JP5513058B2 - Composite member manufacturing method, composite member, heat dissipation member, and semiconductor device - Google Patents
Composite member manufacturing method, composite member, heat dissipation member, and semiconductor device Download PDFInfo
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Description
本発明は、マグネシウム(いわゆる純マグネシウム)又はマグネシウム合金とSiCといった非金属無機材料とが複合された複合部材、この複合部材から構成される放熱部材、この放熱部材を具える半導体装置、及び複合部材の製造方法に関するものである。特に、大型であっても高品位な複合部材を製造することができる複合部材の製造方法に関するものである。 The present invention relates to a composite member in which magnesium (so-called pure magnesium) or a magnesium alloy and a non-metallic inorganic material such as SiC are combined, a heat radiating member composed of the composite member, a semiconductor device including the heat radiating member, and a composite member It is related with the manufacturing method. In particular, the present invention relates to a method of manufacturing a composite member that can manufacture a high-quality composite member even if it is large.
半導体素子の放熱部材(ヒートスプレッダ)の構成材料として、銅といった金属材料のみからなるものの他、Al-SiCといった、金属と非金属無機材料(代表的にはセラミックス)との複合材料が利用されている。近年、放熱部材の軽量化を主目的として、アルミニウム(Al)よりも軽量であるマグネシウム(Mg)やその合金を母材とする複合材料が検討されている(特許文献1参照)。 As a constituent material of a heat dissipation member (heat spreader) of a semiconductor element, a composite material of a metal and a non-metallic inorganic material (typically ceramics) such as Al-SiC is used in addition to a material made of only a metal material such as copper . In recent years, a composite material using magnesium (Mg) or its alloy as a base material, which is lighter than aluminum (Al), has been studied mainly for the purpose of reducing the weight of the heat dissipation member (see Patent Document 1).
昨今、パーソナルコンピュータや携帯用電子機器などの各種の電子機器の高機能化、高密度実装化に伴い、一つの配線板に搭載される半導体素子やその周辺部品が増加する傾向にある。これに対応して、大型な放熱部材が望まれている。特許文献1には、MgやMg合金とSiCなどとの複合材料として50mm×100mmの大きさの板材が開示されているものの、更なる大型化が望まれる。しかし、従来、更に大きな複合材料の製造方法について十分に検討されていない。そして、本発明者らが調べたところ、後述するように大型な複合材料では、欠陥が集中的に存在する箇所が形成されて、品位の低下を招くことがあるとの知見を得た。 In recent years, as various types of electronic devices such as personal computers and portable electronic devices become more functional and have higher density packaging, the number of semiconductor elements and peripheral components mounted on one wiring board tend to increase. Correspondingly, a large heat radiating member is desired. Although Patent Document 1 discloses a plate material having a size of 50 mm × 100 mm as a composite material of Mg or Mg alloy and SiC or the like, further enlargement is desired. However, conventionally, a method for producing a larger composite material has not been sufficiently studied. As a result of investigations by the present inventors, it has been found that, as will be described later, in a large-sized composite material, a portion where defects are concentrated is formed and the quality may be lowered.
そこで、本発明の目的の一つは、Mg又はMg合金と非金属無機材料との複合部材であって、大型であっても、高品位な複合部材を製造することができる複合部材の製造方法を提供することにある。また、本発明の他の目的は、Mg又はMg合金と非金属無機材料との複合部材であって、大型でありながら高品位な複合部材を提供することにある。更に、本発明の他の目的は、上記複合部材からなる放熱部材、及びこの放熱部材を具える半導体装置を提供することにある。 Accordingly, one of the objects of the present invention is a composite member of Mg or Mg alloy and a non-metallic inorganic material, and a method of manufacturing a composite member capable of manufacturing a high-quality composite member even if it is large Is to provide. Another object of the present invention is to provide a composite member of Mg or Mg alloy and a non-metallic inorganic material, which is large but has a high quality. Furthermore, the other object of this invention is to provide the heat radiating member which consists of the said composite member, and a semiconductor device provided with this heat radiating member.
本発明者らは、上記従来技術の問題点を検討すべく、50mm×100mmを超えるような大きさ、具体的には、直径が50mm超の円形領域をとることが可能な大きさを有する板状の複合部材を特許文献1に記載されるような溶浸法(鋳型に充填した非金属無機材料に溶融したMg又はMg合金(以下、溶融Mgと呼ぶ)を溶浸させた後、溶融Mgを凝固させる方法)により、Mg又はMg合金と非金属無機材料とを複合した溶浸板を作製し、雰囲気炉内で徐冷した。そして、得られた板状の複合部材をその厚さ方向に切断し、その断面を観察したところ、当該複合部材の中央部分に欠陥が集中的に存在しており、周縁部分には、欠陥が実質的に見られなかった。より具体的には、上記中央部分の内部に引け巣(内引け巣)による大きな空隙(気孔)が見られた。また、上記複合部材の中央部分の表面にも外引け巣や凹凸が見られた。このように局所的に欠陥が生じた理由は、以下のように推測される。 In order to examine the problems of the prior art, the present inventors have a size exceeding 50 mm × 100 mm, specifically, a plate having a size capable of taking a circular region having a diameter of more than 50 mm. Infiltration method as described in Patent Document 1 (Mg Mg or Mg alloy (hereinafter referred to as molten Mg) melted in a non-metallic inorganic material filled in a mold) An infiltration plate in which Mg or an Mg alloy and a non-metallic inorganic material were combined was produced by a method of solidifying the material and slowly cooled in an atmosphere furnace. Then, when the obtained plate-shaped composite member was cut in the thickness direction and the cross section was observed, defects were concentrated in the central portion of the composite member, and defects were found in the peripheral portion. Virtually not seen. More specifically, large voids (pores) due to shrinkage nests (inner shrinkage nests) were observed inside the central portion. Further, outer shrinkage nests and irregularities were also found on the surface of the central portion of the composite member. The reason why the defect is locally generated in this way is estimated as follows.
上記溶浸板を徐冷すると、その周縁から中央部分に向かって収束するように、また表面から内部に向かって溶融Mgの凝固が進む。すると、上記中央部分の内部にホットスポット(周囲を凝固金属で囲まれた未凝固金属の領域)が生じ得る。ここで、MgやMg合金は、凝固すると体積が4%程度減少する。そのため、凝固による体積減少分を未凝固のMg又はMg合金が補填するように凝固が進む。すると、上記中央部分のホットスポットの未固溶金属が凝固する際には、上記補填によりMg又はMg合金が不足した状態であり、上述のような補填も行われない。その結果、板状の複合部材の周縁部分に欠陥が生じ難く、中央部分に大きな空隙が生じ易いと考えられる。また、上記中央部分において表面部分の溶融Mgが既に凝固していても、内部の未凝固部分が凝固するときの体積減少により内部に引っ張られる。そのため、上記中央部分の表面に外引け巣が生じたり、この表面の引けにより、原料に用いた非金属無機材料の外形に沿った凹凸が生じたりすると考えられる。そして、複合部材の内部に上述のような大きな欠陥が集中して存在すると、強度といった機械的特性や熱伝導性といった熱特性が低下する。ここで、板状の複合部材を半導体素子の放熱部材に利用する場合、通常、複合部材の中央部分には、半導体素子などが搭載される。そのため、半導体素子の搭載箇所となる部分に欠陥が集中した複合部材では、放熱部材に適さない。また、複合部材の外部に上述のような外引け巣といった表面欠陥が存在すると、表面性状の劣化や寸法精度の低下を招く。特に、SiCといった非金属無機材料と金属との複合材料では、溶融金属よりも冷え易いSiCを含むため、溶融金属のみを用いて金属のみの鋳造材を形成する場合と比較して、上記内部欠陥や表面欠陥が生じ易い。 When the infiltration plate is gradually cooled, solidification of molten Mg proceeds so as to converge from the peripheral edge toward the central portion and from the surface toward the inside. Then, a hot spot (an unsolidified metal region surrounded by a solidified metal) may be generated inside the central portion. Here, the volume of Mg or Mg alloy decreases by about 4% when solidified. For this reason, solidification proceeds so that unsolidified Mg or Mg alloy compensates for the volume reduction due to solidification. Then, when the undissolved metal in the hot spot in the central portion is solidified, Mg or Mg alloy is insufficient due to the above-described compensation, and the above-described compensation is not performed. As a result, it is considered that defects are hardly generated in the peripheral portion of the plate-shaped composite member, and a large gap is likely to be generated in the central portion. Further, even if the molten Mg in the surface portion has already solidified in the central portion, the inner unsolidified portion is pulled inside due to the volume reduction when solidified. For this reason, it is considered that an outer shrinkage nest is generated on the surface of the central portion, and unevenness along the outer shape of the nonmetallic inorganic material used as a raw material is generated by the surface shrinkage. And when the above big defects concentrate in the inside of a composite member, mechanical characteristics, such as intensity | strength, and thermal characteristics, such as thermal conductivity, will fall. Here, when a plate-shaped composite member is used as a heat radiating member of a semiconductor element, a semiconductor element or the like is usually mounted on the central portion of the composite member. Therefore, a composite member in which defects are concentrated on a portion where a semiconductor element is mounted is not suitable for a heat dissipation member. In addition, if surface defects such as the above-described shrinkage nests exist outside the composite member, surface properties are deteriorated and dimensional accuracy is reduced. In particular, composite materials of non-metallic inorganic materials such as SiC and metals contain SiC that is easier to cool than molten metal, so the above internal defects compared with the case of forming a metal-only casting using only molten metal And surface defects are likely to occur.
本発明者らは、上記欠陥を低減するには、溶浸板を周縁から中央部分に向かって収束的に冷却するのではなく、溶浸板の一方の縁部から対向する他方の縁部に向かうように一方向に冷却することが効果的である、との知見を得た。本発明は、上記知見に基づくものである。 In order to reduce the above defects, the present inventors do not converge the cooling of the infiltrating plate from the peripheral edge toward the central portion, but instead from one edge of the infiltrating plate to the other opposite edge. The knowledge that it is effective to cool in one direction so that it goes is obtained. The present invention is based on the above findings.
本発明の複合部材の製造方法は、マグネシウム又はマグネシウム合金と非金属無機材料とが複合された複合部材を製造する方法であり、以下の複合工程と、冷却工程とを具える。
複合工程:鋳型に収納された非金属無機材料の集合体に溶融したマグネシウム又はマグネシウム合金を溶浸させ、溶浸板を形成する工程。
冷却工程:上記溶浸板における上記溶融したマグネシウム又はマグネシウム合金の供給側の反対側から一方向に上記溶浸板を冷却して、上記溶融したマグネシウム又はマグネシウム合金を凝固させる工程。
代表的には、上記複合工程では、上記集合体に対して、上記溶融したマグネシウム又はマグネシウム合金をその自重によって重力方向、即ち鉛直方向上側から鉛直方向下側に向かって供給する。そして、上記冷却工程では、上記溶浸板における鉛直方向下側から鉛直方向上側に向かって一方向に上記溶浸板を冷却して、上記溶融したマグネシウム又はマグネシウム合金を凝固させることが挙げられる。
The method for producing a composite member according to the present invention is a method for producing a composite member in which magnesium or a magnesium alloy and a nonmetallic inorganic material are composited, and includes the following composite step and cooling step.
Compounding step: A step of infiltrating molten magnesium or a magnesium alloy into an aggregate of nonmetallic inorganic materials housed in a mold to form an infiltrating plate.
Cooling step: a step of cooling the infiltrating plate in one direction from the opposite side of the molten magnesium or magnesium alloy supply side to solidify the molten magnesium or magnesium alloy.
Typically, in the composite step, the molten magnesium or magnesium alloy is supplied to the aggregate by its own weight from the gravity direction, that is, from the vertical direction upper side to the vertical direction lower side. In the cooling step, the infiltrating plate is cooled in one direction from the lower side in the vertical direction toward the upper side in the vertical direction, and the molten magnesium or magnesium alloy is solidified.
上記本発明複合部材の製造方法は、直径が50mm以下の円形領域をとることが可能な小型な複合部材の製造にも勿論利用することができるが、特に、直径が50mm超の円形領域をとることが可能な大きさを有する複合部材を製造する場合に好適に利用することができる。この場合、上記溶浸板を、直径が50mm超の円形領域をとることが可能な大きさを有するものとすればよい。 The above-described method for producing a composite member of the present invention can of course be used for the production of a small composite member capable of taking a circular region having a diameter of 50 mm or less, and in particular, taking a circular region having a diameter of more than 50 mm. This can be suitably used in the case of manufacturing a composite member having a size that can be used. In this case, the infiltration plate may have a size capable of taking a circular region having a diameter of more than 50 mm.
また、上記本発明複合部材の製造方法によれば、例えば、以下の本発明複合部材が得られる。本発明の複合部材は、マグネシウム又はマグネシウム合金と非金属無機材料とが複合された板材であり、直径が50mm超の円形領域をとることが可能な大きさを有する。そして、当該複合部材を平面視したときの重心を通る直線を切断線として、当該複合部材の厚さ方向の断面をとる。この断面において、上記重心を中心として上記切断線の長手方向に沿って上記切断線の長さの10%までの範囲の領域を中心領域とする。この中心領域から任意の1mm×1mmの小領域をとり、当該小領域の面積に対する欠陥部の面積の割合を面積比とするとき、当該複合部材は、上記面積比が10%以下である。 Moreover, according to the said manufacturing method of this invention composite member, the following this invention composite member is obtained, for example. The composite member of the present invention is a plate material in which magnesium or a magnesium alloy and a nonmetallic inorganic material are combined, and has a size capable of taking a circular region having a diameter of more than 50 mm. Then, a cross section in the thickness direction of the composite member is taken with a straight line passing through the center of gravity when the composite member is viewed in plan as a cutting line. In this cross section, a region in the range of up to 10% of the length of the cutting line along the longitudinal direction of the cutting line with the center of gravity as the center is taken as a central region. When an arbitrary small area of 1 mm × 1 mm is taken from this central area, and the ratio of the area of the defect portion to the area of the small area is an area ratio, the area ratio of the composite member is 10% or less.
上記本発明製造方法において溶融Mgの供給方向を上述のように例えば、重力方向とすると、上記溶浸板中の未固溶の溶融Mgは、その自重により、常に鉛直方向上側(代表的には鋳型の開口側)から鉛直方向下側(代表的には鋳型の底面側)に向かう。この状態で、上記溶浸板を、その鉛直方向下側から鉛直方向上側に向かって一方向に冷却すると、当該下側の溶融Mgが凝固する際に、当該上側の未凝固のMgが当該下側に順次供給される。即ち、上記鉛直方向下側の溶融Mgが凝固するときの体積減少分が、上記鉛直方向上側に存在する未凝固の溶融Mgにより順次補填されながら、当該鉛直方向上側に向かって凝固が進む。そのため、この製造方法では、上述のように溶浸板の周縁から中央部分に向かって収束的に冷却を行った場合のように複合部材の中央部分(上記中心領域を含む部分)に大きな欠陥が集中することがない。このように冷却方向を特定の一方向にして得られた本発明複合部材によれば、大きな欠陥が集中的に存在しておらず、高品位である。また、本発明製造方法により製造された上記本発明複合部材は、直径が50mm超の円形領域をとることが可能な大きさを有する大型の板材でありながら、上記中心領域を含む中央部分に内引け巣に伴う空隙といった欠陥部が小さい。このように局所的に大きな欠陥が存在していない本発明複合部材は、強度といった機械的特性や熱伝導性といった熱特性に優れる上に、半導体素子やその周辺部品の搭載面積を十分に有することができる。従って、本発明複合部材は、上記半導体素子の放熱部材に好適に利用することができる。 In the production method of the present invention, if the molten Mg supply direction is, for example, the gravitational direction as described above, the undissolved molten Mg in the infiltration plate is always on the upper side in the vertical direction (typically From the mold opening side to the lower side in the vertical direction (typically, the bottom surface side of the mold). In this state, when the infiltration plate is cooled in one direction from the vertical lower side to the vertical upper side, when the lower molten Mg is solidified, the upper unsolidified Mg becomes lower. Are sequentially supplied to the side. That is, solidification proceeds toward the upper side in the vertical direction while the volume decrease when the molten Mg on the lower side in the vertical direction solidifies is sequentially compensated by the unsolidified molten Mg present on the upper side in the vertical direction. Therefore, in this manufacturing method, as described above, there is a large defect in the central portion (the portion including the central region) of the composite member as in the case where the cooling is converged from the periphery of the infiltration plate toward the central portion. There is no concentration. As described above, according to the composite member of the present invention obtained by setting the cooling direction to one specific direction, large defects do not exist intensively and are of high quality. In addition, the composite member of the present invention manufactured by the manufacturing method of the present invention is a large plate material having a size capable of taking a circular region having a diameter of more than 50 mm, but is in the central portion including the central region. Defects such as voids associated with shrinkage nests are small. In this way, the composite member of the present invention in which no large defects exist locally is excellent in mechanical properties such as strength and thermal properties such as thermal conductivity, and has a sufficient mounting area for semiconductor elements and peripheral components. Can do. Therefore, the composite member of the present invention can be suitably used as a heat dissipation member for the semiconductor element.
以下、本発明をより詳細に説明する。
[複合部材]
本発明複合部材の形態として、Mg又はMg合金と、非金属無機材料とが複合された複合材料からなる基板のみの形態と、上記基板と、この基板の少なくとも一面を覆う金属被覆層とを具える形態とが挙げられる。まず、上記基板を説明する。
Hereinafter, the present invention will be described in more detail.
[Composite material]
As a form of the composite member of the present invention, a form of only a substrate made of a composite material in which Mg or an Mg alloy and a non-metallic inorganic material are composited, the substrate, and a metal coating layer covering at least one surface of the substrate are provided. Form. First, the substrate will be described.
<金属成分>
上記基板中の金属成分は、99.8質量%以上のMg及び不純物からなるいわゆる純マグネシウム、又は添加元素と残部がMg及び不純物からなるマグネシウム合金とする。上記金属成分が純マグネシウムである場合、合金である場合と比較して、(1)複合部材の熱伝導性を高められる、(2)凝固時に晶出物が不均一に析出するなどの不具合が生じ難いため、均一的な組織を有する複合部材を得易い、といった利点を有する。上記金属成分がマグネシウム合金であると、液相線温度が低下するため、溶融する際の温度を低下できる上に、複合部材の耐食性や機械的特性(強度など)を高められる。添加元素は、Li,Ag,Ni,Ca,Al,Zn,Mn,Si,Cu,及びZrの少なくとも1種が挙げられる。これらの元素は、含有量が多くなると熱伝導率の低下を招くため、合計で20質量%以下(当該金属成分を100質量%とする。以下、添加元素の含有量について同様)が好ましい。特に、Alは3質量%以下、Znは5質量%以下、その他の元素はそれぞれ10質量%以下が好ましい。Liを添加すると、複合部材の軽量化、及び加工性の向上の効果がある。公知のマグネシウム合金、例えば、AZ系,AS系,AM系,ZK系,ZC系,LA系などでもよい。所望の組成となるように金属原料を用意する。
<Metal component>
The metal component in the substrate is so-called pure magnesium composed of 99.8% by mass or more of Mg and impurities, or a magnesium alloy composed of additive elements and the balance Mg and impurities. When the metal component is pure magnesium, compared to the case of an alloy, (1) the thermal conductivity of the composite member can be improved, and (2) the crystallized product is deposited unevenly during solidification. Since it does not easily occur, there is an advantage that it is easy to obtain a composite member having a uniform structure. When the metal component is a magnesium alloy, the liquidus temperature is lowered, so that the temperature at the time of melting can be lowered and the corrosion resistance and mechanical properties (strength, etc.) of the composite member can be improved. Examples of the additive element include at least one of Li, Ag, Ni, Ca, Al, Zn, Mn, Si, Cu, and Zr. Since these elements cause a decrease in thermal conductivity when the content increases, the total content is preferably 20% by mass or less (the metal component is 100% by mass; the same applies to the content of the additive element). In particular, Al is preferably 3% by mass or less, Zn is 5% by mass or less, and other elements are each preferably 10% by mass or less. Addition of Li has the effect of reducing the weight of the composite member and improving the workability. Known magnesium alloys such as AZ, AS, AM, ZK, ZC, and LA may be used. A metal raw material is prepared so as to have a desired composition.
<非金属無機材料>
《組成》
上記基板中の非金属無機材料は、熱膨張係数がMgよりも小さく、熱伝導性に優れ、かつMgと反応し難いものが挙げられる。このような非金属無機材料として、SiCなどのセラミックスが代表的である。その他、Si3N4、Si、MgO、Mg3N2、Mg2Si、MgB2、MgCl2、Al2O3、AlN、CaO、CaCl2、ZrO2、ダイヤモンド、グラファイト、h-BN、c-BN、B4C、Y2O3、NaClの少なくとも1種が挙げられる。特に、SiCは、(1)熱膨張係数が3ppm/K〜4ppm/K程度であり半導体素子やその周辺部品の熱膨張係数に近い、(2)非金属無機材料の中でも熱伝導率が特に高い(単結晶:390W/m・K〜490W/m・K程度)、(3)種々の形状、大きさの粉末や焼結体が市販されている、(4)機械的強度が高い、といった利点を有する。上記複数種の非金属無機材料を含有していてもよい。上記非金属無機材料の一部は、例えば、後述するネットワーク部として存在することを許容する。
<Non-metallic inorganic material>
"composition"
Examples of the non-metallic inorganic material in the substrate include those having a thermal expansion coefficient smaller than Mg, excellent thermal conductivity, and hardly reacting with Mg. As such a non-metallic inorganic material, a ceramic such as SiC is representative. Others, Si 3 N 4 , Si, MgO, Mg 3 N 2 , Mg 2 Si, MgB 2 , MgCl 2 , Al 2 O 3 , AlN, CaO, CaCl 2 , ZrO 2 , diamond, graphite, h-BN, c -At least one of BN, B 4 C, Y 2 O 3 , and NaCl is included. In particular, SiC has (1) a coefficient of thermal expansion of about 3 ppm / K to 4 ppm / K, which is close to the coefficient of thermal expansion of semiconductor elements and peripheral components, and (2) has a particularly high thermal conductivity among non-metallic inorganic materials. (Single crystal: about 390W / m · K to 490W / m · K), (3) Powders and sintered bodies of various shapes and sizes are commercially available, (4) Advantages such as high mechanical strength Have You may contain the said multiple types of nonmetallic inorganic material. For example, a part of the non-metallic inorganic material is allowed to exist as a network part described later.
《含有量及び存在形態》
上記基板中の非金属無機材料の含有量は、この基板を100体積%とするとき、20体積%以上であると、熱伝導率κが高く、熱膨張係数(線熱膨張係数)αが小さい基板とすることができる。基板中の非金属無機材料の含有量が多いほど、熱伝導率κが高まる上、熱膨張係数αが小さくなり易く、半導体素子(4ppm/K〜8ppm/K程度(例えば、Si:4.2ppm/K、GaAs:6.5ppm/K))やその周辺部品(絶縁基板:約4.5ppm/K、シリコンパッケージ:約3ppm/K、アルミナパッケージ:6.5ppm/K)の熱膨張係数に整合し易い。従って、上記含有量は、50体積%以上、特に、70体積%以上、更に80体積%以上、とりわけ85体積%以上が好ましい。特に上限を設けないが、溶融Mgの溶浸性、工業的な生産性などを考慮すると、80体積%〜90体積%程度が実用的であると考えられる。
<< Content and form of existence >>
When the content of the nonmetallic inorganic material in the substrate is 20% by volume when the substrate is 100% by volume, the thermal conductivity κ is high and the thermal expansion coefficient (linear thermal expansion coefficient) α is small. It can be a substrate. The greater the content of the non-metallic inorganic material in the substrate, the higher the thermal conductivity κ and the smaller the thermal expansion coefficient α, and the semiconductor element (about 4 ppm / K to 8 ppm / K (e.g., Si: 4.2 ppm / K, GaAs: 6.5 ppm / K) and its peripheral components (insulating substrate: about 4.5 ppm / K, silicon package: about 3 ppm / K, alumina package: 6.5 ppm / K). Accordingly, the content is preferably 50% by volume or more, particularly 70% by volume or more, more preferably 80% by volume or more, and particularly preferably 85% by volume or more. Although no particular upper limit is set, it is considered that about 80% by volume to 90% by volume is practical considering the infiltration property of molten Mg, industrial productivity, and the like.
上記基板中の非金属無機材料の含有量は、原料の量に実質的に等しい。また、例えば、原料に非金属無機材料の粉末を利用した場合、基板は、Mg又はMg合金の金属成分に非金属無機材料の粒子が概ね離散的に分散した分散形態となる。或いは、原料に上記非金属無機材料の成形体、特に、粉末成形体を加熱などして粒子同士を結合するネットワーク部を有する多孔質の成形体を利用した場合、基板は、上記ネットワーク部を有すると共に上記非金属無機材料の成形体の隙間(気孔)にMg又はMg合金が含浸された結合形態となったり、上記成形体のネットワーク部が溶浸時に崩壊するなどして上記分散形態となったりする。焼結条件などを適宜調整することで、基板中の非金属無機材料の存在状態を変化させられる。基板中の非金属無機材料の存在状態、例えば、ネットワーク部の有無や形状などは、例えば、当該基板の断面を光学顕微鏡や走査型電子顕微鏡(SEM)で観察することで確認することができる。基板が所望の熱特性などを有するように、原料の非金属無機材料の量や形状を適宜選択するとよい。 The content of the nonmetallic inorganic material in the substrate is substantially equal to the amount of the raw material. Further, for example, when a powder of a nonmetallic inorganic material is used as a raw material, the substrate has a dispersed form in which particles of the nonmetallic inorganic material are dispersed in a discrete manner in the metal component of Mg or Mg alloy. Alternatively, when a molded body of the non-metallic inorganic material is used as a raw material, in particular, a porous molded body having a network part that bonds particles by heating the powder molded body, the substrate has the network part. In addition, the gap (pores) of the molded body of the nonmetallic inorganic material is impregnated with Mg or Mg alloy, or the network portion of the molded body is collapsed during infiltration to become the dispersed form. To do. By appropriately adjusting the sintering conditions and the like, the presence state of the nonmetallic inorganic material in the substrate can be changed. The presence state of the nonmetallic inorganic material in the substrate, for example, the presence or absence and shape of the network portion can be confirmed, for example, by observing the cross section of the substrate with an optical microscope or a scanning electron microscope (SEM). The amount and shape of the raw nonmetallic inorganic material may be appropriately selected so that the substrate has desired thermal characteristics.
<大きさ及び形状>
本発明複合部材(基板)の特徴の一つは、比較的大きいことにある。一形態としては、短辺が50mm超、長辺が100mm超の長方形状が挙げられる。複合部材(基板)がこのように大型であることで、例えば、この複合部材を半導体装置の放熱部材の構成材料に利用する場合、多くの半導体素子やその周辺部品を搭載することができる。基板の大きさや形状は、適宜選択することができ、特に問わない。例えば、上記長方形状の他、正方形状でも円形状でもよい。基板が所望の大きさ及び形状となるように鋳型を用意する。また、金属被覆層を除く基板のみの厚さは、10mm以下、特に5mm以下であると、半導体素子の放熱部材の構成材料に好ましいと考えられる。
<Size and shape>
One of the features of the composite member (substrate) of the present invention is that it is relatively large. One form includes a rectangular shape having a short side of more than 50 mm and a long side of more than 100 mm. Since the composite member (substrate) is thus large, for example, when the composite member is used as a constituent material of a heat dissipation member of a semiconductor device, many semiconductor elements and peripheral components can be mounted. The size and shape of the substrate can be appropriately selected and are not particularly limited. For example, in addition to the rectangular shape, a square shape or a circular shape may be used. A mold is prepared so that the substrate has a desired size and shape. Further, it is considered that the thickness of only the substrate excluding the metal coating layer is preferably 10 mm or less, particularly 5 mm or less, as a constituent material of the heat dissipation member of the semiconductor element.
<内部組織>
本発明複合部材(基板)の特徴の一つは、上述のように大型でありながら、欠陥が上記中心領域に集中的に存在していないこと、具体的には、上記中心領域から選択した上記小領域における欠陥部の面積比が10%以下であることにある。上記欠陥部とは、上記小領域において、Mg又はMg合金と非金属無機材料とを除く成分とし、代表的には、空隙が挙げられる。
<Internal organization>
One of the features of the composite member (substrate) of the present invention is that it is large as described above, but defects are not concentrated in the central region, specifically, the above selected from the central region. The area ratio of the defective portion in the small region is 10% or less. The said defect part is a component except Mg or an Mg alloy and a nonmetallic inorganic material in the said small area | region, and a space | gap is mentioned typically.
本発明複合部材(基板)は、後述するように冷却条件を適宜調整することで、上記面積比が5%以下、特に2%以下を満たすことができる。欠陥は存在しないことが望ましいため、面積比の下限は特に設けない。上記本発明製造方法のような特定の一方向の冷却を行わない場合、上記面積比が10%超の複合部材(基板)が得られる。即ち、この基板は、中心領域に多くの欠陥を有し、かつこの欠陥が非常に大きい。より具体的には、この基板は、目視で確認できる程度の大きさの欠陥を有しており、このような大きな欠陥が中心領域に偏在する。これに対し、本発明複合部材(基板)は、中心領域に欠陥が少なく、かつこの欠陥は、目視で確認が困難な程度の大きさ(欠陥の最大長さが0.1mm(100μm)以下程度)である。本発明複合部材(基板)は、局所的に大きな欠陥が存在せず、欠陥が存在したとしても、非常に微細である。そのため、本発明複合部材(基板)は、大きな欠陥が一部に集中的に存在する場合と比較して、強度といった機械的特性や熱伝導性といった熱特性に優れる。また、本発明複合部材は、上記中心領域だけでなく、上記断面の実質的に全域に亘って欠陥が集中的に存在しない。即ち、本発明複合部材は、その全体に亘って欠陥が偏在しておらず、均一的な組織を有する。なお、複合部材が、上記複合材料からなる基板の表面に金属被覆層を具える形態の場合、上記中心領域の抽出は、金属被覆層を除く基板のみを対象として行う。 The composite member (substrate) of the present invention can satisfy the above area ratio of 5% or less, particularly 2% or less by appropriately adjusting the cooling conditions as described later. Since it is desirable that no defects exist, there is no particular lower limit for the area ratio. When cooling in one specific direction is not performed as in the production method of the present invention, a composite member (substrate) having an area ratio of more than 10% is obtained. That is, this substrate has many defects in the central region, and this defect is very large. More specifically, this substrate has defects of a size that can be visually confirmed, and such large defects are unevenly distributed in the central region. On the other hand, the composite member (substrate) of the present invention has few defects in the central region, and this defect has a size that is difficult to visually confirm (the maximum length of the defect is about 0.1 mm (100 μm) or less). It is. The composite member (substrate) of the present invention does not have a large defect locally, and is very fine even if a defect exists. Therefore, the composite member (substrate) of the present invention is superior in mechanical properties such as strength and thermal properties such as thermal conductivity, compared to the case where large defects are concentrated in part. In the composite member of the present invention, defects are not intensively present not only in the central region but also over substantially the entire cross section. That is, the composite member of the present invention has a uniform structure with no defects unevenly distributed throughout. In the case where the composite member has a metal coating layer on the surface of the substrate made of the composite material, the central region is extracted only for the substrate excluding the metal coating layer.
<表面状態>
本発明複合部材(基板)は、上述のように内部欠陥が偏在していない上に、外引け巣などの表面欠陥も少ない。従って、本発明複合部材(基板)は、表面の凹凸が少なく、例えば、表面粗さRaが2.5μm以下を満たすことができる。また、基板自体の表面粗さが小さいことで、基板の上に溶融Mgにより金属被覆層を複合化と同時に形成した場合でも、特に、厚さが1mm以下といった薄い金属被覆層を形成した場合でも、金属被覆層の表面も平滑になり、金属被覆層の表面粗さRaが2.5μm以下を満たすことができる。金属被覆層を厚く形成して、研磨などの機械加工を施すことでも金属被覆層の表面を平滑にできる。但し、金属被覆層は、後述するように薄くてよいため、上記研磨などを行うと、歩留まりの低下を招く上に、研磨コストが増加する。
<Surface condition>
The composite member (substrate) of the present invention is free from internal defects as described above, and has few surface defects such as outer shrinkage nests. Therefore, the composite member (substrate) of the present invention has less surface irregularities and can satisfy, for example, a surface roughness Ra of 2.5 μm or less. Also, because the surface roughness of the substrate itself is small, even when a metal coating layer is formed on the substrate simultaneously with the composite by molten Mg, especially when a thin metal coating layer having a thickness of 1 mm or less is formed. The surface of the metal coating layer is also smooth, and the surface roughness Ra of the metal coating layer can satisfy 2.5 μm or less. The surface of the metal coating layer can also be smoothed by forming the metal coating layer thick and performing machining such as polishing. However, since the metal coating layer may be thin as will be described later, performing the above polishing causes a decrease in yield and an increase in polishing cost.
また、本発明複合部材(基板)は、上述のように表面欠陥が少ないことで変形が少なく、寸法精度にも優れる。例えば、本発明複合部材(基板)は、上述した中心領域の断面において、当該複合部材の最大厚さと最小厚さとの差が0.2mm以下、特に、0.05mm(50μm)以下を満たすことができる。基板の表面に金属被覆層を具える場合も上述のように表面欠陥が少ないため、上記差が0.2mm以下、特に、0.05mm(50μm)以下を満たすことができる。 In addition, the composite member (substrate) of the present invention has less surface defects as described above, so that deformation is small and dimensional accuracy is excellent. For example, the composite member (substrate) of the present invention can satisfy a difference between the maximum thickness and the minimum thickness of the composite member of 0.2 mm or less, particularly 0.05 mm (50 μm) or less in the cross section of the central region described above. Even when a metal coating layer is provided on the surface of the substrate, since the surface defects are small as described above, the difference can satisfy 0.2 mm or less, particularly 0.05 mm (50 μm) or less.
<熱特性>
非金属無機材料の含有量や非金属無機材料の存在形態、金属成分の組成などにもよるが、本発明複合部材(基板)は、熱特性にも優れる。具体的には、例えば、熱伝導率κが180W/m・K以上、特に200W/m・K以上、更に250W/m・K以上、とりわけ300W/m・K以上を満たすような高い熱伝導性を有することができる。また、熱膨張係数が3.5ppm/K(3.5×10-6/K)以上20ppm/K(20×10-6/K)以下、特に、4.0ppm/K(4.0×10-6/K)以上12ppm/K(12×10-6/K)以下を満たすような熱膨張係数が比較的小さい基板とすることができる。SiCといった熱伝導性に優れる非金属無機材料の含有量が多いほど、熱伝導率κが大きく、熱膨張係数αが小さい複合部材(基板)となる傾向にある。
<Thermal characteristics>
Although it depends on the content of the nonmetallic inorganic material, the presence form of the nonmetallic inorganic material, the composition of the metal component, etc., the composite member (substrate) of the present invention is also excellent in thermal characteristics. Specifically, for example, high thermal conductivity such that the thermal conductivity κ satisfies 180 W / m · K or more, particularly 200 W / m · K or more, 250 W / m · K or more, especially 300 W / m · K or more. Can have. The coefficient of thermal expansion is 3.5ppm / K (3.5 × 10-6 / K) or more and 20ppm / K (20 × 10-6 / K) or less, especially 4.0ppm / K (4.0 × 10-6 / K) or more. A substrate having a relatively small thermal expansion coefficient satisfying 12 ppm / K (12 × 10 −6 / K) or less can be obtained. As the content of non-metallic inorganic material having excellent thermal conductivity such as SiC increases, the composite material (substrate) tends to have a higher thermal conductivity κ and a smaller thermal expansion coefficient α.
<金属被覆層>
《組成、組織》
放熱部材と半導体素子や半導体素子を冷却するための冷却装置とを半田により接合することがある。上記複合材料からなる基板は、半田との濡れ性が良くなく、Niなどのめっきを施して半田との濡れ性を向上する必要がある。上記めっきは、生産性を考慮すると電気めっきが好ましいが、非金属無機材料は電気絶縁性が高いものが多いため、電気めっきを行うことが難しい。そこで、上記基板の少なくとも一面に金属被覆層を具え、この金属被覆層を上記電気めっきの下地として利用することで、上記基板にNiなどの電気めっきを容易に施すことができる。また、上記基板は、上述のように表面が平滑であるため、金属被覆層が薄い場合でも金属被覆層の表面をも平滑にすることができる。その結果、上記めっきを均一的な厚さに形成することができる。
<Metal coating layer>
<Composition, organization>
The heat radiating member and the semiconductor element or a cooling device for cooling the semiconductor element may be joined by solder. The substrate made of the above composite material does not have good wettability with solder, and it is necessary to improve the wettability with solder by plating with Ni or the like. The plating is preferably electroplating in consideration of productivity, but it is difficult to perform electroplating because many nonmetallic inorganic materials have high electrical insulation. Therefore, by providing a metal coating layer on at least one surface of the substrate and using the metal coating layer as a base for the electroplating, the substrate can be easily electroplated with Ni or the like. In addition, since the surface of the substrate is smooth as described above, the surface of the metal coating layer can be smooth even when the metal coating layer is thin. As a result, the plating can be formed to a uniform thickness.
金属被覆層の構成金属は、電気めっきに必要な導通が取れる程度の導電率を有する金属であればよく、上記複合材料からなる基板の金属成分と異なる組成でも、同一組成でもよい。特に、同一組成とする場合、溶融Mgにより金属被覆層を形成すると共に複合化を行うと、金属被覆層を有する複合部材を生産性よく製造することができる。この場合、得られた複合部材において、上記基板中の金属成分と上記金属被覆層を構成する金属とは、連続する組織(鋳造組織)を有する。 The constituent metal of the metal coating layer may be a metal having an electrical conductivity sufficient to provide electrical conduction necessary for electroplating, and may have a composition different from or the same as the metal component of the substrate made of the composite material. In particular, in the case of the same composition, when a metal coating layer is formed with molten Mg and combined, a composite member having the metal coating layer can be produced with high productivity. In this case, in the obtained composite member, the metal component in the substrate and the metal constituting the metal coating layer have a continuous structure (cast structure).
上記基板の金属成分と上記金属被覆層の構成金属とが異なる組成である場合、金属被覆層の構成金属は、例えば、上記基板の金属成分と異なる組成のMg合金や、Mg及びMg合金以外の金属、例えば、純度が99%以上のAl,Cu,Ni、及びAl,Cu,Niを主成分とする合金(Al,Cu,Niを50質量%超含有する合金)からなる群から選択される1種の金属が挙げられる。 When the metal component of the substrate and the constituent metal of the metal coating layer have different compositions, the constituent metal of the metal coating layer is, for example, an Mg alloy having a composition different from the metal component of the substrate, or other than Mg and Mg alloy Selected from the group consisting of metals, for example, Al, Cu, Ni with a purity of 99% or more and alloys containing Al, Cu, Ni as the main component (alloys containing more than 50% by mass of Al, Cu, Ni) One kind of metal is mentioned.
《形成箇所》
上記金属被覆層は、上記基板を構成する面のうち、少なくともめっきが必要とされる面に存在していればよい。具体的には、半導体素子が実装される実装面、この実装面と対向し、冷却装置に接触する冷却面の少なくとも一方に金属被覆層を具える。上記基板の端面(上記実装面及び冷却面を連結する面)を含む全面に金属被覆層を具えていてもよい。金属被覆層を具える複合部材は、電気めっきを施せることに加えて、耐食性を高めたり、表面が平滑で外観に優れることから複合部材の商品価値を高めたりすることができる。
<Formation point>
The said metal coating layer should just exist in the surface where plating is required among the surfaces which comprise the said board | substrate. Specifically, a metal coating layer is provided on at least one of the mounting surface on which the semiconductor element is mounted and the cooling surface that faces the mounting surface and contacts the cooling device. A metal coating layer may be provided on the entire surface including the end surface of the substrate (the surface connecting the mounting surface and the cooling surface). In addition to being able to perform electroplating, the composite member provided with the metal coating layer can enhance corrosion resistance and can increase the commercial value of the composite member because of its smooth surface and excellent appearance.
《厚さ》
上記各金属被覆層の厚さは、厚過ぎると特に熱膨張係数が大きくなるため、2.5mm以下、特に1mm以下、更に0.5mm以下が好ましく、1μm以上、特に50μm以上500μm(0.5mm)以下であれば、めっきの下地としての機能を十分に果たす上に、複合部材の搬送時や実装時などで金属被覆層を破損し難いと考えられる。上述のように生産性を考慮すると、研磨などを行うことなく薄い金属被覆層を形成することが好ましい。また、上述のように特定の一方向の冷却を行う本発明製造方法を利用することで、薄くても、表面性状に優れる金属被覆層を形成することができる。
"thickness"
When the thickness of each metal coating layer is too thick, the coefficient of thermal expansion is particularly large, so 2.5 mm or less, particularly 1 mm or less, more preferably 0.5 mm or less, 1 μm or more, particularly 50 μm or more and 500 μm (0.5 mm) or less. If present, it is considered that the metal coating layer is sufficiently damaged while the composite member is sufficiently transported and mounted. In view of productivity as described above, it is preferable to form a thin metal coating layer without performing polishing or the like. Moreover, even if it is thin, the metal coating layer which is excellent in surface property can be formed by utilizing this invention manufacturing method which performs cooling of one specific direction as mentioned above.
特に、上記基板における非金属複合材料の含有量が70体積%超である場合や、50体積%以上であり、かつネットワーク部を有する場合では、基板の厚さが10mm以下程度であれば、基板単体の熱膨張係数を4ppm/K〜6ppm/K程度にすることができる。このような熱膨張係数が小さい基板に対しては、上記各金属被覆層を1mm程度(合計厚さ2mm程度)に厚く形成しても、当該基板と金属被覆層とを含めた複合部材全体の熱膨張係数を8ppm/K以下にすることができる。 In particular, when the content of the nonmetallic composite material in the substrate is more than 70% by volume, or when it is 50% by volume or more and has a network portion, the substrate has a thickness of about 10 mm or less. The thermal expansion coefficient of a single substance can be set to about 4 ppm / K to 6 ppm / K. For a substrate having such a small coefficient of thermal expansion, even if each of the metal coating layers is formed to a thickness of about 1 mm (total thickness of about 2 mm), the entire composite member including the substrate and the metal coating layer is formed. The thermal expansion coefficient can be 8 ppm / K or less.
<用途>
上記複合部材は、放熱部材に好適に利用することができる。この放熱部材は、半導体素子の放熱部材に好適に利用することができる。特に、この放熱部材は、局所的に欠陥が存在しておらず、大きな内部欠陥が少ない上に、表面欠陥も少なく表面性状にも優れる。従って、上記放熱部材は、高品位であり商品価値が高いと期待される。また、この放熱部材は、上述のように欠陥が少ないことで強度といった機械的強度や熱特性にも優れる上に大型であるため、多くの半導体素子やその周辺部品を搭載することができる。このような放熱部材と、この放熱部材に搭載される半導体素子とを具える半導体装置は、各種の電子機器の部品に好適に利用することができる。
<Application>
The said composite member can be utilized suitably for a heat radiating member. This heat radiating member can be suitably used for a heat radiating member of a semiconductor element. In particular, this heat radiating member has no local defects, has few large internal defects, and has few surface defects and excellent surface properties. Therefore, the heat radiating member is expected to have high quality and high commercial value. Moreover, since this heat radiating member is large in size as well as having excellent mechanical strength such as strength and thermal characteristics due to the small number of defects as described above, many semiconductor elements and their peripheral components can be mounted. A semiconductor device including such a heat radiating member and a semiconductor element mounted on the heat radiating member can be suitably used for parts of various electronic devices.
[製造方法]
上記複合部材は、基本的には、鋳型に非金属無機材料の集合体を配置し、この集合体に溶融したMg又はMg合金(以下、溶融Mgと呼ぶ)を溶浸させて溶浸板を形成し、この溶浸板を特定の一方向の冷却により冷却し、Mg又はMg合金を凝固することで得られる。
[Production method]
The composite member basically includes a nonmetallic inorganic material aggregate disposed in a mold, and molten Mg or an Mg alloy (hereinafter referred to as molten Mg) is infiltrated into the aggregate to form an infiltration plate. It is formed by cooling this infiltrated plate with a specific one-way cooling and solidifying Mg or Mg alloy.
<鋳型>
長方形板といった板状の複合部材を作製するにあたり、複合工程で利用する鋳型は、代表的には、底面部と、底面部から立設される側壁部とを具え、底面部と対向する側が開口した箱状のものが利用できる。長方形板状の複合部材を作製する場合には、鋳型として直方体状の箱体が好適に利用できる。この箱状の鋳型に非金属無機材料の集合体を収納した後、代表的には、鋳型の底面部側が鉛直方向下側、鋳型の開口側が鉛直方向上側となるように鋳型を配置する。そして、例えば、溶融Mgの自重を利用してこの鋳型の開口側(溶融Mgの供給側)から底面部側(上記供給側と反対側)に向かって、当該溶融Mgを流入して上記集合体に溶浸させる。こうすることで、溶融Mgを加圧などしなくても、例えば、大気圧でも簡単に溶浸板を製造することができる。
<Mold>
In producing a plate-shaped composite member such as a rectangular plate, a mold used in the composite process typically includes a bottom surface portion and a side wall portion standing from the bottom surface portion, and the side facing the bottom surface portion is open. A box-shaped one is available. When producing a rectangular plate-shaped composite member, a rectangular parallelepiped box can be suitably used as a mold. After the aggregate of nonmetallic inorganic materials is stored in the box-shaped mold, typically, the mold is arranged so that the bottom surface side of the mold is the lower side in the vertical direction and the opening side of the mold is the upper side in the vertical direction. Then, for example, using the dead weight of molten Mg, the molten Mg flows from the opening side of the mold (the molten Mg supply side) toward the bottom surface side (the side opposite to the supply side), and the aggregate Infiltrate into. By doing so, the infiltrating plate can be easily manufactured, for example, even at atmospheric pressure without pressurizing molten Mg.
或いは、鋳型の底面部側から上方の開口側に向かって溶融Mgを溶浸させることもできる。即ち、鋳型の底面部側を溶融Mgの供給側、鋳型の開口側を上記供給側の反対側とすることができる。例えば、鋳型の底面部に溶融Mgの注湯口を設け、ポンプ、ピストン、毛管現象などを利用して当該注湯口から溶融Mgを押し上げる構成が挙げられる。その他、鋳型と別の容器とを用意し、鋳型の底面部と容器の底面部とをホースなどの連結管で繋ぎ、当該容器に溶融Mgを供給し、当該溶融Mgに加わる圧力を利用して、鋳型の底面部側から溶融Mgを供給するように構成したり、鋳型の開口側から溶融Mgを吸引するように構成することが挙げられる。この鋳型の底面部側から溶融Mgを供給する形態では、鋳型の底面部側から未凝固のMg又はMg合金が供給されることで、体積減少分を補填しながら、複合化が進むと考えられる。また、この形態では、上方側が開口していることで、非金属無機材料中の空気を逃がし易いと期待される。そして、この形態では、鉛直方向上側から鉛直方向下側に向かって一方向に溶浸板を冷却することで、上述した欠陥が少ない複合部材を作製することができる。但し、上記溶融Mgの自重を利用する形態の方が、生産性に優れると考えられる。 Alternatively, molten Mg can be infiltrated from the bottom surface side of the mold toward the upper opening side. That is, the bottom side of the mold can be the molten Mg supply side, and the mold opening side can be the opposite side of the supply side. For example, a molten Mg pouring port is provided on the bottom surface of the mold, and the molten Mg is pushed up from the pouring port using a pump, a piston, a capillary phenomenon, or the like. In addition, prepare a mold and another container, connect the bottom of the mold and the bottom of the container with a connecting tube such as a hose, supply molten Mg to the container, and use the pressure applied to the molten Mg For example, the molten Mg may be supplied from the bottom surface side of the mold, or the molten Mg may be sucked from the opening side of the mold. In this form of supplying molten Mg from the bottom surface side of the mold, it is considered that unsolidified Mg or Mg alloy is supplied from the bottom surface side of the mold, so that the composite proceeds while compensating for the volume decrease. . Moreover, with this form, since the upper side is opening, it is anticipated that the air in a nonmetallic inorganic material will be easy to escape. And in this form, the composite member with few defects mentioned above can be produced by cooling an infiltration board to one direction toward the vertical direction lower side from the perpendicular direction upper side. However, the form using the dead weight of the molten Mg is considered to be superior in productivity.
<原料>
上記鋳型に配置する非金属無機材料の集合体は、粒子状や繊維状の粉末や成形体を利用することができる。原料に粉末を用いると、流動性に優れるため、鋳型や成形型に充填し易く、複雑な形状の鋳型にも充填できる。粉末の平均粒径(繊維状の場合、平均短径)は、1μm以上3000μm以下、特に、10μm以上200μm以下であると、鋳型などへの充填を行い易く、充填率を高め易い。平均粒径が異なる複数種の粉末を組み合わせて用いると、充填率を更に高め易い。粉末を利用する場合、例えば、タッピングする(振動を与える)ことで鋳型に充填して、集合体を形成する。
<Raw material>
As the aggregate of non-metallic inorganic materials arranged in the mold, particulate or fibrous powder or a molded body can be used. When powder is used as a raw material, since it is excellent in fluidity, it can be easily filled into a mold or a mold and can be filled into a mold having a complicated shape. When the average particle diameter of the powder (in the case of a fiber, the average short diameter) is 1 μm or more and 3000 μm or less, particularly 10 μm or more and 200 μm or less, it is easy to fill a mold or the like, and the filling rate is easy to increase. When a plurality of types of powders having different average particle diameters are used in combination, the filling rate can be further increased. When using powder, for example, the mold is filled by tapping (giving vibration) to form an aggregate.
一方、成形体は、上記粉末を加圧又は無加圧で固めた粉末成形体や、この粉末成形体を焼結した焼結体、その他市販の焼結体が利用できる。焼結条件を適宜調整することで、ネットワーク部を有する複合部材を製造することができる。成形体を利用すると、(1)粉末を利用した場合よりも非金属無機材料の含有量が70体積%を超えるような複合部材(基板)を得易い、(2)ハンドリング可能な程度の強度を有するため、鋳型に容易に配置することができる、(3)ネットワーク部を有する場合、開気孔にMg又はMg合金が充填されることで、熱伝導性が高く、熱膨張係数が低い複合部材(基板)を得易い、といった効果が得られる。 On the other hand, as the compact, a powder compact obtained by solidifying the above powder with pressure or no pressure, a sintered compact obtained by sintering the powder compact, and other commercially available sintered compacts can be used. A composite member having a network portion can be manufactured by appropriately adjusting the sintering conditions. When using a molded body, (1) it is easier to obtain a composite member (substrate) in which the content of non-metallic inorganic material exceeds 70% by volume than when powder is used, and (2) strength that can be handled. (3) In the case of having a network part, the open pores are filled with Mg or Mg alloy so that the thermal conductivity is high and the thermal expansion coefficient is low. The effect that it is easy to obtain a substrate) is obtained.
上記粉末成形体は、例えば、スリップキャスト、加圧成形、及びドクターブレード法などにより形成することができる。スリップキャストでは、上述した原料の粉末と、水及び分散剤とを用いてスラリーを作製し、このスラリーを成形後、乾燥させることで粉末成形体を形成することができる。分散剤には、一般的な界面活性剤が利用できる。加圧成形には、乾式プレス、湿式プレス、一軸加圧成形、CIP(静水圧プレス)、押出成形が挙げられる。乾式プレス成形の場合、上述した原料の粉末を加圧成形することで、湿式プレス成形の場合、原料の粉末と水などの液体とを混合した混合粉末を加圧成形して液体を押し出すことで、粉末成形体を形成することができる。加圧成形時の圧力(成形圧)は、適宜選択するとよい。ドクターブレード法では、上述した原料の粉末と、溶媒、消泡剤、樹脂などを用いてスラリーを作製し、このスラリーをドクターブレードの受け口に流し込み、シート状体を形成後、溶媒を蒸発させることで粉末成形体を形成することができる。 The powder compact can be formed by, for example, slip casting, pressure molding, doctor blade method, and the like. In slip casting, a slurry can be formed by using the above-described raw material powder, water, and a dispersant, and the slurry can be molded and then dried to form a powder compact. A general surfactant can be used as the dispersant. Examples of pressure molding include dry press, wet press, uniaxial pressure molding, CIP (hydrostatic press), and extrusion molding. In the case of dry press molding, the above-mentioned raw material powder is pressure-molded. In the case of wet press molding, a mixed powder obtained by mixing the raw material powder and a liquid such as water is pressure-molded to extrude the liquid. A powder molded body can be formed. The pressure during molding (molding pressure) may be appropriately selected. In the doctor blade method, a slurry is prepared using the above-mentioned raw material powder and a solvent, an antifoaming agent, a resin, etc., and this slurry is poured into a receptacle of a doctor blade to form a sheet-like body and then evaporate the solvent. A powder compact can be formed.
スリップキャストでは、複雑な形状の成形体を容易に成形することができる、微細な粉末を使用した場合であっても充填率(密度)が高い成形体が得られる、大型な成形体であっても容易に成形することができ、設備コストの増大が少ない、といった利点を有する。プレス成形では、粉末の粒度を均一的にし易い、スリップキャストと比較して工程数が少なく生産性に優れる、といった利点を有する。ドクターブレード法は、板状の成形体を形成する場合に好適に利用することができる。 Slip casting is a large molded body that can easily form a molded body with a complicated shape, and can obtain a molded body with a high filling rate (density) even when fine powder is used. Can be easily molded, and there is an advantage that there is little increase in equipment cost. In press molding, there are advantages that it is easy to make the particle size of the powder uniform, and that the number of steps is small and the productivity is excellent compared to slip casting. The doctor blade method can be suitably used when forming a plate-shaped molded body.
上記粉末成形体を焼結する場合、焼結条件は、非金属無機材料の組成に応じて適宜選択することができる。例えば、SiCの場合、焼結条件は、(1)真空雰囲気、加熱温度:800〜1300℃未満、保持時間:2時間程度、或いは(2)大気雰囲気、加熱温度:800〜1500℃、保持時間:2時間程度、或いは(3)真空雰囲気、加熱温度:1300℃以上2500℃以下、保持時間:2時間程度が挙げられる。焼結を行うことで、上述のように粉末成形体よりも強度が高く扱い易い上に、多孔質体を容易に作製できる。また、焼結温度や保持時間を調節することで、焼結体を緻密化させてSiCなどの非金属無機材料の充填率を向上させることができ、非金属無機材料の含有量が70体積%以上である複合部材を得易い。更に、焼結を行うことで、焼結時の加熱により、粉末成形体の作製に用いたバインダなどを蒸発させて除去することができる。但し、上記(1),(2)の条件では、ネットワーク部を有していない分散形態の複合部材が得られる傾向にある。これに対し、上記(3)の条件で焼結すると、SiC同士を直接結合させることができる。即ち、ネットワーク部をSiCにより形成することができる。SiC同士を直接結合させることで、焼結体の強度がより高くなる上に、この焼結体を用いると、上記ネットワーク部を具えることで、熱膨張係数が小さく、熱伝導率が高い複合部材が得られ易い。 When the powder compact is sintered, the sintering conditions can be appropriately selected according to the composition of the nonmetallic inorganic material. For example, in the case of SiC, the sintering conditions are (1) vacuum atmosphere, heating temperature: less than 800-1300 ° C, holding time: about 2 hours, or (2) air atmosphere, heating temperature: 800-1500 ° C, holding time : About 2 hours, or (3) vacuum atmosphere, heating temperature: 1300 ° C to 2500 ° C, holding time: about 2 hours. By performing the sintering, the strength is higher than that of the powder compact and easy to handle as described above, and a porous body can be easily produced. In addition, by adjusting the sintering temperature and holding time, the sintered body can be densified and the filling rate of non-metallic inorganic materials such as SiC can be improved, and the content of non-metallic inorganic materials is 70% by volume. It is easy to obtain the composite member as described above. Furthermore, by performing the sintering, it is possible to evaporate and remove the binder or the like used for the production of the powder compact by heating during the sintering. However, under the conditions (1) and (2), there is a tendency to obtain a composite member in a distributed form that does not have a network part. On the other hand, when sintering is performed under the condition (3), SiC can be directly bonded to each other. That is, the network part can be formed of SiC. By directly bonding SiC together, the strength of the sintered body becomes higher, and when this sintered body is used, the above-mentioned network part provides a composite with a low thermal expansion coefficient and high thermal conductivity. A member is easily obtained.
その他、Siなどの元素を含有させた粉末成形体を形成し、窒素雰囲気下で焼結することで、新たな非金属無機材料(例えば、Si3N4)を生成し、この新生物によりネットワーク部を形成したり、組成が異なる複数種の粉末を用いて粉末成形体を形成し、一部の粉末と溶融Mgとの反応により新たな非金属無機材料を生成し、この新生物によりネットワーク部を形成したり、粉末成形体に非金属無機材料の前駆体(例えば、ポリカルボシラン)の溶液を含浸させて加熱することで前駆体に基づく非金属無機材料を生成し、この生成物によりネットワーク部を形成したりしてもよい。これらのネットワーク部を有する成形体を利用した場合も、ネットワーク部を有する複合部材が得られる。 In addition, by forming a powder compact containing elements such as Si and sintering in a nitrogen atmosphere, a new non-metallic inorganic material (for example, Si 3 N 4 ) is generated, and this neoplasm forms a network. Forming a powder molded body using a plurality of types of powders having different compositions and forming a non-metallic inorganic material by reaction of some powders with molten Mg. Or a powder molded body impregnated with a solution of a precursor of a non-metallic inorganic material (e.g., polycarbosilane) and heated to produce a precursor-based non-metallic inorganic material, and this product produces a network. A part may be formed. Even when a molded body having these network parts is used, a composite member having a network part can be obtained.
特に、非金属無機材料の含有量が70体積%超の複合部材(基板)を作製する場合、開気孔を有すると共に、閉気孔が少ない、具体的には非金属無機材料の全体積に対して10体積%以下、好ましくは3体積%以下である多孔質体を形成することが好ましい。このような多孔質体は、溶融Mgが含浸するための経路を十分に有することができ、非金属無機材料間の隙間が非常に小さくても毛管現象により溶融Mgが溶浸することができる。従って、上記開気孔に溶融Mgが十分に充填され、気孔が少ない複合部材を得易い。 In particular, when producing a composite member (substrate) having a non-metallic inorganic material content of more than 70% by volume, it has open pores and few closed pores, specifically with respect to the total volume of the non-metallic inorganic material. It is preferable to form a porous body of 10% by volume or less, preferably 3% by volume or less. Such a porous body can sufficiently have a path for impregnating with molten Mg, and molten Mg can be infiltrated by capillary action even if the gap between the nonmetallic inorganic materials is very small. Therefore, it is easy to obtain a composite member in which the open pores are sufficiently filled with molten Mg and the pores are few.
〈酸化膜の形成〉
非金属無機材料としてSiCを利用する場合、溶融Mgに供するSiC集合体として、その表面に酸化膜を具えるものを利用すると、当該集合体と溶融Mgとの濡れ性が高められて好ましい。酸化膜を具えるSiC集合体とすることで、特に、SiCの含有量が多く、SiC間の隙間が非常に小さい場合であっても、毛管現象により溶融Mgが浸透し易い。ネットワーク部を有する複合部材を得る場合、焼結体などのSiC集合体を作製した後に酸化膜を形成する酸化工程を具えることが好ましく、ネットワーク部を有しない複合部材を得る場合、代表的にはSiCの粉末成形体を溶融Mgに供する場合、SiC粉末といった原料粉末に酸化膜を形成しておき、酸化膜を具える粉末を利用してSiC集合体(粉末成形体)を形成するとよい。
<Oxide film formation>
When SiC is used as the non-metallic inorganic material, it is preferable to use a SiC aggregate provided with molten Mg having an oxide film on the surface because wettability between the aggregate and molten Mg is enhanced. By making the SiC aggregate including an oxide film, molten Mg easily penetrates due to capillary action even when the content of SiC is large and the gap between SiC is very small. When obtaining a composite member having a network part, it is preferable to include an oxidation step of forming an oxide film after producing a SiC aggregate such as a sintered body. Typically, when obtaining a composite member having no network part, When the SiC powder compact is subjected to molten Mg, an oxide film is formed on a raw material powder such as SiC powder, and a SiC aggregate (powder compact) is preferably formed using powder containing the oxide film.
上記酸化膜を形成するため条件は、SiC粉末の場合も焼結体などの場合も同様であり、加熱温度は、700℃以上、特に750℃以上、更に800℃以上が好ましく、とりわけ850℃以上、更に875℃以上1000℃以下が好ましい。また、上記原料のSiCに対する質量割合が0.4%以上1.5%以下(酸化膜の厚さ:50nm〜300nm程度)、特に1.0%以下を満たすように酸化膜を形成することが好ましい。酸化膜を形成した場合、複合部材中のSiCの近傍(SiC集合体の輪郭線から100〜300nm以内の領域)は、当該近傍以外の箇所よりも酸素濃度が高い傾向にある。 The conditions for forming the oxide film are the same for both SiC powder and sintered body, and the heating temperature is preferably 700 ° C or higher, particularly 750 ° C or higher, more preferably 800 ° C or higher, especially 850 ° C or higher. Further, 875 ° C. or higher and 1000 ° C. or lower is preferable. Further, it is preferable to form the oxide film so that the mass ratio of the raw material to SiC is 0.4% or more and 1.5% or less (the thickness of the oxide film: about 50 nm to 300 nm), particularly 1.0% or less. When an oxide film is formed, the oxygen concentration tends to be higher in the vicinity of SiC in the composite member (region within 100 to 300 nm from the outline of the SiC aggregate) than in locations other than the vicinity.
<複合化>
上記鋳型に配置した非金属無機材料の集合体に溶融Mgを溶浸させる複合工程は、大気圧(概ね0.1MPa(1atm))以下の雰囲気で行うと、雰囲気中のガスを取り込み難く、ガスの取り込みに伴う気孔が生じ難い。但し、Mgは蒸気圧が高いため、高真空状態とすると溶融Mgを取り扱い難くなる。従って、上記複合工程の雰囲気圧力を大気圧未満とする場合、0.1×10-5MPa以上が好ましい。また、上記複合工程は、Arといった不活性雰囲気で行うと、特にMg成分と雰囲気ガスとの反応を防止でき、反応生成物の存在に伴う熱特性の劣化を抑制できる。溶浸温度は、650℃以上が好ましく、溶浸温度が高いほど濡れ性が高まるため、700℃以上、特に750℃以上が好ましい。但し、1000℃超とすると、引け巣やガスホールといった欠陥が生じたり、Mgが沸騰する恐れがあるため、溶浸温度は1000℃以下が好ましい。特に、過剰な酸化膜の生成や晶出物の生成を抑制するために900℃以下が好ましい。
<Composite>
When the composite process of infiltrating molten Mg into the aggregate of nonmetallic inorganic materials arranged in the mold is performed in an atmosphere at atmospheric pressure (approximately 0.1 MPa (1 atm)) or less, it is difficult to take in the gas in the atmosphere, Stomach due to uptake is unlikely to occur. However, since Mg has a high vapor pressure, it becomes difficult to handle molten Mg in a high vacuum state. Therefore, 0.1 × 10 −5 MPa or more is preferable when the atmospheric pressure in the composite process is less than atmospheric pressure. Further, when the composite process is performed in an inert atmosphere such as Ar, the reaction between the Mg component and the atmospheric gas can be prevented, and the deterioration of the thermal characteristics due to the presence of the reaction product can be suppressed. The infiltration temperature is preferably 650 ° C. or higher. Since the wettability increases as the infiltration temperature increases, 700 ° C. or higher, particularly 750 ° C. or higher is preferable. However, if the temperature exceeds 1000 ° C., defects such as shrinkage cavities and gas holes may occur, and Mg may boil. Therefore, the infiltration temperature is preferably 1000 ° C. or less. In particular, 900 ° C. or lower is preferable in order to suppress the formation of an excessive oxide film and the formation of crystallized substances.
<冷却>
本発明製造方法の最も特徴とするところは、上記溶浸板を当該溶浸板における溶融Mgの供給側の反対側から一方向に上記溶浸板を冷却する点にある。例えば、溶融Mgの供給側を鉛直方向上側、供給側の反対側を鉛直方向下側とする場合、即ち重力方向に溶融Mgを供給する場合、鉛直方向下側から鉛直方向上側に向かって一方向に溶浸板を冷却する。或いは、溶融Mgの供給側を鉛直方向下側、供給側の反対側を鉛直方向上側とする場合、即ち、重力方向と反対方向に溶融Mgを供給する場合、鉛直方向上側から鉛直方向下側に向かって、即ち重力方向に沿って一方向に冷却する。より具体的には、例えば、長方形板状の複合部材を製造する場合、溶浸板の長手方向の一端側を鉛直方向下側とし、他端側を鉛直方向上側として、長手方向の一端側から他端側に向かって(或いは他端側から一端側に向かって)冷却する。このように溶浸板を一方向に冷却するには、例えば、上記溶浸板における溶融Mgの供給側の反対側(以下、冷却開始側と呼ぶ)を強制冷却することが挙げられる。強制冷却は、液体冷媒を利用した液冷や、強制送風を行う空冷などが挙げられる。液体冷媒などの冷媒を用いる場合、冷却開始側に配置された鋳型の底面部(或いは、鋳型の開口部)に当該冷媒を直接接触させてもよいし、冷却開始側に配置された鋳型の底面部(或いは、鋳型の開口部)を当該冷媒に接近させて配置させてもよい。その他、鋳型の底面部といった強制冷却を行う箇所以外の箇所を断熱材で覆ったり、高温領域から低温領域に鋳型を冷却開始側から移動させたりすることが挙げられる。任意の冷却方法を利用することができ、上記各種の冷却方法を組み合わせて利用してもよい。
<Cooling>
The most characteristic feature of the production method of the present invention is that the infiltration plate is cooled in one direction from the side opposite to the molten Mg supply side of the infiltration plate. For example, when the molten Mg supply side is set to the upper side in the vertical direction and the opposite side of the supply side is set to the lower side in the vertical direction, that is, when molten Mg is supplied in the direction of gravity, one direction from the lower side in the vertical direction to the upper side in the vertical direction Cool the infiltration plate. Alternatively, when the molten Mg supply side is set to the lower side in the vertical direction and the opposite side of the supply side is set to the upper side in the vertical direction, that is, when molten Mg is supplied in the direction opposite to the gravity direction, the upper side in the vertical direction is shifted to the lower side in the vertical direction. Cool in one direction, that is, along the direction of gravity. More specifically, for example, when manufacturing a rectangular plate-shaped composite member, one end side in the longitudinal direction of the infiltration plate is set as the lower side in the vertical direction, and the other end side is set as the upper side in the vertical direction. Cool toward the other end side (or from the other end side toward one end side). In order to cool the infiltrating plate in one direction in this way, for example, the side opposite to the molten Mg supply side (hereinafter referred to as the cooling start side) of the infiltrating plate may be forcibly cooled. The forced cooling includes liquid cooling using a liquid refrigerant, air cooling that performs forced air blowing, and the like. When using a coolant such as a liquid coolant, the coolant may be brought into direct contact with the bottom surface of the mold (or the mold opening) disposed on the cooling start side, or the bottom surface of the mold disposed on the cooling start side. The part (or the opening of the mold) may be disposed close to the refrigerant. In addition, a part other than the part where forced cooling is performed, such as the bottom part of the mold, may be covered with a heat insulating material, or the mold may be moved from the high temperature region to the low temperature region from the cooling start side. Any cooling method can be used, and the various cooling methods described above may be used in combination.
《温度勾配》
上記冷却工程において、上記溶浸板の冷却方向に沿った温度勾配(例えば、鉛直方向下側から鉛直方向上側に向かう温度勾配)が以下の特定の範囲になるように当該溶浸板を冷却すると、上記欠陥部の面積比をより低減することができ、欠陥が少ないより高品位な複合部材を得易い。具体的には、先に冷却する一方の側(例えば、鉛直方向下側)と、後に冷却する他方の側(例えば、鉛直方向上側)との間に所定の大きさの温度差を設ける。より具体的には、上記溶浸板の冷却方向に沿って複数の温度測定点をとり、各温度測定点が所定の温度になったとき、当該温度測定点Psに隣り合う一方の温度測定点Puと他方の温度測定点Pdとの温度差ΔTPをとり、この温度差ΔTPを上記二つの温度測定点Pu,Pd間の距離lで除した値:ΔTP/lを当該温度測定点の温度勾配とする。このとき、上記各温度測定点の温度勾配が0.01℃/mm以上となるように上記溶浸板を冷却する。温度勾配を大きくするほど、上記欠陥部の面積比を低減できる傾向にあり、0.1℃/mm以上、特に0.5℃/mm以上がより好ましい。
《Temperature gradient》
In the cooling step, when the infiltration plate is cooled such that the temperature gradient along the cooling direction of the infiltration plate (for example, the temperature gradient from the lower side in the vertical direction toward the upper side in the vertical direction) falls within the following specific range. The area ratio of the defective portion can be further reduced, and a higher-quality composite member with fewer defects can be easily obtained. Specifically, a temperature difference of a predetermined magnitude is provided between one side to be cooled first (for example, the lower side in the vertical direction) and the other side to be cooled later (for example, the upper side in the vertical direction). More specifically, a plurality of temperature measurement points are taken along the cooling direction of the infiltration plate, and when each temperature measurement point reaches a predetermined temperature, one temperature measurement adjacent to the temperature measurement point P s A temperature difference ΔT P between the point P u and the other temperature measurement point P d is taken, and this temperature difference ΔT P is divided by the distance l between the two temperature measurement points P u , P d : ΔT P / l Is the temperature gradient at the temperature measurement point. At this time, the infiltration plate is cooled so that the temperature gradient at each temperature measurement point is 0.01 ° C./mm or more. As the temperature gradient is increased, the area ratio of the defect portion tends to be reduced, and is preferably 0.1 ° C./mm or more, more preferably 0.5 ° C./mm or more.
上記温度測定点は、任意に選択することができるが、上記溶浸板の長手方向に対して、等間隔に複数選択することが好ましい。また、隣り合う温度測定点間の間隔は、近過ぎると温度差を十分に設けることが難しく、広過ぎると温度差が大きくなり過ぎるため、上記溶浸板の長手方向の大きさにもよるが、5〜10mm程度が好ましいと考えられる。 The temperature measurement points can be arbitrarily selected, but it is preferable to select a plurality of temperature measurement points at regular intervals with respect to the longitudinal direction of the infiltration plate. In addition, if the interval between adjacent temperature measurement points is too close, it is difficult to provide a sufficient temperature difference, and if it is too wide, the temperature difference becomes too large, which depends on the size of the infiltration plate in the longitudinal direction. 5 to 10 mm is considered preferable.
《冷却速度》
上記冷却工程において、上記溶浸板の冷却方向に沿って冷却する際の速度(例えば、鉛直方向下側から鉛直方向上側に向かって冷却する際の速度)を以下の特定の範囲になるように冷却すると、上記欠陥部の面積比をより低減することができ、欠陥が少ないより高品位な複合部材を得易い。具体的には、上記溶浸板の冷却方向に沿って複数の温度測定点をとり、各温度測定点が所定の高い温度THから所定の低い温度TLに降下するまでに要した時間tを測定し、上記温度TH,TLの差:TH-TLを上記時間tで除した値:(TH-TL)/tを上記各温度測定点の冷却速度とする。このとき、上記各温度測定点の冷却速度が0.5℃/min以上となるように冷却する。冷却速度を大きくするほど、上記欠陥部の面積比を低減できる傾向にあり、3℃/min以上、特に10℃/min以上、更に50℃/min以上がより好ましい。冷却速度が速いほど、Mg又Mg合金の結晶粒が微細化し、良好な外観の複合部材が得られる。
<Cooling rate>
In the cooling step, the speed at which the infiltration plate is cooled along the cooling direction (for example, the speed at which the cooling is performed from the lower side in the vertical direction toward the upper side in the vertical direction) is set to the following specific range. When cooled, the area ratio of the defective portion can be further reduced, and a higher-quality composite member with fewer defects can be easily obtained. Specifically, a plurality of temperature measurement points are taken along the cooling direction of the infiltration plate, and the time t required for each temperature measurement point to drop from a predetermined high temperature TH to a predetermined low temperature T L And the difference between the temperatures T H and T L : T H −T L divided by the time t is (T H −T L ) / t as the cooling rate at each temperature measurement point. At this time, cooling is performed so that the cooling rate at each temperature measurement point is 0.5 ° C./min or more. As the cooling rate is increased, the area ratio of the defective portion tends to be reduced, and is preferably 3 ° C./min or more, particularly 10 ° C./min or more, and more preferably 50 ° C./min or more. The faster the cooling rate, the finer the crystal grains of Mg or Mg alloy and the better the appearance of the composite member.
上記温度勾配や冷却速度は、上記冷媒の温度や冷媒の量(送風量など)、冷媒と鋳型との間の距離、断熱材の配置状態、鋳型の移動速度などにより変化させることができる。上記温度勾配が一定である場合、上記冷却速度が大きいほど、また、上記冷却速度が一定である場合、上記温度勾配が大きいほど、上記欠陥部の面積比をより低減し易く、変形も少ない。更に、上記冷却速度が大きく、かつ上記温度勾配が大きいと、欠陥が非常に少なく極めて高品位な複合部材を得易い。 The temperature gradient and the cooling rate can be changed by the temperature of the refrigerant, the amount of refrigerant (such as the amount of blown air), the distance between the refrigerant and the mold, the arrangement of the heat insulating material, the moving speed of the mold, and the like. When the temperature gradient is constant, the larger the cooling rate is, and when the cooling rate is constant, the larger the temperature gradient is, the easier it is to reduce the area ratio of the defective portion and the less deformation. Furthermore, if the cooling rate is high and the temperature gradient is large, it is easy to obtain a very high-quality composite member with very few defects.
なお、上記温度勾配や冷却速度を実現するにあたり、溶融したMgやMg合金の温度を熱電対などの温度測定手段で直接測定すると、温度測定手段の損傷が著しい。従って、上記温度勾配や冷却速度を実現可能な鋳型などを用意して、それを利用するとよい。 In realizing the above temperature gradient and cooling rate, if the temperature of molten Mg or Mg alloy is directly measured by a temperature measuring means such as a thermocouple, the temperature measuring means is significantly damaged. Therefore, it is advisable to prepare a mold that can realize the temperature gradient and the cooling rate and use it.
<金属被覆層の形成>
金属被覆層を具える複合部材を製造する場合、種々の方法を利用することができる。例えば、上記基板を形成した後に金属被覆層を別途形成してもよい。この場合、例えば、適宜な金属板を用意し、ロウ付け、超音波接合、鋳ぐるみ、圧延(クラッド圧延)、ホットプレス、酸化物ソルダー法、無機接着剤による接合の少なくとも1つの手法を利用することで、基板の表面に金属被覆層を形成することができる。金属板を利用することで、基板中の金属成分と異なる組成の金属被覆層を容易に形成することができる。
<Formation of metal coating layer>
Various methods can be used when manufacturing a composite member having a metal coating layer. For example, a metal coating layer may be separately formed after the substrate is formed. In this case, for example, an appropriate metal plate is prepared, and at least one method of brazing, ultrasonic bonding, cast-in, rolling (clad rolling), hot press, oxide solder method, bonding with an inorganic adhesive is used. Thus, a metal coating layer can be formed on the surface of the substrate. By using a metal plate, a metal coating layer having a composition different from that of the metal component in the substrate can be easily formed.
或いは、非金属無機材料の集合体と鋳型との間に隙間を設け、上記複合化の際に当該隙間にも溶融Mgが流れ込むようにし、溶浸板の形成と同時に金属被覆層を形成すると、複合部材の生産性に優れる。この場合、上述のように特定の一方向の冷却を行う本発明製造方法では、高品位な基板を形成できることから、その表面に形成する金属被覆層についても表面の引けなどの欠陥を低減することができる。特に、金属被覆層が薄い場合でも、本発明製造方法によれば、表面性状に優れる金属被覆層を形成することができる。この形態では、上記隙間の大きさに応じた厚さの金属被覆層を形成することができる。従って、金属被覆層が所望の厚さになるように上記隙間の大きさを調整するとよい。 Alternatively, a gap is provided between the aggregate of the non-metallic inorganic material and the mold so that the molten Mg flows into the gap during the above-described combination, and when the metal coating layer is formed simultaneously with the formation of the infiltration plate, Excellent composite member productivity. In this case, in the manufacturing method of the present invention in which cooling is performed in a specific direction as described above, a high-quality substrate can be formed, so that defects such as surface scratches can be reduced in the metal coating layer formed on the surface. Can do. In particular, even when the metal coating layer is thin, according to the production method of the present invention, a metal coating layer having excellent surface properties can be formed. In this embodiment, a metal coating layer having a thickness corresponding to the size of the gap can be formed. Therefore, the size of the gap may be adjusted so that the metal coating layer has a desired thickness.
特に、非金属無機材料の成形体を利用する場合、当該成形体は、比較的強度に優れ、鋳型内で自立可能である。そのため、例えば、鋳型の内部空間よりも小さい成形体を形成して鋳型に収納することで、上記隙間を簡単に設けられる。上記隙間を確実に維持できるようにスペーサを配置してもよい。スペーサの構成材料は、ナフタレンなどのように昇華により除去できるものや、カーボン、鉄、ステンレス鋼(SUS430)といった耐熱性に優れるものが利用できる。後者の場合、スペーサを金属被覆層に埋設させたままにしてもよいし、スペーサ部分を切削などにより除去してもよい。スペーサの形態は、板状体や線状体(ワイヤ)が挙げられる。例えば、形成する金属被覆層よりも若干細径の線状体を用意し、この線状体により成形体を鋳型に固定するなどして、成形体と鋳型との間に隙間を設けてもよい。この場合、線状体の大部分が金属被覆層に埋設されるため、線状体を残存させていても、良好な外観の複合部材が得られる。 In particular, when a molded body of a nonmetallic inorganic material is used, the molded body is relatively excellent in strength and can be self-supporting in a mold. Therefore, for example, the gap is easily provided by forming a molded body smaller than the inner space of the mold and storing it in the mold. Spacers may be arranged so as to reliably maintain the gap. As the constituent material of the spacer, a material that can be removed by sublimation such as naphthalene, or a material having excellent heat resistance such as carbon, iron, and stainless steel (SUS430) can be used. In the latter case, the spacer may be left embedded in the metal coating layer, or the spacer portion may be removed by cutting or the like. Examples of the form of the spacer include a plate-like body and a linear body (wire). For example, a gap may be provided between the molded body and the mold by preparing a linear body having a slightly smaller diameter than the metal coating layer to be formed and fixing the molded body to the mold with the linear body. . In this case, since most of the linear body is embedded in the metal coating layer, a composite member having a good appearance can be obtained even if the linear body remains.
本発明複合部材の製造方法は、大型であっても高品位な複合部材を製造することができる。本発明複合部材は、大型でありながら、欠陥が集中的に存在しておらず高品位である。本発明放熱部材は、上記本発明複合部材から構成されることで、熱特性に優れる。本発明半導体装置は、上記放熱部材を具えることで熱特性に優れる。 The manufacturing method of the composite member of the present invention can manufacture a high-quality composite member even if it is large. Although the composite member of the present invention is large, defects are not concentrated and high quality. The heat radiating member of the present invention is excellent in thermal characteristics by being composed of the above-described composite member of the present invention. The semiconductor device of the present invention has excellent thermal characteristics by including the heat dissipation member.
(実施形態1)
純マグネシウムとSiCとを複合した複合部材(基板)を種々の条件で作製し、得られた複合部材の欠陥の状態、熱特性を調べた。
(Embodiment 1)
Composite members (substrates) composed of pure magnesium and SiC were produced under various conditions, and the defect state and thermal characteristics of the obtained composite members were investigated.
原料として、99.8質量%以上のMg及び不純物からなる純マグネシウムのインゴット、及び市販のSiC焼結体(相対密度80%、長さ(長辺)200mm×幅(短辺)100mm×厚さ5mm)を用意した。 Pure magnesium ingot composed of Mg and impurities of 99.8% by mass or more as raw materials, and commercially available SiC sintered body (relative density 80%, length (long side) 200 mm x width (short side) 100 mm x thickness 5 mm) Prepared.
用意したSiC焼結体に875℃×2時間の酸化処理を施して酸化膜を形成し、溶融した純マグネシウムとの濡れ性を高めた。上記酸化処理の工程は、省略してもよい。 The prepared SiC sintered body was oxidized at 875 ° C. for 2 hours to form an oxide film, and the wettability with molten pure magnesium was improved. The oxidation treatment step may be omitted.
上記SiC焼結体を図1に示す鋳型10に収納して、溶融した純マグネシウムを焼結体20に溶浸させて溶浸板を作製した。なお、以下の図において同一符号は、同一名称物を示す。 The SiC sintered body was accommodated in the mold 10 shown in FIG. 1, and molten pure magnesium was infiltrated into the sintered body 20 to produce an infiltration plate. In addition, the same code | symbol shows the same name thing in the following figures.
上記鋳型10は、一方が開口した縦長の直方体状の箱体であり、図1に示すように本体部11と蓋部12とを具える。本体部11は、長方形状の底面部10bと、底面部10bから立設する一対の長方形状の端面壁部10eと、底面部10bから立設すると共に一対の端面壁部10eに連結する側壁部10sとを具える。側壁部10sは、図1に示すように縦長の長方形状である。蓋部12は、側壁部10sと等しい縦長の長方形状の板体であり、側壁部10sと対向するように配置されて、底面部10b及び一対の端面壁部10eにボルト(図示せず)で固定される。本体部11に蓋部12が装着されることで、底面部10bに対向する側が開口した縦長の鋳型10が構成される。ここでは、鋳型10は、カーボン製とした。この鋳型10の内部空間が焼結体20の収納空間として利用される。ここでは、鋳型10の内部空間は、上記焼結体に応じた大きさとし、焼結体20を鋳型10に収納したとき、焼結体20と鋳型10との間に実質的に隙間が設けられないようにした。焼結体20を本体部11に配置してから蓋部12を取り付けてもよいし、鋳型10を組み立ててから焼結体20を配置してもよい。なお、分割片を組み合わせた構成とせず、一体成形された鋳型を利用してもよい。 The mold 10 is a vertically long rectangular parallelepiped box that is open on one side, and includes a main body 11 and a lid 12 as shown in FIG. The main body 11 includes a rectangular bottom surface portion 10b, a pair of rectangular end surface wall portions 10e standing from the bottom surface portion 10b, and side wall portions standing from the bottom surface portion 10b and connected to the pair of end surface wall portions 10e. With 10s. The side wall portion 10s has a vertically long rectangular shape as shown in FIG. The lid portion 12 is a vertically long rectangular plate that is equal to the side wall portion 10s, is disposed so as to face the side wall portion 10s, and is bolted (not shown) to the bottom surface portion 10b and the pair of end surface wall portions 10e. Fixed. By attaching the lid 12 to the main body 11, a vertically long mold 10 having an open side facing the bottom surface 10b is configured. Here, the mold 10 was made of carbon. The internal space of the mold 10 is used as a storage space for the sintered body 20. Here, the internal space of the mold 10 is sized according to the sintered body, and when the sintered body 20 is housed in the mold 10, a substantial gap is provided between the sintered body 20 and the mold 10. I tried not to. The lid 12 may be attached after the sintered body 20 is disposed on the main body 11, or the sintered body 20 may be disposed after the mold 10 is assembled. In addition, you may utilize the casting_mold | template integrally formed without setting it as the structure which combined the division | segmentation piece.
また、ここでは、鋳型10の内周面において焼結体と接触する箇所には、市販の離型剤を塗布してから焼結体20を鋳型10に収納した。離型剤を塗布することで、複合部材を取り出し易くすることができる。この離型剤の塗布工程は、省略してもよい。 Further, here, a commercially available mold release agent was applied to a portion of the inner peripheral surface of the mold 10 that contacts the sintered body, and then the sintered body 20 was accommodated in the mold 10. By applying the release agent, the composite member can be easily taken out. This step of applying the release agent may be omitted.
上記鋳型10は、開口部の周縁に連結されるインゴット載置部(図示せず)を有する。上記インゴット載置部に用意した上記インゴットを配置し、この鋳型10を所定の温度に加熱することで当該インゴットを溶融する。鋳型10の加熱は、図3に示す雰囲気炉30を利用して行う。雰囲気炉30は、密閉可能な容器31と、容器31の内周面に配置される断熱材32と、断熱材32で囲まれる空間内に配置されるヒータ33とを具える。容器31は底面部と、底面部から立設される側壁部と、底面部に対向配置され、側壁部に連結される上面部とを具える。断熱材32は、上記容器31の底面部、側壁部、及び上面部に沿って配置されている。ここでは、雰囲気炉30は、その底面部を鉛直方向下側、上面部を鉛直方向上側になるように配置される。また、ここでは、鋳型10は、上記雰囲気炉30の底面部に、鋳型10の底面部10bが接するように装入する。即ち、鋳型10の底面部10bが鉛直方向下側、鋳型10の開口部が鉛直方向上側となるように鋳型10を装入する。 The mold 10 has an ingot placing part (not shown) connected to the periphery of the opening. The said ingot prepared in the said ingot mounting part is arrange | positioned, and the said ingot is fuse | melted by heating this casting_mold | template 10 to predetermined temperature. The mold 10 is heated using an atmospheric furnace 30 shown in FIG. The atmosphere furnace 30 includes a sealable container 31, a heat insulating material 32 disposed on the inner peripheral surface of the container 31, and a heater 33 disposed in a space surrounded by the heat insulating material 32. The container 31 includes a bottom surface portion, a side wall portion erected from the bottom surface portion, and an upper surface portion that is disposed to face the bottom surface portion and is connected to the side wall portion. The heat insulating material 32 is disposed along the bottom surface, the side wall, and the top surface of the container 31. Here, the atmosphere furnace 30 is disposed so that the bottom surface portion is on the lower side in the vertical direction and the upper surface portion is on the upper side in the vertical direction. Here, the mold 10 is inserted so that the bottom surface portion 10b of the mold 10 is in contact with the bottom surface portion of the atmospheric furnace 30. That is, the mold 10 is loaded so that the bottom surface portion 10b of the mold 10 is on the lower side in the vertical direction and the opening of the mold 10 is on the upper side in the vertical direction.
そして、溶浸温度:775℃、Ar雰囲気、雰囲気圧力:大気圧となるように上記雰囲気炉30を調整した。ヒータ33に加熱されて溶融した純マグネシウムは、その自重により、鋳型10の開口部から鋳型10の内部空間に流入して、当該内部空間に配置された焼結体20に溶浸され、溶浸板が得られる。 The atmosphere furnace 30 was adjusted so that the infiltration temperature was 775 ° C., the Ar atmosphere, and the atmospheric pressure: atmospheric pressure. Pure magnesium that is heated and melted by the heater 33 flows into the internal space of the mold 10 from the opening of the mold 10 due to its own weight, and is infiltrated into the sintered body 20 disposed in the internal space. A board is obtained.
上記溶浸板が配置された鋳型10を以下の冷却方法(1)〜(7)により冷却して純マグネシウムを凝固して、長さ200mm×幅100mm×厚さ5mmの複合部材を得た。また、以下の冷却方法(2)〜(7)において、断熱材の厚さやファンの送風量、水冷銅の温度などを適宜調整することで、後述する温度勾配や冷却速度を変化させた。 The mold 10 on which the infiltration plate was placed was cooled by the following cooling methods (1) to (7) to solidify pure magnesium, thereby obtaining a composite member having a length of 200 mm × width of 100 mm × thickness of 5 mm. Further, in the following cooling methods (2) to (7), the temperature gradient and the cooling rate described later were changed by appropriately adjusting the thickness of the heat insulating material, the blower amount of the fan, the temperature of water-cooled copper, and the like.
(1) 雰囲気炉30のヒータ33の電源を切り、当該炉30内で鋳型10を徐冷する。即ち、図3に示す状態で鋳型10を冷却する。この冷却方法では、鋳型内の溶浸板は、その周縁から中央部分に向かって収束するように冷却される。 (1) The heater 33 of the atmosphere furnace 30 is turned off, and the mold 10 is gradually cooled in the furnace 30. That is, the mold 10 is cooled in the state shown in FIG. In this cooling method, the infiltration plate in the mold is cooled so as to converge from the peripheral edge toward the central portion.
(2) 雰囲気炉30のヒータ33の電源を切った後、当該炉30内の底面部の断熱材32を除去して、鋳型10の底面部10bが当該炉30の容器31に直接接するようにして、当該炉30内で鋳型10を冷却する。 (2) After turning off the heater 33 of the atmospheric furnace 30, the heat insulating material 32 on the bottom surface in the furnace 30 is removed so that the bottom surface 10b of the mold 10 is in direct contact with the container 31 of the furnace 30. Then, the mold 10 is cooled in the furnace 30.
(3) 雰囲気炉30のヒータ33の電源を切った後、当該炉30内の底面部の断熱材32を除去して、当該炉30の外部であって、当該炉30の底面部の近傍にファン(図示せず)を配置し、当該炉30の底面部にファンにより送風しながら、当該炉30内で鋳型10を冷却する。即ち、鋳型10を空冷により強制冷却する。 (3) After turning off the heater 33 of the atmospheric furnace 30, the heat insulating material 32 on the bottom surface in the furnace 30 is removed, and outside the furnace 30 and in the vicinity of the bottom surface of the furnace 30. A fan (not shown) is arranged, and the mold 10 is cooled in the furnace 30 while blowing air to the bottom surface of the furnace 30 by the fan. That is, the mold 10 is forcibly cooled by air cooling.
(4) 雰囲気炉のヒータ33の電源を切った後、図4(I)に示すように、当該炉内の底面部の断熱材32を一部除去して水冷銅40を取り付け、鋳型10の底面部10bに水冷銅40を接触させ、当該炉内で鋳型10を冷却する。即ち、鋳型10を液冷により強制冷却する。なお、図4では、容器を省略している。水冷銅40は、市販のものである。 (4) After turning off the power of the heater 33 of the atmospheric furnace, as shown in FIG. 4 (I), a part of the heat insulating material 32 on the bottom surface in the furnace is partially removed, and water-cooled copper 40 is attached. Water-cooled copper 40 is brought into contact with the bottom surface portion 10b, and the mold 10 is cooled in the furnace. That is, the mold 10 is forcibly cooled by liquid cooling. In FIG. 4, the container is omitted. Water-cooled copper 40 is commercially available.
(5) 雰囲気炉のヒータ33の電源を切った後、図4(II)に示すように鋳型10の端面壁部、側壁部10s、蓋部12、及び開口部の外周面を断熱材34で覆う。即ち、鋳型10の底面部以外を断熱材34で覆う。この状態で、上記(1)〜(4)と同様にして鋳型10を冷却する。図4(II)では、鋳型10を断熱材34で覆うと共に、鋳型10の底面部10bに水冷銅40を接触させた状態を示す。 (5) After turning off the power to the heater 33 of the atmospheric furnace, as shown in FIG. 4 (II), the end wall of the mold 10, the side wall 10s, the lid 12, and the outer peripheral surface of the opening are covered with the heat insulating material 34. cover. That is, the heat insulating material 34 covers the part other than the bottom surface of the mold 10. In this state, the mold 10 is cooled in the same manner as the above (1) to (4). FIG. 4 (II) shows a state in which the mold 10 is covered with the heat insulating material 34 and the water-cooled copper 40 is in contact with the bottom surface portion 10b of the mold 10.
(6) 雰囲気炉のヒータ33の電源を切った後、鋳型10を当該炉の外部に取り出し、鋳型10の底面部に水冷銅40を接触させて鋳型10を冷却する。鋳型10を雰囲気炉外に取り出し、水冷銅40を利用することで、冷却速度を速くすることができる。 (6) After turning off the heater 33 of the atmospheric furnace, the mold 10 is taken out of the furnace, and the water-cooled copper 40 is brought into contact with the bottom surface of the mold 10 to cool the mold 10. By taking out the mold 10 out of the atmosphere furnace and using the water-cooled copper 40, the cooling rate can be increased.
(7) 図5に示すように、雰囲気炉(図示せず)内に、ヒータ33と、その外周を覆う断熱材35とを具える高温領域と、高温領域の下方側に設けられて、水冷銅40からなる低温領域とを具える雰囲気炉を用意する。ヒータ33及び断熱材35、並びに水冷銅40は、鋳型10の周囲を囲むように配置する。鋳型10は、その底面部10bが有底筒状の支持台50に支持され、支持台50の内部には、駆動部(図示せず)により上下方向に移動可能な可動部51が配置されている。この可動部51の上下方向の移動により支持台50を上下方向に移動することができる。即ち、可動部51により鋳型10を上下方向に移動させることができる。このような雰囲気炉を用い、上記可動部51を駆動して、鋳型10を高温領域から低温領域に移動させることで冷却する。即ち、鉛直方向下側に配置された鋳型10の底面部側から低温領域に侵入させることで冷却する。 (7) As shown in FIG. 5, in an atmosphere furnace (not shown), a high temperature region including a heater 33 and a heat insulating material 35 covering the outer periphery thereof, and a lower side of the high temperature region, water cooling An atmosphere furnace having a low temperature region made of copper 40 is prepared. The heater 33, the heat insulating material 35, and the water-cooled copper 40 are disposed so as to surround the periphery of the mold 10. The mold 10 has a bottom surface 10b supported by a bottomed cylindrical support base 50, and a movable part 51 that is movable in the vertical direction by a drive part (not shown) is disposed inside the support base 50. Yes. The support base 50 can be moved in the vertical direction by moving the movable portion 51 in the vertical direction. That is, the mold 10 can be moved in the vertical direction by the movable portion 51. Using such an atmospheric furnace, the movable part 51 is driven to cool the mold 10 by moving it from the high temperature region to the low temperature region. In other words, cooling is performed by entering the low temperature region from the bottom surface side of the mold 10 arranged on the lower side in the vertical direction.
溶浸板の冷却にあたり、上述した(1)〜(7)の冷却方法について、温度勾配及び冷却速度を以下のようにして測定した。その結果を表1に示す。そして、表1に示す温度勾配及び冷却速度を達成する鋳型10や雰囲気炉30などを用いて上述した(1)〜(7)の冷却を行い、複合部材を得た。 In cooling the infiltrating plate, the temperature gradient and the cooling rate were measured as follows for the cooling methods (1) to (7) described above. The results are shown in Table 1. And the cooling of (1)-(7) mentioned above was performed using the casting_mold | template 10 which achieves the temperature gradient shown in Table 1, and the cooling rate, the atmospheric furnace 30, etc., and the composite member was obtained.
縦長の鋳型10の内部空間に、その長手方向に沿って底面部10b側(鉛直方向下側)から開口部側(鉛直方向上側)に向かって等間隔に熱電対を配置する。具体的には、鋳型10の内周面において底面部10bの表面から5mm間隔に側壁部10s(又は蓋部12)に、熱電対(図示せず)を設置する。この鋳型10の内部に純マグネシウムやSiCを充填していない空の状態で雰囲気炉に装入する。熱電対は、市販のものである。 Thermocouples are arranged in the interior space of the vertically long mold 10 at equal intervals along the longitudinal direction from the bottom surface portion 10b side (vertical direction lower side) to the opening side (vertical direction upper side). Specifically, a thermocouple (not shown) is installed on the side wall 10s (or the lid 12) at an interval of 5 mm from the surface of the bottom surface 10b on the inner peripheral surface of the mold 10. The mold 10 is charged into an atmosphere furnace in an empty state in which pure magnesium and SiC are not filled. Thermocouples are commercially available.
〈温度勾配〉
上記熱電対を配置した箇所を温度測定点とし、各温度測定点の温度が650℃になったとき、この温度測定点Psに隣り合う二つの温度測定点Pu,Pd、即ち、温度測定点Psを挟む開口部側(鉛直方向上側)の温度測定点Puの温度Tuと底面部側(鉛直方向下側)の温度測定点Pdの温度Tdとの温度差:ΔTP=Tu-Tdをとり、この温度差:Tu-Tdを上記二つの温度測定点Pu,Pd間の距離l(ここでは10mm)で除した値:(Tu-Td)/lを温度勾配とする。表1には、鋳型10に設けた40個の温度測定点について求めた各温度勾配のうち、最小値を示す。なお、表1において温度勾配の値が「マイナス」の試料は、鋳型に収納されている溶浸板において、その鉛直方向上側(鋳型の開口部側)から鉛直方向下側(鋳型の底面部側)に冷却が進む試料であり、ここでは、溶浸板の周縁から中央部分に向かって収束的に冷却される試料に相当する。温度勾配の値が正の試料は、鋳型に収納されている溶浸板において、その鉛直方向下側(鋳型の底面部側)から鉛直方向上側(鋳型の開口部側)に冷却が進む試料であり、ここでは、溶浸板における鉛直方向下側から鉛直方向上側に一方向に冷却される試料に相当する。
<Temperature gradient>
The location where the thermocouple is placed is a temperature measurement point, and when the temperature at each temperature measurement point reaches 650 ° C., two temperature measurement points P u and P d adjacent to this temperature measurement point P s , that is, the temperature temperature difference between the temperature T d of the temperature T u and the temperature measurement point P d of the bottom surface side (the lower side in the vertical direction) of the temperature measuring point P u of the opening side sandwiching the measurement point P s (upward vertical direction): [Delta] T It takes P = T u -T d, the temperature difference: T u -T d the two temperature measurement points P u, the value obtained by dividing the distance l between P d (where 10mm are): (T u -T d ) / l is the temperature gradient. Table 1 shows the minimum value among the temperature gradients obtained for the 40 temperature measurement points provided on the mold 10. In Table 1, samples with a temperature gradient value of `` minus '' are those on the infiltration plate housed in the mold, from the vertical upper side (mold opening side) to the vertical lower side (mold bottom side). ), Which corresponds to a sample that is convergently cooled from the periphery of the infiltration plate toward the central portion. A sample with a positive temperature gradient is a sample whose cooling proceeds from the lower side in the vertical direction (bottom side of the mold) to the upper side in the vertical direction (opening side of the mold) in the infiltration plate stored in the mold. Yes, here, it corresponds to a sample that is cooled in one direction from the lower side in the vertical direction to the upper side in the vertical direction on the infiltration plate.
〈冷却速度〉
上記熱電対を配置した箇所を温度測定点とし、各温度測定点が高い温度TH:680℃から低い温度TL:620℃まで降下するまでに要した時間tを測定し、上記温度TH,TLの差:TH-TL(ここでは60℃)を上記時間tで除した値:(TH-TL)/tを冷却速度とする。表1には、鋳型10に設けた40個の温度測定点について求めた各冷却速度のうち、最小値を示す。
<Cooling rate>
The location where the thermocouple is placed is a temperature measurement point, and the time t required for each temperature measurement point to drop from a high temperature T H : 680 ° C to a low temperature T L : 620 ° C is measured, and the temperature T H , T L difference: T H −T L (here 60 ° C.) divided by the above time t: (T H −T L ) / t is the cooling rate. Table 1 shows the minimum value among the cooling rates obtained for the 40 temperature measurement points provided in the mold 10.
得られた複合部材について、欠陥部の面積比(%)、寸法差(μm)、表面粗さRa(μm)、熱伝導率κ(W/m・K)、熱膨張係数α(ppm/K)を測定した。その結果を表1に示す。 For the obtained composite member, the defect area ratio (%), dimensional difference (μm), surface roughness Ra (μm), thermal conductivity κ (W / m · K), thermal expansion coefficient α (ppm / K) ) Was measured. The results are shown in Table 1.
欠陥部の面積比(%)は、以下のようにして測定した。得られた複合部材を平面視したときの重心(ここでは、200mm×100mmの長方形状の面の対角線の交点)を通る直線を切断線として、当該複合部材をイオンビーム加工により切断し、厚さ方向の断面(ここでは、断面積が200mm×5mmとなる断面)をとる。この断面において、上記重心を中心として上記切断線の長手方向に沿って上記切断線の長さ(ここでは200mm)の10%までの範囲の領域を中心領域とする。この中心領域(ここでは、断面積:40mm×5mmの領域)から任意に1mm×1mmの小領域を20個選択し、各小領域の面積に対する欠陥部の面積の割合:面積比を求める。欠陥部の面積は、上記断面の画像を利用して求める。具体的には、上記画像に対して市販の画像処理装置により画像解析を行い、各小領域において複合部材を構成する純マグネシウム及びSiC以外の部分(主として空隙)を当該小領域の欠陥部とし、その合計面積を上記画像処理装置により求める。そして、各試料における20個の欠陥部の面積比のうち、最大値を表1に示す。 The area ratio (%) of the defect portion was measured as follows. When the obtained composite member is viewed in plan, the composite member is cut by ion beam processing using a straight line passing through the center of gravity (here, the intersection of diagonal lines of a rectangular surface of 200 mm × 100 mm) as the thickness of the composite member. A cross section in the direction (here, a cross section having a cross-sectional area of 200 mm × 5 mm) is taken. In this cross section, an area in a range of up to 10% of the length of the cutting line (here, 200 mm) along the longitudinal direction of the cutting line with the center of gravity as the center is defined as a central area. Twenty small regions of 1 mm × 1 mm are arbitrarily selected from this central region (here, a cross-sectional area of 40 mm × 5 mm), and the ratio of the area of the defect portion to the area of each small region: the area ratio is obtained. The area of the defective portion is obtained using the cross-sectional image. Specifically, image analysis is performed on the image by a commercially available image processing apparatus, and a portion (mainly a void) other than pure magnesium and SiC constituting the composite member in each small region is a defective portion of the small region, The total area is obtained by the image processing apparatus. Table 1 shows the maximum value among the area ratios of 20 defect portions in each sample.
寸法差は、各試料の上記断面(断面積:200mm×5mm)の画像において、最大厚さと最小厚さを測定し、この最大厚さと最小厚さとの差を求めた。この差が200μm(0.2mm)以上である場合、表面の引けが大きく、表面性状が悪いと言え、50μm(0.05mm)以下である場合、表面の引けが非常に小さいと言える。 As for the dimensional difference, the maximum thickness and the minimum thickness were measured in the image of the cross section (cross-sectional area: 200 mm × 5 mm) of each sample, and the difference between the maximum thickness and the minimum thickness was obtained. When this difference is 200 μm (0.2 mm) or more, it can be said that the surface is highly scratched and the surface properties are poor, and when it is 50 μm (0.05 mm) or less, the surface is very small.
表面粗さRaは、JIS B 0601(2001)に準じて測定した。 The surface roughness Ra was measured according to JIS B 0601 (2001).
熱膨張係数α及び熱伝導率κは、得られた複合部材から試験片を切り出し、市販の測定器を用いて測定した。熱膨張係数αは、30℃〜150℃の範囲について測定した。 The thermal expansion coefficient α and the thermal conductivity κ were measured using a commercially available measuring instrument after cutting out a test piece from the obtained composite member. The thermal expansion coefficient α was measured in the range of 30 ° C to 150 ° C.
更に、得られた複合部材のうち、欠陥部の面積比が10%以下である試料について、複合部材の成分、SiCの形状、SiCの含有量、複合状態を調べた。複合部材の成分は、EDX装置により調べたところ、Mg及びSiC、残部:不可避的不純物であり、用いた原料と同様であった。また、得られた複合部材にCP(Cross-section Polisher)加工を施して断面を出し、SEM観察によりこの断面を調べたところ、SiC同士が直接結合されていた。即ち、ネットワーク部がSiCで形成された多孔質体であり、用いた原料の焼結体と同様であった。更に、これらの試料の断面を光学顕微鏡(50倍)で観察したところ、図2(I)に示すようにSiC間の隙間に純マグネシウムが溶浸されていることが確認できた。図2において連続した網目状を構成する部分がSiCであり、粒状に固まった部分が純マグネシウムである。 Further, among the obtained composite members, the components of the defective portion having an area ratio of 10% or less were examined for the components of the composite member, the shape of SiC, the content of SiC, and the composite state. The components of the composite member were examined by an EDX apparatus, and were Mg and SiC, and the balance: inevitable impurities, which were the same as the raw materials used. Further, when the obtained composite member was subjected to CP (Cross-section Polisher) processing to obtain a cross section, and this cross section was examined by SEM observation, SiC was directly bonded to each other. That is, the network part was a porous body formed of SiC and was the same as the sintered material used. Furthermore, when the cross sections of these samples were observed with an optical microscope (50 ×), it was confirmed that pure magnesium was infiltrated into the gaps between SiC as shown in FIG. 2 (I). In FIG. 2, the portion constituting the continuous network is SiC, and the portion solidified in a granular form is pure magnesium.
上記SiCの含有量は、複合部材の任意の断面を光学顕微鏡(50倍)で観察し、この観察像を市販の画像解析装置で画像処理して、この断面中のSiCの合計面積を求め、この合計面積を体積割合に換算した値をこの断面に基づく体積割合とし、n=3の断面の体積割合を求め、これらの平均値とした(面積割合≒体積割合)。その結果、SiCの含有量は、80体積%であった。 The content of the SiC is observed with an optical microscope (50 times) any cross section of the composite member, this observation image is image processed with a commercially available image analysis device, to determine the total area of SiC in the cross section, A value obtained by converting the total area into a volume ratio was defined as a volume ratio based on the cross section, and a volume ratio of the cross section of n = 3 was obtained and averaged (area ratio≈volume ratio). As a result, the content of SiC was 80% by volume.
表1に示すように、溶浸板における溶融したマグネシウムの供給側の反対側から一方向に溶浸板を冷却して得られた複合部材、ここでは、鉛直方向下側から鉛直方向上側に向かって一方向に溶浸板を冷却して得られた複合部材は、直径が50mm超の円形領域をとることが可能な大型な板材でありながら、欠陥が集中的に存在することがなく、高品位であることが分かる。特に、上記一方向の冷却を行った複合部材に存在した欠陥はいずれも、目視で確認することが困難なほど微細であり(0.1mm以下)、均一的な組織を有していた。また、上記一方向の冷却を行って得られた複合部材は、内部欠陥だけでなく、表面欠陥も少なく、寸法精度に優れることが分かる。更に、上記一方向の冷却を行って得られた複合部材は、熱膨張係数が4ppm/K程度と非常に小さく、熱膨張係数が4ppm/K程度の半導体素子やその周辺部品との整合性に優れる上に、熱伝導率が180W/K・m以上、特に300W/K・m以上の試料もあり、熱伝導性にも優れることが分かる。 As shown in Table 1, a composite member obtained by cooling the infiltration plate in one direction from the opposite side of the molten magnesium supply side in the infiltration plate, here, from the lower vertical direction to the upper vertical direction. The composite member obtained by cooling the infiltrated plate in one direction is a large plate that can take a circular region with a diameter of more than 50 mm. It can be seen that the quality. In particular, any defects present in the composite member that had been cooled in one direction were so fine that it was difficult to visually confirm (0.1 mm or less), and had a uniform structure. Moreover, it turns out that the composite member obtained by performing the said one-way cooling has few surface defects, and is excellent in a dimensional accuracy. Furthermore, the composite material obtained by performing the above-mentioned one-way cooling has a very low coefficient of thermal expansion of about 4 ppm / K, and is compatible with semiconductor elements having a coefficient of thermal expansion of about 4 ppm / K and its peripheral components. In addition to being excellent, there are samples with a thermal conductivity of 180 W / K · m or more, especially 300 W / K · m or more, and it can be seen that they have excellent thermal conductivity.
これに対し、上記一方向の冷却を行わなかった複合部材は、上記欠陥部の面積比が大きく、局所的に欠陥(気孔)が存在していることが分かる。また、この複合部材に存在した欠陥は、目視で確認できるほど大きなものであった。このような大きな欠陥が存在することで、この複合部材は、寸法精度が低く、熱伝導性も低下したと考えられる。 On the other hand, it can be seen that the composite member that has not been cooled in one direction has a large area ratio of the above-described defect portions and locally has defects (pores). Moreover, the defect which existed in this composite member was so large that it could be confirmed visually. Due to the presence of such large defects, it is considered that this composite member has low dimensional accuracy and thermal conductivity.
従って、上記一方向の冷却を行って得られた複合部材は、上記半導体素子の放熱部材の構成材料に好適に利用できると期待される。 Therefore, it is expected that the composite member obtained by performing the unidirectional cooling can be suitably used as a constituent material of the heat dissipation member of the semiconductor element.
また、表1に示すように各温度測定点における温度勾配が0.01℃/mm以上、及び各温度測定点における冷却速度が0.5℃/min以上の少なくとも一方を満たすように冷却することで、欠陥部の面積比を小さくできることが分かる。更に、温度勾配や冷却速度が大きいほど、欠陥部の面積比が小さくなる傾向にあることが分かる。加えて、表1に示すように、冷却速度を一定とする場合、温度勾配が大きいほど、欠陥部を低減できることが分かる。このことから、上記一方向の冷却を行うと共に、温度勾配や冷却速度を大きくすることで、局所的に欠陥が存在する複合部材が得られ難いと言える。 In addition, as shown in Table 1, by cooling so that the temperature gradient at each temperature measurement point is 0.01 ° C / mm or more and the cooling rate at each temperature measurement point is 0.5 ° C / min or more, the defective portion It can be seen that the area ratio can be reduced. Furthermore, it can be seen that the larger the temperature gradient and the cooling rate, the smaller the area ratio of the defect portion. In addition, as shown in Table 1, it can be seen that when the cooling rate is constant, the defect portion can be reduced as the temperature gradient increases. From this, it can be said that it is difficult to obtain a composite member having defects locally by performing the cooling in one direction and increasing the temperature gradient and the cooling rate.
なお、上記実施形態1では、市販のSiC焼結体を用いたが、SiC粉末を利用して複合部材を作製することができる。具体的には、例えば、SiC粉末に875℃×2時間の酸化処理を施した後、鋳型にタッピングやスリップキャストなどを利用して粉末成形体を形成し、実施形態1と同様にして、溶融した純マグネシウムを粉末成形体に溶浸させ、凝固時の冷却条件を実施形態1と同様に制御することで、実施形態1と同様に大型でありながら、欠陥が少ない複合部材が得られる。上記粉末成形体を適宜焼結などしてもよい。 In the first embodiment, a commercially available SiC sintered body is used, but a composite member can be manufactured using SiC powder. Specifically, for example, the SiC powder is subjected to an oxidation treatment at 875 ° C. for 2 hours, and then a powder compact is formed on the mold using tapping, slip casting, etc., and melted in the same manner as in the first embodiment. By infiltrating the pure magnesium into the powder compact and controlling the cooling conditions during solidification in the same manner as in the first embodiment, a composite member having a large size and few defects can be obtained as in the first embodiment. The powder compact may be appropriately sintered.
(実施形態2)
純マグネシウムとSiCとを複合した複合材料からなる基板と、基板の対向する二面をそれぞれ覆う金属被覆層とを具える複合部材を作製し、得られた複合部材の欠陥の状態、熱特性を調べた。
(Embodiment 2)
A composite member comprising a substrate made of a composite material made of a composite of pure magnesium and SiC and a metal coating layer covering each of the two opposing surfaces of the substrate was produced, and the defect state and thermal characteristics of the resulting composite member were measured. Examined.
原料として、実施形態1と同様の純マグネシウムのインゴット、及びSiC焼結体を用意した。また、SiC焼結体には、実施形態1と同様の酸化処理を施した。更に、長さ10mm×幅100mm×厚さ0.5mmで、カーボン製の板状のスペーサを一対用意した。 As raw materials, the same pure magnesium ingot as in Embodiment 1 and a SiC sintered body were prepared. The SiC sintered body was subjected to the same oxidation treatment as in the first embodiment. Further, a pair of carbon plate-like spacers having a length of 10 mm, a width of 100 mm, and a thickness of 0.5 mm were prepared.
ここでは、実施形態1で用いた図1に示す鋳型10であって、SiC焼結体と鋳型との間に上記スペーサが配置可能な大きさを有するものを利用する。適宜離型剤を塗布した鋳型10に焼結体20及び一対のスペーサ(図示せず)を収納し、一対のスペーサにより焼結体20を挟持した状態とする。上記スペーサに挟まれることで焼結体20は、鋳型内に安定して配置されると共に、焼結体20の表面と鋳型10の側壁部10sとの間、及び焼結体20の裏面と鋳型10の蓋部12との間にスペーサの厚さ分(ここでは0.5mm)の隙間がそれぞれ設けられる。この鋳型10を実施形態1と同様に雰囲気炉に装入した。そして、実施形態1と同様の条件で、焼結体20と溶融した純マグネシウムとを複合して、溶浸板を作製した。この実施形態では、溶浸板を形成すると同時に、上述のようにスペーサにより設けられた焼結体と鋳型との間の隙間に溶融した純マグネシウムが流れ込むことで、溶浸板の対向する二面にそれぞれ純マグネシウムからなる層を形成する。 Here, the mold 10 shown in FIG. 1 used in the first embodiment and having a size that allows the spacer to be disposed between the SiC sintered body and the mold is used. A sintered body 20 and a pair of spacers (not shown) are accommodated in a mold 10 appropriately coated with a release agent, and the sintered body 20 is sandwiched between the pair of spacers. By being sandwiched between the spacers, the sintered body 20 is stably disposed in the mold, and between the surface of the sintered body 20 and the side wall portion 10s of the mold 10, and the back surface of the sintered body 20 and the mold. A gap corresponding to the thickness of the spacer (here, 0.5 mm) is provided between each of the 10 lid portions 12. This mold 10 was charged into an atmospheric furnace as in the first embodiment. Then, under the same conditions as in Embodiment 1, the sintered body 20 and molten pure magnesium were combined to produce an infiltration plate. In this embodiment, at the same time as forming the infiltration plate, the melted pure magnesium flows into the gap between the sintered body provided by the spacer and the mold as described above, so that the two opposite surfaces of the infiltration plate are opposed to each other. Each layer is made of pure magnesium.
ここでは、実施形態1の試料No.38と同様の温度勾配、冷却速度となるように水冷銅などを利用して、上記溶浸板をその鉛直方向下側から鉛直方向上側に向かって一方向に冷却して純マグネシウムを凝固した。上記工程により、複合部材(長さ200mm×幅100mm×厚さ6mm)が得られた。 Here, using the water-cooled copper or the like so as to achieve the same temperature gradient and cooling rate as the sample No. 38 of Embodiment 1, the infiltration plate is moved in one direction from the vertical lower side to the vertical upper side. And pure magnesium was solidified. Through the above process, a composite member (length 200 mm × width 100 mm × thickness 6 mm) was obtained.
得られた複合部材の断面を光学顕微鏡(50倍)で観察したところ、図2(II)に示すようにSiC間の隙間に純マグネシウムが溶浸された複合材料からなる基板と、この基板の表面に純マグネシウムからなる金属被覆層を具えることが確認できた。この基板及び金属被覆層の構成金属の組成をEDX装置により調べたところ、同一組成(純マグネシウム)であった。また、上記断面の観察像から、各金属被覆層は、上記基板中の純マグネシウムと連続した組織を有していることが確認できた。更に、上記断面の観察像を用いて各金属被覆層の厚さを測定したところ、概ね0.5mm(500μm)であり、上記スペーサの厚さに実質的に一致していることが確認できた。 When the cross section of the obtained composite member was observed with an optical microscope (50 ×), as shown in FIG. 2 (II), a substrate made of a composite material in which pure magnesium was infiltrated into the gaps between SiC, and the substrate It was confirmed that the surface was provided with a metal coating layer made of pure magnesium. When the composition of the constituent metals of the substrate and the metal coating layer was examined with an EDX apparatus, the same composition (pure magnesium) was obtained. Further, from the observation image of the cross section, it was confirmed that each metal coating layer had a structure continuous with pure magnesium in the substrate. Furthermore, when the thickness of each metal coating layer was measured using the observation image of the cross section, it was about 0.5 mm (500 μm), and it was confirmed that it substantially coincided with the thickness of the spacer.
得られた複合部材において、純マグネシウムとSiCとが複合された部分、即ち、金属被覆層を除く部分のSiCの含有量を測定したところ、80体積%であった。SiCの含有量は、実施形態1と同様にして測定した。 In the obtained composite member, the content of SiC in the portion where pure magnesium and SiC were combined, that is, the portion excluding the metal coating layer was measured and found to be 80% by volume. The SiC content was measured in the same manner as in the first embodiment.
得られた複合部材について、実施形態1と同様にして、欠陥部の面積比(%)、寸法差(μm)、表面粗さRa(μm)を測定したところ、面積比:0.11%、寸法差:1μm、表面粗さRa:0.8μmであった。なお、寸法差は、金属被覆層を含めた厚さを測定した。また、表面粗さRaは、金属被覆層の表面を測定した。 About the obtained composite member, the area ratio (%), the dimensional difference (μm), and the surface roughness Ra (μm) of the defect portion were measured in the same manner as in Embodiment 1. The area ratio: 0.11%, the dimensional difference 1 μm and surface roughness Ra: 0.8 μm. In addition, the dimensional difference measured thickness including the metal coating layer. Moreover, the surface roughness Ra measured the surface of the metal coating layer.
得られた複合部材について熱膨張係数α(ppm/K)と熱伝導率κ(W/m・K)とを実施形態1と同様にして測定したところ、熱膨張係数α:5.1ppm/K、熱伝導率κ:250W/m・Kであった。 When the thermal expansion coefficient α (ppm / K) and the thermal conductivity κ (W / mK) were measured in the same manner as in Embodiment 1 for the obtained composite member, the thermal expansion coefficient α: 5.1 ppm / K, The thermal conductivity κ was 250 W / m · K.
以上から、直径が50mm超の円形領域をとることが可能なほどに大型であり、かつ金属被覆層を有する複合部材であっても、実施形態1と同様に、溶浸板をその鉛直方向下側から鉛直方向上側に向かって一方向に冷却することで、局所的に大きな欠陥が存在せず、表面性状にも優れ、高品位な複合部材が得られることが分かる。また、この複合部材も熱膨張係数が4ppm/K程度の半導体素子やその周辺部品との整合性に優れる上に、放熱性にも優れており、当該半導体素子の放熱部材の構成材料に好適に利用できると期待される。特に、実施形態2の複合部材は、基板の両面に金属被覆層を具えることで、電気めっきによりNiめっきなどを施すことができる。Niめっきなどを施すことで、半田との濡れ性を高められ、半田の塗布が望まれる半導体装置に利用される場合であっても、十分に対応することができる。また、上述のように基板自体の表面が平滑であることで、金属被覆層の表面も平滑になっており、めっきを均一的な厚さに形成することができる。 From the above, even in the case of a composite member that is large enough to have a circular area with a diameter of more than 50 mm and that has a metal coating layer, the infiltrating plate is lowered in the vertical direction as in the first embodiment. It can be seen that by cooling in one direction from the side toward the upper side in the vertical direction, there is no large defect locally, the surface property is excellent, and a high-quality composite member can be obtained. In addition, this composite member is excellent in compatibility with a semiconductor element having a thermal expansion coefficient of about 4 ppm / K and its peripheral components, and also has excellent heat dissipation, and is suitable as a constituent material of the heat dissipation member of the semiconductor element. Expected to be available. In particular, the composite member of Embodiment 2 can be provided with Ni plating or the like by electroplating by providing metal coating layers on both sides of the substrate. By applying Ni plating or the like, the wettability with the solder can be improved, and even when it is used in a semiconductor device where solder application is desired, it can sufficiently cope. In addition, since the surface of the substrate itself is smooth as described above, the surface of the metal coating layer is also smooth, and the plating can be formed with a uniform thickness.
なお、実施形態2の複合部材において、板状のスペーサの厚さや形状、使用数を適宜選択することで、金属被覆層の厚さや形成領域を容易に変更することができる。例えば、成形体(焼結体)の一面にのみスペーサを配置することで、基板の一面にのみ金属被覆層を具える複合部材が得られる。 In the composite member of Embodiment 2, the thickness and formation region of the metal coating layer can be easily changed by appropriately selecting the thickness and shape of the plate-like spacer and the number used. For example, by disposing the spacer only on one surface of the formed body (sintered body), a composite member having a metal coating layer only on one surface of the substrate can be obtained.
本発明は、上述の実施形態に限定されるものではなく、本発明の要旨を逸脱しない範囲で適宜変更することが可能である。例えば、複合部材中の非金属無機材料の組成、含有量、ネットワーク部の有無、ネットワーク部の構成材料、金属成分の組成(例えば、マグネシウム合金)、複合部材の大きさ、金属被覆層の厚さ、複合部材の複合時の条件などを適宜変更することができる。 The present invention is not limited to the above-described embodiment, and can be appropriately changed without departing from the gist of the present invention. For example, composition of non-metallic inorganic material in composite member, content, presence / absence of network part, constituent material of network part, composition of metal component (for example, magnesium alloy), size of composite member, thickness of metal coating layer The conditions at the time of combining the composite members can be changed as appropriate.
本発明複合部材は、半導体素子のヒートスプレッダ(本発明放熱部材)に好適に利用することができる。本発明複合部材の製造方法は、上記複合部材の製造に好適に利用することができる。本発明半導体装置は、種々の電子部品の構成部材に好適に利用することができる。 The composite member of the present invention can be suitably used for a heat spreader of the semiconductor element (the heat dissipation member of the present invention). The manufacturing method of this invention composite member can be utilized suitably for manufacture of the said composite member. The semiconductor device of the present invention can be suitably used for constituent members of various electronic components.
10 鋳型 10b 底面部 10e 端面壁部 10s 側壁部 11 本体部
12 蓋部 20 焼結体(成形体) 30 雰囲気炉 31 容器
32,34,35 断熱材 33 ヒータ 40 水冷銅 50 支持台 51 可動部
10 Mold 10b Bottom 10e End wall 10s Side wall 11 Body
12 Lid 20 Sintered body (molded body) 30 Atmospheric furnace 31 Container
32, 34, 35 Insulation 33 Heater 40 Water-cooled copper 50 Support base 51 Moving parts
Claims (18)
鋳型に収納された非金属無機材料の集合体に溶融したマグネシウム又はマグネシウム合金を溶浸させ、溶浸板を形成する複合工程と、
前記溶浸板における前記溶融したマグネシウム又はマグネシウム合金の供給側の反対側から一方向に前記溶浸板を冷却して、前記溶融したマグネシウム又はマグネシウム合金を凝固させる冷却工程とを具え、
前記非金属無機材料の集合体は、前記鋳型に充填されてなる非金属無機材料の粉末、非金属無機材料の粉末を加圧又は無加圧で固めた粉末成形体、及び非金属無機材料の焼結体から選択される1種であることを特徴とする複合部材の製造方法。 A method for producing a composite member in which magnesium or a magnesium alloy and a nonmetallic inorganic material are combined,
A combined process of infiltrating molten magnesium or a magnesium alloy into an aggregate of nonmetallic inorganic materials housed in a mold to form an infiltrated plate;
Wherein said infiltrant plate is cooled from the side opposite the supply side of the molten magnesium or magnesium alloy in one direction in the infiltrated plate, immediately give a cooling step of solidifying the molten magnesium or magnesium alloy,
The non-metallic inorganic material aggregate includes non-metallic inorganic material powder filled in the mold, non-metallic inorganic material powder compacted by pressing or non-pressurizing, and non-metallic inorganic material method of producing a composite member according to claim 1 Tanedea Rukoto selected from the sintered body.
前記冷却工程では、前記溶浸板における鉛直方向下側から鉛直方向上側に向かって一方向に前記溶浸板を冷却して、前記溶融したマグネシウム又はマグネシウム合金を凝固させることを特徴とする請求項1に記載の複合部材の製造方法。 In the composite step, the molten magnesium or magnesium alloy is supplied from the upper side in the vertical direction toward the lower side in the vertical direction by its own weight with respect to the aggregate.
The cooling step includes cooling the infiltration plate in one direction from a lower vertical direction to an upper vertical direction in the infiltration plate to solidify the molten magnesium or magnesium alloy. A method for producing the composite member according to 1.
直径が50mm超の円形領域をとることが可能な大きさを有する板材であり、
当該複合部材を平面視したときの重心を通る直線を切断線として、当該複合部材の厚さ方向の断面をとり、この断面において、前記重心を中心として前記切断線の長さの10%までの範囲を中心領域とし、この中心領域から任意の1mm×1mmの小領域をとり、当該小領域の面積に対する欠陥部の面積の割合を面積比とするとき、前記面積比が10%以下であることを特徴とする複合部材。 Ri composite member der produced by the production method of a composite member according to claim 1,
It is a plate material having a size capable of taking a circular region having a diameter of more than 50 mm,
Taking a straight line passing through the center of gravity when the composite member is viewed in plan as a cutting line, a cross section in the thickness direction of the composite member is taken, and in this cross section, up to 10% of the length of the cutting line centering on the center of gravity When the area is a central area, an arbitrary small area of 1 mm x 1 mm is taken from this central area, and the area ratio is the ratio of the area of the defect portion to the area of the small area, the area ratio is 10% or less A composite member characterized by
直径が50mm超の円形領域をとることが可能な大きさを有する板材であることを特徴とする複合部材。 Manufactured by the method for producing a composite member according to any one of claims 1 to 6,
A composite member characterized by being a plate material having a size capable of taking a circular region having a diameter of more than 50 mm.
前記基板の少なくとも一面を覆う金属被覆層とを具えることを特徴とする請求項7〜15のいずれか1項に記載の複合部材。 The composite member is a substrate made of a composite material in which the magnesium or the magnesium alloy and the non-metallic inorganic material are combined;
16. The composite member according to claim 7, further comprising a metal coating layer covering at least one surface of the substrate.
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2009/005132 WO2010038483A1 (en) | 2008-10-03 | 2009-10-02 | Composite member |
| US13/122,365 US9028959B2 (en) | 2008-10-03 | 2009-10-02 | Composite member |
| CN200980139128.3A CN102170986B (en) | 2008-10-03 | 2009-10-02 | Composite member |
| CN2013102794947A CN103394668A (en) | 2008-10-03 | 2009-10-02 | Composite member |
| JP2009230339A JP5513058B2 (en) | 2009-10-02 | 2009-10-02 | Composite member manufacturing method, composite member, heat dissipation member, and semiconductor device |
| EP09817522.7A EP2332674B1 (en) | 2008-10-03 | 2009-10-02 | Composite member |
| US14/684,206 US20150225635A1 (en) | 2008-10-03 | 2015-04-10 | Composite member |
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| JP2009230339A JP5513058B2 (en) | 2009-10-02 | 2009-10-02 | Composite member manufacturing method, composite member, heat dissipation member, and semiconductor device |
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| JPH11277217A (en) * | 1998-01-19 | 1999-10-12 | Mitsubishi Materials Corp | Heat dissipation substrate and method of manufacturing the same |
| JP2003183748A (en) * | 2001-12-19 | 2003-07-03 | Toyota Motor Corp | Method for producing magnesium-based dispersion-reinforced composite material, reinforcing particles used therefor, and method for producing the same |
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