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JP5854875B2 - Electroformed parts - Google Patents
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JP5854875B2 - Electroformed parts - Google Patents

Electroformed parts Download PDF

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JP5854875B2
JP5854875B2 JP2012035390A JP2012035390A JP5854875B2 JP 5854875 B2 JP5854875 B2 JP 5854875B2 JP 2012035390 A JP2012035390 A JP 2012035390A JP 2012035390 A JP2012035390 A JP 2012035390A JP 5854875 B2 JP5854875 B2 JP 5854875B2
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electroformed
layer
electroformed layer
nickel
electroforming
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JP2013170300A (en
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岸 松雄
松雄 岸
未英 小西
未英 小西
新輪 隆
隆 新輪
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Seiko Instruments Inc
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Description

本発明は、電気めっき法による電鋳部品の製造方法及び電鋳部品に関する。   The present invention relates to a method for producing an electroformed part by electroplating and an electroformed part.

一般的に、電鋳法による電鋳部品の製造は、以下のようにして行う。まず、原型と呼ばれる所望とする部品と同じ形状を有する型により、この形状が転写可能な樹脂等にこの形状を転写して電鋳型を形成する。ついで、容易に剥離が可能な、銀鏡反応、蒸着等のメタライズ法により電鋳型へ導電膜を付与し、この表面に湿式めっき法により電鋳をなすことで、電鋳体が形成される。この電鋳体は、電鋳後に電鋳型から機械的あるいは化学的に分離し、必要に応じて後加工がなされることで、所望とする電鋳部品となる。   In general, the production of electroformed parts by electroforming is performed as follows. First, by using a mold having the same shape as a desired part called a prototype, this shape is transferred to a resin or the like to which this shape can be transferred to form an electroforming mold. Next, an electroformed body is formed by applying a conductive film to the electroforming mold by a metallizing method such as silver mirror reaction and vapor deposition, which can be easily peeled off, and electroforming the surface by wet plating. This electroformed body is mechanically or chemically separated from the electroforming mold after electroforming, and is subjected to post-processing as necessary, so that a desired electroformed part is obtained.

しかしながら、この電鋳方法では、電鋳型に備わる凹部において、電鋳時におけるめっき膜の成長は、底部よりも側面部や上部の方が早いため、成長した電鋳体に簾と呼ばれる空孔や上面での裂け目を生じさせることがある。特に、この現象は、凹部の幅に対する深さの比が大きくなる高アスペクト品に対して顕著であるため、電鋳部品の適用範囲が限られていた。特に、電鋳部品として最も広く用いられているニッケルやニッケル合金では、凹部とその近傍でのめっき成長が早く上記のような現象を起こしやすいものであるので、高アスペクト品に対する適用範囲が極めて限定的であったり、表面に裂け目状の欠陥を有するものが形成されることが多々あった。   However, in this electroforming method, in the concave portion provided in the electroforming mold, the growth of the plating film at the time of electroforming is faster at the side portion and the upper portion than at the bottom portion. May cause a tear at the top. In particular, this phenomenon is conspicuous for a high aspect product in which the ratio of the depth to the width of the concave portion is large, so that the range of application of the electroformed component is limited. In particular, nickel and nickel alloys, which are most widely used as electroformed parts, are prone to the phenomenon described above because of the rapid growth of plating in and around the recesses, so the scope of application to high aspect products is extremely limited. In many cases, the surface has a crack or a crack-like defect.

これに対して、例えば、導電性基板にフォトレジストをコーティングし、フォトリソグラフィーによりフォトレジストに開口部を設けることにより電鋳型を作製し、開口部底部のみからめっき成長させる電鋳方法が取られている。この方法によれば、めっきの成長が底部からの一方向のみであることから、転写法による電鋳のような簾や裂け目状の欠陥を生じることが無い。   On the other hand, for example, an electroforming method is employed in which a conductive substrate is coated with a photoresist, an electroforming mold is produced by providing an opening in the photoresist by photolithography, and plating is grown only from the bottom of the opening. Yes. According to this method, since the growth of plating is only in one direction from the bottom, defects such as wrinkles and tears as in electroforming by the transfer method do not occur.

さらに近年、フォトリソグラフィーによる電鋳精度を向上するために、シリコンプロセスにより感光性材料を用いて電鋳型形状に加工するLIGA(Lithographie Galvanofomung Abformung)法によって電鋳型を製造し、あわせて微小な形状を有する部品や金型を製造することが提案されている(例えば、特許文献1参照)。当該LIGA法による電鋳型の製造では、X線による露光方法と紫外線による露光方法が行われている。   Furthermore, in recent years, in order to improve electroforming accuracy by photolithography, an electroforming mold is manufactured by a LIGA (Lithography Galvanoforming Abforming) method in which a photosensitive material is used to form an electroforming mold using a silicon process, and a minute shape is also formed. It has been proposed to manufacture parts and molds having the same (for example, see Patent Document 1). In the production of an electroforming mold by the LIGA method, an exposure method using X-rays and an exposure method using ultraviolet rays are performed.

しかしながら、LIGA法を含めたフォトリソグラフィーによる電鋳法では、フォトレジストや製造に係わる設備等が高価であることや、製造プロセスが長く、且、転写法と比べ大量生産に適していないことから、コスト面で不利であった。   However, in electroforming by photolithography including the LIGA method, photoresist and manufacturing equipment are expensive, the manufacturing process is long, and it is not suitable for mass production compared to the transfer method. It was disadvantageous in terms of cost.

特開平11−15126号公報Japanese Patent Laid-Open No. 11-15126

本発明は、上記事情に鑑みてなされたものであり、転写型による電鋳法で作製され、ニッケルやニッケル合金からなるものについて、簾や裂け目状の欠陥の形成を防止した電鋳部品の製造方法及び電鋳部品を提供することを目的とする。   The present invention has been made in view of the above circumstances, and is manufactured by an electroforming method using a transfer mold, and manufacturing an electroformed component that prevents the formation of defects such as wrinkles and tears in nickel or a nickel alloy. The object is to provide a method and an electroformed part.

本発明は、上記課題を解決するため、以下の手段を採用する。
本発明に係わる電鋳部品の製造方法は、複数の電鋳層が積層されてなる電鋳部品の製造方法であって、表面に導電層が形成された絶縁材からなる電鋳型にニッケルまたはニッケル合金からなる第1の電鋳層を形成する工程と、前記第1の電鋳層の表面に、前記第1の電鋳層よりも層としての容積が小さい銅からなる第2の電鋳層を形成する工程と、を含むことを特徴とする。
The present invention employs the following means in order to solve the above problems.
A method for producing an electroformed part according to the present invention is a method for producing an electroformed part formed by laminating a plurality of electroformed layers, wherein nickel or nickel is applied to an electroform made of an insulating material having a conductive layer formed on a surface thereof. A step of forming a first electroformed layer made of an alloy, and a second electroformed layer made of copper having a smaller volume as the layer than the first electroformed layer on the surface of the first electroformed layer Forming the step.

この電鋳部品の製造方法は、表面に導電層が形成された電鋳型を用いるニッケルまたはニッケル合金を主体とする電鋳部品の製造方法であって、樹脂等の絶縁性を有する型の表面に導電性金属膜が形成されていることから、導電性を有する型を容易に提供することができ、型をなす面全面にニッケルまたはニッケル合金からなる第1の電鋳層が形成され、凹部開口部の入り口を塞ぐ前に穴埋め効果を有する銅または銅めっきによる第2の電鋳層を形成するため、凹部に空隙や凹部入り口における裂け目のような欠陥無くなり、型や導電性金属膜を除去し、必要に応じて後加工を施すことにより、空孔や裂け目状の欠陥が無い電鋳部品を提供することが出来る。   This method for producing an electroformed part is a method for producing an electroformed part mainly composed of nickel or a nickel alloy using an electroforming mold having a conductive layer formed on the surface thereof, on the surface of an insulating mold such as a resin. Since the conductive metal film is formed, a conductive mold can be easily provided, and the first electroformed layer made of nickel or nickel alloy is formed on the entire surface forming the mold, and the recess opening is formed. In order to form a second electroformed layer by copper or copper plating that has a hole filling effect before closing the entrance of the part, there is no defect such as a gap or a crack at the entrance of the recessed part, and the mold and the conductive metal film are removed. By performing post-processing as necessary, it is possible to provide an electroformed part free of voids and cracks.

また、本発明に係わる電鋳部品の製造方法において、前記電鋳型は、全体または一部が樹脂からなることを特徴とする。
また、本発明に係わる電鋳部品の製造方法において、前記第2の電鋳層の表面にニッケルまたはニッケル合金からなる第3の電鋳層を形成する工程をさらに備えることを特徴とする。
In the electroformed component manufacturing method according to the present invention, the electroforming mold is entirely or partially made of a resin.
The method for manufacturing an electroformed component according to the present invention further includes a step of forming a third electroformed layer made of nickel or a nickel alloy on the surface of the second electroformed layer.

この電鋳部品の製造方法は、表面に導電層が形成された樹脂等からなる電鋳型を用いるニッケルまたはニッケル合金を主体とする電鋳部品の製造方法であって、樹脂等の絶縁性を有する型の表面に導電性金属膜が形成されていることから、導電性を有する型を容易に提供することができ、型をなす面全面にニッケルまたはニッケル合金からなる第1の電鋳層が形成され、凹部開口部の入り口を塞ぐ前に穴埋め効果を有する銅または銅めっきによる第2の電鋳層を形成するため、凹部に空隙や凹部入り口における裂け目のような欠陥無くなり、さらに第2の電鋳層である銅めっき層の上にニッケルまたはニッケル合金からなる第3の電鋳層を形成し、型や導電性金属膜を除去し、必要に応じて後加工を施すことにより、空孔や裂け目状の欠陥が無く、且、第1および第3の電鋳層の強度が高いため強度に優れた電鋳部品を提供することが出来る。   This method for producing an electroformed part is a method for producing an electroformed part mainly composed of nickel or a nickel alloy using an electroforming mold made of a resin having a conductive layer formed on its surface, and has an insulating property such as a resin. Since the conductive metal film is formed on the surface of the mold, a conductive mold can be easily provided, and the first electroformed layer made of nickel or nickel alloy is formed on the entire surface forming the mold. In order to form the second electroformed layer by copper or copper plating having a hole filling effect before closing the entrance of the recess opening, there is no defect in the recess such as a gap or a tear at the entrance of the recess, and the second electric By forming a third electroformed layer made of nickel or a nickel alloy on the copper plating layer, which is a cast layer, removing the mold and the conductive metal film, and performing post-processing as necessary, pores and A crack-like defect Ku, 且, the strength of the first and third electroforming layer provides excellent electroformed component strength for high possible.

また、本発明に係わる電鋳部品の製造方法において、前記第2の電鋳層と前記第3の電鋳層の境界面のうち前記電鋳型における最深部が、当該凹部の内部にあることを特徴とする。
この電鋳部品の製造方法は、電鋳型凹部において、第2の電鋳層と第3の電鋳層の境界部の最深部がこの凹部の内部にあるため、電鋳後、後加工により電鋳型の凹部の途中或いは凹部上端部より余分な電鋳部を除去する場合、3層構造を有するものとなるため強度に優れた電鋳部品を提供することができる。
Further, in the method for manufacturing an electroformed component according to the present invention, the deepest portion of the electroforming mold among the boundary surfaces between the second electroformed layer and the third electroformed layer is inside the recess. Features.
In this electroformed component manufacturing method, since the deepest portion of the boundary between the second electroformed layer and the third electroformed layer is in the recessed portion in the electroformed recess, the electroforming is performed by post-processing after electroforming. When an extra electroformed part is removed in the middle of the concave part of the mold or from the upper end part of the concave part, an electroformed part having excellent strength can be provided because it has a three-layer structure.

また、本発明に係わる電鋳部品において、ニッケルまたはニッケル合金からなる第1の電鋳層と、前記第1の電鋳層の表面に形成され、前記第1の電鋳層よりも層としての容積が小さい銅からなる第2の電鋳層と、が積層されてなることを特徴とする。
また、本発明に係わる電鋳部品において、前記第2の電鋳層の表面にニッケルまたはニッケル合金からなる第3の電鋳層が積層されてなることを特徴とする。
Further, in the electroformed component according to the present invention, the first electroformed layer made of nickel or a nickel alloy is formed on the surface of the first electroformed layer, and the layer is more layered than the first electroformed layer. A second electroformed layer made of copper having a small volume is laminated.
In the electroformed component according to the present invention, a third electroformed layer made of nickel or a nickel alloy is laminated on the surface of the second electroformed layer.

また、本発明に係わる電鋳部品において、前記第1の電鋳層は上面に凹部を有し、前記第2の電鋳層は当該凹部に積層されてなり、前記第2の電鋳層と前記第3の電鋳層の境界面のうちの最深部が、前記凹部の内部にあることを特徴とする。
また、本発明に係わる電鋳部品において、前記第3の電鋳層の表面は、ニッケルめっき層で覆われてなることを特徴とする。
Further, in the electroformed component according to the present invention, the first electroformed layer has a concave portion on an upper surface, and the second electroformed layer is laminated on the concave portion, and the second electroformed layer and The deepest portion of the boundary surface of the third electroformed layer is inside the recess.
In the electroformed component according to the present invention, the surface of the third electroformed layer is covered with a nickel plating layer.

この発明によれば、転写型による電鋳法で作製され、ニッケルやニッケル合金からなるものについて、簾や裂け目状の欠陥の形成を防止した電鋳部品の製造方法及び電鋳部品を提供することができる。   According to the present invention, there is provided an electroformed component manufacturing method and an electroformed component which are produced by an electroforming method using a transfer die and which are formed of nickel or a nickel alloy and prevent formation of defects such as wrinkles and tears. Can do.

本発明の実施形態に係わる電鋳部品の製造方法により作製された電鋳部品の断面を示す図である。It is a figure which shows the cross section of the electroformed component produced by the manufacturing method of the electroformed component concerning embodiment of this invention. 本発明の実施形態に係る電鋳部品の製造方法のうち、型に導電層を形成する工程を示す図である。It is a figure which shows the process of forming a conductive layer in a type | mold among the manufacturing methods of the electroformed component which concerns on embodiment of this invention. 本発明の実施形態に係わる電鋳部品の製造方法のうち、第1の電鋳層、第2の電鋳層および第3の電鋳層を形成する工程を示す図である。It is a figure which shows the process of forming the 1st electroformed layer, the 2nd electroformed layer, and the 3rd electroformed layer among the manufacturing methods of the electroformed component concerning embodiment of this invention. 本発明の実施形態に係る電鋳部品の製造方法のうち、電鋳体の表面を加工し、電鋳型から電鋳部品を分離する工程を示す図である。It is a figure which shows the process of processing the surface of an electroformed body and isolate | separating an electroformed part from an electroforming mold among the manufacturing methods of the electroformed part which concerns on embodiment of this invention. 本発明の実施形態に係る電鋳部品の製造方法のうち、電鋳部品の表面にめっきを施す工程を示す図である。It is a figure which shows the process of plating on the surface of an electroformed component among the manufacturing methods of the electroformed component which concerns on embodiment of this invention.

本発明に係る実施形態について、図を参照して説明する。
図1は、本発明の実施形態に係る電鋳部品の製造方法により作製される、機械式腕時計のムーブメントを構成するための歯車やバネ部品等の電鋳部品の断面を示す図である。
Embodiments according to the present invention will be described with reference to the drawings.
FIG. 1 is a view showing a cross section of an electroformed part such as a gear or a spring part for constituting a movement of a mechanical wristwatch produced by a method for producing an electroformed part according to an embodiment of the present invention.

この電鋳部品1は、ニッケルからなる第1の電鋳層9と、第1の電鋳層9よりも層としての容積が小さい銅からなる第2の電鋳層10とニッケルからなる第3の電鋳層12と、これら第1の電鋳層9、第2の電鋳層10および第3の電鋳層12を覆うリンを含有する無電解ニッケルからなるニッケルめっき層14と、から構成されている。   The electroformed component 1 includes a first electroformed layer 9 made of nickel, a second electroformed layer 10 made of copper having a smaller volume than the first electroformed layer 9, and a third made of nickel. And a nickel plating layer 14 made of electroless nickel containing phosphorus covering the first electroformed layer 9, the second electroformed layer 10, and the third electroformed layer 12. Has been.

このような構造を有する電鋳部品1は、図2(a)に示した型6に、図2(b)に示す導電層7を形成する工程と、図3(a)に示した第1の電鋳層9、図3(b)に示す第2の電鋳層10および図3(c)に示す第3の電鋳層12を形成する工程と、図4(a)(b)に示した電鋳体13の表面を加工し、電鋳型8から電鋳部品14を分離する工程と、図5に示した電鋳部品14の表面にめっきを施す工程と、によって製造される。   The electroformed component 1 having such a structure includes a step of forming a conductive layer 7 shown in FIG. 2B on the mold 6 shown in FIG. 2A and a first step shown in FIG. 4 (a) and 4 (b), forming the second electroformed layer 9 shown in FIG. 3 (b) and the third electroformed layer 12 shown in FIG. 3 (c). It is manufactured by processing the surface of the electroformed body 13 shown and separating the electroformed component 14 from the electroforming mold 8 and plating the surface of the electroformed component 14 shown in FIG.

図2(a)に示した型6は、例えば、ワックス、樹脂材等の絶縁材からなり、機械加工やLIGAによって作製される原型を用いたスタンピング等の手段や感光性樹脂による光造型やフォトリソグラフィー等により作製される。   The mold 6 shown in FIG. 2A is made of, for example, an insulating material such as wax or a resin material, and is a means such as stamping using a prototype produced by machining or LIGA, photo-molding or photo-molding using a photosensitive resin. It is produced by lithography or the like.

そして、図2(b)に示す如く、型6のうち、少なくとも所望とする電鋳部品が形成されるべき部分である凹部6aの底面及び側面とこれに電気的に繋げるべき面である型6の上面に、剥離可能な導電層7を銀鏡反応、無電解めっきや真空めっき等により形成することにより電鋳型8を作製する。   Then, as shown in FIG. 2 (b), at least the bottom surface and the side surface of the recess 6a, which is a portion in which a desired electroformed part is to be formed, and the surface 6 to be electrically connected to the mold 6 are formed. An electroforming mold 8 is produced by forming a peelable conductive layer 7 on the upper surface of the substrate by silver mirror reaction, electroless plating, vacuum plating or the like.

次に、図3(a)−(c)に示す如く、第1の電鋳層9、第2の電鋳層10および第3の電鋳層12を順次形成する。
まず、図3(a)に示す第1の電鋳層9は、スルファミン酸ニッケル系電鋳液を用いて電鋳することにより形成される。ここで、この電鋳液から析出する第1の電鋳層9は、電鋳型8の輪郭に対してほぼ平行に成長する。そのため、第1の電鋳層9は、凹部6aを完全に埋める、いわゆる穴埋め効果を殆ど有しておらず、最後まで電鋳すると凹部に空孔や隙間を形成することになる。そこで、第1の電鋳層9の厚みは、電鋳型8の凹部の開口径の1/3以下とする。
Next, as shown in FIGS. 3A to 3C, a first electroformed layer 9, a second electroformed layer 10, and a third electroformed layer 12 are sequentially formed.
First, the first electroformed layer 9 shown in FIG. 3A is formed by electroforming using a nickel sulfamate electroforming solution. Here, the first electroformed layer 9 deposited from the electroforming liquid grows substantially parallel to the contour of the electroforming mold 8. Therefore, the first electroformed layer 9 has almost no so-called hole filling effect that completely fills the recess 6a, and when electrocasting to the end, voids and gaps are formed in the recess. Therefore, the thickness of the first electroformed layer 9 is set to 1/3 or less of the opening diameter of the concave portion of the electroforming mold 8.

次いで、図3(b)に示す如く、第1の電鋳層9の表面に、硫酸銅を主成分とするフィルドビア用の銅めっき液を用いて、第2の電鋳層10を形成する。この第2の電鋳層10を構成する銅電鋳は、第1の電鋳層9を構成するニッケル電鋳とは異なり、凹部9aの底面において最も成長が速く、且凹部9aの開口付近での成長が遅いため穴埋め性が高いという特性を有している。第2の電鋳層10のめっきとしての厚みは、最終的な電鋳部品1の強度やバネ性等の必要とされる特性に応じたものや第3の電鋳層12に空孔や隙間等を生じさせないものとすれば良い。ここで、本実施形態の如く、第3の電鋳層12を形成する場合は、第1の電鋳層9の厚みと第2の電鋳層10の厚みとの和が所望とする電鋳部品1の厚みより薄くする必要がある。したがって、第2の電鋳層10の凹部10aにおける最深部11の位置は、この凹部10aより上部を後加工により除去する場合、凹部の内側とする必要がある。   Next, as shown in FIG. 3B, a second electroformed layer 10 is formed on the surface of the first electroformed layer 9 using a copper plating solution for filled vias mainly composed of copper sulfate. The copper electroforming that constitutes the second electroformed layer 10 is different from the nickel electroforming that constitutes the first electroformed layer 9, and grows fastest on the bottom surface of the recess 9a, and near the opening of the recess 9a. Because of its slow growth, it has a characteristic of high filling performance. The thickness of the second electroformed layer 10 as a plating is determined according to required properties such as the strength and spring property of the final electroformed component 1, and the third electroformed layer 12 has voids and gaps. It is sufficient that it does not cause the above. Here, when the third electroformed layer 12 is formed as in this embodiment, the sum of the thickness of the first electroformed layer 9 and the thickness of the second electroformed layer 10 is desired. It is necessary to make it thinner than the thickness of the component 1. Therefore, the position of the deepest portion 11 in the recess 10a of the second electroformed layer 10 needs to be inside the recess when the upper portion from the recess 10a is removed by post-processing.

次いで、図3(c)に示す如く、第2の電鋳層10の表面に、第1の電鋳層9と同じ電鋳液を用いてニッケルからなる第3の電鋳層12を形成することで、電鋳体13を設ける。
次に、図4(a)に示す如く、図3(c)に示した電鋳体13の表面を加工し、電鋳型8から電鋳部品1を分離する工程では、研削および研磨により、電鋳型8の凹部より外部へ突出した部分と凹部のうち寸法外の部分を除去し、電鋳型8を機械的に取り除くことにより、図4(b)に示す電鋳体13を得る。なお、本実施形態において、第1の電鋳層9及び第3の電鋳層12は、ニッケルからなることとしたが、例えば、ニッケル合金で形成しても勿論よい。
Next, as shown in FIG. 3C, a third electroformed layer 12 made of nickel is formed on the surface of the second electroformed layer 10 using the same electroforming liquid as the first electroformed layer 9. Thus, the electroformed body 13 is provided.
Next, as shown in FIG. 4A, in the step of processing the surface of the electroformed body 13 shown in FIG. A portion outside the size of the concave portion of the mold 8 protruding from the concave portion and the concave portion are removed, and the electroformed mold 8 is mechanically removed to obtain the electroformed body 13 shown in FIG. In the present embodiment, the first electroformed layer 9 and the third electroformed layer 12 are made of nickel. However, for example, they may be made of a nickel alloy, for example.

次いで、図5に示すように、図4(b)に示した電鋳体13の表面にめっきを施す工程では、電鋳体13を適宜めっき前処理した後、リン系無電解ニッケルめっき液に投入することによりニッケルめっき層14を形成し、所望とする電鋳部品1を作製する。
このようにして作製された機械式腕時計ムーブ用部品である電鋳部品1は、穴埋め性に優れた銅電鋳を施して第2の電鋳層10を形成しているため、簾や裂け目状の欠陥の形成を好適に防止できる。さらに、電鋳部品1は、第1の電鋳層9や第3の電鋳層12のように、その大部分が強度に優れたニッケル電鋳で形成しているため、必要とする機械的強度を十分有しているものになる。
Next, as shown in FIG. 5, in the step of plating the surface of the electroformed body 13 shown in FIG. 4B, after the electroformed body 13 is appropriately pretreated, the phosphorous electroless nickel plating solution is used. The nickel plating layer 14 is formed by charging, and the desired electroformed part 1 is produced.
The electroformed part 1 which is a mechanical wristwatch move part manufactured in this way is formed with a second electroformed layer 10 by performing copper electroforming with excellent hole filling properties, and thus has a wrinkle or tear shape. The formation of defects can be suitably prevented. Furthermore, the electroformed component 1 is formed by nickel electroforming having excellent strength, like the first electroformed layer 9 and the third electroformed layer 12, and therefore requires the required mechanical properties. It will have sufficient strength.

なお、本実施形態では、機械的強度を高めるためにニッケル電鋳である第3の電鋳層12を形成したが、機械式腕時計ムーブ用部品と同程度の強度を必要としない部品であれば、第2の電鋳層10の厚みを厚くすることにより第3の電鋳層12を形成しなくとも足りる。   In the present embodiment, the third electroformed layer 12 made of nickel electroforming is formed in order to increase the mechanical strength. However, if the component does not require the same strength as the mechanical watch mover component, It is not necessary to form the third electroformed layer 12 by increasing the thickness of the second electroformed layer 10.

以上、本発明による電鋳部品の製造方法によれば、電鋳部品内に空孔や精度、外観上問題となる隙間状の欠陥がない電鋳部品を安価に、かつ、大量に提供することができる。   As described above, according to the method for producing an electroformed component according to the present invention, an electroformed component free of voids, accuracy, and gap-like defects that cause problems in appearance is provided at low cost and in large quantities. Can do.

1 電鋳部品
9 第1の電鋳層
10 第2の電鋳層
12 第3の電鋳層
14 ニッケルめっき層
6 型
7 導電層
8 電鋳型
11 最深部
13 電鋳体
DESCRIPTION OF SYMBOLS 1 Electroformed part 9 1st electroformed layer 10 2nd electroformed layer 12 3rd electroformed layer 14 Nickel plating layer 6 Type 7 Conductive layer 8 Electroforming mold 11 Deepest part 13 Electroformed body

Claims (2)

ニッケルまたはニッケル合金からなる第1の電鋳層と、前記第1の電鋳層の表面に形成され、前記第1の電鋳層よりも層としての容積が小さい銅からなる第2の電鋳層と、が積層されてなり、A first electroformed layer made of nickel or a nickel alloy, and a second electroformed layer made of copper, which is formed on the surface of the first electroformed layer and has a smaller volume than the first electroformed layer. Layered, and
前記第2の電鋳層の表面にニッケルまたはニッケル合金からなる第3の電鋳層が積層されてなり、A third electroformed layer made of nickel or a nickel alloy is laminated on the surface of the second electroformed layer;
電鋳型の凹部内の形状であり、表面は、ニッケルめっき層で覆われてなることを特徴とする電鋳部品。An electroformed component having a shape in a concave portion of an electroforming mold and having a surface covered with a nickel plating layer.
前記第1の電鋳層は上面に凹部を有し、前記第2の電鋳層は当該凹部に積層されてなり、前記第2の電鋳層と前記第3の電鋳層の境界面のうちの最深部が、前記凹部の内部にあることを特徴とする請求項1に記載の電鋳部品。The first electroformed layer has a concave portion on the upper surface, and the second electroformed layer is laminated on the concave portion, and a boundary surface between the second electroformed layer and the third electroformed layer is formed. 2. The electroformed component according to claim 1, wherein the deepest portion is inside the concave portion.
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