JP5347138B2 - Photodisinfection device and ultraviolet X-ray generator - Google Patents

Description

  The present invention relates to a light sterilizer and an ultraviolet X-ray generator capable of simultaneously generating ultraviolet rays and X-rays.

  Ultraviolet generators are conventionally known. Low-pressure mercury lamps are frequently used as ultraviolet ray generators, but those that generate ultraviolet rays by colliding electrons with ultraviolet light emitting materials are also provided (see Patent Document 1). FIG. 7 is a diagram showing an ultraviolet light source described in Patent Document 1. As shown in FIG. The ultraviolet light source includes a translucent anode substrate 6, a counter substrate 7 facing the anode substrate 6 at a predetermined interval, and a frame-shaped side plate 8 provided on an outer peripheral portion between the anode substrate 6 and the counter substrate 7. And have. A phosphor layer 3b that emits ultraviolet light is formed on the inner surface of the anode substrate 6, and a metal back layer 3c is formed so as to cover the phosphor layer 3b. A linear cathode 5 that emits electrons is stretched, and an acceleration control electrode 4 is provided. The phosphor layer 3b emits light by causing the electrons emitted from the linear cathode 5 to be accelerated and controlled by the acceleration control electrode 4 and projecting onto the phosphor layer 3b. In addition, a photo sterilizer using such an ultraviolet ray generator is known. As the photo sterilizer, in addition to a single wavelength band photo sterilizer using ultraviolet rays, a photo sterilizer using gamma (γ) rays or a photo sterilizer using X (X) rays are known. It has been.

JP 2002-033080 A

  In the light sterilization device of a single wavelength band, when trying to sterilize many types of bacteria, the light intensity must be increased, the device becomes larger, the device price becomes expensive, and the power consumption of the device is large. It was a thing. The present invention provides an optical sterilization device that solves the above-described problems and has a sufficient sterilization effect even when the light intensity is weaker, reduces the size of the device, and saves power consumption of the device. To do. Moreover, the ultraviolet-ray X-ray generator which generate | occur | produces the ultraviolet-ray and an X-ray suitable for using for such a photosterilizer is provided.

  An ultraviolet X-ray generator according to the present invention includes an outer enclosure part that forms a vacuum sealed space surrounded by an anode substrate, a counter substrate, and a side plate, and an electron emission disposed in the outer enclosure part And an ultraviolet X-ray emitting part that is disposed on the sealed space side of the anode substrate and collides with electrons emitted from the electron emitting part to generate ultraviolet rays and X-rays, and the ultraviolet X-ray emitting part Is formed by placing an anode facing the electron emitting portion, and placing a target material between the anode and the anode substrate, and the accelerated electrons collide with the target material to cause ultraviolet rays and X-rays. A voltage is applied between the anode and the electron-emitting portion so as to operate in the ultraviolet X-ray range for generating the X-ray, and the anode substrate transmits the X-ray and the ultraviolet light. It is formed in that material.

  An optical sterilization apparatus according to the present invention includes an outer enclosure portion that forms a vacuum sealed space surrounded by an anode substrate, a counter substrate, and a side plate, and an electron emission portion that is disposed inside the outer enclosure portion. And an ultraviolet X-ray emitting portion that is disposed on the sealed space side of the anode substrate and that generates electrons and X-rays by colliding electrons emitted from the electron emitting portion, the ultraviolet X-ray emitting portion An anode is disposed facing the electron emission portion, a target material is disposed between the anode and the anode substrate, and the accelerated electrons collide with the target material to generate ultraviolet rays and X-rays. A voltage is applied between the anode and the electron emission portion so as to operate in a range of ultraviolet X-rays that generates UV, and the anode substrate is formed of a member that transmits the X-rays and the ultraviolet rays. It is.

  In the light sterilization apparatus and the ultraviolet ray X-ray generator of the present invention, the ultraviolet ray X-ray radiating unit has a target material that emits ultraviolet rays and X-rays by colliding electrons having kinetic energy equal to or higher than a predetermined value. Can be generated at the same time, and even if the light intensity is weaker, it has a sufficient sterilizing effect, the device can be miniaturized, and the power consumption of the device can be reduced.

It is a figure which shows the required light quantity required for sterilization in the case of using the light of a single wavelength band. It is a figure which shows the principle of sterilization of embodiment. It is a figure which shows the ultraviolet X-ray generator of embodiment which generates an ultraviolet-ray and an X-ray simultaneously. It is a figure which shows the content of the knowledge which inventors obtained. It is a figure which shows the X-ray dose generate | occur | produced by the difference in target material. It is a figure which shows the difference in the transmittance | permeability of an X-ray by the material of an anode substrate. It is a figure which shows the ultraviolet light source shown in background art.

  The photo sterilization device and the ultraviolet X-ray generation device according to the embodiment include an outer enclosure body that forms a vacuum sealed space surrounded by an anode substrate, a counter substrate, and a side plate, an electron emission portion, and an electron emission portion. An ultraviolet ray X-ray radiating unit that collides the emitted electrons to generate ultraviolet rays and X-rays. The ultraviolet X-ray emission part is formed by arranging an anode facing the electron emission part, a target material is arranged between the anode and the anode substrate, and the accelerated electrons collide with the target material to generate ultraviolet rays and X-rays. A voltage is applied between the anode and the electron emission portion so as to operate in the ultraviolet X-ray range that generates The anode substrate is formed of a member that transmits X-rays and ultraviolet rays.

"Principles of light sterilization"
(Light intensity in a single wavelength band required for light sterilization)
FIG. 1 is a diagram illustrating a necessary light amount necessary for sterilization when light of a single wavelength band is used. FIG. 1 shows ultraviolet rays, gamma rays, and X-rays as light in a single wavelength band. The necessary light amount means a light amount capable of sterilizing 99.99% of the bacteria. Gamma rays and X-rays have the same wavelength band, but are usually distinguished by the generation principle. In the following description, X-ray terms are used as representatives of gamma rays and X-rays. In the following, according to commonly used terms, the amount of X-ray light is referred to as X-ray dose, and the amount of ultraviolet light is referred to as ultraviolet light amount. The vertical axis in FIG. 1 indicates the X-ray dose, and the unit is kGy (kilo gray). The horizontal axis of FIG. 1 indicates the amount of ultraviolet light, and the unit is mW / cm ² (milliwatt / square centimeter).

If attention is paid to the horizontal axis in FIG. 1, for example, when only ultraviolet rays having a wavelength of 254 nm from a mercury lamp are irradiated, for example, Staphylococcus aureus, adenovirus, Escherichia coli, Bacillus subtilis (spore), black mold (spore) ), In order, a stronger light quantity (large light quantity) of ultraviolet rays is required to achieve the purpose of sterilization. And all the above-mentioned microbes are sterilized by the light quantity of 900 mW / cm < ² > vicinity (refer the line | wire of only the ultraviolet-ray (B) of FIG. 1).

  Focusing on the vertical axis in FIG. 1, when only X-rays are irradiated, the purpose of sterilization is, for example, in the order of E. coli, black mold (spore), Staphylococcus aureus, Bacillus subtilis (spore), and adenovirus. A higher dose (greater dose) of x-rays is needed to reach. And all the above-mentioned microbes are sterilized by the dose of 50 kGy vicinity (refer the line of (A) only of the X-ray of FIG. 1).

  As described above, according to FIG. 1, it is found that there are bacteria that are easily sterilized by ultraviolet rays and bacteria that are easily sterilized by X-rays. This is because the sterilization mechanism using X-rays is different from the sterilization mechanism using ultraviolet rays.

  The sterilization mechanism recognized by the inventors (hereinafter abbreviated as the inventors) described in the application for this patent application will be briefly described. DNA damage caused by ionizing radiation such as X-ray includes single-strand break, double-strand break, base damage, base release, and cross-link formation. On the other hand, in the case of ultraviolet rays, ionization does not occur and only excitation occurs to form a pyrimidine dimer or the like. Thus, the reaction mechanism for DNA differs between ultraviolet rays and X-rays. Moreover, the transmission characteristics of substances differ between ultraviolet rays and X-rays. That is, X-rays penetrate deeper than ultraviolet rays. In this way, the inventors think that the reaction mechanism for DNA differs between ultraviolet rays and X-rays, and further, the permeation characteristics of substances differ as described above, which may be the difference in the bactericidal effect against each bacterium. ing.

(Principle of sterilization of embodiment)
FIG. 2 is a diagram illustrating the principle of sterilization according to the embodiment. As shown in Figure 2, using both ultraviolet rays and X-rays, germs that are efficient when sterilized with ultraviolet rays (bacteria that can be sterilized with a smaller amount of light than other bacteria) are sterilized by irradiating them with ultraviolet rays. The principle of the embodiment is to sterilize by irradiating X-rays for bacteria that are efficient when sterilized with X-rays (bacteria that can be sterilized with a dose smaller than other bacteria). 2 indicates the dose when only X-rays are used, and the broken line (B) in FIG. 2 indicates the amount of light when only ultraviolet rays are used (see FIG. 1). As can be seen from the lines (A ′) and (B ′) in FIG. 2, the X-ray dose is, for example, around ² kGy and the amount of ultraviolet light is, for example, around 200 mw / cm ² , which is efficient as shown in FIG. Can kill the same type of bacteria. As shown in Fig. 2, the X-ray dose required for sterilization is reduced from about 50 kGy to about 2 kGy and about 1/25, and the amount of UV light required for sterilization is about 900 mW / cm ² to 200 mw. It is reduced to around 1 / 4.5 near / cm ² .

  Here, the ratio of the X-ray dose and the ultraviolet light amount can be determined as appropriate. In the example shown in line (A ′) and line (B ′) in FIG. 2, as shown in FIG. 4 (described later), hBN is used as the phosphor, and the thickness of the quartz anode substrate is 100 μm (micrometer). This corresponds to the case where the anode voltage is 20 kV (kilovolts) and irradiation is performed for 100 seconds. Although not shown in FIG. 4, the value of the UV intensity at an anode voltage of 20 kV when the thickness of the quartz anode substrate is 100 μm is not significantly different from the case of 500 μm and 1 mm (millimeter).

  In FIG. 2, the upper left area surrounded by the right vertical axis, the broken line (A), the line (A ′), and the line (B ′) is an area where ultraviolet rays are sterilized (ultraviolet sterilization area). The lower right region surrounded by B), the line (A ′) and the line (B ′) is a region where the sterilization is performed with X-rays (X-ray sterilization area), and the right vertical axis, horizontal axis and line (A ′ ) And the line (B ′) is a lower left region where ultraviolet rays and X-rays are sterilized (ultraviolet / X-ray sterilization area).

  At the same time, instead of generating ultraviolet rays and X-rays, ultraviolet rays and X-rays are sequentially generated using conventional techniques, sterilized with ultraviolet rays and then sterilized with X-rays, or sterilized with X-rays and then ultraviolet rays. Any of the sterilization methods of sterilizing with can also be employed. However, in this sequential sterilization method, two types of devices, an X-ray generator and an ultraviolet ray generator, must be used, and there are limits to downsizing, cost reduction, rapid sterilization, and power saving. . In the sterilization apparatus of the embodiment, an ultraviolet X-ray generator that can generate both ultraviolet rays and X-rays at the same time is used, thereby sterilizing. Thus, in the sterilization apparatus of the embodiment, downsizing, cost reduction, quick sterilization, and power saving of the apparatus are achieved.

"Sterilization apparatus and ultraviolet X-ray generator of embodiment"
FIG. 3 is a diagram illustrating an ultraviolet X-ray generator that simultaneously generates ultraviolet rays and X-rays according to the embodiment. In the ultraviolet X-ray generator 1 shown in FIG. 3, the anode substrate 20 and one end surface of the side plate 22 are fixed with frit glass, and the counter substrate 21 and the other end surface of the side plate 22 are fixed with frit glass. . The side plate 22 functions as a pillar material that allows the anode substrate 20 and the counter substrate 21 to withstand atmospheric pressure and maintain a predetermined interval. A sealed space 18 is formed in an internal region formed by being surrounded by the anode substrate 20, the counter substrate 21, and the side plate 22. The sealed space 18 is kept in a high vacuum state.

  The anode substrate 20 is formed of a material that transmits both ultraviolet rays and X-rays, and the thickness in the transmission direction is sufficiently thin so as to reduce the attenuation amount of ultraviolet rays and X-rays and to improve the transmission characteristics. In addition, it has a thickness that does not greatly deform due to atmospheric pressure.

  As described above, the anode substrate 20, the counter substrate 21, and the side plate 22 constitute an outer enclosure.

  Inside the sealed space 18 are the filament 10, the back electrode 11 disposed between the filament 10 and the counter substrate 21, the control electrode 12 disposed on the opposite side of the counter substrate 21 across the filament 10, and the control electrode 12. A shield electrode 13 disposed on the opposite side of the filament 10 with the sandwiching therebetween is disposed. The shield electrode 13 is disposed so as to face an anode 14 described later disposed on the anode substrate 20.

  3 is connected to each of the filament 10, the back electrode 11, the control electrode 12, the shield electrode 13, and an anode (metal back) 14, which will be described later, while maintaining a sealed state, It is drawn from the inside to the outside of the outer enclosure. A predetermined voltage is applied to each electrode by each of these conductive lines.

  The filament 10 is formed in a linear shape extending in the front and back direction of the paper surface of FIG. 3, and the surface is coated with, for example, oxides of Ba, Sr, and Ca as electron emitting materials. It functions as a cathode that emits thermionic electrons by passing an electric current through the filament 10 to raise the temperature of the electron-emitting material.

  The back electrode 11 is a plate-like electrode to which a voltage is applied to the filament 10 so that the thermoelectrons are directed toward the control electrode 12 or for the purpose of electron diffusion.

  The control electrode 12 accelerates the electrons generated in the filament 10 and causes the electrons to travel to the shield electrode 13 side, or confines the electrons between the control electrode 12 and the filament 10 and prevents the electrons from traveling to the shield electrode 13 side. It is an electrode for controlling whether or not. The control electrode 12 is formed as a conductor mesh having a linear mesh extending in the same direction as the filament 10 or an opening extending linearly in the same direction as the filament 10.

  The shield electrode 13 further accelerates the electrons accelerated by the control electrode 12 and travels to the anode 14 side. The shield electrode 13 is formed as a conductor plate having a linear mesh extending in the same direction as the filament 10 or a linear opening extending in the same direction as the filament 10.

  The filament 10, the back electrode 11, the control electrode 12, and the shield electrode 13 constitute an electron emission portion that emits electrons. The thick white arrows in FIG. 3 indicate the emission direction of electrons generated in the electron emission portion.

  A target material 15 that generates ultraviolet rays and X-rays by collision of electrons is disposed on the surface of the anode substrate 20 that is a part of the outer enclosure portion on the side of the sealed space 18, and the side of the target material 15 that faces the electron emission portion. The anode 14 is disposed on the surface.

  The target material 15 and the anode 14 constitute an ultraviolet X-ray emission part. As described above, the ultraviolet X-ray emission part is formed by disposing the anode 14 facing the electron emission part, and disposing the target material 15 between the anode 14 and the anode substrate 20. Here, the anode substrate 20 is a member constituting the outer enclosure body portion, and a member capable of arranging an ultraviolet X-ray radiation portion on the sealed space side of the anode substrate 20.

  The anode 14 is made of a conductive material and is formed into a foil shape that is thin enough to transmit electrons or a porous shape that has many fine holes so that electrons can be transmitted. An anode voltage which is a voltage of 15 kV (kilovolts) or more is applied to the anode 14 with respect to the filament 10. Depending on the anode voltage applied to the anode 14, the velocity of the electrons at the anode 14, that is, the magnitude of the kinetic energy of the electrons colliding with the anode 14 is different. The higher the anode voltage, the more the electrons are accelerated and the magnitude of the kinetic energy of the electrons increases. When the kinetic energy exceeds a certain value, the electrons pass through the anode 14 and collide with the target material 15.

(Features of the embodiment)
In the ultraviolet X-ray generator of the embodiment, a specific target material 15 having the property of generating ultraviolet rays and X-rays is used, the magnitude of the anode voltage applied to the anode 14, and the material and thickness of the light transmission surface of the anode substrate 20. Is appropriately determined to generate both ultraviolet rays and X-rays. Furthermore, in the optical sterilization apparatus of the embodiment, the generation ratio of ultraviolet rays and X-rays is appropriately determined according to the properties of the bacteria to be sterilized. The features of the above-described embodiment will be specifically described by the following examples.

  An embodiment of the ultraviolet X-ray generator will be described with reference to FIGS. 4, 5, and 6 together with FIG. In the ultraviolet X-ray generator 1 of the embodiment (see FIG. 3), as shown in FIG. 3, the anode substrate 20 separates the sealed space 18 from the external space where the sterilization object is placed. Ultraviolet rays and X-rays pass through the anode substrate 20 and are irradiated to the sterilization object placed at a predetermined distance from the surface of the anode substrate 20 on the external space side.

(Target material)
The inventors used zinc aluminate (ZnAl ₂ O ₄ ), hexagonal boron nitride (hBN), aluminum nitride (AlN), and calcium pyrophosphate (Ca ₂ P ₂ O ₇ : Pr) as the target material 15 for ultraviolet rays. And X-rays can be obtained at the same time as a new finding that has not been known so far. That is, it has been known that electrons collide with ZnAl ₂ O ₄ , hBN, AlN, and Ca ₂ P ₂ O ₇ : Pr to generate ultraviolet rays. However, the phenomenon of generating X-rays by causing electrons to collide with ZnAl ₂ O ₄ , hBN, AlN, and Ca ₂ P ₂ O ₇ : Pr has not been known before it was revealed by the inventors.

  FIG. 4 is a diagram illustrating an example of the content of knowledge obtained by the inventors. The vertical axis of the graph shown in FIG. 4 indicates the ultraviolet intensity (mw / cm 2 · sec) and the X-ray (X-ray) intensity (kGy / s) at a point 10 mm away from the surface of the anode substrate 20 on the outer space side. The horizontal axis indicates the anode voltage (kV). In the apparatus having the structure shown in FIG. 3, the inventors changed the magnitude of the anode voltage applied to the anode 14, collided electrons with hBN as the target material 15, and used quartz as the material of the anode substrate 20. The relationship between the type of light emitted and the amount of light emitted was measured.

  A conventionally known range (hereinafter referred to as an ultraviolet range and indicated by an arrow on the left side of the graph in FIG. 4) is a range in which the anode voltage is less than 10 kV, and only ultraviolet rays are generated in this range. The graph shown by the solid line in FIG. 4 is the ultraviolet intensity. When the anode voltage is in the range of 5 kV to 10 kV, the amount of ultraviolet light increases greatly as the anode voltage is increased. In the range where the anode voltage is 10 kV or more, the amount of increase in the amount of ultraviolet light does not increase greatly according to the anode voltage. Therefore, conventionally, the maximum value of the anode voltage has been set to about 10 kV that does not go out of the ultraviolet range described above.

  The inventors say that the anode voltage is further increased from 10 kV, and in the range where the anode voltage is 15 kV or more (hereinafter referred to as the ultraviolet X-ray range, indicated by the arrow on the right side of the graph of FIG. 4), X-rays are generated along with ultraviolet rays. We observed a phenomenon that was not known before. The graph shown by the broken line in FIG. 4 is the X-ray dose. Although FIG. 4 shows up to 20 kV, it has been observed that the ultraviolet X-ray range, which is the range in which both ultraviolet rays and X-rays are generated, extends even at 20 kV or higher.

The parameters and materials of each component shown in FIG. 3 used for obtaining the graph shown in FIG. 4 are shown below. The target material 15 is hBN, the area of the target material irradiated with electrons is 2 cm ² , and the anode current at an anode voltage of 10 kV is 200 μA. The material of the anode substrate 20 is quartz. X-ray dosimetry was performed using an Aroka survey meter.

  The line (1) in FIG. 4 shows the ultraviolet intensity when the thickness of the quartz anode substrate 20 is 500 μm, and the line (2) in FIG. 4 shows that the thickness of the quartz anode substrate 20 is 1 mm (millimeter). The ultraviolet intensity in the case is shown.

  The lines (3), (4), (5), and (6) in FIG. 4 indicate the X-ray intensity. Line (3) shows the case where the thickness of the quartz anode substrate 20 is 100 μm, line (4) shows the case where the thickness of the quartz anode substrate 20 is 300 μm, and line (5) shows the case of quartz. The case where the thickness of the anode substrate 20 is 500 μm is shown, and the line (6) shows the case where the thickness of the quartz anode substrate 20 is 1 mm.

  When the ultraviolet X-ray generator of the example was used as a sterilizer, the distance (L) from the surface of the anode substrate 20 on the external space side to the surface to be sterilized (bacteria) applied was 10 mm. The values of the ultraviolet intensity (mw / cm 2 · sec) and the X-ray (X-ray) intensity (kGy / s) on the vertical axis shown in FIG. 4 are values at a location where the distance from the anode substrate 20 is 10 mm away.

  The contents shown in FIG. 4 will be described in detail. Regarding the ultraviolet intensity indicated by the lines (1) and (2) in FIG. 4, the thickness of the quartz anode substrate 20 is not significantly different between 500 μm and 1 mm. Further, when the anode voltage is in the range of 10 kV to 20 kV, there is no significant change in the ultraviolet intensity compared to the range of the anode voltage from 5 kV to 10 kV.

  Regarding the X-ray intensity shown in the lines (3), (4), (5), and (6) of FIG. 4, the X-ray intensity is in the order of 100 μm, 300 μm, 500 μm, and 1 mm in the thickness of the quartz anode substrate 20. Are very different. That is, the X-ray intensity decreases as the thickness of the anode substrate 20 increases. In addition, the intensity of the X-ray generated when the anode voltage exceeds 15 kV varies greatly when the anode voltage is in the range of 15 kV to 20 kV. Although not shown, the X-ray intensity increases according to the anode voltage even when the anode voltage is 20 kV or more. Therefore, in the ultraviolet X-ray range in which the anode voltage exceeds 15 kV, the ratio between the X-ray intensity and the ultraviolet intensity can be increased as the anode voltage is increased. In the example, the range was set to 20 kV from the viewpoint of the lifetime, thermal design, and power consumption of the ultraviolet X-ray generator 1.

(Difference in X-ray dose depending on target material)
FIG. 5 is a diagram showing the X-ray dose generated depending on the target material. The vertical axis represents the X-ray dose, and the unit is μGy / h. The horizontal axis is the anode voltage, and the unit is kV (kilovolt). The measured target materials are ZnAl ₂ O ₄ indicated by line (1) in FIG. 5, AlN indicated by line (2), and hBN indicated by line (3).

(Anode substrate transmittance)
FIG. 6 is a diagram showing the difference in X-ray transmittance depending on the material of the anode substrate 20. The vertical axis in FIG. 6 indicates the transmittance. The horizontal axis in FIG. 6 is energy, and the unit is keV (kiloelectron volts). The anode substrate 20 is made of 1.0 mm thick yttrium aluminum garnet (YAG) shown by line (1) in FIG. 6, 1.8 mm thick quartz shown by line (2), and 1.0 mm thick shown by line (3). Sapphire, 1.0 mm thick quartz indicated by line (4).

`` Modification of embodiment ''
(Modification of electron emission part)
The structure of the electron emission portion is not limited to the embodiment. For example, the electron emission part may be one using only the filament and the control electrode in addition to the one using the filament, the control electrode and the shield electrode. Further, the electron emission portion may not only generate electrons based on the principle of thermal electron emission using a filament, but also generate electrons based on the principle of high field electron emission. As an electron emission part that emits high electric field electrons, a field emission device (FED) or an electron emission part using carbon nanotubes (CNT), which are well-known techniques, can be used.

(Modification of anode substrate)
Regarding the thicknesses of the yttrium, aluminum, garnet, quartz, sapphire, and quartz anode substrates described above, it is known that the thinner the thickness, the better the transmittance of ultraviolet rays and X-rays. In selecting the anode substrate, it is possible to appropriately select the material of the anode substrate and its thickness in consideration of the relationship between strength and transmittance. In addition, the above-described material having a reduced thickness is used only for the portion of the anode substrate that transmits ultraviolet rays and X-rays, and the portion of the anode substrate that does not need to transmit ultraviolet rays and X-rays is increased in thickness or has high rigidity. By using this material, the anode substrate as a whole can have sufficient rigidity to withstand atmospheric pressure.

(Modification of UV X-ray emission part)
The target material of the ultraviolet X-ray emission part and the anode substrate can be variously combined with the parts of the various embodiments described above. For example, one of ZnAl ₂ O ₄ , hBN, AlN, and Ca ₂ P ₂ O ₇ : Pr can be used as the target material. As the anode substrate, any one of yttrium, aluminum, garnet, quartz, sapphire, and quartz can be used.

(About anode voltage)
The anode voltage (lower limit value) applied to the anode in the ultraviolet X-ray generator in the example is 15 kV or more, but the anode voltage value exceeds a predetermined value that exceeds the ultraviolet range and becomes the ultraviolet X-ray range. Any device that generates electron kinetic energy may be used. When each part has a structure different from that of the embodiment, the lower limit value of the anode voltage may be a voltage that gives the minimum electron kinetic energy necessary for operating the target material in the ultraviolet X-ray range. The upper limit value of the anode voltage is naturally limited by the life of the ultraviolet X-ray generator, the thermal design, and the power consumption. Needless to say, when the ultraviolet ray X-ray generator is used as a sterilizer, the upper limit value may be a voltage sufficient to obtain a sterilizing effect.

  1, 2 UV X-ray generator, 10 filament, 11 back electrode, 12 control electrode, 13 shield electrode, 14 anode, 15 target material, 18 sealed space, 19 conductive wire, 20 anode substrate, 21 counter substrate, 22 side plate

Claims (3)

An outer enclosure that forms a vacuum sealed space inside the anode substrate, the counter substrate, and the side plate;
An electron emission portion disposed inside the outer enclosure body portion;
An ultraviolet X-ray emitting part that is disposed on the sealed space side of the anode substrate and generates ultraviolet rays and X-rays by colliding electrons emitted from the electron emission part;
The ultraviolet X-ray radiation part is
An anode is disposed facing the electron emission portion, and a target material is disposed between the anode and the anode substrate.
A voltage is applied between the anode and the electron emission portion so that the accelerated electrons collide with the target material to generate ultraviolet rays and X-rays, and operate in the ultraviolet X-ray range.
The anode substrate is formed of a member that transmits the X-rays and the ultraviolet rays.
Ultraviolet X-ray generator. The target material is
ZnAl ₂ O ₄ , hBN, AlN, Ca ₂ P ₂ O ₇ : One of Pr,
The ultraviolet X-ray generator according to claim 1, wherein a voltage applied to the anode is 15 kV or more and less than 20 kV with respect to the electron emission portion. An outer enclosure that forms a vacuum sealed space inside the anode substrate, the counter substrate, and the side plate;
An electron emission portion disposed inside the outer enclosure body portion;
An ultraviolet X-ray emitting part that is disposed on the sealed space side of the anode substrate and generates ultraviolet rays and X-rays by colliding electrons emitted from the electron emission part;
The ultraviolet X-ray radiation part is
An anode is disposed facing the electron emission portion, and a target material is disposed between the anode and the anode substrate.
A voltage is applied between the anode and the electron emission portion so that the accelerated electrons collide with the target material to generate ultraviolet rays and X-rays, and operate in the ultraviolet X-ray range.
The anode substrate is formed of a member that transmits the X-rays and the ultraviolet rays.
Light sterilizer.

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