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JP5540705B2 - Temperature control device, temperature control method, and program thereof - Google Patents
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JP5540705B2 - Temperature control device, temperature control method, and program thereof - Google Patents

Temperature control device, temperature control method, and program thereof Download PDF

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JP5540705B2
JP5540705B2 JP2009544704A JP2009544704A JP5540705B2 JP 5540705 B2 JP5540705 B2 JP 5540705B2 JP 2009544704 A JP2009544704 A JP 2009544704A JP 2009544704 A JP2009544704 A JP 2009544704A JP 5540705 B2 JP5540705 B2 JP 5540705B2
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祐輔 塚原
栄二 川田
雅彦 天野
展雄 佐々木
祐輔 中村
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Toppan Inc
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01LCHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L7/00Heating or cooling apparatus; Heat insulating devices
    • B01L7/52Heating or cooling apparatus; Heat insulating devices with provision for submitting samples to a predetermined sequence of different temperatures, e.g. for treating nucleic acid samples
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01LCHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00Control of temperature
    • G05D23/19Control of temperature characterised by the use of electric means
    • G05D23/1927Control of temperature characterised by the use of electric means using a plurality of sensors
    • G05D23/193Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces
    • G05D23/1931Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces to control the temperature of one space
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00Control of temperature
    • G05D23/19Control of temperature characterised by the use of electric means
    • G05D23/20Control of temperature characterised by the use of electric means with sensing elements having variation of electric or magnetic properties with change of temperature
    • G05D23/24Control of temperature characterised by the use of electric means with sensing elements having variation of electric or magnetic properties with change of temperature the sensing element having a resistance varying with temperature, e.g. a thermistor
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    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00781Aspects relating to microreactors
    • B01J2219/00873Heat exchange
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00781Aspects relating to microreactors
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    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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    • B01L2200/00Solutions for specific problems relating to chemical or physical laboratory apparatus
    • B01L2200/14Process control and prevention of errors
    • B01L2200/143Quality control, feedback systems
    • B01L2200/147Employing temperature sensors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01LCHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B01L3/502715Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by interfacing components, e.g. fluidic, electrical, optical or mechanical interfaces

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Description

本発明は、温度制御装置、温度制御方法、ならびにそのプログラムに関する。
本願は、2007年12月07日に、日本に出願された特願2007−317159号に基づき優先権を主張し、その内容をここに援用する。
The present invention relates to a temperature control device, a temperature control method, and a program thereof.
This application claims priority on December 07, 2007 based on Japanese Patent Application No. 2007-317159 for which it applied to Japan, and uses the content here.

デオキシリボ核酸(DNA)を増幅させるための技術としてポリメラーゼ連鎖反応法(PCR)が存在する。このPCR法は、DNAを含む水溶液の温度を周期的に上下させることにより、短時間でDNAを増幅させることができる技術である。ところで、このPCR法を用いて、DNAの任意の断片の増幅を正確に行うためには、水溶液中の温度管理を厳格に行わなければならない。   Polymerase chain reaction (PCR) exists as a technique for amplifying deoxyribonucleic acid (DNA). This PCR method is a technique capable of amplifying DNA in a short time by periodically raising and lowering the temperature of an aqueous solution containing DNA. By the way, in order to accurately amplify an arbitrary fragment of DNA using this PCR method, temperature control in an aqueous solution must be strictly performed.

ここで、温度の推定技術として、特許文献1および特許文献2が開示されている。特許文献1の技術は、ごみ焼却炉の燃焼路、とりわけ流動床炉を制御するためのガス温度推定方法である。この方法に基づいて、燃焼時間が数十秒である流動床路への空気供給量等の制御を行う。この方法では、温度測定の時間遅れが1〜2分程ある熱電対を用い、システム演算処理により算出された熱電対の測定温度に基づいて、カルマンフィルタリング部により熱電対による測定遅れを補償したガス温度を推定し、ごみ焼却炉の燃焼状態にマッチさせる。
また、特許文献2の技術は、被験者の体温を測定し、温度測定値をS字曲線、例えばロジスティック曲線で近似することで、被験者から採血を行わずに高精度で血中グルコース濃度を求める方法である。
特許第3424024号公報 特許第3874743号公報
Here, Patent Literature 1 and Patent Literature 2 are disclosed as temperature estimation techniques. The technique of Patent Document 1 is a gas temperature estimation method for controlling a combustion path of a waste incinerator, particularly a fluidized bed furnace. Based on this method, the amount of air supplied to the fluidized bed passage having a combustion time of several tens of seconds is controlled. In this method, a thermocouple having a time delay of temperature measurement of about 1 to 2 minutes is used, and a gas in which the measurement delay due to the thermocouple is compensated by the Kalman filtering unit based on the measured temperature of the thermocouple calculated by the system calculation process. Estimate the temperature and match the combustion state of the waste incinerator.
Further, the technique of Patent Document 2 is a method for measuring a subject's body temperature and approximating a temperature measurement value with an S-shaped curve, for example, a logistic curve, thereby obtaining a blood glucose concentration with high accuracy without collecting blood from the subject. It is.
Japanese Patent No. 3424024 Japanese Patent No. 3874743

ところで、上述のPCR法における水溶液中の温度の推定においては、その測定対象の特徴を考慮する必要がある。すなわち、上記PCR法における水溶液中の温度の測定においては、温度測定の対象物の測定面積が小さなキャビティ(水溶液の注入された小さな空間)であり、測定対象が小さい。また、従来の(例えばサーモグラフィなど)技術による温度測定では、その対象物の表面温度が測定されるのみであり、PCR法のように水溶液内部のDNA付近の温度を測定するというように、測定対象物の内部温度を推定することはできない。また、キャビティ内に極細の熱電対などの温度計を設けて水溶液内部の温度を測定することも考えられるが、DNAという熱に対して脆弱な物質が含まれる水溶液中に熱電対を入れることは好ましくない。   By the way, in the estimation of the temperature in the aqueous solution in the above-mentioned PCR method, it is necessary to consider the characteristics of the measurement object. That is, in the measurement of the temperature in the aqueous solution in the PCR method, the measurement area of the temperature measurement object is a small cavity (small space into which the aqueous solution is injected), and the measurement object is small. Moreover, in the temperature measurement by the conventional technique (for example, thermography), only the surface temperature of the object is measured, and the temperature in the vicinity of DNA in the aqueous solution is measured as in the PCR method. The internal temperature of an object cannot be estimated. It is also conceivable to measure the temperature inside the aqueous solution by installing a thermometer such as an ultrafine thermocouple in the cavity, but placing a thermocouple in an aqueous solution containing a substance that is vulnerable to heat called DNA It is not preferable.

そこでこの発明は、小さく脆い物質が含まれる測定対象物の内部温度を、外部温度から推定することのできる、化学反応用チップ、温度制御装置および温度制御方法ならびにそのプログラムを提供することを目的の一つとしている。   Accordingly, an object of the present invention is to provide a chip for chemical reaction, a temperature control device, a temperature control method, and a program thereof that can estimate the internal temperature of a measurement object containing a small and brittle substance from the external temperature. It is one.

(1)上記目的を達成するために、本発明の一態様は、下板部と、前記下板部の面に接合される上板部と、前記下板部と前記上板部の間に設けられたキャビティとを有し、外部より加熱および冷却することにより前記キャビティ内に収容された反応物の化学反応に用いる化学反応用チップであって前記キャビティの下側外部接点の温度を計測する下部温度計測素子と、前記上板部の前記下部温度計測素子から垂直方向の前記キャビティの上側外部接点の温度を計測する上部温度計測素子とにより構成される化学反応用チップ、に収容された前記反応物前記加熱及び前記冷却を繰り返す温度制御を行う温度制御部と、前記下部温度計測素子及び前記上部温度計測素子に接続され、温度推定アルゴリズムを用いて前記化学反応用チップに収納された反応物の温度推定を行う温度推定部とを備え、前記温度推定部は、温度推定アルゴリズムを用いて、前記下部温度計測素子及び前記上部温度計測素子から得られた計測結果の時系列データであって、前記化学反応用チップの前記キャビティへの外部からの加熱および冷却を繰り返す際の時系列データをそれぞれフーリエ変換して周波数成分を求め、前記周波数成分を用いて前記化学反応用チップの内部の時系列の温度を推定することを特徴とする温度制御装置である。 (1) In order to achieve the above object, one embodiment of the present invention includes a lower plate portion, an upper plate portion joined to a surface of the lower plate portion, and between the lower plate portion and the upper plate portion. A chip for chemical reaction used for a chemical reaction of a reactant contained in the cavity by heating and cooling from the outside, and measuring a temperature of a lower external contact of the cavity The chemical reaction chip comprised of a lower temperature measuring element and an upper temperature measuring element for measuring the temperature of the upper external contact of the cavity in the vertical direction from the lower temperature measuring element of the upper plate part, is housed in the chip a temperature control unit for controlling the temperature of repeating the heating and the cooling of the reaction product, is connected to the lower temperature measuring element and the upper temperature measuring element, it is housed in the chemical reaction chip using a temperature estimation algorithm Was Bei example a temperature estimating section, the performing temperature estimation of the reactants, the temperature estimation unit by using the temperature estimation algorithm, the time series of the lower temperature measuring element and the upper temperature measurement measurement results obtained from the device The frequency component is obtained by Fourier transforming each time-series data when repeating heating and cooling from the outside to the cavity of the chemical reaction chip, and using the frequency component, the chemical reaction chip It is a temperature control apparatus characterized by estimating the time series temperature inside .

(2)上記の温度制御装置は、以下のように構成されてもよい:前記温度推定部は、温度推定アルゴリズムを用いて、前記下部温度計測素子及び前記上部温度計測素子から得られた計測結果の時系列データであって、前記化学反応用チップの前記キャビティへの外部からの加熱および冷却を繰り返す際の時系列データをそれぞれフーリエ変換して周波数成分を求め、前記上側外部接点と前記下側外部接点を繋ぐ直線上における前記上板部の厚さd1、前記キャビティ内の所定の温度推定点と前記上側外部接点の距離から前記厚さd1を減じた厚さd2、前記下板部の厚さd4、前記温度推定点と前記下側外部接点の距離から前記板部の厚さd4を減じた厚さd3としたときの、厚さd1と厚さd2とをつなぐ温度の伝達行列と、厚さd2と厚さd3とをつなぐ温度の伝達行列と、厚さd3と厚さd4とをつなぐ温度の伝達行列と、厚さd1から厚さd3をつなぐ温度の伝達行列と、厚さd1から厚さd4とをつなぐ温度の伝達行列と、前記下部温度計測素子及び前記上部温度計測素子から得られた計測結果の時系列データをそれぞれフーリエ変換して得た周波数成分と、を用いて前記温度推定点の温度を推定する。 (2) The above temperature control device may be configured as follows: the temperature estimation unit uses a temperature estimation algorithm, and a measurement result obtained from the lower temperature measurement element and the upper temperature measurement element Each of the time series data when the heating and cooling from the outside to the cavity of the chemical reaction chip are repeated by Fourier transform to obtain frequency components, the upper external contact and the lower side The thickness d1 of the upper plate portion on the straight line connecting the external contacts, the thickness d2 obtained by subtracting the thickness d1 from the distance between the predetermined temperature estimation point in the cavity and the upper external contact point, the thickness of the lower plate portion A transfer matrix of temperature connecting the thickness d1 and the thickness d2 when the thickness d3 is obtained by subtracting the thickness d4 of the plate portion from the distance between the temperature estimation point and the lower external contact; Thickness d2 and thickness a temperature transfer matrix connecting d3, a temperature transfer matrix connecting thickness d3 and thickness d4, a temperature transfer matrix connecting thickness d1 to thickness d3, and thickness d1 to thickness d4. The temperature transfer point matrix and the frequency components obtained by Fourier transforming the time series data of the measurement results obtained from the lower temperature measurement element and the upper temperature measurement element, respectively, are used to calculate the temperature of the temperature estimation point. presume.

(3)上記の温度制御装置は、以下のように構成されてもよい:前記温度推定部によって得られる温度推定値と、予め記録された前記反応物の希望温度とに基づいて、前記温度推定値を、前記希望温度へ近づけるように加熱および冷却の温度制御を行う温度制御部を更に備えることを特徴とする。 (3) The above temperature control apparatus may be configured as follows: based on the temperature estimated value obtained by the temperature estimating unit and the desired temperature of the reactant recorded in advance, the temperature estimation A temperature control unit is further provided for performing temperature control of heating and cooling so that the value approaches the desired temperature.

(4)また、本発明の別の一態様は、下板部と、前記下板部の面に接合される上板部と、前記下板部と前記上板部の間に設けられたキャビティとを有し、外部より加熱および冷却することにより前記キャビティ内に収容された反応物の化学反応に用いる化学反応用チップであって前記キャビティの下側外部接点の温度を計測する下部温度計測素子と、前記上板部の前記下部温度計測素子から垂直方向の前記キャビティの上側外部接点の温度を計測する上部温度計測素子とにより構成される化学反応用チップ、に収容された前記反応物の前記加熱及び前記冷却を繰り返す温度制御を行い、前記化学反応用チップの下部の温度を測定し、前記化学反応用チップの上部の温度を測定し、前記下部温度計測素子及び前記上部温度計測素子に接続され、温度推定アルゴリズムを用いて前記化学反応用チップに収納された反応物の温度推定を行うにあたり、温度推定アルゴリズムを用いて、前記下部温度計測素子及び前記上部温度計測素子から得られた計測結果の時系列データであって、前記化学反応用チップの前記キャビティへの外部からの加熱および冷却を繰り返す際の時系列データをそれぞれフーリエ変換して周波数成分を求め、前記周波数成分を用いて前記化学反応用チップの内部の時系列の温度を推定することを特徴とする温度制御方法である。 (4) Moreover, another one aspect | mode of this invention is a cavity provided between the lower board part, the upper board part joined to the surface of the said lower board part, and the said lower board part and the said upper board part. And a lower temperature measuring element for measuring the temperature of a lower external contact of the cavity, which is used for a chemical reaction of a reactant contained in the cavity by heating and cooling from the outside. And a chemical reaction chip configured to measure the temperature of the upper external contact of the cavity in the vertical direction from the lower temperature measuring element of the upper plate part, Perform temperature control that repeats heating and cooling, measure the temperature of the lower part of the chip for chemical reaction , measure the temperature of the upper part of the chip for chemical reaction, and connect to the lower temperature measuring element and the upper temperature measuring element And When estimating the temperature of the reactant stored in the chemical reaction chip using the degree estimation algorithm, the temperature estimation algorithm is used to obtain the measurement results obtained from the lower temperature measurement element and the upper temperature measurement element. Time series data when the heating and cooling from the outside to the cavity of the chemical reaction chip are repeated to obtain frequency components, and the frequency components are used for the chemical reaction. A temperature control method characterized by estimating a time-series temperature inside a chip .

(5)また、本発明の別の一態様は、温度制御装置のコンピュータを、下板部と、前記下板部の面に接合される上板部と、前記下板部と前記上板部の間に設けられたキャビティとを有し、外部より加熱および冷却することにより前記キャビティ内に収容された反応物の化学反応に用いる化学反応用チップであって前記キャビティの下側外部接点の温度を計測する下部温度計測素子と、前記上板部の前記下部温度計測素子から垂直方向の前記キャビティの上側外部接点の温度を計測する上部温度計測素子とにより構成される化学反応用チップ、に収容された前記反応物の前記加熱及び前記冷却を繰り返す温度制御を行う温度制御手段、前記下部温度計測素子及び前記上部温度計測素子に接続され、温度推定アルゴリズムを用いて前記化学反応用チップに収納された反応物の温度推定を行う温度推定手段、として機能させ、前記温度推定手段は、温度推定アルゴリズムを用いて、前記下部温度計測素子及び前記上部温度計測素子から得られた計測結果の時系列データであって、前記化学反応用チップの前記キャビティへの外部からの加熱および冷却を繰り返す際の時系列データをそれぞれフーリエ変換して周波数成分を求め、前記周波数成分を用いて前記化学反応用チップの内部の時系列の温度を推定することを特徴とするプログラムである。 (5) Moreover, another one aspect | mode of this invention is the computer of a temperature control apparatus, a lower board part, the upper board part joined to the surface of the said lower board part, the said lower board part, and the said upper board part A chip for chemical reaction used for a chemical reaction of a reactant contained in the cavity by heating and cooling from the outside, and a temperature of a lower external contact of the cavity Accommodated in a chip for chemical reaction composed of a lower temperature measuring element for measuring the temperature and an upper temperature measuring element for measuring the temperature of the upper external contact of the cavity in the vertical direction from the lower temperature measuring element of the upper plate portion Temperature control means for performing temperature control for repeating the heating and cooling of the reaction product, and connected to the lower temperature measuring element and the upper temperature measuring element, and for the chemical reaction using a temperature estimation algorithm Functioning as temperature estimation means for estimating the temperature of the reactant contained in the cup, the temperature estimation means using a temperature estimation algorithm, the measurement obtained from the lower temperature measurement element and the upper temperature measurement element Time series data of the results, each of the time series data when repeating the heating and cooling from the outside to the cavity of the chemical reaction chip to obtain a frequency component, using the frequency component It is a program characterized by estimating the time series temperature inside the chemical reaction chip.

本発明によれば、小さく脆い物質が含まれる測定対象物の内部温度を、外部温度から非接触で推定することが可能となる。   According to the present invention, it is possible to estimate the internal temperature of a measurement object containing a small and brittle substance from the external temperature in a non-contact manner.

図1Aは、本発明の一実施形態に係る化学反応用チップの構成を示す分解斜視図である。FIG. 1A is an exploded perspective view showing the configuration of a chemical reaction chip according to an embodiment of the present invention. 図1Bは、上記の化学反応用チップの構成を示す側面図である。FIG. 1B is a side view showing the configuration of the chemical reaction chip. 図2は、上記の化学反応用チップの拡大断面図である。FIG. 2 is an enlarged cross-sectional view of the chemical reaction chip. 図3は、温度制御装置の機能ブロック図である。FIG. 3 is a functional block diagram of the temperature control device. 図4は、温度制御装置の処理フローを示す図である。FIG. 4 is a diagram illustrating a processing flow of the temperature control device. 図5は、上側外部接点Aの計測温度の推移を示す図である。FIG. 5 is a diagram showing the transition of the measured temperature of the upper external contact A. As shown in FIG. 図6は、下側外部接点Cの計測温度の推移を示す図である。FIG. 6 is a diagram showing the transition of the measured temperature of the lower external contact C. 図7は、上側外部接点Aの計測温度、下側外部接点Cの計測温度および、水溶液中の点Bにおける推定温度を表すグラフである。FIG. 7 is a graph showing the measured temperature of the upper external contact A, the measured temperature of the lower external contact C, and the estimated temperature at point B in the aqueous solution.

符号の説明Explanation of symbols

1・・・上板部
2・・・下板部
3・・・水溶液注入孔
4・・・凹部
5・・・上部温度計測点(上部温度計測素子)
6・・・下部温度計測点(下部温度計測素子)
10・・・温度制御装置
11・・・入出力部
12・・・制御部
13・・・内部温度推定部
14・・・温度制御部
15・・・記憶部
DESCRIPTION OF SYMBOLS 1 ... Upper board part 2 ... Lower board part 3 ... Aqueous solution injection hole 4 ... Recessed part 5 ... Upper temperature measurement point (upper temperature measurement element)
6 ... Lower temperature measurement point (lower temperature measurement element)
DESCRIPTION OF SYMBOLS 10 ... Temperature control apparatus 11 ... Input-output part 12 ... Control part 13 ... Internal temperature estimation part 14 ... Temperature control part 15 ... Memory | storage part

以下、本発明の一実施形態による化学反応用チップおよび温度制御装置を図面を参照して説明する。
なお、本発明は、PCR法等、化学反応用チップの温度を繰り返し変化させる用途に適用できる。また、本発明は、化学反応用チップの温度を定められた一定の温度に保持する用途にも好適に適用できる。
図1A,1Bは同実施形態による化学反応用チップの構成を示す図である。
図1Aは化学反応用チップのチップ分解斜視図、図1Bは化学反応用チップの断面図である。これらの図には、上板部1(ポリプロピレンを含む)、下板部2(アルミニウムを含む)、水溶液の注入孔3、凹部4、上部温度計測素子5、及び下部温度計測素子6が図示されている。図1Aに示すように、化学反応用チップでは、上板部1と下板部2の対応する面が接合されている。上板部1にはDNA水溶液の注入孔3が2つ備えられている。また、下板部2には水溶液が溜まる凹部4が設けられている。また図1Bの断面図で示すように、下板部2の凹部4の下端部(下側外部接点C)にはこの接点の温度を計測する下部温度計測素子6(例えばサーミスタ、ペルティエ素子など)が備えられている。また、上板部1の上面の、下部温度計測素子6から垂直方向に沿った位置の上端部(上側外部接点A)にはこの接点の温度を計測する上部温度計測素子5(例えばサーミスタ、ペルティエ素子など)が備えられている。そして上部温度計測素子5と、下部温度計測素子6とは、この各素子の計測値の入力を受け付ける温度制御装置と信号接続されている。なお、図1A,図1Bにおいては下板部2に凹部がある構成が示されているが、上板部1に凹部を設け、上板部1と下板部2の構造を入れ替えた構成を用いてもよい。つまり、平板状のプレートにDNA水溶液が格納されるキャビティ(空間)が備えられた構造であればどのようなものでもよい。
Hereinafter, a chemical reaction chip and a temperature control device according to an embodiment of the present invention will be described with reference to the drawings.
In addition, this invention is applicable to the use which changes the temperature of the chip | tip for chemical reaction repeatedly, such as PCR method. Further, the present invention can also be suitably applied to an application for maintaining the temperature of the chemical reaction chip at a predetermined constant temperature.
1A and 1B are diagrams showing a configuration of a chemical reaction chip according to the embodiment.
1A is an exploded perspective view of a chip for chemical reaction, and FIG. 1B is a cross-sectional view of the chip for chemical reaction. In these drawings, an upper plate portion 1 (including polypropylene), a lower plate portion 2 (including aluminum), an aqueous solution injection hole 3, a recess 4, an upper temperature measuring element 5, and a lower temperature measuring element 6 are illustrated. ing. As shown in FIG. 1A, in the chip for chemical reaction, corresponding surfaces of the upper plate portion 1 and the lower plate portion 2 are joined. The upper plate part 1 is provided with two injection holes 3 for the DNA aqueous solution. The lower plate 2 is provided with a recess 4 in which an aqueous solution is accumulated. As shown in the cross-sectional view of FIG. 1B, a lower temperature measuring element 6 (for example, a thermistor, a Peltier element, etc.) that measures the temperature of this contact is provided at the lower end (lower external contact C) of the recess 4 of the lower plate part 2. Is provided. Further, an upper temperature measuring element 5 (for example, thermistor, Peltier) for measuring the temperature of this contact is provided at the upper end (upper external contact A) at a position along the vertical direction from the lower temperature measuring element 6 on the upper surface of the upper plate 1. Element). The upper temperature measurement element 5 and the lower temperature measurement element 6 are signal-connected to a temperature control device that receives input of measurement values of the elements. 1A and 1B show a configuration in which the lower plate portion 2 has a recess, but a configuration in which the upper plate portion 1 is provided with a recess and the structures of the upper plate portion 1 and the lower plate portion 2 are interchanged. It may be used. That is, any structure having a cavity (space) in which a DNA aqueous solution is stored in a flat plate may be used.

図2は化学反応用チップの拡大断面図である。
この図において、Aは図1A,図1Bで示した上部温度計測素子5が測定する上側外部接点である。Cは図1A,図1Bで示した下部温度計測素子6が測定する下側外部接点である。温度制御装置は、水溶液内部の温度推定点Bにおける温度を推定する。本実施形態においては、上板部1はポリプロピレン、下板部2はアルミニウムを材質としているが、これ以外の材質の組合せであっても良い。図2で示すように、上板部1の厚さをd1、下板部2の厚さをd4とする。凹部4の水溶液中の点Bは、上板部1からd2、下板部からd3の距離に位置する。なお、定常状態であれば、A点、B点、C点の各温度は時間によらず一定である。水溶液の温度TBは上板部1のA点における温度TAと、下板部2のC点における温度TCの中間となる。
FIG. 2 is an enlarged sectional view of the chemical reaction chip.
In this figure, A is an upper external contact measured by the upper temperature measuring element 5 shown in FIGS. 1A and 1B. C is a lower external contact measured by the lower temperature measuring element 6 shown in FIGS. 1A and 1B. The temperature control device estimates the temperature at the temperature estimation point B inside the aqueous solution. In the present embodiment, the upper plate portion 1 is made of polypropylene and the lower plate portion 2 is made of aluminum, but a combination of other materials may be used. As shown in FIG. 2, the thickness of the upper plate portion 1 is d1, and the thickness of the lower plate portion 2 is d4. The point B in the aqueous solution of the recess 4 is located at a distance of d2 from the upper plate portion 1 and d3 from the lower plate portion. In the steady state, the temperatures at points A, B, and C are constant regardless of time. The temperature TB of the aqueous solution is intermediate between the temperature TA at the point A of the upper plate portion 1 and the temperature TC at the point C of the lower plate portion 2.

図3は温度制御装置の機能ブロック図である。
この図が示すように温度制御装置10は、入出力部11、制御部12、内部温度推定部13、温度制御部14、記憶部15を備えている。ここで入出力部11は、上部温度計測素子5や、化学反応用チップの下部温度計測素子6から計測値温度の入力を受け付ける。また、制御部12は温度制御装置10の各処理部を制御する。また内部温度推定部13は、化学反応用チップの凹部に溜まった水溶液内部の温度を推定する。また温度制御部14(例えばヒーター、ヒートシンク、ペルティエ素子など)は、内部温度推定部13による温度推定の結果である温度推定値と、予め記録された水溶液内部の希望温度とに基づいて、フィードバック制御により加熱または冷却の温度制御を行い、温度推定値を、希望温度へ近づける。
また記憶部15は、温度推定アルゴリズムを用いて水溶液内部の温度推定を行う際のパラメータや、フィードバック制御により水溶液の内部温度の制御を行うためのパラメータ等を記憶している。
FIG. 3 is a functional block diagram of the temperature control device.
As shown in this figure, the temperature control device 10 includes an input / output unit 11, a control unit 12, an internal temperature estimation unit 13, a temperature control unit 14, and a storage unit 15. Here, the input / output unit 11 receives an input of the measured temperature from the upper temperature measuring element 5 or the lower temperature measuring element 6 of the chemical reaction chip. Further, the control unit 12 controls each processing unit of the temperature control device 10. The internal temperature estimation unit 13 estimates the temperature inside the aqueous solution accumulated in the recess of the chemical reaction chip. Further, the temperature control unit 14 (for example, a heater, a heat sink, a Peltier element, etc.) performs feedback control based on a temperature estimation value that is a result of temperature estimation by the internal temperature estimation unit 13 and a desired temperature inside the aqueous solution recorded in advance. To control the temperature of heating or cooling to bring the estimated temperature close to the desired temperature.
The storage unit 15 also stores parameters for estimating the temperature inside the aqueous solution using a temperature estimation algorithm, parameters for controlling the internal temperature of the aqueous solution using feedback control, and the like.

図4は温度制御装置の処理フローを示す図である。
次に温度制御装置10の処理フローについて説明する。なお、本実施形態における温度制御装置10の温度推定手法は、凹部4内部の水溶液の対流を無視して、上板部1、水溶液、下板部2を層状物質の熱伝導体とみなしている。
まず、DNAを含む水溶液を凹部4に注入した化学反応用チップに対し、PCR法に基づき、周期的な加熱・冷却を繰り返し行う。そして、この時、温度制御装置10の内部温度推定部13は、入出力部11を介して、上部温度計測素子5より上側外部接点Aの計測温度を、また下部温度計測素子6より下側外部接点Cの計測温度の入力を受け付ける。
FIG. 4 is a diagram showing a processing flow of the temperature control device.
Next, the processing flow of the temperature control apparatus 10 will be described. Note that the temperature estimation method of the temperature control device 10 in the present embodiment ignores the convection of the aqueous solution in the recess 4 and regards the upper plate portion 1, the aqueous solution, and the lower plate portion 2 as heat conductors of the layered material. .
First, periodic heating / cooling is repeatedly performed on the chemical reaction chip in which an aqueous solution containing DNA is injected into the recess 4 based on the PCR method. At this time, the internal temperature estimation unit 13 of the temperature control device 10 transmits the measurement temperature at the upper external contact A from the upper temperature measurement element 5 and the lower external from the lower temperature measurement element 6 via the input / output unit 11. The input of the measured temperature of the contact C is received.

図5は上側外部接点Aの計測温度の推移を示す図である。
図6は下側外部接点Cの計測温度の推移を示す図である。
図5、図6で示すように、内部温度推定部13は上側外部接点Aの計測温度と、下側外部接点Cの計測温度を、上部温度計測素子5と下部温度計測素子6より取得する。取得したデータを記憶部15が記憶する。図5、図6で示す計測温度は、化学反応用チップへの加熱または冷却を繰り返す際の一周期[T]に相当する計測データである。
FIG. 5 is a diagram showing the transition of the measured temperature of the upper external contact A. FIG.
FIG. 6 is a diagram showing the transition of the measured temperature of the lower external contact C. In FIG.
As shown in FIGS. 5 and 6, the internal temperature estimation unit 13 acquires the measured temperature of the upper external contact A and the measured temperature of the lower external contact C from the upper temperature measuring element 5 and the lower temperature measuring element 6. The storage unit 15 stores the acquired data. The measured temperature shown in FIGS. 5 and 6 is measured data corresponding to one cycle [T] when heating or cooling of the chemical reaction chip is repeated.

ここで、凹部4等によって構成されるキャビティの内部には熱源が無いので、各材料中の熱伝導方程式は式(1)で示される。ここでρは密度、Cは比熱、kは熱伝道係数、u(t,x)は温度を示している。また密度ρ、比熱C、及び熱伝導係数kは、式(2)で表すことができる。   Here, since there is no heat source inside the cavity constituted by the recesses 4 and the like, the heat conduction equation in each material is expressed by equation (1). Here, ρ represents density, C represents specific heat, k represents a heat transfer coefficient, and u (t, x) represents temperature. Further, the density ρ, the specific heat C, and the heat conduction coefficient k can be expressed by Expression (2).

なお、式(2)においてMは質量、Lは長さ、Tは時間を表している。PCR法における、化学反応用チップへの加熱または冷却を繰り返す際の一周期[T]における温度計測データ(図5、図6)を考えると、そのフーリエ成分U(x)は式(3)により表すことができる。In the formula (2), M represents mass, L represents length, and T represents time. Considering temperature measurement data (FIGS. 5 and 6) in one cycle [T] when repeating heating or cooling of the chemical reaction chip in the PCR method, the Fourier component U n (x) is expressed by the following equation (3). Can be represented by

ここで、化学反応用チップへの加熱または冷却を繰り返す際の一周期[T]における角速度は以下のとおりである:   Here, the angular velocity in one cycle [T] when heating or cooling the chemical reaction chip is repeated is as follows:

従って、温度u(t,x)は式(5)により表すことができる。   Therefore, the temperature u (t, x) can be expressed by the equation (5).

また式(5)を式(1)に代入すると、以下の式を得る。 Further, when the formula (5) is substituted into the formula (1), the following formula is obtained.

ここで以下のWを導入する。Wは温度Uの空間的変化量に相当し、次元を調整した温度勾配を表している。Here, the following W n is introduced. W n corresponds to a spatial change amount of the temperature U and represents a temperature gradient adjusted in dimension.

この場合、式(6)は以下のように表すことができる。   In this case, Equation (6) can be expressed as follows.

そこで式(7)と式(8)の解を求めると、以下の式が得られる。 Therefore, when the solutions of the equations (7) and (8) are obtained, the following equations are obtained.

ここで、以下の式を用いる。 Here, the following formula is used.

また、以下の式が成り立つ。 Further, the following formula is established.

さて、上板部1と水溶液の界面では温度が一致し、界面に入る熱流と出る熱流が一致するものとみなす。つまりx=d1(上板部1の厚さに相当)において、以下のように表すことができる。   Now, it is assumed that the temperature is the same at the interface between the upper plate portion 1 and the aqueous solution, and the heat flow entering the interface and the heat flow exiting are the same. That is, when x = d1 (corresponding to the thickness of the upper plate portion 1), it can be expressed as follows.

また式(13)を用いて書き直すと、以下のように表すことができる。   Moreover, when rewritten using Formula (13), it can represent as follows.

式(12)と式(14)とを一組にした境界条件は、以下の式により表すことができる。   The boundary condition that is a combination of Expression (12) and Expression (14) can be expressed by the following expression.

なお、以下の式を用いる。   The following formula is used.

また式(9)と式(15)により、以下のように表すことができる。   Moreover, it can represent as follows by Formula (9) and Formula (15).

ここで、以下の式は、x=d1とx=d2とをつなぐ伝達行列である。 Here, the following equation is a transfer matrix that connects x = d1 and x = d2.

以下の式も、上記と同様である。   The following formulas are the same as above.

なお、上記の式(22)を用いる。そして、以下の式を用いる。 The above formula (22) is used. And the following formula is used.

なお、T32はx=d2とx=d3とをつなぐ伝達行列、T43はx=d3とx=d4とをつなぐ伝達行列、T31はx=d1からx=d3をつなぐ伝達行列、T41はx=d1からx=d4をつなぐ伝達行列である。T 32 is a transfer matrix connecting x = d2 and x = d3, T 43 is a transfer matrix connecting x = d3 and x = d4, T 31 is a transfer matrix connecting x = d1 to x = d3, T Reference numeral 41 denotes a transfer matrix that connects x = d1 to x = d4.

上記の式(25)で示されるS(点Aと点Cにおける温度と温度勾配(UとW)を結び付ける伝達行列)を導入する。この結果、以下の関係が導かれる。   S shown in the above equation (25) (transfer matrix linking temperature and temperature gradient (U and W) at points A and C) is introduced. As a result, the following relationship is derived.

そして、式(26)を、Wについて解くと、以下の式を得る。   Then, when equation (26) is solved for W, the following equation is obtained.

式(28)を用いて、以下の式を得る。   Using the equation (28), the following equation is obtained.

この式(29)によって水溶液中の点B、すなわちx=d2における温度(ξ)が求まる。なお上記式において、ξ,ξ,ξ,ξは距離x=d1,d2,d3,d4をそれぞれ無次元化したものである。Point B in the aqueous solution by the equation (29), that is, the temperature 3 U n (xi] 2) in the x = d2 is obtained. In the above equation, ξ 1 , ξ 2 , ξ 3 , and ξ 4 are obtained by making the distances x = d1, d2, d3, and d4 dimensionless.

つまり、上述の式(1)〜(29)を用いて説明した水溶液中の点Bの温度の算出手法では、まず、温度制御装置10の内部温度推定部13が、入出力部11を介して、上部温度計測素子5より上側外部接点Aの計測温度を、また下部温度計測素子6より下側外部接点Cの計測温度の入力を受け付ける(ステップS1)。そして、その各温度の時系列データをフーリエ変換し、各周波数成分を求め(ステップS2)、これを(0)、(ξ)とする。また、各周波数成分(n)に対して、上述に示したξ,ξ,ξ,ξを計算し(ステップS3)、また、T43,T32,T21を計算する(ステップS4)。また、T31=T3221,T41=T4331を求める(ステップS5)。That is, in the method for calculating the temperature of the point B in the aqueous solution described using the above equations (1) to (29), first, the internal temperature estimation unit 13 of the temperature control device 10 is connected via the input / output unit 11. Then, the measurement temperature of the upper external contact A is received from the upper temperature measurement element 5, and the measurement temperature of the lower external contact C is received from the lower temperature measurement element 6 (step S1). The Fourier transform of time series data for each of its temperature, the frequency components determined (step S2), and this 1 U n (0), and 4 U n (ξ 4). Further, for each frequency component (n), ξ 1 , ξ 2 , ξ 3 , ξ 4 shown above are calculated (step S3), and T 43 , T 32 , T 21 are calculated (step S3). S4). Also, determine the T 31 = T 32 T 21, T 41 = T 43 T 31 ( step S5).

また、上の式(30)を求める(ステップS6)。   Further, the above equation (30) is obtained (step S6).

また、上の式(31)により温度(ξ)を求める(ステップS7)。またこのようにして各周波数成分(n)に対して求めた(ξ)の列を逆フーリエ変換して、水溶液中の点Bにおける時系列の温度u(t,d)を算出する(ステップS8)。Further, the above equation (31) Temperature 3 Request U n (xi] 2) (step S7). Further, the time series temperature 3 u (t, d 2 ) at the point B in the aqueous solution is obtained by performing inverse Fourier transform on the sequence of 3 U n2 ) obtained for each frequency component (n) in this way. Is calculated (step S8).

なお、図7は上側外部接点Aの計測温度、下側外部接点Cの計測温度および、水溶液中の点Bにおける推定温度を表すグラフである。本実施形態によれば、図7で示すように、温度測定対象物(本実施形態においては水溶液中の点B)に対して非接触で、その温度を推定することが可能となる。   FIG. 7 is a graph showing the measured temperature of the upper external contact A, the measured temperature of the lower external contact C, and the estimated temperature at point B in the aqueous solution. According to the present embodiment, as shown in FIG. 7, it is possible to estimate the temperature without contact with the temperature measurement object (point B in the aqueous solution in the present embodiment).

上述の温度制御装置は、内部に、コンピュータシステムを有している。そして、上述した各処理の過程は、プログラムの形式でコンピュータ読み取り可能な記録媒体に記憶されており、このプログラムをコンピュータが読み出して実行することによって、上記処理が行われる。ここでコンピュータ読み取り可能な記録媒体とは、磁気ディスク、光磁気ディスク、CD−ROM、DVD−ROM、半導体メモリ等をいう。また、このコンピュータプログラムを通信回線によってコンピュータに配信し、この配信を受けたコンピュータがこのプログラムを実行するようにしても良い。   The above temperature control apparatus has a computer system inside. Each process described above is stored in a computer-readable recording medium in the form of a program, and the above process is performed by the computer reading and executing the program. Here, the computer-readable recording medium means a magnetic disk, a magneto-optical disk, a CD-ROM, a DVD-ROM, a semiconductor memory, or the like. Alternatively, the computer program may be distributed to the computer via a communication line, and the computer that has received the distribution may execute the program.

また、上記プログラムは、前述した機能の一部を実現するためのものであっても良い。
さらに、前述した機能をコンピュータシステムにすでに記録されているプログラムとの組み合わせで実現できるもの、いわゆる差分ファイル(差分プログラム)であっても良い。
The program may be for realizing a part of the functions described above.
Furthermore, what can implement | achieve the function mentioned above in combination with the program already recorded on the computer system, and what is called a difference file (difference program) may be sufficient.

本発明によれば、小さく脆い物質が含まれる測定対象物の内部温度を、外部温度から非接触で推定することが可能となる。   According to the present invention, it is possible to estimate the internal temperature of a measurement object containing a small and brittle substance from the external temperature in a non-contact manner.

Claims (5)

下板部と、前記下板部の面に接合される上板部と、前記下板部と前記上板部の間に設けられたキャビティとを有し、外部より加熱および冷却することにより前記キャビティ内に収容された反応物の化学反応に用いる化学反応用チップであって前記キャビティの下側外部接点の温度を計測する下部温度計測素子と、前記上板部の前記下部温度計測素子から垂直方向の前記キャビティの上側外部接点の温度を計測する上部温度計測素子とにより構成される化学反応用チップ、に収容された前記反応物前記加熱及び前記冷却を繰り返す温度制御を行う温度制御部と、
前記下部温度計測素子及び前記上部温度計測素子に接続され、温度推定アルゴリズムを用いて前記化学反応用チップに収納された反応物の温度推定を行う温度推定部と
を備え、
前記温度推定部は、温度推定アルゴリズムを用いて、前記下部温度計測素子及び前記上部温度計測素子から得られた計測結果の時系列データであって、前記化学反応用チップの前記キャビティへの外部からの加熱および冷却を繰り返す際の時系列データをそれぞれフーリエ変換して周波数成分を求め、前記周波数成分を用いて前記化学反応用チップの内部の時系列の温度を推定する
ことを特徴とする温度制御装置。
A lower plate portion, an upper plate portion joined to a surface of the lower plate portion, and a cavity provided between the lower plate portion and the upper plate portion, and by heating and cooling from the outside, A chemical reaction chip used for a chemical reaction of a reactant contained in the cavity, the lower temperature measuring element for measuring the temperature of the lower external contact of the cavity, and the vertical temperature from the lower temperature measuring element of the upper plate portion A temperature control unit that performs temperature control that repeats the heating and cooling of the reactant contained in a chemical reaction chip configured with an upper temperature measuring element that measures the temperature of the upper external contact of the cavity in the direction ; ,
A temperature estimation unit that is connected to the lower temperature measurement element and the upper temperature measurement element and performs temperature estimation of a reactant contained in the chemical reaction chip using a temperature estimation algorithm ;
Bei to give a,
The temperature estimation unit is a time-series data of measurement results obtained from the lower temperature measurement element and the upper temperature measurement element using a temperature estimation algorithm, from the outside to the cavity of the chemical reaction chip The time series data when repeating heating and cooling are respectively Fourier transformed to obtain frequency components, and the time series temperature inside the chemical reaction chip is estimated using the frequency components.
A temperature control device characterized by that .
前記温度推定部は、温度推定アルゴリズムを用いて、前記下部温度計測素子及び前記上部温度計測素子から得られた計測結果の時系列データであって、前記化学反応用チップの前記キャビティへの外部からの加熱および冷却を繰り返す際の時系列データをそれぞれフーリエ変換して周波数成分を求め、The temperature estimation unit is a time-series data of measurement results obtained from the lower temperature measurement element and the upper temperature measurement element using a temperature estimation algorithm, from the outside to the cavity of the chemical reaction chip Each time-series data when repeating heating and cooling is Fourier transformed to obtain frequency components,
前記上側外部接点と前記下側外部接点を繋ぐ直線上における前記上板部の厚さd1、前記キャビティ内の所定の温度推定点と前記上側外部接点の距離から前記厚さd1を減じた厚さd2、前記下板部の厚さd4、前記温度推定点と前記下側外部接点の距離から前記板部の厚さd4を減じた厚さd3としたときの、厚さd1と厚さd2とをつなぐ温度の伝達行列と、厚さd2と厚さd3とをつなぐ温度の伝達行列と、厚さd3と厚さd4とをつなぐ温度の伝達行列と、厚さd1から厚さd3をつなぐ温度の伝達行列と、厚さd1から厚さd4とをつなぐ温度の伝達行列と、前記下部温度計測素子及び前記上部温度計測素子から得られた計測結果の時系列データをそれぞれフーリエ変換して得た周波数成分と、を用いて前記温度推定点の温度を推定するA thickness d1 of the upper plate portion on a straight line connecting the upper external contact and the lower external contact, a thickness obtained by subtracting the thickness d1 from a distance between a predetermined temperature estimation point in the cavity and the upper external contact d2, thickness d4 of the lower plate portion, and thickness d1 and thickness d2 when the thickness d4 is obtained by subtracting the thickness d4 of the plate portion from the distance between the temperature estimation point and the lower external contact. , The temperature transfer matrix connecting the thickness d2 and the thickness d3, the temperature transfer matrix connecting the thickness d3 and the thickness d4, and the temperature connecting the thickness d1 to the thickness d3. Obtained by Fourier transform, respectively, the transfer matrix of temperature, the transfer matrix of temperature connecting the thickness d1 to the thickness d4, and the time series data of the measurement results obtained from the lower temperature measurement element and the upper temperature measurement element And the frequency component to estimate the temperature of the temperature estimation point. Make
ことを特徴とする請求項1に記載の温度制御装置。The temperature control apparatus according to claim 1.
前記温度推定部によって得られる温度推定値と、予め記録された前記反応物の希望温度とに基づいて、前記温度推定値を、前記希望温度へ近づけるように加熱および冷却の温度制御を行う温度制御部を更に備えることを特徴とする請求項1または請求項2に記載の温度制御装置。 Temperature control for performing temperature control of heating and cooling so that the temperature estimated value approaches the desired temperature based on the temperature estimated value obtained by the temperature estimating unit and the desired temperature of the reactant recorded in advance. temperature control device according to claim 1 or claim 2, further comprising a part. 下板部と、前記下板部の面に接合される上板部と、前記下板部と前記上板部の間に設けられたキャビティとを有し、外部より加熱および冷却することにより前記キャビティ内に収容された反応物の化学反応に用いる化学反応用チップであって前記キャビティの下側外部接点の温度を計測する下部温度計測素子と、前記上板部の前記下部温度計測素子から垂直方向の前記キャビティの上側外部接点の温度を計測する上部温度計測素子とにより構成される化学反応用チップ、に収容された前記反応物の前記加熱及び前記冷却を繰り返す温度制御を行い、
前記化学反応用チップの下部の温度を測定し、
前記化学反応用チップの上部の温度を測定し、
前記下部温度計測素子及び前記上部温度計測素子に接続され、温度推定アルゴリズムを用いて前記化学反応用チップに収納された反応物の温度推定を行うにあたり、温度推定アルゴリズムを用いて、前記下部温度計測素子及び前記上部温度計測素子から得られた計測結果の時系列データであって、前記化学反応用チップの前記キャビティへの外部からの加熱および冷却を繰り返す際の時系列データをそれぞれフーリエ変換して周波数成分を求め、前記周波数成分を用いて前記化学反応用チップの内部の時系列の温度を推定する
ことを特徴とする温度制御方法。
A lower plate portion, an upper plate portion joined to a surface of the lower plate portion, and a cavity provided between the lower plate portion and the upper plate portion, and by heating and cooling from the outside, A chemical reaction chip used for a chemical reaction of a reactant contained in the cavity, the lower temperature measuring element for measuring the temperature of the lower external contact of the cavity, and the vertical temperature from the lower temperature measuring element of the upper plate portion Performing temperature control for repeating the heating and cooling of the reactant contained in a chemical reaction chip configured with an upper temperature measurement element that measures the temperature of the upper external contact of the cavity in the direction,
Measure the temperature at the bottom of the chemical reaction chip,
Measure the temperature of the top of the chemical reaction chip,
The temperature measurement algorithm is used to estimate the temperature of the reaction product connected to the lower temperature measurement element and the upper temperature measurement element and stored in the chemical reaction chip using the temperature estimation algorithm. Time series data of measurement results obtained from the element and the upper temperature measurement element, each time series data when repeating heating and cooling from the outside to the cavity of the chemical reaction chip, respectively, Fourier transform A frequency component is obtained, and the time-series temperature inside the chemical reaction chip is estimated using the frequency component.
A temperature control method characterized by that .
温度制御装置のコンピュータを、
下板部と、前記下板部の面に接合される上板部と、前記下板部と前記上板部の間に設けられたキャビティとを有し、外部より加熱および冷却することにより前記キャビティ内に収容された反応物の化学反応に用いる化学反応用チップであって前記キャビティの下側外部接点の温度を計測する下部温度計測素子と、前記上板部の前記下部温度計測素子から垂直方向の前記キャビティの上側外部接点の温度を計測する上部温度計測素子とにより構成される化学反応用チップ、に収容された前記反応物の前記加熱及び前記冷却を繰り返す温度制御を行う温度制御手段、
前記下部温度計測素子及び前記上部温度計測素子に接続され、温度推定アルゴリズムを用いて前記化学反応用チップに収納された反応物の温度推定を行う温度推定手段、
として機能させ、
前記温度推定手段は、温度推定アルゴリズムを用いて、前記下部温度計測素子及び前記上部温度計測素子から得られた計測結果の時系列データであって、前記化学反応用チップの前記キャビティへの外部からの加熱および冷却を繰り返す際の時系列データをそれぞれフーリエ変換して周波数成分を求め、前記周波数成分を用いて前記化学反応用チップの内部の時系列の温度を推定する
ことを特徴とするプログラム。
The temperature control computer,
A lower plate portion, an upper plate portion joined to a surface of the lower plate portion, and a cavity provided between the lower plate portion and the upper plate portion, and by heating and cooling from the outside, A chemical reaction chip used for a chemical reaction of a reactant contained in the cavity, the lower temperature measuring element for measuring the temperature of the lower external contact of the cavity, and the vertical temperature from the lower temperature measuring element of the upper plate portion A temperature control means for performing temperature control to repeat the heating and cooling of the reactant contained in a chemical reaction chip configured with an upper temperature measuring element that measures the temperature of the upper external contact of the cavity in the direction;
A temperature estimation means connected to the lower temperature measurement element and the upper temperature measurement element, for estimating a temperature of a reactant contained in the chemical reaction chip using a temperature estimation algorithm;
Function as
The temperature estimation means is time-series data of measurement results obtained from the lower temperature measurement element and the upper temperature measurement element using a temperature estimation algorithm, from the outside to the cavity of the chemical reaction chip The time series data when repeating heating and cooling are respectively Fourier transformed to obtain frequency components, and the time series temperature inside the chemical reaction chip is estimated using the frequency components.
A program characterized by that.
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