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JP5736624B2 - CO shift catalyst - Google Patents
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JP5736624B2 - CO shift catalyst - Google Patents

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JP5736624B2
JP5736624B2 JP2011019377A JP2011019377A JP5736624B2 JP 5736624 B2 JP5736624 B2 JP 5736624B2 JP 2011019377 A JP2011019377 A JP 2011019377A JP 2011019377 A JP2011019377 A JP 2011019377A JP 5736624 B2 JP5736624 B2 JP 5736624B2
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micro
catalyst
ion beam
shift catalyst
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JP2012157825A (en
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俊一郎 田中
俊一郎 田中
美帆 生天目
美帆 生天目
森川 彰
彰 森川
須田 明彦
明彦 須田
新庄 博文
博文 新庄
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Tohoku University NUC
Toyota Central R&D Labs Inc
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Toyota Central R&D Labs Inc
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/52Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts

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Description

本発明は、合成ガス中などに存在するCOをCOに転化するためのCOシフト触媒に関する。 The present invention relates to a CO shift catalyst for converting CO present in synthesis gas or the like into CO 2 .

工業的操業においては、下記の式1によって示される水性ガスシフト反応がCOをCOに転化するために使用される。 In industrial operation, the water gas shift reaction is used to convert CO to CO 2 which is represented by Formula 1 below.

CO+HO→CO+H H=-9.84 Kcal/mol at 298°K (式1) CO + H 2 O → CO 2 + H 2 H = −9.84 Kcal / mol at 298 ° K (Formula 1)

COシフト触媒として、特許文献1には、Cu及びZnの硝酸塩溶液から共沈法にて作成した触媒粉末をペレット状に作成し、テフロン(登録商標)ディスパージョン液に含浸・乾燥しテフロン(登録商標)をペレット表面に付着させることを特徴とするシフト触媒の調整法と調整された触媒が開示されている。   As a CO shift catalyst, Patent Document 1 discloses that a catalyst powder prepared by a coprecipitation method from a nitrate solution of Cu and Zn is formed into pellets, impregnated in a Teflon (registered trademark) dispersion, dried, and then Teflon (registered). (Trademark) is attached to the pellet surface, and a method for preparing a shift catalyst and a prepared catalyst are disclosed.

また、特許文献2には、約5〜約70重量%の酸化銅、約20〜約50%の酸化亜鉛、約5〜約50重量%の酸化アルミニウムを含み、銅表面積が少なくとも約22m2/gであることを特徴とする低温水性ガスシフト触媒が開示されている。 Patent Document 2 includes about 5 to about 70% by weight copper oxide, about 20 to about 50% zinc oxide, about 5 to about 50% by weight aluminum oxide, and has a copper surface area of at least about 22 m 2 / A low temperature water gas shift catalyst characterized by g is disclosed.

上記開示に係る発明においては、触媒自体は粉末状のものであって、耐熱性に乏しく、かつ使用部位が限定される。例えば、メタノール改質触媒が配置された反応チャンバー内では、晒される温度が高すぎるため改質触媒と共存配置することができない。また、改質触媒を備えた反応部から改質ガスを輸送する際輸送管内にシフト触媒が配置され、COを除去できればシステムがコンパクトとなるが、通常配管の内径は細すぎるため、粉末触媒をウォッシュコートできたとしても目詰まりを起こす可能性が高く、改質触媒反応部とは別にシフト触媒を設置するための反応部を設置しなければならないという問題があった。   In the invention according to the above disclosure, the catalyst itself is in the form of a powder, has poor heat resistance, and the use site is limited. For example, in the reaction chamber in which the methanol reforming catalyst is disposed, the exposed temperature is too high, so that it cannot coexist with the reforming catalyst. In addition, when the reformed gas is transported from the reaction section equipped with the reforming catalyst, the shift catalyst is arranged in the transport pipe, and if the CO can be removed, the system becomes compact. Even if the wash coat can be carried out, there is a high possibility of clogging, and there is a problem that a reaction part for installing the shift catalyst must be provided separately from the reforming catalyst reaction part.

特開2004−089813号公報JP 2004-089813 A 特表2005−520689号公報JP 2005-52089A

本発明は、合金系触媒にして、従来の粉末状のCOシフト触媒では使用できなかった部位に使用することができるCOシフト触媒を提供することを課題とする。   An object of the present invention is to provide a CO shift catalyst that can be used as an alloy-based catalyst at a site that cannot be used with a conventional powdery CO shift catalyst.

上記の課題を解決するためになされた本発明のCOシフト触媒は、Cu−Znからなるナノ・マイクロ突起が成長・形成されている板状合金を用いたことを特徴とするものである。   The CO shift catalyst of the present invention made to solve the above-mentioned problems is characterized by using a plate-like alloy on which nano / micro protrusions made of Cu-Zn are grown and formed.

上記した発明において、Cu−Znからなるナノ・マイクロ突起は、その形状が円錐体、円柱を含む横断面丸形または角錐台のものであり、3μm以下の底面外径に対する長さの比であるアスペクト比が5以上であることを特徴とする。   In the above-described invention, the nano / micro protrusions made of Cu-Zn have a conical shape, a round cross section including a circular column or a truncated pyramid, and a ratio of the length to the bottom outer diameter of 3 μm or less. The aspect ratio is 5 or more.

削除   Delete

従来の触媒は、Cu−ZnO系またはCu−ZnO−Al系が中心であり、いずれれの場合も粉末状の触媒をペレットに成型、あるいはコージェライトハニカム等の基材にウォッシュコートして用いられている。しかしながら、Cu−ZnO自体の耐熱性は必ずしも高くないため、その使用部位は限定されていた。本発明においては、Arイオン照射処理によって板状合金表面に活性種を作り出すことにより、従来の粉末状触媒に比べて耐熱性に優れ形状自由性を持ちかつ使用範囲が広範なCOシフト触媒を作り出すことができた。応用の一例として、高温を必要とする燃料改質容器の内壁にこの板状合金を用いた触媒をライニングすることで、改質触媒によって生成した合成ガスから即座にCOシフト反応を起こすことが可能になり、システムの小型化が可能となる。 Conventional catalysts are Cu-ZnO-based or Cu-ZnO-Al 2 O 3 system centered, one Re powdery catalyst in the case of molding into pellets, or wash-coated on a substrate such as cordierite honeycomb It is used. However, since the heat resistance of Cu—ZnO itself is not necessarily high, its use site has been limited. In the present invention, by generating active species on the surface of the plate-like alloy by Ar ion irradiation treatment, a CO shift catalyst having excellent heat resistance and a wide shape of use compared to conventional powder catalysts is produced. I was able to. As an example of application, by lining a catalyst using this plate-like alloy on the inner wall of a fuel reforming vessel that requires high temperature, it is possible to cause a CO shift reaction immediately from the synthesis gas produced by the reforming catalyst. Thus, the system can be miniaturized.

Arイオンビーム非処理品の表面を示すSEM写真である。It is a SEM photograph which shows the surface of an Ar ion beam non-processed goods. Arイオンビーム10分処理品の表面に形成されたナノ・マイクロ突起を示すSEM写真である。It is a SEM photograph which shows the nano * micro processus | protrusion formed in the surface of the Ar ion beam 10 minute processed goods. Arイオンビーム30分処理品の表面に形成されたナノ・マイクロ突起を示すSEM写真である。It is a SEM photograph which shows the nano-micro processus | protrusion formed in the surface of the Ar ion beam 30 minute processed goods. Arイオンビーム70分処理品の表面に形成されたナノ・マイクロ突起を示すSEM写真である。It is a SEM photograph which shows the nano-micro processus | protrusion formed in the surface of the Ar ion beam 70 minute processed goods. 照射時間によるナノ・マイクロ突起の体積の変化を示すグラフである。It is a graph which shows the change of the volume of a nano-micro processus by irradiation time. Johnson-Mehl-Avramiプロットを示すグラフである。It is a graph which shows a Johnson-Mehl-Avrami plot. Arイオンビーム20分処理品の表面に形成されたナノ・マイクロ突起を示すSEM写真である。It is a SEM photograph which shows the nano * micro processus | protrusion formed in the surface of the Ar ion beam 20 minute processed goods. Arイオンビーム40分処理品の表面に形成されたナノ・マイクロ突起を示すSEM写真である。It is a SEM photograph which shows the nano * micro processus | protrusion formed in the surface of the Ar ion beam 40 minute processed goods. 反応容器と試料の充填状態を示す概念図である。It is a conceptual diagram which shows the reaction container and the filling state of a sample. 反応装置の概略構成図である。It is a schematic block diagram of a reactor. 各処理品の転化率を比較して示すグラフである。It is a graph which compares and shows the conversion rate of each process goods.

以下に、本発明の実施の形態を詳細に説明する。   Hereinafter, embodiments of the present invention will be described in detail.

初めに、板状合金の表面にナノ・マイクロ突起を形成する方法について説明する。   First, a method for forming nano / micro protrusions on the surface of a plate-like alloy will be described.

本発明においては、板状のCu−Zn合金の表面に低真空下でArイオンビームを照射して、ナノ・マイクロ突起を形成する。まず、Cu−Zn合金からなる合金板を用意する。合金板としてはCu65%Zn35%の真鍮板を用いることができる。本発明においては合金板として、7:3黄銅、6:4黄銅を用いることができ、また、Zn濃度20〜80%のCu−Zn合金を用いることができる。また、合金板として鋳造材、熱間鍛造材、熱間圧延材を用いてもよいが、冷間圧延等の冷間加工を施して自己集合組織化して、塑性歪を蓄積させたものを用いるのが望ましい。塑性歪を開放させることによってナノ・マイクロ突起を迅速に成長させることができるからである。合金板は希塩酸等で酸洗して表面を活性化させておく。   In the present invention, the surface of the plate-like Cu—Zn alloy is irradiated with an Ar ion beam under a low vacuum to form nano / micro protrusions. First, an alloy plate made of a Cu—Zn alloy is prepared. As the alloy plate, a brass plate of Cu65% Zn35% can be used. In the present invention, 7: 3 brass or 6: 4 brass can be used as the alloy plate, and a Cu—Zn alloy having a Zn concentration of 20 to 80% can be used. Further, cast material, hot forged material, and hot rolled material may be used as the alloy plate, but a material that has undergone cold working such as cold rolling and self-assembled to accumulate plastic strain is used. Is desirable. This is because nano / micro protrusions can be rapidly grown by releasing the plastic strain. The alloy plate is pickled with diluted hydrochloric acid or the like to activate the surface.

次に、合金板に真空下でArイオンビームを照射して励起したCu原子、Zn原子の表面拡散で突起を成長させる。真空度は10−2〜10−3Pa程度のいわゆる低真空とする。10−2Paより真空度が低いとZnの酸化が進行してZnOとなってしまうからであり、10−3Paより真空度は高いとArイオンビームの照射が困難となるからである。 Next, protrusions are grown by surface diffusion of Cu atoms and Zn atoms excited by irradiating the alloy plate with an Ar ion beam under vacuum. The degree of vacuum is a so-called low vacuum of about 10 −2 to 10 −3 Pa. This is because if the degree of vacuum is lower than 10 −2 Pa, the oxidation of Zn proceeds to become ZnO, and if the degree of vacuum is higher than 10 −3 Pa, irradiation with an Ar ion beam becomes difficult.

さらに、Arイオンビームの照射角度を、板面に対して20〜90°とし、加速電圧は、2−20kVとするのが望ましい。照射角度が20°未満では、効率よくArイオンビームのエネルギーを供給するのが難しく、望ましい円錐状などのナノ・マイクロ突起が形成されないからであり、90°を上限としたのは、それを超えて照射を行う必要がないからである。また、加速電圧を2−20kVとするのは、高エネルギービームであるArイオンビームを照射する場合には、点欠陥などの照射欠陥や注入イオンが導入されにくい20kV以下の低電圧とするのが望ましく、一方2kV未満では電圧が弱すぎるからである。ぺニング型イオン源を用いた場合には、加速電圧5−10kV、照射角度20〜90°、照射時間10〜90分が望ましい。また、Arイオンビームの電流は、0.5〜1.5mAが望ましい。   Furthermore, it is desirable that the irradiation angle of the Ar ion beam is 20 to 90 ° with respect to the plate surface, and the acceleration voltage is 2 to 20 kV. If the irradiation angle is less than 20 °, it is difficult to efficiently supply the energy of the Ar ion beam, and desirable nano- and micro-projections such as conical shapes are not formed. This is because there is no need to perform irradiation. Further, the acceleration voltage is set to 2 to 20 kV when the Ar ion beam which is a high energy beam is irradiated, the irradiation voltage such as a point defect or a low voltage of 20 kV or less in which implanted ions are not easily introduced. On the other hand, if it is less than 2 kV, the voltage is too weak. When a Penning ion source is used, it is desirable that the acceleration voltage is 5 to 10 kV, the irradiation angle is 20 to 90 °, and the irradiation time is 10 to 90 minutes. The current of the Ar ion beam is preferably 0.5 to 1.5 mA.

なお、本発明において照射せしめられるビームは、Arイオンビームに限定されるものではなく、ナノ・マイクロ突起を成長させうる高エネルギービームであればよく、Arイオンビームのほかに電子線、レーザービーム、X線、γ線、中性子線、粒子ビーム等を用いることができる。   In addition, the beam irradiated in the present invention is not limited to the Ar ion beam, but may be any high energy beam capable of growing nano / micro protrusions. In addition to the Ar ion beam, an electron beam, a laser beam, X-rays, γ-rays, neutron beams, particle beams and the like can be used.

好適なナノ・マイクロ突起の形状は、ほぼ円錐体で横断面丸形であるが、円柱を含んでいてもよい。また、角錐台状であってもよい。ナノ・マイクロ突起は、その底面の3μm以下の直径dに対する突起高さhの比であるアスペクト比(=h/d)が5以上であるのが望ましい。アスペクト比を5以上とするのは、5未満では電子放出特性等において十分な効果を発揮できないからである。一方アスペクト比に上限を設けないのはこれがいくら大きくなっても利用するうえで支障がないからである。   A preferred nano / micro-projection shape is generally conical and round in cross section, but may include a cylinder. Further, it may have a truncated pyramid shape. The nano / micro protrusions preferably have an aspect ratio (= h / d) of 5 or more, which is the ratio of the protrusion height h to the diameter d of 3 μm or less on the bottom surface. The reason why the aspect ratio is 5 or more is that if it is less than 5, sufficient effects cannot be exhibited in the electron emission characteristics and the like. On the other hand, the upper limit of the aspect ratio is not set because there is no problem in using the aspect ratio no matter how large.

冷間圧延した真鍮板から幅2mm×長さ10mm×厚さ0.2mmの試料を切り出して基板を作成した。真鍮板は、fcc構造のα相とCsCl型のβ’相とからなる。この基板を1.6モルの塩酸水溶液にて酸洗した後、大気中で150℃に加熱した。その後直ちに真空室に挿入し、真空度10−3Paに保持するとともに、Arイオンビームを照射角度40°、加速電圧5kVまたは9kV、電流0.5mAの条件下で、10〜70分照射した。照射後に照射面のナノ・マイクロ突起と下地の形状を走査電子顕微鏡、Laser Scanning Microscopy(LSM)にて観察するとともに、組成と相をEPMA、Glancing Angle X-ray Diffraction(GAXRD)にて解析した。 A substrate having a width of 2 mm, a length of 10 mm and a thickness of 0.2 mm was cut out from a cold-rolled brass plate to prepare a substrate. The brass plate is composed of an α phase having an fcc structure and a β ′ phase having a CsCl type. The substrate was pickled with 1.6 molar aqueous hydrochloric acid and then heated to 150 ° C. in the atmosphere. Immediately after that, it was inserted into a vacuum chamber, kept at a vacuum degree of 10 −3 Pa, and irradiated with an Ar ion beam at an irradiation angle of 40 °, an acceleration voltage of 5 kV or 9 kV, and a current of 0.5 mA for 10 to 70 minutes. After irradiation, the nano / micro protrusions on the irradiated surface and the shape of the substrate were observed with a scanning electron microscope and Laser Scanning Microscopy (LSM), and the composition and phase were analyzed with EPMA and Glancing Angle X-ray Diffraction (GAXRD).

加速電圧9kV、照射時間0分、10分、30分、70分での真鍮板の表面の走査電子顕微鏡写真を図1〜4に示す。非処理品においては、当然ながら突起は成長していない。10分照射で再結晶して表面に隆起が現れた。その後30分、70分と照射時間が長くなるにつれて円錐体状のナノ・マイクロ突起が成長していくことが認められる。   Scanning electron micrographs of the surface of the brass plate at an acceleration voltage of 9 kV and irradiation times of 0 minutes, 10 minutes, 30 minutes, and 70 minutes are shown in FIGS. Of course, in the non-processed product, the protrusion does not grow. Recrystallization occurred after irradiation for 10 minutes, and bumps appeared on the surface. Thereafter, it is recognized that conical nano / micro protrusions grow as the irradiation time becomes longer, 30 minutes and 70 minutes.

図5に示すように、円錐体状のナノ・マイクロ突起について、ナノ・マイクロ突起の底面の直径X、高さh又はh’から突起体の体積を求めた。図5(a)は加速電圧5kV、図5(b)は加速電圧9kVにおける照射時間と突起体体積との関係を示すものであるが、いずれの場合においても、体積は時間とともに増加するが、その後ある時間で飽和した。   As shown in FIG. 5, for the conical nano / micro protrusion, the volume of the protrusion was determined from the diameter X, height h, or h ′ of the bottom surface of the nano / micro protrusion. FIG. 5A shows the relationship between the irradiation time and the protrusion volume at an acceleration voltage of 5 kV, and FIG. 5B shows the relationship between the irradiation time and the protrusion volume. In either case, the volume increases with time. After that, it was saturated for some time.

次に、Johnson-Mehl-Avrami方程式によって円錐体状突起の成長機構の推定をおこなった。Johnson-Mehl-Avrami方程式は、以下の式2、3である。
X=1−exp(−Btk) (式2)
lnln{1/(1−X)}=klnt+lnB (式3)
Next, the growth mechanism of conical projections was estimated by the Johnson-Mehl-Avrami equation. The Johnson-Mehl-Avrami equation is the following Equations 2 and 3.
X = 1−exp (−Btk) (Formula 2)
lnln {1 / (1-X)} = klnt + lnB (Formula 3)

上記した式2、3において、Xは体積分率、Tは時間、kはAvrami指数である。よって、klntとlnln{1/(1−X)}との関係からkを求めて成長機構を推定することができる。   In the above formulas 2 and 3, X is a volume fraction, T is time, and k is an Avrami index. Therefore, the growth mechanism can be estimated by obtaining k from the relationship between klnt and lnln {1 / (1-X)}.

図6(a)は、加速電圧5kVにおける上記関係を示すグラフであるが、kは約2.27であった。また、図6(b)は、加速電圧9kVにおける上記関係を示すグラフであるが、kは約1.81であった。両者のkの値が異なることから、ナノ・マイクロ突起の成長は拡散律速であるが、加速電圧で成長速度が異なる可能性がある。例えばk=1.5〜2.5では、核生成点が減少しながら拡散律速で成長していることが考えられる。   FIG. 6A is a graph showing the above relationship at an acceleration voltage of 5 kV, and k was about 2.27. FIG. 6B is a graph showing the above relationship at an acceleration voltage of 9 kV, and k was about 1.81. Since the values of k are different from each other, the growth of nano / micro protrusions is diffusion-controlled, but the growth rate may be different depending on the acceleration voltage. For example, when k = 1.5 to 2.5, it is considered that the nucleation point grows at a diffusion-controlled rate while decreasing.

EPMA分析において、ナノ・マイクロ突起にZnの濃化しているものが認められた。また、Znの濃度帯には、Zn35−40mass%のα相とZn45mass%のβ’相との2領域があることを確かめた。また、加速電圧9kVにおける下地部分では、照射時間の増加とともにZn濃度は増加傾向にあることが分かった。   In the EPMA analysis, it was recognized that Zn was concentrated on the nano / micro protrusions. Further, it was confirmed that there are two regions in the Zn concentration band, that is, a Zn35-40 mass% α phase and a Zn45 mass% β ′ phase. In addition, it was found that the Zn concentration tends to increase with increasing irradiation time in the base portion at the acceleration voltage of 9 kV.

図7、8に、加速電圧9kV、照射時間20分、40分処理品での走査電子顕微鏡写真を示す。図7に示すものは20分処理品であって、微量のZnを含むがCu主体の小さいナノ・マイクロ突起であり、その底面の直径は0.5〜1μm、アスペクト比は10〜20であった。また、図8に示すものは40分処理品であって、1μm程度の微小な多数のナノ・マイクロ突起のほかに、比較的大きなCu−Znからなるナノ・マイクロ突起が散見される。微小なナノ・マイクロ突起のアスペクト比は約10であった。   FIGS. 7 and 8 show scanning electron micrographs of processed products with an acceleration voltage of 9 kV, an irradiation time of 20 minutes, and a treatment time of 40 minutes. The product shown in FIG. 7 is a 20-minute treated product, which is a nano / micro protrusion containing a small amount of Zn but mainly made of Cu. The bottom surface has a diameter of 0.5 to 1 μm and an aspect ratio of 10 to 20. It was. In addition, what is shown in FIG. 8 is a 40-minute processed product, and in addition to a large number of minute nano / micro protrusions of about 1 μm, nano / micro protrusions made of relatively large Cu—Zn are scattered. The aspect ratio of the minute nano / micro protrusions was about 10.

以上のような20分処理品、40分処理品を未処理品とともに用いて、COシフト反応におけるCO転化率を測定した。なお、比較材としてArイオンビーム非照射の非処理品を用いた。   Using the 20-minute treated product and the 40-minute treated product as described above together with the untreated product, the CO conversion rate in the CO shift reaction was measured. As a comparative material, an untreated product not irradiated with an Ar ion beam was used.

図9に反応容器と試料の充填状態を示す。反応容器はSUS316製であって、上方に開口部を有し、容器内高さ10mm、内径25mmである。この反応容器の内部に未処理品、20分処理品、40分処理品を各9枚ずつ図のように十字状に並べた。   FIG. 9 shows the filled state of the reaction vessel and the sample. The reaction vessel is made of SUS316, has an opening at the top, has a height in the vessel of 10 mm, and an inner diameter of 25 mm. Nine untreated products, 20-minute treated products, and 40-minute treated products were arranged in a cross shape as shown in the figure inside the reaction vessel.

図10に反応装置の概略構成を示す。すなわち、上下の触媒加熱用ヒータ−の間に9枚の試料を充填した反応容器を挿入して加熱するとともに、ヒーターの内部にCOを含む反応ガスを挿通させて、反応容器に導き、反応後のガスを四重極質量分析器に導入してCO転化率を測定した。なお、反応前のガス組成は、CO(1%)+H2O(5%)+He(残部)であり、ガス流量は40ml/min、反応温度は400℃とした。   FIG. 10 shows a schematic configuration of the reaction apparatus. That is, a reaction vessel filled with nine samples is inserted between the upper and lower heaters for catalyst heating and heated, and a reaction gas containing CO is inserted into the heater and introduced into the reaction vessel. Was introduced into a quadrupole mass spectrometer to measure the CO conversion. The gas composition before the reaction was CO (1%) + H 2 O (5%) + He (remainder), the gas flow rate was 40 ml / min, and the reaction temperature was 400 ° C.

測定の結果、未処理品のCO転化率は2.2%であったが、20分処理品のCO転化率は15.4%、40分処理品のCO転化率は13.5%であって、処理品は未処理品に対して約7倍にCO転化率が高められていることが分った(図11)。したがって、本発明は、従来の粉末触媒では使用できない部位に使用できるCO転化率の高い板状のCOシフト触媒として、工業的価値大なものであることが確かめられた。   As a result of the measurement, the CO conversion rate of the untreated product was 2.2%, but the CO conversion rate of the 20-minute treated product was 15.4%, and the CO conversion rate of the 40-minute treated product was 13.5%. Thus, it was found that the CO conversion rate of the treated product was increased by about 7 times that of the untreated product (FIG. 11). Therefore, it was confirmed that the present invention has a great industrial value as a plate-like CO shift catalyst having a high CO conversion rate that can be used in a site where the conventional powder catalyst cannot be used.

また、真鍮板にArイオンビームを、加速電圧5kVにて40分照射してナノ・マイクロ突起を形成した合金板について、上記と同様にしてCO転化率を測定したところ、CO転化率8%であることを確かめた。
Further, when the CO conversion rate was measured in the same manner as described above for an alloy plate in which a brass plate was irradiated with an Ar ion beam at an acceleration voltage of 5 kV for 40 minutes to form nano / micro protrusions, the CO conversion rate was 8%. I confirmed that there was.

Claims (2)

Cu−Znからなるナノ・マイクロ突起が成長・形成されている板状合金を用いたことを特徴とするCOシフト触媒。   A CO shift catalyst characterized by using a plate-like alloy on which nano / micro protrusions made of Cu-Zn are grown and formed. Cu−Znからなるナノ・マイクロ突起は、その形状が円錐体、円柱を含む横断面丸形または角錐台のものであり、3μm以下の底面外径に対する長さの比であるアスペクト比が5以上であることを特徴とする請求項1に記載のCOシフト触媒。
The nano / micro protrusions made of Cu-Zn have a circular or truncated pyramid shape including a cone and a cylinder, and an aspect ratio that is a ratio of a length to a bottom outer diameter of 3 μm or less is 5 or more. The CO shift catalyst according to claim 1, wherein
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