JP5380903B2 - Optical substrate manufacturing method - Google Patents
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- JP5380903B2 JP5380903B2 JP2008126779A JP2008126779A JP5380903B2 JP 5380903 B2 JP5380903 B2 JP 5380903B2 JP 2008126779 A JP2008126779 A JP 2008126779A JP 2008126779 A JP2008126779 A JP 2008126779A JP 5380903 B2 JP5380903 B2 JP 5380903B2
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/754—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL
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- Optical Integrated Circuits (AREA)
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Description
本発明は、電気配線及び光配線を有する光基板及びその製造方法に関する。 The present invention relates to an optical substrate having electrical wiring and optical wiring, and a method for manufacturing the same.
処理信号の高速化や電気ノイズの低減を始めとして、高速通信の障害となる課題解決に向けた有望な技術として、光信号を利用することで、高速の伝送速度で情報を送受信することが可能な光配線を用いた技術が注目を集めている。特に、光配線を用いた大容量光インターコネクションを実現するために、光配線の高密度化や低損失接続が重要であり、高性能かつ価格低減に向けての様々な技術検討が行われている。 As a promising technology for solving problems that hinder high-speed communication, such as increasing the speed of processing signals and reducing electrical noise, it is possible to send and receive information at high transmission speeds by using optical signals. The technology that uses simple optical wiring is attracting attention. In particular, in order to realize large-capacity optical interconnection using optical wiring, high density optical wiring and low loss connection are important, and various technical studies for high performance and cost reduction have been conducted. Yes.
光信号は、発光素子や光配線から出力されると拡散される。このため、光信号の接続部品はできるだけ近い間隔で接続する必要がある。また、光接続はその接続位置がずれると光信号が漏洩損失するため、正確に位置をあわせて接続する必要がある。また、光信号を伝播する光導波路は基板平面内に水平方向に設けられるため、受発光素子の受発光面に光信号を入出力するためには、光信号路を概略90°変換する必要がある。 The optical signal is diffused when output from the light emitting element or the optical wiring. For this reason, it is necessary to connect the optical signal connection components at intervals as close as possible. Further, since the optical signal leaks and loses when the connection position of the optical connection is shifted, it is necessary to accurately connect the positions. In addition, since the optical waveguide for propagating the optical signal is provided in the horizontal direction in the substrate plane, it is necessary to convert the optical signal path by approximately 90 ° in order to input / output the optical signal to / from the light emitting / receiving surface of the light emitting / receiving element. is there.
特に、受発光素子と光導波路の実装において、光導波路を橋桁を用いて固定実装し、光導波路と受発光素子の高さを合わせる手法が報告されている(非特許文献1)。しかしこの手法では、光導波路の実装信頼性が低下する問題、および光導波路の先端部の位置がずれて光接続効率が低下する問題がある。また、シリコン基板をエッチング加工し、エッチング部に受発光素子を埋め込み、その上に光導波路を実装する手法が報告されている(特許文献1)。しかしこの手法ではワイヤボンディングの高さ分、受発光素子と光導波路が離れてしまい、光接続効率が低下する問題がある。またエッチング加工したシリコン基板が高価となる問題もある。 In particular, in the mounting of the light receiving / emitting element and the optical waveguide, a method has been reported in which the optical waveguide is fixedly mounted using a bridge girder and the height of the optical waveguide and the light receiving / emitting element is matched (Non-Patent Document 1). However, this method has a problem that the mounting reliability of the optical waveguide is lowered and a problem that the position of the tip of the optical waveguide is shifted and the optical connection efficiency is lowered. In addition, a technique has been reported in which a silicon substrate is etched, a light emitting / receiving element is embedded in an etched portion, and an optical waveguide is mounted thereon (Patent Document 1). However, this method has a problem that the light receiving / emitting element and the optical waveguide are separated by the height of wire bonding, and the optical connection efficiency is lowered. Further, there is a problem that the etched silicon substrate becomes expensive.
本発明はかかる従来技術の欠点に鑑みてなされたもので、受発光素子と光導波路および光信号路変換部品が接続する構造を、安価かつ簡便なプロセスで提供する。さらに接続部の実装信頼性を向上させる。これにより低コストかつ接続特性のよい光基板とその製造方法を提供することを目的とする。 The present invention has been made in view of the drawbacks of the prior art, and provides a structure in which a light emitting / receiving element, an optical waveguide, and an optical signal path conversion component are connected by an inexpensive and simple process. Furthermore, the mounting reliability of the connecting portion is improved. Accordingly, it is an object of the present invention to provide an optical substrate with low cost and good connection characteristics and a method for manufacturing the same.
第1の発明は、絶縁樹脂層の少なくとも第一面上に金属層を有する絶縁樹脂フィルムの該金属層をパターニングして電気配線を形成する電気配線工程と、前記絶縁樹脂層をパターニングして、開口部を設ける絶縁樹脂層形成工程と、支持基材上に、絶縁樹脂フィルムを前記第一面を外側にして貼り合せる絶縁樹脂基板設置工程と、前記開口部に受発光面が前記第一面側となるように前記受発光素子を設置する受発光素子実装工程と、前記受発光素子と光学的に接続するように前記受発光面と光導波路の光入出力面を一致させて絶縁樹脂フィルム上に光導波路を設置する光導波路実装工程と、前記支持基材を除去する支持基材除去工程と、を有する光基板の製造方法である。 The first invention, and the electric wiring forming electrical wiring by patterning the metal layer of the insulating resin film having a least metal layer on the first surface even in the insulating resin layer, by patterning the insulating resin layer An insulating resin layer forming step of providing an opening, an insulating resin substrate installation step of bonding an insulating resin film on the support base with the first surface facing outside, and a light receiving and emitting surface in the opening of the first A light emitting / receiving element mounting step for installing the light emitting / receiving element so as to be on the surface side, and an insulating resin in which the light emitting / receiving surface and the light input / output surface of the optical waveguide are aligned to optically connect with the light receiving / emitting element It is the manufacturing method of the optical board | substrate which has an optical waveguide mounting process which installs an optical waveguide on a film, and a support base material removal process which removes the said support base material.
第2の発明は、感光性樹脂からなる絶縁樹脂層の少なくとも第一面上に金属層を有する絶縁樹脂フィルムの該絶縁樹脂層をフォトリソグラフィー法によりパターニングして開口部を形成する絶縁樹脂層形成工程と、支持基材上に、絶縁樹脂フィルムを前記第一面を外側にして貼り合せる絶縁樹脂基板設置工程と、前記金属層をパターニングして電気配線を形成する電気配線工程と、前記開口部に受発光素子の受発光面が前記第一面側となるように前記受発光素子を設置する受発光素子実装工程と、前記受発光素子と光学的に接続するように前記受発光部と光導波路の光入出力面を一致させて絶縁樹脂フィルム上に光導波路を設置する光導波路実装工程と、前記支持基材を除去する支持基材除去工程と、を有する光基板の製造方法である。 The second invention, photosensitive insulating resin layer to form the opening the insulating resin layer is patterned by photolithography to least well of made of a resin insulating resin layer insulating resin film having a metal layer on the first surface Forming step, insulating resin substrate installation step of bonding the insulating resin film on the supporting base material with the first surface outside, an electric wiring step of patterning the metal layer to form an electric wiring, and the opening A light emitting / receiving element mounting step for installing the light emitting / receiving element so that the light emitting / receiving surface of the light emitting / receiving element is on the first surface side, and the light emitting / receiving unit optically connected to the light emitting / receiving element An optical substrate manufacturing method comprising: an optical waveguide mounting step of installing an optical waveguide on an insulating resin film so that the light input / output surfaces of the optical waveguide are aligned; and a support base material removal step of removing the support base material .
第3の発明は、前記電気配線上に受発光素子のコントロールチップを実装するコントロールチップ実装工程を有することを特徴とする請求項1又は2に記載の光基板の製造方法である。
The third invention is the method of manufacturing an optical substrate according to claim 1 or 2 , further comprising a control chip mounting step of mounting a control chip of the light emitting / receiving element on the electric wiring.
第4の発明は、前記受発光面と、前記光入出力面との間隙に透明樹脂を充填させる透明樹脂充填工程を有することを特徴とする請求項1から3のいずれか記載の光基板の製造方法である。
A fourth invention, the light receiving and emitting surface, the light board according to any of claims 1 to 3, characterized in that it has the light input surface and the transparent resin filling step of filling a transparent resin into the gap It is a manufacturing method.
第5の発明は、絶縁樹脂層の少なくとも一部をモールド樹脂で覆うモールド樹脂形成工程を有することを特徴とする請求項1から3のいずれか記載の光基板の製造方法である。
5th invention has the mold resin formation process which covers at least one part of an insulating resin layer with mold resin, The manufacturing method of the optical substrate in any one of Claim 1 to 3 characterized by the above-mentioned.
本発明は、次のような効果がある。
第一に、受発光素子と絶縁樹脂の厚さを合わせ、絶縁樹脂層中に受発光素子を埋め込むことで、絶縁樹脂層の表面と受発光素子の受発光面の高さを合わせることが可能となる。これにより、光導波路を実装する場所を平坦とすることができ、光導波路の実装信頼性を向上し、実装難易度を簡易化する効果がある。
The present invention has the following effects.
First, it is possible to match the height of the surface of the insulating resin layer and the light emitting / receiving surface of the light emitting / receiving element by matching the thickness of the light emitting / receiving element and the insulating resin and embedding the light receiving / emitting element in the insulating resin layer. It becomes. Thereby, the place which mounts an optical waveguide can be made flat, and there exists an effect which improves the mounting reliability of an optical waveguide and simplifies the mounting difficulty.
第二に、絶縁樹脂層中に受発光素子を固定することで、受発光素子と電気配線の接続が容易となる。受発光素子全体が基板に固定されているため、ワイヤボンディング等の高温加熱条件下でも素子が移動することが無く、ワイヤバンプ形成も容易となる。これにより実装歩留まりが向上し製造コストを低減する効果がある。 Second, by fixing the light emitting / receiving element in the insulating resin layer, the connection between the light emitting / receiving element and the electric wiring becomes easy. Since the entire light emitting / receiving element is fixed to the substrate, the element does not move even under high-temperature heating conditions such as wire bonding, and wire bump formation is facilitated. This has the effect of improving the mounting yield and reducing the manufacturing cost.
第三に、受発光素子の受発光面と電気接続用パット面を、共に基板上方に設置することで、汎用受発光素子をそのまま使用することが可能となる。受発光面を下面、電気接続用パット面を上面とした受発光素子は価格が高く、製造コストが上昇する。汎用受発光素子を使用することで、製造コストを低減する効果がある。 Third, by installing both the light emitting / receiving surface of the light emitting / receiving element and the pad surface for electrical connection above the substrate, the general-purpose light emitting / receiving element can be used as it is. A light emitting / receiving element having the light emitting / receiving surface as the lower surface and the pad surface for electrical connection as the upper surface is expensive and the manufacturing cost increases. By using a general-purpose light emitting / receiving element, there is an effect of reducing the manufacturing cost.
本発明の光基板において、その断面図を図1に示す。
本発明の光基板110は、第1面に金属層がパターニングされた電気配線21を有する絶縁樹脂層10を備えている。絶縁樹脂層には開口部が形成され、該開口部に受発光素子60がその受発光部61を外面、つまり電気配線側に向けてはめ込まれて設置されている。受発光面上には光信号を受発光素子と光配線との間で入出力するための光導波路50が配置されている。
A cross-sectional view of the optical substrate of the present invention is shown in FIG.
The optical substrate 110 of the present invention includes an insulating resin layer 10 having an electric wiring 21 having a metal layer patterned on a first surface. An opening is formed in the insulating resin layer, and the light emitting / receiving element 60 is installed in the opening so that the light receiving / emitting element 61 is fitted toward the outer surface, that is, the electric wiring side. An optical waveguide 50 for inputting / outputting optical signals between the light receiving / emitting element and the optical wiring is disposed on the light receiving / emitting surface.
絶縁樹脂層10は、任意の有機材料及び無機材料を選択することができる。具体的にはアクリル材料、シリコーン材料、シリコンウェハ、金属材料、硝子材料、プリプレグ、積層板材料などが使用できる。さらに、感光性樹脂を用いてフォトリソグラフィー法により絶縁樹脂層を形成することで、高精度にパターニングすることが可能であり、このため開口部形状を受発光素子に一致させて位置精度良く設置できるためである。これにより受発光素子埋め込み部を高精度に造形することが可能となり、外形突き当て位置合わせにより受発光素子を実装することができる。感光性樹脂の例としては、感光性ポリイミド樹脂、感光性アクリル樹脂、感光性エポキシ樹脂、またこれらを重合させた感光性エポキシアクリレート樹脂などを用いることができる。 The insulating resin layer 10 can select any organic material and inorganic material. Specifically, acrylic materials, silicone materials, silicon wafers, metal materials, glass materials, prepregs, laminated plate materials, and the like can be used. Furthermore, it is possible to perform patterning with high accuracy by forming an insulating resin layer by a photolithography method using a photosensitive resin. Therefore, the opening shape can be matched with the light emitting / receiving element and can be installed with high positional accuracy. Because. As a result, the light receiving / emitting element embedding part can be shaped with high accuracy, and the light receiving / emitting element can be mounted by aligning the outer shape. Examples of the photosensitive resin include a photosensitive polyimide resin, a photosensitive acrylic resin, a photosensitive epoxy resin, and a photosensitive epoxy acrylate resin obtained by polymerizing these.
本願発明では後述のように支持基板を用いた工程により光基板を作製することで、絶縁樹脂層を貫通する開口部を設け、該開口部に受発光素子を設置している。このため絶縁樹脂層を受発光素子の厚みと略同一の膜厚まで薄くすることが可能であり、高密度な光基板を実現することができる。 In the present invention, as described later, an optical substrate is manufactured by a process using a support substrate to provide an opening that penetrates the insulating resin layer, and a light emitting / receiving element is installed in the opening. For this reason, the insulating resin layer can be thinned to a thickness substantially equal to the thickness of the light emitting / receiving element, and a high-density optical substrate can be realized.
光導波路50には、コアと、コアの外周を覆うクラッドとで構成される一般的な光配線光導波路を用いる事ができる。材質として、カーボネート系、エポキシ系、アクリル系、イミド系、ウレタン系、ノルボルネン系などの高分子材料および石英などの無機材料を用いる事ができる。伝送モードとして、シングルモード、マルチモード、シングルマルチ混合配線などの構成をとることができる。また、光導波路は単層であっても複数層積層されているものでも良い。 As the optical waveguide 50, a general optical wiring optical waveguide composed of a core and a clad covering the outer periphery of the core can be used. As the material, polymer materials such as carbonate, epoxy, acrylic, imide, urethane, norbornene, and inorganic materials such as quartz can be used. As the transmission mode, a single mode, a multi mode, a single multi mixed wiring, or the like can be employed. Further, the optical waveguide may be a single layer or a laminate of a plurality of layers.
図1の光基板では、光導波路の受発光素子側の端面が45度にカットされ、光信号を反射するミラー面が形成されている。あるいは端面に金属層を形成してミラーを構成しても良い。これにより、モールド樹脂で覆った際のモールド樹脂による光信号の漏洩を防ぐ事ができる。受発光素子の受発光部61と、光導波路端面の光入出力面を一致させて配置することにより、両者は光学的に接続されている。 In the optical substrate of FIG. 1, the end surface of the optical waveguide on the side of the light receiving / emitting element is cut at 45 degrees to form a mirror surface that reflects an optical signal. Alternatively, a mirror may be formed by forming a metal layer on the end face. Thereby, the leakage of the optical signal by mold resin at the time of covering with mold resin can be prevented. By arranging the light emitting / receiving section 61 of the light emitting / receiving element and the light input / output surface of the end face of the optical waveguide to coincide with each other, both are optically connected.
受発光素子60には、単チャンネルもしくは複数チャンネルの光素子を用いる事ができる。具体的には、端面発光型LD、面発光型LD、面受光型PDなどを使用する事ができる。受発光素子60の実装は、ワイヤボンディングなどの方法を取る事ができる。 As the light emitting / receiving element 60, a single channel or a plurality of channels of optical elements can be used. Specifically, an edge-emitting LD, a surface-emitting LD, a surface-receiving PD, or the like can be used. The light emitting / receiving element 60 can be mounted by wire bonding or the like.
本発明では、絶縁樹脂層中に受発光素子を固定することで、受発光素子と電気配線の接続が容易となる。受発光素子全体が基板に固定されているため、ワイヤボンディング等の高温加熱条件下でも素子が移動することが無く、ワイヤバンプ形成も容易となるためである。これにより実装歩留まりが向上し製造コストを低減することができる。 In the present invention, the light emitting / receiving element is fixed in the insulating resin layer, thereby facilitating connection between the light emitting / receiving element and the electric wiring. This is because since the entire light receiving and emitting element is fixed to the substrate, the element does not move even under high-temperature heating conditions such as wire bonding, and wire bump formation is facilitated. Thereby, the mounting yield can be improved and the manufacturing cost can be reduced.
また、必要に応じて受発光素子60の受発光面と光導波路50の光入出力面の間に透明樹脂80を充填する事ができる。透明樹脂80には一般に用いられている高分子材料を用いる事ができる。具体的には、カーボネート材料、エポキシ材料、アクリル材料、イミド材料、ウレタン材料、シリコーン材料、無機フィラー混入有機材料などが使用できるが、これに限定されるものではない。また、界面の屈折率差を無くすため、光導波路50と同等の屈折率を持った光学樹脂を用いる事が望ましい。これにより受発光素子と光導波路間の屈折率不整合を改善し、光接続特性を向上し、環境信頼性を改善することができる。 In addition, a transparent resin 80 can be filled between the light emitting / receiving surface of the light emitting / receiving element 60 and the light input / output surface of the optical waveguide 50 as necessary. As the transparent resin 80, a generally used polymer material can be used. Specifically, a carbonate material, an epoxy material, an acrylic material, an imide material, a urethane material, a silicone material, an organic material mixed with an inorganic filler, and the like can be used. However, the material is not limited thereto. It is desirable to use an optical resin having a refractive index equivalent to that of the optical waveguide 50 in order to eliminate the difference in refractive index at the interface. Thereby, the refractive index mismatch between the light emitting / receiving element and the optical waveguide can be improved, the optical connection characteristics can be improved, and the environmental reliability can be improved.
さらに必要に応じて、銅箔20上に、受発光素子60のコントロールチップ40を実装することができる。コントロールチップの近傍で光配線に接続することができ、光電変換された電気信号を基板内部を通さずに受発光素子とコントロールチップとを接続することができるので、電気配線による高周波信号の損失を抑えることができる。コントロールチップ40の実装は、ダイボンディング、ワイヤボンディング、フリップチップ実装などの方法を取る事ができる。 Furthermore, the control chip 40 of the light emitting / receiving element 60 can be mounted on the copper foil 20 as necessary. It can be connected to the optical wiring in the vicinity of the control chip, and the light emitting / receiving element and the control chip can be connected without passing the photoelectric signal through the inside of the substrate. Can be suppressed. The control chip 40 can be mounted by die bonding, wire bonding, flip chip mounting, or the like.
光基板の電気配線が形成された第一面上の全体又は光導波路及び受発光素子を含む任意の部分をモールド樹脂70によりモールドすることで、基板および実装部品の環境信頼性を高める事ができる。その場合、受発光素子60と光導波路50の界面にモールド樹脂が入る事を防ぐため、あらかじめ前記透明樹脂80を充填することが望ましい。 By molding the entire first surface on which the electrical wiring of the optical substrate is formed or an arbitrary portion including the optical waveguide and the light receiving and emitting elements with the molding resin 70, it is possible to improve the environmental reliability of the substrate and the mounted components. . In that case, in order to prevent mold resin from entering the interface between the light emitting / receiving element 60 and the optical waveguide 50, it is desirable to fill the transparent resin 80 in advance.
光基板下面は平坦に形成されているため、高精度にコネクタを設置することができる。具体的には、LGA、PGA、小型電気コネクタ等を設置することができる。図1では半田バンプ90を介して配線基板110と接続した例を示している。 Since the lower surface of the optical substrate is formed flat, the connector can be installed with high accuracy. Specifically, an LGA, a PGA, a small electrical connector, or the like can be installed. FIG. 1 shows an example in which the wiring board 110 is connected via the solder bump 90.
本発明の光基板は、多量の情報入出力を伴う電子機器、あるいは光部品に有効である。光基板を搭載した電子機器の具体例としては、ノートパソコンや業務用大型コンピュータを含む様々な電子計算機、家庭用ゲーム機、録画再生機、テレビ、あるいは、ルータなどの大きな情報の入出力を伴う情報・通信機器に用いることで、ノイズの影響を受けずに効率的に信号の送受信が可能となるために有効である。また、光基板1を搭載する光部品の具体例としては、光インターコネクション(光電気配線板)、光コネクタ、光カプラ、光結合器、光スイッチ、光スプリッタ、あるいは、光送受信機などの、光部品にも搭載することで、同様の効果を期待することができる。 The optical substrate of the present invention is effective for electronic devices or optical components that involve a large amount of information input / output. Specific examples of electronic devices equipped with optical substrates include input and output of large information such as various electronic computers including notebook computers and large commercial computers, home game machines, recording / playback machines, televisions, and routers. Use in information / communication equipment is effective because it enables efficient signal transmission and reception without being affected by noise. In addition, specific examples of the optical component on which the optical substrate 1 is mounted include an optical interconnection (photoelectric wiring board), an optical connector, an optical coupler, an optical coupler, an optical switch, an optical splitter, or an optical transceiver, The same effect can be expected by mounting on optical components.
次に、本発明の光基板の製造方法について説明する。
まず片面に銅箔等の金属層が形成された絶縁樹脂フィルムの絶縁樹脂層及び金属層を相前後してパターニングし、電気配線の形成と、受発光素子を設置する開口部やバイアホール等の絶縁樹脂層除去部分の除去を行う。
Next, the manufacturing method of the optical board | substrate of this invention is demonstrated.
First, the insulating resin layer and metal layer of an insulating resin film having a metal layer such as copper foil formed on one side are patterned before and after the formation of electrical wiring, and openings and via holes for installing light emitting and receiving elements. The insulating resin layer removed portion is removed.
上記工程の具体的な方法としては、まず金属層をパターニングし、配線パターンや実装用パットを形成する。金属層のパターニング方法としては、公知の金属加工方法を用いることが可能である。具体的には、配線パターン、実装用パットに合わせてレジストパターンを形成し、エッチングにより配線パターンを形成する。また必要に応じてNi,Auメッキやソルダーレジスト印刷を行っても良い。次にレーザ加工等の絶縁樹脂加工方法用いて受発光素子を設置する開口部やバイアホール等の絶縁樹脂層除去部分を除去することができる。次に、パターニングされた絶縁樹脂フィルムを、電気配線が形成された面を外側にして支持基材上に張り合わせる。 As a specific method of the above steps, first, a metal layer is patterned to form a wiring pattern and a mounting pad. As a patterning method for the metal layer, a known metal processing method can be used. Specifically, a resist pattern is formed according to the wiring pattern and the mounting pad, and the wiring pattern is formed by etching. Further, if necessary, Ni, Au plating or solder resist printing may be performed. Next, an insulating resin layer removing portion such as an opening or a via hole in which the light emitting and receiving element is installed can be removed by using an insulating resin processing method such as laser processing. Next, the patterned insulating resin film is pasted on the support substrate with the surface on which the electrical wiring is formed facing outside.
また、絶縁樹脂層を感光性樹脂で形成する場合には、フォトリソグラフィー工程として、感光性樹脂のパターンに対応するマスクを用いて露光し、現像を行って絶縁樹脂層をパターニングして開口部等を形成することができる。次に電気配線形成面を表として支持基材上にラミネートした後、前述の方法で金属層のパターニング等を行うことができる。 In the case where the insulating resin layer is formed of a photosensitive resin, as a photolithography process, exposure is performed using a mask corresponding to the pattern of the photosensitive resin, development is performed, the insulating resin layer is patterned, and openings are formed. Can be formed. Next, after laminating on the supporting substrate with the electric wiring forming surface as a table, the metal layer can be patterned by the above-described method.
上述の各工程は適宜、相前後しても良い。支持基材と絶縁樹脂フィルムの張り合わせには一般的なラミネート方法を用いることができる。支持基材には、一般に用いられている材料を用いることができる。具体的には、カーボネート材料、エポキシ材料、アクリル材料、イミド材料、ウレタン材料、シリコーン材料、無機フィラー混入有機材料などが使用できるが、これに限定されるものではない。また、支持基材上に紫外線剥離型の粘着層を設けることもできる。支持基材上で各プロセスを行う事で、光基板下面を平坦とすることができる。これにより光導波路の実装難易度を簡易とし、実装信頼性を向上させることができることから、光基板下面に高精度にコネクタを設置することができる。具体的には、LGA、PGA、小型電気コネクタ等を設置することができる。また、支持基材により絶縁樹脂層が保持固定されるため、絶縁樹脂層の膜厚が薄い場合でも安定して光基板を実装することができる。 Each of the above steps may be appropriately combined. A general laminating method can be used for laminating the supporting substrate and the insulating resin film. A commonly used material can be used for the supporting substrate. Specifically, a carbonate material, an epoxy material, an acrylic material, an imide material, a urethane material, a silicone material, an organic material mixed with an inorganic filler, and the like can be used. However, the material is not limited thereto. Further, an ultraviolet peelable pressure-sensitive adhesive layer can be provided on the support substrate. By performing each process on the supporting base material, the lower surface of the optical substrate can be made flat. Accordingly, the mounting difficulty of the optical waveguide can be simplified and the mounting reliability can be improved, so that the connector can be installed with high accuracy on the lower surface of the optical substrate. Specifically, an LGA, a PGA, a small electrical connector, or the like can be installed. Further, since the insulating resin layer is held and fixed by the support base material, the optical substrate can be stably mounted even when the insulating resin layer is thin.
次に、絶縁樹脂層を除去した受発光素子設置部分に受発光素子を実装する。前記絶縁樹脂層の膜厚が受発光素子の厚みと略同一となるようにすることで、光導波路との接続部における損失を最大限少なくすることができる。絶縁樹脂層の膜厚が受発光素子の厚みと略同一であれば、すなわち受発光素子の受発光面の少なくとも一部を光導波路の光入出力部と接触させて光電変換させることができるからである。 Next, the light emitting / receiving element is mounted on the light emitting / receiving element installation portion from which the insulating resin layer has been removed. By making the thickness of the insulating resin layer substantially the same as the thickness of the light receiving and emitting element, it is possible to minimize loss at the connection portion with the optical waveguide. If the thickness of the insulating resin layer is substantially the same as the thickness of the light emitting / receiving element, that is, at least a part of the light receiving / emitting surface of the light receiving / emitting element can be brought into contact with the light input / output portion of the optical waveguide for photoelectric conversion. It is.
また受発光素子の実装工程と相前後して、必要に応じて受発光素子のコントロールチップを実装しても良い。この場合は電気配線上に、受発光素子のコントロールチップを実装することができる。コントロールチップ40の実装は、ワイヤボンディング、フリップチップ実装などの方法を取る事ができる。 Further, a control chip for the light emitting / receiving element may be mounted as necessary before or after the mounting process of the light receiving / emitting element. In this case, the control chip of the light emitting / receiving element can be mounted on the electric wiring. The control chip 40 can be mounted by wire bonding or flip chip mounting.
次に、光導波路の光入出力部と受発光素子の受発光部が接続するように、光導波路を実装する。必要に応じて、受発光素子と光導波路との界面に光学接着剤を充填しても良い。受発光素子と光導波路の接続部分での光学損失を低減することができる。 Next, the optical waveguide is mounted so that the light input / output unit of the optical waveguide and the light emitting / receiving unit of the light emitting / receiving element are connected. If necessary, an optical adhesive may be filled in the interface between the light emitting / receiving element and the optical waveguide. Optical loss at the connection portion between the light emitting / receiving element and the optical waveguide can be reduced.
次に基板全体もしくは任意の箇所をモールド樹脂でモールドすることができる。この場合にはモールド工程の後、最後にキャリアフィルムを剥離して、本発明の光基板とすることができる。なお、支持基板に紫外線剥離型の粘着層を設けた場合には、紫外線照射により支持基板を剥離することができる。 Next, the entire substrate or an arbitrary portion can be molded with a molding resin. In this case, after the molding step, the carrier film is finally peeled off to obtain the optical substrate of the present invention. Note that in the case where an ultraviolet peelable adhesive layer is provided on the support substrate, the support substrate can be peeled off by ultraviolet irradiation.
以下に本発明に係る光基板の製造方法の具体例を下記実施例をもって示すが、本発明はこれらに限定解釈されるものではない。 Specific examples of the method for producing an optical substrate according to the present invention are shown below with reference to the following examples, but the present invention is not construed as being limited thereto.
<実施例1>
まず東レ製片面銅箔ポリイミド基材(銅箔12μm厚、ポリイミド350μm厚)の銅箔上にエッチングレジストパターン25を形成し、銅箔をエッチングすることで、パターニングされた銅箔20を得た(図2b)。
<Example 1>
First, a patterned copper foil 20 was obtained by forming an etching resist pattern 25 on a copper foil of a Toray single-sided copper foil polyimide substrate (copper foil 12 μm thickness, polyimide 350 μm thickness) and etching the copper foil ( FIG. 2b).
次に炭酸ガスレーザーにて絶縁樹脂10を加工することで、パターニングされた絶縁樹脂層を得た(図2c)。 Next, the insulating resin 10 was processed with a carbon dioxide laser to obtain a patterned insulating resin layer (FIG. 2c).
次に、絶縁樹脂層10を支持基材30(PET:東洋インキ製)にラミネートした(図2d)。 Next, the insulating resin layer 10 was laminated on the support substrate 30 (PET: manufactured by Toyo Ink) (FIG. 2d).
次に、銅箔20上にコントロールチップ40(VCSELドライバーチップ350um厚:HELIX AG製)を実装し、ワイヤボンディングにより電気接続を行った(図2e)。 Next, the control chip 40 (VCSEL driver chip 350 μm thickness: manufactured by HELIX AG) was mounted on the copper foil 20, and electrical connection was performed by wire bonding (FIG. 2e).
次に、パターニングにより絶縁樹脂が除去されたキャリアフィルム上に受発光素子60(4ch VCSEL:ULM製)を実装した(図2f)。設置位置合わせは、絶縁樹脂層11の外形を利用した突き当て位置合わせを行った。 Next, the light emitting / receiving element 60 (4ch VCSEL: manufactured by ULM) was mounted on the carrier film from which the insulating resin was removed by patterning (FIG. 2f). The installation position alignment performed abutment alignment using the outer shape of the insulating resin layer 11.
次に、絶縁樹脂層10および受発光素子61上に光導波路フィルム50(マルチモードエポキシ系光導波路フィルム:NTT−AT製)を設置した(図2g)。設置固定にはエポキシ系屈折率整合光学接着剤:NTT−AT製)を使用した。 Next, an optical waveguide film 50 (multimode epoxy optical waveguide film: manufactured by NTT-AT) was placed on the insulating resin layer 10 and the light emitting / receiving element 61 (FIG. 2g). For installation and fixing, an epoxy-based refractive index matching optical adhesive (manufactured by NTT-AT) was used.
次に、絶縁樹脂層10上をモールド樹脂70で被覆した(図2h)。 Next, the insulating resin layer 10 was covered with a mold resin 70 (FIG. 2h).
次に、支持基材30を剥離し、光基板100を製造した(図2i)。 Next, the support base material 30 was peeled off to manufacture the optical substrate 100 (FIG. 2i).
作製した光基板を光学特性評価した結果、各チャンネルで0.9〜1.1mWの安定した光出力を確認できた。 As a result of evaluating the optical characteristics of the produced optical substrate, a stable light output of 0.9 to 1.1 mW was confirmed in each channel.
<実施例2>
まず感光性絶縁材料として、ビスフェノールA型エポキシアクリレート(リポキシVR−90:昭和高分子)52重量部と無水フタル酸15重量部をプロピレングリコールモノメチルエーテルアセテート溶媒中で110℃30分攪拌してアルカリ現像型感光性絶縁樹脂ワニス原料を調製した。更に、前記アルカリ現像型感光性絶縁樹脂ワニス原料を50重量部、脂環式エポキシ類化合物(EHPE3150:ダイセル化学)17重量部、光硬化型エポキシ樹脂(サイクロマーM100:ダイセル化学)30重量部、光開始剤(LucirinTPO:BASF)3重量部に、プロピレングリコールモノメチルエーテルアセテート溶剤を加えて連続式横型サンドミルにて約3時間分散し、アルカリ現像型感光性絶縁樹脂ワニスを調製した。
<Example 2>
First, as a photosensitive insulating material, 52 parts by weight of bisphenol A type epoxy acrylate (Lipoxy VR-90: Showa High Polymer) and 15 parts by weight of phthalic anhydride are stirred in a propylene glycol monomethyl ether acetate solvent at 110 ° C. for 30 minutes for alkali development. Type photosensitive insulating resin varnish raw material was prepared. Furthermore, 50 parts by weight of the alkali-developable photosensitive insulating resin varnish raw material, 17 parts by weight of an alicyclic epoxy compound (EHPE3150: Daicel Chemical), 30 parts by weight of a photocurable epoxy resin (Cyclomer M100: Daicel Chemical), Propylene glycol monomethyl ether acetate solvent was added to 3 parts by weight of a photoinitiator (LucirinTPO: BASF) and dispersed in a continuous horizontal sand mill for about 3 hours to prepare an alkali development type photosensitive insulating resin varnish.
次に銅箔上に前記アルカリ現像型感光性絶縁樹脂ワニスをスリットコーターにて塗布し、70℃20分乾燥して、約350μm厚の半硬化状態の感光性絶縁樹脂層を形成し、片側銅箔付き感光性絶縁樹脂を製造した(図3a)。 Next, the alkali development type photosensitive insulating resin varnish is applied on a copper foil with a slit coater and dried at 70 ° C. for 20 minutes to form a semi-cured photosensitive insulating resin layer having a thickness of about 350 μm. A photosensitive insulating resin with a foil was produced (FIG. 3a).
次に感光性絶縁樹脂層10にフォトマスクを密着させ、超高圧水銀灯により500mJ/cm2で露光、紫外線硬化させた。その後約5%有機アミン系アルカリ水溶液にて現像、水洗し、90℃オーブンで十分乾燥させることで、パターニングされた絶縁樹脂層を得た(図3b)。 Next, a photomask was brought into close contact with the photosensitive insulating resin layer 10, exposed to 500 mJ / cm 2 with an ultra-high pressure mercury lamp, and cured with ultraviolet rays. Thereafter, development with about 5% organic amine alkali aqueous solution, washing with water, and sufficient drying in a 90 ° C. oven were performed to obtain a patterned insulating resin layer (FIG. 3 b).
次に、絶縁樹脂層10を支持基材30(PET:東洋インキ製)にラミネートした(図3c)。 Next, the insulating resin layer 10 was laminated on the support substrate 30 (PET: manufactured by Toyo Ink) (FIG. 3c).
次に、銅箔20上にエッチングレジストパターン25を形成し、銅箔をエッチングすることで、パターニングされた銅箔21を得た(図3d)。 Next, an etching resist pattern 25 was formed on the copper foil 20, and the copper foil was etched to obtain a patterned copper foil 21 (FIG. 3d).
次に、銅箔20上にコントロールチップ40(VCSELドライバーチップ:HELIX AG製)を実装し、ワイヤボンディングにより電気接続を行った(図3e)。 Next, a control chip 40 (VCSEL driver chip: manufactured by HELIX AG) was mounted on the copper foil 20, and electrical connection was performed by wire bonding (FIG. 3e).
次に、パターニングにより絶縁樹脂が除去されたキャリアフィルム上に受発光素子60(4ch VCSEL:ULM製)を実装した(図3f)。設置位置合わせは、絶縁樹脂層11の外形を利用した突き当て位置合わせを行った。 Next, the light emitting / receiving element 60 (4ch VCSEL: manufactured by ULM) was mounted on the carrier film from which the insulating resin was removed by patterning (FIG. 3f). The installation position alignment performed abutment alignment using the outer shape of the insulating resin layer 11.
次に、絶縁樹脂層10および受発光素子60上に光導波路フィルム50(マルチモードエポキシ系光導波路フィルム:NTT−AT製)を設置した(図3g)。設置固定にはエポキシ系屈折率整合光学接着剤:NTT−AT製)を使用した。 Next, an optical waveguide film 50 (multimode epoxy optical waveguide film: manufactured by NTT-AT) was placed on the insulating resin layer 10 and the light emitting / receiving element 60 (FIG. 3g). For installation and fixing, an epoxy-based refractive index matching optical adhesive (manufactured by NTT-AT) was used.
次に、絶縁樹脂層10上をモールド樹脂70で被覆した(図3h)。 Next, the insulating resin layer 10 was covered with a mold resin 70 (FIG. 3h).
次に、支持基材30を剥離し、光基板100を製造した(図3i)。 Next, the support base material 30 was peeled off to manufacture the optical substrate 100 (FIG. 3i).
作製した光基板を光学特性評価した結果、各チャンネルで0.9〜1.1mWの安定した光出力を確認できた。 As a result of evaluating the optical characteristics of the produced optical substrate, a stable light output of 0.9 to 1.1 mW was confirmed in each channel.
10 絶縁樹脂層
20 金属層(銅箔)
30 支持基材
40 コントロールチップ
50 光導波路
60 受発光素子
61 受発光部
70 モールド樹脂
80 透明樹脂
90 半田バンプ
100 光基板
110 配線基板
10 Insulating resin layer 20 Metal layer (copper foil)
DESCRIPTION OF SYMBOLS 30 Support base material 40 Control chip 50 Optical waveguide 60 Light emitting / receiving element 61 Light receiving / emitting part 70 Mold resin 80 Transparent resin 90 Solder bump 100 Optical board 110 Wiring board
Claims (5)
前記絶縁樹脂層をパターニングして、開口部を設ける絶縁樹脂層形成工程と、
支持基材上に、絶縁樹脂フィルムを前記第一面を外側にして貼り合せる絶縁樹脂基板設置工程と、
前記開口部に受発光面が前記第一面側となるように前記受発光素子を設置する受発光素子実装工程と、
前記受発光素子と光学的に接続するように前記受発光面と光導波路の光入出力面を一致させて絶縁樹脂フィルム上に光導波路を設置する光導波路実装工程と、
前記支持基材を除去する支持基材除去工程と、
を有する光基板の製造方法。 And the electric wiring forming electrical wiring by patterning the metal layer of the insulating resin film having a least metal layer on the first surface even in the insulating resin layer,
An insulating resin layer forming step of patterning the insulating resin layer to provide an opening;
An insulating resin substrate installation step of bonding the insulating resin film on the support base with the first surface facing outside; and
A light emitting / receiving element mounting step of installing the light emitting / receiving element so that the light receiving / emitting surface is on the first surface side in the opening;
An optical waveguide mounting step of installing an optical waveguide on an insulating resin film by matching the light input / output surface of the optical waveguide and the light input / output surface of the optical waveguide so as to be optically connected to the light emitting / receiving element;
A supporting substrate removing step of removing the supporting substrate;
The manufacturing method of the optical board | substrate which has this.
支持基材上に、絶縁樹脂フィルムを前記第一面を外側にして貼り合せる絶縁樹脂基板設置工程と、
前記金属層をパターニングして電気配線を形成する電気配線工程と、
前記開口部に受発光素子の受発光面が前記第一面側となるように前記受発光素子を設置する受発光素子実装工程と、
前記受発光素子と光学的に接続するように前記受発光部と光導波路の光入出力面を一致させて絶縁樹脂フィルム上に光導波路を設置する光導波路実装工程と、
前記支持基材を除去する支持基材除去工程と、
を有する光基板の製造方法。 An insulating resin layer forming step of forming an opening the insulating resin layer of the insulating resin film also has a metal layer on the first surface and less of a photosensitive resin insulating resin layer is patterned by photolithography,
An insulating resin substrate installation step of bonding the insulating resin film on the support base with the first surface facing outside; and
An electrical wiring step of patterning the metal layer to form electrical wiring;
A light emitting / receiving element mounting step of installing the light emitting / receiving element such that the light receiving / emitting surface of the light emitting / receiving element is on the first surface side in the opening;
An optical waveguide mounting step of installing an optical waveguide on an insulating resin film by matching the light input / output surface of the optical waveguide with the light emitting / receiving portion so as to be optically connected to the light emitting / receiving element;
A supporting substrate removing step of removing the supporting substrate;
The manufacturing method of the optical board | substrate which has this.
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| JP2007256298A (en) * | 2004-03-19 | 2007-10-04 | Nec Corp | Optical module and method for manufacturing the same |
| US8358892B2 (en) * | 2005-02-28 | 2013-01-22 | Nec Corporation | Connection structure of two-dimensional array optical element and optical circuit |
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