JP5691443B2 - Prepreg, laminated board using the same, and printed wiring board - Google Patents
Prepreg, laminated board using the same, and printed wiring board Download PDFInfo
- Publication number
- JP5691443B2 JP5691443B2 JP2010265604A JP2010265604A JP5691443B2 JP 5691443 B2 JP5691443 B2 JP 5691443B2 JP 2010265604 A JP2010265604 A JP 2010265604A JP 2010265604 A JP2010265604 A JP 2010265604A JP 5691443 B2 JP5691443 B2 JP 5691443B2
- Authority
- JP
- Japan
- Prior art keywords
- prepreg
- thermal conductivity
- resin composition
- resin
- solid particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- 239000011347 resin Substances 0.000 claims description 33
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- 239000002245 particle Substances 0.000 claims description 32
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- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 6
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- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- XIWFQDBQMCDYJT-UHFFFAOYSA-M benzyl-dimethyl-tridecylazanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 XIWFQDBQMCDYJT-UHFFFAOYSA-M 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- WJVGUJSDVKTDIX-UHFFFAOYSA-M butyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCC[N+](C)(C)C WJVGUJSDVKTDIX-UHFFFAOYSA-M 0.000 description 1
- DLIJPAHLBJIQHE-UHFFFAOYSA-N butylphosphane Chemical compound CCCCP DLIJPAHLBJIQHE-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000002242 colloidal glass Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 239000012796 inorganic flame retardant Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- ISWNAMNOYHCTSB-UHFFFAOYSA-N methanamine;hydrobromide Chemical compound [Br-].[NH3+]C ISWNAMNOYHCTSB-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- DYUWTXWIYMHBQS-UHFFFAOYSA-N n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCNCC=C DYUWTXWIYMHBQS-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- NNOBHPBYUHDMQF-UHFFFAOYSA-N propylphosphine Chemical compound CCCP NNOBHPBYUHDMQF-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- DPKBAXPHAYBPRL-UHFFFAOYSA-M tetrabutylazanium;iodide Chemical compound [I-].CCCC[N+](CCCC)(CCCC)CCCC DPKBAXPHAYBPRL-UHFFFAOYSA-M 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- CBDKQYKMCICBOF-UHFFFAOYSA-N thiazoline Chemical compound C1CN=CS1 CBDKQYKMCICBOF-UHFFFAOYSA-N 0.000 description 1
- BRNULMACUQOKMR-UHFFFAOYSA-N thiomorpholine Chemical compound C1CSCCN1 BRNULMACUQOKMR-UHFFFAOYSA-N 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- RMZAYIKUYWXQPB-UHFFFAOYSA-N trioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)CCCCCCCC RMZAYIKUYWXQPB-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- MXSVLWZRHLXFKH-UHFFFAOYSA-N triphenylborane Chemical compound C1=CC=CC=C1B(C=1C=CC=CC=1)C1=CC=CC=C1 MXSVLWZRHLXFKH-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- DIHAURBCYGTGCV-UHFFFAOYSA-N xi-4,5-Dihydro-2,4(5)-dimethyl-1H-imidazole Chemical compound CC1CN=C(C)N1 DIHAURBCYGTGCV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Reinforced Plastic Materials (AREA)
Description
本発明は、半導体パッケージやプリント配線板用に好適な、樹脂組成物をガラス繊維からなる基材に塗工し、加熱して得られるプリプレグ及びそれを用いた積層板並びにプリント配線板に関する。 The present invention relates to a prepreg obtained by applying a resin composition, which is suitable for a semiconductor package or a printed wiring board, to a substrate made of glass fiber and heating it, and a laminated board and a printed wiring board using the prepreg.
近年、携帯電話やモバイル機器など、電子機器の小型軽量化又は薄型化が顕著になってきている。これにより、電子機器内部のプリント配線板に搭載されたICやLSI等の電子部品は高密度化してきており、それに伴って電子機器内部の発熱密度が大きくなっている。
電子機器内部の発熱密度が大きくなると、電子機器内部の発熱に伴う温度上昇は顕著になり、電子部品の動作信頼性は低下する。
そこで、電子部品や導体から発生した熱を速やかに外部に放出するために、プリント配線基板の放熱性を向上させる必要がある。
このようなプリント配線基板の放熱性を向上させる手段として、様々な提案がなされている。例えば、特許文献1では、無機充填材を添加した樹脂組成物で金属板を絶縁被覆した金属ベース積層板が提案されている。また、特許文献2では、金属板にエポキシ樹脂からなる絶縁接着シートを貼り付けた金属ベース積層板が提案されている。さらに、特許文献3では、窒化アルミニウムを漉き込んだシート状繊維基材にエポキシ樹脂ワニスを含浸し乾燥して得たプリプレグの層を加熱加圧成形した積層板が提案されている。また、特許文献4では、無機充填材ではなく樹脂硬化物自体の熱伝導性を維持した積層板が提案されている。
In recent years, electronic devices such as mobile phones and mobile devices have become increasingly smaller and lighter or thinner. As a result, electronic parts such as ICs and LSIs mounted on a printed wiring board inside the electronic device have been increased in density, and accordingly, the heat generation density inside the electronic device has increased.
When the heat generation density inside the electronic device increases, the temperature rise accompanying the heat generation inside the electronic device becomes remarkable, and the operation reliability of the electronic component decreases.
Therefore, in order to quickly release the heat generated from the electronic components and conductors to the outside, it is necessary to improve the heat dissipation of the printed wiring board.
Various proposals have been made as means for improving the heat dissipation of such a printed wiring board. For example, Patent Document 1 proposes a metal base laminate in which a metal plate is insulated and coated with a resin composition to which an inorganic filler is added. Patent Document 2 proposes a metal base laminate in which an insulating adhesive sheet made of an epoxy resin is attached to a metal plate. Further, Patent Document 3 proposes a laminate in which a layer of a prepreg obtained by impregnating an epoxy resin varnish into a sheet-like fiber base material in which aluminum nitride is impregnated and drying is heated and pressed. Patent Document 4 proposes a laminated board that maintains the thermal conductivity of the cured resin itself rather than the inorganic filler.
特許文献1〜3の積層板は、熱伝導性のよい金属や無機セラミックスを用いて放熱性を高めたものである。しかしながら、これらの方法では、従来のシート状繊維基材に熱硬化性樹脂ワニスを含浸し乾燥して得たプリプレグの層を加熱加圧成形した積層板に比べて、加工性が劣り、また、絶縁性も低下するという問題がある。
また、特許文献4の積層板は、樹脂組成物の熱伝導性が高く加工性、絶縁性に優れると考えられる。しかしながら、熱伝導性に優れた樹脂組成物が得られた場合であっても、ガラス繊維織物に含浸して得られるプリプレグや積層板は、樹脂組成物の熱伝導性よりも劣ることが多く、特に、ガラス繊維織物の熱伝導性が樹脂組成物の熱伝導性に比べ下回る場合は、プリプレグ、積層板の熱伝導性が低下する傾向が著しかった。
The laminates of Patent Documents 1 to 3 have improved heat dissipation using a metal or inorganic ceramic with good thermal conductivity. However, in these methods, the workability is inferior compared to a laminate obtained by heat-pressing a prepreg layer obtained by impregnating a thermosetting resin varnish into a conventional sheet-like fiber substrate and drying, There is a problem that the insulating property is also lowered.
Moreover, the laminated board of patent document 4 is considered that the heat conductivity of a resin composition is high and is excellent in workability and insulation. However, even when a resin composition excellent in thermal conductivity is obtained, the prepreg or laminate obtained by impregnating the glass fiber fabric is often inferior to the thermal conductivity of the resin composition, In particular, when the thermal conductivity of the glass fiber fabric was lower than the thermal conductivity of the resin composition, the tendency of the thermal conductivity of the prepreg and the laminate to decrease was remarkable.
そこで、本発明はかかる事情に鑑みなされたものであり、優れた加工性及び絶縁性を維持し、かつ、熱伝導性に優れたプリプレグを提供することを目的とするものである。また、本発明は、上記熱伝導性に優れたプリプレグを用いて、積層板及びプリント配線基板を作製して、放熱性に優れた積層板及びプリント配線基板を提供することを目的とするものである。 Therefore, the present invention has been made in view of such circumstances, and an object of the present invention is to provide a prepreg that maintains excellent workability and insulation and is excellent in thermal conductivity. Another object of the present invention is to produce a laminated board and a printed wiring board using the prepreg excellent in thermal conductivity, and to provide a laminated board and a printed wiring board excellent in heat dissipation. is there.
本発明は、上記の課題を解決するために鋭意研究した結果、熱伝導性の高い樹脂組成物を、無機固体粒子が付着しているガラス繊維からなる布に塗工し、加熱して得られるプリプレグが、優れた加工性及び絶縁性を維持し、かつ、熱伝導率に優れることを見出し、本発明を完成するに至った。 As a result of earnest research to solve the above-mentioned problems, the present invention is obtained by applying a resin composition having high thermal conductivity to a cloth made of glass fibers to which inorganic solid particles are adhered and heating the resin composition. The present inventors have found that the prepreg maintains excellent workability and insulation and is excellent in thermal conductivity, and has completed the present invention.
すなわち、本発明は、
(1) (A)熱硬化性樹脂及び無機充填材を含む25℃における熱伝導率が0.9W/mK以上である樹脂組成物を、(B)無機固体粒子が付着しているガラス繊維からなる基材に塗工し、加熱して得られるプリプレグ、
(2) 前記熱硬化性樹脂が、エポキシ樹脂である上記(1)に記載のプリプレグ、
(3) 前記無機充填材の含有量が、樹脂組成物全体の30〜70体積%である上記(1)又は(2)に記載のプリプレグ、
(4) 前記無機充填材が、水酸化アルミニウム、酸化アルミニウム、酸化亜鉛、酸化マグネシウム、炭酸マグネシウム、水酸化マグネシウム、酸化チタン及び窒化硼素より選択された少なくとも1種である上記(1)〜(3)のいずれかに記載のプリプレグ、
(5) 前記無機固体粒子の含有量が、ガラス繊維に対して0.1〜2質量%である上記(1)〜(4)のいずれかに記載のプリプレグ、
(6) 前記無機固体粒子の平均粒径が5〜2000nmである上記(1)〜(5)のいずれかに記載のプリプレグ、
(7) 前記無機固体粒子が、酸化珪素及び/又は酸化チタンである上記(1)〜(6)のいずれかに記載のプリプレグ、
(8) プリプレグの25℃における熱伝導率が、1.0W/mK以上である上記(1)〜(7)のいずれかに記載のプリプレグ、
(9) 上記(1)〜(8)のいずれかに記載のプリプレグを用いて積層形成した積層板、
(10) 上記(9)に記載の積層板を配線形成したプリント配線板、
を提供するものである。
That is, the present invention
(1) (A) A resin composition having a thermal conductivity of 0.9 W / mK or more at 25 ° C. containing a thermosetting resin and an inorganic filler is obtained from (B) a glass fiber to which inorganic solid particles are attached. A prepreg obtained by coating and heating on a base material,
(2) The prepreg according to (1), wherein the thermosetting resin is an epoxy resin,
(3) The prepreg according to (1) or (2) above, wherein the content of the inorganic filler is 30 to 70% by volume of the entire resin composition,
(4) The above (1) to (3), wherein the inorganic filler is at least one selected from aluminum hydroxide, aluminum oxide, zinc oxide, magnesium oxide, magnesium carbonate, magnesium hydroxide, titanium oxide and boron nitride. ) The prepreg according to any one of
(5) The prepreg according to any one of (1) to (4), wherein the content of the inorganic solid particles is 0.1 to 2% by mass with respect to the glass fiber.
(6) The prepreg according to any one of (1) to (5), wherein the inorganic solid particles have an average particle size of 5 to 2000 nm.
(7) The prepreg according to any one of (1) to (6), wherein the inorganic solid particles are silicon oxide and / or titanium oxide.
(8) The prepreg according to any one of the above (1) to (7), wherein the thermal conductivity of the prepreg at 25 ° C. is 1.0 W / mK or more,
(9) A laminate formed by using the prepreg according to any one of (1) to (8) above,
(10) A printed wiring board formed by wiring the laminated board according to (9),
Is to provide.
本発明によれば、優れた加工性及び絶縁性を維持し、かつ、熱伝導性に優れたプリプレグが得られる。また、上記熱伝導性に優れたプリプレグを用いて、積層板及びプリント配線基板を作製すれば、放熱性に優れた積層板及びプリント配線基板が得られる。 According to the present invention, it is possible to obtain a prepreg that maintains excellent workability and insulation and is excellent in thermal conductivity. Moreover, if a laminated board and a printed wiring board are produced using the said prepreg excellent in heat conductivity, the laminated board and printed wiring board excellent in heat dissipation will be obtained.
以下、本発明の実施の形態について、詳細に説明する。
まず、本発明に用いる樹脂組成物について説明する。
本発明に用いる樹脂組成物は、(A)熱硬化性樹脂及び無機充填材を含む25℃における熱伝導率が0.9W/mK以上である樹脂組成物であり、熱硬化性樹脂、無機充填材を必須成分として含むものである。
このうち、熱硬化性樹脂としては、例えば、エポキシ樹脂、フェノール樹脂、不飽和イミド樹脂、アミノ樹脂、不飽和ポリエステル樹脂、アリル樹脂、ジシクロペンタジエン樹脂、シリコーン樹脂、トリアジン樹脂、メラミン樹脂等が挙げられる。これらの中で、成形性や電気絶縁性に優れるエポキシ樹脂が好ましい。
このようなエポキシ樹脂としては、例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、ビフェニル型エポキシ樹脂、脂環式エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ビスフェノールFノボラック型エポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂、多官能フェノール類及びアントラセンやナフタレン等の多環芳香族類のグリシジルエーテル化合物等が挙げられる。
Hereinafter, embodiments of the present invention will be described in detail.
First, the resin composition used for this invention is demonstrated.
The resin composition used in the present invention is a resin composition having a thermal conductivity of 0.9 W / mK or more at 25 ° C. containing (A) a thermosetting resin and an inorganic filler. The material is included as an essential component.
Among these, examples of thermosetting resins include epoxy resins, phenol resins, unsaturated imide resins, amino resins, unsaturated polyester resins, allyl resins, dicyclopentadiene resins, silicone resins, triazine resins, melamine resins, and the like. It is done. Among these, an epoxy resin excellent in moldability and electrical insulation is preferable.
Examples of such epoxy resins include bisphenol A type epoxy resins, bisphenol F type epoxy resins, bisphenol S type epoxy resins, biphenyl type epoxy resins, alicyclic epoxy resins, phenol novolac type epoxy resins, and cresol novolak type epoxy resins. Bisphenol A novolak type epoxy resin, bisphenol F novolak type epoxy resin, dicyclopentadiene type epoxy resin, polyfunctional phenols, and polycyclic aromatic glycidyl ether compounds such as anthracene and naphthalene.
無機充填材としては、25℃における熱伝導率が3W/mK以上の熱伝導率の高い無機充填材を用いるのが好ましく、例えば、水酸化アルミニウム(3W/mK)、酸化アルミニウム(20〜30W/mK)、酸化亜鉛(54W/mK)、酸化マグネシウム(45〜60W/mK)、炭酸マグネシウム(15W/mK)、水酸化マグネシウム(8W/mK)、酸化チタン(8W/mK)、窒化硼素(57W/mK)などが挙げられる。なお、上記無機充填材料のかっこ内の数値は、約25℃における熱伝導率である。
これらの中で、水酸化アルミニウム、酸化アルミニウム、酸化亜鉛、酸化マグネシウム、酸化チタン及び窒化硼素は、25℃における熱伝導率が3W/mK以上であり、好ましい無機充填材である。
ここで、熱伝導率は温度の依存性があるため、測定上の制約が少なく管理も容易な温度である25℃における熱伝導率を無機充填材、樹脂組成物、プリプレグ、積層板等の熱伝導率として使用する。
As the inorganic filler, it is preferable to use an inorganic filler having a high thermal conductivity of 3 W / mK or more at 25 ° C., for example, aluminum hydroxide (3 W / mK), aluminum oxide (20 to 30 W / mK), zinc oxide (54 W / mK), magnesium oxide (45-60 W / mK), magnesium carbonate (15 W / mK), magnesium hydroxide (8 W / mK), titanium oxide (8 W / mK), boron nitride (57 W) / mK). In addition, the numerical value in the parenthesis of the said inorganic filling material is a heat conductivity in about 25 degreeC.
Among these, aluminum hydroxide, aluminum oxide, zinc oxide, magnesium oxide, titanium oxide and boron nitride are preferable inorganic fillers having a thermal conductivity of 3 W / mK or more at 25 ° C.
Here, since the thermal conductivity depends on temperature, the thermal conductivity at 25 ° C., which is a temperature that is less constrained in measurement and easy to manage, is applied to the heat of inorganic fillers, resin compositions, prepregs, laminates, etc. Used as conductivity.
また、無機充填材の形状は、樹脂に高充填した際に流動性の低下が少ない球状の粒子が好ましく、無機充填材の粒子径は、累積50%粒子径が0.1〜10μm、特に0.3〜5μmのものが熱伝導性向上の観点から好ましい。
ここで、累積50%粒子径とは、粉末の全体積を100%として粒子径による累積度数分布曲線を求めた時、ちょうど体積50%に相当する点の粒子径のことであり、レーザ回折散乱法を用いた粒度分布測定装置などで測定することができる。
Further, the shape of the inorganic filler is preferably spherical particles with little decrease in fluidity when highly filled in the resin, and the inorganic filler has a cumulative 50% particle size of 0.1 to 10 μm, particularly 0. A thickness of 3 to 5 μm is preferable from the viewpoint of improving thermal conductivity.
Here, the cumulative 50% particle diameter is the particle diameter at a point corresponding to a volume of 50% when a cumulative frequency distribution curve based on the particle diameter is obtained with the total volume of the powder as 100%. It can be measured by a particle size distribution measuring apparatus using a method.
本発明では、樹脂組成物中の無機充填材の含有量は、樹脂組成物全体の30〜70体積%が好ましく、40〜65体積%であることがより好ましく、45〜60体積%であることがさらに好ましい。
無機充填材の含有量が樹脂組成物全体の30〜70体積%であると、無機充填材による樹脂組成物の熱伝導率を高める効果が大きく、その結果、樹脂組成物の25℃における熱伝導率を0.9W/mK以上とすることが容易となるからであり、また、樹脂組成物の熱膨張率が低減し、適度な流動性を有し優れた成形性を有する樹脂組成物が得られるからである。
ここで、無機充填材の体積%とは、樹脂組成物全体の体積に対する無機充填材の占める体積を百分率で示したものである。
In the present invention, the content of the inorganic filler in the resin composition is preferably 30 to 70% by volume of the entire resin composition, more preferably 40 to 65% by volume, and 45 to 60% by volume. Is more preferable.
When the content of the inorganic filler is 30 to 70% by volume of the entire resin composition, the effect of increasing the thermal conductivity of the resin composition by the inorganic filler is large. As a result, the heat conduction of the resin composition at 25 ° C. This is because it is easy to set the rate to 0.9 W / mK or more, and the thermal expansion coefficient of the resin composition is reduced, so that a resin composition having appropriate fluidity and excellent moldability is obtained. Because it is.
Here, the volume% of the inorganic filler is a percentage of the volume occupied by the inorganic filler with respect to the total volume of the resin composition.
そして、樹脂組成物の25℃における熱伝導率が0.9W/mK以上であれば、後記する無機固体粒子が付着しているガラス繊維からなる基材と相まって、優れた放熱性を有するプリプレグ及びこれを用いた積層板並びにプリント配線基板を得ることができる。この樹脂組成物の25℃における熱伝導率は、1.0W/mK以上が好ましく、1.1W/mK以上がさらに好ましい。
含有させる無機充填材の種類及び含有量を調整することにより、樹脂組成物の熱伝導率を調整することができる。
And if the heat conductivity in 25 degreeC of a resin composition is 0.9 W / mK or more, it combined with the base material which consists of the glass fiber to which the inorganic solid particle to mention later adheres, and the prepreg which has the outstanding heat dissipation, and A laminated board and a printed wiring board using this can be obtained. The thermal conductivity at 25 ° C. of this resin composition is preferably 1.0 W / mK or more, and more preferably 1.1 W / mK or more.
The thermal conductivity of the resin composition can be adjusted by adjusting the type and content of the inorganic filler to be contained.
本発明の樹脂組成物には、上記成分以外に硬化剤、硬化促進剤、熱可塑性樹脂、エラストマー、難燃剤、紫外線吸収剤、酸化防止剤および密着性向上剤等を添加することができる。
硬化剤の例としては、例えばエポキシ樹脂を用いる場合には、フェノールノボラック、クレゾールノボラック等の多官能フェノール化合物;ジシアンジアミド、ジアミノジフェニルメタン、ジアミノジフェニルスルフォン等のアミン化合物;無水フタル酸、無水ピロメリット酸、無水マレイン酸、無水マレイン酸共重合体等の酸無水物;等を用いることができる。これら硬化剤は、何種類かを併用することもできる。
In addition to the above components, a curing agent, a curing accelerator, a thermoplastic resin, an elastomer, a flame retardant, an ultraviolet absorber, an antioxidant, an adhesion improver, and the like can be added to the resin composition of the present invention.
Examples of curing agents include, for example, epoxy resins, polyfunctional phenol compounds such as phenol novolac and cresol novolac; amine compounds such as dicyandiamide, diaminodiphenylmethane, and diaminodiphenylsulfone; phthalic anhydride, pyromellitic anhydride, Acid anhydrides such as maleic anhydride and maleic anhydride copolymer; and the like can be used. Several kinds of these curing agents can be used in combination.
硬化促進剤の例としては、例えばエポキシ樹脂の硬化促進剤として、イミダゾール類及びその誘導体;有機リン系化合物;第二級アミン類、第三級アミン類、及び第四級アンモニウム塩;等が挙げられる。
このようなイミダゾール類及びその誘導体としては、イミダゾール、2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、2−ウンデシルイミダゾール、1−ベンジル−2−メチルイミダゾール、2−ヘプタデシルイミダゾール、4、5−ジフェニルイミダゾール、2−メチルイミダゾリン、2−フェニルイミダゾリン、2−ウンデシルイミダゾリン、2−ヘプタデシルイミダゾリン、2−イソプロピルイミダゾール、2、4−ジメチルイミダゾール、2−フェニル−4−メチルイミダゾール、2−エチルイミダゾリン、2−イソプロピルイミダゾリン、2、4−ジメチルイミダゾリン、2−フェニル−4−メチルイミダゾリン等が挙げられる。
これらイミダゾール系化合物は、マスク化剤によりマスクされていても良い。マスク化剤としては、アクリルニトリル、フェニレンジイソシアネート、トルイジンイソシアニネート、ナフタレンジイソシアネート、メチレンビスフェニルイソシアネート、メラミンアクリレート等が挙げられる。
Examples of curing accelerators include, for example, epoxy resin curing accelerators such as imidazoles and derivatives thereof; organophosphorus compounds; secondary amines, tertiary amines, and quaternary ammonium salts; It is done.
Examples of such imidazoles and derivatives thereof include imidazole, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 1-benzyl-2-methyl. Imidazole, 2-heptadecylimidazole, 4,5-diphenylimidazole, 2-methylimidazoline, 2-phenylimidazoline, 2-undecylimidazoline, 2-heptadecylimidazoline, 2-isopropylimidazole, 2,4-dimethylimidazole, 2 -Phenyl-4-methylimidazole, 2-ethylimidazoline, 2-isopropylimidazoline, 2,4-dimethylimidazoline, 2-phenyl-4-methylimidazoline and the like.
These imidazole compounds may be masked with a masking agent. Examples of the masking agent include acrylonitrile, phenylene diisocyanate, toluidine isocyaninate, naphthalene diisocyanate, methylene bisphenyl isocyanate, and melamine acrylate.
有機リン系化合物としては、エチレンホスフィン、プロピルホスフィン、ブチルホスフィン、フェニルホスフィン、トリメチルホスフィン、トリエチルホスフィン、トリブチルホスフィン、トリオクチルホスフィン、トリフェニルホスフィン、トリシクロヘキシルホスフィン、トリフェニルホスフィン/トリフェニルボラン錯体、テトラフェニルホスホニウムテトラフェニルボレート等が挙げられる。
第二級アミン類としては、モルホリン、ピペリジン、ピロリジン、ジメチルアミン、ジエチルアミン、ジシクロヘキシルアミン、N−アルキルアリールアミン、ピペラジン、ジアリルアミン、チアゾリン、チオモルホリン等が挙げられる。
第三級アミン類としては、ベンジルジメチルアミン、2−(ジメチルアミノメチル)フェノール、2、4、6−トリス(ジアミノメチル)フェノール等が挙げられる。
第四級アンモニウム塩としては、テトラブチルアンモニウムアイオダイド、テトラブチルアンモニウムブロマイド、テトラブチルアンモニウムクロライド、テトラブチルアンモニウムフルオライド、塩化ベンザルコニウム、ベンジルジ(2−ヒドロキシエチル)エチルアンモニウムクロライド、デシルジ(2−ヒドロキシエチル)メチルアンモニウムブロマイド等が挙げられる。
なお、上記硬化促進剤の種類や配合量は、2種類以上を併用しても良い。
Examples of organophosphorus compounds include ethylenephosphine, propylphosphine, butylphosphine, phenylphosphine, trimethylphosphine, triethylphosphine, tributylphosphine, trioctylphosphine, triphenylphosphine, tricyclohexylphosphine, triphenylphosphine / triphenylborane complex, tetra Examples include phenylphosphonium tetraphenylborate.
Secondary amines include morpholine, piperidine, pyrrolidine, dimethylamine, diethylamine, dicyclohexylamine, N-alkylarylamine, piperazine, diallylamine, thiazoline, thiomorpholine and the like.
Tertiary amines include benzyldimethylamine, 2- (dimethylaminomethyl) phenol, 2,4,6-tris (diaminomethyl) phenol, and the like.
Quaternary ammonium salts include tetrabutylammonium iodide, tetrabutylammonium bromide, tetrabutylammonium chloride, tetrabutylammonium fluoride, benzalkonium chloride, benzyldi (2-hydroxyethyl) ethylammonium chloride, decyldi (2- And hydroxyethyl) methylammonium bromide.
In addition, you may use 2 or more types together for the kind and compounding quantity of the said hardening accelerator.
熱可塑性樹脂の例としては、例えばポリエチレン、ポリプロピレン、ポリスチレン、ポリフェニレンエーテル樹脂、フェノキシ樹脂、ポリカーボネート樹脂、ポリエステル樹脂、ポリアミド樹脂、ポリアミドイミド樹脂、ポリイミド樹脂、キシレン樹脂、ポリフェニレンスルフィド樹脂、ポリエーテルイミド樹脂、ポリエーテルエーテルケトン樹脂、ポリエーテルイミド樹脂等が挙げられる。
エラストマーの例としては、例えばポリブタジエン、アクリロニトリル、エポキシ変性ポリブタジエン、無水マレイン酸変性ポリブタジエン、フェノール変性ポリブタジエンおよびカルボキシ変性アクリロニトリル等が挙げられる。
Examples of thermoplastic resins include, for example, polyethylene, polypropylene, polystyrene, polyphenylene ether resin, phenoxy resin, polycarbonate resin, polyester resin, polyamide resin, polyamideimide resin, polyimide resin, xylene resin, polyphenylene sulfide resin, polyetherimide resin, Examples include polyether ether ketone resins and polyether imide resins.
Examples of elastomers include polybutadiene, acrylonitrile, epoxy-modified polybutadiene, maleic anhydride-modified polybutadiene, phenol-modified polybutadiene, carboxy-modified acrylonitrile, and the like.
難燃剤の例としては、例えば臭素や塩素を含有する含ハロゲン系難燃剤、トリフェニルホスフェート、トリクレジルホスフェート、トリスジクロロプロピルホスフェート、ホスファゼン、赤リン等のリン系難燃剤;三酸化アンチモン;等の無機系難燃剤が挙げられる。
その他、紫外線吸収剤の例としてはベンゾトリアゾール系紫外線吸収剤、酸化防止剤の例としてはヒンダードフェノール系やスチレン化フェノール系酸化防止剤、密着性向上剤の例としては尿素シラン等の尿素化合物やシランカップリング剤が挙げられる。
このうち、シランカップリング剤としては、具体的には、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピル(メチル)ジメトキシシラン、2−(2,3−エポキシシクロヘキシル)エチルトリメトキシシランのようなエポキシ基含有シラン;3−アミノプロピルトリエトキシシラン、N−(2−アミノエチル)−3−アミノプロピルトリメトキシシラン、N−(2−アミノエチル)−3−アミノプロピル(メチル)ジメトキシシランのようなアミノ基含有シラン;3−(トリメトキシリル)プロピルテトラメチルアンモニウムクロリドのようなカチオン性シラン;ビニルトリエトキシシランのようなビニル基含有シラン;3−メタクリロキシプロピルトリメトキシシランのようなアクリル基含有シラン;および3−メルカプトプロピルトリメトキシシランのようなメルカプト基含有シランが挙げられる。
Examples of flame retardants include, for example, halogen-containing flame retardants containing bromine and chlorine, triphenyl phosphate, tricresyl phosphate, trisdichloropropyl phosphate, phosphazenes, red phosphorus and other phosphorus flame retardants; antimony trioxide; etc. Inorganic flame retardants.
Other examples of UV absorbers include benzotriazole UV absorbers, examples of antioxidants include hindered phenols and styrenated phenols, and examples of adhesion improvers include urea compounds such as urea silane. And silane coupling agents.
Of these, specific examples of silane coupling agents include 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyl (methyl) dimethoxysilane, and 2- (2,3-epoxycyclohexyl) ethyltrimethoxy. Epoxy group-containing silane such as silane; 3-aminopropyltriethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropyl (methyl) Amino group-containing silanes such as dimethoxysilane; cationic silanes such as 3- (trimethoxylyl) propyltetramethylammonium chloride; vinyl group-containing silanes such as vinyltriethoxysilane; 3-methacryloxypropyltrimethoxysilane Acrylic group-containing silanes such as; and 3- Mercapto group-containing silane such as Le mercaptopropyl trimethoxysilane.
本発明の樹脂組成物は、プリプレグに用いられるため、各成分が有機溶媒中に溶解もしくは分散された状態で配合され、最終的にはワニスの状態で提供されることが好ましい。
この際用いる有機溶媒としては、例えばメタノール、エタノール、プロパノール、ブタノール等のアルコール類;メチルセロソルブ、ブチルセロソルブ、プロピレングリコールモノメチルエーテル等のグリコールエーテル類;アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類;酢酸ブチル、プロピレングリコールモノメチルエーテルアセテート等のエステル類;テトラヒドロフラン等のエーテル類;トルエン、キシレン等の芳香族炭化水素類;ジメチルホルムアミド、ジメチルアセトアミド、N−メチルピロリドン等の窒素原子含有溶媒;ジメチルスルホキシド等の硫黄原子含有溶媒;等が挙げられ、単独または2種以上を混合して使用できる。
Since the resin composition of the present invention is used in a prepreg, it is preferable that each component is blended in a state where it is dissolved or dispersed in an organic solvent, and finally provided in a varnish state.
Examples of the organic solvent used here include alcohols such as methanol, ethanol, propanol and butanol; glycol ethers such as methyl cellosolve, butyl cellosolve and propylene glycol monomethyl ether; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone; Esters such as butyl acetate and propylene glycol monomethyl ether acetate; Ethers such as tetrahydrofuran; Aromatic hydrocarbons such as toluene and xylene; Nitrogen-containing solvents such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone; Dimethyl sulfoxide and the like Or a mixture of two or more of them.
これらの中で、溶解性の点からメチルイソブチルケトン、メチルエチルケトン、プロピレングリコールモノメチルエーテル、メチルセロソルブが好ましく、低毒性である点からメチルイソブチルケトン、プロピレングリコールモノメチルエーテルがより好ましい。
また、配合の順序は、無機充填材をあらかじめ有機溶媒中に分散させた後、熱硬化性樹脂等の無機充填材以外の成分と混合等することが好ましい。
無機充填材を有機溶媒中に分散させる際は、分散性向上のためにビーズミル、ホモジナイザー、ジェットミル等の分散機を使うことができる。また、無機充填材をシラン系やチタネート系等のカップリング剤、シリコーンオリゴマー等の表面処理剤で前処理、あるいはインテグラルブレンド処理することも好ましい。
Among these, methyl isobutyl ketone, methyl ethyl ketone, propylene glycol monomethyl ether and methyl cellosolve are preferable from the viewpoint of solubility, and methyl isobutyl ketone and propylene glycol monomethyl ether are more preferable from the viewpoint of low toxicity.
Further, the order of blending is preferably such that the inorganic filler is dispersed in an organic solvent in advance and then mixed with components other than the inorganic filler such as a thermosetting resin.
When dispersing the inorganic filler in the organic solvent, a disperser such as a bead mill, a homogenizer, or a jet mill can be used to improve dispersibility. In addition, it is also preferable to pre-treat the inorganic filler with a surface treatment agent such as a silane or titanate coupling agent or a silicone oligomer, or an integral blend treatment.
最終的に得られるワニス中の樹脂組成物は、ワニス全体の40〜90質量%であることが好ましく、50〜80質量%であることがより好ましい。この範囲であれば、適切な樹脂組成物の付着量を有するプリプレグを作製することが容易であり、また、ワニスの粘度が適度な粘度となり塗工性に優れるからである。 It is preferable that the resin composition in the varnish finally obtained is 40 to 90 mass% of the whole varnish, and it is more preferable that it is 50 to 80 mass%. If it is within this range, it is easy to produce a prepreg having an appropriate amount of the resin composition attached, and the viscosity of the varnish becomes an appropriate viscosity and is excellent in coatability.
次に、本発明に用いる基材について説明する。
本発明に用いる基材は、(B)無機固体粒子が付着しているガラス繊維からなる基材であり、ガラス繊維に無機固体粒子が付着していることが必要である。
本発明に用いるガラス繊維としては、Eガラス、Dガラス、SガラスおよびQガラス等のガラス繊維が挙げられる。
また、上記ガラス繊維は、例えば、織布、不織布、ロービンク、チョップドストランドマットおよびサーフェシングマット等の形状を有するが、材質および形状は目的とする積層板の用途や性能により選択され、必要により、単独または2種類以上の材質および形状を組み合せることができる。これらのうちでも、特に、織布又は不織布が好ましい。
Next, the base material used for this invention is demonstrated.
The base material used for this invention is a base material which consists of a glass fiber to which (B) inorganic solid particle has adhered, and it is necessary for the inorganic solid particle to adhere to glass fiber.
Examples of the glass fiber used in the present invention include glass fibers such as E glass, D glass, S glass, and Q glass.
The glass fiber has, for example, a woven fabric, a non-woven fabric, a robink, a chopped strand mat, a surfacing mat, and the like, and the material and shape are selected depending on the intended use and performance of the laminate, and if necessary. A single material or a combination of two or more materials and shapes can be used. Among these, woven fabric or nonwoven fabric is particularly preferable.
本発明の基材としては、無機固体粒子が付着しているガラス繊維、すなわち、無機固体粒子を含むガラス繊維用収束剤を使用したものが用いられる。この基材は、無機固体粒子がガラス繊維に接触している点が重要であり、無機固体粒子がガラス繊維に接触することで、樹脂組成物と基材間の熱伝導をスムーズにし、プリプレグ全体の熱伝導性を向上することができる。
無機固体粒子の含有量は、ガラス繊維質量に対し0.1〜2質量%であることが好ましく、0.2〜1質量%がさらに好ましい。
無機固体粒子としては、コロイダルシリカなどの酸化珪素や、酸化チタンなどを少なくとも1種含むことが好ましい。また、無機固体粒子の平均粒径は、5〜2000nmであることが好ましいが、特に、樹脂組成物の塗工のし易さ、プリプレグの熱伝導性等を考慮すると、10〜1000nmであることが好ましい。
このような無機固体粒子が付着しているガラス繊維からなる基材の25℃における熱伝導率は、1.0〜1.1W/mKである。
As the substrate of the present invention, a glass fiber to which inorganic solid particles are adhered, that is, a glass fiber converging agent containing inorganic solid particles is used. This base material is important in that the inorganic solid particles are in contact with the glass fiber, and the inorganic solid particles are in contact with the glass fiber, so that the heat conduction between the resin composition and the base material is smooth, and the entire prepreg The thermal conductivity of can be improved.
The content of the inorganic solid particles is preferably 0.1 to 2% by mass and more preferably 0.2 to 1% by mass with respect to the glass fiber mass.
The inorganic solid particles preferably contain at least one kind of silicon oxide such as colloidal silica and titanium oxide. The average particle size of the inorganic solid particles is preferably 5 to 2000 nm, but in particular considering the ease of application of the resin composition, the thermal conductivity of the prepreg, etc., it is 10 to 1000 nm. Is preferred.
The thermal conductivity at 25 ° C. of the base material made of glass fiber to which such inorganic solid particles are attached is 1.0 to 1.1 W / mK.
ガラス繊維に無機固体粒子を付着させる方法としては、例えば、特開平9−208268号公報、特開平6−248572号公報等に記載されている方法を用いることができる。
本発明の無機固体粒子が付着しているガラス繊維からなる基材は、さらにシランカップリング剤等で表面処理したり、または機械的に開繊処理を施したりしたものが、耐熱性、耐湿性、加工性等の面から好ましい。
本発明の無機固体粒子が付着しているガラス繊維からなる基材の厚さは、例えば0.01〜0.2mmのものを採用することができる。
As a method for attaching the inorganic solid particles to the glass fiber, for example, methods described in JP-A-9-208268, JP-A-6-248572, and the like can be used.
The substrate made of glass fibers to which the inorganic solid particles of the present invention are attached is further heat-treated, moisture-resistant, and is surface-treated with a silane coupling agent or the like or mechanically subjected to fiber opening treatment. From the viewpoint of workability and the like.
As the thickness of the substrate made of the glass fiber to which the inorganic solid particles of the present invention are attached, for example, a thickness of 0.01 to 0.2 mm can be adopted.
次に、上記(A)の樹脂組成物を、上記(B)の基材に塗工し、加熱して得られるプリプレグについて説明する。
本発明のプリプレグは、上記(A)の樹脂組成物を、上記(B)の無機固体粒子が付着しているガラス繊維からなる基材に含浸、吹付け、押出し等の方法で塗工し、加熱により半硬化して製造することができる。特に、上記樹脂組成物ワニスを用いて基材に含浸塗工し、加熱半硬化する方法が生産性に優れているので好ましい。
加熱温度及び時間は樹脂の種類、ワニスに含まれる有機溶剤の種類、および硬化促進剤の種類や量によって異なる。
Next, the prepreg obtained by applying the resin composition (A) to the substrate (B) and heating it will be described.
The prepreg of the present invention is obtained by applying the resin composition of the above (A) to a substrate made of glass fiber to which the inorganic solid particles of the above (B) are adhered by a method such as impregnation, spraying, extrusion, etc. It can be manufactured by being semi-cured by heating. In particular, a method of impregnating a substrate with the resin composition varnish and heating and semi-curing is preferable because it is excellent in productivity.
The heating temperature and time vary depending on the type of resin, the type of organic solvent contained in the varnish, and the type and amount of curing accelerator.
また、本発明では、上記のプリプレグを積層して積層板として用いることができる。積層板を作製する方法は、特に限定されないが、例えば、本発明のプリプレグを1〜20枚重ね、その片面または両面に銅またはアルミニウム等の金属箔を配置した構成で、多段プレス、多段真空プレス、連続成形機、オートクレーブ成形機等を使用し、温度100〜250℃、圧力0.2〜10MPa、加熱時間0.1〜5時間の範囲で積層成形して、金属箔張積層板を製造することができる。金属箔は、電子部品用途で用いるものであれば特に制限されない。また、本発明のプリプレグと内層用配線板とを組合せて積層成形し、多層板を製造することもできる。
さらに、この積層板に通常の方法により配線形成して、プリント配線板とすることもできる。
Moreover, in this invention, said prepreg can be laminated | stacked and used as a laminated board. The method for producing the laminated plate is not particularly limited. For example, the prepreg of the present invention is stacked 1 to 20 sheets, and a metal foil such as copper or aluminum is arranged on one or both sides thereof. Then, using a continuous molding machine, an autoclave molding machine, etc., a metal foil-clad laminate is manufactured by laminating at a temperature of 100 to 250 ° C., a pressure of 0.2 to 10 MPa, and a heating time of 0.1 to 5 hours. be able to. The metal foil is not particularly limited as long as it is used for electronic parts. Moreover, the prepreg of the present invention and the inner layer wiring board can be laminated and molded to produce a multilayer board.
Furthermore, it is possible to form a printed wiring board by forming wiring on this laminated board by an ordinary method.
次に、熱伝導率の評価方法について説明する。
樹脂組成物、プリプレグ及び積層板の熱伝導率は、熱拡散率と定圧比熱容量と密度の積で求めることができる。
熱拡散率や定圧比熱容量は、フラッシュ法によって測定することができる。フラッシュ法にはレーザーフラッシュ法やキセノンフラッシュ法などがあるが、これらのいずれの方法も用いることができる。また、定圧比熱容量は、示差走査熱量測定(DSC)によって求めることができる。密度は、アルキメデス法によって測定することができる。
なお、熱伝導率は温度の依存性があるため、すべての測定は同一温度である25℃で測定した。
Next, a method for evaluating thermal conductivity will be described.
The thermal conductivity of the resin composition, prepreg and laminate can be determined by the product of thermal diffusivity, constant pressure specific heat capacity and density.
The thermal diffusivity and the constant pressure specific heat capacity can be measured by a flash method. The flash method includes a laser flash method and a xenon flash method, and any of these methods can be used. The constant pressure specific heat capacity can be determined by differential scanning calorimetry (DSC). The density can be measured by the Archimedes method.
In addition, since thermal conductivity has temperature dependence, all measurements were performed at the same temperature of 25 ° C.
以下、本発明の実施例について説明するが、本発明はこれらの実施例によって限定されるものではない。
実施例1〜4、比較例1〜5
表1及び2に示した樹脂組成物の配合のうち、まず無機充填材を、無機充填材全体に対して1.0質量%のシランカップリング剤(信越化学工業(株)製、商品名:KBM403)を用いて乾式処理した後、プロピレングリコールモノメチルエーテルメチル1kg中に撹拌しながら加えて分散して、無機充填材の分散液を得た。
次に、熱硬化性樹脂および硬化剤を、メチルエチルケトンとプロピレングリコールモノメチルエーテルの混合溶媒(混合重量比:2対1)1kg中に加えた後、熱硬化性樹脂と硬化剤が均一になるまで撹拌して、熱硬化性樹脂のワニスを得た。
Examples of the present invention will be described below, but the present invention is not limited to these examples.
Examples 1-4, Comparative Examples 1-5
Among the blends of the resin compositions shown in Tables 1 and 2, first, the inorganic filler is 1.0% by mass of the silane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: After dry treatment with KBM403), the mixture was added to 1 kg of propylene glycol monomethyl ether methyl with stirring and dispersed to obtain a dispersion of inorganic filler.
Next, the thermosetting resin and the curing agent are added to 1 kg of a mixed solvent of methyl ethyl ketone and propylene glycol monomethyl ether (mixing weight ratio: 2 to 1), and then stirred until the thermosetting resin and the curing agent are uniform. As a result, a varnish of a thermosetting resin was obtained.
そして、この熱硬化性樹脂のワニスに上記無機充填材の分散液を撹拌しながら加え、分散液とその他の成分が十分混合してからさらに硬化促進剤を加えて全体が均一になるまで攪拌した。最後に、樹脂組成物の含有量が70質量%になるようにプロピレングリコールモノメチルエーテルを加えて濃度を調整し、樹脂組成物のワニスを得た。
また、上記樹脂組成物のワニスをガラス板に塗工し、160℃で5分加熱乾燥して得られた膜から樹脂組成物の粉末を得た。この樹脂組成物の粉末を温度185℃、圧力3.5MPaで1.5時間成形を行って、樹脂板を得た。この樹脂板を10mm角の大きさに切断して、熱伝導率評価用樹脂板を作製した。下記に示す熱伝導率評価方法によって樹脂板の25℃における熱伝導率を求め、0.9W/mKを上回るかどうか判断した。
Then, the dispersion liquid of the inorganic filler was added to the thermosetting resin varnish while stirring, and after the dispersion liquid and other components were sufficiently mixed, a curing accelerator was further added and stirred until the whole became uniform. . Finally, propylene glycol monomethyl ether was added to adjust the concentration so that the content of the resin composition was 70% by mass to obtain a varnish of the resin composition.
Moreover, the resin composition powder was obtained from a film obtained by coating the varnish of the resin composition on a glass plate and heating and drying at 160 ° C. for 5 minutes. The resin composition powder was molded at a temperature of 185 ° C. and a pressure of 3.5 MPa for 1.5 hours to obtain a resin plate. The resin plate was cut to a size of 10 mm square to produce a resin plate for thermal conductivity evaluation. The thermal conductivity at 25 ° C. of the resin plate was determined by the thermal conductivity evaluation method shown below, and it was judged whether it exceeded 0.9 W / mK.
次に、上記樹脂組成物のワニスを、コロイダルシリカにより処理されたEガラスクロス(IPCスペック2116、厚さ0.1mm、コロイダルシリカの含有量:Eガラスクロスに対して0.1〜2重量%、25℃における熱伝導率:1.0〜1.1W/mK)に含浸塗工し、160℃で5分加熱乾燥して樹脂組成物の含有量が60体積%のプリプレグを得た。ガラスクロスの比較材として、未処理のEガラスクロス(IPCスペック2116、厚さ0.1mm、熱伝導率1.03W/mK)と、通気度を上げ樹脂の含浸性を向上したEガラスクロス(IPCスペック1080、厚さ0.05mm)を用いて同様にプリプレグを得た。
次に、このプリプレグを4枚重ね、18μmの電解銅箔を上下に配置し、温度185℃、圧力3.5MPaで1.5時間積層成形を行って銅張積層板を得た。銅張積層板の銅箔をエッチング液により取除いた後、10mm角の大きさに切断して熱伝導率評価基板を作製した。
Next, an E glass cloth treated with colloidal silica (IPC spec 2116, thickness 0.1 mm, content of colloidal silica: 0.1 to 2% by weight with respect to E glass cloth) , 25 ° C. thermal conductivity: 1.0 to 1.1 W / mK) and dried by heating at 160 ° C. for 5 minutes to obtain a prepreg having a resin composition content of 60% by volume. As a comparative material for glass cloth, an untreated E glass cloth (IPC spec 2116, thickness 0.1 mm, thermal conductivity 1.03 W / mK) and E glass cloth with improved air permeability and improved resin impregnation properties ( A prepreg was obtained in the same manner using an IPC spec 1080 (thickness 0.05 mm).
Next, 4 sheets of this prepreg were stacked, 18 μm electrolytic copper foils were placed one above the other, and laminate molding was performed at a temperature of 185 ° C. and a pressure of 3.5 MPa for 1.5 hours to obtain a copper clad laminate. After removing the copper foil of the copper-clad laminate with an etching solution, it was cut into a 10 mm square size to produce a thermal conductivity evaluation substrate.
(熱伝導率の測定)
熱伝導率は、熱拡散率と定圧比熱容量と密度の積から求めた。
熱拡散率は、キセノンフラッシュ法(Nano Flash LEA447、NETZSCH製)を用いて測定し、定圧比熱容量は、DSC(PE Pyris Series Pyris1、パーキンエルマー製)を用いて測定し、密度は電子比重計(SD−200L、アルファミラージュ製)を用いて測定した。
熱拡散率、密度は25℃で測定し、定圧比熱容量測定についても25℃の比熱容量を測定により導いた。この結果を表1及び2に示す。
(Measurement of thermal conductivity)
The thermal conductivity was obtained from the product of thermal diffusivity, constant pressure specific heat capacity and density.
The thermal diffusivity was measured using a xenon flash method (Nano Flash LEA447, manufactured by NETZSCH), the constant pressure specific heat capacity was measured using DSC (PE Pyris Series Pyris 1, manufactured by PerkinElmer), and the density was measured by an electronic hydrometer ( SD-200L, manufactured by Alpha Mirage).
The thermal diffusivity and density were measured at 25 ° C., and the specific heat capacity at 25 ° C. was also derived by measurement. The results are shown in Tables 1 and 2.
表1及び2中の数値は、熱硬化性樹脂の配合量を100質量部とした場合の質量部により示されている。ただし、表1及び2中の*1で示した無機充填材の合計含有量は、樹脂組成物全体に対する無機充填材の含有量を体積%で示したものである。
また、表1及び2中の各成分はそれぞれ次のものを用いた。
・熱硬化性樹脂:フェノールノボラック型エポキシ樹脂(大日本インキ化学工業(株)製、商品名:エピクロンN−770)
・硬化剤:クレゾールノボラック型フェノール樹脂(大日本インキ化学工業(株)製、商品名:KA−1165)
・硬化促進剤:2−エチル−4−メチルイミダゾール(四国化成(株)製、商品名:2E4MZ)
・無機充填材:
MgO:水酸化マグネシウム(協和化学(株)製、商品名:パイロスキマ5301K)
Al(OH)3:水酸化アルミニウム(住友化学(株)製、商品名:CL−310)
Al2O3:酸化アルミニウム(住友化学(株)製、商品名:AA−1.5)
SiO2:球状非晶質シリカ(電気化学工業(株)製、商品名:SFP−30M)
The numerical values in Tables 1 and 2 are shown as parts by mass when the amount of the thermosetting resin is 100 parts by mass. However, the total content of the inorganic filler indicated by * 1 in Tables 1 and 2 represents the content of the inorganic filler with respect to the entire resin composition in volume%.
Moreover, the following were used for each component in Tables 1 and 2, respectively.
Thermosetting resin: phenol novolac type epoxy resin (Dainippon Ink Chemical Co., Ltd., trade name: Epicron N-770)
Curing agent: Cresol novolak type phenolic resin (Dainippon Ink Chemical Co., Ltd., trade name: KA-1165)
Curing accelerator: 2-ethyl-4-methylimidazole (manufactured by Shikoku Kasei Co., Ltd., trade name: 2E4MZ)
・ Inorganic filler:
MgO: Magnesium hydroxide (Kyowa Chemical Co., Ltd., trade name: Pyroskima 5301K)
Al (OH) 3 : Aluminum hydroxide (manufactured by Sumitomo Chemical Co., Ltd., trade name: CL-310)
Al 2 O 3 : Aluminum oxide (manufactured by Sumitomo Chemical Co., Ltd., trade name: AA-1.5)
SiO 2 : Spherical amorphous silica (manufactured by Denki Kagaku Kogyo Co., Ltd., trade name: SFP-30M)
表1及び2から明らかなように、本発明の実施例1〜4、比較例1、2は樹脂組成物の25℃における熱伝導率(以下、単に「熱伝導率」と表示する場合は、25℃における熱伝導率を示すものである。)が0.9W/mK以上であるが、コロイダルシリカ処理したガラスクロスを用いた実施例1〜4のみが1.0W/mK以上の熱伝導率を有する積層板を得ることができる。また、樹脂組成物の熱伝導率が0.9W/mK未満である比較例3、4では、積層板の熱伝導率は、0.54W/mK以下であり、熱伝導性が劣っていた。
これは、ガラスクロスの熱伝導率と樹脂組成物の熱伝導率の大小関係が影響しているものと考えられる。ガラスクロス(コロイダルシリカ処理していないガラスクロス、およびコロイダルシリカ処理したガラスクロス)の熱伝導率は0.9〜1.1W/mKの範囲にあるが、樹脂組成物の熱伝導率がこれと等しいかこれよりも高い場合(0.9W/mK以上)で、かつコロイダルシリカ処理したガラスクロスを用いた場合のみ、熱伝導性に優れたプリプレグ(積層板)が得られることがわかった。
As is clear from Tables 1 and 2, Examples 1 to 4 of the present invention and Comparative Examples 1 and 2 indicate the thermal conductivity of the resin composition at 25 ° C. (hereinafter simply referred to as “thermal conductivity”). The thermal conductivity at 25 ° C. is 0.9 W / mK or higher, but only Examples 1 to 4 using glass cloth treated with colloidal silica have a thermal conductivity of 1.0 W / mK or higher. Can be obtained. Moreover, in Comparative Examples 3 and 4 in which the thermal conductivity of the resin composition is less than 0.9 W / mK, the thermal conductivity of the laminate was 0.54 W / mK or less, and the thermal conductivity was inferior.
This is thought to be due to the magnitude relationship between the thermal conductivity of the glass cloth and the thermal conductivity of the resin composition. The thermal conductivity of glass cloth (glass cloth not treated with colloidal silica and glass cloth treated with colloidal silica) is in the range of 0.9 to 1.1 W / mK, but the thermal conductivity of the resin composition is It was found that a prepreg (laminated plate) having excellent thermal conductivity was obtained only when the glass cloth was equal or higher (0.9 W / mK or more) and treated with colloidal silica.
また、実施例1と比較例5から、樹脂組成物にシリカを単に無機充填材として加えただけでは、実施例1〜4のような高い熱伝導率は得られないことがわかった。
さらに、これらの積層板の加工性及び絶縁性は、従来のものと同程度であった。
したがって、本発明によれば、優れた加工性及び絶縁性を維持し、熱伝導性に優れたプリプレグが得られることがわかり、半導体パッケージやプリント配線板用に好適なプリプレグ、積層板及びプリント配線基板を得ることができることがわかった。
Moreover, from Example 1 and Comparative Example 5, it was found that high thermal conductivity as in Examples 1 to 4 could not be obtained simply by adding silica to the resin composition as an inorganic filler.
Furthermore, the workability and insulation of these laminates were comparable to the conventional ones.
Therefore, according to the present invention, it can be seen that a prepreg having excellent workability and insulation and excellent thermal conductivity can be obtained, and a prepreg suitable for a semiconductor package or a printed wiring board, a laminated board, and a printed wiring. It has been found that a substrate can be obtained.
本発明によれば、優れた加工性及び絶縁性を維持し、かつ、熱伝導性に優れたプリプレグが得られるので、このプリプレグ及びそれを用いた積層板並びにプリント配線板は、半導体パーケージやプリント配線板の製造に好適に用いられる。 According to the present invention, a prepreg that maintains excellent workability and insulation and is excellent in thermal conductivity can be obtained. Therefore, the prepreg, a laminated board using the prepreg, and a printed wiring board can be used as a semiconductor package or a printed circuit board. It is suitably used for manufacturing a wiring board.
Claims (8)
前記無機固体粒子が、酸化珪素及び/又は酸化チタンであり、
前記プリプレグの25℃における熱伝導率が、1.0W/mK以上であるプリプレグ。 (A) A resin composition having a thermal conductivity of 0.9 W / mK or more at 25 ° C. containing a thermosetting resin and an inorganic filler, and (B) a substrate made of glass fiber to which inorganic solid particles are attached. It was applied to, a prepreg obtained by heating,
The inorganic solid particles are silicon oxide and / or titanium oxide;
The prepreg whose thermal conductivity in 25 degreeC of the said prepreg is 1.0 W / mK or more .
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| JPH06248572A (en) * | 1993-02-19 | 1994-09-06 | Kanebo Ltd | Glass cloth for fiber-reinforced composite material |
| JPH09208268A (en) * | 1996-02-02 | 1997-08-12 | Nitto Boseki Co Ltd | Glass fiber sizing agent and glass fiber woven fabric |
| DE69907881T2 (en) * | 1998-03-03 | 2004-02-26 | PPG Industries Ohio, Inc., Cleveland | GLASS SPIDING THREAD COATED WITH HEAT-CONDUCTING INORGANIC PARTICLES AND PRODUCTS CONTAINING THEM |
| JP2006036869A (en) * | 2004-07-26 | 2006-02-09 | Shin Kobe Electric Mach Co Ltd | Prepreg, laminated board and printed wiring board |
| JP2009149769A (en) * | 2007-12-20 | 2009-07-09 | Bando Chem Ind Ltd | Elastomer composition, elastomer molded body, and heat dissipation sheet |
| JP2010163598A (en) * | 2008-12-18 | 2010-07-29 | Panasonic Corp | Prepreg, method for producing the same, and printed wiring board using the same |
-
2010
- 2010-11-29 JP JP2010265604A patent/JP5691443B2/en not_active Expired - Fee Related
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