for 7 days were obtained after 113 hours of each temperature atmosphere, after 110 cycles of H / C1, and after 102 cycles of H / C2. , −25 ° C., 25 ° C. (room temperature), 70 ° C., and H / C1, the change in diffraction efficiency is small, and the maximum stability is + 13% as the first-order diffraction efficiency at the Bragg angle (stable refractive index difference Δn) However, the diffraction efficiency greatly changes at 100 ° C. and H / C2, and the maximum stability is −95% as the first-order diffraction efficiency at the Bragg angle (the stability of the refractive index difference Δn). -80%).

また、表5と図8から明らかなとおり、100℃で7日間処理を行なったものは、その
後の各温度雰囲気113時間後、およびH/C1の110サイクル後、H/C2の102サイクル後において、−25℃、25℃(室温)、70℃、100℃、H/C1、H/C2のいずれの場合でも、回折効率の変化は小さく、最大の安定性でも、ブラッグ角での1次回折効率として+23%(屈折率差Δnの安定性として+11%)程度となる。
In addition, as is apparent from Table 5 and FIG. 8, the sample treated at 100 ° C. for 7 days was after 113 hours of each temperature atmosphere, 110 cycles of H / C1, and 102 cycles of H / C2. , −25 ° C., 25 ° C. (room temperature), 70 ° C., 100 ° C., H / C 1, H / C 2, the change in diffraction efficiency is small, and the first-order diffraction at the Bragg angle even with maximum stability The efficiency is about + 23% (the stability of the refractive index difference Δn is about + 11%).

なお、これらいずれの場合でも、改質長さLは変化せず、また、レーザ照射部の波長632.8nmでの光線透過率も表6に示すように90%以上で殆ど変化しないため、各温度雰囲気経過処理後の回折効率の変化は屈折率差Δnの変化と考察された。   In any of these cases, the modified length L does not change, and the light transmittance at a wavelength of 632.8 nm of the laser irradiation portion hardly changes at 90% or more as shown in Table 6. The change in the diffraction efficiency after the temperature atmosphere process was considered as the change in the refractive index difference Δn.

従って、レーザ照射後に加熱処理を行なうと、その後の温度および温度変化が、加熱時処理温度以下であれば、ブラッグ角での1次回折効率および屈折率差Δnは安定する。しかし、加熱時処理温度以上および以上を含む温度変動となると、実施例1の加熱処理時の温度傾向、すなわち40℃以上で回折効率が大きくなり70〜80℃で最大化する傾向に依存した回折効率変化を示すため、回折効率およびΔnが大きく増減する変化を受けることが分かる。すなわち、フェムト秒レーザ照射により光学高分子構造体内部に屈折率変化を誘起する方法で作製された光学素子の、その後の温度変化に対する屈折率差Δnを安定化するためには、光学素子の使用時に曝される最高温度の絶対温度表示T1が0.8≦T1/Tg≦1.13に含まれる場合、フェムト秒レーザ照射後に、加熱温度Tとして、T1≦Tの温度で加熱処理を行なうことがよいことが分かった。 Therefore, when heat treatment is performed after laser irradiation, the first-order diffraction efficiency and the refractive index difference Δn at the Bragg angle are stabilized if the subsequent temperature and temperature change are equal to or lower than the heat treatment temperature. However, when the temperature variation including the heat treatment temperature is higher or higher, the diffraction tendency depends on the temperature tendency during the heat treatment of Example 1, that is, the diffraction efficiency increases at 40 ° C. or higher and maximizes at 70-80 ° C. It can be seen that the diffraction efficiency and Δn are greatly changed to show the efficiency change. That is, in order to stabilize the refractive index difference Δn with respect to the subsequent temperature change of the optical element manufactured by the method of inducing the refractive index change inside the optical polymer structure by femtosecond laser irradiation, use of the optical element is required. When the absolute temperature display T 1 of the highest temperature that is sometimes exposed is included in 0.8 ≦ T 1 / T g ≦ 1.13, heating is performed at a temperature T 1 ≦ T as the heating temperature T after the femtosecond laser irradiation. It turns out that processing is good.

(実施例7)
本実施例においては、先ず、光学高分子構造体の内部に、加工面でのレーザパルスエネルギが400nJとなるようにフェムト秒レーザを照射した。また、N.A.(開口数)0.25の対物レンズ(倍率10倍)を使用し、対物レンズの前に5.5mm径のアパーチャを設定し、光学高分子構造体の内部に集光照射した。それ以外は実施例2と同様の条件とした。その結果、改質厚Lは190μmであり、式(4)によりQ値は4.8となり、ブラッグ角での1次回折効率は0.3%であった。また、レーザ照射部と非照射部との屈折率差Δnは1.1×10-4であり、レーザ照射部の波長632.8nmでの光線透過率は98%であった。
(Example 7)
In this example, first, a femtosecond laser was irradiated into the optical polymer structure so that the laser pulse energy on the processed surface was 400 nJ. N. A. An objective lens having a numerical aperture of 0.25 (magnification of 10) was used, an aperture having a diameter of 5.5 mm was set in front of the objective lens, and the inside of the optical polymer structure was condensed and irradiated. The other conditions were the same as in Example 2. As a result, the modified thickness L was 190 μm, the Q value was 4.8 according to Equation (4), and the first-order diffraction efficiency at the Bragg angle was 0.3%. Further, the refractive index difference Δn between the laser irradiated portion and the non-irradiated portion was 1.1 × 10 −4 , and the light transmittance at a wavelength of 632.8 nm of the laser irradiated portion was 98%.

その後、25℃(室温)、70℃、130℃の各温度雰囲気中で10日間経過処理を行なった。70℃と130℃の雰囲気は恒温加熱槽により調整した。処理後に25℃(室温)下にて測定を実施すると、25℃(室温)での10日間経過処理後のブラッグ角での1次回折効率は2.6%、レーザ照射部と非照射部との屈折率差Δnは3.4×10-4、レーザ照射部の波長632.8nmでの光線透過率は97%であり、また、70℃での10日間経過処理後のブラッグ角での1次回折効率は9.3%、レーザ照射部と非照射部との屈折率差Δnは6.6×10-4、レーザ照射部の波長632.8nmでの光線透過率は96%であり、また、130℃での10日間経過処理後のブラッグ角での1次回折効率は23.1%、レーザ照射部と非照射部との屈折率差Δnは10.6×10-4、レーザ照射部の波長632.8nmでの光線透過率は98%であった。 Thereafter, a lapse treatment was performed for 10 days in each temperature atmosphere of 25 ° C. (room temperature), 70 ° C., and 130 ° C. The atmosphere at 70 ° C. and 130 ° C. was adjusted by a constant temperature heating tank. When the measurement is performed at 25 ° C. (room temperature) after the treatment, the first-order diffraction efficiency at the Bragg angle after the treatment for 10 days at 25 ° C. (room temperature) is 2.6%. The refractive index difference Δn is 3.4 × 10 −4 , the light transmittance at a wavelength of 632.8 nm of the laser irradiation part is 97%, and 1 at the Bragg angle after 10 days of processing at 70 ° C. The next diffraction efficiency is 9.3%, the refractive index difference Δn between the laser irradiated part and the non-irradiated part is 6.6 × 10 −4 , and the light transmittance at the wavelength of 632.8 nm of the laser irradiated part is 96%. Also, the first-order diffraction efficiency at the Bragg angle after 10 days of processing at 130 ° C. is 23.1%, the refractive index difference Δn between the laser irradiation part and the non-irradiation part is 10.6 × 10 −4 , and laser irradiation. The light transmittance of the part at a wavelength of 632.8 nm was 98%.

さらにその後、上記処理を行なった光学高分子構造体の各々を、−25℃、25℃(室温)、70℃、100℃の各温度雰囲気中で190時間、H/C1の温度サイクル雰囲気中で183サイクル、H/C2の温度サイクル雰囲気中で175サイクル、の各条件で経過処理を行なった後、25℃(室温)下にて測定を実施した。表7と表8に、レーザ照射後に、25℃(室温)、70℃、130℃の各温度で10日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率およびレーザ照射部の波長632.8nmでの光線透過率を示す。また、図9に、レーザ照射後に25℃(室温)で10日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率のグラフを示す。また、図10に、レーザ照射後に70℃で10日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率のグラフ
を示す。また、図11に、レーザ照射後に130℃で10日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率のグラフを示す。各温度雰囲気条件のうち、−25℃は恒温冷却槽、70℃、100℃は恒温加熱槽、H/C1とH/C2はヒートサイクル試験槽により調整した。
Further, after that, each of the optical polymer structures subjected to the above treatment was subjected to 190 hours in each temperature atmosphere at −25 ° C., 25 ° C. (room temperature), 70 ° C., and 100 ° C. After the progress treatment was performed under the conditions of 183 cycles and 175 cycles in an H / C2 temperature cycle atmosphere, the measurement was performed at 25 ° C. (room temperature). Tables 7 and 8 show that the first-order diffraction efficiency and the laser irradiation part after exposure to each atmospheric condition after 10 days at 25 ° C. (room temperature), 70 ° C., and 130 ° C. after laser irradiation. The light transmittance at a wavelength of 632.8 nm is shown. FIG. 9 shows a graph of the first-order diffraction efficiency after exposure to each temperature and atmosphere condition after 10 days at 25 ° C. (room temperature) after laser irradiation. Further, FIG. 10 shows a graph of the first-order diffraction efficiency after exposure to each temperature and atmosphere condition after 10 days at 70 ° C. after laser irradiation. Further, FIG. 11 shows a graph of the first-order diffraction efficiency after exposure to each temperature and atmosphere condition after 10 days at 130 ° C. after laser irradiation. Among each temperature atmosphere condition, −25 ° C. was adjusted by a constant temperature cooling bath, 70 ° C. and 100 ° C. by a constant temperature heating bath, and H / C1 and H / C2 were adjusted by a heat cycle test bath.

表7と図9から明らかなとおり、25℃(室温)で10日間処理を行なったものは、その後の各温度雰囲気190時間経過後、およびH/C1の183サイクル後、H/C2の175サイクル後において、−25℃、25℃(室温)では、最大の安定性で、ブラッグ角での1次回折効率として+35%(屈折率差Δnの安定性として+16%)程度であるものの、70℃、100℃、H/C1、H/C2では大きく回折効率が変化し、最大の安定性で、ブラッグ角での1次回折効率として+660%(屈折率差Δnの安定性として+185%)程度となる。   As is apparent from Table 7 and FIG. 9, the sample treated at 25 ° C. (room temperature) for 10 days was after 190 hours of each temperature atmosphere, 183 cycles of H / C1, and 175 cycles of H / C2. Later, at −25 ° C. and 25 ° C. (room temperature), the maximum stability and the first-order diffraction efficiency at the Bragg angle is about + 35% (+ 16% as the stability of the refractive index difference Δn), but 70 ° C. At 100 ° C., H / C1, H / C2, the diffraction efficiency changes greatly, and the maximum stability is about + 660% as the first-order diffraction efficiency at the Bragg angle (+ 185% as the stability of the refractive index difference Δn). Become.

また、表7と図10から明らかなとおり、70℃で10日間処理を行なったものは、その後の各温度雰囲気190時間後、およびH/C1の183サイクル後、H/C2の175サイクル後において、−25℃、25℃(室温)、70℃、H/C1では、回折効率の変化は小さく、最大の安定性でも、ブラッグ角での1次回折効率として+25%(屈折率差Δnの安定性として+12%)程度であるものの、100℃、H/C2では大きく回折効率が変化し、最大の安定性で、ブラッグ角での1次回折効率として+100%(屈折率差Δnの安定性として+44%)程度となる。   In addition, as is apparent from Table 7 and FIG. 10, the samples treated at 70 ° C. for 10 days were observed after 190 hours of each temperature atmosphere, after 183 cycles of H / C1, and after 175 cycles of H / C2. , −25 ° C., 25 ° C. (room temperature), 70 ° C., and H / C1, the change in diffraction efficiency is small, and even with the maximum stability, the first-order diffraction efficiency at the Bragg angle is + 25% (stable refractive index difference Δn) However, the diffraction efficiency greatly changes at 100 ° C. and H / C2, and the maximum stability, the first-order diffraction efficiency at the Bragg angle is + 100% (the stability of the refractive index difference Δn). + 44%).

また、表7と図11から明らかなとおり、130℃で10日間処理を行なったものは、その後の各温度雰囲気190時間後、およびH/C1の183サイクル後、H/C2の175サイクル後において、−25℃、25℃(室温)、70℃、100℃、H/C1、H/C2のいずれの場合でも、回折効率の変化は小さく、最大の安定性でも、ブラッグ角での1次回折効率として+34%(屈折率差Δnの安定性として+18%)程度となる。   In addition, as is apparent from Table 7 and FIG. 11, the sample treated at 130 ° C. for 10 days was after 190 hours of each temperature atmosphere, after 183 cycles of H / C1, and after 175 cycles of H / C2. , −25 ° C., 25 ° C. (room temperature), 70 ° C., 100 ° C., H / C 1, H / C 2, the change in diffraction efficiency is small, and the first-order diffraction at the Bragg angle even with maximum stability The efficiency is about + 34% (the stability of the refractive index difference Δn is about + 18%).

なお、これらいずれの場合でも、改質長さLは変化せず、また、レーザ照射部の波長6
32.8nmでの光線透過率も表8に示すように90%以上で殆ど変化しないため、各温度雰囲気経過処理後の回折効率の変化は屈折率差Δnの変化と考察された。
In any of these cases, the modified length L does not change, and the wavelength 6 of the laser irradiation section is not changed.
Since the light transmittance at 32.8 nm is almost 90% or more as shown in Table 8, the change in the diffraction efficiency after each temperature atmosphere process was considered to be the change in the refractive index difference Δn.

従って、レーザ照射後に加熱処理を行なうと、その後の温度およびその変動が、加熱時処理温度以下であれば、ブラッグ角での1次回折効率および屈折率差Δnは安定するが、加熱時処理温度以上および以上を含む温度変動となると、実施例2の加熱処理時の温度傾向、すなわち70℃以上で回折効率が大きくなり120℃で最大化する傾向、に依存した回折効率変化を示すため、回折効率およびΔnが大きく増減する変化を受けることが分かる。すなわち、フェムト秒レーザ照射により光学高分子構造体内部に屈折率変化を誘起する方法で作製された光学素子の、その後の温度変化に対する屈折率差Δnを安定化するためには、光学素子の使用時に曝される最高温度の絶対温度表示T1が0.8≦T1/Tg
1.13に含まれる場合、フェムト秒レーザ照射後に、加熱温度Tとして、T1≦Tの温
度で加熱処理を行なうことがよいことが分かった。
Therefore, when the heat treatment is performed after laser irradiation, the first-order diffraction efficiency and the refractive index difference Δn at the Bragg angle are stabilized if the subsequent temperature and its fluctuation are equal to or lower than the heat treatment temperature, but the heat treatment temperature When the temperature fluctuation includes the above and the above, the diffraction efficiency changes depending on the temperature tendency during the heat treatment in Example 2, that is, the diffraction efficiency increases at 70 ° C. or higher and maximizes at 120 ° C. It can be seen that the efficiency and Δn are greatly changed. That is, in order to stabilize the refractive index difference Δn with respect to the subsequent temperature change of the optical element manufactured by the method of inducing the refractive index change inside the optical polymer structure by femtosecond laser irradiation, use of the optical element is required. The absolute temperature display T 1 of the highest temperature that is sometimes exposed is 0.8 ≦ T 1 / T g
When included in 1.13, it was found that the heat treatment should be performed at a temperature of T 1 ≦ T as the heating temperature T after the femtosecond laser irradiation.

(実施例8)
本実施例においては、先ず、光学高分子構造体の内部に、実施例3と同様の条件とした。その結果、改質厚Lは160μmであり、式(4)により求められるQ値は4.2となり、ブラッグ角での1次回折効率は0.1%であった。また、レーザ照射部と非照射部と
の屈折率差Δnは0.7×10-4であり、レーザ照射部の波長632.8nmでの光線透過率は99%であった。
(Example 8)
In this example, first, the same conditions as in Example 3 were set inside the optical polymer structure. As a result, the modified thickness L was 160 μm, the Q value obtained by the equation (4) was 4.2, and the first-order diffraction efficiency at the Bragg angle was 0.1%. The refractive index difference Δn between the laser irradiated part and the non-irradiated part was 0.7 × 10 −4 , and the light transmittance at a wavelength of 632.8 nm of the laser irradiated part was 99%.

その後、25℃(室温)、70℃、100℃の各温度雰囲気中で10日間経過処理を行なった。70℃と100℃の雰囲気は恒温加熱槽により調整した。処理後に25℃(室温)下にて測定を実施すると、25℃(室温)での10日間経過処理後のブラッグ角での1次回折効率は7.2%、レーザ照射部と非照射部との屈折率差Δnは6.9×10-4、レーザ照射部の波長632.8nmでの光線透過率は96%であり、また、70℃での10日間経過処理後のブラッグ角での1次回折効率は14.7%、レーザ照射部と非照射部との屈折率差Δnは9.9×10-4、レーザ照射部の波長632.8nmでの光線透過率は98%であり、また、100℃での10日間経過処理後のブラッグ角での1次回折効率は11.5%、レーザ照射部と非照射部との屈折率差Δnは8.7×10-4、レーザ照射部の波長632.8nmでの光線透過率は95%であった。 Thereafter, a lapse process was performed for 10 days in each temperature atmosphere of 25 ° C. (room temperature), 70 ° C., and 100 ° C. The atmosphere at 70 ° C. and 100 ° C. was adjusted by a constant temperature heating tank. When the measurement is carried out at 25 ° C. (room temperature) after the treatment, the first-order diffraction efficiency at the Bragg angle after 10 days of treatment at 25 ° C. (room temperature) is 7.2%. The refractive index difference Δn is 6.9 × 10 −4 , the light transmittance at a wavelength of 632.8 nm of the laser irradiation part is 96%, and 1 at the Bragg angle after 10 days of processing at 70 ° C. The next diffraction efficiency is 14.7%, the refractive index difference Δn between the laser irradiated part and the non-irradiated part is 9.9 × 10 −4 , and the light transmittance at the wavelength of 632.8 nm of the laser irradiated part is 98%. Further, the first-order diffraction efficiency at the Bragg angle after 10 days of processing at 100 ° C. is 11.5%, the refractive index difference Δn between the laser irradiation part and the non-irradiation part is 8.7 × 10 −4 , and laser irradiation The light transmittance of the part at a wavelength of 632.8 nm was 95%.

さらにその後、上記処理を行なった光学高分子構造体の各々を、−25℃、25℃(室温)、70℃、100℃の各温度雰囲気中で190時間、H/C1の温度サイクル雰囲気中で183サイクル、H/C2の温度サイクル雰囲気中で175サイクル、の各条件で経過処理を行なった後、25℃(室温)下にて測定を実施した。表9と表10に、レーザ照射後に、25℃(室温)、70℃、100℃の各温度で10日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率およびレーザ照射部の波長632.8nmでの光線透過率を示す。また、図12に、レーザ照射後に25℃(室温)で10日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率のグラフを示す。また、図13に、レーザ照射後に70℃で10日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率のグラフを示す。また、図14に、レーザ照射後に100℃で10日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率のグラフを示す。各温度雰囲気条件のうち、−25℃は恒温冷却槽、70℃、100℃は恒温加熱槽、H/C1とH/C2はヒートサイクル試験槽により調整した。   Further, after that, each of the optical polymer structures subjected to the above treatment was subjected to 190 hours in each temperature atmosphere at −25 ° C., 25 ° C. (room temperature), 70 ° C., and 100 ° C., and in a temperature cycle atmosphere of H / C1. After the progress treatment was performed under the conditions of 183 cycles and 175 cycles in an H / C2 temperature cycle atmosphere, the measurement was performed at 25 ° C. (room temperature). Tables 9 and 10 show that after the laser irradiation, the first-order diffraction efficiency and the laser irradiation part after exposure to the atmospheric conditions at each temperature after 10 days at temperatures of 25 ° C. (room temperature), 70 ° C., and 100 ° C. The light transmittance at a wavelength of 632.8 nm is shown. In addition, FIG. 12 shows a graph of the first-order diffraction efficiency after exposure to various atmospheric conditions after 10 days at 25 ° C. (room temperature) after laser irradiation. Further, FIG. 13 shows a graph of the first-order diffraction efficiency after exposure to each temperature and atmosphere condition after 10 days at 70 ° C. after laser irradiation. Further, FIG. 14 shows a graph of the first-order diffraction efficiency after exposure to each temperature and atmosphere condition after 10 days at 100 ° C. after laser irradiation. Among each temperature atmosphere condition, −25 ° C. was adjusted by a constant temperature cooling bath, 70 ° C. and 100 ° C. by a constant temperature heating bath, and H / C1 and H / C2 were adjusted by a heat cycle test bath.

表9と図12から明らかなとおり、25℃(室温)で10日間処理を行なったものは、その後の各温度雰囲気190時間経過後、およびH/C1の183サイクル後、H/C2の175サイクル後において、−25℃、25℃(室温)では、最大の安定性で、ブラッグ角での1次回折効率として+18%(屈折率差Δnの安定性として+9%)程度であるものの、70℃、100℃、H/C1、H/C2では大きく回折効率が変化し、最大の安定性で、ブラッグ角での1次回折効率として+125%(屈折率差Δnの安定性として+52%)程度となる。   As is apparent from Table 9 and FIG. 12, the sample treated at 25 ° C. (room temperature) for 10 days was after 190 hours of each temperature atmosphere, 183 cycles of H / C1, and 175 cycles of H / C2. Later, at −25 ° C. and 25 ° C. (room temperature), the maximum stability is obtained, and the first-order diffraction efficiency at the Bragg angle is about + 18% (+ 9% as the stability of the refractive index difference Δn). At 100 ° C., H / C1, H / C2, the diffraction efficiency changes greatly, and the maximum stability is about + 125% as the first-order diffraction efficiency at the Bragg angle (+ 52% as the stability of the refractive index difference Δn). Become.

また、表9と図13から明らかなとおり、70℃で10日間処理を行なったものは、その後の各温度雰囲気190時間後、およびH/C1の183サイクル後、H/C2の175サイクル後において、−25℃、25℃(室温)、70℃、H/C1では、回折効率の変化は小さく、最大の安定性でも、ブラッグ角での1次回折効率として−9%(屈折率差Δnの安定性として−5%)程度であるものの、100℃、H/C2では回折効率が変化し、最大の安定性で、ブラッグ角での1次回折効率として−19%(屈折率差Δnの安定性として−10%)程度となる。   Further, as is apparent from Table 9 and FIG. 13, the samples treated at 70 ° C. for 10 days were observed after 190 hours after each temperature atmosphere, after 183 cycles of H / C1, and after 175 cycles of H / C2. , −25 ° C., 25 ° C. (room temperature), 70 ° C., and H / C1, the change in diffraction efficiency is small, and even with the maximum stability, the first-order diffraction efficiency at the Bragg angle is −9% (refractive index difference Δn Although the stability is about −5%), the diffraction efficiency changes at 100 ° C. and H / C2, and the maximum stability, the first-order diffraction efficiency at the Bragg angle is −19% (the refractive index difference Δn is stable) About -10%).

また、表9と図14から明らかなとおり、100℃で10日間処理を行なったものは、その後の各温度雰囲気190時間後、およびH/C1の183サイクル後、H/C2の175サイクル後において、−25℃、25℃(室温)、70℃、100℃、H/C1、H/C2のいずれの場合でも、回折効率の変化は、最大の安定性でも、ブラッグ角での1次回折効率として+26%(屈折率差Δnの安定性として+13%)程度となる。   Further, as is apparent from Table 9 and FIG. 14, the samples treated at 100 ° C. for 10 days were processed after 190 hours of each temperature atmosphere, after 183 cycles of H / C1, and after 175 cycles of H / C2. , −25 ° C., 25 ° C. (room temperature), 70 ° C., 100 ° C., H / C 1, H / C 2, the change in diffraction efficiency is the maximum stability, the first-order diffraction efficiency at the Bragg angle As + 26% (+ 13% as the stability of the refractive index difference Δn).

なお、これらいずれの場合でも、改質長さLは変化せず、また、レーザ照射部の波長632.8nmでの光線透過率も表10に示すように90%以上で殆ど変化しないため、各温度雰囲気経過処理後の回折効率の変化は屈折率差Δnの変化と考察された。   In any of these cases, the modified length L does not change, and the light transmittance at a wavelength of 632.8 nm of the laser irradiation portion hardly changes at 90% or more as shown in Table 10. The change in the diffraction efficiency after the temperature atmosphere process was considered as the change in the refractive index difference Δn.

従って、レーザ照射後に加熱処理を行なうと、その後の温度およびその変動が、加熱時処理温度以下であれば、ブラッグ角での1次回折効率および屈折率差Δnは安定するが、
加熱時処理温度以上および以上を含む温度変動となると、実施例3の加熱処理時の温度傾向、すなわち50℃以上で回折効率が大きくなり70℃で最大化や100℃で極大化する傾向に依存した回折効率変化を示すため、回折効率およびΔnが大きく増減する変化を受けることが分かる。本実施例では、70℃で10日間処理した後に100℃で190時間処理を行っても大きな回折効率の差にはなっていないのは、実施例3に見られるように、70℃で処理した場合と100℃で処理した場合とで得られる回折効率の差は余り大きくないためである。すなわち、フェムト秒レーザ照射により光学高分子構造体内部に屈折率変化を誘起する方法で作製された光学素子の、その後の温度変化に対する屈折率差Δnを安定化するためには、光学素子の使用時に曝される最高温度の絶対温度表示T1が0.8
≦T1/Tg≦1.13に含まれる場合、フェムト秒レーザ照射後に、加熱温度Tとして、T1≦Tの温度で加熱処理を行なうことがよいことが分かった。
Therefore, when heat treatment is performed after laser irradiation, the first-order diffraction efficiency and the refractive index difference Δn at the Bragg angle are stable if the subsequent temperature and its fluctuation are equal to or lower than the heat treatment temperature,
When the temperature variation including the above-mentioned heat treatment temperature or higher is included, it depends on the temperature tendency at the time of heat treatment in Example 3, that is, the diffraction efficiency increases at 50 ° C. or higher and maximizes at 70 ° C. or maximizes at 100 ° C. It can be seen that the diffraction efficiency and Δn are greatly changed. In this example, it was processed at 70 ° C., as seen in Example 3, that the difference in diffraction efficiency was not large even if the treatment was performed at 70 ° C. for 10 days and then at 100 ° C. for 190 hours. This is because the difference in diffraction efficiency obtained between the case of processing at 100 ° C. and the case of processing at 100 ° C. is not so large. That is, in order to stabilize the refractive index difference Δn with respect to the subsequent temperature change of the optical element manufactured by the method of inducing the refractive index change inside the optical polymer structure by femtosecond laser irradiation, use of the optical element is required. The absolute temperature display T 1 of the highest temperature that is sometimes exposed is 0.8
When included in ≦ T 1 / T g ≦ 1.13, it was found that the heat treatment should be performed at the temperature T 1 ≦ T as the heating temperature T after the femtosecond laser irradiation.

(実施例9)
本実施例においては、先ず、光学高分子構造体の内部に、実施例5と同様の条件でフェムト秒レーザを集光照射した。その結果、改質厚Lは240μmであり、式(4)によりQ値は6.4となり、ブラッグ角での1次回折効率は1.0%であった。また、レーザ照
射部と非照射部との屈折率差Δnは1.7×10-4であり、レーザ照射部の波長632.8nmでの光線透過率は98%であった。
Example 9
In this example, first, the femtosecond laser was focused and irradiated inside the optical polymer structure under the same conditions as in Example 5. As a result, the modified thickness L was 240 μm, the Q value was 6.4 according to Equation (4), and the first-order diffraction efficiency at the Bragg angle was 1.0%. The refractive index difference Δn between the laser irradiated part and the non-irradiated part was 1.7 × 10 −4 , and the light transmittance at a wavelength of 632.8 nm of the laser irradiated part was 98%.

その後、25℃(室温)、70℃、100℃の各温度雰囲気中で8日間経過処理を行なった。70℃と100℃の雰囲気は恒温加熱槽により調整した。処理後に25℃(室温)下にて測定を実施すると、25℃(室温)での8日間経過処理後のブラッグ角での1次回折効率は1.2%、レーザ照射部と非照射部との屈折率差Δnは1.9×10-4、レーザ照射部の波長632.8nmでの光線透過率は98%であり、また、70℃での8日間経過処理後のブラッグ角での1次回折効率は31.7%、レーザ照射部と非照射部との屈折率差Δnは10.0×10-4、レーザ照射部の波長632.8nmでの光線透過率は98%であり、また、100℃での8日間経過処理後のブラッグ角での1次回折効率は1.5%、レーザ照射部と非照射部との屈折率差Δnは2.0×10-4、レーザ照射部の波長632.8nmでの光線透過率は98%であった。 Thereafter, a lapse treatment was performed for 8 days in each temperature atmosphere of 25 ° C. (room temperature), 70 ° C., and 100 ° C. The atmosphere at 70 ° C. and 100 ° C. was adjusted by a constant temperature heating tank. When measurement was performed at 25 ° C. (room temperature) after the treatment, the first-order diffraction efficiency at the Bragg angle after 8 days of treatment at 25 ° C. (room temperature) was 1.2%. The refractive index difference Δn is 1.9 × 10 −4 , the light transmittance of the laser irradiation part at a wavelength of 632.8 nm is 98%, and 1 at the Bragg angle after 8 days of processing at 70 ° C. The next diffraction efficiency is 31.7%, the refractive index difference Δn between the laser irradiated portion and the non-irradiated portion is 10.0 × 10 −4 , and the light transmittance at the wavelength of 632.8 nm of the laser irradiated portion is 98%. Further, the first-order diffraction efficiency at the Bragg angle after 8 days of processing at 100 ° C. is 1.5%, the refractive index difference Δn between the laser irradiation part and the non-irradiation part is 2.0 × 10 −4 , and laser irradiation The light transmittance of the part at a wavelength of 632.8 nm was 98%.

さらにその後、上記処理を行なった光学高分子構造体の各々を、−25℃、25℃(室温)、70℃、100℃の各温度雰囲気中で240時間、H/C1の温度サイクル雰囲気中で239サイクル、H/C2の温度サイクル雰囲気中で224サイクル、の各条件で経過処理を行なった後、25℃(室温)下にて測定を実施した。表11と表12に、レーザ照射後に、25℃(室温)、70℃、100℃の各温度で8日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率およびレーザ照射部の波長632.8nmでの光線透過率を示す。また、図15に、レーザ照射後に25℃(室温)で8日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率のグラフを示す。また、図16に、レーザ照射後に70℃で8日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率のグラフを示す。また、図17に、レーザ照射後に100℃で10日間経過した後に、各温度雰囲気条件に曝した後の1次回折効率のグラフを示す。各温度雰囲気条件のうち、−25℃は恒温冷却槽、70℃、100℃は恒温加熱槽、H/C1とH/C2はヒートサイクル試験槽により調整した。   Further, after that, each of the optical polymer structures subjected to the above-described treatment was subjected to 240 hours in a temperature atmosphere of −25 ° C., 25 ° C. (room temperature), 70 ° C., and 100 ° C. in a temperature cycle atmosphere of H / C1. After lapse of 239 cycles and 224 cycles in an H / C2 temperature cycle atmosphere, measurement was performed at 25 ° C. (room temperature). Tables 11 and 12 show that after the laser irradiation, the first-order diffraction efficiency and the laser irradiation portion after exposure to each temperature atmosphere condition after 8 days at temperatures of 25 ° C. (room temperature), 70 ° C., and 100 ° C. The light transmittance at a wavelength of 632.8 nm is shown. FIG. 15 shows a graph of the first-order diffraction efficiency after exposure to various atmospheric conditions after 8 days at 25 ° C. (room temperature) after laser irradiation. In addition, FIG. 16 shows a graph of the first-order diffraction efficiency after exposure to each temperature and atmosphere condition after 8 days at 70 ° C. after laser irradiation. In addition, FIG. 17 shows a graph of the first-order diffraction efficiency after exposure to various atmospheric conditions after 10 days at 100 ° C. after laser irradiation. Among each temperature atmosphere condition, −25 ° C. was adjusted by a constant temperature cooling bath, 70 ° C. and 100 ° C. by a constant temperature heating bath, and H / C1 and H / C2 were adjusted by a heat cycle test bath.

表11と図15から明らかなとおり、25℃(室温)で8日間処理を行なったものは、その後の各温度雰囲気240時間経過後、およびH/C1の239サイクル後、H/C2の224サイクル後において、−25℃、25℃(室温)では、最大の安定性で、ブラッグ角での1次回折効率として−40%(屈折率差Δnの安定性として−23%)程度であるものの、70℃、100℃、H/C1、H/C2では大きく回折効率が変化し、最大の安定性で、ブラッグ角での1次回折効率として+1250%(屈折率差Δnの安定性として+300%)程度となる。   As is apparent from Table 11 and FIG. 15, the sample treated at 25 ° C. (room temperature) for 8 days was obtained after 240 hours of each temperature atmosphere, 239 cycles of H / C1, and 224 cycles of H / C2. Later, at −25 ° C. and 25 ° C. (room temperature), the first-order diffraction efficiency at the Bragg angle is about −40% (the stability of the refractive index difference Δn is about −23%). At 70 ° C., 100 ° C., H / C1, and H / C2, the diffraction efficiency changes greatly. With the maximum stability, the first-order diffraction efficiency at the Bragg angle is + 1250% (the stability of the refractive index difference Δn is + 300%). It will be about.

また、表11と図16から明らかなとおり、70℃で8日間処理を行なったものは、その後の各温度雰囲気240時間後、およびH/C1の239サイクル後、H/C2の224サイクル後において、−25℃、25℃(室温)、70℃、H/C1では、回折効率の変化は小さく、最大の安定性でも、ブラッグ角での1次回折効率として−9%(屈折率差Δnの安定性として−5%)程度であるものの、100℃、H/C2では大きく回折効率が変化し、最大の安定性で、ブラッグ角での1次回折効率として−98%(屈折率差Δnの安定性として−89%)程度となる。   Further, as is apparent from Table 11 and FIG. 16, the samples treated at 70 ° C. for 8 days were obtained after 240 hours of each temperature atmosphere, after 239 cycles of H / C1, and after 224 cycles of H / C2. , −25 ° C., 25 ° C. (room temperature), 70 ° C., and H / C1, the change in diffraction efficiency is small, and even with the maximum stability, the first-order diffraction efficiency at the Bragg angle is −9% (refractive index difference Δn Although the stability is about −5%), the diffraction efficiency changes greatly at 100 ° C. and H / C2, and the maximum stability, the first-order diffraction efficiency at the Bragg angle is −98% (with a refractive index difference Δn). The stability is about -89%).

また、表11と図17から明らかなとおり、100℃で8日間処理を行なったものは、その後の各温度雰囲気240時間後、およびH/C1の239サイクル後、H/C2の224サイクル後において、−25℃、25℃(室温)、70℃、100℃、H/C1、H/C2のいずれの場合でも、回折効率の変化は小さく、最大の安定性でも、ブラッグ角での1次回折効率として−23%(屈折率差Δnの安定性として−12%)程度となる。   In addition, as is apparent from Table 11 and FIG. 17, the samples treated at 100 ° C. for 8 days were obtained after 240 hours of each temperature atmosphere, after 239 cycles of H / C1, and after 224 cycles of H / C2. , −25 ° C., 25 ° C. (room temperature), 70 ° C., 100 ° C., H / C 1, H / C 2, the change in diffraction efficiency is small, and the first-order diffraction at the Bragg angle even with maximum stability The efficiency is about -23% (the stability of the refractive index difference Δn is about -12%).

なお、これらいずれの場合でも、改質長さLは変化せず、また、レーザ照射部の波長632.8nmでの光線透過率も表12に示すように90%以上で殆ど変化しないため、各温度雰囲気経過処理後の回折効率の変化は屈折率差Δnの変化と考察された。   In any of these cases, the modified length L does not change, and the light transmittance at a wavelength of 632.8 nm of the laser irradiation portion hardly changes at 90% or more as shown in Table 12. The change in the diffraction efficiency after the temperature atmosphere process was considered as the change in the refractive index difference Δn.

従って、レーザ照射後に加熱処理を行なうと、その後の温度およびその変動が、加熱時処理温度以下であれば、ブラッグ角での1次回折効率および屈折率差Δnは安定するが、
加熱時処理温度以上および以上を含む温度変動となると、実施例5の加熱処理時の温度傾向、すなわち50℃以上で回折効率が大きくなり70℃で最大化する傾向、に依存した回折効率変化を示すため、回折効率およびΔnが大きく増減する変化を受けることが分かる。すなわち、フェムト秒レーザ照射により光学高分子構造体内部に屈折率変化を誘起する方法で作製された光学素子の、その後の温度変化に対する屈折率差Δnを安定化するためには、光学素子の使用時に曝される最高温度の絶対温度表示T1が0.8≦T1/Tg≦1
.13に含まれる場合、フェムト秒レーザ照射後に、加熱温度Tとして、T1≦Tの温度
で加熱処理を行なうことがよいことが分かった。
Therefore, when heat treatment is performed after laser irradiation, the first-order diffraction efficiency and the refractive index difference Δn at the Bragg angle are stable if the subsequent temperature and its fluctuation are equal to or lower than the heat treatment temperature,
When the temperature variation including the above processing temperature at the time of heating and the above is included, the diffraction efficiency change depending on the temperature tendency at the time of the heat processing in Example 5, that is, the tendency that the diffraction efficiency increases at 50 ° C. or higher and maximizes at 70 ° C. It can be seen that the diffraction efficiency and Δn are greatly changed. That is, in order to stabilize the refractive index difference Δn with respect to the subsequent temperature change of the optical element manufactured by the method of inducing the refractive index change inside the optical polymer structure by femtosecond laser irradiation, use of the optical element is required. The absolute temperature display T 1 of the highest temperature that is sometimes exposed is 0.8 ≦ T 1 / T g ≦ 1
. 13 included, it was found that the heat treatment should be performed at the temperature T 1 ≦ T as the heating temperature T after the femtosecond laser irradiation.

(ラマン分光分析)
光学高分子構造体の内部にフェムト秒レーザ照射後に加熱処理を行なうことによって、照射部と非照射部の屈折率差が拡大および安定化する理由を解明するために、実施例1における光学高分子構造体および処理条件等において、フェムト秒レーザ照射後の加熱処理を行なう場合と行なわない場合の2つの試料を用意し、これらの試料についてラマン分光分析を行ない、得られたラマンスペクトルを比較した。ただし、処理条件は、加工面でのレーザパルスエネルギを700nJ、周期Λを6μmとした以外は実施例1と同様の条件でフェムト秒レーザを照射した。また、レーザ照射後に加熱処理を行なったものは、70℃で5日間の加熱処理とした。ラマンスペクトルの結果として、フェムト秒レーザ照射後に加熱処理を行なわないものを図18、フェムト秒レーザ照射後に70℃で5日間加熱処理を行なったもの図19に示す。また、図18、図19において、図18および19の(a)はレーザ照射部におけるラマンスペクトル、図18および図19の(b)は非照射部におけるラマンスペクトル、図18および図19の(c)は両スペクトルの差分を示す。
(Raman spectroscopy)
In order to elucidate the reason why the difference in refractive index between the irradiated part and the non-irradiated part is enlarged and stabilized by performing heat treatment after irradiation of the femtosecond laser inside the optical polymer structure, the optical polymer in Example 1 is used. Two samples were prepared with and without heat treatment after the femtosecond laser irradiation in the structure and processing conditions, and these samples were subjected to Raman spectroscopic analysis, and the obtained Raman spectra were compared. However, the processing conditions were such that the femtosecond laser was irradiated under the same conditions as in Example 1 except that the laser pulse energy on the processed surface was 700 nJ and the period Λ was 6 μm. Moreover, what heat-processed after laser irradiation was made into the heat processing for 5 days at 70 degreeC. As a result of Raman spectrum, FIG. 18 shows the case where the heat treatment is not performed after the femtosecond laser irradiation, and FIG. 19 shows the case where the heat treatment is performed at 70 ° C. for 5 days after the femtosecond laser irradiation. 18 and 19, (a) in FIGS. 18 and 19 is a Raman spectrum in the laser irradiation part, (b) in FIGS. 18 and 19 is a Raman spectrum in the non-irradiation part, and (c) in FIG. 18 and FIG. 19. ) Indicates the difference between the two spectra.

図18と図19の比較から、レーザ照射後に加熱処理を行なう場合も行なわない場合も、レーザ照射部、非照射部、およびそれらの差スペクトルのいずれも、同様のスペクトル傾向を示し、化学的結合状態に殆ど変化が見られないことが確認される。   From the comparison between FIG. 18 and FIG. 19, the laser irradiation part, the non-irradiation part, and the difference spectrum thereof show the same spectral tendency both in the case where the heat treatment is performed after the laser irradiation and in the case where the heat treatment is not performed. It is confirmed that there is almost no change in the state.

一方、レーザ照射部と非照射部を比較すると、レーザ照射部では、アクリル基に由来するラマンピーク(2953,1732,1445,987,816,604cm-1)は負に対して、メチル基(2982cm-1)およびメチレン基(2913cm-1)に対応するピークは正に観測され、新たに炭素二重結合(C=C)のラマンピーク(1643cm-1)が出現した。このように、レーザ照射部では、高分子内の化学的結合状態が変化することが確認される。例えば、側鎖が切断されることによる低分子化や、主鎖が切断されることによる低分子量化などが推論される。 On the other hand, when comparing the laser irradiated portion and the non-irradiated portion, in the laser irradiated portion, the Raman peak (2953, 1732, 1445, 987, 816, 604 cm −1 ) derived from the acrylic group is negative, while the methyl group (2982 cm). -1 ) and a peak corresponding to a methylene group (2913 cm -1 ) were observed positively, and a new Raman peak (1643 cm -1 ) of a carbon double bond (C = C) appeared. Thus, it is confirmed that the chemical bonding state in the polymer changes in the laser irradiation part. For example, it is inferred that the molecular weight is reduced by cutting the side chain, or the molecular weight is reduced by cutting the main chain.

以上の、ラマン分光分析結果から、化学的な変化は殆ど見られないことから、レーザ照射後の加熱処理による屈折率差の拡大および安定化は、構造的な変化に起因するものと推論された。また、構造的な変化が非照射部と照射部で異なる理由の1つとして、照射部の高分子内の化学的結合状態が変化することに起因するものと推論された。   From the above Raman spectroscopic analysis results, almost no chemical change was observed, so it was inferred that the expansion and stabilization of the refractive index difference due to heat treatment after laser irradiation was due to structural changes. . It was also inferred that one of the reasons why the structural change is different between the non-irradiated part and the irradiated part is that the chemical bonding state in the polymer of the irradiated part changes.

(原子間力顕微鏡による位相像測定)
次に、構造的な変化としての現象を調査するために、上記ラマン分光分析と同じ試料を、原子間力顕微鏡による位相像測定を行ない、レーザ照射後の加熱有無による位相像を比較した。原子間力顕微鏡位相像の結果として、フェムト秒レーザ照射後に加熱処理を行なわないものを図20、フェムト秒レーザ照射後に70℃で5日間の加熱処理を行なったものを図21に示す。図20、図21において、図中Aはレーザ照射部、図中Bは非照射部を示す。
(Phase image measurement by atomic force microscope)
Next, in order to investigate the phenomenon as a structural change, phase images of the same sample as the Raman spectroscopic analysis were measured with an atomic force microscope, and phase images with and without heating after laser irradiation were compared. As a result of the atomic force microscope phase image, FIG. 20 shows the case where the heat treatment is not performed after the femtosecond laser irradiation, and FIG. 21 shows the case where the heat treatment is performed at 70 ° C. for 5 days after the femtosecond laser irradiation. 20 and 21, A in the figure indicates a laser irradiation part, and B in the figure indicates a non-irradiation part.

図20と図21の比較から、レーザ照射後に加熱処理がない時に比し加熱処理がある方が、レーザ照射部が細くなる傾向が確認され、レーザ照射部は加熱処理によって収縮され
る傾向があることが推論される。
20 and FIG. 21 confirms that the laser irradiation portion tends to be thinner when the heat treatment is performed after the laser irradiation than when there is no heat treatment, and the laser irradiation portion tends to shrink due to the heat treatment. It is inferred.

従って、光学高分子構造体の内部にフェムト秒レーザ照射後に加熱処理を行なうことで、照射部と非照射部の屈折率差が拡大および安定化するのは、レーザ照射部の構造的な収縮により密度が増加することが推論される。   Therefore, the heat treatment after the femtosecond laser irradiation inside the optical polymer structure increases and stabilizes the refractive index difference between the irradiated part and the non-irradiated part due to structural contraction of the laser irradiated part. It is inferred that the density increases.

また、構造的に収縮し密度が増加する1つの理由として、フェムト秒レーザ照射部の化学的結合状態が変化し、非照射部に比して体積緩和が促進されるものと推測された。   In addition, one reason for the structural shrinkage and the increase in density was presumed that the chemical bonding state of the femtosecond laser irradiated part was changed, and the volume relaxation was promoted as compared with the non-irradiated part.

今回開示された実施の形態および実施例はすべての点で例示であって制限的なものではないと考えられるべきである。本発明の範囲は上記した説明ではなくて特許請求の範囲によって示され、特許請求の範囲と均等の意味および範囲内でのすべての変更が含まれることが意図される。   It should be understood that the embodiments and examples disclosed herein are illustrative and non-restrictive in every respect. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

たとえば、回折効率の高い光学素子、または曲率半径が小さいときの伝播損失が小さい光導波路を有する光学素子を提供することができる。   For example, an optical element having a high diffraction efficiency or an optical element having an optical waveguide with a small propagation loss when the radius of curvature is small can be provided.

実施例1における1次回折効率の経日変化を示す図である。It is a figure which shows the time-dependent change of the 1st-order diffraction efficiency in Example 1. FIG. 実施例2における1次回折効率の経日変化を示す図である。It is a figure which shows the time-dependent change of the 1st order diffraction efficiency in Example 2. FIG. 実施例3における1次回折効率の経時変化を示す図である。FIG. 6 is a graph showing a change with time in first-order diffraction efficiency in Example 3. 実施例4における7日間経過後の1次回折効率とレーザ照射部の可視光線透過率を示す図である。It is a figure which shows the 1st-order diffraction efficiency after 7-day progress in Example 4, and the visible ray transmittance of a laser irradiation part. 実施例5における1次回折効率の経日変化を示す図である。It is a figure which shows the daily change of the 1st-order diffraction efficiency in Example 5. FIG. 実施例6においてフェムト秒レーザ照射後に、25℃(室温)で7日間経過後、さらに各温度雰囲気に曝した後の1次回折効率を示す図である。In Example 6, it is a figure which shows the 1st-order diffraction efficiency after exposure to each temperature atmosphere after progress for 7 days at 25 degreeC (room temperature) after femtosecond laser irradiation. 実施例6においてフェムト秒レーザ照射後に、70℃で7日間経過後、さらに各温度雰囲気に曝した後の1次回折効率を示す図である。In Example 6, it is a figure which shows the 1st-order diffraction efficiency after exposure to each temperature atmosphere after progress for 7 days at 70 degreeC after femtosecond laser irradiation. 実施例6においてフェムト秒レーザ照射後に、100℃で7日間経過後、さらに各温度雰囲気に曝した後の1次回折効率を示す図である。In Example 6, it is a figure which shows the 1st-order diffraction efficiency after exposure to each temperature atmosphere after progress for 7 days at 100 degreeC after femtosecond laser irradiation. 実施例7においてフェムト秒レーザ照射後に、25℃(室温)で10日間経過後、さらに各温度雰囲気に曝した後の1次回折効率を示す図である。It is a figure which shows the 1st-order diffraction efficiency after exposure to each temperature atmosphere after progress for 10 days at 25 degreeC (room temperature) after femtosecond laser irradiation in Example 7. FIG. 実施例7においてフェムト秒レーザ照射後に、70℃で10日間経過後、さらに各温度雰囲気に曝した後の1次回折効率を示す図である。It is a figure which shows the 1st-order diffraction efficiency after exposing to each temperature atmosphere after progress for 10 days at 70 degreeC after femtosecond laser irradiation in Example 7. FIG. 実施例7においてフェムト秒レーザ照射後に、130℃で10日間経過後、さらに各温度雰囲気に曝した後の1次回折効率を示す図である。It is a figure which shows the 1st-order diffraction efficiency after exposing to each temperature atmosphere after progress for 10 days at 130 degreeC after femtosecond laser irradiation in Example 7. FIG. 実施例8においてフェムト秒レーザ照射後に、25℃(室温)で10日間経過後、さらに各温度雰囲気に曝した後の1次回折効率を示す図である。It is a figure which shows the 1st-order diffraction efficiency after exposing to each temperature atmosphere after progress for 10 days at 25 degreeC (room temperature) after femtosecond laser irradiation in Example 8. FIG. 実施例8においてフェムト秒レーザ照射後に、70℃で10日間経過後、さらに各温度雰囲気に曝した後の1次回折効率を示す図である。It is a figure which shows the 1st-order diffraction efficiency after exposing to each temperature atmosphere after progress for 10 days at 70 degreeC after femtosecond laser irradiation in Example 8. FIG. 実施例8においてフェムト秒レーザ照射後に、100℃で10日間経過後、さらに各温度雰囲気に曝した後の1次回折効率を示す図である。It is a figure which shows the 1st-order diffraction efficiency after exposing to each temperature atmosphere after progress for 10 days at 100 degreeC after femtosecond laser irradiation in Example 8. FIG. 実施例9においてフェムト秒レーザ照射後に、25℃(室温)で8日間経過後、さらに各温度雰囲気に曝した後の1次回折効率を示す図である。In Example 9, it is a figure which shows the 1st-order diffraction efficiency after exposure to each temperature atmosphere after progress for 8 days at 25 degreeC (room temperature) after femtosecond laser irradiation. 実施例9においてフェムト秒レーザ照射後に、70℃で8日間経過後、さらに各温度雰囲気に曝した後の1次回折効率を示す図である。In Example 9, it is a figure which shows the 1st-order diffraction efficiency after exposing to each temperature atmosphere after progress for 8 days at 70 degreeC after femtosecond laser irradiation. 実施例9においてフェムト秒レーザ照射後に、100℃で8日間経過後、さらに各温度雰囲気に曝した後の1次回折効率を示す図である。In Example 9, it is a figure which shows the 1st-order diffraction efficiency after exposure to each temperature atmosphere after progress for 8 days at 100 degreeC after femtosecond laser irradiation. 実施例1の条件においてフェムト秒レーザ照射後に、加熱処理を行なわない場合のラマン分光分析を行った結果を示すスペクトルであり、(a)はレーザ照射部におけるラマンスペクトル、(b)は非照射部におけるラマンスペクトル、(c)は両スペクトルの差分スペクトルである。It is a spectrum which shows the result of having conducted the Raman spectroscopic analysis in the case of not performing heat processing after femtosecond laser irradiation on the conditions of Example 1, (a) is a Raman spectrum in a laser irradiation part, (b) is a non-irradiation part. (C) is the difference spectrum of both spectra. 実施例1におけるフェムト秒レーザ照射後に、70℃で5日間の加熱を行った場合のラマン分光分析を行った結果を示すスペクトルであり、(a)はレーザ照射部におけるラマンスペクトル、(b)は非照射部におけるラマンスペクトル、(c)は両スペクトルの差分スペクトルである。It is a spectrum which shows the result of having performed the Raman spectroscopic analysis at the time of heating for 5 days at 70 degreeC after the femtosecond laser irradiation in Example 1, (a) is a Raman spectrum in a laser irradiation part, (b) is The Raman spectrum in the non-irradiated part, (c) is the difference spectrum of both spectra. 実施例1におけるフェムト秒レーザ照射後に、加熱処理を行なわない場合の原子間力顕微鏡による位相像を示す図である。2 is a diagram showing a phase image by an atomic force microscope when heat treatment is not performed after femtosecond laser irradiation in Example 1. FIG. 実施例1におけるフェムト秒レーザ照射後に、70℃で5日間の加熱を行った場合の原子間力顕微鏡による位相像を示す図である。It is a figure which shows the phase image by an atomic force microscope at the time of heating for 5 days at 70 degreeC after the femtosecond laser irradiation in Example 1. FIG.

Claims (12)

パルス幅が10-15秒〜10-11秒のフェムト秒レーザを光学高分子構造体の内部に照射することにより、照射部の屈折率を変化させるレーザ照射工程と、
前記レーザ照射後の前記光学高分子構造体に加熱を行なう加熱工程とを含み、
前記加熱工程は、加熱温度を絶対温度でTとし、光学高分子構造体を構成する材料のガラス転移点の絶対温度をTgとするとき、0.8≦T/Tg≦1.13の条件で加熱する光学素子の製造方法。
A laser irradiation step of changing the refractive index of the irradiated portion by irradiating the inside of the optical polymer structure with a femtosecond laser having a pulse width of 10 -15 seconds to 10 -11 seconds;
A heating step of heating the optical polymer structure after the laser irradiation ,
The heating step, and T the heating temperature in absolute temperature, when the absolute temperature of the glass transition point of the material constituting the optical polymeric structure and T g, of 0.8 ≦ T / T g ≦ 1.13 The manufacturing method of the optical element heated on condition.
前記加熱工程における加熱は、30秒間以上である請求項1に記載の光学素子の製造方法。   The method of manufacturing an optical element according to claim 1, wherein the heating in the heating step is 30 seconds or more. 前記加熱工程における加熱は、24時間以上である請求項1に記載の光学素子の製造方法。The method for manufacturing an optical element according to claim 1, wherein the heating in the heating step is 24 hours or more. 前記加熱温度Tは、所定時間の加熱において、照射部と非照射部との屈折率の差が最大となる温度の絶対温度の±10K以内、前記屈折率の差が飽和する時間が最短である温度の絶対温度の±10K以内、および前記屈折率の差が極大となる時間が最短である温度の絶対温度の±10K以内のいずれかの温度である請求項1〜3のいずれかに記載の光学素子の製造方法。 The heating temperature T is within ± 10K of the absolute temperature of the temperature at which the difference in refractive index between the irradiated part and the non-irradiated part becomes maximum in heating for a predetermined time, and the time for which the difference in refractive index is saturated is the shortest. within ± 10K of absolute temperature, and the time difference in the refractive index is maximized is described in any one of claims 1 to 3 temperature is any temperature absolute temperature of ± 10K within in the shortest A method for manufacturing an optical element. 前記所定時間は168時間である請求項4に記載の光学素子の製造方法。The method of manufacturing an optical element according to claim 4, wherein the predetermined time is 168 hours. 前記加熱温度Tは、0.8≦343/Tg≦1.13の範囲にある場合に、343≦Tとする請求項1〜のいずれかに記載の光学素子の製造方法。 The heating temperature T is 0 . When in the range of 8 ≦ 343 / T g ≦ 1.13 , method of manufacturing an optical element according to any one of claims 1 to 5, 343 ≦ T. 前記加熱温度Tは、0.8≦373/TThe heating temperature T is 0.8 ≦ 373 / T. gg ≦1.13の範囲にある場合に、373≦Tとする請求項1〜5のいずれかに記載の光学素子の製造方法。The method for manufacturing an optical element according to claim 1, wherein 373 ≦ T is satisfied in the range of ≦ 1.13. 前記光学高分子構造体を構成する材料は、ポリメチルメタクリレート、ポリカーボネート、およびシクロオレフィンポリマーからなる群より選択される少なくとも1種である請求項1〜のいずれかに記載の光学素子の製造方法。 The material constituting the optical polymer structures, polymethyl methacrylate, polycarbonate, and method of manufacturing an optical element according to any one of claims 1 to 7 at least one selected from the group consisting of a cycloolefin polymer . 前記光学高分子構造体は、母材と添加材とを含む混合物からなり、
前記母材が、ポリメチルメタクリレートであり、
前記添加材が、つぎの式(1)に示す構造を有するジアリールエテンであり、
前記母材に対する前記添加材の混合比率が3質量%以上である請求項1〜のいずれかに記載の光学素子の製造方法。
(式(1)において、R1とR4とは、脂肪族炭化水素基、ヒドロキシ基、ニトロ基、アミノ基またはメルカプト基である。R2、R3、R5およびR6は、水素、アミノ基、脂肪族炭化水素基、芳香族炭化水素基、および芳香族複素環基からなる群より選択される置換基、またはR2とR3、およびR5とR6とは、芳香族炭化水素または芳香族複素環を構成してもよい。XとYとは、硫黄、窒素または酸素であり、環Zは脂環式炭化水素、芳香族炭化水素または芳香族複素環からなる構造を有する。)
The optical polymer structure is composed of a mixture containing a base material and an additive,
The base material is polymethylmethacrylate;
The additive is a diarylethene having a structure represented by the following formula (1):
The method for manufacturing an optical element according to any one of claims 1-8 mixing ratio of the additive material relative to the base material is 3% by mass or more.
(In the formula (1), R 1 and R 4 are an aliphatic hydrocarbon group, a hydroxy group, a nitro group, an amino group or a mercapto group. R 2 , R 3 , R 5 and R 6 are hydrogen, A substituent selected from the group consisting of an amino group, an aliphatic hydrocarbon group, an aromatic hydrocarbon group, and an aromatic heterocyclic group, or R 2 and R 3 , and R 5 and R 6 are aromatic carbonized It may constitute hydrogen or an aromatic heterocyclic ring, X and Y are sulfur, nitrogen or oxygen, and ring Z has a structure consisting of alicyclic hydrocarbon, aromatic hydrocarbon or aromatic heterocyclic ring .)
請求項1〜のいずれかに記載の光学素子の製造方法により製造した光学素子であって、照射部と非照射部との屈折率の差が0.0002以上である光学素子。 An optical element manufactured by the manufacturing method of an optical element according to any one of claims 1 to 9 optical element refractive index difference between the irradiated portion and the non-irradiated portion is 0.0002 or more. 請求項1〜のいずれかに記載の光学素子の製造方法により製造した光学素子であって、照射部と非照射部との屈折率の差の加熱温度T以下での温度変化に対する安定性が、±30%以下である光学素子。 An optical element manufactured by the method for manufacturing an optical element according to any one of claims 1 to 9 , wherein a difference in refractive index between an irradiated part and a non-irradiated part is stable against a temperature change at a heating temperature T or less. An optical element that is ± 30% or less. 前記照射部は、照射部の厚さ0.3mmにおける使用波長の光線の透過率が80%以上である請求項10または11に記載の光学素子。 The optical element according to claim 10 or 11 , wherein the irradiating unit has a light transmittance of a working wavelength at a thickness of 0.3 mm of the irradiating unit of 80% or more.
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