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JP5472014B2 - Optical waveguide device and method for manufacturing optical waveguide device - Google Patents
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JP5472014B2 - Optical waveguide device and method for manufacturing optical waveguide device - Google Patents

Optical waveguide device and method for manufacturing optical waveguide device Download PDF

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JP5472014B2
JP5472014B2 JP2010220934A JP2010220934A JP5472014B2 JP 5472014 B2 JP5472014 B2 JP 5472014B2 JP 2010220934 A JP2010220934 A JP 2010220934A JP 2010220934 A JP2010220934 A JP 2010220934A JP 5472014 B2 JP5472014 B2 JP 5472014B2
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JP2012078407A (en
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稔 篠崎
志展 矢澤
誠 嶋田
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Sumitomo Osaka Cement Co Ltd
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Description

本発明は、光導波路素子および光導波路素子の製造方法に関する。   The present invention relates to an optical waveguide element and a method for manufacturing the optical waveguide element.

基板の表面に光導波路を形成した光導波路素子において、光導波路を伝搬する光波を制御するために、光導波路の伝搬光をモニタすることが行われている。伝搬光のモニタ方法として、光導波路を分岐させて伝搬光の一部をタップした光、あるいは光導波路の合波部から光導波路外へ放射される放射モード光を、基板側面に配置した受光素子で受光する方法や、光導波路の周囲に滲み出しているエバネセント光を、光導波路の上部に配置した受光素子で受光する方法(例えば、特許文献1参照)等が知られている。   In an optical waveguide element in which an optical waveguide is formed on the surface of a substrate, the propagation light in the optical waveguide is monitored in order to control the light wave propagating through the optical waveguide. As a method for monitoring the propagation light, a light receiving element in which the light that branches the optical waveguide and taps a part of the propagation light, or the radiation mode light that is radiated out of the optical waveguide from the combined portion of the optical waveguide is arranged on the side surface of the substrate And a method of receiving evanescent light oozing out around the optical waveguide with a light receiving element disposed at the upper part of the optical waveguide (see, for example, Patent Document 1).

一方、基板に誘電体基板を用いた場合には、焦電効果によって基板表面に電荷が蓄積して光導波路素子の光学特性を劣化させてしまうことがある。これの対策として、基板の裏面(光導波路を形成した面と反対側の面)と側面に導電膜を形成した構成が知られている。この構成によれば、基板表面に溜まった電荷をこの導電膜経由で基板外へ放電させて逃がすことができ、上記のような特性劣化を防止可能である。   On the other hand, when a dielectric substrate is used as the substrate, charges may accumulate on the substrate surface due to the pyroelectric effect, thereby degrading the optical characteristics of the optical waveguide device. As a countermeasure against this, a configuration in which a conductive film is formed on the back surface (the surface opposite to the surface on which the optical waveguide is formed) and the side surface of the substrate is known. According to this configuration, the charge accumulated on the substrate surface can be discharged to the outside of the substrate via this conductive film and escaped, and the above characteristic deterioration can be prevented.

特開2001−215371号公報JP 2001-215371 A

ところで、受光素子を基板に固定するに当たっては、熱硬化型接着剤や光硬化型接着剤等が用いられている。熱硬化型接着剤は一般に硬化時間が長い。そのため、接着工程に要する時間が長くなるという問題や、硬化中に位置ずれの影響を受けやすくなり実装位置精度の低下ひいては特性劣化を招いてしまうという問題がある。よって、受光素子と基板の固定には光硬化型接着剤を用いることが好ましいと考えられる。   Incidentally, in fixing the light receiving element to the substrate, a thermosetting adhesive, a photocurable adhesive, or the like is used. Thermosetting adhesives generally have a long curing time. For this reason, there is a problem that the time required for the bonding process becomes long, and there is a problem that it is easily affected by misalignment during curing, resulting in a decrease in mounting position accuracy and a deterioration in characteristics. Therefore, it is considered preferable to use a photocurable adhesive for fixing the light receiving element and the substrate.

しかしながら、上述のように基板の裏面や側面に導電膜が形成されている構造においては、導電膜が光を遮断してしまうため、基板裏面側から光を照射できず、受光素子と基板の間に塗布された接着剤を硬化させることができない。なお、受光素子と基板の間からはみ出した接着剤は、受光素子の斜め側方から光を照射し硬化させることができるが、それだけでは硬化後の強度が不十分である。   However, in the structure in which the conductive film is formed on the back surface and the side surface of the substrate as described above, the conductive film blocks light, so that light cannot be irradiated from the back surface side of the substrate, and the space between the light receiving element and the substrate. The adhesive applied to the resin cannot be cured. The adhesive protruding from between the light receiving element and the substrate can be cured by irradiating light from an oblique side of the light receiving element, but the strength after curing is insufficient.

本発明は上記の点に鑑みてなされたものであり、その目的は、導電膜が形成された基板に光硬化型接着剤を用いて受光素子を固定することが可能な光導波路素子および光導波路素子の製造方法を提供することにある。   The present invention has been made in view of the above points, and an object of the present invention is to provide an optical waveguide element and an optical waveguide capable of fixing a light receiving element to a substrate on which a conductive film is formed by using a photocurable adhesive. The object is to provide a method for manufacturing an element.

本発明は、上記の課題を解決するためになされたものであり、電気光学効果を有する基板と、前記基板の表面に形成された光導波路と、前記基板の表面に形成され前記光導波路を伝搬する光波を制御する電極と、光硬化型接着剤により前記基板に固定され前記光導波路を伝搬する光波の一部をモニタする受光素子と、前記基板の前記光導波路が形成された面の対向面および他の面に形成された導電膜と、を備える光導波路素子において、前記対向面の一部に前記導電膜を形成しない導電膜非形成部を設け、前記対向面の側から前記基板を介して前記光硬化型接着剤に光を照射可能としたことを特徴とする光導波路素子である。   The present invention has been made to solve the above-described problems, and includes a substrate having an electro-optic effect, an optical waveguide formed on the surface of the substrate, and a propagation formed on the surface of the substrate through the optical waveguide. An electrode for controlling a light wave to be transmitted; a light receiving element that monitors a part of the light wave that is fixed to the substrate by a photocurable adhesive and propagates through the optical waveguide; and a surface opposite to the surface of the substrate on which the optical waveguide is formed And a conductive film formed on another surface, a conductive film non-forming portion that does not form the conductive film is provided on a part of the opposing surface, and the substrate is interposed from the opposing surface side through the substrate. An optical waveguide element characterized in that the light curable adhesive can be irradiated with light.

この構成によれば、導電膜非形成部を通して、受光素子と基板の間の光硬化型接着剤に光を照射することができ、接着剤を硬化させることができる。よって、導電膜が形成された基板であっても、光硬化型接着剤を用いて受光素子を基板に固定することができる。   According to this structure, light can be irradiated to the photocurable adhesive between a light receiving element and a board | substrate through a conductive film non-formation part, and an adhesive agent can be hardened. Therefore, even if it is a board | substrate with which the electrically conductive film was formed, a light receiving element can be fixed to a board | substrate using a photocurable adhesive agent.

また、本発明は、上記の光導波路素子において、前記導電膜非形成部は、前記対向面のうち、前記基板表面の前記電極が形成された作用部と対向する部分を除いた部分に設けられていることを特徴とする。   In the optical waveguide element according to the present invention, the conductive film non-forming portion is provided in a portion of the facing surface excluding a portion facing the working portion on the substrate surface where the electrode is formed. It is characterized by.

この構成によれば、電極の近くには導電膜が存在しており、導電膜非形成部が存在する箇所は電極から離れた箇所に限られる。よって、電極近傍で焦電効果により発生した電荷を、導電膜を経由して効率よく基板外へ逃がすことができる。   According to this configuration, the conductive film is present near the electrode, and the portion where the conductive film non-formed portion is present is limited to the portion away from the electrode. Therefore, charges generated by the pyroelectric effect in the vicinity of the electrode can be efficiently released outside the substrate through the conductive film.

また、本発明は、上記の光導波路素子において、前記導電膜非形成部は、前記導電膜内に形成された開口であることを特徴とする。   In the optical waveguide element according to the present invention, the conductive film non-forming portion is an opening formed in the conductive film.

この構成によれば、開口を通して受光素子と基板の間の光硬化型接着剤に光を照射することができる。また、導電膜非形成部の面積を必要以上に広くしなくてすむので、導電膜の面積を広くとることができ、焦電効果により発生した電荷を効率よく基板外へ逃がすことができる。   According to this configuration, light can be irradiated to the photocurable adhesive between the light receiving element and the substrate through the opening. In addition, since the area of the conductive film non-forming portion does not need to be increased more than necessary, the area of the conductive film can be increased, and the charges generated by the pyroelectric effect can be efficiently released to the outside of the substrate.

また、本発明は、上記の光導波路素子において、前記開口の形状は円形、矩形、または前記受光素子の接着面と略相似形であることを特徴とする。   According to the present invention, in the optical waveguide element described above, the shape of the opening is circular, rectangular, or substantially similar to the bonding surface of the light receiving element.

また、本発明は、電気光学効果を有する基板と、前記基板の表面に形成された光導波路と、前記基板の表面に形成され前記光導波路を伝搬する光波を制御する電極と、光硬化型接着剤により前記基板に固定され前記光導波路を伝搬する光波の一部をモニタする受光素子と、前記基板の前記光導波路が形成された面の対向面および他の面に形成された導電膜と、を備える光導波路素子の製造方法において、前記対向面の一部に設けられた導電膜非形成部から前記基板を介して前記光硬化型接着剤に光を照射する工程を含むことを特徴とする光導波路素子の製造方法である。   Further, the present invention provides a substrate having an electro-optic effect, an optical waveguide formed on the surface of the substrate, an electrode formed on the surface of the substrate for controlling a light wave propagating through the optical waveguide, and a photocurable adhesive A light receiving element that monitors a part of a light wave that is fixed to the substrate by an agent and propagates through the optical waveguide, a conductive film that is formed on an opposite surface of the surface on which the optical waveguide is formed on the substrate, and another surface; The method of manufacturing an optical waveguide device comprising: a step of irradiating light to the photocurable adhesive through the substrate from a conductive film non-forming portion provided on a part of the facing surface. It is a manufacturing method of an optical waveguide device.

また、本発明は、上記の光導波路素子の製造方法において、前記光を照射する工程の前または後に、前記導電膜非形成部を通して前記光硬化型接着剤の厚さの状態を示す干渉縞を検査する工程を含むことを特徴とする。   Further, the present invention provides an interference fringe indicating a thickness state of the photocurable adhesive through the conductive film non-forming portion before or after the light irradiation step in the method for manufacturing an optical waveguide element. The method includes a step of inspecting.

この構成によれば、干渉縞の検査によって受光素子と基板の接着状態に関して良品と不良品を的確に判別することができる。   According to this configuration, it is possible to accurately discriminate between a non-defective product and a defective product regarding the adhesion state between the light receiving element and the substrate by inspection of interference fringes.

また、本発明は、上記の光導波路素子の製造方法において、前記光硬化型接着剤の粘度は1000cp以下であり、前記光硬化型接着剤を硬化させる際に前記受光素子を前記基板に対して押圧する圧力は50〜1000g/mmであることを特徴とする。 Further, the present invention provides the above-described method for manufacturing an optical waveguide element, wherein the photocurable adhesive has a viscosity of 1000 cp or less, and when the photocurable adhesive is cured, the light receiving element is attached to the substrate. The pressing pressure is 50 to 1000 g / mm 2 .

本発明によれば、導電膜が形成された基板に光硬化型接着剤を用いて受光素子を固定することが可能である。   According to the present invention, it is possible to fix a light receiving element to a substrate on which a conductive film is formed using a photocurable adhesive.

本発明の第1の実施形態による光導波路素子の構成を示す図である。It is a figure which shows the structure of the optical waveguide element by the 1st Embodiment of this invention. 受光素子を基板に固定する工程を説明する図である。It is a figure explaining the process of fixing a light receiving element to a substrate. 本発明の第2の実施形態による光導波路素子の構成を示す図である。It is a figure which shows the structure of the optical waveguide element by the 2nd Embodiment of this invention.

以下、図面を参照しながら本発明の実施形態について詳しく説明する。
図1は、本発明の第1の実施形態による光導波路素子1の構成を示す図である。
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 1 is a diagram showing a configuration of an optical waveguide device 1 according to the first embodiment of the present invention.

図1において、光導波路素子1は、基板10および受光素子20を有し構成されている。   In FIG. 1, the optical waveguide element 1 includes a substrate 10 and a light receiving element 20.

基板10は、電気光学効果を有する基板であり、例えば、ニオブ酸リチウム(LN)やタンタル酸リチウム(LT)等の誘電体結晶である。   The substrate 10 is a substrate having an electro-optic effect, and is, for example, a dielectric crystal such as lithium niobate (LN) or lithium tantalate (LT).

基板10の表面には、図1の上面図に示されるように、光導波路101〜104および電極105〜107が形成されている。   As shown in the top view of FIG. 1, optical waveguides 101 to 104 and electrodes 105 to 107 are formed on the surface of the substrate 10.

入力導波路101は、第1分岐導波路102の一端と第2分岐導波路103の一端に接続されている。第1分岐導波路102の他端と第2分岐導波路103の他端は、出力導波路104に接続されている。これにより、マッハツェンダー型導波路が構成されている。   The input waveguide 101 is connected to one end of the first branch waveguide 102 and one end of the second branch waveguide 103. The other end of the first branch waveguide 102 and the other end of the second branch waveguide 103 are connected to the output waveguide 104. Thus, a Mach-Zehnder type waveguide is configured.

第1電極105は、第1分岐導波路102に沿って、第1分岐導波路102と基板10の縁端との間に設けられている。第2電極106は、第1分岐導波路102および第2分岐導波路103に沿って、第1分岐導波路102と第2分岐導波路103との間に設けられている。第3電極107は、第2分岐導波路103に沿って、第2分岐導波路103と基板10の縁端との間に設けられている。これら各電極105〜107には、不図示の電気配線を介して光導波路素子1の外部から所定の電圧が供給される。   The first electrode 105 is provided along the first branch waveguide 102 between the first branch waveguide 102 and the edge of the substrate 10. The second electrode 106 is provided between the first branch waveguide 102 and the second branch waveguide 103 along the first branch waveguide 102 and the second branch waveguide 103. The third electrode 107 is provided between the second branch waveguide 103 and the edge of the substrate 10 along the second branch waveguide 103. A predetermined voltage is supplied to each of these electrodes 105 to 107 from the outside of the optical waveguide device 1 through an electric wiring (not shown).

このように、光導波路素子1は、マッハツェンダー型導波路の第1分岐導波路102および第2分岐導波路103に対して第1電極105,第2電極106,第3電極107から電界を印加して、電気光学効果により第1分岐導波路102および第2分岐導波路103の屈折率を変化させる構成となっている。すなわち、光導波路素子1は、第1分岐導波路102および第2分岐導波路103を伝搬する光波を各電極105〜107からの電界によって変調する変調器として構成されている。   Thus, the optical waveguide element 1 applies an electric field from the first electrode 105, the second electrode 106, and the third electrode 107 to the first branch waveguide 102 and the second branch waveguide 103 of the Mach-Zehnder type waveguide. Thus, the refractive indexes of the first branch waveguide 102 and the second branch waveguide 103 are changed by the electro-optic effect. That is, the optical waveguide device 1 is configured as a modulator that modulates light waves propagating through the first branch waveguide 102 and the second branch waveguide 103 by the electric fields from the electrodes 105 to 107.

ここで、図1の上面図において点線の枠囲みで示した領域、すなわち、マッハツェンダー型導波路の第1分岐導波路102および第2分岐導波路103を伝搬する光波が各電極105〜107による電界の作用を受ける領域を、「作用部」と定義する。   Here, the light wave propagating through the region indicated by the dotted frame in the top view of FIG. 1, that is, the first branching waveguide 102 and the second branching waveguide 103 of the Mach-Zehnder type waveguide is caused by the electrodes 105 to 107. A region that is affected by an electric field is defined as an “action portion”.

基板10の側面には、図1の側面図に示されるように、導電膜110が側面全体にわたって形成されている。   As shown in the side view of FIG. 1, a conductive film 110 is formed on the entire side surface of the substrate 10.

基板10の裏面(光導波路および電極が形成されている面と対向する面)には、図1の底面図に示されるように、導電膜120が裏面の一部を除いて形成されている。導電膜120が形成されていない部分を、導電膜非形成部130と称することとする。導電膜非形成部130の位置は、図1の底面図に示されるように、後述する受光素子20の固定位置と対面する位置であり、基板10の作用部(図1の上面図参照)と相対しない位置である。換言すると、作用部と対面する裏面の部分には、導電膜120が存在しており、導電膜非形成部130は、作用部から離れた箇所に位置している。   As shown in the bottom view of FIG. 1, a conductive film 120 is formed on the back surface of the substrate 10 (the surface facing the surface on which the optical waveguide and electrodes are formed) except for a part of the back surface. A portion where the conductive film 120 is not formed is referred to as a conductive film non-forming portion 130. As shown in the bottom view of FIG. 1, the position of the conductive film non-forming part 130 is a position facing a fixed position of the light receiving element 20 described later, and an action part of the substrate 10 (see the top view of FIG. 1). It is a non-relative position. In other words, the conductive film 120 exists in the part of the back surface facing the action part, and the conductive film non-formation part 130 is located at a location away from the action part.

側面の導電膜110および裏面の導電膜120の材質は、例えば、Au,Ti,Si等である。   The material of the conductive film 110 on the side surface and the conductive film 120 on the back surface is, for example, Au, Ti, Si, or the like.

このように導電膜110,120が基板10の側面と裏面に形成されていることによって、焦電効果により基板10の表面に溜まった電荷をこれら導電膜110,120経由で基板10の外へ放電させて逃がすことが可能である。ここで、焦電効果は電極105〜107の近傍で発生しやすいが、基板裏面のうち電極105〜107に近い部分には導電膜120が存在しているため、基板10に溜まった電荷を効率よく放電可能である。なお、導電膜110,120の少なくとも一方は、導電性接着剤等を介して導電性の筐体(不図示)と電気的に接続されている。   Since the conductive films 110 and 120 are formed on the side surface and the back surface of the substrate 10 as described above, the charges accumulated on the surface of the substrate 10 due to the pyroelectric effect are discharged to the outside of the substrate 10 through the conductive films 110 and 120. It is possible to let it escape. Here, although the pyroelectric effect is likely to occur in the vicinity of the electrodes 105 to 107, the conductive film 120 is present in the portion near the electrodes 105 to 107 on the back surface of the substrate, so that the charges accumulated on the substrate 10 are efficiently used. It can discharge well. Note that at least one of the conductive films 110 and 120 is electrically connected to a conductive casing (not shown) via a conductive adhesive or the like.

受光素子20は、図1の上面図および側面図に示されるように、出力導波路104の上部において基板10の表面と接するようにして基板10と固定されている。受光素子20の受光面は、基板10の側に向けられている。この受光素子20は、出力導波路104を伝搬する光波のパワーをモニタするために用いられるものであり、出力導波路104から滲み出したエバネセント光が受光素子20の受光面から取り込まれて、そのパワーが検知される。   As shown in the top view and the side view of FIG. 1, the light receiving element 20 is fixed to the substrate 10 so as to be in contact with the surface of the substrate 10 above the output waveguide 104. The light receiving surface of the light receiving element 20 is directed to the substrate 10 side. The light receiving element 20 is used to monitor the power of the light wave propagating through the output waveguide 104. Evanescent light that has oozed out of the output waveguide 104 is taken in from the light receiving surface of the light receiving element 20, and Power is detected.

受光素子20の基板10への固定には、光硬化型接着剤を使用する。以下、図2を参照して、受光素子20を基板10に固定する工程について説明する。   A light curable adhesive is used to fix the light receiving element 20 to the substrate 10. Hereinafter, the process of fixing the light receiving element 20 to the substrate 10 will be described with reference to FIG.

まず、工程(A)として、受光素子20の受光面を基板10の側に向けた状態で受光素子20(の受光面)と基板10の間に光硬化型接着剤(粘度1000cp以下)を塗布し、受光素子20と基板10を密着させて受光素子20を基板10に圧力50〜1000g/mmで押圧する。そして、受光素子20の斜め上方からUV光(紫外光)を照射して、受光素子20の周囲に漏れ出した接着剤を硬化させる。UV光の照射時間は、例えば1分以内であり、好ましくは10秒程度である。この状態では、受光素子20の周囲に漏れ出した接着剤のみが硬化し(仮固定の状態)、受光素子20と基板10の接触面に塗布されている接着剤は、UV光が届かないため硬化していない。そのため、受光素子20と基板10との接着強度は十分ではないが、大きな力を加えない限り、受光素子20が基板10から引き剥がされてしまうことはない。ここで、押圧圧力を上記の範囲とすることで、接着剤の剥離や破断を防止できる。また、UV光の照射時間(接着剤の硬化時間)が短いため、硬化中の受光素子20と基板10との位置ずれは小さく、高精度な位置決めが可能である。 First, as a step (A), a photo-curing adhesive (viscosity 1000 cp or less) is applied between the light receiving element 20 (light receiving surface) and the substrate 10 with the light receiving surface of the light receiving element 20 facing the substrate 10 side. Then, the light receiving element 20 and the substrate 10 are brought into close contact with each other, and the light receiving element 20 is pressed against the substrate 10 with a pressure of 50 to 1000 g / mm 2 . Then, UV light (ultraviolet light) is irradiated obliquely from above the light receiving element 20 to cure the adhesive leaking out around the light receiving element 20. The irradiation time of UV light is, for example, within 1 minute, and preferably about 10 seconds. In this state, only the adhesive leaking around the light receiving element 20 is cured (temporarily fixed), and the UV light does not reach the adhesive applied to the contact surface between the light receiving element 20 and the substrate 10. Not cured. Therefore, the adhesive strength between the light receiving element 20 and the substrate 10 is not sufficient, but the light receiving element 20 is not peeled off from the substrate 10 unless a large force is applied. Here, peeling and fracture of the adhesive can be prevented by setting the pressing pressure within the above range. Further, since the UV light irradiation time (adhesive curing time) is short, the positional deviation between the light receiving element 20 and the substrate 10 during curing is small, and high-accuracy positioning is possible.

次に、工程(B)として、基板10の裏面側から導電膜非形成部130を通して、受光素子20と基板10の間の接着剤が未硬化の部分を観察し、当該部分に現れる干渉縞を検査する。干渉縞の様子は、受光素子20と基板10の間の接着剤の厚さやその均一性を反映している。この干渉縞の検査により、接着剤の塗布状態が適切な状態となっているか否かを知ることができ、良品と不良品を判別することができる。なお、不良品の場合は、次の工程(C)へ進まずに、受光素子20と基板を一旦引き剥がして、再度、工程(A)を実施すればよい。   Next, as a step (B), an uncured portion of the adhesive between the light receiving element 20 and the substrate 10 is observed from the back surface side of the substrate 10 through the conductive film non-forming portion 130, and interference fringes appearing in the portion are observed. inspect. The appearance of the interference fringes reflects the thickness and uniformity of the adhesive between the light receiving element 20 and the substrate 10. By examining the interference fringes, it can be determined whether or not the application state of the adhesive is in an appropriate state, and a good product and a defective product can be discriminated. In the case of a defective product, the light receiving element 20 and the substrate may be peeled off once and the process (A) may be performed again without proceeding to the next process (C).

次に、工程(C)として、受光素子20と基板10の間に未硬化のまま残っている接着剤に導電膜非形成部130を通して基板10の裏面側からUV光を照射して、接着剤を硬化させる。UV光の照射時間は、例えば1〜数分程度である。この工程により、受光素子20と基板10の接触面に塗布されている接着剤全部が硬化し、受光素子20と基板10は十分な接着強度で固定される。なお、先の工程(A)で接着剤の一部が既に硬化しているため、本工程(C)の接着剤硬化の際には、受光素子20を基板10に対して押圧しなくてもよいが、接着剤の剥離や破断を確実に防止するために、工程(A)と同様に受光素子20を基板10に圧力50〜1000g/mmで押圧するようにしてもよい。 Next, as a step (C), the adhesive remaining uncured between the light receiving element 20 and the substrate 10 is irradiated with UV light from the back surface side of the substrate 10 through the conductive film non-forming portion 130, and the adhesive To cure. The irradiation time of UV light is, for example, about 1 to several minutes. By this step, all the adhesive applied to the contact surface between the light receiving element 20 and the substrate 10 is cured, and the light receiving element 20 and the substrate 10 are fixed with sufficient adhesive strength. Since a part of the adhesive is already cured in the previous step (A), it is not necessary to press the light receiving element 20 against the substrate 10 when the adhesive is cured in this step (C). However, the light receiving element 20 may be pressed against the substrate 10 at a pressure of 50 to 1000 g / mm 2 in the same manner as in the step (A) in order to reliably prevent the adhesive from peeling or breaking.

次に、工程(D)として、工程(B)と同様に、基板10の裏面側から導電膜非形成部130を通して、受光素子20と基板10の間の接着剤を観察し、当該部分に現れる干渉縞を検査する。この干渉縞の検査により、接着剤の硬化状態が適切な状態となっているか否かを知ることができ、良品と不良品を判別することができる。   Next, as in step (D), as in step (B), the adhesive between the light receiving element 20 and the substrate 10 is observed from the back surface side of the substrate 10 through the conductive film non-forming portion 130 and appears in the portion. Check for interference fringes. By examining the interference fringes, it can be determined whether or not the cured state of the adhesive is in an appropriate state, and a good product and a defective product can be discriminated.

以上のように、本実施形態の光導波路素子1によれば、導電膜非形成部130を通して、受光素子20と基板10の間の光硬化型接着剤にUV光を照射することができ、接着剤を硬化させることができる。また、工程(B)における接着剤の硬化は短時間で済むため、受光素子20の固定位置の精度を向上させることができる。   As described above, according to the optical waveguide device 1 of the present embodiment, the photocurable adhesive between the light receiving element 20 and the substrate 10 can be irradiated with UV light through the conductive film non-forming portion 130, and adhesion is achieved. The agent can be cured. Further, since the curing of the adhesive in the step (B) can be completed in a short time, the accuracy of the fixing position of the light receiving element 20 can be improved.

図3は、本発明の第2の実施形態による光導波路素子2の構成を示す図である。
本実施形態の光導波路素子2と第1の実施形態の光導波路素子1の相違点は、導電膜非形成部140の形状である。
FIG. 3 is a diagram showing a configuration of the optical waveguide device 2 according to the second embodiment of the present invention.
The difference between the optical waveguide device 2 of the present embodiment and the optical waveguide device 1 of the first embodiment is the shape of the conductive film non-forming portion 140.

図3の底面図に示されるように、光導波路素子2の基板10の裏面には、導電膜非形成部140の形状が円形の開口となるように導電膜120が形成されている。導電膜非形成部140の位置は、第1の実施形態と同様、受光素子20の固定位置と対面する位置であり、基板10の作用部(図3の上面図参照)と相対しない位置である。   As shown in the bottom view of FIG. 3, the conductive film 120 is formed on the back surface of the substrate 10 of the optical waveguide element 2 so that the conductive film non-forming portion 140 has a circular opening. Similarly to the first embodiment, the position of the conductive film non-forming portion 140 is a position facing the fixed position of the light receiving element 20 and a position not facing the action portion of the substrate 10 (see the top view of FIG. 3). .

このような構成の光導波路素子2によっても、第1の実施形態の光導波路素子1と同じ効果を得られる。さらに、本実施形態の光導波路素子2によれば、導電膜120の面積が第1の実施形態より広いため、焦電効果で基板10に溜まった電荷を第1の実施形態よりも効率よく放電可能である。   The same effect as that of the optical waveguide device 1 of the first embodiment can be obtained by the optical waveguide device 2 having such a configuration. Furthermore, according to the optical waveguide device 2 of the present embodiment, since the conductive film 120 has a larger area than that of the first embodiment, the charges accumulated on the substrate 10 due to the pyroelectric effect can be discharged more efficiently than in the first embodiment. Is possible.

以上、図面を参照してこの発明の一実施形態について詳しく説明してきたが、具体的な構成は上述のものに限られることはなく、この発明の要旨を逸脱しない範囲内において様々な設計変更等をすることが可能である。
例えば、図3において導電膜非形成部140(開口)の形状は円形であるが、受光素子20の底面形状に合わせた形状(略相似の形状)であってもよいし、矩形でもよい。
また、受光素子20を基板10に接着する位置は、出力導波路104の上部に限定されず、入力導波路101等の上部であってもよい。
また、光導波路の構成は、図1や図3に示されるようなマッハツェンダー型導波路以外の構成であってもよい。
さらに、光導波路の構成に応じて、受光素子20を基板10の側面に接着する構成としてもよい。
As described above, the embodiment of the present invention has been described in detail with reference to the drawings. However, the specific configuration is not limited to the above, and various design changes and the like can be made without departing from the scope of the present invention. It is possible to
For example, in FIG. 3, the shape of the conductive film non-forming portion 140 (opening) is circular, but may be a shape (substantially similar shape) matched to the shape of the bottom surface of the light receiving element 20 or a rectangle.
Further, the position where the light receiving element 20 is bonded to the substrate 10 is not limited to the upper part of the output waveguide 104, and may be the upper part of the input waveguide 101 or the like.
The configuration of the optical waveguide may be a configuration other than the Mach-Zehnder type waveguide as shown in FIG. 1 or FIG.
Furthermore, it is good also as a structure which adhere | attaches the light receiving element 20 on the side surface of the board | substrate 10 according to the structure of an optical waveguide.

1,2…光導波路素子 10…基板 20…受光素子 101…入力導波路 102…第1分岐導波路 103…第2分岐導波路 104…出力導波路 105…第1電極 106…第2電極 107…第3電極 110,120…導電膜 130,140…導電膜非形成部   DESCRIPTION OF SYMBOLS 1, 2 ... Optical waveguide element 10 ... Board | substrate 20 ... Light receiving element 101 ... Input waveguide 102 ... 1st branch waveguide 103 ... 2nd branch waveguide 104 ... Output waveguide 105 ... 1st electrode 106 ... 2nd electrode 107 ... Third electrode 110, 120 ... conductive film 130, 140 ... conductive film non-formation part

Claims (7)

電気光学効果を有する基板と、前記基板の表面に形成された光導波路と、前記基板の表面に形成され前記光導波路を伝搬する光波を制御する電極と、光硬化型接着剤により前記基板に固定され前記光導波路を伝搬する光波の一部をモニタする受光素子と、前記基板の前記光導波路が形成された面の対向面および他の面に形成された導電膜と、を備える光導波路素子において、
前記対向面の一部に前記導電膜を形成しない導電膜非形成部を設け、前記対向面の側から前記基板を介して前記光硬化型接着剤に光を照射可能としたことを特徴とする光導波路素子。
A substrate having an electro-optic effect, an optical waveguide formed on the surface of the substrate, an electrode formed on the surface of the substrate for controlling a light wave propagating through the optical waveguide, and fixed to the substrate by a photocurable adhesive A light receiving element that monitors a part of a light wave propagating through the optical waveguide, and a conductive film formed on an opposite surface of the surface on which the optical waveguide is formed and on another surface of the substrate. ,
A conductive film non-formation portion that does not form the conductive film is provided on a part of the facing surface, and the photocurable adhesive can be irradiated with light from the facing surface side through the substrate. Optical waveguide element.
前記導電膜非形成部は、前記対向面のうち、前記基板表面の前記電極が形成された作用部と対向する部分を除いた部分に設けられていることを特徴とする請求項1に記載の光導波路素子。   2. The conductive film non-forming portion is provided in a portion of the facing surface excluding a portion facing the action portion on which the electrode is formed on the substrate surface. Optical waveguide element. 前記導電膜非形成部は、前記導電膜内に形成された開口であることを特徴とする請求項1または請求項2に記載の光導波路素子。   The optical waveguide element according to claim 1, wherein the conductive film non-forming portion is an opening formed in the conductive film. 前記開口の形状は円形、矩形、または前記受光素子の接着面と略相似形であることを特徴とする請求項3に記載の光導波路素子。   4. The optical waveguide element according to claim 3, wherein the shape of the opening is circular, rectangular, or substantially similar to an adhesive surface of the light receiving element. 電気光学効果を有する基板と、前記基板の表面に形成された光導波路と、前記基板の表面に形成され前記光導波路を伝搬する光波を制御する電極と、光硬化型接着剤により前記基板に固定され前記光導波路を伝搬する光波の一部をモニタする受光素子と、前記基板の前記光導波路が形成された面の対向面および他の面に形成された導電膜と、を備える光導波路素子の製造方法において、
前記対向面の一部に設けられた導電膜非形成部から前記基板を介して前記光硬化型接着剤に光を照射する工程を含むことを特徴とする光導波路素子の製造方法。
A substrate having an electro-optic effect, an optical waveguide formed on the surface of the substrate, an electrode formed on the surface of the substrate for controlling a light wave propagating through the optical waveguide, and fixed to the substrate by a photocurable adhesive A light receiving element that monitors a part of the light wave propagating through the optical waveguide, and a conductive film formed on an opposite surface of the surface on which the optical waveguide is formed on the substrate and on another surface. In the manufacturing method,
A method for manufacturing an optical waveguide device, comprising: irradiating light to the photocurable adhesive through the substrate from a conductive film non-forming portion provided on a part of the facing surface.
前記光を照射する工程の前または後に、前記導電膜非形成部を通して前記光硬化型接着剤の厚さの状態を示す干渉縞を検査する工程を含むことを特徴とする請求項5に記載の光導波路素子の製造方法。   6. The method according to claim 5, further comprising a step of inspecting interference fringes indicating a thickness state of the photocurable adhesive through the conductive film non-forming portion before or after the step of irradiating the light. Manufacturing method of optical waveguide element. 前記光硬化型接着剤の粘度は1000cp以下であり、前記光硬化型接着剤を硬化させる際に前記受光素子を前記基板に対して押圧する圧力は50〜1000g/mmであることを特徴とする請求項5または請求項6に記載の光導波路素子の製造方法。 The viscosity of the photocurable adhesive is 1000 cp or less, and the pressure for pressing the light receiving element against the substrate when the photocurable adhesive is cured is 50 to 1000 g / mm 2. The manufacturing method of the optical waveguide element of Claim 5 or Claim 6 to do.
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