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JP5447014B2 - Crystal growth equipment - Google Patents
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JP5447014B2 - Crystal growth equipment - Google Patents

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JP5447014B2
JP5447014B2 JP2010050810A JP2010050810A JP5447014B2 JP 5447014 B2 JP5447014 B2 JP 5447014B2 JP 2010050810 A JP2010050810 A JP 2010050810A JP 2010050810 A JP2010050810 A JP 2010050810A JP 5447014 B2 JP5447014 B2 JP 5447014B2
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drive shaft
reaction vessel
melt
axial direction
crystal growth
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JP2011184234A (en
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泰彦 福地
一朗 中本
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IHI Corp
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Description

本発明は、結晶成長装置に関するものである。   The present invention relates to a crystal growth apparatus.

次世代半導体材料として期待されている窒化ガリウム(GaN)の製法の一つとしては、数MPaの高圧窒素雰囲気中、800℃〜900℃のNa/Ga融液に種基板を浸漬させ、その種基板上にGaN結晶を成長させる結晶成長方法(所謂、フラックス法)が知られている。
下記特許文献1には、フラックス法において、余分な核発生を抑え、大型で高品質のGaN結晶を得るべく、融液を攪拌する攪拌装置を備える結晶成長装置が開示されている。
One method for producing gallium nitride (GaN) that is expected as a next-generation semiconductor material is to immerse a seed substrate in a Na / Ga melt at 800 ° C. to 900 ° C. in a high-pressure nitrogen atmosphere of several MPa, A crystal growth method (so-called flux method) for growing a GaN crystal on a substrate is known.
Patent Document 1 below discloses a crystal growth apparatus including an agitator for agitating a melt in order to suppress excessive nucleation and obtain a large and high-quality GaN crystal in a flux method.

特開2005−247615号公報JP-A-2005-247615

しかしながら、上述したような従来技術には、以下のような問題が存在する。
上記結晶成長装置においては、融液及び種基板を保持する反応容器を断熱容器、圧力容器で囲って、高温高圧状態を維持する構成が一般的である。この構成で攪拌装置を設ける場合、反応容器に攪拌用の回転駆動軸を挿通させる孔部を形成しなければならない。そうすると、反応容器内部が高温で、且つ、駆動軸が回転駆動するために、その孔部をガスシール材等で封止することが難しく、孔部と駆動軸との間に生じた隙間から高温ガスが漏れて反応容器内の温度分布が不均一となったり、その隙間から、不純物(例えば、断熱容器の断熱材に含まれるバインダ等の成分がアウトガスとなったもの)が反応容器内に混入したり、蒸発したフラックス(Na)が反応容器内から外部へ漏出することで、融液成分、反応容器内のNa/Gaの比率が変化してしまう虞がある。
However, the following problems exist in the conventional technology as described above.
The crystal growth apparatus generally has a configuration in which a reaction vessel holding a melt and a seed substrate is surrounded by a heat insulating vessel and a pressure vessel to maintain a high temperature and high pressure state. When a stirrer is provided in this configuration, it is necessary to form a hole through which the rotary drive shaft for stirring is inserted in the reaction vessel. Then, since the inside of the reaction vessel is at a high temperature and the drive shaft is driven to rotate, it is difficult to seal the hole with a gas seal material or the like, and a high temperature is generated from the gap formed between the hole and the drive shaft. Gas leaks and the temperature distribution in the reaction vessel becomes non-uniform, or impurities (for example, components such as binders contained in the heat insulating material of the heat insulation vessel become outgas) enter the reaction vessel through the gap. Or the evaporated flux (Na) leaks out of the reaction vessel to the outside, so that the melt component and the ratio of Na / Ga in the reaction vessel may change.

本発明は、上記問題点に鑑みてなされたものであり、反応容器の気密を保ちつつ融液を攪拌し、大型で高品質の結晶を得る結晶成長装置の提供を目的とする。   The present invention has been made in view of the above problems, and an object of the present invention is to provide a crystal growth apparatus that stirs the melt while keeping the reaction vessel airtight, and obtains large, high-quality crystals.

上記の課題を解決するために、本発明は、加熱加圧雰囲気下で原料ガスと融液とを反応させて該融液に浸漬された種基板上に結晶を成長させる反応容器と、上記反応容器を挿通して設けられた駆動軸を駆動させ上記融液を攪拌する攪拌装置と、を有する結晶成長装置であって、上記攪拌装置は、上記駆動軸を軸方向に直動駆動させる駆動装置と、上記軸方向において伸縮自在とされ、一端部が上記駆動軸に気密に固定されて他端部が上記反応容器に形成された上記駆動軸が挿通する孔部を気密に囲って上記反応容器に固定されている伸縮管と、を有するという構成を採用する。
この構成を採用することによって、本発明では、駆動軸を軸方向に直動駆動させると、伸縮管がその直動駆動に伴って伸縮するので、伸縮管の一端部が、擦動等することなく駆動軸に気密に固定される。そして、伸縮管の他端部は、駆動軸が挿通される孔部を気密に囲って反応容器に固定されているので、駆動軸と孔部との間に隙間があっても、その隙間の先が、駆動軸と伸縮管の一端部とが気密に固定されることで形成される気密空間と連通するので、孔部を介しての高温ガスの漏れ、不純物の混入が防止される。
In order to solve the above-mentioned problems, the present invention comprises a reaction vessel for reacting a raw material gas and a melt in a heated and pressurized atmosphere to grow crystals on a seed substrate immersed in the melt, and the reaction described above. A crystal growth apparatus having a stirring device for driving the drive shaft provided through the container and stirring the melt, wherein the stirring device drives the drive shaft to move linearly in the axial direction. The reaction vessel is extendable in the axial direction, one end portion is hermetically fixed to the drive shaft, and the other end portion hermetically surrounds a hole through which the drive shaft is formed in the reaction vessel. The structure which has the expansion-contraction pipe | tube currently fixed to is employ | adopted.
By adopting this configuration, in the present invention, when the drive shaft is linearly driven in the axial direction, the telescopic tube expands and contracts along with the linear drive, so that one end of the telescopic tube is rubbed or the like. Without being airtightly fixed to the drive shaft. And since the other end of the telescopic tube is fixed to the reaction vessel so as to hermetically surround the hole through which the drive shaft is inserted, even if there is a gap between the drive shaft and the hole, Since the tip communicates with the airtight space formed by hermetically fixing the drive shaft and one end of the telescopic tube, leakage of high-temperature gas and mixing of impurities through the hole is prevented.

また、本発明においては、上記駆動装置は、上記駆動軸に対して軸方向一方側に向けて付勢力を付与する付勢部材と、上記付勢力に抗して上記駆動軸を軸方向他方側に向けて移動させるシリンダ機構と、を有するという構成を採用する。
この構成を採用することによって、本発明では、駆動軸は付勢部材により軸方向一方側に付勢されているので、シリンダ機構でこの付勢力に抗する力を軸方向他方側に適宜付与することで、駆動軸の軸方向の直動駆動が可能となる。
In the present invention, the drive device includes an urging member that applies an urging force toward one side in the axial direction with respect to the drive shaft, and the other side in the axial direction against the urging force. The structure which has a cylinder mechanism to which it moves toward is employ | adopted.
By adopting this configuration, in the present invention, since the drive shaft is urged to one side in the axial direction by the urging member, the cylinder mechanism appropriately applies a force against the urging force to the other side in the axial direction. As a result, the linear motion drive in the axial direction of the drive shaft becomes possible.

また、本発明においては、上記付勢部材は、上記伸縮管であるという構成を採用する。
この構成を採用することによって、本発明では、駆動軸の直動駆動に伴って変形する伸縮管の復元力を上記付勢力として用いることで、付勢部材と伸縮管とを共通化して部品点数を削減できる。
Further, in the present invention, a configuration is adopted in which the urging member is the telescopic tube.
By adopting this configuration, in the present invention, the restoring force of the expansion / contraction tube that deforms as the drive shaft is driven linearly is used as the urging force, so that the urging member and the expansion / contraction tube can be used in common. Can be reduced.

また、本発明においては、上記シリンダ機構は、上記駆動軸と当接する当接部を有し、上記当接部は、先細りのテーパー形状を有するという構成を採用する。
この構成を採用することによって、本発明では、高温雰囲気に曝される駆動軸と当接する面積を減らして伝熱によるシリンダ機構を介した熱損失を低減することができる。
In the present invention, the cylinder mechanism has a contact portion that contacts the drive shaft, and the contact portion has a tapered shape.
By adopting this configuration, in the present invention, it is possible to reduce the area that comes into contact with the drive shaft that is exposed to a high-temperature atmosphere and reduce heat loss through the cylinder mechanism due to heat transfer.

また、本発明においては、上記駆動軸の直動駆動に伴う上記伸縮管の伸縮に応じて上記反応容器内の圧力を調節する圧力調節装置を有するという構成を採用する。
この構成を採用することによって、本発明では、駆動軸の直動駆動に伴って伸縮管が伸縮すると反応容器内の容積が変化して圧力が変化するので、圧力調節装置でその圧力変化を調節する。
Moreover, in this invention, the structure of having a pressure control apparatus which adjusts the pressure in the said reaction container according to the expansion-contraction of the said expansion-contraction tube accompanying the linear drive of the said drive shaft is employ | adopted.
By adopting this configuration, in the present invention, when the telescopic tube expands and contracts with the direct drive of the drive shaft, the volume in the reaction vessel changes and the pressure changes, so the pressure change device adjusts the pressure change. To do.

また、本発明においては、上記圧力調節装置は、上記孔部とは別に上記反応容器に貫通して設けられた第2の孔部と、上記第2の孔部を気密に囲う気密空間を形成すると共に上記反応容器内の圧力変化に応じて伸縮する第2の伸縮管と、を有するという構成を採用する。
この構成を採用することによって、本発明では、駆動軸の直動駆動に伴って伸縮管が伸縮すると反応容器内の圧力が変化するが、その圧力変化に応じて第2の伸縮管が伸縮して反応容器内の圧力を一定にするので、反応容器内の圧力変化を抑制することができる。
Further, in the present invention, the pressure adjusting device forms a second hole portion penetrating the reaction vessel separately from the hole portion, and an airtight space that hermetically surrounds the second hole portion. And a second telescopic tube that expands and contracts according to the pressure change in the reaction vessel.
By adopting this configuration, in the present invention, when the expansion and contraction tube expands and contracts in accordance with the direct drive of the drive shaft, the pressure in the reaction vessel changes, but the second expansion and contraction tube expands and contracts according to the pressure change. Since the pressure in the reaction vessel is kept constant, the pressure change in the reaction vessel can be suppressed.

また、本発明においては、上記反応容器は、上記駆動軸の直動駆動に伴い上記融液中に所定方向の攪拌流を形成する邪魔板を有するという構成を採用する。
この構成を採用することによって、本発明では、邪魔板の作用により、駆動軸の直動駆動に伴う融液の攪拌効率を高めることができる。
In the present invention, the reaction container has a baffle plate that forms a stirring flow in a predetermined direction in the melt as the drive shaft is linearly driven.
By adopting this configuration, in the present invention, the stirring efficiency of the melt accompanying the direct drive of the drive shaft can be increased by the action of the baffle plate.

本発明によれば、加熱加圧雰囲気下で原料ガスと融液とを反応させて該融液に浸漬された種基板上に結晶を成長させる反応容器と、上記反応容器を挿通して設けられた駆動軸を駆動させ上記融液を攪拌する攪拌装置と、を有する結晶成長装置であって、上記攪拌装置は、上記駆動軸を軸方向に直動駆動させる駆動装置と、上記軸方向において伸縮自在とされ、一端部が上記駆動軸に気密に固定されて他端部が上記反応容器に形成された上記駆動軸が挿通する孔部を気密に囲って上記反応容器に固定されている伸縮管と、を有するという構成を採用することによって、駆動軸を軸方向に直動駆動させると、伸縮管がその直動駆動に伴って伸縮するので、伸縮管の一端部が、擦動等することなく駆動軸に気密に固定される。そして、伸縮管の他端部は、駆動軸が挿通される孔部を気密に囲って反応容器に固定されているので、駆動軸と孔部との間に隙間があっても、その隙間の先が、駆動軸と伸縮管の一端部とが気密に固定されることで形成される気密空間と連通するので、孔部を介しての高温ガスの漏れ、不純物の混入が防止される。
したがって、本発明では、反応容器の気密を保ちつつ融液を攪拌し、大型で高品質の結晶を得ることができる。
According to the present invention, a reaction vessel for reacting a raw material gas and a melt in a heating and pressurizing atmosphere to grow crystals on a seed substrate immersed in the melt, and the reaction vessel are inserted and provided. A crystal growth apparatus having a stirring device for driving the drive shaft to stir the melt, wherein the stirring device is a drive device for linearly driving the drive shaft in the axial direction, and extending and contracting in the axial direction. A telescopic tube having one end portion fixed to the drive shaft in an airtight manner and the other end portion hermetically surrounding a hole through which the drive shaft formed in the reaction vessel is inserted and fixed to the reaction vessel. When the drive shaft is linearly driven in the axial direction by adopting the configuration of having, the expansion and contraction tube expands and contracts along with the linear drive, so that one end portion of the expansion and contraction tube is rubbed. Without being airtightly fixed to the drive shaft. And since the other end of the telescopic tube is fixed to the reaction vessel so as to hermetically surround the hole through which the drive shaft is inserted, even if there is a gap between the drive shaft and the hole, Since the tip communicates with the airtight space formed by hermetically fixing the drive shaft and one end of the telescopic tube, leakage of high-temperature gas and mixing of impurities through the hole is prevented.
Therefore, in the present invention, the melt can be agitated while maintaining the airtightness of the reaction vessel, and a large and high quality crystal can be obtained.

本発明の実施形態における窒化ガリウム製造装置を示す断面構成図である。It is a section lineblock diagram showing the gallium nitride manufacturing device in the embodiment of the present invention. 本発明の別実施形態における窒化ガリウム製造装置を示す断面構成図である。It is a cross-sectional block diagram which shows the gallium nitride manufacturing apparatus in another embodiment of this invention.

以下、本発明の実施形態について図面を参照して説明する。なお、以下の説明では、本実施形態の結晶成長装置として、窒化ガリウム製造装置を例示して説明する。   Embodiments of the present invention will be described below with reference to the drawings. In the following description, a gallium nitride manufacturing apparatus will be described as an example of the crystal growth apparatus of this embodiment.

図1は、本発明の実施形態における窒化ガリウム製造装置1を示す断面構成図である。
窒化ガリウム製造装置1は、フラックス法により種基板2上にGaN結晶を成長させ製造するものであり、種基板2及び混合融液3を保持する反応容器10と、反応容器10の外側を囲う断熱容器20と、断熱容器20の外側を囲う圧力容器30と、混合融液3を攪拌する攪拌装置40と、反応容器10の内部及び圧力容器30の内部にGaN結晶の原料となる窒素ガス(N)を供給して内部圧力を調節する圧力調節装置50と、を有する。なお、反応容器10、断熱容器20、圧力容器30の側部は、同心の円筒形状に形状設定されており、この円筒形状の中心軸が鉛直方向となるように姿勢設定されている。
FIG. 1 is a cross-sectional configuration diagram illustrating a gallium nitride manufacturing apparatus 1 according to an embodiment of the present invention.
The gallium nitride production apparatus 1 is for producing a GaN crystal by growing it on a seed substrate 2 by a flux method. The reaction vessel 10 holding the seed substrate 2 and the mixed melt 3 and the heat insulation surrounding the outside of the reaction vessel 10. The container 20, the pressure vessel 30 that surrounds the outside of the heat insulation vessel 20, the stirring device 40 that stirs the mixed melt 3, and the nitrogen gas (N as a raw material for GaN crystals) inside the reaction vessel 10 and inside the pressure vessel 30 2 ) and a pressure adjusting device 50 for adjusting the internal pressure. The side portions of the reaction vessel 10, the heat insulation vessel 20, and the pressure vessel 30 are set in a concentric cylindrical shape, and the posture is set so that the central axis of the cylindrical shape is in the vertical direction.

本実施形態の反応容器10は、内部にNa/Gaからなる混合融液3を保有するセラミックス製の坩堝11と、坩堝11の外側を囲う金属製の外容器12の二層構造となっている。坩堝11は、その底部に種基板2を載置し、内部の混合融液3に浸漬させる構成となっている。また、坩堝11は、種基板2を囲うように配置される円筒形状の邪魔板13を有する。邪魔板13は、脚部13aによって坩堝11の底部との間に隙間をあけて所定高さで設けられている。   The reaction vessel 10 of the present embodiment has a two-layer structure of a ceramic crucible 11 that contains a mixed melt 3 made of Na / Ga and a metal outer vessel 12 that surrounds the outside of the crucible 11. . The crucible 11 has a configuration in which the seed substrate 2 is placed on the bottom and immersed in the mixed melt 3 inside. Moreover, the crucible 11 has a cylindrical baffle plate 13 disposed so as to surround the seed substrate 2. The baffle plate 13 is provided at a predetermined height with a gap between the baffle 11 and the bottom of the crucible 11 by the legs 13a.

断熱容器20の断熱材には、例えばグラスウール等の繊維系断熱材が用いられる。断熱容器20の内側には、反応容器10の側方及び下方を囲んで加熱するヒーター21が設けられる。
圧力容器30は、圧力状態が変化した場合であってもその圧力に耐えられるように略円筒形状に形状設定された真空容器からなる。また、圧力容器30には、内部の空気を真空排気する不図示の真空排気ポートが接続されている。
As the heat insulating material of the heat insulating container 20, for example, a fiber heat insulating material such as glass wool is used. Inside the heat insulating container 20, a heater 21 is provided that surrounds and heats the side and bottom of the reaction container 10.
The pressure vessel 30 is composed of a vacuum vessel whose shape is set in a substantially cylindrical shape so that it can withstand the pressure even when the pressure state changes. The pressure vessel 30 is connected to a vacuum exhaust port (not shown) that evacuates the internal air.

攪拌装置40は、反応容器10を挿通して設けられた駆動軸41を有する。
駆動軸41の軸方向一端部は、外容器12に形成された孔部12a及び坩堝11に形成された孔部11aを挿通し、混合融液3中に至る構成となっている。駆動軸41は、その軸方向一端部の先端に攪拌体42を備えている。攪拌体42は、駆動軸41の径よりも拡径し且つ邪魔板13の内径より縮径した略円板形状を有している。
一方、駆動軸41の軸方向他端部は、反応容器10外に配置される構成となっている。駆動軸41は、その軸方向他端部の先端にフランジ部43を備えている。フランジ部43は、駆動軸41及び孔部12aの径よりも拡径した略円板形状を有している。
The stirring device 40 has a drive shaft 41 provided through the reaction vessel 10.
One end of the drive shaft 41 in the axial direction is configured to pass through the hole 12 a formed in the outer container 12 and the hole 11 a formed in the crucible 11 and reach the mixed melt 3. The drive shaft 41 includes a stirring body 42 at the tip of one axial end portion thereof. The stirrer 42 has a substantially disk shape that is larger than the diameter of the drive shaft 41 and smaller than the inner diameter of the baffle plate 13.
On the other hand, the other axial end of the drive shaft 41 is arranged outside the reaction vessel 10. The drive shaft 41 includes a flange portion 43 at the tip of the other axial end portion. The flange portion 43 has a substantially disc shape whose diameter is larger than the diameters of the drive shaft 41 and the hole portion 12a.

攪拌装置40は、駆動軸41の軸方向他端部を囲うベローズ管(伸縮管)44を有する。
ベローズ管44は、駆動軸41を囲って軸方向に伸縮自在な構成となっており、その一端部が駆動軸41のフランジ部43に気密に固定され、その他端部が孔部12aを気密に囲って外容器12に固定されている。このため、孔部12aより外側は、ベローズ管44とフランジ部43とが気密に固定されて形成される気密空間に連通する構成となっている。本実施形態のベローズ管44は、耐熱性の金属材(例えば、ステンレス鋼材、インコネル・ハステロイ(商品名)等のニッケル基耐熱合金)から形成されており、収縮変形した際にはその復元力により駆動軸41を上方に持ち上げる力(付勢力)を発現させる付勢部材としても機能する構成となっている。ちなみに、この付勢部材は、ベローズ管44で代用せずに別途に設ける構成であっても良い。
The agitator 40 has a bellows tube (expandable tube) 44 that surrounds the other axial end of the drive shaft 41.
The bellows tube 44 is configured to be able to expand and contract in the axial direction surrounding the drive shaft 41, and one end thereof is airtightly fixed to the flange portion 43 of the drive shaft 41, and the other end airtightly connects the hole portion 12a. It is enclosed and fixed to the outer container 12. For this reason, the outside of the hole portion 12a communicates with an airtight space formed by the bellows tube 44 and the flange portion 43 being airtightly fixed. The bellows tube 44 of this embodiment is formed of a heat-resistant metal material (for example, a stainless steel material, a nickel-based heat-resistant alloy such as Inconel Hastelloy (trade name)), and when it is contracted and deformed, its restoring force It is the structure which functions also as an urging member which expresses the force (urging force) which lifts the drive shaft 41 upward. Incidentally, the urging member may be provided separately without being replaced with the bellows tube 44.

攪拌装置40は、駆動軸41を軸方向に直動駆動させる駆動装置45を有する。駆動装置45は、駆動軸41のフランジ部43に軸方向で当接するシリンダロッド(当接部)46と、シリンダロッド46を直動駆動させる駆動部47とを備えるシリンダ機構48を有する。
駆動部47は、そのケースが圧力容器30の外部に気密に密着固定して設けられている。本実施形態の駆動部47は、例えば、内部にモーターやソレノイド等の駆動源を備えて、シリンダロッド46を直動駆動させる構成となっている。シリンダロッド46は、圧力容器30に形成された孔部30a及び断熱容器20に形成された孔部20aを挿通して、駆動軸41のフランジ部43に当接する構成となっている。シリンダロッド46の先端部は、先細りのテーパー形状となっており、フランジ部43と略点接触する構成となっている。この構成によれば、高温雰囲気に曝される駆動軸41と当接する接触面積を減らして伝熱によるシリンダ機構48を介した熱損失を低減することができる。
The stirring device 40 includes a drive device 45 that drives the drive shaft 41 to move linearly in the axial direction. The drive device 45 includes a cylinder mechanism 48 that includes a cylinder rod (contact portion) 46 that contacts the flange portion 43 of the drive shaft 41 in the axial direction and a drive portion 47 that drives the cylinder rod 46 to move linearly.
The drive unit 47 is provided such that its case is hermetically tightly fixed to the outside of the pressure vessel 30. The drive unit 47 of the present embodiment has a configuration in which, for example, a drive source such as a motor or a solenoid is provided therein, and the cylinder rod 46 is driven to move linearly. The cylinder rod 46 is configured to pass through the hole 30 a formed in the pressure vessel 30 and the hole 20 a formed in the heat insulating container 20 and abut on the flange 43 of the drive shaft 41. The tip end portion of the cylinder rod 46 has a tapered shape and is configured to be in substantially point contact with the flange portion 43. According to this configuration, it is possible to reduce the contact area that comes into contact with the drive shaft 41 exposed to a high temperature atmosphere and reduce heat loss through the cylinder mechanism 48 due to heat transfer.

圧力調節装置50は、反応容器10内に窒素ガスを導入する窒素ガス供給ポート51Aと、圧力容器30内に窒素ガスを導入する窒素ガス供給ポート51Bと、を有する。
窒素ガス供給ポート51Aは、反応容器10の外容器12に接続されており、外容器12に供給された窒素ガスが、孔部11a等を通過して坩堝11内に供給される構成となっている。また、窒素ガス供給ポート51Bは、圧力容器30に接続されており、圧力容器30に供給された窒素ガスが、孔部20a等を通過して断熱容器20内に供給される構成となっている。圧力調節装置50は、反応容器10の内部圧力と、反応容器10の外部圧力とを同圧となるように、窒素ガス供給量を制御する構成となっている。
The pressure adjusting device 50 includes a nitrogen gas supply port 51A that introduces nitrogen gas into the reaction vessel 10 and a nitrogen gas supply port 51B that introduces nitrogen gas into the pressure vessel 30.
The nitrogen gas supply port 51A is connected to the outer vessel 12 of the reaction vessel 10, and the nitrogen gas supplied to the outer vessel 12 is supplied into the crucible 11 through the hole 11a and the like. Yes. Further, the nitrogen gas supply port 51B is connected to the pressure vessel 30, and the nitrogen gas supplied to the pressure vessel 30 is configured to be supplied into the heat insulation vessel 20 through the hole 20a and the like. . The pressure adjusting device 50 is configured to control the supply amount of nitrogen gas so that the internal pressure of the reaction vessel 10 and the external pressure of the reaction vessel 10 become the same pressure.

続いて、上記構成の窒化ガリウム製造装置1の動作及び作用について説明する。なお、本実施形態の窒化ガリウム製造装置1は、不図示の制御部を備えている。そして、特に断りが無い限り、当該制御部が、主体として以下の動作を制御する。
先ず、圧力容器30内部の空気を不図示の真空排気ポートから真空排気する。真空状態となった後、窒素ガス供給ポート51A,51Bから窒素ガスを供給して、内部圧力を数MPaまで加圧する。また、ヒーター21を駆動させて、内部温度を800℃〜900℃まで加熱する。そして、この高温高圧状態を所定時間維持し、反応容器10の混合融液3中で、Ga(ガリウム)とN(窒素)とを反応させて、種基板2上にGaN結晶を成長させる。
Next, the operation and action of the gallium nitride manufacturing apparatus 1 having the above configuration will be described. Note that the gallium nitride manufacturing apparatus 1 of the present embodiment includes a control unit (not shown). And unless otherwise indicated, the said control part controls the following operation | movement as a main body.
First, the air inside the pressure vessel 30 is evacuated from an unillustrated evacuation port. After the vacuum state is reached, nitrogen gas is supplied from the nitrogen gas supply ports 51A and 51B, and the internal pressure is increased to several MPa. Further, the heater 21 is driven to heat the internal temperature to 800 ° C to 900 ° C. Then, this high temperature and high pressure state is maintained for a predetermined time, and Ga (gallium) and N (nitrogen) are reacted in the mixed melt 3 of the reaction vessel 10 to grow a GaN crystal on the seed substrate 2.

この結晶成長過程において余分な核発生を抑え、大型で高品質のGaN結晶を得るべく、攪拌装置40で混合融液3を攪拌させる。この攪拌は、駆動装置45で駆動軸41を軸方向に直動駆動させることで行う。
より詳しくは、シリンダ機構48を駆動させ、フランジ部43と当接しているシリンダロッド46を下方に移動させて駆動軸41を押下げると、攪拌体42が邪魔板13内の混合融液3を下方に押し出して攪拌流を形成する。この攪拌流は、攪拌体42により下方に押し出された混合融液3が、脚部13aの隙間を通り邪魔板13の外側にでた後、邪魔板13の外側を上昇して再び邪魔板13内に入り込むように流通することで形成される。
一方、シリンダ機構48を駆動させ、シリンダロッド46による駆動軸41の押下げを解除すると、押下げられた際に収縮変形したベローズ管44の復元力(付勢力)により、駆動軸41が上方に移動する。これに伴い攪拌体42が、邪魔板13内の混合融液3を上方に押し上げて攪拌流を形成する。この攪拌流は、攪拌体42により上方に押し上げられた混合融液3が、邪魔板13の上部開口縁から外側にでた後、邪魔板13の外側を下降して再び邪魔板13内に入り込むように流通することで形成される。
本実施形態では、このようにシリンダ機構48の押下げと押下げ解除とを所定周期で切り替えることにより、駆動軸41を軸方向に直動駆動させ、混合融液3を攪拌する。
In this crystal growth process, the mixed melt 3 is agitated by the agitator 40 in order to suppress generation of extra nuclei and obtain a large and high quality GaN crystal. This agitation is performed by driving the drive shaft 41 linearly in the axial direction by the drive device 45.
More specifically, when the cylinder mechanism 48 is driven, the cylinder rod 46 that is in contact with the flange portion 43 is moved downward and the drive shaft 41 is pushed down, the stirrer 42 causes the mixed melt 3 in the baffle plate 13 to move. Push down to form a stirring stream. In this stirring flow, after the mixed melt 3 pushed downward by the stirring body 42 passes through the gap of the leg portion 13a and comes to the outside of the baffle plate 13, it rises outside the baffle plate 13 and then again the baffle plate 13 It is formed by circulating so as to enter inside.
On the other hand, when the cylinder mechanism 48 is driven and the push-down of the drive shaft 41 by the cylinder rod 46 is released, the drive shaft 41 is moved upward by the restoring force (biasing force) of the bellows pipe 44 contracted and deformed when pushed down. Moving. Accordingly, the stirring body 42 pushes up the mixed melt 3 in the baffle plate 13 upward to form a stirring flow. In this stirring flow, after the mixed melt 3 pushed upward by the stirring body 42 comes out from the upper opening edge of the baffle plate 13, it descends outside the baffle plate 13 and enters the baffle plate 13 again. It is formed by distributing like.
In the present embodiment, the switch of the cylinder mechanism 48 and the release of the push down are switched in a predetermined cycle as described above, so that the drive shaft 41 is linearly driven in the axial direction and the mixed melt 3 is stirred.

ベローズ管44は、上記駆動軸41の直動駆動に伴って伸縮し、孔部12aを介しての反応容器10からの高温ガスの漏れ、不純物の混入を防止する。
より詳しくは、ベローズ管44は、軸方向に伸縮自在とされているため、駆動軸41が軸方向に直動駆動しても、ベローズ管44がその直動駆動に伴って伸縮するので、ベローズ管44の一端部が、擦動等することなく駆動軸41に気密に固定される。また、ベローズ管44の他端部は、駆動軸41が挿通される孔部12aを気密に囲って外容器12に固定されているので、駆動軸41と孔部12aとの間に隙間があっても、その隙間の先が、駆動軸41とベローズ管44の一端部とが気密に固定されることで形成される気密空間と連通するので、孔部12aを介しての高温ガスの漏れ、不純物の混入が防止される。また、反応容器10内はベローズ管44により気密が保たれるので、組立の際に、圧力容器30及び断熱容器20の中に反応容器10を設置するまでの間に、孔部12a及び孔部11aを介した混合融液3中への不純物の混入の虞もない。
なお、駆動軸41の直動駆動に伴ってベローズ管44が伸縮すると、反応容器10内の容積が変化し、それに伴い内部圧力が変化するが、圧力調節装置50がこの圧力変化に応じて窒素ガス供給量を制御することで、反応容器10の内部圧力は一定に維持されることとなる。
The bellows tube 44 expands and contracts with the linear drive of the drive shaft 41 to prevent leakage of high temperature gas from the reaction vessel 10 and mixing of impurities through the hole 12a.
More specifically, since the bellows tube 44 is extendable in the axial direction, even if the drive shaft 41 is linearly driven in the axial direction, the bellows tube 44 expands and contracts in accordance with the linear drive. One end of the tube 44 is airtightly fixed to the drive shaft 41 without rubbing. The other end of the bellows tube 44 is fixed to the outer container 12 so as to airtightly surround the hole 12a through which the drive shaft 41 is inserted, so that there is a gap between the drive shaft 41 and the hole 12a. However, since the tip of the gap communicates with the airtight space formed by airtightly fixing the drive shaft 41 and one end of the bellows tube 44, high temperature gas leakage through the hole 12a, Impurities are prevented from being mixed. In addition, since the inside of the reaction vessel 10 is kept airtight by the bellows tube 44, the holes 12a and the holes are formed during the assembly until the reaction vessel 10 is installed in the pressure vessel 30 and the heat insulation vessel 20. There is no possibility of contamination of the mixed melt 3 via 11a.
When the bellows tube 44 expands and contracts as the drive shaft 41 is linearly driven, the volume in the reaction vessel 10 changes, and the internal pressure changes accordingly. The pressure adjusting device 50 changes the nitrogen in response to this pressure change. By controlling the gas supply amount, the internal pressure of the reaction vessel 10 is kept constant.

したがって、上述した本実施形態によれば、加熱加圧雰囲気下で窒素ガスとNa/Ga混合融液3とを反応させて該混合融液3に浸漬された種基板2上にGaN結晶を成長させる反応容器10と、反応容器10を挿通して設けられた駆動軸41を駆動させ混合融液3を攪拌する攪拌装置40と、を有する窒化ガリウム製造装置1であって、攪拌装置40は、駆動軸41を軸方向に直動駆動させる駆動装置45と、上記軸方向において伸縮自在とされ、一端部が駆動軸41に気密に固定されて他端部が反応容器10に形成された駆動軸41が挿通する孔部12aを気密に囲って反応容器10に固定されているベローズ管44と、を有するという構成を採用することによって、駆動軸41を軸方向に直動駆動させると、ベローズ管44がその直動駆動に伴って伸縮するので、ベローズ管44の一端部が、擦動等することなく駆動軸41に気密に固定される。そして、ベローズ管44の他端部は、駆動軸41が挿通される孔部12aを気密に囲って反応容器10に固定されているので、駆動軸41と孔部12aとの間に隙間があっても、その隙間の先が、駆動軸41とベローズ管44の一端部とが気密に固定されることで形成される気密空間と連通するので、孔部12aを介しての高温ガスの漏れ、不純物の混入が防止される。
したがって、本実施形態では、反応容器10の気密を保ちつつ融液を攪拌し、大型で高品質の結晶を得ることができる。
Therefore, according to this embodiment described above, a GaN crystal is grown on the seed substrate 2 immersed in the mixed melt 3 by reacting the nitrogen gas and the Na / Ga mixed melt 3 in a heated and pressurized atmosphere. A gallium nitride production apparatus 1 having a reaction vessel 10 to be driven and a stirring device 40 that drives a drive shaft 41 provided through the reaction vessel 10 and stirs the mixed melt 3. A drive device 45 that linearly drives the drive shaft 41 in the axial direction, and a drive shaft that is extendable in the axial direction, one end of which is hermetically fixed to the drive shaft 41 and the other end formed in the reaction vessel 10. When the drive shaft 41 is linearly driven in the axial direction by adopting a structure in which the hole 12a through which the tube 41 is inserted is hermetically surrounded and fixed to the reaction vessel 10, the bellows tube 44 is its linear motion Because stretch with the movement, one end of the bellows tube 44 is hermetically fixed to the drive shaft 41 without Kosudo like. The other end of the bellows tube 44 is fixed to the reaction vessel 10 so as to airtightly surround the hole 12a through which the drive shaft 41 is inserted, so that there is a gap between the drive shaft 41 and the hole 12a. However, since the tip of the gap communicates with the airtight space formed by airtightly fixing the drive shaft 41 and one end of the bellows tube 44, high temperature gas leakage through the hole 12a, Impurities are prevented from being mixed.
Therefore, in this embodiment, the melt can be agitated while maintaining the airtightness of the reaction vessel 10 to obtain large-sized and high-quality crystals.

以上、図面を参照しながら本発明の一実施形態について説明したが、本発明は上記実施形態に限定されるものではない。上述した実施形態において示した各構成部材の諸形状や組み合わせ等は一例であって、本発明の主旨から逸脱しない範囲において設計要求等に基づき種々変更可能である。   As mentioned above, although one Embodiment of this invention was described referring drawings, this invention is not limited to the said embodiment. Various shapes, combinations, and the like of the constituent members shown in the above-described embodiments are examples, and various modifications can be made based on design requirements and the like without departing from the gist of the present invention.

例えば、攪拌体42及び邪魔板13の形状は、上記実施形態での形状に限定されるものではなく、要求される攪拌流に応じて適宜変更される。
例えば、図2に示す別実施形態のように、駆動軸41に設けられる攪拌体42は、坩堝11と邪魔板13との間に配置される略リング形状としてもよい。この攪拌体42は、平面の上部と鋭角となった下部とを有する流線型となっており、攪拌体42を上昇させる時の方が強い流れとなるため、中央部では種基板2に向かう下降流を支配的とさせることができる。
For example, the shapes of the stirrer 42 and the baffle plate 13 are not limited to the shapes in the above-described embodiment, and are appropriately changed according to the required stirring flow.
For example, as in another embodiment shown in FIG. 2, the stirring body 42 provided on the drive shaft 41 may have a substantially ring shape disposed between the crucible 11 and the baffle plate 13. The stirrer 42 has a streamlined shape having an upper portion of a plane and a lower portion having an acute angle. Since the stirrer 42 has a stronger flow when the stirrer 42 is lifted, a downward flow toward the seed substrate 2 in the central portion. Can be made dominant.

また、例えば、上記実施形態では、ベローズ管44の伸縮による反応容器10の内部圧力の変化を窒素ガスの供給量を制御して調節すると説明したが、本発明は、この構成に限定されるものではなく、図2に示す別実施形態のように、内圧調節用のベローズ管60(第2の伸縮管)を設けて圧力調節しても良い。
ベローズ管60は、外容器12に貫通して設けられた孔部(第2の孔部)12bを気密に囲って気密空間を形成すると共に反応容器10内の圧力変化に応じて伸縮する構成となっている。この構成によれば、駆動軸41の直動駆動に伴ってベローズ管44が伸縮すると、その圧力変化に応じてベローズ管60が伸縮して反応容器10内の圧力(容積)を一定にするので、反応容器10内の圧力変化を防止することができる。
Further, for example, in the above embodiment, it has been described that the change in the internal pressure of the reaction vessel 10 due to the expansion and contraction of the bellows tube 44 is controlled by controlling the supply amount of nitrogen gas, but the present invention is limited to this configuration. Instead, as in another embodiment shown in FIG. 2, the pressure may be adjusted by providing an internal pressure adjusting bellows tube 60 (second telescopic tube).
The bellows tube 60 is configured to hermetically surround a hole (second hole) 12b provided penetrating the outer container 12 to form an airtight space, and to expand and contract in accordance with a pressure change in the reaction container 10. It has become. According to this configuration, when the bellows tube 44 expands and contracts with the direct drive of the drive shaft 41, the bellows tube 60 expands and contracts according to the pressure change, and the pressure (volume) in the reaction vessel 10 is made constant. The pressure change in the reaction vessel 10 can be prevented.

1…窒化ガリウム製造装置(結晶成長装置)、2…種基板、3…混合融液、10…反応容器、12a…孔部、12b…孔部(第2の孔部)、13…邪魔板、40…攪拌装置、41…駆動軸、44…ベローズ管(伸縮管、付勢部材)、45…駆動装置、46…シリンダロッド(当接部)、50…圧力調節装置、60…ベローズ管(第2の伸縮管)   DESCRIPTION OF SYMBOLS 1 ... Gallium nitride manufacturing apparatus (crystal growth apparatus), 2 ... Seed substrate, 3 ... Mixed melt, 10 ... Reaction container, 12a ... Hole part, 12b ... Hole part (2nd hole part), 13 ... Baffle plate, DESCRIPTION OF SYMBOLS 40 ... Stirring device, 41 ... Drive shaft, 44 ... Bellows tube (expandable tube, urging member), 45 ... Drive device, 46 ... Cylinder rod (contact part), 50 ... Pressure adjusting device, 60 ... Bellows tube (first) 2 telescopic tube)

Claims (6)

加熱加圧雰囲気下で原料ガスと融液とを反応させて該融液に浸漬された種基板上に結晶を成長させる反応容器と、前記反応容器を挿通して設けられた駆動軸を駆動させ前記融液を攪拌する攪拌装置と、を有する結晶成長装置であって、
前記攪拌装置は、
前記駆動軸を軸方向に直動駆動させる駆動装置と、
前記軸方向において伸縮自在とされ、一端部が前記駆動軸に気密に固定されて他端部が前記反応容器に形成された前記駆動軸が挿通する孔部を気密に囲って前記反応容器に固定されている伸縮管と、を有し、
前記駆動装置は、
前記駆動軸に対して軸方向一方側に向けて付勢力を付与する付勢部材と、
前記付勢力に抗して前記駆動軸を軸方向他方側に向けて移動させるシリンダ機構と、を有し、
前記シリンダ機構は、前記駆動軸と当接する先細りテーパー形状の当接部を有することを特徴とする結晶成長装置。
A reaction vessel for reacting a raw material gas and a melt in a heating and pressurizing atmosphere to grow crystals on a seed substrate immersed in the melt; and a drive shaft provided through the reaction vessel is driven. A crystal growth device having a stirring device for stirring the melt,
The stirring device
A drive device for linearly driving the drive shaft in the axial direction;
It is extendable in the axial direction, one end is fixed to the drive shaft in an airtight manner, and the other end is fixed to the reaction vessel by airtightly surrounding a hole formed in the reaction vessel through which the drive shaft is inserted. have a, and the expansion pipe, which is,
The driving device includes:
A biasing member that applies a biasing force toward one side in the axial direction with respect to the drive shaft;
A cylinder mechanism that moves the drive shaft toward the other side in the axial direction against the biasing force, and
The crystal growth apparatus according to claim 1, wherein the cylinder mechanism has a tapered tapered contact portion that contacts the drive shaft .
前記付勢部材は、前記伸縮管であることを特徴とする請求項1に記載の結晶成長装置。 The crystal growth apparatus according to claim 1 , wherein the biasing member is the telescopic tube. 加熱加圧雰囲気下で原料ガスと融液とを反応させて該融液に浸漬された種基板上に結晶を成長させる反応容器と、前記反応容器を挿通して設けられた駆動軸を駆動させ前記融液を攪拌する攪拌装置と、を有する結晶成長装置であって、A reaction vessel for reacting a raw material gas and a melt in a heating and pressurizing atmosphere to grow crystals on a seed substrate immersed in the melt; and a drive shaft provided through the reaction vessel is driven. A crystal growth device having a stirring device for stirring the melt,
前記攪拌装置は、The stirring device
前記駆動軸を軸方向に直動駆動させる駆動装置と、A drive device for linearly driving the drive shaft in the axial direction;
前記軸方向において伸縮自在とされ、一端部が前記駆動軸に気密に固定されて他端部が前記反応容器に形成された前記駆動軸が挿通する孔部を気密に囲って前記反応容器に固定されている伸縮管と、を有し、It is extendable in the axial direction, one end is fixed to the drive shaft in an airtight manner, and the other end is fixed to the reaction vessel by airtightly surrounding a hole formed in the reaction vessel through which the drive shaft is inserted. A telescopic tube, and
前記駆動軸の直動駆動に伴う前記伸縮管の伸縮に応じて前記反応容器内の圧力を調節する圧力調節装置を有することを特徴とする結晶成長装置。A crystal growth apparatus, comprising: a pressure adjusting device that adjusts a pressure in the reaction vessel according to expansion and contraction of the expansion and contraction tube accompanying linear drive of the drive shaft.
前記圧力調節装置は、
前記孔部とは別に前記反応容器に貫通して設けられた第2の孔部と、
前記第2の孔部を気密に囲う気密空間を形成すると共に前記反応容器内の圧力変化に応じて伸縮する第2の伸縮管と、を有することを特徴とする請求項3に記載の結晶成長装置。
The pressure regulator is
A second hole provided through the reaction vessel separately from the hole;
4. The crystal growth according to claim 3 , further comprising: a second expansion tube that forms an airtight space that hermetically surrounds the second hole portion and expands and contracts according to a pressure change in the reaction vessel. apparatus.
前記反応容器は、前記駆動軸の直動駆動に伴い前記融液中に所定方向の攪拌流を形成する邪魔板を有することを特徴とする請求項1〜4のいずれか一項に記載の結晶成長装置。 The said reaction container has a baffle plate which forms the stirring flow of a predetermined direction in the said melt with the linear drive of the said drive shaft, The crystal | crystallization as described in any one of Claims 1-4 characterized by the above-mentioned. Growth equipment. 加熱加圧雰囲気下で原料ガスと融液とを反応させて該融液に浸漬された種基板上に結晶を成長させる反応容器と、前記反応容器を挿通して設けられた駆動軸を駆動させ前記融液を攪拌する攪拌装置と、を有する結晶成長装置であって、A reaction vessel for reacting a raw material gas and a melt in a heating and pressurizing atmosphere to grow crystals on a seed substrate immersed in the melt; and a drive shaft provided through the reaction vessel is driven. A crystal growth device having a stirring device for stirring the melt,
前記攪拌装置は、The stirring device
前記駆動軸を軸方向に直動駆動させる駆動装置と、A drive device for linearly driving the drive shaft in the axial direction;
前記軸方向において伸縮自在とされ、一端部が前記駆動軸に気密に固定されて他端部が前記反応容器に形成された前記駆動軸が挿通する孔部を気密に囲って前記反応容器に固定されている伸縮管と、を有し、It is extendable in the axial direction, one end is fixed to the drive shaft in an airtight manner, and the other end is fixed to the reaction vessel by airtightly surrounding a hole formed in the reaction vessel through which the drive shaft is inserted. A telescopic tube, and
前記反応容器は、前記駆動軸の直動駆動に伴い前記融液中に形成される上昇流と下降流との仕切りとなる円筒形状の邪魔板を有することを特徴とする結晶成長装置。The crystal growth apparatus, wherein the reaction vessel has a cylindrical baffle plate that serves as a partition between an upward flow and a downward flow formed in the melt as the drive shaft is linearly driven.
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