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JP5666802B2 - Discharge type photocatalyst and method for producing the same - Google Patents
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JP5666802B2 - Discharge type photocatalyst and method for producing the same - Google Patents

Discharge type photocatalyst and method for producing the same Download PDF

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Publication number
JP5666802B2
JP5666802B2 JP2009262112A JP2009262112A JP5666802B2 JP 5666802 B2 JP5666802 B2 JP 5666802B2 JP 2009262112 A JP2009262112 A JP 2009262112A JP 2009262112 A JP2009262112 A JP 2009262112A JP 5666802 B2 JP5666802 B2 JP 5666802B2
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photocatalyst
discharge
base material
titanium oxide
film
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JP2011104518A (en
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雅弘 浅山
雅弘 浅山
成典 高橋
成典 高橋
裕 内田
裕 内田
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Toshiba Corp
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Description

本発明は、高い光触媒性能を有する放電型光触媒およびその製造方法に関するものであり、特に、空気浄化、水浄化などの環境浄化装置に適用できる放電型光触媒およびその製造方法に関するものである。   The present invention relates to a discharge photocatalyst having high photocatalytic performance and a method for producing the same, and more particularly to a discharge photocatalyst applicable to an environmental purification device such as air purification and water purification and a method for producing the same.

近年、空気浄化・脱臭、水浄化・排水処理、防汚、抗菌・殺菌、防曇等の広い分野で光触媒が注目されている。
光半導体粒子にそのバンドギャップ以上のエネルギーを持つ波長の光を与えた場合、価電子帯に存在している電子が光励起され伝導帯に移動する。また、価電子帯には正孔(ホール)が生成される。生成した電子(e-)は酸素(O2)と反応してスーパーオキサイドアニオン(・O2 -)を生成し、また、正孔(h+)は水と反応してヒドロキシラジカル(・OH)を生成する。生成されたスーパーオキサイドアニオン(・O2 -)は強い還元力を示し、ヒドロキシラジカル(・OH)は強い酸化力を示すため、これらの還元力および酸化力を利用して様々な環境浄化分野へ応用しようとする試みがなされている。
In recent years, photocatalysts have attracted attention in a wide range of fields such as air purification / deodorization, water purification / drainage treatment, antifouling, antibacterial / sterilization, and antifogging.
When light having a wavelength having energy equal to or greater than the band gap is given to the optical semiconductor particles, electrons existing in the valence band are photoexcited and moved to the conduction band. In addition, holes are generated in the valence band. The generated electron (e ) reacts with oxygen (O 2 ) to generate a superoxide anion (• O 2 ), and the hole (h + ) reacts with water to generate a hydroxy radical (• OH). Is generated. The generated superoxide anion (• O 2 ) exhibits a strong reducing power, and the hydroxy radical (• OH) exhibits a strong oxidizing power. Therefore, these reducing powers and oxidizing powers can be used for various environmental purification fields. Attempts have been made to apply it.

光触媒は、応用範囲が極めて広く、また、太陽光または蛍光灯の光などをエネルギー源として直接利用できるため、環境に優しいという点で注目されている。しかしながら、光触媒の触媒反応はそれほど強力で迅速ではないため、いかにして効率を上げるかというのが重要な問題となっている。
光触媒の触媒効率の向上を目的として、以下に示すような多くの検討がなされている。
例えば、特開平9−262482号公報(特許文献1)には、Cr、V、Cu、Fe、Mg、Ag、Pd、Ni、MnおよびPtの群から選択される1種以上の金属イオンを1×1015イオン/g−TiO2以上の割合で酸化チタン(TiO2)の表面から内部に含有させた光触媒が掲載されている。
Photocatalysts are attracting attention because they have a very wide range of applications and can be directly used as energy sources such as sunlight or light from fluorescent lamps. However, since the catalytic reaction of the photocatalyst is not so powerful and rapid, how to increase the efficiency is an important issue.
For the purpose of improving the catalytic efficiency of the photocatalyst, many studies as described below have been made.
For example, in Japanese Patent Laid-Open No. 9-262482 (Patent Document 1), one or more kinds of metal ions selected from the group consisting of Cr, V, Cu, Fe, Mg, Ag, Pd, Ni, Mn, and Pt are 1 A photocatalyst contained inside from the surface of titanium oxide (TiO 2 ) at a rate of × 10 15 ions / g-TiO 2 or more is described.

この光触媒は、半導体分野での不純物のドーピング手段に利用されるイオン注入法を用いて作製されたものである。具体的には、上述した金属イオンを30keV以上の高エネルギーに加速して、これを酸化チタンに照射して金属イオンを酸化チタンにドーピングしたものである。このような製造方法により作製された光触媒は、紫外光領域だけでなく、従来不可能とされた可視光領域での光吸収が起こるため、紫外光から可視光の光を利用して触媒反応を行え、一層光触媒の触媒効率の向上を図れる。
また、特開平2−107339号公報(特許文献2)には、冷蔵庫、空気調節器等の冷凍サイクル装置に適用される触媒構造体およびその製造方法について掲載されている。反応ガスおよび光を流通可能とした3次元網目構造の基材上に、光触媒活性成分を担持させた触媒構造体であり、この触媒構造体によれば、空気中に含まれる悪臭成分を光触媒反応により効率良く除去できる。
This photocatalyst is produced by using an ion implantation method used for impurity doping means in the semiconductor field. Specifically, the metal ions described above are accelerated to a high energy of 30 keV or more, and this is irradiated onto titanium oxide to dope metal ions into titanium oxide. The photocatalyst produced by such a manufacturing method absorbs light not only in the ultraviolet light region but also in the visible light region, which has been impossible in the past. It is possible to further improve the catalytic efficiency of the photocatalyst.
Japanese Patent Laid-Open No. 2-107339 (Patent Document 2) describes a catalyst structure applied to a refrigeration cycle apparatus such as a refrigerator and an air conditioner, and a method for manufacturing the catalyst structure. A catalyst structure in which a photocatalytically active component is supported on a base material having a three-dimensional network structure that allows a reaction gas and light to flow. According to this catalyst structure, a malodorous component contained in air is photocatalyzed. Can be removed more efficiently.

さらに、特開平8−103631号公報(特許文献3)には、光触媒フィルタおよびその製造方法が掲載されている。具体的には、球状の耐熱ガラスを融着して作ったガラスフィルタに、チタンのアルコキシドとアルコールアミン類などから調整されたチタニアゾルまたはそれにポリエチレングリコールまたはポリエチレンオキサイドを添加したものをコーティングした後、室温から除々に600℃から700℃の最終温度にまで加熱昇温し、光触媒フィルタを製造する。   Furthermore, Japanese Patent Laid-Open No. 8-103631 (Patent Document 3) describes a photocatalytic filter and a method for producing the same. Specifically, after coating a glass filter made by fusing spherical heat-resistant glass with a titania sol prepared from titanium alkoxide and alcohol amines, or with a polyethylene glycol or polyethylene oxide added thereto, room temperature The temperature is gradually raised from 600 ° C. to a final temperature of 700 ° C. to produce a photocatalytic filter.

この製法により得られた光触媒は表面積が大きく、また、その表面を被覆する酸化チタンが透明で入射した光がフィルタ表面の酸化チタン全体に当たるため、効率良く汚染物質を吸着または分解除去できる。   The photocatalyst obtained by this manufacturing method has a large surface area, and the titanium oxide covering the surface is transparent, and the incident light strikes the entire titanium oxide on the filter surface, so that contaminants can be adsorbed or decomposed efficiently.

特開平9−262482号公報JP-A-9-262482 特開平2−107339号公報Japanese Patent Laid-Open No. 2-107339 特開平8−103631号公報Japanese Patent Laid-Open No. 8-103631 特開2000−140624号公報JP 2000-140624 A

しかしながら、上述したように、光触媒反応の効率を向上させるため、種々検討がなされているにもかかわらず、いずれの場合においても未だ効率が十分とは言い難く、さらに効率向上のための有効な施策が求められていた。
また、発明者らは光触媒の励起源に従来のランプ型ではなく放電光を利用する発明を行なっている(特開2000−140624号公報(特許文献4))。
However, as described above, in order to improve the efficiency of the photocatalytic reaction, although various studies have been made, it is difficult to say that the efficiency is still sufficient in any case, and it is an effective measure for further improving the efficiency. Was demanded.
The inventors have also invented an invention that uses discharge light instead of a conventional lamp type as an excitation source of a photocatalyst (Japanese Patent Laid-Open No. 2000-140624 (Patent Document 4)).

この発明の構成により、優れた性能を有する光触媒を実現した。しかしながら、光源に放電光を利用しているため、放電状態が湿度に依存し、性能が変化することが最近の研究で明らかになってきた。   With the structure of the present invention, a photocatalyst having excellent performance was realized. However, since discharge light is used as a light source, recent research has revealed that the discharge state depends on humidity and the performance changes.

本発明は、このような課題を解決するためになされたものであり、湿度依存性を大幅に安定化させた放電型光触媒を得るとともに、コスト低減を図り量産可能な放電型光触媒の製造方法を提供することを目的とする。   The present invention has been made to solve such a problem, and provides a method for producing a discharge photocatalyst capable of mass production while reducing the cost while obtaining a discharge photocatalyst having greatly stabilized humidity dependency. The purpose is to provide.

本発明者らは、放電型光触媒の湿度依存性の安定化に関して鋭意研究を重ねた結果、励
起源が放電光を用いるいわゆる放電型光触媒に用いられる光触媒膜において、主たる構成
成分が一次粒子径が80nm以下であり、かつ、この一次粒子が凝集した二次粒子の粒径が
80μm以下である酸化チタンよりなり、かつ絶縁性のセラミックスより構成された基材
を含めた気孔率が5%以上48%以下であり、かつ基材を含めた比表面積が1.2m2/g
以上とすることで、見かけ上光触媒性能を大幅に安定させることができることを見い出し
た。また、このような光触媒膜を再現性良くかつ自由に制御する方法を見い出し、本発明
を完成したものである。
As a result of intensive studies on the stabilization of the humidity dependence of the discharge photocatalyst, the present inventors have found that the primary constituent of the photocatalyst film used in the so-called discharge photocatalyst that uses the discharge light as the excitation source is the primary particle size. The particle size of the secondary particles that are 80 nm or less and in which the primary particles are aggregated is
The porosity is 5% or more and 48 % or less including the base material made of titanium oxide of 80 μm or less and made of insulating ceramics , and the specific surface area including the base material is 1.2 m 2 / g.
It has been found that the photocatalytic performance can be greatly stabilized by the above process. Further, the present invention has been completed by finding a method for freely controlling such a photocatalytic film with good reproducibility.

すなわち、請求項1記載の本発明は、励起源に放電光を用い基材の表面に光触媒膜が
形成された放電型光触媒において、前記光触媒膜の主たる構成成分が一次粒子径が80nm
以下であり、かつ、この一次粒子が凝集した二次粒子の粒径が80μm以下である酸化チ
タンよりなり、かつ絶縁性のセラミックスより構成された基材を含めた気孔率が5%以上
48%以下であり、かつ基材を含めた比表面積が1.2m2/g以上であることを特徴とす
る放電型光触媒を提供する。
That is, the present invention according to claim 1 is a discharge photocatalyst in which discharge light is used as an excitation source and a photocatalyst film is formed on the surface of a substrate, and the main component of the photocatalyst film has a primary particle diameter of 80 nm.
The porosity is 5% or more including a base material made of titanium oxide having a particle diameter of secondary particles in which the primary particles are aggregated of 80 μm or less and composed of insulating ceramics.
Provided is a discharge type photocatalyst having a specific surface area of not more than 48 % and a specific surface area including a substrate of not less than 1.2 m 2 / g.

本発明において、主たる構成成分が酸化チタンよりなる光触媒膜は、基材を含めた気孔率
が5%以上48%以下に規定したが、気孔率が5%より少ないと光触媒膜の厚み方向の寄
与が少なくなり性能が低下し、気孔率が48%より大きいと光触媒膜自体の強度不足によ
り光触媒の剥離や脱落が生じるためである。
In the present invention, the photocatalyst film comprising titanium oxide as a main constituent is defined to have a porosity of 5% or more and 48 % or less including the base material. However, if the porosity is less than 5%, the photocatalyst film contributes in the thickness direction of the photocatalyst film. This is because when the porosity is less than 48 %, the photocatalyst film is peeled off or dropped due to insufficient strength of the photocatalyst film.

さらに、基材を含めた比表面積を1.2m2/g以上と規定したが1.2より小さくな
ると、光触媒表面の化学ポテンシャルが低下し、触媒活性が低下するためである。気孔率
により性能が安定する理由として、大気中に含まれる水分が、光触媒や基材の気孔に効果
的に吸着することで、放電が安定化したためと考えられる。
さらにまた、本発明において、酸化チタンの一次粒子径が80nm以下であり、かつ、この
一次粒子が凝集した二次粒子の粒径が80μm以下と規定したが、これは、酸化チタンの
一次粒子が80nmより大きければ、粒内に存在する空孔や転位等の結晶欠陥が増加し性能
が低下すること、また、二次粒子径が80μmより大きければ、二次粒子径が大きすぎて
二次粒子中央部の酸化チタンの性能が発揮されないためである。
そして、基材を絶縁性のセラミックスに限定したが、放電電極と基材間での不要な放電を
抑制するためである。また、セラミックスは耐食性に優れているため安定した放電を達成
できるためである。
Furthermore, the specific surface area including the base material is defined as 1.2 m 2 / g or more, but if it is smaller than 1.2, the chemical potential on the surface of the photocatalyst is lowered and the catalytic activity is lowered. The reason why the performance is stabilized by the porosity is considered to be because the discharge was stabilized by the moisture contained in the atmosphere being effectively adsorbed on the pores of the photocatalyst and the substrate.
Furthermore, in the present invention, the primary particle diameter of titanium oxide is 80 nm or less, and this
The particle size of the secondary particles in which the primary particles are aggregated is defined as 80 μm or less.
If the primary particles are larger than 80 nm, crystal defects such as vacancies and dislocations existing in the grains will increase and performance will increase.
If the secondary particle diameter is larger than 80 μm, the secondary particle diameter is too large.
This is because the performance of the titanium oxide at the center of the secondary particles is not exhibited.
Although the base material is limited to insulating ceramics, unwanted discharge between the discharge electrode and the base material is prevented.
It is for suppressing. In addition, ceramics have excellent corrosion resistance, so stable discharge is achieved.
This is because it can.

また、請求項2記載の本発明は、請求項1の光触媒膜において、酸化チタンの担持量が基材に対して10%以上であることを特徴とする放電型光触媒を提供する。   According to a second aspect of the present invention, there is provided a discharge type photocatalyst characterized in that, in the photocatalytic film of the first aspect, the amount of titanium oxide supported is 10% or more relative to the substrate.

本発明において、酸化チタンの担持量を基材に対して10%以上と規定したが、これは、19%より低いと酸化チタンの絶対量が不足し、性能が低下するためである。   In the present invention, the supported amount of titanium oxide is specified to be 10% or more with respect to the substrate. This is because if the amount is lower than 19%, the absolute amount of titanium oxide is insufficient and the performance is deteriorated.

請求項記載の発明は、請求項1または2記載の放電型光触媒において、基材に三次元
網目構造を有する基材を用いることを特徴とする放電型光触媒を提供する。
The invention according to claim 3 provides the discharge photocatalyst according to claim 1 or 2, wherein a base material having a three-dimensional network structure is used as the base material.

本発明において、光触媒を担持する基材に三次元網目構造を有する基材を用いると限定したが、三次元網目構造を有する基材が、担持量が多い光触媒膜を形成可能であるとともに、効果的に光触媒を励起する光を当てることが可能であるため、触媒性能が向上するからである。   In the present invention, the base material having a three-dimensional network structure is limited to the base material supporting the photocatalyst. However, the base material having the three-dimensional network structure can form a photocatalyst film having a large amount of support, and is effective. This is because the catalyst performance is improved because it is possible to apply light that excites the photocatalyst.

請求項記載の発明は、請求項1または2記載の放電型光触媒であって、前記基材に前記
光触媒膜を形成するときに熱処理により分解除去される気孔形成成分を添加することを特
徴とする放電型光触媒の製造方法を提供する。
The invention according to claim 4 is the discharge photocatalyst according to claim 1 or 2 , characterized in that a pore forming component that is decomposed and removed by heat treatment when the photocatalyst film is formed on the substrate is added. A method for producing a discharge-type photocatalyst is provided.

本発明において、光触媒膜を形成する時に熱処理により分解除去される気孔形成成分を添加すると規定したが、この方法を採用することで、酸化チタン膜の焼付けと気孔形成成分除去を同時に行なえるため工業的に有効であるからである。   In the present invention, it is defined that a pore-forming component that is decomposed and removed by heat treatment is added when forming the photocatalyst film. This is because it is effective.

以上説明したように、本発明によれば、放電光を酸化チタンの励起源とする放電型光触媒において、基材を含めた光触媒膜の気孔率と比表面積を規定して、湿度依存性を大幅に安定化させた放電型光触媒を得るとともに、コスト低減とともに量産可能な放電型光触媒の製造方法を得ることができる。   As described above, according to the present invention, in the discharge photocatalyst using discharge light as the excitation source of titanium oxide, the porosity and specific surface area of the photocatalyst film including the base material are defined, and the humidity dependency is greatly increased. It is possible to obtain a discharge photocatalyst stabilized in a stable manner, and to obtain a method for producing a discharge photocatalyst that can be mass-produced while reducing costs.

本発明の実施形態の実施例1を説明する酸化チタンの気孔率を変えた放電型光触媒と光触媒効率との関係を示すグラフ。The graph which shows the relationship between the discharge type photocatalyst which changed the porosity of the titanium oxide explaining the Example 1 of embodiment of this invention, and photocatalyst efficiency. 本発明の実施形態の実施例2を説明する比表面積を変えた放電型光触媒と光触媒効率との関係を示すグラフ。The graph which shows the relationship between the discharge-type photocatalyst which changed the specific surface area explaining Example 2 of embodiment of this invention, and photocatalyst efficiency. 本発明の実施形態の実施例3を説明する酸化チタンの粒子径を変えた放電型光触媒と光触媒効率との関係を示すグラフ。The graph which shows the relationship between the discharge type photocatalyst which changed the particle diameter of the titanium oxide explaining the Example 3 of embodiment of this invention, and photocatalyst efficiency. 本発明の実施形態の比較例1を説明する気孔形成用添加物を変えた放電型光触媒と光触媒効率との関係を示すグラフ。The graph which shows the relationship between the discharge type photocatalyst which changed the pore formation additive, and photocatalyst efficiency explaining the comparative example 1 of embodiment of this invention. 本発明の実施形態の実施例4を説明する基材を変えた放電型光触媒と光触媒効率との関係を示すグラフ。The graph which shows the relationship between the discharge-type photocatalyst which changed the base material explaining the Example 4 of embodiment of this invention, and photocatalyst efficiency.

以下、本発明の放電型光触媒およびその製造方法について、図1ないし図5を用いて説明する。   Hereinafter, the discharge type photocatalyst of the present invention and the manufacturing method thereof will be described with reference to FIGS.

実施例1
図1に示すように実施例1では、以下に放電型光触媒の製造方法を示すとともに、酸化チ
タンよりなり、かつ基材を含めた気孔率が5%以上48%以下の放電型光触媒を作製して
光触媒効率を求める光触媒出口側アンモニア濃度を測定した。
実施例1において、濃度30%、結晶粒子径6nmの酸化チタンゾルを用い、基材にゾル
を含浸・乾燥後大気中で600℃1時間の熱処理をすることで基材に酸化チタン膜が形成
された光触媒モジュールを作製した。この際酸化チタンゾル中に活性炭を添加し、その濃
度を変えることで、異なる気孔率の光触媒膜を作製し、またこの活性炭の濃度調整によっ
て平均粒子径を制御した。
Example 1
As shown in FIG. 1, in Example 1, a method for producing a discharge photocatalyst is shown below, and a discharge photocatalyst made of titanium oxide and having a porosity of 5% or more and 48 % or less including a base material is produced. Then, the photocatalyst outlet side ammonia concentration for obtaining the photocatalytic efficiency was measured.
In Example 1, a titanium oxide sol having a concentration of 30% and a crystal particle diameter of 6 nm was used, and the substrate was impregnated with the sol, dried, and then heat-treated in the atmosphere at 600 ° C. for 1 hour to form a titanium oxide film on the substrate. A photocatalytic module was prepared. At this time, activated carbon was added to the titanium oxide sol, and its concentration was changed to produce photocatalytic films having different porosity, and the average particle diameter was controlled by adjusting the concentration of the activated carbon.

基材には、コーディエライト(Mg2Al4Si518)を主成分とし、開気孔率85%の三次元網目構造を有するケイ酸塩を用いた。
比表面積は、酸化チタンの担持量を5〜20%まで変えることで制御した。
A silicate having a three-dimensional network structure with cordierite (Mg 2 Al 4 Si 5 O 18 ) as a main component and an open porosity of 85% was used as the base material.
The specific surface area was controlled by changing the supported amount of titanium oxide to 5 to 20%.

得られた触媒を、走査型電子顕微鏡により観察したところ、酸化チタン粒子が存在することが確認され、その平均粒子径は30nmであった。   When the obtained catalyst was observed with a scanning electron microscope, it was confirmed that titanium oxide particles were present, and the average particle diameter was 30 nm.

また、窒素の物理吸着法を用いて比表面積を測定した。
得られた光触媒について、両端に電極を挟みその間で放電させながら、アンモニアの分解効率を測定することで光触媒性能を評価した。なお、本実施例ではアンモニアを光触媒性能の評価として使用したが実験が容易な代表的臭気物質として使用したものであり、他の気体でも同様の評価が得られるのは勿論である。
Moreover, the specific surface area was measured using the physical adsorption method of nitrogen.
The photocatalytic performance of the obtained photocatalyst was evaluated by measuring the decomposition efficiency of ammonia while sandwiching electrodes between both ends and discharging between them. In this example, ammonia was used as an evaluation of the photocatalytic performance, but it was used as a representative odor substance that can be easily experimented. Of course, the same evaluation can be obtained with other gases.

具体的には、得られた基材を含む光触媒にステンレス製の電極を、基材を挟むように設置した。この際の電極間隔は約7mmである。この電極間で放電をさせながら、アンモニア濃度を100ppm、流量を0.5l/minとしたアンモニアガスを光触媒モジュールの一方から流入させた。   Specifically, a stainless steel electrode was placed on the photocatalyst including the obtained base material so as to sandwich the base material. The electrode spacing at this time is about 7 mm. While discharging between the electrodes, ammonia gas having an ammonia concentration of 100 ppm and a flow rate of 0.5 l / min was introduced from one of the photocatalyst modules.

そして、流入した側と反対の出口側におけるアンモニア濃度を測定した。この際、湿度を変えて同じ評価を実施した結果を図1に示す。   And the ammonia concentration in the exit side opposite to the inflow side was measured. At this time, the result of carrying out the same evaluation by changing the humidity is shown in FIG.

なお、比較例として、活性炭を添加せず気孔率が3%の酸化チタンのみの光触媒膜も同様に作製した。   As a comparative example, a photocatalyst film made of only titanium oxide with no porosity added and 3% porosity was prepared in the same manner.

図1に示すように、酸化チタンの気孔率が3%である比較例の場合には、出口側のアンモニア濃度が60ppmを超え光触媒効率が低下したが、気孔率が5%から55%の間の場合には、出口側のアンモニア濃度が40ppmよりも低く光触媒効率が良好であった。   As shown in FIG. 1, in the case of the comparative example in which the porosity of titanium oxide is 3%, the ammonia concentration on the outlet side exceeded 60 ppm and the photocatalytic efficiency was lowered, but the porosity was between 5% and 55%. In this case, the ammonia concentration on the outlet side was lower than 40 ppm, and the photocatalytic efficiency was good.

また、気孔率が55%より大きいものを作製しようとしたが、熱処理後の酸化チタンの脱落が大きく、満足な光触媒膜を得ることは出来なかった。   Further, an attempt was made to produce a material having a porosity of more than 55%, but the titanium oxide was largely removed after the heat treatment, and a satisfactory photocatalytic film could not be obtained.

なお、本実施例において熱処理により分解除去される気孔形成成分として活性炭の例を示したがポリエチレングリコール、フェノール樹脂等の塩素を含まない有機バインダーでも同様に気孔を形成することができる。   In addition, although the example of activated carbon was shown as a pore formation component decomposed | disassembled and removed by heat processing in a present Example, an organic binder which does not contain chlorine, such as polyethyleneglycol and a phenol resin, can form a pore similarly.

また、本実施例において絶縁性のセラミックスとして、コーディエライト(Mg2Al4Si518)を主成分とし、開気孔率85%の三次元網目構造を有するケイ酸塩の例で説明したがアルミナ、炭化ケイ素、チッ化ケイ素、酸化ケイ素、ジルコニアおよびこれらの複合材料でも同様な性能の基材とすることができる。 Further, in this embodiment, as an insulating ceramic, an example of a silicate having cordierite (Mg 2 Al 4 Si 5 O 18 ) as a main component and having a three-dimensional network structure with an open porosity of 85% has been described. However, alumina, silicon carbide, silicon nitride, silicon oxide, zirconia, and composite materials thereof can be used as substrates having similar performance.

実施例2
次に、図2を参照して本発明の実施例2について説明する。
Example 2
Next, Embodiment 2 of the present invention will be described with reference to FIG.

図2は、酸化チタン濃度を変えて担持率および比表面積を変えた光触媒について流入した側と反対の出口側におけるアンモニア濃度を測定した。   FIG. 2 shows the measurement of the ammonia concentration on the outlet side opposite to the inflow side for the photocatalyst having a changed loading ratio and specific surface area by changing the titanium oxide concentration.

具体的には、実施例1において得られた基材を含む光触媒にステンレス製の電極を、基材を挟むように設置した。この際の電極間隔は約7mmである。この電極間で放電をさせながら、アンモニア濃度を100ppm、流量を0.5l/minとしたアンモニアガスを光触媒モジュールの一方から流入させた。   Specifically, a stainless steel electrode was placed on the photocatalyst containing the base material obtained in Example 1 so as to sandwich the base material. The electrode spacing at this time is about 7 mm. While discharging between the electrodes, ammonia gas having an ammonia concentration of 100 ppm and a flow rate of 0.5 l / min was introduced from one of the photocatalyst modules.

そして、流入した側と反対の出口側におけるアンモニア濃度を測定した。この際、湿度を変えて同じ評価を実施した。   And the ammonia concentration in the exit side opposite to the inflow side was measured. At this time, the same evaluation was performed by changing the humidity.

図2に示すように、酸化チタンの担持率が3%で比表面積が0.8m2/gである場合には、出口側のアンモニア濃度が60ppmを超え光触媒効率が低下したが、酸化チタンの担持率が10%で比表面積が1.2m2/g以上の場合には、出口側のアンモニア濃度が40ppmよりも低く光触媒効率が良好であった。 As shown in FIG. 2, when the titanium oxide loading was 3% and the specific surface area was 0.8 m 2 / g, the ammonia concentration on the outlet side exceeded 60 ppm, and the photocatalytic efficiency decreased. When the loading rate was 10% and the specific surface area was 1.2 m 2 / g or more, the ammonia concentration on the outlet side was lower than 40 ppm and the photocatalytic efficiency was good.

なお、比表面積が1.2m2/gの気孔率は30%、2.0m2/gの気孔率は48%であった。 The porosity of the specific surface area of 1.2 m 2 / g was 30%, and the porosity of 2.0 m 2 / g was 48%.

実施例3
次に、図3を参照して本発明の実施例3について説明する。
Example 3
Next, Embodiment 3 of the present invention will be described with reference to FIG.

本実施例3では、実施例1における熱処理温度を変えて一次粒子径を変えた光触媒と、ゾルのpHを変えて一次粒子の凝集度合いを変えた光触媒について作製した。   In Example 3, a photocatalyst in which the primary particle diameter was changed by changing the heat treatment temperature in Example 1 and a photocatalyst in which the degree of aggregation of primary particles was changed by changing the sol pH were prepared.

得られた光触媒について、流入した側と反対の出口側におけるアンモニア濃度を測定した。   About the obtained photocatalyst, the ammonia concentration in the exit side opposite to the inflow side was measured.

具体的には、実施例1において得られた基材を含む光触媒(気孔率5%、比表面積1.2m2/g)にステンレス製の電極を、基材を挟むように設置した。この際の電極間隔は約7mmである。この電極間で放電をさせながら、アンモニア濃度を100ppm、流量を0.5l/minとしたアンモニアガスを光触媒モジュールの一方から流入させた。 Specifically, a stainless steel electrode was placed on the photocatalyst containing the base material obtained in Example 1 (porosity 5%, specific surface area 1.2 m 2 / g) so as to sandwich the base material. The electrode spacing at this time is about 7 mm. While discharging between the electrodes, ammonia gas having an ammonia concentration of 100 ppm and a flow rate of 0.5 l / min was introduced from one of the photocatalyst modules.

そして、流入した側と反対の出口側におけるアンモニア濃度を測定した。この際、湿度を変えて同じ評価を実施した。   And the ammonia concentration in the exit side opposite to the inflow side was measured. At this time, the same evaluation was performed by changing the humidity.

図3に示すように、一次粒子径が80nmを超え、二次粒子径も80μmを超えた光触媒膜である場合には、出口のアンモニア濃度が60ppmを超えているが、一次粒子径が80nm以下で、二次粒子径も80μm以下の光触媒膜を用いた場合には、出口のアンモニア濃度は40ppmよりも低く光触媒効率が良好であった。   As shown in FIG. 3, in the case of a photocatalytic film having a primary particle diameter exceeding 80 nm and a secondary particle diameter exceeding 80 μm, the ammonia concentration at the outlet exceeds 60 ppm, but the primary particle diameter is 80 nm or less. Thus, when a photocatalyst film having a secondary particle diameter of 80 μm or less was used, the ammonia concentration at the outlet was lower than 40 ppm and the photocatalytic efficiency was good.

請求項2記載の発明に係る比較例1
本比較例1では、実施例1に示す酸化チタンゾル中に活性炭の代わりに、熱で分解しないシリカゲルを用いた他は、実施例1と同様な気孔率55%の光触媒を作製した。
Comparative example 1 according to the invention of claim 2
In this Comparative Example 1, a photocatalyst having a porosity of 55% was prepared in the same manner as in Example 1 except that silica gel that was not decomposed by heat was used in the titanium oxide sol shown in Example 1 instead of activated carbon.

得られた触媒について流入した側と反対の出口側におけるアンモニア濃度を測定した。   About the obtained catalyst, the ammonia concentration on the outlet side opposite to the inflow side was measured.

具体的には、本比較例1において得られた基材を含む光触媒にステンレス製の電極を、基材を挟むように設置した。この際の電極間隔は約7mmである。この電極間で放電をさせながら、アンモニア濃度を100ppm、流量を0.5l/minとしたアンモニアガスを光触媒モジュールの一方から流入させた。   Specifically, a stainless steel electrode was placed on the photocatalyst containing the base material obtained in Comparative Example 1 so as to sandwich the base material. The electrode spacing at this time is about 7 mm. While discharging between the electrodes, ammonia gas having an ammonia concentration of 100 ppm and a flow rate of 0.5 l / min was introduced from one of the photocatalyst modules.

そして、流入した側と反対の出口側におけるアンモニア濃度を測定した。この際、湿度を変えて同じ評価を実施した。   And the ammonia concentration in the exit side opposite to the inflow side was measured. At this time, the same evaluation was performed by changing the humidity.

図4に示すように、シリカゲルを添加した比較例1の場合には、出口側のアンモニア濃度は50ppm以上を示しており、実施例1と比較して光触媒効率は低下した。   As shown in FIG. 4, in the case of Comparative Example 1 in which silica gel was added, the ammonia concentration on the outlet side was 50 ppm or more, and the photocatalytic efficiency was lower than that in Example 1.

請求項5記載の発明に係る比較例2(図5)
本実施例では、実施例1で用いた基材をセラミック(コーディエライト(Mg2Al4Si518)を主成分とし、開気孔率85%の三次元網目構造を有するケイ酸塩)から導電性のステンレスを用いた他は、実施例1と同様の方法により光触媒膜を作製した。
Comparative Example 2 according to the invention of claim 5 (FIG. 5)
In this example, the base material used in Example 1 was ceramic (a silicate having a three-dimensional network structure with cordierite (Mg 2 Al 4 Si 5 O 18 ) as a main component and an open porosity of 85%). A photocatalytic film was prepared in the same manner as in Example 1 except that conductive stainless steel was used.

得られた触媒膜について流入した側と反対の出口側におけるアンモニア濃度を測定した。   About the obtained catalyst membrane, the ammonia concentration on the outlet side opposite to the inflow side was measured.

具体的には、本比較例1において得られた基材を含む光触媒にステンレス製の電極を、基材を挟むように設置した。この際の電極間隔は約7mmである。この電極間で放電をさせながら、アンモニア濃度を100ppm、流量を0.5l/minとしたアンモニアガスを光触媒モジュールの一方から流入させた。   Specifically, a stainless steel electrode was placed on the photocatalyst containing the base material obtained in Comparative Example 1 so as to sandwich the base material. The electrode spacing at this time is about 7 mm. While discharging between the electrodes, ammonia gas having an ammonia concentration of 100 ppm and a flow rate of 0.5 l / min was introduced from one of the photocatalyst modules.

そして、流入した側と反対の出口側におけるアンモニア濃度を測定した。この際、湿度を変えて同じ評価を実施した。   And the ammonia concentration in the exit side opposite to the inflow side was measured. At this time, the same evaluation was performed by changing the humidity.

図5に示すように、基材にステンレスを用いた場合には、放電が不安定で、セラミックスを基材に用いた場合と比較して出口のアンモニア濃度は50ppm以上を示しており、実施例1と比較して光触媒効率は低下した。   As shown in FIG. 5, when stainless steel is used for the substrate, the discharge is unstable, and the ammonia concentration at the outlet shows 50 ppm or more compared to the case where ceramic is used for the substrate. Compared with 1, the photocatalytic efficiency decreased.

Claims (4)

励起源に放電光を用い基材の表面に光触媒膜が形成された放電型光触媒において、
前記光触媒膜の主たる構成成分が一次粒子径が80nm以下であり、かつ、この一次粒子が
凝集した二次粒子の粒径が80μm以下である酸化チタンよりなり、
かつ絶縁性のセラミックスより構成された基材を含めた気孔率が5%以上48%以下であ
り、かつ基材を含めた比表面積が1.2m2/g以上であることを特徴とする放電型光触媒
In the discharge photocatalyst in which the photocatalyst film is formed on the surface of the substrate using the discharge light as the excitation source,
The main constituent of the photocatalyst film has a primary particle diameter of 80 nm or less, and the primary particles are
The aggregated secondary particles are made of titanium oxide having a particle size of 80 μm or less ,
And a porosity including a substrate composed of insulating ceramics is 5% or more and 48 % or less, and a specific surface area including the substrate is 1.2 m 2 / g or more. Type photocatalyst.
前記光触媒膜は、酸化チタンの担持量が前記基材に対して10%以上であることを特徴
とする請求項1記載の放電型光触媒。
The discharge photocatalyst according to claim 1, wherein the photocatalyst film has a titanium oxide loading of 10% or more with respect to the base material.
前記基材は、三次元網目構造を有する基材であることを特徴とする請求項1または2The base material is a base material having a three-dimensional network structure.
記載の放電型光触媒。The discharge-type photocatalyst described.
請求項1または2記載の放電型光触媒であって、前記基材に前記光触媒膜を形成するとThe discharge photocatalyst according to claim 1 or 2, wherein the photocatalytic film is formed on the substrate.
きに熱処理により分解除去される気孔形成成分を添加することを特徴とする放電型光触媒Discharge-type photocatalyst characterized by adding pore-forming components that are decomposed and removed by heat treatment
の製造方法。Manufacturing method.
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