JP5477715B2 - Highly transparent alumina ceramic and method for producing the same - Google Patents
Highly transparent alumina ceramic and method for producing the same Download PDFInfo
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 title claims description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000000843 powder Substances 0.000 claims description 27
- 239000002245 particle Substances 0.000 claims description 26
- 239000002243 precursor Substances 0.000 claims description 16
- 238000002834 transmittance Methods 0.000 claims description 14
- 239000013078 crystal Substances 0.000 claims description 8
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- 238000000280 densification Methods 0.000 claims description 3
- 239000011222 crystalline ceramic Substances 0.000 claims 1
- 229910002106 crystalline ceramic Inorganic materials 0.000 claims 1
- 238000005245 sintering Methods 0.000 description 13
- 238000002490 spark plasma sintering Methods 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 238000001513 hot isostatic pressing Methods 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 229910002804 graphite Inorganic materials 0.000 description 6
- 239000010439 graphite Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 239000002002 slurry Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000000349 field-emission scanning electron micrograph Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 238000001208 nuclear magnetic resonance pulse sequence Methods 0.000 description 2
- 238000001272 pressureless sintering Methods 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000009700 powder processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 238000007569 slipcasting Methods 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
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Description
本発明は可視光と赤外線放射に対して高度に透明な材料、及びその製造方法に関する。 The present invention relates to a material that is highly transparent to visible and infrared radiation, and a method of manufacturing the same.
可視光及び赤外線放射に対して透明な材料中で、単結晶材料であるサファイアは赤外線放射に対して透明であり、かつ優れた機械的特性を有している。しかしながら、その価格は多くの用途に対しては引き合わないほどに高価である。特許文献3ではジルコニウム酸化物を含む多結晶アルミナが提案されている。この材料は可視光域で透明であると説明されている。特許文献1はアルミナベースの多結晶セラミックを記載しており、その結晶粒子の平均サイズは1μmより大きくはない。特許文献1はまた3A族及び4A族から選ばれた金属の酸化物を2mol%未満の割合で導入する可能性も記載している。高度に透明な純アルミナを得るためには、1150〜1300℃の温度かつ200MPaまでの圧力での熱間等静圧圧縮成形(HIP)が伝統的に使用されてきた(非特許文献1,2)。HIP法を使用することによって、空隙率を0.05%未満へ容易に低下させ、また粒子サイズを1μm未満に収めることができる。3軸圧力印加法を最適化された粉末処理ルートとともに使用することによって、粒子サイズが300nmで直線透過率(in-line transmittance)が最大71%の、最大限に稠密で透明な純アルミナを得ることができた(非特許文献1)。一般に、HIP処理された純アルミナの直線透過率は50%を越える(非特許文献1及び2、特許文献1〜3)。 Among materials transparent to visible light and infrared radiation, sapphire, which is a single crystal material, is transparent to infrared radiation and has excellent mechanical properties. However, the price is so expensive that many applications do not pay. Patent Document 3 proposes polycrystalline alumina containing zirconium oxide. This material is described as being transparent in the visible range. Patent Document 1 describes an alumina-based polycrystalline ceramic, and the average size of the crystal particles is not larger than 1 μm. Patent Document 1 also describes the possibility of introducing an oxide of a metal selected from Group 3A and Group 4A in a proportion of less than 2 mol%. In order to obtain highly transparent pure alumina, hot isostatic pressing (HIP) at a temperature of 1150 to 1300 ° C. and a pressure of up to 200 MPa has been traditionally used (Non-Patent Documents 1 and 2). ). By using the HIP method, the porosity can be easily reduced to less than 0.05% and the particle size can be kept below 1 μm. By using the triaxial pressure application method with an optimized powder processing route, a pure alumina that is maximally dense and transparent with a particle size of 300 nm and an in-line transmittance of up to 71% is obtained. (Non-Patent Document 1). In general, the linear transmittance of HIP-treated pure alumina exceeds 50% (Non-patent Documents 1 and 2, Patent Documents 1 to 3).
現在の技術水準では(非特許文献1及び2、特許文献1〜3)、半透明あるいは透明な材料を製造するには以下のようないくつかの困難なステップが必要となる。a)アルミナ粉末からスラリーを準備する、b)スラリーを多孔質のモールドに流し込み、乾燥させてモールドから取り出すことで焼結対象物、すなわち焼結の前駆体を得る、c)取り出した焼結対象物を乾燥させる。d)350℃〜600℃の温度で脱バインダーを行う、e)1100℃〜1350℃の間の温度で、密度が少なくとも理論密度の92%の焼結物が得られるまで焼結を行う、及びf)950℃と1300℃の間の温度かつ100MPaから380MPaの圧力下で、「HIP」として知られる熱間等静圧圧縮成形を行う。 In the current state of the art (Non-Patent Documents 1 and 2, Patent Documents 1 to 3), several difficult steps are required to produce a translucent or transparent material. a) preparing a slurry from alumina powder, b) pouring the slurry into a porous mold, drying and removing from the mold to obtain a sintered object, i.e., a sintering precursor, c) an extracted sintered object Let things dry. d) Debinding at a temperature of 350 ° C. to 600 ° C. e) Sintering at a temperature between 1100 ° C. and 1350 ° C. until a sintered product having a density of at least 92% of the theoretical density is obtained, and f) Hot isostatic pressing known as “HIP” is performed at a temperature between 950 ° C. and 1300 ° C. and a pressure of 100 MPa to 380 MPa.
しかしながら、最近、SPSを使用して透明/半透明アルミナが製造された(非特許文献3〜7)。Kim他は、1150℃、印加圧力80MPa下で焼結した試料の場合に、波長640nmにおいて47%の直線透過率を得た(非特許文献4)。SPSはグラファイトのパンチを採用しているので、SPSでの最大圧力は一般にはダイに使用する材料の圧縮強度で制限される。典型的な高強度グラファイトの圧縮強度は140MPaである(非特許文献8及び9)。2006年に、Anselmi-Tamburini他は、結晶サイズが10nm〜20nmの範囲の高密度機能性酸化物成形体を製造する方法を報告した(非特許文献10)。Anselmi-Tamburini他は比較的短時間の熱サイクル(10分未満)を漸次圧力を増大させること(1GPaまで)と組み合わせて、粒子の成長を非常に抑制しながら、高度の圧縮を進めた。しかし、Anselmi-Tamburini他によって特許出願された方法(非特許文献11)は最大限に稠密、高度に透明な材料を製造するためにはいまだに採用されていない。 However, recently, transparent / translucent alumina has been produced using SPS (Non-Patent Documents 3 to 7). Kim et al. Obtained a linear transmittance of 47% at a wavelength of 640 nm in the case of a sample sintered at 1150 ° C. and an applied pressure of 80 MPa (Non-patent Document 4). Since SPS employs graphite punches, the maximum pressure at SPS is generally limited by the compressive strength of the material used for the die. Typical high strength graphite has a compressive strength of 140 MPa (Non-Patent Documents 8 and 9). In 2006, Anselmi-Tamburini et al. Reported a method for producing high-density functional oxide compacts with crystal sizes in the range of 10 nm to 20 nm (Non-patent Document 10). Anselmi-Tamburini et al. Combined a relatively short thermal cycle (less than 10 minutes) with increasing pressure (up to 1 GPa) to advance high compression while greatly suppressing particle growth. However, the method filed by Anselmi-Tamburini et al. (Non-Patent Document 11) has not yet been adopted to produce a maximally dense and highly transparent material.
既存技術とは異なり、本発明は高度に透明なアルミナセラミックを得る簡単な方法を提供することを課題とする。従って、この新規な方法は、可視光と紫外線領域で非常に透明な製品を製造できるようにするが、ここで、スラリーにドーパントを添加する必要がある場合もあるし、その必要がない場合もある。これによって、本製造方法はステップ数及び製造プロセスの点で好都合に簡単化されている。 Unlike the existing technology, the object of the present invention is to provide a simple method for obtaining a highly transparent alumina ceramic. Thus, this new method allows for the production of very transparent products in the visible and ultraviolet regions, where the dopant may or may not need to be added to the slurry. is there. This advantageously simplifies the manufacturing method in terms of the number of steps and the manufacturing process.
本発明の一側面によれば、以下の(a)から(c)のステップを含む、空隙率が0.05%未満に稠密化され、0.8mmの厚さの場合に645nmの波長の光に対して実直線透過率が40%よりも大きくなるように透明化され、平均粒子サイズが200nm以下の結晶粒子からなり、前記結晶粒子はAl 2 O 3 を含み、前記Al 2 O 3 は優先結晶方位を有する、アルミナベース透明多結晶セラミックを製造する方法が与えられる。
(a)アルミナ粉末からなる前駆体を準備する。
(b)前記前駆体に直接電流を印加して、前記前駆体の温度を、前駆体に高度の高密度化をもたらすが実質的に前記前駆体中の粒子成長をもたらさない保持温度である950℃以上1000℃以下の温度範囲にまで上昇させる。
(c)前記前駆体を前記保持温度に維持している間、前記前駆体に500MPa以上1GPa未満の圧力を印加して、空隙率を0.05%未満に稠密化する。
According to one aspect of the present invention , light having a wavelength of 645 nm when the porosity is less than 0.05% and the thickness is 0.8 mm, including the following steps (a) to (c): Is made transparent so that the actual linear transmittance is larger than 40% , and the average particle size is made of crystal particles of 200 nm or less. The crystal particles contain Al 2 O 3 , and the Al 2 O 3 has priority. having a crystal orientation, a method of manufacturing the alumina-based transparent polycrystalline ceramic is given.
(A) A precursor made of alumina powder is prepared.
(B) Applying a current directly to the precursor, the temperature of the precursor is a holding temperature that results in a high densification of the precursor but does not substantially result in particle growth in the precursor 950 The temperature is raised to a temperature range of not less than 1000 ° C and not more than 1000 ° C.
(C) While maintaining the precursor at the holding temperature, a pressure of 500 MPa or more and less than 1 GPa is applied to the precursor to densify the porosity to less than 0.05% .
本発明は他の既存のもっと複雑な方法の大多数のものの生産物よりも透明なアルミナセラミックを製造する非常に簡単な方法を提供する。 The present invention provides a much simpler method of producing a transparent alumina ceramic than the products of the majority of other existing more complex methods.
粒子サイズが300nmよりも細かな、高度に透明なアルミナセラミックは高圧放電焼結によって作成される。印加圧力が500MPaの場合、950℃〜1000℃という低温で、60%よりも高い実直線透過率(波長645nm)を持つ高度に透明なアルミナが得られる。高圧を印加することによって、高度に透明で最大限に稠密なアルミナを低温で、かつ大きな粒子成長を伴うことなく得ることができる。本発明はアルミナベースの透明セラミックを得る非常に簡単化された製造方法を与える。 A highly transparent alumina ceramic with a particle size smaller than 300 nm is made by high pressure discharge sintering. When the applied pressure is 500 MPa, highly transparent alumina having a real linear transmittance (wavelength of 645 nm) higher than 60% is obtained at a low temperature of 950 ° C. to 1000 ° C. By applying high pressure, highly transparent and maximally dense alumina can be obtained at low temperature and without large particle growth. The present invention provides a very simplified manufacturing method for obtaining an alumina-based transparent ceramic.
原料のアルミナ粉末として市販のα−A1203粉末(TM−DAR、大明工業化学株式会社)を使用した(非特許文献12)。図4(a)は納入されたままの粉末の走査電子顕微鏡(SEM)像である。これから、球状の粒子が集塊となって5〜50μmの大きさのクラスターを形成していることがわかった。業者から供給されたままの状態では、平均BET比表面積は14.5m2/gであった。 Commercially available α-A1 2 0 3 powder (TM-DAR, Daimei Industrial Chemical Co., Ltd.) was used as the raw material alumina powder (Non-patent Document 12). FIG. 4A is a scanning electron microscope (SEM) image of the powder as delivered. From this, it was found that spherical particles were aggregated to form a cluster having a size of 5 to 50 μm. In the state as supplied from the vendor, the average BET specific surface area was 14.5 m 2 / g.
受け取ったままの粉末を、前処理も添加物も無しで、放電プラズマ焼結機(spark plasma
sintering machine、SPS)(SPS−1050、住友石炭鉱業株式会社)を使用して、500MPaの単軸圧力下で、900℃、950℃及び1000℃で焼結した。ここで使用した高圧装置の概略図を図1に示す。この装置では直径5mmで厚さが約2.5mmの試料に500MPaを越える圧力を印加することができる。実験結果によれば、図1に示す装置は1GPaもの高圧を印加することが出来るが、試料を最大限に稠密にするには500MPaで十分であることがわかった。典型的な焼結実験では、0.18gから0.2gのアルミナ粉末をダイ上に注いだ。本装置は内部グラファイトダイ及び外部グラファイトダイを有していて、この粉末は2つのWCパンチの間で押圧されるが、これらのWCパンチは2つの仲介WC円盤の間で押圧される。保護円盤やパンチを別にすれば、本装置は全体がグラファイトで作られている。温度は、内部ダイの表面上(すなわち、試料から0.75cm離間した位置)に焦点を結ぶパイロメーターを使用して正確に測定した。グラファイトフェルトを使用して放射による熱損失を低減した。粉末を室温から700℃まで10分間で加熱し、次いで焼結温度(すなわち、900℃、950℃及び1000℃)まで10分間で加熱した。保持時間は10分間とし、圧力は保持時間が始まる直前に上昇させた。加熱は、12個の電源オンの直流パルスとそれに続く2個の電源オフの直流パルスからなるシーケンスによって行った。各パルスの持続時間は4.3m秒であった。このパルスシーケンスのデューティサイクルは12/14であった。すなわち、12個のパルスつまり時間区間(夫々4.3m秒の長さ)がオンであり、2つの時間区間がオフであった。このパルスシーケンスのデューティサイクルが出来上がった試料の透過率に大きく影響することはないと考えられる。実験の全期間にわたって、電流は1000A未満であり、冷却されたラム(ram)間の電圧降下は4V未満であった。
The as-received powder is treated with a spark plasma sintering machine (spark plasma) without any pretreatment or additives.
sintering machine, SPS) (SPS-1050, Sumitomo Coal Mining Co., Ltd.) was sintered at 900 ° C., 950 ° C. and 1000 ° C. under a uniaxial pressure of 500 MPa. A schematic diagram of the high-pressure apparatus used here is shown in FIG. In this apparatus, a pressure exceeding 500 MPa can be applied to a sample having a diameter of 5 mm and a thickness of about 2.5 mm. According to the experimental results, it was found that the apparatus shown in FIG. 1 can apply a high pressure of 1 GPa, but 500 MPa is sufficient to make the sample as dense as possible. In a typical sintering experiment, 0.18 g to 0.2 g of alumina powder was poured onto the die. The apparatus has an internal graphite die and an external graphite die, and this powder is pressed between two WC punches, which are pressed between two intermediate WC discs. Apart from the protective disk and punch, the entire device is made of graphite. The temperature was accurately measured using a pyrometer that focused on the surface of the internal die (ie, 0.75 cm away from the sample). Graphite felt was used to reduce heat loss due to radiation. The powder was heated from room temperature to 700 ° C. in 10 minutes and then heated to the sintering temperature (ie 900 ° C., 950 ° C. and 1000 ° C.) in 10 minutes. The holding time was 10 minutes and the pressure was increased just before the holding time started. Heating was performed by a sequence of twelve power-on DC pulses followed by two power-off DC pulses. The duration of each pulse was 4.3 ms. The duty cycle of this pulse sequence was 12/14. That is, twelve pulses, or time intervals (each 4.3 ms long), were on and two time intervals were off. It is considered that the duty cycle of this pulse sequence does not greatly affect the transmittance of the completed sample. Over the entire duration of the experiment, the current was less than 1000 A and the voltage drop across the cooled ram was less than 4V.
焼結された試料を加工して、直径5mmで厚さが1mmの円盤とし、ダイヤモンドスラリーを使用して両面を慎重に鏡面研磨した。試料の最終的な厚さは0.8mmである。実直線透過率を、二光束分光光度計(SolidSpec-3700DUV、株式会社島津製作所)を使用して波長範囲0.24μm〜1.6μmの波長範囲で測定した。試料と検出器の間の距離は約55cmであった。 The sintered sample was processed into a disk having a diameter of 5 mm and a thickness of 1 mm, and both surfaces were carefully mirror-polished using a diamond slurry. The final thickness of the sample is 0.8 mm. The actual linear transmittance was measured in a wavelength range of 0.24 μm to 1.6 μm using a two-beam spectrophotometer (SolidSpec-3700DUV, Shimadzu Corporation). The distance between the sample and the detector was about 55 cm.
走査型電子顕微鏡(SEM)(JSM-7100、日本電子株式会社)を使用して、焼結された試料の破面上で微細構造を観察した。倍率10000倍のSEM像上で空隙率を測定した。絶対密度は測定しなかった。それは、アルキメデス法などの従来の方法はきわめて低い空隙率に対して感度が悪いからである。Tamburini他によって開発された、電気的に絶縁性のSiCパンチ(英国Goodfellow Cambridge
Limitedの、抵抗率102〜103Ω cmのSiC)を使用するダイ(非特許文献10及び11)とは違って、図1に示す構成は抵抗率が20×10−6Ω
cmであるバインダ無しタングステンカーバイド(WC)でできた導電性のパンチ及び保護円盤を採用している。Tamburini他によって開発された構成ではパンチの抵抗率が高いために、この構成は高圧SPSというよりは高圧ホットプレスの方に良く似ている。
The microstructure was observed on the fracture surface of the sintered sample using a scanning electron microscope (SEM) (JSM-7100, JEOL Ltd.). The porosity was measured on a SEM image with a magnification of 10,000 times. Absolute density was not measured. This is because conventional methods such as the Archimedes method are insensitive to very low porosity. An electrically insulating SiC punch developed by Tamburini et al. (Goodfellow Cambridge, UK)
Unlike the limited die (SiC having a resistivity of 10 2 to 10 3 Ωcm) (Non-Patent Documents 10 and 11), the configuration shown in FIG. 1 has a resistivity of 20 × 10 −6 Ω.
Conductive punches and protective discs made of tungsten carbide (WC) with no binder in cm are employed. The configuration developed by Tamburini et al. Is more similar to a high pressure hot press than a high pressure SPS because of the high punch resistivity.
現在のところ、SPS条件下での他の酸化物粉末の焼結機構は完全には知られていない。しかし、電流は焼結中に単にジュール加熱に限られないある作用を演じている可能性がある(非特許文献13〜15)。最近、Langer他はTM−DARアルミナ粉末についてのホットプレス(HP)技術とSPS技術を比較した(非特許文献13)。試料の形状、加熱スケジュール、印加圧力、及び雰囲気は両方法について同一とされた。その結果によれば、所与の一定時間で、HPと比較して、SPSによる試料の方がより高い密度に到達した。Campbell他(非特許文献15)及びConrad他(非特許文献15)によって、微粒子アルミナにおける電気可塑性(electro plasticity)効果が研究された。これらの報告によれば、300V/cmの電場は1450℃及び1600℃における塑性変形に大きく影響し、実際、この電場により流動応力を最大70%も減らし、一般に破断までの延びが大きくなった。電流が緻密化を増進する可能性があるため、本発明者は図1に示すように導電性パンチを使用することにしたものである。 At present, the sintering mechanism of other oxide powders under SPS conditions is not completely known. However, there is a possibility that the current plays an action during sintering that is not limited to Joule heating (Non-Patent Documents 13 to 15). Recently, Langer et al. Compared hot press (HP) technology and SPS technology for TM-DAR alumina powder (Non-Patent Document 13). Sample shape, heating schedule, applied pressure, and atmosphere were the same for both methods. The results show that at a given time, the SPS sample reached a higher density compared to HP. Campbell et al. (Non-Patent Document 15) and Conrad et al. (Non-Patent Document 15) studied the electro plasticity effect in particulate alumina. According to these reports, the electric field of 300 V / cm greatly affected the plastic deformation at 1450 ° C. and 1600 ° C. In fact, this electric field reduced the flow stress by up to 70% and generally increased the elongation to break. Since the current may promote densification, the inventor decided to use a conductive punch as shown in FIG.
図2は950℃、500MPaで10分間焼結し両面研磨した直径5mmで厚さが0.8mmのアルミナ円盤を文書上に載せたものの写真を示す。なお、文書背面からの照明は行っていない。図2中、(a)は文書上に載せた状態の写真、(b)は文書から1.2cm離間した状態の写真である。これらの写真から判るように、紙面上に直接載せた場合でも、また1.2cmだけ紙面から浮かせた状態でも、試料を通してその背後にある文書のテキスト、画像及びホログラムをはっきり見ることができる。図3は500MPaの印加圧力下で950℃及び1000℃、10分間焼結したアルミナの直線透過率を示すグラフであるが、このグラフからわかるように、950℃及び1000℃で焼結した0.8mmの試料の波長645nmでの直線透過率はそれぞれ63.3%と64%であった。950℃で焼結した試料と1000℃での試料の透明度はほぼ同一であった。900℃で焼結した試料は透明性を示さなかったので、その透明度の測定は行わなかった。図3にはまた、試料厚0.8mmの場合の透明アルミナについて文献で報告されている波長645nmでの比較データを示す。 FIG. 2 shows a photograph of an alumina disk having a diameter of 5 mm and a thickness of 0.8 mm, which was sintered at 950 ° C. and 500 MPa for 10 minutes and polished on both sides. There is no illumination from the back of the document. In FIG. 2, (a) is a photograph placed on a document, and (b) is a photograph 1.2 cm away from the document. As can be seen from these photographs, the text, images and holograms of the document behind it can be clearly seen through the sample, even when placed directly on the paper or when it is lifted from the paper by 1.2 cm. FIG. 3 is a graph showing the linear transmittance of alumina sintered at 950 ° C. and 1000 ° C. for 10 minutes under an applied pressure of 500 MPa. As can be seen from this graph, 0. 0 ° C. sintered at 950 ° C. and 1000 ° C. The linear transmittance of the 8 mm sample at a wavelength of 645 nm was 63.3% and 64%, respectively. The transparency of the sample sintered at 950 ° C. and the sample at 1000 ° C. were almost the same. Since the sample sintered at 900 ° C. did not show transparency, the transparency was not measured. FIG. 3 also shows comparative data at a wavelength of 645 nm reported in the literature for transparent alumina when the sample thickness is 0.8 mm.
本実施例で得られた実直線透過率はApetz他(非特許文献1)で報告された実測値に劣っているだけであって、文献に報告されたほかの全ての値(非特許文献2〜7)に対しては勝っている。Apetz他は平均粒子サイズ150nmのAl2O3粉末をスリップキャスティングまたは圧力鋳造して微粒子試料を準備した。Apetz他はアルミナ試料を1150℃及び1250℃で2時間焼結して、閉鎖された気孔を得た。最後に、サンプルを1200℃〜1400℃、200MPaで2時間、アルゴン中で熱間静水圧プレス(HIP)処理した。HIP処理温度に従って、平均粒子サイズ0.3μm〜8μmが得られた。 The actual linear transmittance obtained in this example is only inferior to the actual value reported by Apetz et al. (Non-Patent Document 1), and all other values reported in the literature (Non-Patent Document 2). ~ 7) is won. Apetz et al. Prepared fine particle samples by slip casting or pressure casting Al 2 O 3 powder with an average particle size of 150 nm. Apetz et al. Sintered alumina samples at 1150 ° C. and 1250 ° C. for 2 hours to obtain closed pores. Finally, the sample was subjected to hot isostatic pressing (HIP) treatment in argon at 1200-1400 ° C. and 200 MPa for 2 hours. Depending on the HIP treatment temperature, an average particle size of 0.3 μm to 8 μm was obtained.
しかしながら、Apetzの成果では、アルミナ粉末の製造業者も初期粉末形状(すなわち、初期粉末粒子のサイズとその分布、及び粒子の形)も開示されていない。これとは異なり、Krell他(非特許文献2)では本実施例と同一の粉末(TM−DAR)を使用している。Krell他ではこの粉末を1280℃で2時間焼結し、その後に1200℃で15時間HIP処理(200MPa)することで、55%という低い直線透過率を得ている。 However, Apetz's work does not disclose the alumina powder manufacturer nor the initial powder shape (ie, the size and distribution of the initial powder particles and the particle shape). In contrast, Krell et al. (Non-Patent Document 2) uses the same powder (TM-DAR) as in this example. Krell et al. Obtained a low linear transmittance of 55% by sintering this powder at 1280 ° C. for 2 hours and then HIP treatment (200 MPa) at 1200 ° C. for 15 hours.
Zpetz他(非特許文献1)及びKrell他(非特許文献2)におけるHIP法に比べて、本発明で提案した方法は非常に高速かつ単純である。それは、i)粉末の脱凝集処理/前処理が不要であり、納入された粉末をそのままダイに注ぎ入れるだけである、及びii)4〜17時間という従来技術(非特許文献1及び2)と比べて、保持時間はわずか10分間である。 Compared with the HIP method in Zpetz et al. (Non-Patent Document 1) and Krell et al. (Non-Patent Document 2), the method proposed in the present invention is very fast and simple. That is, i) no powder deagglomeration / pretreatment is required, the delivered powder is simply poured into the die as it is, and ii) 4-17 hours of the prior art (Non-Patent Documents 1 and 2) In comparison, the retention time is only 10 minutes.
本発明では、80MPa未満のSPS(非特許文献3〜7)によって得られるものよりも透明度が優れている。2℃/分の加熱レート(すなわち、焼結時間が約5時間)での80MPa未満のSPSで焼結したサンプルの場合の最も高い47%の実直線透過率がKim他(非特許文献5)によって報告された。基準のデータ(非特許文献4)が0.88mm厚のサンプルで波長640nmについて測定された。Amen他(非特許文献7)は、焼結対象物成形プロセスを最適化することによって40%の実直線透過率を得た。より最近では、Stuer他(非特許文献6)は、Mg、Y、及びLaドーピングがSPS処理されたアルミナの透明度への効果を研究したが、純粋アルミナの場合には透明度は5%未満であった。 In the present invention, the transparency is superior to that obtained by SPS (Non-Patent Documents 3 to 7) of less than 80 MPa. Kim et al. (Non-patent Document 5) have the highest real linear transmittance of 47% in the case of a sample sintered with SPS of less than 80 MPa at a heating rate of 2 ° C./min (ie, sintering time of about 5 hours). Reported by. Reference data (Non-Patent Document 4) was measured for a wavelength of 640 nm on a 0.88 mm thick sample. Amen et al. (Non-Patent Document 7) obtained an actual linear transmission of 40% by optimizing the sintering object forming process. More recently, Steer et al. (6) studied the effect of Mg, Y, and La doping on the transparency of SPS treated alumina, but in the case of pure alumina, the transparency was less than 5%. It was.
図4はTM−DAR粉末の顕微鏡写真と1000℃、500MPaで10分間焼結した試料の破断面の顕微鏡写真とを対比している。図4(a)に示すように、当初の粉末は強く凝集し、粒子サイズは150nmと250nmの間に分布し、また当初の粒子は平均粒子サイズが200nmのほぼ円形粒子である。図4(b)は焼結した試料の粒内破面(transgranular fracture surface)であり、粒子サイズは当初の粉末とほぼ同じである。Bernard-Granger他(非特許文献16)およびLanger他(非特許文献13)は無圧力焼結とSPSのそれぞれの場合のTM−DAR粉末についての粒子サイズ/相対密度曲線を研究した。彼らの報告によれば、本願で記載したものよりも高温かつ長い焼結時間(すなわち、1220℃で21分間の無圧力焼結(非特許文献16)、あるいは1100℃、50MPa、処理時間1時間で焼結した粉末の場合(非特許文献13))でも、粒子成長はなかった。しかしながら、相対密度は夫々83%と81.5%であった。本発明では、圧力を500MPaまで上げることによって、粒子サイズが約200nmで空隙率が0.05%未満である、最大限に稠密な成形体が得られた。 FIG. 4 compares a micrograph of TM-DAR powder with a micrograph of a fracture surface of a sample sintered at 1000 ° C. and 500 MPa for 10 minutes. As shown in FIG. 4 (a), the initial powder is strongly agglomerated, the particle size is distributed between 150 nm and 250 nm, and the initial particles are almost circular particles having an average particle size of 200 nm. FIG. 4 (b) is a transgranular fracture surface of the sintered sample, and the particle size is approximately the same as the original powder. Bernard-Granger et al. (Non-Patent Document 16) and Langer et al. (Non-Patent Document 13) studied the particle size / relative density curves for TM-DAR powders for pressureless sintering and SPS, respectively. According to their report, sintering time higher than that described in this application (that is, pressureless sintering at 1220 ° C. for 21 minutes (Non-Patent Document 16), or 1100 ° C., 50 MPa, treatment time of 1 hour) Even in the case of the powder sintered in (Non-patent Document 13)), there was no particle growth. However, the relative densities were 83% and 81.5%, respectively. In the present invention, by increasing the pressure to 500 MPa, a compact body having a maximum particle size of about 200 nm and a porosity of less than 0.05% was obtained.
本発明のアルミナベース透明多結晶セラミックは非常に透明でありかつ稠密なので、非常に過酷な環境用の観察窓遮蔽材などの幅広い用途を有する。 Since the alumina-based transparent polycrystalline ceramic of the present invention is very transparent and dense, it has a wide range of applications such as observation window shielding for very harsh environments.
Claims (1)
(a)粒子サイズが150〜250nm以下のアルミナ粉末からなる前駆体を準備する。
(b)前記前駆体に直接電流を印加して、前記前駆体の温度を、前駆体に高度の高密度化をもたらすが実質的に前記前駆体中の粒子成長をもたらさない保持温度である950℃以上1000℃以下の温度範囲にまで上昇させる。
(c)前記前駆体を前記保持温度に維持している間、前記前駆体に500MPa以上1GPa未満の圧力を印加して、稠密化する。 Including the following steps (a) to (c), when the porosity is less than 0.05% and the thickness is 0.8 mm, the actual linear transmittance is 40 for light having a wavelength of 645 nm. % is transparent to be larger than an average particle size consists of the following crystal grains 200 nm, said crystalline particles comprise Al 2 O 3, the Al 2 O 3 has a preferred crystal orientation, alumina-based transparent multi method for producing a crystalline ceramic.
(A) A precursor made of alumina powder having a particle size of 150 to 250 nm or less is prepared.
(B) Applying a current directly to the precursor, the temperature of the precursor is a holding temperature that results in a high densification of the precursor but does not substantially result in particle growth in the precursor 950 The temperature is raised to a temperature range of not less than 1000 ° C and not more than 1000 ° C.
(C) While maintaining the precursor at the holding temperature, the precursor is densified by applying a pressure of 500 MPa or more and less than 1 GPa to the precursor.
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