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JP5534575B2 - Assembly board - Google Patents
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JP5534575B2 - Assembly board - Google Patents

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JP5534575B2
JP5534575B2 JP2009107346A JP2009107346A JP5534575B2 JP 5534575 B2 JP5534575 B2 JP 5534575B2 JP 2009107346 A JP2009107346 A JP 2009107346A JP 2009107346 A JP2009107346 A JP 2009107346A JP 5534575 B2 JP5534575 B2 JP 5534575B2
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circuit board
region
cross
sectional area
dividing
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JP2010258251A (en
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頼之 岸
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Astemo Ltd
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Keihin Corp
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Description

本発明は、集合基板に関する。   The present invention relates to a collective substrate.

集合基板は、部品を実装する回路基板が分割可能に複数連結された構成を有する。このような集合基板は、小型且つ同種の回路基板を効率的に製造するために用いられ、集合基板のままで電子部品等を組み込み、リフロー半田工程を経た後に各回路基板に切り離される。   The collective board has a configuration in which a plurality of circuit boards on which components are mounted are connected so as to be divided. Such a collective board is used to efficiently manufacture a small-sized and similar circuit board. Electronic parts and the like are incorporated as they are in the collective board, and after being subjected to a reflow soldering process, they are separated into circuit boards.

ここで、基板分割時に回路基板に作用する応力を減少させるためには、回路基板の切り離しを容易にすることが好ましい。そこで、従来では、集合基板の一方の側部からスリットを入れることで切り離しを容易にしていた。スリットは、例えば、回路基板の一方の側部を完全に分離させると共に、他方の側部の基板材を残すことで隣り合う2つの回路基板の連結を維持するように形成されており、基板材が残された部分が回路基板の連結部となる。スリットの長さは、連結部によって隣り合う2つの回路基板を連結させる力が維持できる範囲で最大限の大きさになっている。回路基板を分離させるときは、連結部のみに曲げ応力がかかるので、回路基板に作用する応力を減少できる。   Here, in order to reduce the stress acting on the circuit board when the board is divided, it is preferable that the circuit board is easily separated. Therefore, conventionally, a slit is made from one side of the collective substrate to facilitate separation. The slit is formed, for example, so as to completely separate one side of the circuit board and maintain the connection between the two adjacent circuit boards by leaving the substrate material on the other side. The portion where is left is the connection portion of the circuit board. The length of the slit is as large as possible within a range in which the force to connect two adjacent circuit boards by the connecting portion can be maintained. When the circuit boards are separated, since the bending stress is applied only to the connecting portion, the stress acting on the circuit board can be reduced.

実開昭63−50158号公報Japanese Utility Model Publication No. 63-50158

しかしながら、従来の構成では、連結部の断面積を小さくすると基板分離時に回路基板に作用する応力を小さくできるが、集合基板全体としての強度が小さくなってしまう。このため、半田付け工程などで集合基板に熱を加えると連結部の近傍などに反りが生じ易かった。回路基板に反りが生じると、後の検査工程で検査ポイントの位置ずれが生じてしまうので、検査を効率良く実施することができなくなることがある。これに対して、回路基板の反りを抑えるためにスリットを短くすると、連結部の断面積が大きくなって基板分割時の応力が大きくなってしまう。
本発明は、このような事情を鑑みてなされたものであり、集合基板を用いて製造される回路基板を高精度に、かつ効率良く製造できるようにすることを主な目的とする。
However, in the conventional configuration, if the cross-sectional area of the connecting portion is reduced, the stress acting on the circuit board at the time of board separation can be reduced, but the strength of the collective board as a whole is reduced. For this reason, when heat is applied to the collective substrate in a soldering process or the like, warpage is likely to occur near the connecting portion. If the circuit board is warped, the inspection point may be misaligned in the subsequent inspection process, so that the inspection may not be performed efficiently. On the other hand, if the slit is shortened in order to suppress the warp of the circuit board, the cross-sectional area of the connecting portion is increased and the stress at the time of dividing the board is increased.
The present invention has been made in view of such circumstances, and a main object of the present invention is to be able to manufacture a circuit board manufactured using a collective substrate with high accuracy and efficiency.

本願の一観点によれば、電子部品を実装可能な回路基板を複数有し、前記回路基板が個々に分割可能に連結された集合基板であって、前記回路基板は前記電子部品を実装可能な領域として、第1の領域と、前記第1の領域に実装される前記電子部品より歪に対する許容量が小さい前記電子部品が実装される第2の領域とを有し、隣り合う前記回路基板の前記第1の領域間及び第2の領域間に形成された分割部は、分離溝が前記回路基板を分割す
るときの分離線に沿って設けられると共に、前記第2の領域間には、前記分割部を貫通する貫通孔を形成し、前記回路基板の反り量の許容値をγ、前記回路基板の総重量から求められる荷重をβ、前記回路基板の反り量と、その反り量を戻すのに要する応力の関係を直線近似したときの直線の傾きをδ、前記直線において反り量を0としたときに算出される応力の値をαとしたとき、前記分割部において前記貫通孔が形成されていない第1の分割部の前記分離線上の断面積と、前記貫通孔が形成された第2の分割部の前記分離線上の断面積との和である総断面積Sは、S=β/(δ×γ+α)を満たすことを特徴とする集合基板が提供される。
According to one aspect of the present application, the circuit board includes a plurality of circuit boards on which electronic components can be mounted, and the circuit boards are connected to each other so as to be capable of being divided. The circuit board can mount the electronic parts. As a region, the first region and a second region where the electronic component having a smaller allowable amount of distortion than the electronic component mounted in the first region is mounted, and the adjacent circuit board The division part formed between the first regions and between the second regions is provided along a separation line when a separation groove divides the circuit board, and between the second regions, Form a through-hole that penetrates the divided part, and the allowable value of the warpage amount of the circuit board is γ, the load obtained from the total weight of the circuit board is β, the warpage amount of the circuit board and the warpage amount are returned. The slope of the straight line when the stress relationship required for When the value of the stress calculated when the amount of warpage is 0 in the straight line is α, the sectional area on the separation line of the first divided portion where the through hole is not formed in the divided portion, and An aggregate substrate is provided in which a total cross-sectional area S, which is the sum of the cross-sectional areas on the separation line of the second divided portion in which the through holes are formed, satisfies S = β / (δ × γ + α). The

また、本発明の別の観点によれば、請求項1に記載の集合基板において、前記分離溝は表面側と裏面側のそれぞれに設けられ、前記貫通孔は等間隔に複数形成されていることを特徴とする集合基板が提供される。 According to another aspect of the present invention, in the collective substrate according to claim 1, the separation groove is provided on each of the front surface side and the back surface side, and a plurality of the through holes are formed at equal intervals. An aggregate substrate is provided.

本発明によれば、分割部の第2の領域に対応する部分に貫通孔を設けることで、回路基板同士の連結を維持しながら断面積を減少させたので、基板分割時の応力を抑えられ、歪に対して弱い部品への影響を抑えることができる。さらに、熱処理時の回路基板の反りを低減できる。   According to the present invention, since the cross-sectional area is reduced while maintaining the connection between the circuit boards by providing the through hole in the part corresponding to the second region of the divided part, the stress at the time of dividing the board can be suppressed. , It is possible to suppress the influence on parts that are vulnerable to distortion. Furthermore, the warp of the circuit board during the heat treatment can be reduced.

図1は、本発明の実施の形態に係る集合基板の平面図である。FIG. 1 is a plan view of a collective substrate according to an embodiment of the present invention. 図2は、図1の一部を拡大した図であって、分割部の構成を示す平面図である。FIG. 2 is an enlarged view of a part of FIG. 1 and is a plan view showing a configuration of a dividing unit. 図3は、図2のI−I線に沿った断面図である。FIG. 3 is a cross-sectional view taken along the line II of FIG. 図4は、図2のII−II線に沿った断面図である。4 is a cross-sectional view taken along line II-II in FIG. 図5は、反り量と応力の関係を調べたグラフである。FIG. 5 is a graph showing the relationship between the amount of warpage and stress. 図6は、電子部品を実装した後に回路基板を切り離した図である。FIG. 6 is a diagram in which the circuit board is separated after the electronic components are mounted.

本発明の実施の形態について図面を参照して詳細に説明する。
図1に、この実施の形態における集合基板の一例の平面図を示す。
集合基板1は、複数の回路基板2が分割部3を介して個々に切り離し可能に連結され、その両端部に捨て基板4が設けられている。
Embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 1 shows a plan view of an example of a collective substrate in this embodiment.
In the collective substrate 1, a plurality of circuit boards 2 are connected to each other through a dividing portion 3 so as to be individually separable, and discard substrates 4 are provided at both ends thereof.

図1の例で、回路基板2は横長の矩形になっており、横方向(第1の方向)に3つの回路基板2が2つの分割部3を介して連結され、これら連結された3つの回路基板2が横方向に直行する縦方向(第2の方向)に3列配置されており、合計で9個の回路基板2がマトリクス状に配置されている。縦方向に隣り合う回路基板2の間には、回路基板2の長辺に平行なスリット5によって分離させられており、直接には連結されていない。捨て基板4は、分割部3を介して回路基板2に連結されている。このような捨て基板4は、集合基板1のハンドリングを良好にするために設けられている。   In the example of FIG. 1, the circuit board 2 has a horizontally long rectangle, and three circuit boards 2 are connected to each other in the horizontal direction (first direction) via two divided portions 3, and the three connected The circuit boards 2 are arranged in three columns in the vertical direction (second direction) perpendicular to the horizontal direction, and a total of nine circuit boards 2 are arranged in a matrix. The circuit boards 2 adjacent in the vertical direction are separated by a slit 5 parallel to the long side of the circuit board 2 and are not directly connected. The discarded board 4 is connected to the circuit board 2 via the dividing part 3. Such a discarded substrate 4 is provided in order to improve the handling of the collective substrate 1.

回路基板2は、エポキシ基板などの絶縁性を有する基板本体上に図示を省略する導電性パターンを形成すると共に、電子部品のリードなどを挿入可能な孔が少なくとも1つ形成されている。導電性パターンは、2つ以上の回路基板2が同一のパターンになるように形成されている。しかしながら、導電性パターンが異なる回路基板2を含んでも良い。   The circuit board 2 has a conductive pattern (not shown) formed on an insulating board body such as an epoxy board, and at least one hole into which an electronic component lead or the like can be inserted. The conductive pattern is formed so that two or more circuit boards 2 have the same pattern. However, the circuit board 2 having different conductive patterns may be included.

ここで、図1及び図2に示すように、この回路基板2は、第1の領域21と第2の領域22を含んで構成されている。
第1の領域21とは、回路基板2の歪みに対する許容値が大きい領域であり、主に回路基板2の歪みに対して強い電子部品、例えばICやトランジスタ、抵抗などが実装される。なお、歪に対して強い電子部品とは、電子部品の特性が歪に影響を受け難い部品や、回路基板2との接触面積が多いことで歪の影響を受け難くなる部品があげられる。
第2の領域22は、回路基板2の歪みに対する許容値が第1の領域21より小さい領域、言い換えれば歪みを第1の領域21より小さく抑える必要がある領域である。この第2
の領域22には、主に回路基板2の歪みの影響を受け易い電子部品、例えばセラミックコンデンサなどが実装される。なお、歪の影響を受け易い電子部品とは、電子部品の特性が歪に影響を受け易い部品や、回路基板2との接触面積が小さいことにより歪の影響を受け易くなる部品があげられる。
Here, as shown in FIGS. 1 and 2, the circuit board 2 includes a first region 21 and a second region 22.
The first region 21 is a region having a large allowable value with respect to the distortion of the circuit board 2, and electronic components such as ICs, transistors, resistors, etc. that are resistant to the distortion of the circuit board 2 are mainly mounted thereon. Note that electronic components that are resistant to strain include components in which the characteristics of the electronic component are not easily affected by the strain, and components that are less susceptible to the distortion due to the large contact area with the circuit board 2.
The second region 22 is a region where the allowable value for the distortion of the circuit board 2 is smaller than that of the first region 21, in other words, a region where the distortion needs to be suppressed smaller than that of the first region 21. This second
In the region 22, electronic components that are easily affected by distortion of the circuit board 2, such as ceramic capacitors, are mounted. The electronic components that are easily affected by the strain include components that are susceptible to the distortion of the characteristics of the electronic components and components that are easily affected by the distortion due to the small contact area with the circuit board 2.

分割部3は、隣り合う2つの回路基板2の境界に位置し、回路基板2を切り離すときに分割の基点となる領域である。なお、分割部3は、回路基板2の分割後には各回路基板2の側部に残されるが、分割後に機械処理を行って回路基板2から取り除いても良い。   The dividing unit 3 is an area that is located at a boundary between two adjacent circuit boards 2 and serves as a base point of division when the circuit board 2 is separated. The dividing unit 3 is left on the side of each circuit board 2 after the circuit board 2 is divided, but may be removed from the circuit board 2 by performing mechanical processing after the division.

この実施の形態で分割部3は、分割溝10が形成された第1の分割部31と、分割溝10に重なるように貫通孔11を複数設けた第2の分割部32とを有する。第1の分割部31は、回路基板2の第1の領域21に対応する位置に形成されている。具体的には、第1の領域21の長さ、この場合は第1の領域21の回路基板2の辺(図1及び図2の例では短辺)に平行な長さに、第1の分割部31の長さが略一致している。   In this embodiment, the dividing portion 3 includes a first dividing portion 31 in which the dividing groove 10 is formed and a second dividing portion 32 in which a plurality of through holes 11 are provided so as to overlap the dividing groove 10. The first division portion 31 is formed at a position corresponding to the first region 21 of the circuit board 2. Specifically, the length of the first region 21, in this case, the length parallel to the side of the circuit board 2 of the first region 21 (short side in the example of FIGS. 1 and 2) The lengths of the division parts 31 are substantially the same.

第1の分割部31が有する分割溝10は、回路基板2の辺(図1及び図2の例では短辺)に平行に延びており、その断面が集合基板1の基板本体の板材の板厚を減少させるV字形になっている。分割溝10は、集合基板1の表面側と裏面側のそれぞれに1本ずつ形成されており、その形成位置は表面側と裏面側で略一致させてある。したがって、分割溝10の底部が最も板厚が小さい部分であり、ここが回路基板2が切り離されるライン、即ち分割ラインLdになる。なお、分割溝10の断面形状は、その断面が矩形やU字形など、外力で回路基板2を容易に切り離せる形状であれば良い。また、分割溝10は、表面又は裏面のいずれか一方のみに形成しても良い。   The dividing groove 10 included in the first dividing portion 31 extends in parallel with the side of the circuit board 2 (short side in the example of FIGS. 1 and 2), and the cross section thereof is a plate of the plate body of the substrate body of the collective substrate 1. V-shaped to reduce the thickness. One dividing groove 10 is formed on each of the front surface side and the back surface side of the collective substrate 1, and the formation positions thereof are substantially matched on the front surface side and the back surface side. Therefore, the bottom of the dividing groove 10 is the portion with the smallest plate thickness, and this is a line from which the circuit board 2 is cut, that is, the dividing line Ld. In addition, the cross-sectional shape of the division | segmentation groove | channel 10 should just be the shape which can cut off the circuit board 2 easily by external force, such as a rectangle and a U shape. Moreover, you may form the division | segmentation groove | channel 10 only in any one of a surface or a back surface.

図2及び図3に示すように、第1の分割部31の断面積SVは、分割線Ldを通り、回路基板2の表面に垂直な平面において、分割溝10により減少させられた基板本体の板厚tsと、第1の分割部31の長さとで定義される長方形の面積に相当する。   As shown in FIGS. 2 and 3, the cross-sectional area SV of the first division portion 31 is reduced by the division grooves 10 in a plane passing through the division line Ld and perpendicular to the surface of the circuit board 2. This corresponds to a rectangular area defined by the plate thickness ts and the length of the first divided portion 31.

一方、図2に示すように、第2の分割部32は、回路基板2の第2の領域22に対応して配置されている。具体的には、第2の領域22の分割線Ldに平行な長さに第2の分割部32の長さが略一致している。なお、第2の分割部32の長さは、第2の領域の分割線Ldに平行な長さ以上であることが好ましい。
第2の分割部32も分割溝10が表面と裏面のそれぞれに1つずつ形成されており、分割溝10の形成位置で板厚が最も薄くなっている。これら分割溝10は、第1の分割部31と第2の分割部32とに共通する溝であることが好ましい。しかしながら、第1の分割部31と第2の分割部32のそれぞれに独立した分割溝10を設けても良い。
On the other hand, as shown in FIG. 2, the second dividing portion 32 is arranged corresponding to the second region 22 of the circuit board 2. Specifically, the length of the second division portion 32 substantially matches the length parallel to the division line Ld of the second region 22. In addition, it is preferable that the length of the 2nd division part 32 is more than the length parallel to the division line Ld of a 2nd area | region.
The second dividing portion 32 also has one dividing groove 10 formed on each of the front surface and the back surface, and the plate thickness is the thinnest at the position where the dividing groove 10 is formed. These dividing grooves 10 are preferably grooves common to the first dividing portion 31 and the second dividing portion 32. However, independent dividing grooves 10 may be provided in each of the first dividing portion 31 and the second dividing portion 32.

さらに、図2及び図4に示すように、第2の分割部32には、回路基板2の基板本体を貫通する貫通孔11が所定の間隔で複数形成されている。貫通孔11の径d11は、分割溝10の平面視のおける幅より大きくなっており、この貫通孔11によって分割線Ldを通り、回路基板2の表面に垂直な平面における第2の分割部32の断面積Smは第1の分割部31の断面積SVより少なくなっている。なお、貫通孔11の径d11は、分割溝10の幅と同じでも良いし、分割溝10の幅より狭くても良い。   Further, as shown in FIGS. 2 and 4, a plurality of through holes 11 penetrating the board body of the circuit board 2 are formed in the second divided portion 32 at a predetermined interval. The diameter d11 of the through hole 11 is larger than the width of the dividing groove 10 in a plan view. The second dividing portion 32 in a plane perpendicular to the surface of the circuit board 2 passes through the dividing line Ld by the through hole 11. Is smaller than the cross-sectional area SV of the first divided portion 31. The diameter d11 of the through hole 11 may be the same as the width of the dividing groove 10 or may be narrower than the width of the dividing groove 10.

第2の分割部32の断面積Smは、分割溝10により減少させられた基板本体の板厚tsと、第2の分割部32の長さで定義される長方形の面積に相当する断面積から、全ての貫通孔11の断面積を引いた値になる。このように、第2の分割部32は、分断面の断面積Smを第1の分割部SVより小さくすることで、回路基板2を個別に切り離すときに必要な力を減少させている。さらに、後に説明するように、集合基板1に熱を加えたときに第2の領域22の反りを低減させる効果も有する。   The cross-sectional area Sm of the second divided portion 32 is based on the cross-sectional area corresponding to the rectangular area defined by the plate thickness ts of the substrate body reduced by the dividing groove 10 and the length of the second divided portion 32. The value is obtained by subtracting the cross-sectional areas of all the through holes 11. As described above, the second divided portion 32 reduces the force required when individually separating the circuit boards 2 by making the sectional area Sm of the divided cross section smaller than that of the first divided portion SV. Furthermore, as will be described later, there is an effect of reducing the warpage of the second region 22 when heat is applied to the collective substrate 1.

ここで、断面積SVと断面積Smの和が分割部3の総断面積Sになる。この総断面積Sは、以下の式(1)に基づいて算出できる。   Here, the sum of the sectional area SV and the sectional area Sm is the total sectional area S of the dividing portion 3. The total cross-sectional area S can be calculated based on the following formula (1).

S=β/(δ×γ+α) (1) S = β / (δ × γ + α) (1)

Sは回路基板2の反り量が予め定められた基準値を満足するために必要な分割部3の総断面積(mm)である。βは、回路基板2の総重量から求められる荷重(N)である。これは、同じ材料で製造された基板であれば、熱処理時の回路基板2の反り量が回路基板2の重量によって変化するためである。γは回路基板2の反り量の許容値(mm)であり、δは回路基板2の反り量に対する断面応力変化率(N/mm)、αは回路基板2の材料によって定まる定数である。 S is the total cross-sectional area (mm 2 ) of the division part 3 necessary for the amount of warpage of the circuit board 2 to satisfy a predetermined reference value. β is a load (N) obtained from the total weight of the circuit board 2. This is because if the substrates are made of the same material, the amount of warping of the circuit board 2 during the heat treatment changes depending on the weight of the circuit board 2. γ is an allowable value (mm) of the warp amount of the circuit board 2, δ is a cross-sectional stress change rate (N / mm 3 ) with respect to the warp amount of the circuit board 2, and α is a constant determined by the material of the circuit board 2.

断面応力変化率δ及び定数αは、図5に示すようなグラフを作成すると得られる。図5の横軸はリフロー工程後に回路基板2の反り量を計測した結果を示す。縦軸は、分割部3の断面に発生する応力値を示す。ここで、反り量は、回路基板2の端や中央で測定した結果の最大値に相当する。また、応力値は、例えば、分割部3の単位断面積(mm)あたりの回路基板2の基板重量を算出することで得られる。定数αは、図5に示すような反り量と応力値の関係を調べて直線近似し、回路基板2の反り量がゼロのときの応力値から求められる。断面応力変化率δは、図5の直線の傾きから求められる。 The cross-sectional stress change rate δ and the constant α can be obtained by creating a graph as shown in FIG. The horizontal axis of FIG. 5 shows the result of measuring the warpage amount of the circuit board 2 after the reflow process. The vertical axis represents the stress value generated in the cross section of the divided portion 3. Here, the warpage amount corresponds to the maximum value of the result of measurement at the end or center of the circuit board 2. Moreover, a stress value is obtained by calculating the board weight of the circuit board 2 per unit cross-sectional area (mm < 2 >) of the division part 3, for example. The constant α is obtained from the stress value when the warpage amount of the circuit board 2 is zero by examining the relationship between the warpage amount and the stress value as shown in FIG. The cross-sectional stress change rate δ is obtained from the slope of the straight line in FIG.

ここで、回路基板2の分割部3の総断面積Sの計算例を以下に示す。
分割部3の断面に発生する応力値が例えば8.65×10−3N/mm のときに、リフロー工程後の基板反り量は1.49mmであった。同様に、分割部3の断面に発生する応力値が7.40×10−3N/mm のときに、リフロー工程後の基板反り量は1.16mmであった。さらに、分割部の断面に発生する応力値が6.48×10−3N/mm のときに、リフロー工程後の基板反り量は0.96mmであった。これらのデータに基づいて直線近似を行うと断面応力変化率δは4.1×10−3N/mm となり、定数αは、2.5×10−3N/mm になる。
Here, a calculation example of the total cross-sectional area S of the division part 3 of the circuit board 2 is shown below.
When the stress value generated in the cross section of the divided portion 3 is, for example, 8.65 × 10 −3 N / mm 2 , the amount of substrate warpage after the reflow process is 1.49 mm . Similarly, when the stress value generated in the cross section of the divided portion 3 is 7.40 × 10 −3 N / mm 2 , the amount of warpage of the substrate after the reflow process is 1.16 mm . Furthermore, when the stress value generated in the cross section of the divided portion was 6.48 × 10 −3 N / mm 2 , the amount of warpage of the substrate after the reflow process was 0.96 mm. When linear approximation is performed based on these data, the cross-sectional stress change rate δ is 4.1 × 10 −3 N / mm 3 and the constant α is 2.5 × 10 −3 N / mm 2 .

例えば、回路基板2の荷重βが1.56Nで、反り許容値γが1mmのときは、式(1)にこれらの値を代入し、前記した断面応力変化率δ及び定数αを用いて計算すると、総断面積Sは240mになる。すなわち、分割部3の総断面積Sを240mにすれば、回路基板2の反り量を1mmに抑えることができる。
なお、回路基板2の荷重βやその他条件が同じで、反り許容値γが1.2mmのときは、総断面積Sを210mにすれば良い。反り許容値γが1.5mmのときは、総断面積Sを180mにすれば良い
For example, when the load β of the circuit board 2 is 1.56 N and the allowable warpage value γ is 1 mm , these values are substituted into the equation (1), and calculation is performed using the above-described cross-sectional stress change rate δ and the constant α. Then, the total cross-sectional area S becomes 240 mm 2 . That is, if the total cross-sectional area S of the divided portion 3 to 24 0 m m 2, it is possible to suppress the warpage of the circuit board 2 to 1 mm.
Incidentally, the load β and other conditions of the circuit board 2 are the same, when the warpage tolerance γ is 1.2 mm, it may be a total cross-sectional area S to 21 0 m m 2. When warpage tolerance γ is 1.5 mm, it may be a total cross-sectional area S to 18 0 m m 2.

ここで、第2の分割部32における貫通孔11の数及び径d11の決定プロセスについて説明する。2つの分割部31,32で分割ラインLd上の板厚tsは同じであり、第1の分割部31の長さと第2の分割部32の長さの和は一定である。このため、第1の分割部31と第2の分割部32の比率から第1の分割部31の長さが決まれば、S=SV+Smから第2の分割部32の断面積Smが求められる。さらに、
(断面積Sm)=(板厚ts)×(第2の分割部32の長さ)−(貫通孔11の断面積の和)
であることから、総断面積Sから貫通孔11によって減少させるべき断面積の値を求めることができる。各貫通孔11の径d11が一定の場合、
(貫通孔11の断面積の和)=(板厚ts)×(貫通孔11の径d11)×(貫通孔1
1の数)
なので、貫通孔11の数に応じて貫通孔11の径d11が求まる。
Here, the process of determining the number of through holes 11 and the diameter d11 in the second divided portion 32 will be described. The two divided portions 31 and 32 have the same thickness ts on the dividing line Ld, and the sum of the length of the first divided portion 31 and the length of the second divided portion 32 is constant. For this reason, if the length of the 1st division part 31 is determined from the ratio of the 1st division part 31 and the 2nd division part 32, the cross-sectional area Sm of the 2nd division part 32 will be calculated from S = SV + Sm. further,
(Cross sectional area Sm) = (plate thickness ts) × (length of second divided portion 32) − (sum of cross sectional areas of through-holes 11)
Therefore, the value of the cross-sectional area to be reduced by the through hole 11 can be obtained from the total cross-sectional area S. When the diameter d11 of each through hole 11 is constant,
(Sum of cross-sectional area of through-hole 11) = (plate thickness ts) × (diameter d11 of through-hole 11) × (through-hole 1
Number of 1)
Therefore, the diameter d11 of the through hole 11 is obtained according to the number of the through holes 11.

また、同じ反り許容値γでは、第2の分割部32が相対的に長い場合には総断面積Sを満たすように貫通孔11の断面積の和を増大させる。つまり、貫通孔11の数と貫通孔11の径d11の少なくとも一方を増加させる。これに対し、反り許容値γが同じで第2の分割部32が相対的に短い場合は、総断面積Sを満たすように貫通孔11の断面積の和を減少させる。つまり、貫通孔11の数と貫通孔11の径d11の少なくとも一方を少なくする。   Further, at the same warp tolerance γ, the sum of the cross-sectional areas of the through holes 11 is increased so as to satisfy the total cross-sectional area S when the second divided portion 32 is relatively long. That is, at least one of the number of through holes 11 and the diameter d11 of the through holes 11 is increased. On the other hand, when the warp allowable value γ is the same and the second divided portion 32 is relatively short, the sum of the cross-sectional areas of the through holes 11 is reduced so as to satisfy the total cross-sectional area S. That is, at least one of the number of through holes 11 and the diameter d11 of the through holes 11 is reduced.

なお、貫通孔11の数は、1つ以上であれば良い。貫通孔11の数が1つの場合は、貫通孔11の径d11が最も大きくなり、長円形になる。また、同じ断面積Smの場合は、貫通孔11の数が増えるに従って、貫通孔11の径d11が小さくなる。ここで、貫通孔11を複数有する場合、各貫通孔11の径d11は同じであることが好ましく、各貫通孔11は略等間隔に配置されることが好ましい。このようにすると、集合基板1の製造が容易であると共に、第2の領域21にかかる応力を略均一にすることができる。しかしながら、貫通孔11ごとに径d11を変えたり、貫通孔11の配置間隔を場所によって変化させたりしても良い。   The number of through holes 11 may be one or more. When the number of the through holes 11 is one, the diameter d11 of the through hole 11 is the largest and becomes an oval shape. In the case of the same cross-sectional area Sm, the diameter d11 of the through hole 11 decreases as the number of the through holes 11 increases. Here, when it has two or more through-holes 11, it is preferable that the diameter d11 of each through-hole 11 is the same, and it is preferable that each through-hole 11 is arrange | positioned at substantially equal intervals. In this way, the collective substrate 1 can be easily manufactured, and the stress applied to the second region 21 can be made substantially uniform. However, the diameter d11 may be changed for each through hole 11, or the arrangement interval of the through holes 11 may be changed depending on the location.

次に、集合基板1に電子部品を実装し、各回路基板2に分割するまでの工程について説明する。
まず、樹脂製の基板本体の表面の所定位置に、導体を印刷又は貼り付けすることで導電性パターンを形成する。この後、隣り合う2つの回路基板2の境界に分割溝10又はスリット5を形成する。さらに、第2の分割部32には複数の貫通孔11を分離溝10に沿って形成する。これにより、回路基板2が多数配列された集合基板1が形成される。
Next, a process until the electronic component is mounted on the collective substrate 1 and divided into the circuit substrates 2 will be described.
First, a conductive pattern is formed by printing or affixing a conductor on a predetermined position on the surface of a resin substrate body. Thereafter, a dividing groove 10 or a slit 5 is formed at the boundary between two adjacent circuit boards 2. Further, a plurality of through holes 11 are formed in the second divided portion 32 along the separation groove 10. Thereby, the collective substrate 1 in which a large number of circuit boards 2 are arranged is formed.

続いて、電子部品等を回路基板2の導電性パターンの所定位置にロボットなどを用いて供給する。このとき、例えば、セラミックコンデンサなどは、第2の領域21の所定位置に配置される。次に、電子部品等を配置した集合基板1に対してリフロー工程を実施する。集合基板1がリフロー炉に導入されることで、電子部品等が回路基板2の導電性パターンに半田付けされる。   Subsequently, an electronic component or the like is supplied to a predetermined position of the conductive pattern of the circuit board 2 using a robot or the like. At this time, for example, a ceramic capacitor or the like is disposed at a predetermined position in the second region 21. Next, a reflow process is performed on the collective substrate 1 on which electronic components and the like are arranged. By introducing the collective board 1 into the reflow furnace, electronic components and the like are soldered to the conductive pattern of the circuit board 2.

この際、板厚tsが最も薄くなっている分割部3は、リフロー炉の熱の影響で集合基板1を変形させ易くなっている。特に、貫通孔11によって断面積を減少させられている第2の分割部32の周囲がより変形し易くなっている。しかしながら、前記したように、回路基板2の反り量が許容値γになるときの総断面積Sを満たすように、断面積SV及び断面積Smが形成されているので、リフロー工程における回路基板2の反り量がγに抑えられる。これにより、回路基板2上の電子部品、特に第2の領域22に配置された電子部品が歪の影響を受け難くなる。   At this time, the dividing portion 3 having the thinnest plate thickness ts easily deforms the collective substrate 1 due to the influence of heat of the reflow furnace. In particular, the periphery of the second divided portion 32 whose cross-sectional area is reduced by the through hole 11 is more easily deformed. However, as described above, since the cross-sectional area SV and the cross-sectional area Sm are formed so as to satisfy the total cross-sectional area S when the warpage amount of the circuit board 2 reaches the allowable value γ, the circuit board 2 in the reflow process is formed. Is suppressed to γ. As a result, the electronic components on the circuit board 2, particularly the electronic components arranged in the second region 22, are not easily affected by the distortion.

リフロー工程後は、集合基板1を分割線Ldで分割する。これにより、図6に示すように、個々の回路基板2に分割される。この回路基板2は、第1の領域21に歪の影響を受け難い電子部品41が実装され、第2の領域22に歪の影響を受けやすい電子部品42が実装された、実装基板である。基板分割に際しては、分割部3によって隣り合う回路基板
2が容易に分割される。第2の領域22の近傍では、第2の分割部32によって連結部分の断面積が第1の分割部31より小さくなっているので、分割し易い。このため、第2の領域22の歪が第1の領域21より小さくなり、電子部品や電子部品と回路基板2との接続箇所にかかる負荷が低減される。
After the reflow process, the aggregate substrate 1 is divided by the dividing line Ld. Thereby, as shown in FIG. 6, it divides | segments into each circuit board 2. As shown in FIG. The circuit board 2 is a mounting board in which an electronic component 41 that is hardly affected by strain is mounted in the first region 21 and an electronic component 42 that is easily affected by strain is mounted in the second region 22. When dividing the substrate, the adjacent circuit boards 2 are easily divided by the dividing unit 3. In the vicinity of the second region 22, since the cross-sectional area of the connecting portion is smaller than that of the first divided portion 31 by the second divided portion 32, it is easy to divide. For this reason, the distortion of the 2nd field 22 becomes smaller than the 1st field 21, and the load concerning the connection location of an electronic component or an electronic component, and circuit board 2 is reduced.

ここで、本実施の形態に係る集合基板1と、貫通孔11を有しない他は同じ条件で製造した比較用の基板のそれぞれについて、熱処理時の基板の反り量と、基板分割時の歪を計測してみた。その結果、集合基板1の反り量の最大値は0.84mmであり、分割後に測定した歪量は638μstであった。これに対し、比較用の基板の反り量の最大値は1.49mmであり、分割後に測定した歪量は688μstであった。この結果から、集合基板1は、貫通孔11を有しない比較用の基板と比較して、基板の反り量が大幅に改善されたことがわかる。なお、分割後に測定した歪量は、集合基板1の方が小さく抑えられている。これは、貫通孔11によって集合基板1の断面積が比較用の基板より少ないためであると考えられる。   Here, with respect to each of the collective substrate 1 according to the present embodiment and a comparative substrate manufactured under the same conditions except that the through-hole 11 is not provided, the amount of warpage of the substrate during heat treatment and the distortion during substrate division are calculated. I measured it. As a result, the maximum value of the warpage amount of the aggregate substrate 1 was 0.84 mm, and the strain amount measured after the division was 638 μst. On the other hand, the maximum value of the warp amount of the comparative substrate was 1.49 mm, and the strain amount measured after the division was 688 μst. From this result, it can be seen that the amount of warpage of the aggregate substrate 1 is significantly improved as compared with the comparative substrate having no through hole 11. Note that the amount of strain measured after the division is smaller in the collective substrate 1. This is probably because the cross-sectional area of the collective substrate 1 is smaller than that of the comparative substrate due to the through holes 11.

以上、説明したように、この実施の形態では、集合基板1の分割部3に第1の分割部31と第2の分割部32を設け、分割線Ld上の第2の分割部32の断面積Smを貫通孔11を複数形成することによって第1の分割部31の断面積SVより小さくしたので、回路基板2を分離するときに第2の分割部32の近傍の回路基板2の歪を低減できる。これにより、回路基板2の第2の領域22において回路基板2の歪による電子部品の接触不良等を防止できる。
さらに、回路基板2の歪を抑制できるような分割部3において、熱処理後の集合基板1の反り量が予め定めた許容値γになるように、第2の分割部32の分割線Ld上の総断面積S、つまり断面積SV及び断面積Smを決定したので、熱処理時に伴う基板変形を所望の値に制御することができる。これにより、回路基板2の第2の領域22において基板の反りによる電子部品の接触不良を防止できる。また、回路基板2の反りが所定の値に制御されることで、検査ポイントがずれることなくスムーズに検査を実施できる。
As described above, in this embodiment, the first dividing unit 31 and the second dividing unit 32 are provided in the dividing unit 3 of the collective substrate 1 so that the second dividing unit 32 on the dividing line Ld is disconnected. Since the area Sm is made smaller than the cross-sectional area SV of the first divided portion 31 by forming the plurality of through-holes 11, the distortion of the circuit board 2 in the vicinity of the second divided portion 32 is reduced when the circuit board 2 is separated. Can be reduced. Thereby, in the 2nd area | region 22 of the circuit board 2, the contact failure etc. of the electronic component by the distortion of the circuit board 2 can be prevented.
Further, in the dividing unit 3 that can suppress the distortion of the circuit board 2, the warping amount of the aggregate substrate 1 after the heat treatment is set to a predetermined allowable value γ on the dividing line Ld of the second dividing unit 32. Since the total cross-sectional area S, that is, the cross-sectional area SV and the cross-sectional area Sm are determined, the substrate deformation accompanying the heat treatment can be controlled to a desired value. Thereby, in the 2nd area | region 22 of the circuit board 2, the contact failure of the electronic component by the curvature of a board | substrate can be prevented. In addition, since the warp of the circuit board 2 is controlled to a predetermined value, the inspection can be performed smoothly without shifting the inspection point.

なお、本発明は、実施の形態に限定されずに広く応用することが可能である。
例えば、許容値γは、1つの値として計算したが、許容値γを反り量の範囲として規定しても良い。例えば、反り量の許容値γを0.0mm〜1.0mmの範囲とした場合、γ=0.0mmのときの総断面積をS1、γ=1.0mmのときの総断面積をS2とすると、S(=SV+Sm)は、S1以上、S2以下の値を取り得る。
Note that the present invention is not limited to the embodiments and can be widely applied.
For example, the allowable value γ is calculated as one value, but the allowable value γ may be defined as the range of the warp amount. For example, when the allowable value γ of the warp amount is in the range of 0.0 mm to 1.0 mm, the total cross-sectional area when γ = 0.0 mm is S1, and the total cross-sectional area when γ = 1.0 mm is S2. Then, S (= SV + Sm) can take a value not less than S1 and not more than S2.

この場合、リフロー工程では、熱による回路基板2の反りが許容値γの範囲に収まる。反りに起因する不良を抑制できる。さらに、検査ポイントの位置ずれが予め想定された範囲内に収まるので、検査を効率良く実施できる。また、回路基板2を分離させるときは、第2の分割部32の存在によって回路基板2の第2の領域22の歪が抑えられる。   In this case, in the reflow process, the warp of the circuit board 2 due to heat falls within the allowable value γ. Defects caused by warpage can be suppressed. Further, since the positional deviation of the inspection point is within a range assumed in advance, the inspection can be performed efficiently. In addition, when the circuit board 2 is separated, the distortion of the second region 22 of the circuit board 2 is suppressed by the presence of the second division part 32.

1 集合基板
2 回路基板
3 分割部
10 分割溝
11 貫通孔
21 第1の領域
22 第2の領域
31 第1の分割部
32 第2の分割部
Lb 分割線
DESCRIPTION OF SYMBOLS 1 Collective substrate 2 Circuit board 3 Dividing part 10 Dividing groove 11 Through-hole 21 1st area | region 22 2nd area | region 31 1st dividing part 32 2nd dividing part Lb Dividing line

Claims (2)

電子部品を実装可能な回路基板を複数有し、前記回路基板が個々に分割可能に連結された集合基板であって、
前記回路基板は前記電子部品を実装可能な領域として、第1の領域と、前記第1の領域に実装される前記電子部品より歪に対する許容量が小さい前記電子部品が実装される第2の領域とを有し、隣り合う前記回路基板の前記第1の領域間及び第2の領域間に形成された分割部は、分離溝が前記回路基板を分割するときの分離線に沿って設けられると共に、前記第2の領域間には、前記分割部を貫通する貫通孔を形成し
前記回路基板の反り量の許容値をγ、前記回路基板の総重量から求められる荷重をβ、前記回路基板の反り量と、その反り量を戻すのに要する応力の関係を直線近似したときの直線の傾きをδ、前記直線において反り量を0としたときに算出される応力の値をαとしたとき、前記分割部において前記貫通孔が形成されていない第1の分割部の前記分離線上の断面積と、前記貫通孔が形成された第2の分割部の前記分離線上の断面積との和である総断面積Sは、
S=β/(δ×γ+α)
を満たすことを特徴とする集合基板。
A plurality of circuit boards on which electronic components can be mounted, and the circuit boards are connected to each other so that they can be divided individually.
The circuit board has a first region as a region where the electronic component can be mounted, and a second region where the electronic component having a smaller tolerance for distortion than the electronic component mounted in the first region is mounted. And divided portions formed between the first regions and between the second regions of the adjacent circuit boards are provided along separation lines when the separation grooves divide the circuit board. , Between the second regions, forming a through-hole penetrating the divided portion ,
When the allowable value of the warp amount of the circuit board is γ, the load obtained from the total weight of the circuit board is β, and the relationship between the warp amount of the circuit board and the stress required to return the warp amount is linearly approximated Assuming that the slope of the straight line is δ and the stress value calculated when the amount of warpage in the straight line is 0 is α, on the separation line of the first divided portion where the through hole is not formed in the divided portion. And the total cross-sectional area S which is the sum of the cross-sectional area on the separation line of the second divided portion in which the through hole is formed,
S = β / (δ × γ + α)
A collective board characterized by satisfying
前記分離溝は表面側と裏面側のそれぞれに設けられ、前記貫通孔は等間隔に複数形成されていることを特徴とする請求項1に記載の集合基板。 The aggregate substrate according to claim 1, wherein the separation groove is provided on each of the front surface side and the back surface side, and a plurality of the through holes are formed at equal intervals.
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