Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP5572815B2 - Method and device for forming iron having corrosion resistance - Google Patents
[go: Go Back, main page]

JP5572815B2 - Method and device for forming iron having corrosion resistance - Google Patents

Method and device for forming iron having corrosion resistance Download PDF

Info

Publication number
JP5572815B2
JP5572815B2 JP2012242104A JP2012242104A JP5572815B2 JP 5572815 B2 JP5572815 B2 JP 5572815B2 JP 2012242104 A JP2012242104 A JP 2012242104A JP 2012242104 A JP2012242104 A JP 2012242104A JP 5572815 B2 JP5572815 B2 JP 5572815B2
Authority
JP
Japan
Prior art keywords
iron
forming
corrosion resistance
laser light
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012242104A
Other languages
Japanese (ja)
Other versions
JP2014091846A (en
Inventor
昌幸 大越
成美 井上
雄太 粟飯原
Original Assignee
防衛省技術研究本部長
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 防衛省技術研究本部長 filed Critical 防衛省技術研究本部長
Priority to JP2012242104A priority Critical patent/JP5572815B2/en
Publication of JP2014091846A publication Critical patent/JP2014091846A/en
Application granted granted Critical
Publication of JP5572815B2 publication Critical patent/JP5572815B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Chemical Treatment Of Metals (AREA)
  • Physical Vapour Deposition (AREA)

Description

本発明は、材料の表面改質法に係り、とくに、鉄表面に酸化鉄層を形成することによる耐食性を有する鉄の形成法及びそれを用いたデバイスに関する。   The present invention relates to a surface modification method of a material, and more particularly to a method of forming iron having corrosion resistance by forming an iron oxide layer on an iron surface and a device using the same.

鉄は、強磁性、耐熱性、資源的に豊富であるなど優れた特性を有しているため、バルクのみならず薄膜としての利用も望まれている。しかし、鉄は耐食性に欠けるため、その利用の範囲は制限されてきた。   Since iron has excellent properties such as ferromagnetism, heat resistance, and abundant resources, it is desired to be used not only as a bulk but also as a thin film. However, since iron lacks corrosion resistance, the range of its use has been limited.

そのため、錆びにくい鉄を形成するための手法の確立が課題となっている。   Therefore, establishment of the technique for forming iron which does not rust easily has been an issue.

そこで、本発明は、上記の点に鑑み、高い耐食性を有する、つまり錆にくい鉄を形成することが可能な耐食性を有する鉄の形成法及びそれを用いたデバイスを提供することを目的とする。   Therefore, in view of the above points, an object of the present invention is to provide a method of forming iron having high corrosion resistance, that is, having corrosion resistance capable of forming iron that is not easily rusted, and a device using the same.

本発明の第1の態様は耐食性を有する鉄の形成法であり、酸素を含む雰囲気中における波長200nm以下の光照射により、純鉄表面に酸化鉄層としてのFe層を形成することを特徴とする。 The first aspect of the present invention is a method for forming corrosion-resistant iron, and an Fe 3 O 4 layer as an iron oxide layer is formed on a pure iron surface by light irradiation with a wavelength of 200 nm or less in an atmosphere containing oxygen. It is characterized by.

本発明の第2の態様も耐食性を有する鉄の形成法であり、酸素を含む雰囲気中における波長200nm以下の光照射により、鉄表面に含まれる炭素を除去し、かつ酸化鉄層としてのFe層を形成することを特徴とする。 The second aspect of the present invention is also a method for forming corrosion-resistant iron, in which carbon contained in the iron surface is removed by irradiation with light having a wavelength of 200 nm or less in an oxygen-containing atmosphere , and Fe 3 as an iron oxide layer. An O 4 layer is formed.

本発明の第3の態様はデバイスであり、第1又は第2の態様に係る鉄の形成法で得られた耐食性を有する鉄を備えることを特徴とする。   A third aspect of the present invention is a device, comprising iron having corrosion resistance obtained by the iron forming method according to the first or second aspect.

なお、以上の構成要素の任意の組合せ、本発明の表現を方法やシステムなどの間で変換したものもまた、本発明の態様として有効である。   It should be noted that any combination of the above-described constituent elements, and those obtained by converting the expression of the present invention between methods and systems are also effective as aspects of the present invention.

本発明によれば、高い耐食性を有する鉄の形成手法を確立でき、鉄材料を使用することで高い性能を発揮できるデバイス作製の基礎技術として利用可能であるなど、あらゆる分野において必要不可欠な技術となる。   According to the present invention, it is possible to establish a method for forming iron having high corrosion resistance, and it can be used as a basic technology for device fabrication that can exhibit high performance by using an iron material. Become.

本発明の実施の形態を示す構成図である。It is a block diagram which shows embodiment of this invention.

以下、図面を参照しながら本発明の好適な実施の形態を詳述する。なお、各図面に示される同一または同等の構成要素、部材、処理等には同一の符号を付し、適宜重複した説明は省略する。また、実施の形態は発明を限定するものではなく例示であり、実施の形態に記述されるすべての特徴やその組み合わせは必ずしも発明の本質的なものであるとは限らない。   Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. In addition, the same code | symbol is attached | subjected to the same or equivalent component, member, process, etc. which are shown by each drawing, and the overlapping description is abbreviate | omitted suitably. In addition, the embodiments do not limit the invention but are exemplifications, and all features and combinations thereof described in the embodiments are not necessarily essential to the invention.

図1で本発明に係る耐食性を有する鉄の形成法の実施の形態を示す。図1(a)では、板状もしくは薄膜状の純鉄1の表面に、波長200nm以下の光としてレーザー光2を酸素を含む雰囲気中(例えば大気中乃至減圧空気中あるいは酸素のみの雰囲気中等であり、圧力は大気圧以下とは限らない)にて照射する。図1(b)には、レーザー光照射により鉄表面に形成された酸化鉄(Fe)層3が示されている。前記薄膜状の純鉄1は基板上に真空蒸着等で形成可能である。なお、波長200nmより波長の長い光は酸素分子に吸収されなくなるため、有効ではない。 FIG. 1 shows an embodiment of a method for forming iron having corrosion resistance according to the present invention. In FIG. 1A, the surface of a pure iron 1 in the form of a plate or thin film is irradiated with laser light 2 as light having a wavelength of 200 nm or less in an atmosphere containing oxygen (for example, in the atmosphere, in a reduced-pressure air, or in an atmosphere containing only oxygen). Yes, the pressure is not necessarily below atmospheric pressure). FIG. 1B shows an iron oxide (Fe 3 O 4 ) layer 3 formed on the iron surface by laser light irradiation. The thin film-like pure iron 1 can be formed on a substrate by vacuum deposition or the like. Note that light having a wavelength longer than 200 nm is not effective because it is not absorbed by oxygen molecules.

図1において、純鉄の代わりに、炭素を含む低純度の鉄材料を用いてもよい。また、板状もしくは薄膜状の鉄の代わりに、粒子状など別の形態の鉄材料を用いてもよい。   In FIG. 1, a low-purity iron material containing carbon may be used instead of pure iron. Further, instead of plate-like or thin-film iron, other forms of iron material such as particles may be used.

この耐食性を有する鉄の形成法で得られた鉄を備えたデバイスは、例えば、所定の基板上に薄膜状の純鉄1を真空蒸着等で形成後、前記レーザー光の照射を行って表面に酸化鉄(Fe)層を形成することで得られる。これにより基板上に耐食性鉄薄膜を有する磁性体デバイスが得られる。必要に応じて、基板上に他の薄膜や素子を形成すればよい。 A device provided with iron obtained by this method of forming iron having corrosion resistance is formed on a surface by, for example, forming thin-film pure iron 1 on a predetermined substrate by vacuum deposition or the like, and then irradiating the laser beam. It is obtained by forming an iron oxide (Fe 3 O 4 ) layer. Thereby, a magnetic device having a corrosion-resistant iron thin film on the substrate is obtained. If necessary, another thin film or element may be formed on the substrate.

この実施の形態によれば、次の通りの効果を得ることができる。   According to this embodiment, the following effects can be obtained.

(1) 純鉄にレーザー光2を照射する場合、純鉄の表面に極薄い緻密な酸化鉄(Fe)層を形成できる。 (1) When irradiating laser light 2 to pure iron, an extremely thin dense iron oxide (Fe 3 O 4 ) layer can be formed on the surface of pure iron.

(2) 炭素を含む低純度の鉄材料を用いる場合、レーザー光2の照射によって鉄表面に含まれる炭素を除去し、かつ極薄い緻密な酸化鉄(Fe)層を形成できる。 (2) When a low-purity iron material containing carbon is used, the carbon contained in the iron surface can be removed by irradiation with laser light 2 and an extremely thin dense iron oxide (Fe 3 O 4 ) layer can be formed.

(3) 耐食性を有する鉄を備えるデバイスを作製可能である。 (3) It is possible to produce a device comprising iron having corrosion resistance.

以下、本発明に係る耐食性を有する鉄の形成法を実施例で詳述する。 Hereinafter, the method for forming corrosion-resistant iron according to the present invention will be described in detail in Examples.

スライドガラス基板上(大きさ8×26mm、厚さ1mm)に、鉄板(純度99.99%)をターゲットとした電子ビーム蒸着法により、純鉄薄膜(膜厚50nm)を形成した。その試料表面に、波長157nmのフッ素(F)レーザー光を照射した。そのときの単一パルス当たりのレーザーフルエンスは40mJ/cm、パルス繰り返し周波数は10Hz、照射時間は60minとした。また、レーザー光のパルス幅は20nsであった。レーザー光照射は室温、大気圧中で行った。 A pure iron thin film (film thickness 50 nm) was formed on a slide glass substrate (size 8 × 26 mm 2 , thickness 1 mm) by an electron beam evaporation method using an iron plate (purity 99.99%) as a target. The sample surface was irradiated with fluorine (F 2 ) laser light having a wavelength of 157 nm. The laser fluence per single pulse at that time was 40 mJ / cm 2 , the pulse repetition frequency was 10 Hz, and the irradiation time was 60 min. The pulse width of the laser light was 20 ns. Laser light irradiation was performed at room temperature and atmospheric pressure.

レーザー光が照射された試料表面の化学結合状態を、光電子分光分析により調べた。Fレーザー光が照射されたFe薄膜の最表面において、710.8eVにFeを示すピークが測定された。このピークは、レーザー光未照射の試料表面でも見られることから、自然酸化によるものと考えられる。その後、試料をArイオンスパッタリング(加速電圧2kV)により深さ方向に分析を進めていくと、表面から深さ1nmのところでは、ピークの位置が710.4eVに化学シフトすることがわかった。これは、Fe層の形成を示している。また、深さ3nmでは、Fe単体を示すピーク(707.0eV)が見え始めた。したがって、約1nm厚のF自然酸化層の下に、Fレーザー光の照射により、約2nm厚のFe層が形成していることが判明した。 The chemical bonding state of the sample surface irradiated with the F 2 laser beam was examined by photoelectron spectroscopy. A peak indicating Fe 2 O 3 at 710.8 eV was measured on the outermost surface of the Fe thin film irradiated with the F 2 laser beam. Since this peak is also observed on the surface of the sample not irradiated with laser light, it is considered that this peak is due to natural oxidation. Thereafter, when the sample was analyzed in the depth direction by Ar + ion sputtering (acceleration voltage 2 kV), it was found that the peak position was chemically shifted to 710.4 eV at a depth of 1 nm from the surface. This indicates the formation of the Fe 3 O 4 layer. Further, at a depth of 3 nm, a peak (707.0 eV) indicating Fe alone began to appear. Therefore, it was found that an Fe 3 O 4 layer having a thickness of about 2 nm was formed under the F 2 O 3 natural oxide layer having a thickness of about 1 nm by irradiation with F 2 laser light.

レーザー光未照射及び照射試料を用いて、アノード分極挙動による耐食性試験を行った。試験では、対極にPt板を使用し、参照電極としてAg/AgClを用いた。測定における印加電圧の走査速度は1.75mV/sとした。試験溶液には、模擬海水として、濃度3wt%のNaCl水溶液を用いた。未照射試料の場合、自然電位が約−680mVであったが、Fレーザー光照射後、約−315mVまで変化し、365mV程度移行することが認められた。また、未照射試料に比べて照射試料では、電圧印加後0.05mA/cmまでは勾配が緩やかであった。その後、未照射試料と同じ勾配で直線的に変化した。以上より、Fレーザー光により形成したFe層は、NaCl水溶液中での電圧印加によっても、Fe薄膜からFeイオンの溶出を著しく抑制することがわかった。したがって、Fレーザー光により、耐食性を呈するFe薄膜の形成が可能となった。 A corrosion resistance test based on anodic polarization behavior was performed using the laser light unirradiated and irradiated samples. In the test, a Pt plate was used as the counter electrode, and Ag / AgCl was used as the reference electrode. The scanning speed of the applied voltage in the measurement was 1.75 mV / s. The test solution used was a 3 wt% NaCl aqueous solution as simulated seawater. In the case of the unirradiated sample, the natural potential was about −680 mV, but after irradiation with the F 2 laser light, it changed to about −315 mV, and a shift of about 365 mV was observed. In addition, compared with the unirradiated sample, the gradient of the irradiated sample was gentle until 0.05 mA / cm 2 after voltage application. Thereafter, it changed linearly with the same gradient as the unirradiated sample. From the above, it has been found that the Fe 3 O 4 layer formed by the F 2 laser beam remarkably suppresses the elution of Fe ions from the Fe thin film even when a voltage is applied in an NaCl aqueous solution. Therefore, it became possible to form an Fe thin film exhibiting corrosion resistance by F 2 laser light.

レーザー光が照射された試料を、濃度0.01wt%のHNO水溶液中に60min浸漬した結果、耐薬品性を呈することがわかった。また、濃度3wt%のNaCl水溶液中において3日間浸漬しても、Fレーザー光が照射された試料表面では錆びは発生しなかった。 As a result of immersing the sample irradiated with the F 2 laser beam in an aqueous HNO 3 solution having a concentration of 0.01 wt% for 60 min, it was found that the sample exhibited chemical resistance. Further, even when immersed in a 3 wt% NaCl aqueous solution for 3 days, no rust was generated on the surface of the sample irradiated with the F 2 laser beam.

純鉄薄膜の代わりに鋳鉄板を用い、その表面に波長157nmのFレーザー光を照射した。そのときの単一パルス当たりのレーザーフルエンスは40mJ/cm、パルス繰り返し周波数は10Hz、照射時間は60minとした。また、レーザー光のパルス幅は20nsであった。レーザー光照射は室温、大気圧中で行った。 A cast iron plate was used instead of the pure iron thin film, and the surface thereof was irradiated with F 2 laser light having a wavelength of 157 nm. The laser fluence per single pulse at that time was 40 mJ / cm 2 , the pulse repetition frequency was 10 Hz, and the irradiation time was 60 min. The pulse width of the laser light was 20 ns. Laser light irradiation was performed at room temperature and atmospheric pressure.

レーザー光が照射された試料表面の化学結合状態を、光電子分光分析により調べた。Fレーザー光の照射後、炭素を示すピーク(284.5eV)が見られなくなった。また、Fレーザー光照射後約2nmのFe層の形成も認められた。したがって、鉄表面に含まれる炭素がFレーザー光の照射により除去され、純化した表面が酸化鉄(Fe)層に改質されたものと考えられる。 The chemical bonding state of the sample surface irradiated with the F 2 laser beam was examined by photoelectron spectroscopy. After irradiation with F 2 laser light, a peak indicating carbon (284.5 eV) was not observed. Moreover, formation of a Fe 3 O 4 layer of about 2 nm after F 2 laser light irradiation was also observed. Therefore, it is considered that carbon contained in the iron surface was removed by irradiation with F 2 laser light, and the purified surface was modified into an iron oxide (Fe 3 O 4 ) layer.

上記実施例で述べたように、本発明によれば、高い耐食性を有する鉄が形成できるようになり、鉄材料を使用することで高い性能を発揮できるデバイスの作製に繋がる。この結果は、電気電子工学分野でのデバイス作製の基礎技術に適用可能になるなど、その用途はあらゆる分野で有用である。   As described in the above embodiments, according to the present invention, iron having high corrosion resistance can be formed, and the use of an iron material leads to the production of a device capable of exhibiting high performance. This result is useful in all fields, such as being applicable to basic technology for device fabrication in the field of electrical and electronic engineering.

以上、実施の形態及び実施例を例に本発明を説明したが、実施の形態の各構成要素や各処理プロセスには請求項に記載の範囲で種々の変形が可能であることは当業者に理解されるところである。以下、変形例について触れる。   Although the present invention has been described above by way of embodiments and examples, it will be understood by those skilled in the art that various modifications can be made to each component and each processing process of the embodiments within the scope of the claims. It is understood. Hereinafter, modifications will be described.

実施例では、鉄表面に波長157nmのフッ素(F)レーザー光を照射する場合で説明したが、Oを分解できる波長200nm以下(とくに好ましくは波長157nm以下)の光照射であれば、同等の効果が期待できる。また、照射する光はレーザー光であってもよいし、それ以外の光であってもよい。 In the examples, the case where the iron surface is irradiated with a fluorine (F 2 ) laser beam having a wavelength of 157 nm has been described. However, if light irradiation with a wavelength of 200 nm or less (particularly preferably, wavelength of 157 nm or less) that can decompose O 2 is used, Can be expected. Further, the light to be irradiated may be laser light or other light.

1 板状もしくは薄膜状の純鉄
2 レーザー光
3 酸化鉄(Fe)層
1 Plate-like or thin-film pure iron 2 Laser light 3 Iron oxide (Fe 3 O 4 ) layer

Claims (3)

酸素を含む雰囲気中における波長200nm以下の光照射により、純鉄表面に酸化鉄層としてのFe層を形成することを特徴とする耐食性を有する鉄の形成法。 A method of forming corrosion-resistant iron, characterized in that an Fe 3 O 4 layer as an iron oxide layer is formed on a pure iron surface by light irradiation with a wavelength of 200 nm or less in an atmosphere containing oxygen . 酸素を含む雰囲気中における波長200nm以下の光照射により、鉄表面に含まれる炭素を除去し、かつ酸化鉄層としてのFe層を形成することを特徴とする耐食性を有する鉄の形成法。 A method of forming corrosion-resistant iron, characterized by removing carbon contained in the iron surface by light irradiation in an atmosphere containing oxygen at a wavelength of 200 nm or less and forming an Fe 3 O 4 layer as an iron oxide layer . 請求項1又は2記載の鉄の形成法で得られた耐食性を有する鉄を備えることを特徴とするデバイス。   A device comprising iron having corrosion resistance obtained by the iron forming method according to claim 1.
JP2012242104A 2012-11-01 2012-11-01 Method and device for forming iron having corrosion resistance Active JP5572815B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012242104A JP5572815B2 (en) 2012-11-01 2012-11-01 Method and device for forming iron having corrosion resistance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012242104A JP5572815B2 (en) 2012-11-01 2012-11-01 Method and device for forming iron having corrosion resistance

Publications (2)

Publication Number Publication Date
JP2014091846A JP2014091846A (en) 2014-05-19
JP5572815B2 true JP5572815B2 (en) 2014-08-20

Family

ID=50936168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012242104A Active JP5572815B2 (en) 2012-11-01 2012-11-01 Method and device for forming iron having corrosion resistance

Country Status (1)

Country Link
JP (1) JP5572815B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115612973B (en) * 2022-11-02 2024-11-22 上海仅博激光技术有限公司 Laser high temperature flash formation method for oxide film on the surface of steel material

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008255400A (en) * 2007-04-03 2008-10-23 National Institute Of Advanced Industrial & Technology Metal surface processing method
JP5266490B2 (en) * 2007-09-20 2013-08-21 防衛省技術研究本部長 High density oxidation of materials

Also Published As

Publication number Publication date
JP2014091846A (en) 2014-05-19

Similar Documents

Publication Publication Date Title
Zheng et al. Fabrication of self-cleaning superhydrophobic surface on aluminum alloys with excellent corrosion resistance
Walton et al. Electron beam generated plasmas for the processing of graphene
Jang et al. Rapid-thermal-annealing surface treatment for restoring the intrinsic properties of graphene field-effect transistors
KR20190020037A (en) Gravure patterning using hard mask coating
JP2019157273A5 (en)
Boris et al. Controlling the electron energy distribution function of electron beam generated plasmas with molecular gas concentration: I. Experimental results
KR20190021325A (en) Method for providing a temporary protective layer on a graphen sheet
EP2006249A3 (en) High resolution plasma etch
Ma et al. Combination of plasma electrolytic processing and mechanical polishing for single-crystal 4H-SiC
Wang et al. Preparation of lotus-like hierarchical microstructures on zinc substrate and study of its wettability
US20140319655A1 (en) Method for coupling a graphene layer and a substrate and device comprising the graphene/substrate structure obtained
JP5572815B2 (en) Method and device for forming iron having corrosion resistance
CN104037061A (en) Method for direct electron beam nano-etching or printing under wet environment
US10811162B2 (en) Method for healing defect of conductive layer, method for forming metal-carbon compound layer, 2D nano materials, transparent electrode and method for manufacturing the same
Yasumaru et al. Formation of organic layer on femtosecond laser-induced periodic surface structures
KR101465561B1 (en) Processing method for superhydrophobic stainless steel substrate surface and stainless steel substrate having the superhydrophobic surface prepared with the same
Rifai et al. Effect of Deformation Structure and Annealing Temperature on Corrosion of Ultrafine‐Grain Fe‐Cr Alloy Prepared by Equal Channel Angular Pressing
KR101982998B1 (en) Rare earth thin film magnet and manufacturing method thereof
Wang et al. Study on reducing side etching of Copper microelectrode by multi-step etching process
You et al. One-step etching fabrication of superhydrophobic CuO/Cu2O/CuCl hybrid films with integrated anti-corrosion, self-cleaning and long-term stability
Schäfer et al. Fabrication of smooth, periodic surface structures: Combining direct laser interference patterning and electropolishing
Zdorovets et al. Study of irradiation effect of Xe+ 22 and Kr+ 14 ions on structural properties of Zn nanotubes
Caricato et al. Laser deposition of semiconductor thin films based on iron oxides
Azimi et al. Nanoscale lithography of LaAlO3/SrTiO3 wires using silicon stencil masks
Barzola-Quiquia et al. The influence of Ga+ irradiation on the transport properties of mesoscopic conducting thin films

Legal Events

Date Code Title Description
A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140312

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140509

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140528

R150 Certificate of patent (=grant) or registration of utility model

Ref document number: 5572815

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350