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JP5727312B2 - Conductor sensor and conductor detection method - Google Patents
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JP5727312B2 - Conductor sensor and conductor detection method - Google Patents

Conductor sensor and conductor detection method Download PDF

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JP5727312B2
JP5727312B2 JP2011147040A JP2011147040A JP5727312B2 JP 5727312 B2 JP5727312 B2 JP 5727312B2 JP 2011147040 A JP2011147040 A JP 2011147040A JP 2011147040 A JP2011147040 A JP 2011147040A JP 5727312 B2 JP5727312 B2 JP 5727312B2
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知子 尾身
知子 尾身
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Azbil Corp
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Description

本発明は検出技術に係り、導電体センサ及び導電体の検出方法に関する。   The present invention relates to a detection technique, and relates to a conductor sensor and a conductor detection method.

コイルで磁界を励磁し、金属膜等の導電性膜に磁界を照射すると、導電性膜に渦電流が生じる。ここで、電磁誘導作用により、コイルと、導電性膜と、の距離を変化させると、コイルのQ値及びインピーダンス等の電気特性が変化する。したがって、導電性膜及びコイルの間の距離と、コイルの電気特性と、の関係を予め取得しておけば、測定対象導電性膜に磁界を照射した際のコイルの電気特性の値から、測定対象導電性膜の位置を算出することが可能である(例えば、特許文献1参照。)。   When a magnetic field is excited by a coil and a magnetic film is irradiated on a conductive film such as a metal film, an eddy current is generated in the conductive film. Here, when the distance between the coil and the conductive film is changed by electromagnetic induction, the electrical characteristics such as the Q value and impedance of the coil change. Therefore, if the relationship between the distance between the conductive film and the coil and the electrical characteristics of the coil is acquired in advance, the measurement is performed from the value of the electrical characteristics of the coil when the magnetic film is irradiated to the measurement target conductive film. It is possible to calculate the position of the target conductive film (see, for example, Patent Document 1).

特開2010−164472号公報JP 2010-164472 A

しかし、導電性膜の背後に導電体が配置されている場合、コイルから磁界を励磁すると、導電性膜と、導電体と、の両方に渦電流が生じる。そのため、導電性膜と、導電体と、のいずれの位置も正確に検出できないという問題がある。そこで、本発明は、少なくとも2つの導電体のそれぞれの位置を特定可能な導電体センサ及び導電体の検出方法を提供することを目的の一つとする。   However, when a conductor is disposed behind the conductive film, when a magnetic field is excited from the coil, an eddy current is generated in both the conductive film and the conductor. Therefore, there is a problem that neither the conductive film nor the conductor can be accurately detected. Therefore, an object of the present invention is to provide a conductor sensor and a conductor detection method capable of specifying the positions of at least two conductors.

本発明の態様によれば、(a)周波数が異なる第1及び第2の磁界を放射する磁界放射器と、(b)第1の導電体、及び第1の導電体の手前に配置された第2の導電体に磁界放射器を用いて第1の磁界を照射した場合の、磁界放射器の特性、第1及び第2の導電体の位置の第1の関係と、第1及び第2の導電体に磁界放射器を用いて第2の磁界を照射した場合の、磁界放射器の特性、第1及び第2の導電体の位置の第2の関係と、を保存する関係記憶装置と、(c)第1の測定対象導電体、及び第1の測定対象導電体の手前に配置された第2の測定対象導電体に第1の磁界を照射した場合の磁界放射器の特性及び第1の関係に基づき、第1及び第2の導電体の位置の第3の関係を算出し、第1及び第2の測定対象導電体に第2の磁界を照射した場合の磁界放射器の特性及び第2の関係に基づき、第1及び第2の導電体の位置の第4の関係を算出する関係算出部と、(d)第3の関係及び第4の関係に共通する、第1及び第2の導電体の位置の組み合わせを特定する特定部と、を備える、導電体センサが提供される。   According to an aspect of the present invention, (a) a magnetic field radiator that radiates first and second magnetic fields having different frequencies, and (b) a first conductor and a first conductor are disposed in front of the first conductor. The first relationship between the characteristics of the magnetic field emitter, the positions of the first and second electric conductors, and the first and second when the first electric field is irradiated to the second electric conductor using the magnetic field radiator A relationship storage device for storing the characteristics of the magnetic field radiator and the second relationship between the positions of the first and second conductors when the second magnetic field is irradiated to the second conductor using the magnetic field radiator; (C) the characteristics of the magnetic field radiator and the first characteristic when the first magnetic field is irradiated to the first measuring object conductor and the second measuring object conductor disposed in front of the first measuring object conductor; Based on the relationship of 1, the third relationship of the positions of the first and second conductors is calculated, and the second magnetic field is irradiated to the first and second conductors to be measured. A relationship calculation unit for calculating a fourth relationship between the positions of the first and second conductors based on the characteristics of the magnetic field radiator and the second relationship, and (d) the third relationship and the fourth relationship. And a specifying unit that specifies a combination of positions of the first and second conductors common to each other.

また、本発明の態様によれば、(a)第1の導電体、及び第1の導電体の手前に配置された第2の導電体に磁界放射器を用いて第1の磁界を照射した場合の、磁界放射器の特性、第1及び第2の導電体の位置の第1の関係を用意することと、(b)第1及び第2の導電体に磁界放射器を用いて第1の磁界とは周波数が異なる第2の磁界を照射した場合の、磁界放射器の特性、第1及び第2の導電体の位置の第2の関係を用意することと、(c)第1の測定対象導電体、及び第1の測定対象導電体の手前に配置された第2の測定対象導電体に第1の磁界を照射したときの磁界放射器の特性及び第1の関係に基づき、第1及び第2の導電体の位置の第3の関係を算出することと、(d)第1及び第2の測定対象導電体に第2の磁界を照射したときの磁界放射器の特性及び第2の関係に基づき、第1及び第2の導電体の位置の第4の関係を算出することと、(e)第3の関係及び第4の関係に共通する、第1及び第2の導電体の位置の組み合わせを特定することと、を含む、導電体の検出方法が提供される。   According to the aspect of the present invention, (a) the first conductor and the second conductor disposed in front of the first conductor are irradiated with the first magnetic field using the magnetic field radiator. Providing a first relationship between the characteristics of the magnetic field radiator and the positions of the first and second conductors, and (b) using a magnetic field radiator for the first and second conductors. Preparing a second relationship between the characteristics of the magnetic field radiator and the positions of the first and second conductors when a second magnetic field having a frequency different from that of the magnetic field is irradiated, and (c) a first Based on the characteristics and the first relationship of the magnetic field emitter when the first magnetic field is irradiated to the measurement target conductor and the second measurement target conductor disposed in front of the first measurement target conductor, Calculating the third relationship between the positions of the first and second conductors, and (d) irradiating the first and second measurement target conductors with the second magnetic field. Calculating the fourth relationship of the positions of the first and second conductors based on the characteristics of the magnetic field radiator and the second relationship; and (e) common to the third relationship and the fourth relationship. Identifying a combination of positions of the first and second conductors. A method of detecting a conductor is provided.

本発明によれば、少なくとも2つの導電体のそれぞれの位置を特定可能な導電体センサ及び導電体の検出方法を提供可能である。   According to the present invention, it is possible to provide a conductor sensor and a conductor detection method capable of specifying the positions of at least two conductors.

本発明の実施の形態に係る導電体センサの模式図である。It is a schematic diagram of the conductor sensor which concerns on embodiment of this invention. 本発明の実施の形態に係る第1の磁界を照射した場合の、第1のコイルのQ値、第1及び第2の導電体の位置の第1の関係を示すグラフである。It is a graph which shows the 1st relationship of the Q value of the 1st coil at the time of irradiating the 1st magnetic field concerning an embodiment of the invention, and the position of the 1st and 2nd electric conductor. 本発明の実施の形態に係る第2の磁界を照射した場合の、第2のコイルのQ値、第1及び第2の導電体の位置の第2の関係を示すグラフである。It is a graph which shows the 2nd relationship of the Q value of the 2nd coil at the time of irradiating the 2nd magnetic field concerning an embodiment of the invention, and the position of the 1st and 2nd electric conductor. 本発明の実施の形態に係る第1及び第2の測定対象導電体に第1の磁界を照射した場合の第1のコイルのQ値及び第1の関係に基づく、第1及び第2の導電体の位置の第3の関係を示すグラフである。1st and 2nd electric conduction based on Q value and the 1st relation of the 1st coil at the time of irradiating 1st magnetic field to the 1st and 2nd measuring object electric conductor concerning an embodiment of the invention It is a graph which shows the 3rd relationship of the position of a body. 本発明の実施の形態に係る第1及び第2の測定対象導電体に第2の磁界を照射した場合の第2のコイルのQ値及び第2の関係に基づく、第1及び第2の導電体の位置の第4の関係を示すグラフである。First and second conductivity based on the Q value of the second coil and the second relationship when the first and second measurement target conductors according to the embodiment of the present invention are irradiated with the second magnetic field. It is a graph which shows the 4th relationship of the position of a body. 本発明の実施の形態に係る第3の関係及び第4の関係を重ね合わせたグラフである。It is the graph which superimposed the 3rd relationship and 4th relationship which concern on embodiment of this invention. 本発明のその他の実施の形態に係る導電体センサの模式図である。It is a schematic diagram of the conductor sensor which concerns on other embodiment of this invention.

以下に本発明の実施の形態を説明する。以下の図面の記載において、同一又は類似の部分には同一又は類似の符号で表している。但し、図面は模式的なものである。したがって、具体的な寸法等は以下の説明を照らし合わせて判断するべきものである。また、図面相互間においても互いの寸法の関係や比率が異なる部分が含まれていることは勿論である。   Embodiments of the present invention will be described below. In the following description of the drawings, the same or similar parts are denoted by the same or similar reference numerals. However, the drawings are schematic. Therefore, specific dimensions and the like should be determined in light of the following description. Moreover, it is a matter of course that portions having different dimensional relationships and ratios are included between the drawings.

実施の形態に係る導電体センサは、図1に示すように、第1の周波数を有する第1の磁界を放射する第1のコイル11、及び第1の周波数とは異なる第2の周波数を有する第2の磁界を放射する第2のコイル12を有する磁界放射器1と、磁界放射器1に接続された中央演算処理装置(CPU)300と、を備える。実施の形態に係る導電体センサは、さらに、CPU300に接続された関係記憶装置401を備える。関係記憶装置401は、第1の導電体、及び第1の導電体の手前に配置された第2の導電体に磁界放射器1を用いて第1の磁界を照射して予め取得された、磁界放射器1の特性、第1及び第2の導電体の位置の第1の関係を保存する。また、関係記憶装置401は、第1の導電体、及び第1の導電体の手前に配置された第2の導電体に磁界放射器1を用いて第2の磁界を照射して予め取得された、磁界放射器1の特性、第1及び第2の導電体の位置の第2の関係も保存する。   As shown in FIG. 1, the conductor sensor according to the embodiment has a first coil 11 that radiates a first magnetic field having a first frequency, and a second frequency that is different from the first frequency. The magnetic field radiator 1 which has the 2nd coil 12 which radiates | emits a 2nd magnetic field, and the central processing unit (CPU) 300 connected to the magnetic field radiator 1 are provided. The conductor sensor according to the embodiment further includes a relation storage device 401 connected to the CPU 300. The relationship storage device 401 was acquired in advance by irradiating the first conductor and the second conductor disposed in front of the first conductor with the first magnetic field using the magnetic field emitter 1. The first relationship between the characteristics of the magnetic field radiator 1 and the positions of the first and second conductors is preserved. The relation storage device 401 is acquired in advance by irradiating the first conductor and the second conductor disposed in front of the first conductor with the second magnetic field using the magnetic field emitter 1. Further, the second relationship between the characteristics of the magnetic field radiator 1 and the positions of the first and second conductors is also preserved.

CPU300は、関係算出部301を備える。関係算出部301は、第1の測定対象導電体2、及び第1の測定対象導電体2の手前に配置された第2の測定対象導電体3に磁界放射器1から第1の磁界を照射した場合の磁界放射器1の特性と、関係記憶装置401に保存されている第1の関係と、に基づき、第1の導電体の位置と、第2の導電体の位置と、の第3の関係を算出する。また、関係算出部301は、第1の測定対象導電体2及び第2の測定対象導電体3に磁界放射器1から第2の磁界を照射した場合の磁界放射器1の特性と、関係記憶装置401に保存されている第2の関係と、に基づき、第1の導電体の位置と、第2の導電体の位置と、の第4の関係も算出する。さらに、CPU300は、第3の関係と、第4の関係と、に共通する、第1の導電体の位置と、第2の導電体の位置と、の組み合わせを特定する特定部303を備える。   The CPU 300 includes a relationship calculation unit 301. The relationship calculating unit 301 irradiates the first measurement target conductor 2 and the second measurement target conductor 3 disposed in front of the first measurement target conductor 2 from the magnetic field radiator 1 with the first magnetic field. And the third position of the first conductor and the position of the second conductor based on the characteristics of the magnetic field radiator 1 and the first relation stored in the relation storage device 401. Is calculated. In addition, the relationship calculation unit 301 stores the relationship between the characteristics of the magnetic field radiator 1 when the second magnetic field is irradiated from the magnetic field radiator 1 to the first measurement target conductor 2 and the second measurement target conductor 3, and the relationship memory. Based on the second relationship stored in the device 401, a fourth relationship between the position of the first conductor and the position of the second conductor is also calculated. Further, the CPU 300 includes a specifying unit 303 that specifies a combination of the position of the first conductor and the position of the second conductor, which is common to the third relationship and the fourth relationship.

特定された第1の導電体の位置が、第1の測定対象導電体2の位置となる。第1の測定対象導電体2の位置とは、例えば、磁界放射器1に対する第1の測定対象導電体2の相対位置であり、より具体的には、磁界放射器1からの距離Dである。また、特定された第2の導電体の位置が、第2の測定対象導電体3の位置となる。第2の測定対象導電体3の位置とは、例えば、第1の測定対象導電体2に対する第2の測定対象導電体3の相対位置であり、より具体的には、第1の測定対象導電体2の表面から第2の測定対象導電体3の裏面までの距離Mである。   The position of the specified first conductor is the position of the first measurement target conductor 2. The position of the first measurement target conductor 2 is, for example, the relative position of the first measurement target conductor 2 with respect to the magnetic field radiator 1, and more specifically, the distance D from the magnetic field radiator 1. . Further, the position of the specified second conductor is the position of the second conductor 3 to be measured. The position of the second measurement target conductor 3 is, for example, the relative position of the second measurement target conductor 3 with respect to the first measurement target conductor 2, and more specifically, the first measurement target conductivity. This is a distance M from the front surface of the body 2 to the back surface of the second measurement target conductor 3.

第1のコイル11と、第2のコイル12と、は、第2の測定対象導電体3との距離Dが同じになるよう、平行に配置される。第1のコイル11と、第2のコイル12と、は、第1の磁界と、第2の磁界と、の干渉が低減されるよう、離して配置されてもよい。また、第1の周波数と、第2の周波数と、の差を、干渉が低減されるように設定してもよい。あるいは、第1のコイル11と、第2のコイル12と、は、所定時間毎又は所定波数毎に、交互に磁界を発してもよい。さらに、第1の測定対象導電体2又は第2の測定対象導電体3の抵抗率の変動の影響を低減させたい場合は、第1の測定対象導電体2又は第2の測定対象導電体3の抵抗率の変動を抑制する周波数を設定してもよい。例えば、誤差要因として、第2の測定対象膜3の膜厚の変動がある場合には、第1の測定対象導電体2及び第2の測定対象導電体3の位置の検出が可能な範囲内で、第1及び第2の周波数を低くするとよい。   The 1st coil 11 and the 2nd coil 12 are arranged in parallel so that distance D with the 2nd measuring object conductor 3 may become the same. The first coil 11 and the second coil 12 may be spaced apart so as to reduce interference between the first magnetic field and the second magnetic field. Further, the difference between the first frequency and the second frequency may be set so that interference is reduced. Alternatively, the first coil 11 and the second coil 12 may alternately generate a magnetic field every predetermined time or every predetermined wave number. Furthermore, when it is desired to reduce the influence of the resistivity variation of the first measurement target conductor 2 or the second measurement target conductor 3, the first measurement target conductor 2 or the second measurement target conductor 3 is used. You may set the frequency which suppresses the fluctuation | variation of resistivity. For example, when there is a variation in the film thickness of the second measurement target film 3 as an error factor, it is within a range in which the positions of the first measurement target conductor 2 and the second measurement target conductor 3 can be detected. Thus, the first and second frequencies may be lowered.

第1の測定対象導電体2及び第2の測定対象導電体3のそれぞれは、例えば鉄等の磁性体、あるいはアルミニウム、銅、又はこれらを支配的に含む合金等の非磁性体からなる。第1の測定対象導電体2は、第1及び第2の周波数のうち、低い方の周波数に対する表皮深さよりも厚い板等である。なお、第1の測定対象導電体2は、第1及び第2の周波数のうち、低い方の周波数に対する表皮深さよりも薄い薄膜等であってもよい。また、第2の測定対象導電体3は、第1及び第2の周波数のうち、低い方の周波数に対する表皮深さよりも薄い薄膜等である。第1のコイル11は、LC発振回路の一部をなしている。LC発振回路は、発振振幅が第1のコイル11のクオリティファクタの値(以下、「Q値」という。)の単調関数となるよう、構成されている。第1のコイル11のQ値は、ωを共振角周波数、Lを第1のコイル11の自己インダクタンス、Rを第1のコイル11の高周波抵抗として、下記(1)式で与えられる。
Q = ωL / R ・・・(1)
Each of the first measurement object conductor 2 and the second measurement object conductor 3 is made of, for example, a magnetic material such as iron, or a non-magnetic material such as aluminum, copper, or an alloy containing these predominantly. The first measurement target conductor 2 is a plate or the like that is thicker than the skin depth for the lower frequency of the first and second frequencies. In addition, the 1st measuring object conductor 2 may be a thin film etc. thinner than the skin depth with respect to the lower frequency among the first and second frequencies. Moreover, the 2nd measuring object conductor 3 is a thin film etc. thinner than the skin depth with respect to the lower frequency among the 1st and 2nd frequencies. The first coil 11 forms part of an LC oscillation circuit. The LC oscillation circuit is configured such that the oscillation amplitude is a monotone function of the quality factor value of the first coil 11 (hereinafter referred to as “Q value”). The Q value of the first coil 11 is given by the following equation (1), where ω is the resonance angular frequency, L is the self-inductance of the first coil 11, and R is the high-frequency resistance of the first coil 11.
Q = ωL / R (1)

LC発振回路の発振に伴い、第1のコイル11から第2の測定対象導電体3及び第1の測定対象導電体2に向かって、高周波交流磁界が形成され、第2の測定対象導電体3及び第1の測定対象導電体2のそれぞれに渦電流が発生する。渦電流による電気エネルギの損失は、第1のコイル11の見かけ上の高周波抵抗Rを増大させ、Q値を低下させる。したがって、Q値の変化は、第2の測定対象導電体3及び第1の測定対象導電体2の位置に依存する。また、第1のコイル11の見かけ上の自己インダクタンス、高周波抵抗、又はインピーダンス等の特性の変化、あるいはそれらに相関するLC発振回路の発振の変化、LC発振回路を流れる電流の変化も、第2の測定対象導電体3及び第1の測定対象導電体2の位置に依存する。第2のコイル12についても同様である。   Along with the oscillation of the LC oscillation circuit, a high-frequency AC magnetic field is formed from the first coil 11 toward the second measurement target conductor 3 and the first measurement target conductor 2, and the second measurement target conductor 3. And an eddy current generate | occur | produces in each of the 1st conductor 2 to be measured. The loss of electrical energy due to the eddy current increases the apparent high frequency resistance R of the first coil 11 and decreases the Q value. Accordingly, the change in the Q value depends on the positions of the second measurement target conductor 3 and the first measurement target conductor 2. In addition, changes in characteristics such as apparent self-inductance, high-frequency resistance, or impedance of the first coil 11, changes in the oscillation of the LC oscillation circuit, and changes in the current flowing in the LC oscillation circuit are also related to the second. This depends on the positions of the measurement object conductor 3 and the first measurement object conductor 2. The same applies to the second coil 12.

ここでは、磁界放射器1は、例として、第1のコイル11から第1の周波数として100kHzの第1の磁界を第2の測定対象導電体3及び第1の測定対象導電体2に照射し、第1のコイル11のQ値の測定値を関係算出部301に送信する。また、磁界放射器1は、例として、第2のコイル12から第2の周波数として500kHzの第2の磁界を第2の測定対象導電体3及び第1の測定対象導電体2に照射し、第2のコイル12のQ値の測定値を関係算出部301に送信する。   Here, for example, the magnetic field radiator 1 irradiates the second measuring object conductor 3 and the first measuring object conductor 2 with a first magnetic field of 100 kHz as the first frequency from the first coil 11. The measured value of the Q value of the first coil 11 is transmitted to the relationship calculation unit 301. Further, as an example, the magnetic field radiator 1 irradiates the second measurement target conductor 3 and the first measurement target conductor 2 with a second magnetic field of 500 kHz as the second frequency from the second coil 12, The measurement value of the Q value of the second coil 12 is transmitted to the relationship calculation unit 301.

関係記憶装置401に保存されている図2に示すような第1の関係を取得する際には、例えば、第1の測定対象導電体2と大きさ及び材料がほぼ等しい第1の導電体と、第2の測定対象導電体3と大きさ及び材料がほぼ等しい第2の導電体と、が用意される。次に、第1の導電体と、第1の導電体の手前に配置された第2の導電体と、の間隔Mを例えば25μm、50μm、75μm、100μmにしたそれぞれの場合について、図1に示す第1のコイル11と第1の導電体との間の距離Dを変えながら、第1のコイル11から100kHzの第1の磁界を放射して、第1のコイル11のQ値を測定する。これにより、図2に示すような、第1のコイル11のQ値と、磁界放射器1及び第1の導電体の間の距離Dと、第1及び第2の導電体の間隔Mと、の第1の関係が得られる。   When acquiring the first relationship as shown in FIG. 2 stored in the relationship storage device 401, for example, the first conductor to be measured is substantially equal in size and material to the first conductor 2 to be measured. A second conductor having the same size and material as the second measurement target conductor 3 is prepared. Next, in each case where the distance M between the first conductor and the second conductor disposed in front of the first conductor is, for example, 25 μm, 50 μm, 75 μm, and 100 μm, FIG. A first magnetic field of 100 kHz is radiated from the first coil 11 while changing the distance D between the first coil 11 and the first conductor shown, and the Q value of the first coil 11 is measured. . Thereby, as shown in FIG. 2, the Q value of the first coil 11, the distance D between the magnetic field radiator 1 and the first conductor, the distance M between the first and second conductors, The first relationship is obtained.

図1に示す関係記憶装置401に保存されている図3に示すような第2の関係を取得する際にも、例えば、第1の測定対象導電体2と大きさ及び材料がほぼ等しい第1の導電体と、第2の測定対象導電体3と大きさ及び材料がほぼ等しい第2の導電体と、が用意される。次に、第1の導電体と、第2の導電体と、の間隔Mを例えば25μm、50μm、75μm、100μmにしたそれぞれの場合について、図1に示す第2のコイル12と第1の導電体との間の距離Dを変えながら、第2のコイル12から500kHzの第2の磁界を放射して、第2のコイル12のQ値を測定する。これにより、図3に示すような、第2のコイル12のQ値と、磁界放射器1及び第1の導電体の間の距離Dと、第1及び第2の導電体の間隔Mと、の第2の関係が得られる。なお、第1の関係と、第2の関係と、は、図1に示す入力装置312から関係記憶装置401に入力してもよい。   When acquiring the second relationship as shown in FIG. 3 stored in the relationship storage device 401 shown in FIG. 1, for example, a first that is substantially the same in size and material as the first measurement target conductor 2. And a second conductor having substantially the same size and material as the second measuring object conductor 3 are prepared. Next, in each case where the distance M between the first conductor and the second conductor is, for example, 25 μm, 50 μm, 75 μm, and 100 μm, the second coil 12 and the first conductor shown in FIG. A second magnetic field of 500 kHz is emitted from the second coil 12 while changing the distance D between the body and the Q value of the second coil 12 is measured. Thereby, as shown in FIG. 3, the Q value of the second coil 12, the distance D between the magnetic field radiator 1 and the first conductor, the distance M between the first and second conductors, The second relationship is obtained. Note that the first relationship and the second relationship may be input to the relationship storage device 401 from the input device 312 illustrated in FIG.

関係算出部301は、磁界放射器1から第1のコイル11のQ値の測定値を受信する。また、関係算出部301は、関係記憶装置401から、図2に示す第1の関係を読み出す。100kHzの第1の磁界を第2の測定対象導電体3及び第1の測定対象導電体2に照射した場合の、第1のコイル11のQ値の測定値が51.8であった場合、関係算出部301は、Q値51.8における図2に示す第1の関係から、図4に示すような磁界放射器1及び第1の導電体の間の距離Dと、第1及び第2の導電体の間隔Mと、の第3の関係を算出する。   The relationship calculation unit 301 receives the measured value of the Q value of the first coil 11 from the magnetic field radiator 1. In addition, the relationship calculation unit 301 reads the first relationship illustrated in FIG. 2 from the relationship storage device 401. When the measured value of the Q value of the first coil 11 is 51.8 when the second magnetic field to be measured 3 and the first electrical conductor to be measured 2 are irradiated with the first magnetic field of 100 kHz, The relationship calculation unit 301 calculates the distance D between the magnetic field radiator 1 and the first conductor as shown in FIG. 4 from the first relationship shown in FIG. The third relationship between the distance M between the conductors is calculated.

さらに関係算出部301は、磁界放射器1から第2のコイル12のQ値の測定値を受信する。また、関係算出部301は、関係記憶装置401から、図3に示す第2の関係を読み出す。500kHzの第2の磁界を図1に示す第2の測定対象導電体3及び第1の測定対象導電体2に照射した場合の、第2のコイル12のQ値の測定値が113.5であった場合、関係算出部301は、Q値113.5における図3に示す第2の関係から、図5に示すような磁界放射器1及び第1の導電体の間の距離Dと、第1及び第2の導電体の間隔Mと、の第4の関係を算出する。   Further, the relationship calculation unit 301 receives the measured value of the Q value of the second coil 12 from the magnetic field radiator 1. Further, the relationship calculation unit 301 reads the second relationship illustrated in FIG. 3 from the relationship storage device 401. The measured value of the Q value of the second coil 12 when the second magnetic field 3 and the first electric conductor 2 shown in FIG. 1 are irradiated with the second magnetic field of 500 kHz is 113.5. If there is, the relationship calculation unit 301 calculates the distance D between the magnetic field radiator 1 and the first conductor as shown in FIG. 5 from the second relationship shown in FIG. A fourth relationship between the distance M between the first and second conductors is calculated.

図1に示す特定部303は、図6に示すように、第3の関係を与える関数と、第4の関係を与える関数と、の交点における磁界放射器1及び第1の導電体の間の距離Dの値と、第1及び第2の導電体の間隔Mの値と、を特定する。特定された磁界放射器1及び第1の導電体の間の距離Dの値が、図1に示す磁界放射器1から第1の測定対象導電体2までの距離Dの測定値となる。また、特定された第1及び第2の導電体の間隔Mの値が、第1の測定対象導電体2と、第2の測定対象導電体3と、の間隔Mの測定値となる。特定部303は、磁界放射器1から第1の測定対象導電体2までの距離Dの測定値と、第1の測定対象導電体2及び第2の測定対象導電体3の間隔Mの測定値と、を、例えば出力装置313に出力させる。   As illustrated in FIG. 6, the specifying unit 303 illustrated in FIG. 1 is provided between the magnetic field radiator 1 and the first conductor at the intersection of the function that provides the third relationship and the function that provides the fourth relationship. The value of the distance D and the value of the distance M between the first and second conductors are specified. The specified value of the distance D between the magnetic field radiator 1 and the first conductor is a measured value of the distance D from the magnetic field radiator 1 to the first measurement target conductor 2 shown in FIG. Further, the value of the specified distance M between the first and second conductors becomes the measured value of the distance M between the first measurement target conductor 2 and the second measurement target conductor 3. The specifying unit 303 includes a measurement value of the distance D from the magnetic field radiator 1 to the first measurement target conductor 2 and a measurement value of the interval M between the first measurement target conductor 2 and the second measurement target conductor 3. Are output to the output device 313, for example.

なお、図4に示した第3の関係を与える関数の傾きと、図5に示した第4の関係を与える関数の傾きと、が近似すると、磁界放射器1及び第1の導電体の間の距離Dの値と、第1及び第2の導電体の間隔Mの値と、を特定する際に誤差が生じうる。そのため、第3の関係を与える関数の傾きと、第4の関係を与える関数の傾きと、の差が所定の大きさ以上になるよう、第1の磁界の第1の周波数と、第2の磁界の第2の周波数と、を設定してもよい。   When the slope of the function giving the third relation shown in FIG. 4 and the slope of the function giving the fourth relation shown in FIG. 5 are approximated, the magnetic field radiator 1 and the first conductor are An error may occur when specifying the value of the distance D and the value of the distance M between the first and second conductors. Therefore, the first frequency of the first magnetic field and the second frequency are set so that the difference between the slope of the function that gives the third relationship and the slope of the function that gives the fourth relationship is greater than or equal to a predetermined magnitude. A second frequency of the magnetic field may be set.

以上示したように、実施の形態に係る導電体センサによれば、図1に示す第1の測定対象導電体2の位置と、第2の測定対象導電体3の位置と、を同時に測定することが可能となる。さらに、実施の形態に係る導電体センサによれば、第1の測定対象導電体2の存在が、第2の測定対象導電体3の位置の測定値に誤差を与えない。また、第2の測定対象導電体3の存在が、第1の測定対象導電体2の位置の測定値に誤差を与えない。したがって、実施の形態に係る導電体センサによれば、第1の測定対象導電体2の位置と、第2の測定対象導電体3の位置と、をリアルタイムかつ高精度に測定することが可能となる。   As described above, according to the conductor sensor according to the embodiment, the position of the first measurement target conductor 2 and the position of the second measurement target conductor 3 shown in FIG. 1 are simultaneously measured. It becomes possible. Furthermore, according to the conductor sensor according to the embodiment, the presence of the first measurement target conductor 2 does not give an error to the measured value of the position of the second measurement target conductor 3. Further, the presence of the second measurement target conductor 3 does not give an error to the measured value of the position of the first measurement target conductor 2. Therefore, according to the conductor sensor according to the embodiment, the position of the first measurement target conductor 2 and the position of the second measurement target conductor 3 can be measured in real time and with high accuracy. Become.

(その他の実施の形態)
上記のように、本発明を実施の形態によって記載したが、この開示の一部をなす記述及び図面はこの発明を限定するものであると理解するべきではない。この開示から当業者には様々な代替実施の形態、実施の形態及び運用技術が明らかになるはずである。例えば、実施の形態では、第2の測定対象導電体3の位置とは、第1の測定対象導電体2の表面から第2の測定対象導電体3の裏面までの距離Mであると説明したが、第2の測定対象導電体3の位置とは、第1の測定対象導電体2の表面から第2の測定対象導電体3の表面までの距離であってもよい。あるいは、第2の測定対象導電体3の位置とは、磁界放射器1から第2の測定対象導電体3までの距離で表されてもよい。
(Other embodiments)
As mentioned above, although this invention was described by embodiment, it should not be understood that the description and drawing which form a part of this indication limit this invention. From this disclosure, various alternative embodiments, embodiments, and operation techniques should be apparent to those skilled in the art. For example, in the embodiment, it has been described that the position of the second measurement target conductor 3 is the distance M from the surface of the first measurement target conductor 2 to the back surface of the second measurement target conductor 3. However, the position of the second measurement target conductor 3 may be a distance from the surface of the first measurement target conductor 2 to the surface of the second measurement target conductor 3. Alternatively, the position of the second measurement target conductor 3 may be represented by a distance from the magnetic field radiator 1 to the second measurement target conductor 3.

また、実施の形態では、磁界放射器1が第1のコイル11と、第2のコイル12と、を有する例を示したが、図7に示すように、磁界放射器1は、単一のコイル13のみを有していてもよい。この場合、単一のコイル13は、所定時間毎又は所定波数毎に、第1の磁界と、第2の磁界と、を交互に放射すればよい。あるいは、単一のコイル13は、第1の周波数を有する第1の磁界と、第2の周波数を有する第2の磁界と、を重ね合わせた磁界を放射してもよい。この場合、単一のコイル13のQ値又はインピーダンス等の特性は、第1の周波数に関する特性と、第2の周波数に関する特性と、に分割されて利用される。この様に、本発明はここでは記載していない様々な実施の形態等を包含するということを理解すべきである。   Moreover, in embodiment, although the magnetic field radiator 1 showed the example which has the 1st coil 11 and the 2nd coil 12, as shown in FIG. Only the coil 13 may be included. In this case, the single coil 13 may radiate the first magnetic field and the second magnetic field alternately every predetermined time or every predetermined wave number. Alternatively, the single coil 13 may emit a magnetic field obtained by superimposing a first magnetic field having a first frequency and a second magnetic field having a second frequency. In this case, the characteristic such as the Q value or impedance of the single coil 13 is divided into a characteristic relating to the first frequency and a characteristic relating to the second frequency. Thus, it should be understood that the present invention includes various embodiments and the like not described herein.

1 磁界放射器
2 第1の測定対象導電体
3 第2の測定対象導電体
11 第1のコイル
12 第2のコイル
13 コイル
300 CPU
301 関係算出部
303 特定部
312 入力装置
313 出力装置
401 関係記憶装置
DESCRIPTION OF SYMBOLS 1 Magnetic field radiator 2 1st measuring object conductor 3 2nd measuring object conductor 11 1st coil 12 2nd coil 13 Coil 300 CPU
301 Relationship Calculation Unit 303 Identification Unit 312 Input Device 313 Output Device 401 Relationship Storage Device

Claims (14)

周波数が異なる第1及び第2の磁界を放射する磁界放射器と、
第1の導電体、及び前記第1の導電体の手前に配置された第2の導電体に前記磁界放射器を用いて前記第1の磁界を照射した場合の、前記磁界放射器の特性、前記第1及び第2の導電体の位置の第1の関係と、前記第1及び第2の導電体に前記磁界放射器を用いて前記第2の磁界を照射した場合の、前記磁界放射器の特性、前記第1及び第2の導電体の位置の第2の関係と、を保存する関係記憶装置と、
第1の測定対象導電体、及び前記第1の測定対象導電体の手前に配置された第2の測定対象導電体に前記第1の磁界を照射した場合の前記磁界放射器の特性及び前記第1の関係に基づき、前記第1及び第2の導電体の位置の第3の関係を算出し、前記第1及び第2の測定対象導電体に前記第2の磁界を照射した場合の前記磁界放射器の特性及び前記第2の関係に基づき、前記第1及び第2の導電体の位置の第4の関係を算出する関係算出部と、
前記第3の関係及び前記第4の関係に共通する、前記第1及び第2の導電体の位置の組み合わせを特定する特定部と、
を備え、
前記第1及び第2の導電体の位置は、前記磁界放射器に対する前記第1及び第2の導電体の相対位置である、
導電体センサ。
A magnetic field radiator that radiates first and second magnetic fields having different frequencies;
Characteristics of the magnetic field radiator when the first magnetic field is applied to the first conductor and the second conductor disposed in front of the first conductor by using the magnetic field radiator; The first relationship between the positions of the first and second conductors and the magnetic field radiator when the first and second conductors are irradiated with the second magnetic field using the magnetic field radiator. A relation storage device for storing the characteristics of the first relation and the second relation of the positions of the first and second conductors;
Characteristics of the magnetic field radiator when the first magnetic field is applied to the first measurement target conductor and the second measurement target conductor disposed in front of the first measurement target conductor, and the first Based on the relationship of 1, the third relationship between the positions of the first and second conductors is calculated, and the magnetic field when the first and second measurement target conductors are irradiated with the second magnetic field. A relationship calculating unit that calculates a fourth relationship of the positions of the first and second conductors based on a characteristic of the radiator and the second relationship;
A specifying unit for specifying a combination of positions of the first and second conductors common to the third relationship and the fourth relationship;
With
The positions of the first and second conductors are relative positions of the first and second conductors with respect to the magnetic field radiator.
Conductor sensor.
周波数が異なる第1及び第2の磁界を放射する磁界放射器と、  A magnetic field radiator that radiates first and second magnetic fields having different frequencies;
第1の導電体、及び前記第1の導電体の手前に配置された第2の導電体に前記磁界放射器を用いて前記第1の磁界を照射した場合の、前記磁界放射器の特性、前記第1及び第2の導電体の位置の第1の関係と、前記第1及び第2の導電体に前記磁界放射器を用いて前記第2の磁界を照射した場合の、前記磁界放射器の特性、前記第1及び第2の導電体の位置の第2の関係と、を保存する関係記憶装置と、  Characteristics of the magnetic field radiator when the first magnetic field is applied to the first conductor and the second conductor disposed in front of the first conductor by using the magnetic field radiator; The first relationship between the positions of the first and second conductors and the magnetic field radiator when the first and second conductors are irradiated with the second magnetic field using the magnetic field radiator. A relation storage device for storing the characteristics of the first relation and the second relation of the positions of the first and second conductors;
第1の測定対象導電体、及び前記第1の測定対象導電体の手前に配置された第2の測定対象導電体に前記第1の磁界を照射した場合の前記磁界放射器の特性及び前記第1の関係に基づき、前記第1及び第2の導電体の位置の第3の関係を算出し、前記第1及び第2の測定対象導電体に前記第2の磁界を照射した場合の前記磁界放射器の特性及び前記第2の関係に基づき、前記第1及び第2の導電体の位置の第4の関係を算出する関係算出部と、  Characteristics of the magnetic field radiator when the first magnetic field is applied to the first measurement target conductor and the second measurement target conductor disposed in front of the first measurement target conductor, and the first Based on the relationship of 1, the third relationship between the positions of the first and second conductors is calculated, and the magnetic field when the first and second measurement target conductors are irradiated with the second magnetic field. A relationship calculating unit that calculates a fourth relationship of the positions of the first and second conductors based on a characteristic of the radiator and the second relationship;
前記第3の関係及び前記第4の関係に共通する、前記第1及び第2の導電体の位置の組み合わせを特定する特定部と、  A specifying unit for specifying a combination of positions of the first and second conductors common to the third relationship and the fourth relationship;
を備え、  With
前記第1の導電体の位置は、前記磁界放射器に対する前記第1の導電体の相対位置であり、  The position of the first conductor is a relative position of the first conductor with respect to the magnetic field radiator;
前記第2の導電体の位置は、前記第1の導電体に対する前記第2の導電体の相対位置である、  The position of the second conductor is a relative position of the second conductor with respect to the first conductor.
導電体センサ。  Conductor sensor.
前記磁界放射器が、前記第1の磁界を放射する第1のコイルと、前記第2の磁界を放射する第2のコイルと、を備える、請求項1又は2に記載の導電体センサ。 The conductor sensor according to claim 1 or 2 , wherein the magnetic field radiator includes a first coil that radiates the first magnetic field and a second coil that radiates the second magnetic field. 前記磁界放射器が、異なる時間に、前記第1の磁界と、前記第2の磁界と、を放射するコイルを備える、請求項1又は2に記載の導電体センサ。 Wherein the magnetic field radiators, at different times, the first and the magnetic field comprises a coil for radiating a second magnetic field, the conductor sensor according to claim 1 or 2. 前記磁界放射器が、前記第1の磁界と、前記第1の磁界に重ね合わされた前記第2の磁界と、を放射するコイルを備える、請求項1又は2に記載の導電体センサ。 Wherein the magnetic field radiators, the first and the magnetic field comprises a coil for radiating a second magnetic field superimposed on the first magnetic field, the conductor sensor according to claim 1 or 2. 前記磁界放射器がLC発振回路を構成するコイルを備え、前記磁界放射器の特性が、前記LC発振回路の発振振幅である、請求項1又は2に記載の導電体センサ。 A coil of the magnetic field radiators constitutes an LC oscillator circuit, characteristics of the field emitter is the oscillation amplitude of the LC oscillator circuit, conductor sensor according to claim 1 or 2. 前記磁界放射器の特性が、インピーダンス、インダクタンス、抵抗又はクオリティファクタである、請求項1乃至のいずれか1項に記載の導電体センサ。 The conductor sensor according to any one of claims 1 to 5 , wherein the characteristic of the magnetic field radiator is impedance, inductance, resistance, or quality factor. 第1の導電体、及び前記第1の導電体の手前に配置された第2の導電体に磁界放射器を用いて第1の磁界を照射した場合の、前記磁界放射器の特性、前記第1及び第2の導電体の位置の第1の関係を用意することと、
前記第1及び第2の導電体に前記磁界放射器を用いて前記第1の磁界とは周波数が異なる第2の磁界を照射した場合の、前記磁界放射器の特性、前記第1及び第2の導電体の位置の第2の関係を用意することと、
第1の測定対象導電体、及び前記第1の測定対象導電体の手前に配置された第2の測定対象導電体に前記第1の磁界を照射したときの前記磁界放射器の特性及び前記第1の関係に基づき、前記第1及び第2の導電体の位置の第3の関係を算出することと、
前記第1及び第2の測定対象導電体に前記第2の磁界を照射したときの前記磁界放射器の特性及び前記第2の関係に基づき、前記第1及び第2の導電体の位置の第4の関係を算出することと、
前記第3の関係及び前記第4の関係に共通する、前記第1及び第2の導電体の位置の組み合わせを特定することと、
を含
前記第1及び第2の導電体の位置は、前記磁界放射器に対する前記第1及び第2の導電体の相対位置である、
導電体の検出方法。
Characteristics of the magnetic field radiator when the first magnetic field is applied to the first conductive material and the second conductive material disposed in front of the first conductive material using the magnetic field radiator; Providing a first relationship between positions of the first and second conductors;
Characteristics of the magnetic field radiator when the first and second conductors are irradiated with a second magnetic field having a frequency different from that of the first magnetic field using the magnetic field radiator; Providing a second relationship of the positions of the conductors;
Characteristics of the magnetic field radiator when the first magnetic field is applied to the first measuring object conductor and the second measuring object conductor arranged in front of the first measuring object conductor, and the first Calculating a third relationship of the positions of the first and second conductors based on the relationship of 1;
Based on the characteristics of the magnetic field radiator and the second relationship when the first and second conductors to be measured are irradiated with the second magnetic field, the positions of the first and second conductors are changed. Calculating the relationship of 4;
Identifying a combination of positions of the first and second conductors common to the third relationship and the fourth relationship;
Only including,
The positions of the first and second conductors are relative positions of the first and second conductors with respect to the magnetic field radiator.
Conductor detection method.
第1の導電体、及び前記第1の導電体の手前に配置された第2の導電体に磁界放射器を用いて第1の磁界を照射した場合の、前記磁界放射器の特性、前記第1及び第2の導電体の位置の第1の関係を用意することと、  Characteristics of the magnetic field radiator when the first magnetic field is applied to the first conductive material and the second conductive material disposed in front of the first conductive material using the magnetic field radiator; Providing a first relationship between positions of the first and second conductors;
前記第1及び第2の導電体に前記磁界放射器を用いて前記第1の磁界とは周波数が異なる第2の磁界を照射した場合の、前記磁界放射器の特性、前記第1及び第2の導電体の位置の第2の関係を用意することと、  Characteristics of the magnetic field radiator when the first and second conductors are irradiated with a second magnetic field having a frequency different from that of the first magnetic field using the magnetic field radiator; Providing a second relationship of the positions of the conductors;
第1の測定対象導電体、及び前記第1の測定対象導電体の手前に配置された第2の測定対象導電体に前記第1の磁界を照射したときの前記磁界放射器の特性及び前記第1の関係に基づき、前記第1及び第2の導電体の位置の第3の関係を算出することと、  Characteristics of the magnetic field radiator when the first magnetic field is applied to the first measuring object conductor and the second measuring object conductor arranged in front of the first measuring object conductor, and the first Calculating a third relationship of the positions of the first and second conductors based on the relationship of 1;
前記第1及び第2の測定対象導電体に前記第2の磁界を照射したときの前記磁界放射器の特性及び前記第2の関係に基づき、前記第1及び第2の導電体の位置の第4の関係を算出することと、  Based on the characteristics of the magnetic field radiator and the second relationship when the first and second conductors to be measured are irradiated with the second magnetic field, the positions of the first and second conductors are changed. Calculating the relationship of 4;
前記第3の関係及び前記第4の関係に共通する、前記第1及び第2の導電体の位置の組み合わせを特定することと、  Identifying a combination of positions of the first and second conductors common to the third relationship and the fourth relationship;
を含み、  Including
前記第1の導電体の位置は、前記磁界放射器に対する前記第1の導電体の相対位置であり、  The position of the first conductor is a relative position of the first conductor with respect to the magnetic field radiator;
前記第2の導電体の位置は、前記第1の導電体に対する前記第2の導電体の相対位置である、  The position of the second conductor is a relative position of the second conductor with respect to the first conductor.
導電体の検出方法。  Conductor detection method.
前記磁界放射器が、前記第1の磁界を放射する第1のコイルと、前記第2の磁界を放射する第2のコイルと、を備える、請求項8又は9に記載の導電体の検出方法。 The method for detecting a conductor according to claim 8 or 9, wherein the magnetic field radiator includes a first coil that radiates the first magnetic field and a second coil that radiates the second magnetic field. . 前記磁界放射器が、異なる時間に、前記第1の磁界と、前記第2の磁界と、を放射するコイルを備える、請求項8又は9に記載の導電体の検出方法。 The method for detecting a conductor according to claim 8 or 9, wherein the magnetic field radiator includes a coil that radiates the first magnetic field and the second magnetic field at different times. 前記磁界放射器が、前記第1の磁界と、前記第1の磁界に重ね合わされた前記第2の磁界と、を放射するコイルを備える、請求項8又は9に記載の導電体の検出方法。 The method for detecting a conductor according to claim 8 or 9, wherein the magnetic field radiator includes a coil that radiates the first magnetic field and the second magnetic field superimposed on the first magnetic field. 前記磁界放射器がLC発振回路を構成するコイルを備え、前記磁界放射器の特性が、前記LC発振回路の発振振幅である、請求項8又は9に記載の導電体の検出方法。 The method for detecting a conductor according to claim 8 or 9, wherein the magnetic field radiator includes a coil constituting an LC oscillation circuit, and the characteristic of the magnetic field radiator is an oscillation amplitude of the LC oscillation circuit. 前記磁界放射器の特性が、インピーダンス、インダクタンス、抵抗又はクオリティファクタである、請求項乃至12のいずれか1項に記載の導電体の検出方法。 The characteristics of the magnetic field radiators, impedance, inductance, a resistance, or quality factor, the detection method of the conductive member according to any one of claims 8 to 12.
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