JP5549099B2 - Photosensitive resin composition, color filter, and method for producing color filter - Google Patents

Description

  The present invention relates to a photosensitive resin composition for a color filter used for a color liquid crystal display device, a color image pickup tube element and the like, a color filter, and a method for producing the same.

  The color filters that make up a liquid crystal display (LCD) are made by arranging two or more kinds of fine band (striped) filter segments of different hues in parallel or intersecting on the surface of a transparent substrate such as glass or the like. The filter segments are arranged in a constant vertical and horizontal arrangement. The filter segments are as small as several microns to several 100 microns in size, and are regularly arranged in a predetermined arrangement for each hue.

  The filter segment or black matrix that constitutes the color filter is coated with a photosensitive material on a glass substrate, etc., and after removing excess solvent, proximity exposure (ultraviolet light source exposure) is performed through a photomask for pixel formation. It is formed by irradiating an active energy ray by, for example, curing (negative type) or increasing alkali solubility (positive type), and removing a soluble portion with an alkali solution or the like. By repeating this for each color, a color filter is produced.

  In recent years, color liquid crystal display devices have formed a large market for liquid crystal color televisions, car navigation and liquid crystal display integrated laptop computers, and as desktop personal computer monitors and televisions that take advantage of energy and space saving features. Has begun to spread.

  On the other hand, along with the increase in size of color liquid crystal display devices using color filters, exposure photomasks for pixel formation have to be increased in size in the creation of color filters by photolithography, leading to an increase in manufacturing costs. ing.

  As methods for reducing the manufacturing cost of a photomask, methods described in Patent Documents 1 and 2 have been proposed. Patent Document 1 describes an ink jet method in which three colored resin compositions of R, G, and B are used as inks, and each color can be printed simultaneously. According to this method, since each color can be printed at the same time, there is little waste of material, and the pixel formation process is shortened, so that it is possible to expect a reduction in environmental burden and a significant cost reduction. However, the ink jet method has a problem that the colored layer printed by the ink ejection device does not have a flat shape but a convex shape.

  Patent Document 2 describes a maskless exposure method in which a laser is used as a light source and a two-dimensional image is formed by performing relative scanning while modulating light based on image data. In this method, since a pixel can be formed without using an expensive photomask, significant cost reduction can be expected. However, in the maskless exposure method, it is difficult to develop a photosensitive resin composition suitable for a spatial modulation element and a laser used for exposure. For example, in the method described in Patent Document 2, an oxygen blocking film is provided, Sensitivity needs to be improved.

  Furthermore, a method for curing a photosensitive resin composition in an extremely short time by irradiating an excimer laser having a specific wavelength with a low output for a short time has been proposed. In this method, it is possible to scan an exposure pattern through a small photomask on a large substrate on which a color filter is to be formed, thereby forming a filter segment and a black matrix, thereby reducing the cost of the photomask. it can. However, even with this method, it is difficult to develop a photosensitive resin composition matched with an excimer laser, and in particular, the problem is that the film reduction rate increases due to the ablation phenomenon caused by laser.

  In addition, the ablation phenomenon by a laser here means destruction of the photosensitive resin composition coating film by laser exposure. Specifically, when the pattern end portion of the photosensitive resin composition coating film is destroyed, the linearity of the pattern is deteriorated. Further, when the entire film is destroyed, the film reduction rate is increased, the cross-sectional shape of the photosensitive resin composition coating film is deteriorated, and in an extreme case, a pixel pattern is hardly formed.

JP-A-6-347637 JP 2007-11231 A

  The present invention has been made under the circumstances as described above, and is a photosensitive resin composition that is highly sensitive and capable of obtaining an excellent pattern shape, a method for producing a color filter using the same, and a method for producing the same. It is an object to provide an improved color filter.

A first aspect of the present invention, pigments, monomers having a transparent resin, ethylenically unsaturated double bond, a photopolymerization initiator and an epoxy acrylate, integrated exposure amount 1 mJ / cm ² or more, 150 mJ / cm ² or less A photosensitive resin composition that can be cured by laser irradiation, wherein the epoxy acrylate is 0.1 wt% or more and 20.0 wt% or less based on the total solid content of the photosensitive resin composition , The photopolymerization initiator is at least one photopolymerization initiator A selected from an oxime ester photopolymerization initiator, an α-aminoalkylphenone photopolymerization initiator, and a carbazole photopolymerization initiator, and acylphosphine. An oxide-based photopolymerization initiator B, and a weight ratio (a) / (b) between the content (a) of the photopolymerization initiator A and the content (b) of the photopolymerization initiator B. Is 0.6 or more and 4.0 or less, and provides the photosensitive resin composition characterized by the above-mentioned.

In such a photosensitive resin composition, the transparent resin can have a weight average molecular weight Mw of 5,000 or more and 70,000 or less . Further, the ratio of the weight of the monomer having an ethylenically unsaturated double bond to the weight (P) of said transparent resin (M) (M / P) , 0.60 or more, can be 2.00 or less . The ratio (I / M) of the weight (I) of the photopolymerization initiator to the weight (M) of the monomer having an ethylenically unsaturated double bond can be 0.01 or more and 0.45 or less. .

A second aspect of the present invention is a step of forming a coating film of the photosensitive resin composition according to any one of claims 1 to 4 on a substrate, a filter segment or a black matrix of the photosensitive resin composition coating film the portion serving as the integrated exposure amount 1 mJ / cm ² or more, curing by irradiating a laser so that 150 mJ / cm ² or less, to remove an uncured portion of the photosensitive resin composition coating film filter There is provided a method for producing a color filter, comprising a step of forming a segment or a black matrix, and a step of repeating the above steps a plurality of times to form a filter segment or a black matrix of at least two colors.

In such a color filter manufacturing method, a laser having a wavelength of 300 nm or more and 500 nm or less can be used. Further, in the step of curing by irradiating with the laser, an integrated exposure amount to a part of the photosensitive resin composition coating film that becomes a filter segment or a black matrix is 1 mJ / cm ² or more and 50 mJ / cm ² or less. Can do.

  According to a third aspect of the present invention, there is provided a color filter manufactured by the above-described method for manufacturing a color filter.

  According to the photosensitive resin composition according to the first aspect of the present invention, since it contains epoxy acrylate and can be cured by irradiating a laser with a predetermined integrated exposure amount, the photomask can be downsized or maskless. It is possible to obtain a high-quality color filter that is inexpensive and inexpensive.

  Further, according to the method for producing a color filter according to the second aspect of the present invention, the film of the photosensitive resin composition is irradiated with a laser beam having a predetermined integrated exposure amount and developed, so that the photosensitivity due to the ablation phenomenon occurs. It is possible to obtain a color filter having a filter segment and a black matrix having a sufficient film thickness and excellent shape while suppressing the decomposition of the coating film of the conductive resin composition.

  Hereinafter, embodiments of the present invention will be described.

The photosensitive resin composition according to the first embodiment of the present invention contains a pigment, a transparent resin, a monomer having an ethylenically unsaturated double bond, a photopolymerization initiator, and an epoxy acrylate, and an integrated exposure amount of 1 mJ / cm. ² or more, 150 mJ / cm ² or less, preferably 1 mJ / cm ² or more, a photosensitive resin composition is curable by laser irradiation of 50 mJ / cm ² or less, the epoxy acrylate of the photosensitive resin composition It is characterized by being 0.1 to 20.0% by weight based on the total solid content.

  When the above photosensitive resin composition is used, decomposition of the photosensitive resin composition coating film due to the ablation phenomenon is suppressed during exposure by laser irradiation, and a sufficiently thick filter segment or black matrix having a sufficient thickness is formed. It is possible to obtain a color filter having

  If the amount of the epoxy acrylate is less than 0.1%, the effect of adding the epoxy acrylate is difficult to be exhibited, and the photosensitive resin composition coating film is decomposed due to the ablation phenomenon by the laser. The linearity is deteriorated, the film reduction rate is increased, and the cross-sectional shape of the color filter pattern is deteriorated. On the contrary, when the amount of epoxy acrylate exceeds 20.0% by weight, the ratio of the transparent resin having solubility is decreased, the development time is delayed, and the productivity is lowered.

  Hereinafter, each component of the photosensitive resin composition used for forming the color filter according to the first embodiment of the present invention will be described.

(Pigment)
As the pigment contained in the colored composition according to the present embodiment, a commercially available organic pigment can be used, and a dye, a natural pigment, or an inorganic pigment can be used in combination according to the hue of the filter segment to be formed. it can.

  As the organic pigment, those having high color developability and high heat resistance, particularly high heat decomposition resistance are preferably used. An organic pigment can be used individually by 1 type or in mixture of 2 or more types. In addition, the organic pigment may be refined by salt milling, acid pasting, or the like.

  Below, the specific example of the organic pigment which can be used for the photosensitive resin composition which concerns on this embodiment is shown with a color index (C.I.) number.

  When forming a red filter segment, CI Pigment Red 7, 9, 14, 41, 48: 1, 48: 2, 48: 3, 48: 4, 81: 1, 81: 2, 81: 3, 97 122, 123, 146, 149, 168, 177, 178, 179, 180, 184, 185, 187, 192, 200, 202, 208, 210, 215, 216, 217, 220, 223, 224, 226, 227 Red pigments such as 228, 240, 242, 246, 254, 255, 264, 272, and 279 can be used. A yellow pigment and an orange pigment can be used in combination with the red photosensitive resin composition.

  In the case of forming a green filter segment, a green pigment such as C.I. Pigment Green 7, 10, 36, 37, 58 can be used. A yellow pigment can be used in combination with the green photosensitive resin composition.

  When forming a blue filter segment, a blue pigment such as CI Pigment Blue 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, 80 is used. be able to. Purple pigments such as C.I. Pigment Violet 1, 19, 23, 27, 29, 30, 32, 37, 40, 42, and 50 can be used in combination with the blue photosensitive coloring composition.

  When forming a yellow filter segment, CI Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 12, 13, 14, 15, 16, 17, 18, 24, 31, 32, 34, 35 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 93, 94 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 126, 127, 128, 129, 138, 139 147, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 1 It can be used yellow pigments such 6,177,179,180,181,182,185,187,188,193,194,198,199,213,214.

  In the case of forming a purple filter segment, pigments such as C.I. Pigment Violet 1, 19, 23, 27, 29, 30, 32, 37, 40, 42, 50 can be used.

  As the magenta color photosensitive coloring composition for forming the magenta color filter segment, purple pigments and red pigments such as CI Pigment Violet 1, 19, CI Pigment Red 81, 144, 146, 177, 169 can be used. . A yellow pigment can be used in combination with the magenta photosensitive coloring composition.

  In the case of forming a cyan filter segment, pigments such as C.I. Pigment Blue 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, and 80 can be used.

  In the case of forming an orange filter segment, pigments such as C.I. Pigment Orange 36, 43, 51, 55, 59, 61, 71, 73 can be used.

  In the case of forming a black matrix, carbon black, aniline black, anthraquinone black pigment, perylene black pigment, specifically C.I. pigment black 1, 6, 7, 12, 20, 31, etc. can be used. A mixture of a red pigment, a blue pigment, and a green pigment can also be used for the black photosensitive resin composition. As the black pigment, carbon black is preferable from the viewpoint of price and light shielding properties, and the carbon black may be surface-treated with a resin or the like. Moreover, in order to adjust a color tone, a blue pigment and a purple pigment can be used together in a black photosensitive resin composition.

  The photosensitive resin composition described above can contain an inorganic pigment in order to ensure good coatability, sensitivity, developability, and the like while balancing saturation and lightness. Inorganic pigments include titanium oxide, barium sulfate, zinc white, lead sulfate, yellow lead, zinc yellow, red bean (red iron (III) oxide), cadmium red, ultramarine, bitumen, chromium oxide green, cobalt green, amber, titanium Examples thereof include black, synthetic iron black, and carbon black.

  An inorganic pigment can be used individually by 1 type or in mixture of 2 or more types. The inorganic pigment can be used in an amount of 0.1 wt% or more and 10 wt% or less based on the total weight of the pigment (100 wt%).

  In addition, the photosensitive resin composition according to the present embodiment can contain a dye within a range in which heat resistance is not lowered for color matching. The dye can be used in an amount of 0.1 wt% or more and 10 wt% or less based on the total weight of the pigment (100 wt%).

(Transparent resin)
The transparent resin contained in the photosensitive resin composition according to the present embodiment has a transmittance of preferably 80% or more, more preferably 95% or more in the entire wavelength region of 400 nm to 700 nm in the visible light region. be able to. The transparent resin includes a non-photosensitive transparent resin and a photosensitive transparent resin, and these may be used alone or in combination of two or more.

  The weight average molecular weight Mw of the transparent resin is desirably in the range of 5,000 to 70,000. When the weight average molecular weight Mw of the transparent resin is less than 5,000, the linearity of the color filter pattern is deteriorated during development, the film reduction rate is increased, and the cross-sectional shape of the color filter pattern is deteriorated. On the other hand, if it exceeds 70,000, the development time is delayed and the productivity is lowered. More preferably, the range is 10,000 or more and 60,000 or less.

  The non-photosensitive transparent resin is a resin that does not have an ethylenically unsaturated double bond, and includes a thermoplastic resin and a thermosetting resin. Examples of the thermoplastic resin include butyral resin, styrene-maleic acid copolymer, chlorinated polyethylene, chlorinated polypropylene, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyvinyl acetate, polyurethane resin, and polyester resin. And acrylic resins, alkyd resins, polystyrene resins, polyamide resins, rubber resins, cyclized rubber resins, celluloses, polybutadiene, polyethylene, polypropylene, polyimide resins, and the like. Examples of the thermosetting resin include an epoxy resin, a benzoguanamine resin, a rosin-modified maleic acid resin, a rosin-modified fumaric acid resin, a phenol resin, a melamine resin, and a urea resin.

  The photosensitive transparent resin is a resin having an ethylenically unsaturated double bond, for example, a polymer having a reactive substituent such as a hydroxyl group, a carboxyl group, an amino group, an isocyanate group, an aldehyde group, an epoxy group, A functional group having an ethylenically unsaturated double bond such as a (meth) acryloyl group or a styryl group is introduced into the polymer by reacting a (meth) acrylic compound having a reactive substituent such as a carboxyl group or cinnamic acid. Resin.

  Specifically, a functional group capable of reacting with a hydroxyl group and an ethylenically unsaturated double bond are added to a copolymer obtained by copolymerizing an ethylenically unsaturated monomer having a hydroxyl group and another ethylenically unsaturated monomer. Some of them are obtained by reacting the compounds they have. Examples of the functional group capable of reacting with a hydroxyl group include an isocyanate group and a carboxyl group, but an isocyanate group is particularly preferred in terms of reactivity, and specifically, a compound having an isocyanate group and an ethylenically unsaturated double bond. , 2-acryloyl ethyl isocyanate, 2-methacryloyl ethyl isocyanate and the like. In addition, a polymer containing an acid anhydride such as a styrene-maleic anhydride copolymer or an α-olefin-maleic anhydride copolymer is half-esterified with a (meth) acrylic compound having a hydroxyl group such as hydroxyalkyl (meth) acrylate. A modified version is also used.

(Polyfunctional monomer having an ethylenically unsaturated double bond)
Polyfunctional monomer having an ethylenically unsaturated double bond contained in the photosensitive resin composition according to the present embodiment, the integrated exposure amount 1 mJ / cm ² or more, a component which is cured by the laser irradiation of 150 mJ / cm ² or less .

  Examples of polyfunctional monomers having an ethylenically unsaturated double bond include pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, ethylene oxide-modified trimethylolpropane tri (meth) acrylate, and propylene oxide-modified trimethylolpropane. Representative examples include various acrylic esters and methacrylic esters such as tri (meth) acrylate.

  The polyfunctional monomer preferably has 4 to 12 ethylenically unsaturated double bonds from the viewpoint of increasing the sensitivity of the photosensitive resin composition. In the photosensitive resin composition containing the polyfunctional monomer which has 3 or less ethylenically unsaturated double bonds, desired sensitivity cannot be obtained.

  The polyfunctional monomer which has an ethylenically unsaturated double bond can be used individually or in mixture of 2 or more types.

  The content of the polyfunctional monomer having an ethylenically unsaturated double bond is preferably 10 parts by weight or more and 300 parts by weight or less, more preferably 10 parts by weight or more and 200 parts by weight or less with respect to 100 parts by weight of the pigment. Can be used in quantities.

  The ratio (M / P) of the weight (M) of the polyfunctional monomer having an ethylenically unsaturated double bond to the weight (P) of the transparent resin is in the range of 0.60 or more and 2.00 or less. Is preferred. When M / P is less than 0.60, the film reduction rate is increased due to insufficient sensitivity, the cross-sectional shape of the photosensitive resin composition is deteriorated, and in the extreme case, a pixel pattern may be hardly formed. On the contrary, if it exceeds 2.00, the pattern edge part of the photosensitive resin composition by laser exposure will be destroyed, and the linearity of a pattern will deteriorate. 0.65 or more and 1.80 or less are more preferable, and 0.70 or more and 1.60 or less are most preferable.

(Photopolymerization initiator)
Examples of the photopolymerization initiator contained in the photosensitive resin composition used in the present embodiment include an oxime ester photopolymerization initiator, an α-aminoalkylphenone photopolymerization initiator, a carbazole photopolymerization initiator, and acylphosphine. A fin oxide type photoinitiator is mentioned.

  As particularly preferred oxime ester photopolymerization initiators, etanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, 1- (o-acetyloxime), 1 , 2-octadion-1- [4- (phenylthio)-, 2- (o-benzoyloxime)].

  Particularly preferred acylphosphine oxide photopolymerization initiators include 2,4,6-trimethylbenzoyl-diphenylphosphine oxide.

  Particularly preferable α-aminoalkylacetophenone photopolymerization initiators include 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- ( 4-morpholinophenyl) -butane-1,2- (dimethylamino) -2-[(4-methylthiophenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone.

  Particularly preferable carbazole-based photopolymerization initiators include 3,6-bis (2-methyl-2-morpholinopropionyl) -9-methylcarbazole and 3,6-bis (2-methyl-2-morpholinopropionyl) -9-. Benzoylcarbazole, 3,6-bis (2-methyl-2-morpholinopropionyl) -9-n-butylcarbazole, 3,6-bis (2-methyl-2-morpholinopropionyl) -9-n-octylcarbazole, 3 , 6-bis (2-methyl-2-morpholinopropionyl) -9-n-dodecylcarbazole.

  These photoinitiators can be used individually by 1 type or in mixture of 2 or more types. The photopolymerization initiator is at least one photopolymerization initiator A selected from an oxime ester photopolymerization initiator, an α-aminoalkylphenone photopolymerization initiator, and a carbazole photopolymerization initiator, and acylphosphine. It is preferably used in combination with an oxide-based photopolymerization initiator B, and the weight of the content (a) of the photopolymerization initiator A in the photosensitive resin composition and the content (b) of the photopolymerization initiator B The ratio is particularly preferably in the range of (a) / (b) = 0.6 to 4.0.

  When (a) / (b) is less than 0.6, the film is not sufficiently cured due to insufficient sensitivity, and as a result, the film is removed with an alkali developer, resulting in an increased film reduction rate. On the other hand, when (a) / (b) is 4 or more, the photobleaching effect that promotes the internal curing of the acylphosphine oxide-based photopolymerization initiator B is difficult to be exhibited, and the photosensitive resin because of the ablation phenomenon by laser. As described above, the coating film is decomposed, the linearity of the color filter pattern is deteriorated, the film reduction rate is increased, and the cross-sectional shape of the color filter pattern is deteriorated.

The content of the photopolymerization initiator is preferably 5 to 200 parts by weight, more preferably 10 to 150 parts by weight with respect to 100 parts by weight of the pigment.

  In addition, the ratio (I / M) of the weight (I) of the photopolymerization initiator to the weight (M) of the monomer having an ethylenically unsaturated double bond may be in the range of 0.01 or more and 0.45 or less. preferable. From the viewpoint of cost reduction due to a decrease in the amount of the photopolymerization initiator, the ratio (I / M) is preferably smaller and is preferably 0.30 or less. When the ratio (I / M) is less than 0.01, the basic action of the photopolymerization initiator is hardly exhibited, and when it exceeds 0.45, the pattern shape is deteriorated.

(Epoxy acrylate)
Examples of the epoxy acrylate that can be used in the present invention include ortho cresol novolak type, bisphenol A novolak type, phenol novolak type, bisphenol A type epoxy acrylate, and cresol novolak type epoxy acrylate. Particularly preferred epoxy acrylates include bisphenol A type epoxy acrylates.

  The epoxy acrylate is preferably 0.1% by weight or more and 20.0% by weight or less based on the total solid content of the photosensitive resin composition. If it is less than 0.1, the effect of the epoxy acrylate is hardly exhibited, and if it exceeds 20.0, the linearity and the film reduction rate are deteriorated.

(Optional component)
The photosensitive resin composition used in the present embodiment basically does not require a sensitizer, but may be used in combination with a photopolymerization initiator. These sensitizers can be used individually by 1 type or in mixture of 2 or more types. The content of the sensitizer is preferably 0.1 to 60 parts by weight with respect to 100 parts by weight of the photopolymerization initiator.

    The photosensitive resin composition used in the present embodiment can further contain a polyfunctional thiol that functions as a chain transfer agent. The polyfunctional thiol may be a compound having two or more thiol (SH) groups.

When the polyfunctional thiol is used together with the above-mentioned photopolymerization initiator, it acts as a chain transfer agent in the radical polymerization process after light irradiation, and a thiyl radical is generated that is less susceptible to polymerization inhibition by oxygen. Things become highly sensitive. In particular, a polyfunctional aliphatic thiol in which an SH group is bonded to an aliphatic group such as methylene or ethylene group is preferable. For example, hexanedithiol, decanedithiol, 1,4-butanediol bisthiopropionate, 1,4-butanediol bisthioglycolate, ethylene glycol bisthioglycolate, ethylene glycol bisthiopropionate, trimethylolpropane tris Thioglycolate, trimethylolpropane tristhiopropionate, trimethylolpropane tris (3-mercaptobutyrate), pentaerythritol tetrakisthioglycolate, pentaerythritol tetrakisthiopropionate, trimercaptopropionate tris (2-hydroxyethyl) ) Isocyanurate, 1,4-dimethylmercaptobenzene, 2,4,6-trimercapto-s-triazine, 2- (N, N-dibutylamino) -4,6-di Such as mercapto -s- triazine and the like, preferably ethylene glycol bisthiopropionate, trimethylolpropane tris thiopropionate, pentaerythritol tetrakis thiopropionate.

These polyfunctional thiols can be used individually by 1 type or in mixture of 2 or more types. The content of the polyfunctional thiol is preferably 0.05 to 100 parts by weight, more preferably 0.1 to 60 parts by weight with respect to 100 parts by weight of the pigment.

  The photosensitive resin composition used in the present embodiment can contain a storage stabilizer in order to stabilize the viscosity with time of the composition. Moreover, in order to improve adhesiveness with a transparent substrate, adhesion improving agents, such as a silane coupling agent, can also be contained. The storage stabilizer can be used in an amount of 0.1 to 10 parts by weight with respect to 100 parts by weight of the pigment in the photosensitive resin composition.

  In the photosensitive resin composition used in the present embodiment, the pigment is sufficiently dispersed in the composition, and is applied on a transparent substrate such as a glass substrate so that the dry film thickness is 0.2 μm or more and 5 μm or less. A solvent can be included to facilitate the formation of the filter segment or black matrix. Solvents are used alone or in combination.

  Examples of the solvent include 1,2,3-trichloropropane, 1,3-butanediol, 1,3-butylene glycol, 1,3-butylene glycol diacetate, 1,4-dioxane, 2-heptanone, and 2-methyl. -1,3-propanediol, 3,5,5-trimethyl-2-cyclohexen-1-one, 3,5,5-trimethylcyclohexanone, ethyl 3-ethoxypropionate, 3-methyl-1,3-butanediol 3-methoxy-3-methyl-1-butanol, 3-methoxy-3-methylbutyl acetate, 3-methoxybutanol, 3-methoxybutyl acetate, 4-heptanone, m-xylene, m-diethylbenzene, m-dichlorobenzene N, N-dimethylacetamide, N, N-dimethylformamide, n-butyl alcohol N-butylbenzene, n-propyl acetate, N-methylpyrrolidone, o-xylene, o-chlorotoluene, o-diethylbenzene, o-dichlorobenzene, p-chlorotoluene, p-diethylbenzene, sec-butylbenzene, tert-butylbenzene, γ-butyrolactone, isobutyl alcohol, isophorone, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol monotertiary butyl ether, Ethylene glycol monobutyl ether, ethylene glycol monobutyl ether acetate, ethylene glycol monopropyl ether Ter, ethylene glycol monohexyl ether, ethylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, diisobutyl ketone, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate, diethylene glycol Monomethyl ether, cyclohexanol, cyclohexanol acetate, cyclohexanone, dipropylene glycol dimethyl ether, dipropylene glycol methyl ether acetate, dipropylene glycol monoethyl ether, dipropylene group Recall monobutyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monomethyl ether, diacetone alcohol, triacetin, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol diacetate, propylene glycol phenyl ether, propylene glycol monoethyl ether , Propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether, propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, benzyl alcohol, methyl isobutyl ketone Emissions, methylcyclohexanol, acetate n- amyl acetate n- butyl, isoamyl acetate, isobutyl acetate, propyl acetate, include dibasic acid esters such as, used alone or in combination.

  When dispersing a pigment in a monomer having an ethylenically unsaturated double bond or a transparent resin, a dispersant such as a surfactant, a resin-type pigment dispersant, and a pigment derivative can be used as appropriate. Since the dispersant is excellent in dispersing the pigment and has a great effect of preventing re-aggregation of the pigment after dispersion, a photosensitive resin composition in which the pigment is dispersed in a transparent resin and an organic solvent using the dispersant is used. If so, a color filter excellent in transparency can be obtained. The resin type pigment dispersant is used in an amount of 0.1 to 40 parts by weight, preferably 0.1 to 30 parts by weight with respect to 100 parts by weight of the pigment in the photosensitive resin composition. Can be used.

  Examples of the surfactant include polyoxyethylene alkyl ether sulfate, sodium dodecylbenzenesulfonate, alkali salt of styrene-acrylic acid copolymer, sodium alkylnaphthalenesulfonate, sodium alkyldiphenyletherdisulfonate, monoethanolamine lauryl sulfate. , Anionic surface activity such as triethanolamine lauryl sulfate, ammonium lauryl sulfate, monoethanolamine stearate, sodium stearate, sodium lauryl sulfate, monoethanolamine of styrene-acrylic acid copolymer, polyoxyethylene alkyl ether phosphate Agents: polyoxyethylene oleyl ether, polyoxyethylene lauryl ether, polyoxyethylene nonylphenyl ether, polyoxy Nonionic surfactants such as ethylene alkyl ether phosphates, polyoxyethylene sorbitan monostearate, and polyethylene glycol monolaurate; chaotic surfactants such as alkyl quaternary ammonium salts and their ethylene oxide adducts; alkyldimethyl Examples include amphoteric surfactants such as alkylbetaines such as aminoacetic acid betaine and alkylimidazolines, and fluorine-based and silicone-based surfactants.

  A resin-type pigment dispersant is a resin having a pigment-affinity part that has the property of adsorbing to a pigment, and a part that is compatible with a monomer having an ethylenically unsaturated double bond or a transparent resin. This serves to stabilize the dispersion of the pigment into the monomer having an ethylenically unsaturated double bond. Specific examples of resin-type pigment dispersants include polycarboxylic acid esters such as polyurethane and polyacrylate, unsaturated polyamides, polycarboxylic acids, polycarboxylic acid (partial) amine salts, polycarboxylic acid ammonium salts, and polycarboxylic acid alkylamines. Salts, polysiloxanes, long-chain polyaminoamide phosphates, hydroxyl group-containing polycarboxylic acid esters, their modified products, amides formed by the reaction of poly (lower alkyleneimines) with polyesters having free carboxyl groups, and the like Water-based dispersants such as oily dispersants such as salts, (meth) acrylic acid-styrene copolymers, (meth) acrylic acid- (meth) acrylic acid ester copolymers, styrene-maleic acid copolymers, polyvinyl alcohol, polyvinylpyrrolidone Resin, water-soluble polymer, polyester Modified polyacrylate, ethylene oxide / propylene oxide addition compound, phosphate ester-based and the like are used, they can be used alone or in admixture of two or more.

A pigment derivative is a compound in which a substituent is introduced into an organic pigment. Such organic pigments include light yellow aromatic polycyclic compounds such as naphthalene and anthraquinone which are not generally called pigments. Examples of the pigment derivative are described in JP-A-63-305173, JP-B-57-15620, JP-B-59-40172, JP-B-63-17102, JP-B-5-9469, and the like. These can be used alone or in combination of two or more (a method for producing a photosensitive resin composition)
The photosensitive resin composition used in this embodiment comprises a pigment, a monomer having an ethylenically unsaturated double bond together with the pigment dispersant as necessary, a three-roll mill in a transparent resin and an organic solvent as necessary, It can be produced by finely dispersing using various dispersing means such as a two-roll mill, a sand mill, a kneader, and an attritor and adding a photopolymerization initiator. In addition, the photosensitive resin composition for a color filter containing two or more pigments may be produced by mixing each pigment separately and finely dispersed in a monomer having an ethylenically unsaturated double bond. it can.

  The photosensitive resin composition according to the present embodiment is a coarse particle of 5 μm or more, preferably 1 μm or more, more preferably 0.5 μm or more by means of centrifugation, a sintered filter, a membrane filter, or the like. It is preferable to remove particles and mixed dust.

Next, a color filter manufacturing method according to the second embodiment of the present invention will be described. The color filter manufacturing method according to the present embodiment integrates a laser through a step of applying a photosensitive resin composition onto a substrate and a photomask for pixel formation on a portion that becomes a filter segment or a black matrix. exposure dose is 1 mJ / cm ² or more, and curing by irradiation so that 150 mJ / cm ² or less, a step of removing the unexposed portions of the photosensitive resin composition by developing the photosensitive after the developing The step of thermally curing the functional resin composition is repeated a plurality of times to form filter segments and a black matrix.

In this case, the accumulated exposure amount of the laser for forming the filter segment or black matrix, one pixel is 1 mJ / cm ² or more, must be at 150 mJ / cm ² or less, it is less than 1 mJ / cm ^2, curing Cannot be sufficiently performed, and if it exceeds 150 mJ / cm ² , the coating film of the photosensitive resin composition is decomposed due to the ablation phenomenon.

  Hereinafter, each manufacturing process of the color filter will be described.

(Coating process of photosensitive resin composition)
In the coating process of the photosensitive resin composition, coating is performed uniformly using a known coating apparatus such as a slit die coater or a spin coater. As the transparent substrate of the color filter, a known transparent substrate material such as a glass substrate, a quartz substrate, or a plastic substrate can be used. Among them, the glass substrate is excellent in transparency, strength, heat resistance, and weather resistance.

  Then, in order to remove a solvent component, a reduced pressure drying process and a prebaking process can be performed as needed.

(Exposure process)
In the exposure step, the portion of the photosensitive resin composition that becomes the filter segment or the black matrix is irradiated with a laser to be cured. Specifically, the photosensitive resin composition formed on a large-sized substrate is irradiated with a laser through a photomask that is smaller than the substrate and cured.

As the laser, a known laser such as a semiconductor laser, a YAG (solid) laser, or a gas laser (argon laser, helium neon laser, carbon dioxide laser, or excimer laser) can be used. It is essential to apply a weak energy that does not decompose the coating film of the photosensitive resin composition to be cured. The energy density per pulse of the laser is preferably 0.1 mJ / cm ² or more. To fully cure the coating, more preferably 0.3 mJ / cm ² or more, 1 mJ / cm ² or more is most preferable.

In the present embodiment, the photosensitive resin composition can be irradiated with the laser divided into a plurality of times. In order to suppress the abrasion behavior, suppressing the pulse energy of the laser, a plurality of times to repeat it an effective means, as described above, the integrated exposure amount 1 mJ / cm ² or more, at 150 mJ / cm ² or less It is necessary, and it is more preferably 1 mJ / cm ² or more and 50 mJ / cm ² or less.

(Exposure process)
In the development step, a filter segment or a black matrix is formed by removing an unexposed portion of the photosensitive resin composition by a conventionally known development method. In removing the unexposed portion, an aqueous solution such as sodium carbonate or sodium hydroxide is used as an alkali developer, and an organic alkali such as dimethylbenzylamine or triethanolamine can also be used. Moreover, an antifoamer and surfactant can also be added to a developing solution. As a development processing method, a shower development method, a spray development method, a dip (immersion) development method, a paddle (liquid accumulation) development method, or the like can be applied.

(Baking process)
In this embodiment, after forming a filter segment and a black matrix, the process of heat-processing and heat-curing can be provided. As a heating method, a convection oven, a hot plate, a halogen heater, heating by an IR oven, or the like can be used, and is not particularly limited. Here, it is preferable that heating is performed at a temperature of 200 ° C. or more and 250 ° C. or less for a time of 10 minutes or more and 60 minutes or less.

  Next, a color filter according to the third embodiment of the present invention manufactured by the color filter manufacturing method according to the second embodiment of the present invention described above will be described.

  The color filter according to the present embodiment includes a filter segment formed by the method for producing a color filter according to the second embodiment of the present invention, using the photosensitive resin composition according to the first embodiment of the present invention, and And / or a black matrix. The color of the filter segment is selected from about 2 to 6 colors from red, green, blue, yellow, purple, magenta, cyan, orange and the like. Filter segments having the same color and different densities may be formed.

  In the case of a color filter for liquid crystal, a transparent conductive layer and an alignment film layer are sequentially laminated. For example, the liquid crystal display device is disposed so as to face a counter substrate on which an electrode such as a thin film transistor is formed and a liquid crystal is interposed therebetween. Configure. In this specification, a transparent substrate, a black matrix, and a filter segment are combined to form a color filter. A protective layer can be provided on the color filter as necessary.

  EXAMPLES Hereinafter, although an Example demonstrates this invention in detail, this invention is not limited to these Examples. In the examples and comparative examples, “parts” and “%” mean “parts by weight” and “% by weight”, respectively.

  First, a method for preparing the acrylic resin solution and the pigment dispersion used in Examples and Comparative Examples will be described. The weight average molecular weight Mw of the resin is a polystyrene equivalent weight average molecular weight Mw measured by GPC (gel permeation chromatography).

(Synthesis example of acrylic resin solutions A to D)
370 parts of cyclohexanone was placed in a reaction vessel, heated to 80 ° C. while injecting nitrogen gas into this vessel, and 20.0 parts of methacrylic acid, 10.0 parts of methyl methacrylate, 55.0 n-butyl methacrylate at the same temperature. A mixture of 15.0 parts of 2-hydroxyethyl methacrylate and 36.0 parts of 2,2′-azobisisobutyronitrile was added dropwise over 1 hour to carry out a polymerization reaction.

  After completion of the dropwise addition, the mixture was further reacted at 80 ° C. for 3 hours, and then 1.0 part of azobisisobutyronitrile dissolved in 50 parts of cyclohexanone was added, and the reaction was further continued at 80 ° C. for 1 hour. Resin copolymer solution A was obtained.

  After cooling to room temperature, about 2 g of acrylic resin solution A is sampled and heated and dried at 180 ° C. for 20 minutes to measure the non-volatile content, so that the non-volatile content is 20% by weight in the previously synthesized acrylic resin solution. Acrylic resin solution A was prepared by adding cyclohexanone. The resulting acrylic resin A had a weight average molecular weight Mw of 5,000.

  Similarly, an acrylic resin B having a weight average molecular weight Mw of 10,000, an acrylic resin C having a weight average molecular weight Mw of 60,000, and an acrylic resin D having a weight average molecular weight Mw of 70,000 were prepared.

(Preparation of pigment dispersion)
The mixture having the composition shown in Table 1 below was uniformly stirred and mixed, dispersed in a sand mill for 5 hours using glass beads having a diameter of 1 mm, filtered through a 5 μm filter, red pigment dispersions R-1, R-2, R-3, R-4, green pigment dispersion G-1, blue pigment dispersion B-1, and black pigment dispersion BM-1 were prepared.

PR254: Diketopyrrolopyrrole pigment (CI Pigment Red 254)
("Irga Four Red B-CF" manufactured by Ciba Japan)
PR177: Anthraquinone pigment (CI Pigment Red 177)
(Chromo Tar Red A2B manufactured by Ciba Japan)
PG36: Copper halide phthalocyanine pigment (CI Pigment Green 36)
("Rionol Green 6YK" manufactured by Toyo Ink Co., Ltd.)
PB15: 6: ε-type copper phthalocyanine pigment (CI Pigment Blue 15: 6)
(BASF "Heliogen Blue L-6700F")
PY150: Nickel azo complex pigment (CI Pigment Yellow 150)
("E4GN" manufactured by LANXESS)
CB: Carbon Black (CI Pigment Black 7)
("MA11" manufactured by Mitsubishi Chemical Corporation)
Resin type pigment dispersant: “Solsperse 20000” manufactured by Nippon Lubrizol
Pigment derivative: the following formula (1) diketopyrrolopyrrole pigment derivative formula (1)

Acrylic resin solutions A to D: Acrylic resin solutions A to D prepared earlier
Solvent: Cyclohexanone (Preparation of photosensitive resin composition)
The mixture of the formulations shown in Table 2 below including the pigment dispersions R-1, R-2, R-3, R-4, G-1, B-1, and BM-1 prepared earlier is made uniform. After stirring and mixing, the mixture was filtered through a 1 μm filter to obtain each photosensitive resin composition.

Pigment dispersion: Pigment dispersion prepared earlier Acrylic resin solutions A to D: Acrylic resin solutions A to D prepared earlier
Monomer: Dipentaerythritol hexaacrylate (“Aronix M-402” manufactured by Toagosei Co., Ltd.)
Epoxy acrylate: Bisphenol A type epoxy acrylate ("VR-77" manufactured by Showa Polymer Co., Ltd.)
Organic solvent: cyclohexanone Photopolymerization initiator: Initiators 1 to 6 below
Initiator 1: α-aminoalkylphenone photopolymerization initiator 2- (dimethylamino) -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone ( “Irgacure 379” manufactured by Ciba Japan)
Initiator 2: Oxime ester-based photopolymerization initiator 1,2-octadion-1- [4- (phenylthio)-, 2- (o-benzoyloxime)] (“Irgacure OXE-01” manufactured by Ciba Japan)
Initiator 3: Oxime ester photoinitiator ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, 1- (0-acetyloxime) (Ciba “Irgacure OXE-02” manufactured by Japan
Initiator 4: α-aminoalkylphenone photopolymerization initiator 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one (“Irgacure 907” manufactured by Ciba Japan)
Initiator 5: Carbazole-based photopolymerization initiator 3,6-bis (2-methyl-2-morpholinopropionyl) -9-n-octylcarbazole (“ADEKA ARKLES N-1414” manufactured by ADEKA)
Initiator 6: Acylphosphine oxide photopolymerization initiator 2,4,6-trimethylbenzoyl-diphenylphosphine oxide ("Lucirin TPO" manufactured by BASF)
[Shape evaluation]
(1) About the linearity of the filter segment of the color filter created in the example and the comparative example, using an optical microscope, and (2) about the cross-sectional shape using a scanning electron microscope (SEM), the pattern shape Evaluation was made in 4 stages. The evaluation criteria are as follows. The results are shown in Tables 3-8 below.

(1) Linearity ○: Good linearity Δ: Partially poor linearity ×: Poor linearity ××: Pixels are hardly formed (2) Cross-sectional shape ○: Forward tapered shape (cross-sectionally trapezoidal, exposed surface Is small)
Δ: Inverted taper shape (the cross section is trapezoidal and the exposed surface is large)
×: Pixels are formed but it is difficult to determine the shape. ××: Pixels are hardly formed.
[Evaluation of film loss rate]
Measure the film thickness after coating the photosensitive resin composition, removing excess solvent by drying under reduced pressure, and the film thickness after heating at 230 ° C for 30 minutes and calculating the film reduction rate from the following formula The evaluation was made according to the following four criteria. The results are shown in Tables 3-8 below.

◎: Film reduction rate is less than 20% ○: Film reduction rate is 20% or more and less than 30% △: Film reduction rate is 30% or more and less than 50% ×: Film reduction rate is 50% or more Film reduction rate (%) = [ (Film thickness after coating and drying under reduced pressure -Film thickness after heating at 230 ° C. for 20 minutes)
/ Film thickness after coating and drying under reduced pressure] × 100
[Surface wrinkle evaluation]
About wrinkle evaluation, it carried out about Examples 14-22. Observation was made using an optical microscope, and the pattern shape was evaluated according to the following three-stage criteria. The results are shown in Tables 5 and 6 below.

○: No wrinkles (coating surface is smooth)
Δ: Partially wrinkled (wrinkled at the edge of the coating surface)
X: Wrinkles on the entire surface (a state where wrinkles are generated on the entire surface of the coating film)

(Filter segment and black matrix pattern formation)
[Examples 1 to 29, Comparative Examples 1 to 3]
The photosensitive resin composition having the composition shown in Tables 3 to 8 is applied on a 10 cm × 10 cm glass substrate with a spin coater to a thickness of about 2.5 μm, and left in an oven at 70 ° C. for 15 minutes. The excess solvent was removed and dried. Next, a photomask having a stripe pattern of 100 μm in the case of a filter segment, and a photomask having a stripe pattern of 20 μm in the case of a black matrix, spaced 150 μm from the coating film of the photosensitive resin composition. And an excimer laser with a wavelength of 308 nm (XeCL) was irradiated with a pulse width of 20 nsec, a frequency of 600 Hz, and an integrated exposure amount shown in Tables 3 to 8 above. The excimer laser device used was “LAMBDA SX200C” manufactured by Coherent, and the exposure amount was measured using “3 sigma (main body) J25LP-MUV (sensor head)” manufactured by Coherent.

  Then, after developing and removing an unexposed part, this board | substrate was heated at 230 degreeC for 30 minutes, and each color filter segment (red, green, blue) and black matrix (black) were formed.

<Effect of type of photopolymerization initiator>
Examples 1 to 8 are examples in which the types of photopolymerization initiators were variously changed, and as shown in Table 3 above, the cross-sectional shapes of all red, green, and blue filter segments and the black matrix, and The evaluation result of the film reduction rate was good.

<Effect of addition amount of epoxy acrylate and weight average molecular weight Mw of acrylic resin>
Examples 9 to 13 are examples in which the amount of epoxy acrylate in the solid content and the acrylic resin were changed, and as shown in Table 4 above, the weight average molecular weight Mw of the acrylic resin is a more preferable range. In Examples 10 to 12 using 1,000,000 acrylic resin B and 60,000 acrylic resin C, the evaluation results of the linearity, cross-sectional shape and film reduction rate of the filter segment were good. In Examples 9 and 13 using the acrylic resin A having an acrylic resin weight average molecular weight Mw of 5,000 and the acrylic resin D having a weight of 70000, the linearity defect partially occurs, but at a level that does not interfere with practical use. there were. In Comparative Example 1 in which no epoxy acrylate was used and in Comparative Example 2 in which the epoxy acrylate was used in excess of the upper limit, poor linearity occurred.

<Effects of ratio of photopolymerization initiator (A) / photopolymerization initiator (B)>
Examples 14 to 17 are examples in which the ratio of the acylphosphine oxide-based photopolymerization initiator B was variously changed. As shown in Table 5 above, in Example 14 in which the weight ratio (a) / (b) between the photopolymerization initiator A and the photopolymerization initiator B was 4.0, which is the upper limit of the present invention, linearity, cross-section The evaluation results of the shape and the film reduction rate were both good. Moreover, the coating film surface was in a smooth state. Further, Example 15 is an example in which the ratio of the acylphosphine oxide photopolymerization initiator is increased and the weight ratio of the photopolymerization initiator A and the photopolymerization initiator B is set to 0.6 which is the lower limit of the present invention. However, the evaluation results of linearity, cross-sectional shape, and film reduction rate were all good.

  On the other hand, in Example 16 in which the ratio of the acylphosphine oxide photopolymerization initiator was reduced and the weight ratio of the photopolymerization initiator A to the photopolymerization initiator B exceeded 4.0, the upper limit of the present invention, Due to the ablation phenomenon, the linearity and cross-sectional shape were slightly deteriorated, and because there was a difference in the degree of curing with the inside, a slight wrinkle was observed when observing the coating surface, but at a level that does not interfere with practical use there were. In Example 17, the ratio of the acylphosphine oxide photopolymerization initiator was extremely increased, and the weight ratio of the photopolymerization initiator A and the photopolymerization initiator B was less than 0.6, which is the lower limit of the present invention. Although the sensitivity was slightly insufficient and the linearity, cross-sectional shape, film reduction rate, and surface wrinkle were slightly deteriorated, the level was practically acceptable.

<Effects of monomer (M) / transparent resin (P) ratio>
Examples 18 to 22 are examples carried out by changing the monomer / transparent resin ratio. As shown in Table 6 above, Examples 18, 19, and 21 in which the monomer / transparent resin ratio was in the range of 0.60 to 2.00 were evaluated for linearity, cross-sectional shape, film reduction rate, and surface wrinkle. Was good. Further, in Example 20, which was less than the lower limit of 0.60 of the present invention, the linearity and the film reduction rate were slightly deteriorated, and in Example 22, which was more than 2.00 which was the upper limit, the cross-sectional shape was slightly deteriorated. In addition, since a difference in the degree of curing from the inside occurred, when the surface of the coating film was observed, although it was slightly wrinkled, it was at a level that would not interfere with practical use.

<Effects of photopolymerization initiator (I) / monomer (M) ratio>
Examples 23 to 26 are examples carried out by changing the photopolymerization initiator / monomer ratio. As shown in Table 7 above, Examples 23 to 25 in which the photopolymerization initiator / monomer ratio was in the range of 0.01 to 0.45 showed good evaluation results for linearity, cross-sectional shape, and film reduction rate. there were. Further, in Example 26 in which the amount of the photopolymerization initiator was increased and the photopolymerization initiator / monomer ratio was 0.57, the linearity was slightly deteriorated, but it was at a level that could be used.

<Effect by exposure amount>
Examples 27 to 30 and Comparative Example 3 are examples in which the exposure amount was changed. As shown in Table 8 above, in Examples 27 to 28 in which the exposure amount was within the more preferable range of the present invention, the evaluation results of linearity, cross-sectional shape, and film reduction rate were good. Further, in Example 29 in which the exposure amount was 60 mJ / cm ² within the scope of the present invention, the linearity was slightly deteriorated, but the level was not particularly problematic. In Example 30, which was relatively high at 140 mJ / cm ² , the linearity and the film reduction rate were slightly deteriorated due to the laser ablation phenomenon, but it was at a level that could be used. On the other hand, in Comparative Example 3 the amount of exposure exceeds 150 mJ / cm ² which is the upper limit of the present invention with 160 mJ / cm ^2, by ablation phenomenon of laser pixels was hardly formed.

Claims (8)

Pigment, a monomer having a transparent resin, ethylenically unsaturated double bond, a photopolymerization initiator and an epoxy acrylate, integrated exposure amount 1 mJ / cm ² or more, it is curable by laser irradiation of 150 mJ / cm ² or less sensitive The epoxy acrylate is 0.1 wt% or more and 20.0 wt% or less based on the total solid content of the photosensitive resin composition, and the photopolymerization initiator is an oxime ester At least one photopolymerization initiator A selected from a photopolymerization initiator, an α-aminoalkylphenone photopolymerization initiator, and a carbazole photopolymerization initiator; an acylphosphine oxide photopolymerization initiator B; The weight ratio (a) / (b) between the content (a) of the photopolymerization initiator A and the content (b) of the photopolymerization initiator B is 0.6 or more and 4.0. The photosensitive resin composition characterized by the following .   The photosensitive resin composition according to claim 1, wherein the transparent resin has a weight average molecular weight Mw of 5,000 or more and 70,000 or less. The ratio (M / P) of the weight (M) of the monomer having an ethylenically unsaturated double bond to the weight (P) of the transparent resin is 0.60 or more and 2.00 or less. The photosensitive resin composition of Claim 1 or 2 . The ratio (I / M) of the weight (I) of the photopolymerization initiator to the weight (M) of the monomer having an ethylenically unsaturated double bond is 0.01 or more and 0.45 or less, The photosensitive resin composition according to any one of claims 1 to 3 . The step of forming a coating film of the photosensitive resin composition according to any one of claims 1 to 4 on a substrate, a part of the photosensitive resin composition coating film that becomes a filter segment or a black matrix has an integrated exposure amount. 1 mJ / cm ² or more, 150 mJ / cm curing by irradiating a laser to be ² or less, wherein the step of the uncured portions of the photosensitive resin composition coating film is removed to form the filter segment or black matrix, A method for producing a color filter, comprising the steps of repeating the above steps a plurality of times to form a filter segment or black matrix of at least two colors. The method for producing a color filter according to claim 5 , wherein the laser has a wavelength of 300 nm or more and 500 nm or less. In the step of curing by irradiating with the laser, the integrated exposure amount is 1 mJ / cm ² or more and 50 mJ / cm ² or less in a portion of the photosensitive resin composition coating film that becomes a filter segment or a black matrix. The method for producing a color filter according to claim 5 or 6 . A color filter manufactured by the method for manufacturing a color filter according to claim 5 .