JP5458415B2 - Flattened hole-filled printed wiring board and method for manufacturing the same - Google Patents
Flattened hole-filled printed wiring board and method for manufacturing the same Download PDFInfo
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Description
本願発明は、プリント配線板の製造方法、及びそれにより製造されるプリント配線板に関する。特に、本願発明は、穴埋めプリント配線基板の新規な表面平坦化方法、及びそれにより製造される平坦化穴埋めプリント配線板に関する。 The present invention relates to a method for manufacturing a printed wiring board and a printed wiring board manufactured thereby. In particular, the present invention relates to a novel surface flattening method for a hole-filled printed wiring board and a flattened hole-filled printed wiring board manufactured thereby.
従来、穴埋めプリント配線基板の表面平坦化は、基板表面より食(は)み出た穴埋め樹脂を、バフやベルトサンダーにて基板表面を研磨することにより除去し、行われた(特許文献1、実施例1)。
しかし、基板が薄い場合、研磨の際、基板が破損し、折れ曲がり、或いは基板が変形(伸び等)し寸法変化が生じる、等といった問題があった。
そのため、総厚規制や軽薄短小化傾向等によって近年、薄化されつつあるプリント配線基板(特に、0.1mm厚程度のもの)や、寸法変化に極めて弱いPKG基板等に対しては、従来の物理的な研磨方法では対応しきれなかった。Conventionally, the surface flattening of the hole-filled printed wiring board has been performed by removing the hole-filling resin that has eroded from the substrate surface by polishing the substrate surface with a buff or belt sander (
However, when the substrate is thin, the substrate is damaged and bent during polishing, or the substrate is deformed (e.g., stretched) to cause a dimensional change.
Therefore, for printed wiring boards (especially those with a thickness of about 0.1 mm) that have been thinned in recent years due to the total thickness regulation and the trend toward lighter and shorter, for conventional PKG boards that are extremely vulnerable to dimensional changes, etc. The physical polishing method could not cope.
上記事情に鑑み、本願発明は、プリント配線基板を研磨せず表面平坦化でき、その結果、基板の破損、折れ曲がり、或いは基板の変形、寸法変化等がなく、従って極めて薄いプリント配線基板や寸法変化に弱いプリント配線基板等に対しても好適な、新規な基板の表面平坦化方法を提供することを、目的とする。 In view of the above circumstances, the present invention can flatten the surface of the printed wiring board without polishing, and as a result, there is no breakage, bending, deformation of the board, dimensional change, etc. An object of the present invention is to provide a novel method for flattening the surface of a substrate, which is suitable for a printed wiring board that is vulnerable to damage.
上記課題を解決するため、本願発明者が鋭意、検討した結果、以下の本願発明を成すに到った。 In order to solve the above-mentioned problems, the inventors of the present application diligently studied and as a result, the following inventions of the present application were achieved.
即ち、本願第1発明は、貫通穴を有する非透光性プリント配線基板を、貫通穴の一方の開口端面Aが透光性平坦材Bと対向するように透光性平坦材B上に載せ、光硬化性樹脂組成物を貫通穴に塗布充填し、貫通穴の他方の開口端面A’を含むプリント配線基板表面上に他の平坦材B’を載せ、平坦材B’上にて硬質ロールを移動させ、透光性平坦材Bを介して樹脂を露光し、露光後の任意の工程段階において透光性平坦材Bを取り除き、平坦材B’を取り除き、未露光樹脂を現像により除去することを特徴とするプリント配線板の製造方法、を提供する。 That is, the first invention of this application places a non-transparent printed wiring board having a through hole on the translucent flat member B such that one opening end surface A of the through hole faces the translucent flat member B. The photocurable resin composition is applied and filled in the through hole, and another flat material B ′ is placed on the surface of the printed wiring board including the other opening end face A ′ of the through hole, and a hard roll is placed on the flat material B ′. , The resin is exposed through the light transmissive flat material B, the light transmissive flat material B is removed at any step after the exposure, the flat material B ′ is removed, and the unexposed resin is removed by development. A printed wiring board manufacturing method characterized by the above.
本願第2発明は、I)貫通穴の一方の開口端面Aの周縁の少なくとも一部にパッドが設けられた非透光性プリント配線基板を、貫通穴の他方の開口端面A’が透光性平坦材Bと対向するように透光性平坦材B上に載せ、少なくともパッド端面の高さ以上に樹脂が充填されるよう光硬化性樹脂組成物を貫通穴に塗布充填し、パッド端面を含むプリント配線基板表面上に他の平坦材B’を載せ、又は
II)貫通穴の一方の開口端面Aの周縁の少なくとも一部にパッドが設けられた非透光性プリント配線基板を、パッド端面が透光性平坦材Bと対向するように透光性平坦材B上に載せ、光硬化性樹脂組成物を貫通穴に塗布充填し、貫通穴の他方の開口端面A’を含むプリント配線基板表面上に他の平坦材B’を載せ、
平坦材B’上にて硬質ロールを移動させ、透光性平坦材Bを介して樹脂を露光し、露光後の任意の工程段階において透光性平坦材Bを取り除き、平坦材B’を取り除き、未露光樹脂を現像により除去することを特徴とするプリント配線板の製造方法、を提供する。In the second invention of the present application, I) a non-transparent printed wiring board in which a pad is provided on at least a part of the periphery of one opening end surface A of the through hole, and the other opening end surface A ′ of the through hole is translucent. It is placed on the translucent flat material B so as to face the flat material B, and a photocurable resin composition is applied and filled in the through hole so that the resin is filled at least the height of the pad end surface, and includes the pad end surface. Another flat material B ′ is placed on the surface of the printed wiring board, or II) a non-transparent printed wiring board in which a pad is provided on at least a part of the peripheral edge of one opening end surface A of the through hole. The surface of the printed wiring board that is placed on the light transmissive flat material B so as to face the light transmissive flat material B, is coated and filled with a photocurable resin composition in the through hole, and includes the other opening end surface A ′ of the through hole Put another flat material B 'on top,
The hard roll is moved on the flat material B ′, the resin is exposed through the light transmissive flat material B, the light transmissive flat material B is removed at any step after the exposure, and the flat material B ′ is removed. And a method for producing a printed wiring board, wherein unexposed resin is removed by development.
本願第3発明は、貫通穴の両開口端面の周縁の少なくとも一部にそれぞれパッドが設けられた非透光性プリント配線基板を、一方のパッド端面Cが透光性平坦材Bと対向するように透光性平坦材B上に載せ、少なくとも他方のパッド端面C’の高さ以上に樹脂が充填されるよう光硬化性樹脂組成物を貫通穴に塗布充填し、パッド端面C’を含むプリント配線基板表面上に他の平坦材B’を載せ、平坦材B’上にて硬質ロールを移動させ、透光性平坦材Bを介して樹脂を露光し、露光後の任意の工程段階において透光性平坦材Bを取り除き、平坦材B’を取り除き、未露光樹脂を現像により除去することを特徴とするプリント配線板の製造方法、を提供する。 In the third invention of the present application, a non-translucent printed wiring board in which pads are provided on at least a part of the periphery of both opening end faces of the through-holes, and one pad end face C faces the translucent flat member B. The photocurable resin composition is placed on the translucent flat member B, and is coated and filled in the through-hole so that the resin is filled at least the height of the other pad end surface C ′. The other flat material B ′ is placed on the surface of the wiring board, the hard roll is moved on the flat material B ′, the resin is exposed through the translucent flat material B, and the transparent material is transmitted in an arbitrary process step after the exposure. There is provided a method for manufacturing a printed wiring board, characterized in that the optical flat material B is removed, the flat material B ′ is removed, and unexposed resin is removed by development.
本願第4発明は、プリント配線基板が、厚さ0.2mm以下のもの又はPKG基板であることを特徴とする本願第1発明〜第3発明の何れかのプリント配線板の製造方法、を提供する。 A fourth invention of the present application provides the method for manufacturing a printed wiring board according to any one of the first to third inventions of the present invention, wherein the printed wiring board is a board having a thickness of 0.2 mm or less or a PKG board. To do.
本願第5発明は、光硬化性樹脂組成物が、無溶剤であり、アルカリ現像性であることを特徴とする本願第1発明〜第4発明の何れかのプリント配線板の製造方法、を提供する。The present fifth invention, the photocurable resin composition is a solventless, a manufacturing method, any of the printed wiring board of the first invention to fourth invention, characterized in that the alkali developability To do.
本願第6発明は、光硬化性樹脂組成物が、[I]不飽和基を有し、アルカリ可溶性の樹脂、[II](メタ)アクリルモノマー類、[III]光反応開始剤、[IV]エポキシ化合物、及び[V]熱硬化剤を含有する光・熱硬化性樹脂組成物であることを特徴とする本願第5発明のプリント配線板の製造方法、を提供する。 In the sixth invention of the present application, the photocurable resin composition has an [I] unsaturated group and an alkali-soluble resin, [II] (meth) acrylic monomers, [III] a photoreaction initiator, [IV] Provided is a method for producing a printed wiring board according to the fifth aspect of the present invention, which is a photo / thermosetting resin composition containing an epoxy compound and a [V] thermosetting agent.
本願第7発明は、硬質ロールが金属製であることを特徴とする本願第1発明〜第6発明の何れかのプリント配線板の製造方法、を提供する。 A seventh invention of the present application provides the method for producing a printed wiring board according to any one of the first to sixth inventions, wherein the hard roll is made of metal.
本願第8発明は、平坦材B’が載せられる貫通穴の開口端面又はパッド端面を含む面を基準面として、この基準面より上の樹脂層厚が5μm以下となるように、平坦材B’上にて硬質ロールを移動させることを特徴とする本願第1発明〜第7発明の何れかのプリント配線板の製造方法、を提供する。 The eighth invention of the present application uses the surface including the opening end face or the pad end face of the through hole on which the flat material B ′ is placed as a reference surface so that the resin layer thickness above the reference surface is 5 μm or less. A method for producing a printed wiring board according to any one of the first to seventh inventions of the present application, wherein a hard roll is moved upward.
本願第9発明は、光硬化性樹脂組成物を塗布充填後、更に樹脂を加熱脱泡又は真空脱泡することを特徴とする本願第1発明〜第8発明の何れかのプリント配線板の製造方法、を提供する。 The ninth invention of the present application is the production of a printed wiring board according to any one of the first to eighth inventions of the present invention, wherein the resin is heated and degassed or vacuum degassed after the photocurable resin composition is applied and filled. Method.
本願第10発明は、未露光樹脂を現像により除去した後、更に露光樹脂を加熱硬化することを特徴とする本願第1発明〜第9発明の何れかのプリント配線板の製造方法、を提供する。 The tenth invention of the present application provides the method for producing a printed wiring board according to any one of the first to ninth inventions of the present invention, wherein after the unexposed resin is removed by development, the exposed resin is further heat-cured. .
本願第11発明は、本願第1発明〜第10発明の何れかのプリント配線板の製造方法にて製造されるプリント配線板、を提供する。 The eleventh aspect of the present invention provides a printed wiring board manufactured by the method for manufacturing a printed wiring board according to any one of the first to tenth aspects of the present invention.
本願発明により、プリント配線基板を研磨せず表面平坦化でき、その結果、基板の破損、折れ曲がり、或いは基板の変形、寸法変化等がなく、従って極めて薄いプリント配線基板や寸法変化に弱いプリント配線基板等に対しても好適な、新規な基板の表面平坦化方法を提供することができる。 According to the present invention, the surface of the printed wiring board can be flattened without polishing, and as a result, there is no breakage, bending, deformation of the board, dimensional change, etc., and therefore a very thin printed wiring board or a printed wiring board that is vulnerable to dimensional changes. It is possible to provide a novel method for planarizing the surface of a substrate, which is also suitable for the above.
以下、本願発明を、図面を用い、詳述する。
本願発明に係るプリント配線板の製造方法の第1態様は、貫通穴を有する非透光性プリント配線基板を、貫通穴の一方の開口端面Aが透光性平坦材Bと対向するように透光性平坦材B上に載せ、光硬化性樹脂組成物を貫通穴に塗布充填し、貫通穴の他方の開口端面A’を含むプリント配線基板表面上に他の平坦材B’を載せ、平坦材B’上にて硬質ロールを移動させ、透光性平坦材Bを介して樹脂を露光し、露光後の任意の工程段階において透光性平坦材Bを取り除き、平坦材B’を取り除き、未露光樹脂を現像により除去する、ことを特徴とする。Hereinafter, the present invention will be described in detail with reference to the drawings.
In a first aspect of the method for manufacturing a printed wiring board according to the present invention, a non-transparent printed wiring board having a through hole is made transparent so that one open end surface A of the through hole faces the translucent flat member B. Place on the optical flat material B, apply and fill the photocurable resin composition into the through hole, and place another flat material B ′ on the surface of the printed wiring board including the other opening end face A ′ of the through hole, The hard roll is moved on the material B ′, the resin is exposed through the light transmissive flat material B, the light transmissive flat material B is removed at any step after the exposure, the flat material B ′ is removed, The unexposed resin is removed by development.
本願製造方法の第1態様において、基材となるプリント配線基板1(図1a)としては、貫通穴2(図1a)を有するものを用いる。貫通穴2(図1a)の両側には、それぞれ開口端面A(図1a)及びA’(図1a)を有する。貫通穴としては、例えばスルーホール、ビアホール、部品穴等が挙げられる。穴径は、例えば50〜500μmである。 In the first aspect of the manufacturing method of the present application, a printed wiring board 1 (FIG. 1a) serving as a base material has a through hole 2 (FIG. 1a). On both sides of the through hole 2 (FIG. 1a), there are open end faces A (FIG. 1a) and A ′ (FIG. 1a), respectively. Examples of the through hole include a through hole, a via hole, and a component hole. The hole diameter is, for example, 50 to 500 μm.
プリント配線基板としては、後述の露光光を透過させないもの(即ち、非透光性のもの)を用いる。具体的には、プリント配線基板としては、非透光性材料から成るもの、遮光剤が配合されたもの、及び遮光材料(フィルム状、シート状、板状のもの等)にて表面被覆されたもの等が挙げられる。 As the printed wiring board, a substrate that does not transmit exposure light described later (that is, a non-translucent substrate) is used. Specifically, the printed wiring board is surface-coated with a non-translucent material, a light-shielding agent, and a light-shielding material (film, sheet, plate, etc.). And the like.
本願に係る製造方法においては、従来、研磨することが困難又は不適であった、極めて薄いプリント配線基板[厚さ0.2mm以下(特に0.1mm以下)のもの等]や、寸法変化に極めて弱いプリント配線基板(例えば、回路幅10μm以下のもの、PKG基板等)でも、好適に用いることができる。 In the manufacturing method according to the present application, it has been difficult or unsuitable to polish, and an extremely thin printed wiring board (thickness of 0.2 mm or less (especially 0.1 mm or less)) or a dimensional change is extremely difficult. A weak printed wiring board (for example, a circuit width of 10 μm or less, a PKG board, or the like) can be preferably used.
本願製造方法の第1態様において、先ずプリント配線基板1(図1b)を透光性平坦材B(図1b)上に載せる。透光性平坦材Bは、後述の露光光を透過させ(即ち、透光性を有し)、少なくとも片面(好ましくは両面)が平坦面を有するものであり、後工程において取り除くことが容易なものが好ましい。具体的には、透光性平坦材Bとしては、フィルム(PETフィルム等)、シート、プレート等挙げられ、好ましくはフィルムである。フィルムの膜厚は、例えば10〜200μmが好ましい。 In the first aspect of the manufacturing method of the present application, first, the printed wiring board 1 (FIG. 1b) is placed on the translucent flat member B (FIG. 1b). The translucent flat material B transmits exposure light described later (that is, has translucency), and has at least one surface (preferably both surfaces) having a flat surface and can be easily removed in a subsequent process. Those are preferred. Specifically, the translucent flat material B includes a film (PET film or the like), a sheet, a plate, or the like, and is preferably a film. As for the film thickness of a film, 10-200 micrometers is preferable, for example.
プリント配線基板を上記透光性平坦材B上に載せる場合、貫通穴の一方の開口端面Aを、透光性平坦材Bと対向させる。これにより、開口端面Aは透光性平坦材Bにより塞がれる。具体的には、開口端面Aのある側のプリント配線基板表面の全面、又は開口端面Aとその近傍のみが、透光性平坦材B上に載っていてよい。 When the printed wiring board is placed on the translucent flat member B, one opening end surface A of the through hole is opposed to the translucent flat member B. Thereby, the opening end surface A is closed by the translucent flat material B. Specifically, the entire surface of the printed wiring board on the side having the opening end surface A or only the opening end surface A and the vicinity thereof may be placed on the translucent flat member B.
その後、光硬化性樹脂組成物3(図1c)を貫通穴に塗布充填する。光硬化性樹脂組成物は、無溶剤である。溶剤タイプの場合、溶剤の乾燥除去の際、塗布樹脂層の体積変化が大きく、その結果、塗布表面にて凹みが生ずることがある。また、溶剤タイプの場合、溶剤の乾燥除去後、塗布樹脂層の樹脂粘度が高くなり、後述の硬質ロールによる薄層化が困難となることがある。光硬化性樹脂組成物としては、更に環境の観点から、アルカリ現像性、即ちアルカリ水溶液にて現像可能なものが好ましい。Thereafter, the photocurable resin composition 3 (FIG. 1c) is applied and filled into the through holes. The photocurable resin composition is solvent-free. In the case of the solvent type, when the solvent is removed by drying, the volume change of the coating resin layer is large, and as a result, a dent may be formed on the coating surface. In the case of the solvent type, after the solvent is removed by drying, the resin viscosity of the coated resin layer becomes high, and it may be difficult to make a thin layer using a hard roll described later. As the photocurable resin composition, those having alkali developability, that is, developable with an aqueous alkali solution are preferable from the viewpoint of the environment.
そのような光硬化性樹脂組成物としては、光・熱硬化性(光・熱二段硬化型)樹脂組成物が好ましい。光・熱硬化性樹脂組成物としては、[I]不飽和基を有し、アルカリ可溶性の樹脂、[II](メタ)アクリルモノマー類、[III]光反応開始剤、[IV]エポキシ化合物、及び[V]熱硬化剤を含有するものが挙げられる。 As such a photocurable resin composition, a light / thermosetting (light / thermal two-stage curable) resin composition is preferable. The photo / thermosetting resin composition includes [I] unsaturated group, alkali-soluble resin, [II] (meth) acrylic monomers, [III] photoreaction initiator, [IV] epoxy compound, And [V] those containing a thermosetting agent.
光・熱硬化性樹脂組成物において、樹脂[I]としては、例えば2個以上のエチレン性不飽和基とカルボキシル基を有し、固形分酸価が50〜150mgKOH/gの樹脂[I−1]が挙げられる。 In the photo / thermosetting resin composition, the resin [I] is, for example, a resin [I-1] having two or more ethylenically unsaturated groups and a carboxyl group and having a solid content acid value of 50 to 150 mgKOH / g. ].
樹脂[I−1]としては、例えば2個以上のエポキシ基を有する多官能エポキシ樹脂(a)と不飽和モノカルボン酸(b)とをエステル化反応させ、得られたエステル化物の水酸基に飽和及び/又は不飽和多塩基酸無水物(c)を反応させて得られる樹脂[I−1−i]が挙げられる。 As the resin [I-1], for example, a polyfunctional epoxy resin (a) having two or more epoxy groups and an unsaturated monocarboxylic acid (b) are esterified and saturated with the hydroxyl group of the obtained esterified product. And / or resin [I-1-i] obtained by reacting unsaturated polybasic acid anhydride (c).
樹脂[I−1−i]において、多官能エポキシ樹脂(a)としては、具体的にはビスフェノールA型エポキシ樹脂、水添ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAのノボラック型エポキシ樹脂、ビフェノール型エポキシ樹脂、ビキシレノール型エポキシ樹脂、トリスフェノールメタン型エポキシ樹脂、N−グリシジル型エポキシ樹脂等が挙げられる。 In the resin [I-1-i], as the polyfunctional epoxy resin (a), specifically, bisphenol A type epoxy resin, hydrogenated bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, Examples thereof include phenol novolac type epoxy resins, cresol novolac type epoxy resins, bisphenol A novolak type epoxy resins, biphenol type epoxy resins, bixylenol type epoxy resins, trisphenol methane type epoxy resins, N-glycidyl type epoxy resins and the like.
樹脂[I−1−i]において、不飽和モノカルボン酸(b)としては、アクリル酸、メタアクリル酸、桂皮酸、飽和又は不飽和の二塩基酸無水物と1分子中に1個の水酸基を有する(メタ)アクリレート類との反応物等が挙げられる。 In the resin [I-1-i], the unsaturated monocarboxylic acid (b) includes acrylic acid, methacrylic acid, cinnamic acid, a saturated or unsaturated dibasic acid anhydride, and one hydroxyl group in one molecule. Reaction products with (meth) acrylates having
樹脂[I−1−i]において、飽和及び/又は不飽和多塩基酸無水物(c)としては、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、コハク酸、トリメリット酸、ピロメリット酸等の無水物等が挙げられる。 In the resin [I-1-i], examples of the saturated and / or unsaturated polybasic acid anhydride (c) include phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, succinic acid, trimellitic acid, pyromellitic acid, and the like. The anhydride of these is mentioned.
他の樹脂[I−1]としては、例えばアクリル酸及び/又はメタクリル酸と他のエチレン性不飽和結合を有する共重合性モノマー(d)との共重合物に、部分的にグリシジルアクリレート及び/又はグリシジルメタクリレートを反応させて得られる重量平均分子量が5,000〜20,000の樹脂[I−1−ii]が挙げられる。 As other resin [I-1], for example, a glycidyl acrylate and / or a copolymer of acrylic acid and / or methacrylic acid and another copolymerizable monomer (d) having an ethylenically unsaturated bond may be used. Alternatively, resin [I-1-ii] having a weight average molecular weight of 5,000 to 20,000 obtained by reacting glycidyl methacrylate can be mentioned.
樹脂[I−1−ii]において、共重合性モノマー(d)としては、具体的にはスチレン、クロロスチレン、α−メチルスチレン;置換基[メチル、エチル、プロピル、イソプロピル、n−ブチル、イソブチル、t−ブチル、アミル、2−エチルヘキシル、オクチル、カプリル、ノニル、ドデシル、ヘキサデシル、オクタデシル、シクロヘキシル、イソボルニル、メトキシエチル、ブトキシエチル、2−ヒドロキシエチル、2−ヒドロキシプロピル、3−クロロ−2−ヒドロキシプロピル等]を有するアクリレート若しくはメタクリレート;モルホリンのアクリレート若しくはメタクリレート、ポリエチレングリコールのモノアクリレート若しくはモノメタクリレート、ポリプロピレングリコールのモノアクリレート若しくはモノメタクリレート;酢酸ビニル、酪酸ビニル、安息香酸ビニル;アクリルアミド、メタクリルアミド、N−ヒドロキシメチルアクリルアミド、N−ヒドロキシメチルメタクリルアミド、N−メトキシメチルアクリルアミド、N−エトキシメチルアクリルアミド、N−ブトキシメチルアクリルアミド;アクリロニトリル若しくは無水マレイン酸等が挙げられる。 In the resin [I-1-ii], specific examples of the copolymerizable monomer (d) include styrene, chlorostyrene, α-methylstyrene; substituents [methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl. , T-butyl, amyl, 2-ethylhexyl, octyl, capryl, nonyl, dodecyl, hexadecyl, octadecyl, cyclohexyl, isobornyl, methoxyethyl, butoxyethyl, 2-hydroxyethyl, 2-hydroxypropyl, 3-chloro-2-hydroxy Acrylate or methacrylate having propyl etc .; morpholine acrylate or methacrylate, polyethylene glycol monoacrylate or monomethacrylate, polypropylene glycol monoacrylate or monomethacrylate G: vinyl acetate, vinyl butyrate, vinyl benzoate; acrylamide, methacrylamide, N-hydroxymethyl acrylamide, N-hydroxymethyl methacrylamide, N-methoxymethyl acrylamide, N-ethoxymethyl acrylamide, N-butoxymethyl acrylamide; acrylonitrile or And maleic anhydride.
他の樹脂[I−1]としては、例えばグリシジルアクリレート及び/又はグリシジルメタクリレートと共重合性モノマー(d)との共重合物に、不飽和モノカルボン酸(b)を反応させ、得られた反応生成物の水酸基に飽和及び/又は不飽和多塩基酸無水物(c)を反応させて得られる重量平均分子量が5,000〜20,000の樹脂[I−1−iii]が挙げられる。 As another resin [I-1], for example, a reaction product obtained by reacting an unsaturated monocarboxylic acid (b) with a copolymer of glycidyl acrylate and / or glycidyl methacrylate and a copolymerizable monomer (d). A resin [I-1-iii] having a weight average molecular weight of 5,000 to 20,000 obtained by reacting a hydroxyl group of the product with a saturated and / or unsaturated polybasic acid anhydride (c) can be mentioned.
樹脂[I−1−iii]において、共重合性モノマー(d)、不飽和モノカルボン酸(b)、並びに飽和及び/又は不飽和多塩基酸無水物(c)としては、樹脂[I−1−i]及び樹脂[I−1−ii]において例示したものが挙げられる。 In resin [I-1-iii], as copolymerizable monomer (d), unsaturated monocarboxylic acid (b), and saturated and / or unsaturated polybasic acid anhydride (c), resin [I-1 -I] and resin [I-1-ii] are exemplified.
光・熱硬化性樹脂組成物において、[II](メタ)アクリルモノマー類としては、具体的にはイソボロニルアクリレート、ジシクロペンタニルメタクリレート、ヒドロキシビバリン酸ネオペンチルグリコールジアクリレート、トリシクロデカンジメタノールアクリレート、トリメチロールプロパントリアクリレート、ジペンタエリスリトールヘキサアクリレート、クロトン酸イソボロニル等が挙げられる。 In the photo / thermosetting resin composition, specific examples of [II] (meth) acrylic monomers include isobornyl acrylate, dicyclopentanyl methacrylate, hydroxypentylglycol diacrylate, tricyclode Examples include candimethanol acrylate, trimethylolpropane triacrylate, dipentaerythritol hexaacrylate, and isobornyl crotonic acid.
光・熱硬化性樹脂組成物において、[III]光反応開始剤としては、具体的にはベンジルジメチルケタール、1−ヒドロキシ−シクロヘキシル−フェニルケトン、2−ヒドロキシ−2−メチル−1−フェニルプロパン−1−オン等のヒドロキシケトン類、2−メチル−1[(4−メチルチオ)フェニル]−2−モリフォリノプロパン−1−オン、2−ベンジル−2−ジメチルアミノ−1−(4−モルフォリノフェニル)ブタノン−1等のアミノケトン類、2,4,6−トリメチルベンゾイルジフェニルフォスフィンオキサイド、ビス(2,4,6−トリメチルベンゾイル)フェニルフォスフィンオキサイド等のフォスフィンオキサイド類、ベンゾインメチルエーテル、ベンゾインイソブチルエーテル等のベンゾインエーテル類、イソプロピルチオキサントン、2−クロロチオキサントン等のチオキサントン類、ベンゾフェノン、2−ベンゾイルナフタレン、4−ベンゾイルビフェニル、4−ベンゾイルジフェニルエーテル、[4−(メチルフェニルチオ)フェニル]フェニルメタン等のベンゾフェノン類、2−エチルアントラキノン等のアントラキノン類、2,2‘−ビス(o−クロロフェニル)4,5,4’,5’,−テトラフェニル−1,2’ビイミダゾール等のビイミダゾール類、10−ブチル−2−クロロアクリドン等のアクリドン類、ベンジル類、イルガキュアー784として市販されているチタノセン化合物類、トリアリルスルフォニウム−6フッ化リン(または6−フッ化アンチモン)類等が挙げられる。 In the photo / thermosetting resin composition, specific examples of [III] photoreaction initiator include benzyl dimethyl ketal, 1-hydroxy-cyclohexyl-phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropane- Hydroxy ketones such as 1-one, 2-methyl-1 [(4-methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholino Amino ketones such as phenyl) butanone-1, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, phosphine oxides such as bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide, benzoin methyl ether, benzoin Benzoin ethers such as isobutyl ether, isopropyl Thioxanthones such as thioxanthone and 2-chlorothioxanthone, benzophenone, 2-benzoylnaphthalene, 4-benzoylbiphenyl, 4-benzoyldiphenyl ether, benzophenones such as [4- (methylphenylthio) phenyl] phenylmethane, 2-ethylanthraquinone and the like Anthraquinones, biimidazoles such as 2,2′-bis (o-chlorophenyl) 4,5,4 ′, 5 ′,-tetraphenyl-1,2′biimidazole, 10-butyl-2-chloroacridone And titanocene compounds marketed as Irgacure 784, triallylsulfonium-6-fluoride (or 6-antimony fluoride), and the like.
光・熱硬化性樹脂組成物において、[IV]エポキシ化合物としては、エポキシ基を2個以上有するものが好ましく、(メタ)アクリルモノマー類に対し可溶性のもの及び難溶性のものが挙げられる。具体的には、エポキシ化合物の成分[IV]としては、可溶性エポキシ化合物[ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、N,N,O−トリス(グリシジル)−p−アミノフェノール、ビスフェノールAD型エポキシ樹脂等の液状エポキシ樹脂、及びノボラック型エポキシ樹脂等]、並びに難溶性エポキシ化合物[トリグリシジルイソシアヌレート型、ビフェニル型(テトラメチルビフェニル型等)、ジフェニル型[ジ−(p−グリシジルフェニル)エーテル等]、ハイドロキノン型(ハイドロキノンジグリシジルエーテル等)、ビフェニルノボラック型、及びフルオレイン型等の結晶性エポキシ樹脂等]が挙げられる。 In the photo / thermosetting resin composition, the [IV] epoxy compound preferably has two or more epoxy groups, and examples thereof include those soluble in (meth) acrylic monomers and those hardly soluble. Specifically, the epoxy compound component [IV] includes soluble epoxy compounds [bisphenol A type epoxy resin, bisphenol F type epoxy resin, N, N, O-tris (glycidyl) -p-aminophenol, bisphenol AD type. Liquid epoxy resins such as epoxy resins and novolac type epoxy resins, etc., and poorly soluble epoxy compounds [triglycidyl isocyanurate type, biphenyl type (tetramethylbiphenyl type, etc.), diphenyl type [di- (p-glycidylphenyl) ether Etc.], crystalline epoxy resins such as hydroquinone type (hydroquinone diglycidyl ether, etc.), biphenyl novolac type, fluorin type, etc.].
光・熱硬化性樹脂組成物において、[V]熱硬化剤としては、具体的にはジシアンジアミド(DICY)類、メラミン、イミダゾール類、BF3−アミン錯体、アミンアダクト型硬化剤、アミン−酸無水物(ポリアミド)アダクト型硬化剤、ヒドラジド系硬化剤、アミン系硬化剤のカルボン酸塩、オニウム塩等が挙げられる。 In the photo / thermosetting resin composition, specific examples of the [V] thermosetting agent include dicyandiamides (DICY), melamine, imidazoles, BF3-amine complexes, amine adduct type curing agents, and amine-acid anhydrides. (Polyamide) Adduct type curing agents, hydrazide type curing agents, amine type curing agent carboxylates, onium salts and the like.
光・熱硬化性樹脂組成物において、添加剤として、例えばハレーション防止剤、消泡剤、充填剤、レベリング剤、チキソトロピー付与剤、有機・無機着色剤、難燃剤等を含有してよい。 In the photo / thermosetting resin composition, for example, an antihalation agent, an antifoaming agent, a filler, a leveling agent, a thixotropy imparting agent, an organic / inorganic colorant, a flame retardant, and the like may be contained as additives.
光・熱硬化性樹脂組成物の組成において、成分[I]が100重量部の場合それぞれ、成分[II]50〜400(特に100〜300)重量部、成分[III]1〜20(特に5〜15)重量部、成分[IV]10〜100(特に50〜80)重量部、及び成分[V]1〜20(特に5〜10)重量部、が好ましい。 In the composition of the photo / thermosetting resin composition, when the component [I] is 100 parts by weight, the component [II] is 50 to 400 (particularly 100 to 300) part by weight, and the component [III] is 1 to 20 (particularly 5). To 15) parts by weight, component [IV] 10 to 100 (particularly 50 to 80) parts by weight, and component [V] 1 to 20 (particularly 5 to 10) parts by weight are preferred.
本願製造方法の第1態様において、光硬化性樹脂組成物の貫通穴への塗布充填は、例えば真空下又は大気下、スクリーン印刷やロールコート等にて行うことができる。大気下、塗布充填した場合、樹脂を更に脱泡(加熱脱泡、真空脱泡等)するのが好ましい。樹脂の貫通穴への塗布充填量は、少なくとも開口端面A’の高さ以上となる量であり、通常、開口端面A’を含む面を基準面として、この基準面4(図1c)より上の樹脂層厚が50〜500μmとなる量である。 In the first aspect of the production method of the present application, the application and filling of the photocurable resin composition into the through holes can be performed by, for example, screen printing or roll coating under vacuum or in the air. When coating and filling in the atmosphere, it is preferable to further defoam the resin (heat defoaming, vacuum defoaming, etc.). The filling amount of the resin into the through hole is an amount that is at least the height of the opening end surface A ′. Usually, the surface including the opening end surface A ′ is used as a reference surface, and is higher than the reference surface 4 (FIG. 1c). The amount of the resin layer is 50 to 500 μm.
その後、貫通穴の開口端面A’のある側のプリント配線基板表面上に平坦材B’(図1d)を載せる。その場合、少なくとも開口端面A’上に平坦材B’を載せる。好ましくは、塗布充填樹脂3(図1d)の露出面が覆われるように、平坦材B’を載せる。具体的には、開口端面A’のある側のプリント配線基板表面の全面上に、又は開口端面A’とその近傍上に、平坦材B’を載せてよい。 Thereafter, a flat material B '(FIG. 1d) is placed on the surface of the printed wiring board on the side where the opening end surface A' of the through hole is located. In this case, the flat material B ′ is placed on at least the opening end surface A ′. Preferably, the flat material B 'is placed so that the exposed surface of the coating filling resin 3 (FIG. 1d) is covered. Specifically, the flat material B ′ may be placed on the entire surface of the printed wiring board on the side where the opening end surface A ′ is present or on the opening end surface A ′ and the vicinity thereof.
平坦材B’は、少なくとも片面(好ましくは両面)が平坦面を有するものであり、後工程において取り除くことが容易なものが好ましい。具体的には、平坦材B’としては、フィルム(PETフィルム等)、シート、プレート等挙げられ、好ましくはフィルムである。フィルムの膜厚は、例えば10〜100μmが好ましい。平坦材B’には、前記透光性平坦材Bが含まれる。 It is preferable that the flat material B ′ has at least one surface (preferably both surfaces) has a flat surface and can be easily removed in a subsequent process. Specifically, examples of the flat material B ′ include a film (PET film and the like), a sheet, a plate, and the like, and a film is preferable. As for the film thickness of a film, 10-100 micrometers is preferable, for example. The flat material B 'includes the translucent flat material B.
その後、平坦材B’(図1d)上にて硬質ロール5(図1d)を移動させる。具体的には、硬質ロール5(図1d)を、圧力0.1〜1MPaにて平坦材B’(図1d)に押し付けつつ回転させながら、速度0.1〜2m/分にて移動させる。硬質ロールは、ビッカース硬度が回路材質以上のものが好ましい。具体的には、硬質ロールの材質としては、金属(ステンレススチール、鉄、アルミ、銅等)が挙げられ、好ましくはステンレススチールである。ロール径は、例えば5〜250mmが好ましい。 Thereafter, the hard roll 5 (FIG. 1d) is moved on the flat member B ′ (FIG. 1d). Specifically, the hard roll 5 (FIG. 1d) is moved at a speed of 0.1 to 2 m / min while being rotated while being pressed against the flat material B ′ (FIG. 1d) at a pressure of 0.1 to 1 MPa. The hard roll preferably has a Vickers hardness equal to or higher than the circuit material. Specifically, the material of the hard roll includes metal (stainless steel, iron, aluminum, copper, etc.), and preferably stainless steel. The roll diameter is preferably 5 to 250 mm, for example.
ロール移動により、開口端面A’上の塗布樹脂は扱(しご)かれ、所望の層厚になるまで薄層化される。具体的には、開口端面A’を含む面を基準面として、この基準面4(図1e)より上の樹脂層厚が好ましくは5μm以下(より好ましくは3μm以下、最も好ましくは1μm以下)となるように、平坦材B’上にて硬質ロールを移動させる。 By the roll movement, the coating resin on the opening end surface A ′ is handled (ladder) and thinned to a desired layer thickness. Specifically, with the surface including the opening end surface A ′ as a reference surface, the resin layer thickness above the reference surface 4 (FIG. 1e) is preferably 5 μm or less (more preferably 3 μm or less, most preferably 1 μm or less). The hard roll is moved on the flat material B ′.
その後、透光性平坦材B(図1e)を介して樹脂を露光する。具体的には、透光性平坦材Bの側から樹脂に向け、光照射する。光照射条件としては、例えば照射光波長300〜450nm、照射量10〜2000mJ/cm2である。Thereafter, the resin is exposed through the translucent flat member B (FIG. 1e). Specifically, light irradiation is performed from the translucent flat member B side toward the resin. The light irradiation conditions are, for example, an irradiation light wavelength of 300 to 450 nm and an irradiation amount of 10 to 2000 mJ / cm 2 .
露光後、透光性平坦材Bをプリント配線基板より取り除く(具体的には、剥離する。)。透光性平坦材Bを取り除く時期は、露光後であれば特に限定されず、任意の工程段階で行ってよい。具体的には、下記平坦材B’を取り除く工程又は未露光樹脂の現像除去工程の、それぞれ前、後、又は同時であってよい。 After the exposure, the translucent flat material B is removed from the printed wiring board (specifically, peeled off). The timing for removing the translucent flat member B is not particularly limited as long as it is after the exposure, and may be performed at any step. Specifically, it may be before, after, or simultaneously with the step of removing the following flat material B 'or the step of developing and removing the unexposed resin.
平坦材B’をプリント配線基板より取り除く(具体的には、剥離等する。)。この結果、平坦材B’にて覆われていた樹脂が露出する。 The flat material B 'is removed from the printed wiring board (specifically, it is peeled off). As a result, the resin covered with the flat material B ′ is exposed.
露出した樹脂の内、未露光樹脂を現像により除去し、必要に応じプリント配線基板表面を洗浄(水洗等)する。現像液は、水性アルカリ現像液(炭酸ナトリウム水溶液等)が好ましい。その結果、非透光性プリント配線基板により遮蔽されていた塗布樹脂、具体的には開口端面A’を除くプリント配線基板表面上の被覆樹脂が除去される(図1f)。 Of the exposed resin, the unexposed resin is removed by development, and the printed wiring board surface is washed (washed with water, etc.) as necessary. The developer is preferably an aqueous alkaline developer (such as an aqueous sodium carbonate solution). As a result, the coating resin shielded by the non-transparent printed wiring board, specifically, the coating resin on the printed wiring board surface excluding the opening end face A ′ is removed (FIG. 1f).
その後、光硬化性樹脂組成物として例えば光・熱硬化性樹脂組成物等を用いた場合、必要に応じ、露光樹脂を更に加熱硬化(例えば、100〜200℃、10〜180分)する。
上記のようにして、本願製造方法の第1態様から、プリント配線板が製造される。Thereafter, when, for example, a photo / thermosetting resin composition or the like is used as the photocurable resin composition, the exposure resin is further heat-cured (for example, 100 to 200 ° C., 10 to 180 minutes) as necessary.
As described above, the printed wiring board is manufactured from the first aspect of the manufacturing method of the present application.
本願発明に係るプリント配線板の製造方法の第2態様は、下記工程I)を行った後、平坦材B’上にて硬質ロールを移動させ、透光性平坦材Bを介して樹脂を露光し、露光後の任意の工程段階において透光性平坦材Bを取り除き、平坦材B’を取り除き、未露光樹脂を現像により除去する、ことを特徴とする。 In the second aspect of the method for manufacturing a printed wiring board according to the present invention, after performing the following step I), the hard roll is moved on the flat material B ′, and the resin is exposed through the translucent flat material B. The light-transmitting flat material B is removed at any process stage after exposure, the flat material B ′ is removed, and the unexposed resin is removed by development.
工程I)は、貫通穴の一方の開口端面Aの周縁の少なくとも一部にパッドが設けられた非透光性プリント配線基板を、貫通穴の他方の開口端面A’が透光性平坦材Bと対向するように透光性平坦材B上に載せ、少なくともパッド端面の高さ以上に樹脂が充填されるよう光硬化性樹脂組成物を貫通穴に塗布充填し、パッド端面を含むプリント配線基板表面上に他の平坦材B’を載せる工程、を含む。 In the step I), a non-translucent printed wiring board in which a pad is provided on at least a part of the periphery of one opening end surface A of the through hole is used, and the other opening end surface A ′ of the through hole is a translucent flat material B. A printed wiring board including the pad end surface, which is placed on the translucent flat member B so as to face the substrate, and is coated and filled with a photocurable resin composition so that the resin is filled at least at the height of the pad end surface. Placing another flat material B ′ on the surface.
工程I)において、基材となるプリント配線基板1(図2a)としては、第1態様において例示したプリント配線基板にパッドを設けたものを用いることができる。パッド7(図2a)は、貫通穴2(図2a)の一方の開口端面A(図2a)の周縁の少なくとも一部、典型的には周縁の全周に亘って、設けられる。パッド厚は、例えば10〜100(特に20〜50)μmが、好ましい。 In step I), as the printed wiring board 1 (FIG. 2a) serving as a base material, a printed wiring board exemplified in the first embodiment provided with a pad can be used. The pad 7 (FIG. 2a) is provided over at least a part of the peripheral edge of one open end surface A (FIG. 2a) of the through hole 2 (FIG. 2a), typically over the entire periphery. The pad thickness is preferably 10 to 100 (particularly 20 to 50) μm, for example.
工程I)において、プリント配線基板1(図2b)を、透光性平坦材B(図2b)上に載せる。透光性平坦材Bとしては、第1態様において例示したものが挙げられる。 In step I), the printed wiring board 1 (FIG. 2b) is placed on the translucent flat material B (FIG. 2b). As translucent flat material B, what was illustrated in the 1st aspect is mentioned.
プリント配線基板を上記透光性平坦材B上に載せる場合、第1態様と同様にして、貫通穴の他方の開口端面A’(図2a)を、透光性平坦材Bと対向させる。 When the printed wiring board is placed on the translucent flat member B, the other opening end surface A ′ (FIG. 2 a) of the through hole is opposed to the translucent flat member B in the same manner as in the first embodiment.
その後、光硬化性樹脂組成物3(図2c)を貫通穴に塗布充填する。光硬化性樹脂組成物としては、第1態様において例示したものが挙げられる。 Thereafter, the photocurable resin composition 3 (FIG. 2c) is applied and filled into the through holes. As a photocurable resin composition, what was illustrated in the 1st aspect is mentioned.
光硬化性樹脂組成物の貫通穴への塗布充填は、第1態様と同様にして、行うことができる。樹脂の貫通穴への塗布充填量は、少なくともパッド端面の高さ以上となる量であり、通常、パッド端面を含む面を基準面として、この基準面4(図2c)より上の樹脂層厚が50〜500μmとなる量である。 The application and filling of the photocurable resin composition into the through holes can be performed in the same manner as in the first embodiment. The filling amount of the resin into the through hole is an amount that is at least the height of the pad end surface. Usually, the resin layer thickness above the reference surface 4 (FIG. 2c) is a surface including the pad end surface. Is an amount of 50 to 500 μm.
その後、パッド端面のある側のプリント配線基板表面上に平坦材B’(図2d)を載せる。その場合、少なくともパッド端面上に平坦材B’を載せる。好ましくは、塗布充填樹脂3(図2d)の露出面が覆われるように、平坦材B’を載せる。具体的には、パッド端面のある側のプリント配線基板表面の全面上に、又はパッド端面とその近傍上に、平坦材B’を載せてよい。
平坦材B’としては、第1態様において例示したものが挙げられる。Thereafter, a flat material B ′ (FIG. 2d) is placed on the surface of the printed wiring board on the side having the pad end face. In that case, the flat material B ′ is placed on at least the pad end face. Preferably, the flat material B ′ is placed so that the exposed surface of the coating filling resin 3 (FIG. 2d) is covered. Specifically, the flat material B ′ may be placed on the entire surface of the printed wiring board on the side having the pad end face, or on the pad end face and the vicinity thereof.
Examples of the flat material B ′ include those exemplified in the first embodiment.
工程I)を行った後、第1態様と同様にして、平坦材B’(図2d)上にて硬質ロール5(図2d)を移動させる。 After performing step I), the hard roll 5 (FIG. 2d) is moved on the flat material B ′ (FIG. 2d) in the same manner as in the first embodiment.
ロール移動により、パッド端面上の塗布樹脂は扱かれ、所望の層厚になるまで薄層化される。具体的には、パッド端面を含む面を基準面として、この基準面4(図2e)より上の樹脂層厚が好ましくは5μm以下(より好ましくは3μm以下、最も好ましくは1μm以下)となるとなるように、平坦材B’上にて硬質ロールを移動させる。 By the roll movement, the coating resin on the pad end surface is handled and thinned to a desired layer thickness. Specifically, with the surface including the pad end surface as the reference surface, the resin layer thickness above the reference surface 4 (FIG. 2e) is preferably 5 μm or less (more preferably 3 μm or less, most preferably 1 μm or less). As described above, the hard roll is moved on the flat member B ′.
その後、第1態様と同様にして、透光性平坦材B(図2e)を介して樹脂3(図2e)を露光し、露光後の任意の工程段階において透光性平坦材Bを取り除き、平坦材B’を取り除き、未露光樹脂を現像により除去する。 Thereafter, in the same manner as in the first aspect, the resin 3 (FIG. 2e) is exposed through the light-transmitting flat material B (FIG. 2e), and the light-transmitting flat material B is removed in an arbitrary process step after the exposure. The flat material B ′ is removed, and the unexposed resin is removed by development.
その結果、非透光性プリント配線基板により遮蔽されていた塗布樹脂、具体的にはパッド端面を除くプリント配線基板表面上の被覆樹脂が除去される(図2f)。
その後、第1態様と同様、露光樹脂を更に加熱硬化してよい。
上記のようにして、本願製造方法の第2態様から、プリント配線板が製造される。As a result, the coating resin shielded by the non-transparent printed wiring board, specifically, the coating resin on the surface of the printed wiring board excluding the pad end face is removed (FIG. 2f).
Thereafter, as in the first embodiment, the exposed resin may be further heat-cured.
As described above, a printed wiring board is manufactured from the second aspect of the manufacturing method of the present application.
本願発明に係るプリント配線板の製造方法の第3態様は、下記工程II)を行った後、平坦材B’上にて硬質ロールを移動させ、透光性平坦材Bを介して樹脂を露光し、露光後の任意の工程段階において透光性平坦材Bを取り除き、平坦材B’を取り除き、未露光樹脂を現像により除去する、ことを特徴とする。 In the third aspect of the method for producing a printed wiring board according to the present invention, after performing the following step II), the hard roll is moved on the flat material B ′, and the resin is exposed through the translucent flat material B. The light-transmitting flat material B is removed at any process stage after exposure, the flat material B ′ is removed, and the unexposed resin is removed by development.
工程II)は、貫通穴の一方の開口端面Aの周縁の少なくとも一部にパッドが設けられた非透光性プリント配線基板を、パッド端面が透光性平坦材Bと対向するように透光性平坦材B上に載せ、光硬化性樹脂組成物を貫通穴に塗布充填し、貫通穴の他方の開口端面A’を含むプリント配線基板表面上に他の平坦材B’を載せる工程、を含む。 In step II), a non-translucent printed wiring board in which a pad is provided on at least a part of the periphery of one opening end surface A of the through hole is translucent so that the pad end surface faces the translucent flat material B. A step of placing on the flat surface material B, coating and filling the photocurable resin composition in the through hole, and placing another flat material B ′ on the surface of the printed wiring board including the other open end surface A ′ of the through hole. Including.
工程II)において、基材となるプリント配線基板1(図3a)としては、工程I)において例示したものを用いることができる。 In the step II), as the printed wiring board 1 (FIG. 3a) serving as a base material, those exemplified in the step I) can be used.
工程II)において、プリント配線基板1(図3b)を、透光性平坦材B(図3b)上に載せる。透光性平坦材Bとしては、第1態様において例示したものが挙げられる。 In step II), the printed wiring board 1 (FIG. 3b) is placed on the translucent flat material B (FIG. 3b). As translucent flat material B, what was illustrated in the 1st aspect is mentioned.
プリント配線基板を上記透光性平坦材B上に載せる場合、パッド7(図3b)端面を、透光性平坦材Bと対向させる。これにより、パッド端面は透光性平坦材Bにより塞がれる。具体的には、パッド端面のある側のプリント配線基板表面の全面、又はパッド端面とその近傍のみが、透光性平坦材B上に載っていてよい。 When the printed wiring board is placed on the translucent flat member B, the end surface of the pad 7 (FIG. 3b) is opposed to the translucent flat member B. As a result, the pad end face is closed by the translucent flat material B. Specifically, the entire surface of the printed wiring board on the side having the pad end face or only the pad end face and the vicinity thereof may be placed on the translucent flat member B.
その後、光硬化性樹脂組成物3(図3c)を貫通穴に塗布充填する。光硬化性樹脂組成物としては、第1態様において例示したものが挙げられる。
光硬化性樹脂組成物の貫通穴への塗布充填は、第1態様と同様にして、行うことができる。
その後、第1態様と同様にして、貫通穴の開口端面A’(図3a)のある側のプリント配線基板表面上に平坦材B’(図3d)を載せる。
平坦材B’としては、第1態様において例示したものが挙げられる。Thereafter, the photocurable resin composition 3 (FIG. 3c) is applied and filled into the through holes. As a photocurable resin composition, what was illustrated in the 1st aspect is mentioned.
The application and filling of the photocurable resin composition into the through holes can be performed in the same manner as in the first embodiment.
Thereafter, in the same manner as in the first embodiment, a flat material B ′ (FIG. 3d) is placed on the surface of the printed wiring board on the side where the opening end surface A ′ (FIG. 3a) of the through hole is located.
Examples of the flat material B ′ include those exemplified in the first embodiment.
工程II)を行った後、第1態様と同様にして、平坦材B’(図3d)上にて硬質ロール5(図3d)を移動させ、透光性平坦材B(図3e)を介して樹脂3(図3e)を露光し、露光後の任意の工程段階において透光性平坦材Bを取り除き、平坦材B’を取り除き、未露光樹脂を現像により除去する(図3f)。
その後、第1態様と同様、露光樹脂を更に加熱硬化してよい。
上記のようにして、本願製造方法の第3態様から、プリント配線板が製造される。After performing Step II), the hard roll 5 (FIG. 3d) is moved on the flat material B ′ (FIG. 3d) in the same manner as in the first embodiment, and the transparent flat material B (FIG. 3e) is interposed. Then, the resin 3 (FIG. 3e) is exposed, the translucent flat material B is removed at any step after the exposure, the flat material B ′ is removed, and the unexposed resin is removed by development (FIG. 3f).
Thereafter, as in the first embodiment, the exposed resin may be further heat-cured.
As described above, the printed wiring board is manufactured from the third aspect of the manufacturing method of the present application.
本願発明に係るプリント配線板の製造方法の第4態様は、貫通穴の両開口端面の周縁の少なくとも一部にそれぞれパッドが設けられた非透光性プリント配線基板を、一方のパッド端面Cが透光性平坦材Bと対向するように透光性平坦材B上に載せ、少なくとも他方のパッド端面C’の高さ以上に樹脂が充填されるよう光硬化性樹脂組成物を貫通穴に塗布充填し、パッド端面C’を含むプリント配線基板表面上に他の平坦材B’を載せ、平坦材B’上にて硬質ロールを移動させ、透光性平坦材Bを介して樹脂を露光し、露光後の任意の工程段階において透光性平坦材Bを取り除き、平坦材B’を取り除き、未露光樹脂を現像により除去する、ことを特徴とする。 According to a fourth aspect of the method for manufacturing a printed wiring board according to the present invention, a non-transparent printed wiring board in which pads are provided on at least a part of the periphery of both opening end faces of the through-holes, The photocurable resin composition is placed on the translucent flat member B so as to face the translucent flat member B, and the photocurable resin composition is applied to the through hole so that the resin is filled at least the height of the other pad end surface C ′. Fill and place another flat material B ′ on the surface of the printed wiring board including the pad end face C ′, move the hard roll on the flat material B ′, and expose the resin through the translucent flat material B. The light-transmitting flat material B is removed at any step after the exposure, the flat material B ′ is removed, and the unexposed resin is removed by development.
本願製造方法の第4態様において、基材となるプリント配線基板1(図4a)としては、第1態様において例示したプリント配線基板の両側にパッドを設けたものを用いることができる。パッド7(図4a)は、貫通穴2(図4a)の両側の開口端面の周縁の少なくとも一部、典型的には周縁の全周に亘って、それぞれ設けられており、パッド端面C(図4a)及びC’(図4a)が形成されている。パッド厚は、例えば10〜100(特に20〜50)μmが、好ましい。 In the fourth aspect of the manufacturing method of the present application, as the printed wiring board 1 (FIG. 4a) serving as a base material, a printed wiring board exemplified in the first aspect provided with pads on both sides can be used. The pad 7 (FIG. 4a) is provided over at least a part of the periphery of the opening end surface on both sides of the through hole 2 (FIG. 4a), typically over the entire periphery, and the pad end surface C (see FIG. 4a). 4a) and C ′ (FIG. 4a) are formed. The pad thickness is preferably 10 to 100 (particularly 20 to 50) μm, for example.
本願製造方法の第4態様において、プリント配線基板1(図4b)を、透光性平坦材B(図4b)上に載せる。透光性平坦材Bとしては、第1態様において例示したものが挙げられる。
プリント配線基板を上記透光性平坦材B上に載せる場合、工程II)と同様にして、一方のパッド端面Cを、透光性平坦材Bと対向させるIn the fourth aspect of the present application manufacturing method, the printed wiring board 1 (FIG. 4b) is placed on the translucent flat member B (FIG. 4b). As translucent flat material B, what was illustrated in the 1st aspect is mentioned.
When the printed wiring board is placed on the translucent flat member B, one pad end surface C is opposed to the translucent flat member B in the same manner as in the step II).
その後、光硬化性樹脂組成物3(図4c)を貫通穴に塗布充填する。光硬化性樹脂組成物としては、第1態様において例示したものが挙げられる。 Thereafter, the photocurable resin composition 3 (FIG. 4c) is applied and filled into the through holes. As a photocurable resin composition, what was illustrated in the 1st aspect is mentioned.
光硬化性樹脂組成物の貫通穴への塗布充填は、工程I)と同様にして、行うことができる。樹脂の貫通穴への塗布充填量は、少なくとも他方のパッド端面C’の高さ以上となる量であり、通常、パッド端面C’を含む面を基準面として、この基準面4(図4c)より上の樹脂層厚が50〜500μmとなる量である。 Application and filling of the photocurable resin composition into the through holes can be performed in the same manner as in step I). The filling amount of the resin into the through-hole is an amount that is at least the height of the other pad end surface C ′. Usually, the reference surface 4 (FIG. 4c) is defined with the surface including the pad end surface C ′ as the reference surface. The amount of the upper resin layer is 50 to 500 μm.
その後、工程I)と同様にして、パッド端面C’のある側のプリント配線基板表面上に平坦材B’(図4d)を載せる。
平坦材B’としては、第1態様において例示したものが挙げられる。
その後、第1態様と同様にして、平坦材B’(図4d)上にて硬質ロール5(図4d)を移動させる。Thereafter, in the same manner as in step I), a flat material B ′ (FIG. 4d) is placed on the surface of the printed wiring board on the side having the pad end surface C ′.
Examples of the flat material B ′ include those exemplified in the first embodiment.
Thereafter, similarly to the first embodiment, the hard roll 5 (FIG. 4d) is moved on the flat material B ′ (FIG. 4d).
ロール移動により、パッド端面C’上の塗布樹脂は扱かれ、所望の層厚になるまで薄層化される。具体的には、パッド端面C’を含む面を基準面として、この基準面4(図4e)より上の樹脂層厚が好ましくは5μm以下(より好ましくは3μm以下、最も好ましくは1μm以下)となるように、平坦材B’上にて硬質ロールを移動させる。 By the roll movement, the coating resin on the pad end surface C ′ is handled and thinned to a desired layer thickness. Specifically, with the surface including the pad end surface C ′ as a reference surface, the resin layer thickness above the reference surface 4 (FIG. 4e) is preferably 5 μm or less (more preferably 3 μm or less, most preferably 1 μm or less). The hard roll is moved on the flat material B ′.
その後、第1態様と同様にして、透光性平坦材B(図4e)を介して樹脂3(図4e)を露光し、露光後の任意の工程段階において透光性平坦材Bを取り除き、平坦材B’を取り除き、未露光樹脂を現像により除去する。 Thereafter, in the same manner as in the first embodiment, the resin 3 (FIG. 4e) is exposed through the light-transmitting flat material B (FIG. 4e), and the light-transmitting flat material B is removed in an arbitrary process step after the exposure. The flat material B ′ is removed, and the unexposed resin is removed by development.
その結果、非透光性プリント配線基板により遮蔽されていた塗布樹脂、具体的にはパッド端面C’を除くプリント配線基板表面上の被覆樹脂が除去される(図4f)。
その後、第1態様と同様、露光樹脂を更に加熱硬化してよい。
上記のようにして、本願製造方法の第4態様から、プリント配線板が製造される。As a result, the coating resin shielded by the non-transparent printed wiring board, specifically, the coating resin on the printed wiring board surface excluding the pad end face C ′ is removed (FIG. 4f).
Thereafter, as in the first embodiment, the exposed resin may be further heat-cured.
As described above, the printed wiring board is manufactured from the fourth aspect of the manufacturing method of the present application.
本願発明に係るプリント配線板の製造方法により、穴埋め硬化樹脂6(図5)表面とプリント配線基板表面1(図5)との段差8(図5)、又は穴埋め硬化樹脂6(図6)表面とパッド7(図6)表面との段差8(図6)が、5μm以下(より好ましくは3μm以下、最も好ましくは1μm以下)の、実質的に表面平坦化された穴埋めプリント配線板を製造することができる。 By the method for manufacturing a printed wiring board according to the present invention, the step 8 (FIG. 5) between the surface of the hole-filling cured resin 6 (FIG. 5) and the surface of the printed wiring board 1 (FIG. 5) or the surface of the hole-filling cured resin 6 (FIG. 6). And a pad 7 (FIG. 6) with a step 8 (FIG. 6) of 5 μm or less (more preferably 3 μm or less, most preferably 1 μm or less), and a substantially flat surface-filled printed wiring board is manufactured. be able to.
以下、本願発明を、実施例にて具体的に説明する。
・実施例1
プリント配線基板:スルーホール(穴径100μm)の上端及び下端の開口端面周縁(全周)にパッド(パッド厚30μm)が設けられた、非透光性プリント配線基板(三菱ガス化学社製、「CCL−HL802」、厚さ100μm、回路幅20μm)。Hereinafter, the present invention will be specifically described with reference to examples.
Example 1
Printed wiring board: Non-transparent printed wiring board (Mitsubishi Gas Chemical Company, “ CCL-HL802 ", thickness 100 μm, circuit width 20 μm).
光・熱硬化性樹脂組成物の配合組成:フェノールノボラック型エポキシ樹脂の50%アクリル酸付加物にテトラヒドロフタル酸無水物を付加させた、不飽和基含有アルカリ可溶性樹脂(酸価100mgKOH/g)(30重量部)、ペンタエリスリトールトリアクリレート(70重量部)、アクリロイルモルホリン(20重量部)、2−ベンジル−2−ジメチルアミノ−1−(4−モルフォリノフェニル)−ブタノン−1(光反応開始剤、2重量部)、シリコンオイル(消泡剤、1重量部)、ビスフェノールA型エポキシ樹脂(15重量部)、トリグリシジルイソシアヌレート型エポキシ樹脂(15重量部)、2−フェニル−4,5−ジヒドロキシメチルイミダゾール(熱反応開始剤、5重量部)、硫酸バリウム(30重量部)、及び球状シリカ(70重量部)を混合し、ロールミルで分散させて調製した組成物。 Composition of photo / thermosetting resin composition: unsaturated group-containing alkali-soluble resin (acid value 100 mgKOH / g) obtained by adding tetrahydrophthalic anhydride to 50% acrylic acid adduct of phenol novolac epoxy resin 30 parts by weight), pentaerythritol triacrylate (70 parts by weight), acryloylmorpholine (20 parts by weight), 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1 (photoinitiator) 2 parts by weight), silicone oil (antifoaming agent, 1 part by weight), bisphenol A type epoxy resin (15 parts by weight), triglycidyl isocyanurate type epoxy resin (15 parts by weight), 2-phenyl-4,5- Dihydroxymethylimidazole (thermal initiator, 5 parts by weight), barium sulfate (30 parts by weight), Ca (70 parts) were mixed and composition prepared by dispersing in a roll mill.
先ず、上記プリント配線基板を、PETフィルム(膜厚100μm、「フィルム1」とも言う。)上に載せ、熱プレス(圧力5MPa、120℃、60分)した。この結果、下方のパッド端面がPETフィルム1にて塞がれた。 First, the printed wiring board was placed on a PET film (film thickness: 100 μm, also referred to as “
次いで、スルーホールを、上記光・熱硬化性樹脂組成物にて真空スクリーン印刷により充填した。塗布充填量は、上方のパッド端面を含む面を基準面として、この基準面より上の樹脂層厚が200〜300μmとなる量であった。 Next, the through holes were filled with the photo / thermosetting resin composition by vacuum screen printing. The coating filling amount was such that the resin layer thickness above the reference surface was 200 to 300 μm with the surface including the upper pad end surface as the reference surface.
次いで、プリント配線基板上に別のPETフィルム(膜厚40μm、「フィルム2」とも言う。)を載せた。この結果、塗布充填樹脂の露出面がPETフィルム2にて覆われた。 Next, another PET film (film thickness: 40 μm, also referred to as “
その後、ステンレススチール製ロール(ロール径100mm)を、圧力0.2MPaにてPETフィルム2に押し付けつつ回転させながら、速度1m/分にて移動させた。ロール移動により、上方のパッド端面を含む面を基準面として、この基準面より上の樹脂層厚が3μm以下となった。 Thereafter, a stainless steel roll (roll diameter: 100 mm) was moved at a speed of 1 m / min while rotating while being pressed against the
その後、フィルム1の側から樹脂に向け、光照射(照射光波長365nm、照射量1600mJ/cm2)した。
その後、フィルム1及び2を、プリント配線基板より剥離した。Then, light irradiation (irradiation light wavelength 365 nm, irradiation amount 1600 mJ / cm 2 ) was performed from the
Then, the
その後、プリント配線基板表面を炭酸ナトリウム水溶液にて現像し、未露光樹脂を除去した。その結果、上方のパッド端面上の被覆樹脂だけ残し、プリント配線基板表面上にある他の被覆樹脂は除去された。
その後、露光樹脂を更に加熱硬化(150℃、60分)した。Thereafter, the surface of the printed wiring board was developed with an aqueous sodium carbonate solution to remove unexposed resin. As a result, only the coating resin on the upper pad end surface was left, and other coating resins on the surface of the printed wiring board were removed.
Thereafter, the exposed resin was further heat-cured (150 ° C., 60 minutes).
上記のようにして製造されたプリント配線板について、電子顕微鏡(1000倍)にて観察したところ、穴埋め硬化樹脂表面とパッド表面との段差は2.6μm以下であり、更に、破損、折れ曲がり、変形、及び寸法変化は全く観察されなかった。 When the printed wiring board manufactured as described above was observed with an electron microscope (1000 times), the level difference between the hole-filled cured resin surface and the pad surface was 2.6 μm or less, and was further damaged, bent, or deformed. And no dimensional change was observed.
・比較例1
上記光・熱硬化性樹脂組成物を、ポリエステルスクリーン(180メッシュ)を用い上記プリント配線基板に印刷し、スルーホール内に充填した。Comparative example 1
The photo / thermosetting resin composition was printed on the printed wiring board using a polyester screen (180 mesh) and filled into the through holes.
その後、プリント配線基板の両面から光照射(照射光波長365nm、照射量1600mJ/cm2)し、光硬化穴埋めプリント配線基板を作製した。Then, light irradiation (irradiation light wavelength 365nm, irradiation amount 1600mJ / cm < 2 >) was performed from both surfaces of the printed wiring board, and the photocuring hole-filled printed wiring board was produced.
その後、このプリント配線基板表面から食み出た不要な光硬化樹脂部分を、セラミックバフ(正興C&E社製、#600、上下各2本)を備えた研磨機を用い研磨により除去することを試みた。 After that, the unnecessary photo-curing resin portion protruding from the surface of the printed wiring board was tried to be removed by polishing using a polishing machine equipped with a ceramic buff (manufactured by Shoko C & E Co., Ltd., # 600, two each above and below). It was.
しかし、最初のバフを通過したところでプリント配線基板が反り、その結果プリント配線基板が研磨機内に詰まり排出(搬送)されなかった。研磨機からプリント配線基板を取り出したところ、プリント配線基板は折れ曲がり、破壊されていた。 However, the printed wiring board warped when it passed through the first buff, and as a result, the printed wiring board was clogged in the polishing machine and was not discharged (conveyed). When the printed wiring board was taken out from the polishing machine, the printed wiring board was bent and destroyed.
・比較例2
比較例1と同様にして、光硬化穴埋めプリント配線基板を作製した。
このプリント配線基板を冶具板に乗せ、プリント配線基板表面から食み出た不要な光硬化樹脂部分を、ベルトサンダー研磨機(研磨ベルト#800)を用い研磨により除去した。Comparative example 2
In the same manner as in Comparative Example 1, a photocured hole-filled printed wiring board was produced.
This printed wiring board was placed on a jig plate, and unnecessary photocured resin portions protruding from the surface of the printed wiring board were removed by polishing using a belt sander polishing machine (polishing belt # 800).
上記のようにして製造されたプリント配線板について、電子顕微鏡(1000倍)にて観察したところ、プリント配線板全体が反り、更に20μmの回路部まで研磨され、回路の無くなった(磨滅した)部分があった。 When the printed wiring board manufactured as described above was observed with an electron microscope (1000 times), the entire printed wiring board was warped and further polished to a circuit part of 20 μm, and the part where the circuit was lost (worn out). was there.
1 プリント配線基板
2 貫通穴
3 光硬化性樹脂組成物
4 開口端面又はパッド端面を含む基準面
5 硬質ロール
6 穴埋め硬化樹脂
7 パッド
8 段差
A、A’ 貫通穴の開口端面
B 透光性平坦材
B’ 平坦材
C、C’ パッド端面DESCRIPTION OF
Claims (11)
II)貫通穴の一方の開口端面Aの周縁の少なくとも一部にパッドが設けられた非透光性プリント配線基板を、パッド端面が透光性平坦材Bと対向するように透光性平坦材B上に載せ、光硬化性樹脂組成物を貫通穴に塗布充填し、貫通穴の他方の開口端面A’を含むプリント配線基板表面上に他の平坦材B’を載せ、
平坦材B’上にて硬質ロールを移動させ、透光性平坦材Bを介して樹脂を露光し、露光後の任意の工程段階において透光性平坦材Bを取り除き、平坦材B’を取り除き、未露光樹脂を現像により除去することを特徴とするプリント配線板の製造方法。I) A non-transparent printed wiring board in which a pad is provided on at least a part of the peripheral edge of one opening end surface A of the through hole, and the other opening end surface A ′ of the through hole faces the translucent flat member B. As described above, the photocurable resin composition is placed on the translucent flat material B, and is applied and filled in the through-hole so that the resin is filled at least at the height of the pad end surface, and on the printed wiring board surface including the pad end surface. Other flat material B ′ is placed, or II) a non-transparent printed wiring board in which a pad is provided on at least a part of the peripheral edge of one opening end surface A of the through hole, and the pad end surface is translucent flat material B Is placed on the translucent flat material B so as to face the other, and the photocurable resin composition is applied and filled in the through hole, and another flat material is formed on the surface of the printed wiring board including the other opening end surface A ′ of the through hole. Put B ',
The hard roll is moved on the flat material B ′, the resin is exposed through the light transmissive flat material B, the light transmissive flat material B is removed at any step after the exposure, and the flat material B ′ is removed. A method for producing a printed wiring board, wherein unexposed resin is removed by development.
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| JPH0832211A (en) * | 1994-07-15 | 1996-02-02 | Ibiden Co Ltd | Production of printed wiring board |
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