JP5879567B2 - X-ray diffraction sample rocking device, X-ray diffraction device, and X-ray diffraction pattern measurement method - Google Patents
X-ray diffraction sample rocking device, X-ray diffraction device, and X-ray diffraction pattern measurement method Download PDFInfo
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Description
本発明は、X線回折試料揺動装置、X線回折装置及びX線回折パターンの測定方法に関する。特に、本発明は、高圧下における粗粒かつ微少な粉末試料をX線照射位置で揺動することにより、均一な粉末X線回折リングを得る技術である。 The present invention relates to an X-ray diffraction sample rocking device, an X-ray diffraction device, and an X-ray diffraction pattern measurement method. In particular, the present invention is a technique for obtaining a uniform powder X-ray diffraction ring by swinging a coarse and minute powder sample under high pressure at an X-ray irradiation position.
ダイヤモンドアンビルセル(以下、DAC)の微少試料による高圧下のX線回折実験においては、回折に寄与する粒子の統計上の問題から、精密解析に足る良質な回折強度プロファイルを得ることが難しい。特に、DACを使った高圧下でのレーザー加熱実験においては、結晶粒の成長が不可避となることから、正確なX線回折強度データを獲得することは著しく困難である。 In an X-ray diffraction experiment under a high pressure using a very small diamond anvil cell (hereinafter referred to as DAC) sample, it is difficult to obtain a high-quality diffraction intensity profile sufficient for precise analysis due to statistical problems of particles contributing to diffraction. In particular, in a laser heating experiment under high pressure using a DAC, crystal grain growth is unavoidable, and it is extremely difficult to obtain accurate X-ray diffraction intensity data.
非特許文献1には、ガンドルフィカメラ型揺動について記載されている。また、非特許文献2および非特許文献3には、ガンドルフィカメラの原理が解説されている。
非特許文献1、2,3の記載から、我々は、微少かつ粗粒の試料から均一なデバイリングを得ることができる、ガンドルフィカメラ型の揺動に着目した。
しかし、ガンドルフィカメラによる揺動は、大気圧下の試料のX線回折で、試料支持方向は入射X線方向に対し、傾き角45度方向で支持され、自転しながら公転する。そのため、高圧装置を回転することができない。
Non-Patent Document 1 describes a Gandolfi camera type swing. Non-Patent Document 2 and Non-Patent Document 3 explain the principle of the Gandolfi camera.
From the description of Non-Patent Documents 1, 2, and 3, we focused on the Gandolfi camera-type oscillation that can obtain uniform Debye ring from a minute and coarse sample.
However, rocking by the Gandolfi camera is X-ray diffraction of the sample under atmospheric pressure, and the sample support direction is supported at a tilt angle of 45 degrees with respect to the incident X-ray direction, and revolves while rotating. Therefore, the high pressure device cannot be rotated.
従来技術によれば、高圧下では、θ方向のみの揺動がおこなわれてきた。これでは不十分で、回折点の数は増えるが、均一な回折リングを得ることはできない。ωのみの揺動、もしくはθ、ωを組み合わせた揺動の場合でも、回折点の数は増えるが、均一な回折リングを得ることはできない。 According to the prior art, rocking only in the θ direction has been performed under high pressure. This is insufficient, and the number of diffraction points increases, but a uniform diffraction ring cannot be obtained. Even in the case of the oscillation of only ω or the oscillation of a combination of θ and ω, the number of diffraction points increases, but a uniform diffraction ring cannot be obtained.
本発明は、粗粒かつ微少試料であっても均一な回折リングを得ることができるX線回折試料揺動装置、X線回折装置及びX線回折パターンの測定方法を提供することを課題とする。特に、高圧下においても、粗粒かつ微少試料の均一な回折リングを得ることができるX線回折試料揺動装置、X線回折装置及びX線回折パターンの測定方法を提供することを課題とする。 It is an object of the present invention to provide an X-ray diffraction sample rocking device, an X-ray diffraction device, and an X-ray diffraction pattern measurement method capable of obtaining a uniform diffraction ring even with a coarse and fine sample. . In particular, it is an object of the present invention to provide an X-ray diffraction sample rocking device, an X-ray diffraction device, and an X-ray diffraction pattern measurement method that can obtain a uniform diffraction ring of a coarse particle and a small sample even under high pressure. .
上記事情を鑑みて、本発明者は試行錯誤を重ね、従来のθのみの揺動に加え、すべての軸の中心をあわせるための調整機構を付与して、ω及びφの軸あわせを可能にして、φ、θ及びωの組み合わせ揺動により均一な回折リングを得ることができることを見出した。また、X線に対し垂直に保持できることから、高圧装置(ダイヤモンドアンビルセル)を回転することが可能な揺動機構を開発した。この揺動機構は、試料を中空ピンホール内に保持することができ、大気圧下の試料に対しても揺動しながら均一なX線回折リングを撮ることができる。これらの技術に基づき、DACによる高圧下粉末X回折用に多軸揺動装置を開発し、本発明を完成した。本発明者の知る限り、高圧下でこのような揺動をおこなってX線回折実験を行った研究報告はない。
本発明は、以下の構成を有する。
In view of the above circumstances, the present inventor has repeated trial and error, and in addition to the conventional oscillation of only θ, an adjustment mechanism for aligning the centers of all axes is provided to enable the alignment of ω and φ. Thus, it has been found that a uniform diffraction ring can be obtained by combined oscillation of φ, θ, and ω. In addition, a rocking mechanism that can rotate the high-pressure device (diamond anvil cell) has been developed because it can be held perpendicular to the X-rays. This rocking mechanism can hold the sample in the hollow pinhole, and can take a uniform X-ray diffraction ring while rocking the sample under atmospheric pressure. Based on these technologies, we developed a multi-axis oscillating device for high-pressure powder X diffraction by DAC and completed the present invention. To the best knowledge of the present inventor, there has been no research report on X-ray diffraction experiments with such oscillation under high pressure.
The present invention has the following configuration.
(1) X線回折試料を保持する試料保持部をX線入射方向と平行にした第1の回転軸の周りに揺動可能な第1の揺動部と、前記第1の回転軸と直交する第2の回転軸の周りに揺動可能な第2の揺動部と、前記第1及び第2の回転軸と直交する第3の回転軸の周りに揺動可能な第3の揺動部を有することを特徴とするX線回折試料揺動装置。 (1) A first swinging portion that can swing around a first rotating shaft in which a sample holding portion that holds an X-ray diffraction sample is parallel to the X-ray incident direction, and orthogonal to the first rotating shaft A second swinging portion swingable around the second rotating shaft, and a third swinging swingable around the third rotating shaft orthogonal to the first and second rotating shafts. An X-ray diffraction sample rocking device characterized by having a section.
(2) 前記第1の揺動部を前記第1の回転軸の周りに360度回転させる第1の回転機構が取り付けられていることを特徴とする(1)に記載のX線回折試料揺動装置。
(3) 前記第2の揺動部を前記第2の回転軸の周りに回転させる第2の回転機構が取り付けられていることを特徴とする(2)に記載のX線回折試料揺動装置。
(4) 前記第3の揺動部を前記第3の回転軸の周りに回転させる第3の回転機構が取り付けられていることを特徴とする(3)に記載のX線回折試料揺動装置。
(2) The X-ray diffraction sample swing according to (1), wherein a first rotation mechanism for rotating the first swinging portion around the first rotation axis by 360 degrees is attached. Moving device.
(3) The X-ray diffraction sample oscillating device according to (2), wherein a second rotating mechanism that rotates the second oscillating portion around the second rotating shaft is attached. .
(4) The X-ray diffraction sample oscillating device according to (3), wherein a third rotating mechanism that rotates the third oscillating portion around the third rotating shaft is attached. .
(5) 前記第3の揺動部が、3軸パルスモーター制御装置が備えられた台上に固定されていることを特徴とする(4)に記載のX線回折試料揺動装置。
(6) 前記第1の回転軸、前記第2の回転軸及び前記第3の回転軸の軸方向をそれぞれ独立に調整可能な軸調整機構が備えられていることを特徴とする(1)〜(5)のいずれかに記載のX線回折試料揺動装置。
(7) 前記試料保持部がダイヤモンドアンビルセルであることを特徴とする(1)〜(6)のいずれかに記載のX線回折試料揺動装置。
(5) The X-ray diffraction sample oscillating device according to (4), wherein the third oscillating portion is fixed on a table provided with a three-axis pulse motor control device.
(6) A shaft adjusting mechanism capable of independently adjusting the axial directions of the first rotating shaft, the second rotating shaft, and the third rotating shaft is provided. (5) The X-ray diffraction sample rocking device according to any one of (5).
(7) The X-ray diffraction sample rocking device according to any one of (1) to (6), wherein the sample holder is a diamond anvil cell.
(8) (1)〜(7)のいずれかに記載のX線回折試料揺動装置と、X線発生部と、二次元X線検出器とを有することを特徴とするX線回折装置。 (8) An X-ray diffraction apparatus comprising the X-ray diffraction sample rocking device according to any one of (1) to (7), an X-ray generation unit, and a two-dimensional X-ray detector.
(9) (8)に記載のX線回折装置を用いるX線回折パターンの測定方法であって、軸調整機構により、第1の揺動部の第1の回転軸、第2の揺動部の第2の回転軸及び第3の揺動部の第3の回転軸の軸方向を互いに直交するように調整する工程と、第1の揺動部、第2の揺動部及び第3の揺動部を揺動させた状態で、X線発生部で発生させたX線を、X線回折試料揺動装置の試料保持部に保持したX線回折試料に照射して、前記X線回折試料で散乱させたX線を二次元X線検出器に投射する工程と、を有することを特徴とするX線回折パターンの測定方法。 (9) A method for measuring an X-ray diffraction pattern using the X-ray diffractometer according to (8), wherein the first rotating shaft and the second oscillating unit of the first oscillating unit are arranged by an axis adjustment mechanism. Adjusting the axial direction of the third rotating shaft of the second rotating shaft and the third swinging portion to be orthogonal to each other, the first swinging portion, the second swinging portion, and the third swinging portion. The X-ray diffraction sample is irradiated with X-rays generated by the X-ray generation unit while the rocking unit is swung, to the X-ray diffraction sample held by the sample holding unit of the X-ray diffraction sample rocking device. Projecting the X-rays scattered by the sample onto a two-dimensional X-ray detector, and a method for measuring an X-ray diffraction pattern.
(10) 第1の揺動部、第2の揺動部及び第3の揺動部の揺動を同時に行うことを特徴とする(9)に記載のX線回折パターンの測定方法。
(11) 第1の揺動部の第1の回転軸をX線入射方向と平行に調整する工程を有することを特徴とする(9)〜(10)のいずれかに記載のX線回折パターンの測定方法。
(10) The method for measuring an X-ray diffraction pattern according to (9), wherein the first oscillating portion, the second oscillating portion, and the third oscillating portion are simultaneously oscillated.
(11) The X-ray diffraction pattern according to any one of (9) to (10), including a step of adjusting a first rotation axis of the first swinging portion in parallel with an X-ray incident direction. Measuring method.
(12) 3軸パルスモーター制御装置により、第3の揺動部の位置及び方向を制御する工程を有することを特徴とする(9)〜(11)のいずれかに記載のX線回折パターンの測定方法。
(13) 前記試料保持部としてダイヤモンドアンビルセルを用い、前記X線回折試料に高圧を印加した状態でX線を照射することを特徴とする(9)〜(12)のいずれかに記載のX線回折パターンの測定方法。
(12) The X-ray diffraction pattern according to any one of (9) to (11), including a step of controlling the position and direction of the third oscillating unit by a three-axis pulse motor control device. Measuring method.
(13) The diamond anvil cell is used as the sample holder, and X-rays are irradiated in a state where a high pressure is applied to the X-ray diffraction sample. X in any one of (9) to (12) Measuring method of line diffraction pattern.
本発明のX線回折試料揺動装置は、X線回折試料を保持する試料保持部をX線入射方向と平行にした第1の回転軸の周りに揺動可能な第1の揺動部と、前記第1の回転軸と直交する第2の回転軸の周りに揺動可能な第2の揺動部と、前記第1及び第2の回転軸と直交する第3の回転軸の周りに揺動可能な第3の揺動部を有する構成なので、第1の揺動部、第2の揺動部及び第3の揺動部からなる揺動機構により、X線回折試料を3つの軸の周りに揺動させることができ、X線回折パターンを測定したときに、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 The X-ray diffraction sample rocking device of the present invention includes a first rocking portion that can rock around a first rotation axis in which a sample holding portion that holds an X-ray diffraction sample is parallel to the X-ray incident direction; A second swinging portion swingable around a second rotation axis orthogonal to the first rotation axis, and a third rotation axis orthogonal to the first and second rotation axes. Since the third rocking portion is configured to be rockable, the X-ray diffraction sample is moved to three axes by a rocking mechanism including the first rocking portion, the second rocking portion, and the third rocking portion. When the X-ray diffraction pattern is measured, a uniform diffraction ring can be obtained. As a result, the crystal structure factor can be refined, and the atomic position in the crystal structure can be accurately determined. It is done.
本発明のX線回折試料揺動装置は、前記試料保持部がダイヤモンドアンビルセルである構成なので、ダイヤモンドアンビルセルを固定した状態で、ダイヤモンドアンビルセルごと回転することにより、内部の高圧のX線回折試料をX線照射状態で揺動できる。 In the X-ray diffraction sample rocking device of the present invention, since the sample holder is a diamond anvil cell, the diamond anvil cell is fixed, and the diamond anvil cell is rotated to rotate the internal high-pressure X-ray diffraction. The sample can be swung in the X-ray irradiation state.
本発明のX線回折装置は、先に記載のX線回折試料揺動装置と、X線発生部と、二次元X線検出器とを有する構成なので、第1の揺動部、第2の揺動部及び第3の揺動部からなる揺動機構により、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 Since the X-ray diffractometer of the present invention includes the X-ray diffraction sample oscillating device described above, an X-ray generator, and a two-dimensional X-ray detector, the first oscillating unit, the second oscillating unit, A uniform diffractive ring is obtained by the rocking mechanism including the rocking part and the third rocking part. As a result, the crystal structure factor is refined, and the atomic position in the crystal structure is precisely obtained.
本発明のX線回折パターンの測定方法は、先に記載のX線回折装置を用いるX線回折パターンの測定方法であって、軸調整機構により、第1の揺動部の第1の回転軸、第2の揺動部の第2の回転軸及び第3の揺動部の第3の回転軸の軸方向を互いに直交するように調整する工程と、第1の揺動部、第2の揺動部及び第3の揺動部を揺動させた状態で、X線発生部で発生させたX線を、X線回折試料揺動装置の試料保持部に保持したX線回折試料に照射して、前記X線回折試料で散乱させたX線を二次元X線検出器に投射する工程と、を有する構成なので、第1の揺動部、第2の揺動部及び第3の揺動部からなる揺動機構により、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 The X-ray diffraction pattern measurement method of the present invention is an X-ray diffraction pattern measurement method using the above-described X-ray diffraction apparatus, and the first rotating shaft of the first oscillating portion is adjusted by the axis adjustment mechanism. Adjusting the axial directions of the second rotating shaft of the second swinging portion and the third rotating shaft of the third swinging portion to be orthogonal to each other, the first swinging portion, the second swinging portion, With the rocking part and the third rocking part being swung, the X-ray diffraction sample held by the sample holding part of the X-ray diffraction sample rocking device is irradiated with the X-rays generated by the X-ray generating part. And projecting the X-rays scattered by the X-ray diffraction sample onto the two-dimensional X-ray detector, so that the first oscillating unit, the second oscillating unit, and the third oscillating unit are included. A uniform diffractive ring is obtained by a rocking mechanism consisting of moving parts, which leads to refinement of the crystal structure factor and precise determination of the atomic position in the crystal structure. That.
(本発明の実施形態)
<X線回折装置>
本発明の実施形態であるX線回折装置の一例について説明する。
図1は、本発明の実施形態であるX線回折装置の一例を示す模式図である。
図1に示すように、本発明の実施形態であるX線回折装置1は、X線発生装置41と、X線回折試料揺動装置11と、二次元X線検出器51とから構成されている。
X線発生装置41で発生させたX線を試料保持部31に照射して、試料保持部31に保持されたX線回折試料でX線を散乱させ、二次元X線検出器51にX線回折パターンを形成する。
二次元X線検出器51は、例えば、イメージングプレート等である。
(Embodiment of the present invention)
<X-ray diffractometer>
An example of the X-ray diffraction apparatus according to the embodiment of the present invention will be described.
FIG. 1 is a schematic diagram illustrating an example of an X-ray diffraction apparatus according to an embodiment of the present invention.
As shown in FIG. 1, an X-ray diffraction apparatus 1 according to an embodiment of the present invention includes an X-ray generator 41, an X-ray diffraction sample rocking device 11, and a two-dimensional X-ray detector 51. Yes.
The sample holder 31 is irradiated with X-rays generated by the X-ray generator 41, and X-rays are scattered by the X-ray diffraction sample held by the sample holder 31, and the two-dimensional X-ray detector 51 receives X-rays. A diffraction pattern is formed.
The two-dimensional X-ray detector 51 is, for example, an imaging plate.
<X線回折試料揺動装置>
次に、本発明の実施形態であるX線回折試料揺動装置の一例について説明する。
図1に示すように、本発明の実施形態であるX線回折試料揺動装置11は、第1の揺動部21、第2の揺動部22、第3の揺動部23と、を備えている。試料保持部31は、第1の揺動部21に固定されている。
図2は、図1に示すX線回折試料揺動装置の平面図(a)、正面図(b)及び右側面図(c)である。
<X-ray diffraction sample rocking device>
Next, an example of the X-ray diffraction sample rocking device according to the embodiment of the present invention will be described.
As shown in FIG. 1, an X-ray diffraction sample rocking device 11 according to an embodiment of the present invention includes a first rocking portion 21, a second rocking portion 22, and a third rocking portion 23. I have. The sample holding part 31 is fixed to the first swing part 21.
2 is a plan view (a), a front view (b), and a right side view (c) of the X-ray diffraction sample rocking device shown in FIG.
第1の揺動部21は、中心に試料保持部31を固定したリング状の部材であり、第1の回転軸61の周りに回転させる第1の回転機構(図示略)が取り付けられている。
第1の回転軸61は、リング状の第1の揺動部21の中心軸にあわされており、X線入射方向と平行とされている。
図2(c)では、第1の揺動部21は第1の回転軸61の周りにφ度回転可能であることが示されている。なお、第1の回転軸61の周りに第1の揺動部21を360度回転可能である。
The first oscillating portion 21 is a ring-shaped member having a sample holding portion 31 fixed at the center, and a first rotating mechanism (not shown) for rotating around the first rotating shaft 61 is attached. .
The first rotating shaft 61 is aligned with the central axis of the ring-shaped first oscillating portion 21 and is parallel to the X-ray incident direction.
In FIG. 2C, it is shown that the first swing portion 21 can rotate around the first rotation shaft 61 by φ degrees. Note that the first oscillating portion 21 can be rotated 360 degrees around the first rotation shaft 61.
第2の揺動部22は、第1の揺動部21を固定した部材であり、第2の回転軸62の周りに回転させる第2の回転機構(図示略)が取り付けられている。
第2の揺動部22は、保持部材25の湾曲部に保持されており、湾曲部の湾曲形状に合わせて第2の回転軸62の周りに揺動可能とされている。
図2(b)では、第2の揺動部22は第2の回転軸62の周りにω度回転可能であることが示されている。
The second oscillating part 22 is a member to which the first oscillating part 21 is fixed, and a second rotating mechanism (not shown) for rotating around the second rotating shaft 62 is attached.
The second oscillating portion 22 is held by the curved portion of the holding member 25 and can be oscillated around the second rotation shaft 62 in accordance with the curved shape of the curved portion.
FIG. 2B shows that the second swinging portion 22 can rotate around the second rotation shaft 62 by ω degrees.
第3の揺動部23は、第2の揺動部22を固定した円板状の部材であり、第3の回転軸63の周りに回転させる第3の回転機構(図示略)が取り付けられている。
図2(a)では、第3の揺動部23は第3の回転軸63の周りにθ度回転可能であることが示されている。
The third oscillating portion 23 is a disk-like member to which the second oscillating portion 22 is fixed, and a third rotating mechanism (not shown) that rotates around the third rotating shaft 63 is attached. ing.
In FIG. 2A, it is shown that the third swing part 23 can rotate around the third rotation shaft 63 by θ degrees.
第3の揺動部23は、3軸パルスモーター制御装置が備えられた台上に固定されている(図示略)。3軸パルスモーター制御装置を制御することにより、第3の揺動部23の位置及び方向を任意の値に設定することができる。 The 3rd rocking | swiveling part 23 is being fixed on the stand with which the 3 axis | shaft pulse motor control apparatus was equipped (illustration omitted). By controlling the three-axis pulse motor control device, the position and direction of the third swing portion 23 can be set to arbitrary values.
第1の回転軸61、第2の回転軸62及び第3の回転軸63の軸方向をそれぞれ独立に調整可能な軸調整機構が備えられている(図示略)。軸調整機構を制御することにより、第1の回転軸61、第2の回転軸62及び第3の回転軸63の軸方向をそれぞれ直交するように設定することができる。 A shaft adjusting mechanism is provided (not shown) that can adjust the axial directions of the first rotating shaft 61, the second rotating shaft 62, and the third rotating shaft 63 independently of each other. By controlling the shaft adjusting mechanism, the axial directions of the first rotating shaft 61, the second rotating shaft 62, and the third rotating shaft 63 can be set to be orthogonal to each other.
試料保持部31として、ダイヤモンドアンビルセル(DAC)を用いることができる。DACを用いることにより、高圧状態のX線回折試料のX線回折パターンを得ることができる。
試料保持部31として、大気圧用セルを用いれば、大気圧下のX線回折試料のX線回折パターンを得ることができる。
A diamond anvil cell (DAC) can be used as the sample holder 31. By using DAC, an X-ray diffraction pattern of an X-ray diffraction sample in a high pressure state can be obtained.
If an atmospheric pressure cell is used as the sample holder 31, an X-ray diffraction pattern of an X-ray diffraction sample under atmospheric pressure can be obtained.
図3は、DACの一例を示す模式図である。
図3に示すように、DACは対称型であり、一対のダイヤモンドアンビル32a、32bと、1枚のガスケット33と、X線回折試料34とからなる。2つのダイヤモンドアンビル32a、32bは、X線回折試料34の上下に設けられており、その間に存在するX線回折試料34を挟んで、X線回折試料34に加圧可能とされている。
なお、図3では、下側のダイヤモンドアンビル32aを表示するために、仮想的にガスケットを部分的に切断して表示している。
FIG. 3 is a schematic diagram illustrating an example of a DAC.
As shown in FIG. 3, the DAC is symmetrical and includes a pair of diamond anvils 32 a and 32 b, a single gasket 33, and an X-ray diffraction sample 34. The two diamond anvils 32a and 32b are provided above and below the X-ray diffraction sample 34, and the X-ray diffraction sample 34 can be pressurized with the X-ray diffraction sample 34 existing therebetween.
In FIG. 3, in order to display the lower diamond anvil 32a, the gasket is virtually cut and displayed.
図4及び図5は、DACの製造方法の一例を示す工程図である。各工程図は、平面図と、B−B’線における断面図で示されている。
まず、図4(a)に示すように、平面視略正方形状のガスケット基板33を準備する。例えば、100〜250μmの厚さのレニウム製のガスケット基板を用いることができる。
次に、図4(b)に示すように、ガスケット基板33の両面の中心部に平面視円形状の凹部33h、33iを形成する。
次に、図4(c)に示すように、凹部33h、33iの中心に貫通孔33jを形成する。例えば、貫通孔33jの径は、直径100〜150μmとする。
次に、図5(a)に示すように、1つのダイヤモンドアンビル32aの円形面部を一面側の凹部33iに嵌合してから、一面側が塞がれた貫通孔33jの内部に、X線粉末試料35を装填する。
4 and 5 are process diagrams showing an example of a DAC manufacturing method. Each process drawing is shown with the top view and sectional drawing in the BB 'line.
First, as shown in FIG. 4A, a gasket substrate 33 having a substantially square shape in plan view is prepared. For example, a rhenium gasket substrate having a thickness of 100 to 250 μm can be used.
Next, as shown in FIG. 4B, recesses 33 h and 33 i having a circular shape in plan view are formed in the center of both surfaces of the gasket substrate 33.
Next, as shown in FIG.4 (c), the through-hole 33j is formed in the center of the recessed parts 33h and 33i. For example, the diameter of the through hole 33j is 100 to 150 μm.
Next, as shown in FIG. 5A, the X-ray powder is placed inside the through-hole 33j whose one surface side is closed after the circular surface portion of one diamond anvil 32a is fitted into the recess portion 33i on one surface side. Sample 35 is loaded.
次に、図5(b)に示すように、水、アルコール又は水とアルコールの混合物からなる液圧媒体を注射器等の液圧媒体注入容器36により、X線粉末試料35に注入・混合して、X線回折試料34とする。例えば、メタノール:エタノール:水=16:3:1を使用できる。なお、液圧媒体を用いるのは、室温での加圧の場合である。
次に、図5(c)に示すように、もう1つのダイヤモンドアンビル32bの円形面部を他面側の凹部33hに嵌合して、貫通孔33jの他面側を塞ぐ。
以上の工程により、DACを作製する。
Next, as shown in FIG. 5B, a hydraulic medium made of water, alcohol or a mixture of water and alcohol is injected and mixed into the X-ray powder sample 35 by a hydraulic medium injection container 36 such as a syringe. X-ray diffraction sample 34. For example, methanol: ethanol: water = 16: 3: 1 can be used. Note that the hydraulic medium is used in the case of pressurization at room temperature.
Next, as shown in FIG. 5C, the circular surface portion of another diamond anvil 32b is fitted into the concave portion 33h on the other surface side, and the other surface side of the through hole 33j is closed.
The DAC is manufactured through the above steps.
<X線回折パターンの測定方法>
次に、本発明の実施形態であるX線回折パターンの測定方法の一例について説明する。
本発明の実施形態であるX線回折パターンの測定方法は、X線回折装置1を用いるX線回折パターンの測定方法であって、軸調整機構により、第1の揺動部21の第1の回転軸61、第2の揺動部22の第2の回転軸62及び第3の揺動部23の第3の回転軸63の軸方向を互いに直交するように調整する工程と、第1の揺動部21、第2の揺動部22及び第3の揺動部23を揺動させた状態で、X線発生部41で発生させたX線を、X線回折試料揺動装置11の試料保持部31に保持したX線回折試料34に照射して、X線回折試料34で散乱させたX線を二次元X線検出器51に投射する工程と、を有する。
<Measurement method of X-ray diffraction pattern>
Next, an example of a method for measuring an X-ray diffraction pattern according to an embodiment of the present invention will be described.
An X-ray diffraction pattern measuring method according to an embodiment of the present invention is an X-ray diffraction pattern measuring method using the X-ray diffractometer 1, and the first adjustment of the first oscillating portion 21 is performed by an axis adjustment mechanism. Adjusting the axial directions of the rotary shaft 61, the second rotary shaft 62 of the second swing portion 22 and the third rotary shaft 63 of the third swing portion 23 to be orthogonal to each other; X-rays generated by the X-ray generation unit 41 in a state where the oscillating unit 21, the second oscillating unit 22, and the third oscillating unit 23 are oscillated are transmitted to the X-ray diffraction sample oscillating device 11. Irradiating the X-ray diffraction sample 34 held by the sample holding unit 31 and projecting the X-rays scattered by the X-ray diffraction sample 34 to the two-dimensional X-ray detector 51.
図6は、揺動の有無の比較の概念図である。
図6(a)に示すように、粗粒な粉末試料を用い、揺動させない場合には、二次元X線検出器51に投射されたX線回折パターンは点状となり、均一なX線回折リングを得ることができない。
一方、図6(b)に示すように、第1の揺動部21、第2の揺動部22及び第3の揺動部23を揺動させた状態で、X線発生部41で発生させたX線を、X線回折試料揺動装置11の試料保持部31に保持したX線回折試料34に照射することにより、粗粒な粉末試料であっても均一なX線回折リングを得ることができる。
なお、第1の揺動部21の第1の回転軸61、第2の揺動部22の第2の回転軸62及び第3の揺動部23の第3の回転軸63の軸方向を互いに直交するように調整することにより、X線回折試料34を大きく揺動させることができる。
FIG. 6 is a conceptual diagram for comparison of the presence or absence of oscillation.
As shown in FIG. 6A, when a coarse powder sample is used and it is not rocked, the X-ray diffraction pattern projected on the two-dimensional X-ray detector 51 becomes a dot-like pattern, and uniform X-ray diffraction I can't get a ring.
On the other hand, as shown in FIG. 6B, the X-ray generation unit 41 generates the first oscillating unit 21, the second oscillating unit 22, and the third oscillating unit 23 while oscillating them. By irradiating the X-ray diffraction sample 34 held by the sample holding unit 31 of the X-ray diffraction sample rocking device 11 with the X-ray diffraction sample, a uniform X-ray diffraction ring is obtained even for a coarse powder sample. be able to.
The axial directions of the first rotating shaft 61 of the first swinging portion 21, the second rotating shaft 62 of the second swinging portion 22, and the third rotating shaft 63 of the third swinging portion 23 are defined. By adjusting so as to be orthogonal to each other, the X-ray diffraction sample 34 can be largely swung.
第1の揺動部21、第2の揺動部22及び第3の揺動部23の揺動を同時に行ってもよい。これにより、粗粒な粉末試料であっても均一なX線回折リングを得ることができ、揺動を行わない場合に点状のX線回折パターンであっても線状のX線回折パターンにすることができる。 The first swing portion 21, the second swing portion 22, and the third swing portion 23 may be swung simultaneously. As a result, a uniform X-ray diffraction ring can be obtained even for a coarse powder sample, and even if it is not oscillated, even if it is a dotted X-ray diffraction pattern, it becomes a linear X-ray diffraction pattern. can do.
第1の揺動部21の第1の回転軸61をX線入射方向と平行に調整する工程を有することが好ましい。これにより、軸調整機構により、第1の揺動部21の第1の回転軸61、第2の揺動部22の第2の回転軸62及び第3の揺動部23の第3の回転軸63の軸方向を互いに直交するように調整することを容易にできる。 It is preferable to have the process of adjusting the 1st rotating shaft 61 of the 1st rocking | swiveling part 21 in parallel with an X-ray incident direction. Accordingly, the first rotation shaft 61 of the first swing part 21, the second rotation shaft 62 of the second swing part 22, and the third rotation of the third swing part 23 are performed by the shaft adjustment mechanism. It is easy to adjust the axial directions of the shafts 63 to be orthogonal to each other.
3軸パルスモーター制御装置により、第3の揺動部23の位置及び方向を制御する工程を有することが好ましい。これにより、軸調整機構により、第1の揺動部21の第1の回転軸61、第2の揺動部22の第2の回転軸62及び第3の揺動部23の第3の回転軸63の軸方向を互いに直交するように調整することを容易にできる。 It is preferable to have a step of controlling the position and direction of the third oscillating portion 23 by a three-axis pulse motor control device. Accordingly, the first rotation shaft 61 of the first swing part 21, the second rotation shaft 62 of the second swing part 22, and the third rotation of the third swing part 23 are performed by the shaft adjustment mechanism. It is easy to adjust the axial directions of the shafts 63 to be orthogonal to each other.
試料保持部31としてダイヤモンドアンビルセルを用い、X線回折試料34に高圧を印加した状態でX線を照射してもよい。これにより、高圧下のX線回折試料34を回転させることによって、粗粒な粉末試料であっても均一なX線回折リングを得ることができ、高圧状態のX線回折パターンを容易に測定できる。 A diamond anvil cell may be used as the sample holder 31 and X-rays may be irradiated with a high pressure applied to the X-ray diffraction sample 34. Thus, by rotating the X-ray diffraction sample 34 under high pressure, a uniform X-ray diffraction ring can be obtained even with a coarse powder sample, and the X-ray diffraction pattern under high pressure can be easily measured. .
室温でのその場高圧力X線回折は、例えば、Spring8(財団法人高輝度光科学研究センター(JASPRI))BL04B2で行うことができる。38keVに調節された単色シンクロトロンX線を、DAC中の試料上で直径が約50μmのスポットに収束させ、回折されたX線はイメージングプレート(IP)を使用して検出できる。検出器に記録したデバイ(Debye)リングはFIT2Dプログラム(非特許文献4)を使用して強度対2θのデータに変換できる。なお、非特許文献4は、変換プログラムに関するものである。 In-situ high-pressure X-ray diffraction at room temperature can be performed by, for example, Spring 8 (High Intensity Photoscience Research Center (JASPRI)) BL04B2. Monochromatic synchrotron X-rays adjusted to 38 keV are focused to a spot with a diameter of about 50 μm on the sample in the DAC, and the diffracted X-rays can be detected using an imaging plate (IP). The Debye ring recorded in the detector can be converted to intensity vs. 2θ data using the FIT2D program (Non-Patent Document 4). Non-Patent Document 4 relates to a conversion program.
本発明の実施形態であるX線回折試料揺動装置11は、X線回折試料34を保持する試料保持部31をX線入射方向と平行にした第1の回転軸61の周りに揺動可能な第1の揺動部21と、第1の回転軸61と直交する第2の回転軸62の周りに揺動可能な第2の揺動部22と、第1及び第2の回転軸61、62と直交する第3の回転軸63の周りに揺動可能な第3の揺動部23を有する構成なので、第1の揺動部、第2の揺動部及び第3の揺動部からなる揺動機構により、X線回折試料を3つの軸の周りに揺動させることができ、X線回折パターンを測定したときに、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 The X-ray diffraction sample rocking device 11 according to the embodiment of the present invention can rock around the first rotation shaft 61 in which the sample holding unit 31 holding the X-ray diffraction sample 34 is parallel to the X-ray incident direction. The first swinging portion 21, the second swinging portion 22 swingable around the second rotating shaft 62 orthogonal to the first rotating shaft 61, and the first and second rotating shafts 61. , 62 is provided with a third oscillating portion 23 that can oscillate around a third rotating shaft 63, so that the first oscillating portion, the second oscillating portion, and the third oscillating portion are provided. The X-ray diffraction sample can be swung around three axes by a rocking mechanism comprising, and when the X-ray diffraction pattern is measured, a uniform diffraction ring is obtained. This leads to refinement, and the atomic position in the crystal structure is required precisely.
本発明の実施形態であるX線回折試料揺動装置11は、第1の揺動部21を第1の回転軸61の周りに360度回転させる第1の回転機構が取り付けられている構成なので、X線回折試料を第1の回転軸61の周りに揺動させることができ、X線回折パターンを測定したときに、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 The X-ray diffraction sample rocking device 11 according to the embodiment of the present invention has a configuration in which a first rotating mechanism that rotates the first rocking portion 21 around the first rotating shaft 61 by 360 degrees is attached. The X-ray diffraction sample can be swung around the first rotation axis 61, and when the X-ray diffraction pattern is measured, a uniform diffraction ring can be obtained. As a result, the crystal structure factor can be refined. The atomic position in the crystal structure is precisely determined.
本発明の実施形態であるX線回折試料揺動装置11は、第2の揺動部22を第2の回転軸62の周りに回転させる第2の回転機構が取り付けられている構成なので、X線回折試料を第2の回転軸62の周りに揺動させることができ、X線回折パターンを測定したときに、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 The X-ray diffraction sample rocking device 11 according to the embodiment of the present invention has a configuration in which a second rotation mechanism for rotating the second rocking portion 22 around the second rotation shaft 62 is attached. The line diffraction sample can be swung around the second rotation axis 62, and when the X-ray diffraction pattern is measured, a uniform diffraction ring is obtained, resulting in refinement of the crystal structure factor, The atomic position in the crystal structure is required precisely.
本発明の実施形態であるX線回折試料揺動装置11は、第3の揺動部23を第3の回転軸63の周りに回転させる第3の回転機構が取り付けられている構成なので、X線回折試料を第2の回転軸63の周りに揺動させることができ、X線回折パターンを測定したときに、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 The X-ray diffraction sample rocking device 11 according to the embodiment of the present invention has a configuration in which a third rotating mechanism for rotating the third rocking portion 23 around the third rotating shaft 63 is attached. The line diffraction sample can be swung around the second rotation axis 63, and when the X-ray diffraction pattern is measured, a uniform diffraction ring is obtained. As a result, the crystal structure factor is refined, The atomic position in the crystal structure is required precisely.
本発明の実施形態であるX線回折試料揺動装置11は、第3の揺動部23が、3軸パルスモーター制御装置が備えられた台上に固定されている構成なので、X線回折試料を第2の回転軸63の周りに揺動させることができ、X線回折パターンを測定したときに、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 The X-ray diffraction sample oscillating device 11 according to the embodiment of the present invention has a configuration in which the third oscillating portion 23 is fixed on a table provided with a three-axis pulse motor control device. Can be swung around the second rotation axis 63, and when the X-ray diffraction pattern is measured, a uniform diffraction ring is obtained. As a result, the crystal structure factor is refined, and the crystal structure Is precisely required.
本発明の実施形態であるX線回折試料揺動装置11は、第1の回転軸61、第2の回転軸62及び第3の回転軸63の軸方向をそれぞれ独立に調整可能な軸調整機構が備えられている構成なので、第1の回転軸61、第2の回転軸62及び第3の回転軸63の軸方向を互いに直交するように調整することができ、X線回折試料をできるだけ大きく揺動させることができ、X線回折パターンを測定したときに、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 An X-ray diffraction sample oscillating device 11 according to an embodiment of the present invention includes an axis adjustment mechanism that can independently adjust the axial directions of the first rotation shaft 61, the second rotation shaft 62, and the third rotation shaft 63. Therefore, the axial directions of the first rotating shaft 61, the second rotating shaft 62, and the third rotating shaft 63 can be adjusted to be orthogonal to each other, and the X-ray diffraction sample can be made as large as possible. When the X-ray diffraction pattern is measured, a uniform diffraction ring can be obtained. As a result, the crystal structure factor is refined, and the atomic position in the crystal structure is accurately determined.
本発明の実施形態であるX線回折試料揺動装置11は、試料保持部31がダイヤモンドアンビルセルである構成なので、ダイヤモンドアンビルセルを固定した状態で、ダイヤモンドアンビルセルごと回転することにより、内部の高圧のX線回折試料をX線照射状態で揺動できる。 The X-ray diffraction sample oscillating device 11 according to the embodiment of the present invention has a configuration in which the sample holding unit 31 is a diamond anvil cell. Therefore, by rotating the diamond anvil cell together with the diamond anvil cell fixed, A high-pressure X-ray diffraction sample can be swung in an X-ray irradiation state.
本発明の実施形態であるX線回折装置1は、X線回折試料揺動装置11と、X線発生部41と、二次元X線検出器51とを有する構成なので、第1の揺動部、第2の揺動部及び第3の揺動部からなる揺動機構により、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 Since the X-ray diffractometer 1 according to the embodiment of the present invention includes the X-ray diffraction sample oscillating device 11, the X-ray generator 41, and the two-dimensional X-ray detector 51, the first oscillating unit The oscillating mechanism comprising the second oscillating part and the third oscillating part provides a uniform diffractive ring, which leads to the refinement of the crystal structure factor and the precise atomic position in the crystal structure. Desired.
本発明の実施形態であるX線回折パターンの測定方法は、X線回折装置1を用いるX線回折パターンの測定方法であって、軸調整機構により、第1の揺動部21の第1の回転軸61、第2の揺動部22の第2の回転軸62及び第3の揺動部23の第3の回転軸63の軸方向を互いに直交するように調整する工程を有する工程と、第1の揺動部21、第2の揺動部22及び第3の揺動部23を揺動させた状態で、X線発生部41で発生させたX線を、X線回折試料揺動装置11の試料保持部31に保持したX線回折試料34に照射して、X線回折試料34で散乱させたX線を二次元X線検出器51に投射する工程と、を有する構成なので、第1の揺動部、第2の揺動部及び第3の揺動部からなる揺動機構により、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 An X-ray diffraction pattern measuring method according to an embodiment of the present invention is an X-ray diffraction pattern measuring method using the X-ray diffractometer 1, and the first adjustment of the first oscillating portion 21 is performed by an axis adjustment mechanism. Adjusting the axial directions of the rotary shaft 61, the second rotary shaft 62 of the second swing portion 22 and the third rotary shaft 63 of the third swing portion 23 to be orthogonal to each other; In the state where the first oscillating unit 21, the second oscillating unit 22, and the third oscillating unit 23 are oscillated, the X-ray generated by the X-ray generation unit 41 is oscillated by the X-ray diffraction sample. Irradiating the X-ray diffraction sample 34 held by the sample holding unit 31 of the apparatus 11 and projecting the X-rays scattered by the X-ray diffraction sample 34 to the two-dimensional X-ray detector 51, A uniform diffractive ring is obtained by the rocking mechanism including the first rocking part, the second rocking part and the third rocking part. Results, leading to refinement of the crystal structure factors, atom positions in the crystal structure is determined precisely.
本発明の実施形態であるX線回折パターンの測定方法は、第1の揺動部21、第2の揺動部22及び第3の揺動部23の揺動を同時に行う構成なので、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 Since the X-ray diffraction pattern measuring method according to the embodiment of the present invention is configured to simultaneously swing the first swinging portion 21, the second swinging portion 22, and the third swinging portion 23, it is uniform. A diffractive ring is obtained, and as a result, the crystal structure factor is refined, and the atomic position in the crystal structure is accurately determined.
本発明の実施形態であるX線回折パターンの測定方法は、第1の揺動部21の第1の回転軸61をX線入射方向と平行に調整する工程を有する構成なので、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 Since the X-ray diffraction pattern measurement method according to the embodiment of the present invention includes a step of adjusting the first rotation shaft 61 of the first oscillating portion 21 in parallel with the X-ray incident direction, a uniform diffraction ring is provided. As a result, the crystal structure factor is refined, and the atomic position in the crystal structure is precisely determined.
本発明の実施形態であるX線回折パターンの測定方法は、3軸パルスモーター制御装置により、第3の揺動部の位置及び方向を制御する工程を有する構成なので、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 Since the X-ray diffraction pattern measurement method according to the embodiment of the present invention includes a step of controlling the position and direction of the third oscillating unit by a three-axis pulse motor control device, a uniform diffraction ring can be obtained. As a result, the crystal structure factor is refined, and the atomic position in the crystal structure is precisely determined.
本発明の実施形態であるX線回折パターンの測定方法は、試料保持部31としてダイヤモンドアンビルセルを用い、X線回折試料34に高圧を印加した状態でX線を照射する構成なので、高圧状態の試料について、均一な回折リングが得られ、その結果、結晶構造因子の精密化につながり、結晶構造中の原子位置が精密に求められる。 The X-ray diffraction pattern measurement method according to the embodiment of the present invention uses a diamond anvil cell as the sample holder 31 and irradiates X-rays with a high pressure applied to the X-ray diffraction sample 34. A uniform diffractive ring is obtained for the sample, and as a result, the crystal structure factor is refined, and the atomic position in the crystal structure is precisely determined.
本発明の実施形態であるX線回折試料揺動装置、X線回折装置及びX線回折パターンの測定方法は、上記実施形態に限定されるものではなく、本発明の技術的思想の範囲内で、種々変更して実施することができる。本実施形態の具体例を以下の実施例で示す。しかし、本発明はこれらの実施例に限定されるものではない。 The X-ray diffraction sample oscillating device, the X-ray diffraction device, and the X-ray diffraction pattern measurement method according to the embodiment of the present invention are not limited to the above-described embodiments, and are within the scope of the technical idea of the present invention. Various modifications can be made. Specific examples of this embodiment are shown in the following examples. However, the present invention is not limited to these examples.
(実施例1)
以下、本発明を、実施例に基づいて説明する。
実施例1は、X線回折試料に印加する圧力を変化させて、高圧状態及び大気圧状態のX線回折パターンの測定を行った一例である。
次に、図3に示す対称型のダイヤモンドアンビルセル(DAC)を用意した。100μmの厚さのレニウム製のガスケットを用い、直径100〜150μmの孔を形成した。
次に、孔にX線粉末試料を装填してから、メタノール:エタノール:水=16:3:1からなる液圧媒体を加えて、X線回折試料とした。
次に、X線回折試料揺動装置にDACを配置した。
なお、高圧状態の結果を得る際には、上下に設けられた一対のダイヤモンドアンビルでその間に存在するX線回折試料を挟んで、大気圧(1気圧)から7万気圧に加圧した。
実験条件は、加圧しない場合(実験No.1、2)と加圧する場合(実験No.3、4)及び揺動しない場合(実験No.1、3)と揺動させた場合(実験No.2、4)に分けた。
Example 1
Hereinafter, the present invention will be described based on examples.
Example 1 is an example in which the X-ray diffraction pattern in a high-pressure state and an atmospheric pressure state was measured by changing the pressure applied to the X-ray diffraction sample.
Next, a symmetric diamond anvil cell (DAC) shown in FIG. 3 was prepared. Using a rhenium gasket having a thickness of 100 μm, holes having a diameter of 100 to 150 μm were formed.
Next, after loading the X-ray powder sample into the hole, a hydraulic medium consisting of methanol: ethanol: water = 16: 3: 1 was added to obtain an X-ray diffraction sample.
Next, a DAC was placed on the X-ray diffraction sample rocking device.
In order to obtain a result in a high pressure state, the pressure was increased from atmospheric pressure (1 atm) to 70,000 atm with a pair of diamond anvils provided between the upper and lower sides sandwiching an X-ray diffraction sample between them.
The experimental conditions are the case where no pressure is applied (Experiment No. 1 and 2), the case where pressure is applied (Experiment No. 3 and 4), the case where no pressure is applied (Experiment No. 1 and 3), and the case where the material is rocked (Experiment No. 1). .2, 4).
室温でのその場高圧力X線回折実験は、Spring8(財団法人高輝度光科学研究センター(JASPRI))BL04B2で行った。
38keVに調節された単色シンクロトロンX線を、DAC中の試料上で直径が約50μmのスポットに収束させた。
回折されたX線はイメージングプレート(IP)を使用して検出した。
検出器に記録したデバイ(Debye)リングはFIT2Dプログラム(非特許文献4)を使用して強度対2θのデータに変換した。
In-situ high-pressure X-ray diffraction experiments at room temperature were performed in Spring 8 (High Intensity Photoscience Research Center (JASPRI)) BL04B2.
Monochromatic synchrotron X-rays adjusted to 38 keV were focused to a spot with a diameter of about 50 μm on the sample in the DAC.
Diffracted X-rays were detected using an imaging plate (IP).
The Debye ring recorded on the detector was converted to intensity vs. 2θ data using the FIT2D program (Non-Patent Document 4).
表1は、実験No.1〜4におけるφ、ω及びθの実験条件と、イメージングプレート(IP)を使用して検出結果(図7a〜7d)である。なお、実験No.1、2は大気圧(1気圧)におけるものであり、実験No.3、4は高圧におけるものである。 Table 1 shows Experiment No. Experimental conditions of φ, ω, and θ in 1 to 4 and detection results using an imaging plate (IP) (FIGS. 7a to 7d). Experiment No. 1 and 2 are at atmospheric pressure (1 atm). 3 and 4 are at high pressure.
表1に示す実験結果において、実験No.1、3の場合にはスポット状のX線回折リングが観察された。一方、実験No.2、4の場合には均一なX線回折リングが観察された。
図8は、非特許文献5に記載の原子座標及び非特許文献6に記載の解析プログラムGSASを用い、実験No.1、2のX線回折リングを強度対2θのデータに変換して得られたリートベルト解析の結果である。なお、非特許文献5は、Bi2O3の構造に関するものであり、非特許文献6はプログラムに関するものである。
図8に示すように、実験No.2(図8(b):揺動有り)のR因子(構造の確からしさを評価する因子)であるRwp=7.1%が、実験No.1(図8(a):揺動無し)のRwp=16.3%に比べて、小さく、構造が精密化できていた。なお、図8では、φを0度、360度と表記する代わりにそれぞれ、固定、100sec/turnと表記している。
In the experimental results shown in Table 1, Experiment No. In cases 1 and 3, spot-like X-ray diffraction rings were observed. On the other hand, Experiment No. In cases 2 and 4, a uniform X-ray diffraction ring was observed.
8 uses the atomic coordinates described in Non-Patent Document 5 and the analysis program GSAS described in Non-Patent Document 6, and the experiment No. It is the result of the Rietveld analysis obtained by converting the X-ray diffraction rings of 1 and 2 into data of intensity versus 2θ. Non-patent document 5 relates to the structure of Bi 2 O 3 and non-patent document 6 relates to a program.
As shown in FIG. R wp = 7.1%, which is an R factor of 2 (FIG. 8 (b): with rocking) (a factor for evaluating the certainty of the structure) Compared to R wp = 16.3% in FIG. 1 (FIG. 8A: no swing), the structure was small and the structure was refined. In FIG. 8, φ is expressed as fixed and 100 sec / turn instead of 0 and 360 degrees, respectively.
本発明は、X線回折試料揺動装置、X線回折装置及びX線回折パターンの測定方法に関するものであり、X線回折装置光学系として利用することができ、X線分析産業、X線装置産業等において利用可能性がある。 The present invention relates to an X-ray diffraction sample oscillating device, an X-ray diffraction device, and an X-ray diffraction pattern measurement method, and can be used as an X-ray diffraction device optical system. It can be used in industries.
1…X線回折装置、11…X線回折試料揺動装置、21…第1の揺動部、22…第2の揺動部、23…第3の揺動部、25…保持部材、31…試料保持部、32a、32b…ダイヤモンドアンビル、33…ガスケット(基板)、33h、33i…凹部、33j…貫通孔、34…X線回折試料、35…X線粉末試料、36…液圧媒体注入容器、61…第1の回転軸、62…第2の回転軸、63…第3の回転軸。
DESCRIPTION OF SYMBOLS 1 ... X-ray diffraction apparatus, 11 ... X-ray diffraction sample rocking | fluctuation apparatus, 21 ... 1st rocking | fluctuation part, 22 ... 2nd rocking | fluctuation part, 23 ... 3rd rocking | fluctuation part, 25 ... Holding member, 31 Sample holder 32a, 32b Diamond anvil 33 Gasket (substrate) 33h 33i Recess 33j Through hole 34 X-ray diffraction sample 35 X-ray powder sample 36 Hydraulic medium injection Container, 61 ... first rotation axis, 62 ... second rotation axis, 63 ... third rotation axis.
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