JP5770113B2 - Metal foil composite, molded body and method for producing the same - Google Patents
Metal foil composite, molded body and method for producing the same Download PDFInfo
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- JP5770113B2 JP5770113B2 JP2012005279A JP2012005279A JP5770113B2 JP 5770113 B2 JP5770113 B2 JP 5770113B2 JP 2012005279 A JP2012005279 A JP 2012005279A JP 2012005279 A JP2012005279 A JP 2012005279A JP 5770113 B2 JP5770113 B2 JP 5770113B2
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/02—Alloys based on copper with tin as the next major constituent
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
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- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Description
本発明は、金属箔と樹脂層とを積層してなる金属箔複合体、並びに成形体及びその製造方法に関する。 The present invention is a metal foil composite body formed by laminating a metal foil and a resin layer, as well as moldings and a method for producing the same.
金属箔と樹脂層とを積層してなる金属箔複合体は、FPC(フレキシブルプリント基板)、電磁波シールド材、RF-ID(無線ICタグ)、面状発熱体、放熱体などに応用されている。例えば、FPCの場合、ベース樹脂層の上に金属箔の回路が形成され、回路を保護するカバーレイフィルムが回路を覆っており、樹脂層/金属箔/樹脂層の積層構造となっている。
Cu箔又はAl箔と、樹脂とを積層してなる金属箔積層体は、電磁波シールド材、照明機器のリフレクタなどに応用されている。Al箔を使用した積層体は、安価な回路材として使用されることもある。
ところで、このような金属箔複合体の加工性として、MIT屈曲性に代表される折り曲げ性、IPC屈曲性に代表される高サイクル屈曲性が要求されており、折り曲げ性や屈曲性に優れる金属箔複合体が提案されている(例えば、特許文献1〜3)。例えば、FPCは携帯電話のヒンジ部などの可動部で折り曲げられたり、回路の小スペース化を図るために折り曲げて使用されるが、変形モードとしては、上記したMIT屈曲試験や、IPC屈曲試験に代表されるように一軸の曲げであり、過酷な変形モードにならないよう設計されている。
Metal foil composites made by laminating metal foil and resin layers are applied to FPC (flexible printed circuit boards), electromagnetic shielding materials, RF-ID (wireless IC tags), planar heating elements, heat radiators, etc. . For example, in the case of FPC, a circuit of metal foil is formed on a base resin layer, and a coverlay film that protects the circuit covers the circuit, and has a laminated structure of resin layer / metal foil / resin layer.
Metal foil laminates obtained by laminating Cu foil or Al foil and resin are applied to electromagnetic wave shielding materials, reflectors for lighting equipment, and the like. A laminate using an Al foil may be used as an inexpensive circuit material.
By the way, as a workability of such a metal foil composite, a bendability represented by MIT bendability and a high cycle bendability represented by IPC bendability are required, and a metal foil excellent in bendability and bendability. Complexes have been proposed (for example, Patent Documents 1 to 3). For example, FPC can be bent at a movable part such as a hinge part of a mobile phone, or it can be bent to reduce the circuit space. Deformation modes include the MIT bending test and the IPC bending test described above. As represented, it is uniaxial bending and is designed not to be in a severe deformation mode.
しかしながら、上記した金属箔複合体をプレス加工等すると、MIT屈曲試験や、IPC屈曲試験と異なる過酷(複雑)な変形モードになるため、金属箔が破断するという問題がある。そして、金属箔複合体をプレス加工することができれば、回路を含む構造体を製品形状に合わせることができるようになる。
従って、本発明の目的は、プレス加工等のような一軸曲げと異なる過酷(複雑)な変形を行っても金属箔が割れることを防止し、加工性に優れた金属箔複合体、並びに成形体及びその製造方法を提供することにある。
However, when the above metal foil composite is pressed or the like, a severe (complex) deformation mode different from the MIT bending test or the IPC bending test is brought about, so that there is a problem that the metal foil is broken. If the metal foil composite can be pressed, the structure including the circuit can be matched to the product shape.
Accordingly, an object of the present invention are single bend different severe (complex) deformation be performed to prevent the metal foil is broken, excellent formability metal foil composites such as press working or the like, as well as moldings And a manufacturing method thereof.
本発明者らは、樹脂層の変形挙動を金属箔に伝え、樹脂層と同じように金属箔も変形させることで、金属箔のくびれを生じにくくして延性が向上し、金属箔の割れを防止できることを見出し、本発明に至った。つまり、樹脂層の変形挙動が金属箔に伝わるよう、樹脂層及び金属箔の特性を規定した。
すなわち、本発明の金属箔複合体は、厚み50μm以下、破断歪が4%以上、Ag、Sn、In、Au、Mn、Ni、及びZnの群から選ばれる1種又は2種以上を質量率で合計30ppm〜500ppm含有する銅箔であって、平均結晶粒径が10μm以上であり、さらに、結晶粒径が10μmを超える結晶粒において、(前記銅箔の表面から観察した銅箔の結晶粒の最大内接円の直径の平均値)/(前記銅箔の表面から観察した銅箔の結晶粒の最小外接円の直径の平均値)で表される比Rが、0.5≦R≦0.8を満たす銅箔と、厚み120μm以下の樹脂層とが積層された金属箔複合体であって、前記銅箔の厚みをt2(mm)、引張歪4%における前記銅箔の応力をf2(MPa)、前記樹脂層の厚みをt3(mm)、引張歪4%における前記樹脂層の応力をf3(MPa)としたとき、式1:(f3×t3)/(f2×t2)≧1を満たし、かつ、前記銅箔と前記樹脂層との180°剥離接着強度をf1(N/mm)、前記金属箔複合体の引張歪30%における強度をF(MPa)、前記金属箔複合体の厚みをT(mm)としたとき、式2:1≦33f1/(F×T)を満たす。
The present inventors transmit the deformation behavior of the resin layer to the metal foil, and by deforming the metal foil in the same manner as the resin layer, the metal foil is less likely to be constricted and the ductility is improved. The inventors have found that this can be prevented, and have reached the present invention. That is, the characteristics of the resin layer and the metal foil were defined so that the deformation behavior of the resin layer was transmitted to the metal foil.
That is, the metal foil composite of the present invention has a thickness of 50 μm or less, a fracture strain of 4% or more , and one or more selected from the group consisting of Ag, Sn, In, Au, Mn, Ni, and Zn. In a copper foil containing a total of 30 ppm to 500 ppm , the average crystal grain size is 10 μm or more, and the crystal grain size exceeds 10 μm, the crystal grain of the copper foil observed from the surface of the copper foil The ratio R expressed by: (average value of the diameter of the maximum inscribed circle) / (average value of the diameter of the minimum circumscribed circle of the crystal grains of the copper foil observed from the surface of the copper foil) is 0.5 ≦ R ≦ 0.8 A metal foil composite in which a filling copper foil and a resin layer having a thickness of 120 μm or less are laminated, wherein the thickness of the copper foil is t 2 (mm), and the stress of the copper foil at a tensile strain of 4% is f 2 ( MPa), where the thickness of the resin layer is t 3 (mm), and the stress of the resin layer at a tensile strain of 4% is f 3 (MPa), Equation 1: (f 3 × t 3 ) / (F 2 × t 2 ) ≧ 1, and the 180 ° peel adhesion strength between the copper foil and the resin layer is f 1 (N / mm), and the strength at 30% tensile strain of the metal foil composite Is F (MPa), and the thickness of the metal foil composite is T (mm), the formula 2: 1 ≦ 33f 1 / (F × T) is satisfied.
前記樹脂層のガラス転移温度未満の温度において、前記式1及び式2が成り立つことが好ましい。
前記金属箔複合体の引張破断歪lと、前記樹脂層単体の引張破断歪Lとの比l/Lが0.7〜1であることが好ましい。
It is preferable that Formula 1 and Formula 2 hold at a temperature lower than the glass transition temperature of the resin layer.
It is preferable that the ratio 1 / L between the tensile breaking strain 1 of the metal foil composite and the tensile breaking strain L of the resin layer alone is 0.7-1.
本発明の成形体は、前記金属箔複合体を加工してなる。本発明の成形体は、例えばプレス加工、上下金型を用いた張出し加工、絞り加工する他の加工等によって立体的に加工することができる。
本発明の成形体の製造方法は、前記金属箔複合体を加工する。
The molded body of the present invention is obtained by processing the metal foil composite. The molded body of the present invention can be three-dimensionally processed by, for example, pressing, overhanging using upper and lower molds, or other processing for drawing.
The manufacturing method of the molded object of this invention processes the said metal foil composite.
本発明によれば、プレス加工等のような一軸曲げと異なる過酷(複雑)な変形を行っても金属箔が割れることを防止し、加工性に優れた金属箔複合体を得ることができる。 According to the present invention, it is possible to prevent the metal foil from cracking even when severe (complex) deformation different from uniaxial bending such as pressing is performed, and to obtain a metal foil composite excellent in workability.
本発明の金属箔複合体は、金属箔と樹脂層とが積層されて構成されている。本発明の金属箔複合体は、例えば、FPC(フレキシブルプリント基板)、電磁波シールド材、RF-ID(無線ICタグ)、面状発熱体、放熱体に適用することができるが、これらに限定される訳ではない。 The metal foil composite of the present invention is configured by laminating a metal foil and a resin layer. The metal foil composite of the present invention can be applied to, for example, an FPC (flexible printed circuit board), an electromagnetic wave shielding material, an RF-ID (wireless IC tag), a planar heating element, and a radiator, but is not limited thereto. It doesn't mean.
<金属箔>
金属箔は、以下の組成の銅箔、アルミニウム箔、ニッケル箔、ステンレス箔、軟鋼箔、Fe-Ni合金箔又は洋白箔からなる。
銅箔は、Ag、Sn、In、Au、Mn、Ni、及びZnの群から選ばれる1種又は2種以上の添加元素を質量率で合計30ppm〜500ppm含有する組成とする。この組成とすると、銅箔の冷間圧延時や冷間圧延後に動的(または静的)に回復すること(転位密度が減少すること)を抑制することができる。そして、このため、冷間圧延後の熱処理で再結晶したときに銅箔の結晶粒径が粗大になり易くなってf2、Fを小さくすることができ、(f3×t3)/(f2×t2)、33f1/(F×T)を大きな値とすることができ、複合体にしたときに優れた加工性を得ることができる。
上記添加元素の合計含有量が30ppm未満であると上記した効果が小さく、合計含有量が500ppmを超えると再結晶したときにかえって結晶粒が微細化し易くなると共に、合金化による強度上昇のためf2が上昇し、(f3×t3)/(f2×t2)、33f1/(F×T)は小さくなる。
<Metal foil>
The metal foil is made of a copper foil, an aluminum foil, a nickel foil, a stainless steel foil, a mild steel foil, a Fe—Ni alloy foil or a white foil having the following composition.
The copper foil has a composition containing one or more additive elements selected from the group consisting of Ag, Sn, In, Au, Mn, Ni, and Zn in a total mass of 30 ppm to 500 ppm. If it is set as this composition, it can suppress recovering dynamically (or static) at the time of cold rolling of copper foil, or after cold rolling (reduction of a dislocation density). For this reason, when recrystallization is performed by heat treatment after cold rolling, the crystal grain size of the copper foil tends to become coarse, and f 2 and F can be reduced, and (f 3 × t 3 ) / ( f 2 × t 2 ) and 33f 1 / (F × T) can be set to large values, and excellent workability can be obtained when a composite is formed.
When the total content of the additive elements is less than 30 ppm, the above-described effect is small, and when the total content exceeds 500 ppm, the crystal grains are more easily refined when recrystallized, and the strength is increased by alloying. 2 rises, and (f 3 × t 3 ) / (f 2 × t 2 ) and 33f 1 / (F × T) become smaller.
アルミニウム箔はAlを99質量%以上含み、具体的には、JIS H 4000に記載の合金番号1085、1080、1070、1050、1100、1200、1N00、1N30に代表される、Al:99.00質量%以上のアルミニウムが柔らかくて好ましい。
ニッケル箔はNiを99質量%以上含み、具体的には、JIS H4551に記載の合金番号NW2200、NW2201に代表される、Ni:99.0質量%以上のNi箔が柔らかくて好ましい。
ステンレス箔は、板厚を薄くすることができるSUS301、SUS 304、SUS 316、SUS 430、SUS 631(いずれもJIS規格)のいずれかからなるステンレス箔が好ましい。
軟鋼箔は、炭素が0.15質量%以下の軟らかい軟鋼が好ましく、JIS G3141に記載の鋼板をもとに作製することが好ましい。
Fe-Ni合金箔は、Niを35〜85質量%含み、残部がFe及び不可避不純物かなり、を具体的には、JIS C2531に記載のFe-Ni合金をもとに合金箔を作製することが好ましい。
洋白は、JIS H 3110に記載の合金番号C7351、C7521、C7541からなる箔が好ましい。
Aluminum foil contains 99% by mass or more of Al, specifically, alloy numbers 1085, 1080, 1070, 1050, 1100, 1200, 1N00, 1N30 described in JIS H 4000, Al: 99.00% by mass or more Aluminum is soft and preferred.
The nickel foil contains 99 mass% or more of Ni, and specifically, Ni foil of 99.0 mass% or more represented by alloy numbers NW2200 and NW2201 described in JIS H4551 is soft and preferable.
The stainless steel foil is preferably a stainless steel foil made of any one of SUS301, SUS304, SUS316, SUS430, and SUS631 (all JIS standards) that can reduce the plate thickness.
The mild steel foil is preferably a soft mild steel having 0.15% by mass or less of carbon, and is preferably produced based on the steel sheet described in JIS G3141.
The Fe—Ni alloy foil contains 35 to 85% by mass of Ni, and the balance is considerably Fe and inevitable impurities. Specifically, an alloy foil can be produced based on the Fe—Ni alloy described in JIS C2531. preferable.
The white is preferably a foil made of alloy numbers C7351, C7521 and C7541 described in JIS H 3110.
金属箔の厚みt2は、0.004〜0.05mm(4〜50μm)であることが好ましい。t2が0.004mm(4μm)未満であると金属箔の延性が著しく低下し、金属箔複合体の加工性が向上しない場合がある。金属箔は4%以上の引張破断歪があることが好ましい。t2が0.05mm(50μm)を超えると、金属箔複合体にしたときに金属箔単体の特性の影響が大きく現れ、金属箔複合体の加工性が向上しない場合がある。
金属箔としては、圧延金属箔、電解金属箔、メタライズによる金属箔等を用いることができるが、再結晶により加工性に優れつつ、強度(f2)を低くできる圧延金属箔が好ましい。金属箔表面に接着、防錆のための処理層が形成されている場合はそれらも金属箔に含めて考える。
The thickness t 2 of the metal foil is preferably 0.004~0.05mm (4~50μm). t 2 is decreased significantly the ductility of the metal foil is less than 0.004 mm (4 [mu] m), there is a case where workability of the metal foil composite is not improved. The metal foil preferably has a tensile breaking strain of 4% or more. If t 2 is more than 0.05 mm (50 [mu] m), the influence of the metal foil single properties when the metal foil composite appears large, there is a case where workability of the metal foil composite is not improved.
As the metal foil, a rolled metal foil, an electrolytic metal foil, a metal foil made of metallization, or the like can be used, and a rolled metal foil that can reduce strength (f 2 ) while being excellent in workability by recrystallization is preferable. If a treatment layer for adhesion and rust prevention is formed on the surface of the metal foil, these are also included in the metal foil.
<樹脂層>
樹脂層としては特に制限されず、樹脂材料を金属箔に塗布して樹脂層を形成してもよいが、金属箔に貼付可能な樹脂フィルムが好ましい。樹脂フィルムとしては、PET(ポリエチレンテレフタレート)フィルム、PEN(ポリエチレンナフタレート)、PI(ポリイミド)フィルム、LCP(液晶ポリマー)フィルム、PP(ポリプロピレン)フィルムが挙げられる。
樹脂フィルムと金属箔との積層方法としては、樹脂フィルムと金属箔との間に接着剤を用いてもよく、樹脂フィルムを金属箔に熱圧着してもよい。又、接着剤層の強度が低いと、金属箔複合体の加工性が向上し難いので、接着剤層の強度が樹脂層の応力(f3)の1/3以上であることが好ましい。これは、本発明では、樹脂層の変形挙動を金属箔に伝え、樹脂層と同じように金属箔も変形させることで、金属箔のくびれを生じにくくして延性が向上させることを技術思想としており、接着剤層の強度が低いと接着剤層で変形が緩和してしまい、金属箔に樹脂の挙動が伝わらないからである。
なお、接着剤を用いる場合、後述する樹脂層の特性は、接着剤層と樹脂層とを合わせたものを対象とする。
<Resin layer>
The resin layer is not particularly limited, and a resin layer may be formed by applying a resin material to a metal foil, but a resin film that can be attached to the metal foil is preferable. Examples of the resin film include PET (polyethylene terephthalate) film, PEN (polyethylene naphthalate), PI (polyimide) film, LCP (liquid crystal polymer) film, and PP (polypropylene) film.
As a method for laminating the resin film and the metal foil, an adhesive may be used between the resin film and the metal foil, or the resin film may be thermocompression bonded to the metal foil. In addition, if the strength of the adhesive layer is low, it is difficult to improve the workability of the metal foil composite. Therefore, the strength of the adhesive layer is preferably 1/3 or more of the stress (f 3 ) of the resin layer. In the present invention, the technical idea is that the deformation behavior of the resin layer is transmitted to the metal foil, and the metal foil is also deformed in the same manner as the resin layer, so that the metal foil is hardly constricted and the ductility is improved. This is because if the strength of the adhesive layer is low, deformation is relaxed by the adhesive layer, and the behavior of the resin is not transmitted to the metal foil.
In addition, when using an adhesive agent, the characteristic of the resin layer mentioned later targets what combined the adhesive bond layer and the resin layer.
樹脂層の厚みt3は、0.012〜0.12mm(12〜120μm)であることが好ましい。t3が0.012mm(12μm)未満であると、(f3×t3)/(f2×t2)<1となることがある。t3が0.12mm(120μm)より厚いと、樹脂層の柔軟性(フレキシブル性)が低下して剛性が高くなり過ぎ、加工性が劣化する。樹脂層は40%以上の引張破断歪があることが好ましい。 The thickness t 3 of the resin layer is preferably 0.012 to 0.12 mm (12 to 120 μm). If t 3 is less than 0.012 mm (12 μm), (f 3 × t 3 ) / (f 2 × t 2 ) <1 in some cases. When t 3 is thicker than 0.12 mm (120 [mu] m), too high rigidity decreases the flexibility of the resin layer (flexibility) is, workability is deteriorated. The resin layer preferably has a tensile breaking strain of 40% or more.
<金属箔複合体>
上記した金属箔と樹脂層とを積層する金属箔複合体の組み合わせとしては、金属箔/樹脂層の2層構造や、樹脂層/金属箔/樹脂層、又は金属箔/樹脂層/金属箔の3層構造が挙げられる。金属箔の両側に樹脂層が存在する(樹脂層/金属箔/樹脂層)場合、全体の(f3×t3)の値は、2つの樹脂層のそれぞれについて計算した各(f3×t3)の値を加算したものとする。樹脂層の両側に金属箔が存在する(金属箔/樹脂層/金属箔)場合、全体の(f2×t2)の値は、2つの金属箔のそれぞれについて計算した各(f2×t2)の値を加算したものとする。
<Metal foil composite>
As a combination of the metal foil composite in which the metal foil and the resin layer are laminated, the two-layer structure of metal foil / resin layer, resin layer / metal foil / resin layer, or metal foil / resin layer / metal foil A three-layer structure is mentioned. When resin layers exist on both sides of the metal foil (resin layer / metal foil / resin layer), the total value of (f 3 × t 3 ) is calculated for each of the two resin layers (f 3 × t 3 ) The value of 3 ) shall be added. When metal foil exists on both sides of the resin layer (metal foil / resin layer / metal foil), the total value of (f 2 × t 2 ) is calculated for each of the two metal foils (f 2 × t It is assumed that the value of 2 ) is added.
<180°剥離接着強度>
金属箔はその厚みが薄いことから厚み方向にくびれを生じやすい。くびれが生じると金属箔は破断するため、延性は低下する。一方、樹脂層は、引張り時にくびれが生じ難い特徴を持つ(均一歪の領域が広い)。そのため、金属箔と樹脂層との複合体においては、樹脂層の変形挙動を金属箔に伝え、樹脂と同じように金属箔も変形させることで、金属箔にくびれが生じ難くなり、延性が向上する。このとき、金属箔と樹脂層との接着強度が低いと、金属箔に樹脂層の変形挙動を伝えることができず、延性は向上しない(剥離して銅が割れる)。
そこで、接着強度を高くすることが必要となる。接着強度としては、せん断接着力が直接的な指標と考えられるが、接着強度を高くし、せん断接着力を金属箔複合体の強度と同等レベルにすると、接着面以外の場所が破断するため測定が難しくなる。
<180 ° peel strength>
Since the metal foil is thin, it tends to be constricted in the thickness direction. When the constriction occurs, the metal foil breaks, and the ductility decreases. On the other hand, the resin layer has a feature that it is difficult for necking to occur when it is pulled (the region of uniform strain is wide). Therefore, in the composite of metal foil and resin layer, the deformation behavior of the resin layer is transmitted to the metal foil, and the metal foil is also deformed in the same way as the resin, so that the metal foil is less likely to be constricted and the ductility is improved. To do. At this time, if the adhesive strength between the metal foil and the resin layer is low, the deformation behavior of the resin layer cannot be transmitted to the metal foil, and the ductility is not improved (peeling and cracking copper).
Therefore, it is necessary to increase the adhesive strength. As for adhesive strength, shear adhesive strength is considered to be a direct indicator. However, if the adhesive strength is increased and the shear adhesive strength is set to the same level as the strength of the metal foil composite, measurement is performed because the location other than the adhesive surface breaks. Becomes difficult.
このようなことから、本発明では180°剥離接着強度f1の値を用いる。せん断接着強度と180°剥離接着強度とは絶対値がまったく異なるが、加工性や引張伸度と、180°剥離接着強度との間に相関が見られたため、180°剥離接着強度を接着強度の指標とした。
ここで、実際には、「破断したときの強度=せん断密着力」になっていると考えられ、例えば30%以上の引張歪を必要とするような場合、「30%の流動応力≦せん断密着力」となり、50%以上の引張歪を必要とするような場合、「50%の流動応力≦せん断密着力」になると考えられる。そして、本発明者らの実験によると、引張歪が30%以上になると加工性が良好になったため、後述するように金属箔複合体の強度Fとして、引張歪30%における強度を採用することとしている。
For this reason, the value of 180 ° peel adhesion strength f 1 is used in the present invention. Although the absolute values of shear bond strength and 180 ° peel adhesive strength are completely different, there was a correlation between workability, tensile elongation, and 180 ° peel adhesive strength. It was used as an index.
Here, in reality, it is considered that “strength at break = shear adhesion strength”. For example, when a tensile strain of 30% or more is required, “30% flow stress ≦ shear adhesion” When the tensile strain of 50% or more is required, it is considered that “50% flow stress ≦ shear adhesion”. And, according to the experiments by the present inventors, the workability was improved when the tensile strain was 30% or more, and as described later, the strength at the tensile strain of 30% was adopted as the strength F of the metal foil composite. It is said.
図1は、f1と(F×T)の関係を実験的に示す図であり、後述する各実施例及び比較例のf1と(F×T)の値をプロットしている。(F×T)は引張歪30%で金属箔複合体に加わる力であり、これを加工性を向上するために必要な、最低限のせん断接着強度とみなすと、f1と(F×T)の絶対値が同じであれば、両者は傾き1で相関が見られることになる。
但し、図1においては、すべてのデータのf1と(F×T)が同じ相関とはならず、加工性の劣る各比較例は、(F×T)に対するf1の相関係数(つまり、図1の原点を通り、(F×T)に対するf1の傾き)が小さく、それだけ180°剥離接着強度が劣っている。一方、各実施例の傾きは各比較例の傾きより大きいが、もっとも傾きの小さい実施例22(ちょうど歪30%で破断したもの)の傾きが1/33であったため、この値を、加工性を向上するために必要な最低限のせん断接着強度と180°剥離接着強度との間の相関係数とみなした。すなわち、せん断接着力を、180°剥離接着強度f1の33倍とみなした。
なお、比較例3、6、10の場合、図1の傾きが1/33を超えたが、後述する式1:(f3×t3)/(f2×t2)が1未満となったため、加工性が劣化している。
図1において、○が実施例を示し、×が比較例を示す。
Figure 1 is a diagram showing experimentally the relationship f 1 and (F × T), are plotted the values of f 1 of each of the following examples and comparative examples (F × T). (F × T) is a force applied to the metal foil composite with a tensile strain of 30%. When this is regarded as the minimum shear adhesive strength necessary for improving the workability, f 1 and (F × T ) Have the same absolute value, they are correlated with a slope of 1.
However, in FIG. 1, f 1 and (F × T) of all data do not have the same correlation, and each comparative example with inferior workability has a correlation coefficient of f 1 with respect to (F × T) (that is, , through the origin of Figure 1, it is inferior f 1 gradient) is small relative to it by 180 ° peel adhesive strength (F × T). On the other hand, the slope of each example is larger than the slope of each comparative example, but the slope of Example 22 with the smallest slope (just broken at 30% strain) was 1/33. The correlation coefficient between the minimum shear bond strength and 180 ° peel bond strength required to improve That is, the shear adhesive strength was regarded as 33 times the 180 ° peel adhesive strength f 1.
In the case of Comparative Examples 3, 6, and 10, the slope of FIG. 1 exceeded 1/33, but the expression 1: (f 3 × t 3 ) / (f 2 × t 2 ) described later is less than 1. Therefore, workability has deteriorated.
In FIG. 1, ◯ indicates an example and × indicates a comparative example.
180°剥離接着強度は、単位幅あたりの力(N/mm)である。
金属箔複合体が3層構造であって接着面が複数存在するときは、各接着面のうち、180°剥離接着強度が最も低い値を用いる。これは、最も弱い接着面が剥離するためである。又、銅箔の場合、通常S面、M面を有するが、S面は密着性が劣るため、銅箔のS面と樹脂との密着性が弱くなる。そのため、銅箔のS面の180°剥離接着強度を採用することが多い。
The 180 ° peel strength is a force per unit width (N / mm).
When the metal foil composite has a three-layer structure and there are a plurality of adhesion surfaces, the value having the lowest 180 ° peel adhesion strength among the adhesion surfaces is used. This is because the weakest adhesive surface peels off. In addition, the copper foil usually has an S surface and an M surface. However, since the S surface is inferior in adhesion, the adhesion between the S surface of the copper foil and the resin is weakened. Therefore, the 180 ° peel adhesion strength of the S surface of the copper foil is often adopted.
銅箔と樹脂層との接着強度を高くする方法としては、金属箔表面(樹脂層側の面)にクロメート処理等によってCr酸化物層を設けたり、金属箔表面に粗化処理を施したり、金属箔表面にNi被覆した後にCr酸化物層を設けることが挙げられる。
Cr酸化物層の厚みは、Cr重量で5〜100μg/dm2とするとよい。この厚みは、湿式分析によるクロム含有量から算出する。又、Cr酸化物層の存在は、X線光電子分光(XPS)でCrが検出できるか否かで判定することができる(Crのピークが酸化によりシフトする)。
Ni被覆量は、90〜5000μg/dm2とするとよい。Ni被覆の付着量が5000μg/dm2(Ni厚み56nmに相当)を超えると、金属箔(及び金属箔複合体)の延性が低下することがある。
一方、Al箔、Ni箔、ステンレス箔、軟鋼箔、Fe-Ni合金箔、洋白箔は銅箔と比較すると樹脂層との密着性に勝るため、表面処理を施さなくても樹脂層との密着性が高い場合が多い。但し、これらの金属箔において樹脂層との密着性が低い場合、密着性を向上させるために金属箔表面の洗浄処理やめっき処理を施すと良い。
また、金属箔と樹脂層とを積層複合させるときの圧力や温度条件を変えて接着強度を高くすることができる。樹脂層が損傷しない範囲で、積層時の圧力、温度をともに大きくした方が良い。
As a method of increasing the adhesive strength between the copper foil and the resin layer, a metal oxide surface (surface on the resin layer side) is provided with a Cr oxide layer by chromate treatment, or the metal foil surface is subjected to a roughening treatment, For example, a Cr oxide layer may be provided after Ni is coated on the surface of the metal foil.
The thickness of the Cr oxide layer is preferably 5 to 100 μg / dm 2 in terms of Cr weight. This thickness is calculated from the chromium content by wet analysis. The presence of the Cr oxide layer can be determined by whether or not Cr can be detected by X-ray photoelectron spectroscopy (XPS) (Cr peak is shifted by oxidation).
The Ni coating amount is preferably 90 to 5000 μg / dm 2 . When the adhesion amount of Ni coating exceeds 5000 μg / dm 2 (corresponding to Ni thickness 56 nm), the ductility of the metal foil (and the metal foil composite) may be lowered.
On the other hand, Al foil, Ni foil, stainless steel foil, mild steel foil, Fe-Ni alloy foil, and white foil have better adhesion to the resin layer compared to copper foil, so even without surface treatment, In many cases, the adhesion is high. However, when these metal foils have low adhesion to the resin layer, the metal foil surface may be subjected to cleaning treatment or plating treatment in order to improve adhesion.
Further, the adhesive strength can be increased by changing the pressure and temperature conditions when the metal foil and the resin layer are laminated and combined. It is better to increase both the pressure and temperature during lamination as long as the resin layer is not damaged.
<(f3×t3)/(f2×t2)>
次に、特許請求の範囲の((f3×t3)/(f2×t2))(以下、「式1」と称する)の意義について説明する。金属箔複合体は、同一の幅(寸法)の金属箔と樹脂層とが積層されているから、式1は金属箔複合体を構成する金属箔と樹脂層に加わる力の比を表している。従って、この比が1以上であることは、樹脂層側により多くの力が加わることを意味し、樹脂層側が金属箔より強度が高いことになる。そして、金属箔は破断せずに良好な加工性を示す。
一方、(f3×t3)/(f2×t2)<1になると、金属箔側により多くの力が加わってしまうので、樹脂層の変形挙動を金属箔に伝え、樹脂と同じように金属箔を変形させるという上記した作用が生じなくなる。
ここで、f2及びf3は、塑性変形が起きた後の同じ歪量での応力であればよいが、金属箔の引張破断歪と、樹脂層(例えばPETフィルム)の塑性変形が始まる歪とを考慮して引張歪4%の応力としている。なお、f2及びf3(並びにf1)は、全てMD(Machine Direction)の値とする。
<(F 3 × t 3 ) / (f 2 × t 2 )>
Next, the meaning of ((f 3 × t 3 ) / (f 2 × t 2 )) (hereinafter referred to as “Formula 1”) in the claims will be described. Since the metal foil composite is formed by laminating a metal foil and a resin layer having the same width (dimension), Equation 1 represents a ratio of forces applied to the metal foil and the resin layer constituting the metal foil composite. . Therefore, this ratio of 1 or more means that more force is applied to the resin layer side, and the resin layer side has higher strength than the metal foil. And metal foil shows favorable workability, without fracture | rupturing.
On the other hand, when (f 3 × t 3 ) / (f 2 × t 2 ) <1, more force is applied to the metal foil side, so that the deformation behavior of the resin layer is transmitted to the metal foil, which is the same as the resin. The above-described action of deforming the metal foil does not occur.
Here, f 2 and f 3 may be stresses with the same amount of strain after plastic deformation has occurred, but the tensile fracture strain of the metal foil and the strain at which plastic deformation of the resin layer (eg, PET film) starts. Therefore, the stress is 4% tensile strain. Note that f 2 and f 3 (and f 1 ) are all MD (Machine Direction) values.
<33f1/(F×T)>
次に、特許請求の範囲の(33f1/(F×T))(以下、「式2」と称する)の意義について説明する。上記したように、加工性を向上するために必要な、最低限の金属箔と樹脂層との接着強度を直接示すせん断接着力は、180°剥離接着強度f1の約33倍であるから、33f1は金属箔と樹脂層との加工性を向上するために必要な、最低限の接着強度を表している。一方、(F×T)は金属箔複合体に加わる力であるから、式2は、金属箔と樹脂層との接着強度と、金属箔複合体の引張抵抗力との比になる。そして、金属箔複合体が引張られると、金属箔と樹脂層の界面で、局所変形をしようとする金属箔と引張均一歪をしようとする樹脂とによりせん断応力が掛かる。従って、このせん断応力より接着強度が低いと銅と樹脂層が剥離してしまい、金属箔に樹脂層の変形挙動を伝えることができなくなり、金属箔の延性が向上しない。
つまり、式2の比が1未満であると、接着強度が金属箔複合体に加わる力より弱くなって金属箔と樹脂が剥離し易くなり、金属箔がプレス成形等の加工によって破断する。
式2の比が1以上であれば、銅と樹脂層とが剥離せずに樹脂層の変形挙動を金属箔に伝えることができ、金属箔の延性が向上する。なお、式2の比は高いほど好ましいが、10以上の値を実現することは通常は困難であるため、式2の上限を10とするとよい。
尚、33f1/(F×T)が大きいほど加工性は向上すると考えられるが、樹脂層の引張歪lと33f1/(F×T)は比例しない。これは(f3×t3)/(f2×t2)の大きさ、金属箔、樹脂層単体の延性の影響によるものであるが、33f1/(F×T)≧1、(f3×t3)/(f2×t2)≧1を満たす金属箔と樹脂層の組み合わせであれば、必要とする加工性を有する複合体を得ることができる。
<33f 1 / (F × T)>
Next, the meaning of (33f 1 / (F × T)) (hereinafter referred to as “
That is, when the ratio of
If the ratio of
Although it is considered that as 33f 1 / (F × T) is larger, the workability is improved, the tensile strain 1 of the resin layer is not proportional to 33f 1 / (F × T). This is due to the influence of the size of (f 3 × t 3 ) / (f 2 × t 2 ), the ductility of the metal foil and the resin layer alone, but 33f 1 / (F × T) ≧ 1, (f If it is a combination of a metal foil and a resin layer satisfying 3 × t 3 ) / (f 2 × t 2 ) ≧ 1, a composite having the required workability can be obtained.
ここで、金属箔複合体の強度Fとして、引張歪30%における強度を用いるのは、上記したように引張歪が30%以上になると加工性が良好になったためである。又、金属箔複合体の引張試験をしたところ、引張歪30%までは歪によって流動応力に大きな差が生じたが、30%以後では引張歪によっても流動応力に大きな差が生じなかった(多少加工硬化したが曲線の傾きはかなり小さくなった)からである。
なお、金属箔複合体の引張歪が30%以上でない場合、金属箔複合体の引張強度をFとする。
Here, the strength at the tensile strain of 30% is used as the strength F of the metal foil composite because the workability is improved when the tensile strain is 30% or more as described above. In addition, when a tensile test of the metal foil composite was performed, a large difference in flow stress was caused by the strain up to 30% tensile strain, but no significant difference in flow stress was caused by the tensile strain after 30% (somewhat This is because the work was hardened but the slope of the curve was considerably reduced.
When the tensile strain of the metal foil composite is not 30% or more, F is the tensile strength of the metal foil composite.
なお、金属箔が銅箔の場合、金属箔複合体の加工性が銅箔の結晶粒形状に大きく影響される。そして、銅箔の結晶粒が小さすぎると加工性が劣化し割れやすくなったため、平均結晶粒を10μm以上とすることが好ましい。また、結晶粒が大きい場合、圧延方向に長く伸びた大きな結晶粒の形状が等方的でないとやはり加工性が劣化し割れやすくなった。そこで、結晶粒径が10μmを超える結晶粒において、「(板面方位から観察した銅箔の結晶粒の最大内接円の直径の平均値)/(板面方位から観察した銅箔の結晶粒の最小外接円の直径の平均値)」で表される値(比)Rを0.5以上とすることが好ましい。Rが1に近い方が等方的な形状をしているが、圧延後の銅箔は圧延方向に結晶粒が伸びる傾向にあり、Rを0.8以上にすることが困難であったため、Rの上限は通常は0.8以下である。
上記した結晶粒径が10μmを超える結晶粒は、銅箔表面の0.1×0.1mmの面積について測定する。
In addition, when metal foil is copper foil, the workability of a metal foil composite is greatly influenced by the crystal grain shape of copper foil. And, if the crystal grains of the copper foil are too small, the workability deteriorates and it is easy to crack, so the average crystal grain is preferably set to 10 μm or more. In addition, when the crystal grains are large, if the shape of the large crystal grains extending in the rolling direction is not isotropic, the workability is deteriorated and the cracks are easily broken. Therefore, in a crystal grain having a crystal grain size exceeding 10 μm, “(average value of the diameter of the maximum inscribed circle of the copper foil crystal grain observed from the plane orientation) / (copper foil crystal grain observed from the plane orientation) It is preferable that the value (ratio) R represented by “the average value of the diameters of the minimum circumscribed circles” is 0.5 or more. The direction where R is close to 1 has an isotropic shape, but the copper foil after rolling tends to have crystal grains extending in the rolling direction, and it was difficult to make R 0.8 or more. The upper limit is usually 0.8 or less.
The crystal grains whose crystal grain size exceeds 10 μm are measured with respect to an area of 0.1 × 0.1 mm on the surface of the copper foil.
以上のように、本発明の金属箔複合体は、プレス加工等のような一軸曲げと異なる過酷(複雑)な変形を行っても金属箔が割れることを防止し、加工性に優れる。特に本発明は、プレス加工のような立体成形に適する。金属箔複合体を立体成形することで、金属箔複合体を複雑な形状にしたり、金属箔複合体の強度を向上させることができ、例えば金属箔複合体自身を各種電源回路の筐体とすることもでき、部品点数やコストの低減を図ることができる。 As described above, the metal foil composite of the present invention is excellent in workability by preventing the metal foil from cracking even when severe deformation (complex) different from uniaxial bending such as pressing is performed. In particular, the present invention is suitable for three-dimensional molding such as press working. By forming the metal foil composite in three dimensions, the metal foil composite can be made into a complicated shape or the strength of the metal foil composite can be improved. For example, the metal foil composite itself can be used as a casing for various power supply circuits. The number of parts and cost can be reduced.
<l/L>
金属箔複合体の引張破断歪lと、樹脂層単体の引張破断歪Lとの比l/Lが0.7〜1であることが好ましい。
通常、金属箔の引張破断歪より樹脂層の引張破断歪が圧倒的に高く、同様に樹脂層単体の破断歪の方が金属箔複合体の引張破断歪より圧倒的に高い。一方、上記したように本発明においては、金属箔に樹脂層の変形挙動を伝えて金属箔の延性を向上させており、それに伴って金属箔複合体の引張破断歪を樹脂層単体の引張破断歪の70〜100%まで向上させることができる。そして、比l/Lが0.7以上であると、プレス成形性がさらに向上する。
なお、金属箔複合体の引張破断歪lは、引張試験を行ったときの引張破断歪伸びであり、樹脂層と金属箔が同時に破断したときはその値とし、金属箔が先に破断したときは金属箔が破断した時点の値とする。又、樹脂層単体の引張破断歪Lは、金属箔両面に樹脂層がある場合、両方の樹脂層のそれぞれについて引張試験を行って引張破断歪を測定し、値の大きいほうの引張破断歪をLとする。金属箔両面に樹脂層がある場合、金属箔を除去して生じた2つの樹脂層のそれぞれについて測定する。
<L / L>
The ratio 1 / L between the tensile breaking strain 1 of the metal foil composite and the tensile breaking strain L of the resin layer alone is preferably 0.7-1.
Usually, the tensile rupture strain of the resin layer is overwhelmingly higher than that of the metal foil, and similarly, the rupture strain of the resin layer alone is overwhelmingly higher than that of the metal foil composite. On the other hand, in the present invention, as described above, the deformation behavior of the resin layer is transmitted to the metal foil to improve the ductility of the metal foil, and accordingly, the tensile fracture strain of the metal foil composite is reduced to the tensile fracture of the resin layer alone. The strain can be improved to 70 to 100%. And press ratio is further improved as ratio l / L is 0.7 or more.
The tensile breaking strain l of the metal foil composite is the tensile breaking strain elongation when the tensile test is performed, and is the value when the resin layer and the metal foil are simultaneously broken, and when the metal foil is broken first. Is the value when the metal foil breaks. In addition, when the resin layer has a resin layer on both sides of the metal foil, the tensile break strain L of the resin layer alone is measured by performing a tensile test on each of both resin layers, Let L be. When there are resin layers on both surfaces of the metal foil, the measurement is performed for each of the two resin layers generated by removing the metal foil.
<樹脂層のTg>
通常、樹脂層は高温で強度が低下したり接着力が低下するため、高温では(f3×t3)/(f2×t2)≧1や、1≦33f1/(F×T)を満たし難くなる。例えば、樹脂層のTg(ガラス転移温度)以上の温度では、樹脂層の強度や接着力を維持することが難しくなる場合があるが、Tg未満の温度であれば樹脂層の強度や接着力を維持し易くなる傾向にある。つまり、樹脂層のTg(ガラス転移温度)未満の温度(例えば5℃〜215℃)であれば、金属箔複合体が(f3×t3)/(f2×t2)≧1、及び1≦33f1/(F×T)を満たし易くなる。なお、Tg未満の温度においても、温度が高いほうが樹脂層の強度や密着力が小さくなり、式1および式2を満たし難くなる傾向にあると考えられる(後述の実施例20−22参照)。
さらに、式1及び式2を満たす場合、樹脂層のTg未満の比較的高い温度(例えば40℃〜215℃)でも金属箔複合体の延性を維持できることが判明している。樹脂層のTg未満の比較的高い温度(例えば40℃〜215℃)でも金属箔複合体の延性を維持できると、温間プレスなどの工法においても優れた加工性を示す。又、樹脂層にとっては温度が高いほうが成形性がよい。また、プレス後に形状を跡付けるために(弾性変形で元に戻らないように)温間でプレスされることが行われるので、この点でも樹脂層のTg未満の比較的高い温度(例えば40℃〜215℃)でも金属箔複合体の延性を維持できると好ましい。
なお、金属箔複合体が接着剤層と樹脂層とを含む場合や、3層構造の金属箔複合体のように樹脂層が複数存在する場合、最もTg(ガラス転移温度)が低い樹脂層のTgを採用する。
<Tg of resin layer>
Usually, since the strength and the adhesive strength of the resin layer are reduced at high temperature, (f 3 × t 3 ) / (f 2 × t 2 ) ≧ 1 or 1 ≦ 33f 1 / (F × T) at high temperature. It becomes difficult to satisfy. For example, at a temperature equal to or higher than the Tg (glass transition temperature) of the resin layer, it may be difficult to maintain the strength and adhesive strength of the resin layer. It tends to be easier to maintain. That is, if the temperature is less than Tg (glass transition temperature) of the resin layer (for example, 5 ° C. to 215 ° C.), the metal foil composite is (f 3 × t 3 ) / (f 2 × t 2 ) ≧ 1, and It becomes easy to satisfy 1 ≦ 33f 1 / (F × T). Even at a temperature lower than Tg, it is considered that the higher the temperature, the lower the strength and adhesion of the resin layer, and it tends to be difficult to satisfy Equations 1 and 2 (see Examples 20-22 described later).
Furthermore, when satisfy | filling Formula 1 and
When the metal foil composite includes an adhesive layer and a resin layer, or when there are a plurality of resin layers such as a metal foil composite having a three-layer structure, the resin layer having the lowest Tg (glass transition temperature) is used. Tg is adopted.
<銅箔複合体の製造>
Cuを99.99質量%以上含み、残部が不可避不純物からなる電気銅に、さらに表1、表2に記載の元素を添加してインゴットを作製した後、熱間圧延し、表面切削で酸化物を取り除いた後、冷間圧延、焼鈍と酸洗を繰り返し、表1、表2の厚みt2(mm)まで薄くし、最後に焼鈍を行って加工性を確保し、ベンゾトリアゾールで防錆処理して金属箔を得た。金属箔が幅方向で均一な組織となるよう、冷間圧延時のテンション及び圧延材の幅方向の圧下条件を均一にした。次の焼鈍では幅方向で均一な温度分布となるよう複数のヒータを使用して温度管理を行い、銅の温度を測定して制御した。
さらに、得られた銅箔表面に対し表1、表2に示す表面処理を行った後、銅箔の結晶粒径を制御するために100℃で2時間加熱し、次いで表1、表2に示す樹脂フィルム(樹脂層)を用い、(樹脂層のTg+50℃)以上の温度で真空プレス(プレス圧力200N/cm2)によって樹脂フィルムを積層し、表1、表2に示す層構造の金属箔複合体を作製した。但し、実施例25、26、及び比較例2、4については、上記表面処理を行った後に加熱をせず、そのまま樹脂フィルムを同様に積層した。また、実施例27〜29については上記表面処理を行った後に、実施例27については銅箔を75℃で30分間加熱し、実施例28については銅箔を150℃で30分間加熱し、実施例29については銅箔を350℃で30分間加熱した。そして、その後樹脂フィルムを同様に積層した。
銅箔の再結晶は、上記真空プレス中に起きるが、その前にあらかじめ100℃で2時間加熱しておくことで、後述する表3に示すように等方的な再結晶粒を得ることができた。なお、銅箔の両面に樹脂フィルムを積層した場合、両面のf1を測定し、f1が小さい方(接着強度が弱い方)の面の銅箔の表面処理を表1、表2に記載した。
なお、表1、表2中、Cuは金属箔を示し、PIはポリイミドフィルム、PETはポリエチレンテレフタレートフィルムを示す。又、PI、PETのTgは、それぞれ220℃、70℃であった。
<Manufacture of copper foil composite>
Ingots were prepared by adding the elements listed in Tables 1 and 2 to electrolytic copper containing 99.99% by mass or more of Cu and the balance consisting of unavoidable impurities, and then hot-rolled to remove oxides by surface cutting. After that, cold rolling, annealing and pickling are repeated until the thickness t 2 (mm) shown in Tables 1 and 2 is reduced. Finally, annealing is performed to ensure workability, and rust prevention treatment is performed with benzotriazole. A metal foil was obtained. The tension during cold rolling and the rolling condition in the width direction of the rolled material were made uniform so that the metal foil had a uniform structure in the width direction. In the next annealing, temperature control was performed using a plurality of heaters so as to obtain a uniform temperature distribution in the width direction, and the copper temperature was measured and controlled.
Furthermore, after performing the surface treatment shown in Table 1 and Table 2 on the obtained copper foil surface, in order to control the crystal grain size of the copper foil, it was heated at 100 ° C. for 2 hours, and then in Table 1 and Table 2. Using the resin film shown (resin layer), the resin film was laminated by vacuum pressing (pressing pressure 200 N / cm 2 ) at a temperature equal to or higher than (Tg of resin layer + 50 ° C.), and the metal foil having the layer structure shown in Tables 1 and 2 A composite was prepared. However, in Examples 25 and 26 and Comparative Examples 2 and 4, the resin film was laminated in the same manner without heating after the surface treatment. Moreover, after performing the said surface treatment about Examples 27-29, about Example 27, copper foil was heated at 75 degreeC for 30 minutes, and about Example 28, copper foil was heated at 150 degreeC for 30 minutes, and implemented. For Example 29, the copper foil was heated at 350 ° C. for 30 minutes. And the resin film was laminated | stacked similarly similarly after that.
Recrystallization of copper foil occurs during the above vacuum press, but by heating it at 100 ° C. for 2 hours in advance, isotropic recrystallized grains can be obtained as shown in Table 3 to be described later. did it. Note that when laminating the resin film on both surfaces of a copper foil, according to measure both sides of f 1, who f 1 is smaller the surface treatment of the copper foil surface of the (better adhesive strength is weak) in Table 1, Table 2 did.
In Tables 1 and 2, Cu represents a metal foil, PI represents a polyimide film, and PET represents a polyethylene terephthalate film. The Tg of PI and PET were 220 ° C and 70 ° C, respectively.
なお、表面処理の条件は以下の通りである。
クロメート処理:クロメート浴(K2Cr2O7:0.5〜5g/L)を用い、電流密度1〜10A/dm2で電解処理した。
Ni被覆+クロメート処理:Niめっき浴(Niイオン濃度:1〜30g/Lのワット浴)を用い、めっき液温度25〜60℃、電流密度0.5〜10A/dm2でNiめっきを行った後、上記と同様にクロメート処理を行った。
粗化処理:処理液(Cu:10〜25g/L、H2SO4:20〜100g/L)を用い、温度20〜40℃、電流密度30〜70A/dm2、電解時間1〜5秒で電解処理を行った。その後、Ni−Coめっき液(Coイオン濃度:5〜20g/L、Niイオン濃度:5〜20g/L、pH:1.0〜4.0)を用い、温度25〜60℃、電流密度:0.5〜10A/dm2でNi−Coめっきを行った。
The surface treatment conditions are as follows.
Chromate treatment: Electrolytic treatment was performed at a current density of 1 to 10 A / dm 2 using a chromate bath (K 2 Cr 2 O 7 : 0.5 to 5 g / L).
Ni coating + chromate treatment: Ni plating bath (Ni ion concentration: 1-30 g / L Watt bath) was used, and Ni plating was performed at a plating solution temperature of 25-60 ° C. and a current density of 0.5-10 A / dm 2 . Thereafter, chromate treatment was performed in the same manner as described above.
Roughening treatment: electrolytic treatment using treatment liquid (Cu: 10-25 g / L, H2SO4: 20-100 g / L), temperature 20-40 ° C, current density 30-70 A / dm 2 , electrolysis time 1-5 seconds Went. Then, using Ni-Co plating solution (Co ion concentration: 5-20 g / L, Ni ion concentration: 5-20 g / L, pH: 1.0-4.0), temperature 25-60 ° C., current density: was Ni-Co plating 0.5~10A / dm 2.
<アルミニウム箔複合体の製造>
Al箔は市販の純アルミニウム板0.1mmを元に冷間圧延により25μmした。この原箔を脱脂後、5%NaOH溶液で洗浄した後、表4に示す樹脂フィルム(樹脂層)を用い、350度で真空プレス(プレス圧力200N/cm2)によって樹脂フィルムを積層し、表4に示す層構造の金属箔複合体を作製した。
<Manufacture of aluminum foil composite>
The Al foil was 25 μm by cold rolling based on a commercially available pure aluminum plate 0.1 mm. This raw foil is degreased and washed with a 5% NaOH solution, and then the resin film (resin layer) shown in Table 4 is used to laminate the resin film by vacuum pressing (pressing pressure 200 N / cm 2 ) at 350 degrees. A metal foil composite having a layer structure shown in 4 was produced.
<Ni箔複合体の製造>
純度99.90質量%以上のNiインゴットを鋳造し、熱間圧延、冷間圧延、焼鈍を繰り返しJIS H4551 NW2200Niに準ずるNi箔(厚み17μm)を作製した。作製したNi箔を700℃×30分焼鈍した後、密着性を向上させるため、硫酸中で酸洗し、アルカリ洗浄した後に、スルファミン酸Niめっき(電流密度 10A/dm2、めっき厚が1μm)を施した。その後、表4に示す樹脂フィルム(樹脂層)を用い、350℃で真空プレス(プレス圧力200N/cm2)によって樹脂フィルムを積層し、表4に示す層構造の金属箔複合体を作製した。
<Manufacture of Ni foil composite>
A Ni ingot having a purity of 99.90% by mass or more was cast, and Ni foil (thickness: 17 μm) according to JIS H4551 NW2200Ni was produced by repeating hot rolling, cold rolling and annealing. In order to improve the adhesion, the Ni foil was annealed at 700 ° C for 30 minutes, then pickled in sulfuric acid and washed with alkali, then Ni plating sulfamic acid (current density 10A / dm2, plating thickness 1μm) gave. Thereafter, the resin film (resin layer) shown in Table 4 was used, and the resin film was laminated at 350 ° C. by vacuum press (pressing pressure 200 N / cm 2 ) to produce a metal foil composite having a layer structure shown in Table 4.
<ステンレス箔複合体の製造>
それぞれ市販のSUS301、SUS 304、SUS 316、SUS 430、SUS 631ステンレス板を焼鈍して柔らかくした後、厚み25μmまで冷間圧延した。その後、400番のバフ研磨により表面を粗くしながら厚み18μmまで薄くした後、超音波による表面洗浄を行った。その後、1000℃で5秒間、アルゴン雰囲気中で焼鈍し、表4に示す樹脂フィルム(樹脂層)を用い、350℃で真空プレス(プレス圧力200N/cm2)によって樹脂フィルムを積層し、表4に示す層構造の金属箔複合体を作製した。
<Manufacture of stainless steel foil composite>
Each commercially available SUS301, SUS304, SUS316, SUS430, SUS631 stainless steel plate was annealed and softened, and then cold-rolled to a thickness of 25 μm. Thereafter, the surface was thinned to 18 μm while roughening the surface by buffing No. 400, and then the surface was cleaned with ultrasonic waves. Thereafter, the film was annealed at 1000 ° C. for 5 seconds in an argon atmosphere. The resin film (resin layer) shown in Table 4 was used, and the resin film was laminated at 350 ° C. by vacuum pressing (pressing pressure 200 N / cm 2 ). A metal foil composite having the layer structure shown in FIG.
<軟鋼箔複合体の製造>
市販のJIS G3141 SPCCA 軟鋼板を冷間圧延と焼鈍を繰り返して厚み25μmまで冷間圧延した。その後、400番のバフ研磨により表面を粗くしながら厚み18μmまで薄くした後、超音波による表面洗浄を行った。その後、1000℃で5秒間、アルゴン雰囲気中で焼鈍し、表4に示す樹脂フィルム(樹脂層)を用い、350℃で真空プレス(プレス圧力200N/cm2)によって樹脂フィルムを積層し、表4に示す層構造の金属箔複合体を作製した。
<Manufacture of mild steel foil composite>
A commercially available JIS G3141 SPCCA mild steel sheet was cold-rolled to a thickness of 25 μm by repeating cold rolling and annealing. Thereafter, the surface was thinned to 18 μm while roughening the surface by buffing No. 400, and then the surface was cleaned with ultrasonic waves. Thereafter, the film was annealed at 1000 ° C. for 5 seconds in an argon atmosphere. The resin film (resin layer) shown in Table 4 was used, and the resin film was laminated at 350 ° C. by vacuum pressing (pressing pressure 200 N / cm 2 ). A metal foil composite having the layer structure shown in FIG.
<Fe-Ni合金箔複合体の製造>
それぞれFe-36質量%Ni、Fe-50質量%Ni、Fe-85質量%Niの組成となるように真空溶解で鋳造、熱間圧延、面削、冷間圧延、焼鈍を繰り返して厚み25μmまで冷間圧延した。その後、400番のバフ研磨により表面を粗くしながら厚み18μmまで薄くした後、超音波による表面洗浄を行った。その後、1000℃で5秒間、アルゴン雰囲気中で焼鈍し、表4に示す樹脂フィルム(樹脂層)を用い、350℃で真空プレス(プレス圧力200N/cm2)によって樹脂フィルムを積層し、表4に示す層構造の金属箔複合体を作製した。
<Production of Fe-Ni alloy foil composite>
Repeated casting, hot rolling, chamfering, cold rolling, and annealing by vacuum melting to have a composition of Fe-36 mass% Ni, Fe-50 mass% Ni, and Fe-85 mass% Ni, respectively, to a thickness of 25 μm Cold rolled. Thereafter, the surface was thinned to 18 μm while roughening the surface by buffing No. 400, and then the surface was cleaned with ultrasonic waves. Thereafter, the film was annealed at 1000 ° C. for 5 seconds in an argon atmosphere. The resin film (resin layer) shown in Table 4 was used, and the resin film was laminated at 350 ° C. by vacuum pressing (pressing pressure 200 N / cm 2 ). A metal foil composite having the layer structure shown in FIG.
<洋白箔複合体の製造>
JIS H3110 C7451に記載の成分となるようにインゴットを鋳造し、熱間圧延と冷間圧延、焼鈍を繰り返し、厚み25μmの洋白箔とした。この後、800℃で10秒間、アルゴン雰囲気で再結晶焼鈍させた後に硫酸溶液で酸洗し、アルカリ洗浄した後、スルファミン酸Niめっき(電流密度 10A/dm2、めっき厚が1μm)を施した。その後、表4に示す樹脂フィルム(樹脂層)を用い、350℃で真空プレス(プレス圧力200N/cm2)によって樹脂フィルムを積層し、表4に示す層構造の金属箔複合体を作製した。
なお、表4中、Al,Ni,SUS,洋白は金属箔を示し、PIはポリイミドフィルムを示す。又、PIのTgは220℃であった。
<Manufacture of western white foil composite>
An ingot was cast so as to have the components described in JIS H3110 C7451, and hot rolling, cold rolling, and annealing were repeated to obtain a white foil with a thickness of 25 μm. Thereafter, after recrystallization annealing at 800 ° C. for 10 seconds in an argon atmosphere, pickling with a sulfuric acid solution and alkali cleaning were performed, followed by Ni-sulfamate plating (current density 10 A /
In Table 4, Al, Ni, SUS, and white and white indicate metal foils, and PI indicates a polyimide film. The Tg of PI was 220 ° C.
<引張試験>
各金属箔複合体から幅12.7mmの短冊状の引張試験片を複数作製した。金属箔、及び樹脂フィルムの引張試験については、積層前の金属箔単体及び樹脂フィルム単体を12.7mmの短冊状にした。
そして、引張試験機により、JIS−Z2241に従い、金属箔の圧延方向と平行な方向に引張試験した。引張試験時の試験温度を表1、表2に示す。
<180°ピール試験>
180°ピール試験を行って、180°剥離接着強度f1を測定した。まず、金属箔複合体から幅12.7mmの短冊状のピール試験片を複数作製した。試験片の金属箔面をSUS板に固定し、樹脂層を180°方向に引き剥がした。樹脂層が金属箔の両面に存在する実施例については樹脂層+金属箔をSUS板に固定し、逆側の樹脂層を180°方向に引き剥がした。金属箔が樹脂層の両面に存在する実施例については片面の金属箔を除去した後に逆面の金属箔側をSUS板に固定し、樹脂層を180°方向に引き剥がした。そのほかの条件はJIS−C5016に従った。
尚、JISの規格では金属箔層を引き剥がすことになっているが、実施例にて樹脂層を引き剥がしたのは金属箔の厚み、剛性による影響を小さくするためである。
<Tensile test>
A plurality of strip-shaped tensile test pieces having a width of 12.7 mm were produced from each metal foil composite. About the tensile test of metal foil and a resin film, the metal foil simple substance before lamination | stacking and the resin film simple substance were made into 12.7 mm strip shape.
Then, a tensile test was performed in a direction parallel to the rolling direction of the metal foil according to JIS-Z2241 using a tensile tester. Tables 1 and 2 show the test temperatures during the tensile test.
<180 ° peel test>
Performing 180 ° peel test to measure the 180 ° peel adhesive strength f 1. First, a plurality of strip-shaped peel test pieces having a width of 12.7 mm were produced from the metal foil composite. The metal foil surface of the test piece was fixed to the SUS plate, and the resin layer was peeled off in the 180 ° direction. For Examples in which the resin layer was present on both sides of the metal foil, the resin layer + metal foil was fixed to the SUS plate, and the opposite resin layer was peeled off in the 180 ° direction. In Examples in which the metal foil was present on both surfaces of the resin layer, the metal foil on one side was removed, the opposite metal foil side was fixed to the SUS plate, and the resin layer was peeled off in the 180 ° direction. Other conditions were in accordance with JIS-C5016.
In the JIS standard, the metal foil layer is peeled off, but the resin layer was peeled off in the examples in order to reduce the influence of the thickness and rigidity of the metal foil.
<銅箔の結晶粒の等方性の評価>
銅箔の結晶粒の等方性を評価するため、(板面方位から観察した銅箔の結晶粒の最大内接円の直径の平均値)/(板面方位から観察した銅箔の結晶粒の最小外接円の直径の平均値)で表される値(比)Rを求めた。具体的には、銅箔表面の0.1×0.1mmの面積を、電子顕微鏡(日本電子社製:JEOL JXA−8500F)を用いてEBSD測定し、5°以上の角度差がある部分を結晶粒界(双晶粒界は除く)として結晶粒径を測定し、平均結晶粒径を求めた。結晶粒径が10μm未満であるところを除き、ランダムに抽出した150個の結晶粒について最大内接円と最小外接円を求め、それぞれの平均値を算出した。EBSD測定は、TSLソリューションズ社製のOIM(結晶方位解析装置)を用いて行った。
<Evaluation of isotropic crystal grains of copper foil>
In order to evaluate the isotropy of the crystal grains of the copper foil, (the average value of the diameters of the maximum inscribed circles of the crystal grains of the copper foil observed from the plane orientation) / (the crystal grains of the copper foil observed from the plane orientation) Value (ratio) R represented by (the average value of the diameters of the minimum circumscribed circle). Specifically, an area of 0.1 × 0.1 mm on the surface of the copper foil was measured by EBSD using an electron microscope (manufactured by JEOL Ltd .: JEOL JXA-8500F), and a portion having an angle difference of 5 ° or more was observed at the grain boundary. The crystal grain size was measured as (excluding twin grain boundaries), and the average crystal grain size was determined. Except where the crystal grain size is less than 10 μm, the maximum inscribed circle and the minimum circumscribed circle were obtained for 150 randomly extracted crystal grains, and the average value of each was calculated. The EBSD measurement was performed using an OIM (crystal orientation analyzer) manufactured by TSL Solutions.
<加工性の評価>
図2に示すカップ試験装置10を用いて加工性の評価を行った。カップ試験装置10は、台座4とポンチ2とを備えており、台座4は円錐台状の斜面を有し、円錐台は上から下へ向かって先細りになっていて、円錐台の斜面の角度は水平面から60°をなしている。又、円錐台の下側には、直径15mmで深さ7mmの円孔が連通している。一方、ポンチ2は先端が直径14mmの半球状の円柱をなし、円錐台の円孔へポンチ2先端の半球部を挿入可能になっている。
なお、円錐台の先細った先端と、円錐台の下側の円孔の接続部分は半径(r)=3mmの丸みを付けている。
<Evaluation of workability>
Workability was evaluated using the
Note that the connecting portion between the tapered tip of the truncated cone and the lower circular hole of the truncated cone is rounded with a radius (r) = 3 mm.
そして、金属箔複合体を直径30mmの円板状の試験片20に打ち抜き、台座4の円錐台の斜面に金属箔複合体を載置し、試験片20の上からポンチ2を押し下げて台座4の円孔へ挿入した。これにより、試験片20がコニカルカップ状に成形された。
なお、金属箔複合体の片面にのみ樹脂層がある場合、樹脂層を上にして台座4に載置する。又、金属箔複合体の両面に樹脂層がある場合、M面と接着している樹脂層を上にして台座4に載置する。金属箔複合体の両面がCuの場合はどちらが上であってもよい。
成形後の試験片20内の金属箔の割れの有無を目視で判定し、以下の基準で加工性の評価を行った。
◎:金属箔が割れず、金属箔にシワもない
○:金属箔が割れなかったが、金属箔に若干のシワがある
×:金属箔が割れた
Then, the metal foil composite is punched into a disk-shaped
In addition, when there is a resin layer only on one side of the metal foil composite, it is placed on the
The presence or absence of cracking of the metal foil in the
A: The metal foil was not cracked and the metal foil was not wrinkled. ○: The metal foil was not cracked, but the metal foil was slightly wrinkled. X: The metal foil was cracked.
得られた結果を表1〜表4に示す。なお、表1、表4の試験温度は、F、f1、f2、f3、及び加工性の評価を行った温度を示す。 The obtained results are shown in Tables 1 to 4. Incidentally, Table 1, test temperature shown in Table 4, show F, f 1, f 2, f 3, and the temperature were evaluated in the processability.
表1〜表4から明らかなように、各実施例の場合、(f3×t3)/(f2×t2)≧1、及び1≦33f1/(F×T)をともに満たし、加工性に優れたものとなった。
なお、同じ構成の金属箔積層体を用いた実施例13と実施例23とを比較すると、室温(約25℃)で引張試験を行ってF等を測定した実施例13の方が、実施例23より(f3×t3)/(f2×t2)の値が大きく、実施例23では試験温度上昇により樹脂層が弱く(f3が小さく)なっていることが分かる。
又、表3に示すように、金属箔として銅箔を用いた場合、100℃で2時間加熱してから樹脂フィルムを積層した実施例1〜24の方が、加熱せずに樹脂フィルムを積層した実施例25、26に比べ、R値が高くなり、等方的な再結晶粒を得ることができた。尚、銅箔をそれぞれ80℃未満(実施例27、加熱75℃)、又は150〜350℃(実施例28、150℃、実施例29、350℃)で加熱した後に樹脂フィルムを積層するとR値が低くなり、銅箔を加熱した効果が生じなかった。
As is clear from Tables 1 to 4, in each example, both (f 3 × t 3 ) / (f 2 × t 2 ) ≧ 1 and 1 ≦ 33f 1 / (F × T) are satisfied, Excellent workability.
In addition, when Example 13 and Example 23 using the metal foil laminated body of the same structure are compared, the direction of Example 13 which measured F etc. by performing the tensile test at room temperature (about 25 degreeC) is Example. 23, the value of (f 3 × t 3 ) / (f 2 × t 2 ) is larger. In Example 23, it can be seen that the resin layer is weak (f 3 is small) due to the increase in test temperature.
In addition, as shown in Table 3, when copper foil was used as the metal foil, Examples 1 to 24 in which the resin films were laminated after heating at 100 ° C. for 2 hours were laminated without heating. As compared with Examples 25 and 26, the R value was high, and isotropic recrystallized grains could be obtained. In addition, when a resin film is laminated | stacked after heating copper foil below 80 degreeC (Example 27, heating 75 degreeC) or 150-350 degreeC (Example 28, 150 degreeC, Example 29, 350 degreeC), R value However, the effect of heating the copper foil did not occur.
一方、銅箔に表面処理をせずに樹脂フィルムを積層した比較例1の場合、接着強度が低下し、33f1/(F×T)の値が1未満となり、加工性が劣化した。
積層時のプレス圧力を100N/cm2に低減した比較例2、5の場合も接着強度が低下し、33f1/(F×T)の値が1未満となり、加工性が劣化した。
樹脂フィルムの厚みを薄くした比較例3、6、10の場合、樹脂フィルムの強度が金属箔に比べて弱くなって(f3×t3)/(f2×t2)の値が1未満となり、加工性が劣化した。
樹脂フィルムと金属箔とを熱融着せずに接着剤で積層した比較例4の場合、接着強度が低下し、33f1/(F×T)の値が1未満となり、加工性が劣化した。
銅箔中のSnの含有量が500ppmを超えた比較例7の場合、再結晶時にかえって結晶粒が微細化し易くなると共に、合金化による強度上昇のためf2が上昇し、(f3×t3)/(f2×t2)、33f1/(F×T)が1未満となり、加工性が劣化した。
銅箔中のAgの含有量を50ppm未満としたこと以外は実施例22と同様の条件で複合体を作製した比較例8の場合、Agによる結晶粒の粗大化効果が生じず、結晶粒が実施例22より小さかったため、F、f2、が上昇し、(f3×t3)/(f2×t2)、33f1/(F×T)が1未満となり、加工性が劣化した。
それぞれ実施例30,31,33と同じ構成の金属箔積層体を用いたが、積層時のプレス圧力を100N/cm2に低減した比較例9,11,12の場合も接着強度が低下し、33f1/(F×T)の値が1未満となり、加工性が劣化した。
On the other hand, in Comparative Example 1 in which the resin film is laminated without the surface treatment to the copper foil, the adhesion strength is lowered, the value of 33f 1 / (F × T) is less than 1, the workability is deteriorated.
In Comparative Examples 2 and 5 in which the pressing pressure during lamination was reduced to 100 N / cm 2 , the adhesive strength was lowered, the value of 33f 1 / (F × T) was less than 1, and workability was deteriorated.
In Comparative Examples 3, 6, and 10 in which the thickness of the resin film was reduced, the strength of the resin film was weaker than that of the metal foil, and the value of (f 3 × t 3 ) / (f 2 × t 2 ) was less than 1. As a result, workability deteriorated.
In the case of Comparative Example 4 in which the resin film and the metal foil were laminated with an adhesive without being thermally fused, the adhesive strength was lowered, the value of 33f 1 / (F × T) was less than 1, and workability was deteriorated.
In the case of Comparative Example 7 in which the Sn content in the copper foil exceeded 500 ppm, the crystal grains were more easily refined during recrystallization, and f 2 increased due to the increase in strength due to alloying, and (f 3 × t 3 ) / (f 2 × t 2 ) and 33f 1 / (F × T) were less than 1, and workability deteriorated.
In the case of Comparative Example 8 in which the composite was produced under the same conditions as in Example 22 except that the content of Ag in the copper foil was less than 50 ppm, the effect of coarsening the crystal grains due to Ag did not occur, and the crystal grains were since smaller than example 22, F, f 2, is increased, (f 3 × t 3) / (
Although the metal foil laminates having the same configurations as those in Examples 30, 31, and 33 were used, the adhesive strength was also lowered in Comparative Examples 9, 11, and 12 in which the press pressure during lamination was reduced to 100 N / cm 2 . The value of 33f 1 / (F × T) was less than 1, and the workability deteriorated.
Claims (5)
前記銅箔の厚みをt2(mm)、引張歪4%における前記銅箔の応力をf2(MPa)、前記樹脂層の厚みをt3(mm)、引張歪4%における前記樹脂層の応力をf3(MPa)としたとき、式1:(f3×t3)/(f2×t2)≧1を満たし、
かつ、前記銅箔と前記樹脂層との180°剥離接着強度をf1(N/mm)、前記金属箔複合体の引張歪30%における強度をF(MPa)、前記金属箔複合体の厚みをT(mm)としたとき、式2:1≦33f1/(F×T)を満たすことを特徴とする金属箔複合体。 A copper foil having a thickness of 50 μm or less, a fracture strain of 4% or more, and containing one or more selected from the group of Ag, Sn, In, Au, Mn, Ni, and Zn in a mass ratio of 30 ppm to 500 ppm in total. In the crystal grain having an average crystal grain size of 10 μm or more and further exceeding 10 μm, the average diameter of the maximum inscribed circle of the copper foil crystal grain observed from the surface of the copper foil) / (The average value of the diameter of the minimum circumscribed circle of the crystal grains of the copper foil observed from the surface of the copper foil) The copper foil satisfying 0.5 ≦ R ≦ 0.8 and the resin layer having a thickness of 120 μm or less And a metal foil composite laminated with
The thickness of the copper foil is t 2 (mm), the stress of the copper foil at a tensile strain of 4% is f 2 (MPa), the thickness of the resin layer is t 3 (mm), and the thickness of the resin layer is 4% of the tensile strain. When the stress is f 3 (MPa), Formula 1: (f 3 × t 3 ) / (f 2 × t 2 ) ≧ 1 is satisfied,
In addition, the 180 ° peel strength between the copper foil and the resin layer is f 1 (N / mm), the strength at 30% tensile strain of the metal foil composite is F (MPa), and the thickness of the metal foil composite is A metal foil composite characterized by satisfying the formula 2: 1 ≦ 33f 1 / (F × T) where T is (mm).
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| JP2012005279A JP5770113B2 (en) | 2012-01-13 | 2012-01-13 | Metal foil composite, molded body and method for producing the same |
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| CN201380005271.XA CN104039545B (en) | 2012-01-13 | 2013-01-04 | Metal foil composite, copper foil, molded body, and manufacturing method thereof |
| KR1020147018243A KR101628591B1 (en) | 2012-01-13 | 2013-01-04 | Metal-foil composite, copper foil, formed body, and manufacturing method therefor |
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| CN109478445B (en) * | 2016-07-12 | 2021-07-20 | 大日本印刷株式会社 | Patterned electrical conductor, sheet with electrical conductor, heating plate, vehicle, and manufacturing method of patterned electrical conductor |
| JP6883456B2 (en) | 2017-03-31 | 2021-06-09 | Jx金属株式会社 | Manufacturing method of laminates and molded products |
| CN112964495B (en) * | 2021-02-04 | 2024-07-09 | 赣州逸豪新材料股份有限公司 | Electrolytic copper foil electrolytic high-temperature stripping sampling detection device and implementation method thereof |
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| KR100491385B1 (en) * | 2001-07-04 | 2005-05-24 | 닛꼬 긴조꾸 가꼬 가부시키가이샤 | Copper alloy foil for laminated sheet |
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