JP5359052B2 - Method for producing fluorine-containing monomer - Google Patents
Method for producing fluorine-containing monomer Download PDFInfo
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- JP5359052B2 JP5359052B2 JP2008163886A JP2008163886A JP5359052B2 JP 5359052 B2 JP5359052 B2 JP 5359052B2 JP 2008163886 A JP2008163886 A JP 2008163886A JP 2008163886 A JP2008163886 A JP 2008163886A JP 5359052 B2 JP5359052 B2 JP 5359052B2
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- JP
- Japan
- Prior art keywords
- fluorine
- reaction
- containing monomer
- acrylic acid
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 44
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 42
- 239000011737 fluorine Substances 0.000 title claims abstract description 42
- 239000000178 monomer Substances 0.000 title claims abstract description 31
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 150000002009 diols Chemical class 0.000 claims abstract description 13
- 238000006243 chemical reaction Methods 0.000 claims description 65
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 238000005886 esterification reaction Methods 0.000 claims description 4
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 4
- 230000032050 esterification Effects 0.000 claims description 3
- 125000001153 fluoro group Chemical group F* 0.000 claims description 2
- -1 polycyclic nitrogen compound Chemical class 0.000 abstract description 22
- 229910017464 nitrogen compound Inorganic materials 0.000 abstract description 13
- 150000001875 compounds Chemical class 0.000 abstract description 11
- 238000000034 method Methods 0.000 abstract description 11
- 239000000463 material Substances 0.000 abstract description 9
- 239000011248 coating agent Substances 0.000 abstract description 4
- 238000000576 coating method Methods 0.000 abstract description 4
- 238000000206 photolithography Methods 0.000 abstract description 4
- 239000003513 alkali Substances 0.000 abstract 2
- 238000002360 preparation method Methods 0.000 abstract 1
- 230000003449 preventive effect Effects 0.000 abstract 1
- 239000002904 solvent Substances 0.000 description 18
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 238000006116 polymerization reaction Methods 0.000 description 10
- 239000002994 raw material Substances 0.000 description 9
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical class COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 239000003112 inhibitor Substances 0.000 description 7
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- XSCHRSMBECNVNS-UHFFFAOYSA-N benzopyrazine Natural products N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- QAJCOMPEAMJMEB-UHFFFAOYSA-N 1,1,1-trifluoro-2-(trifluoromethyl)pentane-2,4-diol Chemical compound CC(O)CC(O)(C(F)(F)F)C(F)(F)F QAJCOMPEAMJMEB-UHFFFAOYSA-N 0.000 description 5
- HXSIAJREWWAACY-UHFFFAOYSA-N 2-(trifluoromethyl)prop-2-enoyl chloride Chemical compound FC(F)(F)C(=C)C(Cl)=O HXSIAJREWWAACY-UHFFFAOYSA-N 0.000 description 5
- 239000003153 chemical reaction reagent Substances 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 4
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 4
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 4
- RDOWQLZANAYVLL-UHFFFAOYSA-N phenanthridine Chemical compound C1=CC=C2C3=CC=CC=C3C=NC2=C1 RDOWQLZANAYVLL-UHFFFAOYSA-N 0.000 description 4
- AOJFQRQNPXYVLM-UHFFFAOYSA-N pyridin-1-ium;chloride Chemical compound [Cl-].C1=CC=[NH+]C=C1 AOJFQRQNPXYVLM-UHFFFAOYSA-N 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 238000007086 side reaction Methods 0.000 description 4
- 239000002002 slurry Substances 0.000 description 4
- AIFRHYZBTHREPW-UHFFFAOYSA-N β-carboline Chemical compound N1=CC=C2C3=CC=CC=C3NC2=C1 AIFRHYZBTHREPW-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000009776 industrial production Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000005416 organic matter Substances 0.000 description 3
- ARJOQCYCJMAIFR-UHFFFAOYSA-N prop-2-enoyl prop-2-enoate Chemical class C=CC(=O)OC(=O)C=C ARJOQCYCJMAIFR-UHFFFAOYSA-N 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- FLBAYUMRQUHISI-UHFFFAOYSA-N 1,8-naphthyridine Chemical compound N1=CC=CC2=CC=CN=C21 FLBAYUMRQUHISI-UHFFFAOYSA-N 0.000 description 2
- AAQTWLBJPNLKHT-UHFFFAOYSA-N 1H-perimidine Chemical compound N1C=NC2=CC=CC3=CC=CC1=C32 AAQTWLBJPNLKHT-UHFFFAOYSA-N 0.000 description 2
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 2
- VLSRKCIBHNJFHA-UHFFFAOYSA-N 2-(trifluoromethyl)prop-2-enoic acid Chemical compound OC(=O)C(=C)C(F)(F)F VLSRKCIBHNJFHA-UHFFFAOYSA-N 0.000 description 2
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 2
- VHMICKWLTGFITH-UHFFFAOYSA-N 2H-isoindole Chemical compound C1=CC=CC2=CNC=C21 VHMICKWLTGFITH-UHFFFAOYSA-N 0.000 description 2
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- GGNQRNBDZQJCCN-UHFFFAOYSA-N benzene-1,2,4-triol Chemical compound OC1=CC=C(O)C(O)=C1 GGNQRNBDZQJCCN-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- AUZONCFQVSMFAP-UHFFFAOYSA-N disulfiram Chemical compound CCN(CC)C(=S)SSC(=S)N(CC)CC AUZONCFQVSMFAP-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 2
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- LFSXCDWNBUNEEM-UHFFFAOYSA-N phthalazine Chemical compound C1=NN=CC2=CC=CC=C21 LFSXCDWNBUNEEM-UHFFFAOYSA-N 0.000 description 2
- CPNGPNLZQNNVQM-UHFFFAOYSA-N pteridine Chemical compound N1=CN=CC2=NC=CN=C21 CPNGPNLZQNNVQM-UHFFFAOYSA-N 0.000 description 2
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- BYEAHWXPCBROCE-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-ol Chemical group FC(F)(F)C(O)C(F)(F)F BYEAHWXPCBROCE-UHFFFAOYSA-N 0.000 description 1
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- WCBPJVKVIMMEQC-UHFFFAOYSA-N 1,1-diphenyl-2-(2,4,6-trinitrophenyl)hydrazine Chemical compound [O-][N+](=O)C1=CC([N+](=O)[O-])=CC([N+]([O-])=O)=C1NN(C=1C=CC=CC=1)C1=CC=CC=C1 WCBPJVKVIMMEQC-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- JZODKRWQWUWGCD-UHFFFAOYSA-N 2,5-di-tert-butylbenzene-1,4-diol Chemical compound CC(C)(C)C1=CC(O)=C(C(C)(C)C)C=C1O JZODKRWQWUWGCD-UHFFFAOYSA-N 0.000 description 1
- BSADJIPSKPADNV-UHFFFAOYSA-N 4-methylpyridin-1-ium;chloride Chemical compound Cl.CC1=CC=NC=C1 BSADJIPSKPADNV-UHFFFAOYSA-N 0.000 description 1
- RPVUMPHVFYOKAF-UHFFFAOYSA-N CC(CC(CF)(C(F)(F)F)O)O Chemical compound CC(CC(CF)(C(F)(F)F)O)O RPVUMPHVFYOKAF-UHFFFAOYSA-N 0.000 description 1
- UTGQNNCQYDRXCH-UHFFFAOYSA-N N,N'-diphenyl-1,4-phenylenediamine Chemical compound C=1C=C(NC=2C=CC=CC=2)C=CC=1NC1=CC=CC=C1 UTGQNNCQYDRXCH-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 1
- BLXSUZWXVMWNRC-UHFFFAOYSA-N [5,5,5-trifluoro-4-hydroxy-4-(trifluoromethyl)pentan-2-yl] 2-(trifluoromethyl)prop-2-enoate Chemical compound FC(F)(F)C(O)(C(F)(F)F)CC(C)OC(=O)C(=C)C(F)(F)F BLXSUZWXVMWNRC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- BKNBVEKCHVXGPH-UHFFFAOYSA-N anthracene-1,4,9,10-tetrol Chemical compound C1=CC=C2C(O)=C3C(O)=CC=C(O)C3=C(O)C2=C1 BKNBVEKCHVXGPH-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- VBZWSGALLODQNC-UHFFFAOYSA-N hexafluoroacetone Chemical compound FC(F)(F)C(=O)C(F)(F)F VBZWSGALLODQNC-UHFFFAOYSA-N 0.000 description 1
- PSXRWZBTVAZNSF-UHFFFAOYSA-N hydron;quinoline;chloride Chemical compound Cl.N1=CC=CC2=CC=CC=C21 PSXRWZBTVAZNSF-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
本発明は、一般式[3]で表される含フッ素モノマー The present invention relates to a fluorine-containing monomer represented by the general formula [3]
(但し、式中のR1は炭素数1〜8の直鎖または枝分かれのあるアルキル基、または環状のアルキル置換基であり、R2は水素原子、または炭素数1〜6の直鎖または枝分かれのあるアルキル基、または含フッ素アルキル基である。)の製造方法に関する。一般式[3]で示される含フッ素モノマーはヘキサフルオロイソプロピルユニットを有しており、反射防止膜等のコーティング材料あるいは光リソグラフィー等のレジスト材料向けモノマーとして有用である。 (In the formula, R 1 is a linear or branched alkyl group having 1 to 8 carbon atoms or a cyclic alkyl substituent, and R 2 is a hydrogen atom, or a linear or branched chain having 1 to 6 carbon atoms. And a fluorine-containing alkyl group). The fluorine-containing monomer represented by the general formula [3] has a hexafluoroisopropyl unit and is useful as a monomer for a coating material such as an antireflection film or a resist material such as photolithography.
含フッ素モノマーは、反射防止膜等のコーティング材料あるいはレジスト材料向けモノマーとして有用である。特に電気回路の加工技術である光リソグラフィー等のレジスト分野において微細加工の鍵を握る化合物であり、多種多様な化合物に関して開発が進められている。中でもヘキサフルオロイソプロピルアルコールユニットを有する化合物はフッ素を含有し且つ極性基であるヒドロキシル基を有するので大きな注目が集まっている(非特許文献1)。 The fluorine-containing monomer is useful as a monomer for a coating material such as an antireflection film or a resist material. In particular, it is a compound that holds the key to microfabrication in the resist field such as photolithography, which is a processing technique for electric circuits, and a variety of compounds are being developed. Among them, a compound having a hexafluoroisopropyl alcohol unit has received much attention because it contains fluorine and has a hydroxyl group which is a polar group (Non-patent Document 1).
これらの化合物は重合性部位を導入するため、置換アクリル酸等の重合性の酸と機能性のアルコールをエステル化することで合成されることが多い。エステル化の手法としては、一般的なものが使用可能である。例えば、(1)置換アクリル酸無水物とアルコールの酸触媒存在下での反応、(2)置換アクリル酸クロリド、アクリル酸無水物とアルコールとの塩基存在下での反応、(3)置換アクリル酸とアルコールの脱水縮合等、様々なものが知られている。 Since these compounds introduce a polymerizable site, they are often synthesized by esterifying a polymerizable acid such as substituted acrylic acid and a functional alcohol. As the esterification method, a general method can be used. For example, (1) a reaction in the presence of an acid catalyst of a substituted acrylic anhydride and an alcohol, (2) a reaction in the presence of a base of a substituted acrylic acid chloride and an acrylic anhydride and an alcohol, (3) a substituted acrylic acid Various things such as dehydration condensation of alcohol with alcohol are known.
特許文献1には、本発明の目的化合物である一般式[3]で示される含フッ素モノマーを上記(1)あるいは(2)の方法で製造できることが記載されている。
特許文献1記載の上記(1)の置換アクリル酸無水物とアルコールの酸触媒存在下での反応は、良好な選択性で反応が進行し、固体の塩が析出しないことから、溶媒量を削減することができ生産性を向上させることができる等、優れた点を有している。しかし、この手法では、原理的に生成物一当量に対して、一当量のアクリル酸が副生する。そのため、高価な置換アクリル酸を用いる場合はコスト的に不利であり、さらに、製品化には置換アクリル酸の除去も必要であり、必ずしも工業的な製造に適した合成法とはいえない。 The reaction in the presence of the acid catalyst of the substituted acrylic acid anhydride and the alcohol described in (1) described in Patent Document 1 proceeds with good selectivity, and a solid salt does not precipitate, so the amount of solvent is reduced. It has excellent points such as being able to improve productivity. However, in this method, in principle, one equivalent of acrylic acid is by-produced with respect to one equivalent of the product. Therefore, when expensive substituted acrylic acid is used, it is disadvantageous in terms of cost, and further, it is necessary to remove the substituted acrylic acid for commercialization, which is not necessarily a synthesis method suitable for industrial production.
特許文献1には上記(2)の置換アクリル酸クロリド類とアルコールの塩基存在下での反応についての開示もあり、塩基としてトリエチルアミン、ピリジン、2,6−ジメチルピリジンが用いられる旨記載されている。そこで、実際に置換アクリル酸クロリド類とアルコールの反応を当該塩基の存在下行ったところ、塩基によっては副生成物が生成して選択率が落ちる場合(比較例1又は2)があったり、塩基として使用したアミンの塩酸塩が均一なスラリーとはならず生成物を取り込みながら成長して大きな塊になるという現象が進行し操作性が著しく低下する場合(比較例3乃至5)があったりして問題があった。 Patent Document 1 also discloses the reaction in the presence of a base of the substituted acrylic acid chlorides (2) and alcohol described above, and describes that triethylamine, pyridine, and 2,6-dimethylpyridine are used as the base. . Therefore, when the reaction between the substituted acrylic acid chlorides and the alcohol was actually performed in the presence of the base, by-products may be generated depending on the base and the selectivity may be reduced (Comparative Example 1 or 2), In some cases, the amine hydrochloride used as a mixture does not become a uniform slurry but grows while taking up the product and grows into large lumps and the operability is significantly reduced (Comparative Examples 3 to 5). There was a problem.
更に、上記(3)の置換アクリル酸とアルコールとの反応で、脱水縮合反応も試みたが、立体障害の大きい置換アクリル酸とアルコール同士の反応では、副反応が進行し、良好な結果が得られなかった(比較例6参照)。 Furthermore, although the dehydration condensation reaction was also attempted in the reaction of the substituted acrylic acid and alcohol in (3) above, a side reaction progressed in the reaction between the substituted acrylic acid and alcohol having a large steric hindrance, and good results were obtained. (See Comparative Example 6).
一般式[1]で示される含フッ素ジオールと一般式[2]で示される含フッ素置換アクリル酸クロリドを塩基存在下でエステル化させて一般式[3]に示す含フッ素モノマーを製造する工程において、副反応として塩基の塩酸塩が生成する。また、一般式[1]で示されるジオールは水酸基を2個有するので、副生成物として置換アクリル酸クロリドが2個エステル化したビス体が生成する可能性がある。 In the step of producing the fluorine-containing monomer represented by the general formula [3] by esterifying the fluorine-containing diol represented by the general formula [1] and the fluorine-containing substituted acrylic acid chloride represented by the general formula [2] in the presence of a base. As a side reaction, the base hydrochloride is formed. Further, since the diol represented by the general formula [1] has two hydroxyl groups, there is a possibility that a bis body in which two substituted acrylic acid chlorides are esterified as a by-product may be formed.
(但し、式中のR1、R2は一般式[3]と同じ意味。)
前述のように当該塩酸塩が塊状になる場合は攪拌に影響をきたして操作性が低下して工業的に製造する製造法としては問題がある。また、先行例で開示されている塩基を用いての反応では、塩基の種類によっては副生成物の生成が認められ、選択率が必ずしもよくない。そこで、一般式[3]で表される含フッ素モノマーを操作性のよい手法でより効率よく製造する工業的な製造方法が求められていた。
(However, R 1 and R 2 in the formula have the same meaning as in the general formula [3].)
As described above, when the hydrochloride is agglomerated, there is a problem as a production method for industrial production because it affects stirring and the operability is lowered. Moreover, in the reaction using the base disclosed in the preceding examples, the production of by-products is recognized depending on the type of the base, and the selectivity is not necessarily good. Therefore, an industrial production method for producing the fluorine-containing monomer represented by the general formula [3] more efficiently by a method with good operability has been demanded.
本発明は、反射防止膜等のコーティング材料あるいは光リソグラフィー等のレジスト材料に有用な化合物である一般式[3]で表される含フッ素モノマーを操作性のよい手法でより効率よく製造する工業的な製造方法を提供することを課題とする。 INDUSTRIAL APPLICABILITY The present invention is an industrial process for more efficiently producing a fluorine-containing monomer represented by the general formula [3], which is a compound useful for a coating material such as an antireflection film or a resist material such as photolithography, by a method with good operability. It is an object to provide a simple manufacturing method.
本発明者らはかかる従来技術の問題点に鑑み、工業的規模での製造に適した含フッ素モノマーの製造法を確立するべく、鋭意検討を行った。 In view of the problems of the prior art, the present inventors have intensively studied to establish a method for producing a fluorine-containing monomer suitable for production on an industrial scale.
その結果、一般式[1]で表される含フッ素ジオール As a result, the fluorine-containing diol represented by the general formula [1]
(式[1]中のR1の意味は前記と同じ。)を一般式[2]で表される置換アクリル酸クロリド類 (The meaning of R 1 in the formula [1] is the same as described above.) The substituted acrylic acid chlorides represented by the general formula [2]
(式[1]中のR2の意味は前記と同じ。)との反応により、エステル化するのに特定の条件を作用させると、操作性が改良されるばかりでなく、良好な選択性で反応が進行し、適切な回収率で一般式[3]で示される含フッ素レジスト用モノマー (The meaning of R 2 in the formula [1] is the same as described above.) When a specific condition is applied to esterify, not only the operability is improved, but also good selectivity is obtained. Monomer for fluorine-containing resist represented by the general formula [3] with an appropriate recovery rate as the reaction proceeds
(式[3]中、R1とR2の意味は前記と同じ)を得ることができることを見出し、本発明の完成に到達した。 (In formula [3], R 1 and R 2 have the same meanings as described above), and the present invention has been completed.
すなわち本発明は、[発明1]〜[発明4]の発明を含む含フッ素モノマーの新規製造方法である。 That is, the present invention is a novel method for producing a fluorine-containing monomer including the inventions of [Invention 1] to [Invention 4].
[発明1] 一般式[1]で示される含フッ素ジオール [Invention 1] Fluorine-containing diol represented by the general formula [1]
を一般式[2]で表されるアクリル酸クロリド類を用いて塩基の存在下でエステル化する反応において、塩基として多環式の窒素化合物を使用することを特徴とする、一般式[3]で表される含フッ素モノマーの製造方法。 In the reaction of esterifying an acrylic acid chloride represented by the general formula [2] in the presence of a base, using a polycyclic nitrogen compound as the base, the general formula [3] The manufacturing method of the fluorine-containing monomer represented by these.
(但し、式中のR1は炭素数1〜8の直鎖または枝分かれのあるアルキル基、または環状のアルキル置換基であり、R2は水素原子、または炭素数1〜6の直鎖または枝分かれのあるアルキル基、または含フッ素アルキル基である。)
[発明2] 多環式の窒素化合物が、インドール、イソインドール、プリン、キノリン、イソキノリン、フタラジン、ナフチリジン、キノキサリン、キナゾリン、シノリン、プテリジン、カルバゾール、β−カルボリン、フェナントリジン、アクリジン、ペリミジン、フェナントリン、又はフェナジンよりなる群から選ばれる少なくとも一種類の化合物であることを特徴とする、発明1に記載の含フッ素レジスト用モノマーの製造方法。
[発明3] R1がメチル基であり、R2がトリフルオロメチル基であることを特徴とする、発明1又は発明2に記載の、含フッ素モノマーの製造方法。
[発明4] 多環式の窒素化合物がキノリンであることを特徴とする、発明1乃至発明3のいずれかに記載の、含フッ素モノマーの製造方法。
(In the formula, R 1 is a linear or branched alkyl group having 1 to 8 carbon atoms or a cyclic alkyl substituent, and R 2 is a hydrogen atom, or a linear or branched chain having 1 to 6 carbon atoms. An alkyl group having a fluorine atom or a fluorine-containing alkyl group.)
[Invention 2] A polycyclic nitrogen compound is indole, isoindole, purine, quinoline, isoquinoline, phthalazine, naphthyridine, quinoxaline, quinazoline, sinoline, pteridine, carbazole, β-carboline, phenanthridine, acridine, perimidine, phenanthrin Or a method for producing a monomer for a fluorine-containing resist according to invention 1, wherein the monomer is at least one compound selected from the group consisting of phenazine.
[Invention 3] The method for producing a fluorine-containing monomer according to Invention 1 or Invention 2, wherein R 1 is a methyl group and R 2 is a trifluoromethyl group.
[Invention 4] The method for producing a fluorine-containing monomer according to any one of Inventions 1 to 3, wherein the polycyclic nitrogen compound is quinoline.
本発明によれば、目的とする含フッ素モノマーを、操作性よく製造できるばかりでなく、従来よりも高い選択率で効率的に製造できる。このため本発明は、工業的な規模で含フッ素モノマーを製造するためのきわめて優れた方法である。 According to the present invention, the target fluorine-containing monomer can be produced not only with good operability, but also with a higher selectivity than conventional methods. Therefore, the present invention is an extremely excellent method for producing a fluorine-containing monomer on an industrial scale.
本発明の製造方法について以下、さらに詳細に説明する。
Hereinafter, the production method of the present invention will be described in more detail.
本反応が対象とする、一般式[1]で表される含フッ素ジオール類のアルキル置換基R1は、炭素数1〜8の直鎖または枝分かれのあるアルキル基、または環状のアルキル基であり、メチル基、エチル基、n−プロピル基、iso−プロピル基、n−ブチル基、iso−ブチル基、シクロペンチル基、シクロヘキシル基が好ましく、メチル基が特に好ましい。 The alkyl substituent R 1 of the fluorine-containing diols represented by the general formula [1] targeted by this reaction is a linear or branched alkyl group having 1 to 8 carbon atoms or a cyclic alkyl group. , A methyl group, an ethyl group, an n-propyl group, an iso-propyl group, an n-butyl group, an iso-butyl group, a cyclopentyl group, and a cyclohexyl group are preferable, and a methyl group is particularly preferable.
これら一般式[1]で表される含フッ素アルキル置換ビニルハライド類は、例えばヘキサフルオロアセトンとメチルエチルケトンの反応で得られる含フッ素ヒドロキシケトンを還元することで製造できることも知られている(特許文献1あるいは米国特許3662071号明細書参照)。 It is also known that these fluorinated alkyl-substituted vinyl halides represented by the general formula [1] can be produced, for example, by reducing a fluorinated hydroxyketone obtained by the reaction of hexafluoroacetone and methyl ethyl ketone (Patent Document 1). Or US Pat. No. 3,660,711).
本反応が対象とする、一般式[2]で表されるアクリル酸クロリド類のアルキル置換基R2は、水素原子、炭素数1〜6の直鎖または枝分かれのあるアルキル基、または含フッ素アルキル基が挙げられ、水素原子、メチル基、エチル基、プロピル基、iso-プロピル基、トリフルオロメチル基、ペンタフルオロエチル基が好「ましく、トリフロオロメチル基が特に好ましい。これらの化合物は、相当するアクリル酸を酸クロリド化することにより製造できるが、例えば、重合禁止剤および触媒の存在下、酸クロリド化剤として、ホスゲンを用いる方法(特公昭47−13021号公報)、塩化チオニルを用いる方法(特公昭63−66819号公報)により製造できる。 The alkyl substituent R 2 of the acrylic acid chlorides represented by the general formula [2] targeted by this reaction is a hydrogen atom, a linear or branched alkyl group having 1 to 6 carbon atoms, or a fluorinated alkyl. And a hydrogen atom, a methyl group, an ethyl group, a propyl group, an iso-propyl group, a trifluoromethyl group and a pentafluoroethyl group are preferable, and a trifluoromethyl group is particularly preferable. For example, a method using phosgene as an acid chloride agent in the presence of a polymerization inhibitor and a catalyst (Japanese Patent Publication No. 47-13021), thionyl chloride is prepared by acid chloride of the corresponding acrylic acid. It can be produced by the method used (Japanese Examined Patent Publication No. 63-66819).
本発明の反応は、バッチ式、および流通式の反応装置において実施することができる。以下にバッチ式反応の条件を述べるが、それぞれの反応装置において、当業者が容易に調節しうる程度の反応条件の変更を妨げるものではない。 The reaction of the present invention can be carried out in batch-type and flow-type reaction apparatuses. The batch reaction conditions will be described below, but this does not preclude changes in the reaction conditions that can be easily adjusted by those skilled in the art.
本反応において、アクリル酸クロリド類の使用量は、基質に対するモルの比は0.5から3が好ましく、0.8から1.5がより好ましく、0.9から1.2が特に好ましい。0.5より小さいと反応の変換率が低下し、未反応の含フッ素ジオールが残存することから、好ましくない。また、3より大きいと反応に関与しないアクリル酸クロリド類の量が増加するため、経済的に好ましくない。 In this reaction, the amount of acrylic acid chlorides used is preferably from 0.5 to 3, more preferably from 0.8 to 1.5, particularly preferably from 0.9 to 1.2, as the molar ratio to the substrate. If it is less than 0.5, the conversion rate of the reaction is lowered, and unreacted fluorine-containing diol remains, which is not preferable. On the other hand, if it is larger than 3, the amount of acrylic acid chlorides not involved in the reaction increases, which is not economically preferable.
塩基としては多環式の窒素化合物が好ましく、インドール、イソインドール、プリン、キノリン、イソキノリン、フタラジン、ナフチリジン、キノキサリン、キナゾリン、シノリン、プテリジン、カルバゾール、β−カルボリン、フェナントリジン、アクリジン、ペリミジン、フェナントリン、フェナジンがより好ましく、キノリンが最も好ましい。これらの多環式の窒素化合物を塩基として用いることにより、エステル化反応は効率よく進行する。また、副反応で生成する塩酸塩は系内で均一なスラリー状となるため攪拌を妨げることなく操作性も良好である。 The base is preferably a polycyclic nitrogen compound, indole, isoindole, purine, quinoline, isoquinoline, phthalazine, naphthyridine, quinoxaline, quinazoline, sinoline, pteridine, carbazole, β-carboline, phenanthridine, acridine, perimidine, phenanthrin. Phenazine is more preferred, and quinoline is most preferred. By using these polycyclic nitrogen compounds as the base, the esterification reaction proceeds efficiently. Further, the hydrochloride produced by the side reaction becomes a uniform slurry in the system, so that the operability is good without hindering stirring.
本反応において、塩基に多環式の窒素化合物を用いる場合、当該塩基の使用量として、基質に対するモルの比は0.5から3が好ましく、0.8から1.5がより好ましく、0.9から1.2が特に好ましい。0.5より小さいと反応の変換率が低下し、未反応の含フッ素ジオールが残存することから、好ましくない。また、3より大きいと反応に関与しない多環式の窒素化合物の量が増加するため、経済的に好ましくない。 In this reaction, when a polycyclic nitrogen compound is used as the base, the molar ratio of the base to the substrate is preferably 0.5 to 3, more preferably 0.8 to 1.5, and preferably 0.00. 9 to 1.2 are particularly preferred. If it is less than 0.5, the conversion rate of the reaction is lowered, and unreacted fluorine-containing diol remains, which is not preferable. On the other hand, if it is larger than 3, the amount of the polycyclic nitrogen compound not involved in the reaction increases, which is not economically preferable.
本反応は、反応選択率、反応速度、操作性を向上することを目的として溶媒を使用することができる。アセトニトリル、プロピオニトリル又はベンゾニトリル等のニトリル系溶媒、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド又はN,N−ジメチルイミダゾリジノン等のアミド系溶媒、ジメチルスルホキシド等のスルホキシド系溶媒、ジエチルエーテル、ジイソプロピルエーテル、ジブチルエーテル又はテトラヒドロフラン等のエーテル系溶媒、塩化メチレン、クロロホルム又は四塩化炭素等のハロゲン化溶媒、ベンゼン、トルエン又はキシレン等の芳香族系炭化水素溶媒、ペンタン、ヘキサン又はヘプタン等の脂肪族炭化水素溶媒より選ばれる少なくとも1種の化合物が好ましく、ジイソプロピルエーテル、トルエン、ヘプタンがより好ましい。 In this reaction, a solvent can be used for the purpose of improving the reaction selectivity, reaction rate, and operability. Nitrile solvents such as acetonitrile, propionitrile or benzonitrile, amide solvents such as N, N-dimethylformamide, N, N-dimethylacetamide or N, N-dimethylimidazolidinone, sulfoxide solvents such as dimethyl sulfoxide, Ether solvents such as diethyl ether, diisopropyl ether, dibutyl ether or tetrahydrofuran, halogenated solvents such as methylene chloride, chloroform or carbon tetrachloride, aromatic hydrocarbon solvents such as benzene, toluene or xylene, pentane, hexane or heptane At least one compound selected from the aliphatic hydrocarbon solvents is preferred, and diisopropyl ether, toluene, and heptane are more preferred.
溶媒を使用する場合、その効果は使用される溶媒によって変化するため、その溶媒の量を一義的に決めることはできないが、原料の基質に対して30重量%から1000重量%が好ましく、100重量%から500重量%がより好ましい。30重量%未満では加える効果が低下することから好ましくない。また、1000重量%を超えると良好な反応選択性が期待できるが、バッチ当たりの生産性は低下し、また、溶媒を除去する手間が増えることから経済的に好ましくない。 When a solvent is used, the effect varies depending on the solvent used, and therefore the amount of the solvent cannot be uniquely determined, but is preferably 30% to 1000% by weight, preferably 100% by weight based on the raw material substrate. % To 500% by weight is more preferred. If it is less than 30% by weight, the effect of adding is not preferred. On the other hand, when the amount exceeds 1000% by weight, good reaction selectivity can be expected, but the productivity per batch is lowered, and the labor for removing the solvent is increased, which is not economically preferable.
この反応において置換アクリル酸クロリドもしくは生成物(含フッ素モノマー)が重合することを防止することを目的として、重合禁止剤を共存させて行っても良く、通常は重合禁止剤を使用することが望ましい。使用する重合禁止剤はヒドロキノン、メトキノン、2,5−ジ−t−ブチルヒドロキノン、1,2,4−トリヒドロキシベンゼン、2,5−ビステトラメチルブチルヒドロキノン、ロイコキニザリン、ノンフレックスF、ノンフレックスH、ノンフレックスDCD、ノンフレックスMBP、オゾノン35、フェノチアジン、テトラエチルチウラム ジスルフィド、1,1−ジフェニル−2−ピクリルヒドラジル、1,1−ジフェニル−2−ピクリルヒドラジン、Q−1300、Q−1301から選ばれる少なくとも一種の化合物である。上記の重合禁止剤は市販品であり容易に入手可能である。 In this reaction, for the purpose of preventing polymerization of the substituted acrylic acid chloride or the product (fluorinated monomer), it may be carried out in the presence of a polymerization inhibitor, and it is usually desirable to use a polymerization inhibitor. . Polymerization inhibitors used are hydroquinone, methoquinone, 2,5-di-t-butylhydroquinone, 1,2,4-trihydroxybenzene, 2,5-bistetramethylbutylhydroquinone, leucoquinizarin, nonflex F, nonflex H , Non-flex DCD, non-flex MBP, ozonone 35, phenothiazine, tetraethylthiuram disulfide, 1,1-diphenyl-2-picrylhydrazyl, 1,1-diphenyl-2-picrylhydrazine, Q-1300, Q-1301 Is at least one compound selected from the group consisting of The above polymerization inhibitors are commercially available products and can be easily obtained.
本発明に使用する重合禁止剤の量は原料の式[1]で表される含フッ素ジオール1モルに対して通常0.00001〜0.1モルであり、0.0001〜0.05モルが好ましく、0.001〜0.01モルがより好ましい。重合禁止剤の量が原料の式[1]で表される含フッ素ジオール1モルに対して0.1モルを超えても重合を防止する能力に大きな差異はなく、そのため、経済的に好ましくない。 The amount of the polymerization inhibitor used in the present invention is usually 0.00001 to 0.1 mol, and 0.0001 to 0.05 mol per mol of the fluorine-containing diol represented by the raw material formula [1]. Preferably, 0.001 to 0.01 mol is more preferable. Even if the amount of the polymerization inhibitor exceeds 0.1 mol relative to 1 mol of the fluorine-containing diol represented by the formula [1] of the raw material, there is no significant difference in the ability to prevent polymerization, and this is economically undesirable. .
本反応に関与する試薬としては、原料のフッ素化ジオール、置換アクリル酸クロリド類、多環式窒素化合物の三種があるが、これを一度に反応器に加えると、反応の制御が困難になるため、いずれか二種の試薬を溶媒存在下で混合し、残り一種の試薬を逐次添加するのが望ましい。 There are three types of reagents involved in this reaction: raw material fluorinated diols, substituted acrylic acid chlorides, and polycyclic nitrogen compounds. If these are added to the reactor at once, it will be difficult to control the reaction. It is desirable to mix any two kinds of reagents in the presence of a solvent, and sequentially add the remaining one kind of reagent.
試薬の本反応に関与する試薬を逐次添加する速度は、反応器の除熱効率次第で可能な範囲幅が変化するため、一義的に決めることは困難であるが、添加開始から添加終了まで30分から24時間掛けるのが好ましい。30分より短いと、除熱を行うことが困難であるため、反応が暴走するため好ましくない。24時間を越えると除熱は十分行えているにもかかわらず時間のみを使用していることになり、コスト的に好ましくない。 The rate of sequential addition of reagents involved in the main reaction of the reagent is difficult to determine uniquely because the possible range varies depending on the heat removal efficiency of the reactor, but from 30 minutes from the start of addition to the end of addition. It is preferable to take 24 hours. If it is shorter than 30 minutes, it is difficult to remove the heat, and the reaction runs out of control. If it exceeds 24 hours, heat is removed sufficiently, but only time is used, which is not preferable in terms of cost.
本反応を実施する際の反応温度に特別な制限があるわけではないが、通常−50〜200℃であり、−20〜100℃が好ましく、0℃〜50℃が特に好ましい。−50℃未満では、冷却にコストがかかることから望ましくない。また、200℃を超えると、原料、生成物共にモノマーであることから、ポリマー化等の副反応が進行しやすくなり、選択的な合成を達成することが困難になることから望ましくない。 Although there is no special restriction | limiting in the reaction temperature at the time of implementing this reaction, Usually, it is -50-200 degreeC, -20-100 degreeC is preferable, and 0 degreeC-50 degreeC is especially preferable. If it is less than −50 ° C., it is not desirable because it costs cooling. On the other hand, when the temperature exceeds 200 ° C., since the raw material and the product are both monomers, side reactions such as polymerization are likely to proceed, and it is difficult to achieve selective synthesis.
本反応を行う反応器は、四フッ化エチレン樹脂、クロロトリフルオロエチレン樹脂、フッ化ビニリデン樹脂、PFA樹脂、ガラスなどを内部にライニングしたもの、グラス容器、もしくはステンレスで製作したものが好ましい。 The reactor for carrying out the reaction is preferably a reactor made of tetrafluoroethylene resin, chlorotrifluoroethylene resin, vinylidene fluoride resin, PFA resin, glass or the like, a glass container, or stainless steel.
本発明の反応は、特に加圧条件を必要としないため常圧で行うことがコスト面で望ましいが、反応に使用する化合物の蒸気が系外に排出されることを防ぐことを目的として、耐圧性の反応器を用い、系内を密閉して反応を実施することもできる。 The reaction of the present invention is preferably carried out at normal pressure because it does not require pressurizing conditions. However, with the aim of preventing the vapor of the compound used in the reaction from being discharged out of the system, It is also possible to carry out the reaction by sealing the inside of the system using a sex reactor.
本発明の反応は不活性ガス雰囲気下で行うこともできるが、大気下で反応を行っても不活性ガス雰囲気下での反応との間に有意な差は認められず、特に大量規模で合成を行なう場合には、大気下で反応を行う方が、コスト面で好ましい。 Although the reaction of the present invention can be carried out under an inert gas atmosphere, there is no significant difference from the reaction under an inert gas atmosphere even when the reaction is carried out in the atmosphere, and the synthesis is performed particularly on a large scale. In the case of performing the reaction, it is preferable in terms of cost to perform the reaction in the atmosphere.
[望ましい態様の例示]
本発明を実施する方法は限定されるものではないが、望ましい態様の一例につき、詳細を述べる。
[Examples of desirable embodiments]
Although the method for carrying out the present invention is not limited, details will be described with respect to an example of a desirable embodiment.
本反応の反応条件に耐えられる反応器に、原料の含フッ素ジオール類、溶媒、塩基として多環式窒素化合物の所定量を加え、必要により加温もしくは冷却して所定の温度に設定する。 A predetermined amount of a polycyclic nitrogen compound as a raw material fluorine-containing diol, a solvent, and a base is added to a reactor that can withstand the reaction conditions of this reaction, and heated or cooled as necessary to set a predetermined temperature.
アクリル酸クロリドの所定量を滴下により逐次添加し、サンプリング等により目的物の生成をモニタリングすること好ましい。 It is preferable to add a predetermined amount of acrylic acid chloride dropwise and successively monitor the production of the target product by sampling or the like.
反応が進行するにつれ、エステル化により目的の含フッ素モノマーが生成するが、同時に塩基の塩酸塩も生成する。本発明で塩基として使用する多環式窒素化合物の塩酸塩は生成しても均一なスラリー状であるので塊状になることはなく操作性よく反応を行うことができる。さらに反応後の溶液の有機物組成において目的の含フッ素モノマーが99%の変換率、95%以上高い選択率で製造できる。 As the reaction proceeds, the desired fluorine-containing monomer is produced by esterification, but at the same time, the hydrochloride of the base is also produced. Even if the hydrochloride of the polycyclic nitrogen compound used as a base in the present invention is formed in a uniform slurry, it does not become a lump and can be reacted with good operability. Further, in the organic composition of the solution after the reaction, the target fluorine-containing monomer can be produced with a conversion rate of 99% and a selectivity higher by 95% or more.
本発明の製造方法で製造された一般式[3]で表される含フッ素モノマーは公知の方法を適用して精製できるが、例えば、反応容器より取り出した粗含フッ素レジスト用モノマー溶液を濾過することで、多環式窒素化合物の塩酸塩を取り除いた後に、濾液を塩酸水溶液等で処理し、さらに溶媒を留去することで粗有機物が得られる。多環式の窒素化合物が反応液中に残存する場合は、塩酸水溶液で処理した後に濾過することにより除去できるので、塩基の残存の状況に応じて、濾過と塩酸水溶液での処理の順番は適宜変更することができる。得られた粗有機物はカラムクロマトグラフィーや蒸留精製等の精製を行うことで高純度の含フッ素モノマーを得ることができる。 The fluorine-containing monomer represented by the general formula [3] produced by the production method of the present invention can be purified by applying a known method. For example, the crude fluorine-containing resist monomer solution taken out from the reaction vessel is filtered. Thus, after removing the hydrochloride of the polycyclic nitrogen compound, the filtrate is treated with an aqueous hydrochloric acid solution, and the solvent is distilled off to obtain a crude organic material. If the polycyclic nitrogen compound remains in the reaction solution, it can be removed by filtration after treatment with an aqueous hydrochloric acid solution, so the order of filtration and treatment with an aqueous hydrochloric acid solution is appropriate depending on the situation of the remaining base. Can be changed. The obtained crude organic matter can be purified by column chromatography, distillation purification or the like to obtain a high purity fluorine-containing monomer.
[実施例]
以下、実施例により本発明を詳細に説明するが、これらの実施態様に限られない。
ここで、組成分析値の「%」とは、反応混合物または生成物の一部を採取して、有機成分をジエチルエーテルにて溶解したものをガスクロマトグラフィーによって測定して得られた、有機成分の原料および生成物の「面積%」を表わし、この数値をもって選択率とした。また、100から原料のGC%の数値を引いた値を変換率とした。
[Example]
EXAMPLES Hereinafter, although an Example demonstrates this invention in detail, it is not restricted to these embodiments.
Here, “%” of the compositional analysis value refers to an organic component obtained by collecting a part of the reaction mixture or product and measuring the organic component dissolved in diethyl ether by gas chromatography. This represents the “area%” of the raw material and product, and this value was used as the selectivity. A value obtained by subtracting the numerical value of GC% of the raw material from 100 was defined as the conversion rate.
温度計、攪拌器を備えた1L(リットル)の4つ口フラスコに1,1,1−トリフルオロ−2−トリフルオロメチル−ペンタン−2,4−ジオール50.0gとキノリン31.4g、トルエン200mLを加え、水冷した。 In a 1 L (liter) four-necked flask equipped with a thermometer and a stirrer, 50.0 g of 1,1,1-trifluoro-2-trifluoromethyl-pentane-2,4-diol, 31.4 g of quinoline, toluene 200 mL was added and cooled with water.
滴下ロートを使用して2−(トリフルオロメチル)アクリル酸クロリド41.9gを一時間掛けて反応混合物に添加し、加え終わった後、更に1時間攪拌を行った。
反応の途中でキノリンの塩酸塩の生成が認められたが、スラリー状であり攪拌の妨げになることなく反応を進行した。反応液の有機物の組成は2−トリフルオロメチルアクリル酸1,1,1−トリフルオロ−2−ヒドロキシ−2−トリフルオロメチル−ペンタン−4−イル95.9%、1,1,1−トリフルオロ−2−トリフルオロメチル−ペンタン−2,4−ジオール0.7%、その他不純物が計3.4%確認された。生じたキノリン塩酸塩を濾過により除去し、得られた生成物の溶液を5%塩酸200gおよび水で洗浄し、溶媒のトルエンを留去することで、61.6gの粗有機物を得た。
Using a dropping funnel, 41.9 g of 2- (trifluoromethyl) acrylic acid chloride was added to the reaction mixture over 1 hour, and after the addition was completed, the mixture was further stirred for 1 hour.
Formation of hydrochloride of quinoline was observed during the reaction, but the reaction proceeded without being disturbed by stirring in a slurry state. The composition of the organic substance in the reaction solution was 2-trifluoromethylacrylic acid 1,1,1-trifluoro-2-hydroxy-2-trifluoromethyl-pentan-4-yl 95.9%, 1,1,1-trimethyl. Fluoro-2-trifluoromethyl-pentane-2,4-diol was 0.7%, and other impurities were found to be 3.4% in total. The resulting quinoline hydrochloride was removed by filtration, the resulting solution of the product was washed with 200 g of 5% hydrochloric acid and water, and the solvent toluene was distilled off to obtain 61.6 g of a crude organic material.
得られた粗有機物の精密蒸留を行い、沸点83〜88℃(10Torr=1.33kPa)の留分を分取したところ、40.2gの2−トリフルオロメチルアクリル酸1,1,1−トリフルオロ−2−ヒドロキシ−2−トリフルオロメチル−ペンタン−4−イルを得た。純度は98%であった。原料の1,1,1−トリフルオロ−2−トリフルオロメチル−ペンタン−2,4−ジオールからの収率は67%であった。
「比較例1−比較例5」
実施例と同様の反応を塩基の種類、溶媒の種類を変更して行った。反応の条件、結果を実施例1とともに表1に纏めた。
The resulting crude organic matter was subjected to precision distillation, and a fraction having a boiling point of 83 to 88 ° C. (10 Torr = 1.33 kPa) was collected. As a result, 40.2 g of 2-trifluoromethylacrylic acid 1,1,1-trimethyl was obtained. Fluoro-2-hydroxy-2-trifluoromethyl-pentan-4-yl was obtained. The purity was 98%. The yield from the raw material 1,1,1-trifluoro-2-trifluoromethyl-pentane-2,4-diol was 67%.
“Comparative Example 1—Comparative Example 5”
The same reaction as in the examples was performed by changing the type of base and the type of solvent. The reaction conditions and results are summarized in Table 1 together with Example 1.
[比較例1]
温度計、スターラーピースを備えた50mLの2つ口フラスコに1,1,1−トリフルオロ−2−トリフルオロメチル−ペンタン−2,4−ジオール5gとトリエチルアミン2.7g、トルエン20mLを加え、水冷した。
[Comparative Example 1]
To a 50 mL two-necked flask equipped with a thermometer and a stirrer piece was added 5 g of 1,1,1-trifluoro-2-trifluoromethyl-pentane-2,4-diol, 2.7 g of triethylamine, and 20 mL of toluene, followed by water cooling. did.
滴下ロートを使用して2−(トリフルオロメチル)アクリル酸クロリド4.2gを30分掛けて反応混合物に添加し、加え終わった後、更に1時間攪拌を行った。反応混合物のサンプリングを行い、有機物の組成を調べたところ、2−トリフルオロメチルアクリル酸1,1,1−トリフルオロ−2−ヒドロキシ−2−トリフルオロメチル−ペンタン−4−イル63%、1,1,1−トリフルオロ−2−トリフルオロメチル−ペンタン−2,4−ジオール4.3%であり、その他不純物が計32%確認された。 Using a dropping funnel, 4.2 g of 2- (trifluoromethyl) acrylic acid chloride was added to the reaction mixture over 30 minutes. After the addition was completed, the mixture was further stirred for 1 hour. The reaction mixture was sampled and the composition of the organic substance was examined. As a result, 1,1,1-trifluoro-2-hydroxy-2-trifluoromethyl-pentan-4-yl 2-trifluoromethylacrylate 63% 1,1-trifluoro-2-trifluoromethyl-pentane-2,4-diol, and other impurities were confirmed to be 32% in total.
[比較例2]
塩基を2,6−ジメチルピリジン2.8gとした以外は比較例1と同様な条件で反応を行った。結果を表1に示した。
[Comparative Example 2]
The reaction was carried out under the same conditions as in Comparative Example 1 except that the base was changed to 2.8 g of 2,6-dimethylpyridine. The results are shown in Table 1.
[比較例3]
塩基をピリジン2.1gとした以外は比較例1と同様な条件で反応を行った。2−トリフルオロメチルアクリル酸クロリドの滴下の途中で生成したピリジン塩酸塩は粘性の高い塊となり、攪拌は困難になった。滴下後、更に1時間攪拌を行った。結果を表1に示した。
[Comparative Example 3]
The reaction was performed under the same conditions as in Comparative Example 1 except that the base was changed to 2.1 g of pyridine. Pyridine hydrochloride formed during the dropwise addition of 2-trifluoromethylacrylic acid chloride became a highly viscous mass, and stirring became difficult. After the dropping, the mixture was further stirred for 1 hour. The results are shown in Table 1.
[比較例4]塩基をピリジン2.1g、溶媒をジイソプロピルエーテル20mLとした以外は比較例1と同様な条件で反応を行った。2−トリフルオロメチルアクリル酸クロリドの滴下の途中で、生成したピリジン塩酸塩は粘性の高い塊となり、攪拌は困難になったため反応を中止した。 [Comparative Example 4] The reaction was performed under the same conditions as in Comparative Example 1 except that 2.1 g of pyridine and 20 mL of diisopropyl ether were used as the solvent. During the dropwise addition of 2-trifluoromethylacrylic acid chloride, the produced pyridine hydrochloride became a highly viscous mass, and stirring was difficult, so the reaction was stopped.
[比較例5]
塩基を4−メチルピリジン2.5gとした以外は、比較例1と同様の条件で反応を行った。2−トリフルオロメチルアクリル酸クロリドの滴下の途中で、生成した4−メチルピリジン塩酸塩は粘性の高い塊となり、攪拌は困難になったため反応を中止した。
[Comparative Example 5]
The reaction was performed under the same conditions as in Comparative Example 1 except that the base was changed to 2.5 g of 4-methylpyridine. During the dropwise addition of 2-trifluoromethylacrylic acid chloride, the produced 4-methylpyridine hydrochloride became a highly viscous mass, and stirring was difficult, so the reaction was stopped.
[比較例6]
温度計、スターラーピース、ディーンシュターク還流器を備えた50mLの2つ口フラスコに1,1,1−トリフルオロ−2−トリフルオロメチル−ペンタン−2,4−ジオール25gとパラトルエンスルホン酸10.5gおよび2−(トリフルオロメチル)アクリル酸17.0gを加え、加熱還流を開始した。25時間後、反応混合物のサンプリングを行い、有機物の組成を調べたところ、2−トリフルオロメチルアクリル酸1,1,1−トリフルオロ−2−ヒドロキシ−2−トリフルオロメチル−ペンタン−4−イル52%、1,1,1−トリフルオロ−2−トリフルオロメチル−ペンタン−2,4−ジオール28.2%であり、その他不純物が19.8%確認された。
[Comparative Example 6]
In a 50 mL two-necked flask equipped with a thermometer, stirrer piece, and Dean-Stark refluxer, 25 g of 1,1,1-trifluoro-2-trifluoromethyl-pentane-2,4-diol and paratoluenesulfonic acid 5 g and 17.0 g of 2- (trifluoromethyl) acrylic acid were added and heating to reflux was started. After 25 hours, the reaction mixture was sampled and the composition of the organic matter was examined. 1,1,1-trifluoro-2-hydroxy-2-trifluoromethyl-pentan-4-yl 2-trifluoromethyl acrylate They were 52%, 1,1,1-trifluoro-2-trifluoromethyl-pentane-2,4-diol 28.2%, and other impurities 19.8% were confirmed.
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| JP7071675B1 (en) * | 2020-12-10 | 2022-05-19 | セントラル硝子株式会社 | Fluorine-containing polymer |
| JP7071674B1 (en) * | 2020-12-10 | 2022-05-19 | セントラル硝子株式会社 | Method for Producing Fluorine-Containing Polymer and Composition |
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| JP4667035B2 (en) * | 2003-12-26 | 2011-04-06 | セントラル硝子株式会社 | Process for producing 1,1-bis (trifluoromethyl) -1,3-diols acrylic ester |
| JP4359519B2 (en) * | 2004-02-17 | 2009-11-04 | セントラル硝子株式会社 | 1,1-bis (trifluoromethyl) -1,3-diols acrylic ester and method for producing the same |
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| US11597696B2 (en) | 2018-08-14 | 2023-03-07 | Central Glass Company, Limited | Method for purifying polymerizable fluoromonomer by distillation |
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