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JP5653768B2 - Gas purification equipment - Google Patents
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JP5653768B2 - Gas purification equipment - Google Patents

Gas purification equipment Download PDF

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JP5653768B2
JP5653768B2 JP2011008206A JP2011008206A JP5653768B2 JP 5653768 B2 JP5653768 B2 JP 5653768B2 JP 2011008206 A JP2011008206 A JP 2011008206A JP 2011008206 A JP2011008206 A JP 2011008206A JP 5653768 B2 JP5653768 B2 JP 5653768B2
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carbon dioxide
separation membrane
cleaning
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JP2012149002A (en
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昌文 三井
昌文 三井
竹田 久人
久人 竹田
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Sumitomo Heavy Industries Environment Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02CCAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00Capture or disposal of greenhouse gases
    • Y02C20/40Capture or disposal of greenhouse gases of CO2
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/151Reduction of greenhouse gas [GHG] emissions, e.g. CO2

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  • Separation Using Semi-Permeable Membranes (AREA)
  • Gas Separation By Absorption (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Description

本発明は、メタン及び二酸化炭素を主成分とする原料ガスからメタンを主成分とする精製ガスを精製するガス精製装置に関する。   The present invention relates to a gas purifier for purifying a purified gas mainly composed of methane from a raw material gas mainly composed of methane and carbon dioxide.

従来、このような技術分野のガス精製装置としては、原料ガスを洗浄して二酸化炭素を吸収する洗浄手段と、洗浄手段で洗浄された原料ガスを精製ガスとオフガスとに分離する分離膜と、分離膜で分離されたオフガスを洗浄手段の上流側に戻すオフガス戻しラインと、を備えたものが知られている(例えば、特許文献1参照)。   Conventionally, as a gas purification apparatus in such a technical field, a cleaning unit that cleans a source gas and absorbs carbon dioxide, a separation membrane that separates the source gas cleaned by the cleaning unit into purified gas and off-gas, An apparatus including an off-gas return line that returns the off-gas separated by the separation membrane to the upstream side of the cleaning means is known (for example, see Patent Document 1).

特開2010−174167号公報JP 2010-174167 A

上記ガス精製装置では、洗浄手段において二酸化炭素が吸収され、メタン濃度が高められた原料ガスから、より高いメタン濃度の精製ガスが分離膜で分離される。また、分離膜で精製ガスと分離され、洗浄手段の上流側に戻されたオフガスから更に精製ガスが分離されるため、原料ガスからの精製ガスの回収率が高まる。しかしながら、分離膜の他に洗浄手段を備えるために、装置の設置スペース、洗浄水量、ポンプ類の能力等の設備規模が大きくなってしまうという問題があった。   In the gas purification apparatus, carbon dioxide is absorbed in the cleaning means, and the purified gas having a higher methane concentration is separated from the raw material gas having an increased methane concentration by the separation membrane. Further, since the purified gas is further separated from the off gas separated from the purified gas by the separation membrane and returned to the upstream side of the cleaning means, the recovery rate of the purified gas from the raw material gas is increased. However, since the cleaning means is provided in addition to the separation membrane, there is a problem that the equipment scale such as the installation space of the apparatus, the amount of cleaning water, the capacity of pumps and the like becomes large.

そこで、本発明は、高いメタン濃度の精製ガスを高い回収率で精製することができると共に、設置スペース、洗浄水量、ポンプ類の能力等の設備規模を削減することができるガス精製装置の提供を目的とする。   Therefore, the present invention provides a gas purification apparatus that can purify a purified gas with a high methane concentration at a high recovery rate and reduce the equipment scale such as the installation space, the amount of washing water, and the capacity of pumps. Objective.

本発明者等は、上記洗浄手段の最も重要な役割は、上記分離膜の前段でメタン濃度を高めることではなく、ガス精製装置内を循環する二酸化炭素が増加するのを防止することにあり、洗浄手段の設置箇所が分離膜の前段である必要はないことを見出し、本発明に至った。   The present inventors, the most important role of the cleaning means is not to increase the methane concentration in the previous stage of the separation membrane, but to prevent the increase of carbon dioxide circulating in the gas purification device, The present inventors have found that the place where the cleaning means is installed does not have to be in front of the separation membrane, and have reached the present invention.

そこで、本発明に係るガス精製装置は、メタン及び二酸化炭素を主成分とする原料ガスからメタンを主成分とする精製ガスを精製するガス精製装置であって、原料ガスを精製ガスとオフガスとに分離する分離膜と、分離膜で分離されたオフガスを洗浄し二酸化炭素を吸収する洗浄手段と、洗浄手段で洗浄されたオフガスを分離膜に供給すべく分離膜の上流側に戻すオフガス戻しラインと、分離膜の前段に設けられ、オフガス戻しラインにより戻されたオフガスと原料ガスとに含まれた水分を除去する水分除去手段と、を備えたことを特徴とする。 Therefore, the gas purification apparatus according to the present invention is a gas purification apparatus for purifying a purified gas mainly composed of methane from a raw material gas mainly composed of methane and carbon dioxide, wherein the raw material gas is converted into purified gas and off gas. A separation membrane for separating, a cleaning means for cleaning off-gas separated by the separation membrane and absorbing carbon dioxide, an off-gas return line for returning the off-gas cleaned by the cleaning means to the upstream side of the separation membrane to supply the separation membrane; And a moisture removing means for removing moisture contained in the off gas and the raw material gas, which are provided in the preceding stage of the separation membrane and returned by the off gas return line .

このようなガス精製装置では、分離膜により、原料ガスから高いメタン濃度の精製ガスが分離される。精製ガスと分離されたオフガスは、洗浄装置により洗浄され、オフガス戻しラインにより分離膜の上流側に戻される。分離膜の上流側に戻されたオフガスからは、分離膜により更に精製ガスが分離される。このため、精製ガスを高い回収率で精製することができる。また、洗浄手段が洗浄するのは、原料ガスから精製ガスが分離されたオフガスのみであり、洗浄手段が洗浄するガスの量が少ないため、洗浄手段を小型化することができる。さらに、オフガスの二酸化炭素濃度は原料ガスの二酸化炭素濃度に比べて高いため、洗浄手段における二酸化炭素の吸収効率が高く、洗浄手段をより小型化することができる。これにより、ガス精製装置の設置スペース、洗浄水量、ポンプ類の能力等の設備規模を削減することができる。   In such a gas purification apparatus, a purified gas having a high methane concentration is separated from the raw material gas by the separation membrane. The off gas separated from the purified gas is cleaned by the cleaning device, and returned to the upstream side of the separation membrane by the off gas return line. The purified gas is further separated from the off gas returned to the upstream side of the separation membrane by the separation membrane. For this reason, the purified gas can be purified with a high recovery rate. Further, the cleaning means only cleans off gas from which the purified gas is separated from the raw material gas, and since the amount of gas cleaned by the cleaning means is small, the cleaning means can be miniaturized. Furthermore, since the carbon dioxide concentration of the off gas is higher than the carbon dioxide concentration of the raw material gas, the carbon dioxide absorption efficiency in the cleaning means is high, and the cleaning means can be further downsized. Thereby, installation scales, such as the installation space of a gas purification apparatus, the amount of washing water, and the capability of pumps, can be reduced.

ここで、洗浄手段は、常圧でオフガスを洗浄し二酸化炭素を吸収する構成であると、洗浄手段において二酸化炭素と共に吸収されるメタンの量が少なくなり、精製ガスの回収率が高まる。   Here, if the cleaning unit is configured to clean off-gas at normal pressure and absorb carbon dioxide, the amount of methane absorbed together with carbon dioxide in the cleaning unit is reduced, and the recovery rate of purified gas is increased.

また、洗浄手段は、加圧状態でオフガスを洗浄し二酸化炭素を吸収する構成であると、常圧で洗浄するのに比べ二酸化炭素の吸収効率が高まり、分離膜の上流側に戻るオフガスのメタン濃度が高くなる。これにより、高い効率で精製ガスを精製することができる。なお、加圧状態で洗浄すると、常圧で洗浄するのに比べ二酸化炭素と共に吸収されるメタンの量が増える。しかし、オフガスのメタン濃度は原料ガスのメタン濃度に比べ低いため、オフガスを加圧状態で洗浄しても、原料ガスを加圧状態で洗浄するのに比べメタンは吸収され難い。このため、精製ガスの回収率の低下は抑制される。   Further, when the cleaning means is configured to clean off-gas in a pressurized state and absorb carbon dioxide, the absorption efficiency of carbon dioxide increases compared to cleaning at normal pressure, and off-gas methane returns to the upstream side of the separation membrane. The concentration becomes high. Thereby, the purified gas can be purified with high efficiency. In addition, when it wash | cleans in a pressurized state, the quantity of the methane absorbed with a carbon dioxide will increase compared with washing | cleaning by a normal pressure. However, since the off-gas methane concentration is lower than the methane concentration of the source gas, even if the off-gas is washed in a pressurized state, methane is less likely to be absorbed than in the case where the source gas is washed in a pressurized state. For this reason, the fall of the recovery rate of refined gas is suppressed.

本発明のガス精製装置によれば、高いメタン濃度の精製ガスを高い回収率で精製することができると共に、設置スペース、洗浄水量、ポンプ類の能力等の設備規模を削減することができる。   According to the gas purification apparatus of the present invention, a purified gas having a high methane concentration can be purified with a high recovery rate, and the equipment scale such as installation space, the amount of washing water, and the capacity of pumps can be reduced.

本発明に係るガス精製装置の一実施形態を示す構成図である。It is a block diagram which shows one Embodiment of the gas purification apparatus which concerns on this invention. 本発明に係るガス精製装置の他の実施形態を示す構成図である。It is a block diagram which shows other embodiment of the gas purification apparatus which concerns on this invention.

以下、本発明に係るガス精製装置の好適な実施形態について添付図面を参照しながら説明する。なお、各図において、同一の要素には同一の符号を付し、重複する説明は省略する。   Hereinafter, a preferred embodiment of a gas purification apparatus according to the present invention will be described with reference to the accompanying drawings. Note that, in each drawing, the same elements are denoted by the same reference numerals, and redundant description is omitted.

図1は、本発明に係るガス精製装置の一実施形態であるガス精製装置100を示す構成図である。図1に示すように、ガス精製装置100は、水分除去装置1と、コンプレッサ2と、水分除去装置3と、分離装置4と、洗浄塔5と、オフガス戻しラインL1と、を備えている。   FIG. 1 is a configuration diagram showing a gas purification device 100 which is an embodiment of a gas purification device according to the present invention. As shown in FIG. 1, the gas purification device 100 includes a moisture removing device 1, a compressor 2, a moisture removing device 3, a separating device 4, a cleaning tower 5, and an offgas return line L <b> 1.

水分除去装置1は、メタン及び二酸化炭素を主成分とする原料ガスを導入し、導入したガス中の水分を除去するものである。コンプレッサ2は、水分除去装置1で水分が除去されたガスを分離装置4側に向かって圧送するものである。水分除去装置3は、コンプレッサ2から分離装置4に向かうガス中の水分を更に除去するものである。水分除去装置1,3には、例えば、ガスを冷却し、ガス中の水分を凝縮させて除去するものが採用されている。   The moisture removing apparatus 1 introduces a raw material gas mainly composed of methane and carbon dioxide, and removes moisture in the introduced gas. The compressor 2 pumps the gas from which moisture has been removed by the moisture removing device 1 toward the separating device 4 side. The moisture removing device 3 further removes moisture in the gas from the compressor 2 toward the separation device 4. As the moisture removing devices 1 and 3, for example, a device that cools the gas and condenses and removes moisture in the gas is employed.

分離装置4は、水分除去装置3で水分が除去されたガスを導入し、精製ガスとオフガスとに分離する装置である。この分離装置4は、二酸化炭素を透過させ易く且つメタンを透過させ難い分離膜6を有するものであり、分離膜6を透過しなかったガスが精製ガスとなり、分離膜6を透過したガスがオフガスとなる。分離膜6は、例えば、ポリイミドなどの高分子有機膜や、ゼオライト膜等である。   The separation device 4 is a device that introduces the gas from which moisture has been removed by the moisture removal device 3 and separates it into purified gas and off-gas. This separation device 4 has a separation membrane 6 that is easy to permeate carbon dioxide and difficult to permeate methane. The gas that has not permeated the separation membrane 6 becomes purified gas, and the gas that has permeated the separation membrane 6 is off-gas. It becomes. The separation membrane 6 is, for example, a polymer organic membrane such as polyimide, a zeolite membrane, or the like.

洗浄塔5は、分離装置4で分離されたオフガスを洗浄し、オフガス中の二酸化炭素を吸収するものである。この洗浄塔5は、オフガスを下部から導入し上部から排出する一方で、洗浄水を上部から導入し下部から排出する。これにより、オフガスと洗浄水とが向流接触し、オフガス中の二酸化炭素の一部が洗浄水に溶解し吸収される。洗浄塔5の内部は、ここでは常圧とされており、大気圧と略同等となっている。   The cleaning tower 5 cleans off-gas separated by the separation device 4 and absorbs carbon dioxide in the off-gas. The cleaning tower 5 introduces off-gas from the lower part and discharges it from the upper part, while introducing cleaning water from the upper part and discharges it from the lower part. As a result, the off gas and the cleaning water come into countercurrent contact, and a part of the carbon dioxide in the off gas is dissolved and absorbed in the cleaning water. Here, the inside of the cleaning tower 5 is at normal pressure, and is substantially equal to atmospheric pressure.

オフガス戻しラインL1は、洗浄塔5の上部から排出されたオフガスを水分除去装置1に戻すものである。   The off-gas return line L <b> 1 returns the off-gas discharged from the upper part of the cleaning tower 5 to the moisture removing device 1.

このようなガス精製装置100では、メタン及び二酸化炭素を主成分とする原料ガスは、水分除去装置1によって水分を除去され、水分除去装置3によって更に水分を除去された後に、分離装置4に導入される。ここで、原料ガスのメタン濃度は、例えば、容積で約60%である。   In such a gas purification apparatus 100, the raw material gas mainly composed of methane and carbon dioxide is introduced into the separation apparatus 4 after the moisture is removed by the moisture removing apparatus 1 and the moisture is further removed by the moisture removing apparatus 3. Is done. Here, the methane concentration of the source gas is, for example, about 60% by volume.

分離装置4に導入された原料ガス中の二酸化炭素の多くは、分離膜6を透過する。原料ガス中のメタンは、分離膜6を透過せず分離膜6の上流側に留まるが、一部は二酸化炭素と共に分離膜6を透過する。これにより、分離膜6の上流側には高いメタン濃度のガスが留まり、このガスが精製ガスとして回収される。回収される精製ガスのメタン濃度は、例えば、容積で約98%である。このように、ガス精製装置100によれば、高いメタン濃度の精製ガスを回収することができる。一方、分離膜6からは、高い二酸化炭素濃度のガスが透過し、このガスがオフガスとして洗浄塔5に送られる。オフガスのメタン濃度は、例えば、容積で約30%である。   Most of the carbon dioxide in the raw material gas introduced into the separation device 4 permeates the separation membrane 6. Methane in the raw material gas does not permeate the separation membrane 6 and remains upstream of the separation membrane 6, but a part of the methane permeates the separation membrane 6 together with carbon dioxide. As a result, a gas having a high methane concentration remains on the upstream side of the separation membrane 6, and this gas is recovered as a purified gas. The methane concentration of the purified gas recovered is, for example, about 98% by volume. Thus, according to the gas purification apparatus 100, a purified gas having a high methane concentration can be recovered. On the other hand, a gas with a high carbon dioxide concentration permeates from the separation membrane 6, and this gas is sent to the cleaning tower 5 as an off-gas. The off-gas methane concentration is, for example, about 30% by volume.

洗浄塔5に送られたオフガスは、洗浄塔5内の洗浄水と向流接触し、洗浄塔5外に排出される。オフガス中の二酸化炭素の一部は、洗浄水と向流接触する際に洗浄水に溶解し吸収される。二酸化炭素を吸収した洗浄水は、下部から洗浄塔5外に排出される。洗浄塔5において二酸化炭素を吸収されたオフガスのメタン濃度は、例えば、容積で約60%である。このように、本実施形態では、洗浄塔5によってオフガスのメタン濃度を原料ガスのメタン濃度と略同等にしている。これにより、分離装置4に導入されるガスのメタン濃度が安定し、精製ガスのメタン濃度が安定する。   The off-gas sent to the cleaning tower 5 comes into countercurrent contact with the cleaning water in the cleaning tower 5 and is discharged out of the cleaning tower 5. A part of the carbon dioxide in the off-gas is dissolved and absorbed in the cleaning water when coming into countercurrent contact with the cleaning water. The washing water that has absorbed carbon dioxide is discharged from the lower part to the outside of the washing tower 5. The off-gas methane concentration in which carbon dioxide is absorbed in the cleaning tower 5 is, for example, about 60% by volume. Thus, in this embodiment, the methane concentration of the off-gas is made substantially equal to the methane concentration of the source gas by the cleaning tower 5. Thereby, the methane concentration of the gas introduced into the separation device 4 is stabilized, and the methane concentration of the purified gas is stabilized.

洗浄塔5から排出されたオフガスは、オフガス戻しラインL1を通り、水分除去装置1に戻され、原料ガスと共に水分除去装置1に導入される。以降は、同様な動作が繰り返され、オフガスからの精製ガスの回収が繰り返される。このため、ガス精製装置100によれば、精製ガスを高い回収率で精製することができる。   The off gas discharged from the cleaning tower 5 passes through the off gas return line L1, is returned to the moisture removing device 1, and is introduced into the moisture removing device 1 together with the raw material gas. Thereafter, the same operation is repeated, and the recovery of the purified gas from the off gas is repeated. Therefore, according to the gas purification apparatus 100, the purified gas can be purified with a high recovery rate.

また、ガス精製装置100によれば、洗浄塔5で洗浄されるのは、原料ガスから精製ガスが分離されたオフガスのみであり、洗浄塔5で洗浄されるガスの量が少ないため、洗浄塔5を小型化することができる。さらに、オフガスの二酸化炭素濃度は原料ガスの二酸化炭素濃度に比べて高いため、洗浄塔5における二酸化炭素の吸収効率が高く、洗浄塔5をより小型化することができる。これにより、ガス精製装置100の設置スペース、洗浄水量、ポンプ類の能力等の設備規模を削減することができる。   Further, according to the gas purification apparatus 100, the cleaning tower 5 cleans only the off-gas from which the purified gas is separated from the raw material gas, and the amount of gas cleaned by the cleaning tower 5 is small. 5 can be reduced in size. Furthermore, since the carbon dioxide concentration of the off gas is higher than the carbon dioxide concentration of the raw material gas, the carbon dioxide absorption efficiency in the cleaning tower 5 is high, and the cleaning tower 5 can be further downsized. Thereby, the installation scale of the gas purification apparatus 100, the amount of washing water, the capacity of pumps, etc. can be reduced.

また、洗浄塔5の内部は常圧とされ、オフガスが常圧で洗浄されるため、二酸化炭素と共に吸収されるメタンの量が少なく、より高い回収率で精製ガスを精製することができる。   Moreover, since the inside of the washing tower 5 is set to normal pressure and the off-gas is washed at normal pressure, the amount of methane absorbed together with carbon dioxide is small, and the purified gas can be purified with a higher recovery rate.

以上、本発明に係るガス精製装置の好適な実施形態について説明したが、本発明は必ずしも上述の実施形態に限られるものではなく、その要旨を逸脱しない範囲で様々な変更が可能である。   The preferred embodiment of the gas purification apparatus according to the present invention has been described above, but the present invention is not necessarily limited to the above-described embodiment, and various modifications can be made without departing from the scope of the present invention.

例えば、図2に示すガス精製装置200のように、洗浄塔5の下部から排出された洗浄水に溶解している二酸化炭素を除去し、洗浄塔5の上部に戻す脱気装置7を備えるようにしてもよい。この場合、洗浄水が繰り返し使用されるため、洗浄水の消費量が削減される。   For example, as in the gas purification apparatus 200 shown in FIG. 2, a degassing device 7 that removes carbon dioxide dissolved in the washing water discharged from the lower part of the washing tower 5 and returns it to the upper part of the washing tower 5 is provided. It may be. In this case, since the cleaning water is repeatedly used, the consumption of the cleaning water is reduced.

また、ガス精製装置100,200では、一個の分離装置4を用いているが、これに限られない。例えば、複数個の分離装置4を用い、前段の分離装置4の分離膜6の上流側に留まったガスを更に後段の分離装置4に導入し、最後段の分離装置4の分離膜6の上流側に留まったガスを精製ガスとして回収してもよい。   Moreover, in the gas purification apparatuses 100 and 200, although the one separation apparatus 4 is used, it is not restricted to this. For example, by using a plurality of separation devices 4, the gas remaining on the upstream side of the separation membrane 6 of the preceding separation device 4 is further introduced into the subsequent separation device 4, and upstream of the separation membrane 6 of the last separation device 4. The gas remaining on the side may be recovered as a purified gas.

また、ガス精製装置100,200では、洗浄塔5の内部を常圧とし、洗浄塔5に導入されたオフガスを常圧で洗浄しているが、これに限られない。例えば、洗浄塔5の内部を加圧し、洗浄塔5に導入されたオフガスを加圧状態で洗浄してもよい。この場合、常圧で洗浄するのに比べ、オフガスからの二酸化炭素の吸収効率が高まり、分離装置4に戻るオフガスのメタン濃度が高くなる。これにより、高い効率で精製ガスを精製することができる。なお、オフガスが加圧状態で洗浄されると、常圧で洗浄されるのに比べ二酸化炭素と共に洗浄水に溶解し吸収されるメタンの量が増える。しかし、オフガスのメタン濃度は原料ガスのメタン濃度に比べ低いため、オフガスが加圧状態で洗浄されても、原料ガスが加圧状態で洗浄されるのに比べメタンは吸収され難い。このため、精製ガスの回収率の低下は抑制される。   Moreover, in the gas purification apparatuses 100 and 200, the inside of the cleaning tower 5 is set to normal pressure, and the off gas introduced into the cleaning tower 5 is cleaned at normal pressure. However, the present invention is not limited to this. For example, the inside of the cleaning tower 5 may be pressurized, and the off gas introduced into the cleaning tower 5 may be cleaned in a pressurized state. In this case, the efficiency of absorbing carbon dioxide from off-gas is increased compared to cleaning at normal pressure, and the methane concentration of off-gas returning to the separation device 4 is increased. Thereby, the purified gas can be purified with high efficiency. When the off-gas is washed in a pressurized state, the amount of methane dissolved and absorbed in the washing water together with carbon dioxide increases as compared with washing at normal pressure. However, since the off-gas methane concentration is lower than the methane concentration of the source gas, even if the off-gas is washed in a pressurized state, methane is less likely to be absorbed than in the case where the source gas is washed in a pressurized state. For this reason, the fall of the recovery rate of refined gas is suppressed.

5…洗浄塔、6…分離膜、100…ガス精製装置、L1…オフガス戻しライン。   5 ... Washing tower, 6 ... Separation membrane, 100 ... Gas purification device, L1 ... Off-gas return line.

Claims (3)

メタン及び二酸化炭素を主成分とする原料ガスからメタンを主成分とする精製ガスを精製するガス精製装置であって、
前記原料ガスを前記精製ガスとオフガスとに分離する分離膜と、
前記分離膜で分離された前記オフガスを洗浄し二酸化炭素を吸収する洗浄手段と、
前記洗浄手段で洗浄された前記オフガスを前記分離膜に供給すべく前記分離膜の上流側に戻すオフガス戻しラインと、
前記分離膜の前段に設けられ、前記オフガス戻しラインにより戻された前記オフガスと前記原料ガスとに含まれた水分を除去する水分除去手段と、を備えたことを特徴とするガス精製装置。
A gas purification apparatus for purifying a purified gas mainly containing methane from a raw material gas mainly containing methane and carbon dioxide,
A separation membrane for separating the source gas into the purified gas and off-gas;
A cleaning means for cleaning the off-gas separated by the separation membrane and absorbing carbon dioxide;
An off-gas return line for returning the off-gas cleaned by the cleaning means to the upstream side of the separation membrane to supply the separation membrane;
A gas purification apparatus comprising: a moisture removing unit that is provided in a preceding stage of the separation membrane and removes moisture contained in the off gas and the source gas returned by the off gas return line .
前記洗浄手段は、常圧で前記オフガスを洗浄し二酸化炭素を吸収することを特徴とする請求項1記載のガス精製装置。   The gas purifier according to claim 1, wherein the cleaning means cleans the off-gas at normal pressure and absorbs carbon dioxide. 前記洗浄手段は、加圧状態で前記オフガスを洗浄し二酸化炭素を吸収することを特徴とする請求項1記載のガス精製装置。   The gas purifier according to claim 1, wherein the cleaning means cleans the off-gas and absorbs carbon dioxide in a pressurized state.
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