JP5765466B2 - Glass melting furnace - Google Patents

Description

  The present invention relates to a glass melting furnace for detecting deposits such as metals.

  As one form of the glass melting furnace, for example, molten glass is generated in the melting space of the melting furnace main body formed of refractory bricks, and then the molten glass is exposed to the melting space to be energized to generate Joule heat. There is known a direct-current-type glass melting furnace that generates and heats and melts glass beads by introducing them into the molten glass.

  One of the uses of such a glass melting furnace is the formation of a solidified body for storing radioactive drainage generated in a nuclear facility or the like in a radioactive waste storage facility. In this case, the radioactive drainage is combined with glass beads into the glass melting furnace. The radioactive glass is mixed with the molten glass produced by charging the molten glass, and the molten glass containing the radioactive liquid is sealed in the canister from the falling nozzle formed below the melting furnace body to form a glass solidified body. It has become.

Therefore, the lower part of the melting furnace body is, for example, a lead-out part formed so as to reduce the cross-sectional area on the side of the falling nozzle from the melting space, such as an inverted pyramid type, and the molten glass flows smoothly to the flowing nozzle. ing.
However, for example, platinum group elements (rhodium, palladium, ruthenium) contained in radioactive effluent are easily deposited and clustered under certain conditions and deposited on the bottom of the furnace including the lead-out part, and the viscosity is very high. In addition, when platinum group elements are deposited on the bottom of the furnace, the molten glass stagnates in the furnace wall and it becomes difficult to stably flow to the falling nozzle along the furnace wall.

  In addition, because the deposit containing the platinum group element has a lower electrical resistance than the molten glass, the current supplied from the electrode concentrates on the deposit and the current flowing through the molten glass becomes smaller. The electric heating of the molten glass is hindered, and the heating ability at the bottom of the furnace is lowered, so that the waste liquid-containing glass cannot be stably sealed from the flow nozzle to the canister.

  For this reason, when deposits accumulate and affect the operation of the glass melting furnace, the deposits are removed from the furnace wall. On the other hand, an air outlet is provided in the glass melting furnace to A technique for suppressing deposits of metal or the like by bubbling air is disclosed (for example, see Patent Document 1).

  On the other hand, if the electrical resistance between the electrodes falls below the reference value, the bottom of the furnace cannot be confirmed during operation, so the cause of the decrease in electrical resistance is due to the deposition of high-concentration platinum group-containing glass or foreign materials such as metals. It is not easy to identify whether the current is due to the energization interruption due to the contamination of the power supply or due to the power supply malfunction, so conventionally, when the interelectrode resistance is below the reference value, a substance with low electrical resistance is deposited on the bottom of the furnace. As a result, the supply of glass beads and radioactive liquid waste was stopped and the operation of the glass melting furnace was stopped.

JP 2002-236197 A

  However, when the glass melting furnace is stopped, it takes a lot of time and cost to raise the temperature and restart the glass melting furnace. Stopping will cause much more cost than necessary.

Therefore, there is an increasing technical demand for a deposit detection method and a glass melting furnace capable of efficiently and reliably detecting deposits such as high-concentration platinum group-containing glass generated in the glass melting furnace.
In addition, by establishing such technology, operating conditions for establishing stable operating conditions for glass melting in a radiation environment and for cleaning operations when platinum group-containing glass is deposited on the bottom of the furnace are efficiently performed. Expectations for the analysis of

  The present invention has been made in consideration of the above points, and an object of the present invention is to provide a glass melting furnace capable of efficiently and reliably detecting deposits deposited in the glass melting furnace. To do.

In order to achieve the above object, the present invention employs the following configuration.
1st invention is comprised so that molten glass can be stored in the molten space formed with the refractory brick, and the stored molten glass is discharged | emitted from the falling nozzle connected to the derivation | leading-out part of the said molten space lower part. A glass melting furnace comprising a plurality of antenna elements arranged in a matrix so as to cover the melting space, an irradiation antenna capable of irradiating the melting space with electromagnetic waves, and the irradiation antenna irradiating A reflected wave antenna that receives a reflected wave reflected by the molten space, a transmitted wave antenna that receives a transmitted wave transmitted by the irradiation antenna through the molten space, and the plurality of antenna elements And a plurality of temperature sensors that detect the temperature of the molten glass, and irradiate the electromagnetic wave by supplying power to the irradiation unit. And a reflected wave signal indicating the reflected wave received by the reflected wave antenna, a transmitted wave signal indicating the transmitted wave received by the transmitted wave antenna, and a temperature indicating the temperature of the molten glass detected by the temperature sensor. A detection unit that outputs measurement signals, and a database in which a correlation between the intensity of the reflected wave and the intensity of the transmitted wave and the concentration of white metals in the molten glass is stored as a numerical table using the temperature of the molten glass as a parameter And searching the database based on the reflected wave signal, the transmitted wave signal, and the temperature measurement signal, and a signal processing unit that specifies the concentrations of white metals at positions corresponding to the plurality of antenna elements, respectively. The means of preparing is adopted.

  According to a second aspect, in the first aspect, the signal processing unit outputs a signal obtained by binarizing white metal concentrations at positions corresponding to the plurality of antenna elements.

  According to a third aspect, in the first aspect, the signal processing unit employs means for outputting a signal obtained by quantizing the white metal concentration at positions corresponding to the plurality of antenna elements.

  4th invention employ | adopts a means further provided with the display part which displays the white metal density | concentration of the position of these antenna elements based on the signal which the said signal processing part outputs.

In this specification, the deposit is, for example, a high concentration of a platinum group metal or other metal, or a substance having a physical property value (for example, conductivity, dielectric constant, dielectric loss, etc.) different from that of molten glass at a high concentration. It refers to the molten glass contained.
According to the present invention, deposits deposited in the melting space of the glass melting furnace can be efficiently and reliably detected by irradiating and receiving electromagnetic waves in the melting space.
As a result, the operating rate of the glass melting furnace can be improved and the operating cost can be reduced.
In addition, it is possible to efficiently perform an analysis for the purpose of optimizing operating conditions for stably operating the glass melting furnace.

It is a longitudinal section showing an outline of a glass melting furnace concerning one embodiment of the present invention. It is a figure which shows schematic structure of the deposit detection apparatus which concerns on one Embodiment of this invention. It is the schematic which planarly viewed the principal part of the glass melting furnace which concerns on one Embodiment of this invention. It is the longitudinal cross-sectional view which looked at the principal part of the glass melting furnace which concerns on one Embodiment of this invention by the side view. It is a figure which shows schematic structure of the database which concerns on one Embodiment. It is a figure which shows the outline of the principle of the database which concerns on one Embodiment. It is a flowchart about schematic operation | movement of the signal processing part of the deposit detection apparatus concerning one Embodiment of this invention. It is a key map explaining the situation of irradiation and reception of electromagnetic waves by the deposit detection device concerning one embodiment. It is a figure which shows the example of a display by the display part of the deposit detection apparatus which concerns on one Embodiment.

The glass melting furnace according to the present invention will be described below with reference to FIGS.
FIG. 1 is a diagram showing an outline of an example of a glass melting furnace according to an embodiment of the present invention, and reference numeral 1 indicates a glass melting furnace.
The glass melting furnace 1 is, for example, a glass melting furnace for reprocessing radioactive waste liquid that produces a molten glass G using glass beads as a raw material and mixes the molten glass G with a radioactive waste liquid to obtain a solidified glass. .

  The glass melting furnace 1 includes a melting furnace body 10, a raw material supply pipe 13, a drainage supply pipe 14, an indirect heater 15, a main electrode 16, an auxiliary electrode 17, a bottom electrode 18, and a flow-down nozzle 19. And a deposit detection device (deposit detection means) 20. In addition, a canister 50 can be disposed below the downflow nozzle 19, the molten glass G is directly energized and heated in the melting furnace main body 10, and the molten glass G is discharged from the downflow nozzle 19 and filled into the canister 50. It is like that.

  The melting furnace main body 10 is formed of refractory bricks, and the inside is a melting space 11 for storing the molten glass G. The melting space 11 is formed in a substantially rectangular parallelepiped shape and the lower portion is downward from the upper side. A quadrangular pyramid space of a so-called inverted pyramid whose cross-sectional area decreases as it goes to, and this quadrangular pyramid space serves as a lead-out portion 11A for allowing the molten glass G to flow smoothly to the falling nozzle 19.

  The refractory bricks constituting the melting furnace main body 10 are made of, for example, Al2O3 + Cr2O3, and the refractory bricks and the refractory bricks are joined together by filling borosilicate glass therebetween, so that sufficient electrical insulation is provided. It is possible to transmit electromagnetic waves.

The raw material supply pipe 13 is arranged at the upper part of the glass melting furnace 1, and glass beads serving as a raw material for the molten glass G are introduced into the melting space 11.
The drainage supply pipe 14 is arranged at the upper part of the glass melting furnace 1 and, for example, feeds radioactive waste liquid discharged at the time of nuclear fuel production into a melting space 11 in a nuclear fuel production facility. Contains a high concentration of platinum group elements (rhodium, palladium, ruthenium).

  The indirect heater 15 is disposed at the upper part of the melting space, and is composed of an electric resistor such as a nichrome wire, and heats the glass beads filled in the melting space 11 by radiant heat by being energized. In addition, the temperature of the molten glass G that has been melted is maintained or raised.

  The main electrode 16 is composed of, for example, a pair of electrode members formed of Inconel having heat resistance and corrosion resistance against the molten glass G, and is disposed, for example, facing the middle portion of the melting space and on the melting space 11 side. The end is exposed and formed in the lead-out portion 11A, and the molten glass G in the molten space 11 is directly energized to generate Joule heat so that the molten glass G is heated and the glass beads are dissolved in the molten glass G. It has become.

The auxiliary electrode 17 is composed of, for example, a pair of electrode members formed of Inconel in the same manner as the main electrode 16, and is disposed, for example, in the middle of the height direction of the lead-out portion 11A so as to face the direction orthogonal to the main electrode. At the same time, an end portion on the melt space 11 side is exposed to the lead-out portion 11A. With this configuration, it is possible to sufficiently heat the molten glass G in the lead-out portion 11A that cannot be sufficiently heated by the main electrode 16. In FIG. 1, it is shown in the same direction as the main electrode for convenience.
Further, the auxiliary electrode 17 is formed with a ventilation path, and the temperature rise of the auxiliary electrode 17 can be suppressed by circulating cooling air along the arrow.

The bottom electrode 18 is formed of, for example, one electrode member formed of Inconel similarly to the main electrode 16, and is disposed so that the upper part is exposed to the lead-out part 11A in the opening formed in the central part of the lead-out part 11A. ing.
In addition, the bottom electrode 18 communicates with a flow channel of the flow-down nozzle 19 through a flow channel formed in the center portion in plan view so that the molten glass G can flow through the flow-down nozzle 19.
Further, a ventilation path is formed in the bottom electrode 18 so that the temperature rise of the bottom electrode 18 can be suppressed by circulating cooling air along the arrow.

The main electrode 16, the auxiliary electrode 17, and the bottom electrode 18 are arranged in this order from above, and the auxiliary electrode 17 is interposed between the electrode members constituting the main electrode 16 by setting the voltage applied to each electrode member. Between the constituent electrode members, between the main electrode 16 and the auxiliary electrode 17, between the main electrode 16 and the bottom electrode 18, between the auxiliary electrode 17 and the bottom electrode 18, the molten glass G is energized to generate Joule heat. The molten glass G is heated.
In this embodiment, the current that flows through the molten glass G is an alternating current.

The flow-down nozzle 19 is disposed in the lower part of the melting space 11 and is formed so as to communicate with the outlet portion 11 </ b> A. The molten glass G is discharged and filled into the canister 50.
The falling nozzle 19 is formed such that a high-frequency induction heating coil surrounds the flow path, and the temperature of the molten glass G passing through the flow path can be adjusted by induction heating the falling nozzle wall. Yes.

  The glass melting furnace 1 heats and melts the glass beads introduced by such a configuration with the indirect heater 15 in the initial stage to form a molten glass G, and then the glass beads are applied to any of the main electrode 16, the auxiliary electrode 17, and the bottom electrode 18. A voltage is applied to the molten glass G to heat and melt it.

  Further, glass beads and radioactive drainage are introduced into the molten glass G in the molten space 11 and melted, and the radioactive waste liquid is mixed into the molten glass G, and the molten glass G mixed with the radioactive drainage is discharged from the flow nozzle. The canister 50 is filled and solidified.

  As shown in FIG. 2, the deposit detection apparatus 20 includes an irradiation antenna (irradiation unit) 21, a reception antenna (reception unit) 23, a temperature sensor 24, a detection unit 25, a signal processing unit 30, and a display unit 40. The receiving antenna 23 receives the electromagnetic wave irradiated by the irradiation antenna 21, and detects deposits in the molten space 11 based on the time ΔT and the signal intensity from when the electromagnetic wave is irradiated until it is received. The distribution of the deposit is displayed on a display unit 40 such as a CRT (concentration distribution display means). Note that the calculation unit 33 and the database 34A constitute a concentration calculation unit.

  The irradiation antenna 21 is configured to irradiate an electromagnetic wave (for example, a millimeter wave or a microwave) having a wavelength less than or equal to about twice the resolution necessary for detection of deposits. As shown in FIGS. 3 and 4, the antenna is composed of a plurality of antenna element groups extending toward the derivation unit 11 </ b> A, and is a multipoint antenna capable of multipoint measurement. Specifically, a plurality of antenna elements are arranged in a matrix on a plane orthogonal to the extending direction, and this matrix covers the ridgeline of the quadrangular pyramid melting space 11. Note that the hatched portion in FIG. 3 conceptually shows the deposit deposited on the ridge line portion of the lead-out portion 11A.

  The irradiation antenna 21 and the receiving antenna 23 are preferably arranged outside the furnace wall of the refractory brick, but until a signal reaches a deposit such as a high-concentration platinum group-containing glass, which is the target object. In consideration of the attenuation and scattering of the electromagnetic wave, it may be close to the deposit embedded in the furnace wall.

  In addition, each antenna element constituting the irradiation antenna 21 can be fed in order from the detection unit 25 according to the arrangement of the matrix, and sequentially emits electromagnetic waves. In addition, about the irradiation order of electromagnetic waves, you may set arbitrarily, if it can respond | correspond with the received electromagnetic waves and matrix arrangement | sequence.

  The reception antenna (reception unit) 23 includes a reflected wave antenna 23A that receives a reflected wave reflected from a deposit or the like, and a transmitted wave antenna 23B that receives an electromagnetic wave transmitted through the derivation unit 11A. The reflected wave antenna 23 </ b> A is disposed on the same side as the irradiation antenna 21.

  A plurality of temperature sensors 24 are arranged corresponding to the matrix of the irradiation antenna 21, and the positions to be arranged are platinum groups together with the temperature of the molten glass G measured by the temperature sensor 24 and the signal intensity of the electromagnetic wave received by the receiving antenna 23. When the density is calculated, the error is within an allowable range.

  The detection unit 25 includes an irradiation circuit 26, a reflected wave reception circuit 27, a transmitted wave reception circuit 28, and a temperature detection circuit 29. The irradiation circuit 26, the reflected wave reception circuit 27, and the transmitted wave reception circuit 28 are respectively connected to the irradiation antenna 21, The temperature detection circuit 29 is connected to the temperature sensor 24 while being connected to the reflected wave antenna 23A and the transmitted wave antenna 23B.

  The irradiation circuit 26 is connected to each antenna element of the irradiation antenna 21 via a switching circuit. The irradiation circuit 26 feeds the target antenna element with an output signal from the output unit 35 of the signal processing unit 30 and outputs an electromagnetic wave. It is configured as follows.

The reflected wave receiving circuit 27 is configured to convert the reflected wave received by the reflected wave antenna 23 </ b> A into a voltage signal and output it as a reflected wave signal to the signal processing unit 30.
The transmitted wave receiving circuit 28 is configured to convert the transmitted wave received by the transmitted wave antenna 23B into a voltage signal and output it as a transmitted wave signal to the signal processing unit 30.
In addition, the temperature detection circuit 29 outputs a temperature measurement signal detected by the temperature sensor 24 to the signal processing unit 30.

  As shown in FIG. 2, the signal processing unit 30 communicates an input unit (input means) 31, a memory 32, a calculation unit 33, a hard disk device 34, an output unit 35, and their mutual data. Communication line 37, and the hard disk device 34 stores a database 34A.

  The input unit 31 includes, for example, a data input device such as a keyboard (not shown) and outputs settings and the like to the calculation unit 33 and is connected to the reflected wave reception circuit 27, the transmitted wave reception circuit 28, and the temperature detection circuit 29. The reflected wave signal, the transmitted wave signal, and the temperature measurement signal output from these are output to the calculation unit 33.

For example, the calculation unit 33 reads a program stored in the ROM of the memory 32 and executes the program, thereby instructing the irradiation circuit 26 to sequentially supply power to the antenna element to be irradiated with electromagnetic waves via the output unit 35. The output of the reflected wave signal, the transmitted wave signal, and the temperature measurement signal input from the input unit 31 is referred to the database 34A, the platinum group concentration w at the position corresponding to the antenna element of the matrix is calculated, and the calculated platinum The family concentration w is stored in the memory 32 in association with the matrix. Further, the platinum group concentration w stored in the memory 32 is output to the output unit 35 in association with the matrix.
In this embodiment, the calculated platinum group concentration w is binarized based on a threshold value. In place of binarization, the platinum group concentration w may be quantized and displayed by shading.

  The database 34A is, for example, a numerical table in which the correlation between the platinum group concentration w (wt%) and the signal intensity S input from the receiving antenna 23 as shown in FIG. 5 is displayed using the molten glass temperature T1 as a parameter. The calculation unit 33 can calculate the platinum group concentration (wt%) with reference to the signal intensity S and the temperature T1 of the molten glass G.

Further, the database 34A shows that the platinum group concentration w (wt%) and the electrical conductivity σ (1 / Ωm) as shown in FIG. 6 have a certain correlation with the molten glass temperature (T1, T2, T3) as a parameter. Based on having.
In place of the graph shown in FIG. 6, the platinum group concentration (wt%) is calculated based on the correlation between the dielectric constant and the dielectric loss depending on the temperature of the molten glass G and the signal intensity S. A database may be configured.

Next, with reference to FIG. 7, the procedure in which the signal processing unit 30 displays the platinum group concentration w corresponding to the matrix will be described.
FIG. 7 is a flowchart showing an example of a program for mapping the platinum group concentration in the deriving unit 11A according to the matrix.

1) First, the calculation unit 33 selects an antenna element to be irradiated. (S1)
2) Next, the calculation unit 33 instructs the irradiation circuit to irradiate the electromagnetic wave. (S2)
By this instruction, the switching circuit of the antenna element to be irradiated by the irradiation circuit 26 is turned on, and electromagnetic waves are irradiated from the antenna element.
3) When the electromagnetic wave is irradiated, the reflected wave receiving antenna 23A and the transmitted wave receiving antenna 23B receive the electromagnetic wave, and the received reflected wave signal and transmitted wave signal are input via the reflected wave receiving circuit 27 and the transmitted wave receiving circuit. Input to the unit 31.
Further, a temperature measurement signal detected by the temperature sensor 24 at a corresponding position (area) on the matrix is input to the input unit 31 via the temperature detection circuit 29.
FIG. 8 is a conceptual diagram showing an example of irradiation of electromagnetic waves by the irradiation antenna 21 and reception of electromagnetic waves by the receiving antenna 23. Reference numeral M1 indicates the irradiated electromagnetic waves, reference numeral Mr indicates reflected electromagnetic waves, and reference numeral Mt indicates transmitted waves. Show. In FIG. 8, the hatched portion indicates the deposit deposited on the lead-out portion 11A.
4) The computing unit 33 compares the reflected wave signal and the transmitted wave signal acquired via the reflected wave receiving circuit 27 and the transmitted wave receiving circuit with the reference data stored in the memory 32, and the comparison result is within an allowable range. When there is no change (difference) from the normal time, the process proceeds to S8, and when the comparison result exceeds the allowable range and there is a change from the normal time, the process proceeds to S5. (S4)
5) When the process proceeds to S8, the antenna element to be irradiated is changed. (S8)
When the antenna element is changed, the antenna element to be irradiated is selected (S1).
6) When the process proceeds to S5, the calculation unit 33 refers to the database 34A with reference to the database 34A for the signal intensity S of the reflected wave signal and the transmitted wave signal acquired from the input unit 31, and the platinum group at the corresponding position in the matrix The compound concentration w (wt%) is calculated. (S5)
The thickness of the deposit may be specified by calculating the distance to the deposit based on the return time Δt of the reflected wave.
7) The calculation unit 33 stores the position on the matrix and the platinum group concentration w (wt%) in the memory 32 in association with each other.
8) When irradiation is completed for all positions on the matrix, it is determined that mapping has been completed, and the program is terminated. If there are positions on the matrix that are not irradiated with electromagnetic waves, The process proceeds to S8 in order to change the irradiation antenna element in order to grasp the deposition state of the deposit at the remaining positions. (S7)
9) The computing unit 33 repeatedly executes the program until the irradiation of the electromagnetic waves to all positions on the matrix is completed.
10) After completing the execution of the program, the calculation unit 33 outputs the concentration distribution of the platinum group concentration w (wt%) to the binary value via the output unit 35 based on the data in the memory 32 and outputs the binary distribution. Display (for example, black and white) and visualize.

FIG. 9 is a diagram showing an example when the detected platinum group concentration w (wt%) is displayed on the display unit 40 such as a CRT, and the shaded portion indicates that the deposit is equal to or greater than the threshold value. .
9A shows a normal matrix in which no deposit is deposited, FIG. 9B shows an initial stage in which high-concentration metal particles accumulate, and FIG. 9C shows a deposit deposited and accumulated in a high concentration. This shows the state just before a short circuit that requires maintenance.

  According to the glass melting furnace 1, the irradiation antenna 21 covers a region including a ridge line where deposits are likely to be deposited in the outlet portion of the melting space 11, so that deposit accumulation can be efficiently grasped.

  Further, according to the glass melting furnace 1, the concentration distribution of the deposit can be visualized, so that, for example, even when the concentration distribution of the deposit is uneven and the deposit is deposited with partial protrusions, it is efficient. Can grasp. In addition, by grasping the concentration of the deposit, the degree of influence by the deposit can be grasped.

According to the glass melting furnace 1, the platinum group concentration w (wt%) can be efficiently calculated.
Further, since the signal intensity S of the received electromagnetic wave and the temperature T1 of the molten glass G are calculated with reference to the database 34A, the platinum group concentration w (wt%) can be easily calculated.

  In addition, the normal condition at the start of the operation of the glass melting furnace 1 is monitored, and when the high concentration platinum group is deposited across the energized electrodes, the recovery operation (e.g. removal of deposits and Cleaning operation) can be performed efficiently.

Further, as shown in FIG. 9, since the distribution of platinum group concentration w (wt%) can be displayed and visualized, the deposition status of the platinum group can be grasped efficiently and accurately, and the glass melting furnace 1 Can be operated efficiently to reduce operating costs and maintenance costs.
In addition, when the falling nozzle 19 is irradiated with electromagnetic waves, the platinum group concentration w of the molten glass G flowing down can be efficiently grasped while operating the glass melting furnace.

  Also, in the mock-up test for determining the optimum operating conditions, the optimum operating conditions can be established efficiently by correlating the amount of energized current and temperature distribution with the platinum group deposition.

Note that the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the invention.
For example, in the above embodiment, the case where the deposit is a molten glass G containing a platinum group deposited in a glass melting furnace has been described. However, if the substance has different electromagnetic wave reflection, transmission, and absorption characteristics, The present invention may be applied to other deposits.

  Moreover, although the case where the glass melting furnace 1 mixes the molten glass G and the radioactive waste liquid containing platinum group was demonstrated, for example, when mixed with the molten glass G and the molten glass G, detection by electromagnetic waves is possible. The present invention can also be applied when a substance other than the platinum group is mixed with the molten glass G.

  In the above embodiment, the case where the detected received wave is visualized by the signal processing unit 30 has been described. For example, the deposit is deposited when the signal level of the reflected wave is a predetermined value or more. It is good also as a structure only to grasp.

  Further, in the above-described embodiment, the case where the accumulation state of the deposit is calculated by collating with the data stored in the database 34A has been described. However, the regression equation obtained from the correlation between the accumulation state and the reflected wave in advance is used. It is good also as a structure to calculate.

  Further, the distribution state of the platinum group concentration w may be displayed by scanning and irradiating electromagnetic waves to the molten space 11 instead of the antenna element groups arranged in a matrix.

  In the above embodiment, the case where the receiving antenna 23 includes the reflected wave receiving antenna 23A and the transmitted wave receiving antenna 23B has been described. However, the receiving antenna 23 is either the reflected wave antenna 23A or the transmitted wave antenna 23B. You may comprise by one side.

Moreover, in the said embodiment, although the case where the irradiation antenna 21, the reflected wave antenna 23A, and the transmitted wave antenna 23B were arrange | positioned in the side of the glass melting furnace main body 10 was demonstrated, these arrangement positions are glass melting furnace main bodies. It may be above 10 or below 10.
In the above embodiment, the case where the lower part of the melting space 11 is a quadrangular pyramid space whose cross-sectional area decreases as it goes from the top to the bottom has been described. Alternatively, it may be formed in a cone.

  In the above embodiment, the case where the position and concentration of the deposit is calculated from the return time ΔT and the signal intensity S of the reflected wave has been described, but the reflected wave, the transmitted wave, and these can be obtained by comparing them. It is good also as a structure which acquires physical quantities other than the density | concentration regarding a deposit from a signal.

  In the above embodiment, the case where the deposit is detected using the antenna element group arranged in a matrix has been described. However, the electromagnetic wave irradiation target may be one point, multiple points, or a predetermined number. It can be arbitrarily set as to whether or not it is a range having the area. A scanning single antenna may also be used.

  In the above-described embodiment, the case where the irradiation antenna 21 in which a plurality of projecting antenna elements are arranged in a matrix is used has been described. For example, another type of antenna such as a horn antenna is used. Also good.

  In the above embodiment, the case where the refractory brick is formed of Al2O3 + Cr2O3 and the bonding material made of borosilicate glass is filled between the refractory brick and the refractory brick has been described. However, the refractory brick and the bonding material are heat resistant. Substances other than those described above may be used as long as they have properties and electrical insulation properties and are capable of transmitting electromagnetic waves.

Moreover, in the said embodiment, although the glass melting furnace 1 demonstrated the case where it provided with a pair of main electrode 16, a pair of auxiliary electrode 17, and one bottom electrode 18, only the main electrode 16 was demonstrated, for example. The configuration of the electrode, such as the configuration including the main electrode 16 and the auxiliary electrode 17 alone, can be arbitrarily set.
Further, regarding the current flowing between the electrodes, either an alternating current or a direct current may be passed.

G Molten glass G
DESCRIPTION OF SYMBOLS 1 Glass melting furnace 10 Melting furnace main body 11 Melting space 11A Deriving part 16 Main electrode 17 Auxiliary electrode 18 Bottom electrode 20 Deposit detection apparatus 21 Irradiation antenna (irradiation part)
23 Reception antenna (receiver)
23A Reflected wave receiving antenna (receiver)
23B Transmitted wave receiving antenna (receiver)
24 temperature sensor 25 detection unit 30 signal processing unit 31 input unit 33 calculation unit 34A database 35 output unit 40 display unit

Claims (4)

A glass melting furnace configured to store molten glass in a molten space formed of refractory bricks, and to discharge the stored molten glass from a flow nozzle connected to a lead-out portion below the molten space. And
An irradiation antenna composed of a plurality of antenna elements arranged in a matrix so as to cover the melting space, and capable of irradiating the melting space with electromagnetic waves,
A reflected wave antenna that receives the reflected wave reflected by the molten space by the electromagnetic wave irradiated by the irradiation antenna;
A transmitted wave antenna that receives the transmitted wave through which the electromagnetic wave irradiated by the irradiation antenna has passed through the molten space;
A plurality of temperature sensors arranged corresponding to the plurality of antenna elements and detecting the temperature of the molten glass;
The electromagnetic wave is fed to the irradiation antenna to irradiate the electromagnetic wave, and the reflected wave signal indicating the reflected wave received by the reflected wave antenna, the transmitted wave signal indicating the transmitted wave received by the transmitted wave antenna, and the temperature sensor Detecting portions each outputting a temperature measurement signal indicating the temperature of the molten glass detected by
Using the temperature of the molten glass as a parameter, a database storing a numerical table of correlation between the intensity of the reflected wave and the intensity of the transmitted wave and the concentration of white metals in the molten glass is stored, the reflected wave signal, the transmitted wave A glass processing furnace comprising: a signal processing unit that specifies white metal concentrations at positions corresponding to the plurality of antenna elements by searching the database based on a signal and the temperature measurement signal. The glass melting furnace according to claim 1,
The said signal processing part outputs the signal which binarized the white metal density | concentration of the position corresponding to these antenna elements, The glass melting furnace characterized by the above-mentioned. The glass melting furnace according to claim 1 or 2,
The glass processing furnace, wherein the signal processing unit outputs a signal obtained by quantizing white metal concentrations at positions corresponding to the plurality of antenna elements. A glass melting furnace according to claim 2 or 3,
The glass melting furnace further comprising a display unit that displays white metal concentrations at positions of the plurality of antenna elements based on a signal output from the signal processing unit.

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