JP5754231B2 - Method for manufacturing color filter substrate for reflective liquid crystal display device and color filter substrate obtained thereby - Google Patents

Description

  The present invention relates to a method for manufacturing a color filter substrate for a reflective liquid crystal display device that displays by using external light as a light source and reflecting the incident external light by a reflecting plate and emitting it, and a color filter substrate obtained thereby. .

  A color liquid crystal display device is generally configured by enclosing a liquid crystal 3 between a color filter substrate 1 and an array substrate 2 as shown in the cross-sectional explanatory view of FIG. The color filter substrate 1 includes a transparent substrate 11 as a structural support, and a polarizing film 12 is laminated on the screen observer side. The opposite side (back side) is divided into a large number of pixel areas, and a light shielding film 13 is provided at an inter-pixel position located at the boundary between the pixel area and the transparent colored layer 14 in each pixel area. Is arranged. The transparent colored layer 14 colors transmitted light for each pixel. Generally, the transparent colored layer 14 of three colors of red (R), green (G), and blue (B) corresponding to the three primary colors of light is changed for each pixel. Are arranged. The light-shielding film 13 prevents mixed colors of transmitted light colored in these colors.

  Since the liquid crystal display device is not a self-luminous display device, the display requires light from other sources. For example, as shown in FIG. 1, there is an apparatus in which a backlight 4 is arranged on the back surface of an array substrate 2 and display is performed by light through a polarizing film 22 from behind. Such a liquid crystal display device is called a transmissive liquid crystal display device, and is mainly used in a dark environment such as indoors. However, the display is difficult to see in a very bright environment such as outdoors. In particular, the power consumption is increased by attaching the backlight 4, and the continuous use time when the battery is driven is limited. Battery life is important for mobile applications, and in this respect, a reflective type without a backlight, which accounts for the majority of power consumption, is advantageous. In order to take advantage of the portability of the liquid crystal display device, there is a demand for a bright reflective liquid crystal display device that does not require a backlight.

  Therefore, there is a device in which a reflective layer is provided on either the array substrate or the counter substrate, and display is performed by external light from the surroundings when viewing the liquid crystal display device. For example, Patent Document 1 discloses a reflective liquid crystal display element including a reflective film between one glass substrate and an insulating film. In these reflective liquid crystal display devices, poor color display visibility under direct sunlight is a problem. In order to increase the utilization efficiency of external light, it is necessary to increase the light transmittance of the liquid crystal layer and to use a reflector having high reflection efficiency.

  In addition, in order to improve display quality such as visibility under direct sunlight and to reduce weight, a highly reflective metal film such as aluminum (Al) formed on a glass substrate is used as a reflective material on the Al film. Attempts have been made to form color filters directly. For example, in Patent Document 2, a metal reflective layer having a granular undulation in the horizontal direction and having a predetermined surface roughness in the vertical direction on the liquid crystal layer side of one substrate and patterned. A reflective liquid crystal display device is disclosed in which a colored resin is overlaid on top of each other, and the metal reflective layer also serves as a pixel electrode for applying an electric field to the liquid crystal layer. In addition, Patent Document 3 uses an RGB colored layer as an etching protective film in an etching process for the purpose of patterning a metal reflector without performing a metal mask, a photomask, a photoresist, or a photolithography process. A technique for patterning a metal reflector by removing a development protective film and a metal film together with an alkaline solution after forming an RGB layer is disclosed.

As a related technique for increasing the efficiency of the reflector, for example, in Patent Document 4, a scattering reflection layer including a scattering layer in which a sphere is uniformly dispersed on a support and a reflection layer and a color filter are included in the STN liquid crystal element. A reflective color liquid crystal display device is disclosed. Further, in Patent Document 5, a reflective pixel electrode made of an aluminum thin film on a TFT substrate is formed with a surface protective layer having a higher strength than aluminum to prevent occurrence of hillocks in the reflective electrode during alignment film firing. A method of manufacturing a reflective liquid crystal display element that has obtained high reflectance characteristics by preventing light leakage due to alignment disorder of the liquid crystal molecules and lowering of the maximum reflectance has been disclosed. Patent Document 6 discloses a reflective liquid crystal having a concavo-convex reflective layer to prevent the occurrence of surface scratches and foreign matter adhesion in order to increase the reflectance and ensure brightness. A display device is disclosed.

  By the way, when manufacturing a color filter with multiple faces on a single glass substrate, in the conventional manufacturing method, generally, an Al film is formed as a reflective film on a glass substrate by sputtering, and photosensitive by a known photolithography method. A predetermined etching protective film pattern corresponding to a screen multi-faced on one glass substrate is formed with a transparent resist material. Next, the Al film is subjected to etching treatment, and then the etching protection film is peeled off to form a predetermined Al film pattern. Thereafter, a predetermined protective film pattern for covering the Al film is formed by a known photolithography method using a photosensitive transparent resist material. Subsequently, an RGB colored layer is formed by a known photolithography process, development, and baking method as before, and an ITO film is formed as a common electrode, thereby producing a color filter. A reflective liquid crystal display device (LCD) is formed by bonding a TFT substrate as an array substrate with the color filter substrate thus obtained as a counter substrate, injecting liquid crystal, cutting each screen and combining it with a drive device or the like. ) Is configured.

JP-A-62-31824 Japanese Patent Laid-Open No. 06-18874 JP 2002-116434 A JP 2001-281422 A Japanese Patent Laid-Open No. 11-64872 JP 2001-209043 A

  As described above, the metal film used for the reflective material is a material having a high reflectance such as Al. For this reason, when forming a protective film using a photosensitive resist in the next process after the metal film is formed, unevenness caused by resist coating, solvent drying process, substrate back surface cleaning, hot plate process, exposure process, etc. is remarkable. There is a problem that appears. Usually, when evaluating the coating unevenness of a material used in manufacturing a color filter substrate, the evaluation is generally performed using a solid material of a metal film having a high reflectance such as a chromium (Cr) blanks material. Therefore, even a slight level of unevenness that does not hinder normal products can be observed remarkably on a metal film having a high reflectance, leading to deterioration in display quality such as color unevenness.

As a countermeasure against this, as an alternative to applying a photosensitive resist material, there is a film formation of a silicon nitride (SiN) film by a CVD method in which a uniform film formation is easily obtained. However, in the existing manufacturing method, when forming a multi-sided metal film pattern on a single glass substrate by a single wafer method, a photosensitive resist is applied after the Al film is formed, and etching protection of a predetermined shape is performed by a photolithography method. A layer was formed, an Al film was etched, the etching protective layer was peeled off, a multi-faced pattern of an Al metal reflector having a predetermined shape was formed, and finally a protective film such as SiN was formed. For this reason, the quality of Al film (reflectance, surface roughness, unevenness, etc.) can be reduced by exposure to chemicals during peeling of the etching protective layer in the patterning process of Al film and corrosion caused by slight fluctuations in process conditions. There was a problem that could not be secured.

  The present invention has been made to solve the above-described problem, avoids unevenness due to application of a protective film on a metal film as a reflector, and uses a chemical such as a peeling liquid in the etching protective film peeling step. By avoiding exposure, a method for producing a color filter substrate for a reflective liquid crystal display device that ensures the quality of a stable metal film layer and can maintain the stable quality of the metal film in single-sided multi-face production, An object of the present invention is to provide a color filter substrate that does not cause unevenness.

The invention according to claim 1 of the present invention is a method for manufacturing a color filter substrate for a reflective liquid crystal display device having a plurality of screen patterns imposed on a substrate, the order of the manufacturing method being: (1) substrate A metal film forming step of forming a metal film on the entire upper surface; (2) an inorganic protective film forming step of forming an inorganic protective film on the metal film; and (3) a photosensitive resist having dry etching resistance. A dry etching resistant film forming step of patterning the dry etching resistant film on the inorganic protective film on the plurality of screens, and (4) the inorganic protective film covered with the dry etching resistant film. free site by removing boiled dry etching, and an inorganic protective film dry etching step for patterning the inorganic protective layer, (5) the dry etching resistance on the inorganic protective layer And (6) removing the exposed metal film, which is an uncovered portion of the inorganic protective film, on the substrate by an etching process, and removing the conductive film. (7) A photosensitive colored resin composition is applied and dried on the entire surface of the substrate patterned in (6), and exposed through a predetermined mask. developing the patterned formation of colored pixels of firing is repeated in accordance with a desired number of colors, a method of manufacturing a reflective liquid crystal display device for color filter substrate, which is a, a colored layer forming step.

The present onset Ming, the dry etching resistance film forming step (3), the dry etching resistance film on the inorganic protective layer in the form of such an alignment mark and accessories mark for bonding the array substrate simultaneously pattern After forming, through the inorganic protective film dry etching step (4), the dry etching resistant film peeling step (5), and the metal film etching step (6), the same dimensions and shape as the inorganic protective film wherein by the metal film alignment mark and the accessory mark etc. Ru is formed.

Next, an invention according to claim 2 of the present invention is a color filter substrate for a reflective liquid crystal display device obtained by the method for producing a color filter for a reflective liquid crystal display device according to claim 1 .

  In the present invention, since the inorganic protective film is formed in the process before the metal film etching process after the metal film is formed as described above, the formation of the metal film etching protective film, the etching process, and the etching protective film In the peeling process, the metal film is not exposed to a chemical solution such as a peeling solution and the ambient environment. On the other hand, in the conventional method, since the metal film etching process and the etching protective film peeling process were performed in the previous process of the silicon nitride (SiN) film as the protective film, the metal film was turned into a chemical solution such as a peeling liquid. Exposure could not be avoided. As a result, according to the present invention, the reduction in reflectance due to the corrosion of the metal film due to the exposure of the chemical solution at the time of peeling the etching protective layer in the patterning process of the metal film and the slight fluctuation of the process conditions, It has become possible to eliminate the decrease in brightness and display unevenness caused by surface roughness and unevenness.

  In addition, fine panning such as alignment marks and accessory marks, which are indispensable for a multi-sided substrate, can be simultaneously formed, and stable quality can be ensured in the case of single-wafer multi-sided mass production. Furthermore, compared to conventional methods, the inorganic protective film on the metal film also serves as an etching protective film in the metal film etching process, so the etching protective film process (coating, patterning, peeling, etc.) that is usually required in the metal film etching process ) Can be reduced.

It is the elements on larger scale explaining the example of a section structure of a transmissive color liquid crystal display. It is a schematic diagram which shows the example of a partial cross section structure of the color filter substrate for reflection type liquid crystal display devices of this invention. It is the elements on larger scale explaining the cross-sectional structural example of the reflection type liquid crystal display device based on this invention. It is a schematic diagram explaining the manufacturing method of the color filter substrate for reflection type liquid crystal display devices of this invention in a partial cross section. It is a schematic diagram explaining the outline of the manufacturing method of the color filter substrate for reflection type liquid crystal display devices based on this invention by a perspective view.

  Hereinafter, a method for manufacturing a color filter substrate for a reflective liquid crystal display device according to the present invention will be described with reference to the drawings based on an embodiment thereof. In the following description, the same reference numerals are used without assigning new numbers to portions common to the prior art of the color filter substrate for a transmissive liquid crystal display device already described in the background art.

  FIG. 2 is a schematic cross-sectional view showing a configuration of an embodiment of a color filter substrate for a reflective liquid crystal display device obtained by the method for manufacturing a color filter substrate for a reflective liquid crystal display device according to the present invention. As shown in FIG. 2, the color filter substrate 1 for a reflective liquid crystal display device is obtained by forming a metal film 18, an inorganic protective film 17, a transparent colored layer 14, and a transparent conductive film 15 on a substrate 11. . As shown in FIG. 3, the color filter substrate 1 is attached to the TFT substrate 2 which is an array substrate as a counter substrate with a certain gap, and a liquid crystal 3 is injected into the gap to visually recognize the color filter substrate 1 from the TFT substrate 2 side. A reflective liquid crystal display device is obtained.

  The above-described color filter substrate for a reflective liquid crystal display device of the present invention can be obtained through at least the following steps. FIG. 4 is a schematic diagram for explaining, in a partial cross section, an embodiment of a method for producing a color filter substrate for a reflective liquid crystal display device according to the present invention.

  First, as shown in FIG. 4A, a highly reflective metal film 18 is formed on the entire surface of the substrate 11 such as alkali-free glass. Aluminum, silver, platinum, rhodium, etc. are examples of metals having high reflectivity, but aluminum and its alloys that are inexpensive and excellent in stability can be preferably used. The Al film is formed on the entire surface of the substrate 11 by DC magnetron sputtering or resistance heating vacuum deposition. The film thickness is required to be at least about 100 nm, and 100 nm to 200 nm is appropriate. Although it is possible to set the thickness to 500 nm or more, the contribution to the reflectance is small, which is disadvantageous in terms of economy and productivity.

  As the substrate 11, there is a glass substrate such as quartz glass or non-alkali glass, and generally an alkali-free glass substrate can be preferably used. Further, when the reflection type liquid crystal display device according to the present invention is applied as a complete reflection type liquid crystal display device which is not used in combination with the transmission type, the substrate to be used is provided to provide the light reflection layer on the liquid crystal layer side of the substrate. It is not necessary to be transparent or have optical isotropy, and engineering plastics having excellent heat resistance that could not be used as a substrate for a conventional liquid crystal display device can be used.

Next, as shown in FIG. 4B, an inorganic protective film 17 is formed on the metal film 18. As the inorganic protective film 17, silicon nitride (SiN) using a CVD (Chemical Vapor Deposition) method is used as a protective film that is not etched with a color resist developer for forming a color filter layer. It can be preferably used in terms of uniformity and physical properties as a protective film. As the inorganic protective film 17, SiO ₂ or the like can be used in addition to silicon nitride, and can be applied by a vacuum deposition method, a sputtering method, a CVD method, a solution method, or the like.

  The optimum thickness of the inorganic protective film 17 varies depending on the type and configuration of the inorganic compound used, but is preferably in the range of 300 to 800 nm, and the value is appropriately selected. More preferably, it is the range of 400-600 nm.

  Next, as shown in FIG. 4C, a dry etching resistant film 19 is formed in a predetermined shape on the inorganic protective film 17 by using a known resist using a photosensitive resist having dry etching resistance. A pattern is formed.

  Thereafter, as shown in FIG. 4D, a dry etching process is performed using a known method such as plasma etching using active gas plasma, and a SiN film or the like in a portion not covered with the dry etching protective film 19 The inorganic protective film 17 is removed by etching.

  Next, as shown in FIG. 4E, the dry etching resistant film 19 on the inorganic protective film 17 is peeled off, and the inorganic protective film 17 is formed on the metal film 18. For the peeling of the dry etching resistant film 19, a known wet peeling method or a dry etching method in which the etching speed is controlled can be appropriately employed.

  Next, as shown in FIG. 4F, the exposed metal film 18 that is the non-covered portion of the inorganic protective film 17 on the transparent substrate 11 is removed by etching to form a pattern on a plurality of screens. . Also in this case, a wet etching method using a mixed acid obtained by mixing a known acid such as phosphoric acid, nitric acid, and acetic acid can be appropriately employed. Thus, a multi-sided substrate having a screen pattern of a predetermined reflective layer is obtained.

  In the manufacturing method of the present invention, the dry etching resistant film 19 is simultaneously patterned on the inorganic protective film 17 in the shape of the alignment mark and the accessory mark 20 for bonding to the array substrate in the above-described dry etching resistant film forming step. The alignment mark and the accessory mark 20 are formed by the metal film 18 having the same shape and shape as the inorganic protective film 17 by forming the film and then passing through the inorganic protective film dry etching process, the dry etching resistant film peeling process, and the metal film etching process. It is formed. Therefore, it is possible to ensure the alignment accuracy during the production of the multi-sided color filter substrate 1 in the single-wafer method, and to fix the TFT substrate 2 as an array substrate with the color filter substrate 1 using the multi-sided substrate as a counter substrate. It is easy to detect the mark when it is pasted at the gap, and the panel can be manufactured with high accuracy.

  FIG. 5 is a schematic view for explaining an outline of a method for manufacturing a color filter substrate for a reflective liquid crystal display device according to the present invention in perspective. 5A, the metal protective film forming process shown in FIG. 5B, the inorganic protective film dry etching process shown in FIG. 5C, and FIG. 5), a transparent colored layer (RGB) forming step shown in FIG. 5 (e), and a transparent electrode / ITO film forming step shown in FIG. 5 (f). A color filter was formed. That is, the photosensitive colored resin composition is applied to the entire surface of the multi-sided transparent substrate patterned on the plurality of screens including the inorganic protective film 17 formed through the metal film 18 by using a known photolithography method. It is applied and dried, exposed through a predetermined mask, developed, and baked to pattern colored pixels. By repeating this process according to the desired number of colors such as RGB, a colored layer was formed. Thereafter, an ITO layer is formed on this substrate by a known method, and the color filter substrate 1 for a reflective liquid crystal display device shown in FIG. 2 described above is obtained.

  Here, in the color filter substrate of the present invention, light is reflected and passes through each constituent material twice, so that it becomes dark at the same pigment concentration as the conventional transmission type. Therefore, it is preferable to reproduce the predetermined color by adjusting the pigment concentration of the colored layer instead of changing the thickness of the colored layer. Further, only one polarizing film is used on the surface. In the case of using a reflective liquid crystal display element composed of a liquid crystal polymer composite layer in which a liquid crystal and a polymer are dispersed with each other, disclosed in JP-A-11-160682, a polarizing plate is unnecessary. There is no decrease in the amount of light due to light absorption by the polarizing plate.

  Further, in the conventional transmissive liquid crystal display device, the light shielding film 13 is provided in order to prevent the mixed color of the transmitted light colored in each color. However, in the reflective liquid crystal display device according to the present invention, the reflection / reflection of light is performed. A light shielding film is not necessarily required in terms of utilization efficiency.

  The photosensitive colored resin composition used in the present invention contains, as its essential components, a photopolymerizable monomer, a resin binder, a polymerization initiator, a colorant and a solvent. Moreover, you may contain additives, such as a dispersing agent, a photosensitizer, and a chain transfer agent.

  The photopolymerizable monomer is polymerized by irradiation with exposure light to change the coating film of the photosensitive coloring composition to be insoluble in the developer. Generally, it is a monomer whose polymerization is induced by radicals. As such a photopolymerizable monomer, a polyfunctional urethane acrylate obtained by reacting a (meth) acrylate having a hydroxyl group with a polyfunctional isocyanate can be used. The content of the photopolymerizable monomer is preferably 20% by mass or less with respect to 100% by mass of the total amount of the composition. Moreover, it is preferable that it is 1 mass% or more from a viewpoint of exposure sensitivity, the film thickness obtained, and the resolution of a pattern, and solvent resistance.

The binder resin is a resin having a transmittance of preferably 80% or more, more preferably 95% or more in the entire wavelength region of 400 to 700 nm in the visible light region, and is preferably a solvent-soluble resin or an alkali-soluble resin. The solvent-soluble resin is preferably a resin having high solubility in a solvent used as a developer. The alkali-soluble resin is a resin having an acid value and is used to make the photosensitive coloring composition an alkali developing type. As the binder resin, since a high-temperature heating process is performed in the manufacturing process of the color filter, it is preferable to use a resin having good resistance even in the heating process. Furthermore, in the color filter manufacturing process, the photosensitive coloring composition film is thermally cured and then treated with various solvents and chemicals. Therefore, a resin having excellent solvent resistance and chemical resistance when cured is used. It is preferable to use it. Examples of the alkali-soluble resin include (meth) acrylic acid copolymers, styrene-maleic acid copolymers, and polyester resins having a carboxyl group. As the binder resin, in addition to the solvent-soluble resin or the alkali-soluble resin, for the purpose of imparting characteristics such as heat resistance and adhesion, a resin having no solvent solubility or alkali solubility may be contained.

  The colorant colors the transparent colored film and colors the display light of the liquid crystal display device. Although pigments and dyes can be used, it is desirable to use pigments because of their excellent durability. The pigment may be either an organic pigment or an inorganic pigment, but an organic pigment can be preferably used. Moreover, the compounding quantity is not specifically limited.

  When a pigment is used as the colorant, it is desirable to contain a dispersant for dispersing the pigment. As the dispersant, a surfactant or the like is used.

  Examples of the photopolymerization initiator suitably used for the photosensitive colored resin composition include 4-phenoxydichloroacetophenone, 4-t-butyl-dichloroacetophenone, diethoxyacetophenone, 1- (4-isopropylphenyl) -2- Hydroxy-2-methylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- [4- (methylthio) phenyl-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino- Acetophenone-based photopolymerization initiators such as 1- (4-morpholinophenyl) -butan-1-one, benzoin-based and benzophenone-based photopolymerizations such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzyldimethyl ketal Initiator, benzofe Non, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, oxime ester photopolymerization initiators, onium borate photopolymerization initiators such as iodonium borate, sulfonium borate, ammonium borate, imidazole light A compound such as a polymerization initiator is used. You may use the said photoinitiator individually or in mixture of 2 or more types.

  The photosensitive colored resin composition used in the present invention may be used in combination with the following photopolymerization initiator as a sensitizer for the purpose of improving the reactivity of the photopolymerization initiator in addition to the polymerization initiator. Preferably, for example, α-acyloxime ester, acylphosphine oxide, methylphenylglyoxylate, benzyl, 9,10-phenanthrenequinone, camphorquinone, ethylanthraquinone, 4,4′-diethylisophthalophenone, 3, Compounds such as 3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone, 4,4′-diethylaminobenzophenone may be used, or a mixture of two or more may be used. .

A polymerization inhibitor can be added to the photosensitive colored resin composition used in the present invention. In the photosensitive coloring composition, the ratio I / Q of the mass (I) of the photopolymerization initiator to the mass (Q) of the polymerization inhibitor is 30 or more and less than 500, preferably 40 or more and less than 450. More preferably, it is less than 400. When the ratio I / Q is less than 30, the rate at which radicals generated from the photopolymerization initiator upon UV irradiation are deactivated by the polymerization inhibitor becomes very large, and the light reflecting area becomes insufficiently cured. In the process, the coating of the photosensitive coloring composition tends to peel off from the transparent substrate, which is not preferable. When the ratio I / Q is 500 or more, the rate at which radicals generated from the photopolymerization initiator during UV irradiation are deactivated by the polymerization inhibitor is reduced, so that light reflection with a small effective UV irradiation amount is reduced. This is not preferable because the region is sufficiently cured and it is difficult to form a light reflecting region with a thin film thickness.

  Examples of the polymerization inhibitor used in the photosensitive coloring composition include catechol, resorcinol, 1,4-hydroquinone, 2-methylcatechol, 3-methylcatechol, 4-methylcatechol, 2-ethylcatechol, 3-ethylcatechol, 4 -Ethyl catechol, 2-propyl catechol, 3-propyl catechol, 4-propyl catechol, 2-n-butyl catechol, 3-n-butyl catechol, 4-n-butyl catechol, 2-tert-butyl catechol, 3-tert Examples thereof include alkyl catechol compounds such as -butyl catechol, 4-tert-butyl catechol, and 3,5-di-tert-butyl catechol.

  The photosensitive colored resin composition used in the present invention can contain a polyfunctional thiol that functions as a chain transfer agent. The polyfunctional thiol may be a compound having two or more thiol groups. The amount of the polyfunctional thiol used is preferably 0.01 to 50.0 parts by mass, more preferably 0.05 to 30.0 parts by mass with respect to 100 parts by mass of the colorant.

  The solvent has a function of uniformly dispersing the colorant while allowing uniform application on the substrate. As the solvent, a water-soluble organic solvent or the like can be used. The water-soluble organic solvent functions to wet the colorant and water-soluble inorganic salt, and is not particularly limited as long as it dissolves (mixes) in water and does not substantially dissolve the inorganic salt to be used. However, a high boiling point solvent having a boiling point of 120 ° C. or higher is preferable from the viewpoint of safety because the temperature rises during salt milling and the solvent is easily evaporated.

  Examples of the water-soluble organic solvent include 2-methoxyethanol, 2-butoxyethanol, 2- (isopentyloxy) ethanol, 2- (hexyloxy) ethanol, diethylene glycol, triethylene glycol, triethylene glycol monomethyl ether, liquid Polyethylene glycol, 1-methoxy-2-propanol, 1-ethoxy-2-propanol, dipropylene glycol, dipropylene glycol monomethyl ether, liquid polypropylene glycol, ethyl cellosolve acetate, 1-methoxy-2-propyl acetate, diethylene glycol dimethyl ether, Propylene glycol monomethyl ether acetate, ethylene glycol diethyl ether, ethyl cellosolve, methyl ethyl ketone, acetate Le, methanol, ethanol, isopropyl alcohol, butanol, isobutyl ketone, and the like. The water-soluble organic solvent is preferably used in an amount of 5 to 1000% by mass, and most preferably 50 to 500% by mass, based on the total mass of the colorant (100% by mass).

  The photosensitive colored resin composition of the present invention can be prepared by a known method. For example, a pigment composition prepared by mixing a pigment and a dispersant in advance is added to a solution obtained by dissolving a photopolymerizable monomer or a resin binder, or both in a solvent, and then the remaining components are added. is there. Here, the pigment and the dispersant can be dispersed using various dispersing devices such as a three-roll mill, a two-roll mill, a sand mill, a kneader, a dissolver, a high speed mixer, a homomixer, and an attritor.

  Next, the photosensitive colored resin composition obtained as described above is uniformly coated on a substrate, dried and prebaked to form a coating film. As a coating method, a spin coating method, a slit and spin coating method, a spinless method, a roll coating, or the like can be used.

The exposure can be performed by a proximity exposure method using a proximity aligner. As the exposure wavelength, ultraviolet rays obtained from a normal ultra-high pressure mercury lamp are often used. Examples of exposure conditions include an exposure amount of 250 mJ / cm ² , an illuminance of 25.2 mW, and an exposure gap of 100 μm.

  The reflective liquid crystal display device to which the present invention is applied is used for monitors such as monitors and PDAs for industrial equipment having a need for low power consumption in addition to color display.

  Next, the exposed coating film is developed. As the developer, an alkali developer such as an aqueous alkali solution or an organic alkali solution can be used. Examples of the alkaline aqueous solution include sodium carbonate and caustic soda, and examples of the organic alkaline solution include dimethylbenzylamine and triethanolamine. Moreover, you may use the developing solution to which the antifoamer and surfactant were added as needed. As a development processing method, a shower development method, a spray development method, a dip (immersion) development method, a paddle (liquid accumulation) development method, or the like can be applied.

  Next, ITO as a transparent electrode is formed into a film by a sputtering method, and the color filter substrate described above can be manufactured.

  As described above, in the manufacturing method of the present invention, since the inorganic protective film is formed in the process before the metal film etching process after the metal film is formed, the patterning of the Al film, which has been a conventional problem, is performed. Reduced reflectivity due to corrosion of Al film due to chemical exposure when removing the etching protective layer in the process, slight fluctuations in process conditions, reduced brightness due to surface roughness and unevenness, and display unevenness It can be solved.

DESCRIPTION OF SYMBOLS 1 ... Color filter substrate 2 ... Array substrate / TFT substrate 3 ... Liquid crystal 4 ... Backlight 11 ... Substrate, glass substrate 12 ... Polarizing film
DESCRIPTION OF SYMBOLS 13 ... Light-shielding film 14 ... Transparent colored layer (RGB) 15 ... Transparent electrode and ITO
16 ... Alignment film 17 ... Inorganic protective film 18 ... Metal film
19 ... Dry etching resistant film
20 ... Alignment mark and accessory mark
21 ... Transparent substrate (for array substrate) 22 ... Polarizing film 26 ... Alignment film

Claims (2)

A method of manufacturing a color filter substrate for a reflective liquid crystal display device in which a plurality of screen patterns are imposed on a substrate, the order of the manufacturing method being
(1) A metal film forming step of forming a metal film on the entire surface of the substrate;
(2) an inorganic protective film forming step of forming an inorganic protective film on the metal film;
(3) A dry etching resistant film forming step of patterning the dry etching resistant film on the inorganic protective film on the plurality of screens using a photosensitive resist having dry etching resistance;
(4) and said portion not covered by the dry etching resistance film by removing boiled dry etching, inorganic protective film dry etching step for patterning the inorganic protective film of the inorganic protective layer,
(5) a dry etching resistant film peeling step of peeling the dry etching resistant film on the inorganic protective film;
(6) on said substrate, said the metal layer exposed is a non-covered portion of the inorganic protective film is removed by etching process to pattern the plurality of screens, metal film etching step and (7) the The entire surface of the substrate patterned in (6) is coated and dried with a photosensitive colored resin composition, exposed through a predetermined mask, developed, and patterned to form colored pixels to be baked. Repeated according to the number of colors to be colored,
A method for producing a color filter substrate for a reflective liquid crystal display device. A color filter substrate for a reflective liquid crystal display device obtained by the method for producing a color filter for a reflective liquid crystal display device according to claim 1 .