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JP5451175B2 - Exposure equipment - Google Patents
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JP5451175B2 - Exposure equipment - Google Patents

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JP5451175B2
JP5451175B2 JP2009119103A JP2009119103A JP5451175B2 JP 5451175 B2 JP5451175 B2 JP 5451175B2 JP 2009119103 A JP2009119103 A JP 2009119103A JP 2009119103 A JP2009119103 A JP 2009119103A JP 5451175 B2 JP5451175 B2 JP 5451175B2
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exposure
light source
pair
substrate
strip
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JP2010266763A (en
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健 三宅
俊博 高木
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Sanei Giken Co Ltd
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Sanei Giken Co Ltd
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Priority to JP2009119103A priority Critical patent/JP5451175B2/en
Priority to TW099112976A priority patent/TWI485528B/en
Priority to KR1020100041828A priority patent/KR101635962B1/en
Priority to CN201010176146.3A priority patent/CN101887217B/en
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/065—Etching masks applied by electrographic, electrophotographic or magnetographic methods
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
    • H10P76/408—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes
    • H10P76/4085—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes characterised by the processes involved to create the masks

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Description

本発明は、フレキシブルな帯状基板を所定長さ領域ごとに露光するための露光装置に関する。   The present invention relates to an exposure apparatus for exposing a flexible strip-shaped substrate for each predetermined length region.

表面に感光層が形成された露光面を少なくとも片面に有するフレキシブルな帯状基板を間欠的に送り、帯状基板の所定長さ領域に、フォトマスクを通して光を照射することにより、フォトマスクに描かれたパターン（例えば電気回路）を帯状基板の所定長さ領域に転写する露光装置は知られている。帯状基板が間欠的に送られるごとに、帯状基板の新たな所定長さ領域がフォトマスクに対向する位置を占め、次々に露光作業が行なわれていく。   A flexible strip-shaped substrate having an exposure surface with a photosensitive layer formed on at least one surface is intermittently fed, and light is irradiated through a photomask to a predetermined length region of the strip-shaped substrate, which is drawn on the photomask. An exposure apparatus that transfers a pattern (for example, an electric circuit) to a predetermined length region of a belt-like substrate is known. Each time the belt-like substrate is intermittently sent, a new predetermined length region of the belt-like substrate occupies a position facing the photomask, and exposure operations are successively performed.

あらかじめ所定の長さにカットされたシート状の基板を置き換えながら露光する場合に比べ、帯状基板を利用した露光は効率的である。   Compared to the case where exposure is performed while replacing a sheet-like substrate that has been cut to a predetermined length in advance, exposure using a strip-like substrate is more efficient.

特開２００５−３２６５５０号公報JP 2005-326550 A 特開２００６−３０１１７０号公報JP 2006-301170 A

しかしながら、従来の露光装置よりさらに安いコストで高い生産性が得られる露光装置が提供されることが望まれる。   However, it is desired to provide an exposure apparatus that can obtain high productivity at a lower cost than conventional exposure apparatuses.

上記課題を解決するため、本発明によれば、
表面に感光層が形成された露光面を少なくとも片面に有するフレキシブルな帯状基板を所定長さ領域ごとに露光するための露光装置であって、
互いに隣接して且つ平行に配置された一対の露光ユニットと、該一対の露光ユニットのそれぞれが共用する光源手段と、を含み、
前記一対の露光ユニットの各々が、前記帯状基板をその長手方向に沿って間欠的に送るための搬送機構と、前記帯状基板の搬送経路に配置された露光部にして、前記露光面に対して近接または離反可能なように設けられた少なくとも一つのフォトマスクを有する露光部と、を備えており、
前記光源手段が、前記フォトマスクに描かれたパターンを前記帯状基板の前記露光面に転写するために、前記一対の露光ユニットにおけるそれぞれの前記露光部へと交互に光を照射可能となされている、
露光装置が提供される。 In order to solve the above problems, according to the present invention,
An exposure apparatus for exposing a flexible belt-shaped substrate having an exposure surface having a photosensitive layer formed on the surface on at least one surface for each predetermined length region,
A pair of exposure units disposed adjacent to and parallel to each other, and light source means shared by each of the pair of exposure units,
Each of the pair of exposure units has a transport mechanism for intermittently feeding the strip-shaped substrate along the longitudinal direction thereof, and an exposure unit disposed in the transport path of the strip-shaped substrate, with respect to the exposure surface. An exposure unit having at least one photomask provided so as to be close or separable, and
In order for the light source means to transfer the pattern drawn on the photomask to the exposure surface of the strip-shaped substrate, light can be irradiated alternately to the exposure portions of the pair of exposure units. ,
An exposure apparatus is provided.

前記光源手段は、前記一対の露光ユニットにおけるそれぞれの前記露光部へと光を照射可能な位置に移動可能とすることができる。   The light source means can be moved to a position where light can be irradiated to each of the exposure units in the pair of exposure units.

前記光源手段は、複数の発光素子からなる走査型光源を含むものとしてもよい。   The light source means may include a scanning light source composed of a plurality of light emitting elements.

前記発光素子は半導体発光素子としてもよい。   The light emitting element may be a semiconductor light emitting element.

前記光源手段は、光源と、前記一対の露光ユニットにそれぞれ設けられた一対の反射鏡と、を備えるものとし、
前記光源は、前記一対の反射鏡のそれぞれに交互に光を投射するよう照射角度を変更可能なものとすることができる。 The light source means includes a light source and a pair of reflecting mirrors provided in the pair of exposure units, respectively.
The light source may be capable of changing an irradiation angle so as to alternately project light onto each of the pair of reflecting mirrors.

前記露光部における前記帯状基板の搬送経路は垂直とすることができる。   The belt-shaped substrate transport path in the exposure unit may be vertical.

前記フォトマスクが、垂直状態の前記帯状基板の両側に一つずつ配置されており、
これら一対のフォトマスクは、互いに対向する位置に位置合わせ用マークを有しており、
該位置合わせ用マークを読み取るための少なくとも１つのＣＣＤカメラと、該ＣＣＤカメラによる前記位置合わせ用マークの読み取りデータに基づいて前記一対のフォトマスクのうち少なくとも一方をその面内でＸ、Ｙ、θ方向に移動させて位置合わせを行うための移動機構と、をさらに備えることができる。 The photomasks are arranged one on each side of the strip substrate in a vertical state;
These pair of photomasks have alignment marks at positions facing each other,
At least one CCD camera for reading the alignment mark, and at least one of the pair of photomasks in the plane based on the reading data of the alignment mark by the CCD camera, X, Y, θ And a moving mechanism for performing alignment by moving in the direction.

前記帯状基板と前記フォトマスクとの位置合わせを行うために、前記フォトマスクに設けられた位置合わせ用マークと位置合わせ可能な位置合わせ用マークを前記帯状基板に形成することができる。   In order to perform alignment between the strip substrate and the photomask, alignment marks that can be aligned with alignment marks provided on the photomask can be formed on the strip substrate.

前記帯状基板に形成される前記位置合わせ用マークは、前記帯状基板の側縁にとって代わられることができる。   The alignment mark formed on the strip substrate can be replaced by a side edge of the strip substrate.

本発明の露光装置によれば、一方の露光ユニットで露光が行われた後、次の露光のために帯状基板が間欠的に送られて位置合わせが行われている間に、光源手段を他方の露光ユニットにおける露光に用いることができる。したがって、一対の露光ユニットに対して、光源手段を共用することができる。その結果、高い生産性を維持しつつ、設備費を軽減することができる。   According to the exposure apparatus of the present invention, after the exposure is performed by one exposure unit, the light source means is moved to the other while the strip-shaped substrate is intermittently sent and aligned for the next exposure. The exposure unit can be used for exposure. Therefore, the light source means can be shared for the pair of exposure units. As a result, the equipment cost can be reduced while maintaining high productivity.

本発明による露光装置の一実施形態を示す図であり、上図は平面図、下図は側面図。1 is a view showing an embodiment of an exposure apparatus according to the present invention, in which an upper view is a plan view and a lower view is a side view. 本発明による露光装置の別の実施形態を示す図であり、上図は平面図、下図は側面図。It is a figure which shows another embodiment of the exposure apparatus by this invention, the upper figure is a top view, and the lower figure is a side view. 本発明による露光装置のさらに別の実施形態を示す図であり、上図は平面図、下図は側面図。It is a figure which shows another embodiment of the exposure apparatus by this invention, the upper figure is a top view, and the lower figure is a side view.

図１は、本発明による露光装置の一実施形態を示す。露光装置は、第１の露光ユニット１と、第２の露光ユニット２と、第１および第２の露光ユニット１，２が共用する光源手段３とを含む。第１および第２の露光ユニット１，２は、互いに隣接し且つ平行に配置されている。   FIG. 1 shows an embodiment of an exposure apparatus according to the present invention. The exposure apparatus includes a first exposure unit 1, a second exposure unit 2, and a light source means 3 shared by the first and second exposure units 1 and 2. The first and second exposure units 1 and 2 are arranged adjacent to and parallel to each other.

露光ユニット１，２の各々は、表面に感光層が形成された露光面を有するフレキシブルな帯状基板４が円筒状に巻かれている繰り出し用リール５と、繰り出し用リール５から繰り出された帯状基板４を巻き取るための巻き取り用リール６と、帯状基板４を繰り出し用リール５から巻き取り用リール６まで間欠的に送るための駆動装置７とを備えている。繰り出し用リール４、巻き取り用リール５および駆動装置７は、ガイドローラ８等とともに、帯状基板４をその長手方向に沿って間欠的に送るための搬送機構を構成する。
駆動装置７は駆動ローラ７ａを備える。駆動ローラ７ａは、繰り出し用リール５に巻かれた帯状基板４を所定長さ分ずつ間欠的に引き出す。図示実施形態では、帯状基板４の搬送経路が途中で垂直になっている。別の実施形態においては、帯状基板４の搬送経路が垂直経路を有しなくてもよい。 Each of the exposure units 1 and 2 includes a feeding reel 5 in which a flexible belt-like substrate 4 having an exposure surface with a photosensitive layer formed on its surface is wound in a cylindrical shape, and a belt-like substrate fed from the feeding reel 5. 4 and a driving device 7 for intermittently feeding the belt-like substrate 4 from the feeding reel 5 to the winding reel 6. The feeding reel 4, the take-up reel 5, and the driving device 7 together with the guide roller 8 and the like constitute a transport mechanism for intermittently feeding the belt-like substrate 4 along its longitudinal direction.
The driving device 7 includes a driving roller 7a. The driving roller 7a intermittently pulls out the belt-like substrate 4 wound around the feeding reel 5 by a predetermined length. In the illustrated embodiment, the transport path of the belt-like substrate 4 is vertical on the way. In another embodiment, the conveyance path of the strip-shaped substrate 4 may not have a vertical path.

露光ユニット１，２の各々は、帯状基板４の垂直経路に配置された露光部９を備えている。露光部９は、帯状基板４の露光面に対して近接または離反可能なように設けられたフォトマスク１０を有する。図示実施形態の場合、露光面が帯状基板４の両面に設けられているので、露光ユニット１，２の各々に対してフォトマスク１０は２つずつ設けられている。露光面が帯状基板４の片面のみに設けられている場合には、露光ユニット１，２の各々に対してフォトマスク１０は１つずつ設けられることになる。   Each of the exposure units 1 and 2 includes an exposure unit 9 arranged in a vertical path of the strip substrate 4. The exposure unit 9 includes a photomask 10 provided so as to be close to or away from the exposure surface of the belt-like substrate 4. In the case of the illustrated embodiment, since the exposure surfaces are provided on both surfaces of the belt-like substrate 4, two photomasks 10 are provided for each of the exposure units 1 and 2. When the exposure surface is provided only on one surface of the belt-like substrate 4, one photomask 10 is provided for each of the exposure units 1 and 2.

なお、光源手段３の数に関して言えば、露光面が帯状基板４の両面に設けられている図示実施形態では、露光ユニット１，２が共用する光源手段３が２つ設けられている。露光面が帯状基板４の片面のみに設けられている場合には、露光ユニット１，２が共用する光源手段３は１つでよい。   In terms of the number of light source means 3, in the illustrated embodiment in which the exposure surfaces are provided on both surfaces of the strip substrate 4, two light source means 3 shared by the exposure units 1 and 2 are provided. When the exposure surface is provided only on one side of the belt-like substrate 4, the light source means 3 shared by the exposure units 1 and 2 may be one.

帯状基板４の搬送経路が垂直経路を有しない実施形態においては、露光部９を帯状基板４の水平経路に配置してもよい。しかしながら、水平状態の帯状基板４は自重により撓んで変形する傾向がある。また、ゴミも付着しやすい。したがって、帯状基板４の垂直経路に露光部９を配置することが望ましい。   In an embodiment in which the transport path of the strip-shaped substrate 4 does not have a vertical path, the exposure unit 9 may be disposed on the horizontal path of the strip-shaped substrate 4. However, the horizontal belt-like substrate 4 tends to bend and deform due to its own weight. In addition, dust easily adheres. Therefore, it is desirable to arrange the exposure unit 9 in the vertical path of the belt-like substrate 4.

フォトマスク１０には、帯状基板４の露光面上に転写すべきパターン（例えば電気回路パターン）が描かれている。光源手段３から露光部９へと光が照射されると、露光部９における帯状基板４の所定長さ領域の露光面にパターンが転写される。   On the photomask 10, a pattern (for example, an electric circuit pattern) to be transferred is drawn on the exposure surface of the belt-like substrate 4. When light is irradiated from the light source means 3 to the exposure unit 9, the pattern is transferred to the exposure surface of the predetermined length region of the belt-like substrate 4 in the exposure unit 9.

帯状基板４が搬送機構によって送られ、その所定長さ領域が露光部９に到達すると送りが停止され、位置合わせ作業が行われる。フォトマスク１０は、帯状基板４の露光面に対して近接せしめられる。帯状基板４を挟んで互いに向き合う２つのフォトマスク１０は、互いに対向する位置に位置合わせ用マークを有している。少なくとも１つのＣＣＤカメラ１１が、これらの位置合わせ用マークを読み取る。読み取りデータに基づき、移動機構１２が、一対のフォトマスク１０の少なくとも一方をその面内でＸ、Ｙ、θ方向に移動させ、一対のフォトマスク１０どうしの位置合わせを行う。   The belt-like substrate 4 is sent by the transport mechanism, and when the predetermined length area reaches the exposure unit 9, the feeding is stopped and the alignment operation is performed. The photomask 10 is brought close to the exposure surface of the strip substrate 4. The two photomasks 10 facing each other with the belt-like substrate 4 interposed therebetween have alignment marks at positions facing each other. At least one CCD camera 11 reads these alignment marks. Based on the read data, the moving mechanism 12 moves at least one of the pair of photomasks 10 in the X, Y, and θ directions within the plane, thereby aligning the pair of photomasks 10.

帯状基板４とフォトマスク１０との位置合わせを行うには、帯状基板４に形成された位置合わせ用マークも用いられる。帯状基板４に形成される位置合わせマークは、フォトマスク１０の位置合わせマークと位置合わせ可能なものとされる。   In order to perform alignment between the belt-like substrate 4 and the photomask 10, an alignment mark formed on the belt-like substrate 4 is also used. The alignment mark formed on the belt-like substrate 4 can be aligned with the alignment mark of the photomask 10.

帯状基板４に形成される位置合わせ用マークは、帯状基板４の側縁で代用してもよい。   The alignment mark formed on the belt-like substrate 4 may be substituted by the side edge of the belt-like substrate 4.

図１の実施形態において、第１および第２の露光ユニットに共用される光源手段３は、ランプである光源３ａと、平面鏡３ｂと、反射鏡３ｃとを備えている。光源３ａから発せられた光は、平面鏡３ｂによって反射鏡３ｃへと伝達される。凹状面を有する反射鏡３ｃは、伝達された光を平行光にして露光部９へと照射する。   In the embodiment of FIG. 1, the light source means 3 shared by the first and second exposure units includes a light source 3a that is a lamp, a plane mirror 3b, and a reflecting mirror 3c. The light emitted from the light source 3a is transmitted to the reflecting mirror 3c by the plane mirror 3b. The reflecting mirror 3c having a concave surface irradiates the exposure unit 9 with the transmitted light as parallel light.

図１において実線で示された光源手段３は、第１の露光ユニット１の露光部９へと光を照射できる位置にある。光源手段３は、帯状基板４の搬送方向を横切るようにして延びる一対の直動ガイドレール１３上に乗っている。光源手段３は、直動ガイドレール１３上をスライドして、第２の露光ユニット２の露光部９へと光を照射できる位置（二点鎖線で示す）へと移動することができる。   The light source means 3 indicated by a solid line in FIG. 1 is at a position where light can be irradiated to the exposure unit 9 of the first exposure unit 1. The light source means 3 rides on a pair of linear motion guide rails 13 extending across the transport direction of the belt-like substrate 4. The light source means 3 can slide on the linear guide rail 13 and move to a position (indicated by a two-dot chain line) where light can be irradiated to the exposure unit 9 of the second exposure unit 2.

第１の露光ユニット１において帯状基板４の所定長さ領域の露光が終了すると、光源手段３は直動ガイドレール１３上をスライドして、第１の露光ユニット１の露光部９へと光が照射できる位置から第２の露光ユニット２の露光部９へと光を照射できる位置へと移動し、第２の露光ユニット２の露光部９を照射する。この間、第１の露光ユニット１では、フォトマスク１０が帯状基板４の露光面から離反し、帯状基板４の間欠的搬送が行われる。帯状基板４の次の所定長さ領域が露光部９に位置付けられると、フォトマスク１０が帯状基板４の露光面に近接せしめられ、位置合わせ作業が行われる。第２の露光ユニット２の露光部９への照射を終えた光源手段３は、再び第１の露光ユニット１の露光部９へと光を照射できる位置へとスライド移動し、位置合わせが終了したフォトマスク１０を介して照射を行う。   When the exposure of the predetermined length region of the belt-like substrate 4 is completed in the first exposure unit 1, the light source means 3 slides on the linear guide rail 13, and light is emitted to the exposure unit 9 of the first exposure unit 1. The exposure unit 9 of the second exposure unit 2 is irradiated from the position where irradiation can be performed to the exposure unit 9 of the second exposure unit 2 to a position where light can be irradiated. During this time, in the first exposure unit 1, the photomask 10 is separated from the exposure surface of the strip substrate 4, and the strip substrate 4 is intermittently transported. When the next predetermined length region of the belt-like substrate 4 is positioned in the exposure unit 9, the photomask 10 is brought close to the exposure surface of the belt-like substrate 4, and the alignment operation is performed. The light source means 3 that has finished irradiating the exposure unit 9 of the second exposure unit 2 slides again to a position where the light can be irradiated to the exposure unit 9 of the first exposure unit 1, and the alignment is completed. Irradiation is performed through the photomask 10.

このようにして光源手段３は、第１および第２の露光ユニット１，２におけるそれぞれの露光部９へと交互に光を照射するようになされている。従来であれば光源手段３が休止していた位置合わせ作業時間を利用して、隣接する別の露光ユニットへと光源手段３を移動させてそこで露光作業を行わせることができるので、２つの露光ユニットに対して光源手段は１つで済む。   In this way, the light source means 3 is configured to irradiate light alternately to the exposure units 9 in the first and second exposure units 1 and 2. Conventionally, it is possible to move the light source means 3 to another adjacent exposure unit by using the alignment work time in which the light source means 3 has been paused, so that the exposure work can be performed there. Only one light source means is required for the unit.

図２の実施形態においては、光源手段３は、複数の発光素子１４からなる走査型光源３ｄを含んでいる。本実施形態における走査型光源３ｄは、半導体発光素子を利用している。   In the embodiment of FIG. 2, the light source means 3 includes a scanning light source 3 d composed of a plurality of light emitting elements 14. The scanning light source 3d in this embodiment uses a semiconductor light emitting element.

このような半導体発光素子を利用した走査型光源を用いた場合、光源自体を小さくすることができ、且つ、反射鏡のような光学機器を省略することができるので、帯状基板４の搬送方向における露光装置全体の寸法をコンパクトにすることができる。   When a scanning light source using such a semiconductor light emitting element is used, the light source itself can be made small, and an optical device such as a reflecting mirror can be omitted. The overall dimensions of the exposure apparatus can be made compact.

図２の実施形態では、第１の露光ユニット１において位置合わせ作業が行われているときは、走査型光源３ｄは第２の露光ユニット２側へと移動しながら、第２の露光ユニット２の露光部９に対して走査露光を行う。第２の露光ユニット２における露光が終了して、第２の露光ユニット２において帯状基板４の間欠的搬送と位置合わせ作業とが行われる間、走査型光源３ｄは第１の露光ユニット１側へと移動しながら、第１の露光ユニット１の露光部９に対して走査露光を行う。   In the embodiment of FIG. 2, when the alignment operation is performed in the first exposure unit 1, the scanning light source 3 d moves toward the second exposure unit 2, while the second exposure unit 2. Scan exposure is performed on the exposure unit 9. While the exposure in the second exposure unit 2 is completed, the scanning light source 3d moves toward the first exposure unit 1 while the second exposure unit 2 performs the intermittent conveyance of the belt-like substrate 4 and the alignment operation. Scanning exposure is performed on the exposure unit 9 of the first exposure unit 1.

図３の実施形態においては、光源手段３が、ランプである光源３ａと、一対の平面鏡３ｂと、一対の反射鏡３ｃとを備えている。光源３ａは、回動可能な平面ミラー（図示せず）を介して光の照射方向をある角度範囲で変更可能とされている。光源３ａは、ある照射角度の設定では、第１の露光ユニット１側の平面鏡３ｂを介して反射鏡３ｃに光を投射し、第１の露光ユニット１の露光部９を照射する。第１の露光ユニット１における露光が終了し、第１の露光ユニット１において帯状基板４の間欠的搬送と位置合わせ作業とが行われる間、光源３ａは、別の照射角度の設定とされ、第２の露光ユニット２側の平面鏡３ｂを介して反射鏡３ｃに光を投射し、第２の露光ユニット２の露光部９を照射する。   In the embodiment of FIG. 3, the light source means 3 includes a light source 3a that is a lamp, a pair of plane mirrors 3b, and a pair of reflecting mirrors 3c. The light source 3a can change the irradiation direction of light within a certain angle range via a rotatable plane mirror (not shown). The light source 3a projects light onto the reflecting mirror 3c via the plane mirror 3b on the first exposure unit 1 side and irradiates the exposure unit 9 of the first exposure unit 1 with a certain irradiation angle setting. While the exposure in the first exposure unit 1 is completed and the intermittent conveyance of the belt-like substrate 4 and the alignment operation are performed in the first exposure unit 1, the light source 3a is set to another irradiation angle, Light is projected onto the reflecting mirror 3 c via the plane mirror 3 b on the second exposure unit 2 side, and the exposure unit 9 of the second exposure unit 2 is irradiated.

図１ないし図３のいずれの実施形態においても、一対の露光ユニットに対して光源手段を交互に使用する形で共用することができる。したがって、高い生産性を維持しつつ、設備コストを低減させることができる。   In any of the embodiments shown in FIGS. 1 to 3, the light source means can be used in common by alternately using a pair of exposure units. Therefore, equipment costs can be reduced while maintaining high productivity.

なお、図１および図３の実施形態において、光源手段３の構成いかんによっては、平面鏡を省略することもできる。   In the embodiment of FIGS. 1 and 3, the plane mirror can be omitted depending on the configuration of the light source means 3.

さらに、図１および図３の実施形態においてランプ以外の光源を使用することも可能であり、図２の実施形態において半導体発光素子以外の光源を使用することも可能である。   Furthermore, a light source other than a lamp can be used in the embodiment of FIGS. 1 and 3, and a light source other than a semiconductor light emitting element can be used in the embodiment of FIG.

１ 第１の露光ユニット、２ 第２の露光ユニット、３ 光源手段、３ａ 光源（ランプ）、 ３ｂ 平面鏡、３ｃ 反射鏡、３ｄ 光源（走査型光源）、４ 帯状基板、５ 繰り出し用リール（搬送機構）、６ 巻き取り用リール（搬送機構）、７ 駆動装置（搬送機構）、７ａ 駆動ローラ（搬送機構）、８ ガイドローラ（搬送機構）、９ 露光部、１０ フォトマスク、１１ ＣＣＤカメラ、１２ 移動機構、１３ 直動ガイドレール、１４ 発光素子。 DESCRIPTION OF SYMBOLS 1 1st exposure unit, 2nd exposure unit, 3 light source means, 3a light source (lamp), 3b plane mirror, 3c reflecting mirror, 3d light source (scanning light source), 4 strip | belt-shaped board | substrate, 5 reel for delivery (conveyance mechanism) ), 6 Reel for take-up (conveyance mechanism), 7 Drive device (conveyance mechanism), 7a Drive roller (conveyance mechanism), 8 Guide roller (conveyance mechanism), 9 Exposure unit, 10 Photomask, 11 CCD camera, 12 Movement Mechanism, 13 linear motion guide rail, 14 light emitting element.

Claims (9)

表面に感光層が形成された露光面を少なくとも片面に有するフレキシブルな帯状基板を所定長さ領域ごとに露光するための露光装置であって、
互いに隣接して且つ平行に配置された一対の露光ユニットであって、異なる前記帯状基板を処理するために二系列化された一対の露光ユニットと、該一対の露光ユニットのそれぞれが共用する二つの光源手段と、を含み、
前記一対の露光ユニットの各々が、前記帯状基板をその長手方向に沿って間欠的に送るための搬送機構と、前記帯状基板の搬送経路に配置された露光部にして、前記露光面に対して近接または離反可能なように設けられた少なくとも一つのフォトマスクを有する露光部と、を備えており、
前記光源手段が、前記フォトマスクに描かれたパターンを前記帯状基板の前記露光面に転写するために、前記一対の露光ユニットにおけるそれぞれの前記露光部へと交互に光を照射可能となされており、
前記二つの光源手段の各々は、前記一対の露光ユニットのそれぞれの前記露光部のいずれに光を照射する場合にも、前記それぞれの露光部に向けて同一方向に光を照射し、
前記一対の露光ユニットの各々では、前記二つの光源手段の一方から前記帯状基板の一方の面に対して光が照射されるとともに、前記二つの光源手段の他方から前記帯状基板の他方の面に対して光が照射されて、前記帯状基板の両面を同時に露光可能に構成された
露光装置。 An exposure apparatus for exposing a flexible belt-shaped substrate having an exposure surface having a photosensitive layer formed on the surface on at least one surface for each predetermined length region,
A pair of exposure units arranged adjacent to each other in parallel, a pair of exposure units arranged in two lines for processing the different strip-shaped substrates , and two shared by each of the pair of exposure units Light source means,
Each of the pair of exposure units has a transport mechanism for intermittently feeding the strip-shaped substrate along the longitudinal direction thereof, and an exposure unit disposed in the transport path of the strip-shaped substrate, with respect to the exposure surface. An exposure unit having at least one photomask provided so as to be close or separable, and
Said light source means, for transferring the pattern drawn on the photomask to the exposure surface of the strip substrate, it has been made and capable of emitting light alternately to each of the exposed portions of the pair of the exposure unit ,
Each of the two light source means irradiates light in the same direction toward each of the exposure units when irradiating any of the exposure units of the pair of exposure units,
In each of the pair of exposure units, light is emitted from one of the two light source means to one surface of the strip-shaped substrate, and the other surface of the strip-shaped substrate is irradiated from the other of the two light source means. An exposure apparatus configured to be irradiated with light so that both surfaces of the belt-like substrate can be exposed simultaneously . 前記光源手段が、前記一対の露光ユニットにおけるそれぞれの前記露光部へと光を照射可能な位置に移動可能となされている、
請求項１に記載の露光装置。 The light source means is movable to a position where light can be irradiated to each of the exposure units in the pair of exposure units.
The exposure apparatus according to claim 1. 前記光源手段が、複数の発光素子からなる走査型光源を含む、請求項２に記載の露光装置。   The exposure apparatus according to claim 2, wherein the light source means includes a scanning light source including a plurality of light emitting elements. 前記発光素子が半導体発光素子である、請求項３に記載の露光装置。   The exposure apparatus according to claim 3, wherein the light emitting element is a semiconductor light emitting element. 前記光源手段が、光源と、前記一対の露光ユニットにそれぞれ設けられた一対の反射鏡と、を備えており、
前記光源が、前記一対の反射鏡のそれぞれに交互に光を投射するよう照射角度を変更可能とされている、
請求項１に記載の露光装置。 The light source means includes a light source and a pair of reflecting mirrors respectively provided in the pair of exposure units;
The illumination angle can be changed so that the light source alternately projects light onto each of the pair of reflecting mirrors,
The exposure apparatus according to claim 1. 前記露光部における前記帯状基板の搬送経路が垂直である、請求項１ないし５のいずれかに記載の露光装置。   The exposure apparatus according to claim 1, wherein a transport path of the strip-shaped substrate in the exposure unit is vertical. 前記フォトマスクが、垂直状態の前記帯状基板の両側に一つずつ配置されており、
これら一対のフォトマスクは、互いに対向する位置に位置合わせ用マークを有しており、
該位置合わせ用マークを読み取るための少なくとも１つのＣＣＤカメラと、該ＣＣＤカメラによる前記位置合わせ用マークの読み取りデータに基づいて前記一対のフォトマスクのうち少なくとも一方をその面内でＸ、Ｙ、θ方向に移動させて位置合わせを行うための移動機構と、をさらに備える、
請求項６に記載の露光装置。 The photomasks are arranged one on each side of the strip substrate in a vertical state;
These pair of photomasks have alignment marks at positions facing each other,
At least one CCD camera for reading the alignment mark, and at least one of the pair of photomasks in the plane based on the reading data of the alignment mark by the CCD camera, X, Y, θ A moving mechanism for performing alignment by moving in a direction,
The exposure apparatus according to claim 6. 前記帯状基板と前記フォトマスクとの位置合わせを行うために、前記フォトマスクに設けられた位置合わせ用マークと位置合わせ可能な位置合わせ用マークが前記帯状基板に形成されている、請求項７に記載の露光装置。   The alignment mark that can be aligned with the alignment mark provided on the photomask is formed on the belt-shaped substrate in order to perform alignment between the belt-shaped substrate and the photomask. The exposure apparatus described. 前記帯状基板に形成される前記位置合わせ用マークが、前記帯状基板の側縁にとって代わられている、請求項８に記載の露光装置。   The exposure apparatus according to claim 8, wherein the alignment mark formed on the strip substrate is replaced by a side edge of the strip substrate.
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CN102402131A (en) * 2011-11-11 2012-04-04 深南电路有限公司 Exposure system
US8802333B2 (en) 2012-03-15 2014-08-12 Taiwan Semiconductor Manufacturing Company, Ltd. Reflective lithography masks and systems and methods
DE102012108211A1 (en) * 2012-09-04 2014-03-06 Kleo Halbleitertechnik Gmbh exposure system
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Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59121048A (en) * 1982-12-27 1984-07-12 Ibiden Co Ltd Producing device of printed wiring board
JPH0778630B2 (en) * 1986-07-15 1995-08-23 サンエ−技研株式会社 Exposure equipment
JP2891769B2 (en) * 1990-11-30 1999-05-17 ウシオ電機株式会社 Film exposure equipment
JP3559999B2 (en) * 1994-07-29 2004-09-02 株式会社オーク製作所 An exposure apparatus with a mask alignment mechanism and a method of aligning, exposing, and transporting a work.
JP2000066418A (en) * 1998-08-17 2000-03-03 Ono Sokki Co Ltd Exposure apparatus and exposure method
JP2000114159A (en) 1998-10-07 2000-04-21 Canon Inc Projection exposure apparatus and device manufacturing method
JP2003207902A (en) * 2002-01-11 2003-07-25 Pentax Corp Exposure equipment
JP2004094142A (en) * 2002-09-04 2004-03-25 Toray Eng Co Ltd Wide width exposing device
JP4218418B2 (en) * 2003-05-23 2009-02-04 ウシオ電機株式会社 Double-sided projection exposure system for belt-like workpieces
JP2005326550A (en) * 2004-05-13 2005-11-24 Sanee Giken Kk Exposure equipment
JP2006098718A (en) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd Drawing apparatus
JP2006301170A (en) * 2005-04-19 2006-11-02 Fujikura Ltd Exposure apparatus and method
JP4861778B2 (en) * 2005-09-08 2012-01-25 富士フイルム株式会社 Pattern exposure method and apparatus
JP4775076B2 (en) * 2006-03-31 2011-09-21 住友金属鉱山株式会社 Exposure method and apparatus
JP2007292933A (en) * 2006-04-24 2007-11-08 Nsk Ltd Exposure equipment
TW200745781A (en) * 2006-04-24 2007-12-16 Nsk Ltd Exposure apparatus
US8264666B2 (en) * 2009-03-13 2012-09-11 Nikon Corporation Exposure apparatus, exposure method, and method of manufacturing device

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