JP5854868B2 - Gas mixing / rectifying device and combustor using the gas mixing / rectifying device structure - Google Patents

Description

  The present invention relates to a gas mixing / rectifying device that uniformly mixes and rectifies two types of gas, and a combustor including a plurality of burners that can form a micro flame that is a micro flame using the gas mixing / rectifying device structure.

Conventionally, a combustion apparatus such as a premixed combustor, a wind tunnel used in a combustion experiment, and the like have been provided with a gas mixer for mixing two types of gas such as fuel gas and air. As such a gas mixer, for example, an injector that jets gas from a nozzle to a Venturi tube, and a premixer mixer that sucks and pressurizes the atmosphere and the fuel gas and the atmosphere with a single blower are used ( Non-patent document 1).
Moreover, when the flow in the duct is rectified to obtain a uniform flow velocity, a gas rectifier using a nozzle or a perforated plate is used (for example, Patent Document 1).

Japanese Patent Application Laid-Open No. 7-213857

Theory and practice of gas combustion, Ichiro Nakamachi, Fujio Shoji, Energy Conservation Center, 1992, p. 204-207

When trying to obtain a mixed gas flow of an arbitrary composition with a uniform flow rate in a duct of various plants, or when trying to obtain a combustion gas flow of a uniform flow rate using a premix combustor, A gas mixing device for mixing gases and a gas rectifying device for obtaining a uniform flow rate were required. Conventionally, since these had to be prepared separately, there was a problem that the apparatus was complicated and increased in size.
Moreover, in the gas rectifier using a nozzle, there is a problem that the gas rectifier is increased in size because a reduced flow nozzle having a size larger than that of a flow path for obtaining a uniform flow velocity is used.

SUMMARY OF THE INVENTION An object of the present invention is to provide a gas mixing / rectifying device that can mix two types of gas with a single device and can perform rectification to obtain a uniform flow rate, and can be miniaturized. And
Further, by using the gas mixing / rectifying device, a combustor capable of uniform surface heating or a uniform flow velocity of combustion gas in a flow path without unevenness in the distribution of flames. , To provide.

In the present invention, in order to achieve the above object, according to the first aspect of the present invention, the first gas supply means for supplying the first gas and the second gas mixed with the first gas are provided. A second gas supply means for supplying, a plurality of tubular gas supply pipes for ejecting the second gas from the tip, and an outer peripheral surface of the plurality of gas supply pipes, each being disposed around the first gas; A gas mixing / rectifying device comprising: a first gas chamber having a flat shape; and a bottom surface portion of the first gas chamber. A first gas supply section that communicates with the first gas chamber at the first gas supply port and supplies the first gas to the first gas chamber, and the second gas supply means Is communicated with the second gas chamber in a flat shape and the second gas chamber at the second gas supply port, A second gas supply section for supplying a second gas to the second gas chamber, wherein the first gas chamber and the second gas chamber support the plurality of gas supply pipes. A plurality of gas supply pipes, wherein the other end opposite to the tip communicates with the second gas chamber, and the upper surface faces the bottom surface of the first gas chamber. From the plurality of through holes provided in the section, each tip projects to the outside of the housing, and the ejection section is formed as a gap between the inner edge of the through hole and the outer peripheral surface of the gas supply pipe. Assuming a rectangular surface that is respectively supported and circumscribes the ejection part group composed of the plurality of ejection parts and has a minimum area when the first gas chamber is viewed in plan from the upper surface part side, A rectangular parallelepiped gas inflow region having the rectangular surface is set inside the first gas chamber. When the side on the gas supply port side is the front side, the side facing the front side is the opposing side, and the two sides orthogonal to the front side are the side sides, the first side that connects the bottom surface part and the top surface part Inside the side wall portion of the gas chamber, a first protruding portion that protrudes toward the first gas supply port and distributes the first gas to the side, and a curved shape that protrudes outward. And a first guide part configured to guide the first gas distributed by the first projecting part so as to flow into the gas inflow region from the opposite side, and After ejecting from the first gas supply port and colliding with the upper surface portion, the flow rate of the first gas flowing into the gas inflow region from each side of the front side, the opposite side, and the side surface is the length of each side. The technical means of being distributed proportionally is used.

According to the first aspect of the present invention, the first gas that is ejected from the first gas supply port provided in the bottom surface portion of the first gas chamber, is once collided with the top surface portion, and isotropically expanded. The gas is distributed laterally by a first protrusion formed inside the side wall of the first gas chamber, and the first protrusion is formed by a first guide formed in a curved shape protruding outward. By guiding the first gas distributed by the section so as to flow into the gas inflow region from the opposite side, the first gas flowing from each side of the front side, the opposite side, and the side surface of the gas inflow region The flow rate of one gas can be distributed in proportion to the length of each side.
As a result, the first gas can flow at a uniform speed distribution toward the gas inflow region, and the second gas can be supplied from the ejection portion formed between the inner edge of the through hole and the outer peripheral surface of the gas supply pipe. This gas can be ejected at a uniform flow rate depending on the position of the ejection portion, so that the gas can be rectified so as to obtain a uniform flow velocity.
Moreover, since the ejection part which ejects 1st gas is each provided corresponding to the several gas supply pipe | tube from which 2nd gas ejects, the interface which 1st gas and 2nd gas contact Therefore, both can be mixed efficiently.
As a result, two types of gas can be mixed and rectified to obtain a uniform flow rate with a single device. Therefore, gas mixing and rectification to obtain a mixed gas flow of an arbitrary composition with a uniform flow rate The apparatus can be miniaturized.

According to a second aspect of the present invention, in the gas mixing / rectifying device according to the first aspect, a technical means is used in which a tip of the first protrusion is formed in a sharp corner shape.

Since the tip end of the first protrusion is formed in a sharp corner shape as in the invention described in claim 2, the first gas is supplied to the first gas supply port side by the first protrusion. It can be distributed more effectively to the side.

According to a third aspect of the present invention, in the gas mixing / rectifying device according to the first or second aspect, when the ejection portion group is viewed in a plan view from the front end direction, both end portions of the front side and the first portion The gas flow rate distributed in proportion to the angle α formed by the gas supply port becomes a gas flow rate proportional to the length of the front side, and both ends of the first protrusion and the first gas The gas flow rate distributed in proportion to the angle β formed by the supply port is such that the gas flow rate proportional to the length of the opposite side is such that the gas flow rate flows into the gas inflow region from the opposite side. The technical means that the position of the first gas supply port is set is used.

The first gas is ejected from the first gas supply port, once collides with the upper surface portion and isotropically spreads, and the gas flow rate is distributed in proportion to the angles α and β. As in the present invention, the gas flow rate distributed in proportion to the angle α becomes a gas flow rate corresponding to the length of the front side, and the gas flow rate distributed in proportion to the angle β is equal to the length of the opposite side. The position of the first gas supply port can be set so that the gas flow rate corresponding to the gas flow rate flows into the gas inflow region from the opposite side. As a result, the first gas can flow at a uniform speed distribution toward the gas inflow region.

According to a fourth aspect of the present invention, in the gas mixing / rectifying device according to any one of the first to third aspects, the opposing side and the side are parallel to a side wall of the first gas chamber. The ratio between the distance between the side surface and the side wall and the distance between the opposite side and the side wall is equal to the ratio between the length of the side surface and the length of the facing side. Use technical means.

According to the fourth aspect of the present invention, the width of the gas flow path between the side surface and the side wall and the width of the gas flow path between the opposite side and the side wall are determined according to the gas flow rate. Therefore, the speed distribution can be made more uniform.

According to a fifth aspect of the present invention, in the gas mixing / rectifying device according to any one of the first to fourth aspects, the first gas supply port and the first gas supply port on the axis of symmetry of the gas inflow region. 1 is used, and the technical means that the first gas chamber is formed in a shape symmetric with respect to the symmetry axis is used.

According to the fifth aspect of the present invention, since the first gas can flow while maintaining symmetry with respect to the symmetry axis of the gas inflow region, the first gas is more uneven toward the gas inflow region. It is possible to flow with a speed distribution without any.

According to a sixth aspect of the present invention, in the gas mixing / rectifying device according to any one of the first to fifth aspects, the second gas supply port is provided on a bottom surface portion of the second gas chamber. A second protrusion that is formed on the inner side of the side wall of the second gas chamber so as to protrude toward the second gas supply port and distributes the second gas to the side; A second gas distributed by the second projecting portion is formed in a curved shape that protrudes outward, and corresponds to the ejection portion group from a position corresponding to the opposite side of the second gas chamber. And a second guide portion that guides the flow toward the position to be formed is used.

As in the sixth aspect of the invention, the second gas chamber also includes a second protrusion and a second guide corresponding to the first protrusion and the first guide of the first gas chamber. By providing the second gas in the second gas chamber, the second gas can be flowed at a uniform speed distribution, so that the second gas can be ejected from each gas supply pipe at a more uniform speed. . Thereby, in each gas supply pipe | tube and each ejection part, since more uniform mixing of 1st gas and 2nd gas is attained, it is preferable.

According to a seventh aspect of the present invention, the combustor is a gas mixing / rectifying device according to any one of the first to sixth aspects, wherein the gas supply pipe is a hemispherical micro flame at the tip. A technical means is used in which the burner forms a frame, the second gas is a fuel gas, and the first gas is an oxidant gas for burning the fuel gas.

Since the micro flame array type combustor can be suitably used for surface heating, it is desirable to increase the area of the combustion part composed of a plurality of burners, but by increasing the size of the combustion part, There is a possibility that the flow rate of the fuel gas and the oxidant gas may be uneven, and the flame may disappear or coalesce. In order to form a micro flame without the disappearance and coalescence of the flame, it is necessary that the combustion gas ejected from each burner and the oxidant gas supplied from the periphery of each burner have a uniform flow rate. Since the size of the combustor is highly required to be reduced, it is not preferable to improve the speed distribution of the combustion gas and the oxidant gas by increasing the size of the combustor.
When the micro flame array type combustor is configured as in the invention described in claim 7, the fuel gas and the oxidant gas can be ejected at a uniform velocity distribution in each burner and the ejection portion. Even if the combustion area is enlarged, it is possible to form a micro flame that does not disappear or coalesce with a flame, that is, a combustor capable of uniform surface heating without any unevenness in the distribution of the flame can be configured. Moreover, it can comprise as a combustor which can supply the combustion gas of uniform flow velocity in a flow path.

It is a perspective view of a combustor. It is AA arrow sectional drawing of FIG. It is a plane perspective view which shows the structure of a 1st gas chamber. It is a top view which shows the structure of a 2nd gas chamber. It is sectional explanatory drawing which shows the example of a change of a 1st gas chamber. It is explanatory drawing which shows the model shape of the comparative example in a numerical fluid analysis. 6A is a plan perspective view, and FIG. 6B is a side perspective view. It is explanatory drawing which shows the analysis result of the flow volume distribution of the gas in the 1st gas chamber by numerical fluid analysis. FIG. 7A is an explanatory diagram showing the analysis result of the comparative example, and FIG. 7B is an explanatory diagram showing the analysis result of the example.

(First embodiment)
The gas mixing / rectifying device of the present invention will be described with reference to the drawings.

As shown in FIG. 1, the gas mixing / rectifying device 1 includes, as a housing 2, an upper member 3, a lower member 4, and a gas supply each having a plurality of gas supply pipes 51 protruding from the upper surface 31 b to the outside. The partition part 5 which supports the pipe | tube 51, and the mixed gas distribution | circulation part 6 through which the mixed gas distribute | circulates are provided. Here, in FIG. 1, the internal structure of the mixed gas circulation unit 6 is also indicated by a solid line so that the internal structure is clear.

As shown in FIGS. 1 and 2, the first gas supply means 30 for supplying the first gas includes a flat first gas chamber 31 formed of an upper member 3 and a partition wall portion 5, and a first gas chamber. A first gas that communicates with the first gas chamber 31 at a first gas supply port 32 a provided in the bottom surface portion 31 a of the gas outlet 31 and is connected to a gas cylinder or the like (not shown) and supplies the first gas to the first gas chamber 31. And a supply unit 32. In the present embodiment, the first gas supply unit 32 is provided to communicate with the outside from the lower surface of the lower member 4. Here, the bottom surface portion 31 a is formed by the partition wall portion 5.

A through hole 33 through which the gas supply pipe 51 protrudes to the outside is provided in an upper surface part 31 b provided facing and parallel to the bottom surface part 31 a, and an outer peripheral surface of the gas supply pipe 51 and an inner edge of the through hole 33. As a gap, an ejection portion 34 from which the first gas is ejected is formed.

The second gas supply means 40 includes a flat second gas chamber 41 formed by the lower member 4 and the partition wall portion 5, and a second gas supply port 42 a provided in the bottom surface portion 41 a of the second gas chamber 41. A first gas supply unit 42 that communicates with the second gas chamber 41 and is connected to a gas cylinder or the like (not shown) and supplies the second gas to the second gas chamber 41 is provided. Here, the upper surface portion 41 b provided in parallel to the bottom surface portion 41 a is formed by the partition wall portion 5, and the first gas chamber 31 and the second gas chamber 41 are stacked through the partition wall portion 5. ing.

Each gas supply pipe 51 is supported by the partition wall portion 5 so that the tip 51 a protrudes outside from the through hole 33 and the other end 51 b communicates with the second gas chamber 41. In this embodiment, a total of 221 gas supply pipes 51 are arranged at equal intervals in 17 rows in the longitudinal direction and 13 rows in the width direction.

The mixed gas circulation part 6 is formed in a box shape covering each gas supply pipe 51 and is connected to an apparatus (not shown) using the mixed gas, and supplies the mixed gas having a uniform flow rate to the apparatus. . In addition, the mixed gas distribution part 6 can employ | adopt arbitrary shapes according to the use of an apparatus, and can also be abbreviate | omitted.

In order to consider the flow of the first gas ejected from the ejection portion 34, a gas inflow region 60 as shown in FIG. 3 is set. FIG. 3 is a plan perspective view of the first gas chamber 31 as viewed from the upper surface portion 31b side. First, when the first gas chamber 31 is viewed in plan from the upper surface portion 31b side, an ejection portion group including the ejection portions 34 is considered. Next, a rectangular surface circumscribing this ejection part group and having the smallest area is assumed. Then, a rectangular parallelepiped region formed with the rectangular surface in FIG. 3 as the upper surface and the height as the thickness of the first gas chamber 31 in the first gas chamber 31 is a gas inflow region. Set as 60.
Here, the side of the rectangular first gas supply port side is defined as a front side 61, the side facing the front side 61 is defined as a facing side 62, and the two sides orthogonal to the front side 61 are defined as side sides 63 and 63.
The first gas supplied from the first gas supply port 32a to the inside of the first gas chamber 31 flows into the gas inflow region 60 from the side surface of the rectangular parallelepiped before being ejected from the ejection part 34. The direction in which the first gas flows into the gas inflow region 60 is expressed using, for example, the front side 61, the opposing side 62, and the side surface 63 as "first gas flows in from the front side 61 side". .

The first gas chamber 31 is formed on the inner side of the side wall portion 35 connecting the bottom surface portion 31a and the upper surface portion 31b so as to protrude toward the first gas supply port 32a. 1st protrusion part 36 distributed in a direction) is formed. The tip 36a of the first protrusion 36 is formed in a sharp corner shape.

At the corner of the first gas chamber 31, a first guide portion 37 is formed adjacent to the first projecting portion 36 and formed in a curved shape that protrudes outward, in this embodiment, an arc shape. Yes. The first guide part 37 guides the first gas distributed by the first projecting part 36 so as to flow into the gas inflow region 60 from the opposite side 62 side. The first guide portion 37 is formed in an R shape that smoothly connects the end portion 36 b of the first protrusion 36 and the side wall portion 35.

At the corner portion of the first gas chamber 31 facing the first guide portion 37, an R portion 38 formed in a curved shape protruding outward is formed. When the corner is square, the first gas stays in the corner, so that the first gas is provided to effectively guide the first gas to the opposite side 62 side. Here, the R portion 38 may have a smaller R shape than the first guide portion 37.

The first gas supply port 32 a and the first protrusion 36 are arranged on the symmetry axis X of the gas inflow region 60. The first gas chamber 31 is formed in a shape that is symmetric about the symmetry axis X. The ratio of the distance W1 between the side surface 63 and the side wall portion 35 and the distance W2 between the facing side 62 and the side wall portion 35 is configured to be equal to the ratio between the length of the side surface side L2 and the length of the facing side L1. Has been.

The flow of the first gas will be described with reference to FIG. When the ejection unit group is viewed in plan, the angle formed by both ends of the front side 61 and the first gas supply port 32a is α, and both ends 36b and 36b of the first protrusion 36 and the first gas supply port 32a are The angle formed is β, and the remaining two angles are γ. Since the first gas ejected from the first gas supply port 32a by the first gas supply unit 32 once collides with the upper surface and spreads isotropically, the gas flow rate proportional to the angles α, β, γ is the angle α, They are distributed to regions corresponding to β and γ, respectively.

The first gas ejected to the region corresponding to the angle α flows into the gas inflow region 60 from the front side 61 side through the flow path A. At this time, the angle α is set so that the first gas flowing into the gas inflow region 60 from the front side 61 side has a gas flow rate proportional to the length of the front side 61.

The first gas ejected to the region corresponding to the angle β collides with the first protrusion and is distributed laterally at an equal flow rate. Since the tip 36a of the first protrusion 36 is formed in a sharp corner, the first gas is not reflected to the first gas supply port side, and can be more effectively distributed to the side.

The first gas distributed laterally by the first projecting portion 36 is guided by the first guide portion as shown in the flow path B and flows into the gas inflow region 60 from the opposite side 62 side. At this time, the angle β is set so that the first gas flowing into the gas inflow region 60 from the opposing side 62 side has a gas flow rate proportional to the length of the opposing side 62.

The first gas ejected to the region corresponding to the angle γ flows into the gas inflow region 60 from the side surfaces 63 and 63 side through the flow path C. At this time, the angle γ is set such that the first gas flowing into the gas inflow region 60 from the side surface 61 side has a gas flow rate proportional to the length of the side surface 63.

As described above, the position of the first gas supply port 32a is such that the flow rate of the first gas flowing from each side of the front side 61, the opposite side 62, and the side sides 63, 63 of the gas inflow region 60 is changed to each side. It is set at a position where it can be distributed in proportion to the length of. As a result, the first gas can be flowed toward the gas inflow region 60 with a uniform velocity distribution, so that the first gas is ejected from each ejection part 34 at a uniform flow rate depending on the position of the ejection part 34. be able to.

In addition, the width W1 of the gas flow path between the side surface 63 and the side wall 35 and the width W2 of the gas flow path between the facing side 62 and the side wall 35 may correspond to the gas flow rate. As a result, the speed distribution can be made more uniform.

Since the first gas can flow while maintaining symmetry with respect to the symmetry axis X in the longitudinal direction of the gas inflow region 60, the first gas flows toward the gas inflow region 60 with a more even speed distribution. be able to.

As shown in FIG. 4, the second gas chamber 41 has a structure similar to that of the first gas chamber 31. The second gas chamber 41 is formed on the inner side of the side wall 43 so as to protrude toward the second gas supply port 42a, and has a second protrusion 44 that distributes the second gas to the side, and is convex outward. The second gas which is formed in a curved surface and distributed by the second projecting portion 44 is guided so as to flow from a position corresponding to the opposed side 62 inside the first gas chamber 31 toward a position corresponding to the ejection portion group. A second guide portion 45 is formed. In addition, an R portion 46 formed in a curved shape that protrudes outward is formed at the corner of the second gas chamber 41 facing the second guide portion 45.

By providing the second gas chamber 41 with a second projecting portion and a second guide portion corresponding to the first projecting portion and the first guide portion of the first gas chamber 31, respectively, the second gas chamber 41 is provided with the second gas. Therefore, the second gas can be ejected from each gas supply pipe 51 at a more uniform speed. Thereby, in each gas supply pipe 51 and each ejection part 34, the 1st gas and the 2nd gas can be mixed more uniformly. Moreover, since the ejection part 34 is each provided so that the gas supply pipe | tube 51 in which 2nd gas ejects may be surrounded, the interface which 1st gas and 2nd gas contact can be increased, and efficiency Both can be mixed.

  The mixed gas is introduced into the mixed gas circulation section 6 with a uniform speed distribution.

(Example of change)
The number of the gas supply pipes 51 is not limited to this embodiment, and various shapes such as a circle, an ellipse, and a polygon other than a square can be adopted as the array shape.
Various shapes can be adopted for the first protrusion 36 as long as the first gas can be efficiently distributed to the side. For example, you may provide a plane part.
The first guide part 37 can adopt various shapes as long as it can guide the first gas distributed by the first projecting part 36 so as to flow into the gas inflow region 60 from the opposite side 62 side. . For example, it can be a curved surface shape other than an arc.

As shown in FIG. 5, the first gas chamber 31 may be provided with a first gas guide tube 39 formed in a tubular shape protruding from the first gas supply port 32a toward the upper surface portion 31b. The first gas guide pipe 39 guides the first gas introduced into the first gas chamber 31 from the first gas supply port 32a so as not to spread to the vicinity of the upper surface portion 31b, and is narrow just above the first gas supply port 32a. Since it can be made to collide with a field, the 1st gas can be made to collide appropriately with upper surface part 31b, and can be expanded more isotropically. Thereby, since the first gas can be distributed more accurately, a more uniform speed distribution can be obtained.

[Effect of the first embodiment]
According to the gas mixing / rectifying device 1 of the present invention, with the above-described configuration, the gas mixing / rectifying device 1 is ejected from the first gas supply port 32a provided in the bottom surface portion 31a of the first gas chamber 31, and once onto the upper surface portion 31b. The first gas which is collided and isotropically spread is distributed to the side by the first projecting portion 36 formed inside the side wall portion 35 of the first gas chamber 31, and is formed into a curved surface which is convex outward. The front side 61 of the gas inflow region 60 is guided by guiding the first gas distributed by the first protrusion 36 by the first guide portion 37 so as to flow into the gas inflow region 60 from the opposite side 62 side. The flow rate of the first gas flowing from each side of the facing side 62 and the side surfaces 63, 63 can be distributed in proportion to the length of each side.
As a result, the first gas can flow toward the gas inflow region 60 at a uniform speed distribution, and the second gas can be ejected from the ejection portions 34 at a uniform flow rate. It can mix efficiently with the 1st gas which spouts from 51, and can rectify | straighten so that a uniform flow rate may be obtained. Moreover, since the ejection part 34 which ejects 1st gas is provided corresponding to the gas supply pipe | tube 51, respectively, since the interface which 1st gas and 2nd gas contact can be increased, it is more efficient. Both can be mixed.
As a result, two types of gas can be mixed and rectified to obtain a uniform flow rate with a single device. Therefore, gas mixing and rectification to obtain a mixed gas flow of an arbitrary composition with a uniform flow rate The apparatus 1 can be reduced in size.

(Second Embodiment)
A combustor using the gas mixing / rectifying device structure of the present invention will be described with reference to the drawings. Since the micro-frame array type combustor developed by the inventors (Japanese Patent Laid-Open No. 2009-192213) can be suitably used for surface heating, it is possible to increase the area of a combustion part composed of a plurality of burners. Although it is desirable, by enlarging the combustion section, the flow rates of the fuel gas and the oxidant gas in each nozzle may become uneven, and there is a possibility that the flame disappears or coalesces. In order to form a micro flame without the disappearance and coalescence of the flame, it is necessary that the combustion gas ejected from each burner and the oxidant gas supplied from the periphery of each burner have a uniform flow rate. Since the size of the combustor is highly demanded to be reduced in size, it is not possible to adopt a configuration that improves the speed distribution of the combustion gas and the oxidant gas by increasing the combustor size.

Therefore, the structure obtained by removing the mixed gas flow part 6 from the gas mixing / rectifying device 1 of the first embodiment is adopted as a micro flame array type combustor.

In order to use the structure of the gas mixing / rectifying device of the present invention as a micro flame array type combustor, the gas supply pipe 51 is a burner that forms a micro flame that is a hemispherical micro flame at the tip 51a, and the first gas is used as a fuel. An oxidant gas such as air for burning the gas, and the second gas is a fuel gas such as methane, butane, or propane.

When the fuel gas is ejected from the tip 51a of the gas supply pipe 51 and the oxidant gas is ejected from the ejection portion 34 so as to have a predetermined flow rate, ignition is performed at the tip 51a of each gas supply pipe 51. Each is formed, and a combustion part which is a flat heating surface is formed. The oxidant gas ejected from the ejection part 34 is supplied so as to surround the microframe.

It can heat by making a heating target object adjoin to this combustion part.

By using the micro flame array type combustor having the above-described configuration, the fuel gas and the oxidant gas can be ejected at uniform speed distributions without increasing the size of the combustor. Even if the area is increased, it is possible to form a micro frame that does not disappear or coalesce. In addition, since the combustion gas flows at a uniform flow rate, it can be configured as a combustor that can supply the combustion gas with a uniform flow rate into the flow path.

[Effects of Second Embodiment]
By using the gas mixing / rectifying device 1 of the present invention and the micro-frame array type combustor having the above-described configuration, the fuel gas and the oxidant gas are not evenly distributed in the gas supply pipes 51 and the ejection portions 34, respectively. Since it can be ejected at a speed distribution, a combustor capable of uniform surface heating is formed by forming a micro flame that does not disappear or coalesce even if the combustion area is enlarged, and there is no unevenness in the distribution of the flame. It can be configured in a small size. Moreover, it can comprise as a combustor which can supply the combustion gas of uniform flow velocity in a flow path.

  The flow rate distribution of the gas ejected from the first gas chamber through each ejection portion was examined by numerical fluid analysis.

In the embodiment, the shape shown in FIG. 3 is used, and the ejection portions are arranged in a 17 × 13 array, W1 / W2 = 16/6, α = 70 °, and β = 90 °.

As a comparative example, a shape in which gas is introduced from the side surface 131 of the upper member 103 as shown in FIG. 6 was adopted. The gas is introduced into the first gas chamber 132 via a gas supply path 133 that communicates the side portion 131 on the short side of the upper member 103 and the first gas chamber 132. The first gas chamber 132 is rectangular and has the same depth as in the embodiment, and the shape and arrangement of the ejection portion 134 are the same as in the embodiment. The distance between the gas inflow region and the side wall of the first gas chamber 132 was the same as W2 in the example. That is, in the embodiment, the space around the ejection portion is widened as compared with the comparative example.

Numerical fluid analysis was performed using SolidWorks Flow Simulation 2009 (Dassault Systèmes Solid Works). SolidWorks Flow
In Simulation, the basic equations of the flow field are solved on a rectangular mesh composed of planes perpendicular to the three-dimensional coordinate axes using the finite volume method. Based on the finite volume method, the equation system is discretized as a conservative system. Spatial differentiation is approximated by a second-order implicit difference operator, and temporal differentiation is approximated by an implicit first-order Euler scheme. In this software, the numerical viscosity is reduced to a negligible level compared to the physical fluid viscosity.

The calculation conditions were internal flow, the flow inlet was given a volume flow inflow condition of 8.78 × 10 ^-4 m ³ / s, and the outlet was ambient pressure. Further, in order to reproduce a large number of minute ejection parts, the mesh was appropriately redivided.

  FIG. 7 shows the result of numerical fluid analysis of the flow rate distribution of the jetted gas. Here, the left direction of the graph corresponds to the downward direction of FIGS. 3 and 6, that is, the front side of the gas inflow region, and the left and right direction of the graph corresponds to the side surface side of the gas inflow region. A bar graph shows the flow volume from each ejection part.

  In the comparative example, as shown in FIG. 7A, the gas flow rate was large in the region from the center of the front side where the gas was introduced toward the longitudinal direction, and a large flow rate distribution was also observed in the width direction. The ratio of the maximum gas flow rate to the minimum flow rate was over 200 times.

On the other hand, in the example, as shown in FIG. 7B, although the gas flow rate slightly increased in the vicinity of the front side compared to other regions, a large flow rate distribution was not recognized in the width direction. Further, the ratio of the maximum gas flow rate to the minimum gas flow rate is less than twice, and the gas flow rate distribution is greatly improved.

  From the above, it was confirmed that rectification for obtaining a uniform flow rate is possible by using the gas mixing / rectifying device having the configuration of the present invention.

DESCRIPTION OF SYMBOLS 1 ... Gas mixing and rectification apparatus 2 ... Housing 3 ... Upper member 4 ... Lower member 5 ... Partition part 30 ... 1st gas supply means 31 ... 1st gas chamber 31a ... Bottom surface part 31b ... Upper surface part 32 ... 1st gas supply Part 32a ... 1st gas supply port 33 ... Through-hole 34 ... Ejection part 35 ... Side wall part 36 ... 1st protrusion part 37 ... 1st guide part 38 ... R part 40 ... 2nd gas supply means 41 ... 2nd gas chamber 42 ... 2nd gas supply part 42a ... 2nd gas supply port 43 ... Side wall part 44 ... 2nd protrusion part 45 ... 2nd guide part 51 ... Gas supply pipe | tube 60 ... Gas inflow area | region 61 ... Front side 62 ... Opposite side 63 ... Side face Neighborhood

Claims (7)

First gas supply means for supplying a first gas;
Second gas supply means for supplying a second gas to be mixed with the first gas;
A plurality of tubular gas supply pipes for ejecting the second gas from the tip;
A gas mixing / rectifying device, each of which is disposed so as to surround an outer peripheral surface of the plurality of gas supply pipes, and has a jetting part for jetting the first gas,
The first gas supply means communicates with the first gas chamber at a first gas chamber having a flat shape and a first gas supply port provided in a bottom surface portion of the first gas chamber, A first gas supply unit for supplying the first gas to the first gas chamber,
The second gas supply means communicates with the second gas chamber through a flat second gas chamber and a second gas supply port, and supplies the second gas to the second gas chamber. A second gas supply unit,
The first gas chamber and the second gas chamber are laminated and formed via a partition wall that supports the plurality of gas supply pipes,
The plurality of gas supply pipes communicate with the second gas chamber at the other end opposite to the tip, and from a plurality of through holes provided in an upper surface portion facing the bottom surface portion of the first gas chamber. Each tip protrudes to the outside of the housing, and the ejection part is supported by the partition part so as to be formed as a gap between the inner edge of the through hole and the outer peripheral surface of the gas supply pipe,
When the first gas chamber is viewed in plan view from the upper surface side, a rectangular surface circumscribing the ejection portion group composed of the plurality of ejection portions and having the smallest area is assumed. A rectangular gas inflow region having the first gas chamber is set in the first gas chamber, the side on the first gas supply port side is the front side, the side facing the front side is the opposing side, and the two sides orthogonal to the front side Is the side,
The first gas chamber is formed on the inner side of the side wall portion of the first gas chamber connecting the bottom surface portion and the upper surface portion so as to project toward the first gas supply port, and distributes the first gas to the side. A first protrusion;
A first guide portion that is formed in a curved surface that protrudes outward and guides the first gas distributed by the first protrusion so as to flow into the gas inflow region from the opposite side; , Is formed,
After ejecting from the first gas supply port and colliding with the upper surface, the flow rate of the first gas flowing into the gas inflow region from each side of the front side, the opposite side, and the side surface is A gas mixing / rectifying device characterized in that it is distributed in proportion to its length. The gas mixing / rectifying device according to claim 1, wherein a tip end of the first projecting portion is formed in a sharp corner shape. The gas flow rate distributed in proportion to an angle α formed by both end portions of the front side and the first gas supply port when the ejection portion group is viewed from the front end direction is the length of the front side. Gas flow rate proportional to
The gas flow rate distributed in proportion to the angle β formed by both ends of the first protrusion and the first gas supply port is such that the gas flow rate proportional to the length of the opposite side is from the opposite side. In order to achieve a gas flow rate that flows into the gas inflow region,
The gas mixing / rectifying device according to claim 1 or 2, wherein a position of the first gas supply port is set. When the facing side and the side surface are parallel to the side wall of the first gas chamber, the ratio of the distance between the side surface and the side wall and the distance between the facing side and the side wall is the side surface. 4. The gas mixing / rectifying device according to claim 1, wherein the gas mixing / rectifying device is configured to be equal to a ratio of a length of the opposite side to a length of the opposite side. 5. The first gas supply port and the first projecting portion are disposed on the axis of symmetry of the gas inflow region, and the first gas chamber is formed in a shape symmetric with respect to the axis of symmetry. The gas mixing / rectifying device according to any one of claims 1 to 4, wherein: The second gas supply port is provided on a bottom surface of the second gas chamber;
The second gas chamber is formed on the inner side of the side wall portion so as to project toward the second gas supply port, and has a second projecting portion for distributing the second gas to the side, and an outward projecting portion. The second gas distributed by the second protrusion is directed from a position corresponding to the opposite side of the second gas chamber toward a position corresponding to the ejection part group. The gas mixing / rectifying device according to claim 1, wherein a second guide portion that guides the gas to flow is formed. The gas mixing / rectifying device according to any one of claims 1 to 6, wherein the gas supply pipe is a burner that forms a micro-frame that is a hemispherical micro flame at the tip, and the second gas is A combustor comprising a fuel gas and the first gas as an oxidant gas for burning the fuel gas.

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